Substrate processing apparatus

Abstract

To provide a substrate processing apparatus capable of reducing a time that is required for restarting a cleaning processing using a cleaning tool from replacement of the cleaning tool.SOLUTION: A substrate processing apparatus 1 comprises: a substrate holding device 10; a brush arm 41; a plurality of brush devices 50; a brush holding device 70; and a brush liquid supply system 80. A tip end part of the brush arm 41 is constructed so that each brush device 50 can be detached and attached as a brush holding part 42. A substrate W held by the substrate holding device 10 is cleaned by each brush device 50. In the brush holding device 70, each brush device 50 that is not processed is stored. Each brush device 50 that has to be used is detached from the brush holding part 42. Each brush device 50 that is not processed and is stored into the brush holding device 70 is attached to the brush holding part 42. The brush holding device 70 is constructed so that a cleaning surface of each brush device 50 to be stored is wetted by a processing liquid supplied from the brush liquid supply system 80 and is maintained.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus that cleans a substrate by bringing a cleaning tool into contact with the substrate. [Background technology]

[0002] Substrate processing apparatuses are used to perform various processes on substrates such as semiconductor substrates, substrates for FPDs (Flat Panel Displays) such as liquid crystal display devices or organic EL (Electro Luminescence) display devices, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, substrates for photomasks, ceramic substrates, and substrates for solar cells.

[0003] As an example of a substrate processing apparatus, Patent Document 1 describes a scrubber cleaning apparatus that uses a brush to clean a wafer (substrate). The scrubber cleaning apparatus has a brush and an arm. The tip of the arm is configured so that the brush can be attached and detached. The brush attached to the tip of the arm is moved to a cleaning position and slid over the substrate. This cleans the substrate.

[0004] The brushes used for cleaning become contaminated or worn depending on the state of use. Brushes that are excessively contaminated or worn cannot properly clean substrates. Therefore, in the above-mentioned scrubber cleaning device, the brush holding frame is provided at a retracted position different from the cleaning position.

[0005] The brush holding frame holds a plurality of brushes. Thus, when one brush attached to the tip of the arm is in a state to be replaced, the brush is moved to a retracted position and removed from the tip of the arm. In addition, another brush held by the brush holding frame is attached to the tip of the arm. In this manner, the brush used for cleaning the substrate is replaced. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Japanese Patent Application Publication No. 8-318226 Summary of the Invention [Problem to be solved by the invention]

[0007] Depending on the substrate to be treated, the brush used for cleaning needs to be pre-wetted. In this case, in the scrubber cleaning device of Patent Document 1, after replacing the brush attached to the tip of the arm, the new brush needs to be wetted to the extent that it can be used for cleaning. Such a brush pre-treatment operation reduces the operating efficiency of the scrubber cleaning device.

[0008] An object of the present invention is to provide a substrate processing apparatus capable of shortening the time required from replacement of a cleaning tool to resumption of a cleaning process using the replaced cleaning tool. [Means for solving the problem]

[0009] A substrate processing apparatus according to one aspect of the present invention includes a substrate holding part for holding a substrate, a first cleaning tool and a second cleaning tool each having a connected part and a cleaning surface, a cleaning tool holding part having a connecting part that is detachable to the connected parts of the first cleaning tool and the second cleaning tool and holding the first cleaning tool and the second cleaning tool by connecting the connecting part to the connected part, a cleaning tool storage part that is provided at a position separated from the substrate held by the substrate holding part and temporarily stores the second cleaning tool while the first cleaning tool is held in the cleaning tool holding part, and a cleaning tool holding part that moves the cleaning tool holding part so that the cleaning surface of the first cleaning tool or the second cleaning tool held in the cleaning tool holding part comes into contact with the substrate, and a cleaning tool holding part that holds the cleaning tool and the cleaning tool. The cleaning tool storage section is equipped with a cleaning tool holder moving device that moves the cleaning tool holder to a cleaning tool storage section, a processing liquid supply section that supplies a predetermined processing liquid to the cleaning tool storage section, and a control section, wherein the control section cleans the substrate held by the substrate holding section by controlling the cleaning tool holder moving device while the cleaning tool holder holds the first cleaning tool, and after the first cleaning tool used to clean the substrate is removed from the cleaning tool holder, the control section controls the cleaning tool holder moving device to connect the connection part of the cleaning tool holder to the connected part of the second cleaning tool temporarily stored in the cleaning tool storage section, and the cleaning tool storage section is configured to maintain the cleaning surface of the temporarily stored second cleaning tool in a wet state with the processing liquid supplied from the processing liquid supply section. Effect of the Invention

[0010] According to the present invention, it is possible to reduce the time required from replacing a cleaning tool to restarting a cleaning process using the replaced cleaning tool. [Brief description of the drawings]

[0011] [Figure 1] 1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention; [Diagram 2] 2 is a diagram for explaining a basic operation during a cleaning process of a substrate in the substrate processing apparatus of FIG. 1. [Diagram 3]1. FIG. 4 is a diagram for explaining a basic operation during replacement processing of a brush device in the substrate processing apparatus of FIG. [Figure 4] 1. FIG. 4 is a diagram for explaining a basic operation during replacement processing of a brush device in the substrate processing apparatus of FIG. [Diagram 5] 1. FIG. 4 is a diagram for explaining a basic operation during replacement processing of a brush device in the substrate processing apparatus of FIG. [Figure 6] FIG. 2 is an external perspective view of the brush device. [Figure 7] FIG. 7 is a vertical sectional view of the brush device of FIG. 6. [Figure 8] FIG. 4 is an external perspective view of a brush device connection portion. [Figure 9] 9 is a vertical sectional view of the brush device connection portion of FIG. 8. [Figure 10] 13 is an external perspective view for explaining an operation when the brush device is held by the brush device connecting portion. FIG. [Figure 11] 4 is a vertical cross-sectional view showing a state in which the brush device connection portion holds the brush device. FIG. [Figure 12] 12 is a cross-sectional view taken along line AA in FIG. 11. [Figure 13] 13 is an external perspective view for explaining an operation when removing the brush device held in the brush device connecting portion. FIG. [Figure 14] FIG. 2 is a diagram for explaining the configuration of a brush storage device. [Figure 15] FIG. 2 is an external perspective view of a brush storage tank. [Figure 16] 16A and 16B are schematic plan and longitudinal sectional views of the brush storage tank of FIG. 15. [Figure 17] FIG. 2 is an external perspective view of a brush support; [Figure 18] 11 is a plan view showing an example of a configuration in which a brush support is provided so as to cover a portion of a brush storage tank. FIG. [Figure 19] 19A and 19B are schematic plan and vertical sectional views showing a state in which four brush devices are stored in a brush storage tank in the configuration of FIG. 18. [Figure 20] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Figure 21] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Figure 22] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Diagram 23] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Figure 24] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Diagram 25] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Figure 26] 11A and 11B are diagrams for explaining the basic operation of the brush storage device accompanying the replacement process of the brush device. [Figure 27] 2 is a block diagram showing a configuration of a control system of the substrate processing apparatus of FIG. 1. [Figure 28] FIG. 11 is a schematic plan view of a substrate processing apparatus according to another embodiment. [Figure 29] FIG. 13 is a schematic plan view of a substrate processing apparatus according to still another embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] A substrate processing apparatus according to an embodiment of the present invention will be described below with reference to the drawings. In the following description, the term "substrate" refers to a substrate for a flat panel display (FPD) used in a liquid crystal display device or an organic electroluminescence (EL) display device, a semiconductor substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, a photomask substrate, a ceramic substrate, a solar cell substrate, or the like.

[0013] In this embodiment, the substrate has a circular shape in plan view except for the portion where the notch is formed. The substrate has a front surface on which a circuit is formed and a back surface opposite to the circuit forming surface. In the following description, regardless of whether the front surface or back surface of the substrate is the substrate, the surface facing upward is referred to as the top surface of the substrate, and the surface facing downward is referred to as the bottom surface of the substrate.

[0014] The substrate processing apparatus described below performs a cleaning process using a brush on a substrate to be processed. During the cleaning process, a brush is pressed against the upper surface of the substrate while a predetermined cleaning liquid is supplied to the upper surface of the substrate. In the substrate processing apparatus described below, if the brush used for cleaning the substrate becomes contaminated or worn and does not provide adequate cleaning power, the brush is replaced.

[0015] 1. Overall configuration of substrate processing equipment Fig. 1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention. In Fig. 1 and certain figures following Fig. 2, arrows are provided to indicate mutually orthogonal X, Y, and Z directions to clarify positional relationships. The X and Y directions are mutually orthogonal in a horizontal plane, and the Z direction corresponds to the up-down direction (vertical direction).

[0016] 1, the substrate processing apparatus 1 has a configuration in which multiple members are accommodated in a chamber CH, and includes a substrate holding device 10, a cup device 20, a nozzle device 30, a brush arm device 40, multiple brush devices 50, a waiting pod 49, and a brush disposal unit 60. The substrate processing apparatus 1 also includes a brush storage device 70, a brush liquid supply system 80, a brush liquid discharge system 90, and a control unit 900.

[0017] The chamber CH has four side surfaces, a ceiling surface, and a floor surface (bottom surface). A transfer opening (not shown) for transferring a substrate between the inside of the chamber CH and the outside of the chamber CH is formed in one side surface of the chamber CH.

[0018] A substrate holding device 10 is provided at approximately the center of the floor of the chamber CH. The substrate holding device 10 includes a spin base 11, a plurality of holding pins 12, a substrate holding drive unit 13 (FIG. 27), and a substrate rotation drive unit 14 (FIG. 27). The substrate rotation drive unit 14 is, for example, a motor, and is fixed to the floor of the chamber CH with its rotation shaft facing upward. A disk-shaped spin base 11 is attached to the upper end of the rotation shaft.

[0019] The spin base 11 has an outer diameter larger than that of the substrate W to be processed. A plurality of holding pins 12 are provided on the peripheral portion of the upper surface of the spin base 11. Each of the plurality of holding pins 12 has an abutment portion. When the substrate W is placed on the spin base 11, each holding pin 12 is configured to be able to transition between a holding state in which the abutment portion abuts against the outer peripheral edge of the substrate W and a release state in which the abutment portion is separated from the substrate W. The substrate holding drive unit 13 includes, for example, a magnet, and switches each holding pin 12 between the holding state and the release state using the magnetic force of the magnet. The abutment portions of the plurality of holding pins 12 in the holding state abut against a plurality of portions of the outer peripheral edge of the substrate W, thereby holding the substrate W on the spin base 11. In FIG. 1, the outer shape of the substrate W held by the substrate holding device 10 is indicated by a dashed line.

[0020] The cup device 20 includes a cup body 21 and a cup lifting drive unit 22. The cup body 21 has a substantially cylindrical shape, and is provided so as to surround the spin base 11 in a plan view and extend in the Z direction. The cup body 21 is also provided so as to be movable in the Z direction.

[0021] The cup lifting drive unit 22 includes an actuator such as a motor or an air cylinder, and moves the cup body 21 between a predetermined cup upper position and a cup lower position. The cup upper position is a height position (vertical position) where the upper end of the cup body 21 is above the substrate W held by the substrate holding device 10. The cup lower position is a height position where the upper end of the cup body 21 is below the substrate W held by the substrate holding device 10.

[0022] The nozzle device 30 includes a fluid nozzle 31 and a fluid supply system 32. The fluid nozzle 31 is provided at a predetermined position above the substrate holding device 10 and the cup device 20. The fluid nozzle 31 is fixed so that its discharge port faces the rotation center SC of the spin base 11 in the substrate holding device 10. The fluid supply system 32 supplies a cleaning liquid to the fluid nozzle 31 during cleaning processing of the substrate W. As a result, the cleaning liquid is supplied to the upper surface of the substrate W held by the substrate holding device 10. The cleaning liquid is, for example, pure water (deionized water). Note that, instead of pure water, carbonated water, ozone water, hydrogen water, electrolytic ionized water, SC1 (a mixed solution of ammonia and hydrogen peroxide), TMAH (tetramethylammonium hydroxide), or the like can also be used as the cleaning liquid. Furthermore, the nozzle device 30 may be configured to be able to spray a gas such as an inert gas from the fluid nozzle 31. Furthermore, the nozzle device 30 may have a plurality of fluid nozzles 31 capable of discharging or spraying different fluids from each other.

[0023] The brush arm device 40 includes a brush arm 41, a guide rail 43, an arm support unit 44, an arm horizontal drive unit 45, and an arm lift drive unit 46. In the chamber CH, the guide rail 43 is provided adjacent to the substrate holding device 10 in the Y direction. The guide rail 43 extends in the X direction.

[0024] The arm support portion 44 is provided so as to be movable in the X direction along the guide rail 43. The arm horizontal drive portion 45 is, for example, a motor, and moves the arm support portion 44 in the X direction under the control of a control portion 900, which will be described later. The brush arm 41 is supported by the arm support portion 44 so as to be movable in the Z direction. The arm elevation drive portion 46 includes, for example, an actuator such as a motor or an air cylinder, and moves the brush arm 41 in the Z direction under the control of a control portion 900, which will be described later.

[0025] The brush arm 41 has a substantially rectangular parallelepiped shape, and is supported from the arm support part 44 so as to extend in the Y direction toward the substrate holding device 10. The tip of the brush arm 41 is configured as a brush holding part 42 capable of holding and removing (attaching and detaching) a brush device 50 used for cleaning the substrate W. Details of the brush device 50 will be described later. In the substrate processing apparatus 1 of Fig. 1, the brush holding part 42 is located on an imaginary straight line L1 that passes through the rotation center SC of the spin base 11 and extends in the X direction in a plan view.

[0026] In plan view, in addition to the substrate holding device 10, the waiting pod 49, the brush disposal unit 60, and the brush storage device 70 are arranged in a line on the imaginary straight line L1. Specifically, the waiting pod 49, the substrate holding device 10, the brush disposal unit 60, and the brush storage device 70 are arranged in this order on the imaginary straight line L1.

[0027] The standby pod 49 is configured to be able to accommodate and wash the brush device 50 in a clean state while it is held in the brush holding portion 42. The brush disposal portion 60 has a removal structure 61 (FIG. 13) described later for removing the brush device 50 held in the brush holding portion 42 from the brush holding portion 42, and is configured to be able to accommodate the removed brush device 50. The brush storage device 70 is configured to be able to store a plurality of unused brush devices 50.

[0028] Here, the brush storage device 70 includes a brush storage tank 100, a brush support 200, a storage brush horizontal drive unit 210, and a storage brush lift drive unit 220. The brush storage tank 100 is configured to be able to store a plurality of unused brush devices 50. A predetermined processing liquid is supplied to the brush storage tank 100 from a brush liquid supply system 80 and stored therein. The brush device 50 has a cleaning surface for cleaning the substrate W. The processing liquid supplied to the brush storage tank 100 is used to moisten the cleaning surface of the unused brush device 50 stored in the brush storage tank 100. In the following description, this processing liquid is called the brush liquid. The brush liquid may be a cleaning liquid used to clean the substrate W. In this embodiment, the brush liquid is pure water. A part of the brush liquid stored in the brush storage tank 100 is discharged to the outside of the substrate processing apparatus 1 (for example, an exhaust facility, etc.) through a brush liquid discharge system 90.

[0029] The storage brush horizontal drive unit 210 and the storage brush lift drive unit 220 operate to change the storage positions of one or more brush devices 50 stored in the brush storage tank 100. The configurations and operations of the storage brush horizontal drive unit 210 and the storage brush lift drive unit 220 will be described in detail below. The control unit 900 controls the operations of each unit of the substrate processing apparatus 1. The control unit 900 will be described in detail below.

[0030] 1, in the substrate processing apparatus 1, a waiting position P1 is set at a position overlapping with the waiting pod 49 in a plan view. A removal position P2 is set at a position overlapping with the brush disposal unit 60 in a plan view. Furthermore, an attachment position P3 is set at a position overlapping with a part of the brush storage tank 100 in a plan view. The waiting position P1, the removal position P2, and the attachment position P3 are aligned on an imaginary straight line L1.

[0031] 2. Basic operations in substrate processing equipment Fig. 2(a) is a diagram for explaining a basic operation during cleaning processing of a substrate W in the substrate processing apparatus 1 of Fig. 1. In Fig. 2, a schematic plan view of the substrate processing apparatus 1 is shown in the upper part, and a schematic side view of the substrate processing apparatus 1 is shown in the lower part.

[0032] In the initial state of the cleaning process of the substrate W, the brush holder 42 that holds the brush device 50 is located at the standby position P1. The brush device 50 is housed in a standby pod 49. In addition, the cup body 21 is located at the below-cup position, and the discharge of the cleaning liquid by the fluid nozzle 31 is stopped.

[0033] When the cleaning process of the substrate W is started, the substrate W loaded into the substrate processing apparatus 1 is held by the substrate holding device 10 and rotated at a predetermined rotation speed. The cup body 21 is held at a position above the cup. Furthermore, a cleaning liquid is discharged from the fluid nozzle 31 toward the rotating substrate W.

[0034] In this state, the arm horizontal drive unit 45 and the arm elevation drive unit 46 in Fig. 1 are operated to move the brush arm 41 in the Z direction and the X direction. As a result, the brush device 50 held by the brush holder 42 is lifted up from the waiting pod 49 and pressed against the upper surface of the rotating substrate W. In this state, as shown by thick dashed double-dashed arrows a1 and a2 in Fig. 2, the brush device 50 is moved in the X direction along the imaginary straight line L1 in a plan view. In this manner, the upper surface of the substrate W is cleaned.

[0035] When the upper surface of the substrate W has been cleaned, the brush device 50 is returned to its initial position. In addition, the fluid nozzle 31 stops discharging the cleaning liquid, and the substrate holding device 10 stops rotating the substrate W. In addition, the cup body 21 moves from the cup upper position to the cup lower position. This completes the cleaning process of the substrate W.

[0036] 2, the brush device 50 moves back and forth between the outer circumferential edge of the substrate W and the rotation center SC of the spin base 11, but the brush device 50 may clean the substrate W by moving from one end to the other end of the substrate W along the imaginary straight line L1. Alternatively, the brush device 50 may clean the substrate W by moving once between the outer circumferential edge of the substrate W and the rotation center SC of the spin base 11.

[0037] (b) As described above, in the substrate processing apparatus 1 according to this embodiment, a process for replacing brushes used for cleaning the substrates W is performed. Here, the brush device 50 has a configuration in which a brush and a plurality of components associated with the brush are integrally assembled together. Therefore, in the substrate processing apparatus 1, the brush replacement process involves replacing a used brush device 50 (old brush device 50) held by the brush holding portion 42 with an unused brush device 50 (new brush device 50).

[0038] Figures 3 to 5 are diagrams for explaining basic operations during replacement processing of the brush device 50 in the substrate processing apparatus 1 of Figure 1. In Figures 3 to 5, similar to the example of Figure 2, a schematic plan view of the substrate processing apparatus 1 is shown in the upper part, and a schematic side view of the substrate processing apparatus 1 is shown in the lower part.

[0039] In the initial state of the replacement process of the brush device 50, the brush holder 42 holding the old brush device 50 is located at the standby position P1, as shown in Fig. 3. The old brush device 50 is housed in the standby pod 49. The cup body 21 is in the under-cup position, and the discharge of the cleaning liquid by the fluid nozzle 31 is stopped. Furthermore, an unused brush device 50 is stored in the brush storage tank 100 of the brush storage device 70.

[0040] When the replacement process of the brush device 50 is started, the arm horizontal drive unit 45 and the arm elevation drive unit 46 in Fig. 1 are operated to move the brush arm 41 in the Z direction and the X direction. As a result, the brush device 50 held by the brush holding unit 42 is lifted up from the waiting pod 49. Also, as shown by the thick two-dot chain arrow a11 in Fig. 3, the brush holding unit 42 moves in the space above the substrate holding device 10 to the removal position P2.

[0041] At the removal position P2, the used brush device 50 is removed from the brush holding part 42 and stored in the brush disposal part 60. Thereafter, as shown by the thick two-dot chain arrow a12 in Fig. 4, the brush holding part 42, which is no longer holding the brush device 50, moves from the removal position P2 to the attachment position P3.

[0042] At the mounting position P3, an unused brush device 50 stored in the brush storage tank 100 is held by the brush holding part 42. Also, the brush device 50 held by the brush holding part 42 is lifted up from the brush storage tank 100. Thereafter, as shown by a thick two-dot chain arrow a13 in Fig. 5, the brush holding part 42 passes through the space above the substrate holding device 10 and moves to the standby position P1. There, the brush device 50 held by the brush holding part 42 is accommodated in the standby pod 49. This completes the replacement process of the brush device 50.

[0043] 3. Configuration of the brush device 50 Fig. 6 is an external perspective view of the brush device 50, and Fig. 7 is a vertical cross-sectional view of the brush device 50 of Fig. 6. As shown in Fig. 6, the brush device 50 includes a brush 51, a brush support 52, and a connected post 56. The brush support 52 has a substantially cylindrical shape and has a brush attachment portion 53 at its lower end.

[0044] The brush 51 is formed, for example, from a PVA (polyvinyl alcohol) sponge or a PVA sponge with dispersed abrasive grains, and has a circular cleaning surface 51S (FIG. 7) capable of contacting the upper surface of the substrate W. As shown in FIG. 7, the brush 51 is attached to a brush attachment portion 53 of the brush support 52 so that the cleaning surface 51S faces downward. With the brush 51 attached, the brush attachment portion 53 has an annular supported surface 53S that surrounds a portion of the brush 51 and is located a small distance above the cleaning surface 51S.

[0045] 6, a recess 54 is formed in the center of the upper end of the brush support 52. In addition, an annular flange portion 55 is formed at the upper end of the brush support 52 so as to surround the recess 54 and protrude outward a certain distance around the entire circumference of the brush support 52.

[0046] The recess 54 has a flat bottom surface 54S. A screw hole is formed in the center of the bottom surface 54S. The connected pillar 56 is a rod-shaped member having a circular cross section, and a first groove 56a and a second groove 56b are formed in the upper half. A male screw is formed in the lower half of the connected pillar 56, which corresponds to the screw hole in the bottom surface 54S. The lower half of the connected pillar 56 is attached to the screw hole in the bottom surface 54S. As a result, the upper half of the connected pillar 56 is fixed to the brush support 52 in a state where it protrudes upward from the bottom surface 54S of the recess 54.

[0047] The upper end of the connected column 56 is formed in a hemispherical shape. The first groove 56a and the second groove 56b are formed at a position spaced a common distance from the upper end of the connected column 56 in the axial direction. The first groove 56a and the second groove 56b are formed at different positions in the circumferential direction of the connected column 56.

[0048] 6, a diagram of the outer peripheral surface of the upper half of the connected column 56 expanded in the circumferential direction is shown in a two-dot chain line balloon. In the expanded view, the circumferential angular positions based on the central axis of the connected column 56 are indicated in 90° increments from 0° to 360°. As shown in the expanded view, the circumferential angular range (approximately 160°) in which the second groove portion 56b is formed is wider than the circumferential angular range (approximately 45°) in which the first groove portion 56a is formed.

[0049] Each of the first groove portion 56a and the second groove portion 56b is formed so as to be capable of accommodating a part of a steel ball 490 (FIG. 9) described later, but not the whole of the steel ball 490. Furthermore, the second groove portion 56b allows the steel ball 490 to move in the circumferential direction within a certain angular range when part of the steel ball 490 is accommodated therein.

[0050] 4. Configuration of brush holder 42 The brush holding part 42 in Fig. 1 includes a brush device connection part provided to extend in the Z direction (extend downward) at the tip part of the brush arm 41. Fig. 8 is an external perspective view of the brush device connection part, and Fig. 9 is a vertical cross-sectional view of the brush device connection part 400 in Fig. 8. As shown in Fig. 8, the brush device connection part 400 includes a shaft member 410, a connection main body part 420, and a casing 440. Moreover, as shown in Fig. 9, the brush device connection part 400 further includes a pressing member 431, a spring 432, and a plurality of steel balls 490 (three in this example).

[0051] The connection main body 420 has a configuration in which a first cylindrical portion 421 and a second cylindrical portion 422, which have different inner and outer diameters, are connected in the axial direction. The first cylindrical portion 421 and the second cylindrical portion 422 are arranged vertically in this order. The inner diameter of the first cylindrical portion 421 is slightly larger than the outer diameter of the connected pole 56 of the brush device 50. The inner diameter of the second cylindrical portion 422 is larger than the inner diameter of the first cylindrical portion 421, and the outer diameter of the second cylindrical portion 422 is larger than the outer diameter of the first cylindrical portion 421.

[0052] The shaft member 410 is held rotatably around the axis of the shaft member 410 by a rotation drive mechanism (not shown) at the tip portion of the brush arm 41. The lower end portion of the shaft member 410 is inserted into the first cylindrical portion 421 from above, and is connected to the upper end portion of the first cylindrical portion 421 and a portion adjacent to the upper end portion. In this way, the connection main body portion 420 is supported by the shaft member 410.

[0053] A plurality of through holes (three in this example) are formed near the lower end of the first cylindrical portion 421 and are spaced at equal angular intervals in the circumferential direction. The openings of the through holes formed on the inner peripheral surface of the first cylindrical portion 421 are called inner openings 421h. The openings of the through holes formed on the outer peripheral surface of the first cylindrical portion 421 are called outer openings 421i. Both the inner openings 421h and the outer openings 421i have a circular shape.

[0054] A part of the steel ball 490 is accommodated inside each through hole. The thickness of the first cylindrical portion 421 is smaller than the diameter of the steel ball 490. The inner diameter of the inner opening 421h is smaller than the diameter of the steel ball 490. On the other hand, the inner diameter of the outer opening 421i is larger than the diameter of the steel ball 490. With this configuration, the steel ball 490 is positioned such that a part of the steel ball 490 is accommodated in the through hole of the first cylindrical portion 421, and the remaining part is positioned at least either outside or inside the first cylindrical portion 421.

[0055] A cylindrical pressing member 431 having an inner diameter slightly larger than the outer diameter of the first cylindrical portion 421 and an outer diameter smaller than the outer diameter of the second cylindrical portion 422 is fitted into the first cylindrical portion 421. The lower half of the inner peripheral surface of the pressing member 431 is inclined with respect to the axial direction of the pressing member 431 so that the inner diameter gradually increases downward. The inclined inner peripheral surface of the pressing member 431 serves as a ball pressing surface 431T and comes into contact with parts of three steel balls 490 protruding outward from three through holes of the first cylindrical portion 421.

[0056] The pressing member 431 has an annular pressed surface 431S facing upward. A spring 432 is provided on the pressed surface 431S. In this example, the spring 432 is a coil spring, and surrounds the first cylindrical portion 421. A casing 440 is provided around the first cylindrical portion 421 so as to cover the pressing member 431 and the spring 432. The casing 440 is attached to the connection main body 420 so as to compress the spring 432 from above toward the pressed surface 431S of the pressing member 431. As a result, a pressing force from the spring 432 toward the second cylindrical portion 422 acts on the pressing member 431.

[0057] As described above, the ball pressing surface 431T of the pressing member 431 abuts against parts of the three steel balls 490 protruding outward from the three through holes of the first cylindrical portion 421. Therefore, the pressing force applied to the pressing member 431 by the spring 432 acts to press each of the three steel balls 490 toward the axis of the first cylindrical portion 421. In other words, the pressing force along the axis of the first cylindrical portion 421 is converted into a pressing force that presses the three steel balls 490 toward the axis of the first cylindrical portion 421.

[0058] As a result, as shown in the upper part of the bubble indicated by the two-dot chain line in Fig. 9, when no force acts on each steel ball 490 from inside the first cylindrical portion 421, a part of the steel ball 490 protrudes from the inner opening 421h into the inside of the first cylindrical portion 421. On the other hand, as shown in the lower part of the bubble in Fig. 9, it is assumed that a force acting from inside the first cylindrical portion 421 toward the outside of the first cylindrical portion 421 acts on each steel ball 490. In this case, as shown by the hollow arrow, when the force acting from inside the first cylindrical portion 421 toward the outside of the first cylindrical portion 421 exceeds the force pressing the steel ball 490 toward the inside of the first cylindrical portion 421 due to the elastic force of the spring 432, the steel ball 490 is pushed out of the internal space of the first cylindrical portion 421.

[0059] 5. Holding and Removing the Brush Device 50 by the Brush Device Connection Portion 400 Fig. 10 is an external perspective view for explaining the operation when the brush device 50 is held by the brush device connecting part 400. As shown in the upper part of Fig. 10, when the brush device 50 is held by the brush device connecting part 400, the second tubular part 422 of the brush device connecting part 400 is pushed into the recess 54 of the brush device 50 in Fig. 6. Thereby, as shown in the lower part of Fig. 10, the brush device 50 is held by the brush device connecting part 400.

[0060] During this pushing, the connected pillar 56 of the brush device 50 is inserted into the first tubular portion 421 of the brush device connection part 400. At this time, inside the first tubular portion 421, the parts of the three steel balls 490 protruding into the inside of the first tubular portion 421 are gradually pushed outward from the first tubular portion 421 by the upper end of the connected pillar 56. Thereafter, the connected pillar 56 advances further into the first tubular portion 421, and the lower end of the second tubular portion 422 abuts against the bottom surface 54S of the recess 54 of the brush device 50. In this state, parts of the three steel balls 490 fit into the first groove portion 56a and the second groove portion 56b of the connected pillar 56.

[0061] Fig. 11 is a vertical cross-sectional view showing the state in which the brush device connecting part 400 holds the brush device 50, and Fig. 12 is a cross-sectional view taken along line AA in Fig. 11. As shown in Fig. 11 and Fig. 12, each steel ball 490 of the brush device connecting part 400 is partially fitted into either the first groove 56a or the second groove 56b of the connected post 56 of the brush device 50. As a result, with the brush device 50 held by the brush device connecting part 400, an engagement force resulting from the elastic force of a spring 432 (Fig. 9) built into the brush device connecting part 400 acts between them.

[0062] 13 is an external perspective view for explaining the operation when removing the brush device 50 held in the brush device connecting part 400. In order to remove the brush device 50 from the brush device connecting part 400, a removal structure 61 is required. As described above, the removal structure 61 is provided in the brush disposal part 60 in FIG.

[0063] As shown in the upper part of FIG. 13, the removal structure 61 includes, for example, one or more (two in this example) plate-like members, and is arranged so as to be able to abut against the upper surface of the flange portion 55 of the brush device 50. When removing the brush device 50 from the brush device connection part 400, the flange portion 55 of the brush device 50 is placed below the removal structure 61. Thereafter, as shown in the lower part of FIG. 13, the brush device connection part 400 is pulled upward with a force equal to or greater than a certain level. At this time, inside the first cylindrical part 421 of the brush device connection part 400, the first cylindrical part 421 and the connected pole 56 move relatively against the engagement force acting between the three steel balls 490 and the first groove part 56a and the second groove part 56b of the connected pole 56. As a result, the brush device 50 is removed from the brush device connection part 400.

[0064] 13, the removal structure 61 includes two plate-like members, but the present invention is not limited thereto. The removal structure 61 only needs to be configured so as to be able to abut against a part of the upper surface of the flange portion 55 and to be able to fix the brush device 50 when the brush device 50 is removed, and may be formed of only one plate-like member.

[0065] 6. Configuration and Operation of Brush Storage Device 70 (a) Schematic of the configuration of the brush storage device 70 Fig. 14 is a diagram for explaining the configuration of the brush storage device 70. In Fig. 14, the configuration of the brush storage device 70 is mainly shown in an external perspective view. As described above, the brush storage device 70 includes the brush storage tank 100, the brush support 200, the storage brush horizontal drive unit 210, and the storage brush lift drive unit 220.

[0066] As shown in FIG. 14, the brush storage tank 100 has a generally rectangular parallelepiped shape extending in one direction, and is disposed so as to extend along the Y direction. In this embodiment, the brush storage tank 100 is fixed at a predetermined position in the chamber CH. As described above, the brush storage tank 100 is configured to be able to store a plurality of brush devices 50. A pipe 81 is connected to one end of the brush storage tank 100, and a pipe 91 is connected to the other end of the brush storage tank 100. The pipe 81 constitutes a part of the brush liquid supply system 80 in FIG. 1. The pipe 91 constitutes a part of the brush liquid discharge system 90 in FIG. 1. The mounting position P3 in FIG. 1 is set near one end of the brush storage tank 100.

[0067] 14, the brush support 200 is provided so as to cover a part of the brush storage tank 100 from above and both sides in the X direction. The brush support 200 has a guide hole GH extending along the Y direction.

[0068] The storage brush lifting drive unit 220 includes an air cylinder 221 and a lifting shaft 222. The air cylinder 221 is installed, for example, on the floor surface of the chamber CH in Fig. 1. The lifting shaft 222 is connected to a piston provided inside the air cylinder 221, and moves in the Z direction according to the pressure inside the air cylinder 221. A pressure adjusting device (such as an electro-pneumatic regulator) (not shown) for adjusting the pressure inside the air cylinder 221 is connected to the air cylinder 221.

[0069] Two connecting members 223 are attached to the upper end of the lifting shaft 222. The two connecting members 223 are shaft members such as screws, and are inserted into guide holes GH of the brush support 200. As a result, the lifting shaft 222 supports the brush support 200 in a state in which the brush support 200 is movable along the direction of the guide holes GH (Y direction). In addition, the lifting shaft 222 adjusts the height position of the brush support 200 in the Z direction to a desired height position.

[0070] The storage brush horizontal drive unit 210 includes an actuator such as a motor or an air cylinder, and moves the brush support 200 supported by the lift shaft 222 in the Y direction. Thereby, the storage brush horizontal drive unit 210 adjusts the position of the brush support 200 in the Y direction to a desired position.

[0071] (b) Structure of the brush storage tank 100 Fig. 15 is an external perspective view of the brush storage tank 100, and Fig. 16 is a schematic plan view and a vertical cross-sectional view of the brush storage tank 100 of Fig. 15. In Fig. 16, a schematic plan view of the brush storage tank 100 is shown in the upper part, and a vertical cross-sectional view of the upper part taken along line BB is shown in the lower part.

[0072] 15, the brush storage tank 100 has an upper surface 101, a lower surface 102, a first side surface 103, a second side surface 104, a first end surface 105, and a second end surface 106. In this example, the first side surface 103 and the second side surface 104 are surfaces that face in opposite directions in the X direction. The first end surface 105 and the second end surface 106 are surfaces that face in opposite directions in the Y direction.

[0073] A brush storage hole 110 is formed in the top surface 101. The brush storage hole 110 is open facing upward and is formed to extend from near one end of the brush storage tank 100 to near the other end. A liquid inlet 107a connected to the internal space of the brush storage hole 110 is formed in the first end surface 105. The piping 81 in FIG. 14 is connected to the liquid inlet 107a. A liquid outlet 107b connected to the internal space of the brush storage hole 110 is formed in the second end surface 106. The piping 91 in FIG. 14 is connected to the liquid outlet 107b.

[0074] As shown in the upper part of Fig. 16, the brush storage hole 110 is formed with a first storage space 110a, a second storage space 110b, a third storage space 110c, and a fourth storage space 110d, each capable of accommodating a part of the brush device 50 of Fig. 6. The first storage space 110a, the second storage space 110b, the third storage space 110c, and the fourth storage space 110d are mutually connected and are arranged in this order at equal intervals in the direction from the first end face 105 to the second end face 106.

[0075] A storage hole bottom surface 111 is formed inside the brush storage hole 110 and extends in the Y direction through the center of the brush storage hole 110. The storage hole bottom surface 111 is a band-shaped flat surface having a certain width in the X direction in a plan view and is perpendicular to the Z direction.

[0076] Further, inside the brush storage hole 110, a pair of brush guide parts 112 extending in the Y direction are formed so as to sandwich the storage hole bottom surface 111 in the X direction. Each brush guide part 112 is formed so as to protrude upward by a certain height from the storage hole bottom surface 111, as shown in the lower part of Fig. 16.

[0077] In the upper half of the brush guide portion 112, a plurality of cutouts each having an arc shape (arch shape) in a plan view are formed at positions where a plurality of storage spaces (110a to 110d) are formed. These cutouts are formed corresponding to the radius of curvature of the outer circumferential surface of the brush support body 52 of the brush device 50 in Fig. 6. This allows the brush support body 52 in Fig. 6 to be inserted from above between the opposing cutouts of the pair of brush guide portions 112.

[0078] An upwardly facing brush support surface 113 is formed at the lower end of each of the multiple cutouts formed in the brush guide portion 112. The multiple brush support surfaces 113 formed in a pair of brush guide portions 112 are located on a common plane perpendicular to the Z direction. That is, the multiple brush support surfaces 113 are formed at the same height position.

[0079] 16, three different dot patterns with different densities are applied to each surface to facilitate understanding of the positional relationship (height position relationship) in the Z direction between the bottom surface 111 of the storage hole, the upper end surface of the brush guide portion 112, and the multiple brush support surfaces 113. The surface with the higher density dot pattern has a lower height position.

[0080] A pair of brush support surfaces 113 formed in a pair of cutouts facing each other in the X direction support a supported surface 53S (FIG. 7) of the brush support 52 when the brush support 52 in FIG. 6 is inserted between the pair of cutouts. With this configuration, in the brush storage tank 100, it is possible to position and store the brush device 50 in a predetermined posture in each of the multiple storage spaces (110a to 110d) in the brush storage hole 110.

[0081] As for the dimensions of each part of the brush storage tank 100, the distance between each brush support surface 113 and the storage hole bottom surface 111 in the Z direction is set to be larger than the distance between the supported surface 53S (FIG. 7) and the cleaning surface 51S (FIG. 7) of the brush device 50. Also, the distance between the upper surface 101 and each brush support surface 113 in the Z direction is set to be smaller than the distance between the flange portion 55 (FIG. 7) and the supported surface 53S (FIG. 7) of the brush device 50.

[0082] (c) Structure of the brush support 200 Fig. 17 is an external perspective view of the brush support 200. As shown in Fig. 17, the brush support 200 includes a support plate 201, a first side wall 202, and a second side wall 203. The support plate 201 has a substantially rectangular flat plate shape and extends in the Y direction. The length of the support plate 201 in the Y direction is shorter than the length of the brush storage tank 100 (Fig. 15) in the Y direction. On the other hand, the length of the support plate 201 in the X direction is slightly longer than the length of the brush storage tank 100 (Fig. 15) in the X direction.

[0083] The two long sides of the support plate 201 extend parallel to the Y direction. The first side wall 202 and the second side wall 203 are each formed of a rectangular plate-like member, and are formed so as to extend downward from each of the two long sides of the support plate 201. The second side wall 203 has the above-mentioned guide hole GH formed therein.

[0084] The support plate 201 is formed with a notch 204 extending in the Y direction from one end (one short side) in the Y direction to the vicinity of the other end (the other short side). The notch 204 has a pair of opposing surfaces 205a, 205b that face each other in the X direction. As shown by a plurality of hollow arrows in FIG. 17, each of the opposing surfaces 205a, 205b has three recesses that have an arc shape in a plan view. The three recesses of one opposing surface 205a face the three recesses of the other opposing surface 205b, respectively. These recesses are formed corresponding to the radius of curvature of the outer circumferential surface of the brush support 52 of the brush device 50 in FIG. 6. This allows the brush support 52 in FIG. 6 to be inserted from above between the opposing recesses of the pair of opposing surfaces 205a, 205b.

[0085] The brush support 200 is provided, for example, so as to cover a portion of the upper surface 101, the first side wall 202, and the second side wall 203 of the brush storage tank 100. Fig. 18 is a plan view showing an example of a configuration in which the brush support 200 is provided so as to cover a portion of the brush storage tank 100.

[0086] 18, the brush support 200 is disposed at a position that is out of the first storage space 110a of the brush storage hole 110 in the Y direction and overlaps with the second storage space 110b to the fourth storage space 110d of the brush storage hole 110 in the Y direction. As a result, the support plate 201 mainly covers from above the portion from approximately the center of the brush storage tank 100 in the Y direction to the second end face 106.

[0087] In this state, the three spaces between the three pairs of recesses arranged opposite each other in the X direction in the cutout 204 of the brush support 200 overlap with the three storage spaces (110b to 110d) of the brush storage tank 100 in a plan view. Also, in the example of Fig. 18, most of the inner edge of the cutout 204 of the brush support 200 is located slightly inward of the inner edge of the brush storage hole 110 of the brush storage tank 100 in a plan view.

[0088] Figure 19 is a schematic plan view and a vertical cross-sectional view showing four brush devices 50 stored in the brush storage tank 100 in the configuration of Figure 18. In Figure 19, the upper part shows a schematic plan view of the brush storage tank 100 and the brush support body 200, and the lower part shows a vertical cross-sectional view taken along line DD of the upper part. As shown in the upper part of Figure 19, the outer diameter of the flange portion 55 of each brush device 50 is slightly larger than the width of the brush storage hole 110 in the X direction.

[0089] As shown in the lower part of FIG. 19, each brush device 50 is supported by the brush support surface 113 of the brush storage hole 110 in each storage space (110a to 110d). As described above, the distance between each brush support surface 113 and the storage hole bottom surface 111 in the Z direction is greater than the distance between the supported surface 53S (FIG. 7) and the cleaning surface 51S (FIG. 7) of the brush device 50. As a result, the cleaning surface 51S (FIG. 7) located at the lower end of each brush device 50 is held at a height position separated from the storage hole bottom surface 111. In other words, when each brush device 50 is stored in the brush storage tank 100, the supported surface 53S of that brush device 50 does not contact the storage hole bottom surface 111.

[0090] As described above, the distance in the Z direction between the upper surface 101 and each brush support surface 113 is smaller than the distance between the flange portion 55 (FIG. 7) of the brush device 50 and the supported surface 53S (FIG. 7). As a result, when each brush device 50 is stored in the brush storage tank 100, the flange portion 55 located at the upper end of the brush device 50 is held at a height position a certain distance above the upper surface 101 of the brush storage tank 100. Therefore, a certain gap is formed between the flange portions 55 of the multiple brush devices 50 and the upper surface 101 of the brush storage tank 100.

[0091] With at least one brush device 50 stored in the brush storage tank 100, brush liquid is supplied into the brush storage tank 100 from piping 81. As a result, a predetermined amount of brush liquid is stored in the brush storage tank 100. Also, a portion of the brush liquid stored in the brush storage tank 100 is discharged from piping 91. The amount of brush liquid supplied to and discharged from the brush storage tank 100 is adjusted so that the liquid level of the brush liquid stored in the brush storage tank 100 is positioned above the brushes 51 of the stored brush devices 50. As a result, the brush devices 50 stored in the brush storage tank 100 have their brushes 51 immersed in the brush liquid and are maintained in a wet state.

[0092] The thickness of the support plate 201 of the brush support body 200 is set to be smaller than the gap formed between the flange portions 55 of the multiple brush devices 50 and the upper surface 101 of the brush storage tank 100. As a result, in the example of Fig. 19, a part of the support plate 201 is located between the flange portions 55 of the three brush devices 50 and the upper surface 101 of the brush storage tank 100 at a position above the three storage spaces (110b, 110c, 110d).

[0093] (d) Basic operation of the brush storage device 70 20 to 26 are diagrams for explaining the basic operation of the brush storage device 70 accompanying the replacement process of the brush device 50. Hereinafter, the operation of each part of the brush storage device 70 will be explained using vertical cross-sectional views of the brush storage tank 100 and the brush support 200 and an external perspective view of the brush storage device 70. Among FIGS. 20 to 26, FIGS. 20, 22, 24, and 26 show vertical cross-sectional views of the brush storage tank 100 and the brush support 200. These vertical cross-sectional views correspond to the vertical cross-sectional view of FIG. 19. Also, FIGS. 21, 23, and 25 show external perspective views of the brush storage device 70. These vertical cross-sectional views correspond to the external perspective view of FIG. 14.

[0094] 20, 22, 24, and 26, the liquid level of the brush liquid stored in the brush storage tank 100 is indicated by a two-dot chain line. In addition, in Fig. 21, 23, and 25, the multiple brush devices 50 contained in the brush storage tank 100 are omitted in order to make it easier to understand the operation of the brush storage device 70.

[0095] First, in an initial state, the brush storage device 70 is in the state shown in Fig. 14, and four brush devices 50 are stored in the four storage spaces (110a to 110d) of the brush storage hole 110 as shown in Fig. 19. In this state, the replacement process of the brush device 50 is performed. As a result, as shown by the hollow arrow in Fig. 20, an unused brush device 50 stored in the first storage space 110a at the attachment position P3 is held by the brush holding portion 42 in Fig. 1 and pulled up from the brush storage tank 100.

[0096] In this embodiment, the mounting position P3 is set above the first storage space 110a of the brush storage tank 100. Therefore, when the next brush device 50 is replaced, a new unused brush device 50 needs to be stored in the first storage space 110a.

[0097] Therefore, in the brush storage device 70, when an unused brush device 50 is stored in the second storage space 110b of the brush storage tank 100 after the replacement process of the brush device 50, the following series of operations are performed until the next replacement process is performed.

[0098] First, as shown by the hollow arrow in Fig. 21, the storage brush lifting drive unit 220 operates to lift the brush support body 200 to a predetermined height relative to the brush storage tank 100. At this time, as shown in Fig. 22, the brush support body 200 lifts up all of the remaining brush devices 50 that were initially stored in the brush storage tank 100 by a part of the support plate 201 supporting the flange portion 55 of each brush device 50. In this example, the three brush devices 50 that were stored in the second storage space 110b, the third storage space 110c, and the fourth storage space 110d are lifted up from the brush storage tank 100.

[0099] Here, the predetermined height to which the brush support 200 rises is set to such an extent that the lower end (cleaning surface 51S) of the brush device 50 supported by the brush support 200 is positioned at least above the liquid level of the brush liquid stored in the brush storage tank 100. Note that the predetermined height may be set to such an extent that the brush device 50 supported by the brush support 200 is positioned above the brush storage tank 100.

[0100] Next, as shown by the hollow arrow in Fig. 23, the storage brush horizontal drive unit 210 operates to horizontally move the brush support body 200 by a predetermined length in the Y direction relative to the brush storage tank 100. More specifically, the brush support body 200 is moved in the Y direction by one pitch of the multiple storage spaces (110a to 110d) lined up in the Y direction so as to approach the first end surface 105 of the brush storage tank 100. As a result, as shown in Fig. 24, the three brush devices 50 supported by the brush support body 200 are arranged above the first storage space 110a, the second storage space 110b, and the third storage space 110c, respectively.

[0101] Next, as shown by the hollow arrow in Fig. 25, the storage brush lifting drive unit 220 operates to lower the brush support body 200 by a predetermined height relative to the brush storage tank 100. At this time, as shown in Fig. 26, the three brush devices 50 supported by the brush support body 200 are accommodated in the brush storage hole 110. As a result, the three brush devices 50 are stored in the first storage space 110a, the second storage space 110b, and the third storage space 110c, respectively. In this state, the brushes 51 of the three brush devices 50 are immersed in the brush liquid stored in the brush storage tank 100.

[0102] As described above, the brush support 200 moves in the Z direction and the Y direction relative to the brush storage tank 100, thereby changing the storage positions of one or more brush devices 50 stored in the brush storage tank 100. Thereafter, when the brush device 50 stored in the first storage space 110a is removed from the brush storage tank 100 in the replacement process of the next brush device 50, the series of operations shown in Figures 21 to 26 are repeated until the next replacement process is started.

[0103] In the substrate processing apparatus 1, when there are no more brush devices 50 in the brush storage tank 100, the operation of recovering the used brush devices 50 in the brush disposal section 60 and the operation of refilling the brush storage tank 100 with unused brush devices 50 are performed.

[0104] 7.Control system of substrate processing equipment The control system of the substrate processing apparatus 1 will be described together with the configuration of the control unit 900 in Fig. 1. Fig. 27 is a block diagram showing the configuration of the control system of the substrate processing apparatus 1 in Fig. 1. As shown in Fig. 27, the control unit 900 includes a CPU (Central Processing Unit) 901, a RAM (Random Access Memory) 902, a ROM (Read Only Memory) 903, and a storage device 904. The RAM 902 is used as a working area for the CPU 901. The ROM 903 stores a system program. The storage device 904 includes a storage medium such as a hard disk or a semiconductor memory, and stores a substrate cleaning program for performing a cleaning process on the substrate W and a replacement process program for performing a replacement process on the brush device 50.

[0105] The substrate cleaning program and the replacement processing program may be provided in a state stored in a recording medium such as a CD-ROM 909, and installed in the ROM 903 or the storage device 904. Alternatively, the substrate cleaning program and the replacement processing program may be distributed from a server external to the substrate processing apparatus 1 via a communication network, and installed in the ROM 903 or the storage device 904.

[0106] The CPU 901 executes the substrate cleaning program and the replacement processing program to control the operation of each part of the substrate processing apparatus 1. Specifically, the control unit 900 controls the substrate holding and driving unit 13. As a result, the control unit 900 causes the substrate holding device 10 to hold the substrate W to be carried into the substrate processing apparatus 1 by shifting the state of the multiple holding pins 12 from an open state to a holding state. Also, the control unit 900 shifts the state of the multiple holding pins 12 from a holding state to a released state in order to unload the substrate W from the substrate processing apparatus 1. Furthermore, the control unit 900 controls the substrate rotation and driving unit 14. As a result, the control unit 900 rotates the substrate W held by the substrate holding device 10 at a preset speed.

[0107] The control unit 900 also controls the cup lifting drive unit 22. Thereby, the control unit 900 moves the cup body 21 in Fig. 1 between a cup upper position and a cup lower position during cleaning processing of the substrate W. The control unit 900 also controls the fluid supply system 32. Thereby, the control unit 900 supplies cleaning liquid to the fluid nozzle 31 in Fig. 1 during cleaning processing of the substrate W.

[0108] Furthermore, the control unit 900 controls the arm horizontal drive unit 45 and the arm elevation drive unit 46. Thereby, the control unit 900 moves the brush arm 41 within the chamber CH when the substrate W is cleaned and when the brush device 50 is replaced.

[0109] The control unit 900 also controls the brush liquid supply system 80 and the brush liquid discharge system 90. As a result, the control unit 900 adjusts the amount of brush liquid supplied to the brush storage tank 100 and the amount of brush liquid discharged from the brush storage tank 100 so that a state in which a predetermined amount of brush liquid is stored in the brush storage tank 100 is maintained.

[0110] Furthermore, the control unit 900 controls the storage brush horizontal drive unit 210 and the storage brush lift drive unit 220. As a result, the control unit 900 moves the brush support body 200 in the Z direction and the Y direction so that the series of operations shown in Figures 21 to 26 are performed after the replacement process of the brush device 50 and before the next replacement process. As a result, the unused brush device 50 is stored in the first storage space 110a located below the mounting position P3.

[0111] 8. Effects (a) In the above-described substrate processing apparatus 1, a single brush device 50 is held by the brush holding portion 42 of the brush arm 41, and the single brush device 50 is used to perform a cleaning process on the substrate W. At this time, one or more unused brush devices 50 can be temporarily stored in the brush storage tank 100 of the brush storage device 70.

[0112] When one brush device 50 becomes contaminated or deteriorated to the extent that replacement is necessary, the brush device 50 is removed from the brush holding part 42 by the brush disposal part 60 at the removal position P2. Thereafter, the brush holding part 42 is moved to the attachment position P3, and the brush device connection part 400 of the brush holding part 42 is connected to the connection post 56 of an unused brush device 50 stored in the brush storage device 70. As a result, a new brush device 50 is held in the brush holding part 42. In this manner, the replacement process of the brush device 50 is performed.

[0113] When cleaning the substrate W with the brush device 50, the cleaning surface 51S of the brush 51 needs to be wet to a certain degree. It takes a certain amount of time (for example, 15 minutes) to wet the cleaning surface 51S in a dry state to a degree suitable for cleaning the substrate W.

[0114] According to the above configuration, the cleaning surface 51S of the brush device 50 stored in the brush storage tank 100 of the brush storage device 70 is maintained in a wet state by the brush liquid supplied to and stored in the brush storage tank 100. Therefore, after the replacement process of the brush device 50, it is not necessary to wet the cleaning surface 51S of the brush device 50 before cleaning the substrate W with the new brush device 50 held in the brush holding part 42. As a result, it is possible to shorten the time required from the replacement of the brush device 50 to the resumption of the cleaning process using the new brush device 50.

[0115] (b) A plurality of storage spaces (110a to 110d) arranged in one direction are formed in the brush storage tank 100. This allows a plurality of brush devices 50 to be stored in each of the storage spaces (110a to 110d).

[0116] (c) In the brush storage device 70, the attachment position P3 is set above the first storage space 110a. In the brush storage device 70, after the replacement process of one brush device 50 is performed, the storage brush horizontal drive unit 210 and the storage brush lift drive unit 220 operate during the time until the next replacement process. As a result, the storage positions of the brush devices 50 stored in the storage spaces (110b, 110c, 110d) other than the first storage space 110a are sequentially changed so as to approach the first storage space 110a. Therefore, the replacement process of the brush device 50 is smoothly performed at the preset attachment position P3.

[0117] (d) In the brush storage device 70, the brush device 50 stored in the brush storage tank 100 is raised to a height position above the liquid level of the brush liquid stored in the brush storage tank 100 when the storage position is changed. It is then moved in the Y direction. In this case, the brush device 50 does not move horizontally while in contact with the brush liquid stored in the brush storage tank 100. Therefore, disturbances are less likely to occur on the liquid level of the brush liquid stored in the brush storage tank 100. As a result, the brush liquid is prevented from leaking out of the brush storage tank 100.

[0118] (e) In the brush storage tank 100, four storage spaces (110a to 110d) are formed from the first end face 105 to the second end face 106 so as to be mutually connected and aligned in a row in a horizontal plane. A pipe 81 of the brush liquid supply system 80 is connected to the first end face 105. A pipe 91 of the brush liquid discharge system 90 is connected to the second end face 106. This allows the brush liquid supplied from the pipe 81 to flow smoothly from one end of the brush storage tank 100 to the other end thereof. Therefore, when one or more brush devices 50 are stored in the brush storage tank 100, the cleaning surface 51S of each brush device 50 can be constantly immersed in fresh brush liquid that is supplied.

[0119] (f) A part of the brush storage tank 100 (the part forming the first storage space 110a) overlaps with the imaginary straight line L1 along which the brush holder 42 moves when the substrate W is cleaned in a plan view. The brush disposal unit 60 also overlaps with the imaginary straight line L1 when viewed in a plan view. As a result, the standby position P1, the removal position P2, and the mounting position P3 are set on the imaginary straight line L1. In this case, when replacing the brush device 50, the used brush device 50 can be smoothly moved to the removal position P2 after the substrate W is cleaned. Also, the brush holder 42 from which the brush device 50 has been removed can be smoothly moved to the mounting position P3.

[0120] (g) The brush device connection part 400 includes a spring 432. In the brush device connection part 400, when the connected pole 56 is inserted into the first tubular part 421, an engagement force is generated between the brush device connection part 400 and the connected pole 56 due to the spring 432. As a result, the brush device 50 can be easily connected to the brush device connection part 400 by inserting the connected pole 56 into the first tubular part 421 with a pressing force of a certain degree or more. In addition, the brush device 50 connected to the brush device connection part 400 can be easily removed by pulling out the connected pole 56 inserted into the first tubular part 421 with a pulling force of a certain degree or more. In this way, according to the configuration of the brush device connection part 400 and the connected pole 56 of the brush device 50, the brush device 50 can be attached to and detached from the brush device connection part 400 with a simple operation.

[0121] 9. Other embodiments (a) In the brush storage device 70 according to the above embodiment, the brush arm 41 that holds the brush device 50 moves in the X direction in a plan view. Therefore, in the above embodiment, the standby position P1, the removal position P2, and the attachment position P3 are set on a common imaginary straight line L1. However, the present invention is not limited to the above example.

[0122] Fig. 28 is a schematic plan view of substrate processing apparatus 1 according to another embodiment. Substrate processing apparatus 1 in Fig. 28 differs from substrate processing apparatus 1 in Fig. 1 in the configuration of brush arm device 40. Brush arm device 40 in Fig. 28 includes a brush arm 41, an arm support unit 44, an arm rotation drive unit 47, and an arm elevation drive unit 48.

[0123] The arm support 44 in this example is fixed on the floor of the chamber CH at a position to the side of the substrate holding device 10. The arm support 44 also has a rotation shaft extending in the Z direction. The rotation shaft 44S is provided so as to be movable up and down in the Z direction and rotatable around the axis of the rotation shaft 44S.

[0124] The arm rotation drive unit 47 is, for example, a motor, and rotates the rotation shaft 44S around the axis of the rotation shaft 44S under the control of the control unit 900. The arm elevation drive unit 48 includes an actuator such as an air cylinder or a motor, and moves the rotation shaft 44S in the Z direction under the control of the control unit 900.

[0125] 1, and one end of the brush arm 41 is attached to the rotation shaft 44S. The brush arm 41 extends horizontally from the rotation shaft 44S at a position above the substrate holding device 10 and the cup device 20. The other end (tip) of the brush arm 41 is configured as a brush holding part 42 capable of holding the brush device 50 and being removable (attachable and detachable).

[0126] When the arm rotation drive unit 47 rotates the rotation shaft 44S, the brush holding unit 42 moves along a virtual arc L2 that passes through the rotation center SC of the spin base 11 with the axis of the rotation shaft 44S as a reference in a plan view. In this example, the waiting pod 49, the substrate holding device 10, the brush disposal unit 60, and the brush storage device 70 are arranged in this order so as to be aligned on the virtual arc L2. As a result, in the substrate processing apparatus 1, the waiting position P1, the removal position P2, and the attachment position P3 are set to be aligned on the virtual arc L2 in a plan view.

[0127] In this case, when replacing the brush device 50 after the cleaning process of the substrate W, the used brush device 50 can be smoothly moved to the detachment position P2. Also, the brush holder 42 from which the brush device 50 has been detached can be smoothly moved to the attachment position P3.

[0128] (b) In the brush storage device 70 according to the above embodiment, the storage position of the brush device 50 in the brush storage tank 100 is changed by moving the brush support 200 relative to the brush storage tank 100, but the present invention is not limited to this. In the brush storage device 70, the position of the brush device 50 in the brush storage tank 100 may be changed by moving the brush storage tank 100 relative to the brush support 200.

[0129] Fig. 29 is a schematic plan view of a substrate processing apparatus 1 according to yet another embodiment. The substrate processing apparatus 1 in Fig. 29 differs from the substrate processing apparatus 1 in Fig. 1 in the configuration of a brush storage device 70. The brush storage device 70 in Fig. 29 includes a tank horizontal drive unit 510 and a tank lift drive unit 520 instead of the storage brush horizontal drive unit 210 and the storage brush lift drive unit 220 in Fig. 1.

[0130] The tank horizontal driving unit 510 includes an actuator such as a motor or an air cylinder, and is configured to be able to adjust the horizontal position (Y direction in this example) of the brush storage tank 100. The tank lifting driving unit 520 includes an actuator such as a motor or an air cylinder, and is configured to be able to adjust the position of the brush storage tank 100 in the Z direction.

[0131] In the substrate processing apparatus 1 of this example, for example, when the brush device 50 stored in the second storage space 110b is pulled out from the second storage space 110b and moved to the first storage space 110a, the brush support 200 is maintained in a stationary state.

[0132] Specifically, with one brush device 50 stored in the second storage space 110b and supported by the brush support 200, the tank lifting drive unit 520 moves the brush storage tank 100 downward under the control of the control unit 900. As a result, with the brush support 200 stationary, the one brush device 50 is pulled out of the second storage space 110b.

[0133] Next, the tank horizontal driving unit 510 moves the brush storage tank 100 in the Y direction under the control of the control unit 900 so that the first storage space 110a is positioned below one of the brush devices 50 held by the brush support 200.

[0134] Thereafter, the tank lifting drive unit 520 moves the brush storage tank 100 upward under the control of the control unit 900. As a result, one brush device 50 held by the brush support 200 is stored in the first storage space 110a. Finally, the tank horizontal drive unit 510 moves the brush storage tank 100 in the Y direction under the control of the control unit 900 so that one brush device 50 stored in the first storage space 110a is positioned below the mounting position P3. As a result, in the brush storage device 70, the storage position of the brush device 50 in the brush storage tank 100 can be changed, as in the above embodiment.

[0135] (c) Although the brush storage tank 100 according to the above embodiment is configured to be capable of simultaneously holding four brush devices 50, the present invention is not limited to this. The brush storage tank 100 may be configured to be capable of simultaneously holding only two brush devices 50, only three brush devices 50, or five or more brush devices 50.

[0136] (d) In the brush storage device 70 according to the above embodiment, the brush liquid is stored in the brush storage tank 100, thereby maintaining the brushes 51 of the brush device 50 stored in the brush storage tank 100 in a wet state, but the present invention is not limited to this. The brush storage device 70 may have a configuration in which the brush liquid supplied from the brush liquid supply system 80 is constantly discharged toward the brushes 51 of the stored brush device 50. Even with such a configuration, an unused brush device 50 in which the brushes 51 are maintained in a wet state can be stored in the chamber CH.

[0137] (e) The storage brush lifting drive unit 220 according to the above embodiment is configured to be able to lift and lower the brush support 200 by the air cylinder 221, but the present invention is not limited to this. The storage brush lifting drive unit 220 may include another drive source such as a motor instead of the air cylinder 221, and may be configured to be able to lift and lower the brush support 200 using the power of the other drive source.

[0138] (f) The brush storage hole 110 of the brush storage tank 100 in the above embodiment is configured to be able to accommodate a portion of the brush device 50, but the brush storage hole 110 may be configured to be able to accommodate the entire brush device 50.

[0139] (g) Although the brush holding portion 42 according to the above embodiment is configured to be detachable from the connected pole 56 of the brush device 50 by utilizing the elastic force of the spring 432 through the brush device connecting portion 400, the present invention is not limited to this. The brush holding portion 42 may have an actuator that detachably holds the brush device 50. For example, instead of the above brush device connecting portion 400, the brush holding portion 42 may have two or more claws that are configured to be able to grip and release the connected pole 56 of the brush device 50, and a drive source such as a motor that drives those claws.

[0140] (h) In the substrate processing apparatus 1 according to the above embodiment, the substrate holding device 10 has a so-called mechanical chuck type configuration in which the plurality of holding pins 12 abut against the outer circumferential edge of the substrate W to hold the substrate W, but the present invention is not limited to this. The substrate holding device 10 may have a suction type configuration in which the central portion of the lower surface of the substrate W is suction-held.

[0141] (i) The brush support 200 according to the above embodiment may be configured to be capable of releasing the support state for one brush device 50 every time an operation is performed to change the storage position of the one brush device 50 from the second storage space 110b to the first storage space 110a. In this case, the storage brush horizontal drive unit 210 and the storage brush lift drive unit 220 of the brush storage device 70 may return the brush support 200, whose support state for one brush device 50 has been released, to the position before the above operation (original position).

[0142] (j) In the brush storage device 70 according to the above embodiment, the mounting position P3 is set above the first storage space 110a. However, the present invention is not limited to this. The mounting position P3 may be set at a position other than above the brush storage tank 100. In this case, the brush storage device 70 may be configured such that the brush device 50 is moved to the mounting position P3 by the brush storage tank 100 or the brush support 200.

[0143] (k) The brush device 50 and the brush device connection part 400 according to the above embodiment are configured to be connectable and detachable with each other as they move in the vertical direction. However, the present invention is not limited to this. The brush device 50 and the brush device connection part 400 may be configured to be connectable and detachable with each other as they move in the horizontal direction. In addition, the brush storage tank 100 may have a configuration in which an opening is formed in a part of one of the first side surface 103 or the second side surface 104. The opening provided in the one side surface is formed in the upper part of the one side surface so that a certain amount of cleaning liquid can be stored in the brush storage tank 100.

[0144] When the brush device 50, the brush device connection part 400, and the brush storage tank 100 have the above-mentioned configurations, the brush device connection part 400 moves toward the mounting position P3 during the brush replacement process as follows. First, the brush device connection part 400 has its vertical height adjusted by the arm lift drive part 46 at a position near the brush storage tank 100, and is positioned so as to face an opening on one side of the brush storage tank 100 in the horizontal plane. Next, the brush device connection part 400 moves to the mounting position P3 in accordance with the horizontal movement by the arm horizontal drive part 45 so as to enter the inside of the brush storage tank 100 through the opening on one side. At this time, the brush device connection part 400 comes into contact with a part of the brush device 50 in the brush storage tank 100, so that the brush device 50 and the brush device connection part 400 are connected to each other.

[0145] Thus, with the above configuration, a certain amount of cleaning liquid can be stored in the brush storage tank 100, while the brush device connection portion 400 and the brush device 50 can be connected to each other through the opening formed in the first side 103 or the second side 104.

[0146] 10. Correspondence between each component of the claims and each part of the embodiment Below, examples of the correspondence between each component of the claims and each element of the embodiment will be described, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can also be used as each component of the claims.

[0147] In the above embodiment, the substrate processing apparatus 1 is an example of a substrate processing apparatus, the substrate holding apparatus 10 is an example of a substrate holding part, the connected post 56 is an example of a connected part, the cleaning surface 51S is an example of a cleaning surface, the brush device 50 used in the cleaning process of the substrate W is an example of a first cleaning tool, the brush device 50 stored in the brush storage tank 100 is an example of a second cleaning tool, the brush device connection part 400 is an example of a connection part, and the brush holding part 42 is an example of a cleaning tool holding part.

[0148] In addition, the brush storage device 70 is an example of a cleaning tool storage section, the arm horizontal drive unit 45, the arm lifting drive units 46, 48 and the arm rotation drive unit 47 are examples of a cleaning tool holding section moving device, the brush liquid supply system 80 is an example of a treatment liquid supply unit, the brush liquid is an example of a treatment liquid, and the control unit 900 is an example of a control unit.

[0149] In addition, the brush storage tank 100 is an example of a cleaning tool storage tank, the first storage space 110a, the second storage space 110b, the third storage space 110c and the fourth storage space 110d are examples of multiple storage spaces, the first storage space 110a is an example of one storage space, and the brush support 200, the storage brush horizontal drive unit 210, the storage brush lifting drive unit 220, the tank lifting drive unit 520 and the tank horizontal drive unit 510 are examples of position changing units.

[0150] In addition, the storage brush horizontal drive unit 210 is an example of a horizontal movement unit, the storage brush lifting drive unit 220 is an example of a lifting movement unit, the liquid inlet 107a is an example of a treatment liquid inlet, the liquid outlet 107b is an example of a treatment liquid outlet, the virtual straight line L1 is an example of a straight line, and the virtual arc L2 is an example of an arc.

[0151] Furthermore, as shown in Figure 20, the height position of the brush support 200 when the support plate 201 approaches the upper surface 101 of the brush storage tank 100 is an example of the lower height position, and as shown in Figure 22, the height position of the brush support 200 when the support plate 201 is away from the upper surface 101 of the brush storage tank 100 by a distance greater than the height of the brush device 50 is an example of the upper height position.

[0152] 11. Summary of the embodiment (Item 1) The substrate processing apparatus according to item 1 comprises: A substrate holder for holding a substrate; a first cleaning tool and a second cleaning tool each having a connection portion and a cleaning surface; a cleaning tool holder that has a connecting portion that is detachable to the connected portions of the first cleaning tool and the second cleaning tool, and that holds the first cleaning tool and the second cleaning tool by connecting the connecting portion to the connected portions; a cleaning tool storage section provided at a position spaced apart from the substrate held by the substrate holding section, the cleaning tool storage section temporarily storing the second cleaning tool while the first cleaning tool is held by the cleaning tool holding section; a cleaning tool holder moving device that moves the cleaning tool holder so that the cleaning surface of the first cleaning tool or the second cleaning tool held by the cleaning tool holder comes into contact with the substrate, and moves the cleaning tool holder to the cleaning tool storage unit; a processing liquid supply unit that supplies a predetermined processing liquid to the cleaning tool storage unit; A control unit. the control unit controls the cleaning tool holder moving device while the cleaning tool holder holds the first cleaning tool to clean the substrate held by the substrate holding unit, and after the first cleaning tool used to clean the substrate is removed from the cleaning tool holder, controls the cleaning tool holder moving device to connect the connecting portion of the cleaning tool holder to the connected portion of the second cleaning tool temporarily stored in the cleaning tool storage unit, The cleaning tool storage section is configured so that the cleaning surface of the second cleaning tool temporarily stored therein is maintained in a wet state with the processing liquid supplied from the processing liquid supply section.

[0153] In the substrate processing apparatus, the cleaning tool holder holds a first cleaning tool, and the cleaning tool holder moves so that the cleaning surface of the first cleaning tool comes into contact with the substrate held by the substrate holder. This cleans the substrate. At this time, the cleaning tool storage unit temporarily stores a second cleaning tool.

[0154] When the first cleaning tool becomes contaminated or deteriorated to the extent that it needs to be replaced, the first cleaning tool is removed from the cleaning tool holder. The cleaning tool holder is then moved to a cleaning tool storage section, and the connection part of the cleaning tool holder is connected to the connection part of the second cleaning tool stored in the cleaning tool storage section. In this way, the cleaning tool held by the cleaning tool holder is replaced with a new cleaning tool.

[0155] When cleaning a substrate with a cleaning tool, the cleaning surface of the cleaning tool needs to be moistened to a certain degree. It takes a certain amount of time (e.g., 15 minutes) to moisten the dry cleaning surface to a degree suitable for cleaning the substrate.

[0156] According to the above configuration, the cleaning surface of the second cleaning tool stored in the cleaning tool storage section is kept wet with the processing liquid supplied to the cleaning tool storage section. Therefore, after the cleaning tool held by the cleaning tool holder is replaced from the first cleaning tool to the second cleaning tool, there is no need to wet the cleaning surface of the second cleaning tool before cleaning the substrate with the new second cleaning tool. As a result, it is possible to shorten the time required from replacing the cleaning tool to resuming the cleaning process using the new cleaning tool.

[0157] (2) In the substrate processing apparatus according to the first aspect, the cleaning tool storage section includes a cleaning tool storage tank having a storage space that opens upward and can store the second cleaning tool by accommodating at least a portion of the second cleaning tool including the cleaning surface; The cleaning tool storage tank may be configured so as to be capable of storing the processing liquid supplied from the processing liquid supply unit in the storage space.

[0158] In this case, by storing the second cleaning tool in the storage space of the cleaning tool storage tank, the cleaning surface of the second cleaning tool can be immersed in the processing liquid stored in the storage space, thereby keeping the cleaning surface of the second cleaning tool stored in the cleaning tool storage section in a wet state with a simple configuration.

[0159] (Item 3) In the substrate processing apparatus according to item 2, the cleaning tool storage tank has a plurality of the storage spaces, and is configured such that, when the second cleaning tool is stored in one of the plurality of storage spaces, the connecting portion of the cleaning tool holder can be connected to the connected portion of the second cleaning tool; The cleaning tool storage section includes: The cleaning device further includes a position changing unit that changes a positional relationship between the second cleaning tool and the cleaning tool storage tank by moving at least one of the second cleaning tool and the cleaning tool storage tank, The control unit may control the position change unit while the second cleaning tool is stored in another storage space among the plurality of storage spaces, to move the second cleaning tool held in the other storage space from the other storage space to the one storage space.

[0160] In this case, a plurality of cleaning tools including the second cleaning tool can be stored in the plurality of storage spaces. According to the above configuration, a position on one of the storage spaces of the cleaning tool storage tank can be used as an attachment position for attaching the second cleaning tool to the cleaning tool holder.

[0161] (4) In the substrate processing apparatus according to the third aspect, The position change unit is A horizontal movement unit that moves the second cleaning tool in a horizontal direction; The cleaning device may further include a lifting and lowering part that moves the second cleaning tool in a vertical direction.

[0162] In this case, the second cleaning tool moves horizontally and vertically among the multiple storage spaces.

[0163] (5) In the substrate processing apparatus according to the above (4), the lifting and lowering unit is configured to be able to move the second cleaning tool between a lower height position when the second cleaning tool is stored in any one of the plurality of storage spaces and an upper height position when the second cleaning tool is located above a liquid level of the processing liquid stored in the cleaning tool storage tank, When moving the second cleaning tool held in the other storage space to the first storage space, the control unit may control the horizontal movement unit and the lifting movement unit to raise the second cleaning tool held in the other storage space from the lower height position to the upper height position, move the second cleaning tool at the upper height position horizontally to a position above the first holding space, and lower the second cleaning tool that has been moved to a position above the holding space from the upper height position to the lower height position.

[0164] In this case, the second cleaning tool does not move horizontally while in contact with the processing liquid stored in the cleaning tool storage tank. Therefore, the liquid surface of the processing liquid stored in the cleaning tool storage tank is less likely to be disturbed. As a result, the processing liquid is prevented from leaking out of the cleaning tool storage tank.

[0165] (Item 6) In the substrate processing apparatus according to any one of items 3 to 5, The plurality of storage spaces are formed so as to be in communication with each other and aligned in a horizontal plane, The cleaning tool storage tank has a processing liquid inlet for introducing the processing liquid into a storage space located at one end of the plurality of storage spaces; The storage device may further include a treatment liquid outlet for discharging the treatment liquid stored in the storage spaces from a storage space located at the other end of the storage spaces.

[0166] In this case, the processing liquid can be smoothly circulated among the storage spaces. Therefore, while the second cleaning tool is stored in the cleaning tool storage tank, the cleaning surface of the second cleaning tool can be constantly immersed in fresh processing liquid that is supplied.

[0167] (Item 7) In the substrate processing apparatus according to any one of items 3 to 6, the cleaning tool holder moving device moves the cleaning tool holder so as to trace a straight line or a circular arc passing through a center of the substrate in a plan view when cleaning the substrate with the first cleaning tool or the second cleaning tool; The one storage space of the cleaning tool storage tank may overlap the one straight line or the one circular arc in a plan view.

[0168] In this case, after the substrate is cleaned with the first cleaning tool, the cleaning tool holder from which the first cleaning tool has been removed can be smoothly moved to above one of the storage spaces of the cleaning tool storage tank. [Explanation of symbols]

[0169] 1 ... substrate processing apparatus, 10 ... substrate holding device, 11 ... spin base, 12 ... holding pin, 13 ... substrate holding drive unit, 14 ... substrate rotation drive unit, 20 ... cup device, 21 ... cup body, 22 ... cup lift drive unit, 30 ... nozzle device, 31 ... fluid nozzle, 32 ... fluid supply system, 40 ... brush arm device, 41 ... brush arm, 42 ... brush holding unit, 43 ... guide rail, 44 ... arm support unit, 44S ... rotation shaft, 45 ... arm horizontal drive unit, 46, 48 ... arm lift drive unit, 47 ... arm rotation drive unit, 49 ... waiting pod, 50 ... brush device, 51 ... brush , 51S... cleaning surface, 52... brush support, 53... brush mounting portion, 53S... supported surface, 54... recess, 54S... bottom surface, 55... flange portion, 56... connected column, 56a... first groove portion, 56b... second groove portion, 60... brush disposal portion, 61... removal structure, 70... brush storage device, 80... brush liquid supply system, 81, 91... piping, 90... brush liquid discharge system, 100... brush storage tank, 101... upper surface, 102... lower surface, 103... first side surface, 104... second side surface, 105... first end surface, 106... second end surface, 107a... liquid inlet, 107b... liquid outlet, 110... brush Brush storage hole, 110a...first storage space, 110b...second storage space, 110c...third storage space, 110d...fourth storage space, 111...bottom surface of storage hole, 112...brush guide portion, 113...brush support surface, 200...brush support body, 201...support plate, 202...first side wall, 203...second side wall, 204...notch, 205a, 205b...opposing surface, 210...storage brush horizontal drive portion, 220...storage brush lift drive portion, 221...air cylinder, 222...lift shaft, 223...connecting member, 400...brush device connection portion, 410...shaft member, 420...connection Main body, 421...first cylinder, 421h...inner opening, 421i...outer opening, 422...second cylinder, 431...pressing member, 431S...pressed surface, 431T...ball pressing surface, 432...spring, 440...casing, 490...steel ball, 510...tank horizontal drive unit, 520...tank lift drive unit, 900...control unit, 901...CPU, 902...RAM, 903...ROM, 904...storage device, 909...CD-ROM, CH...chamber, GH...guide hole, L1...virtual straight line, L2...virtual arc, P1...standby position, P2...removal position, P3...mounting position, SC...center of rotation, W...substrate

Claims

1. A substrate holder for holding a substrate; a first cleaning tool and a second cleaning tool each having a connection portion and a cleaning surface; a cleaning tool holder that has a connecting portion that is detachable to the connected portions of the first cleaning tool and the second cleaning tool, and that holds the first cleaning tool and the second cleaning tool by connecting the connecting portion to the connected portions; a cleaning tool storage section that is provided at a position separated from the substrate held by the substrate holding section and that temporarily stores the second cleaning tool while the first cleaning tool is held by the cleaning tool holding section; a cleaning tool holder moving device that moves the cleaning tool holder so that the cleaning surface of the first cleaning tool or the second cleaning tool held by the cleaning tool holder comes into contact with the substrate, and moves the cleaning tool holder to the cleaning tool storage unit; a processing liquid supply unit that supplies a predetermined processing liquid to the cleaning tool storage unit; A control unit. the control unit controls the cleaning tool holder moving device while the cleaning tool holder holds the first cleaning tool to clean the substrate held by the substrate holding unit, and after the first cleaning tool used to clean the substrate is removed from the cleaning tool holder, controls the cleaning tool holder moving device to connect the connecting portion of the cleaning tool holder to the connected portion of the second cleaning tool temporarily stored in the cleaning tool storage unit, a cleaning tool storage unit configured to maintain the cleaning surface of the temporarily stored second cleaning tool in a wet state with the processing liquid supplied from the processing liquid supply unit,

2. the cleaning tool storage section includes a cleaning tool storage tank having a storage space that opens upward and can store the second cleaning tool by accommodating at least a portion of the second cleaning tool including the cleaning surface; The substrate processing apparatus according to claim 1 , wherein the cleaning tool storage tank is configured to be capable of storing the processing liquid supplied from the processing liquid supply unit in the storage space.

3. the cleaning tool storage tank has a plurality of the storage spaces, and is configured such that, when the second cleaning tool is stored in one of the plurality of storage spaces, the connecting portion of the cleaning tool holder can be connected to the connected portion of the second cleaning tool; The cleaning tool storage section includes: a position changing unit that changes a positional relationship between the second cleaning tool and the cleaning tool storage tank by moving at least one of the second cleaning tool and the cleaning tool storage tank; 3. The substrate processing apparatus according to claim 2, wherein the control unit controls the position change unit while the second cleaning tool is stored in another storage space among the plurality of storage spaces, thereby moving the second cleaning tool held in the other storage space from the other storage space to the one storage space.

4. The position change unit is A horizontal movement unit that moves the second cleaning tool in a horizontal direction; The substrate processing apparatus according to claim 3 , further comprising a lifting and lowering unit that moves the second cleaning tool in a vertical direction.

5. the lifting and lowering unit is configured to be able to move the second cleaning tool between a lower height position when the second cleaning tool is stored in any one of the plurality of storage spaces and an upper height position when the second cleaning tool is located above a liquid level of the processing liquid stored in the cleaning tool storage tank, 5. The substrate processing apparatus according to claim 4, wherein, when the control unit moves the second cleaning tool held in the other storage space to the first storage space, the control unit controls the horizontal movement unit and the lifting movement unit to raise the second cleaning tool held in the other storage space from the lower height position to the upper height position, move the second cleaning tool at the upper height position horizontally to a position above the first holding space, and lower the second cleaning tool that has moved to the position above the holding space from the upper height position to the lower height position.

6. The plurality of storage spaces are formed so as to be in communication with each other and aligned in a horizontal plane, The cleaning tool storage tank has a processing liquid inlet for introducing the processing liquid into a storage space located at one end of the plurality of storage spaces; The substrate processing apparatus according to any one of claims 3 to 5, further comprising a processing liquid outlet for discharging the processing liquid stored in the storage spaces from a storage space located at the other end of the storage spaces.

7. the cleaning tool holder moving device moves the cleaning tool holder so as to trace a straight line or a circular arc passing through a center of the substrate in a plan view when cleaning the substrate with the first cleaning tool or the second cleaning tool; 6. The substrate processing apparatus according to claim 3, wherein the one storage space of the cleaning tool storage tank overlaps with the one straight line or the one circular arc in a plan view.

Images