Photolithography mask and photolithography system including such a photolithography mask
JP2024532663A5Pending Publication Date: 2025-04-09テクノロジーズデジソーインコーポレイテッド
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- JP2024502627
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2021-07-26
- Filing Date
- 2022-03-31
- Publication Date
- 2025-04-09
Smart Images
Figure 00000000_0000_ABST
Abstract
There is provided a photolithography mask (10) comprising a plate (15) or air-frame matrix having an array of micropixels (20) on a surface thereof, each micropixel (20) being independently controllable using an on-board microcontroller (25) such that a pattern can be generated with the array of micropixels (20).
Need to check novelty before this filing date? Find Prior Art