Processor, lithography device, processing method, and article production method

Abstract

To provide a technology advantageous for determining, by a simple structure and an operation, whether a width of a pellicle frame of a reticle structure is less than the upper limit value or not.SOLUTION: A processing device for processing a structure having a reticle and a pellicle frame attached to a part of the reticle, includes: a drive mechanism that drives the structure in a thickness direction; a first photo-interrupter that has a first optical path and is arranged such that when the width of the pellicle frame is less than the upper limit during the driving of the structure by the drive mechanism, the pellicle frame does not pass through the first optical path, and when the width of the pellicle frame is equal to or greater than the upper limit, the pellicle frame passes through the first optical path; and a control unit that determines whether the width of the pellicle frame is below the upper limit based on the output of the first photo-interrupter during the driving of the structure by the drive mechanism.SELECTED DRAWING: Figure 1

Images