Method for manufacturing a cathode for an electrochemical cell and associated installation

Abstract

Method for manufacturing a cathode for an electrochemical cell and associated installation. The invention relates to a method for manufacturing a cathode (12) for an electrochemical cell, comprising the following steps: a) on a substrate (14), deposition of a strip (80) of a first fluid composition (66) comprising a cathode active material and a first solvent; b) deposition of a strip (84) of a second fluid composition (68) comprising an insulating material and a second solvent; the strips form an interface (88) parallel to a principal axis (25); c) complete evaporation of the first solvent; and d) complete evaporation of the second solvent; step c) occurring after step a) and step d) occurring after step b). The method further comprises, before steps c) and d), a step e) consisting of exposing the interface (88) to a laser beam (74). Figure: Figure 1

Description

Title of the invention: Method for manufacturing a cathode for an electrochemical cell and associated installation

[0001] The present invention relates to a method for manufacturing a cathode for an electrochemical cell, the method comprising the following steps: a) on a first face of a substrate, deposition of a first strip of a first fluid composition, said first strip extending parallel to a principal axis, the first fluid composition comprising an active cathode material and a first solvent; b) on said first face of the substrate, deposition of a second strip of a second fluid composition parallel to the principal axis, the second fluid composition comprising a first electrical insulating material and a second solvent; the first and second strips thus forming a first interface parallel to the principal axis; c) complete evaporation of the first solvent, so as to obtain a first cathode layer on the first face of the substrate;and d) complete evaporation of the second solvent, so as to obtain a first insulating layer on the first face of the substrate; step c) taking place after step a) and step d) taking place after step b). ;

[0002] The invention is particularly applicable to Li-ion cathodes, such as Li-NMC (lithium nickel manganese cobalt) and / or LFP (lithium iron phosphate) and / or LMFP (lithium manganese iron phosphate) cathodes.

[0003] When deposited on the substrate, the interface between the first and second fluid compositions may undergo unintended diffusion of the solvent from one composition to the other. This results in a chemical modification of the interface, leading to a loss of capacitance and / or a reduction in the electrical insulation of the resulting cathode.

[0004] The object of the present invention is to propose an improvement to the method described above. To this end, the invention relates to a process of the type described above, further comprising, after steps a) and b) and before steps c) and d), a step e) of exposing the first interface to a first laser beam so as to at least partially evaporate the first and second solvents at the first interface.

[0005] In other advantageous aspects of the invention, the method comprises one or more of the following features, taken alone or in any technically feasible combination:

[0006] - step b) occurs after step a) and the first interface comprises an area of overlap, the second fluid composition being deposited on the first fluid composition in said overlap zone;

[0007] - on either side of the first interface, the first band and the second band have respectively a first thickness and a second thickness; and the second thickness is between 5% and 50% of the first thickness;

[0008] - the first laser beam is provided by a first laser source, said first laser source and the first laser beam extending along a first laser axis, substantially perpendicular to the substrate; and the first laser source has a periodic motion around the first laser axis;

[0009] - in a transverse direction perpendicular to the main axis, the laser beam has a laser width; and in the transverse direction, an amplitude of the periodic motion of the first laser source is less than the laser width, preferably less than 50% of said width;

[0010] - the method also includes the following steps: f) on the first face of the substrate, deposition of a third band of a third fluid composition parallel to the main axis, the third fluid composition comprising a second electrically insulating material and a third solvent; the first and third bands, thus forming a second interface parallel to the main axis; then g) exposure of the second interface to a second laser beam, so as to evaporate at least partially the first and third solvents at the second interface; then h) complete evaporation of the third solvent, so as to obtain a second insulating layer on the first face of the substrate;

[0011] - the method also includes the following steps: i) on a second face of the substrate, deposition of a fourth band of a fourth fluid composition; said fourth band extends parallel to the principal axis, symmetrically to the first band with respect to the substrate; the fourth fluid composition comprising a cathode active material and a fourth solvent; j) on said second face of the substrate, deposition of a fifth band of a fifth fluid composition parallel to the principal axis, symmetrically to the second band with respect to the substrate; the fifth fluid composition comprising a third electrical insulating material and a fifth solvent; the fourth and fifth bands thus forming a third interface parallel to the principal axis; then k) expose the third interface to a third laser beam, so as to at least partially evaporate the fourth and fifth solvents at the third interface;then 1) complete evaporation of the fourth solvent, so as to obtain a second cathodic layer on the second face of the substrate; and complete evaporation of the fifth solvent, in order to obtain a third insulating layer on the second face of the substrate.

[0012] The invention also relates to an installation for manufacturing a cathode for an electrochemical cell, comprising: a displacement device, designed to move the substrate along the main axis of said substrate; a first an applicator, designed to deposit the first fluid composition onto the moving substrate, so as to form the first strip; a second applicator, designed to deposit the second fluid composition onto the moving substrate, so as to form the second strip; a drying device, designed to achieve complete evaporation of the first and second solvents; and a pre-drying unit comprising the first laser source, said pre-drying unit being disposed between the second applicator and the drying device along the main axis; the installation is configured to implement a manufacturing method as described above.

[0013] In a preferred embodiment, the second applicator is arranged between the first applicator and the drying device along the main axis.

[0014] The invention also relates to a cathode for an electrochemical cell, comprising: a substrate; and a cathode layer and an insulating layer deposited on one face of said substrate, the cathode layer having the form of a strip and being delimited by an edge extending along the main axis; the insulating layer has the form of a strip and extends along the edge of the cathode layer; the cathode is produced by a manufacturing method as described above.

[0015] The invention will be better understood in the light of the following description, which is given by way of non-limiting example, with reference to the drawings, in which:

[0016] [Fig-1] Fig. 1 is a schematic, top view of an installation of production of a cathode for an electrochemical cell according to an embodiment of the invention;

[0017] [Fig.2] Fig.2 is a cross-sectional view of the installation of Fig.1, during a step of a method according to an embodiment of the invention; and

[0018] [Fig.3] The [Fig.3] is a cross-sectional view of a product resulting from the method, according to an embodiment of the invention.

[0019] Fig. 1 shows an installation 10 for the manufacture of a cathode, according to an embodiment of the invention.

[0020] More specifically, the installation 10 is designed for the manufacture of an assembly 12, illustrated in [Fig. 1]. The assembly 12 is designed to be used in the manufacture of an electrochemical cell cathode.

[0021] Figure 3 shows a cross-sectional view of an assembly 112 according to another embodiment. The assembly 112 is also manufactured using the apparatus 10 and can be used in the manufacture of an electrochemical cell cathode.

[0022] Assemblies 12 and 112 are described together below, the common elements being designated by the same reference number.

[0023] The assembly 12, 112 comprises: a substrate 14; a first cathode layer 16; and first 18 and second 20 insulating layers. The assembly 112 of [Fig. 3] also includes a second cathode layer 22, a third insulating layer 24 and a fourth insulating layer (not shown).

[0024] The substrate 14 is in the form of a strip and extends along a principal axis 25. The substrate 14 has a first side 26 and a second side 28 that are opposite. Preferably, the substrate has a first transverse dimension 30 that is substantially constant and perpendicular to the principal axis 25.

[0025] Preferably, the substrate 14 is metallic. Preferably, the substrate 14 is made of an aluminum foil.

[0026] The first cathode layer 16 has the shape of a band and extends over the first face 26 of the substrate 14, along the main axis 25.

[0027] The first cathode layer 16 is defined by a first 32 and a second 34 opposite edges, parallel to the main axis 25. The first cathode layer 16 has a second transverse dimension 36 substantially constant, perpendicular to the main axis 25, between the first edge 32 and the second edge 34.

[0028] The first insulating layer 18 is in the form of a strip and extends over the first face 26 of the substrate 14, along the first edge 32 of the first cathode layer 16. The first cathode layer 16 and the first insulating layer 18 are in contact with each other along the first edge 32. The first insulating layer 18 has a substantially constant third transverse dimension 38, perpendicular to the main axis 25.

[0029] The second insulating layer 20 is in the form of a strip and extends over the first face 26 of the substrate 14, along the second edge 34 of the first cathodic layer 16. The first cathodic layer 16 and the second insulating layer 20 are in contact with each other along the second edge 34. The second insulating layer 20 has a substantially constant fourth transverse dimension 40, perpendicular to the main axis 25.

[0030] Preferably, the first transverse dimension 30 is greater than the sum of the second transverse dimension 36, the third transverse dimension 38 and the fourth transverse dimension 40, so that each of the first insulating layer 18 and second insulating layer 20 is away from an edge of the substrate 14.

[0031] Preferably, the second transverse dimension 36 is greater than the third transverse dimension 38 and fourth transverse dimension 40. Preferably, the third transverse dimension 38 and fourth transverse dimension 40 are substantially equal.

[0032] In the assembly 112 of [Fig.3], the second cathode layer 22 is in the form of a band and extends over the second face 28 of the substrate 14, along the main axis 25. Preferably, the first cathode layer 16 and the second cathode layer 22 are substantially symmetrical with respect to each other with respect to the substrate 14. The second cathode layer 22 includes a third edge 42, symmetrical to the first edge 32 of the first cathode layer 16.

[0033] The third insulating layer 24 of the assembly 112 is in the form of a strip and extends over the second face 28 of the substrate 14, along the third edge 42 of the second cathodic layer 22. The second cathodic layer 22 and the third insulating layer 24 are in contact with each other along the third edge 42. Preferably, the first insulating layer 18 and the third insulating layer 24 are substantially symmetrical with respect to each other with respect to the substrate 14.

[0034] Similarly, the fourth insulating layer (not shown) of the assembly 112 is symmetric to the second insulating layer 20 with respect to the substrate 14.

[0035] The installation 10 comprises: a displacement device 50; a first applicator 52, a second applicator 54 and a third applicator 56; a drying device 58; and a first pre-drying unit 60 and a second pre-drying unit 62.

[0036] The displacement device 50 is designed to move the substrate 14 horizontally. An orthonormal basis (X, Y, Z), associated with the moving device 50, is considered. Z represents the vertical direction. In [Fig. 1], the displacement device 50 is configured to move the substrate 14 along X, with the principal axis 25 parallel to X and the first side 26 of the substrate 14 pointing upwards.

[0037] In the embodiment illustrated in [Fig.1], the displacement device 50 comprises rollers 64 rotating around axes parallel to Y.

[0038] The first applicator 52 is configured to deposit on the substrate 14 a first fluid composition 66, precursor of the first cathode layer 16.

[0039] In the present description, the term "fluid composition" preferably refers to a composition in the form of a slurry, that is to say, a composition comprising solid particles mixed with a solvent.

[0040] The first fluid composition 66 comprises a cathode material and a first solvent. The active material of the cathode is, for example, a Li-NMC (lithium nickel manganese cobalt) material, or an LFP (lithium iron phosphate) material, or an LMFP (lithium manganese iron phosphate) material, or a mixture of these materials.

[0041] The second applicator 54 is configured to deposit a second fluid composition 68, a precursor of the first insulating layer 18, onto the substrate 14. The second fluid composition 68 comprises a first electrical insulating material and a second solvent. Preferably, the first electrical insulating material is suitable for forming a first ceramic-type electrical insulating layer 18.

[0042] The third applicator 56 is configured to deposit onto the substrate 14 a third fluid composition 70, precursor of the second insulating layer 20. The The third fluid composition 70 comprises a second electrical insulating material and a third solvent. Preferably, the second electrical insulating material is suitable for forming a second ceramic-type insulating layer 20.

[0043] For example, the first applicator 52, second applicator 54 and third applicator 56 are slotted applicators. In the installation 10, the first applicator 52, second applicator 54 and third applicator 56 are arranged above the substrate 14.

[0044] According to one embodiment, the second fluid composition 68 and third fluid composition 70 are substantially identical.

[0045] According to the embodiment of [Fig. 1], the second applicator 54 and third applicator 56 are aligned along the Y direction. According to the embodiment of [Fig. 1], the first applicator 52 is not aligned along the Y direction with the second applicator 54 and third applicator 56, as detailed below.

[0046] According to another embodiment (not illustrated), the first applicator 52, the second applicator 54 and the third applicator 56 are aligned along Y, the first applicator 52 being located between the second applicator 54 and the third applicator 56.

[0047] The drying device 58 is configured to evaporate the first, second, and third solvents of the first fluid composition 66, second fluid composition 68, and third fluid composition 70, in order to obtain the first cathodic layer 16 and the first insulating layer 18 and second insulating layer 20, respectively. For example, the drying device 58 is a convection oven extending along X between two open ends.

[0048] In the installation 10, the drying device 58 is arranged on a path along X of the substrate 14, downstream of the first applicator 52, second applicator 54 and third applicator 56. “Downstream” means that the substrate 14 passes through the drying device 58 after interacting with the first applicator 52, the second applicator 54 and the third applicator 56.

[0049] According to the embodiment of [Fig.1], the second applicator 54 and the third applicator 56 are closer to the drying device 58 than the first applicator 52. In other words, in the example of [Fig.1], the second applicator 54 and the third applicator 56 are downstream of the first applicator 52.

[0050] Each of the first pre-drying unit 60 and second pre-drying unit 62 is arranged above the substrate 14 and includes a laser source 72, capable of directing a laser beam 74 towards the substrate 14. Said laser beam 74 extends substantially parallel to Z.

[0051] In the installation 10, the first pre-drying unit 60 is substantially aligned along X with the second application device 54 and located downstream of said second application device. Similarly, the second pre-drying unit 62 is substantially aligned along X with the third application device 64 and located downstream of said third application device. The positions of the first pre-drying unit 60 and the second pre-drying unit 62 will be specified below.

[0052] Preferably, each pre-drying unit 60, 62 is arranged as close as possible along X of the corresponding applicator 54, 56.

[0053] As shown below, the laser source 72 of each of the first pre-drying unit 60 and second pre-drying unit 62 is chosen to optimize the drying of the first, second, and / or third solvents. In one embodiment, the laser source 62 is an infrared laser source, for example, with a wavelength chosen in the range of 900–1100 nm. In another embodiment, the wavelength is chosen in the visible light, for example, in the range of 400–460 nm for a blue laser. In yet another embodiment, the wavelength is chosen in the UV light, for example, in the range of 350–400 nm.

[0054] For example, the power of the laser source 72 is chosen between 20 W and 200 W.

[0055] The laser source 72 of each of the first pre-drying unit 60 and second unit The pre-drying unit 62 extends along a laser axis 75, illustrated in [Fig. 2] for the first pre-drying unit. In the embodiment of Figures 1 and 2, the laser axis 75 is parallel to Z.

[0056] The laser source 72 is configured so that the laser beam 74 is substantially parallel to the laser axis 75. The laser beam 74 has a laser width 76 along Y.

[0057] In one embodiment, the pre-drying unit 60, 62 also includes a movable element 78 capable of applying periodic motion, around the laser axis 75, to the laser source 72 and the laser beam 74. For example, the periodic motion is selected from circular oscillation, elliptical oscillation, and linear oscillation. The characteristics of the periodic motion are detailed below.

[0058] A method for manufacturing the assembly 12, 112 using the installation 10 will now be described.

[0059] First, the substrate 14 is moved by means of the displacement device 50, as illustrated in [Fig. 1]. The substrate 14 moves horizontally along the main axis 25, with the first side 26 oriented upwards. For example, the speed of displacement of the substrate 14 is between 20 and 100 meters per minute.

[0060] Simultaneously, the first applicator 52 deposits the first fluid composition 66 onto the first face 26 of the substrate, continuously, using the die-cutting technique. A first strip 80 of the first fluid composition 66 is thus deposited onto the substrate 14, as a precursor to the first cathode layer 16. The first strip 80 has a first thickness 82 along Z.

[0061] Simultaneously, the second applicator 54 deposits the second fluid composition 68 onto the first face 26 of the substrate, continuously, using the die-cutting technique. A second strip 84 of the second fluid composition 68 is thus deposited onto the substrate 14, as a precursor to the first insulating layer 18.

[0062] It is considered that a transverse dimension of the second band 84 along Y is approximately the same as the third transverse dimension 38 of the first insulating layer 18.

[0063] The second strip 84 has a second thickness 86 along Z, preferably less than the first thickness 82. Preferably, the second thickness 86 is between 5% and 20% of the first thickness 82.

[0064] The first band 80 and the second band 84 are in contact with each other, so as to form a first interface 88 extending parallel to the main axis 25.

[0065] In the embodiment of Figures 1 and 2, the first interface 88 has the shape of an overlap zone. More specifically, when the second applicator 54 is positioned downwards relative to the first applicator 52, an edge 90 of the second strip 84 overlaps an edge 92 of the first strip 80, thus forming the overlap zone of the first interface 88.

[0066] The first interface 88 has an interface width 93 along Y. Preferably, the interface width 93 is less than 25%, more preferably less than 20%, of the transverse dimension of the second band 84.

[0067] Simultaneously, the third applicator 56 deposits the third fluid composition 70 onto the first face 26 of the substrate, continuously, using the die-cutting technique. A third strip 94 of the third fluid composition 70 is thus deposited onto the substrate 14, as a precursor to the second insulating layer 20. The first strip 80 and the third strip 94 are in contact with each other, so as to form a second interface 96 extending parallel to the main axis 25. The second interface 96 is similar to the first interface 88 described above.

[0068] Next, the first interface 88 is exposed to the laser beam 74 of the first pre-drying unit 60. More specifically, the installation 10 is configured so that the laser axis 75 of the first pre-drying unit 60 is positioned along Y so as to be substantially centered on the first interface 88. Consequently, the energy of the laser beam 74 is essentially used to evaporate the solvents from the edges 90, 92 of the first band 80 and second band 84 described above.

[0069] Preferably, the installation 10 is configured so that the ratio between the width 76 of the laser beam 74 and the width 93 of the first interface 88 is between 0.5 and 2.0.

[0070] According to one embodiment, a periodic movement around the laser axis 75 is applied to the laser source 72 as described above. Preferably, the amplitude 98 of the periodic movement along Y is less than the width of the laser 76, preferably less than 50% of the width of the laser 76. The periodic movement of the laser source 72 improves the drying of the edges 90, 92 of the first band 80 and the second band 84.

[0071] Like the first interface 88, the second interface 96 is exposed to the laser beam 74 of the second pre-drying unit 62.

[0072] The laser beams 74 allow for at least partial evaporation of the solvents from the first interface 88 and the second interface 96, immediately after the formation of these interfaces 88, 96. Solvent diffusion between the fluid compositions of the interfaces 88 and 96 is therefore reduced, thus chemically preserving each composition. The quality of the interface 88, 96 is thereby improved.

[0073] After laser exposure of the interfaces, the substrate 14 and the bands 80, 84, 94 enter the drying device 58.

[0074] Preferably, the temperature in the drying device 58 is below 175 °C and more preferably between 70 °C and 150 °C. Indeed, it is preferable to limit the drying temperature to preserve the properties of the first fluid composition 66, precursor of the first cathode layer 16.

[0075] In the drying device 58, the solvents of the first fluid composition 66, second fluid composition 68, and third fluid composition 70 are completely evaporated, leading to the formation of the first cathodic layer 16 and the first insulating layer 18 and second insulating layer 20, respectively. This results in the assembly 12 described above.

[0076] In order to obtain the assembly 112 described above, the process described above for obtaining the assembly 12 is then repeated on the second face 28 of the substrate 14. According to one embodiment (not illustrated), the installation 10 comprises another set of applicators 52, 54, 56, pre-drying units 60, 62 and a drying device 58. According to another embodiment (not illustrated), the displacement device 50 is configured to turn over the substrate 14, so as to pass the second face 28 of the substrate 14 under the applicators 52, 54, 56, the pre-drying units 60, 62 and the drying device 58 described above.

[0077] The assembly 12, 112 is then used, for example, to form the cathode of an electrochemical cell. List of documents cited

[0078] [Tables] 10. Installation for manufacturing a cathode 12, 112 Cathode manufacturing setup 14 Substrate 16 First cathode active material layer 18 First electrical insulating layer 20 Second electrical insulating layer 22 Second cathode active material layer 24 Third electrical insulating layer 25 Main axis 26 First substrate face 28 Second substrate face 30 First cross-sectional dimension 32 First edge of first cathode layer 34 Second edge of first cathode layer 36 Second cross-sectional dimension 38 Third cross-sectional dimension 40 Fourth cross-sectional dimension 42 Third edge of second cathode layer 50 Moving device 52 First applicator 54 Second applicator 56 Third applicator 58 Drying device 60 First pre-drying unit 62 Second pre-drying unit 64 Roller 66 First fluid composition 68 Second fluid composition 70 Third fluid composition 72 Laser source 74 Laser beam 75 Laser axis 76 Laser width 78 Moving element 80 First band 82 First thickness 84 Second band 86 Second thickness 88 First interface 90 Edge of the second band 92 Edge of the first band 93 Interface width 94 Third band 96 Second interface 98 Amplitude of a laser source movement

Claims

Demands

1. A method for manufacturing a cathode (12, 112) for an electrochemical cell, the method comprising the following steps: a) on a first face (26) of a substrate (14), deposition of a first strip (80) of a first fluid composition (66), this first strip extending parallel to a principal axis (25), the first fluid composition comprising a cathode active material and a first solvent; b) on said first face (26) of a substrate, deposition of a second strip (84) of a second fluid composition (68), parallel to the principal axis, the second fluid composition comprising a first electrical insulating material and a second solvent; the first and second strips thus forming a first interface (88) parallel to the principal axis; c) complete evaporation of the first solvent, so as to obtain a first cathode layer (16) on the first face of the substrate;and d) complete evaporation of the second solvent, so as to obtain a first insulating layer (18) on the first face of the substrate; step c) taking place after step a) and step d) taking place after step b); the process being characterized in that it further comprises, after steps a) and b) and before steps c) and d), a step e) consisting of exposing the first interface (88) to a first laser beam (60, 74), so as to evaporate at least partially the first and second solvents at the first interface (88).

2. A method according to claim 1, wherein step b) occurs after step a) and wherein the first interface (88) comprises an overlap zone (90, 92), the second fluid composition being deposited on the first fluid composition in said overlap zone.

3. A method according to claim 1 or 2, wherein: on either side of the first interface, the first strip (80) and the second strip (84) have respectively a first thickness (82) and a second thickness (86); and the second thickness is between 5% and 50% of the first thickness.

4. A method according to any one of the preceding claims, wherein: the first laser beam (74) is provided by a first source

5.

6.

7. laser (72), said first laser source and first laser beam extending along a first laser axis (75), substantially perpendicular to the substrate; and the first laser source has a periodic motion about the first laser axis. A method according to claim 4, wherein: in a transverse direction (Y) perpendicular to the principal axis, the laser beam (74) has a laser width (76); and in the transverse direction, an amplitude of the periodic motion of the first laser source is less than the laser width (76), preferably less than 50% of said laser width (76). A method according to any one of the preceding claims, also comprising the following steps: f) on the first face (26) of a substrate (14), deposition of a third band (94) of a third fluid composition (70) parallel to the main axis, the third fluid composition comprising a second electrically insulating material and a third solvent; the first and third bands thus forming a second interface (96) parallel to the main axis; then (g) exposing the second interface (90) to a second laser beam (62, 74) so ​​as to at least partially evaporate the first and third solvents at the second interface (96); then (h) completely evaporating the third solvent, so as to obtain a second insulating layer (20) on the first face of the substrate. A method according to any one of the preceding claims, further comprising the following steps: (i) on a second face (28) of the substrate (14), deposition of a fourth band of a fourth fluid composition (66); said fourth band extends parallel to the main axis (25), symmetrically to the first band (80) with respect to the substrate (14); the fourth fluid composition comprising a cathode active material and a fourth solvent; (j) on said second face (28) of the substrate, deposition of a fifth band of a fifth fluid composition (68) parallel to the main axis (25), symmetrically to the second band (84) with respect to the substrate (14); the fifth fluid composition comprising a third electrical insulating material and a fifth solvent; the fourth and fifth bands thus forming a third interface parallel to the main axis; then k) exposure of the third interface to a third laser beam (60, 74), so as to evaporate at least partially the fourth and fifth solvents at the third interface; then 1) complete evaporation of the fourth solvent, so as to obtain a second cathodic layer (16) on the second face of the substrate; and complete evaporation of the fifth solvent, so as to obtain a third insulating layer (24) on the second face of the substrate.

8. An installation (10) for manufacturing a cathode (12, 112) for an electrochemical cell, comprising: - a displacement device (50), designed to move the substrate (14) along the main axis (25) of said substrate; - a first applicator (52), designed to deposit the first fluid composition (66) onto the moving substrate, so as to form the first band (80); - a second applicator (54), designed to deposit the second fluid composition (68) onto the moving substrate, so as to form the second band (84); - a drying device (58), designed to carry out the complete evaporation of the first and second solvents; and - a pre-drying unit (60) comprising the first laser source (62), said pre-drying unit being disposed between the second applicator (54) and the drying device (58) along the main axis; the installation being configured for the implementation of a process according to one of the preceding claims.

9. Installation (10) according to claim 9, wherein the second applicator (54) is disposed between the first applicator (52) and the drying device (58) along the main axis.

10. Cathode (12, 112) for electrochemical cell, comprising: a substrate (14); and a cathode layer (16) and an insulating layer (18) deposited on a face (26) of said substrate, the cathode layer being in the form of a strip and delimited by an edge (32) extending along the main axis; the insulating layer is in the form of a strip and extends along the edge (32) of the cathode layer; the cathode being produced by a process according to any one of claims 1 to 7.

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