Gas production apparatus and gas production method

Abstract

To improve efficiency in producing gas.SOLUTION: A gas production apparatus 10 constitutes a closed loop line 83 in which hydrogen gas circulates through a heating part 22, a first adsorption cylinder 11 and a cooling part 24 in this order. The gas production apparatus 10 comprises a pump 47 which circulates hydrogen gas into the closed loop line 83 after supply of hydrogen gas through a supply line 80 from a single gas supply source A1 is stopped. This enables the pump 47 to circulate hydrogen gas into the closed loop line 83 after the supply of hydrogen gas through the supply line 80 from the single gas supply source A1 is stopped, so that moisture included in a first adsorbent 13 in the first adsorption cylinder 11 which should be subjected to regeneration processing can be separated by high-temperature hydrogen gas heated by the heating part 22.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present invention relates to a gas production apparatus and a gas production method. [Background technology]

[0002] In order to use a single gas such as hydrogen gas or oxygen gas as a dry gas, it is necessary to adsorb moisture contained in the single gas to convert it into a dry gas. Thus, a gas production apparatus equipped with an adsorption tube containing an adsorbent therein is known. In such a gas production apparatus, an adsorption process and a regeneration process are alternately and repeatedly performed in the adsorption tube. In the adsorption process, the adsorbent adsorbs moisture contained in the single gas supplied into the adsorption tube through a supply line from a single gas supply source. In the regeneration process, the adsorbent is regenerated by removing moisture contained in the adsorbent after the adsorption process. The gas production apparatus is equipped with a plurality of adsorption tubes so that the adsorption process can be performed in another adsorption tube until the adsorbent is regenerated in the regeneration process after the adsorption process and the adsorption process is performed again in the adsorption tube containing the adsorbent therein.

[0003] In such a gas production apparatus, as in Patent Document 1, for example, in the regeneration process, it is considered that a part of the single gas flowing through the supply line is heated by a heating unit and then supplied to the adsorption tube, which is the target for the regeneration process. In this way, the moisture contained in the adsorbent in the adsorption tube, which is the target for the regeneration process, is desorbed by the high-temperature single gas heated by the heating unit. This regenerates the adsorbent in the adsorption tube, which is the target for the regeneration process. Then, the single gas discharged from the adsorption tube during the regeneration process is cooled by a cooling unit to recover the moisture contained in the single gas, and then the gas is returned to the supply line. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 1-310717 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in such a gas production apparatus, when the supply of the single gas from the single gas supply source through the supply line is stopped for a long time, the moisture content of the adsorbent may reach an equilibrium state in all the adsorption columns. If the supply of the single gas from the single gas supply source through the supply line is started again in all the adsorption columns while the moisture content of the adsorbent remains equilibrium, it becomes difficult to sufficiently perform the adsorption process in the adsorption columns. Therefore, for example, in order to regenerate the adsorbent, it is necessary to sufficiently regenerate the adsorbent by supplying a gas other than the single gas into the adsorption columns. In this way, the start-up of the gas production apparatus becomes poor, and the gas production efficiency deteriorates. [Means for solving the problem]

[0006] Various aspects for solving the above problems will be described below. [Aspect 1] An adsorption cylinder that contains an adsorbent therein, an adsorption step of adsorbing moisture contained in a single gas supplied from a single gas supply source into the adsorption cylinder through a supply line with the adsorbent, and a regeneration step of desorbing moisture contained in the adsorbent after the adsorption step to regenerate the adsorbent, the adsorption step being repeated alternately in the adsorption cylinder, thereby producing a dry gas by adsorbing moisture with the adsorbent in the adsorption step; a plurality of adsorption cylinders are provided so that the adsorption step can be carried out in another adsorption cylinder until the adsorption step is carried out again in the adsorption cylinder containing the adsorbent after the adsorption step by regenerating the adsorbent in the regeneration step; In the gas production apparatus, in the regeneration step, a portion of the single gas flowing through the supply line is heated by a heating unit and then supplied into an adsorption column which is a target for carrying out the regeneration step, and the single gas discharged from the adsorption column during the regeneration step is cooled by a cooling unit to recover moisture contained in the single gas, and then the single gas is returned to the supply line, a gas production apparatus which configures a closed loop line through which a single gas circulates in the order of the heating section, the adsorption column which is the target for performing the regeneration process, and the cooling section, and which further comprises a pump which circulates the single gas through the closed loop line after the supply of the single gas from the single gas supply source via the supply line is stopped.

[0007] [Aspect 2] The gas manufacturing apparatus according to [Aspect 1], wherein the pump is driven after the supply of the single gas from the single gas supply source through the supply line has stopped and immediately before the supply of the single gas from the single gas supply source through the supply line is restarted.

[0008] [Aspect 3] The gas manufacturing apparatus according to [Aspect 1] or [Aspect 2] is characterized in that, after the pump is driven, when the difference between the temperature of the single gas heated by the heating section in the closed loop line and supplied to the adsorption column that is the target of the regeneration process, and the temperature of the single gas discharged from the adsorption column, becomes less than a predetermined temperature, the drive of the pump is stopped.

[0009] [Aspect 4] a regeneration supply line branching off from the supply line to supply a portion of the single gas flowing through the supply line into an adsorption column that is the target of the regeneration step; a regeneration reflux line for refluxing the single gas discharged from the adsorption column during the regeneration step to the supply line; The heating unit is provided in the regeneration supply line, The cooling section is provided in the regeneration reflux line, The regenerated supply line and the regenerated return line constitute a part of the closed loop line, a first on-off valve is provided in a portion of the supply line closer to the adsorption tube than a connection point between the supply line and the regeneration supply line and closer to the adsorption tube than a connection point between the supply line and the regeneration reflux line, The regeneration supply line is provided with a second on-off valve, a third on / off valve is provided in a portion of the supply line closer to the single gas supply source than a connection point between the supply line and the regeneration supply line; the closed loop line includes a bypass line that bypasses the second on / off valve, The pump is provided in the bypass line, The gas manufacturing apparatus according to any one of [Aspect 1] to [Aspect 3], characterized in that when the supply of the single gas from the single gas supply source through the supply line is stopped, the first on / off valve, the second on / off valve, and the third on / off valve are closed to form the closed loop line.

[0010] [Aspect 5] an adsorption step of adsorbing moisture contained in a single gas supplied from a single gas supply source into the adsorption cylinder through a supply line with an adsorbent, and a regeneration step of desorbing moisture contained in the adsorbent after the adsorption step to regenerate the adsorbent, the adsorption step being repeated alternately in the adsorption cylinder, thereby producing a dry gas by adsorbing moisture with the adsorbent in the adsorption step; After the adsorption step, the adsorbent is regenerated in the regeneration step, and the adsorption step is carried out again in the adsorption tube containing the regenerated adsorbent therein. During this time, the adsorption step is carried out in another adsorption tube; In the regeneration step, a portion of the single gas flowing through the supply line is heated by a heating unit and then supplied into an adsorption column which is a target for carrying out the regeneration step, and the single gas discharged from the adsorption column during the regeneration step is cooled by a cooling unit and then returned to the supply line, a single gas supply source for supplying the single gas through the supply line, the single gas being circulated through a closed loop line in which the single gas circulates in this order through the heating section, the adsorption column which is the target for performing the regeneration process, and the cooling section, by driving a pump, after the supply of the single gas from the single gas supply source through the supply line is stopped. Effect of the Invention

[0011] According to the present invention, the gas production efficiency can be improved. [Brief description of the drawings]

[0012] [Figure 1] FIG. 1 is a schematic diagram showing a gas production apparatus according to an embodiment. [Diagram 2] FIG. 2 is a diagram for explaining the first program. [Diagram 3] FIG. 3 is a diagram for explaining the second program. [Figure 4] FIG. 4 is a diagram for explaining the third program. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] Hereinafter, one embodiment of a gas production apparatus will be described with reference to Figs. <Outline of gas production equipment> As shown in FIG. 1, the gas production apparatus 10 includes a first adsorption column 11 and a second adsorption column 12. The first adsorption column 11 is an adsorption column that houses a first adsorbent 13 as an adsorbent therein. The second adsorption column 12 is an adsorption column that houses a second adsorbent 14 as an adsorbent therein. Thus, the gas production apparatus 10 includes a plurality of adsorption columns. The first adsorbent 13 and the second adsorbent 14 are configured to be capable of adsorbing moisture. Examples of the first adsorbent 13 and the second adsorbent 14 include activated alumina, silica gel, and synthetic zeolite.

[0014] The gas production apparatus 10 includes a first pipe 15, a second pipe 16, and a third pipe 17. A first end of the first pipe 15 is connected to a single gas supply source A1. The single gas supplied from the single gas supply source A1 is hydrogen gas. The hydrogen gas is wet hydrogen gas containing moisture produced by electrolysis. The gas production apparatus 10 of this embodiment produces dry gas by adsorbing moisture contained in the hydrogen gas with the first adsorbent 13 or the second adsorbent 14.

[0015] A first end of the second pipe 16 and a first end of the third pipe 17 are each connected to the second end of the first pipe 15. Therefore, the second pipe 16 and the third pipe 17 branch off from the second end of the first pipe 15. The second end of the second pipe 16 is connected to the first port 11a of the first adsorption column 11. The second end of the third pipe 17 is connected to the first port 12a of the second adsorption column 12.

[0016] The gas production apparatus 10 has a fourth pipe 18, a fifth pipe 19, and a sixth pipe 20. A first end of the fourth pipe 18 is connected to the second port 11b of the first adsorption column 11. A first end of the fifth pipe 19 is connected to the second port 12b of the second adsorption column 12. A first end of the sixth pipe 20 is connected to a second end of the fourth pipe 18 and a second end of the fifth pipe 19, respectively. Thus, the fourth pipe 18 and the fifth pipe 19 merge into the sixth pipe 20. A second end of the sixth pipe 20 is connected to a supply target (not shown) of the dry gas.

[0017] The gas manufacturing apparatus 10 includes a seventh pipe 21. A first end of the seventh pipe 21 is connected to the first pipe 15. Thus, the seventh pipe 21 branches off from the first pipe 15. A second end of the seventh pipe 21 is connected to a junction of the fourth pipe 18 and the fifth pipe 19 with the sixth pipe 20. The seventh pipe 21 is provided with a heating unit 22. The heating unit 22 is an electric heater that heats a portion of the seventh pipe 21 from the surroundings.

[0018] The gas production device 10 includes an eighth pipe 23. A first end of the eighth pipe 23 is connected to a branch point of the second pipe 16 and the third pipe 17 from the first pipe 15. A second end of the eighth pipe 23 is connected to a portion of the first pipe 15 closer to the second pipe 16 and the third pipe 17 than the connection point of the first pipe 15 with the seventh pipe 21.

[0019] The eighth pipe 23 is provided with a cooling section 24. The cooling section 24 is a water-cooled cooler. The cooling section 24 is configured to be able to cool the hydrogen gas flowing through the eighth pipe 23. The eighth pipe 23 is provided with a drain recovery section 25. The drain recovery section 25 is provided in a portion of the eighth pipe 23 closer to the first pipe 15 than the cooling section 24 is. The drain recovery section 25 is configured to be able to recover moisture contained in the hydrogen gas flowing through the eighth pipe 23.

[0020] The gas production device 10 includes a first switching valve 31. The first switching valve 31 is provided at a connection point where the first pipe 15, the second pipe 16, the third pipe 17, and the eighth pipe 23 all join together. The first switching valve 31 is a four-way valve. The first switching valve 31 has a first port 31a, a second port 31b, a third port 31c, and a fourth port 31d. The first port 31a of the first switching valve 31 is connected to a second end of the first pipe 15. The second port 31b of the first switching valve 31 is connected to a first end of the second pipe 16. The third port 31c of the first switching valve 31 is connected to a first end of the third pipe 17. The fourth port 31d of the first switching valve 31 is connected to a first end of the eighth pipe 23.

[0021] The first switching valve 31 is configured to be switchable to a first switching state in which the first port 31a communicates with the second port 31b and the third port 31c communicates with the fourth port 31d. The first switching valve 31 is also configured to be switchable to a second switching state in which the first port 31a communicates with the third port 31c and the second port 31b communicates with the fourth port 31d.

[0022] The gas production device 10 includes a second switching valve 32. The second switching valve 32 is provided at a connection point where the fourth pipe 18, the fifth pipe 19, the sixth pipe 20, and the seventh pipe 21 all join together. The second switching valve 32 is a four-way valve. The second switching valve 32 has a first port 32a, a second port 32b, a third port 32c, and a fourth port 32d. The first port 32a of the second switching valve 32 is connected to a second end of the fourth pipe 18. The second port 32b of the second switching valve 32 is connected to a second end of the fifth pipe 19. The third port 32c of the second switching valve 32 is connected to a first end of the sixth pipe 20. The fourth port 32d of the second switching valve 32 is connected to a second end of the seventh pipe 21.

[0023] The second switching valve 32 is configured to be switchable to a first switching state in which the first port 32a communicates with the third port 32c and the second port 32b communicates with the fourth port 32d. The second switching valve 32 is also configured to be switchable to a second switching state in which the first port 32a communicates with the fourth port 32d and the second port 32b communicates with the third port 32c.

[0024] The gas production device 10 includes a first on-off valve 41. The first on-off valve 41 is a two-way valve. The first on-off valve 41 is provided in a portion of the first pipe 15 closer to the second pipe 16 and the third pipe 17 than the connection point with the second end of the eighth pipe 23. When the first on-off valve 41 is in an open state, it allows the flow of hydrogen gas through the first on-off valve 41 in the first pipe 15. On the other hand, when the first on-off valve 41 is in a closed state, it blocks the flow of hydrogen gas through the first on-off valve 41 in the first pipe 15.

[0025] The gas production device 10 includes a second on / off valve 42. The second on / off valve 42 is a two-way valve. The second on / off valve 42 is provided in a portion of the seventh pipe 21 closer to the first pipe 15 than the heating unit 22. When the second on / off valve 42 is in an open state, it allows the flow of hydrogen gas through the second on / off valve 42 in the seventh pipe 21. On the other hand, when the second on / off valve 42 is in a closed state, it blocks the flow of hydrogen gas through the second on / off valve 42 in the seventh pipe 21.

[0026] The gas production device 10 includes a third on-off valve 43. The third on-off valve 43 is a two-way valve. The third on-off valve 43 is provided in a portion of the first pipe 15 closer to the single gas supply source A1 than the connection point with the seventh pipe 21. When the third on-off valve 43 is in an open state, it allows the flow of hydrogen gas through the third on-off valve 43 in the first pipe 15. On the other hand, when the third on-off valve 43 is in a closed state, it blocks the flow of hydrogen gas through the third on-off valve 43 in the first pipe 15.

[0027] The gas manufacturing apparatus 10 includes a bypass pipe 45. A first end of the bypass pipe 45 is connected to a portion of the seventh pipe 21 between the first pipe 15 and the second on / off valve 42. A second end of the bypass pipe 45 is connected to a portion of the seventh pipe 21 between the second on / off valve 42 and the heating unit 22.

[0028] The gas production apparatus 10 includes a pump 47. The pump 47 is provided in the bypass pipe 45. The pump 47 is a compression pump. The pump 47 sucks in the hydrogen gas flowing through the bypass pipe 45 and discharges it.

[0029] <Electrical configuration of gas production equipment> The gas production apparatus 10 includes a control device 70. The control device 70 includes a central processing unit (CPU). The control device 70 also includes a memory including a read-only memory (ROM) that stores various programs and maps in advance, and a random access memory (RAM) that temporarily stores the results of CPU calculations, etc. The control device 70 also includes a timer counter, an input interface, an output interface, etc.

[0030] The control device 70 is electrically connected to the first switching valve 31, the second switching valve 32, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43. The control device 70 controls the operation of each of the first switching valve 31, the second switching valve 32, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43. The control device 70 is also electrically connected to the heating unit 22, the cooling unit 24, and the pump 47. The control device 70 controls the operation of each of the heating unit 22, the cooling unit 24, and the pump 47.

[0031] The control device 70 is electrically connected to an external control device 71 that controls the operation of the single gas supply source A1. The control device 70 receives a signal from the external control device 71 indicating that the operation of the single gas supply source A1 has been stopped. The control device 70 receives a signal from the external control device 71 indicating that preparations for starting the operation of the single gas supply source A1 have begun.

[0032] The gas production apparatus 10 includes a first temperature sensor 72 and a second temperature sensor 73. The first temperature sensor 72 is configured to be capable of detecting the temperature of the hydrogen gas flowing through the first port 11a of the first adsorption column 11. The second temperature sensor 73 is configured to be capable of detecting the temperature of the hydrogen gas flowing through the second port 11b of the first adsorption column 11.

[0033] The control device 70 is electrically connected to a first temperature sensor 72. Then, information regarding the temperature of the hydrogen gas detected by the first temperature sensor 72 is transmitted from the first temperature sensor 72 to the control device 70. The control device 70 is electrically connected to a second temperature sensor 73. Then, information regarding the temperature of the hydrogen gas detected by the second temperature sensor 73 is transmitted from the second temperature sensor 73 to the control device 70.

[0034] The gas production apparatus 10 includes a pressure sensor 74. The pressure sensor 74 is configured to be able to detect the pressure of hydrogen gas flowing in a portion of the first pipe 15 closer to the single gas supply source A1 than the third on / off valve 43. The control device 70 is electrically connected to the pressure sensor 74. Information relating to the pressure of the hydrogen gas detected by the pressure sensor 74 is transmitted from the pressure sensor 74 to the control device 70.

[0035] <Control of the control device> 2, a first program for executing an adsorption process in the first adsorption column 11 and a regeneration process in the second adsorption column 12 is stored in advance in the control device 70. In the first program, the first switching valve 31 is set to the first switching state, and the second switching valve 32 is set to the first switching state. In the first program, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43 are set to the open state. In the first program, the operation of the pump 47 is stopped.

[0036] When the first program is being executed, the first pipe 15 and the second pipe 16 form a supply line 80 that supplies hydrogen gas from the single gas supply source A1 into the first adsorption column 11. In the adsorption step of the first program, moisture contained in the hydrogen gas supplied from the single gas supply source A1 through the supply line 80 into the first adsorption column 11 is adsorbed by the first adsorbent 13. In this way, the gas production apparatus 10 produces dry gas by adsorbing moisture by the first adsorbent 13 in the adsorption step.

[0037] When the first program is being executed, the seventh pipe 21 and the fifth pipe 19 form a regeneration supply line 81 that branches off from the supply line 80 and supplies a portion of the hydrogen gas flowing through the supply line 80 into the second adsorption column 12, which is the target for performing the regeneration process.

[0038] In the regeneration step of the first program, a portion of the hydrogen gas flowing through the supply line 80 is heated by the heating unit 22 and then supplied into the second adsorption column 12, which is the target for the regeneration step. In the first program, the second adsorbent 14 in the second adsorption column 12, which is the target for the regeneration step, is regenerated. Therefore, in the regeneration step of the first program, the moisture contained in the second adsorbent 14 is removed after the adsorption step to regenerate the second adsorbent 14.

[0039] When the first program is being executed, the third pipe 17 and the eighth pipe 23 form a regeneration reflux line 82 that refluxes the hydrogen gas discharged from the second adsorption column 12 during the regeneration process to the supply line 80. In the first program, the hydrogen gas discharged from the second adsorption column 12 during the regeneration process is cooled by the cooling unit 24, and the moisture contained in the hydrogen gas is recovered by the drain recovery unit 25, and then the hydrogen gas is refluxed to the supply line 80.

[0040] As shown in Fig. 3, a second program for executing a regeneration process in the first adsorption column 11 and an adsorption process in the second adsorption column 12 is stored in advance in the control device 70. In the second program, the first switching valve 31 is set to the second switching state, and the second switching valve 32 is set to the second switching state. In the second program, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43 are set to the open state. In the second program, the operation of the pump 47 is stopped.

[0041] When the second program is being executed, the first pipe 15 and the third pipe 17 form a supply line 80 that supplies hydrogen gas from the single gas supply source A1 into the second adsorption column 12. In the adsorption step of the second program, moisture contained in the hydrogen gas supplied from the single gas supply source A1 through the supply line 80 into the second adsorption column 12 is adsorbed by the second adsorbent 14. In this manner, the gas production apparatus 10 produces dry gas by adsorbing moisture by the second adsorbent 14 in the adsorption step.

[0042] When the second program is being executed, the seventh pipe 21 and the fourth pipe 18 form a regeneration supply line 81 that branches off from the supply line 80 and supplies a portion of the hydrogen gas flowing through the supply line 80 into the first adsorption column 11, which is the target for performing the regeneration process.

[0043] In the regeneration step of the second program, a portion of the hydrogen gas flowing through the supply line 80 is heated by the heating unit 22 and then supplied into the first adsorption column 11, which is the target for the regeneration step. Then, in the second program, the first adsorbent 13 in the first adsorption column 11, which is the target for the regeneration step, is regenerated. Therefore, in the regeneration step of the second program, the moisture contained in the first adsorbent 13 is removed after the adsorption step to regenerate the first adsorbent 13.

[0044] When the second program is being executed, the second piping 16 and the eighth piping 23 form a regeneration reflux line 82 that refluxes the hydrogen gas discharged from the first adsorption column 11 during the regeneration process to the supply line 80. In the second program, the hydrogen gas discharged from the first adsorption column 11 during the regeneration process is cooled by the cooling unit 24, and the moisture contained in the hydrogen gas is recovered by the drain recovery unit 25, and then the hydrogen gas is refluxed to the supply line 80.

[0045] As described above, the gas production apparatus 10 includes the regeneration supply line 81 and the regeneration reflux line 82. The heating unit 22 is provided in the regeneration supply line 81. The cooling unit 24 is provided in the regeneration reflux line 82. A first on-off valve 41 is provided in a portion of the supply line 80 closer to the first adsorption column 11 and the second adsorption column 12 than the connection point of the supply line 80 with the regeneration supply line 81 and closer to the first adsorption column 11 and the second adsorption column 12 than the connection point of the supply line 80 with the regeneration reflux line 82. A second on-off valve 42 is provided in the regeneration supply line 81. A third on-off valve 43 is provided in a portion of the supply line 80 closer to the single gas supply source A1 than the connection point of the supply line 80 with the regeneration supply line 81.

[0046] The control device 70 stores in advance a program for switching to the second program after a certain time has elapsed since switching to the first program. The "certain time" is the time it is estimated that the moisture contained in the second adsorbent 14 in the second adsorption column 12 has been sufficiently desorbed. This "certain time" is determined in advance by experiment or the like.

[0047] The control device 70 stores in advance a program for switching to the first program after a certain time has elapsed since switching to the second program. The "certain time" is the time it is estimated that the moisture contained in the first adsorbent 13 in the first adsorption column 11 has been sufficiently desorbed. This "certain time" is determined in advance by an experiment or the like.

[0048] In this way, the gas production apparatus 10 produces dry gas by alternately and repeatedly performing the adsorption process and the regeneration process in the first adsorption column 11 and the second adsorption column 12, thereby adsorbing moisture with the first adsorbent 13 and the second adsorbent 14 in the adsorption process. Therefore, the gas production apparatus 10 is provided with a plurality of adsorption columns so that the adsorption process can be performed in another adsorption column until the adsorption process is performed again in the adsorption column that contains the adsorbent after the adsorption process by regenerating the adsorbent in the regeneration process.

[0049] As shown in FIG. 4, the control device 70 stores in advance a third program for circulating hydrogen gas in the closed loop line 83 after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped. When the control device 70 receives a signal from the external control device 71 indicating that the drive of the single gas supply source A1 has been stopped, the control device 70 executes the third program. In the third program, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43 are each closed. Then, in the third program, the first switching valve 31 is set to the second switching state, and the second switching valve 32 is set to the second switching state. Furthermore, in the third program, when the control device 70 receives a signal from the external control device 71 indicating that the drive of the single gas supply source A1 has been stopped, the control device 70 stops the drive of the heating unit 22 and the cooling unit 24.

[0050] When the third program is executed, a closed loop line 83 is formed by the first pipe 15, the seventh pipe 21, the bypass pipe 45, the seventh pipe 21, the fourth pipe 18, the first adsorption column 11, the second pipe 16, and the eighth pipe 23. In the closed loop line 83, when the pump 47 is driven, the hydrogen gas flowing through the closed loop line 83 circulates through the heating section 22, the first adsorption column 11, and the cooling section 24 in this order. In this manner, the gas production apparatus 10 forms a closed loop line 83 in which the hydrogen gas circulates through the heating section 22, the first adsorption column 11, which is the target for performing the regeneration process, and the cooling section 24 in this order. When the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped, the gas production apparatus 10 closes the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43 to form the closed loop line 83. The regeneration supply line 81 and the regeneration reflux line 82 form a part of the closed loop line 83.

[0051] The bypass piping 45 is a bypass line 84 that bypasses the second on-off valve 42. Therefore, the closed loop line 83 has the bypass line 84 that bypasses the second on-off valve 42. And, the pump 47 is provided in the bypass line 84.

[0052] In the third program, when the control device 70 receives a signal from the external control device 71 to start preparations for starting the operation of the single gas supply source A1, the control device 70 drives the pump 47, the heating unit 22, and the cooling unit 24. Therefore, the pump 47 is driven immediately before the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is started again after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped. In this manner, the pump 47 circulates hydrogen gas in the closed loop line 83 after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped.

[0053] The third program determines whether or not the difference between the temperature detected by the first temperature sensor 72 and the temperature detected by the second temperature sensor 73 is less than a predetermined temperature. The third program stops driving the pump 47 when the difference between the temperature detected by the first temperature sensor 72 and the temperature detected by the second temperature sensor 73 becomes less than the predetermined temperature.

[0054] The temperature detected by the first temperature sensor 72 is the temperature of the hydrogen gas discharged from the first adsorption column 11. The temperature detected by the second temperature sensor 73 is the temperature of the hydrogen gas heated by the heating unit 22 in the closed loop line 83 and supplied to the first adsorption column 11, which is the target for the regeneration process. In this way, after the pump 47 is driven, when the difference between the temperature of the hydrogen gas heated by the heating unit 22 in the closed loop line 83 and supplied to the first adsorption column 11, which is the target for the regeneration process, and the temperature of the hydrogen gas discharged from the first adsorption column 11 becomes less than a preset predetermined temperature, the drive of the pump 47 is stopped.

[0055] The difference between the temperature of the hydrogen gas supplied to the first adsorption column 11 and the temperature of the hydrogen gas discharged from the first adsorption column 11 becomes smaller as the regeneration of the first adsorbent 13 progresses. When the difference between the temperature of the hydrogen gas supplied to the first adsorption column 11 and the temperature of the hydrogen gas discharged from the first adsorption column 11 becomes less than a preset predetermined temperature, the operation of the pump 47 is stopped. Note that the "predetermined temperature" is a temperature at which it can be determined that the regeneration of the first adsorbent 13 has been completed. This "predetermined temperature" is determined in advance by experiment or the like.

[0056] Then, when the pressure detected by the pressure sensor 74 increases and reaches a predetermined pressure, the control device 70 switches from the third program to the first program and opens the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43.

[0057] [Operation of the embodiment] Next, the operation of this embodiment will be described while explaining the gas production method. As shown in Fig. 2, the control device 70 executes a first program to supply hydrogen gas supplied from the single gas supply source A1 into the first adsorption column 11 via the first pipe 15, the second pipe 16, and the first port 11a. Then, an adsorption process is performed in which moisture contained in the hydrogen gas supplied into the first adsorption column 11 is adsorbed by the first adsorbent 13. In this manner, the gas production device 10 produces dry gas by adsorbing moisture by the first adsorbent 13 in the adsorption process. The dry gas produced by carrying out the adsorption process in the first adsorption column 11 is supplied to a supply target of the dry gas via the second port 11b, the fourth pipe 18, and the sixth pipe 20.

[0058] A portion of the hydrogen gas flowing through the first pipe 15 flows into the seventh pipe 21. The hydrogen gas flowing through the seventh pipe 21 is heated by the heating unit 22. The hydrogen gas heated by the heating unit 22 is then supplied into the second adsorption column 12 via the fifth pipe 19 and the second port 12b. A regeneration process is then performed in which the moisture contained in the second adsorbent 14 in the second adsorption column 12 is removed by the high-temperature hydrogen gas heated by the heating unit 22 to regenerate the second adsorbent 14. In this way, in the regeneration process, a portion of the hydrogen gas flowing through the supply line 80 is heated by the heating unit 22 and then supplied into the second adsorption column 12.

[0059] The hydrogen gas in the second adsorption column 12 flows through the eighth pipe 23 via the third pipe 17. The hydrogen gas flowing through the eighth pipe 23 is cooled by the cooling unit 24. Then, the moisture contained in the hydrogen gas cooled by the cooling unit 24 is recovered by the drain recovery unit 25. The hydrogen gas from which the moisture has been recovered by the drain recovery unit 25 is returned to the first pipe 15 via the eighth pipe 23. In this way, the hydrogen gas discharged from the second adsorption column 12 during the regeneration process is cooled by the cooling unit 24 and then returned to the supply line 80.

[0060] As shown in Fig. 3, the control device 70 executes the second program after a certain time has elapsed since executing the first program, and supplies hydrogen gas supplied from the single gas supply source A1 into the second adsorption column 12 via the first pipe 15, the third pipe 17, and the first port 12a. Then, an adsorption process is performed in which moisture contained in the hydrogen gas supplied into the second adsorption column 12 is adsorbed by the second adsorbent 14. In this way, the gas production device 10 produces dry gas by adsorbing moisture by the second adsorbent 14 in the adsorption process. The dry gas produced by performing the adsorption process in the second adsorption column 12 is supplied to a supply target of the dry gas via the second port 12b, the fifth pipe 19, and the sixth pipe 20.

[0061] A portion of the hydrogen gas flowing through the first pipe 15 flows into the seventh pipe 21. The hydrogen gas flowing through the seventh pipe 21 is heated by the heating unit 22. The hydrogen gas heated by the heating unit 22 is then supplied into the first adsorption column 11 via the fourth pipe 18 and the second port 11b. A regeneration process is then performed in which the moisture contained in the first adsorbent 13 in the first adsorption column 11 is removed by the high-temperature hydrogen gas heated by the heating unit 22 to regenerate the first adsorbent 13. In this way, in the regeneration process, a portion of the hydrogen gas flowing through the supply line 80 is heated by the heating unit 22 and then supplied into the first adsorption column 11.

[0062] The hydrogen gas in the first adsorption column 11 flows through the eighth pipe 23 via the second pipe 16. The hydrogen gas flowing through the eighth pipe 23 is cooled by the cooling unit 24. Then, moisture contained in the hydrogen gas cooled by the cooling unit 24 is recovered by the drain recovery unit 25. The hydrogen gas from which moisture has been recovered by the drain recovery unit 25 is returned to the first pipe 15 via the eighth pipe 23. In this way, the hydrogen gas discharged from the first adsorption column 11 during the regeneration process is cooled by the cooling unit 24 and then returned to the supply line 80.

[0063] The control device 70 executes the first program after a certain time has elapsed since executing the second program. Therefore, after the adsorption process, the adsorbent is regenerated in the regeneration process, and the adsorption process is executed again in the adsorption tube that contains the adsorbent. In this way, the adsorption process and the regeneration process are repeatedly executed alternately in the adsorption tube, whereby the adsorbent adsorbs moisture in the adsorption process, thereby producing dry gas.

[0064] As shown in Fig. 4, when the control device 70 receives a signal from the external control device 71 indicating that the drive of the single gas supply source A1 has been stopped, the control device 70 executes the third program. Then, when the control device 70 receives a signal from the external control device 71 indicating that preparations for starting the drive of the single gas supply source A1 are started, the control device 70 drives the pump 47, the heating unit 22, and the cooling unit 24. As a result, hydrogen gas circulates through the first pipe 15, the bypass pipe 45, the seventh pipe 21, the fourth pipe 18, the first adsorption column 11, the second pipe 16, and the eighth pipe 23 in this order. In this way, after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped, the hydrogen gas is circulated through the closed loop line 83 by the pump 47.

[0065] As a result, the moisture contained in the first adsorbent 13 in the first adsorption column 11 is desorbed by the high-temperature hydrogen gas heated by the heating section 22. The hydrogen gas discharged from the first adsorption column 11 is then cooled by the cooling section 24 and the moisture contained in the hydrogen gas is recovered by the drain recovery section 25, after which the high-temperature hydrogen gas heated again by the heating section 22 is supplied into the first adsorption column 11. In this manner, the first adsorbent 13 is regenerated.

[0066] [Effects of the embodiment] The above embodiment can provide the following effects. (1) The gas production apparatus 10 configures a closed loop line 83 through which hydrogen gas circulates in the order of the heating unit 22, the first adsorption column 11, and the cooling unit 24. The gas production apparatus 10 includes a pump 47 that circulates hydrogen gas through the closed loop line 83 after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped. According to this, after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped, the hydrogen gas is circulated through the closed loop line 83 by the pump 47. Therefore, the moisture contained in the first adsorbent 13 in the first adsorption column 11, which is the target for performing the regeneration process, is desorbed by the high-temperature hydrogen gas heated by the heating unit 22. Then, the hydrogen gas discharged from the first adsorption column 11 during the regeneration process is cooled by the cooling unit 24 to recover the moisture contained in the hydrogen gas, and the high-temperature hydrogen gas heated by the heating unit 22 is supplied again into the first adsorption column 11, which is the target for performing the regeneration process. In this way, even after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped, the first adsorbent 13 can be regenerated without supplying a gas other than hydrogen gas into the first adsorption column 11 for the purpose of regenerating the first adsorbent 13. Therefore, even if the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped for a long period of time, the moisture content of the first adsorbent 13 in the first adsorption column 11 is prevented from reaching an equilibrium state. Therefore, when the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is resumed, it is not difficult to sufficiently perform the adsorption process in the first adsorption column 11. As a result, the gas production efficiency can be improved.

[0067] (2) The pump 47 is driven immediately before the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is restarted after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped. According to this, hydrogen gas is circulated to the closed loop line 83 by the pump 47 immediately before the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is restarted. Therefore, for example, the power consumption of the pump 47 can be reduced compared to the case where the pump 47 is driven from immediately after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped until the supply of hydrogen gas is restarted. Also, for example, a case where the pump 47 is driven only immediately after the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is stopped is considered. In this case, even if the first adsorbent 13 is regenerated by the hydrogen gas circulating through the closed loop line 83, there is a risk that the moisture content of the first adsorbent 13 will return to an equilibrium state again before the supply of hydrogen gas from the single gas supply source A1 through the supply line 80 is restarted. Therefore, the pump 47 is configured to circulate hydrogen gas to the closed loop line 83 immediately before the supply of hydrogen gas from the single gas supply source A1 via the supply line 80 is restarted. This prevents the moisture content of the first adsorbent 13 from reaching an equilibrium state when the supply of hydrogen gas from the single gas supply source A1 via the supply line 80 is restarted. Therefore, when the supply of hydrogen gas from the single gas supply source A1 via the supply line 80 is restarted, it is not difficult to sufficiently perform the adsorption process in the first adsorption column 11. As a result, the gas production efficiency can be improved.

[0068] (3) After the pump 47 has been driven, when the difference between the temperature of the hydrogen gas supplied to the first adsorption column 11 and the temperature of the hydrogen gas discharged from the first adsorption column 11 becomes less than a preset predetermined temperature, the driving of the pump 47 is stopped. The difference between the temperature of the hydrogen gas supplied to the first adsorption column 11 and the temperature of the hydrogen gas discharged from the first adsorption column 11 is suitable for determining the progress of regeneration of the first adsorbent 13.

[0069] (4) The configuration of the gas production apparatus 10 of this embodiment is suitable for forming a closed loop line 83 in which hydrogen gas circulates through the heating section 22, the first adsorption column 11 which is the target for performing the regeneration process, and the cooling section 24 in that order.

[0070] (5) There is no need to supply a gas other than hydrogen gas into the first adsorption column 11 or the second adsorption column 12 for the purpose of regenerating the first adsorbent 13 or the second adsorbent 14. Therefore, there is no need to evacuate the first adsorption column 11 or the second adsorption column 12 after the regeneration process, which simplifies the gas production process.

[0071] (6) Since the hydrogen gas after the regeneration process is returned to the supply line 80, a portion of the hydrogen gas supplied from the single gas supply source A1 is not used solely for the purpose of the regeneration process and is not discharged to the outside. Therefore, the hydrogen gas supplied from the single gas supply source A1 can be efficiently supplied to the supply target as a dry gas.

[0072] [Example of change] The above embodiment can be modified as follows: The above embodiment and the following modifications can be combined with each other to the extent that no technical contradiction occurs.

[0073] In the embodiment, when the third program is executed, the control device 70 may configure a closed loop line 83 in which hydrogen gas circulates through the heating unit 22, the second adsorption tube 12, and the cooling unit 24 in that order. In this case, the first switching valve 31 is configured to be switchable to a first switching state in which the third port 31c and the fourth port 31d are connected to each other. Furthermore, the second switching valve 32 is configured to be switchable to a first switching state in which the second port 32b and the fourth port 32d are connected to each other. Then, when the third program is executed, the control device 70 sets the first switching valve 31 to the first switching state and the second switching valve 32 to the first switching state. In this case, the gas production device 10 includes a third temperature sensor configured to be capable of detecting the temperature of the hydrogen gas flowing through the first port 12a of the second adsorption tube 12, and a fourth temperature sensor configured to be capable of detecting the temperature of the hydrogen gas flowing through the second port 12b of the second adsorption tube 12. The control device 70 then determines whether the difference between the temperature detected by the third temperature sensor and the temperature detected by the fourth temperature sensor is less than a preset temperature, and stops driving the pump 47 when the difference between the temperature detected by the third temperature sensor and the temperature detected by the fourth temperature sensor is less than the preset temperature.

[0074] In the embodiment, the control device 70 may drive the pump 47 from immediately after the supply of hydrogen gas from the single gas supply source A1 via the supply line 80 is stopped until the supply of hydrogen gas is started again.

[0075] In the embodiment, the control device 70 may drive the pump 47 only immediately after the supply of hydrogen gas from the single gas supply source A1 via the supply line 80 is stopped. In the embodiment, the gas production apparatus 10 may include a flow sensor that detects the flow rate of hydrogen gas flowing through a portion of the first pipe 15 closer to the single gas supply source A1 than the third on / off valve 43. The control device 70 may then execute the third program when the flow rate of hydrogen gas detected by the flow sensor becomes equal to or lower than a predetermined flow rate.

[0076] In the embodiment, the third program may be executed when the pressure of the hydrogen gas detected by the pressure sensor 74 becomes equal to or lower than a predetermined pressure. In the embodiment, the third program does not need to stop driving the heating unit 22 and the cooling unit 24.

[0077] In the embodiment, the heating unit 22 does not have to be an electric heater, and may be, for example, a steam heater. In short, the heating unit 22 may have a configuration capable of heating the hydrogen gas flowing through the regeneration supply line 81.

[0078] In the embodiment, the cooling unit 24 does not have to be a water-cooled cooler, and may be, for example, an air-cooled cooler. In short, the cooling unit 24 may be configured to be capable of cooling the hydrogen gas flowing through the regeneration reflux line 82.

[0079] In the embodiment, for example, a humidity sensor may be provided in the first adsorption column 11. Then, in the third program, the control device 70 may be configured to stop driving the pump 47 when the humidity detected by the humidity sensor reaches a humidity threshold value determined in advance by an experiment or the like, thereby detecting the completion of the regeneration process.

[0080] In the embodiment, the gas production apparatus 10 may include a plurality of first adsorption columns 11 and a plurality of second adsorption columns 12. For example, the plurality of first adsorption columns 11 may be connected in parallel to one another, or the plurality of first adsorption columns 11 may be connected in series to one another. Similarly, for example, the plurality of second adsorption columns 12 may be connected in parallel to one another, or the plurality of second adsorption columns 12 may be connected in series to one another.

[0081] In the embodiment, the first switching valve 31, the second switching valve 32, the first on-off valve 41, the second on-off valve 42, and the third on-off valve 43 may be manually controlled rather than electrically controlled.

[0082] In the embodiment, the gas production device 10 may adsorb moisture contained in oxygen gas, which is a single gas, to produce a dry gas. In short, the single gas is not limited to hydrogen gas. [Explanation of symbols]

[0083] 10...gas production apparatus, 11...first adsorption column which is an adsorption column, 12...second adsorption column which is an adsorption column, 13...first adsorbent as an adsorbent, 14...second adsorbent as an adsorbent, 22...heating section, 24...cooling section, 41...first on / off valve, 42...second on / off valve, 43...third on / off valve, 47...pump, 80...supply line, 81...regeneration supply line, 82...regeneration reflux line, 83...closed loop line, 84...bypass line, A1...single gas supply source.

Claims

1. An adsorption cylinder that contains an adsorbent therein, an adsorption step of adsorbing moisture contained in a single gas supplied from a single gas supply source into the adsorption cylinder through a supply line with the adsorbent, and a regeneration step of desorbing moisture contained in the adsorbent after the adsorption step to regenerate the adsorbent, the adsorption step being repeated alternately in the adsorption cylinder, thereby producing a dry gas by adsorbing moisture with the adsorbent in the adsorption step; a plurality of adsorption cylinders are provided so that the adsorption step can be carried out in another adsorption cylinder until the adsorption step is carried out again in the adsorption cylinder containing the adsorbent after the adsorption step by regenerating the adsorbent in the regeneration step; In the gas production apparatus, in the regeneration step, a portion of the single gas flowing through the supply line is heated by a heating unit and then supplied into an adsorption column which is a target for carrying out the regeneration step, and the single gas discharged from the adsorption column during the regeneration step is cooled by a cooling unit to recover moisture contained in the single gas, and then the single gas is returned to the supply line, a gas production apparatus which configures a closed loop line through which a single gas circulates in the order of the heating section, the adsorption column which is the target for performing the regeneration process, and the cooling section, and which further comprises a pump which circulates the single gas through the closed loop line after the supply of the single gas from the single gas supply source via the supply line is stopped.

2. 2. The gas manufacturing apparatus according to claim 1, wherein the pump is driven after the supply of the single gas from the single gas supply source through the supply line is stopped and immediately before the supply of the single gas from the single gas supply source through the supply line is started again.

3. The gas manufacturing apparatus according to claim 1 or 2, characterized in that after the pump is driven, when the difference between the temperature of the single gas heated by the heating section in the closed loop line and supplied to the adsorption column that is the target of the regeneration process, and the temperature of the single gas discharged from the adsorption column becomes less than a predetermined temperature, the operation of the pump is stopped.

4. a regeneration supply line branching off from the supply line to supply a portion of the single gas flowing through the supply line into an adsorption column that is the target of the regeneration step; a regeneration reflux line for refluxing the single gas discharged from the adsorption column during the regeneration step to the supply line; The heating unit is provided in the regeneration supply line, The cooling section is provided in the regeneration reflux line, The regenerated supply line and the regenerated return line constitute a part of the closed loop line, a first on-off valve is provided in a portion of the supply line closer to the adsorption tube than a connection point between the supply line and the regeneration supply line and closer to the adsorption tube than a connection point between the supply line and the regeneration reflux line, The regeneration supply line is provided with a second on-off valve, a third on / off valve is provided in a portion of the supply line closer to the single gas supply source than a connection point between the supply line and the regeneration supply line; the closed loop line includes a bypass line that bypasses the second on / off valve, The pump is provided in the bypass line, 2. The gas manufacturing apparatus according to claim 1, wherein, when the supply of the single gas from the single gas supply source through the supply line is stopped, the first on-off valve, the second on-off valve, and the third on-off valve are closed to form the closed loop line.

5. an adsorption step of adsorbing moisture contained in a single gas supplied from a single gas supply source into the adsorption cylinder through a supply line with an adsorbent, and a regeneration step of desorbing moisture contained in the adsorbent after the adsorption step to regenerate the adsorbent, the adsorption step being repeated alternately in the adsorption cylinder, thereby producing a dry gas by adsorbing moisture with the adsorbent in the adsorption step; After the adsorption step, the adsorbent is regenerated in the regeneration step, and the adsorption step is carried out again in the adsorption tube containing the regenerated adsorbent therein. During this time, the adsorption step is carried out in another adsorption tube; In the regeneration step, a portion of the single gas flowing through the supply line is heated by a heating unit and then supplied into an adsorption column which is a target for carrying out the regeneration step, and the single gas discharged from the adsorption column during the regeneration step is cooled by a cooling unit and then returned to the supply line, a single gas supply line for supplying the single gas from the single gas supply source to the heating section, an adsorption column which is the target of the regeneration step, and a single gas supply line for supplying the single gas to the cooling section in that order, the single gas being circulated by driving a pump.

Images