EUV collector

Abstract

An EUV collector (34) is used to collect EUV usable light (10) emitted from a source region (21). A diffraction grating (24) for the EUV usable light (10) is applied to a reflective surface (30, 31, 35) of the collector (34). The EUV usable light (10) emitted from the source region (21) is diffracted by the diffraction grating (24) toward a collecting region (25). The reflective surface (30, 31, 35) is designed, at least in some sections, as a planar reflective surface (30), as a parabolic reflective surface, as a rotationally symmetrical, frustoconical reflective surface (35), or as a hollow-cylindrical reflective surface (31). It is also possible to design the reflective surface with elliptical reflective surface sections having first focal points located in the source region (21), and having second focal points (59, 60) that are spaced apart from one another and from the collecting region (25). This results in an EUV collector which makes possible, with reasonable production cost, an effective separation between EUV usable light that is intended to be collected with the aid of the collector and extraneous light having a wavelength that differs from a usable light wavelength.

Description

[0001]EUV collector. This patent application claims priority from German patent application DE 102022213822.8, the contents of which are incorporated herein by reference. The invention relates to an EUV collector. Furthermore, the invention relates to a source-collector module with such an EUV collector, illumination optics for an EUV projection exposure system with such an EUV collector, a projection exposure system with such illumination optics, a method for producing a micro- or nanostructured component using such a projection exposure system, and a component produced using such a method. An EUV collector is known from WO 2022 / 002566 A1, from US 9,541,685 B2, from US 7,084,412 B2 and from DE 102017204 312 A1.Further embodiments of an EUV collector are known from US 9,612,370 B1, DE 102013002064 A1, DE 102010 063530 A1, and US 2009 / 0289205 A1. It is an object of the present invention to further develop an EUV collector such that, with reasonable manufacturing effort, an effective separation is possible between useful EUV light, which is to be collected by the collector, and stray light with a wavelength different from a useful light wavelength. This object is achieved according to the invention by an EUV collector having the features specified in claim 1. According to the invention, it was recognized.that an EUV collector in which a stray light bundle diameter is more than twice as large as a useful light diameter in the collection area results in a reduction in the thermal load on components exposed to stray light, in particular a reduction in the thermal load on a stray light trap caused by the incidence of the stray light, which reduces the requirements for such components exposed to stray light, in particular the requirements for the stray light trap, as well as any thermal effects on components adjacent to components exposed to stray light, in particular thermal effects on components adjacent to the stray light trap. The bundle cross-section of the stray light bundle along the stray light beam path after reflection at the reflection surface is greater than twice the diameter of the bundle of EUV useful light in the collection area.The cross-section of the stray light beam along the entire stray light beam path after the source region can be larger than twice the diameter of the beam of useful EUV light in the collection region. The cross-section of the stray light beam at the location of a component exposed to stray light in the beam path after the reflection of the stray light at the reflection surface, after the source region, and especially at the location of the stray light trap can be larger than twenty times, thirty times, or even fifty times the diameter of the beam of useful EUV light in the collection region. In particular, it was recognized that it is possible to design the diffraction grating of such an EUV collector in such a way that diffractive transfer of the useful EUV light into the collection region can be ensured largely independently of the shape of the reflection surface or reflection surface sections of the EUV collector.A grating period of the diffraction grating across the reflection surface or reflection surface sections is then regularly dependent on the location of the diffraction grating on the reflection surface or reflection surface section. This dependence is deterministic for a given geometry of the arrangement of the source region to the reflection surface and for a given target position for the collection region, and there is accordingly a solution for this spatial dependence of the grating period. The diffraction grating can be designed as a blaze diffraction grating to support the diffraction effect for the useful EUV light. At least one of the reflection surface sections can be designed such that stray light emanating from the source region is reflected back to the source region after being reflected by this reflection surface section. This can improve the energy efficiency of the EUV radiation source.A stray light trap according to claim 2 can be designed to be absorbent and / or reflective and / or scattering. An EUV collector according to claim 3 with a reflection surface that is at least partially planar, parabolic, rotationally symmetrical, frustoconical, or hollow-cylindrical can be manufactured with reasonable effort with respect to this reflection surface. If a design is provided with a parabolic reflection surface at least partially, a parabolic focal point of this parabolic reflection surface can lie in the source region. A paraboloid of a corresponding parabolic reflection surface can have a vertex circle. This vertex circle can define a plane in which the source region is arranged. When using a plasma EUV radiation source, this enables multiple guidance of pump light through the source region, for example once directly and once after double reflection at the parabolic reflection surface.Two adjacent reflection surface sections of the EUV collector can merge into one another via a transition edge region. Such a transition edge region can be implemented in the form of an edge, i.e., a discontinuous transition, or in the form of a rounded, i.e., continuous transition. Alternatively, gaps can also be present between adjacent reflection surface sections, which can be used, for example, to flush the reflection surface sections with a purge or cleaning gas. A rotational symmetry of the reflection surface or of a reflection surface section according to claim 4 enables the machining of a reflection surface base body of the collector. The diffraction grating can then be applied to this base body. Reflection surface sections according to claim 5 enable the construction of a compact EUV collector.The smallest angle between the reflection surface sections can be 90°, can be 45°, can be 30°. The reflection surface sections can merge seamlessly into one another. At least one of the reflection surface sections is flat. There can also be several flat reflection surface sections and all reflection surface sections can be flat. A collector according to claim 6 with at least two flat reflection surface sections has corresponding advantages. The collector can have at least three flat reflection surface sections which form a smallest angle to one another that is greater than 7°. The number of reflection surface sections can also be greater than three. As a rule, this number is less than 20. Courses of the symmetry axis according to claim 7 are adapted to the symmetry of corresponding reflection surface sections.An embodiment according to claim 8 can be produced with comparatively little effort. Several flat reflection disks can also be provided. Each of the reflection disks can have a passage opening for the pump light. Design variants according to claim 9 have proven particularly suitable depending on the structural requirements and the reflection and diffraction requirements. The advantages of arranging the source region at a focal point of at least one parabolic reflection surface section and / or at least one ellipsoidal reflection surface section according to claim 10 have already been discussed above. The object mentioned at the outset is also achieved according to the invention by an EUV collector with the features specified in claim 11.According to the invention, it was recognized that an EUV collector with a reflection surface that is at least partially planar, parabolic, rotationally symmetric, frustoconical, or hollow-cylindrical can be manufactured with reasonable effort with respect to this reflection surface. In particular, it was recognized that it is possible to design the diffraction grating of such an EUV collector such that diffractive transfer of the useful EUV light into the collection area can be ensured largely independently of the shape of the reflection surface or reflection surface sections of the EUV collector. A grating period of the diffraction grating across the reflection surface or reflection surface sections is then generally dependent on the location of the diffraction grating on the reflection surface or on the reflection surface section.This dependency is deterministic for a given geometry of the arrangement of the source region relative to the reflection surface and for a given target position for the collection region, and there is accordingly a solution for this spatial dependence of the grating period. The diffraction grating can be designed as a blaze diffraction grating to support the diffraction effect for the useful EUV light. If a design is provided with a parabolic reflection surface, at least in sections, a parabolic focal point of this parabolic reflection surface can lie in the source region. A paraboloid of a corresponding parabolic reflection surface can have a vertex circle. This vertex circle can specify a plane in which the source region is arranged.When using a plasma EUV radiation source, this enables multiple guidance of pump light through the source region, for example once directly and once after double reflection at the parabolic reflection surface. The object mentioned above is also achieved according to the invention by an EUV collector with the features specified in claim 12. Alternatively, the EUV collector according to claim 12 can have two ellipsoidal reflection surface sections, one focal point of which lies in the source region and the other focal point of which is arranged at a distance from the collection region, wherein these further focal points are also spaced from one another. This enables reflective guidance of stray light, i.e. light emanating from the source region with a wavelength that deviates from the wavelength of the useful EUV light, to the further focal points of the ellipsoidal reflection surface sections spaced from the collection region.The ellipsoidal reflection surface sections can merge seamlessly into one another via a transition region. A continuous, i.e., edge-free transition can be provided in the transition region. Two adjacent reflection surface sections of the EUV collector can merge into one another via a transition edge region. Such a transition edge region can be realized in the form of an edge, i.e., a discontinuous transition, or in the form of a rounded, i.e., continuous transition. Alternatively, gaps can also be present between adjacent reflection surface sections, which can be used, for example, to purge the reflection surface sections with a purge or cleaning gas. The advantages of a source-collector module according to claim 13 correspond to those already explained above in connection with the EUV collector.The EUV light source can be a plasma source, which in particular has an infrared pump laser. The EUV light source can be a tin-based or xenon-based EUV light source. The diffraction grating of the EUV useful collector is preferably designed such that a wavelength range of the pump light is not diffracted by the diffraction grating. The pump light is therefore false light that cannot be diffracted by the diffraction grating. Compared to collectors in which false light of higher wavelengths is diffracted, the diffraction structures of the diffraction grating of the collector according to the invention, which diffract the EUV useful light, have smaller structure depths, which leads to shorter etching times in an etching production process. A separation of the EUV useful light from stray light can be carried out so effectively that lithography masks without protective film, in particular without pellicles, can be used in projection exposure, which further reduces reflection losses.The advantages of an illumination optics system according to claim 14, a projection exposure system according to claim 15, a manufacturing method for a micro- or nanostructured component according to claim 16, and a component manufactured by such a method according to claim 17 correspond to those already explained above with reference to the EUV collector or the source-collector module. The manufactured component can be a microchip, in particular a memory chip. According to one embodiment, the EUV collector can be an EUV collector for a mask inspection device and / or for a mask metrology device. A mask inspection system is generally known from US 10,042,248 B2, DE 10220815 A1, and WO 2012 / 101269 A1. According to one embodiment, the illumination optics may be an illumination optics for a mask inspection device and / or for a mask metrology device.The mask inspection device and / or the mask metrology device for mask inspection and / or mask metrology can comprise an EUV light source, illumination optics, and projection optics or imaging optics according to one of the exemplary embodiments described here. The projection optics or imaging optics can, in particular, magnify an image from an object plane into an image plane. Exemplary embodiments of the invention are described in more detail below with reference to the drawing. These show: Fig. 1 schematically, in a meridional section, a projection exposure system for EUV projection lithography; Fig. 2, in a meridional section, an embodiment of a collector of the projection exposure system, wherein beam paths of EUV useful light on the one hand and of stray light on the other hand are highlighted by an individual beam; Fig.3 to 7 each show, in a meridional section, further embodiments of a collector of the projection exposure system; Fig. 8 shows, in perspective, a further embodiment of a collector of the projection exposure system; and Figs. 9 to 11 each show, in a meridional section, further embodiments of a collector of the projection exposure system; Fig. 12 schematically shows parameters that can be used to determine a geometric arrangement of diffraction structures of a diffraction grating of the respective collector; and Figs. 13 to 16 each show, in a meridional section, a half-view of a further embodiment of a collector of the projection exposure system. First, the general structure of a projection exposure system 1 for microlithography is described. A Cartesian xyz coordinate system is used for the description. In Fig. 1, the x-axis runs perpendicular to the plane of the drawing. The y-axis runs to the right.The z-axis runs downwards. In connection with the description of individual components, a local Cartesian xyz coordinate system is used in Figure 2, which is arranged such that the x-axis of the local coordinate system runs parallel to the x-axis of the global coordinate system according to Figure 1, and the x- and y-axes each span a principal plane approximating a respective optical surface. Figure 1 shows a schematic meridional section of the projection exposure system 1 for microlithography. An illumination system 2 of the projection exposure system 1 has, in addition to a radiation source 3, illumination optics 4 for illuminating an object field 5 in an object plane 6. A reticle 6a arranged in the object field 5 and held by a reticle holder 6b is illuminated. Projection optics 7 serve to image the object field 5 into an image field 8 in an image plane 9.A structure on the reticle is imaged onto a light-sensitive layer of a wafer 9a arranged in the area of ​​the image field 8 in the image plane 9, which is held by a wafer holder 9b. The reticle holder 6b is driven by a reticle displacement drive 9c and the wafer holder 9b is driven by a wafer displacement drive 9d. The drives by means of the two displacement drives 9c, 9d are synchronized with one another along the y-direction. The radiation source 3 is an EUV radiation source with emitted useful radiation in the range between 5 nm and 30 nm. This can be a plasma source, for example a GDPP source (gas discharge-produced plasma) or an LPP source (laser-produced plasma).For example, tin can be excited into a plasma using a carbon dioxide laser operating at a wavelength of 10.6 μm, i.e., in the infrared range. A radiation source based on a synchrotron can also be used for the radiation source 3. Information on such a radiation source can be found, for example, in US Pat. No. 6,859,515 B2. EUV radiation 10 emanating from the radiation source 3 is bundled by a collector 11, which is described in more detail below and is only schematically indicated in Fig. 1. After the collector 11, the EUV radiation 10 propagates through an intermediate focal plane 12 before striking a field facet mirror 13 having a plurality of field facets 13a. The field facet mirror 13 is arranged in a plane of the illumination optics 4 which is optically conjugated to the object plane 6.The EUV radiation 10 is also referred to below as illumination light or imaging light. The EUV radiation 10 that is actually used for the projection exposure in the projection exposure system 1 is also referred to below as useful EUV light. Light or radiation components with a different wavelength than the useful EUV light 10 are also referred to below as false light. A useful light wavelength can be 13.5 nm. After the field facet mirror 13, the EUV radiation 10 is reflected by a pupil facet mirror 14 with a plurality of pupil facets 14a. The pupil facet mirror 14 is arranged in a pupil plane of the illumination optics 4, which is optically conjugated to a pupil plane of the projection optics 7.With the aid of the pupil facet mirror 14 and an imaging optical assembly in the form of a transmission optics 15 with mirrors 16, 17, and 18 designated in the order of the beam path for guiding the EUV radiation 10, the field facets 13a of the field facet mirror 13 are imaged superimposed onto one another into the object field 5. The last mirror 18 of the transmission optics 15 is a grazing incidence mirror (GI mirror). Depending on the design of the illumination optics 4, the transmission optics 15 can be omitted entirely or partially. Fig. 2 again shows a meridional section of a design of the collector 11. The collector 11 has a reflection surface 20 aligned toward a source region 21 of the radiation source 3, from which radiation, including the EUV radiation 10, emanates. The reflection surface 20 is designed as a flat, level reflection surface.The reflection surface 20 has a passage opening 22 for the passage of pump light 23 to generate the plasma in the source region 21. The pump light 23 can have a pump light wavelength in the infrared wavelength range, for example, in the range of 10.6 µm. The reflection surface 20 is designed as a flat reflection disk. A diffraction grating 24 for the useful EUV light 10 is applied to the reflection surface 20. The diffraction grating 24 is designed such that the useful EUV light 10, which emanates from the source region 21, is diffracted by the diffraction grating 24 toward a collection region 25. The collection region 25 lies in the intermediate focal plane 12. The reflection surface 20 can run parallel to the intermediate focal plane 12. The reflection surface 20 with the diffraction grating 24 can be designed like a Fresnel mirror. A connecting line 26 between the centers of the source region 21 and the collection region 25 is perpendicular to an arrangement plane of the reflection surface 20.The pump light 23 is radiated through the passage opening 22 along this connecting line 26 into the source region 21. The reflection surface 20 can be designed symmetrically around the connecting line 26, which then represents an axis of symmetry of the reflection surface 20 and also of the entire collector 11. The connecting line 26 can be the optical axis of the collector 11. The diffraction grating 24 is structured, e.g., blazed, such that reflection at the diffraction structures of the diffraction grating 24 supports the diffraction of the useful EUV light toward the collection region 25. Light or radiation components 27 that emanate from the source region 21 with a wavelength other than a useful light wavelength of the EUV useful light 10 and are also referred to as stray light are not diffracted by the reflection surface 20 of the collector 11, but are reflected according to the extension of the planar arrangement plane of the reflection surface 20. This is shown in Fig.2 using the example of a single beam of the false light 27. A wavelength difference between a wavelength λN of the EUV useful light 10 and a wavelength λF of the false light 27 satisfies the following relation:. This wavelength difference (left side of the above relation) can be greater than 10%, can be greater than 20%, can be greater than 25%, can be greater than 30%, can be greater than 40%, can be greater than 50%, can be greater than 90%, can be greater than 95% and can also be greater than 99%. An angle of incidence of the stray light 27 on the arrangement plane 20a of the reflection surface 20 is equal to an angle of reflection of the stray light 27 reflected by the reflection surface 20. The collector 11 according to Fig. 2 results in good spatial separation between the EUV useful light 10 and the stray light 27. The stray light 27 reflected by the reflection surface 20 can then be guided to a stray light trap 28, which is shown schematically in Fig. 2 for the illustrated individual beam of the stray light 27.The reflection surface 20 is designed such that it reflects the stray light 27 along a stray light beam path into a stray light bundle whose bundle cross-section along the entire stray light beam path between the source region 21 and a stray light trap is greater than twice the diameter of a bundle of the EUV useful light 10 in the collection region 25. This will be explained in more detail below in connection with some exemplary embodiments. Fig. 3 shows a further embodiment of a collector 29 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those explained above with reference to the collector 11 according to Figures 1 and 2 have the same reference numerals and will not be discussed in detail again. The collector 29 has two reflection surface sections 30, 31.The reflection surface section 30 of the collector 29 is again designed as a flat reflection disk similar to the reflection surface 20 of the collector 11. The reflection surface section 30 in turn has a passage opening 22 for the pump light 23. The reflection surface section 30 is adjoined by the further reflection surface section 31 of the collector 29, which is designed as a hollow circular cylindrical reflection surface section, whose inner wall 32 is used for diffraction and reflection. Both the reflection surface section 30 and the reflection surface section 31 in turn carry diffraction gratings 24 for diffracting the EUV useful light 10, as already explained above with reference to the embodiment according to Fig. 2. Fig.Figure 3 again illustrates the beam paths of individual rays, on the one hand, of the useful EUV light 10, which in turn is diffracted from the source region 21 to the collection region 25, and of the stray light 27, which is reflected by the reflection surface sections 31, 30, whereby the diffraction structures of the diffraction gratings 24 remain ineffective. The stray light 27 can, as indicated in Figure 3, be reflected multiple times by the reflection surface sections 30, 31. Where the stray light 27 leaves a beam path of the useful EUV light 10 in the region of the collector 29, a stray light trap similar to the stray light trap 28 can be arranged. In the meridional section according to Fig. 3, the reflection sections 30, 31 each form a smallest angle α of 90° to each other in a transition region 33. The connecting line 26 represents a rotational symmetry axis for the hollow circular cylinder reflection surface section 31.The source region 21 lies within the volume occupied by the hollow circular cylinder reflection surface section 31. Fig. 4 shows a further embodiment of a collector 34 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those explained above with reference to Figures 1 to 3 have the same reference numerals and will not be discussed in detail again. In addition to the flat reflection surface section 30 and the hollow circular cylinder reflection surface section 31 in the manner of the collector 29, the collector 34 has a rotationally symmetrical frustoconical reflection surface section 35 in the transition region 33, which is also referred to as a hollow cone reflection surface section. The inner wall of the hollow cone reflection surface section 35 is also used for diffraction and reflection.The hollow cone reflection surface section 35 also has the diffraction grating 24 on its inside for diffracting the useful EUV light 10 and is used reflectively for the stray light 27, whereby the diffraction grating 24 then remains ineffective. This effect of the hollow cone reflection surface section 35 is again illustrated in Fig. 4 using two individual beams, one of the useful EUV light 10 and the other of the stray light 27. The reflection surface sections 30, 31, and 35 of the collector 34 reflect the stray light 27 along a stray light beam path into a stray light beam, the beam cross-section of which is indicated in the intermediate focal plane 12 by the extent of a surface of a stray light trap 35a. The beam cross-section of the beam of stray light 27 is, along the entire stray light beam path between the source region 21 and the stray light trap 35a, greater than twice the diameter of a beam of the EUV useful light 10 in the collection region 25.The stray light 27 is thus expanded, particularly in the intermediate focal plane 12, such that it can be easily dissipated there, for example by absorption at the stray light trap 35a, and separated from the useful light 10, which passes through a passage opening 35b in the stray light trap 35a and through the latter into the collection area 25. In the transition area 33, the planar reflection surface section 30 and the hollow cone reflection surface section 35 merge into one another over a smallest angle β, which is 45°. The hollow cone reflection surface section 35 and the circular cylinder reflection surface section 31 also merge into one another over a smallest angle γ of 45°. Fig. 5 shows a further embodiment of a collector 36, which can be used instead of the collector 11 in the projection exposure system 1.Components and functions that correspond to those explained above with reference to Figures 1 to 4 have the same reference numerals and will not be discussed in detail again. The collector 36 has a reflection surface with a first, inner hollow cone reflection surface section 37, which in turn has the passage opening 22, and a second, outer hollow cone reflection surface section 38, which adjoins the inner reflection surface section 37 via a transition region 33. A smallest angle δ between the two inner reflection surface sections 37, 38 in the transition region 33 is approximately 30°. The transition region 33 can be designed as a transition edge region. In the transition region 33, there can be a rounded, continuous transition between the reflection surface sections 37, 38 that merge into one another via the transition region 33.The reflection surface sections 37, 38 in turn carry the diffraction grating 24 for diffracting the useful EUV light 10. The stray light 27 is reflected by the reflection surface sections 37, 38 without the diffraction grating 24 having an effect. Fig. 6 shows a further embodiment of a collector 39 which can be used instead of the collector 11 in the projection exposure system 1. Components and functions which correspond to those explained above with reference to Figs. 1 to 5 have the same reference numerals and will not be discussed in detail again. The collector 39 has a hollow cone reflection surface section 40 which, in the meridional section according to Fig. 6, forms an angle ε of approximately 45° with the connecting line 26, which in turn represents a rotational symmetry axis of the reflection surface section 40. The reflection surface section 40 in turn has a passage opening 22 for the pump light 23. Fig.Figure 7 shows a further embodiment of a collector 41 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those explained above with reference to Figures 1 to 6 have the same reference numerals and will not be discussed in detail again. In addition to the flat reflection disk 30 in the manner of the reflection disks of the collector embodiments according to Figures 3 and 4, the collector 41 has two further flat reflection disks 42, 43 with disk openings 44, 45 of gradually increasing diameter and with stepped distances from the reflection disk 30 along the connecting line 26, which in turn represents a rotational axis of symmetry for all three reflection disks 30, 42, 43. Depending on the design of the collector 41, the number of reflection discs can be two, four or five or can even be greater.The number of reflection disks is usually less than 20. The reflection disks 30, 42, 43 in turn carry the diffraction grating 24 for diffracting the useful EUV light 10. The stray light 27 is reflected by the reflection disks 30, 42, 43 without the diffraction grating 24 having any effect. Fig. 8 shows a further embodiment of a collector 46 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those explained above with reference to Figures 1 to 7 have the same reference numerals and will not be discussed in detail again. The collector 46 is shown in perspective in Fig. 8, wherein the viewing direction runs essentially opposite a beam direction of the pump light 23 through the passage opening 22. In meridional section, the collector 46 corresponds to the collector 29 according to Fig.3.Instead of a circular cylindrical reflection surface section 31 as in the collector 29, the collector 46 has a total of four flat reflection surface sections 47, 48, 49, 50 in addition to the reflection surface section 30. These five flat reflection surface sections 30 and 47 to 50 result in a box-shaped or cuboid-shaped basic shape of the collector 46 with a free opening in the direction of the observer in Fig. 8. The inner walls of the reflection surface sections 47 to 50, like the reflection surface section 30, in turn carry the diffraction grating 24 for diffracting the useful EUV light. The EUV false light is reflected by these inner walls without the respective diffraction grating 24 having any effect. Fig.9 shows a further embodiment of a collector 51 which can be used instead of the collector 11 in the projection exposure system 1.Components and functions corresponding to those explained above with reference to Figures 1 to 8 have the same reference numerals and will not be discussed in detail again. The collector 51 has a parabolic reflection surface 52 in the shape of a paraboloid with a vertex circle 53, in whose circular plane 54 the source region 21 lies. The connecting line 26 is perpendicular to the circular plane 54. This paraboloid shape of the reflection surface 52 of the collector 51 means that pump light, which propagates from the source region 21 towards the reflection surface 52, is reflected back into the source region 21 after being reflected twice by the parabolic reflection surface 52, which is illustrated in Figure 9 using two individual pump light or stray light beams 27. The pump light 23 thus interacts with the source region 21 at least twice, which increases the pump efficiency of the EUV radiation source 3.Stray light 27 reflected from the source region 21 not toward the reflection surface 52 can be deflected by a truncated cone-shaped stray light trap 55. Such a stray light trap is described in WO 2022 / 002566 A1 (see Fig. 2 therein). A path of the useful light 10 between the source region 21, the reflection surface 52 diffracting the useful light 10, and the collection region 25 is illustrated in Fig. 9 using two individual beams. The reflection surface 52 is in turn designed such that the stray light 27 is reflected along a stray light beam path into a stray light bundle whose bundle cross-section along the entire stray light beam path between the source region 21 and the stray light trap 55 is greater than twice the diameter of the bundle of the EUV useful light 10 in the collection region 25. Fig.Figure 10 shows a further embodiment of a collector 56 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those explained above with reference to Figures 1 to 9 have the same reference numerals and will not be discussed in detail again. The collector 56 has an ellipsoidal reflection surface composed of two ellipsoidal reflection surface sections 57, 58. A first focal point of each of these two ellipsoidal reflection surface sections 57, 58 lies in the source region 21. A second focal point 59 of the ellipsoidal reflection surface section 57 lies at a distance from the collection region 25 in Fig. 10 above the connecting line 26. A second focal point 60 of the second ellipsoidal reflection surface section 58 is also located at a distance from the collection region 25 in Fig. 10 below the connecting line 26.With respect to a plane running perpendicular to the plane of the drawing in Fig. 10, in which the connecting line 26 lies, the two second focal points 59, 60 of the ellipsoidal reflection surface sections 57, 58 are mirror-symmetrical to one another. The collector is rotationally symmetrical with respect to this connecting line 26. The two ellipsoidal reflection surface sections 57, 58 merge into one another via a transition region 33. At the location of this transition region 33, there can in turn be a passage opening corresponding to the passage opening 22 for the pump light 23 of the embodiments explained above. A transition angle between the two reflection surface sections 57, 58 in the transition region 33 is such that the reflection surface of the collector 56 with the two reflection surface sections 57, 58 is designed to be concave overall.The two ellipsoidal reflection surface sections 57, 58 in turn carry the diffraction grating 24 for diffracting the useful light 10 emanating from the source region 21 toward the collection region 25, as already explained above in connection with the explanations according to Figs. 2 to 9. This beam path of the useful light 10 is illustrated in Fig. 10 using two individual beams. The diffraction grating 24 is not effective for the stray light, and the stray light 27 is guided toward the two second focal points 59, 60, depending on whether it has been reflected by the reflection surface section 57 or 58. These second focal points 59, 60 can in turn be assigned a stray light trap, as indicated in Fig. 10 by a section of a stray light trap 60a. A beam path of two selected individual rays of the false light 27 between the source region 21 and the false light trap 60a is shown as an example in Fig.10.These individual stray light beams 27 are shown in dashed lines between the reflection surface section 57 and the stray light trap 60a. The reflection surface sections 57, 58 are designed such that they reflect the stray light 27 along a stray light beam path into a stray light bundle whose bundle cross-section along the entire stray light beam path between the source region 21 and the stray light trap 60a is larger than twice the diameter of a bundle of the EUV useful light 10 in the collection region 25. Fig. 11 shows a further embodiment of a collector 61, which can be used instead of the collector 11 in the projection exposure system 1. Components and functions corresponding to those explained above with reference to Figures 1 to 10, and in particular with reference to Figure 10, have the same reference numerals and will not be discussed in detail again. The collector 61 according to Figure 10 also11 has two ellipsoidal reflection surface sections 62, 63 comparable to the collector 56 according to Fig. 10. In the collector 61, the second focal point 59 of the ellipsoidal reflection surface section 62 lies below the connecting line 26 and the second focal point 60 of the further ellipsoidal reflection surface section 63 lies above the connecting line 26. The ellipsoids which describe the two ellipsoidal reflection surface sections 62, 63 on the one hand of the collector 61 and the two reflection surface sections 57, 58 on the other hand of the collector 56 are each identical, i.e. they have the same lengths of the major and minor axes and also the same positions of the focal points. Due to the reversal of the assignment of the second focal points to the reflection surface sections, a partially convex design of the reflection surface results in the transition region 33 of the collector 61.In this transition region 33, a passage opening for the passage of the pump light can again be arranged, as explained above in connection with the embodiments of Figs. 1 to 9. Reflection surfaces of the ellipsoidal reflection surface sections are rotationally symmetrical about the connecting line 26. The following considerations can be used to specify the grating structures of the respective diffraction grating 24, wherein a coordinate system with coordinates x and z is used, which is illustrated in particular in Figs. 2, 8 and 9. Fig. 12 schematically shows the parameters used in this consideration. A possible collector reflection surface section K is rotationally symmetrical, continuous and bijective and can therefore be represented by. where z is the rotation axis (see Fig. 10). The center of the coordinate system lies in the center of the source area 21. In the z-direction, the connecting line 26 or an optical axis of the respective collector is given. A point P on the reflection surface K has a normal direction ^ and a tangential direction ^ A beam emitted or reflected by the plasma is denoted by ^. The angle of incidence at point P on the collector reflection surface section K, relative to the normal, is θ i . It applies (3) The diffraction angle α is approximately given by where ^ describes the vector to the center of the collection area 25. The grid equation is: ^ sin ^ ^ − sin ^ = ^ ^ where α is the diffraction angle, n the diffraction order, C the wavelength of the diffracted EUV light and T the spatially dependent period. Using the representation sin ^ = √1 − cos ^ ^ follows from (5), (3) and (4): Equation (6) connects the specific design parameters of the collector surface, contained in k(x), with the location-dependent periodicity T. Thus, the location-dependent period can be calculated and thus the structure of the diffraction grating 24 can be specified for the respective collector design. For the flat reflection surface 20 of the collector 11 according to Fig. 2, = −^, where a is the distance between the center of the source area 21, i.e., the coordinate origin, and the reflection surface 20. For the parabolic collector 51 according to Fig. 9, the collector surface can be written as ^(^) = c is a measure of the distance stand between the center of the source area 21 and a point of passage of the pump light 23 through the reflection surface 52 and a is a measure of a curvature of the reflection surface 52. For the collectors 56 and 61 according to Figs. 10 and 11, the reflection surface can be described by the following formula: a and d each represent a measure for the two ellipsoid semi-axes. Depending on the design of the collector, the smallest angle that two reflection surface sections of the collector's reflection surface that merge into one another via a transition region can be greater than 7°. Fig. 13 shows a further design of a collector 64 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those already explained above with reference to Figs. 1 to 12 bear, in particular, the same reference numerals and will not be discussed again in detail.A reflection surface 65 of the collector 64 is composed of an inner spherical reflection surface section 66 radially surrounding the connecting line 26 between the source region 21 and the collection region 25, and an adjoining outer parabolic reflection surface section 67. These two reflection surface sections 66 and 67 are each rotationally symmetrical to the connecting line 26. A smallest angle between the two reflection surface sections 66, 67 is approximately 15° in the transition region 33. Fig. 14 shows a further embodiment of a collector 68 that can be used instead of the collector 11 in the projection exposure system 1. Components and functions that correspond to those already explained above with reference to Figs. 1 to 13 bear, in particular, the same reference numerals and will not be discussed again in detail. Even in the version according to Fig.14, a reflection surface 69 of the collector 68 is divided into two reflection surface sections, namely an inner reflection surface section 70 in a radius range around the connecting line 26 up to the transition region 33, designed as an ellipsoid section, and a frustoconical reflection surface section 71 directly adjoining this via the transition region 33. The two reflection surface sections 70 and 71 are in turn rotationally symmetrical about the connecting line 26. A smallest angle between the two reflection surface sections 70, 71 in the transition region 33 is approximately 30°. Fig. 15 shows a further embodiment of a collector 72 which can be used instead of the collector 11 in the projection exposure system 1. Components and functions which correspond to those described above with reference to Fig.1 to 14 have already been explained, in particular, bear the same reference numerals and will not be discussed in detail again. The collector 72 has a reflection surface 73 which is designed as a paraboloid overall. The reflection surface 73 is rotationally symmetrical about the connecting line 26. The reflection surface 73, on which the diffraction grating 24 is applied, is convex. Fig. 16 shows a further embodiment of a collector 74 which can be used instead of the collector 11 in the projection exposure system 1. Components and functions which correspond to those already explained above with reference to Figs. 1 to 15 have in particular the same reference numerals and will not be discussed in detail again. In the collector 74, an entire reflection surface 75, on which the diffraction grating 24 is applied, is designed as a conical surface which is rotationally symmetrical about the connecting line 26.Unlike, for example, the truncated spherical reflection surface 40, the conical surface is not curved around the source region 21, but rather, in projection onto the connecting line 26, a conical apex 76 of the reflection surface 75 is closest to the source region 21. Instead of a conical apex 76, a truncated cone can also be provided for the collector 74. No point on the reflection surface 75 is closer to the source region 21 than a point where the connecting line 26 intersects the reflection surface 75. When the reflection surface 75 is designed with the conical apex 76, the conical apex 76 coincides with this point of intersection. For all collector versions 11, 29, 34, 36, 39, 41, 46, 51, 64, 68, 72 and 74 explained above, the reflection surfaces orReflection surface sections reflect the stray light 27 along a stray light beam path into a stray light bundle whose bundle cross-section along the entire stray light beam path after the source region 21 is greater than twice the diameter of a bundle of the EUV useful light 10 in the collection region 25. This condition that the bundle cross-section of the stray light bundle is greater than twice the diameter of the bundle of the EUV useful light 10 in the collection region 25 can be met along an entire stray light beam path and, for example, a stray light beam path between the source region 21 and a respective stray light trap (cf. 35a in Fig. 4, 55 in Fig. 9 and 60a in Fig. 10). In general, the relationship between a reflectivity R and an angle of incidence of the EUV useful light 10 on the respective reflection surface oron the respective reflection surface section such that the reflectivity is highest at small angles of incidence close to the vertical incidence and decreases towards larger angles of incidence. The collector designs 29, 34, 36, 56, 61, 64 and 69 explained above are examples of optically structured, composite reflection surfaces such that an EUV useful light reflectivity of these reflection surfaces is greater than in the case where only one type of reflection surface shape is used, i.e. without transition region 33. With the aid of the projection exposure system 1, at least a part of the reticle in the object field 5 is imaged onto a region of a light-sensitive layer on the wafer in the image field 8 for the lithographic production of a micro- or nanostructured component, in particular a semiconductor component, for example a microchip.Depending on the design of the projection exposure system 1 as a scanner or as a stepper, the reticle and the wafer are moved in a time-synchronized manner in the y-direction continuously in scanner mode or stepwise in stepper mode.

Claims

1. EUV collector (11; 29; 34; 36; 39; 41; 46; 51; 64; 68; 72; 74) for collecting EUV useful light (10) emanating from a source region (21), - with a reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69; 73; 75) which can be aligned with the source region (21), - wherein the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69; 73; 75) a diffraction grating (24) for the EUV useful light (10) is applied and designed such that the EUV useful light (10) emanating from the source region (21) is diffracted by the diffraction grating (24) towards a collection region (25), - wherein the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69; 73; 75) is designed such that stray light (27) having a wavelength (λ N) of the EUV useful light of a different wavelength (λF) is reflected along a false light beam path into a false light bundle, the bundle cross-section of which along the false light beam path after reflection of the false light (27) at the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69; 73; 75) is greater than twice the diameter of a bundle of the EUV useful light (10) in the collection area (25).

2. EUV collector (11; 29; 34; 36; 39; 41; 46; 51; 64; 68; 72; 74) according to claim 1, characterized in that the beam cross-section of the stray light beam along the entire stray light beam path between the source region (21) and a stray light trap (35a; 55; 60a) is greater than twice the diameter of a bundle of the EUV useful light (10) in the collection region (25).

3. EUV collector according to claim 1 or 2, characterized in that the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69) is designed, at least in sections: - as a planar reflection surface (20; 30; 30, 42, 43; 30, 47 to 50), - as a parabolic reflection surface (52; 67), - as a rotationally symmetrical frustoconical reflection surface (35; 37, 38; 40; 71) or - as a hollow cylindrical reflection surface (31).

4. EUV collector according to claims 1 to 3, characterized in that the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 52) is rotationally symmetrical about an axis of symmetry (z).EUV collector according to one of claims 1 to 4, characterized in that the reflection surface has at least two reflection surface sections (30, 31; 30, 31, 35; 37, 38; 30, 47 to 50) which form a smallest angle (α, β, γ, δ, ε) with respect to one another that is greater than 7°.

6. EUV collector according to claim 5, characterized in that the reflection surface has at least two planar reflection surface sections (30, 31, 35) which form a smallest angle (β, γ) with respect to one another that is greater than 7°.

7. The EUV collector according to one of claims 4 to 6, characterized in that the axis of symmetry (z) is perpendicular to the planar reflection surface (20) or to a planar reflection surface section (30; 30, 42, 43), or that the axis of symmetry runs parallel to the extension of the reflection surface section (31).

8. The EUV collector according to one of claims 1 to 7, characterized in that the planar reflection surface (20) or at least one planar reflection surface section (30, 42, 43) is designed as a planar reflection disk with a passage opening (22) for pump light (23). 9.EUV collector according to one of claims 1 to 8, characterized by - at least one hollow circular cylinder reflection section (31), the inner wall (32) of which is used for reflection and diffraction and has the diffraction grating (24) and / or - at least one hollow cone reflection surface section (35; 37, 38; 40), the inner wall of which is used for reflection and diffraction and has the diffraction grating (24).

10. EUV collector according to one of claims 1 to 9, characterized in that, with the reflection surface aligned towards the source region (21), the source region (21) lies at a focal point of the parabolic reflection surface section (52) and / or at the focal point of at least one of the ellipsoid reflection surface sections (57, 58; 62, 63).

11. EUV collector (11; 29; 34; 36; 39; 41; 46; 51; 64; 68) for collecting EUV useful light (10) emanating from a source region (21). - with a reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69) which can be aligned with the source region (21), - wherein a diffraction grating (24) for the EUV useful light (10) is applied to the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69) and is designed such that the EUV useful light (10) emanating from the source region (21) is directed from the diffraction grating (24) to a collection region (25) is diffracted, - wherein the reflection surface (20; 30, 31; 30, 31, 35; 37, 38; 40; 30, 42, 43; 30, 47 to 50; 52; 65; 69) is designed at least in sections: -- as a flat reflection surface (20; 30; 30, 42, 43; 30, 47 to 50), -- as a parabolic reflection surface (52; 67), -- as a rotationally symmetrical frustoconical reflection surface (35; 37, 38; 40; 71) or -- as a hollow cylindrical reflection surface (31). 12.EUV collector (56; 61) for collecting useful EUV light (10) emanating from a source region (21), - with a reflection surface (57, 58; 62, 63) which can be aligned with the source region (21), - wherein a diffraction grating (24) for the useful EUV light (10) is applied to the reflection surface (57, 58; 62, 63) and is designed such that the useful EUV light (10) emanating from the source region (21) is diffracted by the diffraction grating (24) towards a collection region (25), - wherein the reflection surface (57, 58; 62, 63) has:. -- a first ellipsoidal reflection surface section (57; 62) with a first focal point located in the source region (21) and a further, second focal point (60; 59), -- a second ellipsoidal reflection surface section (58; 63) with a first focal point located in the source region (21) and a further, second focal point (59; 60), -- wherein the two further focal points (59, 60) of the two ellipsoidal reflection surface sections (57, 58; 62, 63) are spaced apart from one another and from the collection region (25).

13. Source-collector module with an EUV light source (3) and with an EUV collector (11) according to one of claims 1 to 12.

14. Illumination optics (4) for an EUV projection exposure system (1) with an EUV collector (11) according to one of claims 1 to 12. 15.A projection exposure system for EUV projection lithography, comprising an EUV light source (3) and illumination optics according to claim 14 for transferring illumination light (10) from the light source (3) into an object field (5) in which a reticle (6a) with structures to be imaged can be arranged, and comprising projection optics (7) for imaging the object field (5) into an image field (8).

16. A method for producing a micro- or nanostructured component, comprising the following steps: - providing a substrate (9a) onto which a layer of a light-sensitive material is at least partially applied. - Providing a reticle (6a) having structures to be imaged, - Projecting at least a portion of the reticle (6a) onto a region of the light-sensitive layer of the substrate (9a) using the projection exposure apparatus according to claim 15.

17. Component produced by a method according to claim 16.

Images