Manufacturing method of glass substrate

Abstract

To provide a manufacturing method of a glass substrate which includes a step in which end surface processing is performed to a peripheral edge end of the glass substrate having a disc-like shape and can maintain high processing accuracy of the end surface processing over a long time without causing increase of facility costs.SOLUTION: A manufacturing method of a glass substrate includes: a holding step S01 in which a disc-like glass substrate G is placed and held on an upper surface 22a of a surface plate 2; a rotation step S02 in which the glass substrate G held by the surface plate 2 is rotated around an axis Z1 with the surface plate 2; and an end surface processing step S03 in which a grinding tool 3 is pressed against an end surface Ga of the rotating glass substrate G to perform end surface processing of the glass substrate G. In the holding step S01, the surface plate 2 has: a first surface plate 21 formed of a metal member; and a second surface plate 22 which is formed of a glass member and is detachably disposed on an upper surface 21a of the first surface plate 21 in a stacking manner.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a method for manufacturing a glass substrate, comprising a step of processing an edge surface of a disk-shaped glass substrate. [Background technology]

[0002] In recent years, for example, in a back-grinding process of a semiconductor wafer, a support made of a disk-shaped glass substrate has been known as an example of a support for supporting a semiconductor wafer (see, for example, "Patent Document 1"). In a manufacturing process of such a disk-shaped glass substrate, it is common to perform chamfering (edge ​​processing) such as R-chamfering or C-chamfering on the peripheral edge of the produced glass substrate.

[0003] Here, the edge processing has conventionally been performed according to the following procedure. That is, first, a disk-shaped glass substrate is placed and fixed on a surface plate in a horizontal position, and rotated together with the surface plate about its axis. Next, the outer circumferential surface of a grinding tool having a substantially cylindrical shape, which also rotates about its axis, is pressed against the edge of the glass substrate. As a result, the shape of the groove formed on the outer circumferential surface of the grinding tool is transferred to the peripheral edge of the glass substrate, and the peripheral edge is subjected to a predetermined edge processing. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] International Publication No. 2016 / 047210 Summary of the Invention [Problem to be solved by the invention]

[0005] Incidentally, if the shape of the peripheral edge of a glass substrate that has been subjected to edge processing is not sufficiently stable, then, for example, in the semiconductor wafer manufacturing process, the debonding process of attaching a semiconductor wafer to a support made of the glass substrate cannot be performed with high precision, increasing the possibility of inducing defects in each process that is subsequently carried out. Therefore, the precision required for the edge processing performed on the peripheral edge of a glass substrate has been increasing in recent years.

[0006] In the conventional edge processing method described above, the planar accuracy (flatness, etc.) of the mounting surface of the surface plate greatly contributes to the processing accuracy of the edge processing, so it is important to finish the planar accuracy of the mounting surface with a higher accuracy. In other words, if the planar accuracy of the mounting surface of the surface plate is insufficient, the glass substrate placed on the mounting surface will be rotated around the axis so that the peripheral edge becomes slightly wavy. As a result, the shape of the peripheral edge of the glass substrate formed by pressing the outer circumferential surface of the grinding tool will have a large variation in processing accuracy in the circumferential direction, so it is important to finish the planar accuracy of the mounting surface of the surface plate with a higher accuracy.

[0007] On the other hand, since a surface plate is generally made of a metal member such as aluminum or stainless steel, there are problems in that the processing cost is high in order to finish the flatness of the support surface with high precision, and there is a limit to the precision. Furthermore, in a surface plate made of such a metal member, even if the flatness of the support surface is finished with high precision, the flatness deteriorates due to the change in the shape of the support surface over time, so that it is difficult to maintain the flatness of the support surface with high precision over a long period of time.

[0008] The present invention has been made in consideration of the current problems described above, and has an object to provide a method for manufacturing a glass substrate, which includes a step of performing edge processing on the peripheral end of a disk-shaped glass substrate, and which is capable of maintaining high-precision edge processing accuracy over a long period of time without increasing equipment costs. [Means for solving the problem]

[0009] The problem to be solved by the present invention has been described above, and the means for solving this problem will now be described.

[0010] That is, the manufacturing method of the glass substrate according to the first aspect of the present invention is a manufacturing method of a disk-shaped glass substrate, comprising a holding step of placing and holding the disk-shaped glass substrate on the upper surface of a base plate, a rotating step of rotating the glass substrate held by the base plate together with the base plate about an axis, and an end surface processing step of pressing a processing tool against an end surface of the rotating glass substrate to process the end surface of the glass substrate, characterized in that in the holding step, the base plate has a first base plate made of a metal member and a second base plate made of a glass member and detachably stacked on the main surface of the first base plate on the glass substrate side. Thus, in the manufacturing method of the glass substrate according to the present invention, the second base plate that comes into direct contact when the disk-shaped glass substrate, which is the workpiece, is placed on the base plate is formed by a glass member that can achieve high-precision flatness (flatness, etc.) by polishing, so that the peripheral edge of the glass substrate can be processed with high precision without a significant increase in equipment costs. Furthermore, according to the glass substrate manufacturing method of the present invention, the second platen, which is made of a glass member having a relatively low manufacturing cost, is treated as a consumable item, and a new second platen is successively replaced at regular intervals of a relatively short period, thereby making it possible to maintain the high processing accuracy of the edge processing for a long period of time.

[0011] A method for manufacturing a glass substrate according to aspect 2 of the present invention is characterized in that, in the above aspect 1, the second platen has a main surface opposite to the first platen with a TTV of 3 μm or less. If the second platen is made of glass, it is easier to polish the TTV to 3 μm or less than when it is made of a metal member. This is because glass is an amorphous material. With this configuration, the glass substrate can be placed on the second platen while maintaining a highly accurate horizontal position, and the peripheral edge of the glass substrate rotated around the axis together with the platen is prevented from rippling, allowing highly accurate edge processing to be stably performed on the peripheral edge of the glass substrate.

[0012] A method for producing a glass substrate according to aspect 3 of the present invention is characterized in that, in the above aspect 1 or aspect 2, the Vickers hardness (HV1) of the second platen is equal to or lower than the Vickers hardness (HV2) of the glass substrate. In this manner, in the method for producing a glass substrate according to the present invention, the Vickers hardness (HV1) of the second platen is set relatively low compared to the Vickers hardness (HV2) of the glass substrate. Therefore, even if a factor that induces breakage, scratches, etc. occurs unexpectedly between the glass substrate and the second platen, the breakage, scratches, etc. will occur preferentially on the second platen having a lower Vickers hardness, and it is possible to prevent breakage, scratches, etc. from occurring on the glass substrate.

[0013] A method for manufacturing a glass substrate according to a fourth aspect of the present invention is characterized in that, in the first or second aspect, the main surface of the first platen facing the glass substrate is formed in a circular shape, the second platen is formed in a disk shape, and L1≦L2 is satisfied, where L2 is the diameter of the second platen and L1 is the diameter of the main surface of the first platen. With this configuration, the method for manufacturing a glass substrate according to the present invention can reduce the area of ​​the peripheral edge protruding radially outward from the platen by holding the large-sized glass substrate when placed on the platen, and can perform edge processing on the peripheral edge of a larger-sized glass substrate with higher accuracy than in the past.

[0014] A glass substrate manufacturing method according to a fifth aspect of the present invention is characterized in that the first platen has, on a main surface on the glass substrate side, an adsorption means capable of adsorbing the second platen in the first or second aspect. With this configuration, for example, in an operation of replacing the second platen which is treated as a consumable item, the second platen can be easily attached to and detached from the first platen via the adsorption means. Effect of the Invention

[0015] The present invention has the following effects: That is, according to the method for manufacturing a glass substrate according to the present invention, high precision in edge processing can be maintained for a long period of time without increasing equipment costs. [Brief description of the drawings]

[0016] [Figure 1] 2A to 2C are process diagrams showing the steps of a method for manufacturing a glass substrate in the present embodiment in chronological order. [Diagram 2] 1 is a cross-sectional view showing an overall configuration of an end surface processing device. [Diagram 3] 4 is a plan view showing the shape of a main surface of a first platen on the glass substrate side. FIG. [Figure 4]FIG. 11 is a diagram showing the shape of the main surface of the second base plate on the glass substrate side, where (a) is a plan view showing the shape of the second base plate in this embodiment, and (b) is a plan view showing the shape of the second base plate in another embodiment. [Diagram 5] FIG. 13 is a diagram showing a state of the edge processing device when performing an edge processing step, and is an enlarged cross-sectional view showing a region near the edge of the glass substrate where a grinding tool is in contact. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0017] Next, one embodiment of the present invention will be described with reference to FIGS.

[0018] [Glass substrate manufacturing method] First, a method for manufacturing a glass substrate embodying the present invention will be described with reference to Fig. 1. The method for manufacturing a glass substrate in this embodiment is a method for manufacturing a disk-shaped glass substrate G (see Fig. 2), and includes various steps (holding step S01, rotating step S02, and edge processing step S03) for processing an edge of the shaped glass substrate G using an edge processing device 1 described later.

[0019] The glass substrate G manufactured in this embodiment is a glass substrate that is used as an example of a support for supporting a semiconductor wafer, for example, in a back-grinding process of the semiconductor wafer.

[0020] The glass substrate G is preferably formed mainly by the down-draw method, in particular the overflow down-draw method, but other forming methods, such as the slot-down method, the re-draw method, the float method, or the roll-out method, can also be adopted.

[0021] The plate-shaped glass substrate formed by the above-mentioned forming method is then subjected to a number of pre-processing steps, such as a cutting (fracturing) step, a polishing step, and a surface treatment step, to be formed into a glass substrate G having a predetermined disk shape, and then the edge processing is performed by an edge processing device 1.

[0022] The manufacturing method of the glass substrate mainly includes a holding step S01, a rotating step S02, and an edge processing step S03, which are performed in sequence over time.

[0023] The holding process S01 is a process of placing and holding the disk-shaped glass substrate G produced through the above-mentioned multiple previous processes on the upper surface of a base plate 2 described later (more specifically, the upper surface 22a of the second base plate 22; see Figure 2).

[0024] Here, the upper surface 22a of the surface plate 2 is formed horizontally and in a circular shape, and the diameter of the upper surface 22a is set to be smaller than the diameter of the glass substrate G.

[0025] Then, in the holding step S01, the glass substrate G is placed coaxially with the upper surface 22a of the surface plate 2 and is held in a state in which the peripheral edge portion protrudes beyond the upper surface 22a.

[0026] The rotation step S02 is a step of rotating the glass substrate G held by the surface plate 2 about the axis Z1 (see FIG. 2) together with the surface plate 2. The rotation speed of the glass substrate G is set to be slower than the rotation speed of a grinding tool 3 (see FIG. 2) described later.

[0027] The edge surface processing step S03 is a step of pressing a grinding tool 3 against an edge surface Ga of a rotating glass substrate G to process the edge surface of a peripheral edge portion Gb of the glass substrate G.

[0028] As described later, the grinding tool 3 is disposed such that an axis Z2 (see FIG. 2) of the grinding tool 3 is parallel to an axis Z1 of the glass substrate G (or the surface plate 2), and a groove 31a having a predetermined shape is provided in advance on the outer circumferential surface of the grinding tool 3. The rotation speed of the grinding tool 3 is set to be higher than the rotation speed of the glass substrate G.

[0029] Then, by pressing the outer peripheral surface of the grinding tool 3 rotating around the axis Z2 against the edge surface of the glass substrate G, the shape of the groove portion 31a is transferred to the peripheral edge Gb of the glass substrate G, and a predetermined edge surface processing is performed on the peripheral edge Gb.

[0030] [Configuration of end surface processing device 1] Next, the configuration of the edge processing apparatus 1 for performing the various steps (holding step S01, rotating step S02, and edge processing step S03) in the above-mentioned method for manufacturing a glass substrate will be described with reference to FIGS.

[0031] In FIG. 2, the edge processing device 1 mainly includes a surface plate 2 that holds a glass substrate G, which is an object to be processed, and a grinding tool 3 that performs edge processing on the glass substrate G held by the surface plate 2.

[0032] The base plate 2 includes a first base plate 21 having an upper surface 21a that is circular in plan view, a second base plate 22 that is stacked on the upper surface 21a of the first base plate 21, and negative pressure generating means 23 that generates negative pressure in the first base plate 21 and the second base plate 22. Here, the negative pressure generating means 23 is formed of, for example, a vacuum pump, and is connected to the first base plate 21 and the second base plate 22, respectively, via piping members (first piping member 21f and second piping member 22d) that will be described later.

[0033] The first base plate 21 is made of a metal member formed into a disk shape and is disposed with the axis Z1 as the up-down direction. The first base plate 21 has a main shaft 21c extending downward from the lower surface 21b, and the main shaft 21c is provided coaxially with the axis Z1.

[0034] The first base plate 21 is rotated about the axis Z1 by a driving force of a driving source (not shown) such as an electric motor being transmitted to the main shaft 21c.

[0035] The top surface 21a of the first base plate 21 is the main surface on the side of the glass substrate G held by the base plate 2, and a first groove portion 21d is provided on the top surface 21a.

[0036] 3, the first groove portion 21d includes a circular first groove portion 21d1 having a circular shape in a plan view, an annular first groove portion 21d2 having a ring shape in a plan view and provided radially outward from the circular first groove portion 21d, and a plurality of (four in this embodiment) communicating first groove portions 21d3·21d3··· that communicate the circular first groove portion 21d1 and the annular first groove portion 21d2 with each other. The circular first groove portion 21d1 and the annular first groove portion 21d2 are each coaxially disposed with respect to the axis Z1.

[0037] On the other hand, multiple areas on the upper surface 21a of the first base plate 21, excluding the first groove portion 21d (areas shown by hatching in Figure 3), function as arrangement surfaces on which the second base plate 22 is stacked and are formed so as to be located on the same plane.

[0038] A plurality of (two in this embodiment) first through holes 21e·21e are provided in the center of the upper surface 21a of the first base plate 21. A first piping member 21f (see FIG. 2) connected to the negative pressure generating means 23 is inserted into one of the (two) first through holes 21e·21e (in this embodiment, the first through hole 21e disposed at a position shifted from the axis Z1). As a result, the first groove portion 21d is communicated with the negative pressure generating means 23 via the first piping member 21f.

[0039] The other first through hole 21e (in this embodiment, the first through hole 21e arranged coaxially with the axis Z1) will be described later.

[0040] Then, as shown in Figure 2, by generating negative pressure in the first groove portion 21d on the upper surface 21a of the first base plate 21 by negative pressure generating means 23, the second base plate 22 stacked on the upper surface 21a is adsorbed and fixed to the first base plate 21. Furthermore, by stopping the generation of negative pressure by the negative pressure generating means 23, the second base plate 22 fixed to the upper surface 21a of the first base plate 21 is released from the above-mentioned adhering state and becomes detachable from the upper surface 21a. That is, the first groove portion 21d, the first piping member 21f, and the negative pressure generating means 23 on the upper surface 21a of the first base plate 21 constitute the adhering means according to the present invention, and the second base plate 22 is detachably stacked on the upper surface 21a of the first base plate 21 via the adhering means.

[0041] In this manner, the first base plate 21 in this embodiment is configured to have suction means (first groove portion 21d, first piping member 21f, and negative pressure generating means 23) capable of suctioning the second base plate 22 on the upper surface 21a, which is the main surface on the glass substrate G side.

[0042] By having such a configuration, for example, in the replacement work of the second base plate 22 which is treated as a consumable item as described below, the attachment and detachment work of the second base plate 22 to the first base plate 21 can be easily performed via the above-mentioned suction means.

[0043] The second base plate 22 is made of a glass member formed into a disk shape, and as described above, is stacked coaxially with the first base plate 21 on the main surface (upper surface 21a) of the first base plate 21 facing the glass substrate G. The second base plate 22 is a member that comes into direct contact with the glass substrate G when it is placed on the base plate 2, and supports the glass substrate G from below via the upper surface 22a.

[0044] Here, the Vickers hardness (HV1) of the second base plate 22 is set to be equal to or less than the Vickers hardness (HV2) of the glass substrate G placed on the base plate 2 (HV1≦HV2). Specifically, in this embodiment, a plurality of types of glass substrates G having a Vickers hardness (HV2) within a range of 550 to 800 HV (550≦HV2≦800) are processed by the end processing apparatus 1, and a plurality of types of second base plates 22 having a Vickers hardness (HV1) within a range of 500 to 750 HV (500≦HV1≦750) are prepared in advance as consumables.

[0045] When the edge processing device 1 performs edge processing on the peripheral edge Gb of the glass substrate G, a second base plate 22 having an optimal Vickers hardness (HV1) is selected depending on the Vickers hardness (HV2) of the glass substrate G, and the selected second base plate 22 is stacked on the upper surface 21a of the first base plate 21.

[0046] In this manner, in the present embodiment, the Vickers hardness (HV1) of the second base plate 22 is set relatively low compared to the Vickers hardness (HV2) of the glass substrate G. Therefore, even if a factor that induces breakage, scratches, etc. suddenly occurs between the glass substrate G and the second base plate 22, the breakage, scratches, etc. will occur preferentially on the second base plate 22, which has a lower Vickers hardness, and it is possible to prevent breakage, scratches, etc. from occurring on the glass substrate G.

[0047] The material of the member forming the second base plate 22 is not particularly limited as long as it is a glass member, and may be substantially the same as the material of the glass substrate G.

[0048] In a state where the second base plate 22 is stacked on the upper surface 21a of the first base plate 21, the upper surface 22a of the second base plate 22 is provided with a second groove portion 22b.

[0049] As shown in Figure 4(a), for example, the second groove portion 22b has a plurality of annular second groove portions 22b1·22b1···, each of which has a circular ring shape with a different diameter in a planar view and is arranged concentrically with each other, and a plurality of (four in this embodiment) communicating second groove portions 22b2·22b2···, which radially intersect with the plurality of annular second groove portions 22b1·22b1··· and connect the plurality of annular second groove portions 22b1·22b1··· to each other.

[0050] On the other hand, a number of areas on the upper surface 22a of the second base plate 22 excluding the second groove portion 22b (areas shown by hatching in Figure 4(a); hereinafter, appropriately referred to as "mounting surface Q") function as mounting surfaces on which the glass substrate G is placed, and are each formed to be located on the same plane.

[0051] In the second base plate 22 in this embodiment, the flatness (TTV) of the mounting surface Q of the upper surface 22a which is the main surface on the glass substrate G side, ie, the side opposite to the first base plate 21 side, is set to 3 μm or less.

[0052] The above-mentioned flatness (TTV) means the "total thickness deviation" of the disk-shaped second base plate 22 made of a glass member. Specifically, the flatness (TTV) is the difference between the maximum thickness and the minimum thickness of the entire upper surface 22a (more specifically, the placement surface Q) of the second base plate 22, and can be measured, for example, by a Bow / Warp measuring device SBW-331ML / d manufactured by Kobelco Research Institute Co., Ltd.

[0053] By having such a configuration, according to the edge processing apparatus 1 in this embodiment, the glass substrate G can be placed on the second base plate 22 while maintaining a highly accurate horizontal posture, and the peripheral end Gb of the glass substrate G, which is rotated together with the base plate 2 around the axis Z1, is prevented from rippling, making it possible to stably perform highly accurate edge processing on the peripheral end Gb of the glass substrate G.

[0054] A second through hole 22c is provided coaxially with the axis Z1 at the center of the upper surface 22a of the second base plate 22. A second piping member 22d (see FIG. 2) connected to the negative pressure generating means 23 is inserted into the second through hole 22c together with the other first through hole 21e of the first base plate 21 described above. As a result, the second groove portion 22b is communicated with the negative pressure generating means 23 via the second piping member 22d.

[0055] 2, similarly to the above-described first base plate 21, negative pressure is generated in the second groove portion 22b on the upper surface 22a of the second base plate 22 by the negative pressure generating means 23, whereby the glass substrate G placed on the upper surface 22a is adsorbed and fixed, and is held on the upper surface (more specifically, the upper surface 22a) of the base plate 2. Furthermore, by stopping the generation of negative pressure by the negative pressure generating means 23, the glass substrate G fixed on the upper surface 22a of the second base plate 22 is released from the above-mentioned adsorbed state, and becomes detachable from the upper surface 22a.

[0056] The shape of the second groove portion 22b provided on the upper surface 22a of the second base plate 22 is not limited to this embodiment, and may be any shape as long as it is configured to stably and removably fix the glass substrate G by the negative pressure generated by the negative pressure generating means 23.

[0057] 4(b), the third groove portion 22e, which is another embodiment of the second groove portion 22b, has a plurality of sector-shaped third groove portions 22e1-22e1-..., which are sector-shaped in plan view and radially arranged around the axis Z1, and a small circular third groove portion 22e2, which is small circular in plan view, is provided coaxially with the axis Z1, and is dug deeper than the plurality of sector-shaped third groove portions 22e1-22e1-.... The small circular third groove portion 22e2 is provided so as to overlap the plurality of sector-shaped third groove portions 22e1-22e1-..., and the small circular third groove portion 22e2 and each sector-shaped third groove portion 22e1 are communicated with each other.

[0058] Even when the third groove portion 22e having such a configuration is provided on the upper surface 22a of the second base plate 22, the glass substrate G can be stably and removably fixed by the negative pressure generated by the negative pressure generating means 23.

[0059] In this embodiment, the diameter of the second base plate 22 is set to be equal to or larger than the diameter of the first base plate 21 at the upper surface 21a.

[0060] 5, the main surface (upper surface 21a) of the first base plate 21 on the glass substrate G side is formed in a circular shape in a plan view, and the second base plate 22 is formed in a disk shape. If the diameter of the second base plate 22 is L2 and the diameter of the main surface (upper surface 21a) of the first base plate 21 is L1, the diameter L2 is set to be equal to or larger than the diameter L1 (L1≦L2).

[0061] With such a configuration, according to the edge processing device 1 of the present embodiment, even if the large-sized glass substrate G protrudes significantly radially outward from the first base plate 21 when placed on the base plate 2, the area of ​​the peripheral edge Gb protruding radially outward from the base plate 2 can be reduced by holding it by the second base plate 22. That is, when edge processing is performed on the peripheral edge Gb of the glass substrate G, it is possible to hold the glass substrate G by the second base plate 2 over an area closer to the grinding tool 3 that abuts against the edge Ga of the glass substrate G. As a result, according to the edge processing device 1 of the present embodiment, edge processing can be performed with high accuracy on the peripheral edge Gb of the glass substrate G that is larger than that of the conventional device.

[0062] The grinding tool 3 is an example of a processing tool according to the present invention, and has, for example, a grinding wheel 31 having a substantially cylindrical shape, and a main shaft 32 that is coaxially fitted into the grinding wheel 31 .

[0063] The grinding wheel 31 is formed by bonding a large number of abrasive grains with an adhesive (for example, Metabond), and a plurality of annular grooves 31a are formed on the outer circumferential surface of the grinding wheel 31 along the direction of the axis Z2 (see FIG. 2) of the main shaft 32. The circumferential cross section of each groove 31a is formed along the shape of the peripheral edge Gb of the glass substrate G intended after end face processing.

[0064] 2, the grinding tool 3 is disposed on the side of the surface plate 2 such that the axis Z2 of the spindle 32 is parallel to the axis Z1 of the surface plate 2 (or the glass substrate G). The grinding tool 3 is configured to be rotatable about the axis Z2, and is also configured to be horizontally movable in the direction toward and away from the glass substrate G held by the surface plate 2.

[0065] Then, the grinding tool 3, which is also rotated around the axis Z2, is moved in the approaching direction relative to the glass substrate G, which is rotated around the axis Z1 by the base plate 2, and the grinding tool 3 (more specifically, the grinding wheel 31) is pressed against the end face Ga of the glass substrate G through a predetermined groove portion 31a, whereby the shape of the groove portion 31a is transferred to the peripheral edge portion Gb of the glass substrate G, and a predetermined edge processing is performed on the peripheral edge portion Gb.

[0066] The grinding tool 3 has a lifting means (not shown) that allows it to move (raise and lower) in the vertical direction, and by moving using the lifting means, each groove portion 31a can be changed to a new groove portion 31a as appropriate depending on the degree of wear of the groove portion 31a, and the edge surface processing is performed on the peripheral edge portion Gb of the glass substrate G using the new groove portion 31a.

[0067] As described above, the manufacturing method of the glass substrate in this embodiment is a manufacturing method of a disk-shaped glass substrate G, and includes a holding process S01 in which the disk-shaped glass substrate G is placed and held on the upper surface of the base plate 2 (upper surface 22a of the second base plate 22), a rotation process S02 in which the glass substrate G held by the base plate 2 is rotated together with the base plate 2 about the axis Z1, and an edge processing process S03 in which a grinding tool (processing tool) 3 is pressed against an edge surface Ga of the rotating glass substrate G to process the edge surface of the glass substrate G.

[0068] In the holding step S01, the base plate 2 is configured to have a first base plate 21 made of a metal member and a second base plate 22 made of a glass member, which is removably stacked on the main surface (upper surface 21a) of the first base plate 21 facing the glass substrate G.

[0069] As described above, in the glass substrate manufacturing method of this embodiment, the second base plate 21 that comes into direct contact with the disk-shaped glass substrate G, which is the workpiece, when it is placed on the base plate 2 is formed from a glass member that can be polished to achieve high-precision planarity accuracy (flatness, etc.) with relative ease, and therefore it is possible to perform high-precision edge processing on the peripheral edge Gb of the glass substrate G without a significant increase in equipment costs.

[0070] Furthermore, according to the glass substrate manufacturing method of this embodiment, the second base plate 22, which is made of a glass member having a relatively low manufacturing cost, is treated as a consumable item, and a new second base plate 22 is successively replaced at regular intervals of a relatively short period, whereby the high processing accuracy of the end face processing can be maintained for a long period of time.

[0071] Although one embodiment of the present invention has been described above, the present invention is not limited to such an embodiment, which is merely illustrative, and it is of course possible to embody the present invention in various other forms without departing from the spirit of the present invention. The scope of the present invention is indicated by the description of the claims, and further includes the equivalent meanings described in the claims, and all modifications within the scope of the claims. [Explanation of symbols]

[0072] 2. Surface Plate 21 First Fixed Plate 21a Top side 21d First groove (adsorption means) 21f first piping member (suction means) 22 Second Fixed Plate 22a Top side 23 Negative pressure generating means (adsorption means) 3 Grinding tools G Glass substrate Ga end face HV1 Vickers hardness of second platen HV2 Vickers hardness of glass substrate L1 Diameter of the top surface of the first surface plate L2 Diameter of the second fixed plate S01 Maintain Engineering S02 Return Project S03 End surface processing project TTV Flatness Z1 axis

Claims

1. A method for manufacturing a disk-shaped glass substrate, comprising the steps of: a holding step of placing and holding a disk-shaped glass substrate on an upper surface of a surface plate; a rotating step of rotating the glass substrate held by the platen together with the platen about an axis; and an edge processing step of pressing a processing tool against an edge surface of the rotating glass substrate to process the edge surface of the glass substrate. In the holding step, The surface plate is A first base plate made of a metal member; and a second base plate made of a glass member and detachably stacked on a main surface of the first base plate on the glass substrate side. A method for manufacturing a glass substrate comprising the steps of:

2. In the second platen, The flatness (TTV) on the main surface opposite to the first platen side is 3 μm or less. The method for manufacturing a glass substrate according to claim 1 .

3. The Vickers hardness (HV1) of the second platen is equal to or lower than the Vickers hardness (HV2) of the glass substrate; 3. The method for manufacturing a glass substrate according to claim 1 or 2.

4. The main surface of the first base plate facing the glass substrate is formed in a circular shape, The second platen is formed in a disk shape, When the diameter of the second base plate is L2 and the diameter of the main surface of the first base plate is L1, L1≦L2.

3. The method for manufacturing a glass substrate according to claim 1 or 2.

5. The first platen is On the main surface on the glass substrate side, The second platen is supported by a suction means.

3. The method for manufacturing a glass substrate according to claim 1 or 2.

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