Insert for source chamber of EUV radiation source

Abstract

To improve an EUV radiation source, particularly an insert for an EUV radiation source.SOLUTION: An insert (11) for a source chamber (2) of an EUV radiation source (1) has a pressure stage (12), and a stop (13) separated from the pressure stage (12).SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The contents of German Patent Application No. 102021207565.7 are incorporated by reference.

[0002] The present invention relates to an insert for a source chamber of an EUV radiation source. Furthermore, the present invention relates to an EUV radiation source having a corresponding insert. Finally, the present invention relates to an EUV radiation source module. [Background technology]

[0003] Radiation sources for generating EUV radiation are known from the prior art. These radiation sources generally have a source chamber in which a plasma is generated. An exit opening (aperture) for the radiation is provided in the source chamber. Deposits can form in the area of ​​the exit opening, which must be removed since they cause obstructions to the beam exiting the radiation source. Summary of the Invention

[0004] An object of the present invention is to provide an improved EUV radiation source, and in particular an improved insert for an EUV radiation source.

[0005] These objects are achieved by the insert according to the invention and by a radiation source having a corresponding insert.

[0006] One aspect of the invention is to design the insert in such a way that its different functions, in particular the spatial separation of the two areas for generating a pressure difference and the outer delimitation of the beam passage area, are separated from one another. In particular, it has been found to be advantageous if the different functions of the insert are generated by different components thereof.

[0007] The constituent parts do not have to be structurally distinct constituent parts. However, this is possible as well. Generally, the following description refers to different regions of the insert. The term "region" is not to be understood here only geometrically, but rather relates to an object. "Region" has substantially the same meaning as the term "constituent part," but leaves open the possibility that two different regions may be formed on a single constituent part, in particular on one structural element.

[0008] In particular, it has been found that it can be advantageous to spatially separate the functions that mechanically separate the source chambers to create / maintain a pressure differential between the source chambers and the throttling effect of the insert.

[0009] The first region, which acts to generate a specified minimum process pressure difference between two partial chambers of the EUV radiation source, is positioned with an offset in the beam emission direction relative to the region acting as an aperture stop, so that the first region can be formed so that it has a specified minimum distance from the smallest outer envelope around the maximum possible beam geometry defined by the aperture stop.

[0010] This has the advantage that contamination, especially debris accumulation in the first region, does not lead to a restriction of the optically used beam cone. As a result, the first region comprises a sacrificial region where debris accumulation can occur without restricting the optically used beam cone.

[0011] According to one aspect of the present invention, the second region acting as an aperture stop is offset in the beam exit direction relative to the first region, thereby reducing the probability of debris accumulating in the second region acting as an aperture stop.

[0012] According to one aspect of the invention, the insert is insertable in a reversible, in particular replaceable, manner into the source chamber wall, and therefore may form a wear part.

[0013] The expression that an EUV radiation source has a partial chamber should not be understood as limiting: in general, this is understood to mean that the radiation source has an inner region and, in particular, a further region adjacent to it, between which a process pressure difference occurs during operation of the radiation source.

[0014] The aperture stop serves to generate a specified beam geometry of the illumination radiation emerging from the radiation source. In particular, the beam diameter and / or beam opening angle can be specified with the help of the aperture stop. These variables depend not only on the geometric details of the aperture stop, but also on the distance of the aperture stop from the EUV-generated plasma and the dimensions of the plasma region.

[0015] The maximum possible beam geometry is determined in particular by the smallest free diameter of the second region, which, together with the distance of the radiation source from the plasma region, determines the maximum possible aperture angle of the beam emerging from the radiation source, which may in particular be at most 10°, in particular at most 5°.

[0016] According to one aspect that is advantageous independently of further details of the invention, the first region is particularly formed to have a specified minimum distance from the envelope of the beam emitted by the radiation source with a specified maximum aperture angle of said beam. In particular, the minimum distance may be at least 0.3 mm, in particular at least 0.5 mm, in particular at least 0.7 mm, in particular at least 1 mm, in particular at least 1.5 mm and in particular at least 2 mm. In particular, the minimum distance is at most 3 mm, in particular at most 2 mm, in particular at most 1.5 mm and in particular at most 1 mm.

[0017] A larger distance provides better resistance to contamination, whereas a smaller distance allows for better mechanical separation of adjacent partial chambers due to the smaller free diameter of the first region.

[0018] The envelope of the exit beam is generally conical. The envelope is defined by the geometry of the aperture stop. The aperture stop generally has a circular free-pass area. However, this is not necessarily the case. The aperture stop may also have a non-circular, elliptical, or polygonal cross section.

[0019] According to one aspect of the invention, the beam passage channel of the insert, defined by the inner surfaces of the regions, has a free diameter that varies in the beam exit direction, in particular a free diameter that expands in the beam exit direction. The beam passage channel has in particular a first minimum free diameter d1 in the first region and a second minimum free diameter d2 in the second region, the first minimum free diameter d1 being smaller than the second minimum diameter d2, i.e. d1 <d2である。

[0020] This allows for easier mechanical separation of the partial chambers to create / maintain a process pressure differential. During operation of the radiation source, the process pressure generated in the inner chamber, also called the upper chamber, can be in the range of 50 mTorr to 150 mTorr. A high vacuum is generated in the outer partial chamber, also called the lower chamber.

[0021] In particular, d1:d2≦0.9, in particular d1:d2≦0.8, in particular d1:d2≦0.75.

[0022] In the first region, the first minimum free diameter D1 of the beam-passing channel may in particular be at most 8 mm, in particular at most 7 mm, in particular at most 6 mm, in particular at most 5 mm.

[0023] The region with the first minimum diameter d1 may be at a distance l in the beam exit direction from the region with the second minimum diameter d2 of at least 30 mm, in particular at least 40 mm, in particular at least 50 mm, in particular at least 60 mm. This distance may in particular be at most 300 mm, in particular at most 200 mm, in particular at most 100 mm. A larger distance allows for a smaller free opening in the first region, thereby allowing for better pressure separation between the sub-chambers. A smaller distance leads to a more compact design of the insert.

[0024] The distance l between the region with the first minimum free diameter d1 and the region with the second minimum free diameter d2 may in particular correspond substantially to the distance LQ between the region with the first minimum free diameter d1 and the plasma region of the radiation source, and in particular the following equation may hold: 0.5≦l:LQ≦2. The exact details may depend on the configuration of the source chamber of the radiation source.

[0025] According to one embodiment of the invention, the first region has a size in the beam exit direction of at least 10 mm, in particular at least 15 mm, in particular at least 20 mm, in particular at least 30 mm, in particular at least 50 mm.

[0026] In the first region, the inner surface area, in particular surrounding the beam passage channel, is at least 150 mm 2 , especially at least 200 mm 2 , especially at least 300 mm 2 , especially at least 500 mm 2 , especially at least 1000 mm 2 is.

[0027] This inner surface acts as a sacrificial area where debris can accumulate without restricting the optically used beam cone, but a large inner surface results in a longer lifetime for the radiation source.

[0028] According to one aspect of the invention, the first and second regions may be formed by separate components. This aspect is also advantageous independently of the remaining details of the invention. In particular, the insert may be formed in multiple parts, in particular in two or three parts.

[0029] In particular, the insert can have a component serving as a pressure stage and a component serving as an aperture stop, which components are in particular formed as separate components.

[0030] A third region can be arranged in the beam exit direction between the first and second regions. In general, the first and second regions, in particular the pressure stage and the throttle, can be spatially separated from one another, in particular spaced apart.

[0031] The third region in the form of a separate component can ensure a specified positioning of the second region acting as an aperture stop relative to the first region acting as a pressure stage.

[0032] According to one aspect of the invention, inlet openings for passing gas into the beam-passing channels can be arranged in the third region. The inlet openings can be distributed over the third region, particularly on the periphery. The inlet openings can be distributed evenly over the periphery of the third region, particularly. This can be a substantially annular inlet opening. This aspect is also advantageous independently of further details of the invention.

[0033] Gas can be introduced into the beam passage channel with the aid of an inlet opening, which can further reduce the probability of debris being deposited on the aperture, in particular in the second region of the insert.

[0034] According to a further aspect of the invention, which may also be advantageous independently of the remaining details of the invention, the insert is made at least in part from sintered silicon carbide and / or from molybdenum.

[0035] In particular, the first and / or second components, i.e., the components serving as the pressure stage and / or the components serving as the aperture stop, may be manufactured from sintered silicon carbide and / or from molybdenum, in particular from one of these materials, and these components are formed from a material that is particularly resistant to chipping by the plasma burning in the source chamber.

[0036] The first and second regions may be made of the same material, and the third region disposed between the first and second regions may be made of a different material from the first and / or second regions.

[0037] The third region may be formed from aluminum or an aluminum compound, which makes it easier to manufacture.

[0038] According to a further aspect, all components of the insert can be assembled with a precision fit, adjacent components can in particular have respective projections and notches that match each other.

[0039] According to a further aspect of the invention, which is also advantageous independently of the remaining details of the invention, the insert may have a collar-type protrusion which at least partially circumferentially surrounds the beam-passing channel.

[0040] The collar-shaped protrusion is arranged on the side of the insert facing the plasma region, in particular on the side of the first region facing the second region of the insert in the beam exit direction. The collar-shaped protrusion can in particular be formed integrally with the pressure stage. In particular, the collar-shaped protrusion can be arranged at the free end of the first region.

[0041] The collar-shaped projection may circumferentially surround the beam-passing channel over a circumferential angle of at least 90°, in particular at least 120°, in particular at least 180°. The collar-shaped projection may in particular completely surround the beam-passing channel.

[0042] The corresponding collar-shaped protrusions may prevent debris, in particular loose flakes, from entering the beam-passing channel, and in particular may reduce the risk of debris penetrating the beam-passing channel through the corresponding collar-shaped protrusions.

[0043] The collar-shaped projection may have a conically tapered outer surface.

[0044] The maximum outer diameter of the collar-shaped projection can in particular be smaller than the outer diameter of the part of the first region adjacent to it in the beam exit direction, which makes it possible to save material.

[0045] Preferably, all edges, and in particular all transitions, are rounded.

[0046] Thus, accumulation of debris in these areas can be prevented.

[0047] The outer surface of the collar-shaped projection can be particularly polished. The outer surface of the collar-shaped projection can be particularly polished to a mean roughness value R of at most 1 μm. a The accumulation of debris outside the collar is thus reduced.

[0048] According to a further aspect of the invention, the first region having the sacrificial region comprises a body portion with a substantially cylindrical outer surface. The body portion is concentrically adjacent to a similarly cylindrical contact surface with a larger diameter in the beam exit direction. The difference between the outer diameters is in the range of 50 μm to 1 mm. In particular, the difference between the outer diameters is at least 100 μm, in particular at least 200 μm. Preferably, the difference between the outer diameters is at most 500 μm, in particular at most 300 μm. The contact surface can ensure accurate positioning of the insert in the source chamber wall. The region of the insert recessed inward relative to the contact surface, especially the reduced outer diameter in the region adjacent to the contact surface facing the beam exit opening, can facilitate insertion of the insert into the source chamber wall.

[0049] The contact surface and / or the outer surface of the insert adjacent thereto opposite the beam exit direction can also have a slightly conical outer surface instead of a cylindrical outer surface.

[0050] The contact surface has a dimension parallel to the beam exit direction of at most 1 cm, in particular at most 5 mm, in particular at most 3 mm, in particular at most 2 mm. A contact shoulder may adjoin the contact surface in the beam exit direction. A hole for receiving a fixing means, in particular a screw, may be provided in the contact shoulder.

[0051] The precise guidance, and in particular the positioning, of the pressure stage in the source chamber is achieved by the contact surface and the adjacent contact shoulder. A tolerance gap remains in the area adjacent to the pressure stage, facing the beam exit direction, between the insert and the source chamber wall or the carrier on which the insert is mounted. This aspect is also advantageous independently of further details of the invention.

[0052] The EUV radiation source according to the invention comprises a first source chamber and a second source chamber separated from each other by a chamber wall, and an insert according to the above description is disposed in the chamber wall.

[0053] The inserts are reversibly replaceable.

[0054] The insert can be inserted with a precise fit into a cutout provided for the insert, and is supported by a contact surface, in particular on the peripheral side facing the cutout provided for the insert.

[0055] The advantages of the radiation source are evident from the advantages of the insert.

[0056] An EUV radiation source module according to the present invention comprises an EUV radiation source according to the above description and a housing adjacent to the beam exit opening and capable of being vacuum-tightly sealed against the outside.

[0057] The advantages are similarly evident from the advantages of the insert.

[0058] Further details and advantages of the invention will become apparent from the description of exemplary embodiments with reference to the drawings. [Brief explanation of the drawings]

[0059] [Figure 1] 1 is a schematic diagram of a cross section through an EUV radiation source having multiple source chambers and inserts inserted into the chamber walls. [Figure 2] 1 is a schematic diagram of a cross section through an insert for an EUV radiation source. [Figure 3] 3 is a perspective view of a first component of the insert according to FIG. 2, which serves as a pressure stage; FIG. [Figure 4] 3 is a perspective view of the connecting part of the insert according to FIG. 2; [Figure 5] 3 is a perspective view of a second component of the insert according to FIG. 2, which serves as an aperture stop; DETAILED DESCRIPTION OF THE INVENTION

[0060] Figure 1 shows a schematic diagram of an EUV radiation source 1. The EUV radiation source 1 may be part of an illumination system (not explicitly shown) of a projection exposure apparatus.

[0061] The EUV radiation source 1 has a two-part source chamber 2. The source chamber 2 has an upper chamber section 3 and a lower chamber section 4.

[0062] The upper chamber part 3 is connected to the lower chamber part 4 by a central opening 5. An insert 6, also called a "bore", is disposed in the central opening 5, also called a passage channel. The insert 6 circumferentially surrounds a plasma generation region 7, also marked in the figure.

[0063] During operation of the EUV radiation source 1, a plasma is generated in the plasma generation region 7. A beam 14 of EUV radiation propagates from the plasma generation region 7 during operation of the EUV radiation source 1. The beam 14 exits the source chamber 2 as a beam cone arranged around the beam exit direction 9.

[0064] The plasma generation region 7 has a diameter that is several orders of magnitude smaller than the distance between the chamber wall 8 and the plasma generation region 7. Therefore, the plasma generation region 7 can be considered to be point-like in a first approximation.

[0065] The upper chamber portion 3 and the lower chamber portion 4 may be filled with xenon during operation of the EUV radiation source 1. A xenon partial pressure in the range of 50 mTorr to 150 mTorr may be generated in the upper chamber portion 3 and the lower chamber portion 4 during operation of the EUV radiation source 1.

[0066] The EUV radiation source 1 has a chamber wall 8. The chamber wall 8 is disposed at a certain distance from the plasma generation region 7 in the beam emission direction 9. The distance between the chamber wall 8 and the plasma generation region 7 is in the range of 50 mm to 80 mm.

[0067] The EUV radiation source 1 has a housing 10 which can be vacuum-tight sealed against the outside.

[0068] The insert 11 surrounds the beam-passing channel 16 on the peripheral side. A region of the EUV radiation source 1 adjacent to the beam-passing channel 16 towards the outside and arranged within the housing 10 of the EUV radiation source 1 may form a service chamber 21.

[0069] An insert 11 is inserted into the chamber wall 8. The insert 11 is described in more detail below.

[0070] During operation of the EUV radiation source 1 , a high vacuum is created within a housing 10 outside the source chamber 2 .

[0071] The insert 11 is reversibly, in particular exchangeably, inserted into the chamber wall 8. The insert has a first component 12 that serves as a pressure stage. The first component 12 serves in particular to generate a specified process pressure difference between the source chamber 2, in particular the lower chamber part 4, and an area outside the source chamber 2 during operation of the EUV radiation source 1.

[0072] A second component 13 of the insert 11 is arranged offset in the beam output direction 9 relative to the first component 12. The second component 13 serves as a stop, in particular an aperture stop, for defining a beam 14 of EUV radiation produced by the EUV radiation source 1.

[0073] The aperture defines the maximally possible beam geometry, in particular the maximum aperture angle of the beam 14 of EUV radiation. The aperture angle is defined on the one hand by the free aperture A of the second component 13 and on the other hand by the distance L of the second component 13 from the plasma generation region 7. The free aperture A can be in the range of 6 mm to 10 mm. The distance L can be in the range of 70 mm to 300 mm, in particular in the range of 90 mm to 200 mm.

[0074] A connecting piece 15 is provided between the first component 12 and the second component 13. The connecting piece 15 serves to accurately position the second component 13 relative to the first component 12.

[0075] The connecting piece 15 may be manufactured from aluminum or an aluminum compound. In particular, the connecting piece 15 may be formed from a material different from the first component 12 and / or the second component 13.

[0076] A collar 17 is arranged on the side of the first component 12 facing the plasma generation region 7, surrounding the beam-passing channel 16 on the peripheral side.

[0077] Collar 17 has a conically tapered outer surface.

[0078] The collar 17 has a minimum free diameter d1, which is preferably in the range of 5 mm to 8 mm.

[0079] The smallest free diameter d1 is in particular smaller than the free opening A of the second component 13. In particular d1:d2≦0.9, in particular d1:d2≦0.8, in particular d1:d2≦0.75.

[0080] All transitions on the outer surface of the first component 12 have a rounded corner design, which prevents debris from accumulating.

[0081] The first component 12 and the second component 13 may be made from ceramic, in particular from sintered silicon carbide, or from molybdenum.

[0082] The first component 12 is realized such that its inner surface 18 is spaced apart from the beam 14. In particular, the inner surface 18 has a minimum distance from the beam 14, in particular at least 0.3 mm, in particular at least 0.5 mm, in particular at least 0.7 mm, in particular at least 1 mm.

[0083] The connecting piece 15 also preferably has an inner surface that is spaced apart from the beam 14 .

[0084] A hole 19 is arranged in the connection piece 15. Gas can be introduced into the beam-passing channel 16 through the hole 19. The probability of debris deposition at the aperture can be reduced by the introduced gas.

[0085] The hole 19 is arranged in the connection piece 15 at an angle b to the beam output direction 9. The angle b is in the range of 10° to 60°, in particular 30° to 50°. The angle b can be 45°.

[0086] The first component 12 can be placed by precision fitting in a cutout provided for the first component 12 in the chamber wall 8. In particular, the first component 12 can be fixed, in particular screwed, to the chamber wall 8.

[0087] The first component 12 has a contact surface 20. The first component 12 bears in particular against the chamber wall 8 by means of the contact surface 20. Facing the beam exit direction 9, a recessed region adjoins the contact surface 20. This makes it easier to insert the first component 12 into the chamber wall 8.

[0088] The guiding and positioning of the first component 12 in the chamber wall 8 is not realized over the entire height of the first component, but only over the contact surface 20. In the area adjacent to the contact surface 20 opposite the beam exit direction 9, a tolerance gap remains between the chamber wall 8 and the first component 12 due to the insert 11 inserted into the chamber 8.

[0089] The connecting piece 15 is reliably connectable to the first component 12. For example, the connecting piece 15 may be screwed to the first component 12. The same screws that serve to connect the first component 12 to the chamber wall 8 may be used for this purpose.

[0090] The second component 13 of the insert 11 is securely connectable to a connecting piece 15, in particular by means of a screw.

[0091] The first component 12, the connecting piece 15 and the second component 13 can be assembled with a particularly precise fit.

[0092] Unlike the illustrated embodiment in which the insert 11 is made from three parts, the insert 11 can also be made from two parts or one part. The connecting part can in particular be part of the first component 12 and / or the second component 13.

[0093] It is equally possible to omit the collar 17. This is possible, in particular if the beam exit direction 9 is directed against gravity during operation of the EUV radiation source 1, since in that case there is no reason to fear that contamination debris will fall into the beam passage channel 16 as a result of gravity.

[0094] (Clauses) 1. An insert (11) for a source chamber (2) of an EUV radiation source (1) for generating a beam (14) by EUV radiation, wherein the insert (11) has 1.1. a first region (12) extending in the beam exit direction (9), and 1.2. a second region (13) extending in the beam exit direction (9) and 1.3. in each case an inner surface (18) delimits a beam passage channel (16) on the peripheral side in the regions (the regions (12, 13)), 1.4. the second region (13) serves to define the maximum possible beam geometry, 1.5. the first region (12) serves to generate and / or maintain a pressure difference on the opposite side of the insert (11) during operation of the EUV radiation source (1), 1.6. the second region (13) is arranged with an offset in the beam exit direction (9) with respect to the first region (12), 1.7. the first region (12) is realized to have a minimum distance from the smallest outer envelope around the maximum possible beam geometry defined by the second region (13), insert (11).

[0095] 2. The beam passage channel has a first minimum free diameter (d1) in the first region (12) and a second minimum free diameter (d2) in the second region (13), and the first minimum diameter (d1) is smaller than the second minimum diameter (d2), i.e., d1 < d2, insert (11) according to clause 1.

[0096] 3. The beam passage channel has a first minimum free diameter (d1) of at most 8 mm in the first region (12), insert (11) according to clause 1 or 2.

[0097] 4. An insert (11) described in any one of clauses 1 to 3, wherein the beam-passing channel has a first minimum free diameter (d1) in the first region (12) and a second minimum free diameter (d2) in the second region (13), and the first minimum diameter (d1) and the second minimum diameter (d2) have a distance (l) of at least 30 mm in the beam emission direction (9).

[0098] 5. An insert (11) according to any one of clauses 1 to 4, wherein the first region (12) has a size in the beam emission direction (9) of at least 10 mm.

[0099] 6. An insert (11) according to any one of clauses 1 to 5, wherein the first region (12) and the second region (13) are formed by separate components (12, 13).

[0100] 7. The insert (11) according to any one of clauses 1 to 6, wherein the first region (12) and the second region (13) are spaced apart from each other by a third region (15).

[0101] 8. An insert (11) according to clause 7, wherein an inlet opening (19) for passing gas into the beam-passing channel (16) is arranged in the third region (15).

[0102] 9. The insert (11) according to any one of clauses 1 to 8, wherein the insert (11) is made at least in part from sintered SiC and / or from molybdenum.

[0103] 10. An insert (11) according to any one of clauses 1 to 9, wherein a third region (15) made from a material different from the first region (12) and / or the second region (13) is arranged between the first region (12) and the second region (13).

[0104] 11. An insert (11) according to any one of clauses 1 to 10, wherein a collar-shaped protrusion (17) at least partially surrounds the beam-passing channel on the peripheral side.

[0105] 12. An insert (11) according to any one of clauses 1 to 11, wherein the component (12) forming the first region has an outer surface with a contact surface (20) having a diameter greater than the adjacent outer surface region.

[0106] 13. An EUV radiation source (1), comprising: 13.1. A source chamber (2); 13.2. Further chamber (21) and and 13.3. The further chambers (21) are separated by chamber walls (8), 13.4. An EUV radiation source (1), wherein an insert (11) according to any one of clauses 1 to 12 is arranged in the chamber wall (8).

[0107] 14. An EUV radiation source module comprising: 14.1. An EUV radiation source (1) according to clause 13, 14.2. A housing (10) that can be sealed vacuum-tight from the outside; 1. An EUV radiation source module comprising: [Explanation of symbols]

[0108] 1 EUV radiation source 2. Source Chamber 3 Upper chamber 4 Lower chamber section 5 Central opening 6 Inserts 7. Plasma generation region 8 Chamber wall 9 Beam emission direction 10. Housing 11 Insert 12 First component 13 Second component 14 Beam 15 Connecting parts 16 beam-passing channels 17 colors 18 Inner surface 19 holes 20 Contact surface 21 Service Chamber

Claims

1. An insert (11) for a source chamber (2) of an EUV radiation source (1) for generating a beam (14) by EUV radiation, wherein the insert (11) comprises: 1.

1. a first region (12) extending in the beam emission direction (9); 1.

2. a second region (13) extending in the beam emission direction (9); and has, 1.

3. in each case, an inner surface (18) defining a beam passage channel (16) on the peripheral side in the regions (12, 13); 1.

4. the second region (13) serves to define the maximum possible beam geometry; 1.

5. the first region (12) serves to generate and / or maintain a pressure difference on the opposite side of the insert (11) during operation of the EUV radiation source (1); 1.

6. the second region (13) is arranged with an offset in the beam emission direction (9) with respect to the first region (12); 1.

7. the first region (12) is realized so as to have a minimum distance specified from the smallest outer envelope around the maximum possible beam geometry defined by the second region (13); insert (11).

2. The beam passage channel has a first minimum free diameter (d1) in the first region (12) and a second minimum free diameter (d2) in the second region (13), and the first minimum diameter (d1) is smaller than the second minimum diameter (d2), i.e., d1 < d2. The insert (11) according to claim 1.

3. The beam passage channel has a first minimum free diameter (d1) of at most 8 mm in the first region (12). The insert (11) according to claim 1 or 2.

4. The beam passage channel has a first minimum free diameter (d1) in the first region (12) and a second minimum free diameter (d2) in the second region (13), and the first minimum diameter (d1) and the second minimum diameter (d2) have a distance (l) of at least 30 mm in the beam emission direction (9). The insert (11) according to claim 1 or 2.

5. The first region (12) has a size of at least 10 mm in the beam emission direction (9). The insert (11) according to claim 1 or 2.

6. The insert (11) according to claim 1 or 2, wherein the first region (12) and the second region (13) are formed by separate components (12, 13).

7. The insert (11) according to claim 1 or 2, wherein the first region (12) and the second region (13) are separated from each other by a third region (15).

8. The insert (11) according to claim 7, wherein an inlet opening (19) for passing gas through the beam passage channel (16) is arranged in the third region (15).

9. The insert (11) according to claim 1 or 2, wherein the insert (11) is at least partially made of sintered SiC and / or molybdenum.

10. The insert (11) according to claim 1 or 2, wherein a third region (15) made of a material different from the first region (12) and / or the second region (13) is arranged between the first region (12) and the second region (13).

11. The insert (11) according to claim 1 or 2, wherein a color-type protrusion (17) at least partially surrounds the beam passage channel on the peripheral side.

12. The insert (11) according to claim 1 or 2, wherein the component (12) forming the first region has an outer surface having a contact surface (20) with a diameter larger than that of adjacent outer surface regions.

13. An EUV radiation source (1), wherein the EUV radiation source (1) 13.

1. a source chamber (2); 13.

2. a further chamber (21); and has 13.

3. the further chamber (21) is separated by a chamber wall (8); 13.

4. the insert (11) according to claim 1 or 2 is arranged on the chamber wall (8). EUV radiation source (1).

14. An EUV radiation source module, comprising 14.

1. the EUV radiation source (1) according to claim 13; and 14.

2. a housing (10) that can be hermetically sealed against the outside. EUV radiation source module.

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