Onium salt compound
The use of an onium salt compound as a radiation-sensitive acid generator in a resin composition addresses the insufficiencies of existing technologies by enhancing sensitivity, LWR, and CDU performance, facilitating high-quality resist pattern formation for next-generation photolithography.
JP2025114652AActive Publication Date: 2025-08-05JSR CORPORATION
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Patent Information
- Application Number
- JP2025075215
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2020-05-29
- Filing Date
- 2025-04-30
- Publication Date
- 2025-08-05
- Estimated Expiration
- 2041-05-13
AI Technical Summary
Technical Problem
Existing radiation-sensitive resin compositions do not provide sufficient levels of sensitivity, Line Width Roughness (LWR) performance, and Critical Dimension Uniformity (CDU) performance required for next-generation photolithography technologies.
Method used
Incorporating an onium salt compound with a specific structure as a radiation-sensitive acid generator in a resin composition, which includes a solvent and optionally an acid diffusion controller, to enhance sensitivity, LWR performance, and CDU performance during resist pattern formation.
Benefits of technology
The onium salt compound composition achieves high-quality resist patterns with improved sensitivity, LWR performance, and CDU performance, enabling efficient formation of fine circuits in semiconductor elements.
✦ Generated by Eureka AI based on patent content.
Abstract
To provide an onium salt compound capable of exhibiting sensitivity, LWR performance, and CDU performance at a sufficient level.SOLUTION: An onium salt compound comprising a structure represented by the following formula (1-2): (In the formula, Rf1 and Rf2 are each F or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R1 is H, a monovalent hydrocarbon group having 1 to 20 carbon atoms, F, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 to R7 are each H or a monovalent hydrocarbon group having 1 to 20 carbon atoms; n1 is an integer of 0 to 4; n2 is an integer of 0 to 4; provided that n1+n2 is an integer of 2 to 8; n3 is an integer of 0 to 5; X1 and X2 are each O or S; and Z+ is a monovalent radiation-sensitive onium cation).SELECTED DRAWING: None
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