Worktable system and method for manufacturing display panel using the same

Abstract

To provide a worktable system with high control accuracy, and provide a method for manufacturing a display panel using a worktable system with high control accuracy.SOLUTION: A worktable system includes a base stage extending in a first direction and a second direction intersecting the first direction and having a first stroke length, and a plurality of first stages disposed on the base stage adjacent to each corner of the base stage and movable in the first direction and the second direction by a second stroke length that is smaller than the first stroke length.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a work table system, and more particularly to a work table system with improved process reliability and a method for manufacturing a display panel using the same. [Background technology]

[0002] As information technology advances, the importance of display devices, which are the connecting medium between users and information, is increasing, leading to an increase in the use of display devices such as liquid crystal displays (LCDs), organic light-emitting displays (OLEDs), and plasma display panels (PDPs).

[0003] A display device includes a display panel that includes various layers on a substrate. As display devices vary in size, the substrate sizes also vary, from the substrates that form the display panels included in large display devices such as televisions to the substrates that form the display panels included in virtual reality (VR) display devices.

[0004] In order to improve the reliability of the process of forming a display panel, it is important to control accurately the work table system that supports the substrate. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Chinese Patent Application Publication No. 116576818 [Patent Document 2] Korean Patent Registration No. 10-0931601 [Patent Document 3] Chinese Patent No. 109879243 Summary of the Invention [Problem to be solved by the invention]

[0006] An object of the present invention is to provide a work table system with high control accuracy.

[0007] Another object of the present invention is to provide a method for manufacturing a display panel using a work table system with high control precision.

[0008] However, the object of the present invention is not limited to this, and various extensions can be made without departing from the spirit and scope of the present invention. [Means for solving the problem]

[0009] In order to achieve the object of the present invention, the work table system according to the present invention is characterized by including a base stage extending in a first direction and a second direction intersecting the first direction and having a first stroke length, and a plurality of first stages arranged on the base stage adjacent to each corner of the base stage and movable in the first direction and the second direction by a second stroke length that is shorter than the first stroke length.

[0010] The second stroke length may be on the nanoscale or smaller.

[0011] The base stage may include at least one selected from the group consisting of granite, ceramic, and invar, and each of the plurality of first stages may include a first portion disposed on the base stage and including a piezoelectric actuator, and a second portion disposed on the first portion and including a porous material.

[0012] A negative pressure may be provided in the second portion.

[0013] The worktable system may further include a second stage disposed on the base stage, spaced apart from the plurality of first stages, the second stage including a porous material.

[0014] The second stage may be provided with a positive pressure.

[0015] The second stage may include a plurality of pads, each of which may include a body portion including a porous material and disposed on the base stage, with an accommodation groove defined in a lower portion thereof, and a height adjustment portion disposed in the accommodation groove between the base stage and the body portion and including a knob protruding from the body portion in a plan view defined by the first direction and the second direction.

[0016] The pads may be arranged in tiles spaced apart from one another in the first and second directions.

[0017] Each of the plurality of pads may be raised and lowered in a third direction intersecting the first direction and the second direction by rotating the height adjustment portion.

[0018] The upper surface of the body is flat, and the remaining surfaces of the body except for the upper surface may be coated.

[0019] A second hole is defined in the base stage in a third direction intersecting the first direction and the second direction, and the worktable system further includes a fluid passage passing through the second hole, and a portion of the positive pressure may be recovered through the fluid passage.

[0020] On a plane, each of the plurality of pads may include a first side, a second side, a third side, and a fourth side, and the fluid passages may include a first fluid passage adjacent to the first side, a second fluid passage adjacent to the second side, a third fluid passage adjacent to the third side, and a fourth fluid passage adjacent to the fourth side.

[0021] The worktable system may further include a substrate arranged on a plurality of first stages and second stages and extending in a first direction and a second direction, and a sensor arranged spaced apart from the substrate in either one of the directions in which the substrate extends and measuring displacement of the substrate.

[0022] The base stage may have a tube fitting hole defined in a third direction intersecting the first direction and the second direction, and the worktable system may further include a tube passing through the tube fitting hole and connected to the second stage.

[0023] The base stage may have a first hole defined in a third direction intersecting the first direction and the second direction, and may further include a lift pin passing through the first hole, and the lift pin may be raised and lowered in the third direction intersecting the first direction and the second direction.

[0024] In order to achieve another object of the present invention, a method for manufacturing a display panel of the present invention is characterized in that it includes placing a substrate extending in a first direction and a second direction on a worktable system including a base stage extending in a first direction and a second direction intersecting the first direction and having a first stroke length, and a plurality of first stages arranged on the base stage adjacent to each corner of the base stage and movable in the first direction and the second direction by a second stroke length smaller than the first stroke length, and the plurality of first stages fixing the substrate.

[0025] The second stroke length may be on the nanoscale or smaller.

[0026] To secure the substrate, a negative pressure may be applied to the plurality of first stages, and the substrate may be attracted to the plurality of first stages.

[0027] The worktable system may further include a second stage disposed on the base stage at a distance from the plurality of first stages and including a porous material, and may further include planarizing the substrate after the substrate is adsorbed.

[0028] A positive pressure may be provided to the second stage to planarize the substrate.

[0029] The work table system may further include a sensor arranged at a distance from the substrate in either direction of the extension direction of the substrate and measuring the displacement of the substrate, and may measure the displacement of the substrate after the substrate is adsorbed, and if the measured displacement of the substrate falls outside a predetermined range, may change the position of the substrate. [Effects of the Invention]

[0030] A worktable system according to the present invention includes a base stage that extends in a first direction and a second direction intersecting the first direction and has a first stroke length, and a plurality of first stages that are disposed on the base stage adjacent to each corner of the base stage and are movable in the first direction and the second direction by second stroke lengths that are shorter than the first stroke length. The inclusion of the base stage makes it possible to realize a long-stroke, large-area worktable system, and the inclusion of the plurality of first stages makes it possible to realize high-resolution control on the nano level.

[0031] The worktable system further includes a second stage disposed on the base stage at a distance from the plurality of first stages and including a porous material. A negative pressure is applied to the plurality of first stages, and a positive pressure is applied to the second stage. This allows the substrate on the worktable system to be fixed by the plurality of first stages, minimizing the effect of friction with the second stage.

[0032] The second stage also includes a plurality of pads. The pads are arranged in a tiled pattern, spaced apart from one another in a first direction and a second direction. Each of the pads is arranged on the base stage and includes a body portion including a porous material and having a storage groove defined in its lower portion, and a height adjustment unit disposed in the storage groove between the base stage and the body portion and including a knob protruding from the body portion in a plan view defined by the first direction and the second direction. Each of the pads is raised and lowered in a third direction intersecting the first direction and the second direction by rotation of the height adjustment unit. This allows for highly accurate control of the flatness of a substrate levitated by positive pressure.

[0033] Additionally, a second hole is defined in the base stage in a third direction intersecting the first and second directions. The worktable system further includes a fluid passage passing through the second hole. This allows a portion of the positive pressure provided to the substrate to be recovered in order to prevent pressure buildup and substrate swelling caused by positive pressure levitation.

[0034] In one embodiment, the worktable system further includes a substrate disposed on a plurality of first and second stages and extending in a first direction and a second direction, and a sensor disposed apart from the substrate in either of the extending directions of the substrate and measuring displacement of the substrate. The method further includes changing the position of the substrate when the measured displacement of the substrate falls outside a predetermined range. This allows for more accurate correction of motion errors.

[0035] However, the effects of the present invention are not limited to the above-described effects, and can be expanded in various ways without departing from the spirit and scope of the present invention. [Brief explanation of the drawings]

[0036] [Figure 1] FIG. 1 is a perspective view of a work table system according to an embodiment of the present invention. [Figure 2] FIG. 2 is an enlarged plan view of region A in FIG. [Figure 3] FIG. 3 is a diagram for explaining a plurality of first stages included in the work table system of FIG. [Figure 4] FIG. 4 is a front view of part B in FIG. [Figure 5] FIG. 5 is a diagram for explaining the first hole and the second hole defined in the work table system of FIG. [Figure 6] FIG. 6 is a cross-sectional end view taken along line II' of FIG. [Figure 7] FIG. 7 is a diagram illustrating the lift pins included in the work table system of FIG. [Figure 8] FIG. 8 is a diagram illustrating the lift pins included in the work table system of FIG. [Figure 9] FIG. 9 is a diagram illustrating the lift pins included in the work table system of FIG. [Figure 10] FIG. 10 is a diagram for explaining the piezoelectric actuator included in the work table system of FIG. [Figure 11] FIG. 11 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 12] FIG. 12 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 13] FIG. 13 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 14] FIG. 14 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 15] FIG. 15 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 16] FIG. 16 is a diagram illustrating a method for manufacturing a display panel according to another embodiment of the present invention. [Figure 17] FIG. 17 is a cross-sectional end view of a pixel manufactured by the work table system of FIG. 1 and the display panel manufacturing method of FIGS. DETAILED DESCRIPTION OF THE INVENTION

[0037] Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. The same reference numerals are used to designate the same components in the drawings, and redundant description of the same components will be omitted.

[0038] Fig. 1 is a perspective view of a work table system according to an embodiment of the present invention, and Fig. 2 is an enlarged plan view of area A in Fig. 1.

[0039] As shown in FIG. 1, a work table system according to an embodiment of the present invention includes a base stage 100, a plurality of first stages 200, and a plurality of second stages 300.

[0040] For example, the base stage 100 is used in the manufacturing process of a display device. For example, the base stage 100 is used in an inkjet process in the manufacturing process of a display device. Furthermore, the base stage 100 is used in an exposure process in the manufacturing process of a display device. However, the present invention is not limited to this. For example, the base stage 100 can be used in various processes that require precise control in the manufacturing process of a display device.

[0041] For example, the base stage 100 is a long stroke stage. For example, the base stage 100 has a multi-layer structure. For example, a stage (e.g., upper stage) (not shown) movable in a second direction (DR2) is disposed on a stage (e.g., lower stage) (not shown) movable in a first direction (DR1).

[0042] For example, the second direction (DR2) is perpendicular to the first direction (DR1). However, the present invention is not limited to this. For example, a stage movable in the first direction (DR1) is disposed on a stage movable in the second direction (DR2). The base stage 100 may also have a single-layer structure.

[0043] The upper portion may refer to the third direction (DR3). For example, the third direction (DR3) is perpendicular to each of the first direction (DR1) and the second direction (DR2). Similarly, the lower portion may refer to the opposite direction of the third direction (DR3).

[0044] For example, the upper stage and the lower stage include substantially the same components. For example, the base stage 100 includes a base plate, a moving frame, a linear motor, a linear motor track, a linear scale, and at least one air bearing. That is, each of the upper stage and the lower stage includes a base plate, a linear motor, a linear motor track, a linear scale, and an air bearing. For convenience of explanation, the following description will focus on the lower stage, which is movable in the first direction (DR1).

[0045] The base plate extends in a first direction (DR1) and a second direction (DR2), for example, the base plate defines a recessed space from the upper surface to the lower surface of the base plate.

[0046] In one embodiment, the base stage 100 may include granite, ceramics, Invar, etc. For example, the base plate may include granite, ceramics, Invar, etc. However, the present invention is not limited thereto. For example, the base stage 100 may include various materials.

[0047] The moving frame is disposed on the base plate. A portion of the moving frame is housed within the space of the base plate. The moving frame is spaced apart from the base plate in a third direction (DR3). The moving frame is movable in the first direction (DR1) or in a direction opposite to the first direction (DR1). For example, the moving frame has a rectangular planar shape. However, the present invention is not limited thereto. For example, the moving frame can have various shapes, sizes, etc.

[0048] The linear motor is disposed on at least one surface of the moving frame. For example, the linear motor is disposed on both sides of the moving frame. The linear motor is fixed to the moving frame. For example, the linear motor includes a coil.

[0049] The linear motor track is disposed on the base plate. The linear motor track extends in a first direction (DR1). The linear motor track defines a space in which a portion of the linear motor is housed. The linear motor track does not contact the linear motor. That is, the linear motor track and the linear motor are separated from each other. For example, the linear motor track includes a magnet.

[0050] The linear motor can move along the linear motor track in a first direction (DR1) or a direction opposite to the first direction (DR1). For example, the linear motor and the linear motor track move the moving frame. For example, the linear motor and the linear motor track move the moving frame using electromagnetic force. The moving frame can move in the first direction (DR1) or a direction opposite to the first direction (DR1) by the linear motor and the linear motor track. That is, the moving frame moves in a straight line by the linear motor and the linear motor track.

[0051] The linear scale (or encoder) is disposed on the base plate. For example, the linear scale is disposed on the bottom of the moving frame. The linear scale extends in a first direction (DR1). The linear scale detects information such as the position, movement distance, and movement speed of the linear motor. The linear scale also feeds back the detected information to the linear motor.

[0052] The air bearings are disposed on at least one surface of the motion frame. For example, the air bearings are disposed on the bottom and / or side surfaces of the motion frame. For example, the air bearings are fixed to the motion frame within a space defined by the base plate. For example, the air bearings evacuate air, causing the motion frame to levitate above the base plate.

[0053] However, the present invention is not limited to this. For example, the base stage 100 may include three or fewer air bearings, or five or more air bearings. The base stage 100 may also include other components or omit some of the components.

[0054] In one embodiment, multiple first stages 200 are positioned on the base stage 100 adjacent each corner of the base stage 100 .

[0055] In one embodiment, the base stage 100 has a first stroke length, and each of the plurality of first stages 200 has a second stroke length that is less than the first stroke length. As described above, the base stage 100 is a long-stroke stage, and each of the plurality of first stages 200 is a relatively short-stroke stage.

[0056] The comparative worktable system may include only a long stroke stage or a short stroke stage.

[0057] For example, in the case of a worktable system that only includes a long-stroke stage, it is difficult to achieve minute displacements in nanometer units or high-precision control. For example, in the case of a worktable with a stroke length of approximately several thousand millimeters (mm), the correction precision is only approximately several microns (1 / 1000 m). This makes it difficult to use in the manufacturing process of display devices, which require high precision.

[0058] On the other hand, a worktable system that includes only a short-stroke stage is difficult to manufacture in a large area. For example, a short-stroke stage includes a piezoelectric actuator (see, for example, FIGS. 10A to 10C) and a flexure motion guide (flexure hinge). For example, a flexure motion guide is a displacement amplifier that easily generates parasitic motion. For example, a flexure motion guide can amplify the ohm (Ω) unit movement of a piezoelectric actuator to a micro- to nano-unit movement. However, flexure motion guides are difficult to manufacture in a large area due to design difficulties.

[0059] The worktable system according to the embodiment of the present invention has a structure in which multiple first stages 200 are arranged on a base stage 100. The base stage 100 has a first stroke length, and each of the multiple first stages 200 has a second stroke length that is shorter than the first stroke length. In one embodiment, the second stroke length is nanoscale or less. This allows for a long-stroke, large-area, and high-precision worktable system, unlike the worktable system according to the comparative example. For example, the base stage 100 can move approximately several meters (m), and the multiple first stages 200 can move approximately several millimeters (mm). The multiple first stages 200 can correct errors with an accuracy of approximately several nanometers (nm).

[0060] For example, translational motion errors (e.g., flatness errors, straightness errors, etc.) may occur along axes parallel to each of the first direction (DR1), the second direction (DR2), and / or the third direction (DR3), and rotational motion errors (e.g., yaw errors, roll errors, pitch errors, etc.) may occur along axes parallel to each of the first direction (DR1), the second direction (DR2), and / or the third direction (DR3).

[0061] In one embodiment, the second stage 300 is disposed on the base stage 100 at a distance from the plurality of first stages 200 .

[0062] In one embodiment, the second stage 300 includes a plurality of pads (e.g., 310, 320, and 330 in FIG. 2 ). The second stage 300 also includes a first pad 310, a second pad 320, and a third pad 330. For example, the first pad 310 is disposed on the base stage 100 and spaced apart from any one of the plurality of first stages 200 in a first direction (DR1). The third pad 330 is disposed on the base stage 100 and spaced apart from any one of the plurality of first stages 200 in a second direction (DR2). The second pad 320 is disposed on the base stage 100 and spaced apart from any one of the plurality of first stages 200 in a direction between the first direction (DR1) and the second direction (DR2).

[0063] In one embodiment, the pads are arranged in a tiled pattern, spaced apart from one another in the first direction (DR1) and / or the second direction (DR2). For example, the first pad 310 and the second pad 320 are arranged spaced apart from one another in the second direction (DR2). The second pad 320 and the third pad 330 are arranged spaced apart from one another in the first direction (DR1). That is, the pads are repeatedly arranged spaced apart from one another along the first direction (DR1), and the pads are repeatedly arranged spaced apart from one another along the second direction (DR2).

[0064] In one embodiment, second stage 300 is provided with a positive pressure (e.g., air expelled in a third direction (DR3)). To this end, in one embodiment, second stage 300 includes a porous material. In one embodiment, the porous material is included in a body (e.g., body 410 in FIG. 4) included in second stage 300.

[0065] For example, the porous material may include a metal, or may be formed by adjusting the porosity of alumina, although the present invention is not limited thereto.

[0066] Fig. 3 is a diagram for explaining a plurality of first stages included in the work table system in Fig. 1. Fig. 4 is a front view of part B in Fig. 3.

[0067] The plurality of first stages 200 and second stages 300 will be described in detail below with reference to FIGS.

[0068] As shown in FIGS. 1, 2 and 3, in one embodiment, each of the plurality of first stages 200 includes a first portion 210 and a second portion 220.

[0069] In one embodiment, the first portion 210 is disposed on the base stage 100 and includes a piezoelectric actuator (see, for example, FIG. 10). As previously mentioned, the piezoelectric actuator can have a variety of structures, shapes, configurations, etc.

[0070] In one embodiment, the second portion 220 is disposed on the first portion 210. In one embodiment, a negative pressure (e.g., air flowing in a direction opposite to the third direction (DR3)) is applied to the second portion 220. To this end, in one embodiment, the second portion 220 includes a porous material.

[0071] For example, the porous material may include a metal, or may be formed by controlling the porosity of alumina, although the present invention is not limited thereto.

[0072] For example, the porous materials contained in the plurality of first stages 200 and second stages 300 are the same type, but the present invention is not limited thereto. For example, the porous materials contained in the plurality of first stages 200 and second stages 300 may be different types.

[0073] 1, 2, and 4, in one embodiment, the second stage 300 includes a plurality of pads (e.g., first pad 310, second pad 320, and third pad 330 in FIG. 2). In one embodiment, each of the plurality of pads includes a body portion 410 and a height adjustment portion 400.

[0074] In one embodiment, the body 410 is placed on the base stage 100 and defines an accommodating groove (AG) at the bottom.

[0075] In one embodiment, the body 410 includes a porous material. Here, the porous material has voids through which air can freely enter and exit, and the remaining surfaces of the body 410 except for the top surface (e.g., the bottom surface facing the top surface in the direction opposite to the third direction (DR3), and the side surfaces intersecting with each of the top and bottom surfaces) are coated (e.g., with epoxy resin, etc.). By disposing a coating layer on the surfaces of the body 410 other than the top surface, positive pressure can be efficiently provided from the top surface of the body 410.

[0076] In one embodiment, the height adjustment unit 400 is disposed in the receiving groove (AG) between the base stage 100 and the body 410. That is, the receiving groove (AG) defines a space in which the height adjustment unit 400 is disposed.

[0077] 2 and 4, in one embodiment, the height adjustment unit 400 includes a knob protruding from a body 410 (see 310, 320, and 330 in FIG. 2) in a plan view defined by a first direction (DR1) and a second direction (DR2). For example, the knob protrudes a predetermined length (PP) from the end of the body 410. This allows the knob to be turned clockwise or counterclockwise from the outside.

[0078] In one embodiment, each of the plurality of pads is raised in a third direction (DR3) or lowered in a direction opposite to the third direction (DR3) by rotating the height adjustment portion 400.

[0079] For example, the height adjustment unit 400 includes a leveling adjustment bolt, and the second stage 300 can be raised only by the leveling adjustment bolt, i.e., the second stage 300 does not interfere with the base stage 100.

[0080] Fig. 5 is a diagram for explaining the first hole and the second hole defined in the work table system in Fig. 1. Fig. 6 is a cross-sectional view taken along line II' in Fig. 5.

[0081] 1, 2, 3, 4, 5 and 6, in one embodiment, the base stage 100 is defined with a tube fitting hole (HO3) in a third direction (DR3).

[0082] In one embodiment, the second stage 300 is connected to a tube 600 disposed in a tube fitting hole (HO3). The tube 600 is connected to a pump or the like.

[0083] In one embodiment, the second stage 300 includes a plurality of pads (e.g., a second pad 320, a fourth pad 340, and a sixth pad 360). Each of the plurality of pads is individually connected to a pump or the like. For example, the second pad 320 is connected to the first tube 620 by a first fitting 520. The fourth pad 340 is connected to the second tube 640 by a second fitting 540. The sixth pad 360 is connected to the third tube 660 by a third fitting 560. However, the present invention is not limited thereto. For example, if the base stage 100 includes a metal, each of the first tube 620, the second tube 640, and the third tube 660 is connected to the metal by welding. In this case, the fittings that connect the tube 600 and the second stage 300 (for example, the first fitting 520, the second fitting 540, and the third fitting 560) can be omitted.

[0084] The tube 600 is connected only to the second stage 300 and does not interfere with the base stage 100 .

[0085] 1 to 5 again, in one embodiment, a first hole (HO1) and a second hole (HO2) are defined in the base stage 100. Each of the first hole (HO1) and the second hole (HO2) penetrates the base stage 100 in a third direction (DR3).

[0086] For example, the first hole (HO1) is a hole for defining a space in which a lift pin (e.g., lift pin 800 in FIG. 7) is disposed, and the second hole (HO2) is a hole for defining a fluid passage (e.g., a space in which a pipe for recovering positive pressure is disposed). The fluid passage overlaps the second hole (HO2) on a plane.

[0087] As shown in FIG. 2 , in one embodiment, each of the plurality of pads includes a first side (S1), a second side (S2), a third side (S3), and a fourth side (S4) on a plane. For example, the fluid passages include a first fluid passage adjacent to the first side (S1), a second fluid passage adjacent to the second side (S2), a third fluid passage adjacent to the third side (S3), and a fourth fluid passage adjacent to the fourth side (S4). However, the present invention is not limited thereto. For example, two or more fluid passages are arranged adjacent to each side of the plurality of pads. For example, the fluid passages further include a fifth fluid passage adjacent to the first side (S1), a sixth fluid passage adjacent to the second side (S2), a seventh fluid passage adjacent to the third side (S3), and an eighth fluid passage adjacent to the fourth side (S4).

[0088] For example, positive pressure can cause a bulging phenomenon in the substrate, where the center of the substrate and the edge of the substrate are at different height levels. The edge surrounds the center.

[0089] To prevent the board from swelling up or the board from losing its flatness, a part of the positive pressure is recovered by the fluid passage, thereby providing a constant flow rate of air to each of the multiple pads.

[0090] Figures 7, 8, and 9 are diagrams illustrating the lift pins included in the work table system of Figure 1. For example, Figure 7 is a perspective view of the lift pins. Figures 8 and 9 are cross-sectional views of the lift pins in a raised state and a lowered state, respectively.

[0091] 7, 8, and 9, in one embodiment, lift pins 700 pass through first holes (HO1). In one embodiment, lift pins 700 rise in a third direction (DR3). Alternatively, lift pins 700 can descend in the direction opposite to the third direction (DR3).

[0092] FIGS. 10A to 10C are diagrams illustrating the piezoelectric actuator included in the work table system of FIG.

[0093] As shown in FIGS. 1 and 10A to 10C, each of the multiple first stages 200 includes a piezoelectric actuator (PAC). The piezoelectric actuator (PAC) has high control precision and a fast response time. For example, the piezoelectric actuator (PAC) includes a piezoelectric element (PD) and a shaft (SH). For example, when a voltage is applied to the piezoelectric element (PD) and it expands, the shaft (SH) rotates and the level of the upper surface changes. When it expands to its maximum, it contracts quickly and the shaft (SH) returns to its initial position. However, this is an example, and the piezoelectric actuator (PAC) can have various structures, arrangements, etc.

[0094] The work table system described above with reference to FIGS. 1 to 10 is an example, and the work table system according to one embodiment of the present invention may further include various components.

[0095] In one embodiment, the worktable system further includes a sensor (see, for example, 800 in Figures 13 and 14) that measures displacement of the substrate.

[0096] In one embodiment, a substrate (e.g., substrate (SUB) in FIG. 11) is placed on a plurality of first stages 200 and second stages 300. In one embodiment, the substrate extends in a first direction (DR1) and a second direction (DR2). The substrate is subjected to processing steps (e.g., ink ejection, exposure, etc.) for manufacturing a display device.

[0097] In one embodiment, the sensor is disposed spaced apart from the substrate (SUB) in either one of the directions in which the substrate (SUB) extends (for example, the first direction (DR1) or the second direction (DR2)).

[0098] A detailed description of the sensor will be given below with reference to FIG.

[0099] For example, translational and / or rotational motion errors occur during the manufacturing process of a display device. For example, a linear scale included in the base stage 100 detects the translational motion errors and feeds back the detected information to the linear motor.

[0100] In the comparative example, a worktable system including only a linear scale provides inaccurate feedback due to the large distance between the linear scale and the substrate mounted on the worktable system. This results in processing occurring in unintended areas of the substrate, which can lead to defects (e.g., dark spots, color mixing) or reduced display quality in the display device.

[0101] However, the work table system according to one embodiment of the present invention further includes a sensor 800 (e.g., 810 to 830 in FIGS. 13 and 14). The sensor 800 detects information such as the position of the moving frame and feeds the detected information back to the linear motor. For example, the sensor detects translational motion errors and / or rotational motion errors and feeds the detected errors back to the linear motor. This improves process reliability and the display quality of the display device.

[0102] As described above, a worktable system according to one embodiment of the present invention includes a base stage 100 that extends in a first direction (DR1) and a second direction (DR2) and has a first stroke length, and multiple first stages 200 that are disposed on the base stage 100 adjacent to each corner of the base stage 100 and are movable in the first direction (DR1) and the second direction (DR2) by a second stroke length that is shorter than the first stroke length. The inclusion of the base stage 100 allows for a long-stroke, large-area worktable system to be realized. Furthermore, the inclusion of multiple first stages 200 allows for highly accurate control on the nanometer scale.

[0103] The worktable system further includes a second stage 300 that is spaced apart from the plurality of first stages 200 and that is disposed on the base stage 100 and includes a porous material. Negative pressure is applied to the plurality of first stages 200, and positive pressure is applied to the second stage 300. This allows the substrate on the worktable system to be fixed by the plurality of first stages 200. In addition, the influence of friction with the second stage 300 can be minimized.

[0104] The second stage 300 also includes a plurality of pads (e.g., the first pad 310, the second pad 320, and the third pad 330 in FIG. 2). The pads are arranged in a tiled pattern, spaced apart from one another in a first direction (DR1) and a second direction (DR2). Each of the pads includes a body 410, which is arranged on the base stage 100 and includes a porous material and has a receiving groove (AG) defined in its lower portion, and a height adjustment unit 400, which is arranged in the receiving groove (AG) between the base stage 100 and the body 410 and includes a knob protruding from the body 410 in a plan view defined by the first direction (DR1) and the second direction (DR2). Each of the pads moves up and down in a third direction (DR3) by rotation of the height adjustment unit 400. This allows precise control of the flatness of the substrate levitated by positive pressure.

[0105] A second hole (HO2) in a third direction (DR3) is defined in the base stage 100. The worktable system further includes a fluid passage passing through the second hole (HO2), which recovers a portion of the positive pressure provided to the substrate to prevent pressure buildup or substrate swelling caused by positive pressure lift.

[0106] In one embodiment, the worktable system further includes a substrate disposed on a plurality of first stages 200 and second stages 300 and extending in a first direction (DR1) and a second direction (DR2), and a sensor 800 (e.g., 810-830 in FIGS. 13 and 14) disposed at a distance from the substrate in either one of the directions along which the substrate extends (e.g., the first direction (DR1) or the second direction (DR2)) and measuring the displacement of the substrate. The system further includes a step of changing the position of the substrate if the measured displacement of the substrate falls outside a predetermined range. This allows for more accurate correction of errors. Furthermore, the system can move only minute displacements that are difficult to achieve with the base stage 100.

[0107] 11, 12, 13, 14, 15 and 16 are diagrams for explaining a method of manufacturing a display panel according to another embodiment of the present invention.

[0108] The display panel manufacturing method described in Figures 11 to 16 utilizes the work table system according to one embodiment of the present invention described above with reference to Figures 1 to 10. Therefore, in the following, explanations that overlap with the explanation of the work table system according to one embodiment of the present invention will be omitted.

[0109] A method for manufacturing a display panel according to an embodiment of the present invention includes the following steps: Referring to Figures 1, 11 and 12, in one embodiment, a substrate (SUB) is placed on a work table system (S100), and a plurality of first stages 200 fix the substrate (SUB) (S200).

[0110] For example, the substrate (SUB) is supported (placed) by lift pins 700 that penetrate the base stage 100 .

[0111] In one embodiment, the step of fixing the substrate (SUB) further includes the steps of providing a negative pressure to the plurality of first stages 200, attracting the substrate (SUB) by the plurality of first stages 200, and planarizing the substrate (SUB). In one embodiment, the step of planarizing the substrate (SUB) includes the step of providing a positive pressure to the second stage.

[0112] As a result, the substrate (SUB) is fixed by the plurality of first stages 200 and does not shake during the processing process, and the influence of friction with the second stage 300 can be minimized.

[0113] As shown in Figures 13 and 14, in one embodiment, the displacement of the substrate (SUB) is measured (S300).

[0114] For example, the work table system has a plurality of sensors 800. For example, the work table system includes a first sensor 810, a second sensor 820, and a third sensor 830.

[0115] For example, two sensors 800 are arranged in a direction parallel to the direction of movement of the work table system, and one sensor is arranged in a direction intersecting the direction of movement of the work table system.

[0116] 14, the base stage 100 included in the worktable system moves along a second direction (DR2), in which the first sensor 810 and the second sensor 820 are arranged in a direction parallel to the movement direction, and the third sensor 830 is arranged in a direction intersecting the movement direction.

[0117] For example, the first sensor 810 and the second sensor 820 can be positioned at either end of the worktable system. The third sensor 830 can be positioned to move in and then move back in a direction that intersects the direction of movement. This ensures X-axis data, Y-axis data, and Z-axis data.

[0118] For example, the sensor 800 is an interferometer system. The interferometer installs a reflecting mirror on the work table system, irradiates the reflecting mirror with a laser, and measures the change in the wave frequency of the light reflected back by the reflecting mirror to measure the movement of the work table system (for example, the Doppler effect).

[0119] For example, the reflecting mirrors are disposed on the side surfaces of the first portions 210 included in the plurality of first stages 200. As described above, the first portions 210 correspond to the movers.

[0120] For example, the sensor 800 is disposed adjacent to the work table system. For example, if another component exists on the path of the laser beam, interference with the component may cause a measurement error, and collision with the component may damage the mirror and / or the sensor 800. To prevent this, for example, the sensor 800 is disposed adjacent to the work table system.

[0121] However, this is merely an example, and the present invention is not limited to this. For example, the number of sensors 800 can be changed in various ways. For example, taking into account the stroke distance of the work table system, the number of sensors 800 may be four or more. Alternatively, the number of sensors 800 may be one or two.

[0122] 15, in one embodiment, if the measured displacement of the substrate (SUB) falls outside a predetermined range, the position of the substrate (SUB) is changed (S400). That is, by including a base stage 100, a long-stroke, large-area worktable system can be realized (S500). Furthermore, by including multiple first stages 200, high-precision control in nanometer units can be achieved, and the substrate (SUB) can be moved by only minute displacements (S400).

[0123] The method further includes a step of changing the position of the substrate (SUB) if the measured displacement of the substrate (SUB) falls outside a predetermined range. This allows for more accurate correction of errors. Also, it is possible to move only minute displacements that are difficult to achieve with the base stage 100.

[0124] FIG. 17 is a cross-sectional view of a pixel manufactured by the work table system of FIG. 1 and the display panel manufacturing method of FIGS.

[0125] As shown in Figure 17, a pixel (PX) includes a base substrate (BS), a buffer layer (BFR), a transistor (TR), a gate insulating layer (GI), an interlayer insulating layer (ILD), a via insulating layer (VIA), a light-emitting element (EL), and a pixel defining layer (PDL). The transistor includes an active layer (ACT), a gate electrode (GE), a source electrode (SE), and a drain electrode (DE). The light-emitting element (EL) includes a first electrode (AE), an emitting layer (EML), and a second electrode (CE). The display area (DA) includes a light-emitting area (PA) and a non-emitting area (NPA). The transistor (TR) and the light-emitting element (EL) are arranged in the light-emitting area (PA). The non-emitting area (NPA) surrounds the light-emitting area (PA) in a plan view.

[0126] In one embodiment, the base substrate (BS) comprises glass, quartz, plastic, etc., and the base substrate (BS) may have flexible, bendable, or rollable properties.

[0127] The buffer layer (BFR) is disposed on the base substrate (BS). The buffer layer (BFR) includes an inorganic insulating material. For example, the buffer layer (BFR) includes silicon oxide, silicon nitride, silicon oxynitride, etc. The buffer layer (BFR) serves to block impurities from diffusing from the base substrate (BS) to prevent damage to the active layer (ACT) of the transistor (TR).

[0128] The active layer (ACT) is disposed on the buffer layer (BFR). In one embodiment, the active layer (ACT) comprises a silicon semiconductor material. For example, the active layer (ACT) comprises amorphous silicon, polycrystalline silicon, etc. In another embodiment, the active layer (ACT) comprises an oxide semiconductor material. For example, the active layer (ACT) comprises zinc oxide, zinc-tin oxide, zinc-indium oxide, indium oxide, titanium oxide, indium-gallium-zinc oxide, indium-zinc-tin oxide, etc.

[0129] The gate insulating layer (GI) is disposed on the active layer (ACT). The gate insulating layer (GI) includes an inorganic insulating material. For example, the gate insulating layer (GI) includes silicon oxide, silicon nitride, silicon oxynitride, titanium oxide, tantalum oxide, etc. The gate insulating layer (GI) serves to electrically insulate the active layer (ACT) and the gate electrode (GE) from each other.

[0130] The gate electrode (GE) is disposed on the gate insulating layer (GI). The gate electrode (GE) includes a conductive material. For example, the gate electrode (GE) includes a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. A gate signal is applied to the gate electrode (GE). The gate signal can turn on and off the transistor (TR) to adjust the electrical conductivity of the active layer (ACT).

[0131] The interlayer dielectric layer (ILD) is disposed on the gate electrode (GE). The interlayer dielectric layer (ILD) may include an organic insulating material and / or an inorganic insulating material. The interlayer dielectric layer (ILD) serves to electrically insulate the source electrode (SE) and drain electrode (DE) from the gate electrode (GE).

[0132] The source electrode (SE) and the drain electrode (DE) are disposed on the interlayer insulating layer (ILD). Each of the source electrode (SE) and the drain electrode (DE) includes a conductive material. For example, each of the source electrode (SE) and the drain electrode (DE) includes a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. Each of the source electrode (SE) and the drain electrode (DE) is in electrical contact with the active layer (ACT) through a contact hole that penetrates the interlayer insulating layer (ILD) and the gate insulating layer (GI).

[0133] The via insulating layer (VIA) is disposed on the source electrode (SE) and the drain electrode (DE). The via insulating layer (VIA) includes an organic insulating material. For example, the via insulating layer (VIA) includes a polyacrylic resin, a polyimide resin, an acrylic resin, etc. Therefore, the upper surface of the via insulating layer (VIA) is substantially flat.

[0134] The first electrode (AE) is disposed on the via insulating layer (VIA). The first electrode (AE) includes a conductive material. For example, the first electrode (AE) includes a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. The first electrode (AE) is in electrical contact with the source electrode (SE) or the drain electrode (DE) through a contact hole that penetrates the via insulating layer (VIA). In one embodiment, the first electrode (AE) is an anode electrode.

[0135] The pixel defining layer (PDL) is disposed on the first electrode (AE). The pixel defining layer (PDL) includes an organic insulating material. For example, the pixel defining layer (PDL) includes a polyacrylic compound, a polyimide compound, or the like. The pixel defining layer (PDL) defines the light-emitting area (PA) of the pixel (PX). To this end, the pixel defining layer (PDL) defines a pixel opening that exposes the first electrode (AE).

[0136] The light-emitting layer (EML) is disposed on the first electrode (AE) within the pixel opening. The light-emitting layer (EML) comprises an organic light-emitting material. In one embodiment, the light-emitting layer (EML) has a multilayer structure including various functional layers. For example, the light-emitting layer (EML) further comprises at least one of a hole-injection layer, a hole-transport layer, an electron-transport layer, and an electron-injection layer.

[0137] The second electrode (CE) is disposed on the emissive layer (EML) and covers the pixel defining layer (PDL). In one embodiment, the second electrode (CE) is a cathode electrode.

[0138] In one embodiment, the light-emitting layer (EML) is formed by depositing a deposition material on the first electrode (AE) using a worktable system (for example, the worktable system of FIG. 1).

[0139] However, the present invention is not limited to this, and the work table system can be used in various process steps that require positioning and movement of a substrate (e.g., the base substrate (BS) of Figure 29, or the substrate (SUB) of Figures 11, 12, 13, 15 and 16) during the process of forming a display panel. [Industrial Applicability]

[0140] The worktable system according to the exemplary embodiment of the present invention can be applied to the manufacturing process of display devices included in computers, notebook computers, mobile phones, smartphones, smart pads, PMPs, PDAs, MP3 players, and the like.

[0141] Although the present invention has been described above with reference to embodiments thereof, those skilled in the art will appreciate that various modifications and variations of the present invention may be made without departing from the spirit and scope of the present invention as set forth in the claims below. [Explanation of symbols]

[0142] 100: Base Stage 200: Multiple first stages DR1: First direction DR2: Second Direction 210: First part 220: Second part 300: Second Stage 410: Torso 400: Height adjustment section DR3: The Third Direction HO1: First hole HO2: Second hole S1: First side S2: Second side S3: The third side S4: The fourth side HO3: Tube fitting hole 600:Tube 700: Lift pin 800: Sensor SUB: Substrate

Claims

1. a base stage extending in a first direction and a second direction intersecting the first direction and having a first stroke length; a plurality of first stages arranged on the base stage adjacent to each corner of the base stage, the first stages being movable in the first direction and the second direction by a second stroke length that is shorter than the first stroke length.

2. 2. The worktable system according to claim 1, wherein the second stroke length is on the nanoscale or less.

3. the base stage includes at least one selected from the group consisting of granite, ceramics, and invar; Each of the plurality of first stages comprises: a first portion disposed on the base stage and including a piezo actuator; 2. The work table system according to claim 1, further comprising: a second portion disposed on the first portion and including a porous material.

4. 4. The work table system according to claim 3, wherein a negative pressure is provided to the second portion.

5. 2. The worktable system according to claim 1, further comprising a second stage disposed on the base stage and spaced apart from the plurality of first stages, the second stage including a porous material.

6. 6. The worktable system of claim 5, wherein a positive pressure is provided to the second stage.

7. the second stage includes a plurality of pads; Each of the plurality of pads is a body portion disposed on the base stage, the body portion including a porous material and having a receiving groove defined in a lower portion thereof; 7. The work table system according to claim 6, further comprising: a height adjustment unit disposed in the accommodation groove between the base stage and the body portion, the height adjustment unit including a knob protruding from the body portion in a plan view defined by the first direction and the second direction.

8. 8. The work table system according to claim 7, wherein the plurality of pads are arranged in a tiled pattern spaced apart from one another in the first direction and the second direction.

9. 8. The work table system according to claim 7, wherein each of the plurality of pads is raised and lowered in a third direction intersecting the first direction and the second direction by rotating the height adjustment part.

10. The upper surface of the body is flat, The work table system according to claim 7 , wherein the remaining surfaces of the body except for the top surface of the body are coated.

11. a second hole is defined in the base stage in a third direction intersecting the first direction and the second direction; a fluid passageway extending through the second bore; The work table system according to claim 7, wherein a portion of the positive pressure is recovered through the fluid passage.

12. On the plane, each of the plurality of pads includes a first side, a second side, a third side, and a fourth side; 12. The worktable system of claim 11, wherein the fluid passages include a first fluid passage adjacent to the first side, a second fluid passage adjacent to the second side, a third fluid passage adjacent to the third side, and a fourth fluid passage adjacent to the fourth side.

13. a substrate disposed on the plurality of first stages and the second stage and extending in the first direction and the second direction; 6. The work table system according to claim 5, further comprising a sensor arranged at a distance from the substrate in any one direction along the extension direction of the substrate, for measuring displacement of the substrate.

14. a tube fitting hole is defined in the base stage in a third direction intersecting the first direction and the second direction; The work table system according to claim 5 , further comprising a tube that passes through the tube fitting hole and is connected to the second stage.

15. a first hole is defined in the base stage in a third direction intersecting the first direction and the second direction; a lift pin extending through the first hole; 2. The work table system according to claim 1, wherein the lift pins move up and down in a third direction intersecting the first direction and the second direction.

16. a substrate extending in the first direction and the second direction is placed on a worktable system including: a base stage extending in a first direction and a second direction intersecting the first direction and having a first stroke length; and a plurality of first stages disposed on the base stage adjacent to each corner of the base stage and movable in the first direction and the second direction by a second stroke length that is smaller than the first stroke length; a plurality of first stages for fixing the substrate;

17. The method for manufacturing a display panel according to claim 16, wherein the second stroke length is nanoscale or less.

18. To fix the substrate, a negative pressure is provided to the plurality of first stages; The method of manufacturing a display panel according to claim 16 , further comprising: adsorbing the substrate by the plurality of first stages.

19. the worktable system further includes a second stage disposed on the base stage and spaced apart from the plurality of first stages, the second stage including a porous material; The method of claim 18, further comprising planarizing the substrate after the substrate is adsorbed.

20. 20. The method of claim 19, wherein a positive pressure is applied to the second stage to planarize the substrate.

21. the work table system further includes a sensor that is disposed apart from the substrate in any one direction along which the substrate extends and that measures a displacement of the substrate; After the substrate is adsorbed, measuring the displacement of the substrate; The method of claim 16, further comprising changing the position of the substrate when the measured displacement of the substrate is outside a predetermined range.

Images