Remote plasma device and plasma processing apparatus

JP2024175447APending Publication Date: 2024-12-18TOKYO ELECTRON LTD
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Patent Information

Application Number
JP2023093239
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-06-06
Publication Date
2024-12-18

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Abstract

To reduce a size of a remote plasma device.SOLUTION: The present invention provides a remote plasma device including: a metal housing; a dielectric body disposed to fill the housing; a gas supply port that is disposed at the housing and supplies a gas into the housing; a gas exhaust port that is disposed at the housing, and discharges the gas from the housing; a gas line that is formed in the dielectric body, and connects the gas supply port and the gas exhaust port; and an electromagnetic wave supply part that is disposed at the housing, supplies electromagnetic waves into the housing, and generates a plasma in the gas line.SELECTED DRAWING: Figure 1
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