Stage position detection method and exposure equipment

Abstract

To provide technique enabling stage position to be highly accurately and inexpensively detected.SOLUTION: Exposure equipment 100 is equipped with a stage 2, a stage moving mechanism 3, an exposure head 51, a first moving member 68, a first edge sensor 61, and a control unit 9. The stage 2 has an upper surface 2S that supports a substrate W. The stage moving mechanism 3 moves the stage 2 in the Y direction. The exposure head 51 can apply light to the substrate W supported on the upper surface 2S of the stage 2. The first moving member 68 can move together with the stage 2 and has a first edge E1 that extends in the Y direction. The first edge sensor 61 detects the X position of the first edge E1. The stage position detection unit 951 of the control unit 9 calculates a Y position of the stage 2 using the X position of the first edge E1 detected by the first edge sensor 61.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The subject matter disclosed herein relates to a stage position detection method and an exposure apparatus. [Background technology]

[0002] For example, exposure apparatuses that perform direct writing by light irradiation are known as a method for forming a pattern on a substrate such as a semiconductor wafer or a glass substrate. In this type of exposure apparatus, a substrate on which a photosensitive layer such as a resist is formed is held on a stage, and the stage is moved in the main scanning direction. Then, a pattern light is emitted from an exposure head according to the position of the stage in the main scanning direction, and a predetermined pattern is written on the photosensitive layer.

[0003] In such an exposure apparatus, when the stage is moved, the stage may meander and displace in an unexpected direction. When such a displacement occurs, the pattern may not be formed as specified, and distortion of the pattern may occur. Therefore, techniques for measuring the amount of displacement of the stage have been proposed.

[0004] For example, Patent Document 1 describes a method of detecting the position of a stage by using a laser interferometer that irradiates a reflecting mirror provided on the stage with laser light and measures the amount of movement of the stage based on the reflected light. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Publication No. 10-038518 Summary of the Invention [Problem to be solved by the invention]

[0006] However, because the conventional technology uses a laser interferometer, there is a problem that the measurement accuracy decreases when the measurement distance becomes long because the laser light is affected by air fluctuations. Also, since laser interferometers are generally expensive, there is a problem that the equipment cost increases significantly.

[0007] An object of the present invention is to provide a technique that can detect the stage position with high accuracy and at low cost. [Means for solving the problem]

[0008] In order to solve the above problem, a first aspect is a stage position detection method including: a) a step of moving a stage in a first direction; b) a step of projecting a first light from a first projection unit toward a first edge of a moving member that moves together with the stage in step a), and detecting a position of the first edge in a second direction intersecting the first direction based on an incidence position at which the first light is incident on a first detector; and c) a step of calculating a position of the stage using the position of the first edge detected in step b).

[0009] A second aspect is the stage position detection method of the first aspect, wherein the first edge extends toward the first direction at an angle to one side of the second direction, and step c) is a step of calculating the position of the stage in the first direction.

[0010] A third aspect is a stage position detection method of the second aspect, wherein the first edge extends in a zigzag pattern with alternating portions inclined in one direction of the second direction toward the first direction and portions inclined in the other direction of the stage second direction toward the first direction.

[0011] A fourth aspect is the stage position detection method of the third aspect, further including a step d) of projecting a second light from a second projection unit toward a second edge of the movable member, and detecting a second position of the second edge in the second direction based on an incident position at which the second light is incident on a second detector, and step c) includes a step of calculating the position of the stage in the first direction using the position of the first edge detected by step b) and the position of the second edge detected by step d).

[0012] A fifth aspect is a stage position detection method of the fourth aspect, in which the step c) includes the steps of: c-1) calculating the position of the stage in the first direction using the position of the first edge when the position of the first edge detected by the step b) is within a predetermined measurable area in the second direction; and c-2) calculating the position of the stage in the first direction using the position of the second edge detected by the step d) when the position of the first edge detected by the step b) is outside the measurable area.

[0013] A sixth aspect is the stage position detection method according to the second or third aspect, wherein the first edge is displaced toward the first direction at a constant inclination toward the second direction.

[0014] A seventh aspect is the stage position detection method according to the sixth aspect, wherein the first edge is inclined at an angle of 45° or more with respect to the first direction.

[0015] An eighth aspect is a stage position detection method of the second or third aspect, further including a step e) of projecting a third light from a third projection unit toward a third edge of the movable member, and detecting the position of the third edge in the second direction based on the incident position at which the third light is incident on a third detector, wherein the third edge extends parallel to the first direction, and step c) includes a step of correcting the position of the first edge detected by step b) in accordance with the position of the third edge detected by step e).

[0016] A ninth aspect is a stage position detection method of the first or second aspect, in which the step c) includes a step of calculating a position of the stage from the position of the first edge using a conversion equation obtained based on a shape of the first edge, or a conversion equation obtained from a relationship between an actual measurement value of the position of the first edge and an actual measurement value of the position of the stage.

[0017] A tenth aspect is an exposure apparatus comprising: a stage having a support surface for supporting a substrate; a stage moving mechanism for moving the stage in a first direction; an exposure head capable of irradiating light toward the substrate supported on the support surface of the stage; a moving member movable together with the stage and having a first edge extending in the first direction; a first edge sensor for detecting a position of the first edge in a second direction intersecting the first direction; and a stage position calculation unit for calculating a position of the stage using the position of the first edge detected by the first edge sensor. Effect of the Invention

[0018] According to the stage position detection methods of the first to ninth aspects and the exposure apparatus of the tenth aspect, the position of the stage is calculated by detecting the position of the first edge that moves together with the stage, so that the position of the stage can be detected accurately and at low cost.

[0019] According to the stage position detection method of the second aspect, the position of the stage in the first direction can be calculated by detecting the position of the first edge in the second direction.

[0020] According to the stage position detection method of the third aspect, the width of the first edge in the second direction can be reduced.

[0021] According to the stage position detection method of the fourth aspect, the position of the stage can be calculated by detecting the position of the second edge in the second direction.

[0022] According to the stage position detection method of the fifth aspect, when the detected position of the first edge is outside the measurable area, the position of the stage is calculated using the position of the second edge instead of the position of the first edge, thereby improving the calculation accuracy of the stage position.

[0023] According to the stage position detection method of the sixth aspect, the position of the stage in the first direction can be calculated from the detected position of the first edge and the inclination of the first edge with respect to the first direction.

[0024] According to the seventh aspect of the stage position detection method, the ratio of the displacement of the first edge in the second direction to the displacement of the stage in the first direction can be increased, which allows the position of the first edge to be detected with higher accuracy, and therefore the position of the stage to be calculated with higher accuracy.

[0025] According to the stage position detection method of the eighth aspect, the displacement of the stage in the second direction can be detected by the third edge, and therefore, by correcting the detected position of the first edge with the position of the third edge, the displacement of the first edge itself in the second direction can be corrected.

[0026] According to the stage position detection method of the ninth aspect, the position of the stage can be calculated using a conversion formula. [Brief description of the drawings]

[0027] [Figure 1] 1 is a perspective view of an exposure apparatus according to an embodiment. [Diagram 2] 4 is a perspective view showing a first edge sensor, a second edge sensor, and a portion of a first moving member. FIG. [Diagram 3] 4 is an enlarged top view showing a portion of the first edge and the second edge. FIG. [Figure 4] 4 is a diagram showing the corresponding relationship between the Y position of the stage and the X position detected by the first edge sensor and the second edge sensor. FIG. [Diagram 5] 13 is a perspective view showing a third edge sensor and a portion of a second moving member. FIG. [Figure 6] 13 is a diagram showing a change over time in the X position of the third edge detected as the stage moves in the Y direction. FIG. [Figure 7] 2 is a block diagram showing a configuration of a control unit shown in FIG. 1. [Figure 8] 2 is a diagram showing a flow of processing executed by a control unit shown in FIG. 1. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0028] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples, and are not intended to limit the scope of the present invention. In the drawings, the dimensions and numbers of each part may be exaggerated or simplified as necessary for ease of understanding.

[0029] In each drawing, in order to facilitate understanding of the positional relationships of the elements in exposure apparatus 100, an XYZ Cartesian coordinate system is appropriately provided, with the X-axis and Y-axis directions being horizontal and the Z-axis direction being vertical. The tip of the arrow is the positive side (+ side), and the opposite side is the negative side (- side). The +Z direction is upward, and the -Z direction is downward. Furthermore, the position of an object in the X direction is simply referred to as the "X position," and the position of an object in the Y direction is simply referred to as the "Y position."

[0030] <1. Embodiment> 1 is a perspective view of an exposure apparatus 100 according to an embodiment. The exposure apparatus 100 is an apparatus that draws a pattern by irradiating light onto the upper surface of a substrate W on which a layer of a photosensitive material (photosensitive layer) such as resist has been formed. The substrate W is, for example, a semiconductor substrate, a printed circuit board, a substrate for a color filter, a glass substrate for a flat panel display used in a weather display device or a plasma display device, or a substrate for an optical disk. The exposure apparatus 100 includes a base 1, a stage 2, a stage moving mechanism 3, a gantry 4, an exposure unit 5, a measurement unit 6, and a control unit 9.

[0031] The base 1 has a rectangular shape when viewed from above, and supports a stage 2, a stage moving mechanism 3, a gantry 4, an exposure unit 5, and a measurement part 6 from below.

[0032] The stage 2 has an upper surface 2S that holds the substrate W. The upper surface 2S is a horizontal surface parallel to the X and Y directions. The substrate W is placed on the upper surface 2S in a horizontal position. The upper surface 2S has a plurality of suction holes formed therein. The stage 2 can fix the substrate W to the upper surface 2S by applying a negative pressure (suction pressure) to the suction holes. Note that a chuck that grips the periphery of the substrate W may be provided on the upper surface 2S, and the substrate W may be fixed to the upper surface 2S by the chuck. The upper surface 2S is an example of a support surface.

[0033] The stage moving mechanism 3 is a mechanism that moves the stage 2 in the main scanning direction (Y direction), the sub-scanning direction (X-axis direction), and a rotation direction (rotation direction around the Z axis (θ-axis direction)). The stage moving mechanism 3 has a support plate 31, a sub-scanning mechanism 32, a base plate 33, a main scanning mechanism 34, and a rotation mechanism 35.

[0034] The support plate 31 is disposed below the stage 2 and rotatably supports the stage 2. The base plate 33 is disposed below the support plate 31 and supports the support plate 31 and the sub-scanning mechanism 32. The sub-scanning mechanism 32 moves the support plate 31 in the sub-scanning direction, that is, the X direction, relative to the base plate 33. The main scanning mechanism 34 moves the base plate 33 in the main scanning direction, that is, the Y direction, relative to the base 1. The sub-scanning mechanism 32 and the main scanning mechanism 34 are, for example, a linear motor mechanism including a linear motor and a guide, or a ball screw mechanism including a rotary motor, a ball screw, and a guide. The rotation mechanism 35 is provided on the support plate 31 and rotates the stage 2 about a rotation axis OA extending in the Z direction. The sub-scanning mechanism 32, the main scanning mechanism 34, and the rotation mechanism 35 operate based on a control command from the control unit 9.

[0035] The gantry 4 is fixed to the base 1. The gantry 4 has two support columns 41 and a beam 43. The lower part of the support column 41 is fixed to the base 1 and extends in the Z direction. The two support columns 41 are arranged at an interval in the X direction. The beam 43 connects the upper parts of the two support columns 41 and extends in the X direction. In this example, the stage 2 and the base plate 33 of the stage moving mechanism 3 are arranged between the two support columns 41 in the X direction, and the beam 43 is arranged above the stage 2.

[0036] The gantry 4 is a member that supports the exposure unit 5 and the measurement unit 6. Each exposure head 51 of the exposure unit 5 and the measurement unit 6, which will be described later, are fixed to the −Y side surface of a beam portion 43 in the gantry 4.

[0037] The exposure unit 5 has one or more exposure heads 51. In this example, five exposure heads 51 are arranged along the X-axis direction. Each exposure head 51 has a spatial light modulator 510. The spatial light modulator 510 modulates laser light based on strip data corresponding to a drawing pattern.

[0038] The exposure unit 5 has a light irradiation section 53. The light irradiation section 53 irradiates the exposure head 51 with laser light. The light irradiation section 53 is housed, for example, inside the gantry 4. The light irradiation section 53 has a laser driving section 531, a laser oscillator 533, and an illumination optical system 535. By operation of the laser driving section 531, the laser oscillator 533 emits laser light to the illumination optical system 535. The illumination optical system 535 changes the magnification of the laser light incident from the laser oscillator 533, and uniformizes the light amount distribution. The laser light emitted from the illumination optical system 535 is irradiated onto the spatial light modulator 510 of each exposure head 51.

[0039] The spatial light modulator 510 spatially modulates the laser light irradiated from the light irradiation unit 53 on a channel-by-channel basis, and reflects necessary light that contributes to drawing a pattern and unnecessary light that does not contribute to drawing a pattern in different directions. Note that spatially modulating light means changing the spatial distribution (amplitude, phase, polarization, etc.) of light. The exposure head 51 irradiates the modulated laser light onto the substrate W moving directly below the exposure head 51. As a result, the drawing pattern is exposed onto the unprocessed substrate W.

[0040] The spatial light modulator 510 may be, for example, a grating type optical element such as a GLV (Grating Light Valve, a registered trademark of Silicon Light Machines, Inc.) or a DMD (Digital Mirror Device).

[0041] The measurement unit 6 is a device for measuring the position of the stage 2. The measurement unit 6 has a first edge sensor 61, a second edge sensor 62, a third edge sensor 63, a first moving mechanism 64, a second moving mechanism 65, connecting members 66 and 67, a first moving member 68, and a second moving member 69.

[0042] The first edge sensor 61 and the second edge sensor 62 are disposed so as to detect edges (a first edge E1 and a second edge E2 described later) of a first light-shielding portion 681 formed on the first moving member 68. The third edge sensor 63 is disposed so as to detect an edge (a third edge E3 described later) of a second light-shielding portion 691 formed on the second moving member 69.

[0043] The first edge sensor 61 and the second edge sensor 62 are fixed to the inside of a U-shaped support member 610 whose -X side is closed. The third edge sensor 63 is fixed to the inside of a U-shaped support member 630 whose +X side is closed. When the stage 2 moves in the Y direction, the first moving member 68 is inserted into the inside of the support member 610, and the second moving member 69 is inserted into the inside of the support member 630. This enables the first edge sensor 61 and the second edge sensor 62 to detect the edge of the first light-shielding portion 681 of the first moving member 68, and the third edge sensor 63 to detect the edge of the second light-shielding portion 691 of the second moving member 69.

[0044] The first moving mechanism 64 is a mechanism for moving the first edge sensor 61 and the second edge sensor 62 in the X direction together. The first edge sensor 61 and the second edge sensor 62 are connected to the first moving mechanism 64 via a connecting member 66 extending in the Z direction. When the first moving mechanism 64 moves the connecting member 66 in the X direction, the first edge sensor 61 and the second edge sensor 62 move in the X direction. The second moving mechanism 65 is a mechanism for moving the third edge sensor 63 in the X direction. The third edge sensor 63 is connected to the second moving mechanism 65 via a connecting member 67 extending in the Z direction. When the second moving mechanism 65 moves the connecting member 67 in the X direction, the third edge sensor 63 moves in the X direction. The first moving mechanism 64 and the second moving mechanism 65 are, for example, configured by a ball screw mechanism or a linear motor mechanism. The first moving mechanism 64 and the second moving mechanism 65 are electrically connected to the control unit 9 and operate in response to a control command from the control unit 9.

[0045] The first moving member 68 and the second moving member 69 are fixed to the stage 2 and can move together with the stage 2. The first moving member 68 and the second moving member 69 are plate-shaped members extending in the Y direction. The first moving member 68 and the second moving member 69 extend from the +Y side end to the -Y side end of the stage 2. The first moving member 68 and the second moving member 69 are longer in the Y direction than the substrate W supported by the stage 2. When the substrate W is supported by the stage 2, the substrate W is disposed inside both ends of the first moving member 68 and inside both ends of the second moving member 69 in the Y direction. The first moving member 68 and the second moving member 69 are disposed at the same height as the upper surface 2S of the stage 2 in the Z direction. The first moving member 68 is disposed adjacent to the -X side of the upper surface 2S, and the second moving member 69 is disposed adjacent to the +X side of the upper surface 2S.

[0046] The first moving member 68 and the second moving member 69 are made of a material with high light transmittance, such as quartz glass. The first moving member 68 and the second moving member 69 have a first light shielding portion 681 and a second light shielding portion 691, respectively. The first light shielding portion 681 and the second light shielding portion 691 are portions that block light, and are formed, for example, by etching a chrome film. The first light shielding portion 681 and the second light shielding portion 691 may be formed by performing processing such as cutting on a member having light shielding properties.

[0047] Fig. 2 is a perspective view showing the first edge sensor 61, the second edge sensor 62, and a portion of the first moving member 68. Fig. 3 is an enlarged top view showing a portion of the first edge E1 and the second edge E2.

[0048] The first light-shielding portion 681 of the first moving member 68 has a first edge E1 and a second edge E2. The first edge E1 is located at the end of the first light-shielding portion 681 on the -X side, and the second edge E2 is located at the end of the first light-shielding portion 681 on the +X side. The first edge E1 and the second edge E2 extend from the +Y side end to the -Y side end of the stage 2. When the substrate W is supported by the stage 2, the substrate W is disposed inside both ends of the first edge E1 in the Y direction. The substrate W is also disposed inside both ends of the second edge E2 in the Y direction. The first edge E1 and the second edge E2 are displaced in the X direction toward the +Y direction, which is one side of the Y direction, and are also periodically displaced in the X direction toward the Y direction. Specifically, as shown in Fig. 3, the first edge E1 is a line formed by connecting two equal sides (sides AB and BC) of an isosceles triangle consisting of three points A, B, and C along the Y direction. As a result, the first edge E1 is bent in a zigzag shape by alternating a straight line portion (side AB) that is inclined toward the -X side by an angle α toward the -Y side and a straight line portion (side BC) that is inclined toward the +X side toward the -Y side. The angle α is the base angle of the isosceles triangle ABC. The second edge E2 has the same shape as the first edge E1, so a description thereof will be omitted.

[0049] 3, the second edge E2 is disposed so as to be shifted by a predetermined length in the Y direction with respect to the first edge E1. Specifically, the first edge E1 and the second edge E2 are disposed so that the peak (point B) and valley (points A, C) of one are not at the same position as the peak and valley of the other in the Y direction.

[0050] As shown in FIG. 2, the first edge sensor 61 has a first projection unit 611 and a first detector 613. The first detector 613 faces the first projection unit 611 in the Z direction. In the Y direction, the first detector 613 is disposed on the opposite side of the first moving member 68 from the first projection unit 611. The first projection unit 611 projects a thin linear first light LB1 extending in the X direction toward the first edge E1 of the first moving member 68. The first detector 613 has a detection surface extending in the X direction, and receives the first light LB1 projected by the first projection unit 611 on the detection surface. The first projection unit 611 has a light source such as an LED (Light Emitting Diode). The first detector 613 has a PSD (Position Sensitive Detector) or a CMOS (Complementary Metal Oxide Semiconductor).

[0051] The second edge sensor 62 has the same configuration as the first edge sensor 61. That is, the second edge sensor 62 has a second projection unit 621 and a second detector 623. The second detector 623 faces the second projection unit 621 in the Z direction. The second detector 623 is disposed on the opposite side of the first moving member 68 from the second projection unit 621. The second projection unit 621 projects a thin linear second light LB2 extending in the X direction toward the second edge E2 of the first moving member 68. The second detector 623 has a detection surface extending in the X direction, and receives the second light LB2 projected by the second projection unit 621 on the detection surface.

[0052] 2, the first light LB1 emitted from the first projection unit 611 is irradiated to the first light shielding unit 681 so as to cross the first edge E1 in the X direction. That is, as shown in FIG. 3, the +X side end of the first light LB1 is disposed on the +X side of the valley portion (points A, C) which is the +X side end of the first edge E1, and the -X side end of the first light LB1 is disposed on the -X side of the peak portion (apex B) which is the -X side end of the first edge E1. Similarly to the first light LB1, the second light LB2 is also irradiated to the second light shielding unit 691 so as to cross the second edge E2 in the X direction.

[0053] When the first light LB1 is projected toward the first edge E1, a part of the first light LB1 is blocked by the first light blocking portion 681. Therefore, of the projected first light LB1, the light that passes outside the first edge E1 of the first light blocking portion 681 is incident on the first detector 613. The first detector 613 detects the X position of the first edge E1 in the X direction by detecting the incident position of the first light LB1 (more specifically, the position of the +X side end of the area where the light is received). Similarly to the first detector 613, the second detector 623 also detects the position of the second edge E2 in the X direction by detecting the incident position of the second light LB2 (more specifically, the position of the -X side end of the area where the light is received). The first edge sensor 61 and the second edge sensor 62 are electrically connected to the control unit 9, and transmit signals indicating the X positions of the first edge E1 and the second edge E2 detected by the first detector 613 and the second detector 623 to the control unit 9.

[0054] 3, when the stage 2 moves in the +Y direction, causing the first edge E1 to move in the +Y direction together with the stage 2, the first detector 613 moves relatively with respect to the first edge E1 from the position indicated by the dashed line to the position indicated by the solid line. If the displacement amount of the stage 2 in the Y direction is ΔY and the displacement amount of the X position of the first edge E1 detected by the first edge sensor 61 is ΔX, the displacement amount ΔY is expressed by the following equation using the displacement amount ΔX and the angle α.

[0055] (Equation 1) ΔY = ΔX / tan α

[0056] When the angle α is 45°, ΔY:ΔX is 1:1, and the displacement ΔX and change ΔY are the same. Here, if you want to improve the measurement accuracy of the displacement ΔY, you can increase the rate of change of the displacement ΔX relative to the displacement ΔY. In other words, by making the angle α larger than 45° (i.e., making the apex angle (∠ABC) of the isosceles triangle ABC an acute angle), ΔY:ΔX can be made 1:N (where N>1).

[0057] Fig. 4 is a diagram showing the correspondence relationship between the Y position of the stage 2 and the X position detected by the first edge sensor 61 and the second edge sensor 62. Fig. 4(A) is a diagram showing a correspondence relationship G1 between the Y position of the stage 2 and the X position of the first edge E1 detected by the first edge sensor 61. Fig. 4(B) is a diagram showing a correspondence relationship G2 between the Y position of the stage 2 and the X position of the second edge E2 detected by the second edge sensor 62. In Fig. 4, the vertical axis indicates the X position detected by the first edge sensor 61 or the second edge sensor 62, and the horizontal axis indicates the Y position of the stage 2.

[0058] As shown in Fig. 4(A) and (B), the X position detected by the first edge sensor 61 and the second edge sensor 62 periodically increases and decreases as the stage 2 moves in one direction in the Y direction. When the side AB of the first edge E1 shown in Fig. 3 is detected by the first edge sensor 61, when the stage 2 moves in the +Y direction, the detected X position changes in the negative direction, and when the stage 2 moves in the -Y direction, the detected X position changes in the positive direction. That is, the region of the side AB of the first edge E1 corresponds to the part in the correspondence relationship G1 where the inclination is negative. On the other hand, when the side BC of the first edge E1 is detected by the first edge sensor 61, when the stage 2 moves in the +Y direction, the detected X position changes in the positive direction, and when the stage 2 moves in the -Y direction, the detected X position changes in the negative direction. That is, the region of the side BC corresponds to the part in the correspondence relationship G1 where the inclination is positive. In addition, in the second edge E2, the region of side BC corresponds to the portion in correspondence relationship G2 where the inclination is negative, and the region of side AB corresponds to the portion in correspondence relationship G2 where the inclination is positive.

[0059] In addition, since the first edge E1 and the second edge E2 are arranged with a shift, the phases of the correspondence relationship G1 and the correspondence relationship G2 are shifted from each other.

[0060] From the fluctuation of the X-position measured near the peaks and valleys (points A, B, C) of the first edge E1 and the second edge E2, it is difficult to distinguish whether the stage 2 is moving in the +Y direction or the -Y direction. For this reason, a measurable area is set in advance for each of the first edge sensor 61 and the second edge sensor 62 so as not to use the measurement results of the peaks and valleys of the first edge E1. In detail, an upper limit value TH1 and a lower limit value TL1 that indicate the measurable area are set for the first edge sensor 61. Furthermore, an upper limit value TH2 and a lower limit value TL2 that indicate the measurable area are set for the second edge sensor 62.

[0061] Then, if the X position detected by the first edge sensor 61 is within the measurable area, that X position is used to calculate the Y position of the stage 2. On the other hand, if the X position detected by the first edge sensor 61 is outside the measurable area, the X position detected by the second edge sensor 62 is used to calculate the Y position of the stage 2. Also, if the X position detected by the second edge sensor 62 is within the measurable area, that X position is used to calculate the Y position of the stage 2. Then, if the X position detected by the second edge sensor 62 is outside the measurable area, the X position detected by the first edge sensor 61 is used.

[0062] In this manner, in this embodiment, the X-position data used to calculate the Y-position of the stage 2 (hereinafter referred to as "calculation data") is switched between the X-position data detected by the first edge sensor 61 and the X-position data detected by the second edge sensor 62. Furthermore, the positions of the first edge E1 and the second edge E2, and the upper limit values ​​TH1, TH2 and lower limit values ​​TL1, TL2 of the measurable area are set so that either the first edge sensor 61 or the second edge sensor 62 can detect the X-position of the measurable area.

[0063] 4(C) is a diagram conceptually showing the switching of calculation data. In the following description, the data of the X position detected by the first edge sensor 61 is simply referred to as "first data." Moreover, the data of the X position detected by the second edge sensor 62 is simply referred to as "second data." Among the first data, data corresponding to the region where the slope is positive in the correspondence relationship G1 is referred to as "first data a," and data corresponding to the region where the slope is negative in the correspondence relationship G1 is referred to as "first data c." Among the second data, data corresponding to the region where the slope is positive in the correspondence relationship G2 is referred to as "second data b," and data corresponding to the region where the slope is negative in the correspondence relationship G2 is referred to as "second data d."

[0064] First, consider the case where the stage 2 moves in the +Y direction. In this case, as shown in Fig. 4(C), the calculation data is switched in a clockwise direction (i.e., the first data a → the second data b → the first data c → the second data d → the first data a).

[0065] First, when the first data a is within the measurable range (i.e., when the first data a is equal to or greater than the lower limit TL1 and equal to or less than the upper limit TU1), the first data a is used as calculation data. The first data a is data in the range where the slope of the correspondence relationship G1 is positive. Therefore, the sign of the first data a is not inverted and the data is used as is. When the first data a falls outside the measurable range (i.e., when the first data a exceeds the upper limit value TU1), the calculation data is switched to the second data b. Note that the second data b, like the first data a, is also data in the range in which the slope of the correspondence relationship G2 is positive. Therefore, the sign of the second data b is not inverted and the data is used as is. When the second data b falls outside the measurable range (i.e., when the second data b exceeds the upper limit value TU2), the calculation data is switched to the first data c. The first data c is data in a range where the slope in the correspondence relationship G1 is negative. Therefore, in order to calculate the Y position that changes in the positive direction, the sign of the first data c is inverted and used. When the first data c falls outside the measurable range (i.e., when the first data c exceeds (falls below) the lower limit TL1), the calculation data is switched to the second data d. The second data d is also data in the range where the slope of the correspondence relationship G2 is negative. Therefore, the sign of the second data d is inverted before use. When the second data d falls outside the measurable range (i.e., when the second data d exceeds (falls below) the lower limit TL2), the calculation data is switched back to the first data a. As described above, the calculation data is switched sequentially between the first data a, c and the second data b, d.

[0066] Furthermore, when the stage 2 is moved in the -Y direction, the calculation data is switched counterclockwise (i.e., the first data a -> the second data d -> the first data c -> the second data b -> the first data a) as shown in Fig. 4(C). For example, when the first data a is used as the calculation data, if the first data a exceeds (falls below) the lower limit TL1, the calculation data is switched to the second data d.

[0067] When it is necessary to recognize whether the X position of the first data or the second data changes in the positive direction or the negative direction at the start of driving the stage 2, for example, the direction (tilt) in which the X position changes may be detected by acquiring the first data and the second data while moving the stage 2 only slightly. Also, the above-mentioned measurement may be omitted by storing the initial positional relationship between the first edge sensor 61 and the first edge E1 or the initial positional relationship between the second edge sensor 62 and the second edge E2 as a parameter in advance.

[0068] The first moving member 68 is disposed at the same height in the Z direction as the upper surface 2S of the stage 2. That is, the first edge E1 and the second edge E2 of the first light shielding portion 681 are positioned at the same height as the substrate W. This makes it possible to measure the displacement of a portion of the stage 2 close to the substrate W, thereby improving the exposure accuracy.

[0069] 5 is a perspective view showing the third edge sensor 63 and a part of the second moving member 69. The second light-shielding portion 691 of the second moving member 69 has a third edge E3. The third edge E3 is located at the end of the second light-shielding portion 691 on the +X side. The third edge E3 is a straight line extending parallel to the Y direction.

[0070] The third edge sensor 63 has the same configuration as the first edge sensor 61. That is, the third edge sensor 63 has a third projection unit 631 and a third detector 633. The third detector 633 faces the third projection unit 631 in the Z direction. The third detector 633 is disposed on the opposite side of the second moving member 69 to the third projection unit 631. The third projection unit 631 projects a thin linear third light LB3 extending in the X direction toward a third edge E3 of the second moving member 69. The third detector 633 has a detection surface extending in the X direction, and receives the third light LB3 projected by the third projection unit 631 on the detection surface.

[0071] 5, the third light LB3 emitted from the third projection unit 631 is irradiated onto the second light-shielding unit 691 so as to cross the third edge E3 in the X direction. That is, the +X side end of the third light LB3 is disposed on the +X side of the third edge E3, and the -X side end is disposed on the -X side of the third edge E3.

[0072] When the third light LB3 is projected toward the third edge E3, a portion of the third light LB3 is blocked by the second light blocking portion 691. Therefore, of the projected third light LB3, the light that passes through the second light blocking portion 691 outside the third edge E3 is incident on the third detector 633. The third detector 633 detects the position of the third edge E3 in the X direction by detecting the incident position of the third light LB3 (more specifically, the position of the -X side end of the light-receiving area). The third edge sensor 63 is electrically connected to the control unit 9, and transmits a signal indicating the X position of the third edge E3 detected by the third detector 633 to the control unit 9.

[0073] Preferably, the first edge sensor 61, the second edge sensor 62, and the third edge sensor 63 each perform edge detection using a common external signal (clock signal) (not shown) as a trigger. As a result, the first edge sensor 61, the second edge sensor 62, and the third edge sensor 63 perform edge detection at the same time, making it possible to obtain the X position of the first edge E1, the X position of the second edge E2, and the X position of the third edge E3 at the same time.

[0074] 6 is a diagram showing a time change G4 in the X-position of the third edge E3 detected as the stage 2 moves in the Y-direction. FIG. 6 shows a detection result when the stage 2 is moved in the Y-direction at a constant speed. When the stage 2 is moved along the Y-direction, the stage 2 may meander, causing the X-position of the stage 2 to shift. When the X-position of the stage 2 shifts, the X-position of the third edge E3 of the second moving member 69 also shifts in the same direction and by the same distance as the stage 2. For this reason, as shown in FIG. 6, the X-position of the third edge E3 is detected by the third edge sensor 63.

[0075] FIG. 7 is a block diagram showing the configuration of the control unit 9 shown in FIG. 1. The control unit 9 includes a processor such as a CPU (Central Processing Unit) and a storage unit 99. The storage unit 99 is electrically connected to the processor, and specifically includes a main storage device such as a RAM (Random Access Memory) and an auxiliary storage device such as a hard disk. The storage unit 99 stores a program P. The processor executes the program P to function as an irradiation control unit 91, a stage control unit 93, and a drawing control unit 95. Some of the functions of the control unit 9 may be realized in hardware by a dedicated circuit.

[0076] The irradiation control unit 91 controls the light irradiation unit 53 of the exposure unit 5 to cause the light irradiation unit 53 to emit a line beam of light toward the exposure head 51. The stage control unit 93 controls the stage moving mechanism 3 to move the stage 2 relative to the exposure head 51. The drawing control unit 95 controls the spatial light modulator 510 of the exposure head 51 based on the drawing recipe stored in the storage unit 99 and the Y position of the stage 2. Specifically, the drawing control unit 95 controls the drive voltage applied to each channel of the spatial light modulator 510. As a result, the drawing control unit 95 causes the spatial light modulator 510 to modulate the line beam of light so as to correspond to the drawing pattern.

[0077] In the drawing recipe, for example, pattern data indicating a drawing pattern to be formed on the substrate W and various conditions for drawing (such as the amount of light emitted from the exposure unit 5 and the moving speed of the stage 2) are described in a predetermined data format. The pattern data is, for example, data obtained by rasterizing CAD data generated using CAD (computer aided design), and position information on the substrate W to be irradiated with light is recorded in pixel units.

[0078] The writing control unit 95 has a stage position detection unit 951. The stage position detection unit 951 calculates the Y position of the stage 2 from the X positions of the first edge E1, the second edge E2, and the third edge E3 detected by the first edge sensor 61, the second edge sensor 62, and the third edge sensor 63.

[0079] The stage position detection unit 951 of the drawing control unit 95 corrects the X positions of the first edge E1 and the second edge E2 detected by the first edge sensor 61 and the second edge sensor 62 with the X position of the third edge E3 detected by the third edge sensor 63 at the same timing. When the X position of the stage 2 is shifted, the X positions of the first edge E1 and the second edge E2 on the first moving member 68 are also shifted. As a result, the X positions of the first edge E1 and the second edge E2 detected by the first edge sensor 61 and the second edge sensor 62 are shifted from the actual X positions. Therefore, the stage position detection unit 951 corrects the X positions of the first edge E1 and the second edge E2, so that the Y position of the stage 2 can be appropriately calculated.

[0080] The drawing control unit 95 also controls the first moving mechanism 64 and the second moving mechanism 65. The exposure device 100 exposes the photosensitive layer of the substrate W by alternately repeating a main scanning movement in which the stage 2 is moved in the Y direction (main scanning direction) and a sub-scanning movement in which the stage 2 is moved in the X direction (sub-scanning direction) while irradiating light from the exposure head 51. When the stage 2 is moved in the X direction, the first moving member 68 and the second moving member 69 move in the X direction together with the stage 2. The control unit 9 controls the first moving mechanism 64 and the second moving mechanism 65 to move the first edge sensor 61, the second edge sensor 62, and the third edge sensor 63 in the X direction in accordance with the movement of the stage 2 in the X direction. As a result, the positional relationship between the first edge sensor 61 and the second edge sensor 62 and the first moving member, and the positional relationship between the third edge sensor 63 and the second moving member 69 are maintained in the X direction.

[0081] Fig. 8 is a diagram showing the flow of processing executed by the control unit 9 shown in Fig. 1. The flow shown in Fig. 8 is a flow executed to acquire the Y position of the stage 2, for example, when the exposure unit 5 exposes the photosensitive layer of the substrate W. It is assumed that the X positions of the first edge sensor 61 and the second edge sensor 62 are adjusted according to the X position of the first moving member 68, and the X position of the third edge sensor 63 is adjusted according to the X position of the second moving member 69.

[0082] First, the controller 9 causes the stage controller 93 to control the stage moving mechanism 3 to start moving the stage 2 in the +Y direction (step S11). Also, in step S11, edge detection by the first edge sensor 61, the second edge sensor 62, and the third edge sensor 63 is started.

[0083] After edge detection is started, the stage position detection unit 951 acquires the X-position of the first edge E1 measured by the first edge sensor 61 (step S12). The stage position detection unit 951 determines whether the X-position of the first edge E1 acquired in step S12 is within a measurable area (step S13). In step S13, as described in FIG. 4, it is determined whether the X-position of the first edge E1 acquired in step S12 exceeds an upper limit value TU1 (or a lower limit value TL1).

[0084] If the X position of the first edge E1 is within the measurable region (YES in step S13), the stage position detection unit 951 corrects the X position of the first edge E1 using the X position of the third edge E3 detected by the third edge sensor 63 (step S14). Specifically, if the X position of the third edge E3 is deviated from the reference position by dx1 at the time the X position of the first edge E1 is detected, the stage position detection unit 951 acquires a value obtained by subtracting dx1 from the X position of the first edge E1 as the corrected X position in step S14.

[0085] If the X position detected by the first edge sensor 61 or the second edge sensor 62 contains a known measurement error, the stage position detection unit 951 may perform processing to correct the measurement error.

[0086] After step S14, the stage position detection unit 951 calculates the Y position of the stage 2 using the X position of the first edge E1 corrected in step S14 (corrected X position) (step S15). In detail, as described in Fig. 4, the displacement amount ΔX is found from the corrected X position, and the displacement amount ΔY of the stage 2 is calculated using the displacement amount ΔX and the above formula (1).

[0087] The above formula (1) is an example of a conversion formula found based on the shapes of the first edge E1 and the second edge E2. Note that instead of formula 2, a conversion formula found from the relationship between the actual measured values ​​of the X positions of the first edge E1 and the second edge E2 obtained by the first edge sensor 61 and the second edge sensor 62 and the actual measured value of the displacement amount ΔY of the stage 2 obtained by a measuring device (not shown) may be used. As the measuring device, for example, a laser length measuring device or a linear encoder provided in the main scanning mechanism 34 may be used.

[0088] After step S15, the stage position detection unit 951 determines whether to end the process (step S16). For example, when the movement of the stage 2 in the Y direction is to be ended (when the Y position of the stage 2 reaches the end position), the process is ended. On the other hand, when the process is to be continued (NO in step S16), the stage position detection unit 951 returns to step S12.

[0089] In step S13, if the X position of the first edge E1 is outside the measurable range (NO in step S13), the stage position detection unit 951 acquires the X position of the second edge E2 detected by the second edge sensor 62 (stage position detection unit 951). Then, the stage position detection unit 951 determines whether the X position of the second edge E2 acquired in step S17 is within the measurable region (step S18). In step S18, as described in FIG. 4, it is determined whether the X position of the second edge E2 acquired in step S17 exceeds the upper limit TU2 (or the lower limit TL2).

[0090] If the X position of the second edge E2 is within the measurable region (YES in step S18), the stage position detection unit 951 corrects the X position of the second edge E2 (step S19) using the X position of the third edge E3 detected by the third edge sensor 63. For example, if the X position of the third edge E3 is deviated from the reference position by dx2 at the time the X position of the second edge E2 is detected, a value obtained by subtracting dx2 from the detected X position of the second edge E2 is acquired as the corrected X position.

[0091] After step S19, the stage position detection unit 951 calculates the Y position of the stage 2 using the X position of the second edge E2 corrected in step S19 (corrected X position) (step S20).

[0092] After step S20, the stage position detection unit 951 determines whether to end the process (step S21). Step S21 is similar to the process of step S16. If the process is to be continued (NO in step S21), the stage position detection unit 951 returns to step S17.

[0093] As described above, when the X position detected by one of the first edge sensor 61 and the second edge sensor 62 falls outside the measurable range, the Y position of the stage 2 is calculated from the X position detected by the other. In this way, by switching the sensors, it is possible to detect the position of the stage based on edge detection.

[0094] <Effects> The stage position detection method includes: a) step S1 of moving the stage 2 in a first direction (Y direction); a step (step S1) of projecting a first light LB1 from a first projection unit 611 of the first edge sensor 61 toward a first edge E1 of a first moving member 68 that moves together with the stage 2 in step S1, and detecting an X position of the first edge E1 in a second direction (X direction) intersecting the first direction based on an incidence position at which the first light LB1 is incident on a first detector 613; and c) a step (step S15) of calculating a position (Y position) of the stage using the position (X position) of the first edge E1 detected in the above step b).

[0095] Moreover, the exposure apparatus 100 has a stage 2, a stage moving mechanism 3, an exposure head 51, a first moving member 68, a first edge sensor 61, and a stage position detection unit 951. The stage 2 has a support surface (upper surface 2S) that supports the substrate W. The stage moving mechanism 3 moves the stage 2 in a first direction (Y direction). The exposure head 51 can irradiate light toward the substrate W supported on the support surface of the stage 2. The first moving member 68 can move together with the stage 2, and has a first edge E1 that extends in the first direction (Y direction). The first edge sensor 61 detects the position of the first edge E1 in a second direction (X direction) that intersects with the first direction. The stage position detection unit 951 calculates the position (Y position) of the stage 2 using the position (X position) of the first edge E1 detected by the first edge sensor 61.

[0096] According to these configurations, the position (Y position) of the stage 2 is calculated by detecting the position (X position) of the first edge E1 that moves together with the stage 2, so that the position (Y position) of the stage 2 can be detected accurately and at low cost.

[0097] Moreover, the first edge E1 extends toward the first direction (Y direction) while being inclined toward one side of the second direction (X direction), and the above-mentioned step c) is a step of calculating the position of the stage 2 in the first direction. According to this configuration, the position of the stage 2 in the first direction can be calculated by detecting the position of the first edge E1 in the second direction.

[0098] Moreover, the stage position detection method further includes a step d) of projecting a second light LB2 from the second projection unit 621 toward the second edge E2 of the first moving member 68, and detecting the position (X position) of the second edge E2 in the second direction (X direction) based on the incident position at which the second light LB2 is incident on the second detector 623. The step c) includes a step of calculating the position of the stage 2 in the first direction (Y direction) using the position (X position) of the first edge E1 detected in the step b) and the position (X position) of the second edge E2 detected in the step d). According to this configuration, the position (Y position) of the stage 2 can be calculated by detecting the position (X position) of the second edge E2.

[0099] Moreover, the above step c) includes the steps of: c-1) calculating the position of the stage 2 in the first direction (Y direction) using the position (X position) of the first edge E1 when the position of the first edge E1 detected in the above step b) is within a measurable area in the second direction (X direction) that is determined in advance; and c-2) calculating the position of the stage 2 in the first direction (Y direction) using the position (X position) of the second edge E2 detected in the above step d) when the position (X position) of the first edge E1 detected in the above step b) is outside the measurable area. According to this configuration, when the position (X position) of the detected first edge E1 is outside the measurable area, the position (Y position) of the stage 2 is calculated using the position (X position) of the second edge E2, not the position (X position) of the first edge E1. This can improve the calculation accuracy of the stage position.

[0100] Moreover, the first edge E1 is displaced toward the first direction (Y direction) at a constant inclination in the second direction (X direction). With this configuration, the position of the stage in the first direction can be calculated from the detected position of the first edge and the inclination of the first edge with respect to the first direction.

[0101] Furthermore, the first edge E1 is inclined at an angle of 45° or more with respect to the first direction (Y direction). With this configuration, it is possible to increase the ratio of the displacement of the first edge E1 in the second direction (X direction) to the displacement of the stage 2 in the first direction (Y direction). This allows the position of the first edge E1 to be detected with higher accuracy, and therefore the position of the stage 2 to be calculated with high accuracy.

[0102] The stage position detection method further includes a step e) of projecting a third light LB3 from the third projection unit 631 toward the third edge E3 of the second moving member 69, and detecting the position (X position) of the third edge E3 in the second direction (X direction) based on the incident position at which the third light LB3 is incident on the third detector 633. The third edge E3 extends parallel to the first direction (Y direction). The step c) includes a step of correcting the position (X1) of the first edge E1 detected in the step b) according to the position (X position) of the third edge E3 detected in the step e). With this configuration, the displacement of the stage 2 in the second direction (X direction) can be detected by the third edge E3. Therefore, by correcting the detected position (X position) of the first edge E1 with the position (X position) of the third edge E3, the displacement of the first edge E1 itself in the second direction (X direction) can be corrected.

[0103] The above step c) includes a step of calculating the position (Y position) of the stage from the position (X position) of the first edge using a conversion equation (Equation 2) obtained based on the shape of the first edge E1, or a conversion equation obtained from the relationship between the actual measurement value of the position (X position) of the first edge E1 and the actual measurement value of the position (Y position) of the stage 2. With this configuration, the position (Y position) of the stage 2 can be calculated using the conversion equation.

[0104] <2. Modification> Although the embodiment has been described above, the present invention is not limited to the above, and various modifications are possible.

[0105] For example, the exposure apparatus 100 may include a plurality of first moving members 68, a plurality of first edge sensors 61, and a plurality of second edge sensors 62. For example, by arranging two first moving members 68 spaced apart in the X direction, it is possible to measure two Y positions spaced apart in the X direction for the stage 2. This makes it possible to detect, for example, the rotation of the stage 2.

[0106] Furthermore, exposure apparatus 100 may include a plurality of third edge sensors 63 and a plurality of second moving members 69. For example, by arranging two second moving members 69 spaced apart in the X direction, it is possible to measure two X positions spaced apart from each other on the X position for stage 2. This makes it possible to detect, for example, the rotation of stage 2.

[0107] Furthermore, in the above embodiment, the first edge E1 and the third edge E3 are formed on different moving members, but they may be formed on the same single moving member.

[0108] The first moving member 68 may have a reflecting portion made of a material that reflects the first light LB1, instead of the first light blocking portion 681. In this case, the first light LB1 reflected by the reflecting portion may be detected by a first detector 613 provided on the same side as the first projection portion 611 with respect to the first moving member 68, thereby detecting the X position of the edge (first edge E1) of the reflecting portion. The same applies to the second moving member 69.

[0109] Also, the second edge sensor 62 and the second edge E2 may be omitted. That is, the Y position of the stage 2 may be calculated only from the detection result of only the first edge sensor 61. In this case, if the X position of the first edge E1 detected by the first edge sensor 61 is outside the measurable area, the X position of the first edge E1 may be found by an interpolation process such as linear interpolation for the X position within the measurable area.

[0110] Although the present invention has been described in detail, the above description is merely illustrative in all respects, and the present invention is not limited thereto. It is understood that countless variations not illustrated can be envisioned without departing from the scope of the present invention. The configurations described in the above embodiments and variations can be appropriately combined or omitted as long as they are not mutually contradictory. [Explanation of symbols]

[0111] 2: Stage 2S:Top surface (support surface) 5: Exposure unit 51: Exposure head 61: First edge sensor 62: Second edge sensor 63: 3rd edge sensor 68: First moving member 69: Second moving member 93: Stage control section 100: Exposure equipment 611: 1st projection section 613: First detector 621:Second projection section 623: Second detector 630: Support member 631:Third projection section 633: 3rd detector 951: Stage position detector E1: First edge E2: Second edge E3: Third edge LB1: 1st light LB2: Second light LB3: Third light W: Substrate

Claims

1. 1. A method for detecting a stage position, comprising: a) moving a stage in a first direction; b) projecting a first light from a first projection unit toward a first edge of a moving member that moves together with the stage in step a), and detecting a position of the first edge in a second direction intersecting the first direction based on an incident position at which the first light is incident on a first detector; c) calculating a position of the stage using the position of the first edge detected in step b); and A stage position detection method comprising:

2. 2. A stage position detection method according to claim 1, comprising: the first edge extends in the first direction and is inclined toward one side of the second direction, The step c) is a step of calculating a position of the stage in the first direction.

3. 3. A stage position detection method according to claim 2, comprising: A stage position detection method, wherein the first edge extends in a zigzag pattern in which portions inclined toward one side of the second direction toward the first direction and portions inclined toward the other side of the stage second direction toward the first direction are alternately repeated.

4. 4. A stage position detection method according to claim 3, comprising: d) projecting second light from a second projection unit toward a second edge of the movable member, and detecting a second position of the second edge in the second direction based on an incident position at which the second light is incident on a second detector; Further comprising: The step c) includes a step of calculating a position of the stage in the first direction using the position of the first edge detected in the step b) and the position of the second edge detected in the step d).

5. 5. A stage position detection method according to claim 4, comprising: The step c) comprises: c-1) calculating a position of the stage in the first direction using the position of the first edge when the position of the first edge detected in the step b) is within a predetermined measurable area in the second direction; c-2) calculating a position of the stage in the first direction using the position of the second edge detected in step d) when the position of the first edge detected in step b) is outside the measurable area; and A stage position detection method comprising:

6. 4. The stage position detection method according to claim 2, further comprising: A stage position detection method, wherein the first edge is displaced toward the first direction at a constant inclination toward the second direction.

7. 7. A stage position detection method according to claim 6, comprising: A stage position detection method, wherein the first edge is inclined at an angle of 45° or more with respect to the first direction.

8. 4. The stage position detection method according to claim 2, further comprising: e) projecting third light from a third projection unit toward a third edge of the movable member, and detecting positions of the three edges in the second direction based on an incident position at which the third light is incident on a third detector; Further comprising: The third edge extends parallel to the first direction, The step c) includes a step of correcting the position of the first edge detected in the step b) in accordance with the position of the third edge detected in the step e).

9. 3. A stage position detection method according to claim 1, further comprising: The step c) of the stage position detection method includes a step of calculating a position of the stage from the position of the first edge using a conversion equation obtained based on a shape of the first edge, or a conversion equation obtained from a relationship between an actual measurement value of the position of the first edge and an actual measurement value of the position of the stage.

10. An exposure apparatus comprising: a stage having a support surface for supporting a substrate; a stage moving mechanism that moves the stage in a first direction; an exposure head capable of irradiating light toward the substrate supported on the support surface of the stage; a moving member movable together with the stage and having a first edge extending in a first direction; a first edge sensor that detects a position of a first edge in a second direction that intersects with the first direction; a stage position calculation unit that calculates a position of the stage using a position of the first edge detected by the first edge sensor; An exposure apparatus comprising:

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