Soft magnetic material core and method for producing a soft magnetic material core

Abstract

The present invention discloses a layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, for producing a core (3) of a magnetic field-sensitive component, in particular with a plurality of layers, wherein the layer material is characterized in that the layer material (1) is provided on at least one side with a silica layer (2) made of water-insoluble silica.The present invention further discloses a core (3) of a magnetic field-sensitive component comprising a plurality of layers of a layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, and more specifically a metallic glass, preferably having a nanocrystalline structure, wherein the core (3) of the magnetic field-sensitive component is characterized in that a silica layer (2) of water-insoluble silica is formed between at least two layers of the layer material (1). The present invention further discloses methods for producing a core (3) of a magnetic field-sensitive component comprising a plurality of layers of a layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, and more specifically a metallic glass, preferably having a nanocrystalline structure.

Description

[0001] The present invention relates to a layered material made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, for producing a core of a magnetic field-sensitive component, in particular with a plurality of layers.

[0002] The present invention further relates to a magnetic field-sensitive component with a core having a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, and further in particular a metallic glass, preferably having a nanocrystalline structure.

[0003] The present invention further relates to a method for producing a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, comprising the steps of arranging the plurality of layers made of the layer material to form the core, and annealing the core.

[0004] Soft magnetic materials, in particular amorphous soft magnetic materials, and further, in particular, metallic glass, preferably having a nanocrystalline structure, are known from the prior art. These materials are used, for example, in electrical engineering for a wide variety of applications due to their electromagnetic properties. Examples of such applications include the detection or measurement of currents in electrical conductors or the filtering of currents.

[0005] For example, soft magnetic materials are provided in thin layers and combined to form cores by stacking the layers on top of each other. Alternatively, such cores can be produced by winding a very thin strip of the soft magnetic material. For instance, the layers of the soft magnetic material may be in an amorphous state and subsequently treated in a special furnace using an annealing process, which can give the cores a crystalline or nanocrystalline structure and make them brittle overall. This makes handling these cores after annealing very difficult, as the layers can easily break apart, typically affecting the electrical properties and other characteristics of the core.This problem not only complicates production, especially for larger cores, but also their transport and further use. For example, cores may need to be transported between different production sites, such as for potting in an end application. Transport cases or special packaging are typically used to reduce the risk of core damage. However, even the packing and unpacking of the cores can cause problems and damage to the core material, thus impairing product properties. Furthermore, there are high demands on the purity of the cores, and contamination and the inclusion of foreign matter must be avoided. For example, contamination by small metal particles can cause problems, such as...Impairments to creepage / clearance clearances or short circuits in electrical circuits can occur. Such contamination and deposits can also occur more frequently during handling of the cores for transport.

[0006] The problems mentioned above are addressed in the prior art, for example, by treating the cores with various chemicals, usually epoxy resins, whereby the cores are impregnated with these chemicals in a vacuum or the chemicals are applied as a coating to the layers of the soft magnetic material. This has disadvantages in production, such as the additional costs incurred by the chemicals, the complex processing, and the need for specialized equipment. Furthermore, many of the epoxy resins currently used for this purpose are associated with significant environmental, health, and safety risks.

[0007] An important limitation regarding the use of epoxy resins is that treatment with the epoxy resins can only take place after the cores have been annealed, as the epoxy resins cannot withstand the high temperatures of annealing. This means that the cores are initially brittle and difficult to work with after annealing, which also complicates shaping.

[0008] Another disadvantage of using epoxy resins is that the maximum operating temperature of the resin is typically lower than that of the soft magnetic material, which may limit the use of a core treated in this way compared to cores not treated with epoxy resins.

[0009] Generally, it is difficult to form the cores into desired shapes, which is why they are often manufactured in a simple ring shape. However, it would often be advantageous to form the cores into complex geometries to minimize the space required in the final application or to ensure specific magnetic lengths and cross-sections.

[0010] The present invention is therefore based on the objective of providing a layer material made of a soft magnetic material, in particular an amorphous soft magnetic material, and more specifically a metallic glass, preferably having a nanocrystalline structure, for the production of a core of a magnetic field-sensitive component, particularly with a plurality of layers, with which the aforementioned disadvantages can be at least partially overcome. In particular, the present invention is based on the objective of providing such a layer material which improves the handling of the layer material itself as well as the production of a core of a magnetic field-sensitive component, particularly with a plurality of layers, and its handling, especially after annealing of the layer material or the core.

[0011] The present invention is therefore based on the further objective of providing a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, and more specifically a metallic glass, preferably having a nanocrystalline structure, with which the aforementioned disadvantages can be at least partially overcome. In particular, the present invention is based on the objective of providing such a core with a plurality of layers made of a layer material of a soft magnetic material, the handling of which is improved, especially after annealing of the layer material or the core.

[0012] The present invention is therefore also based on the objective of providing a method for producing a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, comprising the steps of arranging the plurality of layers of the layer material to form the core, and annealing the core, with which the aforementioned disadvantages can be overcome at least partially.In particular, the present invention is based on the objective of providing such a method for producing a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, with which such a core can be produced whose handling is improved, in particular after annealing the layer material or the core.

[0013] The problem underlying the present invention is solved by a layer material having the features of claim 1. An advantageous embodiment of the layer material is described in claim 2, which depends on claim 1.

[0014] In more detail, the problem underlying the present invention is solved by a layer material made of a soft magnetic material, in particular an amorphous soft magnetic material, and further in particular a metallic glass, preferably having a nanocrystalline structure, for the production of a core of a magnetic field-sensitive component, in particular with a plurality of layers.

[0015] The layer material according to the invention is characterized in that the layer material is made up on at least one side with a silica layer made of water-insoluble silica.

[0016] The problem underlying the present invention is further solved by a core of a magnetic field-sensitive component having the features of claim 3. Advantageous embodiments of the core of the magnetic field-sensitive component are described in claims 4 to 6, which depend on claim 3.

[0017] In more detail, the problem underlying the present invention is solved by a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, and further in particular a metallic glass, preferably having a nanocrystalline structure.

[0018] The core of the magnetic field-sensitive component according to the invention is characterized in that a silica layer made of water-insoluble silica is formed between at least two layers of the layer material.

[0019] The problem underlying the present invention is further solved by a method having the features of claim 7 or claim 8. Advantageous embodiments of the corresponding methods are described in claims 9 to 16, which depend on claims 7 and 8, respectively.

[0020] In more detail, the problem underlying the present invention is achieved by a method for producing a core of a magnetic field-sensitive component with a plurality of layers made of a layer material of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, comprising the steps Arranging the majority of layers from the layered material to form the core, and annealing the core, dissolved.

[0021] The method according to the invention is characterized, on the one hand, by the fact that the method comprises the following additional steps: Preparation of a water glass solution; introduction of the water glass solution between at least two of the layers of the core, and drying of the water glass solution for silicification and formation of a silica layer from water-insoluble silica.

[0022] The method according to the invention is alternatively characterized in that the method comprises the following additional steps: Preparation of a water glass solution; application of the water glass solution to at least one side of the layer material, and drying of the water glass solution to silicify and form a silica layer from water-insoluble silica.

[0023] In practice, it has been found that the silica layer, composed of water-insoluble silica, influences the properties of the layering material in such a way that the combination of the layering material and the silica layer is less brittle and therefore less prone to breakage. Compared to using layering material without a silica layer, the combination of the layering material with the silica layer results in an overall increase in stability. The electromagnetic properties are essentially determined by the layering material itself. The impact of the silica layer on the electromagnetic properties is minimal. This applies even to the layering material itself, i.e., before the core is formed. Accordingly, the layering material with the silica layer can be easily processed into a core. This also applies to the finished core with multiple layers of the layering material.

[0024] It is essentially irrelevant at what point the silica layer is applied or incorporated. For the finished core, only the presence of the silica layer(s) is relevant. Even the presence of a silica layer between two layers of the core material can make the core less brittle overall and therefore less prone to breakage. However, it is advantageous to have a silica layer between several layers, and particularly preferably between all layers of the core, as this further improves the core's properties.

[0025] The processes are similarly characterized in that the water glass solution can be applied to the layered material before the core is produced by arranging the majority of layers of the layered material, or the core is first produced from the layered material as in the prior art, and the water glass solution is then introduced between at least two of the core layers. Upon drying, the water glass solution silicifies, and a silica layer of water-insoluble silica is formed.

[0026] The silica layer, composed of water-insoluble silica, applied to or sandwiched between the layers of the coating material, results in the production of solid cores that are mechanically stable. These cores are less brittle than those produced using conventional methods, thus reducing layer breakage during manufacturing, packaging, and transport. Furthermore, this layer also prevents technical cleanliness issues, as it prevents contamination and the ingress of foreign matter.

[0027] The silica layer is also very easy and inexpensive to form, for example, by applying or introducing and then drying a water glass solution. When the alkali cations of the water glass are chemically removed from the negatively charged SiO groups, silica begins to form. The precipitated silica initially exists in an amorphous form before irreversibly transitioning into its crystalline state. Irreversible means that water glass cannot be regenerated by adding water to the silica.

[0028] Another advantage of the silica layer is its high temperature resistance, allowing it to withstand the high temperatures that can occur during core annealing. Therefore, the silica layer can be applied after annealing the cores or the layer material, as is common practice in the prior art, or even before annealing. This means that the cores, which are initially brittle and difficult to work with in the prior art, can be easily handled immediately after annealing, for example, for transport or packaging.

[0029] Furthermore, the temperature stability of the silica layer, which is usually in the range of the maximum operating temperature of the soft magnetic material or above, is advantageous, as it means that the use of the core is not limited compared to untreated cores.

[0030] Another advantage of such a core is its high stability, allowing it to be shaped into desired forms. This minimizes the space required in the final application or ensures specific magnetic lengths and cross-sections. Particularly before annealing, when the layered material and thus the cores are easy to machine, the silica layer allows for easy shaping and subsequent hardening. This is especially true if the layered material is still in an amorphous state before annealing, meaning it is not brittle and therefore easy to handle, and only transitions to a crystalline or nanocrystalline state after annealing. After annealing, the silica layer ensures the cores remain hard and stable.This can mean that the cores can even be transported without special transport cases and packaging.

[0031] If the nucleus has already formed, the water glass solution can penetrate between at least two of the nucleus layers, for example, due to capillary action. The water glass solution can therefore be introduced by applying it to an edge region of the nucleus from the outside, allowing it to penetrate between the layers from there.

[0032] Silicas are the oxygen acids of silicon. The simplest silica is monosilicic acid (orthosilicic acid) Si(OH)₄ or H₄SiO₄. The general formula for all silicas is H₂ₙ₂SiₙO₃ₙ₋₁₀. The molecular formula is typically given as SiO₂ · n H₂O. The silica layer, composed of water-insoluble silicic acid, is therefore typically based on silicon dioxide (SiO₂), which can exist, for example, in an amorphous state. The water-insoluble silicic acid remains, for instance, after the drying of a water glass solution. Drying of a water glass solution is an irreversible process; that is, after drying, the silicic acid layer cannot be dissolved by water. Nor can the silicic acid layer be converted back into water glass by adding water.

[0033] The layer material is preferably provided in the form of sheets or strips and, in accordance with the further descriptions of the core and the methods for manufacturing the core, may, for example, comprise the soft magnetic material in annealed or unannealed form.

[0034] The layer thickness of the coating material can be at least 5 µm, in particular at least 10 µm, and / or at most 200 µm, in particular at most 100 µm, preferably at most 25 µm. Particularly preferably, the layer thickness is 14 to 24 µm, in particular about 20 µm.

[0035] The core can be formed with a varying number of layers of the layering material. The total number of layers can be at least 100, in particular at least 250, preferably at least 400, and / or at most 1,500, in particular at most 1,000, preferably at most 600. Particularly preferably, the core comprises approximately 500 layers.

[0036] A "soft magnetic material" is understood to be a material that can be easily magnetized in a magnetic field. Preferably, a soft magnetic material has a coercive field strength of less than or equal to 1,000 A / m.

[0037] The soft magnetic material can in particular be an amorphous soft magnetic material, especially a metallic glass, which preferably has a nanocrystalline structure.

[0038] Preferably, the soft magnetic material comprises an alloy of iron, nickel and / or cobalt.

[0039] The amorphous atomic arrangement, highly unusual for metals, enables advantageously unique physical properties. In particular, the use of metallic glass can advantageously reduce the coercive field strength of the magnetic field-sensitive component and / or advantageously increase its permeability.

[0040] A "metallic glass" is understood to be a metal-based alloy of a material which, at the atomic level, does not have a crystalline but rather an amorphous structure, yet still exhibits metallic conductivity. Preferably, metallic glass may contain non-metallic alloying elements in addition to metallic alloying elements.

[0041] Preferably, a soft magnetic material can have the following atomic composition: [Fe 1-a Ni a ] 100-xyz-α-β-γ CU x S ​​iy B z Nb α M' β M" γ with a ≤ 0.3, 0, 6 ≤ x ≤ 1.5, 10 ≤ y ≤ 17, 5 ≤ z ≤ 14, 2 < α < 6, β ≤ 7, γ ≤ 8, where M' is at least one of the elements V, Cr, Co, Al and Zn, where M" is at least one of the elements C, Ge, P, Ga, Sb, In and Be.

[0042] Preferably, a soft magnetic material may contain 73.5 wt.% iron and / or 1 wt.% copper and / or 3 wt.% niobium and / or 13.5 wt.% silicon and / or 9 wt.% boron. Advantageously, a soft magnetic material may contain 74.5 wt.% iron and copper, wherein the copper content is less than or equal to 1 wt.%.

[0043] The application of the silica layer made of water-insoluble silica to at least one side of the layer material can be carried out in accordance with the following detailed descriptions of the methods for producing the core.

[0044] Preferably, the silica layer is applied by first preparing a water glass solution, which is then applied to at least one side of the layer material and allowed to dry, causing the water glass solution to silicify and form the silica layer from water-insoluble silica. The water glass solution can be applied in various ways, for example by spraying, dipping, or using a roller, brush, sponge, or paintbrush.

[0045] The production of the layered material with the silica layer on at least one side can therefore be achieved, for example, by applying the water glass solution to the layered material in the unannealed state and drying it there, or by applying the water glass solution to the layered material in the annealed state and drying it there. Another alternative for producing the layered material with the silica layer on at least one side is to apply the water glass solution to the layered material in the unannealed state and dry it there, and then anneal the layered material subsequently, particularly as a core.

[0046] When using the layered material to fabricate the core of a magnetic field-sensitive component with multiple layers of the same material, several layers of the material are stacked on top of each other to form the core. Therefore, the silica layer is only required on one side of the layered material to create a core where a silica layer is sandwiched between all layers of the material.

[0047] In accordance with the detailed descriptions below of the core design and the methods for producing the core, the silica layer on the layer material can have a mass that is more than 0.001% and less than 10% of the mass of the layer material, preferably more than 0.005% and less than 5% of the mass of the layer material, particularly preferably more than 0.01% and less than 1% of the mass of the layer material, and most preferably more than 0.05% and less than 0.5% of the mass of the layer material.

[0048] Preparing a water glass solution involves producing the water glass solution as an aqueous solution of water glass. Water glass is often already provided as an aqueous solution, and preparing the water glass solution involves preparing the water glass solution with the desired concentration, i.e., diluting the provided water glass solution with water as required.

[0049] The drying of the water glass solution for silicification and the formation of a silica layer from water-insoluble silica involves a drying process in which the water is removed from the water glass solution, and the corresponding silica layer forms through a process called silicification. As described above, the silica layer consists mainly of silicon dioxide and may contain other components, such as metal salts of the water glass solution.

[0050] Preferably, in the layered material, the silica layer, consisting of water-insoluble silica, is applied across the entire surface of at least one side of the layered material, or the silica layer, consisting of water-insoluble silica, is applied to at least one side of the layered material in such a way that it only partially covers that side. The layered material with the full-surface silica layer is easy to manufacture and ensures uniform properties of the layered material. In some cases, however, it may be sufficient if the corresponding side of the layered material is only partially covered, thus saving silica.In a design of the silica layer which only partially covers at least one side of the layer material, the silica layer can be applied, for example, in regular patterns, such as spaced stripes, or in a random or quasi-random manner, such as using a spray technique or in the manner of drops.

[0051] Preferably, in the core, the silica layer, made of water-insoluble silica, is formed completely between the at least two layers of the layered material, or the silica layer, made of water-insoluble silica, is formed between the at least two layers of the layered material in such a way that it is only partially formed between the at least two layers of the layered material. The above descriptions regarding the configuration of the layered material with the silica layer, which is formed completely on at least one side of the layered material or which only partially covers at least one side of the layered material, apply accordingly.

[0052] Preferably, the silica layer of the core consists of water-insoluble silica and is a silicified layer of dried water glass solution, particularly based on potassium silicate, sodium silicate, or lithium silicate, or a mixture thereof. The mixture can contain potassium silicate and / or sodium silicate and / or lithium silicate in any combination. The use of water glass or a water glass solution offers a simple way to produce the silica layer. Water glass is typically inexpensive and readily available, making it well-suited for this purpose. The different types of water glass can be selected depending on the desired processing properties and the finished product. Potassium silicate and sodium silicate are very inexpensive, while lithium silicate is the most expensive of the aforementioned water glass types.Compared to potassium silicate and sodium silicate, lithium silicate is less fluid and has a lower viscosity, allowing it to penetrate well between layers of the coating material and, for example, completely fill existing cavities. It is also particularly water-resistant. Furthermore, when using lithium silicate, there is less risk of cracks forming in the silica layer after drying.

[0053] Furthermore, preferably, in the core, the silica layer between the at least two layers of the layering material has a mass that corresponds to more than 0.001% and less than 10% of the mass of the layering material of the core, preferably more than 0.005% and less than 5% of the mass of the layering material of the core, particularly preferably more than 0.01% and less than 1% of the mass of the layering material of the core, and most preferably more than 0.05% and less than 0.5% of the mass of the layering material of the core. It is advantageous in principle that the silica layer has sufficient thickness so that the core, together with the layering material and the silica layer, exhibits increased overall stability.On the other hand, it is desirable for the core to have as large a proportion as possible of the layered material made of the soft magnetic material in order to ensure and utilize the electromagnetic properties of the core and thus of the magnetic field-sensitive component. The impairment of the electromagnetic properties by the silica layer is advantageously minimal. This applies both to the layered material itself, i.e., before the core is manufactured, and to the finished core with its multiple layers. Accordingly, the layered material with the silica layer can be easily processed into a core.

[0054] Preferably, the method further comprises arranging the multiple layers of the layering material to form the core by winding the layering material to form the core. Accordingly, the layering material is provided, for example, as a tape. In this way, the core can be easily formed from the multiple layers of the layering material. Handling the layering material is particularly easy for winding, and positioning of the layering material essentially only needs to be in the lateral direction so that the individual layers lie on top of each other in the core. Positioning of the layering material in the longitudinal direction of the tape is automatic.

[0055] In the process, the preparation of the water glass solution preferably comprises producing the water glass solution as an aqueous solution with a water glass content of 0.01% to 99.9% by weight, preferably with a water glass content of 0.1% to 25% by weight, more preferably with a water glass content of 1% to 10% by weight, and particularly preferably with a water glass content of 3% to 7% by weight. Even if the silica layer is formed by drying the water glass solution and the onset of silicification, the concentration of the water glass solution can indeed make a difference for its handling and application. For example, the water glass solution can have a different viscosity, which is particularly relevant for the application of the water glass solution between at least two of the core layers.The viscosity has a direct effect on the capillary effect for introducing the water glass solution between the at least two layers of the core.

[0056] The concentration of the water glass solution can be selected based on the dimensions of the core being produced, as the solution must be introduced over a greater distance between the layers of the coating material in larger cores. Therefore, improved capillary action is desirable for larger cores. Another factor influencing the choice of water glass solution can be the desired core fill factor, i.e., the desired amount of water glass solution to be introduced or the desired amount of material for the silica layer. The core geometry can also be relevant for selecting the water glass solution concentration. A complex geometry can hinder the penetration of the water glass solution, making improved capillary action desirable.The choice of water glass solution can also depend on target values, such as desired core hardness or electrical properties of the core. Using a water glass solution with a lower concentration of water glass reduces the impact on the electrical properties of the cores.

[0057] Water glasses typically exhibit modulus values ​​between 1.5 and 5, depending on their silicon dioxide content. The higher the modulus value, the more viscous the water glass and the more silicon dioxide it contains.

[0058] Preferably, in this process, the annealing of the core is carried out together with the drying of the water glass solution to silicify and form the silica layer from water-insoluble silica. By combining the steps of annealing the core and drying the water glass solution to silicify and form the silica layer from water-insoluble silica, the process can be carried out efficiently. Due to the properties of water glass, i.e., its temperature stability, it can also be exposed to the high temperatures that occur during the annealing of the core. The same applies accordingly to the annealing of the layer material together with the drying of the water glass solution to silicify and form the silica layer from water-insoluble silica.

[0059] The process preferably further comprises an additional step for washing the core, particularly with water, after the drying of the water glass solution to silicify and form the silica layer from water-insoluble silica. Washing removes external contaminants from the core. Salt deposits resulting from the drying of the water glass solution during silicification and the formation of the silica layer can also be at least partially removed. This is advantageous because the salts can influence the electromagnetic properties of the core. A lower salt content typically results in a lesser impact on the core's electromagnetic properties. After washing the core, an additional step for drying the core is typically performed.

[0060] Preferably, the drying process for silicification and formation of the silica layer from water-insoluble silica further comprises drying the water glass solution using a hot air stream and / or by heating in an oven. Such processes can accelerate the drying of the water glass solution compared to drying at ambient temperature.

[0061] Preferably, the method further comprises introducing a water glass solution between at least two of the layers by immersing the core in the water glass solution, spraying the core with the water glass solution, coating the core with the water glass solution, dipping the core into the water glass solution, or pouring or pouring the water glass solution over the core. Various methods exist for introducing the water glass solution between the at least two layers of the core. Immersion allows for particularly reliable introduction by using an excess of the water glass solution. However, spraying or coating the core with the water glass solution can also be used to introduce the solution between the at least two layers in a suitable manner to form the silica layer.Since the water glass solution can no longer be applied directly to the layer material after the core has been formed, the water glass solution is introduced into a space or spaces between the at least two layers by a capillary effect.

[0062] Preferably, the method further comprises an additional step for moving the core after the water glass solution has been introduced between at least two of the layers. Moving the core allows any air bubbles present to be filled with the water glass solution. Similarly, any air remaining in the core can be displaced by the water glass solution. Moving the core is particularly effective when the core is immersed in the water glass solution, allowing more solution to flow into the core. For example, the core can be moved in the immersed water glass solution until no more air bubbles emerge from the core. Alternative steps, such as exciting the core or the water glass solution to vibrate, for example with ultrasound, can also be used to remove air between the layers and improve the penetration of the water glass solution between the layers.

[0063] Preferably, the method further comprises an additional step for shaping the core, in particular by applying an external force to an outer layer of the layered material and / or by using specific molds / gauges. The core, with its multiple layers of the layered material and the water glass solution between the at least two layers, is less brittle than the cores used in the prior art, which is why the core can be shaped without the layers breaking apart. In principle, however, it is also possible for the shaping to take place in several individual steps.

[0064] The individual steps for core production can be carried out in different sequences in the two methods, as detailed below with reference to five embodiments. The embodiments described below are purely exemplary, and it is obvious to those skilled in the art that further variations exist for the core production methods. The described steps can be carried out according to the details proposed above for each step. Additional process steps can also be added as indicated above. It is also possible, for example, to carry out the drying of the water glass solution in several partial steps; that is, the drying can be performed multiple times with identical or different parameters. In principle, the preparation of the water glass solution can be carried out at any time before the application or...The introduction of the water glass solution is carried out, and is therefore not further detailed for the five embodiments.

[0065] In a first embodiment of the process, the majority of layers of the layering material are initially arranged to form the core. The layering material is in an amorphous state and is not annealed. Subsequently, the core is annealed, causing the layering material to transition from an amorphous state to a crystalline or nanocrystalline state, in which it becomes brittle. This is followed by the introduction of a water glass solution between at least two of the core layers, and the subsequent drying of the water glass solution to silicify and form a silica layer of water-insoluble silica. In this state, the core is stabilized by the combination of the layers of the layering material, even in the crystalline or nanocrystalline state, with the silica layer(s) between the layers of the layering material.

[0066] In a second embodiment of the process, the majority of layers of the layering material are first arranged to form the core. The layering material is in an amorphous form and has not yet been annealed. The water glass solution is then introduced between at least two of the core layers. Subsequently, the core is annealed, causing the layering material to transition from an amorphous state to a crystalline or nanocrystalline state. During this process, the water glass solution automatically dries, leading to silicification and the formation of a silica layer of water-insoluble silica. Here, too, the core is ultimately stabilized by the combination of the layers of the layering material, also in the crystalline or nanocrystalline state, together with the silica layer(s) between the layers of the layering material.

[0067] In a third embodiment of the process, the water glass solution is first applied to at least one side of the layer material. Then, the majority of layers of the layer material are arranged to form the core. The layer material is in an amorphous state and has not yet been annealed. Subsequently, the core is annealed, causing the layer material to transition from the amorphous state to the crystalline or nanocrystalline state. During this process, the water glass solution automatically dries, leading to silicification and the formation of the silica layer from water-insoluble silica. Here, too, the core is ultimately stabilized by the combination of the layers of the layer material, also in the crystalline or nanocrystalline state, together with the silica layer(s) between the layers of the layer material.

[0068] In a fourth embodiment of the process, the layer material is in an amorphous form and is first annealed, so that the layer material transitions from the amorphous form to the crystalline or nanocrystalline state, in which the layer material becomes brittle. This is followed by the application of the water glass solution to at least one side of the layer material, with subsequent drying of the water glass solution to silicify and form a silica layer of water-insoluble silica. In this state, the layer material is stabilized by the combination with the silica layer(s) on it. Subsequently, multiple layers of the layer material are arranged to form the core, so that the combination of the layers of the layer material, also in the crystalline or nanocrystalline state, together with the silica layer(s), further stabilizes the layer.The silica layers between the layers of the layered material provide a stabilized core.

[0069] In a fifth embodiment of the process, the layer material is initially in an amorphous form. This is followed by the application of the water glass solution to at least one side of the layer material, with subsequent drying of the water glass solution to silicify and form a silica layer of water-insoluble silica. The majority of layers of the layer material are then arranged to form the core, with the silica layers positioned between the layers of the layer material in accordance with the previous application of the water glass solution. The layer material is then annealed, so that it transitions from the amorphous form to the crystalline or nanocrystalline state. The silica layer is temperature-stable at the annealing temperature and is not affected by the annealing process. In this state, the core is formed by the layer material in combination with the silica layer.stabilized by the silica layers on it.

[0070] Further advantages, details, and features of the invention will become apparent from the exemplary embodiments described below. Specifically, the following will be shown: Figure 1: A schematic representation of a layered material according to the invention, comprising a silica layer of water-insoluble silica on one side of the layered material according to a first embodiment of the present invention; Figure 2: A schematic representation of a core of a magnetic field-sensitive component comprising a plurality of layers of a layered material and silica layers of water-insoluble silica formed between the layers of the layered material according to a second embodiment of the present invention; Figure 3: A detailed, schematic representation of a core structure made of Figure 2with multiple layers of the layering material and silica layers formed between the layers of the layering material, consisting of water-insoluble silica; Figure 4: a flowchart of a process for producing a core from the Figures 2 and 3 according to a third embodiment of the present invention; Figure 5: a flowchart of a method for producing a core from the Figures 2 and 3according to a fourth embodiment of the present invention; Figure 6: a schematic representation of a core after a forming step according to a fifth embodiment of the present invention; Figure 7: a schematic representation of a core after a forming step according to a sixth embodiment of the present invention; Figure 8: a schematic representation of a core after a forming step according to a seventh embodiment of the present invention; and Figure 9: a schematic representation of a core after a forming step according to an eighth embodiment of the present invention.

[0071] In the following description, identical reference numerals denote identical components or identical features, so that a description of a component in relation to one figure also applies to the other figures, thus avoiding repetitive descriptions. Furthermore, individual features described in connection with one embodiment can also be used separately in other embodiments.

[0072] Figure 1 Figure 1 shows a schematic representation of a layer material 1 according to the invention, made of a soft magnetic material, in particular an amorphous soft magnetic material, and more specifically a metallic glass, preferably having a nanocrystalline structure, for producing a core 3 of a magnetic field-sensitive component, in particular with a plurality of layers, according to a first embodiment of the present invention. Such cores 3 are exemplified in the Figures 2 and 6 to 9depicted.

[0073] The layer material 1 can, for example, be used for the production of a core 3 of a magnetic field-sensitive component, which is also described below.

[0074] The layer material 1 is provided here in the form of sheets or strips and, in accordance with the further descriptions of the core 3 and the methods for manufacturing the core 3, can, for example, have the soft magnetic material in annealed or unannealed form.

[0075] The layer thickness of the layer material 1 can be, for example, at least 5 µm, in particular at least 10 µm, and / or at most 200 µm, in particular at most 100 µm, preferably at most 25 µm. Particularly preferably, the layer thickness is 14 to 24 µm, in particular about 20 µm.

[0076] A "soft magnetic material" is understood to be a material that can be easily magnetized in a magnetic field. Preferably, a soft magnetic material has a coercive field strength of less than or equal to 1,000 A / m.

[0077] The soft magnetic material can in particular be an amorphous soft magnetic material, especially a metallic glass, which preferably has a nanocrystalline structure.

[0078] Preferably, the soft magnetic material comprises an alloy of iron, nickel and / or cobalt.

[0079] A "metallic glass" is understood to be a metal-based alloy of a material which, at the atomic level, does not have a crystalline but rather an amorphous structure, yet still exhibits metallic conductivity. Preferably, metallic glass may contain non-metallic alloying elements in addition to metallic alloying elements.

[0080] Preferably, a soft magnetic material can have the following atomic composition: [Fe 1-a Ni a ] 100-xyz-α-β-γ Cu x Si y B z Nb α M' β M" γ with a ≤ 0.3, 0, 6 ≤ x ≤ 1.5, 10 ≤ y ≤ 17, 5 ≤ z ≤ 14, 2 < α ≤ 6, β ≤ 7, γ ≤ 8, where M' is at least one of the elements V, Cr, Co, Al and Zn, where M" is at least one of the elements C, Ge, P, Ga, Sb, In and Be.

[0081] Preferably, a soft magnetic material may contain 73.5 wt.% iron and / or 1 wt.% copper and / or 3 wt.% niobium and / or 13.5 wt.% silicon and / or 9 wt.% boron. Advantageously, a soft magnetic material may contain 74.5 wt.% iron and copper, wherein the copper content is less than or equal to 1 wt.%.

[0082] As from Figure 1 As can be seen, the layer material 1 is made on one side with a silica layer of water-insoluble silica.

[0083] Silicas are the oxygen acids of silicon. The simplest silica is monosilicic acid (orthosilicic acid) Si(OH)₄ or H₄SiO₄. The general formula for all silicas is H₂ₙ₂SiₙO₃ₙ₋₁₀. The molecular formula is typically given as SiO₂ · n H₂O. The silica layer, composed of water-insoluble silicic acid, is therefore typically based on silicon dioxide (SiO₂), which can exist, for example, in an amorphous state. The water-insoluble silicic acid remains, for instance, after the drying of water glass. Drying water glass is an irreversible process; that is, after drying, the silicic acid layer cannot be dissolved again by water.

[0084] In this embodiment, the silica layer is applied and formed over the entire surface of one side of the layer material 1 by applying and subsequently drying water glass solution.

[0085] First, the water glass solution is prepared, for example by mixing a commercially available water glass solution, such as a 36% solution, with water to produce a water glass solution containing five percent water glass by weight. In this embodiment, sodium silicate is used to prepare the water glass solution.

[0086] The water glass solution thus prepared is applied to one side of the layer material 1 over its entire surface. The water glass solution can be applied in various ways, for example by spraying, dipping, or with a roller, brush, sponge, or paintbrush.

[0087] The water glass solution is then dried on one side of the layer material 1, causing it to silicify and form a silica layer of water-insoluble silica. During drying, alkali cations from the water glass are chemically removed from the negatively charged SiO groups, leading to the formation of silica. The precipitated silica initially exists in an amorphous form before irreversibly transitioning to its crystalline state. Irreversible means that adding water to the silica does not regenerate water glass.

[0088] In accordance with the detailed descriptions below of the design of the core 3 and the methods for producing the core 3, the silica layer on the layering material 1 can have a mass that is more than 0.001% and less than 10% of the mass of the layering material 1, preferably more than 0.005% and less than 5% of the mass of the layering material 1, particularly preferably more than 0.01% and less than 1% of the mass of the layering material 1, and most preferably more than 0.05% and less than 0.5% of the mass of the layering material 1.

[0089] The application and drying of the silica layer can, in principle, be carried out independently of the annealing of the layer material 1. For example, the water glass solution can be applied to the layer material 1 in the annealed or unannealed state. The same applies to drying, which can be carried out in the annealed or unannealed state of the layer material 1. Depending on the further use of the layer material 1, it can also be annealed at a later time, for example, after the layer material 1 has been formed into a core 3. Similarly, the drying of the water glass solution can, in principle, be carried out at a later time, for example, after the layer material 1 has been formed into a core 3.

[0090] The Figures 2 and 3show a schematic representation of a core 3 of a magnetic field-sensitive component according to the invention, comprising a plurality of layers of a layer material 1 made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, according to a second embodiment of the present invention.

[0091] The core 3 can be formed with a varying number of layers of the layer material 1. The total number of layers can be at least 100, in particular at least 250, preferably at least 400, and / or at most 1,500, in particular at most 1,000, preferably at most 600. Particularly preferably, the core 3 comprises approximately 500 layers.

[0092] The layer thickness of the layer material 1 can be at least 5 µm, in particular at least 10 µm, and / or at most 200 µm, in particular at most 100 µm, preferably at most 25 µm. Particularly preferably, the layer thickness is 14 to 24 µm, in particular about 20 µm.

[0093] A "soft magnetic material" is understood to be a material that can be easily magnetized in a magnetic field. Preferably, a soft magnetic material has a coercive field strength of less than or equal to 1,000 A / m.

[0094] The soft magnetic material can in particular be an amorphous soft magnetic material, especially a metallic glass, which preferably has a nanocrystalline structure.

[0095] Preferably, the soft magnetic material comprises an alloy of iron, nickel and / or cobalt.

[0096] A "metallic glass" is understood to be a metal-based alloy of a material which, at the atomic level, does not have a crystalline but rather an amorphous structure, yet still exhibits metallic conductivity. Preferably, metallic glass may contain non-metallic alloying elements in addition to metallic alloying elements.

[0097] Preferably, a soft magnetic material can have the following atomic composition: [Fe 1-a Ni a ] 100-xyz-α-β-γ Cu x Si y B z Nb a M' β M" γ with a ≤ 0.3, 0, 6 ≤ x ≤ 1.5, 10 ≤ y ≤ 17, 5 ≤ z ≤ 14, 2 ≤ α ≤ 6, β ≤ 7, γ ≤ 8, where M' is at least one of the elements V, Cr, Co, Al and Zn, and where M" is at least one of the elements C, Ge, P, Ga, Sb, In and Be.

[0098] Preferably, a soft magnetic material may contain 73.5 wt.% iron and / or 1 wt.% copper and / or 3 wt.% niobium and / or 13.5 wt.% silicon and / or 9 wt.% boron. Advantageously, a soft magnetic material may contain 74.5 wt.% iron and copper, wherein the copper content is less than or equal to 1 wt.%.

[0099] In this embodiment, the core 3 is formed by winding a strip of the layered material 1. Furthermore, the core 3 thus formed is annealed.

[0100] As in Figure 2 As shown, a silica layer of water-insoluble silica is formed between each pair of layers of layer material 1. The details specified with regard to layer material 1 and the silica layer therein apply.

[0101] In this embodiment, the silica layer, composed of water-insoluble silica, is a silicified layer of dried water glass solution, in particular potassium silicate, sodium silicate, or lithium silicate. A mixture of potassium silicate and / or sodium silicate and / or lithium silicate in any combination can also be used. In this embodiment, sodium silicate is used as an example. With respect to the entire core 3, in this embodiment, the silica layer between the layers of the coating material 1 has a mass that is more than 0.001% and less than 10% of the mass of the coating material 1, preferably more than 0.005% and less than 5% of the mass of the coating material 1, particularly preferably more than 0.01% and less than 1% of the mass of the coating material 1, and most preferably more than 0.05% and less than 0.5% of the mass of the coating material 1.

[0102] In the following, methods for manufacturing such a core 3 of a magnetic field-sensitive component, which is used in the Figures 2 and 3 The process is described as comprising multiple layers of a layer material 1 made of a soft magnetic material, in particular an amorphous soft magnetic material, and further, in particular, a metallic glass, preferably having a nanocrystalline structure. The above statements regarding the soft magnetic material also apply to the layer material 1 used in the process.

[0103] The Figure 4 shows a flowchart of such a method according to a third embodiment of the present invention.

[0104] In the third embodiment of the method, a plurality of layers of the layer material 1 are first arranged in step S100 to form the core 3.

[0105] For this purpose, the layered material 1 is provided, for example, as a ribbon and wound up to form the core 3. The layered material 1 exists in an amorphous state and is wound in this state to form the core 3.

[0106] In step S110, the core 3 is annealed. The layer material 1 is transformed from its amorphous state into a crystalline or nanocrystalline state.

[0107] Step S120 involves preparing a water glass solution. In this embodiment, the water glass solution is provided as an aqueous solution of water glass. For this purpose, a water glass solution already prepared as an aqueous solution is used and diluted with water as desired to achieve the required concentration of the water glass solution. In this embodiment, a sodium water glass solution is used.

[0108] In this embodiment, the water glass solution is produced as an aqueous water glass solution with a water glass content of 0.01% to 99.9% by weight, preferably with a water glass content of 0.1% to 25% by weight, more preferably with a water glass content of 1% to 10% by weight, and particularly preferably with a water glass content of 3% to 7% by weight.

[0109] S130 relates to the introduction of the water glass solution between at least two of the layers of the core 3. In this embodiment, the water glass solution is introduced between all layers of the core 3 to form a corresponding silica layer.

[0110] In this embodiment, the water glass solution is introduced between the layers of the core 3 by immersing the core 3 in the water glass solution. The water glass solution can then penetrate between the layers of the core 3, for example, due to capillary action. Preferably, sufficient water glass solution is introduced between the layers of the core 3 through capillary action to completely wet the layers.

[0111] In an alternative embodiment, the water glass solution is introduced between the layers of the core 3 by spraying or brushing the core 3 with the water glass solution. In this case as well, the water glass solution is drawn into the spaces between the layers of the core 3 by capillary action, which is why the water glass solution may need to be sprayed or brushed onto the core 3 several times.

[0112] In step S140, core 3 is moved to fill any existing air bubbles with the water glass solution. Similarly, any remaining air in core 3 is displaced by the water glass solution.

[0113] Alternative steps, such as exciting the core 3 or the water glass solution to vibrate, for example with ultrasound, can also be used to remove air between the layers and improve the penetration of the water glass solution between the layers.

[0114] Step S150 involves drying the water glass solution to silicify and form a silica layer from water-insoluble silica.

[0115] The drying of the water glass solution for silicification and the formation of a silica layer from water-insoluble silica involves a drying process in which the water is removed from the water glass solution, and the corresponding silica layer forms through a process called silicification. As described above, the silica layer consists mainly of silicon dioxide and may contain other components, such as metal salts, depending on the water glass solution used.

[0116] The drying of the water glass solution can be carried out, for example, under normal ambient conditions or by means of a hot air stream and / or by heating in an oven.

[0117] Starting from the complete wetting of the layers with the water glass solution, after drying the silica layer made of water-insoluble silica is applied over the entire surface between the layers of the layer material 1.

[0118] Step S160 involves washing the core 3, particularly with water, to remove external contaminants from the core 3 and / or to at least partially remove salt deposits by drying the water glass solution to silicify and form the silica layer.

[0119] As a result, the silica layer of the core 3 produced in this way has a mass that corresponds to more than 0.001% and less than 10% of the mass of the layer material 1 of the core 3, preferably more than 0.005% and less than 5% of the mass of the layer material 1 of the core 3, particularly preferably more than 0.01% and less than 1% of the mass of the layer material 1 of the core 3, and most preferably more than 0.05% and less than 0.5% of the mass of the layer material 1 of the core 3.

[0120] The method of the third embodiment can also be carried out in modified form. For example, the preparation of the water glass solution according to step S120 can be carried out at any time before its use. The method of the third embodiment can also be carried out in a modified form by, for example, performing steps S130 to S150 for introducing the water glass solution between at least two of the layers of the core 3, for moving the core 3, and for drying the water glass solution before step S110 for annealing the core 3.

[0121] In an alternative embodiment, steps S110 for annealing the core 3 and S150 for drying the water glass solution for silicification and formation of the silica layer from water-insoluble silica are carried out together, for example instead of the individual step S150 for drying the water glass solution.

[0122] The Figure 5shows a flowchart of such a method according to a fourth embodiment of the present invention.

[0123] In a fourth embodiment, a water glass solution is first prepared in step S200. In this embodiment, the water glass solution is provided as an aqueous solution of water glass. For this purpose, a water glass solution already prepared as an aqueous solution is used and diluted with water as desired to achieve the required concentration of the water glass solution. In this embodiment, a sodium water glass solution is used as an example.

[0124] Furthermore, in this embodiment, the water glass solution is produced as an aqueous water glass solution with a weight fraction of 0.01% to 99.9% water glass in the water glass solution, preferably with a weight fraction of 0.1% to 25% water glass in the water glass solution, more preferably with a weight fraction of 1% to 10% water glass in the water glass solution, and particularly preferably with a weight fraction of 3% to 7% water glass in the water glass solution.

[0125] In step S210, the water glass solution is applied to one side of a layer material 1. For this purpose, the layer material 1 is provided, for example, as a strip. In this embodiment, the water glass solution is applied, for example, by spraying, dipping, or with a roller, brush, sponge, or paintbrush. In this embodiment, the water glass solution is applied to the entire surface of one side of the layer material 1.

[0126] In step S220, the water glass solution is dried to silicify and form a silica layer from water-insoluble silica.

[0127] This refers to a drying process in which the water is removed from the water glass solution, and the corresponding silica layer forms through a process called silicification. As described above, the silica layer consists mainly of silicon dioxide and may contain other components, such as metal salts, depending on the specific water glass solution used.

[0128] The drying of the water glass solution can be carried out, for example, under normal ambient conditions or by means of a hot air stream and / or by heating in an oven.

[0129] Starting with the application of the water glass solution to the entire surface of one side of the layer material 1, after drying the silica layer of water-insoluble silica is formed over the entire surface of one side of the layer material 1.

[0130] In step S230, the layer material 1 is arranged in a plurality of layers to form the core 3.

[0131] For this purpose, the layered material 1, provided here as an example in the form of a strip, is wound up to form the core 3. The layered material 1 exists in an amorphous state and is wound up in this state to form the core 3.

[0132] In step S240, the layer material 1 is annealed in the already formed core 3. The layer material 1 is transformed from its amorphous state into a crystalline or nanocrystalline state.

[0133] In step S250, the core 3 is washed, especially with water, to remove external contaminants from the core 3 and / or to at least partially remove salt deposits by drying the water glass solution to silicify and form the silica layer.

[0134] As a result, in the core 3 produced by the process of the fourth embodiment, the silica layer has a mass that corresponds to more than 0.001% and less than 10% of the mass of the layer material 1 of the core 3, preferably more than 0.005% and less than 5% of the mass of the layer material 1 of the core 3, particularly preferably more than 0.01% and less than 1% of the mass of the layer material 1 of the core 3, and most preferably more than 0.05% and less than 0.5% of the mass of the layer material 1 of the core 3.

[0135] The method of the fourth embodiment can also be carried out in a modified form.

[0136] For example, step S220 for drying the water glass solution to silicify and form a silica layer from water-insoluble silica can only be carried out after step S230 for arranging the layer material 1 to form the core 3 in a plurality of layers.

[0137] In another alternative embodiment, the annealing of the layer material 1 according to step S240 takes place before the formation of the core 3 according to step S230. The annealing is thus carried out by annealing the layer material 1 before the formation of the core 3. Steps S210 and S220 for applying the water glass solution to one side of the layer material 1 and for drying the water glass solution can be carried out after the annealing, with steps S210 and S220 preferably being carried out before the formation of the core 3 according to step S230. Alternatively, steps S210 and S220 can be carried out only after the formation of the core 3 according to step S230.

[0138] Furthermore, for example, a corresponding step to move the core 3 can also be carried out here in accordance with step S140 above before drying the water glass solution according to step S220.

[0139] In an alternative embodiment, steps S220 for drying the water glass solution for silicification and formation of the silica layer from water-insoluble silica and S240 for annealing the layer material 1 are carried out together, for example instead of the individual step S240 for annealing the layer material 1.

[0140] The aforementioned methods may include an additional step for forming the core 3. This step can be performed, for example, immediately after the core 3 has been formed. Depending on the type of forming, the forming of the core 3 can also be performed integrally with the core 3 formation step. The forming can be achieved, for example, by applying an external force to an outer layer of the layered material 1, and / or by using specific molds / templates. In principle, it is possible for the forming to be carried out in several individual steps, for example, first forming an inner part of the core 3 and then an outer part. Various configurations of such a formed core 3 are described in the Figures 6 to 9 Examples 5 to 8 are shown.

[0141] The aforementioned processes can also include an additional step for further processing the core 3 into a finished product. For example, the core 3 can be coated with epoxy powder or painted. A further annealing step is also possible. Alternatively or additionally, the core 3 can be encased in a plastic housing. Another type of further processing involves winding the core 3 with wire for later use. Reference symbol list

[0142] 1. Layer material 2. Silica layer 3. Core

Claims

1. Layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, for producing a core (3) of a magnetic field-sensitive component, in particular with a plurality of layers, wherein the layer material characterized by the fact that the layer material (1) is made on at least one side with a silica layer (2) of water-insoluble silica.

2. Layer material (1) according to claim 1, characterized by the fact that the silica layer (3) made of water-insoluble silica is applied over the entire surface of at least one side of the layer material (1), or the silica layer (3) made of water-insoluble silica is applied to at least one side of the layer material (1) in such a way that it only partially covers at least one side of the layer material (1).

3. Core (3) of a magnetic field-sensitive component comprising a plurality of layers of a layer material (1) of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, wherein the core (3) of the magnetic field-sensitive component characterized by the fact that a silica layer (2) made of water-insoluble silica is formed between at least two layers of the layer material (1).

4. Core (3) of a magnetic field-sensitive component according to claim 3, characterized by the fact thatthe silica layer (2) is made of water-insoluble silica over the entire surface between the at least two layers of the layer material (1), or the silica layer (2) is made of water-insoluble silica between the at least two layers of the layer material (1) in such a way that it is only partially made between the at least two layers of the layer material (1).

5. Core (3) of a magnetic field-sensitive component according to one of claims 3 or 4, characterized by the fact that the silica layer (2) of water-insoluble silica is a silicified layer of dried water glass solution, in particular based on potassium water glass, sodium water glass or lithium water glass or a mixture thereof.

6. Core (3) of a magnetic field-sensitive component according to one of claims 3 to 5, characterized by the fact thatthe silica layer (2) between the at least two layers of the layer material (1) has a mass which corresponds to more than 0.001% and less than 10% of the mass of the layer material (1) of the core (3), preferably more than 0.005% and less than 5% of the mass of the layer material (1) of the core (3), particularly preferably more than 0.01% and less than 1% of the mass of the layer material (1) of the core (3), most preferably more than 0.05% and less than 0.5% of the mass of the layer material (1) of the core (3).

7. Method for producing a core (3) of a magnetic field-sensitive component with a plurality of layers of a layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, comprising the steps of arranging the plurality of layers of the layer material (1) to form the core (3), and annealing the core (3), wherein the method characterized by the fact that The process comprises the following additional steps for producing a water glass solution; introducing the water glass solution between at least two of the layers of the core (3), and drying the water glass solution to silicify and form a silica layer (2) from water-insoluble silica.

8. Method for producing a core (3) of a magnetic field-sensitive component with a plurality of layers of a layer material (1) made of a soft magnetic material, in particular an amorphous soft magnetic material, further in particular a metallic glass, preferably having a nanocrystalline structure, comprising the steps of arranging the plurality of layers of the layer material (1) to form the core (3), and annealing the layer material (1), wherein the method characterized by the fact that The process comprises the following additional steps for producing a water glass solution; applying the water glass solution to at least one side of the layer material (1), and drying the water glass solution to silicify and form a silica layer (2) from water-insoluble silica.

9. Method according to one of claims 7 or 8, characterized by the fact thatThe arrangement of the plurality of layers of the layer material (1) to form the core (3) includes winding the layer material (1) to form the core (3).

10. Method according to any one of claims 7 to 9, characterized by the fact that The preparation of the water glass solution comprises the preparation of the water glass solution as an aqueous water glass solution with a weight fraction of 0.01% to 99.9% water glass in the water glass solution, preferably with a weight fraction of 0.1% to 25% water glass in the water glass solution, further preferably with a weight fraction of 1% to 10% water glass in the water glass solution, and particularly preferably with a weight fraction of 3% to 7% water glass in the water glass solution.

11. Method according to any one of claims 7 to 10, characterized by the fact that The annealing of the core (3) is carried out together with the drying of the water glass solution to silicify and form the silica layer (2) from water-insoluble silica.

12. Method according to any one of claims 7 to 11, characterized by the fact that the process includes an additional step for washing the core (3), in particular with water, after drying the water glass solution to silicify and form the silica layer (2) from water-insoluble silica.

13. Method according to any one of claims 7 to 12, characterized by the fact that The drying of the water glass solution for silicification and formation of the silica layer (2) from water-insoluble silica includes drying the water glass solution by means of a hot air stream and / or by heating in an oven.

14. Method according to any one of claims 7 to 13, characterized by the fact thatThe introduction of a water glass solution between at least two of the layers includes immersion of the core (3) in the water glass solution and / or spraying of the core (3) with the water glass solution and / or coating of the core (3) with the water glass solution and / or dipping of the core (3) into the water glass solution and / or pouring or pouring over the core (3) with the water glass solution.

15. Method according to any one of claims 7 to 13, characterized by the fact that the method includes an additional step for moving the core (3) after the introduction of the water glass solution between at least two of the layers.

16. Method according to any one of claims 7 to 15, characterized by the fact that the process includes an additional step for shaping the core (3), in particular by applying an external force to an outer layer of the layer material (1) and / or by using certain shapes / gauges.

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