Weaving machine, guiding device for a weaving machine and use of a guiding device

Abstract

The invention relates to a weaving machine with a shed device (5), a weft insertion device (7), a reed (10), a take-up device (12) for the fabric (82) and a guide device (30; 130; 230; 330) with at least one guide unit (32, 34; 132; 232; 332) extending at least partially over the fabric width, which has at least one guide section (33, 35; 133; 233; 333) for contacting the fabric (82) in the area of ​​the reed stop plane (14), which is preferably positionable substantially in the fabric thickness direction (G). In this case, one or more command sections (33, 35; 133; 233; 333) of at least one command unit (32, 34; 132; 232; 332) have a total profiling (136; 236; 336) in the direction of fire (SR).

Description

[0001] The invention relates to a weaving machine according to the preamble of independent claim 1 and to a guide device for a weaving machine according to the preamble of claim 12 and to a use of such a guide device for such a weaving machine according to claim 15.

[0002] Such weaving machines have been known for a long time, for example in the form of rapier weaving machines and air-jet weaving machines. What they have in common is that a multitude of warp threads running side by side in the direction of production are raised or lowered by a shedding device to form an open shed, through which (at least) one weft thread is inserted. The shed is then closed again, the weft thread is beaten onto the binding point by a reed, and the shed is then opened again. The fabric is successively drawn off by means of a take-off device and, for example, wound onto a cloth beam or removed from the weaving machine in a horizontal position.

[0003] A disadvantage of the known weaving machines is that a reliable weaving process cannot always be guaranteed, especially with fabrics that deviate from the usual geometry, especially with fabrics of greater thickness and / or an uneven surface.

[0004] It is the object of the present invention to achieve improved tissue control and tissue guidance.

[0005] This problem is solved by the features of the independent claims.

[0006] The advantages of the invention lie in particular in the provision of means and methods that enable more precise guidance of the fabric in the area of ​​the reed beat-up plane, applicable under a wide range of weaving conditions. The term "area of ​​the reed beat-up plane" refers here to the area of ​​the fabric that is in the immediate vicinity of the reed beat-up plane, i.e., in the range of a few millimeters (down to 0 mm) to several centimeters from the reed beat-up plane in the direction of the fabric already produced.

[0007] According to a first aspect of the disclosure, a weaving machine has at least one guide device which has at least one guide unit which extends at least partially across the width of the fabric. This at least one guide unit comprises at least one guide section which can be positioned essentially in the direction of the fabric thickness and with which the fabric can be guided in a contacting manner in the region of the reed beat-up plane, i.e. the guide section rests against the fabric and guides it. At least one upper guide unit for guiding the fabric on its upper side and / or at least one lower guide unit for guiding the fabric on its underside is provided. Furthermore, a control unit is provided which is designed to control at least one drive.This at least one drive is connected to the at least one guide unit in order to change the position of at least one of its guide sections essentially in the direction of the fabric thickness. According to a preferred variant, said control unit processes information related to the fabric structure in the area of ​​the reed beat-up plane for the purpose of said control.

[0008] In this disclosure aspect, the fabric structure in the area of ​​the reed beat-up plane determines how the fabric is guided in this area, i.e., in the area of ​​the reed beat-up plane in the fabric thickness direction, i.e., generally vertically to the fabric surface. The term "fabric structure" encompasses the internal fabric structure, i.e., the path of the warp and weft threads in the fabric as a function of the pattern, the thickness of the fabric in the area of ​​the reed beat-up plane, and / or the surface path on the underside and / or top side of the fabric in the area of ​​the reed beat-up plane, including the respective fluctuations in thickness or surface path in the warp and / or weft direction.

[0009] For example, optimal guidance can be achieved with fabrics that have different thicknesses in the weft and / or warp directions. With such "wandering" fabric thicknesses, the disclosed fabric guidance prevents warp threads in the area of ​​the reed beat-up plane from being lifted from the fabric by the healds when the shed is opened, or even the entire fabric from being moved out of the weaving plane.

[0010] The term "at least one guide unit extending at least partially across the fabric width" means that the fabric is guided in the area of ​​the reed beat-up plane over at least one section in the weft direction, i.e., across the fabric width. In this case, several guide units extending side by side in the weft direction can also be provided, with the end faces of two adjacent guide units being arranged, for example, in close proximity to one another or at a distance from one another. In principle, a wide variety of designs are possible, as long as guidance is provided over at least one section and preferably across the entire width of the fabric.

[0011] The term "information related to the fabric structure in the area of ​​the reed beat-up plane" refers in particular to information that can be derived directly from the fabric structure, but also to information that is coordinated with the fabric structure or in which the fabric structure is taken into account. Advantageous examples of this are listed below.

[0012] The control unit particularly preferably receives the said information relating to the fabric structure from one or more of the sources listed below. According to a correspondingly preferred embodiment, the fabric guidance is pattern-controlled. For this purpose, the said information is stored directly or indirectly in a pattern cartridge, i.e. the electronically stored fabric pattern, and the control unit accesses this information. If it is stored directly in the pattern cartridge, the pattern designer has to incorporate this information into its programming. For this purpose, he uses special tracks present in the pattern cartridge, for example, via which information for positioning the at least one guide unit can be stored (e.g. bit pattern coded). This information is interpreted by the weaving machine directly for positioning the at least one guide unit without any further additional information.

[0013] With indirect storage of information in the sense of selecting information for positioning the at least one guide unit, the programmer or weaving machine operator can, for example, define indices in special tracks of the pattern cartridge. The indices refer to another source with corresponding information stored at another location on the weaving machine or outside the weaving machine, for example, in a central control system of the weaving mill. This information includes, for example, the positions to be approached by the at least one guide unit in the fabric thickness direction, which are then processed accordingly by the control unit in order to control the at least one guide unit accordingly.

[0014] According to an alternative, the control unit accesses a memory unit in which the relevant information is stored, independently of the pattern cartridge. Such access by the control unit occurs promptly, preferably simultaneously, with the reading of the actual pattern information in the pattern cartridge, so that the fabric guidance is timed to match the fabric pattern.

[0015] The described direct and indirect storage of information in a pattern cartridge or in a separate storage unit are examples of information related to the fabric structure. In these cases, there is no direct or immediate relationship between the fabric structure and the information processed by the control unit, but rather an indirect or indirect one. This information is specifically tailored to the fabric structure, or the fabric structure was taken into account when creating the information, for example, by the programmer or the weaving machine operator, in order to achieve the desired or intended positioning of the at least one guide unit and thus of the fabric in the area of ​​the reed beat-up plane.

[0016] In a further alternative, the control unit is designed such that an algorithm calculates the said information from the weaving pattern stored in the pattern cartridge. In this case, no commands for fabric guidance are programmed into the weaving pattern, as is provided for the above-mentioned case. Rather, the said algorithm is capable of calculating the relevant information for controlling the at least one drive for fabric guidance in the fabric thickness direction from the weaving pattern itself. Alternatively, the pattern designer already uses the aforementioned algorithm when creating the pattern cartridge, so that the instructions for the control unit are already contained in the pattern cartridge provided to the weaving machine.

[0017] In all of the above cases, the pattern cartridge can be stored in the shedding device, e.g. the control of a Jacquard device, or in a central control of the weaving machine or in an even higher-level control, e.g. a central control of the weaving mill.

[0018] A further alternative provides that the information for adjusting the fabric guide is not stored beforehand, but is determined during the weaving process. For this purpose, one or more sensors, for example at least one optical sensor and / or at least one ultrasonic sensor, can be provided which analyze the fabric surface - as part of the fabric structure - in the area of ​​the reed beat-up plane and make the corresponding measured values ​​available to the control unit. From these, the control unit calculates the control commands for the fabric guide. The said at least one sensor is arranged in front of the reed beat-up plane, preferably on the front side of the reed, and / or stationary between the guide device and the reed and / or below the fabric in the area of ​​the reed beat-up plane and / or above the fabric in the area of ​​the reed beat-up plane.

[0019] The aforementioned sources from which the control unit receives the information related to the tissue structure can be made available to the control unit alternatively or in any combination.

[0020] Alternatively or in addition to the above-mentioned information relating to the fabric structure in the area of ​​the reed beat-up plane, the control unit processes information on the position of the warp threads in the open shed in order to then control at least one guide unit accordingly and position it in the direction of the fabric thickness.

[0021] By directly observing the open shed, for example, impending collisions between the weft insertion device and the warp threads can be detected and prevented by appropriate positioning of at least one guide unit.

[0022] One embodiment accordingly provides for one or more sensors to analyze the position of the warp threads in the open shed. The at least one corresponding sensor is designed, for example, as an optical sensor, e.g. in the form of a camera. An embodiment in the form of several lasers, arranged one above the other, for example, which shine through the shed at different heights, is also possible. The results of the analysis with regard to the shed are processed by the control unit to control the at least one said drive, for example to displace the fabric in the direction of the fabric thickness so that the weft can be inserted through the open shed without colliding with the warp threads.

[0023] The control unit is particularly preferably capable of controlling the at least one drive based on said information relating to the fabric structure and / or the position of the warp threads in the open shed such that the fabric as a whole is displaced in the direction of the fabric thickness in the area of ​​the reed beat-up. This makes it possible to guide a weft insertion means for the weft thread to be inserted through the shed without collision. The weft insertion means is preferably designed as a rapier (and the weaving machine is thus a rapier weaving machine).Particularly in the case of thick fabrics, for example with a thickness of more than 5 mm or more than 10 mm or more than 20 mm or more than 50 mm, the weft insertion means can be moved through the shed by displacing the fabric in the direction of the fabric thickness, for example at a substantially equal distance from the upper and lower warp threads forming the open shed. If, for example, a weft thread is inserted in the area of ​​one fabric surface in a multi-layer fabric, the binding edge, i.e. the selvedge seen in section against which the reed beats, is displaced in the direction of this fabric surface compared to the neutral shed, which runs through the center plane of the fabric. So that the weft insertion means can be moved through the open shed without collision, the fabric in the area of ​​the reed beat-up plane is preferably displaced as a whole in the direction of the other surface of the fabric in its thickness direction.

[0024] Alternatively or additionally, the control unit is advantageously designed such that it can control at least one of the guide units to guide the fabric in its thickness direction. This also allows for guidance without displacement of the fabric as a whole in its thickness direction. For example, the fabric can be guided in a contact-type manner on its bottom and / or top side, even in the event of thickness fluctuations, without the neutral shed being displaced in the thickness direction.

[0025] According to a second aspect of the disclosure, a weaving machine according to the preamble of the independent device claims has at least one guide device with at least two guide units extending at least partially across the fabric width, each of which has at least one guide section positionable substantially in the fabric thickness direction for contact-guiding the fabric in the region of the reed beat-up plane. At least one upper guide unit is provided for guiding the fabric on its upper side and at least one lower guide unit is provided for guiding the fabric on its underside. Furthermore, said at least two guide units are each connected to at least one drive, which is connected to a control unit, so that they can be moved both in the same direction and in opposite directions in the fabric thickness direction.

[0026] This configuration of the weaving machine according to the second aspect of the disclosure, which can be combined with the features of the first aspect of the disclosure, achieves a high degree of flexibility with regard to fabric guidance. The fabric can be shifted in one direction or the other with respect to the fabric thickness by moving the two guide units in the same direction; by moving them in opposite directions, the guide units can follow changes in fabric thickness.

[0027] Irrespective of the disclosure aspect, according to an advantageous variant, the guide section(s) of only one lower or one upper guide unit can be positioned in only one direction in the direction of the fabric thickness, while the other guide unit remains stationary. This ensures that the corresponding guide section can also follow thickness variations on only one side of the fabric.

[0028] Alternatively or additionally, the guide section(s) of only one guide unit can be moved in one direction by means of a drive, while the guide section(s) of the other guide unit on the other side of the fabric are moved along in a purely passive manner, with this passive guide unit being subjected to a force, for example, generated by a spring. In this embodiment, in the simplest variant, only a single drive is required for the active movement of the at least one guide section. This configuration particularly relates to embodiments according to the first aspect of the disclosure.

[0029] Various designs of the at least one and preferably all guide units are possible, regardless of the disclosure aspect. In one embodiment, the at least one guide unit is designed as a rigid profile extending in the weft direction. This can be positioned in the direction of the fabric thickness by the at least one drive. Alternatively, the at least one guide unit (or several) is designed as a passive or actively driven roller. In the case of a passive roller, this can be set in rotation by the fabric movement caused by the take-off device. In the case of an actively driven roller, its peripheral speed is preferably adapted to the take-off speed of the fabric. The same applies to the embodiment in which the at least one guide unit is designed as a circulating belt.

[0030] It has proven advantageous that at least one of the said upper and / or lower guide units is provided in at least one and / or both of the following areas: For the purpose of lateral guidance, i.e. guidance of the fabric at least along one of its longitudinal edges running in the warp direction (including the so-called catch strips that may be adjacent to the actual main fabric), it is advantageous if such upper and / or lower guide is provided by one or more corresponding guide units. Alternatively or additionally, it is preferred that the fabric is guided on the upper and / or lower sides in the area adjacent to at least one of the longitudinal edges in the direction of the fabric center. For example, it is possible for the two longitudinal edges to be guided by different guide units than the fabric area in between (also referred to as the main fabric).In another embodiment, a lower and / or upper guide unit is provided for one longitudinal edge, while the main fabric and the other longitudinal edge are guided or moved by a common lower and / or upper guide unit. All of these measures improve overall control over the fabric in the area of ​​the reed beat-up plane, depending on requirements.

[0031] The contact zone between at least one guide section of at least one guide unit—preferably all guide sections of all guide units—preferably lies within a range of 0 to 100 mm, measured from the reed beating plane, i.e., the reed position at the time of its beating against the selvedge, in the longitudinal direction of the fabric. Preferably, the contact area even lies between 0 and 50 mm.

[0032] Even if guide units are generally provided for guiding the fabric from both sides in the direction of the fabric thickness, these guide units can preferably be positioned in the direction of the fabric thickness in such a way that the fabric can be guided - temporarily or permanently - in the area of ​​the reed beat-up plane only from its underside, only from its top side and / or from both its underside and top side in contact with the fabric.

[0033] It can further advantageously be provided that the upper and / or lower guide unit is movable away from the fabric, preferably also in the direction of the fabric thickness, in order to allow easier access for an operator to otherwise difficult-to-access weaving machine parts, such as a harness. Such movement of the guide unit(s) can be realized purely mechanically, for example by means of a lever mechanism, and / or by inputting a corresponding command to the control unit and then correspondingly controlling one or more drives.

[0034] According to claim 1, in a weaving machine according to the invention, at least one guide device, which is itself the subject matter of claim 12, is provided with at least one guide unit extending at least partially across the fabric width, each of which has at least one guide section for contact-guiding the fabric in the region of the reed beat-up plane. As in the first and second disclosure aspects, at least one upper guide unit is provided for guiding the fabric on its upper side and / or at least one lower guide unit is provided for guiding the fabric on its underside. In addition, one or more guide sections of at least one guide unit as a whole have a profiling in the weft direction. The term profiling is understood here to mean a non-linear course of the guide section(s) of the at least one guide unit that contact the fabric in the weft direction.This allows variations in the thickness of the fabric in the weft direction to be taken into account without the guide section(s) losing contact with the fabric along the weft direction.

[0035] Said profiling can be implemented in various ways. In a very simple case, for example, as continuous, non-linear profiling across a section of the fabric or across the entire width of the fabric, viewed in the weft direction. For example, the at least one guide unit is rigid, meaning it does not rotate about an axis of rotation extending, for example, in the weft direction. Fabrics with thicknesses that vary in the weft direction but remain constant in the warp direction can be advantageously guided in this way.

[0036] According to one alternative, the profiling is implemented by individual actuators arranged one behind the other in the weft direction, each of which is assigned a guide section, which together forms a guide section. The individual actuators, and thus also their guide sections, are essentially separately adjustable in the direction of the fabric thickness. In this way, the fabric areas that come into contact with these actuators can be guided in a defined manner by specifically controlling the actuators. According to a further development of this alternative, the guide sections are preferably covered with a flexible sheath, which covers the transitions between adjacent guide sections and thus contributes to fabric protection.

[0037] In another alternative, the profiling is achieved using a continuous roller with an axis of rotation running essentially parallel to the weft direction. The roller has a continuous profiling that forms the guide section. This type of profiling can also be used to guide a fabric with a thickness profile that varies in the weft direction but remains constant in cross-section, provided the profiling is designed symmetrically around the axis of rotation running in the weft direction.

[0038] Alternatively, a roller with a similar rotational axis is provided, with the roller being divided into segments arranged one behind the other in the weft direction. These segments have, at least in part, different diameters and / or are arranged eccentrically to the rotational axis, similar to a camshaft. By rotating the roller in the direction of production, fabric sections lying adjacent to one another in the weft direction can be guided at different heights on their upper and / or lower surfaces.

[0039] In yet another alternative, a roller is constructed from individual segments arranged one behind the other in the weft direction. One or more of the individual segments are each rotatable about the roller's longitudinal axis running in the weft direction. It is also possible for several individual segments to each be rotatable about an axis running eccentrically to this longitudinal axis. Overall, such designs can accommodate a wide variety of thickness changes in the fabric in the weft direction, while reliably ensuring fabric guidance.

[0040] The described designs not only accommodate changes in the fabric thickness, but also compensate for shifts in the binding point or binding edge along the fabric thickness, particularly to guide the gripper through the shed without collision. For this purpose, the profiles must be adapted accordingly to the fabric's pattern sequence.

[0041] According to a preferred further development, at least one elastic element is arranged on at least one of the guide sections. Such an elastic element, which serves in particular to protect the fabric, is designed, for example, as a hose pressurized with compressed air or as a spring. It is preferred that the at least one elastic element extends across the width of the fabric in order to guide the fabric at every point in the weft direction.

[0042] Preferably, at least one of the guide sections has a contour that is curved in the weft direction in order to be able to guide a correspondingly curved fabric in the weft direction.

[0043] The guide section(s) forming the profiling can be arranged in a stationary manner or designed to be positionable, preferably in the direction of the fabric thickness. In the latter case, such positioning can be achieved, for example, manually or with the aid of a control unit and one or more correspondingly controlled drives, e.g., within the scope of the first and / or second disclosure aspect.

[0044] The aforementioned disclosure aspects can be advantageously combined in pairs or all together.

[0045] The weaving machine according to the invention according to the various aspects of the disclosure is particularly preferably of the Jacquard type, so that an individual positioning of the individual strands is possible and also three-dimensional, ie relatively thick, fabrics of high complexity can be woven.

[0046] The fabric displacement and fabric guidance according to the invention according to the various aspects of the disclosure can also be combined with a known height displacement of the rapier in the shed in order to thereby further expand the application possibilities.

[0047] The individual guide devices can also be regarded as separate inventions, i.e. as devices according to the invention in themselves, which are intended for installation in a weaving machine.

[0048] The invention is explained in more detail below with reference to the drawings. The figures are merely exemplary embodiments, and individual features may also be combined with other embodiments. Like reference numerals denote like or equivalent elements. They show: Fig. 1 a schematic side view of essential parts of a weaving machine; Fig. 2 a schematic side view of a part of a first embodiment of a weaving machine in the area of ​​the reed beat-up plane with only one guide unit (without warp threads, without fabric); Fig. 3 a schematic side view of a part of a second embodiment of a weaving machine in the area of ​​the reed beat-up plane with two guide units (without warp threads, without fabric); Fig. 4 the schematic side view according to the Fig. 3 , now with warp threads and fabric; Fig. 5 the schematic side view according to the Fig. 4 , with lowered tissue; Fig. 6-9 four alternatives for providing information to the control unit; Fig. 10 a schematic side view of part of a weaving machine with a sensor for analyzing the fabric surface; Fig. 11 a schematic side view of part of a weaving machine with a sensor for analyzing the open shed; Fig. 12 a schematic side view of part of a weaving machine with a spring-loaded lower guide unit; Fig. 13 a schematic side view of part of a weaving machine with a fabric with thickness variations in the warp direction; Fig. 14 a schematic side view of part of a weaving machine with height-adjustable rollers as guide units; Fig. 15 a schematic side view of part of a weaving machine with vertically adjustable circulating belts as guide units; Fig. 16 a perspective view of a management facility; Fig. 17 a top view of a fabric with various guiding devices, and Fig. 18-22 various designs of guide units in longitudinal section (section in firing direction).

[0049] Figur 1 shows a schematic side view of a possible embodiment of a weaving machine 1. A plurality of warp threads 80 running alongside one another are provided, for example, by a warp beam 2 (alternatively by a creel) and fed in the warp direction KR (see arrow) via a back rest 3 and, after passing a warp thread monitor 4, to a shedding device 5, the shedding means of which are preferably formed by healds 6 that are known to be oscillating and movable in opposite directions to one another in order to open or close a shed 9. According to a preferred embodiment, the shedding device 5 is of the Jacquard type.

[0050] A weft insertion device 7 (only indicated) has a weft insertion means 8, which in this case is designed as a thread gripper and transports weft threads through the open shed 9. Furthermore, the weaving machine 1 has a reed 10, by means of which an inserted weft thread can be beaten onto the so-called binding point 11 of the already produced fabric 82. For this purpose, the reed 10 is rotatably mounted about an axis 10a. The finished fabric 82 is drawn off by means of a take-off device 12, only indicated schematically, for example horizontally - especially with thicker fabrics - or for winding onto a cloth beam (not shown).

[0051] A control unit 15 is connected to and controls various drives. A drive 16 is connected to the warp beam 2, a drive 17 to the shedding device 5, a drive 18 to the reed 10, and another drive 19 to the take-off device 12. This drive concept is chosen merely as an example; other concepts are readily possible. The control unit 15 also records sensor data, indicated here for the warp stop motion 4, to ensure trouble-free operation of the weaving machine 1. These devices are connected to the control unit 15 via signal-transmitting lines, as indicated by the dotted lines.

[0052] The present invention relates to a guide of the fabric 82 by means of one or more guide devices in the area of ​​the reed beat-up plane. Fig. 1 The shedding device 5 shown and described, the weft insertion device 7 with the weft insertion means 8, the reed 10 and the take-off device 12 are also present in the weaving machine(s) 1 according to the invention.

[0053] The Fig. 2 shows a guide device 30, which comprises a lower, cross-sectionally L-shaped guide unit 34, which has a guide section 35 for contacting the underside of a fabric. The lower guide section 34 guides the fabric in the immediate vicinity of the reed beat-up plane 14, ie in the plane of the beat-up of the reed 10 (in Fig. 2 (Depicted with solid lines in the open shed position and with dashed lines when beating against the selvedge; in some figures, the beaten-up reed 10 is shown in dashed lines, in others not, in order to more clearly identify the reed beating plane 14.) Optionally, and shown in dashed lines, there is an upper guide unit 32, L-shaped in cross-section, with a guide section 33, which in the present example is rigid and immovable. The upper guide unit 32, if present, serves to guide the upper side of the fabric.

[0054] The lower guide unit 34 is connected to a drive 39, which is connected to the control unit 15, which controls the drive 39 such that the lower guide unit 34 is moved in the direction of arrow f2, i.e., in the direction of the fabric thickness, in order to guide the fabric from its underside. It is of course also possible (not shown) for an upper guide unit 32 to be moved in the fabric thickness direction G by a drive connected to the control unit 15, wherein, for example, a rigid lower guide unit 34 may optionally be present.

[0055] In the Fig. 3 A guide device 30 is shown, which in this case comprises two guide units 32, 34 located one above the other. The upper guide unit 32 is arranged above a (in the Fig. 3 The upper guide unit 32 is placed on the upper side of the fabric (not shown), while the lower guide unit 34 is arranged below the fabric. In the illustrated, non-limiting embodiment, both guide units 32, 34 are L-shaped in cross-section, with each of the guide units 32, 34 having two mutually facing guide sections 33 and 35, respectively, which serve for contact with the fabric in the immediate vicinity of the reed beat-up plane 14. The reed beat-up plane 14 is the plane at which the reed 10 beats against the fabric 82 after the insertion of a weft thread.

[0056] Both guide units 32, 34 are further connected to a drive 38 and 39, respectively, which in turn are connected to the control unit 15. The control unit 15 controls the two drives 38, 39 such that they can move the guide units 32, 34 toward each other or in opposite directions as well as in the same direction, as indicated by the respective arrows f1 and f2 (corresponding to the second disclosure aspect described above). With the fabric 82 clamped (see Fig. 4 ) this is the fabric thickness direction G, which runs parallel to the reed beat-up plane 14.

[0057] The upper and / or lower guide units 32, 34 preferably extend in the weft direction across the entire fabric width. Alternatively, they can extend only over a portion of the fabric. Several upper and / or lower guide units 32, 34 running side by side in the weft direction are also feasible.

[0058] In the Fig. 3 A distance d, measured from the reed beat-up plane 14 in the direction of the fabric's longitudinal direction GR (here running parallel to the warp direction KR), is shown, not to scale. This distance d indicates the preferred area in which the guide units 32, 34 guide the fabric 82 in contact, whereby said guidance does not have to take place over this entire area, but can lie within this area. The area with the distance d from the reed beat-up plane 14 preferably extends from 0 to 100 mm, particularly preferably between 0 and 50 mm, in the fabric's longitudinal direction GR.

[0059] In the Fig. 4 is the same section of the weaving machine 1 as in the Fig. 3 shown, but this time with warp threads 80a, 80b and fabric 82. The fabric shown here is relatively thick, for example, thicker than 10 mm or even thicker than 20 mm or even thicker, although thicknesses of up to 100 mm or more are also possible. The layer-by-layer weaving of the weft threads is indicated by the meandering pattern 89, with the sheds 9 in this simplest case being alternated from top to bottom or from bottom to top, so that the weft sequence occurs sequentially in the vertical direction. The resulting fabric 82 is built up layer by layer.

[0060] The Fig. 4 represents the state of the guide units 32, 34 in their neutral position, ie without changing the position of the guide units 32, 34 in the direction of the fabric thickness G. In the Fig. 4 The uppermost layer of the fabric 82 is currently being produced, with the weft insertion means 8 being guided through the open shed 9. The shed 9 is created by upper warp threads 80a and lower warp threads 80b, for example, in the case of a shedding device designed as a Jacquard machine, by controlling the actuators for the corresponding heddles. As further Fig. 4 As can be seen, position 11a – the use of the term "binding point" would be misleading here; with thicker fabrics, it is more likely a "binding edge" which runs vertically and in the image plane in the sectional view – which in the present case is the starting point of the warp threads 80a, 80b in the direction of the open shed 9, has a large distance from the neutral shed nF, which runs at the level of the weft insertion means 8 in the warp direction KR, due to the relatively great thickness of the fabric 82. This, in turn, justifies a relatively large distance a1 of the weft insertion means to the upper warp threads 80a and a relatively small distance a2 to the lower warp threads 80b. Due to the small distance a2, there is a high risk that the weft insertion means 8 will collide with the lower warp threads 80b when passing through the open shed 9, which would stop the weaving process and lead to damage to the fabric 82 and the supplied warp threads 80.

[0061] It should also be noted that the Fig. 4 The course of the two warp threads 80a, 80b shown is merely an example, since the two warp threads 80a, 80b do not necessarily both converge in position 11a. Rather, depending on the fabric 82, it is also possible for an upper warp thread 80a to be cast on further down to the fabric 82, while a lower warp thread 80b is cast on above this upper warp thread 80a.

[0062] The fabric 82 is displaced in the fabric thickness direction G by means of at least one guide unit 32, 34, so that the weft insertion means 8 can be guided collision-free through the open shed 9. In the Fig. 4 both guide units 32, 34 are moved downwards (see arrows f1, f2), so that the position 11a is essentially at the level of the neutral shed nF and the distances a1 and a2 to the weft insertion means 8 are essentially the same, as shown in Fig. 5 is shown. Thus, the weft insertion means 8 can pass through the open shed 9 without collision.

[0063] In other words, if, according to the example of Fig. 4 just an upper (or the topmost) layer of the fabric 82 is being woven according to the fabric pattern stored in the pattern cartridge, the fabric 82 is lowered with the aid of the guide units 32, 34 on the basis of the corresponding information, which is then initiated by the control unit 15 by controlling the drives 38, 39 (see Fig. 5 ).

[0064] The control unit 15 processes information relating to the structure of the fabric 82 in the area of ​​the reed beat-up plane 14 for the corresponding control of the guide units 32, 34 (according to the first disclosure aspect described above). This information includes, for example, the position of the weft threads to be inserted next into the fabric 82, which is of great importance, especially for thicker fabrics, such as the Fig. 4 und 5 can be seen. In these figures, it is shown that the control unit 15 is connected to a memory unit 25, which stores information for the control unit 15, which converts this information into commands to the drives 38, 39 for positioning the guide units 32, 34 in the fabric thickness direction G. In the Fig. 6 bis 9 Specific embodiments of this arrangement are shown.

[0065] In the storage unit 25 according to the Fig. 6 the pattern cartridge 26 for the fabric 82 is stored. According to one embodiment, the pattern cartridge 26 itself contains not only the fabric pattern but also the aforementioned information, which includes, for example, that the layer just to be woven is the uppermost layer in the fabric 82 and therefore the guide units 32, 34 are to be lowered by half the fabric thickness in the fabric thickness direction G in order to enable the weft insertion means 8 to traverse the open shed 9 without collision.

[0066] The information can also be stored as direct control instructions in the pattern cartridge 26, which are converted by the control unit 15 into control commands for the drives 38, 39. All of this information is thus related to the current fabric structure at the selvedge 83 or in the area of ​​the reed beat-up plane 14.

[0067] According to a study published in Fig. 7 In the schematically illustrated alternative, in addition to the fabric pattern, separate information is stored in the pattern cartridge stored in the memory unit 25, for example indices which refer to a data track 27 also stored in the memory unit 25, wherein the data track 27 contains the said information for the control unit 15 for the subsequent control of the drives 38, 39. The information in the data track 27 is synchronized accordingly with the instructions for the shedding device 5 and the weft insertion device 7. When the pattern cartridge 26 is read out, the data track 27 is then also read out by the control unit 15 via the indices essentially at the same time.

[0068] Another alternative is in the Fig. 8 . In addition to a first storage unit 25, in which the pattern cartridge 26 defining the fabric pattern is stored, a second storage unit 28 is provided. This second storage unit 28 stores the information relating to the fabric structure in the area of ​​the reed beat-up plane 14. The control unit 15 accesses this information and processes it—synchronized with the actual current fabric position at the selvedge 83 or at the reed beat-up plane 14—to control the drives 38, 39 for the guide units 32, 34.

[0069] According to another alternative, which is Fig. 9 As shown schematically, the control instructions for the drives 38, 39 are calculated by a correspondingly designed algorithm 29 directly from the pattern cartridge 26, ie from the electronically stored weaving pattern, which is stored in the memory unit 25. Such a calculation is advantageously carried out continuously during the weaving operation, wherein the algorithm 29 is processed, for example, by the control unit 15 (as in Fig. 9 indicated) or by another computer unit (not shown), which then forwards the corresponding information to the control unit 15. According to an alternative, the algorithm is already used during the creation of the pattern cartridge 26 in order to pre-incorporate or store said information for controlling the drives 38, 39 into the pattern cartridge 26, which is then successively retrieved by the control unit 15 during web operation.

[0070] In the Fig. 10 An alternative is shown as to how the control unit 15 receives the said information for controlling the drives 38, 39. In the Fig. 10 In the variant shown, a sensor 50 is arranged above the upper side 84 of the fabric 82 and connected to the control unit 15. The sensor 50 is designed, for example, as an ultrasonic sensor or an optical sensor and detects the surface of the fabric 82, which is indicated by the beam cone 51. In particular, from the distance of the surface of the fabric 82 to the sensor 50, the control unit can determine whether the fabric 82 needs to be lowered or moved upwards by means of the guide units 32, 34 for trouble-free weaving operation.

[0071] The arrangement of the sensor 50 is merely exemplary. Alternatively or additionally, one sensor can detect the underside 85 of the fabric 82. More than one or two sensors are also possible. Also—again alternatively or additionally—one or more sensors can be arranged on the front side of the reed 10 and / or fixedly between one or both guide units 32, 34 and the reed 10, with said at least one sensor then being arranged in front of the reed beat-up plane.

[0072] In the Fig. 11 An alternative to controlling the drives 38, 39 is shown. Here, a sensor 55 is provided which analyses the position of the warp threads 80 (80a, 80b) in the open shed 9. For this purpose, the sensor 55 is preferably designed as an optical sensor, particularly preferably as a camera, which is arranged to the side of the shed 9 and detects the open shed 9 in the weft direction (i.e., perpendicular to the plane of the paper), as indicated by the region 56 detecting the open shed 9 in the weft direction. The optical sensor analyses the open shed 9 and, in particular, determines the position of the warp threads 80a, 80b in the shed 9, in order to detect, in particular, a possible collision of the weft insertion means 8 with the warp threads 80a, 80b. The sensor 55 transmits the measurement results or - after calculation - the analysis results to the control unit 15 (see dashed line), which then processes the results to control the drives 38, 39.

[0073] In the Fig. 12 The guide of a fabric 82 in the area of ​​the reed beat-up plane is shown, wherein the upper guide unit 32 is actively positioned by a drive 38 in the fabric thickness direction G, while the lower guide unit 34 passively follows. For this purpose, the lower guide unit 34 is, for example, subjected to spring force from one or more springs 20, as in Fig. 12 shown schematically. If the upper guide unit 32 is moved upward, the spring force presses the lower guide unit 34 from below against the fabric 82, so that contact always exists between the lower guide unit 34 and the fabric 82. Such an arrangement has the particular advantage of a simple construction. It is of course also possible for the lower guide unit 34 to be actively positioned by means of a drive, while the upper guide unit 32 is passively guided.

[0074] In the Fig. 13 an example is shown in which the fabric 82 is woven in the warp direction KR with thickness variations in order to meet special requirements for the later use of the fabric 82. In order to ensure that the fabric 82 can always be guided in the fabric thickness direction G in the area of ​​the reed beat-up plane 14 during the weaving process, the two guide units 32, 34 are constantly adjusted to the respective fabric thickness, including the necessary counter-directional movement of the two guide units 32, 34 in the fabric thickness direction G, mediated by control commands from the control unit 15 to the drives 38, 39 (see also arrows f1 and f2). However, positioning of the two guide units 32, 34 in a common direction is also possible, in particular if an upwardly or downwardly curved fabric structure is to be woven in the warp direction KR, for example with a constant fabric thickness.

[0075] An opposite movement of the two guide units 32, 34 with respect to the fabric thickness direction G with changing fabric thickness in the warp direction KR can also be realized by means of at least one active guide unit 32 or 34 from one fabric side and at least one passive, for example spring-loaded, guide unit 34 or 32 from the other fabric side.

[0076] The adaptation of the guide units 32, 34 to the fabric thickness in the warp direction KR can easily be combined with the displacement of the fabric in the area of ​​the reed beat-up plane 14 as a whole in the fabric thickness direction, as can be seen in particular from the Fig. 4 und 5 as explained above.

[0077] In the Fig. 14 und 15 There are two alternatives to the L-shaped guide units 32 according to the Fig. 2-13 According to the Fig. 14 The guide units 32 are designed as actively driven or passive rollers (see direction of rotation). Fig. 15 The guide units 32 are designed as actively driven or passively rotating belts, which—just like the rollers—can also be used to transport the fabric 82 in the warp direction KR. The rollers and rotating belts can preferably be positioned vertically, i.e., in the fabric thickness direction G, as indicated by the arrows f1 and f2. The drives and the control unit are not shown here.

[0078] In the Fig. 16 a perspective view of a possible embodiment of a guide device 30 is shown, which comprises an upper guide unit 32 and a lower guide unit 34. Both guide units 32, 34 are designed as rigid profiles that extend in the weft direction SR and are L-shaped in cross section. The upper guide unit 32 is connected by means of vertical struts 40 to a transverse profile 41 that runs parallel to the guide unit 32 and that, in turn, is connected at its two end faces (only one is shown) to a drive profile 42 that is engaged by the drive 38 in order to position the guide unit 32 in the fabric thickness direction G. The drive profile 42 is shown only schematically and can, for example, comprise a toothed rack into which a pinion driven by the drive 38 engages. A wide variety of designs are possible for moving the guide unit 32 in the fabric direction by means of the drive 38.

[0079] According to the illustrated embodiment, the lower guide unit 34 is connected to a stationary machine part 46 via a double pivot mechanism 45. The double pivot joint has two pivot arms 47 arranged one above the other, one end of which is connected to a vertical strut 48 for pivoting about the pivot axes 47a and the other end of which is connected to a vertical strut 48 for pivoting about pivot axes 47b. The vertical strut 48, in turn, is connected on the one hand to the lower guide unit 34, which is L-shaped in cross-section, and on the other hand to a transverse profile 49 running parallel to the guide unit 34, which is engaged by the drive 39 and can move upwards and downwards in a controlled and defined manner by means of the coupling to the double pivot mechanism 45 (see double arrow f2).The lower guide unit 34 performs a minimal pivoting movement via the double pivoting mechanism 45, which is accompanied by a movement of the guide section 35 of the lower guide unit 34 in or against the warp direction KR; however, this is not significant compared to the displacement in the fabric thickness direction.

[0080] In the Fig. 17 A plan view of a fabric 82 with different guide units 32 is shown, which are responsible for guiding the upper side 84 of the fabric in different fabric areas. The middle guide unit 32 is responsible for guiding the fabric area that lies between the two lateral longitudinal edges 86 of the fabric 82 (also called catching strips) running in the warp direction (KR), wherein the guide unit 32 rests against the upper side 84 of the fabric 82 in the area of ​​the selvedge 83 or the reed beat-up plane 14 (according to the embodiments according to the Fig. 2-16 ). This part of the fabric 82 is also called the main fabric. The two outer guide units 32, however, are provided for guiding the longitudinal edges 86 of the fabric 82. Such a distribution of tasks for guiding the fabric 82 is useful, for example, when the lateral longitudinal edges 86 of the fabric 82 have a different thickness than the main fabric, e.g., due to a smaller number of layers. In such a case, the respective binding edge can then be individually adjusted for the different fabric areas.

[0081] Corresponding guide units are preferably also provided on the underside of the fabric, of which one or more guide units can be provided for guiding the main fabric and one or more other guide units can be provided for guiding the lateral longitudinal edge 86. The control of all active guide units is preferably again carried out by means of control unit 15 and corresponding drives.

[0082] In an embodiment not shown, an upper (and / or lower) guide unit 32 is provided for one of the longitudinal edges 86, while the main fabric and the other longitudinal edge 86 are guided or moved with a common upper (and / or lower) guide unit 32.

[0083] In the Fig. 17 a distance d is drawn, which - as already shown by the Fig. 3 explained - defines an area starting from the reed beat-up plane 14 in the fabric longitudinal direction GR (here coinciding with the warp direction KR), in which the guide units 32 are preferably arranged.

[0084] In the Fig. 18-22 Various embodiments of guide devices 130, 230, 330 (only partially shown in each case) cut in the weft direction SR are shown, with guide units 132, 232, 332, each having different profiles 136, 236, 336 in its guide sections 133, 233, 333. As stated above, the guide sections 133, 233, 333 each have contact with the upper side 84 of the fabric 82 (not shown). It is understood that the Fig. 18-22 The profiles 136, 236, 336 shown may - alternatively or additionally - also be present on lower guide units for guiding the underside 85 of the fabric 82. It is also possible that on the upper or lower side 84, 85 a said profile 136, 236, 336 and on the lower or upper side 85, 84 flat profile sections (as in the Fig. 2-16 ) are provided (with actively driven or passive guide units). It is also possible that guide sections of the upper guide units have different profiles than guide sections of the lower guide units.

[0085] All profiles 136, 236, 336 described in more detail below have in common that they can guide fabrics 82 with different thicknesses in the weft direction SR, so that, for example, no individual warp threads from non-guided areas are lifted out of the fabric during shed opening. The guide units 132, 232, 332 of the Fig. 18-22 They preferably extend in the weft direction across the entire width of the fabric. Alternatively, they can extend only over part of the fabric. Several guide units 132, 232, 332 running side by side in the weft direction can also be implemented (alternatively and / or additionally, corresponding, profiled lower guide units for guiding the fabric on its underside).

[0086] According to the Fig. 18 The profiling 136 of the guide section 133 of the guide unit 132 is continuous in the weft direction SR and is adapted to a corresponding surface profile of the upper side 84 of a fabric 82. The guide unit 132 can be rigid or, for example, as a roller, which is then preferably designed symmetrically about a rotation axis running in the weft direction.

[0087] The embodiment of the Fig. 19 is characterized in that the profiling 236 of the guide unit 232 has individual actuators 237 arranged one behind the other in the weft direction SR, each with its own associated guide sections 233a, which together form the guide section 233. The individual actuators 237 and thus also their guide sections 233a are separately adjustable in the fabric thickness direction G by means of the control unit 15 (not shown) in order to be able to react, particularly during weaving operation, to thickness fluctuations of the fabric 82 in the weft direction SR defined in the weaving pattern, and thus to always ensure optimal fabric guidance.

[0088] The embodiment according to the Fig. 20 differs from that of the Fig. 19 merely in that the guide sections 233a are covered with a flexible covering 238, which covers the transitions between the guide sections 233a and thus protects the fabric 82 during contact.

[0089] The design of the Fig. 21 in turn differs from those of the Fig. 19 und 21 in that an elastic element 239 is arranged on the guide section 233, here designed as a hose pressurized with compressed air. In the illustration according to the Fig. 21 the lower contour of the tube is shown in a state in which it is in contact with a correspondingly contoured fabric 82 (not shown).

[0090] In the Fig. 22 Finally, the profiling 336 of the guide unit 332 is realized by a roller 337, which is mounted for rotation about a rotation axis 339 running parallel to the weft direction SR and is preferably actively set in rotation (see arrow f4). The roller 337 has several segments 338 arranged one behind the other in the weft direction SR, some of which have different diameters and are also arranged at least partially eccentrically to the rotation axis 339.

[0091] Segmented profiling, as exemplified by the designs according to Fig. 18-22 As described above, deviating positions of the formed sheds 9 in the weft direction can be compensated with regard to the fabric thickness. An example here are the above-mentioned ones on the lateral longitudinal edges 86 of the fabric 82 as well as the main fabric between these two lateral longitudinal edges 86. By means of a suitable profiling - for example with a continuous profiling 136 corresponding Fig. 18 or by means of actuators 237 according to the Fig. 19-21 - a secure fabric guidance can be achieved even with such thickness variations.

[0092] The embodiments shown in the figures can be combined in various ways. For example, the guide units 132, 232, 332 of the Fig. 18-22 with a like in the Fig. 1- 17 illustrated control unit 15 and the other associated devices, which are designed according to the first and / or the second aspect of the disclosure. Bezugszeichenliste

[0093] 1 Loom 2 Warp beam 3 Back beam 4 Warp stop motion 5 Shedding device 6 Heddles 7 Weft insertion device 8 Weft insertion means 9 Shed 10 Reed 10a Rotary axis 11 Tying point 11a Position 12 Take-off device 14 Reed beat-up plane 15 Control unit 16 Drive 17 Drive 18 Drive 19 Drive 20 Spring 25 Storage unit 26 Pattern cartridge 27 Data track 28 Second storage unit 29 Algorithm 30 Guide device 32 Guide unit 33 Guide section 34 Guide unit 35 Guide section 38 Drive 39 Drive 40 Vertical struts 41 Cross profile 42 Drive profile 45 Double pivot mechanism 46 Fixed machine part 47 Pivot arms 47a Pivot axes 47bPivoting axes 48Vertical strut 49Cross profile 50Sensor 51Beam cone 55Sensor 56Detected area 80Warp thread 80aUpper warp thread 80lower warp thread 82Fabric 83Selve edge 84Top side of the fabric 85Bottom side of the fabric 86Lateral longitudinal edges of the fabric 89Meandering course 130Guide device 132Guide unit 133Guide section136 Profiling 230 Guide device 232 Guide unit 233 Guide section 233a Guide section 236 Profiling 237 Actuators 238 Cover 239 Elastic element 330 Guide device 332 Guide unit 333 Guide section 336 Profiling 337 Roller 338 Segments 339 Rotation axis GFabric thickness direction f1-f4 Movement directions nF Neutral shed KR Warp direction SR Weft direction GR Fabric longitudinal direction a1, a2 Distances d Distance

Claims

1. Weaving machine (1), preferably a rapier weaving machine, - with a shedding device (5) for opening and closing a shed (9) formed by a plurality of warp threads (80, 80a, 80b), - with a weft insertion device (7) with a weft insertion means (8) for inserting weft threads through an open shed (9), - with a reed (10) for beating inserted weft threads onto the selvedge, - with a take-off device (12) for taking off the fabric (82), and - with at least one guide device (30; 130; 230; 330) with at least one guide unit (32, 34; 132; 232; 332) extending at least partially across the fabric width, each of which has at least one guide section (33, 35; 133; 233; 333) for contact-guiding the fabric (82) in the region of the reed beat-up plane (14), wherein at least one upper guide unit (32; 132; 232;332) for guiding the fabric (82) on its upper side (84) and / or at least one lower guide unit (34) for guiding the fabric (82) on its lower side (85) are provided, ; characterized by that one or more guide sections (33, 35; 133; 233; 333) of at least one guide unit (32, 34; 132; 232; 332) have a profile (136; 236; 336) in the weft direction (SR).

2. Weaving machine (1) according to claim 1, characterized by thatthe profiling (136; 236; 336) of the at least one guide section (33, 35; 133; 233; 333) of the at least one guide unit (32, 34; 132; 232; 332) is realized according to at least one of the following embodiments: - continuous profiling (136) seen in the weft direction (SR); - individual actuators (237) arranged one behind the other in the weft direction (SR) with respectively assigned guide sections (233a), which together form a guide section (233), wherein the individual actuators (237) and thus also their guide sections (233a) are substantially separately adjustable in the fabric thickness direction (G), wherein the guide sections (233a) are preferably covered with a flexible covering (238) which covers the transitions between the guide sections (233a);- a continuous roller with an axis of rotation running essentially parallel to the weft direction (SR), the roller having a continuous profiling forming the guide section; - a roller (337) with an axis of rotation (339) running essentially parallel to the weft direction (SR), the roller (337) having segments (338) arranged one behind the other in the weft direction (SR) with at least partially different diameters and / or arranged eccentrically to the axis of rotation (339); - a roller constructed from individual segments arranged one behind the other in the weft direction (SR), one or more of the individual segments being rotatable about the longitudinal axis of the roller running in the weft direction and / or about an axis running eccentrically to this longitudinal axis; 3. Weaving machine (1) according to claim 1 or 2, characterized by thatat least one elastic element (238) is arranged on at least one of the guide sections (233), for example designed as a hose pressurized with compressed air or as a spring, wherein the at least one elastic element (238) preferably extends across the width of the fabric.

4. Weaving machine (1) according to one of the preceding claims, characterized by that at least one of the guide sections (133) has a contour which is curved in the weft direction (SR) for guiding a fabric (82) which is correspondingly curved in the weft direction (SR).

5. Weaving machine (1) according to one of the preceding claims, characterized by thatone or more guide sections (33, 35; 133; 233; 333) of the upper guide unit (32; 132; 232; 332) or the lower guide unit (34) have a profiling (136; 236; 336) and one or more guide sections (33, 35; 133; 233; 333) of the lower guide unit (34) or the upper guide unit (132; 132; 232; 332) have flat profile sections.

6. Weaving machine (1) according to one of claims 1 to 4, characterized by , that one or more guide sections (33, 35; 133; 233; 333) of both the upper guide unit (32; 132; 232; 332) and the lower guide unit (34) have a profiling (136; 236; 336).

7. Weaving machine (1) according to one of the preceding claims, characterized by that Guide sections (33; 133; 233; 333) of the upper guide unit (32; 132; 232; 332) have different profiles than guide sections (35) of the lower guide unit (34).

8. Weaving machine (1) according to one of the preceding claims, characterized by thatthe at least one guide unit (32, 34; 132; 232; 332) extends in the weft direction (SR) over the entire fabric width.

9. Weaving machine (1) according to one of claims 1 to 7, characterized by , that the at least one guide unit (32, 34; 132; 232; 332) extends in the weft direction (SR) only over a part of the fabric.

10. Weaving machine (1) according to one of the preceding claims, characterized by that several guide units (32, 34; 132; 232; 332) are provided which run side by side in the firing direction (SR).

11. Weaving machine (1) according to claim 1, characterized by that in the case of a profiling (136) which is continuous as seen in the weft direction (SR) according to the first embodiment according to claim 2, the at least one guide unit (32, 34; 132; 232; 332) is rigid and cannot be rotated about an axis of rotation which runs, for example, in the weft direction.

12. Guide device (30; 130; 230; 330) for a weaving machine (1), preferably a rapier weaving machine, in particular a weaving machine (1) according to one of the preceding claims, with at least one guide unit (32, 34; 132; 232; 332) extending at least partially over the width of a fabric (82) woven in the weaving machine (1), which has at least one guide section (33, 35; 133; 233; 333) which can preferably be positioned substantially in the fabric thickness direction (G) for contact-guiding the fabric (82) in the region of the reed beat-up plane (14) of the weaving machine (1), wherein at least one upper guide unit (32; 132; 232; 332) for guiding the fabric (82) on its upper side (84) and / or at least one lower guide unit (34) for guiding the fabric (82) on the underside (85) of which are provided, characterized by thatone or more guide sections (33, 35; 133; 233; 333) of at least one guide unit (32, 34; 132; 232; 332) have a profile (136; 236; 336) in the weft direction (SR).

13. Guide device (30; 130; 230; 330) according to the preceding claim, characterized in that the guide device (30; 130; 230; 330) is designed according to one of claims 1-11.

14. Guide device (30; 130; 230; 330) according to claim 12 or 13, characterized by thatthe profiling (136; 236; 336) of the at least one guide section (33, 35; 133; 233; 333) of the at least one guide unit (32, 34; 132; 232; 332) is realized according to at least one of the following embodiments: - continuous profiling (136) seen in the weft direction (SR); - individual actuators (237) arranged one behind the other in the weft direction (SR) with respectively assigned guide sections (233a), which together form a guide section (233), wherein the individual actuators (237) and thus also their guide sections (233a) are substantially separately adjustable in the fabric thickness direction (G), wherein the guide sections (233a) are preferably covered with a flexible covering (238) which covers the transitions between the guide sections (233a);- a continuous roller with an axis of rotation running essentially parallel to the weft direction (SR), the roller having a continuous profiling forming the guide section; - a roller (337) with an axis of rotation (339) running essentially parallel to the weft direction (SR), the roller (337) having segments (338) arranged one behind the other in the weft direction (SR) with at least partially different diameters and / or arranged eccentrically to the axis of rotation (339); - a roller constructed from individual segments arranged one behind the other in the weft direction (SR), one or more of the individual segments being rotatable about the longitudinal axis of the roller running in the weft direction and / or about an axis running eccentrically to this longitudinal axis; 15. Use of a guide device (30; 130; 230; 330) according to one of claims 12-14 for a weaving machine (1) according to one of claims 1-11.

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