Method for manufacturing spectacle lens

Abstract

To provide a method for manufacturing a spectacle lens capable of forming a layer provided between a lens base material and a multilayer film for adjusting a refractive index by dry film formation.SOLUTION: Provided is a method for manufacturing a spectacle lens including a lens base material and a multilayer film located on at least one surface of the lens base material, and the spectacle lens further includes a base layer between the lens base material and the multilayer film. The method for manufacturing the spectacle lens includes forming the base layer by performing at least one round of sputtering by a metal target and irradiating a metal film formed by sputtering with oxygen ions and nitrogen ions.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a method for manufacturing eyeglass lenses. [Background technology]

[0002] Spectacle lenses are generally manufactured by forming a functional film on the surface of a lens substrate to provide the spectacle lens with a desired function. As such a functional film, a multilayer film is provided on the surface of the lens substrate (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-007695 Summary of the Invention [Problem to be solved by the invention]

[0004] Paragraph 0022 of Patent Document 1 proposes suppressing the occurrence of interference fringes by adjusting the refractive index of a functional thin film disposed between a lens substrate and a multilayer film. Furthermore, the same paragraph lists methods for adjusting the refractive index, such as selecting the type of resin that constitutes the main component of the functional thin film and selecting the type of microparticles to be added to the resin that constitutes the main component. Specifically, in the examples of Patent Document 1, the functional thin films (hard coat and primer coat) are formed as cured layers by heat curing (see paragraph 0062 of Patent Document 1). However, while the formation of cured layers is performed by wet film formation, which requires the application of a curable composition, the formation of multilayer films is typically performed by dry film formation. Considering the simplicity of the manufacturing process for eyeglass lenses, it is desirable that the layer disposed between the lens substrate and the multilayer film for adjusting the refractive index can also be formed by dry film formation.

[0005] An object of one aspect of the present invention is to provide a method for manufacturing a spectacle lens that can form a layer, which is provided between the lens substrate and the multilayer film for refractive index adjustment, by dry film formation. [Means for solving the problem]

[0006] One aspect of the present invention is as follows. [1] A method for manufacturing a spectacle lens including a lens substrate and a multilayer film located on at least one surface of the lens substrate, comprising: the spectacle lens further includes an underlayer between the lens substrate and the multilayer film, A method for manufacturing the above-mentioned eyeglass lens (hereinafter also simply referred to as the "manufacturing method"), which includes forming the above-mentioned underlayer by performing sputtering using a metal target and irradiating the metal film formed by sputtering with oxygen ions and nitrogen ions one or more times. [2] The method for manufacturing a spectacle lens according to [1], wherein the metal target is a Si target. [3] The method for manufacturing a spectacle lens according to [1] or [2], wherein the irradiation of the oxygen ions and nitrogen ions is carried out using an ion gun. [4] The multilayer film includes one or more high refractive index layers and one or more low refractive index layers, and The method for manufacturing a spectacle lens according to any one of [1] to [3], wherein at least one of the high refractive index layers has a refractive index of 2.00 or more and 2.40 or less. [5] The multilayer film includes one or more high refractive index layers and one or more low refractive index layers, and The method for manufacturing a spectacle lens according to any one of [1] to [4], wherein at least one of the low refractive index layers has a refractive index of 1.44 or more and 1.49 or less. [6] The metal target is a Si target, The oxygen ions and nitrogen ions are irradiated by an ion gun, the multilayer film includes one or more high refractive index layers and one or more low refractive index layers, At least one of the high refractive index layers has a refractive index of 2.00 or more and 2.40 or less, and The method for manufacturing a spectacle lens according to [1], wherein at least one of the low refractive index layers has a refractive index of 1.44 or more and 1.49 or less. [Effects of the Invention]

[0007] According to a method for manufacturing a spectacle lens according to one aspect of the present invention, a layer to be provided between the lens substrate and the multilayer film for adjusting the refractive index can be formed by sputtering, which is a dry film formation method. [Brief explanation of the drawings]

[0008] [Figure 1] 1 shows the reflection spectra (convex side) of the eyeglass lenses of Example 1 and Comparative Example 1. [Figure 2] 1 shows the reflection spectra (concave side) of the eyeglass lenses of Example 1 and Comparative Example 1. [Figure 3] 1 shows the reflection spectra (enlarged on the convex surface side) of the eyeglass lenses of Example 1 and Comparative Example 1. [Figure 4] 1 shows the reflection spectra (convex side) of the eyeglass lenses of Example 2 and Comparative Example 2. [Figure 5] 1 shows the reflection spectra (concave side) of the eyeglass lenses of Example 2 and Comparative Example 2. [Figure 6] 1 shows the reflection spectra (enlarged on the convex surface side) of the eyeglass lenses of Example 2 and Comparative Example 2. [Figure 7] 1 shows the reflection spectra (convex side) of the eyeglass lenses of Example 3 and Comparative Example 3. [Figure 8] 1 shows the reflection spectra (concave side) of the eyeglass lenses of Example 3 and Comparative Example 3. [Figure 9] 1 shows the reflection spectra (enlarged on the convex surface side) of the eyeglass lenses of Example 3 and Comparative Example 3. [Figure 10] 1 shows the reflection spectra (convex side) of the eyeglass lenses of Example 4 and Comparative Example 4. [Figure 11] 1 shows the reflection spectrum (concave side) of each spectacle lens of Example 4 and Comparative Example 4. [Figure 12] 1 shows the reflection spectra (enlarged on the convex surface side) of the eyeglass lenses of Example 4 and Comparative Example 4. [Figure 13] 1 shows the reflection spectra (convex side) of the eyeglass lenses of Example 5 and Comparative Example 5. [Figure 14] 1 shows the reflection spectrum (concave side) of each eyeglass lens of Example 5 and Comparative Example 5. [Figure 15] 1 shows the reflection spectra (enlarged on the convex side) of the eyeglass lenses of Example 5 and Comparative Example 5. DETAILED DESCRIPTION OF THE INVENTION

[0009] The method for manufacturing a spectacle lens according to one aspect of the present invention will be described in further detail below.

[0010] <Lens substrate> The lens substrate used in the above manufacturing method can be a plastic lens substrate or a glass lens substrate. The glass lens substrate can be, for example, a lens substrate made of inorganic glass. Plastic lens substrates are preferred as lens substrates because they are lightweight and break-resistant. Examples of plastic lens substrates include (meth)acrylic resins, styrene resins, polycarbonate resins, allyl resins, allyl carbonate resins such as diethylene glycol bisallyl carbonate resin (CR-39), vinyl resins, polyester resins, polyether resins, urethane resins obtained by reacting an isocyanate compound with a hydroxy compound such as diethylene glycol, thiourethane resins obtained by reacting an isocyanate compound with a polythiol compound, and cured products (generally referred to as transparent resins) obtained by curing a curable composition containing a (thio)epoxy compound having one or more disulfide bonds in the molecule. The curable composition can also be referred to as a polymerizable composition. The lens substrate can contain known additives. One example of the additive is an ultraviolet absorber. A lens substrate containing an ultraviolet absorber can reduce the amount of ultraviolet light that enters the object-side surface and then enters the eyes of the spectacle wearer.

[0011] The lens substrate may be either undyed (colorless lens) or dyed (dyed lens). The refractive index of the lens substrate may be, for example, approximately 1.50 to 1.76. However, the refractive index of the lens substrate is not limited to the above range, and may be within the above range or may be above or below the above range. Furthermore, the lens substrate may be a lens with refractive power (so-called prescription lens) or a lens without refractive power (so-called non-prescription lens).

[0012] The spectacle lenses manufactured by the above manufacturing method can be various lenses such as single-vision lenses, multifocal lenses, and progressive-power lenses. The type of lens is usually determined by the surface shapes of both sides of the lens substrate. The surface of the lens substrate may be convex, concave, or flat. In ordinary lens substrates and spectacle lenses, the object-side surface is convex and the eyeball-side surface is concave. However, the present invention is not limited to this. The "object-side surface" refers to the surface that faces the object when spectacles equipped with the spectacle lens are worn by a wearer. The "eyeball-side surface" refers to the opposite surface, i.e., the surface that faces the eyeball when spectacles equipped with the spectacle lens are worn by a wearer.

[0013] <Formation of base layer> The underlayer can be formed on the surface of the lens substrate, or on the surface of a layer provided on the lens substrate. Examples of layers that can be provided on the lens substrate include a photochromic layer.

[0014] The underlayer is formed by sputtering a metal target and irradiating the metal film formed by this sputtering with oxygen ions and nitrogen ions one or more times. The above-mentioned sputtering and ion irradiation constitute one cycle, and the underlayer may be formed in one cycle or in two or more cycles. The more cycles are performed, the thicker the underlayer can be formed. Therefore, the number of cycles can be determined so that the underlayer has the desired thickness. The thickness of the underlayer can be, for example, 400.0 nm or more and 3000.0 nm or less, but is not limited to the above range.

[0015] The "film thickness" referred to in this specification is a physical film thickness. The film thickness can be determined by a known film thickness measurement method. For example, the film thickness can be determined by converting the optical film thickness measured by an optical film thickness measurement device into a physical film thickness.

[0016] In the present invention and this specification, the term "metal" refers to a component selected from the group consisting of a simple metal element (pure metal) and an alloy of multiple metal elements. Metal elements include not only those classified as metal elements but also those classified as metalloid elements. For example, Si (silicon) is an example of a metalloid element, and is included in the "metal element" in the present invention and this specification.

[0017] In the present invention and this specification, a "metal target" is a sputtering target made of metal, excluding impurities inevitably mixed in during the preparation of the sputtering target and known additives optionally used to assist film formation. This also applies to "Si targets," "metal films," and the like described below. The metal content in the metal target can be, for example, in the range of 90 to 100 mass % or 95 to 100 mass %. Examples of metal targets include Si (silicon) targets, Al (aluminum) targets, and Ti (titanium) targets, with Si targets being preferred from the viewpoint of excellent adhesion to the multilayer film.

[0018] In the underlayer formation process, a metal film is formed as a sputtering film by sputtering using a metal target. The inventors believe that the metal film can then be irradiated with oxygen ions and nitrogen ions, thereby oxidizing and nitriding the metal in the metal film to obtain a metal nitride oxide film. Because metal oxides and nitrides have different refractive indices, the refractive index of the formed metal nitride oxide film can be controlled by adjusting the irradiation dose of oxygen ions and nitrogen ions. For example, in the case of silicon (Si), the refractive index of silicon nitride is higher than that of silicon oxide, so the refractive index of the formed silicon nitride oxide film can be lowered by increasing the irradiation dose of oxygen ions, and can be increased by increasing the irradiation dose of nitrogen ions. For example, by adjusting the refractive index of the metal nitride oxide film thus formed to match or approach the refractive index of the lens substrate, it is possible to suppress the occurrence of interference fringes in eyeglass lenses due to the refractive index difference between the lens substrate and the underlayer. Furthermore, by introducing oxygen ions and nitrogen ions into the metal film, the transparency of the film can be improved. Furthermore, the process for forming the underlayer is a dry process that involves sputtering and ion irradiation, and therefore can also contribute to simplifying the manufacturing process of eyeglass lenses.

[0019] Sputtering and ion irradiation for forming the underlayer can be performed in the same film formation apparatus. The configuration of such a film formation apparatus is known. For example, if a commercially available film formation apparatus is used that is equipped with a film formation mechanism using a meta mode process, sputtering and ion irradiation can be performed in the same film formation apparatus. The irradiation of oxygen ions and the irradiation of nitrogen ions can be performed simultaneously, and / or one can be irradiated first and then the other. The irradiation of oxygen ions and the irradiation of nitrogen ions can be performed using known ion irradiation means such as an ion gun.

[0020] <Formation of multilayer film> A multilayer film is formed on the underlayer. The spectacle lens manufactured by the above manufacturing method has a multilayer film on at least one surface of a lens substrate, and has the underlayer between the multilayer film and the lens substrate. The spectacle lens may have a multilayer film only on the object-side surface of the lens substrate, or only on the eyeball-side surface of the lens substrate, or may have a multilayer film on each of the object-side surface and the eyeball-side surface of the lens substrate. When multilayer films are located on both sides of the lens substrate, the multilayer films can be the same or different. The same applies to the underlayer.

[0021] The multilayer film may be located directly on the surface of the underlayer, or may be located indirectly on the surface of the underlayer via one or more other layers. Since the underlayer can exhibit excellent adhesion to the multilayer film, in one embodiment, the underlayer and the multilayer film can be directly laminated without any other layers interposed therebetween.

[0022] The multilayer film may have a laminated structure in which high-refractive index layers and low-refractive index layers are alternately stacked. In the present invention and this specification, the terms "high" and "low" used in relation to the high-refractive index layers and low-refractive index layers contained in the multilayer film are relative terms with respect to the refractive index of the lens substrate contained in the spectacle lens. A high-refractive index layer refers to a layer with a higher refractive index than the lens substrate. A low-refractive index layer refers to a layer with a lower refractive index than the lens substrate. The multilayer film may contain three or more layers with different refractive indices. In the present invention and this specification, "refractive index" refers to the refractive index for light with a wavelength of 500 nm. The refractive index of the lens substrate of a spectacle lens is generally approximately 1.50 to 1.76, and the low-refractive index layer may be a layer with a refractive index of 1.50 or less, and the high-refractive index layer may be a layer with a refractive index of 1.76 or more. The refractive index of the high refractive index layer can be, for example, 2.00 or more and 2.40 or less, or 2.00 or more and 2.20 or less. The refractive index of the low refractive index layer can be, for example, 1.44 or more and 1.49 or less. However, as described above, the terms "high" and "low" used for the high refractive index layer and the low refractive index layer are relative terms with respect to the refractive index of the lens substrate, and therefore the refractive indices of the high refractive index layer and the low refractive index layer are not limited to the above ranges.

[0023] The high-refractive index material constituting the high-refractive index layer and the low-refractive index material constituting the low-refractive index layer can be inorganic, organic, or organic-inorganic composite materials, with inorganic materials being preferred from the standpoint of film-forming properties, etc. That is, the multilayer film is preferably an inorganic multilayer film. Specifically, the high-refractive index material constituting the high-refractive index layer can be one or a mixture of two or more oxides selected from the group consisting of zirconium oxide (e.g., ZrO), tantalum oxide (e.g., TaO), titanium oxide (e.g., TiO), aluminum oxide (e.g., AlO), yttrium oxide (e.g., YO), hafnium oxide (e.g., HfO), and niobium oxide (e.g., NbO). On the other hand, the low-refractive index material constituting the low-refractive index layer can be one or a mixture of two or more oxides or fluorides selected from the group consisting of silicon oxide (e.g., SiO), magnesium fluoride (e.g., MgF), and barium fluoride (e.g., BaF). In the above examples, for convenience, oxides and fluorides are shown in terms of stoichiometric composition, but those in which oxygen or fluorine is deficient or in excess relative to the stoichiometric composition can also be used as high refractive index materials or low refractive index materials.

[0024] Preferably, the high-refractive index layer is a film mainly composed of a high-refractive index material, and the low-refractive index layer is a film mainly composed of a low-refractive index material. Here, the "main component" refers to the component that accounts for the largest proportion in the film, typically accounting for approximately 50% to 100% by mass, and even approximately 90% to 100% by mass, of the film's mass. Such films (e.g., vapor deposition films, sputtering films) can be formed by depositing films using film-forming materials (e.g., vacuum deposition sources, sputtering targets, etc.) mainly composed of the high-refractive index material or low-refractive index material. The same applies to the main components of film-forming materials. Films and film-forming materials may contain unavoidable impurities and may also contain other components, such as other inorganic substances or known additives that aid in film formation, as long as they do not impair the function of the main component.

[0025] A known film formation method can be used to form the multilayer film. From the viewpoint of ease of film formation, film formation is preferably performed by vapor deposition. That is, each layer included in the multilayer film is preferably a vapor-deposited film. A vapor-deposited film means a film formed by vapor deposition. In the present invention and this specification, "vapor deposition" includes dry methods such as vacuum deposition, ion plating, and sputtering. In the vacuum deposition method, an ion beam assisted method in which an ion beam is irradiated simultaneously during vapor deposition may be used. As the sputtering method, a DC (Direct Current) method, an RF (Radio Frequency) method, etc. may be used.

[0026] The multilayer film can be, for example, a multilayer film in which high-refractive index layers and low-refractive index layers are alternately stacked to a total of three or more layers. The total number of high-refractive index layers and low-refractive index layers can be, for example, 11 or less. The film thicknesses of the high-refractive index layers and the low-refractive index layers can be determined depending on the layer structure. Specifically, the combination of layers included in the multilayer film and the film thickness of each layer can be determined by optical simulation using a known method based on the refractive indexes of the film-forming materials for forming the high-refractive index layers and the various physical properties that are desired to be imparted to the eyeglass lens by providing the multilayer film.

[0027] Examples of high refractive index layers included in the multilayer film include a layer containing zirconium oxide, a layer containing niobium oxide, and a layer containing tantalum oxide, and it is preferable that these layers are layers containing the above oxides as the main component. The low refractive index layer included in the multilayer film may be a layer containing silicon oxide, preferably a layer mainly composed of silicon oxide. As described above, in one embodiment, the underlayer and the multilayer film can be directly laminated without any other layer. In this case, from the viewpoint of further improving the adhesion between the underlayer and the multilayer film, the bottom layer in direct contact with the underlayer in the multilayer film is preferably a layer containing an oxide of the same metal as the metal of the underlayer, more preferably a layer mainly composed of an oxide of the same metal. For example, when the underlayer is formed using a Si target, the bottom layer in direct contact with the underlayer in the multilayer film may be a layer containing silicon oxide, preferably a layer mainly composed of silicon oxide. In the multilayer film, the high refractive index layer and the low refractive index layer may be in direct contact with each other, or the multilayer film may include at least one laminate structure in which a conductive oxide layer, which will be described later, is present between the high refractive index layer and the low refractive index layer.

[0028] The thickness of each of the high refractive index layers and low refractive index layers included in the multilayer film can be, for example, 1.0 to 500.0 nm, and the total thickness of the multilayer film can be, for example, 100.0 to 900.0 nm (including the thickness of the conductive oxide layer if a conductive oxide layer is included).

[0029] In addition to the high refractive index layer and low refractive index layer described above, the multilayer film may also include one or more layers containing a conductive oxide (also referred to as "conductive oxide layer") at any position in the multilayer film. The conductive oxide layer may be a layer containing a conductive oxide as a main component, and may preferably be a vapor-deposited film of a conductive oxide formed by vapor deposition using a vapor deposition source containing a conductive oxide as a main component. From the viewpoint of the transparency of the spectacle lens, the conductive oxide layer is preferably an indium tin oxide (tin-doped indium oxide; ITO) layer having a thickness of 10 nm or less, a tin oxide layer having a thickness of 10 nm or less, or a titanium oxide layer having a thickness of 10 nm or less. An indium tin oxide (ITO) layer is a layer containing ITO as a main component. This also applies to tin oxide layers and titanium oxide layers. In the present invention and this specification, the "high refractive index layer" and "low refractive index layer" contained in the multilayer film are not considered to be an indium tin oxide (ITO) layer having a thickness of 10 nm or less, a tin oxide layer having a thickness of 10 nm or less, or a titanium oxide layer having a thickness of 10 nm or less. In other words, even if one or more of these layers are contained in the multilayer film, these layers are not considered to be "high refractive index layer" or "low refractive index layer." The thickness of the conductive oxide layer having a thickness of 10 nm or less can be, for example, 0.1 nm or more.

[0030] Furthermore, a further functional film can be formed on the multilayer film. Examples of such a functional film include various functional films such as a water-repellent or hydrophilic antifouling film and an antifogging film. Publicly known techniques can be applied to these functional films. [Example]

[0031] The present invention will be further described below with reference to examples, although the present invention is not limited to the embodiments shown in the examples.

[0032] [Example 1] <Formation of base layer> (1) After placing the lens substrate (refractive index: see Table 1) in the deposition dome of a commercially available deposition device equipped with a deposition mechanism using the Meta mode process, -3 The vacuum was drawn until the pressure was reduced to 0.05 Pa or less. (2) Deposition dome for 25.0 min -1The lens was rotated at 500°C and heated using a heater set to a temperature of 65°C. After the specified pressure was reached, Ar gas (flow rate: 200 sccm) and O2 gas (flow rate: 26 sccm) were introduced from the sputtering target (Si target), and O2 gas (flow rate: 10 sccm) and N2 gas (flow rate: 50 sccm) were introduced from the ion gun. The flow rate ratio of O2 gas to N2 gas was determined in advance through a preliminary experiment so that the refractive index of the underlying layer to be formed would match the refractive index of the lens substrate. (3) A power of 2000 W was applied to the sputtering target, and an acceleration voltage of 850 V, an acceleration current of 425 mA, a suppressor voltage of 300 V, and a bias current of 850 mA were applied to the ion gun. As the deposition dome rotated, the following cycle was repeated: metal film deposition → irradiation with oxygen ions and nitrogen ions by the ion gun → metal film deposition → irradiation with oxygen ions and nitrogen ions by the ion gun → ... to deposit a film of the specified thickness on one surface of the lens substrate. (4) After the formation of the multilayer film described below, the lens substrate was removed and then set back in the film-forming dome, and the above steps (1) to (3) were carried out to form a film of the specified thickness on the other surface of the lens substrate.

[0033] <Formation of multilayer film> On both the convex and concave surfaces, the multilayer film was formed in the same film-forming apparatus without being exposed to the atmosphere after the formation of the base layer. From the base layer side toward the spectacle lens surface side, the first layer, second layer, etc. were stacked in this order using the evaporation sources listed in Table 1, starting from the bottom and ending with the top, so that the outermost layer on the spectacle lens surface side was formed using the evaporation source listed in the top column of Table 1. In these examples and comparative examples, evaporation sources made of oxides listed in Table 1 were used, excluding impurities that may be unavoidably mixed in, and each layer was formed in the thickness listed in Table 1 in sequence. The film thickness is the physical thickness, measured in nm. The refractive index of the layer formed using an evaporation source made of SiO2 (hereinafter referred to as the "SiO2 layer") was 1.47, and the refractive index of the layer formed using an evaporation source made of ZrO2 (hereinafter referred to as the "ZrO2 layer") was 2.08.

[0034] The refractive index of each layer can be determined by the following method. A single layer film is formed on a glass substrate under the same film-forming conditions as those for each layer, to obtain a laminate of the glass substrate and the single layer film. The surface reflectance of the surface of the laminate on which the single layer film is formed is measured using a lens reflectance measuring instrument USPM-RU manufactured by Olympus Corporation, and the refractive index is determined by optical thin film analysis of the obtained spectral reflectance.

[0035] [Examples 2 to 5] By changing the flow rate ratio of O2 gas and N2 gas introduced from the ion gun, an underlayer with the same refractive index as the lens substrate shown in Table 1 or Table 2 was formed. In order to form an underlayer with a higher refractive index, the proportion of N2 gas in the flow rate ratio of O2 gas and N2 gas was increased. The multilayer film was formed by the method described for Example 1, except that the items shown in Table 1 for Examples 2 and 3, and the items shown in Table 2 for Examples 4 and 5 were changed as shown in each table.

[0036] [Comparative Examples 1 to 5] Spectacle lenses having the layer configurations shown in Table 3 or Table 4 were prepared. More specifically, a spectacle lens of Comparative Example 1 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 1. A spectacle lens of Comparative Example 2 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 2. A spectacle lens of Comparative Example 3 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 3. A spectacle lens of Comparative Example 4 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 4. A spectacle lens of Comparative Example 5 was prepared as a spectacle lens having the same reflection characteristics as the spectacle lens of Example 5. In the eyeglass lenses of Comparative Examples 1 to 5, the primer layer and hard coat layer are cured layers formed by applying and curing a curable composition. The multilayer film was formed by the same method as in Example 1, except that the items shown in Table 3 for Comparative Examples 1 to 3 and the items shown in Table 4 for Examples 4 and 5 were changed as shown in each table.

[0037] [Reflectivity] The reflection characteristics of normal incidence (i.e., for 0° incident light) at the optical center were measured for each of the convex and concave surfaces of each spectacle lens in Examples 1 to 5 and Comparative Examples 1 to 5. The measurements were performed using a Hitachi High-Technologies UH4150 spectrophotometer (measurement pitch: 1 nm, measurement conditions set to normal incidence). 1 to 15 show the reflection spectra measured on the convex and concave sides of the above-mentioned Examples and Comparative Examples, respectively. Figures 3, 6, 9, 12, and 15 show enlarged reflection spectra of the concave side. From the reflection characteristics measured above, the luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe were calculated. The luminous reflectance Rv was calculated according to JIS T 7334:2011. The dominant wavelength Wd was calculated according to Annex JA of JIS Z 8781-3:2016. The excitation purity Pe was calculated according to JIS 8701:1999. The luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe of the spectacle lens are not particularly limited, but for example, the luminous reflectance Rv can be 0% or more and 1.50% or less, the dominant wavelength Wd can be 400 nm or more and 600 nm or less, and the excitation purity Pe can be 20.0% or more and 75.0% or less.

[0038] The results are shown in Tables 1 to 4. In the table below, if the 9th layer is an ITO layer, the 7th layer is an SiO2 layer and the 8th layer is a ZrO2 layer. If there is no ITO 9th layer, the 7th layer is an ITO layer and the 8th layer is an SiO2 layer. In the following tables, the material of the underlayer formed in Examples 1 to 5 is denoted as "SiON" for convenience, but this does not limit the composition of the underlayer formed in Examples 1 to 5.

[0039] 1 to 15 and the measured values ​​of the reflection characteristics (luminous reflectance Rv, dominant wavelength Wd, and excitation purity Pe) shown in the table below, it can be confirmed that the spectacle lenses of Examples 1 to 5 have reflection characteristics equivalent to those of the corresponding spectacle lenses of Comparative Examples, and that the occurrence of ripples in the reflection spectra is suppressed compared to the corresponding spectacle lenses of Comparative Examples. The more pronounced the occurrence of ripples in the reflection spectra, the more easily interference fringes are visible on the spectacle lenses, so it can be said that the occurrence of interference fringes is suppressed in the spectacle lenses of Examples 1 to 5.

[0040] [Table 1]

[0041] [Table 2]

[0042] [Table 3]

[0043] [Table 4]

[0044] The various aspects described herein may be combined in any combination of two or more.

[0045] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive. The scope of the present invention is defined by the claims, not by the above description, and is intended to include all modifications within the meaning and scope of the claims. [Industrial Applicability]

[0046] The present invention is useful in the field of manufacturing eyeglass lenses and eyeglasses.

Claims

1. 1. A method for manufacturing a spectacle lens comprising a lens substrate and a multilayer film disposed on at least one surface of the lens substrate, the method comprising: the spectacle lens further includes an underlayer between the lens substrate and the multilayer film, a method for manufacturing the eyeglass lens, the method comprising: forming the underlayer by performing sputtering using a metal target and irradiating the metal film formed by the sputtering with oxygen ions and nitrogen ions one or more times.

2. The method for manufacturing an eyeglass lens according to claim 1 , wherein the metal target is a Si target.

3. The method for manufacturing a spectacle lens according to claim 1 , wherein the irradiation of the oxygen ions and nitrogen ions is carried out by an ion gun.

4. The multilayer film includes one or more high refractive index layers and one or more low refractive index layers; and The method for manufacturing a spectacle lens according to claim 1 , wherein at least one of the high refractive index layers has a refractive index of 2.00 or more and 2.40 or less.

5. The multilayer film includes one or more high refractive index layers and one or more low refractive index layers; and The method for manufacturing a spectacle lens according to claim 1 , wherein at least one of the low refractive index layers has a refractive index of 1.44 or more and 1.49 or less.

6. the metal target is a Si target, The irradiation of the oxygen ions and nitrogen ions is carried out by an ion gun; the multilayer film includes one or more high refractive index layers and one or more low refractive index layers, At least one of the high refractive index layers has a refractive index of 2.00 or more and 2.40 or less, and The method for manufacturing a spectacle lens according to claim 1 , wherein at least one of the low refractive index layers has a refractive index of 1.44 or more and 1.49 or less.

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