Photomask

JP1816216SActive Publication Date: 2026-01-09SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
JP2024017092D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2021-09-27
Publication Date
2026-01-09
Estimated Expiration
2046-09-27

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Abstract

This article is a photomask. As shown in the enlarged view (reference enlarged plan view) of the area surrounded by the dashed line in the plan view and bottom view, and the cross-sectional view (reference cross-sectional view) taken along the dashed line A-A' in the enlarged view, this article has an opening through which a laser passes. This article is used in a method for lifting an optical device (e.g., an LED) by irradiating a laser through the opening (LIFT: Laser Induced Forward Transfer).
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