OPTICAL SYSTEM AND PROJECTIONAL LIGHTING SYSTEM

Abstract

An optical system (100) for a projection exposure system (1), comprising a support frame (104), an optical element (102) wherein the support frame (104) supports the optical element (102), a sensor frame (106) wherein the support frame (104) supports the sensor frame (106), a temperature control medium line (122, 124, 126, 128) for guiding a temperature control medium (M) from the support frame (104) to the sensor frame (106) and / or to the optical element (102), and a removable transport lock (200A, 200B, 200C, 200D) which is configured to grip the temperature control medium line (122, 124, 126, 128) in order to secure the temperature control medium line (122, 124, 126, 128) during to secure the transport of the optical system (100) against movement.

Description

[0001] The present invention relates to an optical system for a projection exposure apparatus and a projection exposure apparatus having such an optical system.

[0002] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system equipped with an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, for example, a silicon wafer, in order to transfer the mask structure to the light-sensitive coating of the substrate.

[0003] Driven by the pursuit of ever smaller structures in the production of integrated circuits, EUV lithography systems are currently being developed that use light with a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm. Due to the high absorption of light at this wavelength by most materials, such EUV lithography systems require the use of reflective optics, i.e., mirrors, instead of the previously used refractive optics, i.e., lenses.

[0004] Such a projection system comprises, in addition to the aforementioned optics, a force frame and a sensor frame. The force frame supports both the optics and the sensor frame. During operation of such a projection system, heat is introduced into the optics and the sensor frame, which must be dissipated. For this purpose, a cooling system can be used, with the aid of which a cooling medium, for example, demineralized water, is pumped through the optics and / or the sensor frame. For this purpose, temperature control channels, in particular cooling channels, can be provided in the optics and / or the sensor frame.

[0005] To ensure the best possible dynamic decoupling between the support frame and the optics or between the support frame and the sensor frame during operation of the projection system, it is necessary to design pipes that run from the support frame to the optics and / or to the sensor frame to be as soft as possible for the cooling medium. For example, long and soft corrugated hoses can be used for this purpose. However, these corrugated hoses can move and vibrate uncontrollably within the projection system during transport. This can cause damage to the corrugated hoses or surrounding components. In particular, the fatigue strength of the corrugated hoses and the connections provided on the corrugated hoses is problematic during transport. However, the function described above does not have to be limited to heat dissipation. It is also possible to supply heat in a targeted manner.In this case, no cooling system is provided, but rather a temperature control system, in particular a heating system, in order to heat, for example, any components of the projection system.

[0006] Against this background, it is an object of the present invention to provide an improved optical system.

[0007] Accordingly, an optical system for a projection exposure system is proposed. The optical system comprises a support frame, an optical element, wherein the support frame supports the optical element, a sensor frame, wherein the support frame supports the sensor frame, a temperature control medium line for guiding a temperature control medium from the support frame to the sensor frame and / or to the optical element, and a removable transport lock configured to engage around the temperature control medium line in order to secure the temperature control medium line against movement during transport of the optical system.

[0008] Because the transport lock grips the temperature control line, it can no longer swing uncontrollably. Uncontrolled movements of the temperature control line during transport of the optical system are prevented. Damage to the temperature control line and surrounding components can thus be avoided. The fatigue strength of the temperature control line and any connections provided on the temperature control line, such as connecting flanges, is improved.

[0009] The optical system is preferably a projection optics unit of the projection exposure system or part of such a projection optics unit. However, the optical system can also be an illumination system of the projection exposure system or part of such an illumination system. The support frame can also be referred to as a force frame. The support frame is preferably coupled to a fixed world of the optical system. The "fixed world" is understood here to mean an immovable region of the optical system. For example, the fixed world can be a base frame of the optical system. The support frame can be coupled to the fixed world via a coupling element. The coupling element can comprise springs.

[0010] The optical element is preferably a mirror, in particular an EUV mirror. However, the optical element can also be a lens. In particular, the optical element can also be used for DUV lithography. The optical system can have any number of optical elements. However, only one optical element will be discussed below. The fact that the support frame "supports" the optical element means, in this case, in particular, that the optical element is coupled to the support frame. For this purpose, the optical element can be operatively connected to the support frame via an actuator unit.

[0011] The optical element is coupled to the actuator unit, and the actuator unit is coupled to the support frame. The optical element can be coupled to the actuator unit by means of a coupling element. The coupling element can comprise springs. The actuator unit can, in turn, be coupled to the support frame by means of another coupling element. This coupling element can also comprise springs.

[0012] The sensor frame can also be referred to as a sensor frame. The sensor frame is coupled to the support frame by means of a coupling element. The coupling element can have springs. Preferably, the sensor frame is arranged within the support frame. However, this is not mandatory. It is also possible for the sensor frame to encompass the support frame. The support frame can be made up of multiple parts. In particular, the support frame can have a lower shell or a lower part and an upper shell or an upper part. The lower part and the upper part enclose or enclose the sensor frame. The support frame can have one or more openings or breakthroughs through which the transport lock can be inserted into the optical system in order to encompass or enclose the temperature control medium line. These breakthroughs or openings are preferably only temporary and are closed during operation of the optical system.Suitable lids or closures can be provided for this purpose.

[0013] The temperature control medium line is part of a temperature control device of the optical system. With the help of the temperature control device, heat can be dissipated from the optical element and / or the sensor frame. For this purpose, the temperature control medium is supplied to the optical element and / or the sensor frame via at least one temperature control medium line and removed again via another temperature control medium line. The temperature control medium is, in particular, a cooling medium. Preferably, the temperature control medium is demineralized water. The temperature control medium line can also be referred to as a cooling medium line. The optical system can comprise any number of temperature control medium lines.

[0014] The temperature control medium line is routed from the support frame to the optical element. The temperature control medium line thus connects the support frame to the optical element. Preferably, at least two temperature control medium lines are assigned to the optical element, one of the temperature control medium lines serving to supply the temperature control medium from the support frame to the optical element, and the other of the temperature control medium lines serving to discharge the temperature control medium from the optical element to the support frame. Alternatively, the temperature control medium line can also be routed from the support frame to the sensor frame. In this case, the temperature control medium line connects the support frame to the sensor frame.Preferably, at least two temperature control medium lines are assigned to the sensor frame, one of the temperature control medium lines serving to supply the temperature control medium from the support frame to the sensor frame, and the other of the temperature control medium lines serving to discharge the temperature control medium from the sensor frame to the support frame. Any number of temperature control medium lines can be assigned to both the optical element and the sensor frame. In the following, reference is made to only one temperature control medium line.

[0015] The temperature control medium line is preferably a corrugated pipe or corrugated hose. In this context, a "corrugated pipe" or "corrugated hose" refers to a pipe or hose with an external corrugation with alternating peaks and troughs. This makes the temperature control medium line particularly flexible and, at the same time, resistant to kinking. The temperature control medium line can be made of a non-metallic material, such as a plastic material, or of a metallic material. The temperature control medium line can also have smooth sections where no corrugation is provided. The transport lock preferably engages the temperature control medium line at such a smooth section.

[0016] In this context, the term "removable" or "disassemblable" means, in particular, that the transport lock can be removed from the optical system after it has been transported. If the optical system is to be transported again, the transport lock can be reattached to the optical system. The transport lock preferably remains with the optical system after disassembly. However, this is not mandatory. The optical system can have any number of transport locks. Multiple transport locks can be assigned to the temperature control medium line.

[0017] In this case, the fact that the transport lock "engages" or "encloses" the temperature control medium line is to be understood in particular to mean that the transport lock runs at least partially around the temperature control medium line or runs around it. The transport lock preferably engages the temperature control medium line without any play. This reliably prevents the formation of particles during movements, for example during vibrations, of the temperature control medium line. For this purpose, the temperature control medium line can be clamped or firmly clamped by the transport lock. In this case, "movement" can be understood in particular to mean both a macroscopic movement, i.e. a movement of several millimeters or several centimeters, and a movement due to vibrations of the temperature control medium line.

[0018] According to one embodiment, the transport lock encompasses the temperature control medium line in a form-fitting and / or force-fitting manner.

[0019] Positive-locking connections are created by the interlocking or interlocking of at least two connecting components, in this case the transport lock and the temperature control medium line. A force-locking connection requires a normal force acting on the surfaces to be joined. Force-locking connections can be achieved through frictional engagement. The mutual displacement of the surfaces is prevented as long as the counterforce caused by static friction is not exceeded. In a force-locking connection between the transport lock and the temperature control medium line, the transport lock can, for example, clamp or hold the temperature control medium line.

[0020] According to a further embodiment, the transport lock comprises a support element and a closure element, wherein the support element and the closure element are together configured to encompass the temperature control medium line.

[0021] In other words, the support element and the closure element together enclose the temperature control medium line to secure it against movement. The support element or the closure element can extend annularly around the temperature control medium line, at least in sections, to encompass it at least in sections. The support element and / or the closure element can be provided with a wear-resistant coating, at least in sections. The wear-resistant coating can be a DLC (diamond-like carbon) coating. However, other coatings can also be used for the wear-resistant coating.

[0022] According to a further embodiment, the closure element is mounted on the support element in a linearly displaceable manner.

[0023] This allows the closure element to be moved relative to the support element, for example, to place the transport lock around the temperature control medium line. This linear movement allows the transport lock to be moved from an open state to a closed state and vice versa. Alternatively, a rotational movement between the closure element and the support element can be provided. In this case, the transport lock can be opened and closed like a pair of pincers.

[0024] According to a further embodiment, the support element has a guide rail, wherein the closure element engages positively in the guide rail.

[0025] In particular, the support element comprises a base section. The base section can be rod-shaped. The guide rail is integrally formed on the base section. The guide rail can be a dovetail guide. The closure element also preferably comprises a base section. This base section can also be rod-shaped. An engagement section is integrally formed on the base section of the closure element, which is designed to engage positively with the guide rail. The closure element is thus guided linearly displaceably on the guide rail of the support element by means of its engagement section.

[0026] According to a further embodiment, the transport lock has a receiving area for receiving the temperature control medium line, wherein the transport lock can be moved from an open state in which the receiving area is circumferentially open to a closed state in which the receiving area is circumferentially closed, and vice versa.

[0027] The receiving area can in particular be tubular or cylindrical. The transport lock can be moved from the open state to the closed state and vice versa by linearly displacing the closure element relative to the support element. “Circumferential” in the present case means that the receiving area has a circumference, in particular a circular circumference, with a circumferential direction along which the receiving area is closed in the closed state and open in the open state. In the open state, the temperature control medium line can only partially be enclosed or encompassed by the transport lock. In the open state, the temperature control medium line can accordingly be removed from the receiving area. If the transport lock is in the closed state, the temperature control medium line can no longer be removed from the receiving area.In particular, the receiving area is provided on the inside with the previously mentioned wear protection layer.

[0028] According to a further embodiment, the support element has a receiving portion for receiving the temperature control medium line, wherein the closure element has a closure portion, and wherein the receiving portion and the closure portion circumferentially close the receiving area in the closed state.

[0029] The receiving section is formed on the aforementioned base section of the support element. The receiving section has a smaller cross-sectional area than the base section. The closing section is formed on the base section of the closing element. The closing section can be rod-shaped. The receiving section has an inner contour which faces the receiving area. The closing section also has an inner contour facing the receiving area. The inner contour of the receiving section and the inner contour of the closing section together completely encircle the receiving area when the transport lock is closed, so that the temperature control medium line is completely enclosed by the inner contours in the closed state. In the closed state, the closing section can bear against the receiving section in a contacting manner.

[0030] According to a further embodiment, the closure element has an encircling portion for encircling the temperature control medium line, wherein the support element has a closure portion, and wherein the encircling portion and the closure portion circumferentially close the receiving area in the closed state.

[0031] In this case, when the transport lock is open, the temperature control medium line is received in the encompassing section of the closure element and not in the receiving section of the support element. The encompassing section of the support element and the closure section of the support element preferably each have an inner contour facing the receiving area. In the closed state, the inner contour of the encompassing section and the inner contour of the closure section completely surround the receiving area.

[0032] According to a further embodiment, the receiving section or the gripping section is hook-shaped.

[0033] In this case, "hook-shaped" is understood in particular to mean that the receiving section or the encircling section can encompass the temperature control medium line to such an extent that it can only be removed from the receiving section or the encircling section in one direction. The receiving section or the encircling section encircles or encloses the temperature control medium line at least in sections, in particular with a circumferential angle of at least 180°.

[0034] According to a further embodiment, the transport lock has a locking element with the aid of which the closure element can be locked to the support element.

[0035] The locking element can be a screw. For example, a threaded hole is provided in the support element into which the locking element can be screwed. The closure element can have a slot-shaped opening through which the closure element is passed. When the transport lock is in the closed state, the locking element can be fixed so that the closure element is attached to the support element or clamped to it. The transport lock can therefore not be undesirably moved from the closed state to the open state. The locking element can be spring-loaded. For this purpose, a spring element can be provided through which the locking element is passed. The spring element prevents accidental release of the locking element, for example in the event of vibrations.

[0036] According to a further embodiment, the optical system has an engagement element attached to the temperature control medium line, wherein the transport lock is designed to engage positively in the engagement element or to encompass it positively.

[0037] The engagement element is preferably annular. The engagement element is firmly connected to the temperature control medium line. The engagement element is preferably integrally connected to the temperature control medium line. For example, the engagement element can be welded or soldered onto the temperature control medium line. It is also possible to glue the engagement element to the temperature control medium line. The engagement element is preferably attached to a smooth section or smooth region of the temperature control medium line, as mentioned above. The temperature control medium line can have multiple engagement elements. Each engagement element can be assigned a transport lock. The engagement element can also be clamped or jammed by the transport lock in the closed state, so that a force-fitting connection can be realized between the transport lock and the engagement element.The transport lock is connected indirectly to the temperature control medium line via the engagement element. "Indirectly" or "indirectly" means that the transport lock is connected to the engagement element, whereby the engagement element is in turn connected to the temperature control medium line. However, the transport lock can also be connected directly or indirectly to the temperature control medium line. In this case, the transport lock encompasses the temperature control medium line without the engagement element being arranged between the transport lock and the temperature control medium line. The engagement element is then dispensable. The engagement element can also have a spherical geometry, at least in sections. In particular, the engagement element has a spherical cap-shaped outer surface. In this case, a "spherical cap" is understood to mean a section of a sphere.The transport lock can have spherical cap-shaped inner surfaces corresponding to the spherical cap-shaped outer surface, which can abut against the spherical cap-shaped outer surface of the engagement element. Due to the spherical cap-shaped inner surfaces of the transport lock and the spherical cap-shaped outer surface of the engagement element, the transport lock can be tilted relative to the engagement element in its closed state. The engagement element is preferably also provided with a wear-resistant layer as mentioned above. Alternatively, either the transport lock or the engagement element can be provided with such a wear-resistant layer. Particularly preferably, only the engagement element has such a wear-resistant layer.

[0038] According to a further embodiment, the engagement element has an annular groove or an annular rib, wherein the transport lock and the annular groove or the transport lock and the annular rib are designed to engage with each other in a form-fitting manner.

[0039] If the engagement element has an annular groove, the receiving portion of the support element can engage positively in the annular groove. Alternatively, the encompassing portion of the locking element can engage in the annular groove. The annular groove can also be referred to as an annular groove. If the engagement element has an annular rib or annular rib, an annular groove corresponding to the annular rib can be provided on the receiving portion or on the encompassing portion. In this case, the annular rib engages positively in the groove provided on the receiving portion or on the encompassing portion, or vice versa.

[0040] According to a further embodiment, the optical system has an interface frame connectable to the support frame, wherein the transport lock is connected to the interface frame.

[0041] The interface frame and the transport lock can be part of a transport lock arrangement of the optical system. The engagement element can also be part of the transport lock arrangement. The transport lock arrangement can have any number of transport locks and / or engagement elements. The interface frame is preferably connected to a lower part of the support frame as mentioned above. However, the interface frame can also be connected to an upper part of the support frame as mentioned above. However, it is assumed below that the interface frame is connected to the lower part. The lower part has an opening through which the transport locks or the transport lock can be inserted from the outside.The transport lock can be removed again before operating the optical system to ensure continued decoupling between the support frame and the sensor frame and / or the optical element. The interface frame preferably has a frame-shaped base body with an opening. This opening is aligned with the opening in the lower part of the support frame. The interface frame can be screwed to the lower part of the support frame. The transport locks are guided through the opening in the interface frame and into the optical system.

[0042] According to a further embodiment, the transport lock has a retaining pin which is coupled to the interface frame.

[0043] The retaining pin is attached in particular to the support element of the transport lock. The retaining pin can have a circular cross-section. A retaining element, which in turn accommodates a retaining rod, is preferably mounted on the interface frame. The retaining rod can be linearly displaced and / or rotated relative to the retaining element. The retaining rod can be clamped using the retaining element. A clamping element, which can accommodate the retaining pin of the transport lock, is in turn mounted on the retaining rod. The retaining pin can be linearly displaced and / or rotated relative to the clamping element. Furthermore, the retaining pin can be rotated relative to the clamping element. This enables precise alignment of the transport lock by, on the one hand, the retaining rod can be linearly displaced and / or rotated relative to the retaining element and, on the other hand, the retaining pin can be linearly displaced and / or rotated relative to the clamping element.In addition, the retaining pin can have knurling, roughening, or any other contour shape. This can increase the coefficient of friction to achieve higher frictional forces. The retaining element, the retaining rod, and the clamping element are part of the aforementioned transport locking assembly. The transport locking assembly, the retaining element, the retaining rod, and the clamping element combine to create a tripod-like and adjustable structure. Each transport locking assembly is assigned a retaining element, a retaining rod, and a clamping element.

[0044] Furthermore, a projection exposure system with such an optical system is proposed.

[0045] The projection exposure system can be an EUV lithography system. EUV stands for "Extreme Ultraviolet" and refers to a working light wavelength between 0.1 nm and 30 nm. The projection exposure system can also be a DUV lithography system. DUV stands for "Deep Ultraviolet" and refers to a working light wavelength between 30 nm and 250 nm.

[0046] "One" in this case is not necessarily limited to a single element. Rather, multiple elements, such as two, three, or more, may also be included. Any other counting term used here should also not be understood as implying a limitation to the exact number of elements stated. Rather, numerical deviations upwards and downwards are possible, unless otherwise stated.

[0047] The embodiments and features described for the proposed optical system apply accordingly to the proposed projection exposure system and vice versa.

[0048] Further possible implementations of the invention also include combinations of features or embodiments described above or below with respect to the exemplary embodiments that are not explicitly mentioned. In this case, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

[0049] Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will be explained in more detail below using preferred embodiments with reference to the accompanying figures. Fig. 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography; Fig. 2 shows a schematic view of an embodiment of an optical system for the projection exposure apparatus according to Fig. 1; Fig. 3 shows a schematic perspective view of an embodiment of a transport lock for the optical system according to Fig. 2; Fig. 4 shows a further schematic perspective view of the transport lock according to Fig. 3; Fig. 5 shows a schematic perspective exploded view of the transport lock according to Fig. 3; Fig. 6 shows a schematic perspective view of an embodiment of an engagement element for the transport lock according to Fig. 3; Fig. 7 shows a schematic perspective exploded view of another embodiment of a transport lock for the optical system according to Fig. 2; Fig. 8 shows a schematic perspective view of an embodiment of an engagement element for the transport lock according to Fig. 7; Fig. 9 shows a schematic perspective exploded view of another embodiment of a transport lock for the optical system according to Fig. 2; Fig. 10 shows a schematic perspective exploded view of another embodiment of a transport lock for the optical system according to Fig. 2; Fig. 11 shows a schematic perspective view of an embodiment of an engagement element for the transport lock according to Fig. 10; Fig. 12 shows a schematic perspective detailed view of an embodiment of a support frame for the optical system according to Fig. 2; and Fig. 13 shows a further schematic perspective partial view of the support frame according to Fig. 12.

[0050] In the figures, identical or functionally equivalent elements are provided with the same reference numerals unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

[0051] Fig. 1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of an illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, an illumination optics 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the remaining illumination system 2. In this case, the illumination system 2 does not include the light source 3.

[0052] A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be displaced via a reticle displacement drive 9, in particular in a scanning direction.

[0053] In the Fig. For illustrative purposes, Figure 1 shows a Cartesian coordinate system with an x-direction x, a y-direction y, and a z-direction z. The x-direction x runs perpendicular to the plane of the drawing. The y-direction y runs horizontally, and the z-direction z runs vertically. The scanning direction runs in the Fig. 1 along the y-direction y. The z-direction z runs perpendicular to the object plane 6.

[0054] The projection exposure system 1 comprises a projection optics 10. The projection optics 10 serves to image the object field 5 into an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible.

[0055] A structure on the reticle 7 is imaged onto a light-sensitive layer of a wafer 13 arranged in the image plane 12 in the region of the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be displaced, in particular along the y-direction y, via a wafer displacement drive 15. The displacement of the reticle 7, on the one hand, via the reticle displacement drive 9, and the displacement of the wafer 13, on the other hand, via the wafer displacement drive 15, can be synchronized with each other.

[0056] The light source 3 is an EUV radiation source. The light source 3 emits, in particular, EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation 16 has, in particular, a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source. The light source 3 can be a free-electron laser (FEL).

[0057] The illumination radiation 16 emanating from the light source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and / or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 17 can be exposed to the illumination radiation 16 at grazing incidence (GI), i.e., at angles of incidence greater than 45°, or at normal incidence (NI), i.e., at angles of incidence less than 45°. The collector 17 can be structured and / or coated, on the one hand, to optimize its reflectivity for the useful radiation and, on the other hand, to suppress stray light.

[0058] After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4.

[0059] The illumination optics 4 comprises a deflecting mirror 19 and, downstream of this in the beam path, a first facet mirror 20. The deflecting mirror 19 can be a flat deflecting mirror or, alternatively, a mirror with a beam-influencing effect beyond the pure deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful light wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first facet mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugated to the object plane 6 as the field plane, it is also referred to as a field facet mirror. The first facet mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Of these first facets 21, Fig. 1 only some examples are shown.

[0060] The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or partially circular edge contour. The first facets 21 can be designed as flat facets or, alternatively, as convexly or concavely curved facets.

[0061] As is known, for example, from DE 10 2008 009 600 A1, the first facets 21 themselves can also be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can, in particular, be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1.

[0062] Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction y.

[0063] In the beam path of the illumination optics 4, a second facet mirror 22 is arranged downstream of the first facet mirror 20. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil facet mirror. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1 614 008 B1, and US Pat. No. 6,573,978.

[0064] The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

[0065] The second facets 23 can also be macroscopic facets, which can, for example, be round, rectangular, or hexagonal, or alternatively facets composed of micromirrors. Reference is also made to DE 10 2008 009 600 A1 in this regard.

[0066] The second facets 23 can have planar or alternatively convex or concave curved reflection surfaces.

[0067] The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a fly's-eye integrator.

[0068] It may be advantageous to arrange the second facet mirror 22 not exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second facet mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as described, for example, in DE 10 2017 220 586 A1.

[0069] With the help of the second facet mirror 22, the individual first facets 21 are imaged into the object field 5. The second facet mirror 22 is the last beam-forming mirror or actually the last mirror for the illumination radiation 16 in the beam path before the object field 5.

[0070] In a further embodiment of the illumination optics 4 (not shown), a transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5, which transmission optics contributes in particular to the imaging of the first facets 21 into the object field 5. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (GI mirrors, grazing incidence mirrors).

[0071] The illumination optics 4 has in the version shown in the Fig. 1, after the collector 17 there are exactly three mirrors, namely the deflection mirror 19, the first facet mirror 20 and the second facet mirror 22.

[0072] In a further embodiment of the illumination optics 4, the deflection mirror 19 can also be omitted, so that the illumination optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22.

[0073] The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optics into the object plane 6 is usually only an approximate imaging.

[0074] The projection optics 10 comprises a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

[0075] In the Fig. In the example shown in Figure 1, the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or a different number of mirrors M1 are also possible. The projection optics 10 is a doubly obscured optic. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75.

[0076] Reflection surfaces of the mirrors Mi can be designed as freeform surfaces without a rotational symmetry axis. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one rotational symmetry axis of the reflection surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

[0077] The projection optics 10 has a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

[0078] The projection optics 10 can, in particular, be anamorphic. It has, in particular, different magnifications Bx, By in the x and y directions x, y. The two magnifications Bx, By of the projection optics 10 are preferably (Bx, By) = (+ / - 0.25, + / - 0.125). A positive magnification B means an image without image inversion. A negative sign for the magnification B means an image with image inversion.

[0079] The projection optics 10 thus leads to a reduction in the ratio 4:1 in the x-direction x, i.e. in the direction perpendicular to the scanning direction.

[0080] The projection optics 10 leads to a reduction of 8:1 in the y-direction y, i.e. in the scanning direction.

[0081] Other magnifications are also possible. Magnifications with the same sign and absolutely identical in the x and y directions (x, y), for example, with absolute values ​​of 0.125 or 0.25, are also possible.

[0082] The number of intermediate image planes in the x- and y-directions x, y in the beam path between the object field 5 and the image field 11 can be the same or can be different, depending on the design of the projection optics 10. Examples of projection optics with different numbers of such intermediate images in the x- and y-directions x, y are known from US 2018 / 0074303 A1.

[0083] Each of the second facets 23 is assigned to exactly one of the first facets 21 to form a respective illumination channel for illuminating the object field 5. This can, in particular, result in illumination according to the Köhler principle. The far field is divided into a plurality of object fields 5 using the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to them.

[0084] The first facets 21 are each imaged onto the reticle 7 by an associated second facet 23, superimposed on one another, to illuminate the object field 5. The illumination of the object field 5 is, in particular, as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

[0085] By arranging the second facets 23, the illumination of the entrance pupil of the projection optics 10 can be geometrically defined. By selecting the illumination channels, in particular the subset of the second facets 23 that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil fill.

[0086] A likewise preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels.

[0087] Further aspects and details of the illumination of the object field 5 and in particular of the entrance pupil of the projection optics 10 are described below.

[0088] The projection optics 10 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

[0089] The entrance pupil of the projection optics 10 cannot usually be precisely illuminated with the second facet mirror 22. When imaging the projection optics 10, which telecentrically images the center of the second facet mirror 22 onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found in which the pairwise determined distance of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in spatial space. In particular, this surface exhibits a finite curvature.

[0090] The projection optics 10 may have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7. This optical element can be used to account for the different positions of the tangential entrance pupil and the sagittal entrance pupil.

[0091] In the Fig. In the arrangement of the components of the illumination optics 4 shown in Figure 1, the second facet mirror 22 is arranged in a surface conjugate to the entrance pupil of the projection optics 10. The first facet mirror 20 is arranged tilted relative to the object plane 6. The first facet mirror 20 is arranged tilted relative to an arrangement plane defined by the deflection mirror 19. The first facet mirror 20 is arranged tilted relative to an arrangement plane defined by the second facet mirror 22.

[0092] Fig. 2 shows a schematic view of an embodiment of an optical system 100 for the projection exposure apparatus 1.

[0093] The optical system 100 can be a projection optics unit 10 as previously explained or part of such a projection optics unit 10. Therefore, the optical system 100 can also be referred to as a projection optics unit. However, the optical system 100 can also be an illumination system 2 as previously explained or part of such an illumination system 2. Therefore, the optical system 100 can alternatively also be referred to as an illumination system.

[0094] However, it is assumed below that the optical system 100 is a projection optics 10 or part of such a projection optics 10. The optical system 100 is suitable for EUV lithography. However, the optical system 100 can also be suitable for DUV lithography.

[0095] The optical system 100 may comprise a plurality of optical elements 102, of which Fig. 2, however, only one is shown. Therefore, only one optical element 102 will be discussed below. The optical element 102 can be one of the mirrors M1 to M6. Accordingly, the optical element 102 is a mirror, in particular an EUV mirror. However, the optical element 102 can also be a lens.

[0096] In addition to the optical element 102, the optical system 100 has a support frame 104 (force frame) and a sensor frame 106 (sensor frame). The support frame 104 is coupled to a fixed world 110 by means of a coupling element 108. The coupling element 108 can comprise springs. Several such coupling elements 108 can be provided. A "fixed world" is understood here to be a region of the optical system 100 that is immovable with respect to the support frame 104. For example, the fixed world 110 can be a base frame of the optical system 100.

[0097] The sensor frame 106 is coupled to the support frame 104 by means of a coupling element 112. The coupling element 112 can comprise springs. Several such coupling elements 112 can be provided. The support frame 104 thus supports the sensor frame 106. In other words, the sensor frame 106 is not directly coupled to the fixed world 110, but indirectly or indirectly via the support frame 104.

[0098] The optical element 102 can be adjusted or aligned in six degrees of freedom using an actuator unit 114. This allows a change in the position of the optical element 102. For example, the optical element 102 can be moved from an actual position, in which the optical element 102 does not meet certain optical specifications, to a desired target position in which the optical element 102 meets the optical specifications. The sensor frame 106 serves as a reference for a change in the position of the optical element 102 as mentioned above.

[0099] The optical element 102 is connected to the support frame 104 via the actuator unit 114. The optical element 102 can be connected to the actuator unit 114 by means of a coupling element 116, which in turn is connected to the support frame 104 via a coupling element 118. The coupling elements 116, 118 can comprise springs. Any number of coupling elements 116, 118 can be provided.

[0100] With the help of a control and regulation unit 120, for example, a target position of the optical element 102 as mentioned above is maintained. For this purpose, the control and regulation unit 120 can communicate with the actuator unit 114, which aligns or adjusts the optical element 102 based on control signals from the control and regulation unit 120. The control and regulation unit 120 interacts with the sensor frame 106 in such a way that, for example, sensors attached to the sensor frame 106 measure the optical element 102, wherein the control and regulation unit 120 controls the actuator unit 114 based on sensor signals from these sensors in order to maintain the target position of the optical element 102.

[0101] During operation of the optical system 100, heat Q is introduced into the optical element 102 and / or the sensor frame 106. To dissipate this heat Q from the optical element 102 and / or the sensor frame 106, a temperature control device, in particular a cooling device, is provided. With the aid of this temperature control device, a temperature control medium M, for example, demineralized water, can be pumped through temperature control channels, in particular cooling channels, provided in the optical element 102 and / or the sensor frame 106.

[0102] The temperature control medium M is supplied to the optical element 102, for example, by means of a temperature control medium line 122, pumped through the optical element 102, and discharged from the optical element 102 again by means of a temperature control medium line 124. The temperature control medium lines 122, 124 are routed from the support frame 104 to the optical element 102. The temperature control medium lines 122, 124 are designed as corrugated pipes or hoses that are as long and as flexible as possible.

[0103] The temperature control medium M is supplied to the sensor frame 106 via a temperature control medium line 126 and removed from it via a temperature control medium line 128. The temperature control medium lines 126, 128 also run from the support frame 104 to the sensor frame 106. The temperature control medium lines 126, 128 are also designed as corrugated pipes or hoses that are as long and as flexible as possible. The temperature control medium lines 122, 124, 126, 128 together form a temperature control medium line assembly 130.

[0104] To ensure the best possible dynamic decoupling between the support frame 104 and the optical element 102 and / or the sensor frame 106 during operation of the optical system 100, it is necessary to design the temperature control medium lines 122, 124, 126, 128 as soft as possible. For this purpose, for example, the longest and softest possible corrugated pipes or corrugated hoses can be used for the temperature control medium lines 122, 124, 126, 128.

[0105] However, due to their softness and length, the temperature control medium lines 122, 124, 126, 128 can move and vibrate uncontrollably within the optical system 100 during transport. This can cause damage to the temperature control medium lines 122, 124, 126, 128 and / or surrounding components. In particular, the fatigue strength of the temperature control medium lines 122, 124, 126, 128 and the connections provided on the temperature control medium lines 122, 124, 126, 128 is problematic during transport of the optical system 100. For this reason, the temperature control medium lines 122, 124, 126, 128 can be protected from movement with removable transport locks 200A.

[0106] Fig. 3 shows a schematic perspective view of an embodiment of a transport lock 200A as mentioned above. Fig. 4 shows another schematic perspective view of the transport lock 200A. Fig. 5 shows a schematic perspective exploded view of the transport lock 200A. The following refers to the Fig. 3 to 5 are referred to simultaneously.

[0107] With the aid of the transport lock 200A, it is possible to grip around a respective temperature control medium line 122, 124, 126, 128 in order to secure the respective temperature control medium line 122, 124, 126, 128 against movement during transport of the optical system 100. The transport lock 200A is configured to grip around the respective temperature control medium line 122, 124, 126, 128 in a form-fitting and / or force-fitting manner. Several such transport locks 200A can be assigned to each temperature control medium line 122, 124, 126, 128.

[0108] A positive connection is created by the interlocking or interlocking of at least two connecting partners, in this case the respective transport lock 200A and the corresponding temperature control medium line 122, 124, 126, 128. A force-locking connection requires a normal force on the surfaces to be joined. Force-locking connections can be achieved through frictional engagement. Mutual displacement of the surfaces is prevented as long as the counterforce caused by static friction is not exceeded.

[0109] Only one transport lock is discussed below. The transport lock 200A comprises a support element 202. A closure element 204 is mounted on the support element 202 for linear displacement. The support element 202 and the closure element 204 are together configured to encompass or enclose the temperature control medium line 122, 124, 126, 128.

[0110] The support element 202 comprises a rod-shaped or block-shaped base section 206. In the orientation of the Fig. 3 to 5, a guide rail 208 is provided or formed on the top of the base section 206. The guide rail 208 can be a dovetail guide. A threaded hole 210 is machined into the base section 206. The threaded hole 210 can also extend through the guide rail 208.

[0111] In the orientation of the Fig. 3 to 5, a hook-shaped receiving section 212 is formed on the right side of the base section 206. The receiving section 212 can be used to grip the temperature control medium line 122, 124, 126, 128. The receiving section 212 has a curved, in particular circularly curved, inner contour 214.

[0112] The receiving section 212 encloses a receiving area 216 which is oriented in the direction of the Fig. 4 and Fig. 5 is open at the top. The receiving area 216 is delimited or defined by the inner contour 214. In other words, the receiving section 212 does not completely enclose the receiving area 216. The receiving area 216 is thus open circumferentially or along its circumference. The receiving area 216 can thus accommodate the temperature control medium line 122, 124, 126, 128 or be laid around it.

[0113] A retaining pin 218, which may have a circular cross-section, is also attached to the base section 206. Using the retaining pin 218, the transport lock 200A can be attached to any supporting structure. The retaining pin 218 is part of the supporting element 202.

[0114] Now returning to the closure element 204, this has a rod-shaped base section 220. In the orientation of the Fig. 3 to 5, an engagement portion 222 is formed on the underside of the base portion 220. The engagement portion 222 is configured to positively engage or engage with the guide rail 208, so that the closure element 204 is mounted on the support element 202 for linear displacement along the guide rail 208.

[0115] In the orientation of the Fig. 3 to 5, a closure section 224 is molded onto the right side of the base section 220. With the aid of the closure section 224, the receiving area 216 can be closed circumferentially, so that the receiving section 212 and the closure section 224 together completely enclose the receiving area 216. The closure section 224 can have an arcuate, in particular circular, curved inner contour 226. The inner contour 226 and the inner contour 214 of the receiving section 212 together completely enclose the receiving area 216 circumferentially.

[0116] The base section 220 is penetrated by a slot-shaped opening 228. A locking element 230 is passed through the opening 228. The locking element 230 can be a screw that is screwed into the threaded bore 210. A washer 232 can be associated with the locking element 230.

[0117] The 200A transport lock also includes a Fig. 6 shows the engagement element 234A in detail. The engagement element 234A is permanently connected to the temperature control medium line 122, 124, 126, 128. Several engagement elements 234A can be assigned to each temperature control medium line 122, 124, 126, 128. In particular, the engagement element 234A is permanently connected to a smooth section of the temperature control medium line 122, 124, 126, 128, which is designed as a corrugated hose or corrugated pipe. In particular, the engagement element 234A is welded or soldered to the temperature control medium line 122, 124, 126, 128.

[0118] The engagement element 234A is annular. The engagement element 234A comprises a base body 236 with a central opening 238. The temperature control medium line 122, 124, 126, 128 is passed through the opening 238. The transport lock 200A is configured to engage positively in the engagement element 234A. For this purpose, the engagement element 234A has an annular groove or annular groove 240 into which the transport lock 200A can engage positively. The groove 240 is geometrically adapted to the inner contours 214, 226. The groove 240 is delimited laterally by two side walls 242, 244 of the base body 236.

[0119] Now returning to the Fig. 3 and Fig. 4 the transport lock 200A can be removed from the Fig. 4 shown open state Z1, in which the receiving area 216 is opened circumferentially, into a Fig. 3, in which the closure element 204, in particular the closure section 224, circumferentially closes the receiving area 216. To move the transport lock from the open state Z1 to the closed state Z2 and vice versa, the closure element 204 is displaced linearly along the guide rail 208 relative to the support element 202.

[0120] In the open state Z1, the engagement element 234A can be removed radially or laterally from the receiving area 216. In the closed state Z2, the receiving section 212 of the support element 202 and the closure section 224 of the closure element 204 enclose or encompass the engagement element 234A, so that it is positively connected to the transport lock 200A. In the closed state Z2, the closure section 224 can bear against the receiving section 212.

[0121] To secure the temperature control medium line 122, 124, 126, 128 against movement during transport of the optical system 100, the transport lock 200A is first moved to the open state Z1. The receiving section 212 is placed around the engagement element 234A, with the receiving section 212 positively engaging the groove 240 of the engagement element 234A. The transport lock 200A is then moved from the open state Z1 to the closed state Z2.

[0122] As previously mentioned, the transport lock 200A is moved from the open state Z1 to the closed state Z2 by linearly displacing the closure element 204 along the guide rail 208 relative to the support element 202 until the receiving area 216 is circumferentially closed. The closure element 204 can be linearly displaced along the guide rail 208 relative to the support element 202 until the closure section 224 contacts the receiving section 212.

[0123] Due to the arcuate inner contour 226 of the closure portion 224, the engagement element 234A can be pressed into the receiving area 216 when the transport lock 200A is moved from the open state Z1 to the closed state Z2. This enables a play-free mounting of the engagement element 234A and thus also of the temperature control medium line 122, 124, 126, 128.

[0124] When the transport lock 200A is in the closed state Z2, the closure element 204 can be secured against unwanted displacement relative to the support element 202 by means of the locking element 230. The transport lock 200A cannot then be accidentally moved from the closed state Z2 back to the open state Z1, for example due to vibrations.

[0125] Fig. 7 shows a schematic perspective exploded view of another embodiment of a transport lock 200B as previously explained. Fig. Figure 8 shows a schematic perspective view of another embodiment of an engagement element 234B. Reference is made to the Fig. 7 and Fig. 8 simultaneously referred to.

[0126] The transport lock 200B is essentially identical in design and functionality to the transport lock 200A. Therefore, only the differences between the two versions of the transport lock 200A and 200B will be discussed below.

[0127] Like the transport lock 200A, the transport lock 200B comprises a support element 202 and a closure element 204. Unlike the transport lock 200A, the transport lock 200B comprises a receiving portion 212 with a groove-shaped geometry. For this purpose, the receiving portion 212 has an annular groove or annular groove 246. Likewise, the closure portion 224 of the closure element 204 has part of an annular groove or part of an annular groove 248.

[0128] The transport lock 200B is assigned the engagement element 234B. The engagement element 234B has a base body 250 with a central opening 252 through which the temperature control medium line 122, 124, 126, 128 is passed. An annular rib 254 is attached centrally to the base body 250 and extends completely around the base body 250. The rib 254 can positively engage the grooves 246, 248 of the receiving section 212 and the closure section 224. The transport lock 200B can be moved from an open state Z1 (not shown) to a closed state Z2 (not shown) and vice versa, as previously explained with reference to the transport lock 200A.

[0129] Fig. 9 shows a schematic perspective exploded view of another embodiment of a transport lock 200C.

[0130] The 200C transport lock is essentially identical in design and functionality to the 200A transport lock. Therefore, only the differences between the two versions of the 200A and 200C transport lock will be discussed below.

[0131] As with the transport lock 200A, the transport lock 200C includes a support element 202 and a closure element 204. In this case, the closure element 204 has a gripping section 256 on its base section 220, which is configured to positively grip one of the previously explained engagement elements 234A, 234B. The gripping section 256 is hook-shaped. The gripping section 256 has an inner contour 258 that is at least partially annular. The inner contour 258 is curved in an arcuate manner, in particular with a circular base. The inner contour 258 encloses a receiving area 216, as previously mentioned, for receiving the engagement element 234A, 234B. The receiving area 216 is circumferentially open or opened so that the gripping section 256 can be placed around the engagement element 234A, 234B.

[0132] A rod-shaped closure section 260 is formed on the base section 206 of the support element 202, with the aid of which the receiving area 216 can be completely closed or enclosed circumferentially. The closure section 260 has an arcuate, in particular circular, curved inner contour 262. The inner contours 258, 262 completely enclose the receiving area 216 in a closed state Z2 of the transport lock 200C, as previously mentioned. The transport lock 200C can be moved from an open state Z1 (not shown) to the aforementioned closed state Z2 (not shown) and vice versa, as previously explained with reference to the transport lock 200A.

[0133] A plate-shaped bearing section 264 with an opening 266 is attached to the base section 206. A holding element 268 is mounted on the holding pin 218. The holding element 268 has an opening 270 for the holding pin 218 and an opening 272 for a locking element 274. The locking element 274 is guided through a spring element 276 for spring preloading the locking element 274. The locking element 274 can be a screw that can be guided through the opening 266 and through the opening 272 and screwed into a threaded hole provided on the end face of the base section 220 of the closure element 204.

[0134] To protect the temperature control medium line 122, 124, 126, 128 from movement during transport of the optical system 100, the encircling section 256 first engages the engagement element 234A. Subsequently, the transport lock 200C is moved from the open state Z1 to the closed state Z2. For this purpose, the locking element 274 is screwed into the closure element 204. The closure element 274 then presses the inner contours 258, 262 against the engagement element 234A, 234B. The engagement element 234A, 234B can be pressed between the inner contours 258, 262, thereby achieving a play-free hold of the engagement element 234A, 234B. With the help of the spring element 276, a spring preload of the locking element 274 can be achieved so that it cannot come loose, for example, even in the event of vibrations.

[0135] Fig. 10 shows a schematic perspective exploded view of another embodiment of a transport lock 200D as previously explained. Fig. 11 shows a schematic perspective view of another embodiment of an engagement element 234C. Reference is made below to the Fig. 10 and Fig. 11 simultaneously referred to.

[0136] The transport lock 200D is essentially identical in design and functionality to the transport lock 200A. Therefore, only the differences between the two versions of the transport lock 200A and 200D will be discussed below.

[0137] Like the transport lock 200A, the transport lock 200D comprises a support element 202 and a closure element 204. In contrast to the transport lock 200A, the transport lock 200D comprises a receiving section 212 with a spherical cap-shaped geometry, at least in sections. For this purpose, the receiving section 212 has a spherical cap-shaped inner surface 278. In the present case, a "spherical cap" is understood to mean a section of a sphere. Likewise, the closure section 224 of the closure element 204 also has a spherical cap-shaped inner surface 280. This means that the closure section 224 is also spherical cap-shaped, at least in sections. Accordingly, the receiving area 216 is spherical cap-shaped, at least in sections.

[0138] The transport lock 200D is assigned the engagement element 234C. The engagement element 234C has a base body 282 that is at least partially spherical and has a central opening 284 through which the temperature control medium line 122, 124, 126, 128 passes. On the outside, the base body 282 has a spherical cap-shaped outer surface 286. The transport lock 200D can - as previously explained with reference to the transport lock 200A - be moved from an open state Z1 (not shown) to a closed state Z2 (not shown) and vice versa. In the closed state Z2, the inner surfaces 278, 280 of the transport lock 200D rest against the outer surface 286 of the engagement element 234C. Due to the spherically curved inner surfaces 278, 280 and the spherically curved outer surface 286, the transport lock 200D can be tilted relative to the engagement element 234C in the closed state Z2.

[0139] Fig. 12 shows a schematic perspective detailed view of the support frame 104. Fig. 13 shows a further schematic perspective detailed view of the support frame 104. In the following, reference is made to the Fig. 10 and Fig. 11 simultaneously referred to.

[0140] In the Fig. 12 and Fig. 13, only a lower shell or a lower part 132 of the support frame 104 is shown. In addition to the lower part 132, the support frame 104 has an upper shell or an upper part, which in the Fig. 12 and Fig. 13, however, is not shown. An opening 134 is provided in the lower part 132. The temperature control medium lines 122, 124, 126, 128 are arranged in the lower part 132. The opening 134 penetrates the lower part 132, so that the temperature control medium lines 122, 124, 126, 128 are accessible from the surroundings of the optical system 100. The opening 134 can be closed using a cover (not shown).

[0141] An interface frame 288 can be mounted on the support frame 104 for transporting the optical system 100. With the interface frame 288, several transport locks 200A can be mounted in the Fig. 12 are only shown in sections. The same applies to the transport locks 200B, 200C, and 200D.

[0142] The interface frame 288 is frame-shaped and extends around the opening 134. The interface frame 288 can be screwed to the lower part 132. The interface frame 288 has a frame-shaped base body 290 with an opening 292. The transport locks 200A are passed through the opening 292. The transport locks 200A are coupled to the interface frame 288 by means of their retaining pins 218.

[0143] To couple the transport locks 200A to the interface frame 288, several retaining elements 294, 296, 298 are mounted on the interface frame 288. The retaining elements 294, 296, 298 can be screwed to the interface frame 288. The retaining elements 294, 296, 298 hold the retaining rods 300, 302, 304. The retaining rods 300, 302, 304 are clamped by the retaining elements 294, 296, 298.

[0144] The support rods 300, 302, 304 can be moved or displaced along the support elements 294, 296, 298, so that the support rods 300, 302, 304 can be pushed further beyond the opening 292 or pulled out of it, as shown in the Fig. 13 is indicated by a double arrow 306 on the holding rod 300. Furthermore, the holding rods 300, 302, 304 can also be rotated relative to the holding elements 294, 296, 298, as shown in the Fig. 13 is indicated by the support rod 300 with a double arrow 308

[0145] The support rods 300, 302, 304 are connected to the support pins 218 of the transport locks 200A by means of clamping elements 310, 312, 314. The support pins 218 are linearly displaceable and rotatable relative to the clamping elements 310, 312, 314, as shown in the Fig. 12 is indicated by double arrows 316, 318.

[0146] The transport locks 200A can thus be positioned by displacing and / or rotating the holding rods 300, 302, 304 relative to the holding elements 294, 296, 298 and by displacing and / or rotating the holding pins 218 of the transport locks 200A relative to the clamping elements 310, 312, 314.

[0147] The transport locks 200A, the interface frame 288, the holding elements 294, 296, 298, the holding rods 300, 302, 304, and the clamping elements 310, 312, 314 form a transport lock assembly 320 for securing the temperature control medium line assembly 130 during transport of the optical system 100. Before transporting the optical system 100, the transport lock assembly 320 is mounted on the support frame 104 and removed after transport is complete. Preferably, however, the transport lock assembly 320 always remains with the optical system 100. However, this is not mandatory.

[0148] Although the present invention has been described using exemplary embodiments, it can be modified in many ways. LIST OF REFERENCE SYMBOLS 1 projection exposure system 2 Lighting system 3 Light source 4 Lighting optics 5 Object field 6 Object level 7 reticles 8 reticle holders 9 Reticle displacement drive 10 Projection optics 11 Image field 12 Image plane 13 wafers 14 wafer holders 15 Wafer relocation drive 16 Illumination radiation 17 Collector 18 Intermediate focal plane 19 Deflecting mirrors 20 first facet mirror 21 first facet 22 second facet mirror 23 second facet 100 optical system 102 optical element 104 supporting frames 106 sensor frames 108 coupling element 110 solid world 112 coupling element 114 Actuator unit 116 coupling element 118 coupling element 120 Control and regulation device 122 Tempering medium line 124 Tempering medium line 126 Tempering medium line 128 Tempering medium line 130 Temperature control medium line assembly 132 lower part 134 Breakthrough 200A transport lock 200B transport lock 200C transport lock 200D transport lock 202 supporting element 204 locking element 206 Base Section 208 guide rail 210 threaded hole 212 Recording section 214 inner contour 216 Recording area 218 retaining pin 220 base section 222 intervention section 224 closure section 226 inner contour 228 Breakthrough 230 locking element 232 washer 234A engagement element 234B engagement element 234C engagement element 236 basic bodies 238 Breakthrough 240 groove 242 side wall 244 side wall 246 groove 248 groove 250 basic bodies 252 Breakthrough 254 Rib 256 gripping section 258 inner contour 260 closure section 262 inner contour 264 storage section 266 Breakthrough 268 Holding element 270 Breakthrough 272 Breakthrough 274 locking element 276 spring element 278 interior surface 280 interior area 282 basic bodies 284 Breakthrough 286 exterior area 288 interface frames 290 basic bodies 292 Breakthrough 294 Holding element 296 Holding element 298 Holding element 300 holding rod 302 Holding rod 304 Holding rod 306 Double Arrow 308 Double Arrow 310 clamping element 312 clamping element 314 clamping element 316 Double Arrow 318 Double Arrow 320 Transport securing arrangement M Tempering medium M1 mirror M2 mirror M3 mirror M4 mirror M5 mirror M6 mirror Q Heat x x-direction y y-direction z z-direction Z1 condition Z2 condition QUOTES CONTAINED IN THE DESCRIPTION

[0000] This list of documents submitted by the applicant was generated automatically and is included solely for the convenience of the reader. This list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions. Cited patent literature

[0000] DE 10 2008 009 600 A1 [0061, 0065] US 2006 / 0132747 A1

[0063] EP 1 614 008 B1

[0063] US 6,573,978

[0063] DE 10 2017 220 586 A1

[0068] US 2018 / 0074303 A1

[0082]

Claims

[1] Optical system (100) for a projection exposure system (1), comprising a supporting frame (104), an optical element (102), wherein the support frame (104) supports the optical element (102), a sensor frame (106), wherein the support frame (104) supports the sensor frame (106), a temperature control medium line (122, 124, 126, 128) for guiding a temperature control medium (M) from the support frame (104) to the sensor frame (106) and / or to the optical element (102), and a removable transport lock (200A, 200B, 200C, 200D) configured to engage around the temperature control medium line (122, 124, 126, 128) in order to secure the temperature control medium line (122, 124, 126, 128) against movement during transport of the optical system (100). [2] Optical system according to claim 1, wherein the transport lock (200A, 200B, 200C, 200D) surrounds the temperature control medium line (122, 124, 126, 128) in a form-fitting and / or force-fitting manner. [3] Optical system according to claim 1 or 2, wherein the transport lock (200A, 200B, 200C, 200D) comprises a support element (202) and a closure element (204), and wherein the support element (202) and the closure element (204) are together configured to encompass the temperature control medium line (122, 124, 126, 128). [4] Optical system according to claim 3, wherein the shutter element (204) is mounted linearly displaceably on the support element (202). [5] Optical system according to claim 3 or 4, wherein the support element (202) has a guide rail (208), and wherein the closure element (204) engages positively in the guide rail (208). [6] Optical system according to one of claims 3-5, wherein the transport lock (200A, 200B, 200C, 200D) has a receiving area (216) for receiving the temperature control medium line (122, 124, 126, 128), and wherein the transport lock (200A, 200B, 200C, 200D) can be moved from an open state (Z1), in which the receiving area (216) is circumferentially open, into a closed state (Z2), in which the receiving area (216) is circumferentially closed, and vice versa. [7] Optical system according to claim 6, wherein the support element (202) has a receiving portion (212) for receiving the temperature control medium line (122, 124, 126, 128), wherein the closure element (204) has a closure portion (224), and wherein the receiving portion (212) and the closure portion (224) in the closed state (Z2) circumferentially close the receiving area (216). [8] Optical system according to claim 6, wherein the closure element (204) has an encompassing portion (256) for encompassing the temperature control medium line (122, 124, 126, 128), wherein the support element (202) has a closure portion (260), and wherein the encompassing portion (256) and the closure portion (260) circumferentially close the receiving area (216) in the closed state (Z2). [9] Optical system according to claim 7 or 8, wherein the receiving portion (212) or the gripping portion (256) is hook-shaped. [10] Optical system according to one of claims 3-9, wherein the transport lock (200A, 200B, 200C, 200D) has a locking element (230, 274) with the aid of which the closure element (204) can be locked to the support element (202). [11] Optical system according to one of claims 1-10, comprising an engagement element (234A, 234B, 234C) attached to the temperature control medium line (122, 124, 126, 128), wherein the transport lock (200A, 200B, 200C, 200D) is designed to engage positively in the engagement element (234A, 234B, 234C) or to encompass it positively. [12] The optical system according to claim 11, wherein the engagement element (234A, 234B) comprises an annular groove (240) or an annular rib (254), and wherein the transport lock (200A, 200C) and the annular groove (240) or the transport lock (200B) and the annular rib (254) are adapted to engage with each other in a positive-locking manner. [13] Optical system according to any one of claims 1-12, comprising an interface frame (288) connectable to the support frame (104), wherein the transport lock (200A, 200B, 200C, 200D) is connected to the interface frame (288). [14] The optical system of claim 13, wherein the transport lock (200A, 200B, 200C, 200D) comprises a retaining pin (218) coupled to the interface frame (288). [15] Projection exposure apparatus (1) with an optical system (100) according to one of claims 1-14.

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