Exposure apparatus, control method, and method for producing article

Abstract

To provide a technique advantageous for highly accurately positioning a light-shielding member without reducing the throughput.SOLUTION: An exposure apparatus that exposes a substrate via an original plate has a drive part, a setting part, and a control part. The control part performs first drive control of driving a light-shielding member toward a target position at a first resolution by the drive part. In the case where a target projection position at which the target position is projected onto the substrate is positioned in a first region where a distance from the projection range is a predetermined distance or less, the control part performs second drive control of driving the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive part if a deviation between a position of the light-shielding member after the first drive control is performed and the target position exceeds a threshold value, and in the case where the target projection position is positioned in a second region other than the first region, the control part does not perform the second drive control regardless of a position of the light-shielding member after the first drive control is performed.SELECTED DRAWING: Figure 5

Description

Technical Field

[0001] The present invention relates to an exposure apparatus, a control method, and a method for manufacturing an article.

Background Art

[0002] In a photolithography process, which is one of the manufacturing processes for semiconductor elements, imaging elements, liquid crystal display elements, thin film magnetic heads, and other devices, an exposure apparatus is used. The exposure apparatus projects and transfers a pattern formed on a master (reticle, mask) onto a substrate (wafer, glass plate) coated with a photosensitive agent such as a resist through a projection optical system.

[0003] In an exposure apparatus, in order to accurately transfer the pattern of the master onto the substrate, it is required to align the master and the substrate with high precision. In order to improve the alignment accuracy between the master and the substrate, it is necessary to detect (observe) alignment marks provided on the master or the substrate with a dedicated position measuring device and align the master and the substrate.

[0004] In an exposure apparatus, generally, since a pattern is transferred to the same substrate a plurality of times, when light (illumination light) from the illumination optical system irradiates a pattern (circuit pattern) or an alignment mark adjacent to a predetermined region on the substrate, it becomes a cause of product defects. Therefore, a light shielding member provided between the illumination optical system and the substrate is driven to shield the illumination light so that the illumination light does not leak (is not irradiated) to regions other than the predetermined region on the substrate. However, when the light shielding member is driven to a position deviated from the target position, leakage of the illumination light occurs, so it is necessary to position the light shielding member at the target position with high precision. In addition, since the driving speed of the light shielding member affects the throughput (productivity) of the exposure apparatus, it is preferably high.

[0005] Therefore, technologies for driving an object to be driven, such as a light-shielding member, at high speed and with high precision have been proposed (see Patent Documents 1 and 2). Patent Document 1 discloses a technique in which when the driving distance to a target position is greater than a preset distance, the object to be driven is driven by rough feed, and when the driving distance to the target position is less than or equal to the preset distance, the object to be driven is driven by fine feed. According to such a technique, even when the object to be driven is driven by fine feed, an increase in driving time can be suppressed. Further, Patent Document 2 discloses a technique in which a driving resolution is selected according to the driving distance of an object to be driven to a target position, and feedback control is performed until the number of rising or falling edges of a pulse signal corresponding to the driving distance matches the number of edges of the generated pulse signal.

Prior Art Documents

Patent Documents

[0006]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0007] However, by driving the light-shielding member with high resolution, the positioning accuracy can be improved. However, when driving the light-shielding member at a higher resolution while driving it at high speed, the pulse frequency must be increased. When the pulse frequency increases, problems such as torque reduction and noise occur. Therefore, when driving the light-shielding member at a higher resolution, it is necessary to reduce the driving speed.

[0008] In addition, it is also possible to improve the positioning accuracy by performing a process (trapping process) of additionally driving the light-shielding member until the deviation amount from the target position reaches a predetermined threshold value. Here, when improving the positioning accuracy by driving the light-shielding member with high resolution, it is necessary to set a low threshold value for the deviation amount from the target position, so the probability of the trapping process occurring (being performed) increases. When the trapping process occurs, it takes time until the entire process ends. In particular, in an apparatus in which a plurality of units are provided in parallel, when the trapping process occurs in a predetermined unit, other units must be provided with a waiting time until such a trapping process ends.

[0009] Thus, when improving the positioning accuracy by driving the light-shielding member with high resolution, there is a risk of causing a decrease in the driving speed of the light-shielding member and a decrease in throughput due to an increase in the probability of the trapping process occurring.

[0010] The present invention has been made in view of such problems of the prior art, and an exemplary object thereof is to provide a technique advantageous for positioning the light-shielding member with high precision without reducing the throughput.

Means for Solving the Problems

[0011] To achieve the above object, an exposure apparatus according to one aspect of the present invention is an exposure apparatus that exposes a substrate through a reticle, and includes a drive unit that drives a light-shielding member for restricting the range of exposure light incident on the substrate, a setting unit that sets a projection range on the substrate on which the pattern is projected based on at least one of the pattern of the reticle and the shot layout of the substrate, and a control unit that performs drive control of the drive unit so that the light-shielding member is positioned at a target position. The control unit performs first drive control to drive the light-shielding member toward the target position at a first resolution by the drive unit. When the target projection position obtained by projecting the target position onto the substrate is located in a first region where the distance from the projection range is equal to or less than a predetermined distance, if the deviation between the position of the light-shielding member after performing the first drive control and the target position exceeds a threshold value, the control unit performs second drive control to drive the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive unit. When the target projection position is located in a second region other than the first region, the second drive control is not performed regardless of the position of the light-shielding member after performing the first drive control.

[0012] A further object or other aspect of the present invention will be clarified by embodiments described below with reference to the accompanying drawings.

Advantages of the Invention

[0013] According to the present invention, for example, it is possible to provide a technique advantageous for positioning a light-shielding member with high precision without reducing throughput.

Brief Description of the Drawings

[0014]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Mode for Carrying Out the Invention

[0015] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention according to the claims. Although a plurality of features are described in the embodiments, not all of these plurality of features are essential to the invention, and the plurality of features may be arbitrarily combined. Further, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant descriptions are omitted.

[0016] FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus 101 as one aspect of the present invention. The exposure apparatus 101 is used in a manufacturing process of articles such as semiconductor elements, imaging elements, liquid crystal display elements, thin film magnetic heads, and other devices, and is a lithography apparatus that forms a pattern on a substrate by exposing the substrate through a reticle. In the present embodiment, the exposure apparatus 101 performs a process (exposure process) of projecting and transferring a pattern of a reticle (mask or reticle) onto a substrate (such as a glass substrate or a wafer) through a projection optical system.

[0017] In this specification and the accompanying drawings, directions are indicated in an XYZ coordinate system in which the direction parallel to the surface on which the substrate is disposed is the XY plane. The directions parallel to the X-axis, Y-axis, and Z-axis in the XYZ coordinate system are the X-direction, Y-direction, and Z-direction, respectively, and the rotations around the X-axis, Y-axis, and Z-axis are θX, θY, and θZ, respectively.

[0018] As shown in FIG. 1, the exposure apparatus 101 includes an illumination optical system 103 that illuminates a reticle 104 with light from a light source, a reticle stage 105 that holds the reticle 104, and a projection optical system 108 that projects the pattern of the reticle 104 onto a substrate 111. The exposure apparatus 101 further includes a substrate stage 112 that holds the substrate 111, light shielding members 106 and 109, drive units 107 and 110, measurement units 115 and 117, a control unit 102, and a display unit 119.

[0019] In the exposure apparatus 101, the light from the illumination optical system 103 illuminates the pattern of the reticle 104 held by the reticle stage 105 and is projected onto the substrate 111 held by the substrate stage 112 via the projection optical system 108.

[0020] The light shielding members 106 and 109 are plate members (blades) provided between the illumination optical system 103 and the substrate 111 for restricting the range of the light (exposure light) incident on the substrate from the projection optical system 108 by partially shielding (blocking) the light passing therebetween. In the present embodiment, the light shielding member 106 is disposed between the reticle 104 and the projection optical system 108, and the light shielding member 109 is disposed between the projection optical system 108 and the substrate 111.

[0021] The drive units 107 and 110 have functions for driving the light shielding members 106 and 109 provided between the illumination optical system 103 and the substrate 111. The drive unit 107 drives the light shielding member 106 disposed between the reticle 104 and the projection optical system 108, and the drive unit 110 drives the light shielding member 109 disposed between the projection optical system 108 and the substrate 111.

[0022] In this embodiment, the drive units 107 and 110 are each configured to be able to switch the resolution (drive resolution) for driving the light-shielding members 106 and 109 between a first resolution and a second resolution higher than the first resolution. FIG. 2 is a diagram showing an example of the configuration of a drive unit DU applicable to the drive units 107 and 110. As shown in FIG. 2, the drive unit DU includes a printed circuit board 601, a motor control unit 602, a resolution switching unit 603, a resolution setting unit 604, and a motor 605 for driving the light-shielding member. Here, the resolution represents the driving amount of the light-shielding member per pulse by the motor 605.

[0023] The printed circuit board 601 gives a command to the motor control unit 602 to switch the resolution of the motor 605, and in this embodiment, a command for specifying the first resolution or the second resolution. Based on the command from the printed circuit board 601, the motor control unit 602 switches (switches) the resolution to be set for the motor 605 by the resolution setting unit 604 in the resolution switching unit 603. For example, in the resolution switching unit 603, by switching the switch 603A from on (ON) to off (OFF) and the switch 603B from off to on, the resolution to be set for the motor 605 is switched from the first resolution to the second resolution. Also, in the resolution switching unit 603, by switching the switch 603A from off to on and the switch 603B from on to off, the resolution to be set for the motor 605 is switched from the second resolution to the first resolution. The resolution setting unit 604 sets the resolution (first resolution or second resolution) corresponding to the switching of the switches 603A and 603B in the resolution switching unit 603 for the motor 605.

[0024] Note that the configuration of the drive unit applicable to the drive units 107 and 110 is not limited to the configuration of the drive unit DU shown in FIG. 2, and any configuration that can switch the resolution for driving the light-shielding members 106 and 109 is acceptable. For example, it may include a first motor for driving the light-shielding members 106 and 109 at the first resolution and a second motor for driving them at the second resolution, and be configured to switch the motors for driving the light-shielding members 106 and 109 between the first motor and the second motor.

[0025] The measurement units 115 and 117 each include an interferometer, an encoder, etc., and measure the position of the light shielding member 106 disposed between the original plate 104 and the projection optical system 108, and the position of the light shielding member 109 disposed between the projection optical system 108 and the substrate 111.

[0026] The control unit 102 is constituted by a computer (information processing apparatus) including, for example, a CPU, a memory, etc. The control unit 102 comprehensively controls each part of the exposure apparatus 101 according to a program stored in a storage unit or the like to operate the exposure apparatus 101. The control unit 102 controls an exposure process of projecting and transferring the pattern of the original plate 104 onto the substrate 111 via the projection optical system 108. Further, in the exposure process, the control unit 102 performs drive control of the drive units 107 and 110 that drive the light shielding members 106 and 109 so that the light shielding members 106 and 109 are positioned at target positions based on the measurement results and various information by the measurement units 115 and 117.

[0027] The display unit 119 is a display device for displaying various information regarding the exposure apparatus 101. The display unit 119 includes, for example, a touch panel, displays a user interface including various screens, and receives operations from the user. Note that the display unit 119 may be configured integrally with (in a common housing) the exposure apparatus 101, or may be configured separately from (in a separate housing) the exposure apparatus 101. For example, the display unit 119 may be provided in a management room where a user who manages the exposure apparatus 101 is stationed.

[0028] FIG. 3 is a diagram showing how the light shielding members 106 and 109 shield exposure light from the viewpoint of the original plate stage 105 side to the substrate stage 112 side. In the present embodiment, the light shielding member 106 restricts the range of the exposure light in the Y direction on the substrate by shielding the exposure light in the Y direction, and the light shielding member 109 restricts the range of the exposure light in the X direction on the substrate by shielding the exposure light in the X direction.

[0029] In the process where the light from the illumination optical system 103 is irradiated onto the substrate 111 held by the substrate stage 112, if such light is irradiated (leaks) onto areas other than the predetermined area on the substrate, for example, adjacent patterns or alignment marks, it will cause product defects. Therefore, in order to irradiate the light from the illumination optical system 103 only onto the predetermined area on the substrate, the light shielding members 106 and 109 are driven and positioned at the target positions to shield the light irradiated onto areas other than the predetermined area on the substrate. Thereby, it is possible to avoid the light from the illumination optical system 103 leaking onto areas other than the predetermined area on the substrate. In particular, in areas where the interval between adjacent patterns is narrow, it is necessary to position the light shielding members 106 and 109 with high precision so that the light from the illumination optical system 103 does not leak onto areas other than the predetermined area on the substrate.

[0030] First, before explaining the drive control of the drive units 107 and 110 in the present embodiment, specifically, the drive control for positioning (placing) the light shielding members 106 and 109 at the target positions, the drive control of the drive units 107 and 110 in the prior art will be explained. As described above, the drive control of the drive units 107 and 110 is performed (controlled) by the control unit 102.

[0031] FIG. 4 is a flowchart for explaining the drive control of the drive units 107 and 110 in the prior art. In S201, based on the exposure pattern (exposure area) set by the user, the target positions at which the light shielding members 106 and 109 should be positioned are set.

[0032] In S202, the drive units 107 and 110 drive the light shielding members 106 and 109 so that the light shielding members 106 and 109 are positioned at the target positions set in S201. In this way, drive control is performed to drive the light shielding members 106 and 109 toward the target positions by the drive units 107 and 110.

[0033] In S203, it is determined whether the deviation (position deviation amount) between the positions of the light-shielding members 106 and 109 measured by the measurement units 115 and 117 (the current positions of the light-shielding members 106 and 109 after the drive control was performed in S202) and the target position exceeds a threshold value. If the position deviation amount does not exceed the threshold value, it is considered that the positions of the light-shielding members 106 and 109 are not deviated from the target position, and the drive control of the drive units 107 and 110 is terminated (normally terminated). On the other hand, if the position deviation amount exceeds the threshold value, the process proceeds to S204.

[0034] In S204, based on the positions of the light-shielding members 106 and 109 measured in S203, the drive amounts of the light-shielding members 106 and 109 are calculated. Specifically, the difference between the current positions and the target positions of the light-shielding members 106 and 109, that is, the position deviation amount, is calculated as the drive amounts of the light-shielding members 106 and 109.

[0035] In S205, according to the drive amounts calculated in S204, the drive units 107 and 110 drive the light-shielding members 106 and 109 so that the light-shielding members 106 and 109 are positioned at the target positions. In this way, additional drive control is performed to drive the light-shielding members 106 and 109 by the drive amounts calculated in S204 toward the target positions by the drive units 107 and 110.

[0036] In S206, it is determined whether the deviation (position deviation amount) between the positions of the light-shielding members 106 and 109 measured by the measurement units 115 and 117 (the current positions of the light-shielding members 106 and 109 after the additional drive control was performed in S205) and the target position exceeds a threshold value. If the position deviation amount does not exceed the threshold value, it is considered that the positions of the light-shielding members 106 and 109 are not deviated from the target position, and the drive control of the drive units 107 and 110 is terminated (normally terminated). On the other hand, if the position deviation amount exceeds the threshold value, the process proceeds to S207.

[0037] In S207, it is determined whether the number of additional drive controls performed in S205 exceeds a predetermined number. If the number of additional drive controls does not exceed the predetermined number, the process proceeds to S204 in order to perform further additional drive controls. On the other hand, if the number of additional drive controls exceeds the predetermined number, an error is output and the drive controls of drive units 107 and 110 are terminated (abnormally terminated).

[0038] As described above, in the prior art, when driving the light-shielding members 106 and 109, even when the target position does not require positioning accuracy, additional drive controls are repeated until the difference between the positions of the light-shielding members 106 and 109 and the target position is within the threshold value. Also, in the prior art, the light-shielding members 106 and 109 are driven with a resolution corresponding to high-speed driving.

[0039] In the prior art, in order to improve the positioning accuracy of the light-shielding members 106 and 109, in order to drive the light-shielding members 106 and 109 with a higher resolution, it is necessary to suppress an increase in the pulse frequency and reduce the driving speed. Also, when improving the positioning accuracy of the light-shielding members 106 and 109, since it is necessary to set the threshold values used in S203 and S206 low, the probability of occurrence of additional drive controls (S205) increases. Therefore, even when the target positions of the light-shielding members 106 and 109 do not require positioning accuracy, the possibility of occurrence of additional drive controls increases, and it tends to take time until the entire process is completed. Therefore, in the prior art, when improving the positioning accuracy by driving the light-shielding members 106 and 109 with a higher resolution, the driving speed of the light-shielding members 106 and 109 decreases, and the probability of occurrence of additional drive controls increases, resulting in a decrease in throughput.

[0040] Therefore, in the present embodiment, a drive control (control method for controlling drive units 107 and 110) of drive units 107 and 110 that enables the light-shielding members 106 and 109 to be positioned with high accuracy without reducing throughput is provided.

[0041] <First Embodiment> FIG. 5 is a flowchart for explaining the drive control of the drive units 107 and 110 in the first embodiment. In S301, based on the exposure pattern (exposure area) set by the user, target positions for positioning the light-shielding members 106 and 109 are set.

[0042] In S302, based on at least one of the pattern of the original plate 104 and the shot layout of the substrate 111, a projection range (pattern projection exposure range) on the substrate onto which the pattern of the original plate 104 is projected is set. In the present embodiment, the control unit 102 functions as a setting unit that sets the projection range based on, for example, the design information of the pattern of the original plate 104 and the exposure recipe including the shot layout of the substrate 111. The projection range can be freely set according to the pattern of the original plate 104 and the shot layout of the substrate 111, and a plurality of projection ranges may be set on the same substrate. Specifically, an area for which the result of exposure through the original plate 104 should be guaranteed or an area where a circuit corresponding to the pattern of the original plate 104 should be transferred is set as the projection range. Information regarding the projection range may be held in association with the pattern of the original plate 104 and the shot layout of the substrate 111, or may be held in association with specific position information within the drivable range of the light-shielding members 106 and 109.

[0043] In S303, in the drive units 107 and 110, a first resolution is set as the resolution for driving the light-shielding members 106 and 109. Note that as the first resolution, any resolution can be set as long as it satisfies the driving speed and torque conditions when driving the light-shielding members 106 and 109 at the first resolution.

[0044] In S304, the drive units 107 and 110 drive the light-shielding members 106 and 109 at the first resolution set in S303 so that the light-shielding members 106 and 109 are positioned at the target positions set in S301. In this way, first drive control is performed in which the drive units 107 and 110 drive the light-shielding members 106 and 109 at the first resolution toward the target positions.

[0045] In S305, it is determined whether the target projection position obtained by projecting the target position set in S301 onto the substrate is in the vicinity of the projection range set in S302, that is, whether it is located in a first region where the distance from the projection range is equal to or less than a predetermined distance. If the target projection position is not located in the first region, the drive control of the drive units 107 and 110 is terminated (normally terminated) without measuring the positions (current positions) of the light-shielding members 106 and 109 or calculating the deviation between the positions of the light-shielding members 106 and 109 and the target position. In other words, if the target projection position is located in a second region other than the first region, the drive control of the drive units 107 and 110 is terminated without performing the second drive control (S309) described later, regardless of the positions of the light-shielding members 106 and 109 after the first drive control. On the other hand, if the target projection position is located in the first region, the process proceeds to S306.

[0046] In S306, it is determined whether the deviation (position deviation amount) between the positions of the light-shielding members 106 and 109 measured by the measurement units 115 and 117 (the current positions of the light-shielding members 106 and 109 after the first drive control in S304) and the target position exceeds a threshold value. If the position deviation amount does not exceed the threshold value, the drive control of the drive units 107 and 110 is terminated (normally terminated) on the assumption that the positions of the light-shielding members 106 and 109 are not deviated from the target position. On the other hand, if the position deviation amount exceeds the threshold value, the process proceeds to S307.

[0047] In S307, based on the positions of the light-shielding members 106 and 109 measured in S306, the drive amounts of the light-shielding members 106 and 109 are calculated. Specifically, the difference between the current positions of the light-shielding members 106 and 109 and the target position, that is, the position deviation amount, is calculated as the drive amounts of the light-shielding members 106 and 109.

[0048] In S308, in the drive units 107 and 110, a second resolution higher than the first resolution is set as the resolution for driving the light-shielding members 106 and 109.

[0049] In S309, in accordance with the driving amount calculated in S307, the driving units 107 and 110 drive the light-shielding members 106 and 109 at the second resolution set in S308 so that the light-shielding members 106 and 109 are positioned at the target positions. In this way, second driving control is performed in which the driving units 107 and 110 drive the light-shielding members 106 and 109 toward the target positions at the second resolution by the driving amount calculated in S307. Note that the second driving control is performed at a driving speed at which the light-shielding members 106 and 109 can be driven at the second resolution set in S308.

[0050] In S310, it is determined whether or not the deviation (position deviation amount) between the positions of the light-shielding members 106 and 109 measured by the measurement units 115 and 117 (the current positions of the light-shielding members 106 and 109 after the second driving control is performed in S309) and the target position exceeds a threshold value. If the position deviation amount does not exceed the threshold value, it is considered that the positions of the light-shielding members 106 and 109 are not deviated from the target positions, and the driving control of the driving units 107 and 110 is terminated (normal termination). On the other hand, if the position deviation amount exceeds the threshold value, the process proceeds to S311.

[0051] In S311, it is determined whether or not the number of times of the second driving control performed in S309 exceeds a predetermined number of times. If the number of times of the second driving control does not exceed the predetermined number of times, the process proceeds to S307 to perform the second driving control further. On the other hand, if the number of times of the second driving control exceeds the predetermined number of times, an error is output and the driving control of the driving units 107 and 110 is terminated (abnormal termination).

[0052] Here, in S305, an explanation will be given regarding the setting of a first region used to determine whether the target projection position is in the vicinity of the projection range, that is, a first region where the distance from the projection range is equal to or less than a predetermined distance. For example, if the interval between adjacent shot regions on the substrate is narrow and the light-shielding members 106 and 109 are not positioned with high precision, there is a risk that the exposure light will irradiate adjacent shot regions, resulting in product defects. Such a region is set as the first region. Thus, the region set as the first region includes the region between adjacent shot regions on the substrate. Such a region is also called a scribe line and generally has alignment marks provided thereon. Therefore, it can also be said that the region set as the first region includes the region on the substrate where alignment marks are provided. Also, it is possible to set a plurality of different regions (a plurality of first regions) as the first region. Note that if there is a margin in the interval between adjacent shot regions on the substrate, it is considered that there is no need to position the light-shielding members 106 and 109 with high precision. Therefore, such a region should not be set as the first region. This can suppress the occurrence of unnecessary second drive control.

[0053] FIG. 6 is a diagram showing an example of a user interface UIA that displays a screen for a user to specify (set) a first region where the distance from the projection range is equal to or less than a predetermined distance. The user interface UIA is provided from the control unit 102 to the display unit 119 and displayed. In the user interface UIA, for example, four projection ranges 501 on the substrate set for the substrate 111 held by the substrate stage 112 are displayed. In this case, the twelve regions of regions R1 to R12 above, below, left, and right of the projection range 501 on the substrate can be set as the first region in the vicinity of the projection range 501, that is, the region where it is possible to set the necessity of highly accurate positioning of the light shielding members 106 and 109. The user can freely set the first region that requires highly accurate positioning of the light shielding members 106 and 109 by clicking (selecting) an arbitrary region from regions R1 to R12 in the user interface UIA. Further, as shown in FIG. 6, the user interface UIA may include check boxes corresponding to each of regions R1 to R12. In this case, the user can also freely set the first region that requires highly accurate positioning of the light shielding members 106 and 109 by checking (selecting) the check box corresponding to an arbitrary region. In FIG. 6, among regions R1 to R12 on the substrate, regions R4, R6, R7, and R9 are set (designated) as the first region.

[0054] Also, when driving (retracting) the light shielding members 106 and 109 to a standby position located outside a predetermined region on the substrate, etc., since the target position is not in the vicinity of the projection range, it is not necessary to perform the second drive control. Therefore, the second region other than the first region where the distance from the projection range is equal to or less than a predetermined distance also includes the standby positions of the light shielding members 106 and 109, that is, the regions located outside the projection range where the light shielding members 106 and 109 are made to standby.

[0055] Thus, in this embodiment, when driving the light-shielding members 106 and 109, if the target position is in the first region where positioning accuracy is not required, even if the amount of deviation from the target position exceeds the threshold value, that is, regardless of the amount of deviation, the second drive control is not performed. Also, in this embodiment, in the second drive control, compared with the first drive control, the light-shielding members 106 and 109 are driven with high resolution, so that the positioning accuracy of the light-shielding members 106 and 109 can be improved. Note that since the final positioning accuracy of the light-shielding members 106 and 109 is determined by the resolution at which the light-shielding members 106 and 109 are driven in the second drive control, in the first drive control, the light-shielding members 106 and 109 can be driven at high speed with low resolution.

[0056] According to this embodiment, in the second drive control, the light-shielding members 106 and 109 are driven with high resolution toward the target position. When the target position is in the first region where positioning accuracy is not required, the second drive control is not performed regardless of the amount of deviation from the target position. Thereby, the light-shielding members 106 and 109 can be positioned with high accuracy without reducing the throughput.

[0057] <Second Embodiment> FIG. 7 is a flowchart for explaining the drive control of the drive units 107 and 110 in the second embodiment. Note that S401 to S405 and S407 to S412 are the same as S301 to S305 and S306 to S311 shown in FIG. 5, and thus detailed description thereof is omitted here.

[0058] In S405, the thresholds used in S407 and S411 are set. Such thresholds are thresholds for the deviation (position deviation amount) between the current positions and the target positions of the light-shielding members 106 and 109 after performing the first drive control in S404, and are used to determine whether to perform the second drive control. Thus, in the present embodiment, the thresholds used in S407 and S411 are set after performing the first drive control in S404. Further, in S402, when a plurality of projection ranges are set on the same substrate, different thresholds may be set for each of the plurality of projection ranges, specifically, for a plurality of first regions set in the vicinity of each projection range. In other words, the threshold may be set (changed) for each first region. By setting the threshold for each first region in this way, it is possible to reduce the occurrence of unnecessary second drive control according to the positioning accuracy required for each of the first regions, leading to suppression of throughput reduction.

[0059] FIG. 8 is a diagram showing an example of a user interface UIB that displays a screen for a user to specify (set) a threshold for a first region in addition to the first region where the distance from the projection range is equal to or less than a predetermined distance. The user interface UIB is provided from the control unit 102 to the display unit 119 and displayed. On the user interface UIB, for example, four projection ranges 501 on the substrate set for the substrate 111 held by the substrate stage 112 are displayed. In this case, twelve regions, regions R1 to R12, above, below, left, and right of the projection range 501 on the substrate can be set as first regions in the vicinity of the projection range 501, that is, regions where it is possible to set the necessity of high-precision positioning of the light-shielding members 106 and 109. Further, as shown in FIG. 8, the user interface UIB includes check boxes corresponding to each of the regions R1 to R12 and numerical value fields for specifying (setting) thresholds corresponding to each of the regions R1 to R12. The user can freely set the thresholds for each of the regions R1 to R12 by inputting arbitrary numerical values into the numerical value fields corresponding to each of the regions R1 to R12 in the user interface UIA.

[0060] In FIG. 8, a threshold value of 150 μm is set for regions R1 to R5, a threshold value of 60 μm is set for regions R6 and R7, and a threshold value of 150 μm is set (specified) for regions R8 to R12. Among regions R1 to R12 on the substrate, regions R4, R6, R7, and R9 are set (specified) as the first regions. Therefore, when the target positions of the light-shielding members 106 and 109 are located in regions R4, R6, R7, and R9, second drive control is performed according to the threshold values set for the respective regions. Note that for regions R1 to R3, R5, R8, and R10 to R12 that are not set as the first regions, even if threshold values are set, such threshold values are not referenced and the second drive control is not performed.

[0061] According to the present embodiment, similar to the first embodiment, the light-shielding members 106 and 109 can be positioned with high precision without reducing the throughput.

[0062] The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as semiconductor elements, liquid crystal display elements, flat panel displays, and MEMS. Such a manufacturing method includes a step of exposing a substrate coated with a photosensitive agent using the exposure apparatus 101 described above, and a step of developing the exposed photosensitive agent. Further, an etching step, an ion implantation step, etc. are performed on the substrate using the pattern of the developed photosensitive agent as a mask, and a circuit pattern is formed on the substrate. These steps of exposure, development, etching, etc. are repeated to form a circuit pattern composed of a plurality of layers on the substrate. In a subsequent process, dicing (processing) is performed on the substrate on which the circuit pattern is formed, and chip mounting, bonding, and inspection steps are performed. Further, such a manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, resist stripping, etc.). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the prior art.

[0063] The present invention can also be implemented by supplying a program that realizes one or more functions of the above-described embodiments to a system or apparatus via a network or a storage medium, and causing one or more processors in a computer of the system or apparatus to read and execute the program. It can also be implemented by a circuit (for example, an ASIC) that realizes one or more functions.

[0064] The disclosure of this specification includes the following exposure apparatus, control method, and method of manufacturing an article.

[0065] (Item 1) An exposure apparatus that exposes a substrate through a reticle, comprising: a drive unit that drives a light-shielding member for restricting the range of exposure light incident on the substrate; a setting unit that sets a projection range on the substrate where the pattern is projected based on at least one of the pattern of the reticle and the shot layout of the substrate; a control unit that performs drive control of the drive unit so that the light-shielding member is positioned at a target position; having: the control unit: performs first drive control to drive the light-shielding member toward the target position at a first resolution by the drive unit; when the target projection position obtained by projecting the target position onto the substrate is located in a first region where the distance from the projection range is equal to or less than a predetermined distance, if the deviation between the position of the light-shielding member after performing the first drive control and the target position exceeds a threshold value, performs second drive control to drive the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive unit; when the target projection position is located in a second region other than the first region, does not perform the second drive control regardless of the position of the light-shielding member after performing the first drive control; An exposure apparatus characterized by the above.

[0066] (Item 2) The drive unit includes a motor for driving the light-shielding member. The first resolution and the second resolution include a resolution representing the driving amount of the light-shielding member per pulse by the motor. The exposure apparatus according to claim 1, characterized in that.

[0067] (Item 3) The control unit provides a user interface for displaying a screen for a user to specify the first region. The exposure apparatus according to claim 1 or 2, characterized in that.

[0068] (Item 4) The user interface displays a screen for a user to specify the threshold value in addition to the first region. The exposure apparatus according to claim 3, characterized in that.

[0069] (Item 5) The first region includes a plurality of different first regions where the distance from the projection range is equal to or less than the predetermined distance. The exposure apparatus according to claim 1 or 2, characterized in that.

[0070] (Item 6) The control unit provides a user interface for displaying a screen for a user to specify the plurality of first regions. The exposure apparatus according to claim 5, characterized in that.

[0071] (Item 7) The user interface displays a screen for a user to specify the threshold value for each of the plurality of first regions in addition to the plurality of first regions. The exposure apparatus according to claim 6, characterized in that.

[0072] (Item 8) The projection range includes a region where the result of exposure through the original plate should be guaranteed. The exposure apparatus according to any one of claims 1 to 7, characterized in that.

[0073] (Item 9) The projection range includes a region where a circuit corresponding to the pattern should be transferred. The exposure apparatus according to any one of claims 1 to 8, characterized in that.

[0074] (Item 10) The exposure apparatus according to any one of Items 1 to 9, wherein the first region includes a region on the substrate where alignment marks are provided.

[0075] (Item 11) The exposure apparatus according to any one of Items 1 to 10, wherein the first region includes a region between adjacent shot regions on the substrate.

[0076] (Item 12) The exposure apparatus according to any one of Items 1 to 11, wherein the second region includes a region located outside the projection range and for waiting for the light shielding member.

[0077] (Item 13) The exposure apparatus according to any one of Items 1 to 12, wherein the threshold value is set after performing the first drive control.

[0078] (Item 14) A control method for controlling a drive unit that drives a light shielding member for restricting a range of exposure light incident on a substrate, the control method being used for an exposure apparatus that exposes the substrate through a reticle, the control method including: a first step of setting a projection range on the substrate where the pattern is projected based on at least one of the pattern of the reticle and the shot layout of the substrate; a second step of performing drive control of the drive unit so that the light shielding member is positioned at a target position, In the second step, a first drive control is performed to drive the light shielding member toward the target position at a first resolution by the drive unit, When the target projection position obtained by projecting the target position onto the substrate is located in a first region where the distance from the projection range is equal to or less than a predetermined distance, if the deviation between the position of the light-shielding member after performing the first drive control and the target position exceeds a threshold value, second drive control is performed to drive the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive unit. When the target projection position is located in a second region other than the first region, the second drive control is not performed regardless of the position of the light-shielding member after performing the first drive control. A control method characterized by the above.

[0079] (Item 15) A step of exposing a substrate using the exposure apparatus according to any one of Items 1 to 13, A step of developing the exposed substrate, A method for manufacturing an article, characterized by including the above steps.

[0080] The invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, claims are attached to disclose the scope of the invention.

Description of Reference Numerals

[0081] 101: Exposure apparatus 102: Control unit 104: Master mask 106, 109: Light-shielding member 107, 110: Drive unit 111: Substrate

Claims

1. An exposure apparatus for exposing a substrate through a reticle, comprising: a drive unit that drives a light-shielding member for restricting the range of exposure light incident on the substrate; a setting unit that sets a projection range on the substrate where the pattern is projected based on at least one of the pattern of the reticle and the shot layout of the substrate; a control unit that performs drive control of the drive unit so that the light-shielding member is positioned at a target position; wherein the control unit performs first drive control to drive the light-shielding member toward the target position at a first resolution by the drive unit; when the target projection position obtained by projecting the target position onto the substrate is located in a first region where the distance from the projection range is equal to or less than a predetermined distance, if the deviation between the position of the light-shielding member after performing the first drive control and the target position exceeds a threshold value, second drive control is performed to drive the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive unit; when the target projection position is located in a second region other than the first region, the second drive control is not performed regardless of the position of the light-shielding member after performing the first drive control; An exposure apparatus characterized by the above.

2. The drive unit includes a motor for driving the light-shielding member, wherein the first resolution and the second resolution include a resolution representing the driving amount of the light-shielding member per pulse by the motor. The exposure apparatus according to claim 1, characterized by the above.

3. The control unit provides a user interface for displaying a screen for a user to specify the first region. The exposure apparatus according to claim 1, characterized by the above.

4. The user interface, in addition to the first region, displays a screen for a user to specify the threshold value. The exposure apparatus according to claim 3, characterized by the above.

5. The first region includes a plurality of different first regions where the distance from the projection range is equal to or less than the predetermined distance. The exposure apparatus according to claim 1, characterized by the above.

6. The control unit provides a user interface for displaying a screen for a user to specify the plurality of first regions. The exposure apparatus according to claim 5, characterized by the above.

7. The user interface, in addition to the plurality of first regions, displays a screen for a user to specify the threshold value for each of the plurality of first regions. The exposure apparatus according to claim 6, characterized by the above.

8. The exposure apparatus according to claim 1, wherein the projection range includes an area where the result of exposure through the original plate should be guaranteed.

9. The exposure apparatus according to claim 1, wherein the projection range includes an area where a circuit corresponding to the pattern should be transferred.

10. The exposure apparatus according to claim 1, wherein the first area includes an area where an alignment mark on the substrate is provided.

11. The exposure apparatus according to claim 1, wherein the first area includes an area between shot areas adjacent to each other on the substrate.

12. The exposure apparatus according to claim 1, wherein the second area includes an area located outside the projection range and for waiting the light-shielding member.

13. The exposure apparatus according to claim 1, wherein the threshold value is set after performing the first drive control.

14. A control method for controlling a drive unit that drives a light-shielding member for restricting a range of exposure light incident on a substrate, the control method being used for an exposure apparatus that exposes the substrate through an original plate, a first step of setting a projection range on the substrate where the pattern is projected based on at least one of the pattern of the original plate and the shot layout of the substrate; a second step of performing drive control of the drive unit so that the light-shielding member is located at a target position, wherein in the second step, a first drive control is performed to drive the light-shielding member toward the target position at a first resolution by the drive unit; when a target projection position obtained by projecting the target position onto the substrate is located in a first area where a distance from the projection range is equal to or less than a predetermined distance, if a deviation between a position of the light-shielding member after performing the first drive control and the target position exceeds a threshold value, a second drive control is performed to drive the light-shielding member toward the target position at a second resolution higher than the first resolution by the drive unit; when the target projection position is located in a second area other than the first area, the second drive control is not performed regardless of the position of the light-shielding member after performing the first drive control, characterized in that.

15. A step of exposing a substrate using the exposure apparatus according to any one of claims 1 to 13; a step of developing the exposed substrate; A method for manufacturing an article, characterized by including these steps.

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