Release agent composition

Abstract

To provide a release agent composition which lowers the concentration of carbonic acid and is able to suppress degradation due to carbonic acid, in one aspect.SOLUTION: The present disclosure relates, in one aspect, to a release agent composition comprising an alkali component, a carbonate-removing component, and water, wherein the carbonate-removing component comprises metal ions (component A) having a solubility product with hydroxide ions of 1.0×10-6 or more and a solubility product with carbonate ions of 1.0×10-8 or less, and the content of component A in the release agent composition is 0.2 mass% or more.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present disclosure relates to a stripper composition, a method for reducing the carbonate concentration in an alkaline aqueous solution, and a method for producing electronic components. [Background technology]

[0002] In recent years, personal computers and various electronic devices have become increasingly power-efficient, faster, and more compact, and the wiring on the package substrates and other components they are equipped with has been getting finer every year. Until now, metal masking has been the primary method used to form such fine wiring and connection terminals such as pillars and bumps, but due to its limited versatility and the difficulty of adapting to the miniaturization of wiring, new methods are being adopted.

[0003] One new method is to use a dry film resist as a thick resin mask instead of a metal mask. This resin mask is finally stripped and removed, and an alkaline stripping agent composition (strip cleaner) is used for this purpose.

[0004] For example, Patent Document 1 proposes a cleaning solution for removing photoresist from the surface of a semiconductor element having a low dielectric constant film (low-k film) and a material containing 10 atomic % or more of tungsten, the cleaning solution containing 0.001 to 5 mass % of an alkaline earth metal compound, 0.1 to 30 mass % of an inorganic alkali and / or an organic alkali, and water. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. 2016 / 076031 Summary of the Invention [Problem to be solved by the invention]

[0006] It has been reported that alkaline stripping compositions deteriorate due to dissolution of the resist, reaction with carbon dioxide gas in the air, etc., and that stripping performance (resin mask removal performance) decreases. For example, when a stripper composition is recycled, the concentration of the alkaline component in the stripper composition and the concentration of carbonic acid (carbonate ions) present in the stripper composition change, causing the stripper composition to deteriorate, and therefore it is necessary to replenish or replace the stripper composition.

[0007] Therefore, the present disclosure provides a stripping agent composition that can reduce the carbon dioxide concentration and suppress deterioration due to carbon dioxide, a method for reducing the carbon dioxide concentration in an alkaline aqueous solution, and a method for producing electronic components. [Means for solving the problem]

[0008] In one aspect, the present disclosure provides a stripping composition comprising an alkaline component, a carbonation excluding component, and water, wherein the carbonation excluding component has a solubility product with hydroxide ions of 1.0×10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The present invention relates to a stripping agent composition comprising the following metal ion (component A), wherein the content of component A in the stripping agent composition is 0.2 mass % or more.

[0009] In one aspect, the present disclosure provides a method for reducing a carbonate concentration in an alkaline aqueous solution, comprising: -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The present invention relates to a method for reducing a carbon dioxide concentration, which includes a step of mixing the following metal ions (component A) with an alkaline aqueous solution (mixing step).

[0010] In one aspect, the present disclosure relates to a method for producing an electronic component, comprising a step of reducing the carbonate concentration in an alkaline aqueous solution used in the production of an electronic component, using the method for reducing the carbonate concentration of the present disclosure.

[0011] In one aspect, the present disclosure relates to a method for producing an electronic component, comprising a step of stripping a resin mask from a substrate having the resin mask thereon using the stripper composition of the present disclosure.

[0012] In one aspect, the present disclosure provides a carbon dioxide scavenger for use in the method for reducing carbon dioxide concentration of the present disclosure, the carbon dioxide scavenger having a solubility product with hydroxide ions of 1.0×10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The present invention relates to a carbonation scavenger comprising a metal ion (component A) that is: [Effects of the Invention]

[0013] According to one aspect of the present disclosure, a stripping composition can be provided that can reduce the carbon dioxide concentration and suppress deterioration due to carbon dioxide. DETAILED DESCRIPTION OF THE INVENTION

[0014] [Removal agent composition] In one or more embodiments, the present disclosure is based on the finding that by adding a specific metal ion (component A) to a stripper composition containing an alkaline component, the carbon dioxide concentration in the stripper composition can be reduced and deterioration of the stripper composition due to carbon dioxide can be suppressed even if carbon dioxide gas in the air dissolves in the stripper composition.

[0015] In one aspect, the present disclosure provides a stripping composition comprising an alkaline component, a carbonation excluding component, and water, wherein the carbonation excluding component has a solubility product with hydroxide ions of 1.0×10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The present invention relates to a stripper composition (hereinafter also referred to as "the stripper composition of the present disclosure") that contains the following metal ion (component A), and the content of component A in the stripper composition is 0.2 mass % or more.

[0016] According to the present disclosure, it is possible to provide a stripping agent composition that can reduce the carbon dioxide concentration and suppress deterioration due to carbon dioxide.

[0017] Although the details of the mechanism of action by which the effects of the present disclosure are manifested are still unclear, it is presumed as follows. It is believed that a stripper composition containing an alkaline component reacts with carbon dioxide in the air as it is used, and the alkali is deactivated (deteriorated) as the carbon dioxide (carbonic acid) dissolves, resulting in a decrease in the stripping performance (resin mask removal ability) of the stripper composition. In the present disclosure, by incorporating a specific amount of a specific metal ion (component A) into a stripper composition containing an alkaline component, the metal ion (component A) with a small solubility product of carbonate reacts with carbonic acid to form a precipitate (carbonate), and therefore component A acts as a carbonic acid extractor, enhancing the activity of the alkali, i.e., it is believed that deterioration of the stripper composition due to carbonic acid can be suppressed. On the other hand, in a stripping composition containing an alkaline component, metal ions with a small solubility product as a hydroxide are also precipitated as hydroxides, which reduces the carbon dioxide removal effect. Conversely, when a substance containing an element with a large solubility product as both a hydroxide and a carbonate is used, carbon dioxide cannot be precipitated. However, in the present disclosure, by using a substance containing an element whose solubility product as a hydroxide is larger than the solubility product as a carbonate, i.e., a metal ion of component A, it is possible to efficiently expel (remove) carbonic acid from the stripper composition, reduce the carbonic acid concentration in the stripper composition, and inhibit deterioration of the stripper composition due to carbonic acid. However, the present disclosure need not be construed as being limited to this mechanism.

[0018] In one or more embodiments, the stripper composition of the present disclosure is a stripper composition for stripping a resin mask. By using the stripper composition of the present disclosure for cleaning a substrate having a resin mask, deterioration of the stripper composition due to carbonic acid can be suppressed and the resin mask can be efficiently removed. Furthermore, by using the stripper composition of the present disclosure for cleaning electronic components such as electronic circuit boards having a resin mask, high-quality electronic components can be obtained with a high yield.

[0019] In the present disclosure, a resin mask is a mask for protecting the surface of a material from treatments such as etching, plating, and heating, that is, a mask that functions as a protective film. In one or more embodiments, the resin mask may be a resist layer after exposure and development processes, a resist layer that has been subjected to at least one of exposure and development processes (hereinafter also referred to as "exposed and / or developed"), or a hardened resist layer. In one or more embodiments, the resin mask is formed using a resist whose physical properties, such as solubility in a developer, change when exposed to light, an electron beam, or the like. Resists are broadly classified into negative and positive types based on how they react with light or an electron beam. Negative resists have the property of decreasing their solubility in a developer when exposed to light, and the exposed portion of a layer containing negative resist (hereinafter also referred to as a "negative resist layer") is used as a resin mask after exposure and development. Positive resists have the property of increasing their solubility in a developer when exposed to light, and the exposed portion of a layer containing positive resist (hereinafter also referred to as a "positive resist layer") is removed after exposure and development, and the unexposed portion is used as a resin mask. By using a resin mask with such properties, fine connections on a circuit board, such as metal wiring, metal pillars, and solder bumps, can be formed. In one or more embodiments, the resin material for forming the resin mask may be a film-like photosensitive resin, a resist film, or a photoresist. A general-purpose resist film may be used.

[0020] (carbon dioxide eliminating ingredient) The carbon dioxide excluding component contained in the stripping composition of the present disclosure has a solubility product with hydroxide ions of 1.0 × 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The carbon dioxide excluding component contains the following metal ion (hereinafter also referred to as "component A"). The carbon dioxide excluding component is a source of the metal ion (component A), and in one or more embodiments, examples of the carbon dioxide excluding component include an aqueous solution, metal salt, or ion crystal containing component A. In one or more embodiments, the carbon dioxide excluding component is the hydroxide of component A or a hydrate thereof.

[0021] The solubility product of component A and hydroxide ions is set to 1.0 × 10 from the viewpoint of reducing the carbon dioxide concentration. -6or more, preferably 1.0 × 10 -5 More preferably, 1.0 × 10 -4 More preferably, 1.0 × 10 -3 That's all. The solubility product of component A and carbonate ions is 1.0 x 10 from the viewpoint of reducing the carbon dioxide concentration. -8 or less, preferably 5.0 × 10 -9 Less than 2.0 × 10, more preferably -9 The following is the result. In the present disclosure, the solubility product refers to the solubility product in water at 25°C. The solubility products of various metal ions and hydroxide ions, and the solubility products of various metal ions and carbonate ions are publicly known and can be known by those skilled in the art. For example, see "Chemistry 2e" (PAUL FLOWERS and 3 others, "Chemistry 2e", APPENDIX J Solubility Products TABLE J1, pp. 1125-1130, [online], 2019, RICE UNIVERSITY, [searched January 10, 2024]), Internet <https: / / assets.openstax.org / oscms-prodcms / media / documents / Chemistry2e-WEB.pdf?_gl=1*18312di*_ga*MTgwMDIyMDM5Mi4xNzA5MDA2MjMx*_ga_T746F8B0QC*MTcwOTA5MjQxNy4zLjEuMTcwOTA5MjQ0NC4zMy4wLjA> ) is described in Alternatively, for example, a saturated solution may be prepared, its cation concentration and anion concentration may be measured, and the solubility product may be calculated from the measured concentrations. The metal ion (component A) reacts with carbonate ions in the alkaline aqueous solution and the alkaline stripper composition to form a salt. The salt is poorly soluble or insoluble in the alkaline aqueous solution and the alkaline stripper composition, and may precipitate in some cases. For example, when component A is a Ba ion, it reacts with carbonate ions to form the carbonate salt BaCO3.

[0022] As the metal ion (component A), from the viewpoint of reducing the carbonate concentration, alkaline earth metal ions are preferred, and barium (Ba) ions (solubility product with hydroxide ions: 5.0 × 10 -3 , solubility product with carbonate ion 1.6 × 10 -9 ), strontium (Sr) ions (solubility product with hydroxide ions: 3.2 × 10 -4 , solubility product with carbonate ion 7 × 10 -10 ) and calcium (Ca) (solubility product with hydroxide ion: 1.3 × 10 -6 , solubility product with carbonate ion 8.7 × 10 -9 ) ions, more preferably at least one of Ba ions and Sr ions, and even more preferably Ba ions. Component A may be one type or a combination of two or more types. In one or more embodiments, the carbon dioxide excluding component that serves as a supply source of the metal ions (component A) is not particularly limited as long as it is a compound that can supply the metal ions (component A). A preferred example is barium hydroxide octahydrate (Ba(OH) 8H O).

[0023] The content (concentration, mass %) of Component A in the stripping composition of the present disclosure is 0.2 mass % or more, preferably 0.3 mass % or more, more preferably 0.5 mass % or more, from the viewpoint of reducing the carbon dioxide concentration, and is preferably 10 mass % or less, more preferably 7 mass % or less, and even more preferably 4 mass % or less, from the viewpoint of blendability. When Component A is a combination of two or more types, the content of Component A is the total content thereof. The content of the metal that is the source of component A in the liquid phase of the stripping agent composition, obtained by atomic absorption spectrometry, inductively coupled plasma atomic emission spectrometry, precipitation titration, or the like, can be used as the content of component A according to the present disclosure. The content (concentration, mmol / g) of component A in the stripping composition of the present disclosure is preferably 0.003 mmol / g or more, more preferably 0.010 mmol / g or more, and even more preferably 0.016 mmol / g or more, from the viewpoint of reducing the carbonate concentration, and is preferably 0.317 mmol / g or less, more preferably 0.222 mmol / g or less, and even more preferably 0.127 mmol / g or less, from the viewpoint of blendability.

[0024] (Alkaline component) In one or more embodiments, the alkaline component contained in the stripper composition of the present disclosure is at least one alkali selected from a quaternary ammonium hydroxide (component B), an organic amine (component C), and an alkali metal hydroxide (component D). The alkaline component may be one type or a combination of two or more types.

[0025] <Component B: Quaternary ammonium hydroxide> In one or more embodiments, the stripper composition of the present disclosure contains a quaternary ammonium hydroxide (hereinafter also referred to as "component B"). From the viewpoint of resin mask removability, component B is preferably a quaternary ammonium hydroxide having a total of 10 or less carbon atoms, more preferably tetramethylammonium hydroxide. Component B may be one type or a combination of two or more types.

[0026] When the stripper composition of the present disclosure contains Component B, the content of Component B in the stripper composition of the present disclosure is preferably 0.1% by mass or more, more preferably 2% by mass or more, and even more preferably 3% by mass or more from the viewpoint of improving resin mask removability, and is preferably 10% by mass or less, more preferably 8% by mass or less, and even more preferably 7% by mass or less from the viewpoints of resin mask removability and waste liquid treatability. When Component B is a combination of two or more types, the content of Component B refers to the total content thereof.

[0027] <Component C: Organic amine> In one or more embodiments, the stripper composition of the present disclosure contains an organic amine (hereinafter also referred to as "component C"). From the viewpoint of resin mask removability, component C is preferably an alkanolamine (amino alcohol), more preferably an alkanolamine having a total of 6 or less carbon atoms, and even more preferably monoethanolamine. Component C may be one type or a combination of two or more types.

[0028] When the stripper composition of the present disclosure contains component C, the content of component C in the stripper composition of the present disclosure is preferably 0.1 mass % or more, more preferably 0.5 mass % or more, even more preferably 3 mass % or more, and still more preferably 7 mass % or more from the viewpoint of resin mask removability, waste liquid treatability, and suppression of damage to the substrate resin and the substrate metal, and is preferably 20 mass % or less, more preferably 15 mass % or less, and even more preferably 13 mass % or less from the viewpoint of resin mask removability, waste liquid treatability, and suppression of damage to the substrate resin and the substrate metal. When component C is a combination of two or more types, the content of component C refers to the total content thereof.

[0029] <Component D: Alkali metal hydroxide> In one or more embodiments, the stripper composition of the present disclosure contains an alkali metal hydroxide (hereinafter also referred to as "component D"). Note that alkali metal ions are not contained in component A. From the viewpoints of reducing the carbon dioxide concentration and removing the resin mask, component D is preferably at least one selected from lithium hydroxide, sodium hydroxide, and potassium hydroxide, more preferably at least one of sodium hydroxide and potassium hydroxide, and even more preferably sodium hydroxide. Component D may be one type or a combination of two or more types.

[0030] When the stripper composition of the present disclosure contains component D, the content of component D in the stripper composition of the present disclosure is preferably 0.1 mass% or more, more preferably 0.2 mass% or more, and even more preferably 0.3 mass% or more, from the viewpoints of reducing the carbon dioxide concentration and removability of the resin mask, and is preferably 3 mass% or less, more preferably 2 mass% or less, and even more preferably 1 mass% or less, from the viewpoint of removability of the resin mask. When component D is a combination of two or more types, the content of component D refers to the total content thereof.

[0031] The content of the alkali component in the stripper composition of the present disclosure is preferably 0.1% by mass or more, more preferably 0.2% by mass or more, and even more preferably 0.3% by mass or more, from the viewpoints of reducing the carbon dioxide concentration and removability of the resin mask, and is preferably 30% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less, from the viewpoints of resin mask removability, waste liquid treatability, and suppression of damage to the substrate resin and the substrate metal. The mass ratio of component A to the alkali component (component A / alkali component) in the stripper composition of the present disclosure is preferably 0.01 or more, more preferably 0.03 or more, and even more preferably 0.04 or more, from the viewpoints of reducing the carbon dioxide concentration and removing the resin mask, and from the same viewpoints, is preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.

[0032] (water) From the viewpoint of resin mask removability, preferred examples of water contained in the stripper composition of the present disclosure include pure water, deionized water, and distilled water.

[0033] The water content in the stripper composition of the present disclosure can be the remainder excluding the carbonation-removing component, the alkaline component (component B, component C, component D), and the optional components (other components) described below. Specifically, from the viewpoint of resin mask removability, the water content in the stripper composition of the present disclosure is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably 75% by mass or more, and from the same viewpoint, is preferably less than 100% by mass, more preferably 95% by mass or less, more preferably 91% by mass or less, and even more preferably 87% by mass or less.

[0034] In the present disclosure, the "content of each component of the stripper composition" refers to the content of each component at the time of use, i.e., at the time when the stripper composition starts to be used for cleaning (resin mask removal treatment). In one or more embodiments, the content of each component in the stripper composition of the present disclosure can be considered to be the blending amount of each component in the stripper composition of the present disclosure.

[0035] (Other ingredients) The stripping agent composition of the present disclosure may further contain other components, such as alkaline agents other than Component B, Component C, and Component D, amines other than Component C, organic solvents, surfactants, chelating agents, thickeners, dispersants, rust inhibitors, polymeric compounds, solubilizers, antioxidants, preservatives, antifoaming agents, and antibacterial agents.

[0036] In one or more embodiments, the stripping agent composition of the present disclosure may contain carbonic acid (carbonate ions). The carbonic acid (carbonate ions) are derived from carbon dioxide gas in the air, etc. In general, the carbonate concentration (content) in the stripper composition of the present disclosure is preferably as low as possible from the viewpoint of resin mask removability. From the viewpoint of resin mask removability, the carbonate concentration is preferably 10 mol / L or less, more preferably 5 mol / L or less, and even more preferably 1 mol / L or less. The carbonate concentration in the stripper composition of the present disclosure can be measured, for example, using potentiometric titration, specifically, by the method described in the Examples.

[0037] (pH) The pH of the stripper composition of the present disclosure is preferably 10 or more, more preferably 12 or more, and even more preferably 13 or more, from the viewpoint of improving the removability of the resin mask, and is preferably 14 or less, more preferably 13.8 or less, and even more preferably 13.6 or less, from the viewpoint of suppressing damage to the substrate resin. The pH of the stripper composition is a value at 25°C and can be measured using pH, specifically, by the method described in the Examples.

[0038] The stripper composition according to the present disclosure may be a so-called one-component type, in which all components (except for carbon dioxide) are premixed and supplied to the market, or may be a so-called two-component type, in which components are mixed at the time of use.

[0039] (Method of producing the release agent composition) In one or more embodiments, the stripper composition of the present disclosure can be produced by blending a carbonation-free component (component A), an alkali component (component B, component C, component D), water, and, if necessary, the optional components (other components) described above, using a known method. For example, the stripper composition of the present disclosure can be produced by blending at least a carbonation-free component (component A), an alkali component (component B, component C, component D), and water. Therefore, in one or more embodiments, the present disclosure relates to a method for producing a stripper composition, comprising a step of blending at least a carbonation-free component (component A), an alkali (component B, component C, component D), and water. In this disclosure, "blending" includes mixing the carbonation-free component (component A), an alkali component (component B, component C, component D), water, and, if necessary, the optional components (other components) described above, simultaneously or in any order. In the method for producing a stripper composition of the present disclosure, the preferred amount of each component can be the same as the preferred content of each component in the stripper composition of the present disclosure described above.

[0040] The stripper composition of the present disclosure may be prepared as a concentrate by reducing the amount of water to the extent that separation, precipitation, etc. do not occur and storage stability is not impaired. From the viewpoint of transportation and storage, the stripper composition concentrate is preferably a concentrate diluted 3 times or more, and from the viewpoint of storage stability, it is preferably a concentrate diluted 30 times or less. The stripper composition concentrate can be used by diluting it with water so that component A, alkaline components (components B, C, and D), water, and optional components (other components) reach the above-mentioned contents (i.e., contents at the time of cleaning) at the time of use. Furthermore, the stripper composition concentrate can also be used by adding each component separately at the time of use. In the present disclosure, "at the time of use" or "at the time of cleaning" of the concentrated stripper composition refers to the diluted state of the stripper composition concentrate.

[0041] [Method for reducing the carbon dioxide concentration in an alkaline aqueous solution] In one aspect, the present disclosure relates to a method for reducing the carbonate concentration in an alkaline aqueous solution (hereinafter also referred to as the "carbonate concentration reducing method of the present disclosure"). In one or more embodiments, the method for reducing a carbon dioxide concentration of the present disclosure is characterized in that the solubility product with hydroxide ions is 1.0 × 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The method includes a step of mixing the following metal ions (component A) with an alkaline aqueous solution (hereinafter, also simply referred to as the "mixing step"). In one or more embodiments, the form of the component A mixed in the mixing step may be the form of the carbon dioxide-excluded component.

[0042] In the mixing step, when the alkaline aqueous solution and component A are mixed, carbonic acid in the alkaline aqueous solution may react with component A to precipitate a carbonate, and it is preferable to separate the precipitated carbonate. Therefore, it is preferable that the carbon dioxide concentration reducing method of the present disclosure further comprises, after the mixing step, a step of separating the carbonic acid precipitated by the mixing from the carbonate salt of component A. The carbonate can be separated by, for example, filtration.

[0043] The content of component A in the alkaline aqueous solution after the mixing step is preferably 0.2% by mass or more from the viewpoints of reducing the carbon dioxide concentration and suppressing deterioration due to carbon dioxide. Therefore, in one or more embodiments, the mixing step is preferably a step of mixing component A and the alkaline aqueous solution so that the content of component A in the alkaline aqueous solution is 0.2% by mass or more.

[0044] In one or more embodiments, the alkaline aqueous solution in the method for reducing a carbon dioxide concentration of the present disclosure is a stripper composition. Accordingly, in one aspect, the method for reducing a carbon dioxide concentration of the present disclosure is a method for reducing the carbon dioxide concentration in a stripper composition.

[0045] [Carbonation remover] In one or more embodiments, the carbon dioxide removing component containing component A used in the carbon dioxide concentration reducing method of the present disclosure can be used as a carbon dioxide removing agent. Therefore, in one aspect, the present disclosure provides a carbon dioxide scavenger for use in the carbon dioxide concentration reducing method of the present disclosure, the carbon dioxide scavenger having a solubility product with hydroxide ions of 1.0 × 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 The present invention relates to a carbonation scavenger comprising a metal ion (component A) that is: In one or more embodiments, component A in the carbonation scavenger may be in the form of an aqueous solution containing component A, a metal salt, or an ionic crystal. Furthermore, the stripper composition of the present disclosure can be produced by adding the carbon dioxide scavenger of the present disclosure to a conventional stripper composition.

[0046] [Items to be cleaned] In one or more embodiments, the stripper composition of the present disclosure is used to clean a substrate (object to be cleaned) having a resin mask. Examples of the substrate include a printed circuit board, a wafer, a copper plate, and an aluminum plate. The resin mask may be, for example, a negative resin mask or a positive resin mask, with a negative resin mask being preferred in terms of the ease with which the effects of the present disclosure are exerted. Examples of negative resin masks include negative dry film resists that have been subjected to exposure and / or development. In the present disclosure, a negative resin mask is one formed using a negative resist, and examples thereof include a negative resist layer that has been subjected to exposure and / or development. In the present disclosure, a positive resin mask is one formed using a positive resist, and examples thereof include a positive resist layer that has been subjected to exposure and / or development. The thickness of the resin mask is, for example, 5 μm to 35 μm or less.

[0047] In one or more embodiments, the substrate (object to be cleaned) having a resin mask may be a substrate having a metal layer and a resin mask on its surface. In one or more embodiments, the metal layer is a copper plating layer, which can be formed by, for example, an electrolytic copper plating method. The thickness of the metal layer is, for example, 3 μm or more and 30 μm or less. In one or more embodiments, the metal layer is used as a metal wiring or a wiring connection portion.

[0048] In one or more other embodiments, the substrate (object to be cleaned) having the resin mask may be, for example, an electronic component having a metal layer and a resin mask on its surface, or a manufacturing intermediate thereof. Examples of the electronic component include at least one component selected from a printed circuit board, a wafer, and a metal plate such as a copper plate or an aluminum plate. The manufacturing intermediate is an intermediate product in the manufacturing process of an electronic component, and includes an intermediate product after resin mask treatment. Specific examples of objects to be cleaned include electronic components in which wiring, connection terminals, etc. are formed on the surface of a substrate by undergoing at least one of soldering using a resin mask and plating (copper plating, aluminum plating, nickel plating, tin plating, etc.). In this disclosure, soldering refers to applying solder to the resin mask-free areas of the substrate and forming solder bumps by heating. In this disclosure, plating refers to performing at least one plating process selected from copper plating, aluminum plating, nickel plating, and tin plating on the resin mask-free areas of the substrate. The resin mask-free areas refer to areas in a resist pattern (patterned resin mask) formed by developing a resin mask laminated to a substrate, where the resin mask has been removed by the developing process.

[0049] [Removal method] In one aspect, the present disclosure relates to a method for stripping a resin mask (hereinafter also referred to as the "stripping method of the present disclosure"), which includes a step of stripping a resin mask from a substrate (object to be cleaned) having the resin mask thereon using a stripper composition of the present disclosure (hereinafter also simply referred to as the "stripping step"). Examples of the object to be cleaned in the stripping step include the above-mentioned objects to be cleaned.

[0050] The stripping method of the present disclosure includes a step of stripping a resin mask from a substrate (object to be cleaned) having the resin mask thereon in the presence of carbonate ions using the stripper composition of the present disclosure (hereinafter also simply referred to as a "stripping step"). In one or more embodiments, the stripping step includes contacting the object to be cleaned with the stripper composition of the present disclosure. According to the stripping method of the present disclosure, deterioration of the stripper composition due to carbon dioxide can be suppressed and the resin mask can be efficiently removed.

[0051] Examples of a method for peeling a resin mask from an object to be cleaned using the stripper composition of the present disclosure, or a method for contacting an object to be cleaned with the stripper composition of the present disclosure, include a method of contacting the object by immersing the object in a cleaning bath containing the stripper composition, a method of contacting the object by spraying the stripper composition (shower method), and an ultrasonic cleaning method of irradiating the object with ultrasonic waves while immersed in the stripper composition. The stripper composition of the present disclosure can be used for cleaning as is without dilution. Examples of objects to be cleaned include the above-mentioned objects. The immersion time can be, for example, from 1 minute to 10 minutes, or even from 3 minutes to 6 minutes. The spray time can be, for example, from 1 minute to 10 minutes, or even from 3 minutes to 6 minutes.

[0052] In one or more embodiments, the stripping method of the present disclosure may include a step of contacting the object to be cleaned with the stripper composition of the present disclosure, rinsing with water, and drying. Examples of the rinsing method include rinsing with running water. Examples of the drying method include air blow drying. In one or more embodiments, the stripping method of the present disclosure can include a step of contacting the object to be cleaned with the stripper composition of the present disclosure and then rinsing with water.

[0053] In the stripping method of the present disclosure, ultrasonic waves are preferably applied when the stripper composition of the present disclosure comes into contact with the object to be cleaned, and the ultrasonic waves are more preferably relatively high frequency, from the viewpoint of making it easier for the stripper composition of the present disclosure to exert its stripping and cleaning power. From the same viewpoint, the ultrasonic irradiation conditions are, for example, preferably 26 to 72 kHz and 80 to 1500 W, and more preferably 36 to 72 kHz and 80 to 1500 W.

[0054] In the stripping method of the present disclosure, the temperature of the stripper composition of the present disclosure is preferably 40°C or higher, more preferably 50°C or higher, from the viewpoint of easily exerting the stripping and cleaning power of the stripper composition of the present disclosure, and is preferably 70°C or lower, more preferably 60°C or lower, from the viewpoint of reducing the effect on the substrate.

[0055] [Electronic component manufacturing method] In one aspect, the present disclosure relates to a method for producing an electronic component, comprising a step of reducing the carbonate concentration in an alkaline aqueous solution used in the production of an electronic component, using the carbonate concentration reduction method of the present disclosure. In another aspect, the present disclosure relates to a method for producing an electronic component, including a step (stripping step) of stripping a resin mask from a substrate (object to be cleaned) having the resin mask thereon using the stripper composition of the present disclosure. In another aspect, the present disclosure relates to a method for manufacturing an electronic component substrate, including a step (peeling step) of peeling a resin mask from a substrate (object to be cleaned) having the resin mask thereon using the resin mask peeling method of the present disclosure. The object to be cleaned in the peeling step can be any of the above-mentioned objects to be cleaned. The peeling method in the peeling step may be the same as the peeling method of the present disclosure described above. According to the method for manufacturing electronic components of the present disclosure, the resin mask adhered to the substrate can be effectively removed, thereby enabling the manufacturing of highly reliable electronic components. Furthermore, by performing the peeling method of the present disclosure, the resin mask adhered to the substrate can be easily peeled off, thereby shortening the peeling time and improving the manufacturing efficiency of electronic components.

[0056] [kit] In one aspect, the present disclosure relates to a kit (hereinafter also referred to as the "kit of the present disclosure") for use in either the stripping method of the present disclosure or the method for producing an electronic component of the present disclosure. In one or more embodiments, the kit of the present disclosure is a kit for producing the stripper composition of the present disclosure. The kit of the present disclosure can reduce the carbon dioxide concentration and obtain a stripper composition that can suppress deterioration due to carbon dioxide.

[0057] One embodiment of the kit of the present disclosure includes a kit (three-liquid cleaning composition) that contains a solution containing component A (first liquid), a solution containing component B (second liquid), and a solution containing component C (third liquid) in a mutually unmixed state, where at least one selected from the first, second, and third liquids further contains some or all of the water required for preparing the stripper composition, and the first, second, and third liquids are mixed at the time of use. After the first, second, and third liquids are mixed, they may be diluted with water as needed. Each of the first, second, and third liquids may contain the optional components (other components) described above as needed. Another embodiment of the kit of the present disclosure is a kit (two-component cleaning composition) that includes a solution (first component) containing Components A and B and a solution (second component) containing at least one of Components C and D, which are not mixed with each other, and at least one of the first and second components further contains some or all of the water required to prepare the stripper composition, and the first and second components are mixed at the time of use. After the first and second components are mixed, they may be diluted with water as needed. Each of the first and second components may contain the optional components (other components) described above as needed. Another embodiment of the kit of the present disclosure includes a kit (two-component cleaning composition) that contains a solution (first component) containing Component A and a solution (second component) containing at least one alkali selected from Component B, Component C, and Component D, in a mutually unmixed state, where at least one of the first and second components further contains some or all of the water required for preparing the stripper composition, and the first and second components are mixed at the time of use. After the first and second components are mixed, they may be diluted with water as needed. Each of the first and second components may contain the optional components (other components) described above as needed. [Example]

[0058] The present disclosure will be specifically described below using examples, but the present disclosure is not limited to these examples in any way.

[0059] 1. Preparation of Tetramethylammonium Carbonate Aqueous Solution Carbon dioxide is blown into a 25% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) until the pH of the aqueous solution at 25°C reaches 8, thereby preparing an aqueous solution of tetramethylammonium hydrogencarbonate with a carbonate concentration of 2.7 mol / L. The concentration of tetramethylammonium hydrogencarbonate in the aqueous solution obtained by the above procedure was calculated on the assumption that all of the tetramethylammonium in the 25% by mass aqueous TMAH solution used was converted to tetramethylammonium carbonate.

[0060] 2. Preparation of Stripping Compositions of Examples 1 to 5 and Comparative Examples 1 to 3 The tetramethylammonium carbonate aqueous solution, tetramethylammonium hydroxide (TMAH), monoethanolamine (MEA), sodium hydroxide (NaOH), barium hydroxide octahydrate (Ba(OH)2·8H2O), and water were mixed to the compositions shown in Tables 1 to 3 to obtain the alkaline aqueous solution and carbon dioxide release agent shown in Tables 1 to 3. The concentrations shown in Tables 1 to 3 are the active ingredient concentrations (mass % or mol / L) calculated from the blend amounts. The solubility product of barium ion with hydroxide ion is 5.0×10 -3 The solubility product with carbonate ions is 1.6 × 10 -9 is. The alkaline aqueous solution was stirred at 500 rpm and a carbon dioxide releasing agent was added, and then the solid content was removed by gravity filtration using filter paper (manufactured by Advantec, 5A, 110 mm) to prepare the stripping agent compositions of Examples 1 to 5 and Comparative Examples 1 to 3 (pH: 13.7, 13.2, 13.8, 13.8, 13.8, 8.1, 12.4, 13.4).

[0061] The alkaline aqueous solutions, carbon dioxide releasing agents, and stripping compositions shown in Tables 1 to 3 were prepared using the following materials. Monoethanolamine (MEA) [Nippon Shokubai Co., Ltd.] Tetramethylammonium hydroxide (TMAH) [Resonac Corporation, 25% by weight aqueous solution] Sodium hydroxide (NaOH) [Toagosei Co., Ltd., 48% aqueous solution] Barium hydroxide octahydrate (Ba(OH)2·8H2O) [Fujifilm Wako Pure Chemical Industries, Ltd.] Water [pure water of less than 1 μS / cm produced using the Organo Corporation G-10DSTSET water purification system]

[0062] [pH of Stripping Composition] The pH of the stripping composition at 25°C is a value measured using a pH meter (HM-30G, manufactured by Toa Denpa Kogyo Co., Ltd.), and is the value measured 3 minutes after immersing the electrodes of the pH meter in the stripping composition.

[0063] 3. Evaluation of Stripping Agent Composition The prepared release agent compositions of Examples 1 to 5 and Comparative Examples 1 to 3 were evaluated as follows. (1) Evaluation of carbon dioxide concentration Using an automatic potentiometric titrator (AT-710, manufactured by Kyoto Electronics Manufacturing Co., Ltd.), titration analysis was performed twice using water and ethanol as dilution solvents. The carbonate concentration was calculated using the following formula and compared with the theoretical value before mixing and filtration. The measurement results of the carbonate concentration before filtration (theoretical value) and the carbonate concentration after filtration (measured value) are shown in Tables 1 to 3. If the carbonate concentration after filtration is lower than the carbonate concentration before filtration, it can be determined that the carbonate has been expelled (removed) from the stripping agent composition. [Calculation formula for carbon dioxide concentration] Carbonate concentration (mol / L) = (CD-((AD)+(BD)) / 2) x 1000 A (mol / g): The number of moles of acid consumed per 1 g of the stripping agent up to the first inflection point (pH 9.5 to 7.5) under water dilution conditions B (mol / g): The number of moles of acid consumed per 1 g of the stripping agent up to the second inflection point (pH 7.4 to 5.5) under water dilution conditions C (mol / g): The number of moles of acid consumed per 1 g of the stripping agent up to the third inflection point (pH 5.0 to 3.5) under water dilution conditions D (mol / g): The number of moles of acid consumed per 1 g of the stripping agent up to the first inflection point (pH 14 to 10) under ethanol dilution conditions When A and C were not detected, the carbon dioxide concentration was below the detection limit and was therefore recorded as 0 mol / L. (2) Peeling time evaluation (resin mask removability) [Test piece for evaluating peel time] The test piece for evaluating peeling time was 50 mm x 50 mm in size, and had a resin mask layer, which was a negative dry film with a thickness of 25 μm, covering the entire surface of the copper substrate. [Peeling time measurement] 300 mL of each of the stripping compositions shown in Table 3, prepared in the same manner as in the evaluation of the carbon dioxide concentration, was heated to 60°C and the test piece was immersed in the composition while stirring at 500 rpm. The time it took for the resin mask to peel off was measured by visual observation. The results are shown in Table 3.

[0064] [Table 1]

[0065] As shown in Table 1, the stripping agent compositions of Examples 1 to 3 containing Component A had a reduced carbon dioxide concentration after filtration treatment compared to Comparative Example 1 which did not contain Component A, demonstrating that the carbon dioxide in the stripping agent composition was successfully expelled (removed).

[0066] [Table 2]

[0067] As shown in Table 2, the stripping agent composition of Example 4 containing Component A had a lower carbon dioxide concentration after filtration treatment than Comparative Example 2 containing no Component A, demonstrating that the carbon dioxide in the stripping agent composition was successfully expelled (removed).

[0068] [Table 3]

[0069] As shown in Table 3, the stripping composition of Example 5, which contains Component A, had a lower carbon dioxide concentration after filtration than Comparative Example 3, which does not contain Component A, demonstrating that the carbon dioxide in the stripping composition was successfully expelled (removed). The stripping times of Example 5 and Comparative Example 3 were the same. Therefore, it is believed that a stripping composition containing a specific metal ion (component A) can inhibit deterioration of the stripping composition due to carbonic acid and has excellent resin mask removal properties. [Industrial Applicability]

[0070] According to the present disclosure, a stripper composition can be provided that can reduce the carbon dioxide concentration and suppress deterioration due to carbon dioxide. Furthermore, use of the stripper composition of the present disclosure can improve the performance and reliability of manufactured electronic components, thereby improving the productivity of semiconductor devices.

Claims

1. A stripping composition comprising an alkaline component, a carbonation-removing component, and water, The carbon dioxide excluding component has a solubility product with hydroxide ions of 1.0 x 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 Contains a metal ion (component A) that is: A stripping agent composition, wherein the content of component A in the stripping agent composition is 0.2 mass% or more.

2. 2. The stripping composition according to claim 1, wherein the alkaline component is at least one selected from the group consisting of a quaternary ammonium hydroxide (component B), an organic amine (component C), and an alkali metal hydroxide (component D).

3. The stripping composition according to claim 2, wherein the content of component B in the stripping composition is 0.1% by mass or more and 10% by mass or less.

4. The stripping composition according to claim 1, wherein the content of water in the stripping composition is 50% by mass or more and less than 100% by mass.

5. The stripping composition according to claim 2, wherein the content of component C in the stripping composition is 0.1% by mass or more and 20% by mass or less.

6. A method for reducing a carbon dioxide concentration in an alkaline aqueous solution, comprising: The solubility product with hydroxide ions is 1.0 x 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 A method for reducing a carbon dioxide concentration, comprising a step of mixing the following metal ion (component A) with an alkaline aqueous solution (mixing step):

7. The method for reducing a carbon dioxide concentration according to claim 6, further comprising, after the mixing step, a step of separating the carbonic acid precipitated by the mixing from the carbonate salt of component A.

8. The method for reducing a carbon dioxide concentration according to claim 6, wherein the mixing step is a step of mixing component A and the alkaline aqueous solution so that the content of component A in the alkaline aqueous solution is 0.2 mass% or more.

9. The method for reducing a carbon dioxide concentration according to claim 6, wherein the alkaline aqueous solution is a stripping agent composition.

10. A method for producing electronic components, comprising a step of reducing the carbonate concentration in an alkaline aqueous solution used in the production of electronic components, by using the method for reducing the carbonate concentration according to any one of claims 6 to 9.

11. A method for producing an electronic component, comprising the step of stripping a resin mask from a substrate having the resin mask thereon using the stripping composition according to any one of claims 1 to 5.

12. A carbon dioxide scavenger for use in the method for reducing carbon dioxide concentration according to any one of claims 6 to 9, The solubility product with hydroxide ions is 1.0 x 10 -6 or more, and the solubility product with carbonate ions is 1.0 × 10 -8 A carbonation scavenger comprising a metal ion (component A) which is:

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