X-ray generator, x-ray analyzer, method for controlling x-ray generator, and control system for x-ray generator

Abstract

To provide technology pertaining to a window holding unit, an X-ray generator, an X-ray analyzer, a method for controlling the X-ray generator, and a control system for the X-ray generator with which there is no need to install an X-ray observation window in a vacuum region and no need to use some of the X-ray used for X-ray analysis measurement.SOLUTION: According to one aspect of the present invention, an X-ray generator is provided. This X-ray generator comprises an X-ray generation unit and an X-ray transmission window. The X-ray generation unit is constituted so as not to generate an X-ray upon receiving electrons from the outside. The X-ray transmission window includes a first X-ray transmission window and a second X-ray transmission window. The first X-ray transmission window is constituted so as to transmit a first X-ray oriented in a first direction out of X-rays. The first X-ray enters an X-ray observation unit which is located on its optical axis and with which the X-ray focus of the X-ray is observable. The second X-ray transmission window is constituted so as to transmit a second X-ray oriented in a second direction different from the first direction out of X-rays.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an X-ray generator, an X-ray analysis device, a control method for an X-ray generator, and a control system for an X-ray generator. [Background technology]

[0002] US Patent No. 5,399,633 discloses a technique for determining and controlling the width of an electron beam at the point where the electron beam intersects the target when implemented in conjunction with an X-ray source operable to create an X-ray target. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Special Publication No. 2014-503960 [Non-patent literature]

[0004] [Non-Patent Document 1] Benedikt Gunther et al. "Device for source position stabilization and beam parameter monitoring at inverse Compton X-ray sources" Journal of Synchrotron Radiation, September 2019 [Non-Patent Document 2] jae Yeon Park et al. "X-ray beam-position feedback system with easy-to-use beam-position monitor" Journal of Synchrotron Radiation, May 2019 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in Patent Document 1, a sensor for detecting the presence of an electron beam spot is installed inside a housing, which is a vacuum region, and it is not easy to build a system for detecting the electron beam. In addition, Patent Document 1 assumes a liquid target such as a liquid metal jet, and it is not easy to expand the scope of application to solid targets such as stationary targets and rotor targets.

[0006] In consideration of the above circumstances, the present invention provides techniques relating to a window holder, an X-ray generator, an X-ray analysis device, a control method for an X-ray generator, and a control system for an X-ray generator, which do not require the provision of an X-ray observation section within a vacuum region and do not require the use of a portion of the X-rays used in X-ray analysis measurement. [Means for solving the problem]

[0007] According to one aspect of the present invention, an X-ray generating device is provided. The X-ray generating device includes an X-ray generating unit and an X-ray transmitting window. The X-ray generating unit is configured to generate X-rays by receiving an electron beam from the outside. The X-ray transmitting window includes a first X-ray transmitting window and a second X-ray transmitting window. The first X-ray transmitting window is configured to transmit a first X-ray of the X-rays oriented in a first direction. The first X-ray is incident on an X-ray observation unit that is provided on the optical axis of the first X-ray and is capable of observing an X-ray focus of the X-rays. The second X-ray transmitting window is configured to transmit a second X-ray of the X-rays oriented in a second direction different from the first direction.

[0008] According to the present disclosure, it is possible to provide a technique that does not require providing an X-ray observation section within a vacuum region, and does not require using part of the X-rays used in X-ray analysis measurement. [Brief description of the drawings]

[0009] [Figure 1] 1 is a diagram illustrating an example of a system configuration of an X-ray analysis system 1 according to an embodiment. [Diagram 2] FIG. 2 is a diagram illustrating an example of an X-ray analysis device 2 in an embodiment. [Diagram 3] 2 is an example of a cross-sectional view of a first window holding portion 204 in the embodiment. [Figure 4] 1 is an example of a cross-sectional view of a second window holding portion 205 in the embodiment. [Diagram 5] 2 is a diagram for explaining the positional relationship between an X-ray generation unit 203a, an X-ray imaging unit 204b, and an X-ray observation unit 21. FIG. [Figure 6] 2 is a diagram illustrating an example of a hardware configuration of an information processing device 3 according to an embodiment. [Figure 7] FIG. 2 is a diagram illustrating an example of information processing according to an embodiment. [Figure 8] 1 is a diagram showing an example of an X-ray focus acquired by the X-ray observation unit 21, and is a diagram showing an example of data relating to the shape of an X-ray. FIG. [Figure 9] 13 is an example of a cross-sectional view of a first window holding portion 404 in a modified example. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] [Embodiment] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings. Various characteristic features shown in the following embodiments can be combined with each other.

[0011] 1. System configuration of X-ray analysis system 1 First, the system configuration of the X-ray analysis system 1 of this embodiment will be described with reference to FIG. 1. FIG. 1 is a diagram showing an example of the system configuration of the X-ray analysis system 1 in the embodiment. As shown in FIG. 1, the X-ray analysis system 1 includes an X-ray analysis device 2 and an information processing device 3. The X-ray analysis system 1 is a system that enables analysis of a sample by X-rays. The X-ray analysis device 2 and the information processing device 3 are configured to be able to communicate with each other via a communication cable or a network. As a result, the X-ray analysis device 2 and the information processing device 3 can transmit or receive various information to each other. In this embodiment, the information processing device 3 is a PC (Personal Computer). The information processing device 3 may be a tablet computer, a smartphone, or the like instead of a PC. Here, the system exemplified by the X-ray analysis system 1 is composed of one or more devices or components. Therefore, even if the X-ray analysis device 2 is a single unit or the information processing device 3 is a single unit, it is included in the system exemplified by the X-ray analysis system 1. The X-ray analysis device 2 and the information processing device 3 are operated by a user who is a measurer.

[0012] 2. Configuration of X-ray analysis device 2 Next, the configuration of the X-ray analysis device 2 of this embodiment will be described with reference to Fig. 2. Fig. 2 is a diagram illustrating an example of the X-ray analysis device 2 in the embodiment. Note that in the drawings attached to this specification, including Fig. 2, components may be shown at different ratios from the actual ones in order to clearly show characteristic parts.

[0013] The X-ray analysis device 2 of this embodiment is a device for performing X-ray analysis measurement. The X-ray analysis device 2 includes an X-ray generator 20, an X-ray observation unit 21, a sample stage 22, and an X-ray detector 23. The X-ray analysis device 2 is used to directly observe the X-rays generated from the X-ray generator 20 at the X-ray observation unit 21. The X-ray analysis device 2 of this embodiment is also used to irradiate the X-rays generated from the X-ray generator 20 onto a sample on the sample stage 22, and detect the X-rays reflected, diffracted, or scattered by the sample with the X-ray detector 23.

[0014] The X-ray generating device 20 is a device that includes a vacuum space, generates X-rays from a target in the space, and is capable of extracting the X-rays to the outside of the vacuum. The X-ray generating device 20 includes a container 200, an insulating part 201, a cathode part 202, an anode part 203, a first window holding part 204, a second window holding part 205, a housing part 206, and a bellows 207.

[0015] The accommodation unit 200 forms a vacuum space therein. The accommodation unit 200 accommodates an insulating unit 201, a cathode unit 202, an anode unit 203, a first window holder 204, and a second window holder 205, among the elements constituting the X-ray generating device 20. Note that the vacuum state is not limited to a complete vacuum state, and may also include a state in which the pressure is reduced to an extent that a particle beam such as an electron beam can propagate, for example, a low vacuum state.

[0016] The insulating section 201 is made of a material having an electrical insulating property, such as an insulator, etc. The insulating section 201 functions as a support base for the cathode section 202.

[0017] The cathode section 202 is a negative electrode configured to be capable of emitting an electron beam. The cathode section 202 is electrically connected to the anode section 203 via an electric cable so that a high voltage can be applied to the cathode section 202. The cathode section 202 is installed on the insulating section 201 in such a manner that the cathode section 202 can irradiate the electron beam toward the anode section 203, and is thereby insulated from the bellows 207 described below.

[0018] The anode section 203 is a positive electrode that pairs with the cathode section 202 as a negative electrode. The anode section 203 accelerates the electron beam emitted from the cathode section 202. The anode section 203 has an X-ray generating section 203a as a target at a position facing the cathode section 202.

[0019] The X-ray generating unit 203a is made of any metal. For example, the X-ray generating unit 203a is made of a metal element such as carbon, aluminum, chromium, iron, cobalt, copper, molybdenum, rhodium, silver, or gold. The X-ray generating unit 203a may include a plurality of the above-mentioned metal elements and may be configured to be able to switch the metal that generates X-rays according to a user's selection. Such switching of metals may be performed by moving a target such as a rotor target. Such switching of metals may be performed by changing the trajectory of the electron beam or by moving the position of the cathode unit 202. Furthermore, the X-ray generating unit 203a may be not only a solid target such as a rotor target or a stationary target, but also a liquid target such as a liquid metal jet. In the liquid metal jet, a liquid metal is used as the X-ray generating unit 203a instead of a solid metal. For example, an alloy containing copper, gallium, indium, tin, or the like is used as the liquid metal.

[0020] The X-ray generating unit 203a is configured to generate X-rays in various directions by receiving the electron beam generated from the cathode unit 202. The X-rays generated at this time include characteristic X-rays corresponding to the metal of the X-ray generating unit 203a. The X-rays generated in various directions include a first X-ray L1 and a second X-ray L2.

[0021] The first X-ray L1 is used to directly observe the X-ray focus in the X-ray generating unit 203a. That is, the first X-ray L1 is directed in the first direction D1, extracted to the outside of the X-ray generating device 20 through the first X-ray transmission window 204a of the first window holding unit 204, and enters the X-ray observation unit 21 that is provided on the optical axis and can observe the X-ray focus of the X-ray. At this time, the first X-ray L1 enters the X-ray observation unit 21 from the X-ray generating unit 203a without passing through a sample. That is, in this embodiment, the mode in which a sample is provided between the X-ray generating unit 203a and the X-ray observation unit 21 is excluded. The first window holding unit 204 will be described later with reference to FIG. 3. This makes it possible to directly observe X-rays using one of the multiple X-ray transmission windows. This also makes it possible to control the X-rays generated from the X-ray generating unit 203a.

[0022] The second window holder 205 has a second X-ray transmission window 205a. The second X-ray transmission window 205a is configured to transmit a second X-ray L2, which is directed in a second direction D2 different from the first direction D1, among the X-rays. The second window holder 205 will be described later with reference to FIG. 4.

[0023] The housing unit 206 includes a plurality of stages for translating the cathode unit 202. For example, the plurality of stages include a stage movable in the X-axis direction, a stage movable in the Y-axis direction, and a stage movable in the Z-axis direction. Each of the plurality of stages moves along the respective axial direction in response to receiving a movement instruction. In response to each of the movements of the plurality of stages, the housing unit 206, the insulating unit 201, and the cathode unit 202 supported by the insulating unit 201 also move in the same manner. When the three mutually orthogonal spatial axes are the X-axis, the Y-axis, and the Z-axis, the directions along the X-axis, the Y-axis, and the Z-axis are the X-axis, the Y-axis, and the Z-axis, respectively. The housing unit 206 is provided outside the vacuum. The housing unit 206 is connected to the insulating unit 201 via a bellows 207. In addition, as described later in a modified example, the housing unit 206 may be configured to change the attitude of the cathode unit 202. Furthermore, as described later in a modified example, an actuator may be used instead of the housing unit 206.

[0024] The bellows 207 is configured to deform in response to the movement of the housing 206. By using the bellows 207, the insulating part 201 supporting the cathode 202 can be smoothly translated in the X-axis direction, the Y-axis direction, or the Z-axis direction while maintaining the vacuum state of the X-ray generating device 20. This allows fine adjustment of the position of the electron beam emitted from the cathode 202.

[0025] The X-ray observation unit 21 is configured to be able to observe the state of X-rays generated from the X-ray generation unit 203a. The X-ray observation unit 21 has an arbitrary configuration. For example, the X-ray observation unit 21 may be configured as an X-ray camera that detects X-rays using a photodiode such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor). The X-ray observation unit 21 may also be configured to focus or change the magnification of visible light from a scintillator that has received the first X-ray L1 and emitted light, using a lens, and detect the visible light with a photodiode. The material forming the scintillator may be a crystalline material such as LuAG or GAGG, or a powder material such as P43.

[0026] In this embodiment, the X-ray focus is directly observed by the X-ray observation unit 21. This "direct observation" is a concept indicating that an image of the X-ray focus is formed on the X-ray observation unit 21 and the image is observed. For example, "direct observation" includes evaluation of the profile of the X-ray focus by a method of PSF (Point Spread Function) using a pinhole camera. In addition to a method using a pinhole camera, "direct observation" also includes a method using a four-quadrant slit or optical lens, which will be described later. On the other hand, "direct observation" does not include a method of estimating the size of the X-ray focus from an edge image by a method such as LSF (Line Spread Function) or MTF (modulation transfer function) from a transmitted image by providing a slit, a test chart (e.g., a star pattern), or the like on the optical path of the X-ray.

[0027] The second X-rays L2 are used for analyzing a sample using X-rays. That is, the second X-rays L2 are irradiated onto the sample. More specifically, for example, the second X-rays L2 are directed in a second direction D2 different from the first direction D1, extracted to the outside of the X-ray generating device 20 through the second X-ray transmitting window 205a, and incident on the sample on the sample stage 22.

[0028] The sample stage 22 is configured to be able to place a sample on which the second X-rays L2 are incident. The second X-rays L2 incident on the sample are diffracted, reflected, or scattered by the sample. The sample stage 22 may be configured to be able to move or tilt the sample stage 22 in any direction based on an operation instruction generated by the processor 31. This operation instruction is an instruction to move or tilt the sample stage 22.

[0029] The X-ray detector 23 is configured to be capable of detecting the second X-rays L2 diffracted, reflected or scattered by the sample placed on the sample stage 22. The detected X-rays are analyzed by the information processing device 3. The X-ray detector 23 may be a zero-dimensional detector using a counter tube or the like, a one-dimensional detector using a linear CCD or the like, or a two-dimensional detector using a CCD, an imaging plate or the like. This makes it possible to provide an X-ray analysis device that can control the X-rays used for X-ray analysis measurement based on the observation results of the X-rays generated from the X-ray generation unit.

[0030] Next, the first window holder 204 will be described with reference to FIG. 3. FIG. 3 is an example of a cross-sectional view of the first window holder 204 in the embodiment. This cross-sectional view is a view of the cross-section of the first window holder 204 observed from a plane horizontal to the straight direction of the first X-ray L1. The first window holder 204 includes a first X-ray transmission window 204a, an X-ray imaging unit 204b, and an air hole 204c. In this embodiment, the first window holder 204 is configured to be able to fit the first X-ray transmission window 204a and the X-ray imaging unit 204b. That is, the first X-ray transmission window 204a and the X-ray imaging unit 204b may be provided in the same unit. This allows the X-ray imaging unit 204b to be configured in the same unit as the X-ray transmission window, making it easy to incorporate into an existing system.

[0031] The position of the first window holding unit 204 may be any position within the X-ray generating device 20 so long as the first window holding unit 204 does not mechanically interfere with the second X-ray L2. The position of the first window holding unit 204 may be set so as to have a different installation relationship from the second window holding unit 205 with respect to the position of the X-ray generating unit 203a as a reference, or may be set so as to have the same installation relationship.

[0032] First X-ray transmissive window 204a is configured to transmit first X-rays L1 directed in a first direction D1 among X-rays. First X-ray transmissive window 204a may have any shape, for example, a flat plate shape. The material forming first X-ray transmissive window 204a may be any material that can transmit X-rays, and may be, for example, beryllium, carbon, diamond, SUS, or the like.

[0033] The X-ray imaging unit 204b receives the incidence of the first X-ray L1. The X-ray imaging unit 204b is configured to be able to form an image of the first X-ray L1 in the X-ray observation unit 21. In this embodiment, a pinhole 204b2 is formed in the X-ray imaging unit 204b. Among the X-rays generated from the X-ray generation unit 203a, the X-rays that have passed through the pinhole 204b2 of the X-ray imaging unit 204b travel straight and form an image of the X-ray generation unit 203a that is upside down and left and right in the X-ray observation unit 21. By using the pinhole 204b2, it becomes possible to form an image of the X-ray generation unit 203a in the X-ray observation unit 21. In addition, since the image of the X-ray generation unit 203a is formed in the X-ray observation unit 21, it becomes possible to observe the state of the X-ray generation unit 203a.

[0034] The X-ray imaging unit 204b may have any shape, for example, a flat plate shape. When the pinhole 204b2 is formed in the X-ray imaging unit 204b, the pinhole 204b2 may have any shape, for example, a cylindrical shape or a polygonal prism (such as a triangular prism or a square prism).

[0035] When the pinhole 204b2 is formed in the X-ray imaging unit 204b, the material forming the X-ray imaging unit 204b may be any material capable of blocking X-rays, and may be, for example, made of molybdenum, tungsten, platinum, gold, etc. When the X-ray imaging unit 204b is provided in a vacuum, the material forming the X-ray imaging unit 204b may be a material resistant to ozone generated in the vacuum inside the storage unit 200.

[0036] In this embodiment, the size of the X-ray focus is 40 μm or less. The diameter of the pinhole 204b2 is preferably smaller than the size of the X-ray focus. Preferably, the diameter of the pinhole 204b2 is 20 μm or less. More preferably, the diameter of the pinhole 204b2 is 5 μm or less. The diameter of the pinhole 204b2 may be 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, or 20 μm, or may be within a range between any two of the numerical values ​​exemplified here. The diameter of the pinhole 204b2 may be selected according to the material forming the X-ray imaging unit 204b, the wavelength of the characteristic X-rays, and the like. By using a pinhole 204b2 with an appropriate diameter, it is possible to form a clearer image of the X-ray generation unit 203a in the X-ray observation unit 21.

[0037] When the pinhole 204b2 is formed in the X-ray imaging unit 204b, the depth of the pinhole 204b2 can be any value. The deeper the pinhole 204b2, the better. Preferably, the depth of the pinhole 204b2 is 50 μm or more. The depth of the pinhole 204b2 may be selected depending on the material forming the X-ray imaging unit 204b, the wavelength of the characteristic X-rays, etc. By using the pinhole 204b2 of an appropriate depth, it becomes possible to form a clearer image of the X-ray generation unit 203a in the X-ray observation unit 21.

[0038] In this embodiment, the X-ray imaging unit 204b may be provided in a vacuum between the first X-ray transmission window 204a and the X-ray generation unit 203a. The positional relationship between the X-ray generation unit 203a, the X-ray imaging unit 204b, and the X-ray observation unit 21 will be described later with reference to Fig. 5. This allows the X-ray imaging unit 204b to be provided closer to the X-ray generation unit 203a than the first X-ray transmission window 204a, making it possible to form a sufficiently large image in the X-ray observation unit 21 without using a large-scale device.

[0039] The air hole 204c is a hole that allows gas to pass between the space within the first window holding portion 204 defined by the first X-ray transmission window 204a and the X-ray imaging portion 204b and the space outside the first window holding portion 204.

[0040] The first direction D1 is the direction indicated by the rightward arrow in Fig. 3. The first X-ray L1 travels straight along the first direction D1, that is, along the direction from the X-ray imaging unit 204b toward the first X-ray transmission window 204a.

[0041] Next, the second window holder 205 will be described with reference to FIG. 4. FIG. 4 is an example of a cross-sectional view of the second window holder 205 in the embodiment. This cross-sectional view is a view of the cross section of the second window holder 205 observed from a plane horizontal to the straight direction of the second X-ray L2. The second window holder 205 includes a second X-ray transmission window 205a. The second window holder 205 is configured to be able to fit the second X-ray transmission window 205a. For the shape of the second X-ray transmission window 205a and the material forming the second X-ray transmission window 205a, please refer to the first X-ray transmission window 204a. The second direction D2 is the direction indicated by the right arrow in FIG. 4. The second X-ray L2 travels straight from the X-ray generating unit 203a to the sample on the sample stage 22 through the first X-ray transmission window 204a along the second direction D2.

[0042] In this way, by using the first window holding part 204 for observing X-rays, unlike Non-Patent Documents 1 and 2, a portion of the X-rays used in the X-ray analysis measurement is not used to evaluate the X-rays, and therefore the analysis of the sample by the X-ray analysis measurement is less likely to be affected.

[0043] Next, the positional relationship between the X-ray generating unit 203a, the X-ray imaging unit 204b, and the X-ray observation unit 21 will be described with reference to FIG. 5. FIG. 5 is a diagram for explaining the positional relationship between the X-ray generating unit 203a, the X-ray imaging unit 204b, and the X-ray observation unit 21. The magnification of the image of the X-ray focus formed on the X-ray observation unit 21 is the distance B from the X-ray imaging unit 204b to the X-ray observation unit 21 divided by the distance A from the X-ray generating unit 203a to the X-ray imaging unit 204b. By utilizing this, if the X-ray imaging unit 204b can be provided at a position closer to the X-ray generating unit 203a, it becomes possible to form a sufficiently large image in the X-ray observation unit 21 without using a large-scale device.

[0044] 3. Configuration of information processing device 3 The information processing device 3 is a device for transmitting instructions to the X-ray analysis device 2. For example, the information processing device 3 is configured to be capable of transmitting at least one of a control instruction for the X-ray generation device 20 described later, an instruction to the X-ray observation unit 21, an operation instruction for the sample stage 22 described above, an instruction to the X-ray detector 23, and an instruction to operate the arm of the goniometer. The information processing device 3 is also a device capable of acquiring a profile based on the result detected by the X-ray detector 23 and analyzing samples such as thin films and single crystals.

[0045] Next, the hardware configuration of the information processing device 3 will be described with reference to Fig. 6. Fig. 6 is a diagram showing an example of the hardware configuration of the information processing device 3 in an embodiment. As shown in Fig. 6, the information processing device 3 includes a processor 31, a storage unit 32, a communication unit 33, an input unit 34, and an output unit 35, and these components are electrically connected via a communication bus 30 inside the information processing device 3. The information processing device 3 executes the process according to the embodiment.

[0046] The processor 31 processes and controls the overall operation related to the information processing device 3. The processor 31 is, for example, a central processing unit (CPU). Information processing by a program stored in the storage unit 32 can be specifically realized by the processor 31, which is an example of hardware, and executed as each functional unit included in the processor 31. Each functional unit included in the processor 31 realizes, for example, the processing shown in FIG. 7, which will be described later. The processor 31 is not limited to being single, and may be implemented with multiple processors 31 for each function. Also, a combination of these may be used. At least one processor 31 can execute each step of a control method, which will be described later. The processor 31 is included in a control system of the X-ray generating device 20.

[0047] The storage unit 32 stores various information defined by the above description. This can be implemented, for example, as a storage device such as a solid state drive (SSD) that stores various programs and the like related to the information processing device 3 executed by the processor 31, and as a memory such as a random access memory (RAM) that stores temporarily required information (arguments, arrays, etc.) related to the program calculations. The storage unit 32 stores various programs and variables related to the information processing device 3 executed by the processor 31, and data and the like used when the processor 31 executes processing based on the programs.

[0048] The communication unit 33 is preferably a wired communication means such as USB, IEEE1394, Thunderbolt (registered trademark), wired LAN network communication, etc., but may also include wireless LAN network communication, mobile communication such as LTE / 3G / 4G / 5G, BLUETOOTH (registered trademark) communication, etc. as necessary. In other words, it is more preferable to implement it as a collection of multiple communication means. In other words, the information processing device 3 may communicate various information from the outside via the communication unit 33.

[0049] The input unit 34 may be included in the housing of the information processing device 3 or may be externally attached. For example, the input unit 34 may be implemented as a touch panel integrated with the output unit 35. If it is a touch panel, the user can input a tap operation, a swipe operation, or the like. Of course, a switch button, a mouse, a keyboard, or the like may be adopted instead of the touch panel. That is, the input unit 34 accepts an input based on an operation performed by the user. The input is transferred as a command signal to the processor 31 via the communication bus 30, and the processor 31 can execute a predetermined control or calculation as necessary.

[0050] The output unit 35 can function as a display device of the information processing device 3. The output unit 35 may be included in the housing of the information processing device 3, for example, or may be externally attached. The output unit 35 displays a screen of a graphical user interface (GUI) that can be operated by a user. This is preferably implemented by using display devices such as a CRT display, a liquid crystal display, an organic EL display, and a plasma display according to the type of the information processing device 3.

[0051] The program for realizing the software appearing in this embodiment may be provided as a non-transitory computer-readable recording medium, or may be provided so as to be downloadable from an external server, or may be provided so that the program is launched on an external computer and its functions are realized on a client device (so-called cloud computing).

[0052] In addition, in this embodiment, the term "unit" may include, for example, a combination of hardware resources implemented by a circuit in the broad sense and software information processing that can be specifically realized by these hardware resources. In addition, in this embodiment, various information is handled, and this information is represented, for example, by physical values ​​of signal values ​​representing voltage and current, high and low signal values ​​as a binary bit collection consisting of 0 or 1, or quantum superposition (so-called quantum bits), and communication and calculation can be performed on the circuit in the broad sense.

[0053] In addition, a circuit in the broad sense is a circuit realized by at least appropriately combining a circuit, circuitry, a processor, a memory, etc. In other words, it includes an application specific integrated circuit (ASIC), a programmable logic device (e.g., a simple programmable logic device (SPLD), a complex programmable logic device (CPLD), and a field programmable gate array (FPGA)), etc.

[0054] 4. Overview of Information Processing Next, a control method for the X-ray analysis system 1 for stably generating X-rays suitable for X-ray analysis measurement from the X-ray generator 20 will be described with reference to Fig. 7. Fig. 7 is a diagram for explaining an example of information processing in an embodiment. That is, the control method includes the following steps S1 to S4. The processor 31 may cause the output unit 35 to display the state of the information processing relating to the subsequent steps S1 to S4 in a form that is visible to the user.

[0055] In step S1, the processor 31 receives the observation result of the first X-ray L1 in the X-ray observation unit 21 from the X-ray analysis device 2 via the communication unit 33. The observation result includes data on the intensity or shape of the X-ray. Here, the data on the intensity of the X-ray is data on the number of X-ray photons per unit time detected on the detection surface of the X-ray observation unit 21. The data on the shape of the X-ray is data including both data on the position on the detection surface of the X-ray observation unit 21 and data on the intensity of the X-ray. FIG. 8 is a diagram showing an example of an X-ray focus acquired by the X-ray observation unit 21, and a diagram showing an example of data on the shape of the X-ray. In FIG. 8, an image of the X-ray focus is visually expressed. The data on the shape of the X-ray also includes data obtained by converting intensity information such as binarization processing and grayscale conversion.

[0056] As described above, the metal of the X-ray generating unit 203a may be switched due to a change in the trajectory of the electron beam or a movement of the position of the cathode unit 202. In this case, the shape of the X-ray changes so as to be concentrated on the location of the switched metal.

[0057] In step S2, processor 31 refers to the reference data and compares it with the observation result. The reference data is data on the conditions of X-ray intensity or X-ray shape for stably generating X-rays. The reference data is stored in memory unit 32. Processor 31 may switch the reference data for each wavelength of characteristic X-rays. If the observation result satisfies the conditions of the reference data, processor 31 advances the information processing to step S3, and if the observation result does not satisfy the conditions of the reference data, processor 31 advances the information processing to step S4.

[0058] In step S3, the processor 31 generates a control instruction based on the result of the observation, and transmits the control instruction to the X-ray analysis device 2 via the communication unit 33. This control instruction is an instruction for controlling the X-rays generated from the X-ray generation unit 203a. The control instruction is generated based on the deviation of the result of the observation from the reference data. The control instruction includes an instruction for controlling the position of the cathode unit 202 as an electron gun that generates an electron beam, an instruction for changing the output of the filament of the cathode unit 202, an instruction for changing the output of the electric field between the cathode unit 202 and the anode unit 203, and the like. The X-ray analysis device 2 that has received the control instruction executes an operation corresponding to the control instruction. Thereafter, the processor 31 returns to step S1. The processor 31 loops the information processing of steps S1 to S3. The processor 31 also executes the loop of steps S1 to S3 at short intervals, such as less than 0.1 seconds, to execute the observation of the X-ray focus in real time.

[0059] In this case, the control method based on the control instruction is not particularly limited, but for example, P control, PD control, PID control, etc. can be appropriately adopted. Each coefficient related to the control may be set to a preferred value as necessary. The value of the control instruction may be specified by voltage.

[0060] In step S4, if the observation result satisfies the condition of the reference data, the processor 31 ends the information processing. Note that the processor 31 may resume the information processing from step S1 in response to receiving an instruction from the user via the input unit 34.

[0061] Such information processing makes it possible to control the X-rays generated from the X-ray generating unit based on the observation results.

[0062] As described above, according to the present embodiment, it is possible to provide techniques relating to a window holder, an X-ray generator, an X-ray analysis device, a control method for an X-ray generator, and a control system for an X-ray generator, which do not require the provision of an X-ray observation section within a vacuum region and do not require the use of a portion of the X-rays used for X-ray analysis measurement.

[0063] [others] In the embodiment, the X-ray imaging unit 204b has been described as being provided between the first X-ray transmission window 204a and the X-ray generation unit 203a. In the modified example, the first X-ray transmission window 404a may be provided between the X-ray imaging unit 404b and the X-ray generation unit 203a. In this case, a first window holder 404 as shown in FIG. 9 may be provided. FIG. 9 is an example of a cross-sectional view of the first window holder 404 in the modified example. This cross-sectional view is a view of the cross section of the first window holder 204 observed from a plane horizontal to the straight direction of the first X-ray L1. The first window holder 404 in FIG. 9 includes the first X-ray transmission window 404a and the X-ray imaging unit 404b. That is, even in the modified example, the first X-ray transmission window 404a and the X-ray imaging unit 404b are provided in the same unit. A pinhole 404b2 is also formed in the X-ray imaging unit 404b of the modified example. For the X-ray imaging unit 404b and the pinhole 404b2 of the modified example, please refer to the X-ray imaging unit 204b and the pinhole 204b2 of the embodiment. In the first window holder 404 of the modified example, the X-ray imaging unit is not exposed to a high-energy environment, so deterioration of the X-ray imaging unit due to generated ozone and the like is unlikely to occur. In addition, since the X-ray imaging unit is not installed in a vacuum, it is possible to easily adjust, replace, and the like the X-ray imaging unit.

[0064] In addition, in the embodiment, the first X-ray transparent window 204a and the X-ray imaging section 204b are described as being provided in the same unit, but the first X-ray transparent window 204a and the X-ray imaging section 204b may be provided separately from each other.

[0065] In the embodiment, the X-ray imaging unit 204b has been described as being the pinhole 204b2, but in the modified example, any configuration may be adopted as long as it can form an X-ray image in the X-ray observation unit 21. For example, the X-ray imaging unit in the modified example may be a four-quadrant slit. The four-quadrant slit can narrow the space through which the X-ray can pass, similar to the pinhole 204b2. That is, among the X-rays generated from the X-ray generation unit 203a, the X-rays that have passed through the four-quadrant slit form an image in the X-ray observation unit 21. In addition, the X-ray imaging unit in the modified example may be an optical lens that can focus the X-rays on the X-ray observation unit 21. A curved crystal, a multilayer crystal, or the like is used for this optical lens.

[0066] In the embodiment, the magnification of the image of the X-ray focal point formed on the X-ray observation unit 21 has been described as being the magnitude obtained by dividing the distance B by the distance A. In a modified example, the magnification of the image of the X-ray focal point formed on the X-ray observation unit 21 may be determined by the ratio between the distance that the housing unit 206 moves parallel to a specific direction and the distance that the X-ray focal point moves and is formed on the X-ray observation unit 21 that moves accordingly.

[0067] Although the housing unit 206 has been described as moving in parallel along the X-axis direction, the Y-axis direction, or the Z-axis direction, the housing unit 206 of the modified example may have any configuration. For example, the housing unit 206 has been described as moving by a plurality of stages, but the cathode unit 202 may be moved using a stage that moves by applying a magnetic field. Also, for example, the housing unit 206 of the modified example may be configured to change the attitude of the cathode unit 202 by rotating the cathode unit 202 at any angle. In this case, the direction in which the cathode unit 202 irradiates the X-ray generation unit 203a with an electron beam changes according to the change in the attitude of the cathode unit 202. Also, in this case, the control instruction may include an instruction to control the attitude of an electron gun as the cathode unit 202 that generates the electron beam.

[0068] In the embodiment, the case 206 that houses the stage is described as being used, but other mechanisms may be used. In a modified example, the position or orientation of the cathode unit 202 may be controlled by an actuator. The actuator may include a piezoelectric actuator, an electromagnetic actuator, a linear motor (voice coil), a rotary motor with an appropriate gear device, or the like.

[0069] The reference data in step S2 in the embodiment may be generated using a trained model trained by a machine learning algorithm such as a neural network. Data such as the intensity of X-rays, the shape of X-rays, the output to the filament of the cathode unit 202, the magnitude of the magnetic field applied between the cathode unit 202 and the anode unit 203, and the position and orientation of the cathode unit 202 are used as feature quantities of the trained model.

[0070] In the modified example, step S4 does not have to be executed. That is, in the modified example, processor 31 repeatedly executes the information processing of steps S1 to S3.

[0071] In the present embodiment, the size of the X-ray focal spot has been described as being 40 μm or less, but in a modified example, the size of the X-ray focal spot may be 40 μm or more.

[0072] Furthermore, the present invention may be provided in the following manner.

[0073] (1) An X-ray generating device comprising an X-ray generating unit and an X-ray transparent window, the X-ray generating unit configured to generate X-rays by receiving an electron beam from an outside, the X-ray transparent window including a first X-ray transparent window and a second X-ray transparent window, the first X-ray transparent window configured to transmit a first X-ray of the X-rays directed in a first direction, the first X-ray being incident on an X-ray observation unit that is provided on an optical axis of the first X-ray and that can observe an X-ray focus of the X-ray, and the second X-ray transparent window configured to transmit a second X-ray of the X-rays directed in a second direction different from the first direction.

[0074] According to this embodiment, it is not necessary to provide an X-ray observation section within the vacuum region, and it is not necessary to use part of the X-rays used for X-ray analysis measurement.

[0075] (2) The X-ray generating device described in (1) above, further comprising an X-ray imaging unit, the X-ray imaging unit configured to receive the first X-ray and form an image of the first X-ray in the X-ray observation unit.

[0076] According to this embodiment, since an image of the X-ray generating part is formed in the X-ray observation part, it becomes possible to observe the state of the X-ray generating part.

[0077] (3) The X-ray generating device according to (2) above, wherein a pinhole is formed in the X-ray imaging section.

[0078] According to this aspect, by using a pinhole, it becomes possible to form an image of the X-ray generation part in the X-ray observation part.

[0079] (4) The X-ray generating apparatus according to (3) above, wherein the pinhole has a diameter of 20 μm or less.

[0080] According to this embodiment, by using a pinhole with an appropriate diameter, it is possible to form a clearer image of the X-ray generating part in the X-ray observation part.

[0081] (5) The X-ray generating device according to any one of (2) to (4) above, wherein the X-ray imaging unit is provided between the X-ray transmission window and the X-ray generating unit.

[0082] According to this embodiment, the X-ray imaging section can be located closer to the X-ray generation section than the X-ray transmission window, making it possible to form a sufficiently large image in the X-ray observation section without using a large-scale device.

[0083] (6) The X-ray generating device according to any one of (2) to (5) above, wherein the X-ray imaging section and the X-ray transmission window are provided in a single unit.

[0084] According to this embodiment, the X-ray imaging section can be configured as the same unit as the X-ray transmission window, which makes it easy to incorporate into an existing system.

[0085] (7) An X-ray analysis apparatus comprising an X-ray generator, a sample stage, and an X-ray detector, the X-ray generator being any one of the X-ray generators described in (1) to (6) above, the sample stage being configured to be able to place a sample on which the second X-rays are incident, and the X-ray detector being configured to be able to detect the second X-rays diffracted, reflected, or scattered by the sample.

[0086] According to this aspect, it is possible to provide an X-ray analysis device that can control the X-rays used for X-ray analysis measurement based on the observation results of the X-rays generated from the X-ray generation unit.

[0087] (8) A method for controlling an X-ray generating device according to any one of (1) to (6) above, comprising the following steps: in the receiving step, a result of observation of the first X-ray in the X-ray observation unit is received; and in the control step, a position or attitude of an electron gun that generates the electron beam is controlled based on the result of the observation.

[0088] According to this embodiment, it is possible to control the X-rays generated from the X-ray generating unit based on the observation results.

[0089] (9) A control system for an X-ray generator, comprising at least one processor that executes each step of the control method described in (8) above.

[0090] According to this embodiment, it is possible to control the X-rays generated from the X-ray generating unit based on the observation results. Of course, this is not the case.

[0091] Finally, although various embodiments of the present invention have been described, these are presented as examples and are not intended to limit the scope of the invention. The novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. The embodiments and their modifications are included within the scope and spirit of the invention, and are included in the scope of the invention and its equivalents described in the claims. [Explanation of symbols]

[0092] 1: X-ray analysis system 2:X-ray analyzer 20: X-ray generator 200: Storage unit 201: Insulation part 202: Cathode section 203: Anode part 203a: X-ray generating section 204: First window holder 204a: First X-ray transparent window 204b: X-ray imaging section 204b2: Pinhole 204c: Air hole 205: Second window holder 205a: second X-ray transparent window 206: Housing 207: Bellows 21: X-ray observation section 22: Sample stage 23: X-ray detector 3: Information processing equipment 30: Communication bus 31: Processor 32: Storage section 33: Communications Department 34: Input section 35: Output section 404: First window holder 404a: X-ray transparent window 404b: X-ray imaging section 404b2: Pinhole D1: First direction D2: Second direction L1: First X-ray L2: Second X-ray

Claims

1. 1. An X-ray generating device, comprising: The apparatus includes an X-ray generating unit, an X-ray transmission window, and an X-ray imaging unit, the X-ray generating unit is configured to generate X-rays by receiving an electron beam from an external source; the x-ray transmissive window includes a first x-ray transmissive window and a second x-ray transmissive window; the first X-ray transmission window is configured to transmit first X-rays directed in a first direction among the X-rays, wherein the first X-rays are incident on an X-ray observation unit that is provided on an optical axis of the first X-rays and that can observe an X-ray focus of the X-rays; the second X-ray transmissive window is configured to transmit second X-rays of the X-rays directed in a second direction different from the first direction; The X-ray imaging unit receiving the first X-rays; The X-ray observation unit is configured to form an image of the first X-ray. X-ray generator.

2. In the X-ray generating device according to claim 1, A pinhole is formed in the X-ray imaging unit. X-ray generator.

3. In the X-ray generating device according to claim 2, The diameter of the pinhole is 20 μm or less. X-ray generator.

4. In the X-ray generating device according to claim 1, the X-ray imaging unit is provided between the X-ray transmission window and the X-ray generation unit; X-ray generator.

5. In the X-ray generating device according to claim 1, the X-ray imaging unit and the X-ray transmission window are provided in the same unit; X-ray generator.

6. An X-ray analysis apparatus, An X-ray generator, a sample stage, and an X-ray detector are provided. The X-ray generator is an X-ray generator according to any one of claims 1 to 5, the sample stage is configured to be able to place a sample on which the second X-rays are incident, the X-ray detector is configured to be able to detect the second X-rays diffracted, reflected, or scattered by the sample. X-ray analyzer.

7. A method for controlling an X-ray generator according to any one of claims 1 to 5, comprising: It includes the following steps: In the receiving step, a result of the first X-ray observation in the X-ray observation unit is received; In the control step, a position or an attitude of an electron gun that generates the electron beam is controlled based on the result of the observation. A method for controlling an X-ray generating device.

8. A control system for an X-ray generator, comprising: at least one processor for executing the steps of the control method of claim 7; X-ray generator control system.

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