Atomized active liquid supply device

Abstract

To provide an atomized active liquid supply device for stably and efficiently supplying an atomized active liquid to an object for a long time.SOLUTION: An atomized active liquid supply device supplies an atomized and activated liquid, and includes: an atomized liquid generation mechanism that ejects an atomized liquid from an ejection port; and an energy imparting mechanism that is disposed outside a range of an ejection region of the atomized liquid ejected from the ejection port and imparts energy to the liquid.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an atomized activated liquid supplying device for supplying activated atomized liquid to an object stably and efficiently over a long period of time. [Background technology]

[0002] In recent years, technologies for activating liquids by irradiating them with energy such as ultraviolet light or plasma have been actively investigated for the purpose of densifying coating films and promoting sterilization.

[0003] Patent Document 1 discloses a technology in which an atomized mixed liquid containing silica sol and a surfactant is applied to a target substrate, and then atmospheric pressure plasma is applied to the coating film to activate the coating film and form a low dielectric constant film.

[0004] Non-Patent Document 1 discloses a technique in which atmospheric pressure plasma is generated between two copper wire electrodes (diameter 1 mm, length 100 mm) coated with aluminum oxide, which is a dielectric, and atomized liquid is sprayed so that it passes through the atmospheric pressure plasma. This activates the atomized liquid, and it has been shown to be able to suppress the viable bacterial count. Hereinafter, in this application, activated atomized liquid may be referred to as "atomized activated liquid." [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2005-332943 [Non-patent literature]

[0006] [Non-Patent Document 1] Kazuo Takahashi, "Inactivating gram-positive microorganisms by using atmospheric pressure discharges with water mist," Japanese Journal of Applied Physics 62, 016003 (2023) Summary of the Invention [Problem to be solved by the invention]

[0007] However, in the method for forming a low dielectric constant film disclosed in Patent Document 1, atmospheric pressure plasma is irradiated onto a coating film (mixed liquid) applied to a target substrate, so there are cases where a sufficient activation effect is not obtained inside the coating film.

[0008] Furthermore, the atomized active liquid supply device disclosed in Non-Patent Document 1 has a copper wire electrode for generating atmospheric pressure plasma located within the area where the atomized liquid is sprayed, and therefore, when used for a long period of time, the liquid may adhere to the copper wire electrode, resulting in processing defects due to abnormal discharge or uneven processing due to dripping.

[0009] The present invention has been made in consideration of the above-mentioned problems, and provides an atomized active liquid supplying device for supplying atomized active liquid to an object stably and efficiently for a long period of time. [Means for solving the problem]

[0010] [1] The atomized activated liquid supply device of the present invention, which solves the above problems, is a device for supplying atomized activated liquid, an atomized liquid generating mechanism that sprays the atomized liquid from a spray nozzle; and an energy imparting mechanism that is arranged outside the range of the spray area of ​​the atomized liquid sprayed from the spray nozzle and that imparts energy to the liquid.

[0011] The atomized active liquid supply device of the present invention preferably has the following aspects [2] to [5]. [2] The atomized active liquid supply device according to [1], wherein the energy imparting mechanism is arranged to surround or sandwich the spray area. [3] The atomized active liquid supply device according to [1] or [2] above, wherein the energy imparting mechanism is an atmospheric pressure plasma treatment device. [4] The atomized active liquid supply device according to [3], wherein the atmospheric pressure plasma treatment device is of a dielectric barrier discharge type. [5] The atmospheric pressure plasma treatment device is in contact with the atomized liquid generation mechanism, the injection port of the atomized liquid generating mechanism is at ground potential, and the electrode of the atmospheric pressure plasma processor is at driving potential; The atomized active liquid supply device according to [3] or [4] above. [Effects of the Invention]

[0012] According to the atomized active liquid supplying device of the present invention, atomized active liquid can be supplied to an object stably and efficiently for a long period of time. [Brief explanation of the drawings]

[0013] [Figure 1] FIG. 1 is a schematic diagram showing an atomized active liquid supply device according to a first embodiment of the present invention. [Figure 2] FIG. 2 is a schematic diagram showing an atomized active liquid supply device according to a second embodiment of the present invention. [Figure 3] FIG. 3 is a schematic diagram showing an atomized active liquid supply device according to a third embodiment of the present invention. [Figure 4] FIG. 4 is an enlarged view of the vicinity of the injection port (area A) of the atomized liquid generating nozzle in the atomized activated liquid supply device according to the third embodiment of the present invention. [Figure 5] FIG. 5 is an example of a schematic diagram of the spray nozzle of the atomized liquid generating nozzle in the atomized activated liquid supply device of the third embodiment of the present invention, as viewed from the target object. [Figure 6] FIG. 6 is another example of a schematic diagram of the spray nozzle of the atomized liquid generating nozzle in the atomized activated liquid supply device according to the third embodiment of the present invention, as viewed from the target object. [Figure 7]FIG. 7 is a schematic diagram showing an atomized active liquid supply device according to a fourth embodiment of the present invention. [Figure 8] FIG. 8 is another enlarged view of the vicinity of the injection port (area A) of the atomized liquid generating nozzle in the atomized activated liquid supply device according to the fourth embodiment of the present invention. [Figure 9] FIG. 9 is a schematic diagram showing an atomized active liquid supply device according to a fifth embodiment of the present invention. [Figure 10] FIG. 10 is an enlarged view of the vicinity of the injection port (area A) of the atomized liquid generating nozzle in the atomized activated liquid supply device according to the fifth embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0014] [First embodiment of atomized active liquid supply device] Hereinafter, examples of embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a schematic diagram showing a first embodiment 101 of the atomized activated liquid supplying device of the present invention. As shown in Fig. 1, the atomized activated liquid supplying device 101 of this embodiment is equipped with an atomized liquid generating mechanism 1 and an energy imparting mechanism 5. Below, the atomized liquid generating mechanism 1 and the energy imparting mechanism 5 will be described separately.

[0015] [Atomized liquid generation mechanism] Referring to Figure 1, the atomized liquid generating mechanism 1 will be described first. The atomized liquid generating mechanism 1 has the function of atomizing a liquid and spraying the atomized liquid 6 onto an object 8.

[0016] The atomized liquid generating mechanism 1 is not particularly limited in its specific configuration as long as it has the above-mentioned functions. For example, it may be a one-fluid spray nozzle equipped with a liquid supplier 4, in which the atomized liquid 6 is generated by the hydraulic pressure and / or ultrasonic vibration of the liquid supplied from the liquid supplier 4, or a two-fluid spray nozzle equipped with a gas supplier and liquid supplier 4 (not shown), in which the atomized liquid generating nozzle 2 is brought into contact with a high-velocity compressed gas to atomize (shear) the liquid. The atomizing gas supplied to the two-fluid nozzle is not particularly limited, and examples include air and nitrogen gas. It may be a single gas or a mixed gas of multiple gases.

[0017] The atomized liquid 6 in the present invention refers to aggregates (droplets) of fine liquid molecules. The specific droplet size of the atomized liquid 6 is not particularly specified, but is, for example, about several nm to several hundred μm. By miniaturizing the droplet size of the atomized liquid 6, the atomized liquid 6 can be sprayed uniformly and densely onto the surface of the target 8, regardless of the surface shape of the target 8. The droplet size distribution of the atomized liquid 6 can be confirmed using a laser diffraction particle size distribution measuring device or the like.

[0018] The type of liquid to be atomized is not particularly limited, and examples include water, alcohol, liquid resin, etc. It may be a single liquid or a mixed liquid of multiple liquids. It may also be a slurry-like liquid in which solid particles are dispersed.

[0019] The shape of the opening of the spray nozzle 3 of the atomized liquid generating nozzle is not particularly limited. Examples include a square shape and a round shape. Furthermore, when the target object 8 is wide, a plurality of atomized liquid generating nozzles 2 and spray nozzles 3 may be provided, but it is preferable that the opening of the spray nozzle 3 be shaped like a slit. By using a slit shape, the atomized liquid 6 can be sprayed more uniformly onto the wide target object 8.

[0020] The liquid supplier 4 is not particularly limited, but examples thereof include metering pumps such as a smoothflow pump, a syringe pump, and a diaphragm pump.

[0021] The target 8 onto which the atomized liquid 6 is sprayed can be changed as appropriate depending on the purpose, and may be a flat substrate or a three-dimensional structure, such as, but not limited to, a silicon wafer, a plastic film, a metal pipe, or an exterior wall.

[0022] The spray area 6 of the atomized liquid refers to the area within the spread (spray angle θ of the atomized liquid) of the atomized liquid 6 sprayed from the spray nozzle 3 between the spray nozzle 3 of the atomized liquid generating nozzle and the target 8. The spray angle θ of the atomized liquid can be calculated from the relationship between the distance L1 from the spray nozzle 3 of the atomized liquid generating nozzle to the target 8 and the spray width L2 of the atomized liquid on the target 8, as shown in the following formula. Spray angle of atomized liquid θ=2×tan -1 (L2 / (2×L1)).

[0023] The distance L1 from the nozzle 3 of the atomized liquid generating nozzle to the target object 8 can be adjusted as desired and is not particularly limited.

[0024] [Energy transfer mechanism] Next, the energy applying mechanism 5 will be described. The energy applying mechanism 5 applies energy 7 such as ultraviolet light, infrared light, plasma, or flame to the atomized liquid 6, thereby activating the atomized liquid 6.

[0025] The energy imparting mechanism 5 is positioned outside the spray area 6 of the atomized liquid. This prevents the atomized liquid 6 from adhering to the energy imparting mechanism 5, preventing treatment defects due to abnormal discharge, photon energy loss due to light absorption by adhered materials, and uneven treatment due to dripping. As a result, the atomized activated liquid 6 can be stably supplied to the target object 8 for a long period of time. In addition, because energy 7 is imparted to the fine atomized liquid 6, the liquid can be activated efficiently. Furthermore, because energy 7 is imparted to the atomized liquid 6 before it adheres to the target object 8, the entire atomized liquid 6 can be effectively activated. In addition, when forming a coating film, a sufficient activation effect can be obtained not only on the surface but also on the interior of the coating film.

[0026] Furthermore, in the atomized activated liquid supply device 101 of the present invention, the atomized liquid generating mechanism 1 and the energy imparting mechanism 5 are separate, so each mechanism can be controlled according to its purpose, providing high process controllability.

[0027] In the present invention, "activation" refers to providing energy 7 to the atomized liquid 6 to ionize, dissociate, or impart an electric charge to the atomized liquid 6. This activation generates radicals and charged particles within the atomized liquid 6, accelerating the chemical reaction between the atomized liquid 6 and the target object 8. As a result, effects such as densifying the coating film, improving adhesion to the target object 8, and promoting sterilization and germination can be obtained. Furthermore, providing energy 7 to the atomized liquid 6 causes a portion of the atomized liquid 6 to decompose and evaporate, further reducing the droplet size of the atomized liquid 6. The activity of the atomized liquid 6 can be confirmed using a pH meter, an electrometer, or the like.

[0028] In the present invention, the term "radical" refers to an atom or molecule having a highly reactive unpaired electron or an atom or molecule in an excited state.

[0029] The energy application mechanism 5 only needs to have the energy necessary to activate the atomized liquid 6, and at least one of an atmospheric pressure plasma treatment device, an ultraviolet treatment device, an infrared treatment device, a flame treatment device, and the like can be used. Among these, an atmospheric pressure plasma treatment device is more preferable because it has a relatively high energy and can efficiently activate the atomized liquid 6. The atmospheric pressure plasma treatment device may be equipped with a gas supply device for supplying any discharge gas. For example, air or nitrogen gas can be used as the discharge gas. In order to prevent the activated species generated by the discharge from colliding with other gas molecules and becoming inactive, it is preferable to use an inert gas such as nitrogen. A single gas or a mixed gas containing multiple gases may be used. If the atomized liquid generating mechanism 1 is a two-fluid spray nozzle, the atomization gas can be used as the discharge gas. The types of gases may be the same or different.

[0030] The power supply 10 connected to the energy application mechanism 5 can be selected appropriately depending on the type of the energy application mechanism 5. For example, a DC power supply or an AC power supply can be selected. In the present invention, "AC" refers to a voltage and current whose magnitude constantly changes over time. While the value generally changes in a sinusoidal manner over time, other examples include a value that changes in a rectangular wave or pulse wave. Examples of power supply frequencies in AC power supplies include low frequencies on the order of several kHz to high frequencies on the order of several tens of MHz, and microwaves on the order of several GHz.

[0031] The atomized liquid generating mechanism 1 and the energy imparting mechanism 5 are electrically insulated from each other.

[0032] The energy deposition mechanism 5 is preferably provided with a measuring instrument 9 for monitoring the energy state in the energy deposition region 7. By providing the measuring instrument 9, abnormalities in the energy deposition region 7 can be detected early. For example, when an atmospheric pressure plasma treatment device is used for the energy deposition mechanism 5, by providing an optical emission spectrometer that can measure the light emission state of the plasma, the plasma energy and the type and amount of active species contained in the atomized liquid 6 can be determined from the emission peak and emission wavelength.

[0033] The energy deposition region 7 refers to the region where energy is deposited, and this region can be confirmed by the measuring instrument 9 described above.

[0034] When the energy imparting mechanism 5 is an atmospheric pressure plasma processor, it is preferable that the atmospheric pressure plasma processor is electrically insulated from the object 8. This makes it possible to suppress attraction of unnecessary charged particles to the object 8 and to prevent the object 8 from being charged.

[0035] [Second embodiment of atomized active liquid supply device] Please refer to Figure 2. Figure 2 is a schematic diagram showing an atomized activated liquid supplying device 102 according to a second embodiment of the present invention. The atomized activated liquid supplying device 102 according to this embodiment is the same as the first embodiment 101, except that the energy imparting mechanisms 5 are arranged to sandwich the atomized liquid spraying region 6. This allows energy 7 to be imparted more efficiently and completely across the entire atomized liquid spraying region 6, thereby increasing the activity of the atomized liquid 6. The energy imparting mechanisms 5 may be arranged to surround the atomized liquid spraying region 6.

[0036] [Third embodiment of atomized active liquid supply device] Please refer to Figures 3, 4, 5, and 6. Figure 3 is a schematic diagram showing atomized activated liquid supplying device 103 of a third embodiment of the present invention, and Figure 4 is an enlarged view of the vicinity of nozzle 3 of the atomized liquid generating nozzle in atomized activated liquid supplying device 103 of this embodiment (the area indicated by symbol A in Figure 3). Also, Figures 5 and 6 are examples of schematic views of the nozzle 3 of the atomized liquid generating nozzle in atomized activated liquid supplying device 103 of this embodiment as viewed from the target object 8.

[0037] In the atomized activated liquid supply device 103 of this embodiment, a dielectric barrier discharge type atmospheric pressure plasma processor is used for the energy imparting mechanism 5. The dielectric barrier discharge type atmospheric pressure plasma processor is equipped with a driving electrode 13, a ground electrode 14, and a dielectric 11. The driving electrode 13 and the ground electrode 14 of the atmospheric pressure plasma processor are arranged to sandwich the atomized liquid spray area 6, as shown in FIG. 5, or to surround the atomized liquid spray area 6, as shown in FIG. 6. The driving electrode 13 and the ground electrode 14 are in contact with the atomized liquid generation nozzle 2 via the dielectric 11. In other words, the atmospheric pressure plasma processor composed of the driving electrode 13, the ground electrode 14, and the dielectric 11 is in contact with the atomized liquid generation nozzle 2. Other than that, it is the same as the second embodiment 102.

[0038] The driving electrode 13 is at a driving potential applied from the power supply 10, and the ground electrode 14 is at a ground potential. The electrical wiring of the power supply 10 may be reversed, and the electrode arrangement of the driving electrode 13 and the ground electrode 14 may be reversed. In the case of a dielectric barrier discharge type atmospheric pressure plasma processor, it is preferable that the power supply 10 is an AC power supply. This allows repeated charging and discharging even if the dielectric 11 is charged up. Furthermore, it is preferable that the frequency of the AC power supply 10 is 100 KHz or higher. By setting the power supply frequency to 100 KHz or higher, it is possible to mitigate the effect of temporary loss of atmospheric pressure plasma due to charging and discharging of the dielectric 11, and it is possible to supply the atomized active liquid 6 more efficiently.

[0039] The driving electrode 13, the ground electrode 14, and the atomized liquid generating mechanism 1 are electrically insulated from one another. In the atomized activated liquid supply device 103 of this embodiment, the atomized liquid generating mechanism 1 is at a floating potential.

[0040] By using a dielectric barrier discharge atmospheric pressure plasma processor, as in the atomized active liquid supply device 103 of this embodiment, it is possible to suppress the inflow of excessive current into the electrodes 13, 14, and prevent abnormal discharge such as arcing and heat generation. As a result, thermally non-equilibrium atmospheric pressure plasma 7 can be generated stably and over a wide area at the distance L4 between the drive electrode and the ground electrode shown in Figure 4. For this reason, it is more preferable to use a dielectric barrier discharge atmospheric pressure plasma processor for the energy imparting mechanism 5.

[0041] The distance L6 by which the driving electrode 13 and the ground electrode 14 protrude from the nozzle 3 of the atomized liquid generating nozzle may be changed as appropriate, provided that the driving electrode 13, the ground electrode 14 and the dielectric 11 are positioned outside the range of the atomized liquid spray area 6.

[0042] As shown in FIG. 4, the dielectric 11 covers the surfaces of the electrodes 13 and 14 that face the atomized liquid generating nozzle 2 and the energy imparting region 7 .

[0043] There are no particular restrictions on the material of the dielectric 11. Examples include zirconia, titanium oxide, aluminum oxide, silicone rubber, and polytetrafluoroethylene.

[0044] Although there are no particular limitations on the thickness L5 of the dielectric 11, it is preferable to adjust the thickness L5 according to the dielectric strength (KV / mm) of the material of the dielectric 11 so that the withstand voltage is equal to or greater than the discharge voltage applied to the driving electrode 13 and the ground electrode 14. By making the withstand voltage of the dielectric 11 higher than the discharge voltage, energy can be stably imparted to the atomized liquid 6 without dielectric breakdown of the dielectric 11.

[0045] It is preferable to adjust the thickness L5 of the dielectric 11 and the width L3 of the nozzle 3 of the atomized liquid generating nozzle so that the distance L4 between the driving electrode 13 and the ground electrode 14 is 3 mm or less. When the distance L4 between the electrodes is 3 mm or less, atmospheric pressure plasma can be generated even with a low discharge voltage, reducing the possibility of abnormal discharge occurring toward surrounding components.

[0046] As in the atomized active liquid supply device 103 of this embodiment, by bringing the driving electrode 13 and the ground electrode 14 into contact with each other near the nozzle 3 of the atomized liquid generating nozzle, the distance L4 between the driving electrode 13 and the ground electrode 14 can be reduced. This reduces the discharge voltage applied between the driving electrode 13 and the ground electrode 14, reducing the occurrence of abnormal discharge. As a result, the atomized active liquid 6 can be stably supplied to the target object 8 for a long period of time.

[0047] [Fourth embodiment of atomized active liquid supply device] Please refer to Figures 7 and 8. Figure 7 is a schematic diagram showing an atomized activated liquid supply device 104 according to a fourth embodiment of the present invention, and Figure 8 is an enlarged view of the vicinity of the nozzle 3 of the atomized liquid generating nozzle in the atomized activated liquid supply device 104 according to this embodiment (the area indicated by symbol A in Figure 7).

[0048] In the first, second and third embodiments 101, 102 and 103 described above, the nozzle 3 has a narrow diameter (width) relative to the overall diameter (width) of the atomized liquid generating nozzle 2, but as shown in Figures 7 and 8, the nozzle 3 may have a narrow diameter (width) that does not protrude relative to the overall diameter (width) of the atomized liquid generating nozzle 2. The driving electrode 13, the ground electrode 14 and the dielectric 11 may be arranged outside the spray area 6 of the atomized liquid.

[0049] [Fifth embodiment of atomized active liquid supply device] Please refer to Figures 9 and 10. Figure 9 is a schematic diagram showing an atomized activated liquid supplying apparatus 105 of a fifth embodiment of the present invention, and Figure 10 is an enlarged view of the vicinity of the nozzle 3 of the atomized liquid generating nozzle in the atomized activated liquid supplying apparatus 105 of this embodiment (the area indicated by symbol A in Figure 9). The atomized activated liquid supplying apparatus 105 of this embodiment is the same as the atomized activated liquid supplying apparatus 103 of the third embodiment, except that the nozzle 3 of the atomized liquid generating mechanism 1 serves as the ground electrode 14, and the atmospheric pressure plasma processing device serves as the driving electrode 13. Note that, as shown in Figures 7 and 8, a structure in which the nozzle 3, which has a narrow diameter (width) relative to the overall diameter (width) of the atomized liquid generating nozzle 2, does not protrude may also be used.

[0050] As shown in FIG. 10, the atomized activated liquid supply device 105 of this embodiment can further reduce the distance L4 between the driving electrode 13 and the ground electrode 14, thereby generating high-density atmospheric pressure plasma 7 toward the nozzle 3 of the atomized liquid generating nozzle. By reducing the distance L4 between the driving electrode and the ground electrode as much as possible, the discharge voltage applied between these electrodes can be reduced to the minimum, significantly reducing the occurrence of abnormal discharge. As a result, the atomized activated liquid 6 can be supplied to the target object 8 stably for a longer period of time. Furthermore, by generating high-density atmospheric pressure plasma 7 toward the nozzle 3 of the atomized liquid generating nozzle, the atomized liquid 6 can be activated more efficiently.

[0051] In this embodiment 105, the width L3 of the nozzle outlet 3 of the atomized liquid generating nozzle is not involved in the generation of atmospheric pressure plasma, so the nozzle outlet width L3 can be freely changed. [Example]

[0052] The atomized active liquid supply device of the present invention will be described below with reference to examples, but the present invention is not limited to these examples.

[0053] [Example 1] An atomized activated liquid supply device 105 shown in Figures 9 and 10 was used. In this device, a two-fluid slit spray nozzle was used as the atomized liquid generation mechanism 1, and a dielectric barrier discharge atmospheric pressure plasma treatment device was used as the energy imparting mechanism 5. The target object 8 was a stainless steel container 8.

[0054] The gas supplied to the two-fluid slit spray nozzle was air, which was also used as the discharge gas, and water was used as the liquid. The air pressure was 0.11 MPa, the water supply rate was 10 mL / min, and atomized liquid 6 was sprayed.

[0055] By applying an 18 KVpp voltage (sine wave, 5 KHz AC) between the driving electrode 13 and the ground electrode 14 of the atmospheric pressure plasma processor, which is the nozzle 3 of the atomized liquid generating nozzle, atmospheric pressure plasma was generated in the energy imparting region 7, and the atomized liquid 6 was activated for 10 minutes. The protrusion distance L6 between the driving electrode 13 and the ground electrode 14 was 0.8 mm. The spread (spray width L2) of the atomized liquid 6 at the distance L6 from the bottom surface of the nozzle 3 of the atomized liquid generating nozzle was 1.1 mm. Because the width L3 of the nozzle 3 of the atomized liquid generating nozzle was 1.4 mm, the driving electrode 13, ground electrode 14, and dielectric 11 were positioned outside the range of the spray region 6 of the atomized liquid.

[0056] The positional relationship between the atomized liquid generating mechanism 1 and the energy imparting mechanism 5 in this embodiment 1 will be described below. Distance L1 from the nozzle of the atomized liquid generating nozzle to the target: 120 mm Spray width of atomized liquid on target L2: 170mm Atomized liquid generating nozzle nozzle width L3: 1.4mm Dielectric 11 material: Silicone rubber Dielectric thickness L5: 0.07mm Protrusion distance between drive electrode and ground electrode L6: 0.8 mm Distance between driving electrodes L7: 1.54 mm Spray angle of atomized liquid θ: 71°.

[0057] The activity of the atomized liquid 6 was evaluated by measuring the pH of the active liquid accumulated in the stainless steel container 8 with a pH meter (compact pH meter LAQUAtwin, manufactured by Horiba, Ltd.). The droplet size (Sauter mean value) of the atomized active liquid 6 was confirmed with a 532 nm laser diffraction particle size distribution analyzer (FLD-319A, Seika Digital Image Co., Ltd.).

[0058] As a result, it was confirmed that the atomized active liquid 6 could be stably supplied to the target object 8 for at least 10 minutes without dripping from the driving electrode 13. In addition, the pH of the generated active liquid was 5.97, and the droplet size of the atomized active liquid 6 was φ40.3 μm.

[0059] [Example 2] The same atomized active liquid supply device 105 as in Example 1 was used. The target object 8 was a stainless steel container 8.

[0060] Nitrogen was used as the gas supplied to the two-fluid slit spray nozzle, and was also used as the discharge gas. The gas pressure was 0.05 MPa, and the water supply rate was 20 mL / min. Atomized liquid 6 was sprayed.

[0061] By applying a voltage of 12 KVpp (sine wave, AC 10 KHz) between the driving electrode 13 of the atmospheric pressure plasma processor and the nozzle 3 of the atomized liquid generating nozzle, which is the ground electrode 14, atmospheric pressure plasma was generated in the energy imparting region 7, and the atomized liquid 6 was activated for 10 minutes. The other conditions, such as the positional relationship between the atomized liquid generating mechanism 1 and the energy imparting mechanism 5, were the same as in Example 1.

[0062] As a result, it was confirmed that the atomized activated liquid 6 could be stably supplied to the target object 8 for at least 10 minutes without dripping from the driving electrode 13. The activity of the atomized liquid 6 was measured in the same manner as in Example 1, and the pH of the produced activated liquid 6 was found to be 4.75.

[0063] [Example 3] Atomized active liquid 6 was supplied under the same conditions as in Example 2, except that the gas supplied to the two-fluid slit spray nozzle was air. As a result, the pH of the produced active liquid 6 was 5.27.

[0064] [Comparative Example 1] Atomized activated liquid 6 was supplied under the same conditions as in Example 1, except that atmospheric pressure plasma was not generated. As a result, the pH of the generated activated liquid 6 was 6.42, and the droplet size of the atomized activated liquid 6 was φ44.4 μm.

[0065] Comparative Example 2 Atomized activated liquid 6 was supplied under the same conditions as in Example 1, except that the protrusion distance L6 of the drive electrode was set to 2 mm and the drive electrode 13 was positioned within the spray area 6 of the atomized liquid. As a result, water adhered to the drive electrode 13, and dripping occurred about one minute after the start of treatment. After that, it was confirmed that localized liquid pools (abnormal discharge) occurred between the drive electrodes 13 about two to three minutes later. When the protrusion distance L6 of the drive electrode was set to 2 mm, the spread (spray width L2) of the atomized liquid 6 was 2.8 mm. Since the spray opening width L3 of the atomized liquid generating nozzle was 1.4 mm, it was positioned within the spray area 6 of the atomized liquid.

[0066] Comparative Example 3 Atomized activated liquid 6 was supplied under the same conditions as in Example 2, except that atmospheric pressure plasma was not generated. As a result, the pH of the generated activated liquid 6 was 6.77.

[0067] Comparative Example 4 Atomized activated liquid 6 was supplied under the same conditions as in Example 3, except that atmospheric pressure plasma was not generated. As a result, the pH of the generated activated liquid 6 was 6.44.

[0068] [Evaluation of the results of each example and each comparative example] [Comparison between Example 1 and Comparative Example 1, Example 2 and Comparative Example 3, and Example 3 and Comparative Example 4] When water is activated, oxygen radicals are generated within the water, or oxygen radicals are absorbed from the activated atmosphere, generating highly acidic hydrogen peroxide or ozone, and the droplet size is thought to decrease as the water evaporates and decomposes due to the applied energy. In other words, the lower the pH value of the atomized activated liquid 6 and the smaller the droplet size, the more activated the water is.

[0069] Example 1 had a lower pH and smaller droplet size than Comparative Example 1, Example 2 had a lower pH than Comparative Example 3, and Example 3 had a lower pH than Comparative Example 4. It is believed that in Examples 1 to 3, in which atmospheric pressure plasma was generated to impart energy to the atomized liquid 6, the water was more activated than in Comparative Examples 1, 3, and 4, in which the atomized liquid 6 was sprayed as is without generating atmospheric pressure plasma.

[0070] [Comparison between Example 2 and Example 3] In Example 2, in which nitrogen was used as the gas supplied to the nozzle and also as the discharge gas, the pH was 4.75, whereas in Example 3, in which air was used as the gas supplied to the nozzle, the pH was 5.27. This suggests that the use of nitrogen, an inert gas, as the discharge gas enabled more efficient activation of the atomized liquid 6.

[0071] [Comparison between Example 1 and Comparative Example 2] In Comparative Example 2, in which the driving electrode 13 serving as the energy imparting mechanism 5 was arranged within the liquid spraying area 6, abnormal discharge occurred in about 2 to 3 minutes, whereas in Example 1, in which the driving electrode 13 serving as the energy imparting mechanism 5 was arranged outside the liquid spraying area 6, no liquid dripping that could lead to abnormal discharge occurred for at least 10 minutes. From this, it is believed that by arranging the energy imparting mechanism 5 outside the liquid spraying area 6, atomized activated liquid could be supplied stably for a long period of time. [Industrial Applicability]

[0072] By using the atomized active liquid supply device of the present invention, it is possible to supply the atomized active liquid to the target object stably and efficiently for a long period of time. This supply device can be used for, for example, film formation on a substrate or sterilization treatment, but the range of applications is not limited to these. [Explanation of symbols]

[0073] 1, 101, 102, 103, 104, 105 Atomized liquid generation mechanism 2. Atomized liquid generating nozzle 3. Atomized liquid generating nozzle nozzle 4 Liquid supply 5 Energy transfer mechanism 6. Spray area of ​​atomized liquid (spray area of ​​atomized active liquid) 7 Energy deposition area 8 Objects 9 Measuring Instruments 10 Power supply 11 Dielectrics 12 Internal flow path of atomized liquid generating nozzle 13 Driving electrode (driving potential) 14 Ground electrode (ground potential) L1: Distance from the nozzle of the atomized liquid generating nozzle to the target object L2 Spray width of atomized liquid on the target L3 Atomized liquid generating nozzle nozzle width L4 Distance between the driving electrode and the ground electrode L5 Dielectric Thickness L6 Protrusion distance between driving electrode and ground electrode L7 Distance between drive electrodes θ Spray angle of atomized liquid

Claims

1. 1. A device for dispensing atomized and activated liquid, comprising: an atomized liquid generating mechanism that sprays the atomized liquid from a spray nozzle; an energy imparting mechanism that is disposed outside a range of an ejection area of ​​the atomized liquid ejected from the ejection port and that imparts energy to the liquid; An atomized active liquid supply device comprising:

2. 2. The atomized active liquid supply device according to claim 1, wherein the energy applying mechanism is disposed so as to surround or sandwich the injection area.

3. 2. The atomized activated liquid supply device according to claim 1, wherein the energy imparting mechanism is an atmospheric pressure plasma treatment device.

4. 4. The atomized active liquid supply device according to claim 3, wherein the atmospheric pressure plasma treatment device is of a dielectric barrier discharge type.

5. the atmospheric pressure plasma treatment device is in contact with the atomized liquid generation mechanism, the injection port of the atomized liquid generating mechanism is at ground potential, and the electrode of the atmospheric pressure plasma processor is at drive potential; 4. The atomized active liquid supply device of claim 3.

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