Device with vacuum chamber and movable object

Abstract

The invention relates to a device (100) with a chamber (101) designed for operation in high vacuum or ultra-high vacuum, and in the interior of which at least one movable object (102) is arranged, which is connected or connectable to at least one electrical cable (103). A movable cable guide (104) is arranged inside the chamber (101), in, over, or on which the electrical cable (103) is guided or can be guided, wherein the electrical cable (103) has a bending radius of less than 4.5 cm. The invention also relates to a measuring machine, a lithography system and an inspection system.

Description

[0001] The invention relates to a device with a chamber designed for operation in high or ultra-high vacuum, containing at least one movable object which is connected or connectable to at least one electrical cable. The invention further relates to a measuring machine, a lithography system, and an inspection system.

[0002] The importance of technical applications or processes requiring high vacuum (HV) or ultra-high vacuum (UHV) conditions is increasing. Devices and processes requiring high vacuum or ultra-high vacuum include, for example, lithography systems, particularly DUV or EUV lithography systems, as well as measuring arrangements used to inspect, measure, and / or specify objects within a lithography system. The high vacuum range is typically between 10 -3 mbar to approx. 10 -7mbar, while the ultra-high vacuum range extends from approximately 10 -7 mbar up to 10 -11 The vacuum chambers extend to mbar. Movable objects requiring electrical cables for signal and / or data transmission and / or power supply can be located within them. It must be ensured that no or minimal tensile stress is exerted on the cables when the object moves, and that the cables do not rub against each other or become knotted during operation. Furthermore, the cables must meet technical requirements to enable use in high vacuum or ultra-high vacuum. For example, the cable sheath must be made of a material that does not outgas under HV or UHV conditions.

[0003] Therefore, the object of the present invention is to provide a device, a measuring machine, a lithography system and an inspection system that solves or at least reduces the aforementioned problems.

[0004] The problem relating to the device is solved by a device according to the features of claim 1. The problem relating to the measuring machine is solved by a measuring machine with the features of claim 15. The problem relating to the lithography system is solved by a lithography system with the features of claim 17. The problem relating to the inspection system is solved by an inspection system with the features of claim 18. Advantageous embodiments with expedient further developments are specified in the dependent claims.

[0005] The device is characterized in particular by the fact that at least one movable cable guide is provided inside the chamber, in, on, or over which the electrical cable is guided or can be guided, and that the electrical cable has a bending radius of less than 4.5 cm, preferably less than 4.0 cm, and most preferably less than 3.0 cm. In a particularly preferred embodiment, the electrical cable has a bending radius of less than 2.5 cm. This makes it possible to provide a more robust and durable movable object, as well as a more robust and durable device. The routing of the cable(s) on, in, or over the movable cable guide prevents the electrical cable(s) from becoming tangled during movement of the movable object. This also reduces the mechanical stress during movement of the movable object and / or the cable guide.The reduced bending radius of the electrical cable allows for a smaller cable routing design, resulting in a more compact chamber and thus lower installation space requirements, as well as greater flexibility in the use of the available space. A plurality of electrical cables are particularly preferred, configured for signal or data transmission (analog or digital), or for the electrical connection between the movable object and a power source.

[0006] Furthermore, to reduce the installation space requirements, it is preferable for the movable cable guide to be curved. The bending radius of the movable cable guide is less than 8.0 cm, preferably less than 6.0 cm, and most preferably less than 4.0 cm.

[0007] Furthermore, it is advantageous if the electrical cable is guided in or on the movable cable tray without tensile stress or with near-zero tensile stress. The movable object and the movable cable tray are preferably coupled to each other exclusively via the electrical cable, in particular without tensile stress or with near-zero tensile stress, and it is preferred if this connection is designed as a decoupled connection, for example by using a sufficiently long electrical cable. It is also advantageous if the at least one electrical cable is guided in the movable cable tray in a fixed position or with near-fixed position.

[0008] Furthermore, it is advantageous if the movement of the movable cable guide is configured to follow the trajectory of the movable object. In one embodiment, the movement (i.e., in particular, the direction of movement) of the movable cable guide is coaxial, parallel, or approximately parallel to the movement (in particular, the direction of movement) of the movable object. The axis of movement of the cable guide therefore preferably corresponds to the axis of movement of the movable object or is arranged parallel to the axis of movement of the movable object. The cable guide is also arranged at a distance from the movable object within the chamber.

[0009] Particularly preferably, the movable cable guide is formed as a drag chain, especially a curved drag chain. The electrical cable(s) are preferably guided in or along the drag chain. For this purpose, the drag chain can have a cable receiver extending at least partially along the drag chain.

[0010] Furthermore, it is preferred if the movable object is movable along exactly one degree of freedom. This degree of freedom can be rotational or translational. Alternatively, it is also possible for the movable object to be movable along multiple degrees of freedom, i.e., along translational and / or rotational degrees of freedom.

[0011] Furthermore, it is advantageous within the scope of the invention if the electrical cable(s) are equipped to carry current and / or data and / or a digital signal and / or an analog signal.

[0012] The electrical cable preferably comprises a plurality of sub-cables, each containing a plurality of conductors. The individual sub-cables are preferably spaced apart from one another, with at least two sub-cables being connected to each other by means of a spring-loaded and / or torsionally flexible spacer. Advantageously, the conductors are twisted in pairs as twist-pair cables to prevent or reduce common-mode interference. The conductors of the cables are preferably arranged relative to each other such that the conductors and / or the conductor pairs and / or the sub-cables are arranged with low friction, or the conductor pairs are arranged with low friction relative to adjacent conductor pairs / sub-cables. Preferably, the sub-cables are arranged parallel or approximately parallel to each other, preferably in a common plane. The distance between adjacent sub-cables is preferably smaller than the diameter of the sub-cables.Adjacent subcables are connected to each other via a spacer, which is preferably flexible (springy, elastic) and / or torsionally rigid. The electrical cable is preferably sheathed in an electrically insulating jacket. The subcables can be sheathed separately from each other or share a common jacket and be connected to each other via this jacket. In other words, the spacers between the subcables are preferably formed as the jacket. Furthermore, it is advantageous if the electrical cable is shielded. The diameter of the subcables is less than 3 mm, preferably less than 2.8 mm, and most preferably less than 2.6 mm. The electrical cable is therefore preferably flat. The subcables can all have the same diameter, or the diameter of at least one of the subcables can differ from the diameter of one of the other subcables.

[0013] The chamber can contain several movable objects, each associated with at least one movable cable guide carrying at least one electrical cable. In one embodiment, the at least one movable object can be a sensor. In particular, the sensor can be selected from the group consisting of: position sensor, distance sensor, intensity sensor, camera, temperature sensor, pressure sensor, velocity sensor, or acceleration sensor. It is particularly preferred if the movable object is a position or distance sensor, which can, for example, be configured as an optical encoder or an interferometer.

[0014] Alternatively or additionally, the at least one movable object can also be formed as a drive or as an actuator, for example as an electric motor, or as a piezoelectric, piezostrictive, or magnetostrictive actuator, or as an electrostatic actuator or as a Lorenz actuator.

[0015] Furthermore, it is advantageous if at least one electrical cable, or at least its electrically insulating sheath, is PVC-free (polyvinyl chloride-free). The sheath of the electrical cable could, for example, be made of or contain PTFE (polytetrafluoroethylene). This prevents outgassing when used in a high-vacuum or ultra-high-vacuum chamber.

[0016] The measuring machine according to the invention is characterized in particular by the fact that it is designed to acquire a measured quantity of a measured object and comprises at least one device according to the invention for this purpose. The advantages and embodiments mentioned for the device also apply to the measuring device according to the invention.

[0017] Particularly preferably, the measured variable of the measuring machine is a geometry, position, shape, surface, surface finish, reflectivity, transmission, position, or distance to another object. The object being measured is preferably arranged within the chamber of the device. To acquire the measured variable of the object, several movable objects, for example, designed as sensors, can be arranged in the chamber of the device, with the electrical cable(s) of the movable object being routed to, in, or over a common or separate cable guide. The various movable objects can acquire the same physical measured variable (e.g., from different positions) or different physical measured variables. The measuring machine can also include an evaluation unit that compares the acquired actual values ​​with target values.The measuring machine can also be designed as a coordinate measuring machine.

[0018] The object being measured can be an optical element, such as a mirror, an EUV mirror, or a lens. However, the object being measured can also be a support structure, a stage, a reticle, or an object intended for use in a lithography system.

[0019] The lithography system according to the invention is characterized in that it comprises at least one device according to the invention. The advantages and embodiments mentioned for the device are also applicable to the lithography system comprising the device. The device according to the invention can also be used in a lighting system, in particular in a DUV or EUV lighting system, or in a projection lens, in particular in a DUV or EUV projection lens of a lithography system.

[0020] The inspection system according to the invention for inspecting the shape, position, or geometry of a measured object is characterized in particular by the fact that at least one device according to the invention is provided. The device is configured to detect a measured quantity. The measured quantity can be, for example, a geometry, position, shape, surface, surface finish, reflectivity, transmission, position, or distance to another object. The measured object can be an optical element, for example, a mirror, an EUV mirror, or a lens. However, the measured object can also be a support structure, a stage, a wafer, a reticle, or an object intended for use in a lithography system. Preferably, an evaluation unit is provided that compares the detected measured quantity with a target quantity.

[0021] Further features, properties, and advantages of the present invention are described in more detail below with reference to exemplary embodiments and the accompanying figures. All features described so far and below are advantageous both individually and in any combination. The exemplary embodiments described below are merely examples and do not limit the scope of the invention. The figures show: Fig. 1a a schematic representation of a microlithographic projection exposure system designed for operation in the EUV, Fig. 1b a schematic representation of a microlithographic projection exposure system designed for operation in DUV, Fig. 2 a schematic representation of a first embodiment of a device, Fig. 3 a schematic representation of a first embodiment of a cable for the device, and Fig. 4 A schematic representation of an embodiment of a measuring machine with a device.

[0022] Fig. Figure 1a shows a schematic representation of an exemplary projection exposure system 600 designed for operation in the EUV, in which the present invention can be implemented.

[0023] According to Fig. 1a A lighting device in a projection exposure system 600 designed for EUV has a field facet mirror 603 and a pupil facet mirror 604. The light from a light source unit, which comprises a plasma light source 601 and a collector mirror 602, is directed onto the field facet mirror 603. In the light path after the pupil facet mirror 604, a first telescope mirror 605 and a second telescope mirror 606 are arranged. Further down the light path is a deflecting mirror 607, which directs the incident radiation onto an object field in the object plane of a projection lens comprising six mirrors 651-656. At the location of the object field, a reflective structure-bearing mask 621 is arranged on a mask table 620, which is imaged into an image plane by means of the projection lens, in which a substrate 661 coated with a light-sensitive layer (photoresist) is located on a wafer table 660.

[0024] The invention can be used in a DUV system as well as in Fig. 1b is shown. A DUV system is basically the same as the EUV system described above. Fig. 1a constructed, wherein mirrors and lenses can be used as optical elements in a DUV system and the light source of a DUV system emits useful radiation in a wavelength range of 100 nm to 300 nm.

[0025] The in Fig. The DUV lithography system 700 shown in Figure 1b has a DUV light source 701. For example, an ArF excimer laser can be used as the DUV light source 701, emitting radiation 702 in the DUV range at, for example, 193 nm. A beam shaping and illumination system 703 directs the DUV radiation 702 onto a photomask 704. The photomask 704 is designed as a transmissive optical element and can be located outside the system 703. The photomask 704 has a structure which is reduced in size and projected onto a wafer 706 or the like by means of the projection system 705. The projection system 705 has several lenses 707 and / or mirrors 708 for imaging the photomask 704 onto the wafer 706. Individual lenses 707 and / or mirrors 708 of the projection system 705 can be arranged symmetrically to the optical axis 709 of the projection system 705.It should be noted that the number of lenses 707 and mirrors 708 of the DUV lithography system 700 is not limited to the number shown. More or fewer lenses 707 and / or mirrors 708 may be used. In particular, the beam shaping and illumination system 703 of the DUV lithography system 700 has several lenses 707 and / or mirrors 708. Furthermore, the mirrors are typically curved on their front surface for beam shaping. An air gap 710 between the last lens 707 and the wafer 706 can be replaced by a liquid medium with a refractive index > 1. The liquid medium can be, for example, highly purified water. Such a setup is also called immersion lithography and offers increased photolithographic resolution.

[0026] Fig. Figure 2 shows a first embodiment of a device 100, in particular an optical device with a chamber 101, which is configured for operation in high vacuum or ultra-high vacuum, i.e., is formed as an HV chamber or a UHV chamber. Inside the HV or UHV chamber 101, at least one movable object 102 is arranged, which is connected or connectable to at least one electrical cable 103. Inside the chamber 101, a movable cable guide 104 is arranged, in, over, or on which the electrical cable 103 is guided or can be guided. The electrical cable 103 has a bending radius of less than 4.5 cm, preferably less than 4.0 cm, and most preferably less than 3.0 cm. In a particularly preferred embodiment, the electrical cable 103 has a bending radius of less than 2.5 cm.The movable cable guide 104 is also curved to further save installation space, with a bending radius of less than 8.0 cm, preferably less than 6.0 cm, and most preferably less than 4.0 cm. The electrical cable 103 is guided on or in the movable cable guide 104 without tensile stress or almost without tensile stress. The movable object 102 and the movable cable guide 104 are preferably coupled to each other exclusively via the electrical cable 103, in particular in a way that prevents tensile stress.

[0027] The movement of the movable cable guide 104 and the electrical cable 103 is configured to follow the trajectory of the movable object 102. In one embodiment, the movement of the movable cable guide 104 is configured to be coaxial, parallel, or approximately parallel to the movement of the movable object 102. The axis of movement of the movable cable guide 104 therefore preferably corresponds to the axis of movement of the movable object 102 or is arranged parallel to the axis of movement of the movable object 102. In this embodiment, the movable cable guide 104 is arranged at a distance from the movable object 102 in the chamber 101.

[0028] In this case, the movable cable guide 104 is formed as a drag chain, in particular as a curved drag chain. The electrical cable(s) 103 are preferably guided in or on the drag chain. For this purpose, the drag chain can have a cable receiver (not shown) extending along the drag chain.

[0029] The movable object 102 can be movable along exactly one degree of freedom. This degree of freedom can be a rotational or a translational degree of freedom. Alternatively, it is also possible for the movable object 102 to be movable along multiple degrees of freedom, i.e., along translational and / or rotational degrees of freedom.

[0030] In the present embodiment, exactly one movable object 102 is arranged in chamber 101. Of course, several movable objects 102 can also be present, each of which is assigned at least one movable cable guide 104 carrying at least one electrical cable 103. Several movable objects 102 can also share a common movable cable guide 104. In one embodiment, the at least one movable object 102 can be configured as a sensor. In particular, the sensor can be selected from the group consisting of: position sensor, distance sensor, intensity sensor, camera, temperature sensor, pressure sensor, velocity sensor, or acceleration sensor. Preferably, the movable object is configured as a position or distance sensor, which can, for example, be configured as an optical encoder or an interferometer.Alternatively or additionally, the at least one movable object 102 can also be formed as a drive or an actuator, for example as an electric motor, or as a piezoelectric or piezostrictive or magnetostrictive actuator, or as an electrostatic actuator or as a Lorenz actuator.

[0031] This makes it possible to provide a more robust and durable device 100. The routing of the cable(s) in the movable cable guide 104 prevents the electrical cables 103 from becoming tangled when the movable object 102 is moved. This also reduces the mechanical stress during the movement of the movable object 102 and / or the cable guide 104. Furthermore, the reduced bending radius of the electrical cable 103 allows for a smaller design of the cable guide 104, resulting in a more compact chamber 101, reduced installation space requirements, and greater flexibility in the use of the space within the chamber 101.

[0032] Fig. Figure 3 shows an embodiment of an electrical cable 103 for the device 100. The present electrical cable 103 has several sub-cables 106, each of which has a plurality of conductors 105. The sub-cables are connected to one another at intervals by means of spacers 108. The spacers are preferably flexible (elastic or spring-loaded) and / or torsionally rigid. The individual sub-cables 106 are preferably configured to carry electrical current and / or data and / or a digital signal and / or an analog signal. The plurality of conductors 105 are preferably twisted, in particular twisted in pairs, i.e., designed as a twist-pair cable, in order to prevent or reduce common-mode interference. The sub-cables 106 and / or the conductors 105 of the sub-cables 106 are preferably arranged with low friction relative to one another. The subcables 106 and / or the (twisted) wire pairs 105 are preferably arranged parallel or approximately parallel to each other.The subcables 106 can all have the same or approximately the same diameter d1, or the diameter of at least one of the subcables 106 may differ from the diameter of another of the subcables 106. The distance d. aThe distance between adjacent subcables 106 is preferably smaller than the diameter d1 of the subcables 106. The electrical cable 103 has an electrically insulating sheath 107, which is preferably made of a PVC-free material (for example, PTFE). In this case, the spacers are formed as part of the sheath, meaning that the subcables 106 have a common electrically insulating sheath. The electrical cable thus shaped is designed to be torsionally rigid. Alternatively, the subcables 106 can also be sheathed separately from one another, with the separate sheaths 107 of the subcables 106 being connected to each other by preferably flexible (elastic, resilient) and / or torsionally rigid spacers. The electrical cable 103 is preferably shielded. The diameter of the subcable is less than 3 mm, preferably less than 2.8 mm, and most preferably less than 2.6 mm.

[0033] The at least one electrical cable 103, in particular its sheath, is PVC-free (polyvinyl chloride-free). This prevents evaporation when used in the high-vacuum or ultra-high-vacuum chamber 101. The sheath of the electrical cable 103 is, for example, made of or comprised of PTFE (polytetrafluoroethylene).

[0034] Fig. Figure 4 shows an embodiment of a measuring machine 200, which includes a device 100 and is configured for detecting a measured quantity of a measuring object 201. The movable object 101 of the device 100 is, for example, a sensor configured for detecting a measured quantity of the measuring object.

[0035] The measured variable of the measuring machine can be a geometry, position, shape, surface, surface finish, reflectivity, transmission, position, or distance to another object. The object being measured is arranged within the HV or UHV chamber 101 of the device 100. To acquire the measured variable of the object 201, several movable objects, for example, designed as sensors, can be arranged in the chamber of the device, with the electrical cable 103 of the movable object(s) 101 being guided on, in, or over a common or separate movable cable guide 104. The sensors can acquire different physical measured variables of the object or acquire the same physical measured variable from different positions. The measuring machine 200 can also include an evaluation unit (not shown) that compares acquired actual values ​​with target values.The measuring machine can also be configured as a coordinate measuring machine. The object being measured (201) can, for example, be an optical element such as a lens or a mirror, in particular an EUV mirror. Alternatively, the object being measured can also be a support structure, an actuator, a stage, a reticle, or an object intended for use in a lithography system.

[0036] The device 100 or the measuring machine 200 can also be part of an inspection system or a lithography system. REFERENCE MARK LIST 100 Device 101 high vacuum chamber / ultra high vacuum chamber 102 movable objects 103 electrical cable 104 movable cable guides 105 pairs of wires / wires 106 Sub-cables (of the electrical cable) 107 Electrically insulating sheath of the electrical cable 108 spacers (between sub cables) 200 measuring machine 201 Measuring object 600 Projection exposure system 601 Plasma light source 602 Collector mirrors 603 Field faceted mirror 604 pupil facet mirrors 605 first telescope mirror 606 second telescope mirror 607 Deflection mirror 620 mask table 621 Mask 651 Mirror (projection lens) 652 Mirror (projection lens) 653 Mirror (projection lens) 654 Mirror (projection lens) 655 Mirror (projection lens) 656 Mirror (projection lens) 660 wafer table 661 coated substrate 700 DUV lithography system 701 DUV light source 702 DUV radiation / beam path 703 Beam shaping and illumination system (DUV) 704 Photomask 705 Projection System 706 wafers 707 lens 708 mirrors 709 optical axis

Claims

[1] Device (100) comprising a chamber (101) which is designed for operation in a high vacuum or ultra-high vacuum and in the interior of which at least one movable object (102) is arranged which is connected or connectable to at least one electrical cable (103), characterized by , that inside the chamber (101) a movable cable guide (104) is arranged in, over or on which the electrical cable (103) is guided or can be guided, wherein the electrical cable (103) has a bending radius of less than 4.5cm. [2] Device (100) according to claim 1, characterized by , that the movable cable guide (104) is curved. [3] Device (100) according to claim 1 or 2, characterized by , that the electrical cable (103) is guided in the movable cable guide (104) without tensile stress or approximately without tensile stress. [4] Device (100) according to any one of claims 1 to 3, characterized by, that the movement of the movable cable guide (104) is set up to follow a movement trajectory of the movable object (102). [5] Device (100) according to any one of claims 1 to 4, characterized by , that the movable cable guide (104) is formed as a drag chain. [6] Device (100) according to any one of claims 1 to 5, characterized by , that the movable object (102) is movable along exactly one degree of freedom. [7] Device (100) according to any one of claims 1 to 6, characterized by , that the electrical cable (103) is set up to carry power and / or data and / or a digital signal and / or an analog signal. [8] Device (100) according to any one of claims 1 to 7, characterized by, that the electrical cable (103) comprises a plurality of sub-cables (106), each of which has a plurality of conductors (105) and is arranged parallel or approximately parallel to each other, and that at least two of the sub-cables (106) are connected to each other by means of a spring-loaded and / or torsionally flexible spacer (108). [9] Device (100) according to claim 8, characterized by , that the electrical cable (103) is sheathed by means of an electrically insulating sheath (107), and that the at least one spacer (108) is formed as the sheath (107) or at least as a part of the sheath (107). [10] Device (100) according to any one of claims 1 to 9, characterized by , that at least one movable object (102) is a sensor. [11] Device (100) according to claim 10, characterized by, that the sensor is selected from the group: position sensor, distance sensor, intensity sensor, camera, temperature sensor, pressure sensor, speed sensor, accelerometer. [12] Device (100) according to any one of claims 1 to 11, characterized by , that the at least one movable object (102) is formed as an optical encoder or as an interferometer. [13] Device (100) according to any one of claims 1 to 12, characterized by , that the at least one movable object (102) is formed as a drive or as an actuator. [14] Device (100) according to any one of claims 1 to 13, characterized by , that the electrical cable (103) is made without PVC. [15] Measuring machine (100) for recording a measured quantity of a measured object (201) with a device (100) according to one of claims 1 to 14. [16] Measuring machine (200) according to claim 15, characterized bythat the measured quantity is a geometry or a surface or a reflectivity or a transmission or a position or a distance to another object or a. [17] Lithography system with a device (100) according to any one of claims 1 to 14. [18] Inspection system for inspecting the shape, position or geometry of an object with a device (100) according to any one of claims 1 to 14.

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