Achromatic imaging optics

Abstract

An achromatic imaging optic (20) is used to image an output field (16a) along a beam path (23) of the imaging optic (20) into a target field (14) for use in DUV microlithography. The imaging optic (20) has a plurality of lenses (L1 to L13), each containing less than 5% lead oxide. At least one of the lenses (L5, L7, L9) is made of a high-dispersion optical material with an Abbe number less than 50. At least one of the lenses (L1 to L4, L6, L8, L10 to L13) is made of a low-dispersion optical material with an Abbe number greater than 50. This results in an imaging optic with simplified manufacturing. Depending on the design, the imaging optics can be part of an optical system of a projection exposure system as an illumination lens (20) or as a projection lens.

Description

[0001] The invention relates to an achromatic imaging optic for imaging an output field along a beam path of the imaging optic into a target field, for use in DUV microlithography.

[0002] An imaging optic of the type mentioned above is known from DE 196 53 983 A1, US 5,982,558, US 7,551,361 B2, DE 101 13 612 A1 and WO 2009 / 095 052 A1.

[0003] It is an object of the present invention to further develop an imaging optic of the type mentioned at the outset in such a way that the manufacture of the imaging optic is simplified.

[0004] This problem is solved according to the invention by an imaging optic with the features specified in claim 1.

[0005] According to the invention, it was discovered that when using only lenses made of a material with a low lead oxide content, virtually no hazardous lead dust is produced during polishing or grinding of the lenses. Lens material with a lead oxide content of less than 5% is hereinafter also referred to as lead-free material. Accordingly, the safety measures required in the manufacture of lenses for achromatic imaging optics are reduced. The lenses of the achromatic imaging optics can have a lead oxide content of less than 1%. This content can also be zero. At least one lens of the achromatic imaging optics can be made of lead-free flint glass. Examples of such lead-free flint glass are N-SF6, N-SF66, N-F2, and N-BaSF64.

[0006] The usable wavelength of achromatic imaging optics can lie in the range between 360 nm and 370 nm. In particular, the i-line of a mercury vapor light source at approximately 365.5 nm can be used here.

[0007] The achromatic imaging optics can have more than ten lenses, for example, 13, 14, or 15 lenses. The achromatic imaging optics can have more than 20 lenses, for example, 24 or 25 lenses. The achromatic imaging optics can have at least one aspherical surface, for example, three, four, or six aspherical surfaces.

[0008] Lead-free fluoro-crown glass as a low-dispersion material according to claim 2 has proven effective in practice. A lens made of low-dispersion material can be configured as a converging lens, for example, as a plano-convex lens or as a biconvex lens. The achromatic imaging optic can comprise at least five lenses or at least ten lenses, for example, ten to twelve lenses, made of the low-dispersion material. N-FK5 can be used as the low-dispersion material.

[0009] To perform achromatization of the optics, in addition to a lens made of a low dispersion material, at least one further lens made of a high dispersion material can be used.

[0010] At least one lens made of heavy crown glass as a high-dispersion material and / or at least one lens made of short flint glass as a high-dispersion material according to claim 3 has proven suitable as a replacement for a lead-containing high-dispersion material. The lens made of high-dispersion material can be configured as a diverging lens, for example as a plano-concave lens, a biconcave lens, or a concave-convex lens. The achromatic imaging optics can comprise at least two lenses made of the high-dispersion material, for example, three to four lenses made of the high-dispersion material. N-SSK20 or N-KZFS11 from Schott AG can be used as the high-dispersion material.

[0011] The number of lenses made from a low dispersion material can exceed the number of lenses made from a high dispersion material.

[0012] At least one lens made of a crystalline glass according to claim 4 can lead to transmission advantages of achromatic imaging optics. Alternatively or additionally to a crystalline glass lens, at least one quartz glass lens can be used. Such a lens can be used as a low-dispersion optical lens. Lenses made of crystalline glass and / or quartz glass can serve as a complete replacement for lenses made of fluorocrown glass as a low-dispersion material. Alternatively or additionally, such a lens can also be made of a crystalline material, for example, CaF₂.

[0013] An achromatic imaging optic made of exactly two optical materials according to claim 5 simplifies manufacturing. For example, the material combinations fluorine crown glass as a low-dispersion material and heavy crown glass as a high-dispersion material, each with a lead oxide content of less than 5%, or the material combination quartz glass as a low-dispersion material and heavy crown glass as a high-dispersion material, each with a lead oxide content of less than 5%, can be used.

[0014] In an embodiment of the achromatic imaging optic as an illumination lens according to claim 6, the advantages of low-lead or lead-free lenses are particularly evident. Such an illumination lens can be used as a REMA (Reticle Masking) lens. The output field is then a field limited by a REMA aperture.

[0015] In an embodiment of the illumination objective with a collimating lens group and an achromatic lens group according to claim 7, the achromatic lens group can comprise several alternating lens pairs made of low-dispersion and high-dispersion material. The achromatic imaging optics can include an aperture diaphragm in the beam path downstream of the achromatic lens group. In the beam path between the achromatic lens group and the target field, the achromatic imaging optics can include a target field lens group. The target field lens group is also referred to as a field lens group.

[0016] The advantages of a low-lead / lead-free lens material design are particularly evident when the achromatic imaging optic is implemented as a projection lens according to claim 8.

[0017] In an embodiment with two field lens groups and an intermediate beam waist according to claim 9, all lenses made of the high-dispersion material can be located in the target field lens group. Depending on the embodiment of the achromatic imaging optics, at most two lenses made of the high-dispersion material can be located in the output field lens group. The achromatic imaging optics can include at least one converging lens made of the high-dispersion material. The achromatic imaging optics can also include several converging lenses made of the high-dispersion material.

[0018] The achromatic imaging optics can have a lens group with negative refractive power near the output field, followed by a lens group with positive refractive power in the region of a first beam path expansion, also known as the antinodes. This can be followed by another lens group with negative refractive power in the region of the beam waist, and then by a lens group with positive refractive power in the region of a further beam path expansion (second antinodes). An aperture stop of the imaging optics can be positioned between this lens group and the subsequent target field lens group, which can have positive refractive power.

[0019] An embodiment of the achromatic imaging optics according to claim 10 leads to a particularly good chromatic correction.

[0020] At least one quartz glass lens according to claim 11 leads to cost advantages.

[0021] The achromatic imaging lens, designed as a projection lens, can be made exclusively from lenses of a crystalline material (quartz, fluorite) and / or from lead-free glass, e.g., N-FK5. Such a projection lens can have N lenses. Let i be one-quarter of this number of lenses N (i = 0.25 N) and j = three-quarters of this number of lenses N (j = 0.75 N), then at least one lens L1 to Li can be made of a highly dispersed material, in particular as a converging lens. Another of the lenses Lj to LN can also be made of a highly dispersed material.

[0022] The advantages of an optical system according to claim 12, a projection exposure system according to claim 13, a manufacturing method according to claim 14, and a structured component according to claim 15 correspond to those already explained above with reference to achromatic imaging optics. The illumination lens of the optical system according to claim 12 can be a REMA lens. The light source of the projection exposure system can be a mercury vapor lamp, an excimer laser, or an LED light source.

[0023] A structured component, in particular a microchip, for example a memory chip, can be manufactured.

[0024] Exemplary embodiments of the invention are explained in more detail below with reference to the drawing. This drawing shows: Fig.1 schematically in meridional section optical main groups of a projection exposure system for microlithography; Fig. 2 a meridional section through an achromatic imaging optic for imaging an output field along a beam path of the imaging optic in the form of an intermediate field into a target field in the form of an object field of the projection exposure system, for use as an illumination lens of an optical system in which the output field is a field that is imaged into an object field of a subsequently arranged projection optic, for use in DUV microlithography; Fig. 3 in one to Fig. 2. Similar illustrations show another version of the imaging optics with an additional folding mirror; Fig. 4 to 6 in each of Fig. 2 similar representations further versions of an imaging optic, which, instead of the imaging optic according to the Fig. 2 or Fig.3 can be used; Fig. 7 also schematically in a meridional section another embodiment of an achromatic imaging optic for imaging an output field along a beam path of the imaging optic into a target field, again for use in DUV microlithography, designed as a projection lens, in which the output field is an object field in which an object to be imaged can be arranged, and in which the target field is an image field in which a substrate can be arranged; Fig. 8 to 10 in each of a Fig. 8 similar representations of further versions of a projection lens, which replace the projection lens according to Fig. 7 can be used; Fig. 11 an optical system comprising the imaging optics according to Fig. 3 and the projection lens after Fig. 7, wherein the target field of the imaging optics according to Fig.3 simultaneously the output field of the projection lens to Fig. 7 represents; Fig. 12 in one to Fig. 2. Similar representation: another version of the imaging optics, which replaces the imaging optics according to the Fig. 2 to 6 can be used; and Fig. 13 in one of the Fig. Figures 7 to 10 show a similar representation of another version of a projection lens, which replaces the projection lens according to the Fig. 7 to 10 can be used.

[0025] A projection exposure system 1 is, with regard to its main optical groups, schematically represented in the Fig.Figure 1 shows the meridional section. This schematic representation depicts the main optical groups as refractive optical elements. The main optical groups can equally well be configured as diffractive or reflective components, or as combinations or subcombinations of refractive / diffractive / reflective assemblies of optical elements.

[0026] To facilitate the representation of spatial relationships, an xyz coordinate system is used below. In the Fig. 1. The x-axis runs perpendicular to the plane of the drawing and into it. The y-axis runs in the Fig. 1 upwards. The z-axis runs in the Fig. 1 to the right and parallel to an optical axis 2 of the projection exposure system 1. This optical axis 2 may also be folded once or several times.

[0027] The projection exposure system 1 has a light or radiation source 3 that generates useful light in the form of an illumination or imaging beam 4. The useful light 4 has a wavelength in the deep ultraviolet (DUV) range, for example, in the range between 100 nm and 200 nm, or in the ultraviolet (UV) range between 200 nm and 400 nm. Alternatively, the useful light 4 can also have a wavelength in the extreme ultraviolet (EUV) range, in particular between 5 nm and 30 nm. Example wavelengths of the radiation source 3 are 365 nm, 248 nm, and 193 nm. Depending on the radiation source 3 used, the useful wavelength spectrum is narrowband, but can also be broadband, for example, when using a mercury discharge lamp. The useful light 4 is subsequently also referred to as illumination light or imaging light.

[0028] A lighting optic 5 of the projection exposure system 1 directs the useful light 4 from the radiation source 3 to an object plane 6 of the projection exposure system 1. An object to be imaged by the projection exposure system 1, in the form of a reticle 7, is arranged in the object plane 6. The reticle 7 is in the Fig. 1 is shown with a dashed line. Reticule 7 is supported by a holding device (not shown) that allows for controlled scan displacement or stepwise displacement.

[0029] The first main optical group of the lighting optics 5 comprises a pupil-shaping optic 8. This serves to generate a defined intensity distribution of the useful light 4 in a downstream pupil plane 9. The pupil-shaping optic 8 also serves as an adjustment device for specifying various lighting settings. Such adjustment devices, which, for example, have adjustable optical components or interchangeable apertures, are known to those skilled in the art. The pupil-shaping optic 8 projects the radiation source 3 into a plurality of secondary light sources in the pupil plane 9. The pupil-shaping optic 8 can also have a field-shaping function. Faceted elements, honeycomb elements, and / or diffractive optical elements can be used in the pupil-shaping optic 8.The pupil plane 9 is optically conjugate to another pupil plane 10 of a projection lens 11 of the projection exposure system 1. The projection lens 11 is positioned between the object plane 6 and an image plane 12 of the illumination optics 5. A wafer 13 is arranged in the image plane 12 and in the . Fig. 1 is shown with a dashed line. The wafer 13 is supported by a holding device (not shown) that allows for controlled scan displacement or stepwise displacement. An object field 14 in the object plane 6 is mapped by the projection lens 11 onto an image field 14a in the image plane 12.

[0030] Downstream of the pupillary plane 9, which is arranged behind the pupil-forming optics 8, is a field lens group 15 as a further main optical group of the illumination optics 5. Downstream of the field lens group 15 is an intermediate image plane 16, which is conjugate to the object plane 6. The field lens group 15 therefore represents a condenser group.

[0031] In the intermediate image plane 16 lies a field stop 17 for defining the edge boundary of an intermediate field in the intermediate image plane 16, which is mapped onto the object field 14 in the object plane 6. The field stop 17 is also referred to as a REMA field stop (Reticle Masking System for delimiting the illuminated part of the reticle 7).

[0032] The intermediate image plane 16, in particular the REMA field diaphragm 17, is imaged onto the object plane 6 by an achromatic imaging optic in the form of a lens group 18, also referred to as a REMA lens group or REMA lens. The lens group 18 represents another main optical group of the illumination optics 5. The lens group 18 is a chromatically corrected imaging optic as part of the illumination optics 5.

[0033] Between field planes 16 and 6 lies another pupil plane 19.

[0034] Fig. Figure 2 shows in meridional section a version of an imaging optic 20, which can be used as a REMA lens instead of the lens group 18 in the projection exposure system 1.

[0035] The illumination optics 20 serve to image the intermediate field, adapted to the downstream projection optics 11, in the form of an illumination conditioning field 16a in the intermediate image plane 16, defined by the aperture 17, into the object field 14 of the downstream projection optics 11. The distance between the field plane 16 and the object plane 6 is 1200 mm for the imaging optics 20.

[0036] Object field 14 has xy dimensions of 104×52 mm 2 The object field 14 has a distortion-corrected diameter of approximately 120 mm, along, for example, a diagonal of the object field 14. This distortion-corrected diameter of the object field 14 is greater than 10 mm, greater than 25 mm, greater than 50 mm, and greater than 100 mm. This distortion-corrected diameter is regularly less than 300 mm.

[0037] The image is shown in the Fig.2 The path of a principal ray 21 and of peripheral, pupil-limited rays 22, originating from two spaced-apart field points, is shown. This illustrates the imaging ray path 23 of the illumination light 4.

[0038] The imaging optics 20 are telecentric on the object side.

[0039] The imaging optics 20 has a total of thirteen lenses L1 to L13 in the imaging beam path 23 between the illumination conditioning field 16a and the object field 14, which are numbered in the order of their application in the imaging beam path 23.

[0040] All lenses L1 to L13 of the imaging optics 20 are made of a material with a lead oxide content of less than 5% by weight.

[0041] Lens L1 is a concave-convex lens. Lens L2 is a biconvex lens. Lens L3 has an aspherical entrance surface and a convex exit surface.

[0042] Lenses L1 to L3 form a collimator lens group of the illumination optics 20 near the conditioning field 16a. The lenses of this collimator lens group of the illumination optics 20 are made of the same lens material, namely a low-dispersion optical material with an Abbe number v. d , which is greater than 55. In the example shown, the low-dispersion material is a fluorine crown glass. This could be the optical glass material N-FK5. The Abbe number is given for the respective material in the range of standard wavelengths of the visible spectrum. N-FK5 has an Abbe number of 70.4 here.

[0043] Lenses L4, L6, L8 and L10 are each designed as biconvex lenses.

[0044] Lenses L5, L7 and L9 are designed as biconcave lenses.

[0045] Lenses L4 to L10 form a pupil-proximal achromatic lens group of the illumination optics 20 near the pupil plane 19. In this pupil-proximal lens group, lenses L4, L6, L8, and L10, again each made of the low-dispersion material, alternate with lenses L5, L7, and L9. These lenses L5, L7, and L9 are made of a high-dispersion optical material with an Abbe number v. d manufactured, which is smaller than 55. A heavy crown glass is used as the higher dispersion material. In the execution of the Fig. In section 2, the optical glass used for the higher dispersion material is N-SSK20. N-SSK20 has an Abbe number of 50.2 at standard wavelengths of the visible spectrum.

[0046] The lenses L1 to L13 of the imaging optics 20 are made of exactly two optical materials, namely the high dispersion optical material N-SSK20 and the low dispersion optical material N-FK5.

[0047] The pupil-near achromatic lens group with lenses L4 to L10 serves to correct a chromatic longitudinal aberration of the image of the intermediate field 16a into the object field 14 by means of a close sequence of achromatic lens pairs, each consisting of a converging lens (L4, L6, L8, L10) and a diverging lens (L5, L7, L9).

[0048] A pupillary diaphragm AS is arranged downstream of the lens L10 in the imaging beam path 23.

[0049] Downstream of aperture AS is lens L11, which is designed as a concave-convex lens. One entrance surface of lens L11 is aspherical.

[0050] The L11 lens is made of low dispersion material.

[0051] The last two lenses L12 and L13 in the imaging beam path 23 of the imaging optics 20 form a field lens group of the illumination optics 20 near the object field 14. The lenses L12 and L13 are made of the low dispersion material.

[0052] A graduated filter F of the illumination optics 20 is positioned downstream of lens L13 in front of the object field 14. The graduated filter F is a static neutral density filter with an absorbing layer. The graduated filter F ensures intensity homogenization of the illumination of the object field 14. The substrate material of the graduated filter F is quartz glass with increased UV transmission, which is subsequently also referred to as SILUV.

[0053] The illumination optics 20 are designed for the illumination light 4 with a wavelength of 365.5 nm.

[0054] The image-side numerical aperture of the imaging optics 20 is 0.15.

[0055] The illumination optics 20 are dioptrically designed, meaning they have no mirrors with a beam-shaping effect. In the illustrated embodiment, the illumination optics 20 also lacks a planar deflecting mirror. Space for such a planar deflecting mirror exists between lenses L11 and L12, so that in a further embodiment of the illumination optics 20, which is shown in the Fig. As shown in Figure 3, a folding of the imaging beam path 23 can be carried out with such a flat deflecting mirror US.

[0056] Exactly three lenses of the imaging optics 20, namely lenses L5, L7 and L9, are made of the optical high dispersion material.

[0057] The imaging optics project the ReMa field diaphragm 17 onto the reticle 7. The imaging optics 20 are configured such that the edges of the ReMa field diaphragm 17 in the object plane are transformed into spots with a diameter of approximately 300 µm.

[0058] The magnification scale of the imaging optics 20 between the intermediate field 16a and the object field 14 is four times greater.

[0059] The imaging optics 20 are almost telecentric on the image side. The lenses L12 and L13 serve to shape a field-point-wise exit pupil position of the imaging optics 20 against the background of a slight deviation from exact telecentricity.

[0060] The pupil forming quality of the imaging optics 20 is such that an (exit) pupil of the imaging optics 20 is adapted to an (entrance) pupil of the subsequent projection objective 11 with a maximum angular deviation that is less than 1 mrad at each field point.

[0061] An exit surface of lens L12 and an exit surface of lens L13 are each designed as aspherical surfaces.

[0062] The following refractive index table tabulates refractive index values ​​of the optical materials involved N-FK5, N-SSK20 and SILUV at a central useful wavelength of the illumination light 4 (column 2) and at a slightly larger and a slightly smaller wavelength (columns 3 and 4). MATERIAL INDEX1 INDEX2 INDEX3 wavelength 365,50 366,50 364,50 N-FK5 1,503934 1,504701 1,503200 N-SSK20 1,656980 1,658518 1,655515 SILUV 1,474477 1,475222 1,473764

[0063] The following tables show design data for the imaging optics 20 according to the Fig. 2. Apart from the position of a deflecting mirror US, which is not apparent from these tables, these tables also describe the design data of the imaging optics 20 according to the Fig. 3.

[0064] Table 1 shows, in the first column, the numbered optical surfaces of the imaging optics 20. The first surface listed, “0”, is the intermediate image plane 16 with the intermediate field 16a. This is followed by surface “1”, an entrance surface of lens L1, surface “2”, an exit surface of lens L1, and so on. The four aspherical surfaces of the imaging optics 20 are surfaces 5, 22, 25, and 27.

[0065] Surfaces 28 and 29 are the entry and exit surfaces of the gradient filter F. Surface 30 is the top surface of the reticle. Image plane 32 lies on the bottom surface of the reticle.

[0066] Column 2 of Table 1 specifies the radius of curvature of the respective optical surface. This radius value is given in mm.

[0067] Column 3 of Table 1 describes the distance between each optical surface and the next optical surface, given in mm.

[0068] Column 4 of Table 1 indicates the respective material that follows the respective surface.

[0069] The last column of Table 1 lists the optically used radius of the respective optical surface.

[0070] Table 2 shows the aspheric coefficients for the four aspheric surfaces 5, 22, 25 and 27 according to the following aspheric formula: p(h)=[((1 / r)h2) / (1+SQRT(1−(1+K)(1 / r)2h2))]+C1⋅h4+C2⋅h6+… Table 1 for Fig. 2 / 3 SURFACE RADIUS THICKNESS MATERIAL HALF-KNIFE 0 0,000000 46,953522 1 -38,197425 51,352263 N-FK5 34,2 2 -67,649443 0,978966 63,5 3 508,773978 50,618276 N-FK5 98,6 4 -182,038558 0,991412 101,6 5 1392,123685 30,601412 N-FK5 105,0 6 -250,414825 0,998351 106,6 7 193,262985 55,591880 N-FK5 106,6 8 -407,902918 5,342144 104,5 9 -357,886830 10,000000 N-SSK20 102,4 10 171,679232 5,225905 94,6 11 180,938113 56,126842 N-FK5 95,4 12 -243,396803 3,741925 94,5 13 -238,594867 10,000000 N-SSK20 93,0 14 199,601716 10,997955 91,1 15 260,919592 53,153074 N-FK5 93,0 16 -180,511829 0,994193 93,6 17 -229,670645 10,000000 N-SSK20 91,7 18 397,255486 0,998494 93,4 19 277,682666 51,453410 N-FK5 94,9 20 -194,426351 4,996990 95,2 21 0,000000 137,923506 87,1 22 -307,730636 9,997084 N-FK5 75,0 23 -426,869750 426,291882 76,4 24 1888,244085 40,000868 N-FK5 95,1 25 -159,838725 0,999940 95,2 26 175,351924 30,007783 N-FK5 81,2 27 110,312465 29,672259 68,2 28 0,000000 4,000000 N-FK5 67,6 29 0,000000 55,750000 67,3 30 0,000000 6,250000 SILUV 59,7 31 0,000000 0,000000 59,2 32 0,000000 0,000000 59,2 Table 2 for Fig. 2 / 3 SURFACE 5 22 25 27 K 0 0 0 0 C1 -5,298067E-08 -7,641810E-08 -2,937847E-09 1,146288E-07 C2 6,396446E-15 -3,549736E-12 1,033221E-11 2,521181E-12 C3 -4,281763E-17 2,390058E-17 -7,546220E-16 -2,441638E-15 C4 -4,990864E-22 -3,497264E-20 2,363513E-20 2,479517E-19

[0071] Lenses L1 to L13 are rotationally symmetric about the optical axis 2.

[0072] Four of the thirteen lenses are designed as aspherical lenses. In each of these four aspherical lenses, only one of the two optical surfaces is aspherical, while the other of the two optical surfaces of the respective lens is spherical. The imaging optics 20 have no intermediate image plane.

[0073] The point image quality of the imaging optics 20 can be achieved with a spot diameter that is smaller than 300 µm.

[0074] To determine the point image quality, a generated point image is measured via the energy distribution of an imaging light sub-bundle emanating from the corresponding object point. The diameter of the point image is defined by the fact that 99.9% of the measured luminous flux of the imaging light sub-bundle lies within a point image circle with the diameter corresponding to the respective point image quality, in this case, within a circle with a diameter smaller than 300 µm. The center point of each circle is the point where a principal beam, emanating from the associated object point at the reference wavelength (in this case, 365.5 nm), passes through the image plane 12.

[0075] Based on the Fig.Section 4 below describes a further embodiment of an achromatic imaging optic 24, which can again be used as a REMA lens in the projection exposure system 1 instead of the imaging optic 20. Components and functions that correspond to those described above with reference to the Fig. 1 to 3 and in particular with reference to the Fig. Items 2, which have already been explained, bear in particular the same reference numbers and will not be discussed again in detail.

[0076] The imaging optic 24 differs from the imaging optic 20 mainly in the design of the target field lens group with lenses L12 and L13. In the imaging optic 24, lens L12 is designed as a convex-concave lens and lens L13 as a concave-convex lens.

[0077] Tables 1 and 2 below show design data for the imaging optics 24 according to Fig.4. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 4 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 48,941391 1 -36,863143 43,940458 N-FK5 34,2 2 -62,649971 0,981941 59,8 3 -641,820214 37,552945 N-FK5 84,2 4 -129,286940 0,990420 89,3 5 484,741718 43,238346 N-FK5 105,3 6 -272,464997 0,997653 106,6 7 197,519564 54,116977 N-FK5 105,7 8 -404,320780 5,191262 103,6 9 -358,413480 10,000000 N-SSK20 101,5 10 168,906400 7,397874 93,5 11 191,368767 50,816066 N-FK5 94,3 12 -280,526799 10,253461 93,6 13 -202,003184 10,000000 N-SSK20 92,4 14 243,855277 12,888359 94,3 15 323,445906 55,800674 N-FK5 97,9 16 -175,182735 0,997435 99,2 17 -234,349550 10,000000 N-SSK20 97,5 18 514,518697 0,997815 101,1 19 325,631994 55,139863 N-FK5 103,5 20 -204,977665 4,998357 104,1 21 0,000000 131,176086 97,3 22 -1142,877683 12,615052 N-FK5 90,2 23 -431,430733 436,407041 90,7 24 171,601480 30,002992 N-FK5 75,8 25 110,638576 34,700208 69,4 26 -314,373115 24,883404 N-FK5 69,6 27 -106,476532 0,992079 70,7 28 0,000000 4,000000 N-FK5 67,6 29 0,000000 55,750000 67,2 30 0,000000 6,250000 SILUV 59,7 31 0,000000 0,000000 59,2 32 0,000000 0,000000 59,2 Table 2 for Fig. 4 SURFACE 3 22 25 27 K 0 0 0 0 C1 -6,067611E-08 -3,941679E-08 -3,225614E-08 1,308736E-07 C2 2,374574E-12 -1,439700E-12 3,062477E-13 2,095823E-12 C3 -2,602936E-16 5,517579E-17 -1,658560E-15 4,529342E-16 C4 1,040371E-20 -8,915029E-21 2,748475E-20 1,180502E-19

[0078] Based on the Fig. Section 5 below describes a further embodiment of an achromatic imaging optic 25, which can again be used as a REMA lens in the projection exposure system 1 instead of the imaging optic 20. Components and functions that correspond to those described above with reference to the Fig. 1 to 3 and in particular with reference to the Fig. Items 2, which have already been explained, bear in particular the same reference numbers and will not be discussed again in detail.

[0079] The imaging optics 25 has a total of fourteen lenses, L1 to L14. Each target field lens group in the imaging optics 25 comprises three lenses: L12, L13, and L14. These are all made of low-dispersion optical material. Lens L12 is a convex-concave lens. Lens L13 is a biconcave lens. Lens L14 is a biconvex lens.

[0080] In the imaging optic 25, the target field lens group contains exactly one aspherical surface. Compared to the target field lens groups of the imaging optics 20 and 24, the imaging optic 25 therefore saves one aspherical surface.

[0081] The exit surface of lens L14 is designed as an aspherical surface in the imaging optics 25.

[0082] Tables 1 and 2 below show design data for the imaging optics 25 according to Fig.5. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 5 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 48,832869 1 -36,965574 45,376706 N-FK5 34,2 2 -62,595135 0,983069 60,0 3 -1221,543034 36,346220 N-FK5 84,9 4 -137,969334 0,991974 90,0 5 686,684630 43,775178 N-FK5 104,9 6 -233,371818 0,998326 106,6 7 207,895993 54,832673 N-FK5 106,6 8 -361,020829 3,182026 104,7 9 -365,446982 10,000000 N-SSK20 102,6 10 171,631010 8,415859 94,7 11 201,464386 54,484260 N-FK5 95,5 12 -229,698392 3,669315 94,9 13 -226,264597 10,000000 N-SSK20 93,5 14 216,261051 8,809590 92,9 15 283,133535 53,143238 N-FK5 94,3 16 -180,235468 0,995448 95,1 17 -242,305277 10,000000 N-SSK20 93,2 18 406,721070 0,997732 95,2 19 259,710883 52,876640 N-FK5 97,4 20 -210,322999 4,997335 97,6 21 0,000000 142,639405 90,3 22 -255,715977 9,999325 N-FK5 79,2 23 -316,713841 348,241334 80,8 24 137,876295 37,599227 N-FK5 93,5 25 467,985061 77,580631 90,8 26 -366,702797 6,999645 N-FK5 72,3 27 119,466028 26,639047 68,0 28 1119,215956 31,616928 N-FK5 69,3 29 -121,591361 0,995752 70,2 30 0,000000 4,000000 N-FK5 67,5 31 0,000000 55,750000 67,1 32 0,000000 6,250000 SILUV 59,7 33 0,000000 0,000000 59,2 34 0,000000 0,000000 59,2 Table 2 for Fig. 5 SURFACE 3 22 29 K 0 0 0 C1 -8,285138E-08 -5,464803E-08 1,080790E-07 C2 2,448010E-12 -2,528913E-12 2,356719E-12 C3 -2,622925E-16 5,345513E-17 -3,197082E-16 C4 2,618718E-21 -2,076384E-20 4,414035E-20

[0083] Based on the Fig. Section 6 below describes a further embodiment of an achromatic imaging optic 26, which can again be used as a REMA lens in the projection exposure system 1 instead of the imaging optic 20. Components and functions that correspond to those described above with reference to the Fig. 1 to 4 and in particular with reference to the Fig. Items 2, which have already been explained, bear in particular the same reference numbers and will not be discussed again in detail.

[0084] The imaging optics 26 has a total of fifteen lenses L1 to L15. Following the achromatic lens group with lenses L4 to L10, which corresponds in its basic arrangement to that of the imaging optics 20, 24, and 25 discussed above, the imaging optics 26 has, in the imaging beam path 23 after the aperture plane AS, a pair of lenses L11 and L12, which are arranged directly downstream of the aperture plane. Lens L11 is a biconvex lens with an aspherical exit surface. Lens L12 is a biconcave lens. Lens L11 is made of a low-dispersion material. Lens L12 is made of a high-dispersion material.

[0085] A target field lens group with subsequent lenses L13, L14 and L15 corresponds in its basic structure to the target field lens group of the imaging optics 25.

[0086] Synthetic quartz glass (SILUV) is used as the low-dispersion optical material in the imaging optics 26 for all low-dispersion lenses, i.e. lenses L1 to L4, L6, L8, L10, L11 and L13 to L15.

[0087] Alternatively or additionally to quartz glass, a crystalline glass can also be used as a lens material, especially as a low-dispersion lens. CaF2 is an example of such a crystalline glass.

[0088] The imaging optics 26 has exactly four lenses made of high dispersion material, in this case made of material N-SSK20.

[0089] The imaging optics 26 in turn have four aspherical surfaces. These are the entrance surface of lens L3, the exit surface of lens L11, the entrance surface of lens L14 and the exit surface of lens L15.

[0090] Tables 1 and 2 below show design data for the imaging optics 26 according to Fig.6. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 6 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 48,670473 1 -37,138337 47,532033 SILUV 34, 2 2 -63,979500 0,993060 61,2 3 541,522489 54,765406 SILUV 96,9 4 -156,863259 0,997210 100,0 5 -2916,845944 24,480210 SILUV 102,4 6 -209,186479 0,998060 104,9 7 295,273633 55,361916 SILUV 110,1 8 -260,276265 3,443355 109,5 9 -259,255510 10,000000 N-SSK20 108,1 10 252,288135 8,405403 107,8 11 311,216013 62,423669 SILUV 109,2 12 -201,497933 0,997766 110,1 13 -391,763740 10,000000 N-SSK20 106,6 14 254,418956 4,801920 106,8 15 259,064782 64,497063 SILUV 108,7 16 -209,388775 0,998422 109,3 17 -873,402212 10,000000 N-SSK20 103,8 18 220,652834 16,038939 100,7 19 236,504014 59,351529 SILUV 104,2 20 -226,489599 0,998783 104,0 21 0,000000 0,998816 96,1 22 148,584402 63,025824 SILUV 91,4 23 -540,198100 4,742823 82,8 24 -846,708479 15,001509 N-SSK20 79,3 25 104,403579 386,179834 67,5 26 149,921220 51,289704 SILUV 96,9 27 -772,972828 67,772839 94,8 28 -100,825616 10,000000 SILUV 74,0 29 139,890161 14,196570 69,3 30 302,045035 36,054952 SILUV 69,9 31 -106,811388 0,997748 70,0 32 0,000000 4,000000 N-FK5 67,5 33 0,000000 55,750000 67,1 34 0,000000 6,250000 SILUV 59,7 35 0,000000 0,000000 59,2 36 0,000000 0,000000 59,2 Table 2 for Fig. 6 SURFACE 5 23 28 31 K 0 0 0 0 C1 -8,732294E-08 4,086695E-08 3,380926E-07 2,587157E-07 C2 -1,071901E-12 -1,644293E-12 1,200523E-11 1,736673E-11 C3 -2,115663E-17 3,100633E-17 -1,994458E-15 -1,399890E-15 C4 -6,430343E-21 2,468035E-21 2,147637E-19 2,909126E-19

[0091] Based on the Fig. Section 7 below describes a projection optic 27 which can be used in place of the projection optic 11 in the projection exposure system 1. Components and functions that correspond to those described above with reference to the Fig. Items 1 to 6, which have already been explained, bear the same reference numbers and will not be discussed again in detail.

[0092] The imaging optics 27 have a magnification reduction of a factor of 4 between the object field 14 and the image field 14a. The image-side numerical aperture of the imaging optics 27 is 0.65.

[0093] The imaging optics 27 are approximately telecentric on the object side.

[0094] The imaging errors of the imaging optics 27 are corrected up to a Strehl value of over 99%.

[0095] The imaging optics 27 has a total of 25 lenses L1 to L25. Four of these lenses, namely lenses L11, L13, L17 and L20, are made of high-dispersion optical material, in this example N-SSK20. The other lenses of the imaging optics 27 are made of low-dispersion optical material, in this case again N-FK5.

[0096] All lenses L1 to L25 of the imaging optics 27 are made of a material with a lead oxide content of less than 5%.

[0097] Lenses L1 to L10 form an output field lens group in the imaging beam path 23 after the object field 14. The further lenses L11 to L25 form a target field lens group of the imaging optics 27 in the imaging beam path 23 after the output field lens group.

[0098] Between the output field lens group with lenses L1 to L10 and the target field lens group with lenses L11 to L25, namely in the illustrated embodiment in the region of lens L10, lies a beam waist of the imaging beam path 23.

[0099] The lenses L11, L13, L17 and L20 made from the higher dispersion material are all in the target field lens group.

[0100] All four lenses L11, L13, L17 and L20 are designed as optically diverging lenses, namely as biconcave lenses.

[0101] Chromatic correction in the imaging optic 27 therefore takes place exclusively in the target field lens group.

[0102] Tables 1 and 2 below show design data for the imaging optics 27 according to Fig. 7. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. SURFACE RADIUS THICKNESS MATERIAL HALF-KNIFE 0 0,000000 32,999058 1 198,647120 28,640900 N-FK5 67,1 2 -327,139722 0,999585 67,1 3 -2721,561066 10,000000 N-FK5 66,3 4 99,286599 45,622111 64,2 5 -106,204325 9,999426 N-FK5 65,0 6 1079,821588 21,042277 78,1 7 -696,636895 33,971006 N-FK5 86,9 8 -157,147387 0,999452 91,5 9 1393,034965 40,439347 N-FK5 103,7 10 -223,435820 0,999292 105,7 11 320,084920 35,646854 N-FK5 107,5 12 -808,469051 0,999381 106,6 13 181,887092 37,574587 N-FK5 98,7 14 2963,029850 0,999686 95,2 15 176,163385 48,807562 N-FK5 84,0 16 166,779901 10,722824 62,5 17 334,410128 10,000000 N-FK5 60,0 18 84,261242 22,914540 50,4 19 -385,097533 10,000000 N-FK5 49,1 20 153,419028 26,828266 45,3 21 -70,379652 10,000000 N-SSK20 44, 7 22 195,390210 5,040826 52,2 23 253,885208 42,092676 N-FK5 55,2 24 -78,361868 4,852179 58,3 25 -76,438919 10,000000 N-SSK20 58,2 26 587,096598 3,923770 74,6 27 642,736093 38,653566 N-FK5 78,6 28 -157,383279 0,997713 83,3 29 357,497632 43,850803 N-FK5 98,3 30 -257,058165 0,999599 99,6 31 513,476580 43,854905 N-FK5 99,5 32 -204,609980 5,795668 98,8 33 -194,897946 10,000000 N-SSK20 97,1 34 249,735002 3,173976 98,2 35 226,547448 54,325977 N-FK5 99,6 36 -226,693117 -18,408732 100,3 Table 1 for Fig. 7 37 0,000000 19,407872 99,6 38 192,507258 53,453281 N-FK5 100,9 39 -337,327052 7,298059 99,1 40 -268,298361 10,000000 N-SSK20 97,1 41 182,736831 3,637680 92,1 42 184,149217 40,780120 N-FK5 93,1 43 -782,834549 25,026108 92,7 44 185,715441 33,091833 N-FK5 85,9 45 -2227,752200 0,999789 83,2 46 90,902898 52,933681 N-FK5 68,7 47 94,096928 10,311745 47,1 48 159,498406 10,019642 N-FK5 44,5 49 69,027059 4,377544 37,0 50 53,688020 20,105443 N-FK5 34,2 51 199,572280 4,211103 28,5 52 0,000000 3,000000 SILUV 26,7 53 0,000000 12,000000 25,2 54 0,000000 0,000000 14,8 Table 2 for Fig. 7 SURFACE 4 19 32 35 51 K 0 0 0 0 0 C1 -2,194898E-07 1,380671E-07 1,448269E-08 -2,501775E-08 3,110888E-07 C2 -3,631391E-12 9,125991E-12 -1,168188E-13 2,115805E-13 -9,266991E-11 C3 -3,015272E-16 5,351189E-16 2,131127E-17 2,479150E-17 1,352441E-13 C4 -6,349319E-20 1,929682E-18 -2,816567E-21 -2,329544E-21 -2,427441E-16 C5 6,278384E-24 -6,437076E-22 1,779840E-25 1,380897E-25 2,263059E-19 C6 -1,001458E-27 1,593738E-25 -5,385531E-30 -3,665357E-30 -7,930542E-23

[0103] Based on the Fig. Section 8 below describes a projection optic 28 which can be used in place of the projection optic 11 in the projection exposure system 1. Components and functions that correspond to those described above with reference to the Fig. Items 1 to 7, which have already been explained, bear the same reference numbers and will not be discussed again in detail.

[0104] The imaging optics 28 has a total of 24 lenses L1 to L24.

[0105] Lenses L1, L10, L12, L16, and L19 are made of high-dispersion material, in this case N-SSK20. The other lenses, L2 to L9, L11, L13 to L15, L17, L18, and L20 to L24, are made of low-dispersion material.

[0106] Lenses L2, L3, L8, L9, and L23, i.e., lenses in the regions of fields 14 and 14a, as well as in the region of the beam waist between the output field lens group and the target field lens group, are made of fused silica (SILUV). The other lenses of the imaging optics 28, made of low-dispersion material, are made of fluorocrown glass, in this case, N-FK5. This has the advantage that the use of a low-dispersion material with a higher refractive index (in this case, N-FK5) in converging lenses and a low-dispersion material with a lower refractive index (fused silica, SILUV) in the diverging lenses of the beam waist has a favorable effect on the correction of the Petzval sum. This facilitates the correction of image aberrations.

[0107] In the imaging optics 28, one of the lenses made of the high-dispersion material is arranged in the output field lens group. This facilitates the correction of chromatic magnification differences. Lens L1 made of the high-dispersion material is a biconvex lens, while the other lenses L10, L12, L16, and L19, which are part of the target field lens group, are biconcave lenses. In the imaging optics 28, lenses L1 to L9 form the output field lens group, and lenses L10 to L24 form the target field lens group.

[0108] The last lens, L24, in the imaging optics 28 is also made of quartz glass. This is advantageous in order to prevent aberrations caused by the high radiation load in lenses with a small beam cross-section, for example through light absorption and heating of the lenses.

[0109] Three of the lenses of the imaging optics 28 are designed as aspherics, each of which in turn has exactly one aspheric surface. These can be an exit surface of lens L4, an entrance surface of lens L8, an exit surface of lens L15, an entrance surface of lens L17, and an exit surface of lens L24.

[0110] Tables 1 and 2 below show design data for the imaging optics 28 according to Fig. 8. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 8 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 32,999875 1 278,389712 29,549330 N-SSK20 66,4 2 -221,760555 2,346649 66,5 3 -256,466178 10,000000 SILUV 65,7 4 109,428896 39,910761 64,0 5 -120,512384 9,999414 SILUV 64,7 6 676,049806 35,160880 74,9 7 -1151,247282 36,656689 N-FK5 90,6 8 -162,567379 0,999376 94,4 9 514,117653 39,621723 N-FK5 104,3 10 -301,685610 0,999186 105,2 11 169,749760 44,083318 N-FK5 101,7 12 -18228,477322 0,999415 98,9 13 129,542443 37,688384 N-FK5 84,5 14 857,395921 8,103457 78,8 15 -5870,700022 10,000000 SILUV 75,0 16 77,900277 46,587267 56,7 17 -307,973053 10,000000 SILUV 50,6 18 144,704264 28,586008 46,6 19 -71,626446 10,000000 N-SSK20 46,0 20 214,217744 4,059544 54,2 21 240,468951 44,077853 N-FK5 57,3 22 -80,701240 5,267639 60,4 23 -77,957974 10,000000 N-SSK20 60,2 24 649,733594 3,904778 77,3 25 705,453602 40,472937 N-FK5 81,4 26 -156,571003 0,998569 86,0 27 565,289015 39,914934 N-FK5 99,5 28 -253,778766 0,999216 101,3 29 513,187614 47,341480 N-FK5 102,8 30 -197,069646 3,523863 102,4 31 -205,364354 10,000000 N-SSK20 100,9 32 273,865198 1,014836 102,4 33 225,258696 57,201239 N-FK5 103,8 34 -236,217986 -19,223044 104,5 35 0,000000 20,222308 103,7 36 199,126365 52,922043 N-FK5 103,9 37 -388,002376 9,488119 102,0 38 -270,950853 10,000000 N-SSK20 100,0 39 192,997224 4,792547 95,3 40 202,410348 40,319833 N-FK5 96,3 41 -777,320764 21,567902 96,0 42 228,467044 36,688008 N-FK5 90,9 43 -507,055419 0,999579 88,8 44 90,797487 51,303820 N-FK5 69,8 45 94,235516 12,398155 48,6 46 208,884713 9,999783 SILUV 45,8 47 71,218665 6,550672 37,7 48 54,545814 20,094670 SILUV 34,0 49 246,113699 3,818469 28,4 50 0,000000 3,000000 SILUV 26,6 51 0,000000 12,000000 25,1 52 0,000000 0,000000 14,8 Table 2 for Fig. 8 SURFACE 4 17 30 33 49 K 0 0 0 0 0 C1 -2,027713E-07 1,448000E-07 1,471421E-08 -2,450307E-08 3,270842E-07 C2 -1,645820E-12 9,423301E-12 4,273497E-14 2,020231E-13 -9,489497E-11 C3 -2,594504E-16 3,377347E-16 1,424446E-17 1,411299E-17 1,478971E-13 C4 -3,058416E-20 1,567768E-18 -1,440183E-21 -1,255110E-21 -2,565032E-16 C5 3,785403E-24 -4,782126E-22 9,659558E-26 7,359378E-26 2,378585E-19 C6 -4,053218E-28 1,082756E-25 -2,286901E-30 -1,927727E-30 -8,442328E-23

[0111] Based on the Fig.Section 9 below describes a projection optic 29 which can be used in place of the projection optic 11 in the projection exposure system 1. Components and functions that correspond to those described above with reference to the Fig. Items 1 to 8, which have already been explained, bear the same reference numbers and will not be discussed again in detail.

[0112] The imaging optics 29 has a total of 25 lenses L1 to L25.

[0113] The lenses L1, L4, L10, L12, L16, L19, L22 and L25 of the imaging optics 29 are made of high-dispersion optical material, namely N-SSK20. The other lenses of the imaging optics 29 are made of low-dispersion optical material.

[0114] The imaging optics 29, in addition to chromatic correction of longitudinal and transverse aberrations, also has a higher-order chromatic aberration correction. Here, chromatic correction refers to a variation in field curvature and astigmatism, i.e., a corresponding Petzval sum.

[0115] The correction of the chromatic variation of the Petzval sum is achieved by reducing the sum of the individual refractive powers of the lenses made of the higher dispersion material. This is accomplished by adding lenses with positive refractive power at low marginal ray heights, i.e., in the region immediately behind the object (L1, L4) and immediately in front of the image (L22, L25).

[0116] At the location of the high-dispersion lenses L1, L4, L22, and L25, a marginal ray of the imaging beam path 23 has only a small height, so that these high-dispersion lenses L1, L4, L22, and L25 cause only a small longitudinal chromatic aberration. The marginal ray is the ray that runs from the center of the object field 14 to the edge of the aperture diaphragm AS. The height of the marginal ray is its distance from the optical axis 2, which is also in the Fig. The number 9 is shown with a dashed line. The height of the marginal ray is a measure of the expected longitudinal chromatic aberration.

[0117] The imaging optics 29 has a total of five aspheric surfaces, namely an exit surface of lens L2, an entrance surface of lens L9, an exit surface of lens L15, an entrance surface L17 and an entrance surface of lens L24.

[0118] Tables 1 and 2 below show design data for the imaging optics 29 according to Fig.9. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 9 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 37,205493 1 -503,093897 18,844840 N-SSK20 64,9 2 -176,069926 2,354674 66,5 3 -199,690422 10,000000 SILUV 66,5 4 234,595612 37,258490 69,9 5 -112,031943 9,998799 SILUV 70,9 6 666,119841 9,170006 88,0 7 3352,301029 42,213859 N-SSK20 91,9 8 -164,128971 0,998543 95,9 9 358,338932 41,821137 N-FK5 106,9 10 -378,535495 0,998395 107,3 11 205,870638 38,016909 N-FK5 103,1 12 -14815,514585 0,998647 100,6 13 134,052289 37,629894 N-FK5 87,4 14 710,575749 25,640278 82,0 15 -1123,916368 10,000000 SILUV 66,2 16 70,863110 31,980582 51,0 17 -177,695268 10,000000 SILUV 50,1 18 205,094704 55,865859 48,3 19 -67,837182 10,000000 N-SSK20 48,1 20 1071,163007 0,998965 59,4 21 302,594638 45,626476 N-FK5 64,0 22 -92,956496 4,543360 67,3 23 -91,867675 10,000000 N-SSK20 67,3 24 1014,206549 0,994217 83,9 25 585,805772 41,831606 N-FK5 87,5 26 -178,539292 0,997506 91,6 27 737,921049 39,627873 N-FK5 102,2 28 -250,163389 0,998283 103,7 29 384,790346 50,001457 N-FK5 104,0 30 -198,130505 4,118353 103,1 31 -211,846813 10,000000 N-SSK20 101,3 32 255,265026 0,995133 101,2 33 212,843178 49,179731 N-FK5 102,5 34 -355,183471 -2,925111 102,8 35 0,000000 3,923539 101,4 36 173,396985 59,174048 N-FK5 103,9 37 -361,923888 6,382352 101,9 38 -300,913755 10,000000 N-SSK20 99,8 39 165,888584 3,145513 93,0 40 165,374857 43,058179 N-FK5 94,1 41 -1195,992063 19,613099 93,4 42 173,195121 46,882625 N-FK5 86,4 43 2472,428284 0,999567 79,3 44 103,130056 39,529146 N-SSK20 68,3 45 146,863339 7,689390 54,1 46 200,267084 9,999697 N-FK5 51,1 47 104,268693 10,725534 43,9 48 223,847676 9,999156 SILUV 41,4 49 74,157091 2,909330 34,9 50 61,905690 20,001009 N-SSK20 33,4 51 393,956837 3,003544 28,2 52 0,000000 3,000000 SILUV 26,5 53 0,000000 12,000000 25,0 54 0,000000 0,000000 14,8 Table 2 for Fig. 9 SURFACE 4 17 30 33 48 K 0 0 0 0 0 C1 -1,149314E-07 1,138869E-07 2,553250E-08 -2,303564E-08 -2,862388E-07 C2 1,068991E-12 6,834873E-12 1,903152E-13 1,057034E-13 -1,471849E-11 C3 -1,023871E-16 1,159846E-15 2,384636E-17 2,216235E-17 -9,176267E-16 C4 -8,652159E-22 1,806928E-19 -2,275184E-21 -2,298400E-21 1,790556E-18 C5 2,735396E-25 1,158738E-23 1,379019E-25 1,404494E-25 -9,828832E-22 C6 -5,452765E-29 3,240280E-27 -2,718802E-30 -3,151646E-30 1,345538E-25

[0119] Based on the Fig. Section 10 below describes a projection optic 30 which can be used in place of the projection optic 11 in the projection exposure system 1. Components and functions that correspond to those described above with reference to the Fig. Items 1 to 9, which have already been explained, bear the same reference numbers and will not be discussed again in detail.

[0120] The imaging optics 30 has a total of 24 lenses L1 to L24. Six of these 24 lenses are designed as aspherical lenses, each with an aspherical optical surface. These are the exit surface of lens L1, the entrance surface of lens L7, the entrance surface of lens L11, the exit surface of lens L14, the exit surface of lens L21, and the exit surface of lens L24.

[0121] Lenses L3, L9, L13, L16 and L19 are made of high dispersion optical material, in this case N-SSK20.

[0122] All other lenses, i.e. lenses L1, L2, L4 to L8, L10 to L12, L14, L15, L17, L18 and L20 to L24, of the imaging optics 30 are made of low-dispersion optical material, in this case quartz glass.

[0123] No fluorine crown glass is used in the entire system. Such a system is radiation-resistant, meaning it is particularly suitable for the highest light intensities in the imaging range.

[0124] The following tables 1, 2a and 2b show design data of the imaging optics 30 according to Fig. 10. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 10 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 45,849251 1 225,810357 14,994990 SILUV 69,4 2 127,677968 50,207121 69,7 3 -101,316008 9,999602 SILUV 70,8 4 -143,220345 0,999506 78,1 5 -276,400007 24,273145 N-SSK20 82,5 6 -151,125008 0,999179 86,0 7 1523,150264 30,110064 SILUV 90,8 8 -250,211217 0,999434 91,7 9 303,272259 31,659835 SILUV 89,8 10 -488,661115 0,999532 88,4 11 129,008321 73,261661 SILUV 77,6 12 85,652041 22,990487 49,8 13 -303,454130 10,000000 SILUV 48,1 14 136,585495 23,083480 43,8 15 -87,700435 10,000000 SILUV 43,0 16 712,388591 27,757063 44,6 17 -56,628936 10,000000 N-SSK20 45,1 18 12567,949734 4,148294 61,9 19 607376,966110 36,044439 SILUV 66,7 20 -114,690163 0,999413 72,8 21 357,175381 43,871219 SILUV 91,1 22 -185,316987 1,038337 94,0 23 446,092969 51,157611 SILUV 99,9 24 -183,034823 3,314075 100,2 25 -182,388906 10,000000 N-SSK20 98,9 26 360,320365 0,998699 103,9 27 258,640626 48,512551 SILUV 107,5 28 -332,470885 20,026224 108,4 29 0,000000 -18,103945 108,6 30 266,430327 54,692900 SILUV 109,2 31 -288,416340 0,997793 108,7 32 -325,455490 10,000000 N-SSK20 107,5 33 237,724945 0,997263 106,1 34 219,894556 45,167217 SILUV 107,4 35 -813,268500 0,998553 107,5 36 187,523619 57,017121 SILUV 105,6 37 -375,426707 9,214753 103,2 38 -268,215803 10,000000 N-SSK20 100,8 39 180,093738 0,997250 94,4 40 167,271323 39,470911 SILUV 95,3 41 13414,269891 0,999365 94,5 42 161,061779 28,231718 SILUV 91,1 43 903,592720 0,999436 88,2 44 150,804134 34,625939 SILUV 84,2 45 1472,921969 0,999180 80,1 46 161,722974 70,989935 SILUV 71,5 47 49,148628 2,067552 34,8 48 47,613120 23,079860 SILUV 34,1 49 258,220412 3,273422 28,7 50 0,000000 3,000000 SILUV 26,9 51 0,000000 12,000000 25,4 52 0,000000 0,000000 14,8 Table 2a for Fig. 10 SURFACE 2 13 21 K 0 0 0 C1 -1,504905E-07 3,108983E-07 -5,361104E-08 C2 2,541441E-12 1,215501E-11 1,362496E-12 C3 -2,134753E-16 3,315181E-15 -1,831998E-16 C4 1,194390E-20 2,517534E-18 1,058862E-20 C5 -1,692923E-24 -8,168914E-22 -5,629956E-25 C6 5,375473E-29 2,263210E-25 8,842696E-30 Table 2b for Fig. 10 SURFACE 28 43 49 K 0 0 0 C1 2,812420E-08 7,926291E-08 -4,233609E-07 C2 -2,008736E-13 1,598574E-12 -9,054730E-11 C3 -2,792840E-17 -1,328010E-17 3,717306E-14 C4 -5,903274E-22 8,313760E-21 -2,821435E-17 C5 4,864057E-26 -4,768989E-25 4,441990E-20 C6 1,314858E-30 3,112545E-29 -1,846910E-23

[0125] Fig. Figure 11 shows an optical system formed as a combination of the following Fig. 3 folded imaging optics 20 as REMA lens and the imaging optics 27 as projection lens.

[0126] An aperture diaphragm AS is arranged in an aperture plane between the lenses L18 and L19 in the imaging optics 27.

[0127] In the optical system according to Fig. 11 ensures that the aperture AS of the imaging optics 20 is mapped exactly onto the aperture AS of the imaging optics 27.

[0128] In particular, a pupil plane of the imaging optics 20 is imaged centrally onto the aperture diaphragm of the projection optics 27 across all field points. This is achieved by adjusting the exit pupil of the ReMa 20 and the entrance pupil of the projection lens 27 field-point by field point.

[0129] The imaging optic 20, designed as a REMA lens, can also be used with the other projection optics described above, in particular according to the Fig. 7 to 10 can be combined. This also applies to the imaging optics also designed as REMA lenses according to the Fig. 4 to 6.

[0130] Based on the Fig. Section 12 below describes a further embodiment of an achromatic imaging optic 31, which, for example, can again be used as a REMA lens in the projection exposure system 1 instead of the imaging optic 20. Components and functions that correspond to those described above with reference to the Fig. 1 to 11 and in particular with reference to the Fig. Items 2 to 6 and 11, which have already been explained, bear in particular the same reference numbers and will not be discussed again in detail.

[0131] In the imaging optics 31, a short-flint glass in the form of optical material N-KZFS11 (manufacturer: Schott AG) is used as the higher dispersion material. Alternatively, a short-flint glass, such as optical material S-BAM12 (manufacturer: OHARA GmbH), can be used as the higher dispersion material. Other optical glasses from other glass manufacturers with comparable optical properties to the aforementioned higher dispersion materials can also be used.

[0132] The following refractive index table tabulates refractive index values ​​of the optical material N-KZFS11 again at the central useful wavelength of the illumination light 4 (column 2) and at a slightly larger and a slightly smaller wavelength (columns 3 and 4). MATERIAL INDEX1 INDEX2 INDEX3 wavelength 365,50 366,50 364,50 N-KZFS11 1,676172 1,678120 1,674323

[0133] The imaging optics 31 has a total of 11 lenses L1 to L11, which are numbered in the order of their application in the imaging beam path 23 between the illumination conditioning field 16a and the object field 14. All lenses L1 to L11 of the imaging optics 31 are made of a material with a lead oxide content of less than 5% by weight.

[0134] In terms of its basic structure, the imaging optic 31 is based on Fig. 12 with the imaging optics 20 after Fig. 2 comparable. In contrast to this imaging optic 20, the imaging optic 31 has according to Fig. 12 a pupil-near achromatic lens group with lenses L4 to L8, thus with one fewer lens pair overall than in the pupil-near achromatic lens group of the imaging optics 20 according to Fig. 2.

[0135] The lenses L5 and L7 in the imaging optics 31 are made of the high-dispersion optical material N-KZFS11, i.e., an high-dispersion optical material with an Abbe number v. d , which is less than 55. In the case of the optical lens material N-KZFS11, this Abbe number is v d 42.41.

[0136] Within the pupil-near achromatic lens group, lenses L4, L6 and L8, which are made of the low dispersion material N-FK5, alternate with lenses L5 and L7 made of the high dispersion optical material.

[0137] Lenses L4, L6 and L8 are biconvex and lenses L5 and L7 are biconcave.

[0138] In the imaging optics 31, exactly two optical materials are used for the lenses L1 to L11, namely N-FK5 as a low dispersion material and N-KZFS11 as a high dispersion material.

[0139] The lenses L1 to L3 serve as a collimation lens group in the imaging optics 31.

[0140] The illumination optics 31 are designed for the illumination light 4 with a wavelength of 365.5 nm.

[0141] Tables 1 and 2 below show design data for the imaging optics 31 according to Fig. 12. In terms of structure, these tables correspond to those mentioned above, e.g., in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 12 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 49,193804 1 -36,725481 44,236359 FK5 34,2 2 -64,248800 0,980522 60,8 3 591,436198 52,850826 FK5 97,8 4 -164,465077 0,989927 101,1 5 -1478,492845 32,089573 FK5 104,3 6 -184,648288 0,996216 106,5 7 168,111077 60,233387 FK5 106,6 8 -450,137639 0,995855 104,1 9 -714,646685 10,000000 N-KZFS11 100,4 10 161,631193 1,304973 89,4 11 149,601620 41,853111 FK5 89,4 12 -1668,527673 18,781473 87,2 13 -222,487293 10,000000 N-KZFS11 85,6 14 197,812943 30,421415 84,1 15 305,737920 50,263289 FK5 91,5 16 -174,105228 4,995608 92,2 17 0,000000 178,822895 101,0 18 -159,767505 20,000055 FK5 78,3 19 -156,322926 425,862118 82,8 20 1693,567751 40,000582 FK5 95,8 21 -161,503328 1,613488 95,8 22 186,134433 30,003593 FK5 81,4 23 110,548473 29,522029 68,1 24 0,000000 4,000000 FK5 67,6 25 0,000000 55,750000 67,2 26 0,000000 6,250000 SILUV 59,6 27 0,000000 0,000000 59,1 28 0,000000 0,000000 59,1 Table 2 for Fig. 12 SURFACE 5 18 21 23 K 0 0 0 0 C1 -5,854146E-08 -6,806086E-08 3,706880E-09 1,220875E-07 C2 -4,024488E-13 -2,868734E-12 9,222189E-12 -4,858839E-12 C3 -2,034947E-17 -9,567675E-18 -6,589021E-16 -2,922533E-16 C4 -2,092093E-21 -2,807777E-20 2,068525E-20 2,145519E-20

[0142] Lenses L1 to L11 are rotationally symmetric about the optical axis 2.

[0143] Four of the eleven lenses are designed as aspherical lenses. The entrance surface of lens L3, the entrance surface of lens L9, the exit surface of lens L10, and the exit surface of lens L11 are designed as aspherical surfaces.

[0144] Based on the Fig. Section 13 below describes a projection optic 32 which can be used in place of, for example, the projection optic 11 in the projection exposure system 1. Components and functions that correspond to those described above with reference to the Fig. 1 to 12 and in particular with reference to the Fig. Items 7 to 11, which have already been explained, bear the same reference numbers and will not be discussed again in detail.

[0145] The imaging optics 32 has a total of 19 lenses L1 to L19. Three of these lenses, namely lenses L9, L12 and L15, are made of high-dispersion optical material, in this example N-KZFS11. The other lenses of the imaging optics 32 are made of low-dispersion optical material, in this case again N-FK5.

[0146] All lenses L1 to L19 of the imaging optics 32 are made of a material with a lead oxide content of less than 5%.

[0147] Lenses L1 to L8 form an output field lens group in the imaging beam path 23 after the object field 14. The further lenses L9 to L19 form a target field lens group of the imaging optics 32 in the imaging beam path after the output field lens group.

[0148] Between the output field lens group and the target field lens group, in the example shown in the area of ​​lens L8, lies a beam waist of the imaging beam path 23.

[0149] Lenses L9, L12, and L15 are made of the high-dispersion material and are all part of the target-field lens group. These lenses are all designed as optically diverging lenses, specifically as biconcave lenses in this example.

[0150] Chromatic correction, namely correction of the longitudinal chromatic aberration, takes place exclusively in the target field lens group of the imaging optic 32.

[0151] The lenses L1 to L19 of the imaging optics 32 are made of exactly two optical materials, namely N-FK5 on the one hand and N-KZFS11 on the other.

[0152] Five of the lenses of the imaging optics 32 are designed as aspherical lenses, namely as lenses with aspherical surfaces, each of which in turn has exactly one aspherical surface. These are an exit surface of lens L1, an exit surface of lens L8, an entrance surface of lens L10, an entrance surface of lens L13, and an exit surface of lens L19.

[0153] Tables 1 and 2 below show design data for the imaging optics 32 according to Fig. 13. In terms of structure, these tables correspond to those mentioned above in connection with the Fig. 2 and Fig. 3 have already been explained. Table 1 for Fig. 13 SURFACE RADIUS THICKNESS MATERIAL HALF-MEASURE 0 0,000000 57,128392 1 285,650912 10,000000 FK5 71,1 2 143,450562 40,677217 71,7 3 -134,600228 9,999514 FK5 72,7 4 590,096969 7,861812 86,7 5 1591,117637 39,597627 FK5 89,8 6 -176,866546 0,999296 94,0 7 1576,683906 39,056212 FK5 104,3 8 -232,814801 0,999754 106,1 9 302,193270 35,353347 FK5 107,5 10 -1016,976721 0,999736 106,4 11 210,643655 32,947273 FK5 99,5 12 2270,617240 87,647432 96,3 13 -4134,312839 10,000000 FK5 55,1 14 96,158016 22,556828 48,1 15 -202,760491 9,999590 FK5 47,5 16 191,411018 27,407340 46,9 17 -74,384846 10,000000 N-KZFS11 47,4 18 435,992730 21,289407 59,1 19 -1759,304176 45,517979 FK5 74,6 20 -104,999850 0,999285 80,4 21 260,921711 45,297003 FK5 100,1 22 -338,299950 62,824852 100,7 23 -319,017948 10,000000 N-KZFS11 96,5 24 307,399534 1,694806 100,1 25 218,471647 61,627611 FK5 101,9 26 -180,658834 -27,025052 103,5 27 0,000000 31,416980 102,9 28 173,181373 55,782622 FK5 107,5 29 -667,382184 10,953474 105,4 30 -497,468381 10,000000 N-KZFS11 101,6 31 202,690049 15,000224 95,1 32 232,486686 33,737668 FK5 96,5 33 -1654,776945 15,000169 95,7 34 245,782842 29,503166 FK5 90,4 35 -1709,563169 15,000113 88,1 36 95,298883 41,143080 FK5 69,5 37 -1944,885494 6,277145 63,7 38 -520,381377 52,630070 FK5 58,7 39 315,145726 3,102098 28,7 40 0,000000 3,000000 SILUV 26,9 41 0,000000 12,000000 25,4 42 0,000000 0,000000 14,8 Table 2 for Fig. 13 SURFACE 2 16 19 25 39 K 0 0 0 0 0 C1 -1,512200E-07 7,567135E-08 -7,622660E-09 -6,775371E-08 -2,838247E-07 C2 2,159773E-12 1,093833E-11 -2,172326E-12 1,472534E-12 -3,249642E-11 C3 -1,357926E-16 3,450452E-15 5,280471E-16 -5,625340E-17 4,911042E-14 C4 -5,713981E-21 -5,126832E-19 -5,764209E-20 1,734385E-21 -1,036996E-16 C5 1,119616E-24 1,334671E-22 3,791746E-24 -4,264908E-26 1,001064E-19 C6 -8,243969E-29 9,608172E-27 -1,275255E-28 -8,342741E-32 -3,760950E-23

[0154] Using the projection exposure system 1, at least a portion of the reticulum 7 is imaged onto an area of ​​a photosensitive layer on the wafer 13 for the lithographic fabrication of a micro- or nanostructured component. Depending on whether the projection exposure system 1 is configured as a scanner or a stepper, the reticulum 7 and the wafer 13 are moved continuously in the y-direction in scanner mode or stepwise in stepper mode, synchronized over time.

[0155] A semiconductor component in the form of a microchip, for example a memory chip, is manufactured as a micro- or nanostructured component. QUOTES INCLUDED IN THE DESCRIPTION

[0000] This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions. Cited patent literature

[0000] DE 196 53 983 A1

[0002] US 5,982,558

[0002] US 7,551,361 B2

[0002] DE 101 13 612 A1

[0002] WO 2009 / 095 052 A1

[0002]

Claims

[1] Achromatic imaging optics (20; 24; 25; 26; 27; 28; 29; 30; 31; 32) for imaging an output field (16a; 14) along a beam path (23) of the imaging optics (20; 24; 25; 26; 27; 28; 29; 30) into a target field (14; 14a), for use in DUV microlithography, - with a plurality of lenses (L1 to L13; L1 to L14; L1 to L15; L1 to L25; L1 to L24), wherein each of the lenses (L1 to L13; L1 to L14; L1 to L15; L1 to L25; L1 to L24) has a proportion of lead oxide that is less than 5%. - wherein at least one of the lenses (L5, L7, L9; L5, L7, L9, L12; L11, L13, L17, L20; L1, L10, L12, L16, L19; L1, L4, L10, L12, L16, L19, L22, L25; L3, L9, L13, L16, L19) is made of an optical high dispersion material with an Abbe number v d manufactured, which is smaller than 55, and - wherein at least one of the lenses (L1 to L4, L6, L8, L10 to L13; L1 to L4, L6, L8, L10 to L14; L1 to L4, L6, L8, L10, L11, L13 to L15; L1 to L10, L12, L14 to L16, L18, L19, L21 to L25; L2 to L9, L11, L13 to L15, L17, L18, L20 to L24; L2, L3, L5 to L9, L11, L13 to L15, L17, L18, L20, L21, L23, L24; L1, L2, L4 to L8, L10 to L12, L14, L15, L17, L18, L20 to L24) is made of a low-dispersion optical material with a Abbe number v d is manufactured, which is larger than 55. [2] Achromatic imaging optics according to claim 1, characterized by at least one lens made of fluorine crown glass as a low dispersion material. [3] Achromatic imaging optics according to claim 1 or 2, characterized by at least one lens made of heavy crown glass and / or at least one lens made of short flint glass as a higher dispersion material. [4] Achromatic imaging optics according to any one of claims 1 to 3, characterized byat least one lens made of crystal glass. [5] Achromatic imaging optics according to any one of claims 1 to 4, characterized by that all lenses of the imaging optics are made of either one optical material or of another optical material selected from exactly two optical materials. [6] Achromatic imaging optics according to one of claims 1 to 5, designed as an illumination lens (20; 24; 25; 26; 31) in which the output field (16a) is a field that is imaged by the imaging optics into an object field (14) of a subsequently arranged projection optics. [7] Achromatic imaging optics according to claim 6, characterized by a collimation lens group (L1 to L3) in the beam path (23) after the output field (16a) and with an achromat lens group (L4 to L10; L4 to L8) in the beam path after the collimation lens group (L1 to L3). [8] Achromatic imaging optics according to one of claims 1 to 5, designed as a projection lens (27; 28; 29; 30; 32) wherein the output field (14) is an object field in which an object to be imaged can be arranged, and wherein the target field (14a) is an image field in which a substrate can be arranged. [9] Achromatic imaging optics according to claim 8, characterized by an output field lens group (L1 to L10; L1 to L9; L1 to L8) in the beam path after the output field (14) and with a target field lens group (L11 to 25; L10 to L24; L10 to L25; L9 to L24; L9 to L19) in the beam path (23) after the output field lens group (L1 to L10; L1 to L9; L1 to L8), wherein a beam waist of the beam path (23) lies between the output field lens group (L1 to L10; L1 to L9; L1 to L8) and the target field lens group (L11 to 25; L10 to L24; L10 to L25; L9 to L24; L9 to L19). [10] Achromatic imaging optics according to any one of claims 1 to 9, characterized by at least four lenses (L5, L7, L9, L12; L11, L13, L17, L20; L1, L10, L12, L16, L19; L1, L4, L10, L12, L16, L19, L22, L25; L3, L9, L13, L16, L19) made of high dispersion material. [11] Achromatic imaging optics according to any one of claims 8 to 10, characterized by at least one lens in the beam waist area made of quartz glass. [12] Optical system comprising an illumination lens for imaging an output field into an object field and / or a projection lens for imaging an object field into an image field according to any of the preceding claims. [13] Projection exposure system with an optical system according to claim 12, with a reticule holder for holding a reticule (7) as the object to be imaged and with a wafer holder for holding a wafer (13) as the substrate. [14] Methods for manufacturing structured components comprising the following steps: - Providing a wafer (13) on which at least part of a layer of a photosensitive material is applied, - Providing a reticulum (7) that contains structures to be mapped, - Providing a projection exposure system (1) according to claim 13, - Projecting at least part of the reticulum (7) onto an area of ​​the wafer layer (13) using the projection exposure system (1). [15] Structured component manufactured according to a method according to claim 14.

Images