Processor and article manufacturing method

Abstract

To provide a technique advantageous for detection of foreign matters in a processor which processes a liquid or performs processing by using a liquid.SOLUTION: A processor comprises: a functional part which processes a liquid or performs processing by using a liquid; a flow channel connected to the functional part; and a foreign matter detection part located in the flow channel. The foreign matter detection part includes a capture nozzle which is located so that the liquid flows in the flow channel, and a sensor which detects capture of foreign matters by the capture nozzle.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a processing apparatus and an article manufacturing method.

Background Art

[0002] In the manufacture of articles such as semiconductor devices, an imprint technique may be used in which droplets of an imprint material are placed on a substrate and the imprint material is molded by a mold to form a pattern on the substrate. Alternatively, in the manufacture of a display panel, a coating method may be used in which a liquid containing an organic material is applied onto a substrate and dried and fired to form an organic layer.

[0003] A liquid ejection device for placing a liquid on a substrate may be configured to eject the liquid from a plurality of ejection ports by an inkjet method. When the liquid ejection device is used over a long period of time, foreign matter may be mixed into the liquid. When the foreign matter is carried to the flow path of the ejection head, ejection failure may occur. Further, when foreign matter is ejected onto the substrate together with the liquid, product failure may occur.

[0004] Patent Document 1 describes an imprint material ejection device. In this imprint material ejection device, foreign matter is removed by a filter provided in a passage for circulating the imprint material in the storage section. However, Patent Document 1 does not describe detecting foreign matter in the liquid.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] An object of the present invention is to provide a technique advantageous for detecting foreign matter in a processing apparatus that processes a liquid or performs processing using a liquid. **Means for Solving the Problems**

[0007] One aspect of the present invention relates to a processing apparatus, the processing apparatus including: a functional unit that processes a liquid or performs processing using a liquid; a flow path connected to the functional unit; and a foreign matter detection unit disposed in the flow path, the foreign matter detection unit including a capture nozzle disposed in the flow path so that the liquid flows therethrough, and a sensor that detects capture of foreign matter by the capture nozzle. **Advantages of the Invention**

[0008] According to the present invention, a technique advantageous for detecting foreign matter in an apparatus that processes a liquid or performs processing using a liquid is provided. **Brief Description of the Drawings**

[0009]

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Embodiments for Carrying Out the Invention

[0010] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention according to the claims. Although a plurality of features are described in the embodiments, not all of these plurality of features are essential to the invention, and the plurality of features may be arbitrarily combined. Further, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant descriptions are omitted.

[0011] FIG. 1 schematically shows the configuration of the processing apparatus 1 according to the first embodiment. The processing apparatus 1 may include a functional unit 210 that processes the liquid LQ or performs processing using the liquid, a flow path 230 connected to the functional unit 210, and a foreign object detection unit 100 disposed in the flow path 230. Processing the liquid LQ may include, for example, at least one of a process of filtering (filtering) the liquid LQ, a process of adjusting the temperature of the liquid LQ, and a process of applying pressure to the liquid LQ. From another perspective, the functional unit 210 may include, for example, at least one of a filter that filters the liquid LQ, a temperature adjuster that adjusts the temperature of the liquid LQ, and a pump that applies pressure to the liquid LQ. Performing processing using the liquid may include, for example, a process of discharging the liquid LQ toward a member to be processed (e.g., a substrate). The process of discharging the liquid LQ toward the member to be processed may result in the liquid LQ being applied to the member to be processed or a film of the liquid LQ being formed on the member to be processed. Therefore, the processing apparatus 1 may have an aspect as a coating apparatus or a film forming apparatus.

[0012] The foreign object detection unit 100 may include a capture nozzle 112 disposed in the flow path 230 such that the liquid LQ flows therethrough, and a sensor 120 that detects the capture of a foreign object by the capture nozzle 112. The foreign object may be a solid or a semi-solid. The semi-solid may mean a substance having a higher viscosity than the liquid LQ. The sensor 120 may detect the capture of a foreign object by the capture nozzle 112 based on, for example, the residual vibration of the capture nozzle 112 generated by applying vibration to the capture nozzle 112.

[0013] Sensor 120 may include, for example, a piezoelectric element 122. The residual vibration of the capture nozzle 112 caused by applying vibration to the capture nozzle 112 by the piezoelectric element 122 may generate a back electromotive force in the piezoelectric element 122. Sensor 120 may detect the residual vibration by detecting the back electromotive force generated by the piezoelectric element 122. Further, when the capture nozzle 112 captures a foreign object, the residual vibration of the capture nozzle 112 caused by applying vibration to the capture nozzle 112 by the piezoelectric element 122 may change. Therefore, the sensor 120 can detect the capture of the foreign object by the capture nozzle 112 based on the difference between the residual vibration in the state where the capture nozzle 112 is not capturing a foreign object and the residual vibration in the state where the capture nozzle 112 has captured a foreign object.

[0014] Sensor 120 may include, for example, a processor (control unit) 124 that drives the piezoelectric element 122 and processes an electrical signal obtained from the piezoelectric element 122. The processor 124 can detect the residual vibration of the capture nozzle 112 based on the electrical signal (due to the back electromotive force) obtained from the piezoelectric element 122, and can detect the capture of a foreign object by the capture nozzle 112 based on the residual vibration. The processor 124 may be constituted by, for example, a PLD (abbreviation for Programmable Logic Device) such as an FPGA (abbreviation for Field Programmable Gate Array), or an ASIC (abbreviation for Application Specific Integrated Circuit), or a general-purpose or dedicated computer into which a program is incorporated, or a combination of all or part of these.

[0015] The foreign object detection unit 100 may include a separation wall 110 arranged to separate the flow path 230 into a first part 231 and a second part 232, for example. The capture nozzle 112 may be arranged on the separation wall 110 to communicate the first part 231 and the second part 232. The foreign object detection unit 100 includes a container 140 that may form part of the flow path 230, and the separation wall 110 may be arranged to separate the flow path 230 into a first part 231 and a second part 232 within the container 140. The separation wall 110 may be supported by the container 140. The foreign object detection unit 100 may have a plurality of capture nozzles 112 arranged on the separation wall 110 to communicate the first part 231 and the second part 232. The sensor 120 may be provided for each capture nozzle 112, or for two or more of the plurality of capture nozzles 112, or for all of the capture nozzles 112.

[0016] The processing device 1 may include a switching mechanism for switching the direction in which the liquid LQ flows through the flow path 230. The processing device 1 may include other functional units 220. In one example, the functional unit 210 performs at least one of the processes of filtering the liquid LQ, adjusting the temperature of the liquid LQ, and applying pressure to the liquid LQ, and the functional unit 220 performs a process of discharging the liquid LQ toward the member to be processed. The processing device 1 may be configured as, for example, a dispenser or a coating device for applying a liquid of a curable composition as the liquid LQ to a substrate, or as a coating device for applying a photosensitive material as the liquid LQ to a substrate. Alternatively, the processing device 1 may be configured as a coating device for applying a liquid of an organic material as the liquid LQ to a substrate, or as a film forming device for applying a liquid of an organic material as the liquid LQ to a substrate to form an organic film.

[0017] All or part of the liquid LQ provided to the functional unit 220 may be returned to the functional unit 210. In other words, a circulation path or a circulation system through which the liquid LQ circulates through the functional unit 210, the foreign matter detection unit 100, and the functional unit 220 may be configured. A filter for removing foreign matter in the liquid LQ may be provided in the circulation system. A bypass flow path that bypasses the foreign matter detection unit 100 may be provided in the flow path 230. This enables the liquid LQ to flow through the bypass flow path without flowing through the foreign matter detection unit 100. A filter for removing foreign matter in the liquid LQ may be provided in the bypass flow path.

[0018] The liquid LQ can be, for example, a curable composition. A curable composition is a material that cures when energy for curing is applied. As the energy for curing, electromagnetic waves, heat, etc. are used. As the electromagnetic waves, for example, light such as infrared rays, visible light, and ultraviolet rays whose wavelength is selected from the range of 10 nm or more and 1 mm or less is used. A photocurable composition that cures by light among curable compositions contains at least a polymerizable compound and a photoinitiator, and may contain a non-polymerizable compound or a solvent as necessary. The non-polymerizable compound is at least one selected from the group consisting of a sensitizer, a hydrogen donor, an internal release agent, a surfactant, an antioxidant, a polymer component, etc.

[0019] In FIG. 2, a partial cross-sectional structure of the foreign matter detection unit 100 is schematically shown. In FIG. 3, the separation wall 110 and the surrounding configuration are schematically shown. FIG. 4 is an enlarged schematic view of a part 11 of the separation wall in FIG. 2. Note that FIG. 3 corresponds to a view of the separation wall 110 and its surroundings as seen from the second space 152 described later.

[0020] As described above, the foreign matter detection unit 100 may include a separation wall 110 disposed so as to separate the flow path 230 into a first portion 231 and a second portion 232. One or a plurality of capture nozzles 112 may be disposed on the separation wall 110 so as to communicate the first portion 231 and the second portion 232. Typically, a plurality of capture nozzles 112 may be arranged in a two-dimensional array. The container 140 may include a first member 141 that defines a first space 151 communicating with the first portion 231 of the flow path 230 and a second member 142 that defines a second space 152 communicating with the second portion 232 of the flow path 230. The separation wall 110 may be supported by, for example, a support plate 145. The support plate 145 may be made of a material having a low coefficient of thermal expansion, such as a ceramic material or quartz glass. A protective member 143 supported by the support plate 145 is disposed around the separation wall 110, and a filler (or sealing material) 144 may be disposed between the protective member 143 and the separation wall 110. The first member 141 may be fixed to the support plate 145. The second member 142 may be fixed to the support plate 145 via the protective member 143 or without passing through the protective member 143. The cross-sectional areas of the first space 151 and the second space 152 (the area of a cross-section orthogonal to the flow path 230) are preferably larger than the cross-sectional area of the flow path 230 (the area of a cross-section orthogonal to the flow path 230). The cross-sectional areas of the first space 151 and the second space 152, and the number of the plurality of capture nozzles 112 may be designed according to the required flow rate of the liquid LQ.

[0021] The foreign matter detection unit 100 may perform a foreign matter detection operation when the liquid LQ is moving from the first space 151 to the second space 152. The capture nozzle 112 has an inlet 131 on the side of the first space 151 and an outlet 132 on the side of the second space 152. The cross-sectional area of the inlet 131 is larger than the cross-sectional area of the outlet 132. In a direction orthogonal to the direction from the first portion 231 (the first space 151) to the second portion 232 (the second space 152) (the lateral direction in FIG. 4), the inlet 131 and the outlet 132 may be displaced from each other. The capture nozzle 112 has a connection space 133 connecting the inlet 131 and the outlet 132. The piezoelectric element 122 may be disposed so as to face the connection space 133.

[0022] FIG. 5 illustrates an electrical signal output from the piezoelectric element 122 to the processor 124. In FIG. 5, although the dimension of the electrical signal shown on the vertical axis is current, the electrical signal may be in the dimension of voltage or may be an index value indicating the magnitude of the back electromotive force. In FIG. 3, the dotted line illustrates the electrical signal during normal times (i.e., when no foreign matter is captured by the capture nozzle 112), and the thick line illustrates the electrical signal during abnormal times (i.e., when foreign matter is captured by the capture nozzle 112). The processor 124 can hold, as a reference feature amount, a feature amount indicating the feature of the electrical signal during normal times. The processor 124 can detect the capture of foreign matter by the capture nozzle 112 by comparing a feature amount (hereinafter, measurement feature amount) indicating the feature of the electrical signal supplied from the piezoelectric element 122 during the foreign matter detection operation with the reference feature amount. The processor 124 may detect the degree of capture of foreign matter by the capture nozzle 112 (the degree of blockage of the capture nozzle 112) based on the amount of deviation of the measurement feature amount from the reference feature amount. The degree of capture of foreign matter can be used as information for estimating the amount of foreign matter in the liquid LQ.

[0023] In one example, the first functional unit 210 is a filter. In this case, the foreign matter detection unit 100 can measure the performance (filtering performance) of the first functional unit 210. The foreign matter detection unit 100 can be configured to be able to detect foreign matter having a size smaller than the nominal value of the size of foreign matter that can be removed by the filter as the first functional unit 210. Alternatively, the foreign matter detection unit 100 can be configured to be able to detect foreign matter having a size equal to or larger than the nominal value of the size of foreign matter that can be removed by the filter as the first functional unit 210.

[0024] Hereinafter, the processing apparatus 2 of the second embodiment will be described. Matters not mentioned as the second embodiment may follow the first embodiment. FIG. 6 schematically shows the configuration of the processing apparatus 2 of the second embodiment. The processing apparatus 2 of the second embodiment may include a discharge unit 700 as a functional unit that processes the liquid LQ or performs processing using a liquid, a flow path 43 connected to the discharge unit 700, and a foreign matter detection unit 100 disposed in the flow path 43. The processing apparatus 2 may be understood as a liquid discharge apparatus or an apparatus including a liquid discharge apparatus. The discharge unit 700 has a discharge head 11 and a container 12, and the internal space of the container 12 may be separated into a first space 15 and a second space 16 by a separation membrane 14 formed of a flexible member. The thickness of the separation membrane 14 is preferably, for example, 10 μm or more and 200 μm or less, and it is preferably formed of a material with low permeability to liquids and gases. The separation membrane 14 may be formed of, for example, a PE film, a PP film, a film of a fluororesin material such as PFA, or a composite multilayer film combining a fluororesin material and a plastic material. The first space 15 contains the liquid 8 as the discharge liquid, and the second space 16 is filled with the working liquid. The second space 16 is connected to the pressure control unit 13 by a working liquid flow path 17, and the first space 15 is connected to the discharge head 11.

[0025] The pressure control unit 13 may include, for example, a working liquid tank, a pressure sensor, a pump, a valve, etc., and may be configured to be able to control the pressure in the second space 16. By controlling the pressure of the working liquid in the second space 16 by the pressure control unit 13, the pressure of the liquid 8 (discharge liquid) in the first space 15 can be controlled via the separation membrane 14.

[0026] When the discharge of the liquid 8 from the discharge head 11 is repeated, the liquid 8 in the first space 15 is consumed and decreased, and the separation membrane 14 gradually deforms so that the capacity of the first space 15 decreases. Along with the deformation of the separation membrane 14, the working liquid may be replenished from the working liquid tank to the second space 16 by the pressure control unit 13.

[0027] FIG. 7 schematically shows the configuration of the ejection head 11 of the ejection unit 700. The ejection head 11 of the ejection unit 700 includes an ejection nozzle 112' that ejects the liquid 8, and the ejection nozzle 112' may have the same structure as the capture nozzle 112 of the foreign object detection unit 100. In this case, the substrate 110' having the ejection nozzle 112' can be diverted as the partition wall 110 of the foreign object detection unit 100. In this case, foreign objects having a size that can block the ejection nozzle 112' can be reliably captured and detected by the foreign object detection unit 100.

[0028] The ejection nozzle 112' provided on the substrate 110' may include an inlet 131' facing the liquid chamber 701 to which the liquid 8 is supplied from the first space 15, an outlet 132' as an ejection port for ejecting the liquid 8, and a connection space 133' connecting the inlet 131' and the outlet 132'. The cross-sectional area of the inlet 131' is larger than the cross-sectional area of the outlet 132'. In a direction orthogonal to the ejection direction D of the liquid 8 from the outlet 132', the inlet 131' and the outlet 132' may be displaced from each other. The ejection head 11 may have a piezoelectric element 122' as a transducer that applies energy for ejecting the liquid 8 from the ejection nozzle 112' to the liquid 8. The piezoelectric element 122' may be arranged to face the connection space 133'. Instead of the piezoelectric element 122' as a transducer, for example, a heating element may be used. The ejection unit 700 includes a control unit 75 that controls the piezoelectric element 122'. By sending an ejection control signal from the control unit 75 to the piezoelectric element 122', the piezoelectric element 122' is activated, and the liquid 8 can be ejected from the ejection nozzle 112'.

[0029] The outlet 132' as an ejection port may have a diameter in the range of, for example, several μm to several tens of μm. The leakage of the liquid 8 from the outlet 132' is prevented by capillary action. The surface of the liquid 8 at the outlet 132' is maintained in a concave meniscus state. The pressure of the liquid 8 inside the ejection nozzle 112' is maintained at a negative pressure in the range of, for example, -0.1 to -1000 Pa by the pressure control unit 13, whereby the meniscus state can be stably maintained. The surface (lower surface) of the substrate 110' can be subjected to a liquid-repellent treatment so as to prevent the leakage of the liquid 8 from the outlet 132'.

[0030] In the example shown in FIG. 6, the internal space of the container 12 is separated into a first space 15 and a second space 16 by the separation membrane 14, but it is not essential to provide the separation membrane 14. In the case where the separation membrane 14 is not provided, the pressure control unit 13 can directly control the pressure of the liquid 8.

[0031] The flow path 43 can form a circulation unit 40 that circulates the liquid 8 through the container 12 (first space 15) and the foreign matter detection unit 100. A filter 41 for filtering the liquid 8, a pump 42, and the foreign matter detection unit 100 can be arranged in the circulation unit 40. By driving the pump 42, the liquid 8 in the first space 15 can be sucked into the flow path 43 and the liquid 8 can be sent into the foreign matter detection unit 100. The foreign matter detection unit 100 can function not only to detect foreign matter in the liquid 8 but also to remove foreign matter in the liquid 8. The liquid 8 that has passed through the foreign matter detection unit 100 can be sent to the filter 41. The filter 41 removes foreign matter that has passed through the foreign matter detection unit 100. The liquid 8 that has passed through the filter 41 can be returned to the first space 15. The circulation unit 40 can function to remove foreign matter while detecting foreign matter in the liquid 8. Considering the possibility of foreign matter being mixed into the liquid 8 due to dust generation from the pump 42, it is preferable to arrange the foreign matter detection unit 100 and the filter 41 on the downstream side of the pump 42. The pump 42 can be provided in the flow path 43, but it may also be provided outside the flow path 43.

[0032] When the processing device 2 is applied to a dispenser in a film forming device such as an imprint device, that is, a coating device that disposes a curable composition on a substrate, the volume of droplets composed of the liquid discharged from the discharge head 11 can be, for example, in the range of 0.3 pL to 1.2 pL. In this case, the diameter of the outlet 132' of the discharge nozzle 112' can be, for example, in the range of several μm to several tens of μm. The capture nozzle 112 of the foreign matter detection unit 100 can also have the same configuration as the discharge nozzle 112'. In this case, the size of foreign matter detected by the foreign matter detection unit 100 can be in the range of several μm to several tens of μm. The filter 41 can be configured to remove foreign matter having a size of, for example, several tens of nm or more. If an attempt is made to remove foreign matter having a size of less than several tens of nm with the filter 41, the circulation of the liquid 8 taken by the pump 42 can become difficult.

[0033] The pressure inside the discharge head 11 can be controlled, for example, within the range of -0.1 to -1000 Pa so as to satisfy a negative pressure condition under which a stable meniscus condition is maintained. When pressure fluctuations occur in the internal space of the container 12 due to the driving of both the circulation unit 40 and the foreign matter detection unit 100, the discharge operation can become unstable due to a change in the meniscus condition of the discharge head 11 accordingly. Therefore, it is preferable that the discharge process of the discharge head 11 and the processes by the circulation unit 40 and the foreign matter detection unit 100 be performed during different periods.

[0034] FIG. 8 illustrates the operation of the processing device 2 of the second embodiment. This operation can be controlled by the control unit 75. In step S1, foreign matter already present in the plurality of capture nozzles 112 of the foreign matter detection unit 100 is detected. Here, the capture nozzles 112 in which foreign matter already exists among all the capture nozzles 112 are excluded from the capture nozzles 112 used in subsequent foreign matter detection processes. That is, in step S1, the capture nozzles 112 in which no foreign matter is detected are used in the following foreign matter detection processes.

[0035] In step S2, the pump 42 is driven, and the circulation of the liquid 8 by the circulation unit 40 is started. As a result, it becomes possible to detect foreign matter by the foreign matter detection unit 100, and the removal of foreign matter by the foreign matter detection unit 100 and the filter 41 is started. In S3, foreign matter is detected by the foreign matter detection unit 100. At this time, the capture nozzle 112 in which foreign matter exists is specified, and the capture nozzle 112 can be excluded from the capture nozzles 112 used in subsequent foreign matter detection processes.

[0036] In step S4, it is determined whether foreign matter has been detected by the foreign matter detection unit 100 in step S3. If foreign matter has been detected by the foreign matter detection unit 100 in step S3, the process returns to step S2, and steps S2, S3, and S4 are executed again. On the other hand, if foreign matter has not been detected by the foreign matter detection unit 100 in step S3, in step S5, the pump 42 is stopped, and the circulation of the liquid 8 by the circulation unit 40 is stopped.

[0037] In step S6, the liquid 8 is discharged from the discharge head 11 of the discharge unit 700 to the supply target of the liquid 8. Here, after the pressure in the internal space (the first space 15) of the container 12 is stabilized within a predetermined negative pressure condition, for example, in the range of -0.1 to -1000 Pa, by the pressure control unit 13, the liquid 8 can be discharged from the discharge head 11.

[0038] As described above, the foreign matter detection process by the foreign matter detection unit 100 and the discharge process by the discharge head 11 can be carried out exclusively. The foreign matter detection process may be carried out after the discharge process. Alternatively, the foreign matter detection process may be carried out each time a plurality of discharge processes are performed.

[0039] FIG. 9 shows a configuration example of an imprint apparatus 300 incorporating a processing apparatus 2 configured as a liquid ejection apparatus. The imprint apparatus 300 may be understood as a film forming apparatus that forms a film on a substrate 311, or a pattern forming apparatus that forms a pattern on the substrate. The imprint apparatus 300 may include a light irradiation unit 302, a mold holding mechanism 303, a substrate stage mechanism 304, a processing apparatus (liquid ejection apparatus) 2, a control unit 306, a user interface 330, a measuring instrument 322, and a support structure 323.

[0040] The light irradiation unit 302 irradiates the liquid 8 as a curable composition on the substrate 311 through the mold 107 with curing light (e.g., ultraviolet light) 308. The light irradiation unit 302 may include a light source 309 and an optical element 310 that adjusts the curing light 308 irradiated from the light source 309.

[0041] The mold holding mechanism 303 may include a mold chuck 315 that holds the mold 307 by vacuum suction or electrostatic suction, and a mold driving mechanism 316 that drives the mold 307 by driving the mold chuck 315. The mold chuck 315 and the mold driving mechanism 316 have an opening region 317 at the center so that the curing light 308 irradiated from the light irradiation unit 302 is irradiated toward the substrate 311. The mold driving mechanism 316 drives the mold chuck 315 so as to press the pattern portion 307a of the mold 307 against the liquid 8 on the substrate 311 or to separate the mold 307 from the film obtained by curing the liquid 8. The mold chuck 315 has a light transmissive member 313 that forms a sealed space on the side of the back surface 307b of the mold 307, and the shape of the mold 307 can be controlled by adjusting the pressure in the sealed space.

[0042] The substrate 311 is, for example, a single crystal silicon substrate or a SOI (Silicon on Insulator) substrate. On the substrate 311, a liquid 8 as a curable composition can be applied by a processing device 2 as a liquid ejection device. A substrate stage mechanism 304 holds and positions the substrate 311. The substrate stage mechanism 304 may include a substrate stage 319 that holds the substrate 311 and a stage drive mechanism 320 that drives the substrate stage 319. A reference mark 321 may be disposed on the substrate stage 319.

[0043] The foreign matter detection process in the processing device 2 as a liquid ejection device can be carried out, for example, immediately after the processing device 2 is mounted on the imprint device 300. Alternatively, the foreign matter detection process can be carried out during the period when the substrate 311 is being exchanged in the imprint device 300.

[0044] FIG. 10 illustrates the operation of the imprint device 300. This operation can be controlled by a control unit 306. In step S11, a processing device 2 as a liquid ejection device can be mounted on the imprint device 300 by an operation mechanism (not shown) or an operator. In step S12, in the processing device 2, removal and detection of foreign matter can be performed through circulation of the liquid by a circulation unit 40. In step S13, an imprint job is started. In step S14, the substrate 311 is loaded into the imprint device 300, and in step S15, a pattern formation process can be performed on the substrate 311. The pattern formation process may include a coating step of applying a liquid 8 (curable composition) to the substrate 311 by the processing device 2 (liquid ejection device), and a molding step of molding the liquid 8 using a mold 307. The molding step may include a contact step of bringing the mold 307 into contact with the liquid 8 on the substrate 311, a curing step of forming a cured film by irradiating the liquid 8 with curing light 308 to cure the liquid 8, and a separation step of separating the mold 307 from the cured film. When the pattern formation process is performed in units of shot areas, the pattern formation process can be sequentially performed on a plurality of shot areas of the substrate 311.

[0045] In step S16, the substrate 311 can be unloaded from the imprint apparatus 300. At the timing when the unloading of the substrate 311 is started, or after the unloading of the substrate 311 is started, in step S17, foreign matter can be removed and detected through the circulation of the liquid by the circulation unit 40. Alternatively, step S17 may be performed each time a plurality of substrates 311 are processed.

[0046] Hereinafter, the processing apparatus 2 of the third embodiment will be described. Matters not referred to as the third embodiment may follow the second embodiment. FIG. 11 schematically shows the configuration of the processing apparatus 2 of the third embodiment. The processing apparatus 2 of the third embodiment is an improved example of the processing apparatus 2 of the second embodiment. The processing apparatus 2 of the third embodiment differs from the processing apparatus 2 of the second embodiment in the configuration of the circulation unit 40.

[0047] In the third embodiment, the flow path 43 includes a first flow path 431 as a bypass flow path that bypasses the foreign matter detection unit 100 and a second flow path 432 that passes through the foreign matter detection unit 100, and either the first flow path 431 or the second flow path 432 is selected by the three-way valve 46. The three-way valve 46 can be controlled by the control unit 75. In one example, in the first mode of removing foreign matter without detecting foreign matter, the three-way valve 46 is set to pass through the first flow path 431. In the first mode, since the liquid does not flow through the foreign matter detection unit 100, it is possible to prevent a decrease in the function of the foreign matter detection unit 100, specifically, blockage of the capture nozzle 112 due to the capture of foreign matter by the capture nozzle 112. In the second mode of detecting foreign matter, the three-way valve 46 is set to pass through the second flow path 432, and foreign matter is detected by the foreign matter detection unit 100. In one operation example, in the first mode, after the foreign matter in the liquid 8 is sufficiently removed, it can be switched from the first mode to the second mode, and the foreign matter detection process can be performed. The three-way valve 46 can function as a switching mechanism for switching modes or a selector for selecting modes. The processing apparatus 2 may have other modes other than the first mode and the second mode.

[0048] FIG. 12 illustrates the operation of the processing apparatus 2 in the third embodiment. This operation can be controlled by the control unit 75. In step S21, foreign matters already present in the plurality of capture nozzles 112 of the foreign matter detection unit 100 are detected. Here, among all the capture nozzles 112, the capture nozzles 112 in which foreign matters already exist are excluded from the capture nozzles 112 used in the subsequent foreign matter detection process. That is, in step S21, the capture nozzles 112 in which no foreign matters are detected are used in the following foreign matter detection process.

[0049] In step S22, the three-way valve 46 is set so that the first flow path 431 is used, the pump 42 is driven for a certain period of time, and the foreign matters in the liquid 8 are removed by the filter 41. Next, in step S23, the three-way valve 46 is set so that the second flow path 432 is used. In step S22, the three-way valve 46 is set so that the first flow path 431 is used, and the pump 42 is activated. Thereby, it becomes possible to detect foreign matters by the foreign matter detection unit 100, and it also becomes possible to remove foreign matters by the foreign matter detection unit 100 and the filter 41. In step S24, foreign matters are detected by the foreign matter detection unit 100. At this time, the capture nozzles 112 in which foreign matters exist are specified, and the capture nozzles 112 can be excluded from the capture nozzles 112 used in the subsequent foreign matter detection process.

[0050] In step S25, it is determined whether foreign matters are detected by the foreign matter detection unit 100 in step S24. If foreign matters are detected by the foreign matter detection unit 100 in step S24, the process returns to step S22, and steps S22, S23, and S24 are executed again. On the other hand, if no foreign matters are detected by the foreign matter detection unit 100 in step S24, the pump 42 is stopped, and the circulation of the liquid 8 by the circulation unit 40 is stopped.

[0051] The processing device 2 of the fourth embodiment will be described below. Matters not mentioned as the fourth embodiment may follow the second or third embodiment. In FIG. 13, the configuration of the processing device 2 of the fourth embodiment is schematically shown. The processing device 2 of the fourth embodiment is an improved example of the processing device 2 of the second or third embodiment. The processing device 2 of the fourth embodiment differs from the processing device 2 of the second or third embodiment in the configuration of the circulation unit 40.

[0052] In the fourth embodiment, three-way valves 46, 47, and 48 are provided in the circulation unit 40. In the foreign object detection mode for performing foreign object detection processing, the three-way valves 46, 47, and 48 are set as indicated by the dotted arrows so that the liquid 8 flows in the forward direction through the foreign object detection unit 100. On the other hand, in the cleaning mode for cleaning the foreign object detection unit 100, the three-way valves 46, 47, and 48 are set as indicated by the solid arrows so that the liquid 8 flows in the reverse direction through the foreign object detection unit 100. Here, the forward direction is the direction in which the liquid flows from the first space 151 of the foreign object detection unit 100 through the capture nozzle 112 to the second space 152, as described in the first embodiment. The reverse direction is the direction in which the liquid flows from the second space 152 of the foreign object detection unit 100 through the capture nozzle 112 to the first space 151. The three-way valves 46, 47, and 48 can be controlled by the control unit 75. By implementing the cleaning mode, foreign objects captured by the capture nozzle 112 can be removed, and the foreign object detection function of the capture nozzle 112 can be restored. From another perspective, by implementing the cleaning mode, foreign objects captured by the capture nozzle 112 can be removed, and the foreign object detection sensitivity of the capture nozzle 112 can be restored.

[0053] A filter 45 for removing foreign objects may be provided in the circulation unit 40. In the example of FIG. 13, in the cleaning mode, the liquid 8 sucked out from the first space 15 of the container 12 by the pump 42 is supplied to the foreign object detection unit 100 through the three-way valve 46, the filter 45, and the three-way valve 48, and flows through the foreign object detection unit 100 in the reverse direction. The liquid 8 that has flowed through the foreign object detection unit 100 in the reverse direction then returns to the first space 15 of the container 12 through the three-way valve 47 and the filter 42.

[0054] In the foreign object detection mode, the liquid 8 sucked out from the first space 15 of the container 12 by the pump 42 is supplied to the foreign object detection unit 100 through the three-way valves 46 and 47 and flows through the foreign object detection unit 100 in the forward direction. The liquid 8 that has flowed through the foreign object detection unit 100 in the forward direction then returns to the first space 15 of the container 12 through the three-way valve 48 and the filter 42. In the foreign object detection mode, foreign objects can be detected by the foreign object detection unit 100 and removed from the liquid 8. The foreign object detection mode can be implemented, for example, according to the procedure shown in FIG. 8 referred to in the first embodiment.

[0055] FIG. 14 illustrates a procedure for maintenance processing of the foreign object detection unit 100. This procedure can be controlled by the control unit 75. In step S41, the number of foreign objects, in other words, the number of capture nozzles 112 in which foreign objects are present, can be detected. In step S42, it is determined whether the number of foreign objects is less than or equal to a specified value. If the number of foreign objects is less than or equal to the specified value, the maintenance processing ends. On the other hand, if the number of foreign objects is more than the specified value, in step S43, the above-described cleaning mode is implemented.

[0056] In step S44, again, the number of foreign objects, in other words, the number of capture nozzles 112 in which foreign objects are present, can be detected. Note that the number of foreign objects may also be detected in step S43. In step S45, it is determined whether the number of foreign objects is less than or equal to a specified value. If the number of foreign objects is less than or equal to the specified value, the maintenance processing ends. On the other hand, if the number of foreign objects is more than the specified value, the process returns to step S43 and the above-described cleaning mode is implemented again.

[0057] Hereinafter, the processing apparatus 2 of the fifth embodiment will be described. Matters not referred to as the fifth embodiment can follow the first to fourth embodiments. FIG. 15 schematically shows the configuration of the processing apparatus 2 of the fifth embodiment.

[0058] The processing apparatus 2 of the fifth embodiment may include a discharge unit 700 as a functional unit that processes a liquid 8 or performs processing using the liquid, a foreign matter detection unit 100, and a liquid supply unit 80. The foreign matter detection unit 100 may be understood as a component of the liquid supply unit 80. The foreign matter detection unit 100 may have the same configuration as the foreign matter detection unit 100 in the first to third embodiments. In the fifth embodiment, instead of the aforementioned pressure control unit 13, a liquid supply unit 80 is provided, and the liquid supply unit 80 controls the pressure in the internal space of the container 12. Further, in the fifth embodiment, the container 12 does not have a separation membrane 14. Thus, the entire internal space of the container 12 is the first space 15. The liquid supply unit 80 is connected to the container 12 via a flow path 83.

[0059] The liquid supply unit 80 may include, for example, a filter 81 that filters the liquid 8, a positive pressure pump 82, a negative pressure pump 87, a pressure sensor 85, a pressure sensor 86, and a tank 88. The liquid supply unit 80 may supply the liquid 8 from the tank 88 to the container 12 via the flow path 83. The liquid supply unit 80 may send the liquid inside the tank 88 to the foreign matter detection unit 100 by operating the positive pressure pump 82 and the negative pressure pump 87. The liquid 8 that has passed through the foreign matter detection unit 100 may be sent to the container 12 through the filter 81. The filter 81 may remove foreign matter that has passed through the foreign matter detection unit 100. The liquid 8 sucked out from the container 12 returns to the tank 88. As described above, in the processing apparatus 2, the liquid 8 circulates through the flow path 83. Foreign matter in the liquid 8 circulating in such a circulation system is detected and removed by the foreign matter detection unit 100 and is also removed by the filter 81.

[0060] A pressure sensor 85 is disposed in a portion of the flow path 83 from the tank 88 to the container 12, and a pressure sensor 86 is disposed in a portion of the flow path 83 from the container 12 to the tank 88. Based on the pressures detected by the pressure sensors 85 and 86, the control unit 75 may control the pumps 82 and 87 so that the pressure of the liquid 8 in the internal space of the container 12 becomes a negative pressure within the range of -0.1 to -1000 Pa. Here, the control unit 75 may control the pumps 82 and 87 so that the pressure detected by the pressure sensor 85 becomes a positive pressure and the pressure detected by the pressure sensor 86 becomes a negative pressure. As a result, the state of the meniscus formed by the liquid 8 inside the discharge nozzles of the discharge head 11 can be stabilized, and the discharge of the liquid 8 can be controlled with good reproducibility.

[0061] The processing apparatus 2 of the fifth embodiment discharges the liquid 8 toward the member to be coated while circulating the liquid 8 by the liquid supply unit 80. When a foreign object is detected by the foreign object detection unit 100, the control unit 75 stops the discharge of the liquid 8 from the discharge head 11 and continues the circulation of the liquid 8, the detection, and the removal of the foreign object. Then, when no new foreign object is detected by the foreign object detection unit 100, the control unit 75 can resume the discharge of the liquid 8 from the discharge head 11.

[0062] Also in the fifth embodiment, as in the third embodiment, a first flow path bypassing the foreign object detection unit 100 and a second flow path passing through the foreign object detection unit 100 may be provided to realize the first mode and the second mode. In the first mode, by removing the foreign object by the filter 81 while bypassing the foreign object detection unit 100, it is possible to prevent a decrease in the foreign object detection function or the foreign object detection sensitivity of the foreign object detection unit 100.

[0063] Further, also in the fifth embodiment, as in the fourth embodiment, a function of cleaning the foreign object detection unit 100 while flowing the liquid in the opposite direction to the foreign object detection unit 100 may be provided.

[0064] Hereinafter, as a sixth embodiment, an article manufacturing method for manufacturing an article using the processing apparatus including the coating unit described above will be described. The article manufacturing method may include a film forming step of forming a film on a substrate by the processing apparatus, and a processing step of obtaining an article by processing the substrate that has undergone the film forming step. The film may be, for example, a film on which a mold pattern is transferred. Alternatively, the film may be a film planarized using a mold having a flat surface. Alternatively, the film may be an organic film. The processing step may include, for example, an etching step, a film forming step, a dicing step, and a sealing step. The article manufacturing method may include a plurality of film forming steps and a plurality of processing steps. From another perspective, the article manufacturing method includes a plurality of processes, and each process may include a film forming step and a processing step. The article may be, for example, a semiconductor device or a display panel.

[0065] This specification and the drawings include the following disclosures. (Item 1) A functional unit that processes a liquid or performs processing using a liquid, A flow path connected to the functional unit, A foreign matter detection unit disposed in the flow path, and The foreign matter detection unit includes a capture nozzle disposed such that the liquid flows through the flow path, and a sensor that detects capture of foreign matter by the capture nozzle. A processing apparatus characterized by the above. (Item 2) The sensor detects capture of foreign matter by the capture nozzle based on residual vibration of the capture nozzle generated by applying vibration to the capture nozzle. The processing apparatus according to Item 1, characterized by the above. (Item 3) The sensor includes a piezoelectric element, and the piezoelectric element detects the residual vibration of the capture nozzle generated by applying vibration to the capture nozzle by the piezoelectric element, and detects capture of foreign matter by the capture nozzle based on the residual vibration. The processing apparatus according to Item 1, characterized by the above. (Item 4) It further includes a bypass flow path that bypasses the foreign object detection unit and a filter provided in the bypass flow path, and it is possible to flow the liquid through the bypass flow path without flowing the liquid through the foreign object detection unit. The processing apparatus according to any one of Items 1 to 3, characterized in that. (Item 5) The direction in which the liquid flows through the foreign object detection unit can be switched. The processing apparatus according to any one of Items 1 to 4, characterized in that. (Item 6) The foreign object detection unit includes a separation wall arranged so as to separate the flow path into a first part and a second part, and the capture nozzle is arranged on the separation wall so as to communicate the first part and the second part. The processing apparatus according to any one of Items 1 to 5, characterized in that. (Item 7) A plurality of capture nozzles are arranged on the separation wall so as to communicate the first part and the second part, and the plurality of capture nozzles include the capture nozzle. The processing apparatus according to Item 6, characterized in that. (Item 8) The foreign object detection unit further includes a first member that defines a first space communicating with the first part and a second member that defines a second space communicating with the second part, and the cross-sectional areas of the first space and the second space are larger than the cross-sectional area of the flow path. The processing apparatus according to Item 6, characterized in that. (Item 9) The foreign object detection unit performs a foreign object detection operation when the liquid is moving from the first space to the second space, the capture nozzle has an inlet on the side of the first space and an outlet on the side of the second space, and the cross-sectional area of the inlet is larger than the cross-sectional area of the outlet. The processing apparatus according to Item 8, characterized in that. (Item 10) In a direction orthogonal to the direction from the first part toward the second part, the inlet and the outlet are displaced from each other, and the capture nozzle has a connection space connecting the inlet and the outlet. The processing apparatus according to item 9, characterized in that. (Item 11) The sensor includes a piezoelectric element, and the piezoelectric element detects residual vibration of the capture nozzle generated by applying vibration to the capture nozzle, and detects capture of foreign matter by the capture nozzle based on the residual vibration. The processing apparatus according to item 10, characterized in that. (Item 12) The piezoelectric element is disposed so as to face the connection space. The processing apparatus according to item 11, characterized in that. (Item 13) The functional unit includes a discharge unit that discharges the liquid. The processing apparatus according to any one of items 1 to 12, characterized in that. (Item 14) The functional unit includes a container that stores the liquid. The flow path is configured such that the liquid circulates through the container and the flow path. The processing apparatus according to item 13, characterized in that. (Item 15) The discharge unit includes a discharge nozzle that discharges the liquid. The discharge nozzle has the same structure as the capture nozzle. The processing apparatus according to item 14, characterized in that. (Item 16) A film forming apparatus including a coating unit that coats a liquid of a curable composition on a substrate, and forming a film on the substrate by molding the curable composition on the substrate using a mold. The coating unit includes the processing apparatus according to any one of items 13 to 15. The film forming apparatus, characterized in that. (Item 17) A film forming step of forming a film of a curable composition on a substrate by the film forming apparatus according to item 16, A processing step of obtaining an article by processing the substrate that has undergone the film forming step, An article manufacturing method characterized by including these steps.

[0066] The invention is not limited to the above embodiments, and various changes and modifications are possible without departing from the spirit and scope of the invention. Therefore, claims are attached to disclose the scope of the invention.

[0067] The invention is not limited to the above embodiments, and various changes and modifications are possible without departing from the spirit and scope of the invention. Therefore, claims are attached to disclose the scope of the invention.

Description of Reference Numerals

[0068] 1, 2: Processing layer apparatus, 100: Foreign matter detection unit, 112: Capture nozzle, 120: Sensor, 210, 220: Functional unit, 230: Flow path

Claims

1. A functional unit that processes a liquid or performs a process using a liquid, a flow path connected to the functional unit, and a foreign object detection unit disposed in the flow path, wherein the foreign object detection unit includes a capture nozzle disposed such that the liquid flows through the flow path, and a sensor that detects capture of a foreign object by the capture nozzle. A processing apparatus characterized by the above.

2. The sensor detects capture of a foreign object by the capture nozzle based on residual vibration of the capture nozzle generated by applying vibration to the capture nozzle. The processing apparatus according to claim 1, characterized by the above.

3. The sensor includes a piezoelectric element, detects residual vibration of the capture nozzle generated by applying vibration to the capture nozzle by the piezoelectric element by the piezoelectric element, and detects capture of a foreign object by the capture nozzle based on the residual vibration. The processing apparatus according to claim 1, characterized by the above.

4. The processing apparatus further includes a bypass flow path that bypasses the foreign object detection unit and a filter provided in the bypass flow path, and it is possible to flow the liquid through the bypass flow path without flowing the liquid through the foreign object detection unit. The processing apparatus according to claim 1, characterized by the above.

5. The direction in which the liquid flows through the foreign object detection unit can be switched. The processing apparatus according to claim 1, characterized by the above.

6. The foreign object detection unit includes a separation wall disposed so as to separate the flow path into a first part and a second part, and the capture nozzle is disposed on the separation wall so as to communicate the first part and the second part. The processing apparatus according to claim 1.

7. A plurality of capture nozzles are disposed on the separation wall so as to communicate the first part and the second part, and the plurality of capture nozzles include the capture nozzle. The processing apparatus according to claim 6, characterized by the above.

8. The foreign object detection unit further includes a first member that defines a first space communicating with the first part and a second member that defines a second space communicating with the second part, and the cross-sectional areas of the first space and the second space are larger than the cross-sectional area of the flow path. The processing apparatus according to claim 6, characterized by the above.

9. The foreign object detection unit performs a foreign object detection operation when the liquid is moving from the first space to the second space, the capture nozzle has an inlet on the side of the first space and an outlet on the side of the second space, and the cross-sectional area of the inlet is larger than the cross-sectional area of the outlet. The processing apparatus according to claim 8, characterized in that...

10. In a direction orthogonal to the direction from the first part to the second part, the inlet and the outlet are arranged offset from each other, and the capture nozzle has a connection space connecting the inlet and the outlet. The processing apparatus according to claim 9, characterized in that...

11. The sensor includes a piezoelectric element, and the piezoelectric element detects residual vibration of the capture nozzle generated by applying vibration to the capture nozzle by the piezoelectric element, and detects capture of foreign matter by the capture nozzle based on the residual vibration. The processing apparatus according to claim 10, characterized in that...

12. The piezoelectric element is arranged so as to face the connection space. The processing apparatus according to claim 11, characterized in that...

13. The functional unit includes a discharge unit that discharges the liquid. The processing apparatus according to any one of claims 1 to 12, characterized in that...

14. The functional unit includes a container that stores the liquid, and the flow path is configured such that the liquid circulates through the container and the flow path. The processing apparatus according to claim 13, characterized in that...

15. The discharge unit includes a discharge nozzle that discharges the liquid, and the discharge nozzle has the same structure as the capture nozzle. The processing apparatus according to claim 14, characterized in that...

16. A film forming apparatus including an application unit that applies a liquid of a curable composition onto a substrate, and forming a film on the substrate by molding the curable composition on the substrate using a mold. The application unit includes the processing apparatus according to claim 13. The film forming apparatus, characterized in that...

17. A film forming step of forming a film of a curable composition on a substrate by the film forming apparatus according to claim 16, and a processing step of obtaining an article by processing the substrate that has undergone the film forming step. An article manufacturing method, characterized by including... ​ ​ ​

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