Drawing device, drawing method, program, and substrate processing device

Abstract

To provide a technique with which the position of a laden upper stage can be measured without directly measuring the position of the upper stage.SOLUTION: A drawing device 100 comprises a Y-axis stage 33, an X-axis stage 31, a support stage 2, a stage-moving mechanism 3, a Y-axis linear scale 36, a first displacement meter 61, and an exposure head 51. A first stage is movable in the Y direction. The X-axis stage 31 is positioned above the Y-axis stage 33. The support stage 2 is positioned above the X-axis stage 31. The stage-moving mechanism 3 moves the Y-axis stage 33 in the Y direction. The Y-axis linear scale 36 measures the position of the stage-moving mechanism 3. The first displacement meter 61 can detect the amount of displacement of the support stage 2 in the Y direction with respect to the Y-axis stage 33.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The subject matter disclosed in this specification relates to a drawing apparatus, a drawing method, a program, and a substrate processing apparatus. [Background technology]

[0002] For example, as a method for forming a pattern on a substrate such as a semiconductor wafer or a glass substrate, a drawing apparatus that draws a pattern directly by irradiating light is known. In this type of drawing apparatus, a substrate on which a photosensitive layer such as a resist is formed is supported by a stage, and the stage is moved in the main scanning direction. Then, a pattern light is emitted from an exposure head according to the position of the stage in the main scanning direction, thereby drawing a predetermined pattern on the photosensitive layer.

[0003] In such a drawing apparatus, when the stage is moved, the stage may be displaced in an unexpected direction, such as by meandering. When such a displacement occurs, the pattern may not be formed as specified, and distortion of the pattern may occur. Therefore, techniques for correcting the unexpected displacement of the stage have been proposed.

[0004] For example, Patent Document 1 discloses a mask stage that controls the coordinates of a mask. The mask stage includes an X-table that moves in the X-direction on a base plate, a Y-table that is provided on the X-table and moves in the Y-direction, and a plurality of support pads that support the mask provided on the Y-table. A bar mirror is fixed on the Y-table, and the position of the bar mirror is measured by a laser interferometer that is fixed on the base plate, thereby detecting the position of the Y-table. In addition, a sensor that measures the distance or displacement to the mask is attached to the bar mirror. When the mask table on which the mask is placed is moved, the position information measured by the laser interferometer is corrected using the distance information or displacement information detected by the sensor means. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2016-100541 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the case of Patent Document 1, it was necessary to directly detect the position of the Y table, which is the upper stage, using a laser interferometer. Therefore, when it is difficult to directly measure the upper stage, the technology of Patent Document 1 cannot be adopted.

[0007] An object of the present invention is to provide a technique capable of measuring the position of an upper stage in a multi-stage stack without directly measuring the position of the upper stage. [Means for solving the problem]

[0008] In order to solve the above problem, a first aspect is a drawing apparatus for drawing a pattern on a substrate, comprising: a first stage movable in a predetermined movement direction; a second stage located above the first stage and movable integrally with the first stage; a third stage located above the second stage and movable integrally with the second stage, supporting a substrate; a stage moving mechanism for moving the first stage in the movement direction; a first stage position measurement unit for measuring the position of the first stage; a first displacement meter movable integrally with the first stage and capable of detecting the amount of displacement of the third stage in a first direction relative to the first stage; and an exposure head capable of exposing the substrate supported by the third stage moved in the movement direction by the stage moving mechanism.

[0009] A second aspect is the drawing apparatus of the first aspect, wherein the second stage is movable relative to the first stage in a second direction that intersects the first direction, and the stage movement mechanism is capable of moving the second stage in the second direction relative to the first stage.

[0010] A third aspect is a drawing apparatus of the first or second aspect, further comprising a control unit that controls the exposure head based on the position of the first stage in the movement direction measured by the first stage position measurement unit and the displacement amount detected by the first displacement meter.

[0011] A fourth aspect is the drawing apparatus according to the third aspect, wherein a first direction in which the first displacement gauge detects the amount of displacement is parallel to the direction in which the first stage moves.

[0012] A fifth aspect is the drawing apparatus of the fourth aspect, wherein the first stage position measurement unit measures the position of the first stage in the movement direction. The control unit and the drawing device.

[0013] A sixth aspect is a drawing device of the first or second aspect, further comprising a second displacement meter capable of detecting an amount of displacement of the third stage relative to the first stage in the first direction, wherein the second displacement meter detects an amount of displacement of a portion of the third stage that is away in a second direction that intersects with the first direction from a portion of the third stage where the amount of displacement is detected by the first displacement meter.

[0014] A seventh aspect is the drawing apparatus of the first or second aspect, further comprising a third displacement meter that detects an amount of displacement of the third stage relative to the first stage in a second direction intersecting the first direction.

[0015] An eighth aspect is a drawing device of the first or second aspect, wherein the first displacement meter includes a lower displacement meter capable of detecting the amount of displacement of the second stage relative to the first stage in the first direction, and an upper displacement meter capable of detecting the amount of displacement of the third stage relative to the second stage in the first direction.

[0016] A ninth aspect is a drawing method including: (a) a moving step of moving a first stage, a second stage located above the first stage, and a third stage located above the second stage and supporting a substrate integrally in a predetermined moving direction; (b) a measuring step of measuring a position of the first stage moved by the moving step; (c) a detection step of detecting an amount of displacement of the third stage in a first direction relative to the first stage moved by the moving step; and (d) an exposure step of exposing the substrate supported by the third stage moved in the first direction by the moving step.

[0017] A tenth aspect is a computer-executable program, the program causing the computer to execute the drawing method of the ninth aspect.

[0018] An eleventh aspect is a substrate processing apparatus for processing a substrate, comprising: a first stage movable in a predetermined movement direction; a second stage located above the first stage and movable integrally with the first stage; a third stage located above the second stage, movable integrally with the second stage, and having a support surface for supporting a substrate; a stage moving mechanism for moving the first stage in the movement direction; a first stage position measurement unit for measuring the position of the first stage; a first displacement meter movable integrally with the first stage and capable of detecting the amount of displacement of the third stage in a first direction relative to the first stage; and a processing unit for performing a predetermined processing on the substrate supported by the third stage moved in the movement direction by the stage moving mechanism. Effect of the Invention

[0019] According to the drawing apparatus of the first to eighth aspects and the drawing method of the ninth aspect, the position of the first stage is measured and the displacement of the third stage relative to the first stage is detected, thereby making it possible to measure the position of the third stage without directly measuring the position of the third stage.

[0020] According to the imaging apparatus of the second aspect, by moving the second stage in the second direction, it is possible to move the third stage and the substrate in the second direction.

[0021] According to the drawing apparatus of the third aspect, even if the third stage is displaced relative to the first stage, the exposure position is corrected according to the detected amount of displacement, thereby making it possible to avoid a decrease in drawing accuracy.

[0022] According to the imaging device of the fourth aspect, the amount of displacement in the movement direction of the third stage relative to the first stage can be detected.

[0023] According to the imaging device of the sixth aspect, it is possible to distinguish between a displacement due to translation of the third stage and a displacement due to rotation, based on the detection results of the first displacement meter and the second displacement meter.

[0024] According to the imaging device of the seventh aspect, the amount of displacement of the third stage relative to the first stage in the second direction can be detected.

[0025] According to the drawing device of the eighth aspect, the deformation of the members supporting the lower displacement gauge and the upper displacement gauge can be reduced, and therefore the displacement of the lower displacement gauge and the upper displacement gauge can be reduced, thereby improving the detection accuracy of the displacement amount. [Brief description of the drawings]

[0026] [Figure 1] FIG. 1 is a perspective view of a drawing apparatus according to a first embodiment. [Diagram 2] 2 is a block diagram showing a configuration of a control unit shown in FIG. 1. [Diagram 3] 13 is a diagram showing the change over time in the Y position of the Y-axis stage measured by the Y-axis linear scale and the change over time in the amount of displacement of the support stage in the Y direction detected by a first displacement meter. FIG. [Figure 4] FIG. 13 is a top view showing a rotated support stage. [Diagram 5] FIG. 11 is a diagram showing a first displacement meter according to a second embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0027] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples, and are not intended to limit the scope of the present invention. In the drawings, the dimensions and numbers of each part may be exaggerated or simplified as necessary for ease of understanding.

[0028] In each drawing, in order to facilitate understanding of the positional relationship of each element in the drawing device 100, an XYZ Cartesian coordinate system is appropriately provided, with the X-axis direction and Y-axis direction being horizontal and the Z-axis direction being vertical. The tip of the arrow is the positive side (+ side), and the opposite side is the negative side (- side). The +Z direction is upward, and the -Z direction is downward. With regard to the position of each element, the position in the X direction may be simply referred to as the "X position," and the position in the Y direction may be simply referred to as the "Y position."

[0029] <1. First embodiment> 1 is a perspective view of a drawing apparatus 100 according to a first embodiment. The drawing apparatus 100 is an apparatus that draws a pattern by irradiating light onto an upper surface of a substrate W on which a layer of a photosensitive material (photosensitive layer) such as a resist is formed. The substrate W is, for example, a semiconductor substrate, a printed circuit board, a substrate for a color filter, a glass substrate for a flat panel display used in a liquid crystal display device or a plasma display device, or a substrate for an optical disk. The drawing apparatus 100 includes a base 1, a support stage 2, a stage moving mechanism 3, a gantry 4, an exposure unit 5, a measurement unit 6, and a control unit 9.

[0030] The base 1 has a rectangular shape when viewed from above. The base 1 supports a support stage 2, a stage movement mechanism 3, a gantry 4, an exposure unit 5, and a measurement part 6 from below.

[0031] The support stage 2 has an upper surface 2S that supports the substrate W. The upper surface 2S is a horizontal surface parallel to the X and Y directions. The substrate W is placed on the upper surface 2S in a horizontal position. A plurality of suction holes are formed in the upper surface 2S. The support stage 2 is capable of fixing the substrate W to the upper surface 2S by applying a negative pressure (suction pressure) to the suction holes. Note that a chuck that grips the periphery of the substrate W may be provided on the upper surface 2S, and the substrate W may be fixed to the upper surface 2S by the chuck. The upper surface 2S functions as a support surface.

[0032] The stage movement mechanism 3 is a mechanism that moves the support stage 2 in the Y direction which is the main scanning direction, the X direction which is the sub-scanning direction, and a rotation direction (θ-axis direction) around a rotation axis A1 along the Z axis. The stage movement mechanism 3 has an X-axis stage 31, a sub-scanning mechanism 32, a Y-axis stage 33, a main scanning mechanism 34, a rotation mechanism 35, a Y-axis linear scale 36, and an X-axis linear scale 37.

[0033] The X-axis stage 31 is disposed below the support stage 2 and rotatably supports the support stage 2. The Y-axis stage 33 is disposed below the X-axis stage 31 and supports the X-axis stage 31 and the sub-scanning mechanism 32. The sub-scanning mechanism 32 moves the X-axis stage 31 in the sub-scanning direction, or the X direction, relative to the Y-axis stage 33. The main scanning mechanism 34 moves the Y-axis stage 33 in the main scanning direction, or the Y direction, relative to the base 1. The sub-scanning mechanism 32 and the main scanning mechanism 34 are, for example, a linear motor mechanism including a linear motor and a guide, or a ball screw mechanism including a rotary motor, a ball screw, and a guide. The rotation mechanism 35 is provided on the X-axis stage 31 and rotates the support stage 2 about a rotation axis A1 extending in the Z direction. The sub-scanning mechanism 32, the main scanning mechanism 34, and the rotation mechanism 35 operate based on a control command from the control unit 9.

[0034] The Y-axis linear scale 36 is a linear encoder system for measuring the Y position of the Y-axis stage 33 relative to the base 1. The Y-axis linear scale 36 has a Y-axis scale 361 and a Y-axis reader head (not shown). The Y-axis scale 361 is fixed to the base 1. The Y-axis scale 361 is a scale extending along the Y direction and has a regular pattern or marking. The Y-axis reader head is fixed to the Y-axis stage 33. The Y-axis reader head obtains position information by reading the pattern or marking of the Y-axis scale 361. The Y-axis reader head is electrically connected to the control unit 9 and transmits the obtained position information to the control unit 9 as appropriate.

[0035] The X-axis linear scale 37 is a linear encoder system for measuring the X-position of the X-axis stage 31 relative to the Y-axis stage 33. The X-axis linear scale 37 has an X-axis scale 371 and an X-axis reader head (not shown). The X-axis scale 371 is fixed to the X-axis stage 31. The X-axis scale 371 is a scale extending along the X direction and has a regular pattern or marking. The X-axis reader head is fixed to the X-axis stage 31. The X-axis reader head obtains position information by reading the pattern or marking of the X-axis scale 371. The X-axis reader head of the X-axis linear scale 37 is electrically connected to the control unit 9 and transmits the obtained position information to the control unit 9 as appropriate. The Y-axis linear scale 36 and the X-axis linear scale 37 may each be electromagnetic or optical.

[0036] The gantry 4 is fixed to the base 1. The gantry 4 has two support columns 41 and a beam 43. The lower part of the support column 41 is fixed to the base 1 and extends in the Z direction. The two support columns 41 are arranged at an interval in the X direction. The beam 43 connects the upper parts of the two support columns 41 and extends in the X direction. In this example, the support stage 2 and the Y-axis stage 33 of the stage moving mechanism 3 are arranged between the two support columns 41 in the X direction, and the beam 43 is arranged above the support stage 2.

[0037] The gantry 4 is a member that supports the exposure unit 5. Each exposure head 51 of the exposure unit 5, which will be described later, is fixed to the −Y side surface of a beam portion 43 of the gantry 4.

[0038] The exposure unit 5 has a plurality of (five in this embodiment) exposure heads 51. The plurality of exposure heads 51 are arranged at regular intervals along the X direction. Each exposure head 51 has a spatial light modulator 510 that spatially modulates light.

[0039] The exposure unit 5 has a light irradiation section 53. The light irradiation section 53 irradiates the exposure heads 51 with laser light. The light irradiation section 53 is housed, for example, inside the gantry 4. The light irradiation section 53 has a laser driving section 531 and an illumination optical system 533. By operation of the laser driving section 531, the illumination optical system 533 forms the laser light emitted from a laser light source such as a laser diode into a linear line beam, and irradiates the spatial light modulator 510 of each exposure head 51 with the line beam.

[0040] The spatial light modulator 510 spatially modulates the line beam irradiated from the light irradiation unit 53 based on pattern data indicating a drawing pattern to be formed on the substrate W. More specifically, the spatial light modulator 510 spatially modulates the line beam on a channel-by-channel basis, and reflects necessary light that contributes to drawing the pattern and unnecessary light that does not contribute to drawing the pattern in different directions. Note that spatially modulating light means changing the spatial distribution (amplitude, phase, polarization, etc.) of light. The exposure head 51 illuminates the modulated line beam onto the substrate W moving directly below the exposure head 51. As a result, the drawing pattern is exposed on the unprocessed substrate W.

[0041] The spatial light modulator 510 may be, for example, a grating type optical element such as a GLV (Grating Light Valve, a registered trademark of Silicon Light Machines, Inc.) or a DMD (Digital Mirror Device).

[0042] The measuring unit 6 has a first displacement meter 61 and a second displacement meter 62. The first displacement meter 61 and the second displacement meter 62 are fixed to the upper part of a bracket 65 extending in the Z direction, and are fixed to a side surface (in this example, the -Y side surface) of the Y-axis stage 33 via the bracket 65. The first displacement meter 61 and the second displacement meter 62 are movable in the Y direction together with the Y-axis stage 33. The first displacement meter 61 and the second displacement meter 62 detect the amount of displacement in the Y direction of the support stage 2 relative to the Y-axis stage 33. The first displacement meter 61 and the second displacement meter 62 are optical displacement meter, and each has a projection unit that projects a laser light for detection onto a side surface (in this example, the -Y side surface) of the support stage 2, and a detector that detects the reflected laser light.

[0043] The second displacement meter 62 is positioned away from the first displacement meter 61 in the X direction (+X direction in this example). The second displacement meter 62 detects the amount of displacement of a portion of the support stage 2 that is away in the X direction (+X direction in this example) from a portion (a portion where the detection laser light is incident and reflected) at which the displacement amount is detected by the first displacement meter 61. The first displacement meter 61 and the second displacement meter 62 are electrically connected to the control unit 9, and transmit the detected amount of displacement to the control unit 9 as appropriate.

[0044] The measuring unit 6 further has a third displacement meter 63 and a fourth displacement meter 64. The third displacement meter 63 and the fourth displacement meter 64 are each fixed to the upper part of a bracket 66 extending in the Z direction, and are fixed to a side surface (the +X side surface in this example) of the Y-axis stage 33 via the bracket 66. The third displacement meter 63 and the fourth displacement meter 64 detect the amount of displacement in the X direction of the support stage 2 relative to the Y-axis stage 33. The third displacement meter 63 and the fourth displacement meter 64 are optical displacement meters.

[0045] The fourth displacement meter 64 is positioned away from the third displacement meter 63 in the Y direction (+Y direction in this example). The fourth displacement meter 64 detects the amount of displacement of a portion of the support stage 2 that is away in the Y direction (+Y direction in this example) from a portion (a portion where the detection laser light is incident and reflected) at which the displacement amount is detected by the third displacement meter 63. The third displacement meter 63 and the fourth displacement meter 64 are electrically connected to the control unit 9, and transmit the detected amount of displacement to the control unit 9 as appropriate.

[0046] Fig. 2 is a block diagram showing the configuration of the control unit 9 shown in Fig. 1. The control unit 9 has a processor such as a CPU (Central Processing Unit) and a storage unit 99. The storage unit 99 is electrically connected to the processor, and specifically, stores data in a RAM (Random Access Memory). The controller 9 includes a main storage device such as a memory (e.g., a ROM) and an auxiliary storage device such as a hard disk drive. The storage unit 99 stores a computer program P. The processor executes the computer program P stored in the storage unit 99 to function as an irradiation control unit 91, a stage control unit 93, and a drawing control unit 95. Note that some of the functions of the control unit 9 may be realized in hardware by a dedicated circuit.

[0047] The irradiation control unit 91 controls the light irradiation unit 53 of the exposure unit 5 to cause the light irradiation unit 53 to emit a line beam toward the exposure head 51. The stage control unit 93 controls the stage movement mechanism 3 to move the support stage 2 in the Y direction and the X direction relative to the exposure head 51.

[0048] The drawing control unit 95 controls the spatial light modulator 510 of the exposure head 51. More specifically, the drawing control unit 95 controls the drive voltage applied to each channel of the spatial light modulator 510, thereby causing the spatial light modulator 510 to modulate the line beam so as to correspond to the drawing pattern.

[0049] The drawing control unit 95 controls the spatial light modulator 510 based on the drawing recipe stored in the storage unit 99 and the position information of the support stage 2. In the drawing recipe, for example, pattern data indicating a drawing pattern to be formed on the substrate W and various conditions for drawing (such as the amount of light emitted from the exposure unit 5 and the moving speed of the Y-axis stage 33) are described in a predetermined data format. The pattern data is, for example, data obtained by rasterizing CAD data generated using CAD (computer aided design), and position information on the substrate W to be irradiated with light is recorded in pixel units. In addition, the position information of the support stage 2 includes the position of the Y-axis stage 33 measured by the Y-axis linear scale 36 and the X-axis linear scale 37, and the displacement amount of the support stage 2 relative to the Y-axis stage 33 acquired by the first displacement gauge 61 to the fourth displacement gauge 64 (hereinafter simply referred to as the "displacement amount of the support stage 2").

[0050] The drawing control unit 95 has a displacement amount acquisition unit 951. The displacement amount acquisition unit 951 acquires the amount of displacement of the support stage 2. More specifically, the displacement amount acquisition unit 951 acquires the amount of displacement of the support stage 2 in the Y direction from the detection results of the first displacement meter 61 and the second displacement meter 62. In addition, the displacement amount acquisition unit 951 acquires the amount of displacement of the support stage 2 in the X direction from the detection results of the third displacement meter 63 and the fourth displacement meter 64.

[0051] When a pattern is drawn on the substrate W in the drawing apparatus 100, first, the substrate W coated with a photosensitive material is supported on the support stage 2, and the substrate W is aligned (position adjusted). Thereafter, the stage control unit 93 controls the stage movement mechanism 3 to move the support stage 2 in the Y direction (main scanning direction) relative to each exposure head 51. Then, the drawing control unit 95 controls the spatial light modulator 510 according to the Y position of the support stage 2, so that the line beam is spatially modulated into a line beam corresponding to the drawing pattern of the pattern data, and the line beam is irradiated onto the substrate W. As a result, a belt-shaped region extending in the Y direction on the upper surface of the substrate W is exposed. After the movement in the Y direction is completed, the support stage 2 is moved in the X direction (sub-scanning direction) by the width of the belt-shaped region. By repeatedly performing such stage movement in the Y direction and stage movement in the X direction, a pattern is drawn on the entire upper surface of the substrate W.

[0052] FIG. 3 is a diagram showing the time change G1 in the Y position of the Y-axis stage 33 measured by the Y-axis linear scale 36 and the time change G2 in the amount of displacement of the support stage 2 in the Y direction detected by the first displacement meter 61.

[0053] In the drawing apparatus 100, from the bottom up, the Y-axis stage 33, the X-axis stage 31, and the support stage 2 are stacked in multiple stages. Therefore, as shown in FIG. 3, when the Y-axis stage 33 is moved in the Y direction at a constant speed, the support stage 2 oscillates, which may displace the support stage 2 relative to the Y-axis stage 33.

[0054] In order to deal with such a displacement, the writing control unit 95 acquires the position (y) of the Y-axis stage 33 corresponding to the exposure position. Then, the writing control unit 95 performs a correction (for example, Y+ΔY) to shift the exposure position according to the displacement amount (Δy) of the support stage 2 acquired by the displacement amount acquisition unit 951. Then, the writing control unit 95 controls the spatial light modulator 510 to perform exposure at the corrected exposure position. For example, if the Y position of the Y-axis stage 33 corresponding to the exposure position is "y" and the displacement amount of the support stage 2 in the Y direction is "Δy", the exposure position is "Y+Δy". Note that when a displacement of the support stage 2 in the Y direction is detected, the timing of exposure is changed. Also, when a displacement of the support stage 2 in the X direction is detected, the position of the pattern light is shifted in the X direction by controlling the spatial light modulator 510. Such a correction of the exposure position may be performed by deforming, magnifying, or translating the pattern data in the Y direction or the X direction.

[0055] The displacement amount acquiring unit 951 may directly use the amount of displacement detected by the first displacement meter 61 or the second displacement meter 62 as the amount of displacement in the Y direction of the support stage 2. Furthermore, the displacement amount acquiring unit 951 may directly use the amount of displacement detected by the third displacement meter 63 or the fourth displacement meter 64 as the amount of displacement in the X direction of the support stage 2.

[0056] Furthermore, the displacement amount acquiring unit 951 may calculate the displacement amount in the Y direction of the support stage 2 for a plurality of positions in the X direction by performing an interpolation process such as linear interpolation using the displacement amounts detected by the first displacement meter 61 and the second displacement meter 62. Furthermore, the displacement amount acquiring unit 951 may calculate the displacement amount in the X direction of the support stage 2 for a plurality of positions in the Y direction by performing an interpolation process using the displacement amounts detected by the third displacement meter 63 and the fourth displacement meter 64.

[0057] Furthermore, the detection results of the displacement amounts of the first to fourth displacement gages 61 to 64 and the corresponding actual measured values ​​of the displacement amounts of the substrate W may be experimentally obtained in advance. Then, a formula for calculating the displacement amount of the substrate W from the displacement amounts detected by the first to fourth displacement gages 61 to 64, or an inference device for predicting the displacement amount of the substrate W by machine learning may be obtained. In this case, the displacement amount acquisition unit 951 may calculate the displacement amount of the substrate W using the detection results of the first to fourth displacement gages 61 to 64 and the formula or inference device, and the calculated displacement amount of the substrate W may be the displacement amount of the support stage 2.

[0058] As described above, the drawing apparatus 100 includes the Y-axis stage 33 (first stage), the X-axis stage 31 (second stage), the support stage 2 (third stage), the stage moving mechanism 3, the Y-axis linear scale 36 (first stage position measuring unit), the first displacement meter 61, and the exposure head 51. The Y-axis stage 33 is movable in the Y direction (predetermined moving direction). The X-axis stage 31 is positioned above the Y-axis stage 33 and is movable integrally with the Y-axis stage 33. The support stage 2 is positioned above the X-axis stage 31 and is movable integrally with the X-axis stage 31, and supports the substrate W. The stage moving mechanism 3 moves the Y-axis stage 33 in the Y direction. The Y-axis linear scale 36 measures the position of the stage moving mechanism 3. The first displacement meter 61 is movable integrally with the Y-axis stage 33 and is capable of detecting the amount of displacement of the support stage 2 in the Y direction (first direction) relative to the Y-axis stage 33. The exposure unit 5 is capable of exposing a substrate W supported by a support stage 2 which is moved in the Y direction by a stage movement mechanism 3 .

[0059] Moreover, the imaging method by the imaging apparatus 100 according to this embodiment includes a moving step, a measuring step, a detecting step, and an exposing step. The moving step is a step of integrally moving the Y-axis stage 33 (first stage), the X-axis stage 31 (second stage) located above the Y-axis stage 33, and the support stage 2 (third stage) located above the X-axis stage 31 and supporting the substrate W in the Y direction (predetermined moving direction) together. The measuring step is a step of measuring the position of the Y-axis stage 33 moved by the moving step. The detecting step is a step of detecting the amount of displacement in the Y direction (first direction) of the support stage 2 relative to the Y-axis stage 33 moved by the moving step. The exposing step is a step of exposing the substrate W supported by the support stage 2 moved in the Y direction by the moving step.

[0060] According to these configurations, even if the X-axis stage 31 and the support stage 2 stacked on the Y-axis stage 33 are displaced due to the movement of the Y-axis stage 33, the position of the support stage 2 can be appropriately measured by detecting the position of the Y-axis stage 33 and the amount of displacement of the support stage 2 relative to the Y-axis stage 33. Therefore, the position of the support stage 2 can be measured without directly measuring the position of the support stage 2.

[0061] Furthermore, the X-axis stage 31 (second stage) is movable in an X-direction (second direction) intersecting with the Y-direction (first direction) relative to the Y-axis stage 33 (first stage). The stage movement mechanism 3 is capable of moving the X-axis stage 31 in the X-direction relative to the Y-axis stage 33. With this configuration, the support stage 2 and the substrate W can be moved in the X-direction by moving the X-axis stage 31 in the X-direction.

[0062] The imaging device 100 further includes a control unit 9. The control unit 9 controls the exposure head 51 based on the position in the Y direction (movement direction) of the Y-axis stage 33 (first stage) measured by the Y-axis linear scale 36 (first stage position measurement unit) and the displacement amount detected by the first displacement meter 61. With this configuration, even if the support stage 2 is displaced relative to the Y-axis stage 33, the exposure position is corrected according to the detected displacement amount, thereby making it possible to avoid a decrease in imaging accuracy.

[0063] The Y direction (first direction) in which the first displacement gauge 61 detects the amount of displacement is parallel to the Y direction (movement direction) in which the Y-axis stage 33 moves. With this configuration, the amount of displacement in the movement direction of the support stage 2 relative to the Y-axis stage 33 can be detected.

[0064] The position of Y-axis stage 33 (first stage) in the Y direction (movement direction) is measured by Y-axis linear scale 36. According to this configuration, the position of Y-axis stage 33 can be measured at relatively low cost, so that the cost of the device can be reduced.

[0065] For example, when the position of the support stage 2 is directly measured by a laser interferometer, the working distance of the laser light becomes long, and there is a risk that the measurement accuracy will decrease due to the influence of air fluctuation. Furthermore, the use of a laser interferometer with a long working distance increases the cost of the device. In contrast, since the first displacement meter 61 of this embodiment only measures the displacement amount of the support stage 2 relative to the Y-axis stage 33, the working distance of the laser light of the first displacement meter 61 can be shortened. Therefore, it is possible to avoid the measurement accuracy from decreasing due to air fluctuation, and to suppress the cost of the device.

[0066] The imaging apparatus 100 further includes a second displacement meter 62. The second displacement meter 62 can detect the amount of displacement in the Y direction (first direction) of the support stage 2 (third stage) relative to the Y-axis stage 33 (first stage). The second displacement meter 62 detects the amount of displacement of a portion of the support stage 2 that is separated in the X direction (second direction) from the portion at which the amount of displacement is detected by the first displacement meter 61. With this configuration, it is possible to distinguish between a displacement due to translation and a displacement due to rotation of the support stage 2 from the detection results of the first displacement meter 61 and the second displacement meter 62.

[0067] More specifically, the displacement of the support stage 2 may be, for example, translation caused by the entire support stage 2 falling in the Y direction or the X direction, or rotation caused by twisting around an axis along the Z axis. In the drawing device 100 of this embodiment, the first displacement meter 61 and the second displacement meter 62 detect displacement in the Y direction at two locations on the support stage 2 that are separated in the X direction. For example, when the first displacement meter 61 and the second displacement meter 62 detect the same amount of displacement in the same direction, it can be evaluated that the support stage 2 has translated in the Y direction. Also, when a difference occurs between the amount of displacement detected by the first displacement meter 61 and the amount of displacement detected by the second displacement meter 62, it can be evaluated that the support stage 2 has rotated.

[0068] Fig. 4 is a top view showing the rotated stage 2. As shown in Fig. 4, it is assumed that the stage 2 rotates by an angle α, causing a difference d between the amount of displacement detected by the first displacement gauge 61 and the amount of displacement detected by the second displacement gauge 62. In addition, the distance between the first displacement gauge 61 and the second displacement gauge 62 in the X direction is L. Then, the rotation angle α can be calculated from the following equation.

[0069] (Formula) tanα = d / L

[0070] As described above, by providing the first displacement meter 61 and the second displacement meter 62, it is possible to distinguish between a displacement due to translation of the support stage 2 and a displacement due to rotation of the support stage 2. It is also possible for the third displacement meter 63 and the fourth displacement meter 64 to distinguish, from the detection results, between a displacement due to translation of the support stage 2 in the X direction and a displacement due to rotation of the support stage 2.

[0071] Moreover, the imaging apparatus 100 further includes a third displacement meter 63. The third displacement meter 63 can detect the amount of displacement in the X direction (second direction) of the support stage 2 (third stage) relative to the Y-axis stage 33 (first stage). With this configuration, the amount of displacement in the X direction of the support stage 2 relative to the Y-axis stage 33 can be detected.

[0072] <2. Second embodiment> Next, a second embodiment will be described. In the following description, elements having the same functions as elements already described will be given the same reference numerals or reference numerals with an additional alphabetical character, and detailed description thereof may be omitted.

[0073] 5 is a diagram showing a first displacement meter 61a according to the second embodiment. As shown in FIG. 5, the first displacement meter 61a of the present embodiment has a lower displacement meter 611 and an upper displacement meter 612.

[0074] The lower displacement gauge 611 is fixed to an upper part of a bracket 65a extending in the Z direction, and is fixed to the Y-axis stage 33 via the bracket 65a. The lower displacement gauge 611 can detect the amount of displacement in the Y direction of the X-axis stage 31 relative to the Y-axis stage 33. The upper displacement gauge 612 is fixed to an upper part of a bracket 66b extending in the Z direction, and is fixed to the X-axis stage 31 via the bracket 66b. The upper displacement gauge 612 can detect the amount of displacement in the Y direction of the support stage 2 relative to the X-axis stage 31.

[0075] The displacement amount acquisition unit 951 of the control unit 9 according to this embodiment adds the displacement amount detected by the upper displacement meter 612 to the displacement amount detected by the lower displacement meter 611. In this way, the displacement amount of the X-axis stage 31 relative to the Y-axis stage 33 is acquired.

[0076] According to the imaging apparatus 100 of this embodiment, the length of the brackets 65a, 65b supporting the lower displacement gage 611 and the upper displacement gage 612 can be made shorter than the length of the bracket 66 supporting the first displacement gage 61 of the first embodiment. This makes it possible to reduce deformation of the brackets 65a, 65b when the Y-axis stage 33 is moved in the Y direction. Therefore, the displacement of the lower displacement gage 611 and the upper displacement gage 612 themselves can be reduced, thereby improving the detection accuracy of the displacement amount.

[0077] In this embodiment, the upper displacement meter 612 may be omitted. In this case, the displacement amount acquisition unit 951 may convert the displacement amount detected by the lower displacement meter 611 into the displacement amount of the support stage 2 according to the respective heights (positions in the Z direction) of the X-axis stage 31 and the support stage 2 relative to the Y-axis stage 33. For example, assuming that the height of the X-axis stage 31 relative to the Y-axis stage 33 is "H1" and the height of the support stage 2 relative to the Y-axis stage 33 is "H2", and the displacement amount detected by the lower displacement meter 611 is Δy1, a value obtained by multiplying the displacement amount Δy1 by the ratio of the height H2 to the height H1 (=Δy1×H2 / H1) may be acquired as the displacement amount of the support stage 2.

[0078] <3. Modification> Although the embodiment has been described above, the present invention is not limited to the above, and various modifications are possible.

[0079] For example, in the above embodiment, the first displacement gauge 61 is fixed to the Y-axis stage 33 and detects the position of the support stage 2. However, the first displacement gauge 61 may be configured to be fixed to the support stage 2 and to detect the displacement of the Y-axis stage 33. The same applies to the second displacement gauge 62 to the fourth displacement gauge 64.

[0080] A mirror that reflects the laser light projected from the first displacement gauge 61 to the fourth displacement gauge 64 may be provided on the side surface of the support stage 2.

[0081] The first to fourth displacement gauges 61 to 64 may be contact-type displacement gauges instead of optical displacement gauges.

[0082] The second displacement gauge 62 to the fourth displacement gauge 64 may not be required.

[0083] In the above embodiment, the first displacement meter 61 and the second displacement meter 62 detect the amount of displacement at two different points in the X direction for the support stage 2. However, the amount of displacement at three or more different points in the X direction may be measured. Similarly, the amount of displacement at three or more different points in the Y direction for the support stage 2 may be detected.

[0084] The present invention can also be applied to a substrate processing apparatus for processing substrates. This substrate processing apparatus includes a Y-axis stage 33 (first stage), an X-axis stage 31 (second stage), a support stage 2 (third stage), a stage moving mechanism 3, a Y-axis linear scale 36, a first displacement meter 61, and a processing section. The processing section performs a predetermined process on a substrate W supported by the support stage 2 that is moved in the Y direction (movement direction) by the stage moving mechanism 3.

[0085] Although the present invention has been described in detail, the above description is merely illustrative in all respects, and the present invention is not limited thereto. It is understood that countless variations not illustrated can be envisioned without departing from the scope of the present invention. The configurations described in the above embodiments and variations can be appropriately combined or omitted as long as they are not mutually contradictory. [Explanation of symbols]

[0086] 2: Support Stage (3rd Stage) 3: Stage movement mechanism 9: Control section 31: X-axis stage (second stage) 33: Y-axis stage (first stage) 36: Y-axis linear scale 51: Exposure head 61: First displacement meter 61a: First displacement meter 62: Second displacement gauge 63: 3rd displacement gauge 100:Drawing device 611: Lower displacement gauge 612: Upper displacement gauge P: Computer program W: Substrate

Claims

1. A drawing apparatus for drawing a pattern on a substrate, comprising: a first stage movable in a predetermined direction of movement; a second stage located above the first stage and movable integrally with the first stage; a third stage that is located above the second stage, is movable integrally with the second stage, and supports a substrate; a stage moving mechanism that moves the first stage in the movement direction; a first stage position measuring unit that measures a position of the first stage; a first displacement meter that is movable integrally with the first stage and that is capable of detecting a displacement amount of the third stage relative to the first stage in a first direction; an exposure head capable of exposing the substrate supported by the third stage which is moved in the movement direction by the stage movement mechanism; A drawing device comprising:

2. The drawing device according to claim 1 , the second stage is movable relative to the first stage in a second direction intersecting the first direction, The stage moving mechanism is capable of moving the second stage in the second direction relative to the first stage.

3. 3. The drawing device according to claim 1, a control unit that controls the exposure head based on the position of the first stage in the movement direction measured by the first stage position measurement unit and the displacement amount detected by the first displacement meter; The drawing device further comprises:

4. The drawing device according to claim 3, A drawing apparatus, wherein a first direction in which the first displacement gauge detects a displacement amount is parallel to the movement direction in which the first stage moves.

5. The drawing device according to claim 4, The first stage position measuring unit includes a linear scale that measures the position of the first stage in the movement direction. The control unit and the drawing device.

6. 3. The drawing device according to claim 1, a second displacement meter capable of detecting an amount of displacement of the third stage relative to the first stage in the first direction; Further equipped with A drawing device, wherein a second displacement meter detects a displacement amount of a portion of the third stage that is away in a second direction that intersects with the first direction from a portion where the displacement amount is detected by the first displacement meter.

7. 3. The drawing device according to claim 1, a third displacement meter that detects a displacement amount of the third stage relative to the first stage in a second direction intersecting the first direction; The drawing device further comprises:

8. 3. The drawing device according to claim 1, The first displacement meter is a lower displacement meter capable of detecting an amount of displacement of the second stage relative to the first stage in the first direction; an upper displacement meter capable of detecting an amount of displacement of the third stage relative to the second stage in the first direction; A drawing device comprising:

9. A drawing method comprising the steps of: (a) a moving step of integrally moving a first stage, a second stage located above the first stage, and a third stage located above the second stage and supporting a substrate in a predetermined moving direction; (b) a measuring step of measuring a position of the first stage moved by the moving step; (c) a detection step of detecting a displacement amount of the third stage in a first direction relative to the first stage moved by the movement step; (d) an exposure step of exposing the substrate supported by the third stage which is moved in the first direction by the moving step; Including, how to draw.

10. A computer-executable program, The program causes the computer to execute the drawing method according to claim 9 .

11. A substrate processing apparatus for processing a substrate, a first stage movable in a predetermined direction of movement; a second stage located above the first stage and movable integrally with the first stage; a third stage located above the second stage, movable integrally with the second stage, and having a support surface for supporting a substrate; a stage moving mechanism that moves the first stage in the movement direction; a first stage position measuring unit that measures a position of the first stage; a first displacement meter that is movable integrally with the first stage and that is capable of detecting a displacement amount of the third stage relative to the first stage in a first direction; a processing section that performs a predetermined process on the substrate supported by the third stage that is moved in the movement direction by the stage movement mechanism; The substrate processing apparatus includes:

Images