Shower head for semiconductor substrate processing

JP1825862SActive Publication Date: 2026-05-01LAM RES CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
LAM RES CORP
Filing Date
2025-12-12
Publication Date
2026-05-01

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Abstract

The article to which this application pertains (hereinafter referred to as "the Article") is, for example, a shower head for releasing processing gases used in the manufacturing process of semiconductors.
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