Device, system and method for producing a device

Abstract

The invention relates to a device (10) for at least partial reflection of electromagnetic radiation, comprising at least one base element (11), with a coating (13) being arranged in at least portions of at least one surface (12) of the base element (11), the coating (13) comprising at least one layer (H1) of a first highly refractive material and at least one layer (H2) of a second highly refractive material.

Description

[0001] Device, system and method for producing a device

[0002] Description

[0003] The invention relates to a device for at least partially reflecting electromagnetic radiation having the features of independent patent claim 1, a system having a device for at least partially reflecting electromagnetic radiation having the features of independent patent claim 10 and a method for producing a device for at least partially reflecting electromagnetic radiation having the features of independent patent claim 11.

[0004] To influence the transmission, reflection, and / or polarization properties of optical components, they are often provided with optical coatings. The optical coatings are adapted to the specific application of the optical component. For example, optical coatings can be designed to filter electromagnetic radiation or to reflect electromagnetic radiation as completely as possible. The production of optical coatings, especially with the goal of achieving high-quality optical properties, such as a coating with the highest possible reflection and / or lowest possible absorption, can be complex and costly.

[0005] It is therefore an object of the present invention to at least partially overcome at least one of the disadvantages described above. In particular, it is an object of the invention to provide an optical coating with high-quality optical properties in a simple and / or cost-effective manner. In particular, it is an object of the invention to provide a preferably broadband and low-scattering optical coating with a high reflection and / or low absorption coefficient in a simple and / or cost-effective manner.

[0006] The above object is achieved by a device having the features of independent patent claim 1, by a system having the features of independent patent claim 10, and by a method having the features of independent patent claim 11. Further features and details of the invention emerge from the subclaims, the description, and the drawings. Features and details described in connection with the device according to the invention naturally also apply in connection with the system according to the invention and / or in connection with the method according to the invention, and vice versa, so that with regard to the disclosure of the individual aspects of the invention, reference is or can always be made to each other.

[0007] According to the invention, a device for at least partially reflecting electromagnetic radiation is provided, comprising at least one base element, wherein a coating, in particular a dielectric coating, is arranged at least in sections on at least one surface of the base element, wherein the coating comprises at least one layer made of a first high-refractive index material and at least one layer made of a second high-refractive index material, and wherein the first high-refractive index material is different from the second high-refractive index material.

[0008] In other words, within the scope of the invention, a coating comprising at least two layers is arranged on a base element of a device according to the invention. The coating comprises at least one layer made of a first high-refractive-index material and at least one layer made of a second high-refractive-index material that is different from the first high-refractive-index material. With regard to the present invention, a combination of different high-refractive-index materials within a coating has proven particularly advantageous for achieving high-quality optical properties of the coating, in particular for achieving a high reflection and / or low absorption coefficient of the coating.

[0009] Within the scope of the invention, it is conceivable for the at least one layer made of a first high-index material to be a component of a layer stack, in particular a first layer stack. Furthermore, within the scope of the invention, it can be provided for the at least one layer made of a second high-index material to be a component of a layer stack, in particular a second layer stack.

[0010] Furthermore, it is conceivable that at least one layer made of a first low-refractive-index material is part of a layer stack, in particular a first layer stack. It is also conceivable that at least one layer made of a second low-refractive-index material is part of a layer stack, in particular a second layer stack.

[0011] Within the scope of the present invention, a base element is to be understood as a carrier element or carrier material that is at least partially coated with the coating. Within the scope of the invention, it can be provided that at least one base element is formed, at least partially, from a low-absorption material. In particular, it is conceivable that at least one base element is formed, at least partially, from a glass or plastic material, in particular a low-absorption quartz glass and / or a low-absorption borosilicate crown glass.

[0012] A high-index material is understood within the context of the present invention as a material having a refractive index of 1.7 or more than 1.7. A low-index material is also understood within the context of the present invention as a material having a refractive index of less than 1.7. The refractive index results from the ratio of the wavelength of the electromagnetic radiation in a vacuum to the wavelength of the electromagnetic radiation in the material in question.

[0013] The absorption coefficient of a coating indicates what proportion of the power of electromagnetic radiation incident on the coating is absorbed by the coating. The reflection coefficient of a coating indicates what proportion of the power of electromagnetic radiation incident on the coating is reflected by the coating.

[0014] Within the scope of the invention, the electromagnetic radiation can be radiation from the near-infrared range. Within the scope of the present invention, the near-infrared range is to be understood as a wavelength range between 780 nm and 3000 nm, preferably between 850 nm and 2000 nm, particularly preferably between 900 nm and 1500 nm. In particular, the electromagnetic radiation can be electromagnetic radiation from the near-infrared range with a wavelength of 1070 nm and / or 1064 nm and / or 1030 nm. Alternatively, it can be provided that the electromagnetic radiation is radiation from the ultraviolet range (UV range). Within the scope of the present invention, the UV range is to be understood as a wavelength range between 100 nm and 380 nm, preferably between 100 nm and 180 nm.Furthermore, it can be provided that the electromagnetic radiation is deep ultraviolet radiation (DUV radiation), whereby the wavelength of the DUV radiation is 193 nm or 248 nm.

[0015] Alternatively, the electromagnetic radiation may be radiation from the visible range. Within the scope of the present invention, the visible range is understood to mean a wavelength range between 380 nm and 790 nm, preferably between 400 nm and 600 nm. In particular, it may be electromagnetic radiation with a wavelength of 532 nm.

[0016] Furthermore, it can be provided that the device is a mirror for at least partially reflecting electromagnetic radiation. In particular, it can be provided that the mirror is a mirror for at least partially reflecting light radiation, particularly preferably laser radiation. Such a use of a device according to the invention has proven particularly advantageous within the scope of the invention.

[0017] It is also conceivable within the scope of the invention for the device to be a filter for filtering electromagnetic radiation. In particular, it can be provided that a filter according to the invention can be used or is used in a lithography process, preferably in the context of DUV lithography and / or e-beam lithography.

[0018] It can be provided within the scope of the invention that at least one layer, in particular all layers, of the second high-refractive index material is or are arranged starting from the surface of the base element over at least one layer, in particular over all layers, of the first high-refractive index material.

[0019] Within the scope of the invention, it can be advantageous for the first high-refractive index material to have a higher refractive index than the second high-refractive index material, wherein in particular the difference between the refractive index of the first high-refractive index material and the refractive index of the second high-refractive index material is at least 0.1. Such a difference in the refractive indices has been shown to result in particularly advantageous properties of the coating within the scope of the present invention. Within the scope of the invention, it is further conceivable that at least one layer encompassed by the coating is generated by a CVD (chemical vapor deposition) and / or a PA-CVD (plasma-assisted vapor deposition) process. Additionally or alternatively, it can be provided that at least one layer encompassed by the coating is generated by vapor deposition (thermal evaporation) or a PVD (physical vapor deposition) process.Alternatively or additionally, it is conceivable that at least one layer encompassed by the coating is generated by sputtering and / or atomic layer deposition. Within the scope of the invention, layer generation by evaporation or a PVD process has proven particularly advantageous, as this allows for particularly cost- and time-efficient layer generation. Furthermore, the advantage is that a combination of different high-index materials according to the invention can produce a coating with particularly high optical properties, in particular a high degree of reflection and / or low degree of absorption, even with layer generation exclusively by evaporation.

[0020] It is further conceivable within the scope of the invention for the vapor deposition of at least one layer encompassed by the coating to additionally be carried out with ion and / or plasma assistance. In particular, it is conceivable for at least all layers of a first high-refractive-index material and / or at least all layers of a first low-refractive-index material and / or at least all layers of a first layer stack to be vapor deposition with ion and / or plasma assistance. Alternatively or additionally, it is further conceivable for at least all layers of a second high-refractive-index material and / or at least all layers of a second low-refractive-index material and / or at least all layers of a second layer stack to be vapor deposition without ion and / or plasma assistance. As a result, it has been shown within the scope of the invention that a particularly low-absorption, broadband, low-scattering, and simultaneously highly reflective coating can be generated.

[0021] It can be provided within the scope of the invention that the coating comprises at least a first layer stack, the first layer stack comprising at least one layer made of the first high-refractive-index material and at least one layer made of a first low-refractive-index material. It is further conceivable that the first layer stack, in particular at least one or exactly one layer from the first layer stack, is arranged on a surface of the base element. It is also conceivable within the scope of the invention that the layer of the first layer stack which is arranged on the surface of the base element is formed from the first high-refractive-index material. Alternatively, however, it can also be provided that the layer of the first layer stack which is arranged on the surface of the base element is formed from the first low-refractive-index material.It is further conceivable that the first layer stack comprises exclusively layers of the first high-refractive-index material and the first low-refractive-index material.

[0022] Furthermore, with regard to the present invention, it is conceivable that the number of layers of the first high-refractive-index material in the first layer stack is equal to the number of layers of the first low-refractive-index material in the first layer stack and / or that the layers of the first high-refractive-index material and the layers of the first low-refractive-index material are arranged alternately in the first layer stack. By alternating the high- and low-refractive-index layers, a particularly high reflection of the coating can be achieved.

[0023] It is further conceivable for the coating to have at least a second layer stack, the second layer stack comprising at least one layer made of the second high-refractive index material and at least one layer made of a second low-refractive index material. It is further conceivable for the second layer stack to be arranged on the first layer stack. In other words, it can be provided that at least one or exactly one layer, in particular the bottom layer starting from a surface of the base element, of the second layer stack is arranged on a layer, in particular on the top layer starting from the surface of the base element, of the first layer stack. It can also be provided that the bottom layer of the second layer stack starting from a surface of the base element is formed from the second high-refractive index material.Alternatively, however, it can also be provided that the lowest layer of the second layer stack, starting from a surface of the base element, is formed from the second low-refractive-index material. It is also conceivable that the second layer stack comprises exclusively layers of the second high-refractive-index material and the second low-refractive-index material.

[0024] Within the scope of the invention, it can be provided that in at least one transition, in particular in all transitions, from one layer stack to a subsequently arranged layer stack, one of the two adjacent layers, in particular one above the other, of the layer stacks in question is made of a low-refractive-index material and the other layer is made of a high-refractive-index material. The transition can preferably be a transition between a first and a second layer stack or a second and a third or a third and a fourth layer stack. In other words, it can be provided that in a transition between two adjacent layer stacks, in particular one above the other, an alternating arrangement of high-refractive-index and low-refractive-index materials is maintained.This has shown that a particularly advantageous coating could be realized with regard to the optical properties of the device, in particular with regard to a high reflection and low absorption coefficient.

[0025] For example, with regard to a transition between the first and second layer stacks, it can be provided that the uppermost layer of the first layer stack, starting from a surface of the base element, is formed from the first high-refractive-index material, and the lowermost layer of the second layer stack, starting from a surface of the base element and arranged on the first layer stack, is formed from the second low-refractive-index material. Alternatively, it is conceivable that the uppermost layer of the first layer stack, starting from a surface of the base element, is formed from the first low-refractive-index material, and the lowermost layer of the second layer stack, starting from a surface of the base element and arranged on the first layer stack, is formed from the second high-refractive-index material. This can be applied analogously to transitions between other layer stacks.This ensures an alternating arrangement of high and low refractive index materials even at a transition between two layer stacks.

[0026] Furthermore, with regard to the present invention, it is conceivable that the number of layers of the second high-refractive-index material in the second layer stack is equal to the number of layers of the second low-refractive-index material in the second layer stack and / or the layers of the second high-refractive-index material and the layers of the second low-refractive-index material are arranged alternately in the second layer stack.

[0027] Within the scope of the invention, it can be provided that a layer stack is a stack of at least two layers, wherein the layers of the layer stack are arranged one above the other starting from a surface of the base element. An alternating arrangement of layers of different materials is meant here to be an alternating arrangement. With regard to a first high-refractive-index material and a first low-refractive-index material, for example, a layer of the first high-refractive-index material would be followed by a layer of the first low-refractive-index material and a layer of the first low-refractive-index material would be followed by a layer of the first high-refractive-index material. Within the scope of the invention, it can be provided that each layer stack comprises only layers of a high-refractive-index material and layers of a low-refractive-index material.

[0028] It can further be provided within the scope of the invention that the coating comprises more than two, in particular at least three, preferably at least four or at least five, layer stacks, wherein the layer stacks are preferably arranged one above the other starting from the surface of the base element. It can be provided within the scope of the invention that at least three layer stacks are provided, wherein at least one layer stack comprises at least one layer made of a third high-refractive-index material and at least one layer made of a third low-refractive-index material. At least one layer stack, in particular each layer stack, can have an alternating arrangement of layers made of high-refractive-index and low-refractive-index materials.

[0029] It is also conceivable for the coating to comprise a layer of a third high-refractive index material as a cover layer, wherein in particular the third high-refractive index material is the same as the second high-refractive index material. Alternatively, it can be provided that the coating comprises a layer of a third low-refractive index material as a cover layer, wherein in particular the third low-refractive index material is the same as the second low-refractive index material. A cover layer is to be understood here as an outermost layer of the coating. In other words, the cover layer of the coating is the layer which, starting from the surface of the base element, is arranged furthest away from the base element. The cover layer is also the layer which is first hit by electromagnetic radiation which strikes the coating.

[0030] Within the scope of the invention, it can be provided that the cover layer is arranged on a layer of a layer stack arranged below the cover layer with respect to the surface of the base element. Within the scope of the invention, it can be provided that an alternating arrangement of low-refractive-index materials and high-refractive-index materials is maintained at the transition between the layer stack and the cover layer.

[0031] Furthermore, it can be provided within the scope of the invention that an alternating arrangement of low-refractive-index materials and high-refractive-index materials is interrupted at the transition between the cover layer and a layer stack arranged furthest outwards from the surface of the base element or below the cover layer. In other words, it can be provided that if the layer of the layer stack in question arranged below the cover layer is made of a low-refractive-index material, the cover layer is also made of a low-refractive-index material. Alternatively, it can be provided that if the layer of the layer stack in question arranged below the cover layer is made of a high-refractive-index material, the cover layer is also made of a high-refractive-index material. For example,It can be provided that, if the second layer stack ends with a layer of the second high-refractive index material and a cover layer is arranged on this layer, the cover layer is formed from a third high-refractive index material. Alternatively, it can be provided that, if the second layer stack ends with a layer of the second low-refractive index material and a cover layer is arranged on this layer, the cover layer is formed from a third low-refractive index material. By interrupting an alternating arrangement of high-refractive index and low-refractive index materials at a transition between the outermost layer stack and a cover layer, the advantage of high reflection and low absorption of a coating has been demonstrated.

[0032] Within the scope of the invention, it is optionally possible that the first high-index material and / or the second high-index material is a material from the group of the following:

[0033] - aluminum oxide (AI2O3),

[0034] - Hafnium oxide (HfO2),

[0035] - Yttrium oxide (Y2O3),

[0036] - Scandium oxide (Sc2O3),

[0037] - Cerium dioxide (CeO2),

[0038] - Tantalum(V) oxide (Ta2O5),

[0039] - Niobium(V) oxide (Nb2O5),

[0040] - Zirconium dioxide (ZrO2),

[0041] - Titanium dioxide (TiO2),

[0042] - Mixed oxide of silicon dioxide and aluminum oxide (SiO2:AI2O3), - Mixed oxide of zirconium dioxide and hafnium oxide (ZrO2:HfO2),

[0043] - Silicon (Si),

[0044] - Silicon nitride (SiN),

[0045] - Silicon monoxide (SiO).

[0046] In particular, it is conceivable that the first high-index material is Ta2O5, TiO2, Nb2O5, or CeO2, and / or the second high-index material is HfO2, ZrO2, or ZrO2:HfO2. Such a material selection has proven particularly advantageous for producing a broadband and low-scattering optical coating with a high reflection and / or low absorption coefficient.

[0047] Furthermore, it can be provided within the scope of the invention that the first low-refractive index material and / or the second low-refractive index material is a material from the group of the following:

[0048] - Silicon dioxide (SiO2),

[0049] - Mixed oxide of silicon dioxide and aluminum oxide (SiO2:AI2O3),

[0050] - Nanoporous SiO2,

[0051] - Magnesium fluoride (MgF2),

[0052] - aluminum fluoride (AlF3),

[0053] - Cryolite (Na3AlF6).

[0054] In particular, it is conceivable that the first low-refractive-index material is SiO2 and / or that the second low-refractive-index material is SiO2. Such a material selection has proven particularly advantageous for producing a broadband and low-scattering optical coating with a high reflection and / or low absorption coefficient.

[0055] With regard to the present invention, it is conceivable that at least one layer encompassed by the coating is formed as a quarter-wave layer (λ / 4 layer). The formation of at least one layer as an λ / 4 layer can occur with respect to a wavelength of electromagnetic radiation in the range of 300 nm to 3000 nm, in particular in the range of 900 nm to 1500 nm. An λ / 4 layer is to be understood here as a layer whose optical layer thickness is 1 / 4 of the addressed wavelength of electromagnetic radiation. The optical layer thickness results from the product of the geometric layer thickness and the refractive index of the layer material. By forming individual or all layers of a coating according to the invention, the total number of layers required to achieve high-quality optical properties, in particular high reflectivity with a simultaneous high bandwidth, can be reduced.

[0056] Within the scope of the invention, it can be provided that the first layer stack has a higher absorption coefficient than the second layer stack. This has proven advantageous with regard to generating a highly reflective yet low-absorption coating.

[0057] Furthermore, it is conceivable that the coating has a reflection factor of at least 98%, in particular at least 99%, preferably at least 99.5%, particularly preferably at least 99.9%, with respect to incident electromagnetic radiation, in particular electromagnetic radiation from the near-infrared range, and / or an absorption factor of less than 20 ppm, in particular less than 10 ppm, preferably less than 2 ppm, particularly preferably less than 1.5 ppm. In this context, it can be provided that the electromagnetic radiation falls on the coating at an angle between 0° and 45°. As already explained, the absorption factor is a dimensionless (relative) value. The unit ppm (parts per million) is used as an auxiliary unit of measurement or as a representative of the factor 10' 6 (comparable to a factor of 10' 2A coating with the properties mentioned has proven particularly advantageous, particularly with regard to the use of a device according to the invention as a mirror for at least partially reflecting electromagnetic radiation.

[0058] An advantageous embodiment of the present invention is shown in a coating which comprises a first layer stack, wherein the first layer stack comprises 12 layers each of the first high-refractive-index material and a first low-refractive-index material, wherein the layers of the first high-refractive-index material and the layers of the first low-refractive-index material are arranged alternately in the first layer stack. Additionally or alternatively, it can be provided that the coating comprises a second layer stack, wherein the second layer stack, starting from a surface of the base element, in particular directly, above the first layer stack oris arranged on the first layer stack, and the second layer stack comprises 6 layers each of the second high-refractive-index material and a second low-refractive-index material, wherein the layers of the second high-refractive-index material and the layers of the second low-refractive-index material are arranged alternately in the second layer stack. It can further be provided that the bottommost layer of the first layer stack, starting from a surface of the base element, is formed from the first high-refractive-index material and / or an alternating arrangement of high-refractive-index and low-refractive-index materials is also maintained at the transition between the first and second layer stacks.Furthermore, it is conceivable for such a coating to comprise a cover layer, wherein the cover layer is arranged on the second layer stack and is formed from a third low-refractive-index material, wherein, in particular, the third low-refractive-index material is identical to the second low-refractive-index material. Such a coating has been shown to exhibit particularly high reflectivity combined with low absorption losses.

[0059] It can further be provided within the scope of the invention that a device according to the invention, in particular a device according to one of claims 1 to 9, was produced by a method according to the invention, in particular a method according to one of claims 11 to 16.

[0060] The above object is further achieved by a system according to the invention, comprising at least one device for at least partially reflecting electromagnetic radiation according to one of claims 1 to 9 and at least one emission unit for emitting electromagnetic radiation, in particular electromagnetic radiation in the near-infrared range, wherein in particular the emission unit is arranged relative to the device such that the electromagnetic radiation emitted by the emission unit at least partially strikes the coating of the device, preferably at an angle between 0° and 45°.

[0061] Furthermore, it can be provided that the device is arranged relative to the emission unit such that the electromagnetic radiation first strikes the outermost layer of the device's coating relative to the surface of the base element, in particular a cover layer. With respect to a system according to the invention, the same advantages arise as have already been described with respect to a device according to the invention.

[0062] The above object is further achieved by a method according to the invention for producing a device for at least partially reflecting electromagnetic radiation, in particular according to one of claims 1 to 9. The method comprises applying a coating to a base element of the device, wherein for applying the coating at least the following steps are carried out, in particular in the specified order: a) applying a layer of a first high-refractive index material, wherein preferably the first high-refractive index material is a material from the group Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:Al2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the first high-refractive index material is Ta2O5, TiO2, Nb2O5 or CeO2, c) applying a layer of a second high-refractive index material, wherein the second high-refractive index material is a material from the group Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2,SiO2:AI2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the second high-index material is HfO2, ZrO2 or ZrO2:HfO2, wherein the first high-index material is different from the second high-index material and wherein in particular the first high-index material has a higher refractive index than the second high-index material.

[0063] A method according to the invention enables the simple and rapid production of a coating with high-quality optical properties. In particular, a method according to the invention enables the time- and cost-efficient production of a broadband and low-scattering optical coating with a high reflection and / or low absorption coefficient. Furthermore, the same advantages arise with regard to a method according to the invention as have already been described with regard to a device according to the invention and / or a system according to the invention. Within the scope of the invention, it can be provided that individual steps of a method according to the invention are carried out repeatedly or multiple times.

[0064] Within the scope of the invention, it may be advantageous that in addition, in particular before or after step a), at least the following step is carried out: b) applying at least one layer of a first low-refractive-index material, wherein the first low-refractive-index material is preferably a material from the group SiO2, SiO2:AI2O3, nanoporous SiO2, MgF2, AlF3, Na3AlF6.

[0065] In particular, in this context, it can be provided that the first low-refractive-index material is SiO2. Within the scope of the invention, it is further conceivable that, in addition, in particular before or after step c), at least the following step is carried out: d) applying at least one layer of a second low-refractive-index material, wherein the second low-refractive-index material is preferably a material from the group SiO2, SiO2:Al2O3, nanoporous SiO2, MgF2, AlF3, Na3AlF6, in particular that the second low-refractive-index material is SiO2.

[0066] In particular, in this context it may be provided that the second low-refractive material is SiO2.

[0067] It can be provided within the scope of the invention that in addition, in particular after step d), at least the following step is carried out: e) applying a cover layer made of a third high-refractive index material, wherein in particular the third high-refractive index material is the same as the second high-refractive index material or applying a cover layer made of a third low-refractive index material, wherein in particular the third low-refractive index material is the same as the second low-refractive index material.

[0068] Within the scope of the invention, it can be provided that step e) constitutes a final step in the construction of the coating. In other words, the cover layer applied in step e) can be the last layer of the coating or the outermost layer of the coating with respect to a surface of the base element.

[0069] It is further conceivable for at least one layer encompassed by the coating to be applied by a CVD (chemical vapor deposition) and / or a PA-CVD (plasma-assisted vapor deposition) process. Additionally or alternatively, it can be provided that at least one layer encompassed by the coating is applied by vapor deposition (thermal vapor deposition) or a PVD (physical vapor deposition) process. Alternatively or additionally, it is conceivable for at least one layer encompassed by the coating to be applied by sputtering and / or atomic layer deposition. Within the scope of the invention, layer generation by vapor deposition or a PVD process has proven particularly advantageous, since this enables particularly cost- and time-efficient layer generation.Furthermore, the advantage is shown that by a combination of different high-refractive index materials according to the invention, a coating with particularly high-quality optical properties, in particular a high degree of reflection and / or low degree of absorption, can be realized even when the layer is generated exclusively by evaporation.

[0070] It is further conceivable within the scope of the invention for at least one layer encompassed by the coating to be applied by evaporation with additional ion and / or plasma assistance. In this case, it is particularly conceivable for at least all layers of a first high-refractive-index material and / or at least all layers of a first low-refractive-index material and / or at least all layers of a first layer stack to be evaporated with ion and / or plasma assistance. Alternatively or additionally, it is conceivable for at least all layers of a second high-refractive-index material and / or at least all layers of a second low-refractive-index material and / or at least all layers of a second layer stack to be evaporated without ion and / or plasma assistance. As a result, it has been shown within the scope of the invention that a particularly low-absorption, broadband, low-scattering, and simultaneously highly reflective coating can be generated.

[0071] It is also conceivable that at least steps a) and b), in particular before the first implementation of step c) and / or d), are carried out repeatedly, in particular alternately, to build up a first layer stack, so that the layers of the first high-refractive-index material and the layers of the first low-refractive-index material are arranged alternately in the first layer stack. Additionally or alternatively, it can be provided within the scope of the invention that steps a) and b) are carried out equally often, so that the number of layers of the first high-refractive-index material in the first layer stack is equal to the number of layers of the first low-refractive-index material in the first layer stack.

[0072] Within the scope of the invention, it is optionally possible for steps c) and d), in particular after performing steps a) and / or b), to be carried out repeatedly to build up a second layer stack, in particular alternately, so that the layers of the second high-refractive-index material and the layers of the second low-refractive-index material are arranged alternately in the second layer stack. Additionally or alternatively, it can be provided within the scope of the invention that steps c) and d) are carried out the same number of times, so that the number of layers of the second high-refractive-index material in the first layer stack is equal to the number of layers of the second low-refractive-index material in the second layer stack.Furthermore, within the scope of the invention, it can be provided that at least one layer of the first high-index material and / or at least one layer of the second high-index material is applied at a temperature of 200°C to 350°C, preferably 200°C to 250°C, and / or at a layer rate of 0.1 nm / s to 1 nm / s, preferably 0.2 nm / s to 0.4 nm / s. This results in the advantage of time-efficient and simultaneously high-quality layer generation.

[0073] With regard to the present invention, it is conceivable that at least one layer of the first low-refractive-index material and / or at least one layer of the second low-refractive-index material is applied at a temperature of 200°C to 350°C, preferably 200°C to 250°C, and / or at a layer rate of 0.2 nm / s to 2 nm / s, preferably 0.2 nm / s to 0.5 nm / s. This results in the advantage of time-efficient and simultaneously high-quality layer generation.

[0074] Furthermore, it can be provided within the scope of the invention that a method according to the invention is designed for producing a coating of a device according to the invention, in particular a device according to one of claims 1 to 9.

[0075] Further advantages, features, and details of the invention will become apparent from the following description, in which several embodiments of the invention are described in detail with reference to the drawings. The features mentioned in the claims and in the description may be essential to the invention individually or in any combination.

[0076] Fig. 1 is a schematic representation of a device according to the invention,

[0077] Fig. 2 is a schematic representation of a device according to the invention,

[0078] Fig. 3 is a schematic representation of a device according to the invention,

[0079] Fig. 4 is a schematic representation of a system according to the invention and

[0080] Fig. 5 is a schematic representation of a method according to the invention.

[0081] Fig. 1 shows a schematic representation of a device 10 according to the invention for at least partially reflecting electromagnetic radiation. The device 10 comprises a base element 11, wherein a coating 13 is arranged at least in sections on a surface 12 of the base element 11. The coating 13 further comprises at least one layer H1 made of a first high-refractive index material and at least one layer H2 made of a second high-refractive index material, wherein the first high-refractive index material is different from the second high-refractive index material. In the present case, it is provided that the first high-refractive index material has a higher refractive index than the second high-refractive index material, wherein the difference between the refractive indices is at least 0.1. Such a difference in the refractive indices has shown particularly advantageous properties of the coating 13 within the scope of the present invention.

[0082] Both the at least one layer H1 made of a first high-refractive index material and the at least one layer H2 made of a second high-refractive index material are each part of a layer stack 14, 15. The at least one layer H1 made of a first high-refractive index material is part of a first layer stack 14, and the layer H2 made of a second high-refractive index material is part of a second layer stack 15.

[0083] According to Fig. 1, the coating 13 is provided to comprise a first layer stack 14 and a second layer stack 15. The first layer stack 14 comprises at least one layer H1 made of the first high-refractive index material and at least one layer L1 made of a first low-refractive index material. In the present case, the first layer stack 14 comprises three layers H1, L1 each of the first high-refractive index material and the first low-refractive index material. The lowest layer H1 of the first layer stack 14, starting from the surface 12 of the base element 11, which is arranged on the surface 12 of the base element 11, is made of the first high-refractive index material. Furthermore, it can be seen from Fig. 1 that the layers H1 of the first high-refractive index material and the layers L1 of the first low-refractive index material are arranged alternately in the first layer stack 14.

[0084] According to Fig. 1, it is further provided that the second layer stack 15 comprises at least one layer H2 made of the second high-refractive-index material and at least one layer L2 made of a second low-refractive-index material. In the present case, the second layer stack 15 comprises three layers H2 made of the second high-refractive-index material and two layers L2 made of the second low-refractive-index material. Furthermore, Fig. 1 shows that the layers H2 of the second high-refractive-index material and the layers L2 of the second low-refractive-index material are arranged alternately in the second layer stack 15.

[0085] The lowest layer H2 of the second layer stack 15, starting from the surface 12 of the base element 11, is formed from the second high-refractive-index material and is arranged on the uppermost layer L1 of the first layer stack 14, starting from the surface 12 of the base element 11, which layer L1 is formed from the first low-refractive-index material. Thus, an alternating arrangement of high-refractive-index and low-refractive-index materials is maintained even at a transition between the first layer stack 14 and the second layer stack 15. This has shown that a coating 13 that is particularly advantageous with regard to the optical properties of the device, in particular with regard to a high reflection and low absorption coefficient, could be realized.

[0086] In the present case, the first layer stack 14 has a greater degree of absorption than the second layer stack 15. This has proven to be advantageous with regard to the generation of a highly reflective and at the same time low-absorption coating 13.

[0087] Furthermore, it can be seen from Fig. 1 that the coating 13 comprises a layer H3 made of a third high-refractive index material as the cover layer 16. Alternatively, the cover layer 16 could also be formed from a third low-refractive index material. Such an embodiment is shown in Fig. 3. The cover layer 16 forms the outermost layer of the coating 13 with respect to the surface 12 of the base element 11 and is arranged on the outermost layer of the second layer stack 15 with respect to the surface 12 of the base element 11. Since the second layer stack 15 ends in the direction of the cover layer 16 with a layer H2 made of the second high-refractive index material and the cover layer 16 is formed from a third high-refractive index material in the present case, an alternating arrangement of high-refractive index and low-refractive index materials is interrupted at the transition between the cover layer 16 and the second layer stack 15.This has shown the advantage of high reflection and low absorption of a coating 13.

[0088] Fig. 2 also shows a schematic representation of a device 10 according to the invention, the basic structure of which corresponds to the device 10 shown in Fig. 1. However, the first layer stack 14 begins, starting from the surface 12 of the base element 11, with a layer L1 of a first low-refractive-index material. At a transition between the first layer stack 14 and the second layer stack 15, an alternating arrangement of high-refractive-index and low-refractive-index materials is maintained. The cover layer 16 is formed, as in Fig. 1, as a layer H3 made of a third high-refractive-index material. At the transition between the second layer stack 15 and the cover layer 16, however, an alternating sequence of high- and low-refractive-index materials is also maintained due to the structure of the coating 13 being changed compared to Fig. 1.

[0089] 1 to 3, all layers H1, L1, H2, L2, H3, L3 comprised by the coating 13 were applied by vapor deposition. This enables particularly cost- and time-efficient layer generation to be achieved. Furthermore, the advantage is shown that an inventive combination of different high-refractive materials makes it possible to produce a coating 13 with particularly high-quality optical properties, in particular a high degree of reflection and / or low degree of absorption, even when the layer is generated exclusively by vapor deposition. With reference to FIGS. 1 to 3, all layers H1, L1 of the first layer stack 14 were additionally vapor deposition with ion and / or plasma assistance. All other layers H2, L2, H3, L3 of the coating 13 were generated without ion and / or plasma assistance.

[0090] Fig. 4 shows a schematic representation of a system 50 according to the invention. The system 50 comprises at least one device 10 according to the invention for at least partially reflecting electromagnetic radiation and furthermore at least one emission unit 51 for emitting electromagnetic radiation. In the present case, the emission unit 51 is designed to emit electromagnetic radiation in the near-infrared range. The electromagnetic radiation is schematically represented in Fig. 4 by the dashed line. The emission unit 51 is arranged relative to the device 10 such that the electromagnetic radiation emitted by the emission unit 51 at least partially impinges on the coating 13 of the device 10. In the present case, the electromagnetic radiation impinges on the coating 13 of the device 10 at an angle of 45°.

[0091] Furthermore, Fig. 5 shows a schematic representation of a method 100 according to the invention for producing a device 10 according to the invention for at least partially reflecting electromagnetic radiation. The method 100 comprises applying 110 a coating 13 to a base element 11 of the device 10, wherein for applying 110 the coating 13, at least the following steps are further carried out: a) applying 120 a layer H1 of a first high-refractive-index material, wherein the first high-refractive-index material is preferably a material from the group Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:Al2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the first high-refractive-index material is Ta2O5, TiO2, Nb2O5 or CeO2, b) applying 130 at least one layer L1 of a first low-refractive-index material, wherein the first low-refractive-index material is preferably a material from the group SiO2, SiO2:Al2O3, nanoporous SiO2, MgF2, AI F3, Na3AIF6 is,wherein in particular the first low-refractive index material is SiO2, c) applying 140 a layer H2 of a second high-refractive index material, wherein the second high-refractive index material is a material from the group Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:Al2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the second high-refractive index material is HfO2, ZrO2 or ZrO2:HfO2, d) applying 150 at least one layer L2 of a second low-refractive index material, wherein preferably the second low-refractive index material is a material from the group SiO2, SiO2:Al2O3, nanoporous SiO2, MgF2, AlF3, Na3AlF6, wherein in particular the second low-refractive index material is SiO2. e) applying 160 a layer H3 of a third high-refractive-index material as cover layer 16, wherein in particular the third high-refractive-index material is the same as the second high-refractive-index material, or applying 160 a layer L3 of a third low-refractive-index material as cover layer 16,wherein in particular the third low-refractive-index material is equal to the second low-refractive-index material, wherein the first high-refractive-index material is different from the second high-refractive-index material, and wherein in particular the first high-refractive-index material has a higher refractive index than the second high-refractive-index material.

[0092] List of reference symbols

[0093] 10 Device

[0094] 11 Basic element

[0095] 12 Surface

[0096] 13 Coating

[0097] 14 first layer stack

[0098] 15 second layer stack

[0099] 16 Top layer

[0100] 50 systems

[0101] 51 emission units

[0102] 100 procedures

[0103] 110 Application

[0104] 120 Application

[0105] 130 Application

[0106] 140 Application

[0107] 150 Application

[0108] 160 Application

[0109] H1 layer

[0110] L1 layer

[0111] H2 layer

[0112] L2 layer

[0113] H3 layer

[0114] L3 layer

Claims

Patent claims Device (10) for at least partially reflecting electromagnetic radiation, comprising at least one base element (11), wherein a coating (13) is arranged at least in sections on at least one surface (12) of the base element (11), wherein the coating (13) comprises at least one layer (H1) made of a first high-refractive index material and at least one layer (H2) made of a second high-refractive index material, and wherein the first high-refractive index material is different from the second high-refractive index material. Device (10) according to claim 1, characterized in that the first high-refractive index material has a higher refractive index than the second high-refractive index material, wherein in particular the difference between the refractive index of the first high-refractive index material and the refractive index of the second high-refractive index material is at least 0.1.Device (10) according to one of the preceding claims, characterized in that at least one is enclosed by the coating (13). Layer (H1, L1, H2, L2, H3, L3) is generated by vapor deposition, sputtering and / or atomic layer deposition, wherein the vapor deposition of at least one layer (H1, L1, H2, L2, H3, L3) is preferably additionally carried out with ion and / or plasma assistance. Device (10) according to one of the preceding claims, characterized in that the coating (13) comprises at least a first layer stack (14), the first layer stack (14) comprising at least one layer (H1) made of the first high-refractive index material and at least one layer (L1) made of a first low-refractive index material, wherein in particular the layers (H1) of the first high-refractive index material and the layers (L1) of the first low-refractive index material are arranged alternately. Device (10) according to one of the preceding claims, characterized in that the coating (13) has at least one second layer stack (15), the second layer stack comprising at least one layer (H2) made of the second high-refractive-index material and at least one layer (L2) made of a second low-refractive-index material, wherein in particular the layers (H2) of the second high-refractive-index material and the layers (L2) of the second low-refractive-index material are arranged alternately.Device (10) according to one of the preceding claims, characterized in that the coating (13) comprises a layer (H3) made of a third high-refractive index material as a cover layer (16), wherein in particular the third high-refractive index material is the same as the second high-refractive index material, or in that the coating (13) comprises a layer (L3) made of a third low-refractive index material as a cover layer (16), wherein in particular the third low-refractive index material is the same as the second low-refractive index material.Device (10) according to one of the preceding claims, characterized in that the first high-refractive index material and / or the second high-refractive index material is a material from the group AI2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:AI2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the first high-refractive index material is Ta2O5, TiO2, Nb2O5 or CeO2 and / or the second high-refractive index material is HfO2, and / or that the first low-refractive index material and / or the second low-refractive index material is a material from the group SiO2, SiO2:AI2O3, nanoporous SiO2, MgF2, AIF3, Na3AlF6, in particular that the first low-refractive index material is SiO2 and / or that the second low-refractive index material is SiO2. Device (10) according to one of the preceding claims, characterized in that at least one layer covered by the coating (13) Layer (H1 L1, H2, L2, H3, L3) is designed as a quarter-wavelength layer (λ / 4 layer) with respect to a wavelength in the range from 300 nm to 3000 nm, in particular in the range from 900 nm to 1500 nm. Device (10) according to one of the preceding claims, characterized in that the coating (13) has a reflectance of at least 98%, in particular at least 99%, preferably at least 99.5%, particularly preferably at least 99.9%, with respect to incident electromagnetic radiation and / or an absorption of less than 20 ppm, in particular less than 10 ppm, preferably less than 2 ppm, particularly preferably less than 1.5 ppm.System (50) comprising at least one device (10) for at least partially reflecting electromagnetic radiation according to one of claims 1 to 9 and at least one emission unit (51) for emitting electromagnetic radiation, in particular electromagnetic radiation in the near-infrared range, wherein in particular the emission unit (51) is arranged relative to the device (10) such that the electromagnetic radiation emitted by the emission unit (51) at least partially strikes the coating (13) of the device (10), preferably at an angle between 0° and 45°.Method (100) for producing a device (10) for at least partially reflecting electromagnetic radiation, in particular according to one of claims 1 to 9, the method (100) comprising applying (110) a coating (13) to a base element (11) of the device (10), wherein for applying (110) the coating (13) at least the following steps are further carried out, in particular in the specified order: a) applying (120) a layer (H1) of a first high-refractive index material, wherein the first high-refractive index material is preferably a material from the group Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:Al2O3, ZrO2:HfO2, Si, SiN, SiO, in particular that the first high-refractive index material is Ta2O5, TiO2, Nb2O5 or CeO2. c) applying (140) a layer (H2) of a second high-refractive index material, wherein the second high-refractive index material is a material from the group consisting of Al2O3, HfO2, Y2O3, Sc2O3, CeO2, Ta2O5, Nb2O5, ZrO2, TiO2, SiO2:Al2O3, ZrO2:HfO2, Si, SiN, SiO, in particular wherein the second high-refractive index material is HfO2, ZrO2 or ZrO2:HfO2, wherein the first high-refractive index material is different from the second high-refractive index material and wherein in particular the first high-refractive index material has a higher refractive index than the second high-refractive index material.Method (100) according to claim 11, characterized in that additionally, in particular after step a), at least the following step is carried out: b) applying (130) at least one layer (L1) of a first low-refractive-index material, wherein preferably the first low-refractive-index material is a material from the group SiO2, SiO2:AI2O3, nanoporous SiO2, MgF2, AI F3, Na3AlF6, wherein in particular the first low-refractive-index material is SiO2 and / or that additionally, in particular after step c), at least the following step is carried out: d) applying (150) at least one layer (L2) of a second low-refractive-index material, wherein preferably the second low-refractive-index material is a material from the group SiO2, SiO2:AI2O3, nanoporous SiO2, MgF2, AI F3, Na3AlF6, wherein in particular the second low-refractive-index material is SiO2.Method (100) according to one of claims 11 to 12, characterized in that additionally, in particular after step d), at least the following step is carried out: e) applying (160) a layer (H3) made of a third high-refractive-index material as a cover layer (16), wherein in particular the third high-refractive-index material is the same as the second high-refractive-index material, or applying (160) a layer (L3) made of a third low-refractive-index material as a cover layer (16), wherein in particular the third low-refractive-index material is the same as the second low-refractive-index material. Method (100) according to one of claims 11 to 13, characterized in that the application of at least one layer covered by the coating (13) Layer (H1, L1, H2, L2, H3, L3) is deposited by vapor deposition, sputtering and / or atomic layer deposition, wherein the vapor deposition of at least one layer (H1, L1, H2, L2, H3, L3) is preferably additionally carried out with ion and / or plasma support. Method (100) according to one of claims 11 to 14, characterized in that at least steps a) and b), in particular before the first implementation of step c) and / or d), are repeatedly carried out to build up a first layer stack (14), in particular alternately, so that the layers (H1) of the first high-refractive-index material and the layers (L1) of the first low-refractive-index material are arranged alternately in the first layer stack (14) and / or that steps c) and d), in particular after the implementation of the Steps a) and / or b) are carried out repeatedly to build up a second layer stack (15), in particular alternately, so that the layers (H2) of the second high-refractive-index material and the layers (L2) of the second low-refractive-index material are arranged alternately in the second layer stack (15). Method (100) according to one of claims 11 to 15, characterized in that at least one layer (H1) made of the first high-refractive-index material and / or at least one layer (H2) made of the second high-refractive-index material is applied at a temperature of 200°C to 350°C and / or at a layer rate of 0.1 nm / s to 1 nm / s and / or that at least one layer (L1) made of the first low-refractive-index material and / or at least one layer (L2) made of the second low-refractive-index material is applied at a temperature of 200°C to 350°C and / or at a layer rate of 0.2 nm / s to 2 nm / s.

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