Gas-liquid mixer and liquid material vaporizer

By incorporating annular grooves for liquid and gas-liquid mixing, the gas-liquid mixer addresses pressure loss issues, enabling a higher flow rate of the mixture.

JP2025119308APending Publication Date: 2025-08-14HORIBA STEC CO LTD
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Patent Information

Application Number
JP2024014132
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-02-01
Publication Date
2025-08-14

AI Technical Summary

Technical Problem

Conventional gas-liquid mixers experience significant pressure loss due to a limited mixing space, which restricts the flow rate of the gas-liquid mixture.

Method used

The gas-liquid mixer features an annular liquid material supply groove and an annular gas-liquid mixing groove, allowing for a larger mixing area, with one groove formed inside the other, to reduce pressure loss and enable a higher flow rate of the gas-liquid mixture.

Benefits of technology

This configuration effectively reduces pressure loss and allows for a larger flow rate of the gas-liquid mixture, enhancing the efficiency of the mixing process.

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Abstract

To reduce a pressure loss in a gas-liquid mixer.SOLUTION: A gas-liquid mixer includes: a main body block 2 for mixing together a liquid material and a carrier gas; and a control valve 3 disposed in the main body block 2 to adjust a flow rate of the liquid material. An annular liquid material supply groove M1 having a supply port H1 for the liquid material formed on an inner surface thereof, and an annular gas-liquid mixing groove M2 having a supply port H2 for the carrier gas and a discharge port H3 for leading out a gas-liquid mixture formed on an inner surface thereof are formed in a valve seat portion 21 of the main body block 2 which the control valve 3 contacts with or separates from. One of the liquid material supply groove M1 and the gas-liquid mixing groove M2 is formed on an inner side of the other.SELECTED DRAWING: Figure 2
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Description

[Technical Field]

[0001] The present invention relates to a gas-liquid mixer and a liquid material vaporizer. [Background technology]

[0002] A conventional liquid material vaporization device is considered to include a main body block having a mixing section that mixes the liquid material and carrier gas, and a control valve that is provided in the main body block and adjusts the flow rate of the liquid material, as shown in Patent Document 1. The main body block also has a liquid material inlet path for introducing the liquid material, a carrier gas inlet path for introducing the carrier gas, and a gas outlet path for discharging the gas-liquid mixture of the liquid material and carrier gas.

[0003] In this liquid material vaporizer, an annular recess is formed on the top surface of the main body block (the valve seat surface where the control valve comes into and out of contact with), and a downstream opening of the liquid material inlet passage is formed on the bottom surface of the annular recess. Also, a straight, elongated groove is formed inside the annular recess, with a downstream opening of the carrier gas inlet passage and a hole leading to the gas outlet passage for the gas-liquid mixture.

[0004] However, the mixing section where the liquid material and carrier gas are mixed is a linear, elongated groove, and the mixing section has a limited space, which results in a large pressure loss in the mixing section, making it difficult to flow a large flow rate of the gas-liquid mixture. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent No. 4393677 Summary of the Invention [Problem to be solved by the invention]

[0006] Therefore, the present invention has been made to solve the above-mentioned problems, and an object of the present invention is to reduce the pressure loss in a gas-liquid mixer. [Means for solving the problem]

[0007] In other words, the liquid material vaporization device of the present invention is a gas-liquid mixer that mixes a liquid material with a carrier gas to produce a gas-liquid mixture, and is equipped with a main body block for mixing the liquid material and the carrier gas, and a control valve that is provided in the main body block and adjusts the flow rate of the liquid material, and is characterized in that a valve seat portion in the main body block to which the control valve abuts or moves away is formed with an annular liquid material supply groove whose inner surface is opened to the supply port of the liquid material, and an annular gas-liquid mixing groove whose inner surface is opened to the supply port of the carrier gas and the outlet for the gas-liquid mixture, and one of the liquid material supply groove and the gas-liquid mixing groove is formed inside the other.

[0008] In such a liquid material vaporization device, one of the annular liquid material supply groove and the annular gas-liquid mixing groove is formed inside the other, so that the liquid material and carrier gas can be mixed over a larger area than before, reducing pressure loss in the mixing section, and as a result, a large flow rate of the gas-liquid mixture can be produced.

[0009] It is desirable that the liquid material supply groove and the gas-liquid mixing groove have an annular shape. With this configuration, since each groove has an annular shape, it is possible to reduce pressure loss and also reduce retention in each groove.

[0010] In order to allow a large flow rate of the gas-liquid mixture, it is desirable that at least one of the liquid material supply groove and the gas-liquid mixing groove be formed in plural numbers.

[0011] It is desirable that a plurality of the liquid material supply grooves and a plurality of the gas-liquid mixing grooves are formed alternately. With this configuration, the liquid material can be made to flow easily from the liquid material supply groove to the gas-liquid mixing groove.

[0012] In the gas-liquid mixing groove, it is desirable that the supply port for the carrier gas and the outlet port for the gas-liquid mixture are formed on both sides of the center. With this configuration, the flow path through which the carrier gas flows can be lengthened in the gas-liquid mixing groove, and the liquid material and the carrier gas can be more easily mixed in the gas-liquid mixing groove.

[0013] In the liquid material supply groove, it is desirable that the supply port of the liquid material be formed on a line perpendicular to a line connecting the supply port of the carrier gas and the outlet port of the gas-liquid mixture. This configuration makes it easy to form the liquid material flow path, carrier gas flow path, and gas-liquid mixture flow path inside the fluid block. Also, the liquid material can be efficiently introduced between the carrier gas supply port and the gas-liquid mixture outlet in the gas-liquid mixing groove.

[0014] A liquid material vaporizing device according to the present invention is characterized by comprising the above-described gas-liquid mixer and a vaporizer that heats the gas-liquid mixture and vaporizes the liquid material. [Effects of the Invention]

[0015] In this way, according to the present invention, the pressure loss in the gas-liquid mixer can be reduced. [Brief explanation of the drawings]

[0016] [Figure 1] 1 is a diagram schematically illustrating the configuration of a liquid material vaporizing device according to one embodiment of the present invention. [Figure 2] FIG. 2 is a top view of a main body block of the gas-liquid mixer of the embodiment. [Figure 3] FIG. 2 is a perspective view of a main body block of the gas-liquid mixer of the embodiment. [Figure 4] FIG. 10 is a top view of a main body block of a gas-liquid mixer according to a modified embodiment. [Figure 5] FIG. 10 is a perspective view of a main body block of a gas-liquid mixer according to a modified embodiment. [Figure 6]FIG. 10 is a top view of a main body block of a gas-liquid mixer according to a modified embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0017] An embodiment of a liquid material vaporization device according to the present invention will be described below with reference to the drawings. Note that, for ease of understanding, all of the drawings shown below are drawn in a schematic manner, with appropriate omissions or exaggerations. Identical components are designated by the same reference numerals, and their description will be omitted where appropriate.

[0018] <Basic Configuration of Liquid Material Vaporizer 100> The liquid material vaporizing apparatus 100 according to this embodiment is incorporated into, for example, a semiconductor manufacturing line, etc., and is used to supply a predetermined flow rate of gas to a chamber, etc., used in the semiconductor manufacturing process.

[0019] Specifically, as shown in FIG. 1, the liquid material vaporization device 100 includes a gas-liquid mixer 10 that mixes a liquid material with a carrier gas to generate a gas-liquid mixture, and a vaporizer 20 into which the gas-liquid mixture is introduced and which vaporizes the liquid material contained in the gas-liquid mixture.

[0020] <Gas-liquid mixer 10> As shown in FIG. 2, the gas-liquid mixer 10 includes a main body block 2 having a mixing section 2x that mixes the liquid material and the carrier gas, and a control valve 3 that is provided in the main body block 2 and adjusts the flow rate of the liquid material.

[0021] 2 and 3, the main body block 2 is formed with a liquid material flow path 2a through which the liquid material flows, a carrier gas flow path 2b through which the carrier gas flows, and a gas-liquid mixture flow path 2c through which the gas-liquid mixture flows. Each of the flow paths 2a, 2b, and 2c opens into a valve seat 21 formed on the upper surface of the main body block 2 with which the control valve 3 abuts or moves away. In the valve seat 21 of the main body block 2, the junction of the carrier gas flow path 2b and the gas-liquid mixture flow path 2c forms a mixing portion 2x where the liquid material and the carrier gas mix. The detailed configuration of the valve seat 21 of the main body block 2 will be described later.

[0022] The control valve 3 functions as a flow control valve, and is provided on the upper surface of the main body block 2 via a seal member (not shown), as shown in Fig. 2. The control valve 3 includes a diaphragm 31, which is a valve body portion that abuts against or separates from the valve seat portion 21 of the main body block 2, and an actuator 32 that presses and deforms the diaphragm 31. The actuator 32 uses, for example, a piezo stack.

[0023] As shown in Figures 1 and 2, the main body block 2 is connected to a liquid material supply pipe 4 for supplying liquid material to the liquid material flow path 2a, a carrier gas supply pipe 5 for supplying carrier gas to the carrier gas flow path 2b, and a gas-liquid mixture discharge pipe 6 for discharging the gas-liquid mixture from the gas-liquid mixture flow path 2c.

[0024] A mass flow meter (not shown) is provided upstream of the liquid material supply pipe 4 to measure the flow rate of the liquid material flowing through the liquid material supply pipe 4. Based on the measurement value of this mass flow meter, the control valve 3 is feedback-controlled so that the liquid material supplied to the mixing section 2x is maintained at a predetermined flow rate. Furthermore, a mass flow controller is provided upstream of the carrier gas supply pipe 5 to adjust the flow rate of the carrier gas flowing through the carrier gas supply pipe 5.

[0025] <Vaporizer 20> 1, vaporizer 20 includes a heating block 7 having a heating flow path HS that heats the gas-liquid mixture produced by gas-liquid mixer 10. Vaporizer 20 also has a configuration in which the vaporization of the liquid material is promoted by spraying the gas-liquid mixture into the heating flow path HS using a nozzle portion N.

[0026] The heating block 7 has a built-in heater 8 for heating the gas-liquid mixture flowing through the heating flow path HS. The heating block 7 is made of a heat-conducting metal (e.g., aluminum). The upstream end of the heating flow path HS is connected to a gas-liquid mixture outlet pipe 6. In addition, the downstream end of the heating flow path HS is connected to an outlet port 9 for outletting the vaporized gas obtained by vaporizing the liquid material.

[0027] <Specific Configuration of Gas-Liquid Mixer 10 (Detailed Configuration of Valve Seat Portion 21)> Next, the detailed configuration of the valve seat portion 21 in the gas-liquid mixer 10 of this embodiment will be described.

[0028] In this embodiment, the valve seat portion 21 is formed with an annular liquid material supply groove M1 having a liquid material supply port H1 opening on its inner surface (here, the bottom surface), and an annular gas-liquid mixing groove M2 serving as a mixing portion 2x having a carrier gas supply port H2 and a gas-liquid mixture outlet H3 opening on its inner surface (here, the bottom surface). Note that the supply port H1 may be configured to open on a side surface of the liquid material supply groove M1, and the outlet H3 may be configured to open on a side surface of the gas-liquid mixing groove M2.

[0029] In this embodiment, the liquid material supply groove M1 is formed with one liquid material supply port H1, which is connected to the liquid material flow path 2a. The gas-liquid mixing groove M2 is formed with one carrier gas supply port H2, which is connected to the carrier gas flow path 2b. The gas-liquid mixing groove M2 is also formed with one gas-liquid mixture outlet H3, which is connected to the gas-liquid mixture flow path 2c. The liquid material supply groove M1 may be formed with two or more supply ports H1, and the gas-liquid mixing groove M2 may be formed with two or more supply ports H2 or two or more outlets H3.

[0030] In plan view, the liquid material supply groove M1 and the gas-liquid mixing groove M2 are formed such that one of the liquid material supply groove M1 and the gas-liquid mixing groove M2 is formed inside the other. Specifically, the liquid material supply groove M1 and the gas-liquid mixing groove M2 are formed concentrically on the valve seat portion 21 in plan view. Note that concentricity includes a configuration in which the centers of the liquid material supply groove M1 and the gas-liquid mixing groove M2 are perfectly aligned, as well as a configuration in which they are slightly offset. Furthermore, the liquid material supply groove M1 and the gas-liquid mixing groove M2 form an annular shape in plan view. In this embodiment, they are formed concentrically so that the liquid material supply groove M1 is on the outside and the gas-liquid mixing groove M2 is on the inside.

[0031] In this embodiment, the gas-liquid mixing groove M2 has a carrier gas supply port H2 and a gas-liquid mixture outlet H3 on either side of the center. This allows the carrier gas supplied from the carrier gas supply port H2 to flow in two separate paths toward the gas-liquid mixture outlet H3. Furthermore, in the liquid material supply groove M1, the liquid material supply port H1 is formed on a line perpendicular to the line connecting the carrier gas supply port H2 and the gas-liquid mixture outlet H3. This configuration allows the carrier gas flow path 2b and the gas-liquid mixture flow path 2c to be formed on the same line in the main body block 2, and the liquid material flow path 2a to be formed perpendicular to the flow paths 2b and 2c. This facilitates the formation of the flow paths 2a-2c in the main body block 2.

[0032] In the configuration of the valve seat portion 21 described above, the upper surface of the partition portion T1 formed between the liquid material supply groove M1 and the gas-liquid mixing groove M2 serves as the valve seat surface 21a, and the upper surface of the central portion formed inside the gas-liquid mixing groove M2 also serves as the valve seat surface 21a.

[0033] When the control valve 3 is in contact with the valve seat surface 21a (valve closed state), the liquid material supply groove M1 and the gas-liquid mixing groove M2 are blocked, and the supply of liquid material to the gas-liquid mixing groove M2 is stopped. In this state, carrier gas is supplied to the gas-liquid mixing groove M2 from the carrier gas supply port H2, and the carrier gas flows out from the outlet H3.

[0034] On the other hand, when the control valve 3 is spaced from the valve seat surface 21a (open state), the liquid material supply groove M1 and the gas-liquid mixing groove M2 are in communication, and the liquid material is supplied to the gas-liquid mixing groove M2. The flow rate of the liquid material flowing into the gas-liquid mixing groove M2 is adjusted by adjusting the opening of the control valve 3 (the distance from the valve seat surface 21a). Specifically, the liquid material is supplied from the liquid material supply port H1 to the liquid material supply groove M1, and the liquid material flows from the liquid material supply groove M1 into the gas-liquid mixing groove M2 over the entire circumferential direction. At this time, the liquid material is mixed with the carrier gas on the partition wall T1, or is mixed with the carrier gas in the gas-liquid mixing groove M2. The gas-liquid mixture then flows out from the outlet H3.

[0035] <Effects of this embodiment> As described above, in the liquid material vaporizing apparatus 100 of this embodiment, one of the annular liquid material supply groove M1 and the annular gas-liquid mixing groove M2 is formed inside the other, so that the liquid material and the carrier gas can be mixed over a larger area than in the past, and pressure loss in the mixing section 2x can be reduced. As a result, a large flow rate of the gas-liquid mixture can be flowed.

[0036] <Other embodiments> For example, as shown in Figures 4 and 5, at least one of the liquid material supply groove M1 and the gas-liquid mixing groove M2 may be formed in multiple numbers. Figures 4 and 5 show an example in which two annular liquid material supply grooves M1 and two annular gas-liquid mixing grooves M2 are formed. Here, an annular liquid material supply groove M1 and an annular gas-liquid mixing groove M2 are formed in this order from the outside, for example, in a concentric pattern. Furthermore, a circular liquid material supply groove M11 is formed inside the innermost gas-liquid mixing groove M2. In this configuration of the valve seat portion 21, the upper surface of the partition portion formed between the liquid material supply grooves M1, M11 and the gas-liquid mixing groove M2 becomes the valve seat surface.

[0037] The liquid material supply port H1 formed in the bottom surface of each liquid material supply groove M1, M11 is connected to the liquid material flow path 2a. The carrier gas supply port H2 formed in the bottom surface of each gas-liquid mixing groove M2 is connected to the carrier gas flow path 2b. Furthermore, the gas-liquid mixture outlet H3 formed in the bottom surface of each gas-liquid mixing groove M2 is connected to the gas-liquid mixture flow path 2c.

[0038] When the control valve 3 is in contact with the valve seat surface (valve closed state), the liquid material supply grooves M1, M11 and the gas-liquid mixing grooves M2 are blocked, and the supply of liquid material to the gas-liquid mixing groove M2 is stopped. In this state, carrier gas is supplied to the gas-liquid mixing grooves M2 from the carrier gas supply port H2, and the carrier gas flows out from the outlet H3.

[0039] On the other hand, when the control valve 3 is separated from the valve seat surface (open state), the liquid material supply grooves M1, M11 communicate with the gas-liquid mixing grooves M2, and the liquid material is supplied to the gas-liquid mixing grooves M2. Specifically, the liquid material is supplied from the liquid material supply port H1 to the liquid material supply grooves M1, M11, and flows from the liquid material supply grooves M1, M11 to the gas-liquid mixing grooves M2 in the entire circumferential direction. At this time, the liquid material is mixed with the carrier gas in the partition wall portion, or mixed with the carrier gas in the gas-liquid mixing groove M2. The gas-liquid mixture then flows out from the outlet H3.

[0040] Furthermore, as shown in FIG. 6, an annular gas-liquid mixing groove M2 may be formed on the outside, an annular liquid material supply groove M1 may be formed on the inside, and a linear gas-liquid mixing groove M21 may be formed inside the annular liquid material supply groove M1, where the carrier gas supply port H2 and the gas-liquid mixture outlet H3 may be formed.

[0041] In the above-described embodiment, the liquid material supply groove M1 and the gas-liquid mixing groove M2 may be arranged in reverse.

[0042] Furthermore, either the liquid material supply groove M1 or the gas-liquid mixing groove M2 is not limited to being circular in plan view, but may be various shapes, such as an elliptical shape, an oval shape, or a rectangular shape, in plan view. Furthermore, either the liquid material supply groove M1 or the gas-liquid mixing groove M2 may be a continuous groove around the entire circumference, or may have a shape with a portion cut out, such as a C-shape. In other words, in the present invention, a shape with a portion cut out is also included in the concept of annular shape. For example, if the gas-liquid mixing groove M2 has a portion cut out, such as a C-shape, a carrier gas supply port H2 may be formed at one circumferential end of the gas-liquid mixing groove M2, and a gas-liquid mixture outlet H3 may be formed at the other circumferential end of the gas-liquid mixing groove M2. Alternatively, one of the supply port H2 or outlet H3 may be formed in the circumferential center of the gas-liquid mixing groove M2, and the other of the supply port H2 or outlet H3 may be formed at each of the circumferential ends of the gas-liquid mixing groove M2.

[0043] In addition, various modifications and combinations of the embodiments may be made as long as they do not go against the spirit of the present invention. [Explanation of symbols]

[0044] 100 Liquid material vaporizer 10...gas-liquid mixer 20 ···Carburetor 2 Body block 3. Control valve 21 Valve seat M1...Liquid material supply groove H1: Liquid material supply port M2...Gas-liquid mixing groove (mixing part) H2 carrier gas supply port H3: Outlet for gas-liquid mixture

Claims

1. A gas-liquid mixer that mixes a liquid material with a carrier gas to generate a gas-liquid mixture, a main body block for mixing the liquid material and the carrier gas; a control valve provided in the main body block to adjust the flow rate of the liquid material; a valve seat portion of the main body block with which the control valve abuts or separates is formed with an annular liquid material supply groove, the liquid material supply port of which opens on its inner surface, and an annular gas-liquid mixing groove, the carrier gas supply port and the gas-liquid mixture outlet of which open on their inner surfaces; A gas-liquid mixer, wherein one of the liquid material supply groove and the gas-liquid mixing groove is formed inside the other.

2. 2. The gas-liquid mixer according to claim 1, wherein the liquid material supply groove and the gas-liquid mixing groove are annular.

3. 3. The gas-liquid mixer according to claim 1, wherein at least one of the liquid material supply groove and the gas-liquid mixing groove is formed in plural.

4. The gas-liquid mixer according to claim 1 , wherein a plurality of the liquid material supply grooves and a plurality of the gas-liquid mixing grooves are alternately formed.

5. 5. The gas-liquid mixer according to claim 1, wherein the gas-liquid mixing groove has a supply port for the carrier gas and an outlet port for the gas-liquid mixture formed on both sides of the center.

6. 6. The gas-liquid mixer according to claim 5, wherein in the liquid material supply groove, the supply port of the liquid material is formed on a line perpendicular to a line connecting the supply port of the carrier gas and the outlet of the gas-liquid mixture.

7. The gas-liquid mixer according to any one of claims 1 to 6, a vaporizer that heats the gas-liquid mixture and vaporizes the liquid material.

Citation Information

Patent Citations

  • Liquid material vaporization method and apparatus and control valve

    JP4393677B2