Flow division unit and liquid treatment system
Patent Information
- Application Number
- JP2023135034
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-08-22
- Publication Date
- 2025-03-07
AI Technical Summary
【0009】 本開示によれば、気泡を含みうる液を、気泡が低減された状態で送り出すのに有利である。
Smart Images

Figure 2025030059000001_ABST
Abstract
Description
[Technical field]
[0001] The present disclosure relates to a flow diversion unit and a liquid treatment system. [Background technology]
[0002] 2. Description of the Related Art There is known a system in which a processing liquid is circulated in a tank and a circulation line, and a required amount of the processing liquid is supplied from the circulation line to a processing unit (see Patent Documents 1 and 2). [Prior art documents] [Patent documents]
[0003] [Patent Document 1] Patent Publication No. 2022-3666 [Patent Document 2] International Publication No. 2022 / 009661 Summary of the Invention [Problem to be solved by the invention]
[0004] In a system in which a processing liquid is circulated, gas dissolved in the processing liquid may appear in the processing liquid in the tank in the form of gas bubbles.
[0005] Air bubbles in the treatment liquid tend to grow larger when passing through a portion where the liquid flow is disturbed, such as a step portion, etc. Therefore, even if the air bubbles in the treatment liquid are relatively small in size inside the tank, they may grow larger when moving from the tank to the circulation line or when passing through a pump provided in the circulation line.
[0006] When the processing liquid flows through the circulation line together with large-sized bubbles (for example, by sucking in the large-sized bubbles with a pump) and is supplied to the processing unit, the particle count can suddenly increase. Even if the bubbles are small, if the number of bubbles increases, the particle count tends to increase.
[0007] The present disclosure provides an advantageous technique for delivering liquid that may contain air bubbles in a state in which the air bubbles are reduced. [Means for solving the problem]
[0008] One aspect of the present disclosure relates to a diversion unit comprising a diversion main body having a guide flow path, an inlet portion that guides liquid to the guide flow path, and first and second outlet portions that cause the liquid to flow out from the guide flow path to the outside, wherein the first outlet portion is located above the second outlet portion, and when air bubbles are present in the liquid in the guide flow path, the volume of the air bubbles that flow out together with the liquid through the second outlet portion is smaller than the volume of the air bubbles that flow out together with the liquid through the first outlet portion. Effect of the Invention
[0009] The present disclosure is advantageous in that liquid that may contain air bubbles can be delivered in a state in which the air bubbles are reduced. [Brief description of the drawings]
[0010] [Figure 1] FIG. 1 is a schematic diagram illustrating an example of a liquid processing system. [Diagram 2] FIG. 2 is a partial cross-sectional view showing an outline of an example of a processing unit. [Diagram 3] FIG. 3 is a diagram showing a schematic configuration of an example of a liquid processing system not equipped with a flow dividing unit effective for reducing air bubbles in the processing liquid, and mainly shows a configuration for circulating the processing liquid. [Figure 4] FIG. 4 is a schematic diagram showing an example of the state of air bubbles in the treatment liquid in the circulation line shown in FIG. [Diagram 5] FIG. 5 is a diagram showing a schematic configuration of an example of a liquid processing system having a flow dividing unit effective for reducing air bubbles in the processing liquid, and mainly shows a circulation configuration of the processing liquid. [Figure 6] FIG. 6 is a cross-sectional view showing an example of a flow dividing unit. [Figure 7] FIG. 7 is a diagram for explaining the gas-liquid separation action of the flow dividing unit (particularly the guide partition and shoulder portion), and shows an example of the state of air bubbles in the treatment liquid in the vicinity of the guide partition and shoulder portion. [Figure 8] FIG. 8 is a diagram for explaining the gas-liquid separation action of the flow dividing unit (particularly the guide partition and shoulder portion), and shows an example of the state of air bubbles in the treatment liquid in the vicinity of the guide partition and shoulder portion. [Figure 9] FIG. 9 is a diagram for explaining the gas-liquid separation action of the flow dividing unit (particularly the guide partition and shoulder portion), and shows an example of the state of air bubbles in the treatment liquid in the vicinity of the guide partition and shoulder portion. [Figure 10] FIG. 10 is a diagram for explaining the gas-liquid separation action of the flow dividing unit (particularly the guide partition and shoulder portion), and shows an example of the state of air bubbles in the treatment liquid in the vicinity of the guide partition and shoulder portion. [Figure 11] FIG. 11 is an enlarged cross-sectional view of an example of a flow dividing unit according to the first modified example. [Figure 12] FIG. 12 is a perspective view showing another example of the flow dividing unit according to the first modified example, in which the flow dividing unit is cut in half. [Figure 13] FIG. 13 is an enlarged cross-sectional view of an example of a flow dividing unit according to the second modified example. [Figure 14] FIG. 14 is an enlarged cross-sectional view of another example of the flow dividing unit according to the second modified example. [Figure 15] FIG. 15 is a diagram illustrating an example of a configuration of a liquid processing system according to a third modified example, and mainly illustrates a configuration for circulating a processing liquid. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0011] Exemplary embodiments of the present disclosure will be described with reference to the drawings. The shapes and sizes of the elements shown in the drawings do not necessarily correspond to the shapes and sizes of the actual objects, and the positional relationship and dimensional ratios between the elements do not necessarily correspond to the positional relationship and dimensional ratios between the elements. Furthermore, the positional relationship and dimensional ratios between the elements do not necessarily correspond between the drawings.
[0012] In the following description, the X, Y, and Z directions are mutually perpendicular, the X and Y directions are horizontal directions, and the Z direction is a height direction (vertical direction) perpendicular to the horizontal direction. Therefore, the horizontal direction perpendicular to the height direction (Z direction) is the direction in which the XY plane (horizontal plane) extends.
[0013] FIG. 1 is a schematic diagram showing an example of a liquid treatment system 80. As shown in FIG.
[0014] 1 includes a loading / unloading station 91 and a processing station 92. The loading / unloading station 91 includes a placement section 81 having a plurality of carriers C, and a transport section 82 in which a first transport mechanism 83 and an exchange section 84 are provided. Each carrier C accommodates a plurality of substrates W in a horizontal state. The substrates W are typically semiconductor wafers, but are not limited to such. The processing station 92 includes a plurality of processing units 90 installed on both sides of a transport path 86, and a second transport mechanism 85 that reciprocates along the transport path 86.
[0015] The substrate W is taken out of the carrier C by the first transport mechanism 83 and placed on the delivery section 84, and is taken out of the delivery section 84 by the second transport mechanism 85. The substrate W is then carried into the corresponding processing unit 90 by the second transport mechanism 85, and a predetermined process is performed in the corresponding processing unit 90. Thereafter, the substrate W is taken out of the corresponding processing unit 90 by the second transport mechanism 85 and placed on the delivery section 84, and then returned to the carrier C of the receiver 81 by the first transport mechanism 83. Note that the substrate W may be returned to the carrier C after being processed in two or more processing units 90.
[0016] In the above-described liquid processing system 80, two or more of the multiple processing units 90 may have the same configuration as each other, or may have different configurations as each other, and may perform the same processing as each other, or may perform different processing as each other. Each processing unit 90 can perform various processing on the substrate W by applying various processing fluids (e.g., processing liquids such as chemical liquids, rinsing liquids, and cleaning liquids) to the substrate W. The processing fluids (processing liquids) that can be used in each processing unit 90 are not limited, and may contain components that change the surface properties of the substrate W, or may be pure water (DIW (De-Ionized Water)).
[0017] Liquid processing system 80 includes a control unit 93. Control unit 93 is configured, for example, by a computer, and includes an arithmetic processing unit and a memory unit. The memory unit of control unit 93 stores programs and data for various processes performed in liquid processing system 80. The arithmetic processing unit of control unit 93 appropriately reads out and executes the programs stored in the memory unit, thereby controlling various mechanisms of liquid processing system 80 and performing various processes.
[0018] The programs and data stored in the storage unit of the control unit 93 may be those recorded in a computer-readable storage medium and installed into the storage unit from the storage medium. Examples of computer-readable storage media include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), and a memory card.
[0019] FIG. 2 is a partial cross-sectional view showing an outline of an example of the processing unit 90. As shown in FIG.
[0020] The processing unit 90 shown in FIG. 2 includes a chamber 70, a substrate holding mechanism 71, a processing liquid supply unit 72, and a collection cup 73.
[0021] A substrate holding mechanism 71, a processing liquid supply unit 72, and a recovery cup 73 are disposed inside the chamber 70. An FFU (Fan Filter Unit) 74 that forms a downflow air current in the chamber 70 is provided on the ceiling of the chamber 70. The substrate holding mechanism 71 includes a holding unit 75, a support unit 76, and a drive unit 77. The holding unit 75 holds the substrate W horizontally. The support unit 76 extends vertically, and the base end (lower end in FIG. 2) of the support unit 76 is supported by the drive unit 77, and the tip end (upper end in FIG. 2) of the support unit 76 supports the holding unit 75 horizontally. The drive unit 77 rotates the support unit 76 (and thus the holding unit 75) around a vertical axis passing through the center of the support unit 76 (and thus the holding unit 75). By rotating the holding unit 75 together with the support unit 76 in this manner, the substrate W (see FIG. 1) held by the holding unit 75 is also rotated.
[0022] The processing liquid supply unit 72 supplies a processing liquid to the substrate W held in the holder 75. The processing liquid supply unit 72 includes a plurality of nozzles, and is connected to the liquid supply system 10. Each nozzle ejects the processing liquid supplied from the liquid supply system 10 onto the substrate W. For example, the plurality of nozzles are provided so as to correspond to each of the plurality of types of processing liquid supplied from the liquid supply system 10.
[0023] Recovery cup 73 is disposed to surround holder 75, and collects the processing liquid scattered from substrate W. A drainage port 78 is formed in the bottom of recovery cup 73, and the processing liquid collected by recovery cup 73 is discharged to the outside of processing unit 90 via drainage port 78. In addition, an exhaust port 79 is formed in the bottom of recovery cup 73, and gas (downflow) supplied from FFU 74 is discharged to the outside of processing unit 90 via exhaust port 79.
[0024] [Liquid supply system] Next, the liquid supply system 10 for supplying the processing liquid to the processing liquid supply part 72 of the processing unit 90 will be described.
[0025] FIG. 3 is a schematic diagram showing the configuration of an example of a liquid processing system 80 that does not have a diversion unit (see reference numeral 15 in FIGS. 5 and 6) described below, which is effective in reducing air bubbles B in the processing liquid L, and mainly shows the circulation configuration of the processing liquid L.
[0026] 3, liquid supply system 10 has tank 11 and a circulation line 20 connected to tank 11. Processing liquid L is stored in a storage space Ts of tank 11. Circulation line 20 is provided with a circulation pump 25 that pumps out processing liquid L. When circulation pump 25 is driven under the control of control unit 93, processing liquid L flows out of tank 11 through one end of circulation line 20 and is returned to tank 11 through circulation line 20.
[0027] The circulation line 20 extends through the liquid supply system 10 and the processing units 90. The circulation line 20 in the example shown in Fig. 3 is provided so as to be shared by the multiple processing units 90. A plurality of supply lines 87 branching off from the circulation line 20 are each connected to the processing liquid supply parts 72 of the multiple processing units 90, and the processing liquid L is supplied to each processing liquid supply part 72 from the circulation line 20 via the supply line 87.
[0028] Fig. 3 shows a circulation configuration for a single type of processing liquid L. When multiple types of processing liquid are discharged from each processing liquid supply unit 72, a circulation configuration for the processing liquid L as shown in Fig. 3 may be provided for each processing liquid. In this case, circulation lines of multiple circulation configurations are connected to each processing liquid supply unit 72, and multiple types of processing liquid are supplied to each processing liquid supply unit 72 from each of the circulation lines of the multiple circulation configurations.
[0029] Fig. 4 is a schematic diagram showing an example of the state of air bubbles B in the treatment liquid L in the circulation line 20 shown in Fig. 3 (particularly, the portion between the tank 11 and the circulation pump 25; see reference symbol "IV" in Fig. 3). (a) to (e) of Fig. 4 show, in this order, example states of air bubbles B in the treatment liquid L in the circulation line 20 over time.
[0030] 4(a) to (e), in the liquid supply system 10 of FIG. 3, which is not provided with a flow dividing unit (described later) that functions as a gas-liquid separation mechanism, the processing liquid L continues to flow out of the tank 11 into the circulation line 20 together with the air bubbles B without reducing the amount of the air bubbles B contained therein. Therefore, as shown in FIG. 4(a) to (e), the number and total volume of the air bubbles B in the processing liquid L in the circulation line 20 do not change significantly over time, and as a result, the air bubbles B having a large diameter that have grown in the processing liquid L may be supplied to the processing unit 90.
[0031] FIG. 5 is a diagram showing a schematic configuration of an example of a liquid processing system 80 having a flow dividing unit 15 effective for reducing air bubbles B in the processing liquid L, and mainly shows a circulation configuration of the processing liquid L.
[0032] The liquid treatment system 80 shown in Figure 5 comprises a tank 11, a diversion unit 15 connected to the tank 11 via an inlet line 19, and a first circulation line 21 and a second circulation line 22 connected to the diversion unit 15 and the tank 11.
[0033] The tank 11 is a liquid storage section to which a first circulation line 21 and a second circulation line 22, which are provided in parallel, are connected, and is connected to a diversion unit 15 (particularly an "inlet section" described below; see reference numeral "40" in FIG. 6) via an inlet line 19. The tank 11 may be a main tank that is not supplied with the processing liquid L from other tanks, or may be a sub-tank / buffer tank to which the processing liquid L is supplied from other tanks (such as the main tank).
[0034] The treatment liquid L is stored in the storage space Ts defined by the internal space of the tank 11. The inflow line 19 opens to a portion of the storage space Ts where the treatment liquid L is stored (e.g., at the bottom). Meanwhile, the first circulation line 21 and the second circulation line 22 open to a space above the stored liquid (treatment liquid L) in the storage space Ts (e.g., at the ceiling).
[0035] The treatment liquid L returned to the tank 11 via the first circulation line 21 and the second circulation line 22 may be returned to the storage space Ts, for example, by flowing along the inner wall surface of the tank 11 that defines the storage space Ts.
[0036] Gas is dissolved in the processing liquid L stored in the storage space Ts, and some of the gas in the processing liquid L is released from the processing liquid L while the processing liquid L is stored in the tank 11, while another portion of the gas continues to remain in the processing liquid L in the form of bubbles.
[0037] The treatment liquid L is supplied to the diversion unit 15 from the tank 11 via an inflow line 19. If the inflow line 19 has a step or a bend, air bubbles in the treatment liquid L may grow large when the treatment liquid L flowing through the inflow line 19 passes through such a step or bend.
[0038] The flow dividing unit 15 divides the treatment liquid L supplied via the inlet line 19 into the treatment liquid L to be sent to the first circulation line 21 and the treatment liquid L to be sent to the second circulation line 22.
[0039] In particular, the diversion unit 15 of this embodiment diverts the treatment liquid L so that the volume of the bubbles B flowing out together with the treatment liquid L via the second circulation line 22 is smaller than the volume of the bubbles B flowing out together with the treatment liquid L via the first circulation line 21.
[0040] A configuration example of the diversion unit 15 will be described later (see Figure 6), but the treatment liquid L is guided to an internal flow path (guide flow path) within the diversion unit 15 via the inlet, and the treatment liquid L flows out from the guide flow path via the first outlet and the second outlet into each of the first circulation line 21 and the second circulation line 22.
[0041] The first circulation line 21 is connected to the diversion unit 15 (particularly the "first outflow section" described below; see reference numeral "41" in FIG. 6) and the tank 11, and is provided with a liquid delivery device 28 that delivers the treatment liquid L in the first circulation line 21 from the diversion unit 15 to the tank 11. The specific configuration of the liquid delivery device 28 is not limited, and the liquid delivery device 28 can be configured by, for example, a pump or an ejector.
[0042] In the example shown in Figure 5, all of the treatment liquid L that flows out from the diversion unit 15 to the first circulation line 21 is returned to the tank 11, but it is sufficient that at least a portion of the treatment liquid L that flows out to the first circulation line 21 is returned to the tank 11.
[0043] The treatment liquid L returned to the tank 11 via the first circulation line 21 is discharged above the treatment liquid L stored in the storage space Ts of the tank 11. This promotes the release (degassing) of air bubbles B from the treatment liquid L, and the air bubbles B in the treatment liquid L can be reduced.
[0044] The second circulation line 22 is connected to the diversion unit 15 (particularly the "second outlet section" described below; see reference numeral "42" in Figure 6), and is provided with a circulation pump (liquid delivery device) 25 that sends the treatment liquid L in the second circulation line 22 downstream.
[0045] The second circulation line 22 extends through the liquid supply system 10 and the processing units 90, and the processing liquid L is supplied from the second circulation line 22 to the processing units 90 that perform processing using the processing liquid L. The second circulation line 22 in this example is provided so as to be shared by the multiple processing units 90. Each of the multiple supply lines 87 branching off from the second circulation line 22 is connected to the processing liquid supply parts 72 of the multiple processing units 90, and the processing liquid L is supplied to each processing liquid supply part 72 from the second circulation line 22 via the supply line 87.
[0046] Fig. 5 shows a circulation configuration for a single type of processing liquid L. When multiple types of processing liquids are discharged from the processing liquid supply part 72 of the processing unit 90, a circulation configuration for the processing liquid L as shown in Fig. 5 may be provided for each of the processing liquids. In this case, circulation lines of multiple circulation configurations are connected to each processing liquid supply part 72, and multiple types of processing liquids are supplied to each processing liquid supply part 72 from each of the circulation lines of the multiple circulation configurations.
[0047] Of the processing liquid L that flows out from the diversion unit 15 to the second circulation line 22, at least a portion of the processing liquid L that is not supplied to the processing liquid supply section 72 of the processing unit 90 is returned to the tank 11 through the second circulation line 22.
[0048] According to the liquid processing system 80 shown in FIG. 5 described above, the flow dividing unit 15 can send the processing liquid L with reduced air bubbles B to the second circulation line 22 leading to the processing unit 90.
[0049] On the other hand, the treatment liquid L in which the amount of bubbles B has been increased by the diversion unit 15 is sent to the first circulation line 21 that is not connected to the treatment unit 90, and is finally returned to the tank 11. At least a part of the dissolved gas in the treatment liquid L returned to the tank 11 via the first circulation line 21 is released into the upper space in the storage space Ts under the release of pressure in the tank 11. The treatment liquid L in which the amount of dissolved gas has been reduced in the tank 11 is sent again to the diversion unit 15 via the inlet line 19.
[0050] [Diversion unit 15] Next, the flow dividing unit 15 included in the liquid supply system 10 will be described.
[0051] FIG. 6 is a cross-sectional view showing an example of the flow dividing unit 15. As shown in FIG.
[0052] 6 includes a diversion main body 30 having a guide flow path R, an inlet 40 that guides the treatment liquid L to the guide flow path R, and a first outlet 41 and a second outlet 42 that cause the treatment liquid L to flow out from the guide flow path R. The first outlet 41 is located above the second outlet 42.
[0053] The guide flow path R includes an inflow guide path R0 into which the treatment liquid L flows from the inflow section 40, a first outflow guide path R1 located between the inflow guide path R0 and the first outflow section 41, and a second outflow guide path R2 located between the inflow guide path R0 and the second outflow section 42.
[0054] The inlet guide path R0 extends in a height direction (Z direction; first direction). The first outlet guide path R1 and the second outlet guide path R2 are positioned offset from the inlet guide path R0 in a horizontal direction (second direction) perpendicular to the height direction. The treatment liquid L is guided in the height direction (particularly upward) in the inlet guide path R0, and then guided in the horizontal direction to flow into the first outlet guide path R1 or the second outlet guide path R2.
[0055] 6, the inflow section 40 is connected to the inflow guide path R0 of the guide flow path R at the side wall section 32 of the diversion main body section 30, and directs the flow of the treatment liquid L supplied from the inflow line 19 so as to discharge the treatment liquid L into the inflow guide path R0 toward the guide partition section 31. The first outlet section 41 is connected to the first outlet guide path R1 including the top of the guide flow path R at the ceiling wall section 33 of the diversion main body section 30. The second outlet section 42 is connected to the second outlet guide path R2 including the bottom of the guide flow path R at the bottom wall section 34 of the diversion main body section 30.
[0056] The flow dividing body 30 has a guide section 31 , a shoulder section 35 and a tapered section 36 .
[0057] The guide partition portion 31 extends in the height direction (Z direction) and defines at least a part of the inlet guide path R0.
[0058] 6 extends from the bottom wall 34 toward the ceiling wall 33, and forms a connecting guide path Rc between the guide path R and the ceiling wall 33, through which the treatment liquid L can flow. At least a part of the inflow guide path R0 is formed by the space of the guide flow path R outside the guide partition 31. Meanwhile, at least a part of the second outflow guide path R2 is formed by the space of the guide flow path R inside the guide partition 31.
[0059] Furthermore, at least a part of the first outflow guide path R1 (including at least a part of the space partitioned by the tapered portion 36) is formed by the space inside the guide partition portion 31 and the space facing the upward direction (the direction from the bottom wall portion 34 toward the ceiling wall portion 33) of the guide flow path R.
[0060] In this manner, at least a portion of the inlet guide path R0 and at least a portion of the second outlet guide path R2 are separated by the guide partition 31. The guide partition 31 shown in Fig. 6 has a circular ring shape in a plan view from above, and the portion of the inlet guide path R0 and the portion of the second outlet guide path R2 partitioned by the guide partition 31 are arranged concentrically.
[0061] The shoulder portion 35 defines a part of the inlet guide passage R0 and forms a shoulder surface Ss extending in a direction perpendicular to the height direction (i.e., horizontal direction). The tapered portion 36 defines at least a part of the first outlet guide passage R1 and forms a tapered surface St whose diameter (i.e., horizontal size) gradually decreases toward the first outlet portion 41. The shoulder surface Ss and the tapered surface St are connected to each other. In the example shown in FIG. 6, the shoulder surface Ss and the tapered surface St are directly connected to each other, but they may be indirectly connected via another surface (not shown).
[0062] The processing liquid L may be guided in a swirling flow toward the first outlet portion 41 in at least a portion of the first outlet guide path R1 (e.g., a portion defined by the tapered surface St). Such a swirling flow of the processing liquid L can be created in any manner. For example, by devising the structure of the guide flow path R (e.g., the structure of the inlet guide path R0 and the first outlet guide path R1) or the shape and state of the surface defining the first outlet guide path R1, it is possible to create a swirling flow of the processing liquid L in the portion of the first outlet guide path R1 defined by the tapered surface St.
[0063] In the flow dividing unit 15 having the above-mentioned configuration, the portion of the second outflow guide path R2 partitioned by the guide partition portion 31 has a larger horizontal cross-sectional area than the portion of the inflow guide path R0 partitioned by the guide partition portion 31. Therefore, the downward movement speed (descending speed) of the treatment liquid L in the second outflow guide path R2 is slower than the upward movement speed (ascending speed) of the treatment liquid L in the inflow guide path R0. This makes it possible to effectively prevent the air bubbles B, which are subjected to buoyancy in the upward direction in the treatment liquid L, from flowing out to the second circulation line 22 via the second outflow guide path R2.
[0064] In order to suppress the outflow of the bubbles B into the second circulation line 22 via the second outflow guide path R2, it is preferable that the descending speed of the processing liquid L in the second outflow guide path R2 is as slow as possible. On the other hand, it is necessary to cause a desired amount or more of the processing liquid L (for example, a flow rate of the processing liquid L that needs to be supplied to one or more processing units 90 connected to the second circulation line 22) to flow from the second outflow guide path R2 into the second circulation line 22.
[0065] Moreover, larger diameter air bubbles B are more likely to induce particles than smaller diameter air bubbles B. Therefore, in order to suppress the increase in particles, it is effective to prevent the larger diameter air bubbles B from flowing out through the second outflow guide path R2 into the second circulation line 22. By effectively preventing the air bubbles B from flowing out through the second outflow guide path R2 into the second circulation line 22 and flowing into the circulation pump (liquid delivery device) 25, the increase in particles can be effectively suppressed.
[0066] Furthermore, the larger the diameter of the air bubbles B, the greater the buoyancy force that the air bubbles B are subjected to, making it more difficult for the air bubbles B to descend and therefore more difficult for the air bubbles B to flow out into the second circulation line 22 via the second outflow guide path R2.
[0067] Taking all these factors into consideration, in order to prevent air bubbles B having a diameter of approximately 5 mm or more from flowing out into the second circulation line 22 via the second outflow guide path R2, the treatment liquid L may be caused to flow downward in the second outflow guide path R2 at a speed slower than, for example, 0.0006 m / sec.
[0068] 6 described above, when air bubbles B are present in the treatment liquid L in the guide flow path R, the volume of the air bubbles B flowing out together with the treatment liquid L via the second outlet portion 42 is smaller than the volume of the air bubbles B flowing out together with the treatment liquid L via the first outlet portion 41. Also, the number of air bubbles B flowing out together with the treatment liquid L via the second outlet portion 42 tends to be smaller than the number of air bubbles B flowing out together with the treatment liquid L via the first outlet portion 41.
[0069] In this way, the diversion unit 15 guides a part of the processing liquid L supplied from the tank 11 via the inflow line 19 to the second circulation line 22 via the second outflow part 42 with the amount of bubbles contained therein reduced. This effectively prevents the operation of the circulation pump 25 provided in the second circulation line 22 from being disturbed by the bubbles B, and increases the operational stability of the circulation pump 25. In addition, since the processing liquid L with reduced bubbles B is supplied to each processing unit 90 to which the processing liquid L is supplied from the second circulation line 22, the generation of particles is prevented, and high-quality processing using the processing liquid L can be performed.
[0070] The flow rate of the treatment liquid L flowing out from the guide flow path R to the outside (first circulation line 21) through the first outlet 41 may be less than the flow rate of the treatment liquid L flowing out from the guide flow path R to the outside (second circulation line 22) through the second outlet 42. In this case, air bubbles B in the treatment liquid L can be effectively prevented from flowing out to the second circulation line 22 through the second outlet 42.
[0071] In addition, in the flow dividing unit 15, by forcing the processing liquid L to flow forcefully toward the guide partition 31 and the shoulder portion 35, the flow of the processing liquid L is disturbed, and gas (air bubbles B) can be effectively separated from the processing liquid L.
[0072] 7 to 10 are diagrams illustrating the gas-liquid separation action of the diversion unit 15 (particularly the guide partition 31 and shoulder portion 35), and in this order show examples of the state of air bubbles B in the treatment liquid L near the guide partition 31 and shoulder portion 35 over time. In Fig. 7 to Fig. 10, (a) shows an enlarged cross-sectional view of the diversion unit 15 shown in Fig. 6, and (b) shows an enlarged cross-sectional view of the second circulation line 22 (particularly the area between the diversion unit 15 and the circulation pump 25 (see Fig. 5)).
[0073] 7(a) and (b) show a state in which the treatment liquid L is filled in the diversion unit 15 and the second circulation line 22, but is stagnant without being flowed downstream. As shown in FIG. 7(a) and (b), while the treatment liquid L is not flowing, the treatment liquid L in the diversion unit 15 uniformly contains air bubbles B, and the treatment liquid L in the second circulation line 22 can also uniformly contain air bubbles B.
[0074] 8 to 10 (a) and (b) show a state in which the treatment liquid L filled in the flow-diversion unit 15 and the second circulation line 22 is flowing downstream. At the beginning of the flow, the treatment liquid L in the flow-diversion unit 15 flows downstream in a state in which it uniformly contains air bubbles B having a relatively small diameter, as shown in FIG. 8 (a). As the treatment liquid L in the flow-diversion unit 15 continues to flow downstream, the air bubbles B in the treatment liquid L gradually combine with each other, and the air bubbles B grow to have a large volume, as shown in FIG. 9 and FIG. 10 (a).
[0075] The growth of such bubbles B is likely to proceed under conditions in which the flow of the processing liquid L is disturbed and contact between the bubbles B is promoted, and therefore the merging and growth of the bubbles B is likely to be promoted particularly in the vicinity of the guide partition 31 and the shoulder portion 35.
[0076] In particular, relatively large bubbles B that are subjected to a relatively large buoyancy tend to remain on the shoulder surface Ss extending in the horizontal direction. The bubbles B that remain on the shoulder surface Ss grow further and become larger in size as they collide with and combine with further subsequent bubbles B. Then, the bubbles B that have grown to a certain size on the shoulder surface Ss are moved from the shoulder surface Ss by the subsequent processing liquid L flowing downstream, and move downstream through the connecting guide path Rc.
[0077] The air bubbles B moving downstream in this manner are subjected to a large buoyancy force according to their size (volume), and therefore tend to move toward the first outflow portion 41 through the first outflow guide path R1 located above.
[0078] In particular, in the flow dividing unit 15 shown in Figures 6 to 10, the tapered surface St extends obliquely upward from the end of the shoulder surface Ss. Therefore, the air bubbles B can move smoothly from the shoulder surface Ss to the tapered surface St, and are guided by the tapered surface St toward the first outflow portion 41, facilitating the outflow from the first circulation line 21. As a result, the air bubbles B can be more effectively prevented from outflowing to the second circulation line 22 via the second outflow guide path R2 and the second outflow portion 42 (see Figures 8 to 10(b)).
[0079] [First Modification] Fig. 11 shows an enlarged cross-sectional view of an example of the flow distribution unit 15 according to the first modified example. In Fig. 11, elements that are the same as or correspond to elements of the flow distribution unit 15 shown in Figs. 6 to 10 described above are denoted by the same reference numerals, and detailed description thereof will be omitted.
[0080] The flow dividing body 30 may have a protrusion 50 that protrudes downward from an inner wall surface of the flow dividing body 30 that defines at least one of the inflow guide path R0 and the first outflow guide path R1.
[0081] 11, a protrusion 50 with a triangular cross section is provided on the shoulder portion 35 of the flow dividing body 30 at a position facing the guide partition portion 31 in the height direction (Z direction). The provision of such a protrusion 50 can promote the retention and growth of bubbles B in the treatment liquid L, and is advantageous in applying a larger buoyancy force to the bubbles B.
[0082] The air bubble B that has grown to a certain size on the shoulder surface Ss is moved downstream by the subsequent processing liquid L flowing downstream, as shown by the dotted line in Figure 11, from the shoulder surface Ss through the connecting guide path Rc, overcoming the protrusion 50, and moves downstream.
[0083] The protrusion 50 is not limited to the example shown in FIG.
[0084] FIG. 12 is a perspective view showing another example of the flow dividing unit 15 according to the first modified example, in which the flow dividing unit 15 is cut in half.
[0085] The protrusion 50 does not necessarily have to face the guide partition 31 in the height direction (Z direction). For example, as shown in Fig. 12, the protrusion 50 may be provided at a position farther from the first outlet portion 41 in the horizontal direction than the guide partition 31. Alternatively, the protrusion 50 may be provided at a position closer to the first outlet portion 41 in the horizontal direction than the guide partition 31.
[0086] Furthermore, a protrusion 50 may be provided on the tapered surface St that defines at least a portion of the inlet guide path R0 and / or the first outlet guide path R1.
[0087] Furthermore, the protrusions 50 may have a cross-sectional shape other than a triangle, and may have a symmetrical cross-sectional shape or an asymmetrical cross-sectional shape.
[0088] [Second modified example] Fig. 13 shows an enlarged cross-sectional view of one example of flow distribution unit 15 according to the second modified example. Fig. 14 shows an enlarged cross-sectional view of another example of flow distribution unit 15 according to the second modified example. In Figs. 13 and 14, elements that are the same as or correspond to elements of flow distribution unit 15 shown in Figs. 6 to 10 described above are denoted by the same reference numerals, and detailed description thereof will be omitted.
[0089] The flow dividing body portion 30 may have a first divided body portion 30A and a second divided body portion 30B that are separably attached to each other.
[0090] 13, the ceiling wall 33 of the flow distribution main body 30 may be provided so as to be separable from the side wall 32 and the bottom wall 34. Alternatively, as shown in FIG. 14, the bottom wall 34 of the flow distribution main body 30 may be provided so as to be separable from the side wall 32 and the ceiling wall 33.
[0091] The body connecting portion 30C that detachably fixes the first divided body portion 30A and the second divided body portion 30B to each other is not limited. Such a body connecting portion 30C may be, for example, a fastener having a threaded portion, or a fastener that utilizes a recessed and protruding fit other than a thread. The body connecting portion 30C may be provided as a part of the first divided body portion 30A and the second divided body portion 30B, or may include a member separate from the first divided body portion 30A and the second divided body portion 30B.
[0092] Alternatively, the flow distribution body 30 may include three or more divided body portions that are detachably attached to one another.
[0093] Since the diversion main body 30 of the diversion unit 15 has a separable structure as in this modified example, maintenance of the diversion unit 15 can be easily performed, which is convenient, for example, for cleaning the inner wall surface of the diversion main body 30 or for replacing the divided main body parts.
[0094] In addition, the characteristics such as the constituent material can be changed for each divided main body part. For example, only the divided main body part including the ceiling wall part 33 (first divided main body part 30A in Figs. 13 and 14) may be made of a transparent material (e.g., transparent resin or quartz). In this case, the side wall part 32 and / or the bottom wall part 34 can have a structure (constituent material, etc.) with excellent strength, and the state of the bubbles B in the guide flow path R in the flow division main body part 30 can be visually confirmed through the ceiling wall part 33.
[0095] It is also possible to prepare multiple types of divided main body parts with different structures for a specific divided main body part, and select and use the most suitable type of divided main body part depending on the usage situation. For example, for a divided main body part including the bottom wall part 34 (the second divided main body part 30B in Figs. 13 and 14), divided main body parts with different horizontal cross-sectional area ratios / volume ratios of the inflow guide path R0 and the second outflow guide path R2 partitioned by the guide partition part 31 may be prepared. In this case, it is possible to use the divided main body part with the most suitable cross-sectional area ratio / volume ratio depending on the situation.
[0096] [Third Modification] Fig. 15 is a diagram illustrating the configuration of an example of a liquid processing system 80 according to a third modified example, and mainly illustrates a configuration for circulating the processing liquid L. In Fig. 15, elements that are the same as or correspond to elements of the liquid processing system 80 illustrated in Fig. 5 described above are denoted by the same reference numerals, and detailed descriptions thereof will be omitted.
[0097] In one circulation configuration, a plurality of diversion units 15 that cause the treatment liquid L with reduced air bubbles B to flow out through the second outlet 42 to the second circulation line 22 may be provided.
[0098] In the example shown in FIG. 15, a first diversion unit 15A and a second diversion unit 15B are provided in series.
[0099] An inflow line 19 is connected to the first diversion unit 15A, and causes the treatment liquid L supplied from the tank 11 via the inflow line 19 to flow out to the first circulation line 21 and the second circulation line 22.
[0100] The second diversion unit 15B is provided at a location on the second circulation line 22 between the first diversion unit 15A and the circulation pump 25, and directs the treatment liquid L supplied from an upstream location on the second circulation line 22 to the first circulation line 21 and the second circulation line 22 (particularly the downstream location).
[0101] Each of the first diversion unit 15A and the second diversion unit 15B can have a configuration similar to that of the above-mentioned diversion unit 15 (see FIGS. 6 to 14). That is, in the first and second diversion units 15A and 15B, the volume of the air bubbles B discharged together with the treatment liquid L into the second circulation line 22 via the second outlet 42 is smaller than the volume of the air bubbles B discharged together with the treatment liquid L into the first circulation line 21 via the first outlet 41.
[0102] As shown in FIG. 15, by providing a plurality of dividing units 15A, 15B, the processing liquid L in which the air bubbles B have been more effectively reduced can be supplied to the processing liquid supply portion 72 of each processing unit 90.
[0103] [Other variations] The specific configuration of the guide passage R in the diverter unit 15 (the first diverter unit 15A and the second diverter unit 15B) is not limited. In the above example (FIG. 6, etc.), at least a part of the first outlet guide passage R1 is defined by the tapered surface St, but at least a part of the inlet guide passage R0 and / or the second outlet guide passage R2 may be defined by a tapered surface.
[0104] It should be noted that the embodiments and modifications disclosed in this specification are merely illustrative and should not be construed as limiting in all respects. The above-mentioned embodiments and modifications can be omitted, substituted, and modified in various forms without departing from the scope and spirit of the appended claims. For example, the above-mentioned embodiments and modifications may be combined in whole or in part, and embodiments other than those described above may be combined with the above-mentioned embodiments or modifications. In addition, the effects of the present disclosure described in this specification are merely illustrative, and other effects may be obtained.
[0105] The technical category embodying the above technical idea is not limited. For example, the above technical idea may be embodied by a computer program for causing a computer to execute one or more procedures (steps) included in a method for manufacturing or using the above device. The above technical idea may also be embodied by a non-transitory recording medium readable by a computer on which such a computer program is recorded. [Explanation of symbols]
[0106] 15 Diversion Unit 21 First Circulation Line 22 Second Circulation Line 30 Diversion main body 40 Inlet 41 First Outlet 42 Second Outlet 80 Liquid Treatment System 90 Processing Unit R Guide passage L Processing liquid
Claims
1. A flow dividing body portion having a guide flow path; an inflow portion for guiding liquid to the guide flow path; a first outlet portion and a second outlet portion for causing the liquid to flow out from the guide flow path to the outside, A diversion unit in which the first outlet is located above the second outlet, and when air bubbles are present in the liquid in the guide flow path, the volume of the air bubbles flowing out together with the liquid through the second outlet is smaller than the volume of the air bubbles flowing out together with the liquid through the first outlet.
2. The guide flow path includes an inflow guide path into which the liquid from the inflow portion flows, a first outflow guide path located between the inflow guide path and the first outflow portion, and a second outflow guide path located between the inflow guide path and the second outflow portion, The flow dividing body portion has a guide partition portion that defines at least a portion of the inlet guide passage, The inlet portion discharges the liquid into the inlet guide path toward the guide partition portion. The flow division unit of claim 1 .
3. The inlet guide passage extends in a first direction, The first outlet guideway and the second outlet guideway are offset from the inlet guideway in a second direction perpendicular to the first direction, The liquid is guided in the first direction in the inlet guide path and then guided in the second direction. The flow division unit according to claim 2 .
4. the guide flow path includes an inflow guide path into which the liquid from the inflow portion flows, a first outflow guide path located between the inflow flow path and the first outflow portion, and a second outflow guide path located between the inflow flow path and the second outflow portion, The flow dividing body portion has a guide partition portion extending in a first direction, At least a portion of the inlet guide passage and at least a portion of the second outlet guide passage are separated via the guide partition portion, A portion of the second outlet guideway defined by the guide partition portion has a larger cross-sectional area in a direction perpendicular to the first direction than a portion of the inlet guideway defined by the guide partition portion. The flow division unit of claim 1 .
5. the guide flow path includes an inflow guide path into which the liquid from the inflow portion flows, a first outflow guide path located between the inflow flow path and the first outflow portion, and a second outflow guide path located between the inflow flow path and the second outflow portion, The flow dividing body portion is A guide partition portion extending in a first direction and partitioning at least a portion of the inlet guide passage; a shoulder portion defining a portion of the inlet guide passage and forming a shoulder surface extending in a direction perpendicular to the first direction; a tapered portion that defines at least a portion of the first outlet guide passage and that forms a tapered surface whose diameter gradually decreases toward the first outlet portion, The shoulder surface and the tapered surface are directly or indirectly connected to each other. The flow division unit of claim 1 .
6. the guide flow path includes an inflow guide path into which the liquid from the inflow portion flows, a first outflow guide path located between the inflow flow path and the first outflow portion, and a second outflow guide path located between the inflow flow path and the second outflow portion, The liquid flows toward the first outlet portion in a swirling manner in at least a portion of the first outlet guide path. The flow division unit of claim 1 .
7. The inlet portion is connected to the inlet guide passage of the guide flow passage at a side wall portion of the flow distribution body portion, The first outlet portion is connected to a first outlet guide passage including a top portion of the guide passage at a ceiling wall portion of the flow dividing body portion, The second outlet portion is connected to a second outlet guide passage including a bottom portion of the guide passage at a bottom wall portion of the flow dividing body portion, the flow dividing body portion has a guide partition portion extending from the bottom wall portion toward the ceiling wall portion, and the guide partition portion forms a connecting guide path through which the liquid can flow between the guide partition portion and the ceiling wall portion, At least a part of the inlet guide passage is formed by a space of the guide passage outside the guide partition portion, At least a part of the second outflow guide path is formed by a space inside the guide partition portion of the guide flow path, At least a portion of the first outlet guide path is formed by a space of the guide flow path that faces an inner space of the guide partition portion in a direction from the bottom wall portion toward the ceiling wall portion. The flow division unit of claim 1 .
8. a flow rate of the liquid flowing out from the guide flow path to the outside through the first outlet portion is smaller than a flow rate of the liquid flowing out from the guide flow path to the outside through the second outlet portion; The flow division unit of claim 1 .
9. the guide flow path includes an inflow guide path into which the liquid from the inflow portion flows, a first outflow guide path located between the inflow flow path and the first outflow portion, and a second outflow guide path located between the inflow flow path and the second outflow portion, The flow dividing body portion has a protrusion portion protruding downward from an inner wall surface of the flow dividing body portion that defines at least one of the inlet guide passage and the first outlet guide passage, The flow division unit of claim 1 .
10. The flow dividing body portion has a first divided body portion and a second divided body portion that are separably attached to each other. The flow division unit of claim 1 .
11. 11. The flow dividing unit according to claim 1, wherein a treatment liquid is guided to the guide flow path through the inflow portion and flows out from the guide flow path through the first outlet portion and the second outlet portion; A first outlet line connected to the first outlet portion; a second outlet line connected to the second outlet portion, The processing liquid is supplied from the second outlet line to a processing unit that performs a process using the processing liquid. Liquid handling systems.
12. a liquid storage section to which the first outflow line and the second outflow line are connected, the liquid storage section being connected to the inflow section via an inflow line; The treatment liquid is supplied from the liquid storage section to the flow division unit via the inlet line, At least a portion of the treatment liquid that flows out from the diversion unit to the first outflow line is returned to the liquid storage section, At least a portion of the treatment liquid that has flowed out from the diversion unit to the second outflow line and has not been supplied to the treatment unit is returned to the liquid storage section. The liquid treatment system of claim 11.
13. the treatment liquid returned to the liquid storage section via the first outflow line is discharged above the treatment liquid stored in the storage space of the liquid storage section; The liquid treatment system of claim 12.
14. A plurality of the diversion units are provided. The liquid treatment system of claim 11.
Citation Information
Patent Citations
Liquid processing apparatus and liquid processing method
JP2022003666A
Liquid treatment device and liquid treatment method
WO2022009661A1