Manufacturing process of an image sensor

Abstract

Method for manufacturing an image sensor The present description relates to a method for manufacturing an image sensor comprising the formation of an opening in a substrate, the formation of a conductive pad (13) covering the sides of the opening and delimiting a gap (16) in the opening, the formation of microlenses (23) in a layer (15) of a first resin, the layer (15) of the first resin covering the pad (13) and penetrating into the gap (16), the formation of a mask of a second resin, on and in contact with the layer (15) of the first resin, the chemical plasma etching of the layer (15) of the first resin, through the mask, delimiting a block (36) of the first resin in the gap (16), the deposition of a protective layer (40) on the microlenses (23) and on the block (36), the removal of the part of the protective layer (40) covering the block (36), and the engraving of the block (36). Figure for the abstract: Fig. 21

Images