ELEMENTARY CELL COMPRISING A RESISTIVE MEMORY AND ASSOCIATED INITIALIZATION METHOD
A breakdown layer in the resistive memory and selector device assembly addresses electrical isolation issues by ensuring the selector device is in a high resistive state post-manufacturing, enabling reliable operation and high integration density.
FR3104812B1Active Publication Date: 2025-06-20COMMISSARIAT A LENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
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Patent Information
- Application Number
- FR2019014468
- Authority / Receiving Office
- FR · FR
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2019-12-16
- Publication Date
- 2025-06-20
- Estimated Expiration
- 2039-12-16
AI Technical Summary
Technical Problem
Existing resistive memory and selector device assemblies face issues with electrical isolation problems due to the selector device being in a conductive state at the end of manufacturing, failing to isolate the memory effectively.
Method used
Incorporating a breakdown layer of dielectric material that breaks down at a predetermined voltage, ensuring electrical insulation of the memory regardless of its resistive state, and initializing the selector device to its high resistive state through a controlled voltage pulse.
Benefits of technology
Ensures effective electrical isolation of the memory and proper functioning of the selector device, maintaining high integration density and operational reliability.
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Abstract
ELEMENTARY CELL COMPRISING A RESISTIVE MEMORY AND ASSOCIATED INITIALIZATION METHOD One aspect of the invention relates to an elementary cell (100) comprising a breakdown layer (103) made of dielectric having a thickness depending on a breakdown voltage, a device and a non-volatile resistive memory (102) connected in series, the device (101) comprising: an upper selector electrode (1013), a lower selector electrode (1011), a layer made of a first active material, called the active selector layer (1012), said device (101) being intended to form a volatile selector; said memory (102) comprising: an upper memory electrode (1015), a lower memory electrode (1013), a layer made of at least one second active material, called the active memory layer (1014). Figure to be published with the abstract: Figure 3
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