Solar control and / or low-emissivity glazing

Abstract

The invention relates to a material comprising a transparent substrate coated with a functional coating capable of acting on solar and / or infrared radiation. The invention also relates to glazing comprising these materials, as well as the use of such materials for manufacturing thermal insulation and / or solar control glazing. The invention specifically aims to develop a material comprising a two-layer silver-based functional coating exhibiting selectivity close to that of three-layer functional coatings, while maintaining excellent color neutrality. Figure 1:

Description

Title of the invention: Solar control and / or low-emissivity glazing

[0001] The invention relates to a material comprising a transparent substrate coated with a functional coating capable of acting on solar radiation and / or infrared radiation. The invention also relates to glazing comprising these materials as well as the use of such materials for manufacturing thermal insulation and / or solar protection glazing. In the remainder of the description, the term “functional” qualifying “functional coating” means “capable of acting on solar radiation and / or infrared radiation”.

[0002] These glazings can be intended to equip both buildings and vehicles, in particular with a view to: - reduce air conditioning effort and / or prevent excessive overheating, so-called “solar control” glazing and / or - reduce the amount of energy dissipated to the outside, so-called “low emissive” glazing.

[0003] The selectivity "S" makes it possible to evaluate the performance of these glazings. It corresponds to the ratio of the light transmission TLvis in the visible of the glazing to the solar factor FS of the glazing (S = TLvis / FS). The solar factor "FS or g" corresponds to the ratio in % between the total energy entering the room through the glazing and the incident solar energy. The solar factor therefore measures the contribution of a glazing to heating the "room". The smaller the solar factor, the lower the solar gains.

[0004] Known selective glazings comprise transparent substrates coated with a functional coating comprising a stack of one or more metallic functional layers, each arranged between two dielectric coatings. Such glazings make it possible to improve solar protection while maintaining high light transmission. These functional coatings are generally obtained by a succession of deposits carried out by cathodic sputtering, possibly assisted by a magnetic field.

[0005] Conventionally, the faces of a glazing are designated from the exterior of the building and by numbering the faces of the substrates from the exterior to the interior of the living space or room it equips. This means that the incident sunlight passes through the faces in ascending order of their number.

[0006] Known selective glazings are generally double glazings comprising the functional coating located on face 2, that is to say on the outermost substrate of the building on its face facing the interlayer gas layer.

[0007] Currently, the most efficient materials have a selectivity on higher than 2 and include a functional coating with at least three silver-based metallic functional layers. For comparison: - a material comprising a functional coating with two silver-based layers allows to obtain a selectivity of 1.7 up to 1.9, - a material comprising a functional coating with a silver-based layer allows to obtain a selectivity of up to 1.2, - a material comprising a functional coating without a silver-based layer allows to obtain a selectivity of up to 1.

[0008] However, functional coatings comprising at least three functional layers are complex. Indeed, by multiplying the number of layers and materials constituting these functional coatings, it becomes increasingly difficult to adapt the settings of the deposition conditions in order to obtain functional coatings that are constant in color and properties.

[0009] The invention is specifically concerned with developing a material comprising a functional coating with two silver-based functional layers having improved selectivity close to functional coatings with three functional layers, i.e. a selectivity close to, or even greater than, 2, while retaining excellent color neutrality (a*T less than -9, preferably less than -6), low external reflection (<12%, or even less than 10%). The invention preferably aims at medium to low light transmissions (<60%).

[0010] The subject of the invention is a material comprising a substrate coated with a functional coating comprising an alternation of only two silver-based metallic functional layers called, starting from the substrate, first and second functional layers and three dielectric coatings called, starting from the substrate, Di1, Di2 and Di3, each dielectric coating comprising at least one dielectric layer, so that each functional metallic layer is arranged between two dielectric coatings, characterized in that: the first dielectric coating Dil located below the first functional layer comprises an absorbent layer located between two dielectric layers, said absorbent layer being chosen from: - layers based on a metal or a metal alloy, - the metal nitride layers, and - metal oxynitride layers; the metallic element(s) being chosen from nickel, chromium, niobium, vanadium, titanium, tungsten, palladium, stainless steel, molybdenum, zirconium, tantalum and zinc.

[0011] The absorbent layer may be essentially in metallic form. Although essentially in metallic form, the metal may have traces of ni truration due to the nitrogen-polluted deposition atmosphere of neighboring deposition areas. Preferably, the absorbing layer is a metal selected from palladium, niobium, tungsten, stainless steel, titanium, chromium, molybdenum, zirconium, nickel, tantalum, zinc, alloys such as NiCr, NiCrW, WTa, WCr, NbZr, TaNiV, CrZr and NbCr.

[0012] The absorbing layer may be a nitride or a sub-nitride, i.e. a sub-stoichiometric nitrogen nitride. Preferably, the absorbing layer is a nitride chosen from TiN, NiCrWN, NiVN, TaN, CrN, ZrN, CrZrN, TiAIN, TiZrN, WN, SiZrN and SiNiCrN.

[0013] Advantageously, the absorbent layer can be chosen from layers based on Ti, TiN, Nb, NbN, Ni, NiN, Cr, CrN, NiCr, NiCrN.

[0014] According to preferred embodiments, the absorbing layer is a layer of titanium nitride TiN or a metallic layer of nickel and chromium alloy NiCr.

[0015] Preferably, the stack comprises a single absorbent layer. This means in particular that the upper covering does not comprise an absorbent layer.

[0016] The thickness of the absorbent layer is, in order of increasing preference, from 0.2 to 9 nm, from 0.3 to 5 nm, from 0.35 to 3 nm, from 0.35 to 0.45 nm.

[0017] The absorbing layer is located between two dielectric layers. Preferably, the sum of the thicknesses of all dielectric layers immediately above and in contact with the absorbing layer is greater than 5 nm, 10 nm, 15 nm, 20 nm or 30 nm. Preferably, the sum of the thicknesses of all the dielectric layers immediately below and in contact with the absorbing layer is greater than or equal to 4 nm, preferably greater than or equal to 5 nm. One or more dielectric layers are considered to be in immediate contact with the absorbing layer when they are not separated from the absorbing layer by a metal layer or another absorbing layer. For example, in the sequence Dielectric layer 1 / Absorbing layer / Dielectric layer 2 / Dielectric layer 3, the thicknesses of dielectric layer 1 and dielectric layer 2 will be added together to determine the sum of the thicknesses of all the dielectric layers immediately above and in contact with the absorbing layer.

[0018] The material of the invention may have the following characteristics alone or in combination: - the functional coating comprises one or more metallic blocking layers preferably located in contact with, below and / or above the first and / or second metallic functional layer, - the first dielectric coating Dil located below the first functional layer comprises a high refractive index layer having an index of re fraction measured at 550 nm greater than 2.20 and a thickness greater than 5 nm, preferably greater than 8 nm, or even greater than 10 nm, the high index layer can be located between the absorbent layer and the first functional layer, - the third dielectric coating Di3 located above the second functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm, preferably greater than 8 nm, or even greater than 10 nm, - the absorbent layer can be chosen from metallic layers based on nickel and / or chromium and layers based on titanium nitride, - the second dielectric coating further comprises a tin oxide-based layer comprising at least 10%, or less than 20% or at least 30% by mass of tin relative to the total mass of elements other than nitrogen and oxygen, this tin oxide-based layer generally has a thickness greater than 5 nm, or even greater than 10 nm and less than 40 nm, or even less than 30 nm, - the second dielectric coating further comprises a layer based on tin oxide, preferably based on zinc and tin oxide comprising at least 10%, at least 20% or at least 30% by mass of tin relative to the total mass of zinc and tin, this layer based on tin oxide generally has a thickness greater than 5 nm, or even greater than 10 nm and less than 40 nm, or even less than 30 nm, - when the functional coating comprises one or more layers with a high refractive index, these are preferably chosen from layers based on titanium oxide and layers based on silicon and zirconium nitride, - when the functional coating comprises one or more layers with a high refractive index, these preferably have a thickness greater than 10 nm, - the dielectric coating located below the first functional layer may comprise a zinc oxide-based layer located in contact with the first functional layer or separated from the first functional layer by a blocking layer, - the dielectric coating located below the second functional layer may comprise a zinc oxide-based layer located in contact with the second functional layer or separated from the second functional layer by a blocking layer, - the dielectric coating located below the first metallic functional layer comprises a layer comprising silicon chosen from silicon nitride layers, - the dielectric coating located above the first metallic functional layer comprises a layer comprising silicon chosen from the layers of silicon nitride, - the dielectric coating located above the second metallic functional layer comprises a layer comprising silicon chosen from silicon nitride layers, - each dielectric coating comprises a layer comprising silicon chosen from silicon nitride layers.

[0019] The material according to the invention has, in particular, a light transmission of between 20 and 70%, preferably of between 35 and 65%.

[0020] The glazing comprising material according to the invention may be in the form of multiple glazing or laminated glazing.

[0021] The invention also relates to: - glazing comprising a material according to the invention, - glazing comprising a material according to the invention mounted on a vehicle or on a building, and - the process for preparing a material or glazing according to the invention, - the use of glazing according to the invention as solar control and / or low-emissivity glazing for buildings or vehicles, - a building, a vehicle or a device comprising glazing according to the invention.

[0022] Throughout the description, the substrate according to the invention is considered to be laid horizontally. The stack of thin layers is deposited above the substrate. The meaning of the expressions “above” and “below” and “lower” and “upper” is to be considered in relation to this orientation. In the absence of a specific stipulation, the expressions “above” and “below” do not necessarily mean that two layers and / or coatings are arranged in contact with each other. When it is specified that a layer is deposited “in contact” with another layer or a coating, this means that there cannot be one (or more) layer(s) interposed between these two layers (or layer and coating).

[0023] All the luminous characteristics described are obtained according to the principles and methods of European standards EN 410 relating to the determination of the luminous and solar characteristics of glazing used in glass for construction. It is considered that the sunlight entering a building goes from the outside to the inside.

[0024] According to the invention, the luminous characteristics are measured according to the illuminant D65 at 2° perpendicular to the material mounted in double glazing: - TL corresponds to the light transmission in the visible range in %, - Rext (or RL1) corresponds to the external light reflection in the visible in %, observer on the external space side, - Rint (or RL2) corresponds to the interior light reflection in the visible in %, observer on the inner space side, - a*T and b*T correspond to the transmission colors a* and b* in the L*a*b* system, - a*Rext and b*Rext correspond to the colors in reflection a* and b* in the L*a*b* system, observer on the exterior space side, - a*Rint (or a*RL2) and b*Rint (or b*RL2) correspond to the reflection colors a* and b* in the L*a*b* system, observer side interior space.

[0025] The coating is deposited by magnetic field-assisted sputtering (magnetron process). According to this advantageous embodiment, all the layers of the stack are deposited by magnetic field-assisted sputtering.

[0026] In the absence of a specific stipulation, the expressions "above" and "below" do not necessarily mean that two layers and / or coatings are arranged in contact with each other. When it is specified that a layer is deposited "in contact" with another layer or a coating, this means that there cannot be one (or more) layer(s) interposed between these two layers (or layer and coating).

[0027] Unless otherwise stated, the thicknesses referred to in this document are physical thicknesses and the layers are thin layers. A thin layer is understood to mean a layer having a thickness between 0.1 nm and 100 micrometers.

[0028] According to the invention, unless otherwise indicated, the expression "based on", used to qualify a material or a metallic layer as to what it contains, means that the mass fraction of the constituent that it comprises is at least 50%, in particular at least 70%, preferably at least 90%.

[0029] According to the invention, unless otherwise indicated, the expression "based on", used to qualify a material or a dielectric layer as to what it contains, means that the mass fraction of the constituent that it comprises is at least 50%, in particular at least 70%, preferably at least 90% by mass relative to the total mass of the elements other than oxygen and nitrogen.

[0030] According to the invention, the term "distinct layers" means two layers of different chemical nature, that is to say made up of different chemical elements or two layers of the same nature but separated by at least one layer of different chemical nature.

[0031] The silver-based metal functional layers comprise at least 95.0%, preferably at least 96.5% and more preferably at least 98.0% by mass of silver relative to the mass of the functional layer. Preferably, a silver-based metal functional layer comprises less than 1.0% by mass of metals other than silver relative to the mass of the silver-based metal functional layer.

[0032] The silver-based metallic functional layers have a thickness: - greater than 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm or 16 nm, and / or - less than 25 nm, 22 nm, 20 nm, 18 nm.

[0033] By "dielectric coating" within the meaning of the present invention, it is to be understood that there may be a single layer or several layers of different materials inside the coating. A "dielectric coating" according to the invention mainly comprises dielectric layers. However, according to the invention these coatings may also comprise layers of other nature, in particular absorbent layers, for example metallic ones.

[0034] It is considered that a “same” dielectric coating is located: - between the substrate and the first functional layer, - between each silver-based functional metal layer, - above the last functional layer (furthest from the substrate).

[0035] Dielectric coatings comprise dielectric layers. By "dielectric layer" within the meaning of the present invention, it is to be understood that from the point of view of its nature, the material is "non-metallic", i.e. is not a metal. In the context of the invention, this term designates a material having an n / k ratio over the entire visible wavelength range (from 380 nm to 780 nm) equal to or greater than 5. n designates the real refractive index of the material at a given wavelength and k represents the imaginary part of the refractive index at a given wavelength; the n / k ratio being calculated at a given wavelength identical for n and for k.

[0036] The thickness of a dielectric coating corresponds to the sum of the thicknesses of the layers constituting it. Preferably, the dielectric coatings have a thickness greater than 10 nm, greater than 15 nm, between 15 and 200 nm, between 15 and 100 nm or between 15 and 70 nm.

[0037] The dielectric layers of the coatings have the following characteristics alone or in combination: - they are deposited by magnetic field-assisted cathode sputtering, - they are chosen from oxides, nitrides or oxynitrides of one or more elements chosen from titanium, silicon, aluminum, zirconium, tin and zinc, - they have a thickness greater than 2 nm, preferably between 2 and 100 nm.

[0038] Dielectric layers, in addition to their optical function, can have various other functions. The choice of the nature and position of the dielectric layers within the dielectric coating depends on this function. For example, the following functions can be cited: - stabilizing or wetting layers located at close proximity to silver-based functional layers such as zinc oxide-based layers, - smoothing layers located below the wetting layers such as tin oxide-based layers, - barrier or optical function layers.

[0039] A single dielectric layer generally performs several functions. In fact, each dielectric layer plays an optical role which depends on its refractive index and its thickness.

[0040] The dielectric layers are conventionally chosen from oxide-based, nitride-based or oxynitride-based layers. The oxide-based layers of one or more elements comprise essentially oxygen and very little nitrogen. The oxide-based layers comprise in particular at least 90% by atomic percentage of oxygen relative to the oxygen and nitrogen in said layer. The nitride-based layers comprise essentially nitrogen and very little oxygen. The nitride-based layers comprise at least 90% by atomic percentage of nitrogen relative to the oxygen and nitrogen in said layer. The oxynitride-based layers comprise a mixture of oxygen and nitrogen. The silicon oxynitride-based layers comprise 10 to 90% (limits excluded) by atomic percentage of nitrogen relative to the oxygen and nitrogen in said layer.

[0041] The amounts of oxygen and nitrogen in a layer are determined as atomic percentages relative to the total amounts of oxygen and nitrogen in the layer under consideration.

[0042] The dielectric layers are conventionally chosen from: - layers comprising silicon, aluminum and / or zirconium, optionally doped with at least one other element, - layers based on tin oxide, - layers based on titanium oxide, - layers based on zinc oxide.

[0043] The stack may comprise at least one layer comprising silicon or aluminum. Preferably, the dielectric coating located above the functional layer may comprise a layer comprising silicon, in particular chosen from silicon nitride layers or silicon nitride and zirconium layers. Each dielectric coating may also comprise at least one layer comprising silicon.

[0044] Layers comprising silicon are extremely stable to heat treatments. For example, no migration of the elements constituting them is observed. Consequently, these elements are not likely to alter the silver layer. Layers comprising silicon therefore also contribute to the non-alteration of the silver layers and therefore to obtain low emissivity after heat treatment.

[0045] The layers comprising silicon comprise at least 50% by mass of silicon relative to the mass of all the elements constituting the layer comprising silicon other than nitrogen and oxygen.

[0046] The layers comprising silicon may be chosen from oxide-based, nitride-based or oxynitride-based layers such as silicon oxide-based layers, silicon nitride-based layers and silicon oxynitride-based layers.

[0047] The silicon oxide-based layers comprise at least 90 atomic percent oxygen relative to the oxygen and nitrogen in the silicon oxide-based layer. The silicon nitride-based layers comprise at least 90 atomic percent nitrogen relative to the oxygen and nitrogen in the silicon nitride-based layer. The silicon oxynitride-based layers comprise 10 to 90 atomic percent nitrogen relative to the oxygen and nitrogen in the silicon oxide-based layer. Preferably, the silicon oxide-based layers are characterized by a refractive index at 550 nm of less than or equal to 1.55. Preferably, the silicon nitride-based layers are characterized by a refractive index at 550 nm of greater than or equal to 1.95.

[0048] The layers comprising silicon may comprise or consist of elements other than silicon, oxygen and nitrogen. These elements may be chosen from aluminum, boron, titanium, and zirconium. The layers comprising silicon may comprise at least 2%, at least 5% or at least 8% by mass of aluminum relative to the mass of all the elements constituting the layer comprising silicon other than oxygen and nitrogen.

[0049] The layers comprising aluminum may be chosen from oxide-based, nitride-based or oxynitride-based layers such as aluminum oxide-based layers such as Al2O3, aluminum nitride-based layers such as AlN and aluminum oxynitride-based layers such as AlOxNy.

[0050] The layers based on silicon nitride and zirconium SixZryNz are part of the layers comprising silicon, in particular layers based on silicon nitride. The refractive index of the layers based on silicon nitride and zirconium increases with the increase in the proportions of zirconium in said layer.

[0051] The silicon nitride-based layers may comprise aluminum and / or zirconium. Such layers may comprise, in atomic proportion relative to the atomic proportion of Si, Zr and Al: - 50 to 98%, 60 to 90%, 60 to 70% atomic silicon, - 0 to 10%, 2 to 10% atomic aluminum, -0 to 40%, 10 to 40% or 5 to 30% atomic zirconium.

[0052] Preferably, at least one dielectric coating comprises a layer comprising silicon selected from silicon nitride-based layers. Preferably, the dielectric coating located above the silver-based functional layer comprises a layer comprising silicon selected from silicon nitride-based layers. Each dielectric coating may comprise a layer comprising silicon selected from silicon nitride-based layers.

[0053] Preferably, the sum of the thicknesses of all layers comprising silicon nitride-based silicon in each dielectric coating located above the first silver-based functional metal layer may be greater than 35%, greater than 50%, of the total thickness of the dielectric coating.

[0054] Preferably, the silver-based functional layer is located above a dielectric layer called a stabilizing or wetting layer made of a material capable of stabilizing the interface with the functional layer. These layers are generally based on zinc oxide.

[0055] Preferably, the silver-based functional layer is located below a dielectric layer called a stabilizing or wetting layer made of a material capable of stabilizing the interface with the functional layer. These layers are generally based on zinc oxide.

[0056] The zinc oxide-based layers may comprise at least 80% or at least 90% by mass of zinc relative to the total mass of all the elements constituting the zinc oxide-based layer, excluding oxygen and nitrogen.

[0057] The zinc oxide-based layers may comprise one or more elements chosen from aluminum, titanium, niobium, zirconium, magnesium, copper, silver, gold, silicon, molybdenum, nickel, chromium, platinum, indium, tin and hafnium, preferably aluminum.

[0058] The zinc oxide-based layers can optionally be doped with at least one other element, such as aluminum.

[0059] A priori, the zinc oxide-based layer is not nitrided, however traces may exist.

[0060] The zinc oxide-based layer comprises, in order of increasing preference, at least 80%, at least 90%, at least 95%, at least 98% or at least 100%, by mass of oxygen relative to the total mass of oxygen and nitrogen.

[0061] The dielectric coating located between the substrate and the first functional metal layer and / or one or each dielectric coating located above the first silver-based functional layer comprises a zinc oxide-based layer comprising at least 80% by mass of zinc relative to the mass of all elements other than oxygen.

[0062] Preferably, each dielectric coating comprises a zinc oxide-based layer comprising at least 80% by mass of zinc relative to the mass of all elements other than oxygen.

[0063] Preferably, the dielectric coating located directly below the silver-based functional metal layer comprises at least one zinc oxide-based dielectric layer, optionally doped with at least one other element, such as aluminum. The metal functional layer deposited above a zinc oxide-based layer is either directly in contact or separated by a blocking layer.

[0064] In all stacks, the dielectric coating closest to the substrate is called the bottom coating and the dielectric coating farthest from the substrate is called the top coating. Stacks with more than one silver layer also include intermediate dielectric coatings located between the bottom and top coating.

[0065] Preferably, the lower or intermediate coatings comprise a zinc oxide-based dielectric layer located below and directly in contact with a silver-based metal layer or separated from this layer by a blocking sub-layer.

[0066] Preferably, the dielectric coating located directly above the silver-based functional metal layer comprises at least one zinc oxide-based dielectric layer, optionally doped with at least one other element, such as aluminum. The metal functional layer deposited below a zinc oxide-based layer is either directly in contact or separated by a blocking layer.

[0067] Preferably, the intermediate or upper coatings comprise a zinc oxide-based dielectric layer located above and directly in contact with the silver-based metal layer or separated from this layer by a blocking overlayer.

[0068] The zinc oxide layers have a thickness: - at least 1.0 nm, at least 2.0 nm, at least 3.0 nm, at least 4.0 nm or at least 5.0 nm, and / or - not more than 25 nm, not more than 10 nm or not more than 8.0 nm.

[0069] Preferably, the material comprises one or more layers based on tin oxide, preferably zinc oxide and tin.

[0070] The zinc and tin oxide-based layers comprise at least 20% by mass of tin relative to the total mass of zinc and tin. The zinc and tin oxide-based layer comprises, relative to the total mass of zinc and tin, at least 20%, at least 30%, at least 40%, at least 50%, at least 60% or at least 80% by mass of tin mass. Preferably, the zinc tin oxide-based layer comprises 40 to 80% by mass of tin relative to the total mass of zinc and tin.

[0071] The tin oxide-based layer has a thickness: - greater than 5 nm, greater than 10 nm, greater than 15 nm, greater than 20 nm or greater than 25 nm, - less than 50 nm, less than 40 nm or less than 35 nm.

[0072] The dielectric coating located between the substrate and the first functional metal layer and / or one or each dielectric coating located above the first silver-based functional layer comprises a layer based on tin oxide, preferably zinc oxide and tin comprising at least 20% by mass of tin relative to the total mass of zinc and tin. Each dielectric coating may comprise a layer of tin oxide, preferably based on zinc oxide and tin comprising at least 20% by mass of tin relative to the total mass of zinc and tin.

[0073] Among the dielectric layers, a distinction is made, depending on their refractive index at 550 nm, between low refractive index layers, intermediate refractive index layers and high refractive index layers. The low refractive index layers have a refractive index of less than 1.70. The intermediate refractive index layers have a refractive index of between 1.70 and 2.2. The high refractive index layers have a refractive index of greater than 2.2.

[0074] The coating may comprise a layer with a refractive index greater than 2.20. The presence of high-index layers contributes to obtaining high light transmission.

[0075] The high refractive index layers can be chosen from: - layers based on titanium oxide (n550=2.4), - layers based on mixed titanium oxide and another component chosen from the group consisting of Zn, Zr and Sn, - layers based on a layer of zirconium nitride (n 550 = 2.55), - layers based on silicon nitride and zirconium (n550 nm = 2.20 - 2.40), - layers based on a layer of zirconium oxide, - layers based on a layer of niobium oxide (n550 = 2.30), - layers based on a layer of bismuth oxide (n 550 = 2.60). Preferably, the high refractive index layer is chosen from layers based on titanium oxide and layers based on silicon and zirconium nitride.

[0076] The functional coating may comprise at least one blocking layer whose function is to protect the silver layers by avoiding possible degradation linked to the deposition of a dielectric coating or linked to a heat treatment. These layers blockages are preferably located in contact with the silver-based functional metal layers.

[0077] According to advantageous embodiments, the stack may comprise at least one blocking layer, located below and directly in contact with a silver-based functional metal layer (blocking sub-layer) and / or at least one blocking layer located above and directly in contact with a silver-based functional metal layer (blocking over-layer).

[0078] A blocking layer located above a silver-based functional metal layer is called a blocking overlayer. A blocking layer located below a silver-based functional metal layer is called a blocking underlayer.

[0079] The blocking layers are chosen from metallic layers based on a metal or a metallic alloy, metallic nitride layers, metallic oxide layers and metallic oxynitride layers of one or more elements chosen from titanium, nickel, chromium, tantalum and niobium such as Ti, TiN, TiOx, Nb, NbN, NbOx, Ni, NiN, NiOx, Cr, CrN, CrOx, NiCr, NiCrN, NiCrOx.

[0080] When these blocking layers are deposited in metallic, nitrided or oxynitrided form, these layers can undergo partial or total oxidation depending on their thickness and the nature of the layers surrounding them, for example, at the time of deposition of the following layer or by oxidation in contact with the underlying layer.

[0081] The blocking layers can be chosen from metallic layers, in particular of a nickel and chromium alloy (NiCr) or titanium. The choice of this type of blocking layer is particularly suitable when the material or functional coating is intended to undergo heat treatment at high temperature.

[0082] Advantageously, the blocking layers are nickel-based metal layers. The nickel-based metal blocking layers may comprise, (before heat treatment), at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, at least 99% or 100% by mass of nickel relative to the mass of the nickel-based metal layer.

[0083] The nickel-based metal layers can be chosen from: - the metallic layers of nickel, - doped nickel metal layers, - metallic layers based on nickel alloy.

[0084] The nickel alloy-based metal layers may be based on a nickel and chromium alloy.

[0085] The blocking layers can also be chosen from titanium metal layers or titanium oxide layers. The choice of this type of layer blocking is particularly suitable when the material or functional coating is used as is, i.e. without heat treatment.

[0086] Each blocking layer has a thickness of between 0.1 and 5.0 nm. The thickness of these blocking layers may be: - at least 0.1 nm, at least 0.2 nm or at least 0.4 nm and / or - not more than 5.0 nm, not more than 2.0 nm, not more than 1.0 nm or not more than 0.5 nm.

[0087] The functional coating may optionally comprise a protective layer. The protective layer is preferably the last layer of the stack, i.e. the layer furthest from the coated substrate of the stack (before heat treatment). These layers generally have a thickness of between 0.5 and 10 nm, between 1 and 5 nm, between 1 and 3 nm or between 1 and 2.5 nm. This protective layer may be chosen from a layer of titanium, zirconium, hafnium, silicon, zinc and / or tin, this or these metals being in metallic, oxidized or nitrided form.

[0088] According to one embodiment, the protective layer is based on zirconium oxide and / or titanium oxide, preferably based on zirconium oxide, titanium oxide or titanium and zirconium oxide. When determining the thickness of a dielectric coating, the thickness of the protective layer is taken into account.

[0089] The transparent substrates according to the invention are preferably made of a rigid mineral material, such as glass, or organic polymer-based (or polymer-based).

[0090] The organic transparent substrates according to the invention may also be made of polymer, rigid or flexible. Examples of polymers suitable according to the invention include, in particular: - polyethylene, - polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN); - polyacrylates such as polymethyl methacrylate (PMMA); - polycarbonates; - polyurethanes; - polyamides; - polyimides; - fluorinated polymers such as fluoroesters such as ethylene tetrafluoroethylene (ETFE), polyvinylidene fluoride (PVDF), polychlorotrifluoroethylene (PCTFE), ethylene chlorotrifluoroethylene (ECTFE), fluorinated ethylene-propylene copolymers (FEP); - photocrosslinkable and / or photopolymerizable resins, such as thiolene, polyurethane, urethane-acrylate, polyester-acrylate resins and - polythiomethanes.

[0091] The substrate is preferably a sheet of glass or glass-ceramic. The substrate is preferably transparent, colorless (in which case it is a clear or extra-clear glass) or colored, for example blue, gray or bronze. The glass is preferably of the soda-lime-silica type, but it can also be of borosilicate or alumino-borosilicate glass. According to a preferred embodiment, the substrate is made of glass, in particular soda-lime-silica or of polymeric organic material.

[0092] The substrate advantageously has at least one dimension greater than or equal to 1 m, or even 2 m and even 3 m. The thickness of the substrate generally varies between 0.5 mm and 19 mm, preferably between 0.7 and 9 mm, in particular between 2 and 8 mm, or even between 4 and 6 mm. The substrate may be flat or curved, or even flexible.

[0093] The present invention relates to the non-heat-treated material. The coating may not have undergone heat treatment at a temperature above 500°C, preferably 300°C.

[0094] The present invention also relates to the heat-treated material. The heat treatments are chosen from: - annealing, for example rapid annealing, - quenching and / or bending.

[0095] The material, i.e. the transparent substrate coated with the stack, may have undergone a heat treatment at high temperature. The stack and the substrate may have been subjected to a heat treatment at a high temperature such as quenching, annealing or bending.

[0096] It is also possible to heat treat only the stack. In this case, only the stack may have undergone heat treatment.

[0097] In both cases, the stack may have undergone heat treatment at a temperature above 300°C, preferably 500°C. The heat treatment temperature (at the stack) is above 300°C, preferably above 400°C, and better still above 500°C.

[0098] According to the invention, it is possible to carry out a rapid thermal annealing process (Rapid Thermal Process) such as laser or flash lamp annealing. Rapid thermal annealing is for example described in applications WO2008 / 096089 and WO2015 / 185848. In these cases, only the stack is subjected to a heat treatment. During this type of treatment, each point of the stack is brought to a temperature of at least 300°C while maintaining a temperature less than or equal to 150°C at any point on the face of the substrate opposite that on which the stack is located. This process has the advantage of heating only the stack, without significant heating of the entire substrate.

[0099] In the case of laser processing, the coated materials can be processed using a laser line formed from laser sources of the InGaAs laser diode or InGaAs laser type. Yb:YAG disc. These continuous sources emit at a wavelength between 900 and 1100 nm. The laser line has a length of the order of 3.3 m, equal to the width 1 of the substrate, and an average full width at half maximum FWHM between 45 and 100 pm.

[0100] The materials are arranged on a roller conveyor so as to travel in a direction X, parallel to its length. The laser line is fixed and positioned above the coated surface of the substrate with its longitudinal direction Y extending perpendicular to the direction X of travel of the substrate, i.e. along the width of the substrate, extending over this entire width.

[0101] The position of the focal plane of the laser line is adjusted to be within the thickness of the functional coating when the substrate is positioned on the conveyor. The surface power of the laser line at the focal plane is less than 100kW / cm2. The substrate was passed under the laser line at a speed of approximately 8 m / min.

[0102] The coating may therefore have been subjected to rapid thermal annealing in which each point of the stack is brought to a temperature of at least 300°C while maintaining a temperature less than or equal to 150°C at any point on the face of the substrate opposite that on which the stack is located.

[0103] It is also possible to combine heat treatments. For example, it is possible to carry out rapid thermal annealing followed by quenching.

[0104] The coating and the substrate may have been subjected to a heat treatment at an elevated temperature above 500°C such as tempering, annealing or bending. The coated substrate of the stack may be a curved or tempered glass.

[0105] The invention also relates to a glazing comprising at least one material according to the invention. The invention relates to a glazing which may be in the form of monolithic, laminated and / or multiple glazing, in particular double glazing or triple glazing.

[0106] Double glazing has 4 faces, face 1 is on the outside of the building and therefore constitutes the outer wall of the glazing, face 4 is on the inside of the building and therefore constitutes the inner wall of the glazing, faces 2 and 3 being on the inside of the double glazing. The stack according to the invention is on face 2 or face 3.

[0107] Triple glazing has 6 faces, face 1 is on the outside of the building and therefore constitutes the outer wall of the glazing, face 6 is on the inside of the building and therefore constitutes the inner wall of the glazing, faces 2 and 3 and 4 and 5 being on the inside of the double glazing. The stack according to the invention can be on face 2, face 3 and / or face 5.

[0108] A laminated glazing comprises at least one structure of the first substrate / sheet(s) / second substrate type. The polymeric sheet may in particular be based on polyvinyl butyral PVB, ethylene vinyl acetate EVA, polyethylene terephthalate PET, polyvinyl chloride PVC. The stack of thin layers is positioned on one at less than the faces of one of the substrates.

[0109] The invention therefore relates to: - a multiple glazing unit of the double glazing type with the stack on face 2, - a multiple glazing unit of the double glazing type with the stack on face 3, - a multiple glazing unit of the triple glazing type with the stack on face 2 and face 5, - a laminated glazing unit with the stack on face 2 or 3. These windows can be mounted on a building or a vehicle.

[0110] The following examples illustrate the invention. Examples

[0111] a. Preparation of substrates: materials and deposition conditions Thin film stacks defined below are deposited on clear soda-lime glass substrates with a thickness of 6 mm. In the examples of the invention: - the functional layers are silver (Ag) layers, - the dielectric layers are based on aluminum-doped silicon nitride (Si3 N4: Al), based on aluminum-doped silicon and zirconium nitride (SiZrN: Al), based on zinc and tin oxide, based on zinc oxide (ZnO). The layers of titanium oxide TiOx, hereinafter referred to as TiOx (1), located above and in contact with the functional layers, are deposited from a ceramic target, in particular under stoichiometric conditions, in a controlled atmosphere comprising oxygen. A first thin layer of titanium oxide-based layer is deposited in contact with the silver layer, from a ceramic target, in a non-oxidizing or very weakly oxidizing atmosphere. Then, a thicker layer of titanium oxide-based layer is deposited from a ceramic target in an oxidizing atmosphere. The titanium oxide-based layer consists of these two parts. During deposition, the part of the titanium oxide-based layer in contact with the functional layer is less oxidized than the part furthest from the functional layer. The layers of titanium oxide TiOx hereinafter called TiOx (2) are deposited from a ceramic target, in particular under stoichiometric without varying the proportions of oxygen during their deposition.

[0112] The conditions for deposition of the layers, which were deposited by sputtering (so-called “magnetron cathode” sputtering), are summarized in Table 1.

[0113] [Tables 1] Materials Target composition Pressure Power Gas sccm Ar o2 n2 ZnO (1) ZnO:A12O3 2%wt ceramic 2 pbar 500 W 40 2 - ZnO (2) Zn:Al metallic 2 ubar 750 15 16 - TiOx (1) TiOx ceramic 2 pbar 500 W 20 - - TiOx (2) TiOx ceramic 2 pbar 2000 W 20 2 - SnZnO Sn:Zn 60 / 40%wt metallic 2 pbar 1500 W 15 32 Ag Ag metallic 8 pbar 210 W 80 - - NiCr Ni:Cr 80:20 %wt metallic 2 ubar 125 W 18 - - Si3N4 Si:Al 8%wt metallic 2 pbar 2000 W 18 - 24 SiZrN Si:Zr 27% at metallic 2 pbar 1000 W 12 - 18

[0114] %wt: % by weight; at%: atomic.

[0115] In the examples, different materials according to the invention and comparative materials were tested. In all the tables setting out the optical characteristics and performances, the characteristics were measured on a double glazing having a 6 / 16 / 4 structure: 6 mm glass / 16 mm interlayer space filled with 90% argon and 10% air / 4 mm glass, the stack being positioned on face 2 (face 1 of the glazing being the outermost face of the glazing, as usual).

[0116] Light transmission levels varying between 40% and 60% were tested. For this, a color box was defined for interior reflection and exterior reflection for all glazing.

[0117] The color box varies only by the level of a* in transmission for the different light transmission levels. The color level (a*) in transmission, and more particularly the search for neutrality in transmission (a*T close to 0), regulates the selectivity of multi-Ag coatings. For the TL cases of 40 and 50%, a*T is greater than -9. For the 60% cases, a*T is greater than -7.

[0118] [T ableaux2] Tab.2 a*, min a*, max b*, min b*, max TL variable 0 -3.0 2.5 RL1 <18 -3.0 -1.0 -10.0 0 RL2 <16 -6.0 0 -5.0 1

[0119] The table below lists the materials and physical thicknesses in nanometers (unless otherwise indicated) of each layer or coating that constitutes the stacks according to their positions with respect to the substrate carrying the stack. The stacks according to the invention are all stacks comprising two silver-based metal layers interposed between dielectric coatings. Example 1

[0120] In this example, the stack comprises an absorbent layer of NiCr between two dielectric layers of Si3N4 in the first dielectric coating. Light transmissions of 40, 50 and 60% are sought: 40% in example 1a, 50% in examples 1b, 1c and 1d and 60% in example 1c. Each example is compared with a stack reaching the same TL and, where applicable, the same aT* index, but not including an absorbent layer.

[0121] Table 3 below lists the different functional coatings tested.

[0122] [Tables3] Table 3 Layers REF la INV la REF 1b INV 1b REF le INV le REF Id INV Id REF le INV le Rev, Dielectric, TiOx 1 1 1 1 1 1 1 1 1 1 Si3N4 32 28 33 28 33 28 31 35 32 31 ZnO 5 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 1.2 0.7 0.7 0.7 0.2 0.7 0.2 0.7 1.0 0.7 Functional layer bound Ag 12.7 18.7 13.8 17.5 13.3 17.0 11.1 13.1 14.1 16.4 Barrier layer NiCr 0.8 0.2 0.5 0.3 0.5 0.2 0.5 0.2 1.0 0.2 Rev, Dielectric, ZnO 5 5 5 5 5 5 5 5 5 5 SnZnO 10 10 10 10 10 10 10 10 10 10 Si3N4 64 64 68 61 69 64 61 60 66 62 ZnO 5 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 3.0 0.7 1.6 0.7 2.5 0.5 3.0 0.6 1.0 0.7 Functional layer bound Ag 8.0 17.4 10.7 14.4 10.9 13.5 8.1 10.7 11.7 12.0 Barrier layer NiCr 3.0 0.3 2.4 0.2 2.3 0.3 2.2 1.6 2.0 0.2 Rev, dielectric, ZnO 5 5 5 5 5 5 5 5 5 5 5 Si3N4 - 49 - 49 - 47 - 40 - 39 NiCr - 4.7 - 3.6 - 3.1 - 2.1 - 2.1 Si3N4 12 5 20 5 40 5 50 12 24 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6 6

[0123] [Fig.l] relates the selectivity S with the neutrality in transmission represented by the index a*T. The black curve shows the values ​​for the reference stacks REF 1b, REF le and REF Id and the gray curve for the stacks according to the invention INV 1b, INV le and INVld. One might think that the selectivity of example Id is not very high (1.709) but it is associated with a very high neutrality (a*T=-2). For this neutrality the corresponding reference stack only reaches a selectivity of 1.623.

[0124] With identical neutrality, the invention always makes it possible to increase the values ​​of S. Example 2

[0125] As in the previous example, the stack comprises an absorbent layer between two dielectric layers of Si3N4 in the first dielectric coating. In this example, the absorbent layer used is either NiCr or TiN. The target TLs are 50% in examples 2a and 2b and 40% in examples 2c, 2d, 2e, 2f, 2g and 2h. Each example is compared with a stack reaching the same TL but not including an absorbing layer. Several levels of transmission neutrality are considered: a*T > -9 ; a*T > -4 ; and a*T > -2

[0126] Table 4 below lists the different functional coatings tested.

[0127] [Tables4] Table 4 Layers REF 2a INV 2a REF _2b INV 2b REF 2c INV 2c INV 2d INV 2e INV 2f INV 2g INV 2h Rev, TiOx 1 1 1 1 1 1 1 1 1 1 1 dielectr Si3N4 33 28 33 27 32 28 32 28 32 27 20 ZnO 5 5 5 5 5 5 5 5 5 5 5 C. barrier NiCr 0.7 0.7 0.2 0.7 1.2 0.7 0.8 0.3 0.3 0.2 1.3 C. funct. Ag 13.8 17.5 13.3 14.8 12.7 18.7 14.5 17.7 12.7 17.2 9.0 C. barrier NiCr 0.5 0.3 0.5 - 0.8 0.2 0.2 0.2 0.8 0.2 2.9 Rev, ZnO 5 5 5 5 5 5 5 5 5 5 5 Dielectr, SnZnO 10 10 10 10 10 10 10 10 10 10 10 Si3N4 68 61 69 62 64 64 59 63 57 64 71 ZnO 5 5 5 5 5 5 5 5 5 5 5 C.barrier NiCr 1.6 0.7 2.5 0.7 3.0 0.7 0.2 0.7 0.2 0.7 0.7 Operating C. Ag 10.7 14.4 10.9 11.6 8.0 17.4 11.4 16.9 9.2 16.3 8.0 C. barrier NiCr 2.4 0.2 2.3 0.5 3.0 0.3 0.3 0.3 0.2 1.0 2.1 Rev, ZnO 5 5 5 5 5 5 5 5 5 5 5 Dielectr, Si3N4 - 49 0 33 - 49 31 48 50 48 41 NiCr - - - - - 4.7 - 4.6 - 4.1 - TiN - 3.6 - 7.1 - - 15 - 18 - 3.9 Si3N4 20 5 40 5 12 5 8 8 8 6 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6 6 6 Example 3

[0128] In this example, as in the previous examples, the stack comprises an absorbent layer between two dielectric layers of Si3N4 in the first dielectric coating.

[0129] In Examples 3a, 3c and 3e, an additional high-index layer is inserted into the first dielectric coating. In Examples 3b, 3d and 3f, a high-index layer high index is inserted in the first and third dielectric coating.

[0130] Each stack according to the invention is compared to a stack reaching the same TL but not comprising an absorbent layer and comprising a high index layer in the first dielectric coating.

[0131] Table 5 below lists the different functional coatings tested.

[0132] [Tables5] Table 5 Layers REF 3a INV 3a INV 3b REF 3c INV 3c INV 3d REF 3e INV 6 3e INV 3f Rev, TiOx 1 1 1 1 1 1 1 1 1 Dielectric, Si3N4 32 37 5 34 30 6 32 29 6 SiZr27N - - 17 - - 18 - - 19 ZnO 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 1.2 0.9 0.2 0.7 0.4 0.7 0.7 0.7 0.7 Functional layer Ag 12.5 13.8 18.4 14.5 17.5 19.9 15.0 17.5 19.1 Barrier layer NiCr 1.2 1.0 0.2 0.2 0.2 0.4 0.5 0.2 0.2 Rev, ZnO 5 5 5 5 5 5 5 5 5 Dielectric, SnZnO 10 10 10 10 10 10 10 10 10 Si3N4 66 70 67 68 64 66 68 64 68 ZnO 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 3.0 0.2 0.7 1.3 0.7 0.7 0.7 0.7 0.7 Function layer, Ag 8.0 14.9 18.7 12.3 16.1 16.5 14.3 13.4 13.9 Barrier layer NiCr 3.0 0.2 0.2 2.9 0.2 0.2 2.3 0.2 0.3 Rev, ZnO 5 5 5 5 5 5 5 5 5 dielectric SiZr27N 6 32 29 13 25 29 17 29 20 Si3N4 - 16 11 - 16 9 - 29 14 NiCr - 5.6 4.8 - 3.6 3.6 - 2.2 2.1 Si3N4 5 6 6 5 5 5 5 5 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6

[0133] b. Optical Properties and Performance Tableau 6 g S TL a* b* RL1 a* b* RL2 a* b* a* R2 60° b* R2 60° Ext REF_la 23,5 1,698 40,0 -5,7 -6,4 20,3 -0,4 -7,6 12,5 -6,4 -6,1 3,0 -10, 0 INV la 21,5 1,853 39,9 -9,0 -2,9 12,0 -2,8 0,0 19,5 -5,8 -5,0 1,4 -3,3 REF 1b 28,1 1,781 50,0 -5,2 -3,4 18,7 -0,4 -7,7 14,3 -6,2 -6,0 1,2 -10, 0 INV 1b 25,6 1,919 49,1 -5,8 -2,4 7,7 -1,4 -1,5 15,9 0,0 -5,0 1,2 -2,2 REF le 28,4 1,761 50,0 -3,8 -3,6 18,3 -0,8 -4,1 15,9 -5,8 -6,5 1,0 -10, 0 INV le 26,4 1,871 49,3 -4,0 -2,5 7,8 -1,0 -2,6 15,8 -4,9 -5,1 1,3 -4,2 REF Id 30,8 1,623 50,0 -2,0 -3,9 15,5 -4,9 -0,3 16,0 -7,6 -5,2 2,8 -9,9 INV Id 29,3 1,709 50,0 -2,0 -3,1 8,9 -2,9 -2,3 15,8 -7,8 -5,0 2,8 -6,3 REF le 32,8 1,798 59,0 -4,4 -2,4 15,2 -0,7 -6,5 14,4 -6,6 -5,6 3,0 -10, 0 INV le 31,5 1,871 59,0 -4,7 -0,8 8,8 -2,9 -1,0 13,4 0,0 -5,0 3,0 -5,5 Ex 2 REF 2a 28,1 1,781 50,0 -5,2 -3,4 18,7 -0,4 -7,7 14,3 -6,2 -6,0 1,2 -10, 0 INV 2a 26,2 1,894 49,7 -6,0 -0,5 7,8 -1,0 0,0 15,2 0,0 -5,0 1,1 -1,7 REF 2b 28,4 1,761 50,0 -3,8 -3,6 18,3 -0,8 -4,1 15,9 -5,8 -6,5 1,0 -10, 0 INV 2b 27,1 1,834 49,6 -4,0 -0,4 8,5 -0,6 0,0 15,9 -4,1 -5,1 3,0 -4,3 , REF 2c 23,5 1,698 40,0 -5,7 -6,4 20,3 -0,4 -7,6 12,5 -6,4 -6,1 3,0 -10, 0 INV 2c 21,5 1,853 39,9 -9,0 -2,9 12,0 -2,8 0,0 19,5 -5,8 -5,0 1,4 -3,3 INV 2d 21,4 1,867 40,0 -9,0 -2,9 7,9 -1,0 -0,2 15,7 0,0 -5,0 1,0 -1,9 INV 2e 21,1 1,899 40,0 -5,9 -3,1 7,8 -1,0 -0,2 22,0 -5,9 -5,1 1,0 -0,6 INV 2f 22,9 1,750 40,0 -6,2 -2,3 11,3 -1,0 -6,9 12,5 -3,8 -2,4 1,4 -7,1 INV 2g 21,4 1,861 39,8 -4,0 -3,6 8,1 -0,9 -0,1 21,9 -5,9 -5,3 1,0 -1,1 Ex 3 REF 3a 23,6 1,697 40,0 -6,0 -6,6 18,5 -0,2 -8,8 12,1 -6,4 -6,8 2,8 -10, 0 INV 3a 21,4 1,868 40,0 -9,0 -3,0 9,3 -1,0 -8,2 14,7 0,0 -3,4 1,0 -7,8 INV 3b 19,0 2,070 39,4 -9,0 -0,9 8,5 -1,1 -0,8 20,4 -1,7 -5,0 1,4 -1,4 REF 3c 27,1 1,846 50,0 -6,0 -3,0 18,1 -1,2 -4,8 15,1 -5,7 -5,1 2,6 -8,6 INV 3c 24,8 1,980 49,0 -7,4 -1,9 7,8 -1,4 -2,1 15,5 0,0 -4,9 2,5 -3,4 INV 3d 23,7 2,068 49,1 -7,9 0,4 8,1 -1,4 -0,8 15,9 -0,1 -4,7 2,9 -4,5 REF 3e 31,4 1,876 59,0 -4,5 -1,6 16,3 -2,6 -0,2 16,1 -5,2 -5,3 3,0 -7,9 INV 3e 30,6 1,926 59,0 -4,6 -0,2 9,0 -1,0 0,4 13,1 -0,8 -5,2 3,0 -3,2 INV 3f 29.6 1.996 59.0 -5.6 2.2 9.3 -2.9 0.0 13.7 -2.5 -5.0 2.9 -7.1,

[0134] In comparison with a stack reaching the same TL, and depending on the case, the same color in transmission (index a*T), we can see that the Selectivity S is improved each time.

[0135] The solution of the invention makes it possible to improve selectivity while obtaining in combination:

[0136] - excellent transmission neutrality,

[0137] - low external reflection values,

[0138] - colors in neutral reflection.

Claims

Claims

1. Material comprising a substrate coated with a functional coating comprising an alternation of only two silver-based metallic functional layers called, starting from the substrate, first and second functional layers and three dielectric coatings called, starting from the substrate, Di1, Di2 and Di3, each dielectric coating comprising at least one dielectric layer, so that each functional metallic layer is arranged between two dielectric coatings, characterized in that: the first dielectric coating Di1 located below the first functional layer comprises an absorbent layer located between two dielectric layers, said absorbent layer being chosen from: - layers based on a metal or a metal alloy, - layers of metal nitride, and - layers of metal oxynitride;the metallic element(s) being chosen from nickel, chromium, niobium, vanadium, titanium, tungsten, palladium, stainless steel, molybdenum, zirconium, tantalum and zinc.;

2. Material according to the preceding claim, characterized in that the functional coating comprises one or more metallic blocking layers located in contact with, below and / or above the first and / or second metallic functional layer.

3. Material according to any one of the preceding claims, characterized in that the first dielectric coating Dil located below the first functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm.

4. Material according to the preceding claim, characterized in that the high index layer is located between the absorbent layer and the first functional layer.

5. Material according to any one of the preceding claims, characterized in that the third dielectric coating Di3 located above the second functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm.

6. Material according to any one of the preceding claims, characterized in that the absorbent layer is chosen from the layers metallic layers based on nickel and / or chromium and layers based on titanium nitride.

7. Material according to the preceding claim, characterized in that the second dielectric coating further comprises a layer based on tin oxide, preferably based on zinc and tin oxide comprising at least 10% by mass of tin relative to the total mass of zinc and tin.

8. Material according to the preceding claim, characterized in that the tin oxide-based layer has a thickness: - greater than 5 nm, - less than 40 nm.

9. Material according to any one of claims 3 to 8, characterized in that the high refractive index layers are chosen from layers based on titanium oxide and layers based on silicon and zirconium nitride.

10. Material according to any one of claims 3 to 9, characterized in that the high refractive index layers have a thickness greater than 10 nm.

11. Material according to any one of the preceding claims, characterized in that the dielectric coating located below the first functional layer comprises a zinc oxide-based layer located in contact with the first functional layer or separated from the first functional layer by a blocking layer.

12. Material according to any one of the preceding claims, characterized in that the dielectric coating located below the second functional layer comprises a zinc oxide-based layer located in contact with the second functional layer or separated from the second functional layer by a blocking layer.

13. Material according to any one of the preceding claims, characterized in that it has a light transmission of between 20 and 70%, preferably between 35 and 65%.

14. Glazing comprising material according to any one of claims 1 to 13 in the form of multiple glazing or laminated glazing.

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