Vaporization system

Abstract

To provide a vaporization system capable of suppressing an increase in a high boiling point component contained in a liquid within a vaporizer.SOLUTION: According to the present invention, provided is a vaporization system comprising: a vaporizer; a heater; and a mixer. The vaporization system is configured such that vapor gas generated by vaporizing a portion of a liquid in the vaporizer is heated by the heater and then supplied to the mixer. In the mixer, it is mixed with the liquid removed from the vaporizer to generate a mixed vapor gas.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a vaporization system for vaporizing a liquid, such as liquefied ammonia. [Background technology]

[0002] Patent Document 1 discloses a vaporizer that vaporizes liquefied ammonia into ammonia gas. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] WO2020 / 115822 Summary of the Invention [Problem to be solved by the invention]

[0004] Incidentally, a small amount of moisture is mixed into liquefied ammonia, and liquefied ammonia is more easily vaporized than water. Therefore, when an operation is performed in which new liquefied ammonia is added before the entire amount of liquid ammonia in the vaporizer is vaporized, there is a problem that moisture accumulates in the vaporizer, and the amount of moisture contained in the liquid ammonia in the vaporizer gradually increases.

[0005] The present invention has been made in consideration of the above circumstances, and provides a vaporization system capable of suppressing an increase in high boiling point components contained in the liquid in the vaporizer. [Means for solving the problem]

[0006] According to the present invention, the following inventions are provided. [1] A vaporization system comprising a vaporizer, a heater, and a mixer, the vaporized gas produced by vaporizing a portion of the liquid in the vaporizer is heated by the heater and then supplied to the mixer, where the vaporized gas is mixed with the liquid removed from the vaporizer to produce a mixed vaporized gas. [2] The vaporization system according to [1], further comprising a pressure adjustment mechanism for adjusting the pressure of the vaporized gas supplied to the mixer. [3] An evaporation system as described in [1] or [2], wherein the liquid is taken out of the vaporizer through a liquid outlet provided in the vaporizer, the mixer has a liquid supply port that supplies the liquid into the mixer, no transfer pump is provided between the liquid outlet and the liquid supply port to transfer the liquid, and the liquid is transferred from the vaporizer to the mixer by gravity acting on the liquid and / or a force acting due to the differential pressure between the gas phase pressure in the vaporizer and the gas phase pressure in the mixer. [4] The evaporation system according to [3], wherein the liquid supply port is positioned at the same height as the liquid exhaust port or at a higher height. [5] An evaporation system described in any one of [1] to [4], wherein the liquid is removed from the vaporizer through a liquid outlet provided in the vaporizer, and the liquid outlet is provided at a position higher than the bottom of the vaporizer and lower than the liquid level of the liquid in the vaporizer. [6] The vaporization system according to any one of [1] to [5], wherein the liquid contains a main component and a high-boiling point component having a boiling point higher than the boiling point of the main component. [7] The vaporization system according to [6], wherein the main component is ammonia and the high boiling point component is water. [8] A vaporization system comprising a vaporizer and a mixer, the vaporized gas produced by vaporizing a portion of the liquid in the vaporizer is supplied to the mixer, and mixed with the liquid removed from the vaporizer in the mixer, the vaporization system being provided with a pressure adjustment mechanism for adjusting the pressure of the vaporized gas supplied to the mixer. Effect of the Invention

[0007] In the vaporization system of the present invention, the vaporized gas taken out from the vaporizer is mixed with the liquid taken out from the vaporizer. With this configuration, it is possible to suppress an increase in high boiling point components contained in the liquid in the vaporizer. Furthermore, in the vaporization system of the present invention, the vaporized gas is heated and then mixed with the liquid. With this configuration, the liquid can be vaporized by the amount of heat applied from the vaporized gas to the liquid, which has the advantage that there is no need to provide a separate heater for vaporizing the liquid. [Brief description of the drawings]

[0008] [Figure 1] 1 is a diagram showing a configuration of an evaporation system 1 according to an embodiment of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, embodiments of the present invention will be described. Various features shown in the following embodiments can be combined with each other. Also, each feature can be an invention independently.

[0010] 1. First embodiment A vaporization system 1 according to a first embodiment of the present invention will be described with reference to Fig. 1. The vaporization system 1 according to the present embodiment includes a vaporizer 2, a heater 3, and a mixer 4. The vaporization system 1 is configured to vaporize a part of the liquid L in the vaporizer 2, heat the vaporized gas produced by the vaporization in the heater 3, and then supply the vaporized gas to the mixer 4, where the vaporized gas is mixed with the liquid L removed from the vaporizer 2 to produce a mixed vaporized gas. Each component will be described in detail below.

[0011] <Carburetor 2> The vaporizer 2 is configured to be capable of generating vaporized gas by vaporizing the liquid L in the vaporizer 2. The vaporizer 2 is provided with a liquid supply port 2a, a liquid discharge port 2b, a gas discharge port 2c, a heating fluid supply port 2d, and a heating fluid discharge port 2e.

[0012] The liquid supply port 2a is preferably connected to a tank (not shown) that contains the liquid L, and the liquid L is supplied into the shell of the vaporizer 2 through the liquid supply port 2a. A heat transfer tube (not shown) connected to the heating fluid supply port 2d and the heating fluid discharge port 2e is arranged in the vaporizer 2. The heat transfer tube is arranged so as to come into contact with the liquid L. The vaporizer 2 is configured so that the heating fluid supplied into the vaporizer 2 through the heating fluid supply port 2d supplies heat to the liquid L while passing through the heat transfer tube, and then is discharged through the heating fluid discharge port 2e. In another embodiment, the liquid L supplied into the heat transfer tube of the vaporizer 2 may be heated by the heating fluid supplied into the shell of the vaporizer 2. The heating fluid may be any fluid having a higher temperature than the liquid L in the vaporizer 2, and one example is seawater in a liquid state. When the main component of liquid L is ammonia, the temperature of liquid L is close to the boiling point of ammonia, which is −33°C, so liquid L can be heated using liquid seawater, which has a higher temperature than ammonia.

[0013] The vaporized gas generated by vaporizing the liquid L in the vaporizer 2 is discharged through the gas outlet 2c. Meanwhile, the liquid L can be discharged directly from the vaporizer 2 through the liquid outlet 2b. The liquid outlet 2b may be provided at a position lower than the liquid level Ls of the liquid L, and is preferably provided at a position higher than the bottom 2f of the vaporizer 2. If the liquid outlet 2b is provided at a position lower than the liquid level Ls of the liquid L, there is no particular hindrance to the discharge of the liquid L. In addition, if the liquid outlet 2b is provided at a position higher than the bottom 2f of the vaporizer 2, there is an advantage that even if dust has sunk to the bottom of the vaporizer 2, the dust is less likely to be mixed into the liquid L discharged through the liquid outlet 2b.

[0014] The liquid L preferably contains a main component and a high-boiling point component having a boiling point higher than that of the main component. In this specification, the "boiling point" means a value at one atmospheric pressure. The main component is, for example, ammonia, and the high-boiling point component is, for example, water. The ratio of the main component in the liquid L is, for example, 90% by mass or more and less than 100% by mass, preferably 99% by mass or more and less than 100% by mass, and preferably 99.9% by mass or more and less than 100% by mass. This ratio is, for example, 90 to 99.99999% by mass, specifically, for example, 90, 99, 99.9, 99.99, 99.999, 99.9999, 99.99999% by mass, and may be in the range between any two of the numerical values ​​exemplified here or any one or more (but less than 100% by mass). The proportion of the high boiling point component in the liquid L is, for example, more than 0% by mass and not more than 10% by mass, preferably more than 0% by mass and not more than 1% by mass, and more preferably more than 0% by mass and not more than 0.1% by mass. This proportion is, for example, 0.00001 to 10% by mass, specifically, for example, 0.00001, 0.0001, 0.001, 0.01, 0.1, 1, or 10% by mass, and may be in the range between any two of the numerical values ​​exemplified here or not more than any one of them (but more than 0% by mass).

[0015] When the liquid L contains a main component and a high boiling point component, the main component is preferentially vaporized and the concentration of the high boiling point component in the liquid L in the vaporizer 2 increases when the liquid L is vaporized in the vaporizer 2. If an operation is performed in which new liquid L is supplied to the vaporizer 2 after the entire amount of the liquid L in the vaporizer 2 is vaporized, the problem of the increase in the concentration of the high boiling point component can be avoided, but if the main component is ammonia, which has a relatively high boiling point and large latent heat, it takes a very long time to vaporize the entire amount of the liquid L in the vaporizer 2, and another problem occurs in that the liquid L cannot be vaporized efficiently.

[0016] In this embodiment, in order to solve such a problem, a mixed vaporized gas is generated by mixing a vaporized gas generated by vaporizing a part of the liquid L in the vaporizer 2 with the liquid L taken out from the vaporizer 2. With such a configuration, the ratio of high boiling point components contained in the mixed vaporized gas can be made equal to or higher than the ratio of high boiling point components contained in the liquid L supplied to the vaporizer 2, so that an increase in the concentration of high boiling point components contained in the liquid L in the vaporizer 2 can be avoided. Therefore, the liquid L can be vaporized while the liquid L is being added to the vaporizer 2, and the efficiency of vaporization of the liquid L can be improved.

[0017] <Heating device 3> The heater 3 is configured to be capable of heating the vaporized gas generated by vaporizing the liquid L in the vaporizer 2. The heater 3 is provided with a gas supply port 3a, a gas exhaust port 3b, a heating fluid supply port 3c, and a heating fluid exhaust port 3d.

[0018] A heat transfer tube (not shown) connected to a gas supply port 3a and a gas exhaust port 3b is disposed in the heater 3, and the vaporized gas supplied into the heater 3 through the gas supply port 3a is discharged through the gas exhaust port 3b after passing through the heat transfer tube. The heating fluid supplied into the shell of the heater 3 through the heating fluid supply port 3c is discharged through the heating fluid exhaust port 3d after contacting the heat transfer tube to supply heat to the vaporized gas. With this configuration, the vaporized gas is heated while passing through the heater 3. In another embodiment, the vaporized gas supplied into the shell of the heater 3 may be heated by the heating fluid supplied to the heat transfer tube of the heater 3. The heating fluid may be any fluid having a higher temperature than the vaporized gas, and may be, for example, liquid water or water vapor. The temperature of the heating fluid and the temperature of the vaporized gas passing through the heater 3 are preferably 20°C or higher, more preferably 50°C or higher, and more preferably 80°C or higher, respectively. This temperature is, for example, 20 to 300°C, and specifically, for example, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200, 250, or 300°C, and may be in a range between any two of the numerical values ​​exemplified here or equal to or greater than any one of them.

[0019] As described later, in this embodiment, the liquid L supplied to the mixer 4 is vaporized by heat from the vaporized gas heated by the heater 3. For this reason, it is preferable that the heater 3 heats the vaporized gas to such an extent that the vaporized gas is not liquefied even when the vaporized gas comes into contact with the liquid L in the mixer 4 and heat is removed therefrom.

[0020] Incidentally, instead of providing the heater 3 that heats the vaporized gas, a configuration that provides a heater that heats and vaporizes the liquid L supplied to the mixer 4 can be considered, but in order to heat and vaporize the liquid, it is necessary to add a heat quantity equivalent to latent heat, and the size of the heater tends to be larger than when the temperature is increased by heating the gas. In this embodiment, by adopting the heater 3 that heats the vaporized gas, it is possible to reduce the size of the heater 3 and the vaporization system 1.

[0021] <Mixer 4> The mixer 4 is configured to generate a mixed vaporized gas by mixing the vaporized gas heated by the heater 3 with the liquid L extracted from the vaporizer 2. The mixer 4 is provided with a gas supply port 4a, a gas exhaust port 4b, and a liquid supply port 4c.

[0022] The gas supply port 4a is connected to the gas exhaust port 3b through a pipe 6, and the vaporized gas heated by the heater 3 is supplied into the mixer 4 through the gas supply port 4a. The gas supply port 4a is connected to the gas exhaust port 4b through a flow path 4d in the mixer 4. The liquid supply port 4c is connected to the liquid exhaust port 2b through a pipe 7, and the liquid L discharged from the vaporizer 2 is supplied into the mixer 4 through the liquid supply port 4c. The liquid supply port 4c is connected to the flow path 4d, and the vaporized gas and the liquid L are mixed in the flow path 4d.

[0023] The liquid L can be mixed with the vaporized gas by, for example, being sprayed from a spray nozzle disposed in the flow path 4d, or can be sucked in with the vaporized gas due to a pressure drop caused by the flow of the vaporized gas flowing in the flow path 4d and mixed with the vaporized gas. In either case, the liquid L is vaporized by contacting the heated vaporized gas with the liquid L, and a mixed vaporized gas is generated.

[0024] It is preferable that no transfer pump for transferring the liquid L is provided between the liquid outlet 2b and the liquid supply port 4c. In this case, it is preferable that the liquid L is transferred from the vaporizer 2 to the mixer 4 by the force acting due to gravity applied to the liquid L and / or the differential pressure between the gas phase pressure in the vaporizer 2 and the gas phase pressure in the mixer 4. In this embodiment, if the pressure of the vaporized gas flowing through the flow path 4d (i.e., the gas phase pressure in the mixer 4) is too high, the amount of the liquid L mixed with the vaporized gas may be too small. In this case, the liquid L may not be sufficiently taken out from the vaporizer 2, and the concentration of the high boiling point component in the liquid L in the vaporizer 2 may increase. Therefore, in this embodiment, in order to solve such a problem, a pressure adjustment mechanism 8 for adjusting the pressure of the vaporized gas supplied to the mixer 4 is provided. The pressure adjustment mechanism 8 can be provided in the pipe between the vaporizer 2 and the mixer 4, and may be provided in the pipe 5 or the pipe 6. In either case, the pressure of the vaporized gas flowing through the flow path 4d can be reduced by reducing the pressure of the vaporized gas when it passes through the pressure adjustment mechanism 8, thereby increasing the amount of liquid L taken out from the vaporizer 2. The pressure adjustment mechanism 8 can be constituted by a control valve, an orifice, or the like.

[0025] In addition, the pressure adjustment mechanism 8 is provided to adjust the flow rate of the vaporized gas discharged from the vaporizer 2, thereby adjusting the gas phase pressure in the vaporizer 2. By increasing the gas phase pressure in the vaporizer 2, the force for transporting the liquid L through the pipe 7 can be increased.

[0026] Incidentally, when the liquid L is transferred only by the action of gravity acting on the liquid L, it is preferable to arrange the liquid supply port 4c at a position lower than the liquid discharge port 2b. As shown in FIG. 1, the vaporizer 2 usually has a larger volume than the heater 3 and the mixer 4, and the base supporting the vaporizer 2 is also likely to be large. For this reason, it is easy to arrange the liquid supply port 4c at a position lower than the liquid discharge port 2b. On the other hand, when the liquid L is transferred by the force acting due to the differential pressure between the gas phase pressure in the vaporizer 2 and the gas phase pressure in the mixer 4, even if the liquid supply port 4c is arranged at the same height position as the liquid discharge port 2b or at a higher position, the liquid L can be appropriately transferred by setting the differential pressure to a required value. In this case, the degree of freedom in arranging the mixer 4 is increased.

[0027] 2. Other embodiments From another perspective, the present invention can be understood as a vaporization system 1 including a vaporizer 2 and a mixer 4, configured to supply a vaporized gas generated by vaporizing a liquid L in the vaporizer 2 to the mixer 4 and mix the vaporized gas with the liquid L taken out from the vaporizer 2 in the mixer 4, and provided with a pressure adjustment mechanism 8 for adjusting the pressure of the vaporized gas supplied to the mixer 4. An embodiment from this perspective is characterized by pressure adjustment by the pressure adjustment mechanism 8, and it is not essential to heat the vaporized gas generated in the vaporizer 2 before supplying it to the mixer 4. In an embodiment from this perspective, the heater 3 may be provided in any of the pipes 5, 6, and 7, or may be provided downstream of the mixer 4, or may be omitted if unnecessary. [Explanation of symbols]

[0028] 1: Evaporation system 2: Carburetor 2a:Liquid supply port 2b:Liquid outlet 2c: Gas outlet 2d: Heating fluid supply port 2e: Heated fluid outlet 2f: Bottom 3: Heater 3a: Gas supply port 3b: Gas outlet 3c: Heating fluid supply port 3d: Heating fluid discharge port 4: Mixer 4a: Gas supply port 4b: Gas discharge port 4c: Liquid supply port 4d: Flow path 5: Pipe 6: Pipe 7: Pipe 8: Pressure regulating mechanism L: Liquid Ls: Liquid level

Claims

1. A vaporization system comprising a vaporizer, a heater, and a mixer, An evaporation system configured to vaporize a portion of the liquid in the vaporizer, heat the vaporized gas produced by the vaporization in the heater, and then supply it to the mixer, where it is mixed with the liquid removed from the vaporizer to produce a mixed vaporized gas.

2. 2. The vaporization system of claim 1, A vaporization system comprising a pressure adjustment mechanism for adjusting the pressure of the vaporized gas supplied to the mixer.

3. 2. The vaporization system of claim 1, The liquid is removed from the vaporizer through a liquid outlet provided in the vaporizer; the mixer includes a liquid supply port for supplying the liquid into the mixer; A transfer pump for transferring the liquid is not provided between the liquid outlet and the liquid supply port, A vaporization system in which the liquid is transferred from the vaporizer to the mixer by gravity acting on the liquid and / or a force acting due to a pressure difference between the vapor phase pressure in the vaporizer and the vapor phase pressure in the mixer.

4. 4. The vaporization system of claim 3, A vaporization system, wherein the liquid supply is located at the same height as or higher than the liquid exhaust.

5. The vaporization system according to any one of claims 1 to 4, The liquid is removed from the vaporizer through a liquid outlet provided in the vaporizer; A vaporization system, wherein the liquid outlet is located at a position higher than a bottom of the vaporizer and lower than a liquid level of the liquid in the vaporizer.

6. The vaporization system according to any one of claims 1 to 4, The liquid includes a main component and a high boiling point component having a boiling point higher than the boiling point of the main component.

7. 7. The vaporization system of claim 6, The main component is ammonia, The vaporization system wherein the high boiling point component is water.

8. A vaporization system including a vaporizer and a mixer, A vaporized gas generated by vaporizing a portion of the liquid in the vaporizer is supplied to the mixer, and is mixed with the liquid taken out from the vaporizer in the mixer. A vaporization system comprising a pressure adjustment mechanism for adjusting the pressure of the vaporized gas supplied to the mixer.

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