Gas supply system and method

Abstract

To provide a gas supply system and method for performing a purge process of preventing corrosion of a gas line and / or a defect of a component.SOLUTION: A gas supply system includes: a supply line which couples a gas container and a process object; a purge line which is coupled to a first point of the supply line and coupled to a purge gas supply part supplying a purge gas; a first exhaust line which is coupled to a second point of the supply line, and couples the supply line to an exhaust part providing sound pressure; and a second exhaust line which is coupled to a third point of the purge line, and couples the purge line to a fourth point of the first exhaust line. According to one embodiment, the first point of the supply line is more adjacent to the gas container than the second point.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The following embodiments relate to gas supply systems and methods. [Background technology]

[0002] Generally, various types of gases are supplied during the manufacturing process of semiconductors or electronic devices. When switching gas containers after using a gas during the manufacturing process of semiconductors or electronic devices, moisture may be contained in the purge gas when purging the supply pipe. This moisture may be adsorbed in the supply pipe and react with the corrosive gas during gas supply, causing corrosion of the pipe. Therefore, a process for removing moisture contained in the purge gas is necessary.

[0003] Conventional purging methods involve repeatedly filling a gas line with purge gas to dilute the gas concentration, then applying acoustic pressure to the gas line to exhaust the purge gas. However, moisture, one of the impurities in the purge gas, repeatedly flows into the piping and adsorbs onto the piping or components, causing corrosion or component defects. Therefore, a gas supply system or purge method with a purge system to address this issue is currently needed.

[0004] The above-mentioned background art is what the inventors possessed or learned in the process of deriving the present invention, and is not necessarily publicly known art that was disclosed to the general public prior to the filing of the present invention. Summary of the Invention [Problem to be solved by the invention]

[0005] It is an object of one embodiment to provide a gas delivery system for performing a purge process that prevents corrosion of gas lines and / or component failure.

[0006] It is an object of one embodiment to provide a gas delivery method that provides a purging step that prevents corrosion of gas lines and / or component failure. [Means for solving the problem]

[0007] According to one embodiment, the gas supply system includes a supply line connecting a gas container to a process target, a purge line connected to a first point of the supply line and connected to a purge gas supply unit that supplies a purge gas, a first exhaust line connected to a second point of the supply line and connecting the supply line to an exhaust unit that provides sound pressure, and a second exhaust line connected to a third point of the purge line and connecting the purge line to a fourth point of the first exhaust line.

[0008] In one embodiment, the first point of the supply line may be closer to the gas container than the second point, and the supply line may be connected to a supply pressure sensor that detects an internal pressure of the supply line and a first supply valve that controls the flow of fluid moving through the supply line.

[0009] In one embodiment, the purge line is connected to a first purge valve connected between the first point and the third point to control the flow of a fluid moving through the purge line, a second purge valve disposed between the first purge valve and the third point to control the flow of a fluid moving through the purge line, a purge pressure sensor disposed between the first purge valve and the second purge valve to detect an internal pressure of the purge line, a first regulator disposed between the third point and the purge gas supply unit to adjust the internal pressure of the purge line, and a flow rate control device disposed between the first regulator and the third point. It can be connected.

[0010] In one embodiment, the first exhaust line may be connected to a first exhaust valve disposed between the second point and the fourth point and a second exhaust valve disposed between the fourth point and the exhaust unit, and the second exhaust line may be connected to a third exhaust valve for adjusting gas supply and an exhaust pressure sensor for detecting internal pressure of the line between the third exhaust valve and the fourth point.

[0011] In one embodiment, the purge line may be connected to a first purge valve connected between the first point and a third point to control the flow of fluid moving through the purge line, a fourth purge valve disposed between the third point and a purge supply unit to control the flow of fluid moving through the purge line, a purge pressure sensor disposed between the first purge valve and the fourth purge valve to detect an internal pressure of the purge line, a first regulator disposed between the fourth purge valve and the purge gas supply unit to adjust the internal pressure of the purge line, and a flow control device disposed between the first regulator and the fourth purge valve.

[0012] In one embodiment, a second regulator for controlling the pressure of the supply line may be additionally connected to the supply line.

[0013] In one embodiment, a second supply valve may be additionally connected to the supply line to control the flow of the supply line.

[0014] In one embodiment, a supply filter may be additionally connected to the supply line.

[0015] In an embodiment, a first exhaust valve may be additionally connected to the first exhaust line, the first exhaust valve being disposed between the second point and the fourth point.

[0016] In an embodiment, a fourth purge valve connected to the rear end of the flow control device and a second check valve connected to the front end of the flow control device may be additionally connected to the purge line.

[0017] In one embodiment, a method for supplying gas through a gas supply system includes the steps of opening a second exhaust valve, an exhaust unit continuously applying sound pressure, opening a first exhaust valve and a second supply valve, opening a third exhaust valve and a second purge valve, closing the third exhaust valve and opening the first purge valve, and repeatedly opening and closing a fourth purge valve.

[0018] In one embodiment, the method may further include detecting the presence or absence of a vacuum with the exhaust pressure sensor after the step of opening the second exhaust valve.

[0019] In one embodiment, the method may further include detecting the presence or absence of a vacuum via the exhaust pressure sensor, and closing the first exhaust valve or all valves if the pressure change is below a set value for a certain period of time.

[0020] In one embodiment, the method can further include venting the second exhaust line with the first purge valve closed.

[0021] In one embodiment, the method can further include evacuating the first exhaust line.

[0022] In one embodiment, a method for supplying gas through a gas supply system includes the steps of: providing all valves in a closed state; evacuating a first exhaust line and a supply line while a first supply valve, a fourth purge valve, and a first purge valve are closed; evacuating a second exhaust line and a purge line in a vacuum state; and performing pulse venting between a first pressure and a second pressure using a flow regulator in the purge line and the fourth purge valve after closing the second exhaust line.

[0023] In one embodiment, the first pressure is a pressure that makes the Knudsen number for the pipe diameter less than 1, and the second pressure may be a pressure that is less than or equal to the saturated vapor pressure of water in the pipe so that water molecules in the pipe can evaporate. [Effects of the Invention]

[0024] In the gas supply system and method according to an embodiment, the process line may be purged with a purge gas before and after injecting a process gas into the process line.

[0025] An embodiment of a gas supply system and method can reduce or prevent the introduction of impurities when injecting a purge gas.

[0026] An embodiment of a gas delivery system and method can reduce or prevent line corrosion that can occur when repeated purging steps are performed.

[0027] In a gas supply system and method according to an embodiment, a purge valve and an exhaust valve connected to a process line are arranged in a line without a stagnation section, thereby maximizing the purge effect.

[0028] The effects of the gas supply system and gas supply method according to one embodiment are not limited to those mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the following description. [Brief explanation of the drawings]

[0029] The following drawings attached to this specification illustrate a preferred embodiment of the present invention and, together with the detailed description of the invention, serve to further understand the technical concept of the present invention, and therefore the present invention should not be interpreted as being limited only to the matters shown in such drawings.

[0030] [Figure 1] FIG. 1 is a schematic diagram illustrating a gas supply system according to an embodiment. [Figure 2] FIG. 1 is a schematic diagram showing a gas supply system according to the prior art. DETAILED DESCRIPTION OF THE INVENTION

[0031] Hereinafter, the embodiments will be described in detail with reference to the accompanying drawings. However, specific structural or functional descriptions disclosed in this specification are merely examples for the purpose of describing the embodiments, and the embodiments may be implemented in various different forms, and the present invention is not limited to the embodiments described in this specification. It should be understood that all modifications, equivalents, and alternatives to the embodiments are included in the scope of the claims.

[0032] Furthermore, in describing components of the embodiments, terms such as first, second, A, B, (a), (b) may be used. These terms are merely used to distinguish the component from other components, and do not limit the nature, order, or sequence of the components. When a component is described as being "coupled," "connected," or "connected" to another component, it does not mean that the component is directly connected or connected to the different component. It should be understood that although each component may have additional components "coupled," "coupled," or "connected" therebetween.

[0033] Components having common functions with components included in one embodiment will be described using the same names in other embodiments. Unless otherwise specified, the description of one embodiment will be applied to other embodiments, and detailed description will be omitted to the extent that they overlap.

[0034] FIG. 1 is a schematic diagram showing a gas supply system 1 according to one embodiment, and FIG. 2 is a schematic diagram showing a gas supply system according to the prior art.

[0035] 1, a gas supply system 1 according to one embodiment receives a process gas from a gas container G and supplies the gas to a process target R. In one embodiment, the gas supply system 1 controls the flow of gas through a valve while the waste flows along a predetermined flow path within the system, and supplies at least a portion of the supplied gas to the target.

[0036] In one embodiment, the target may include a substrate used in a semiconductor process, semiconductor facility equipment including the substrate, or a display included in an electronic device, but is not limited thereto and may include any target to which a process gas is supplied.

[0037] In the following description of the components included in the gas supply system 1, the terms "front end" and "rear end" are defined according to the flow direction of the process gas. For example, the "front end" refers to a point where the process gas flows in based on the flow path of the process gas, and the "rear end" refers to a point where the process gas is discharged.

[0038] The gas supply system 1 according to one embodiment includes a supply line 100, a purge line 200, a first exhaust line 310, and a second exhaust line 320. In one embodiment, the supply line 100 may be connected to the purge line 200 at a first point P1 on the supply line 100. In one embodiment, the supply line 100 may be connected to the first exhaust line 310 at a second point P2 on the supply line 100. In one embodiment, the purge line 200 may be connected to the second exhaust line 320 at a third point P3 on the purge line 200. In one embodiment, the first exhaust line 310 may be connected to the second exhaust line 320 at a fourth point P4 on the first exhaust line 310. In other words, the first point P1 to the fourth point P4 refer to points where the lines branch off.

[0039] In one embodiment, the supply line 100 provides a passage through which the process gas flows from the gas container G to the process object R. In one embodiment, the supply line 100 may include a pipe through which a fluid can flow. In one embodiment, one end of the supply line 100 may be connected to the gas container G, and the other end may be connected to the process object R. For example, the supply line 100 may fluidly connect the gas container G and the process object R. In this case, the process gas flows from the gas container G into the supply line 100, flows from the front end to the rear end of the supply line 100, and is discharged toward the process object R.

[0040] In one embodiment, the supply line 100 may be coupled to a supply pressure sensor 1016 , a first supply valve 1011 , a second supply valve 1012 , a second regulator 1013 , and a supply filter 1015 .

[0041] In one embodiment, the supply pressure sensor 1016 can detect the pressure caused by the fluid in the supply line 100. For example, the supply pressure sensor 1016 can detect the presence or absence of a vacuum in the supply line 100. In one embodiment, the supply pressure sensor 1016 can detect the presence or absence of a vacuum in the supply line 100. The supply pressure sensor 1016 may be connected to any point in the supply line 100. For example, the supply pressure sensor 1016 can detect whether the supply line 100 is airtight when the inside of the supply line 100 is evacuated to a vacuum.

[0042] In one embodiment, the first supply valve 1011 can control the flow of fluid flowing through the supply line 100. In one embodiment, the first supply valve 1011 may be connected to the supply line 100. In one embodiment, the first supply valve 1011 may arbitrarily open or close the supply line 100. For example, when the first supply valve 1011 is open, the supply line 100 at the front end and rear end of the first supply valve 1011 may be fluidly connected. In this case, fluid flows from the front end of the first supply valve 1011 to the rear end of the first supply valve 1011. For example, when the first supply valve 1011 is closed, the supply line 100 at the front end and rear end of the first supply valve 1011 are sealed and separated to prevent fluid flow. In this case, fluid cannot flow from the front end of the first supply valve 1011 to the rear end of the first supply valve 1011. In other words, the supply line 100 is separated from the first supply valve 1011, and fluid cannot flow through the supply line 100. In one embodiment, the first supply valve 1011 may be connected to the rear end of the supply pressure sensor 1016. However, it should be noted that this connection position is exemplary and is not limited thereto and may be modified or changed. In one embodiment, the first supply valve 1011 may partially open or partially close the supply line 100 between an open and closed state. For example, when the first supply valve 1011 partially opens or partially closes the supply line 100, the supply line 100 may be fluidly connected from the first supply valve 1011. In this case, the amount of fluid flowing is relatively small compared to the open state.

[0043] In one embodiment, the second regulator 1013 can control the pressure in the supply line 100. In one embodiment, the second regulator 1013 may be connected to the supply line 100. In one embodiment, the second regulator 1013 may control the pressure in the supply line 100 by adjusting the pressure of the fluid flowing through the supply line 100. In one embodiment, the second regulator 1013 may be disposed after the supply pressure sensor 1016. In one embodiment, the second regulator 1013 may be disposed before the first supply valve 1011. For example, the second regulator 1013 may adjust the flow of fluid passing through the first supply valve 1011. In this case, the pressure in the supply line 100 at the rear end of the second regulator 1013 is controlled. However, it should be noted that such connection locations are exemplary and are not limited thereto, and may be modified or changed. In one embodiment, the supply filter 1015 may filter the fluid flowing inside the supply line. In one embodiment, the supply filter 1015 may be connected to a point on the supply line 100.

[0044] In one embodiment, the purge line 200 may provide a flow path for purge gas from the purge gas supply unit P to the supply line 100 to purge the interior of the supply line 100. In one embodiment, one end of the purge line 200 may be connected to the purge gas supply unit P, and the other end may be connected to a first point P1 of the supply line 100. In this case, the first point P1 may be any point on the supply line 100. In this case, the first point P1 may be any point on the supply line 100 adjacent to the gas container G. In this case, by arranging the first point P1 adjacent to the gas container G, it is possible to minimize dead space where no purge gas is supplied to the supply line 100. For example, the purge line 200 may fluidly connect the purge gas supply unit P and the supply line 100. In this case, the purge gas flows from the purge gas supply unit P into the purge line 200 , flows from the front end to the rear end of the purge line 200 , and flows into the inside of the supply line 100 .

[0045] In one embodiment, the purge line 200 includes a first purge valve 2011, a second purge valve 2012, a third purge valve 2021, a purge pressure sensor 2013, a first regulator A fourth purge valve 2022 and a second check valve may be connected to the purge line 200.

[0046] In one embodiment, the first purge valve 2011 can control the flow of fluid moving through the purge line 200. In one embodiment, the first purge valve 2011 may be connected to the purge line 200. In one embodiment, the first purge valve 2011 may arbitrarily open or close the purge line 200. For example, when the first purge valve 2011 is open, the purge line 200 at the front end and rear end of the first purge valve 2011 may be fluidly connected. In this case, fluid flows from the front end of the first purge valve 2011 to the rear end of the first purge valve 2011. For example, when the first purge valve 2011 is closed, the purge line 200 at the front end and rear end of the first purge valve 2011 may be sealed and separated to prevent fluid flow. In this case, fluid does not flow from the front end of the first purge valve 2011 to the rear end of the first purge valve 2011. In other words, the purge line 200 is separated from the first purge valve 2011, preventing fluid from flowing through the purge line 200. In one embodiment, the first purge valve 2011 may be connected between the first point P1 and the third point P3. Here, the third point P3 refers to an arbitrary point on the purge line 200, such as a point to which the second exhaust line 320 (described later) is connected. In this case, the first purge valve 2011 controls the flow of fluid passing through the third point P3 and flowing toward the first point P1. However, it should be noted that this connection position is merely exemplary and is not limited thereto and may be modified or changed. In one embodiment, the first purge valve 2011 may partially open or partially close the purge line 200 between an open and closed state. For example, when the first purge valve 2011 partially opens or partially closes the purge line 200, the purge line 200 may be fluidly connected from the first purge valve 2011. In this case, the fluid is only displaced at a relatively small flow rate compared to the open state.

[0047] In one embodiment, the second purge valve 2012 can control the flow of fluid moving through the purge line 200. In order to avoid repetition, when describing the second purge valve 2012, the description of the first purge valve 2011 will be applied to components that are substantially the same as those of the first purge valve 2011 to the extent that it does not contradict the first purge valve 2011. In one embodiment, the second purge valve 2012 may be disposed between the first purge valve 2011 and a third point P3. In this case, the second purge valve 2012 controls the flow of fluid moving through the purge line 200 after passing through the third point P3. However, it should be noted that this connection position is merely an example and is not limited thereto and may be modified or changed. In one embodiment, the second purge valve 2012 may be opened and closed independently of the first purge valve 2011.

[0048] In one embodiment, the third purge valve 2021 controls the flow of fluid moving through the purge line 200. In order to avoid repetition, when describing the third purge valve 2021, the description of the first purge valve 2011 will be applied to components that are substantially the same as those of the first purge valve 2011 to the extent that they do not contradict the first purge valve 2011. In one embodiment, the third purge valve 2021 may be disposed between the third point P3 and the purge gas supply unit P. In this case, the third purge valve 2021 controls the flow of fluid that flows from the purge gas supply unit P toward the rear end of the third purge valve 2021. However, it should be noted that this connection position is merely an example and is not limited thereto and may be modified or changed. In one embodiment, the third purge valve 2021 may be opened and closed independently of the first purge valve 2011 and the second purge valve 2012.

[0049] In one embodiment, the purge pressure sensor 2013 measures the internal pressure of the purge line 200. For example, the purge pressure sensor 2013 may detect the presence or absence of a vacuum state in the purge line 200. In one embodiment, the purge pressure sensor 2013 may be disposed between the first purge valve 2011 and the second purge valve 2012. For example, the purge pressure sensor 2013 may detect the internal pressure of the purge line 200 in the section between the first purge valve 2011 and the second purge valve 2012. However, it should be noted that such connection positions are exemplary and are not limited thereto, and may be modified and changed.

[0050] In one embodiment, the first regulator 2023 may adjust the internal pressure of the purge line 200. For example, the first regulator 2023 may adjust the flow of purge gas flowing through the purge line 200. In this case, the internal pressure of the purge line 200 may change depending on the flow of the purge gas. In one embodiment, the first regulator 2023 may be disposed between the third purge valve 2021 and the purge gas supply unit P. In this case, the purge gas that has passed through the third purge valve 2021 may pass through the first regulator 2023. In this case, the first regulator 2023 may adjust the flow of the purge gas that has passed through the third purge valve 2021, thereby adjusting the internal pressure of the purge line 200 at the rear end of the first regulator 2023. However, it should be noted that these connection positions are merely exemplary and are not limited thereto, and modifications and variations may be made.

[0051] In one embodiment, the flow rate regulator 2024 may regulate the flow rate of the purge gas. For example, the flow rate regulator 2024 may be connected to the purge line 200 and reduce the flow rate of the purge gas. For example, the flow rate regulator 2024 may regulate the flow rate to inject a small amount of purge gas into the purge line 200. For example, the flow rate regulator 2024 may regulate the flow rate of the purge gas flowing into the purge line 200 so that the pressure in the line is maintained below the saturated vapor pressure of water when the purge gas flows into the purge line 200. In this case, the pressure in the line can be maintained below the saturated vapor pressure of water not only via the flow rate regulator 2024 but also via the first regulator 2023. In other words, the flow rate regulator 2024 and the first regulator 2023 can both regulate the flow of gas in the line, thereby maintaining the pressure in the line below the saturated vapor pressure of water. For example, the flow rate regulator 2024 may be disposed between the third purge valve 2021 and the fourth purge valve 2022. For example, the flow rate regulator 2024 may be disposed at the front ends of the first purge valve 2011 and the second purge valve 2012. In this case, pulse banding can be performed by adjusting the opening and closing of the first purge valve 2011 and the second purge valve 2012. For example, when the pressure in the line is lower than the saturated vapor pressure of water, water in the line evaporates rapidly. In this case, the water evaporated inside the line is discharged to the outside of the line. In one embodiment, the flow rate regulator 2024 may include a portion of a line having a diameter smaller than the inner diameter of the purge line 200. For example, the flow rate regulator 2024 may include an orifice, a variable orifice, a mass flow controller (MFC), a bleed valve, a metering valve, or a flow meter. For example, the diameter of the flow rate regulator 2024 may be 0.2 mm. However, it should be noted that this is an example, the flow rate regulator 2024 is not limited to this, and those skilled in the art will appreciate that various variations and modifications can be made to the embodiments described herein to regulate the purge gas flow rate.

[0052] In one embodiment, the fourth purge valve 2022 can control the flow of fluid traveling through the purge line 200. The description of the fourth purge valve 2022 follows the description of the first purge valve 2011 to the extent that it does not contradict the description of the first purge valve 2011. In one embodiment, the fourth purge valve 2022 can control the flow of fluid flowing toward the flow regulator 2024. For example, when the fourth purge valve 2022 is opened, the fluid In this case, the flow rate may be adjusted by a flow rate adjuster 2024. In one embodiment, the fourth purge valve 2022 may perform pulse venting, in which purging is performed by repeatedly opening and closing. In one embodiment, pulse venting is performed to purge the process line 100. For example, pulse venting may be performed without breaking the vacuum. In this case, exhaust may be performed to provide continuous sound pressure to continuously maintain the vacuum in the piping. In one embodiment, the fourth purge valve 2022 may be disposed between the third point P3 and the purge supply unit P, and the second purge valve 2012 may be omitted. In this case, the purge pressure sensor 2013 may be disposed between the third point P3 and the fourth purge valve 2022. In this case, the purge pressure sensor may be disposed between the first purge valve and the fourth purge valve 2022. In this case, the first regulator may be disposed between the fourth purge valve and the purge gas supply unit. However, this is merely an example, and the types and arrangements of components disposed in the piping are not limited.

[0053] In one embodiment, while the vacuum is maintained in the process line 100, the third purge valve 2021 is opened in the purge line 200 to adjust the pressure of the first regulator 2023 (e.g., 10 to 20 psi), and then the fourth purge valve 2022 is opened. In one embodiment, when the purge gas passes through the flow regulator 2024 (e.g., 0.2 mm in diameter), the purge gas flow rate is reduced and the second purge valve 2012 and the first purge valve 2011 are opened to allow the purge gas to flow into the process line 100. In this case, purging may be performed by repeating pulse purging using the first purge valve 2011 (e.g., opening for 5 seconds and closing for 1 second). In one embodiment, after purging is completed, the first purge valve 2011 is closed to evacuate the process line 100, and then the second exhaust valve 3102 is closed and the vacuum level is measured via the vacuum sensor VT3002. After a certain period of time (e.g., 10 minutes), the change in the vacuum pressure in the process line 100 is detected to determine whether purging is complete.

[0054] In one embodiment, second check valve 2026 can regulate the fluid flow in only one direction to prevent reverse flow of the fluid. For example, second check valve 2026 may regulate the fluid flow direction so that the fluid flows only from the front end to the rear end of second check valve 2026. For example, the fluid may include a purge gas.

[0055] In one embodiment, the first exhaust line 310 may provide a passageway for the fluid in the supply line 100 to flow to the exhaust section V so as to exhaust the fluid in the supply line 100. In one embodiment, the first exhaust line 310 may connect the exhaust section V and the supply line 100 to provide sound pressure to the supply line 100. For example, one end of the first exhaust line 310 may be connected to the second point P2 of the supply line 100, and the other end may be connected to the exhaust section V. In one embodiment, the exhaust section V may include a pump that provides sound pressure. For example, the exhaust section V may apply sound pressure to the line to create a vacuum inside the line. In this case, the exhaust section V may continuously apply sound pressure to the line to create a continuous vacuum inside the line. However, it should be noted that these connection positions are merely exemplary and are not limited thereto, and modifications and variations may be made.

[0056] In one embodiment, the first exhaust line 310 may be connected to a first exhaust valve 3101, a second exhaust valve 3102, and a first check valve.

[0057] In one embodiment, the first exhaust valve 3101 can control the flow of fluid traveling through the first exhaust line 310. In one embodiment, the first exhaust valve 3101 can be coupled to the first exhaust line 310. In one embodiment, the first exhaust valve 3101 can optionally open or close the first exhaust line 310. For example, the first exhaust valve 3101 can When the first exhaust valve 3101 is open, the exhaust lines at the front and rear ends of the first exhaust valve 3101 may be fluidly connected. In this case, fluid flows from the front end of the first exhaust valve 3101 to the rear end of the first exhaust valve 3101. For example, when the first exhaust valve 3101 is closed, the first exhaust lines 310 at the front and rear ends of the first exhaust valve 3101 may be sealed and separated to prevent fluid flow. In this case, fluid cannot flow from the front end of the first exhaust valve 3101 to the rear end of the first exhaust valve 3101. In other words, the exhaust lines are separated from the first exhaust valve 3101, preventing fluid from flowing through the exhaust lines. In one embodiment, the first exhaust valve 3101 may be disposed between the second point P2 and the fourth point P4. In this case, the first exhaust valve 3101 controls the flow of fluid passing through the second point P2 and flowing toward the fourth point P4. However, it should be noted that such connection positions are merely examples and are not limiting and may be modified and changed.

[0058] In one embodiment, the second exhaust valve 3102 may control the flow of fluid moving through the first exhaust line 310. In order to avoid repetition in the description of the second exhaust valve 3102, the description of the first exhaust valve 3101 will be applied to components that are substantially the same as those of the first exhaust valve 3101 to the extent that it does not contradict the first exhaust valve 3101. In one embodiment, the second exhaust valve 3102 may be disposed between the fourth point P4 and the exhaust section V. In this case, the second exhaust valve 3102 controls the flow of fluid moving through the first exhaust line 310 after passing through the fourth point P4. In one embodiment, the second exhaust valve 3102 may be opened and closed independently of the first exhaust valve. However, it should be noted that this connection position is merely an example and is not limited thereto, and modifications and variations may be made.

[0059] In one embodiment, the first check valve 3103 may regulate the fluid flow in only one direction to prevent the fluid from flowing backward. For example, the first check valve 3103 may regulate the fluid flow direction so that the fluid flows only from the front end to the rear end, starting from the first check valve 3103.

[0060] In one embodiment, the second exhaust line 320 may provide a passageway for the fluid in the purge line 200 to flow to the exhaust section V so as to exhaust the fluid in the purge line 200. In one embodiment, the second exhaust line 320 may be connected to the exhaust section V and the purge line 200 so as to provide acoustic pressure to the purge line 200. For example, one end of the second exhaust line 320 may be connected to the third point P3 of the purge line 200, and the other end may be connected to the exhaust section V. However, it should be noted that these connection positions are merely exemplary and are not limited thereto, and may be modified or changed.

[0061] In one embodiment, a third exhaust valve 3201 may be connected to the second exhaust line 320 .

[0062] In one embodiment, the third exhaust valve 3201 may control the flow of fluid traveling through the second exhaust line 320. In one embodiment, the third exhaust valve 3201 may be connected to the second exhaust line 320. The description of the third exhaust valve 3201 follows the description of the first and second exhaust valves 3102 to the extent that it does not conflict with the description of the first and second exhaust valves 3102. In one embodiment, the third exhaust valve 3201 may be connected between a third point and a fourth point. In this case, the third exhaust valve 3201 may control the flow of fluid passing through a section between the third point P3 and the fourth point P4. In other words, the third exhaust valve may control whether or not fluid communication is established between the third point P3 and the fourth point P4.

[0063] In one embodiment, an exhaust pressure sensor (not shown) can detect the internal pressure of the second exhaust line 320. For example, the exhaust pressure sensor can be connected to the second exhaust line 320. For example, the exhaust pressure sensor may detect whether or not there is an internal vacuum in the second exhaust line 320. In one embodiment, the exhaust pressure sensor 4002 may be connected between the third exhaust valve 3201 and the fourth point P4. For example, the exhaust pressure sensor may detect the pressure in the section between the third exhaust valve 3201 and the fourth point P4. However, it should be noted that such connection positions are merely examples and are not limited thereto and may be modified or changed.

[0064] 2, the conventional gas supply system includes a supply line 700, a purge line 800, and an exhaust line 900. In the description of the conventional gas supply system shown in FIG. 2, the contents described with reference to FIG. 1 will be followed to avoid redundant description of configurations that are substantially the same as or similar to those of the gas supply system shown in FIG. 1.

[0065] A supply line 700 of a conventional gas supply system is connected to a supply pressure sensor 7016, a first supply valve 7011, a second supply valve 7012, a second regulator 7013, and a supply filter 7015. A purge line 800 of a conventional gas supply system is connected to a first purge valve 8011, a second purge valve 8012, a third purge valve 8021, a purge pressure sensor 8013, a fourth purge valve 8022, and a second check valve 8026. An exhaust line 900 of a conventional gas supply system is connected to a first exhaust valve 9101 and a second exhaust valve 9102. In one embodiment, the conventional gas supply system can reduce the concentration of harmful gases in the supply line 700 by introducing purge gas into the supply line 700 via the purge line 800 to dilute the gas present in the piping and then removing the gas in the supply line 700 via the exhaust line 900. However, in a conventional gas supply system, when a purge gas is pressurized into the supply line 700, moisture, which is one of the impurities contained in the purge gas, flows into the supply line 700 and is adsorbed on the pipes or components of the gas supply system, where it reacts with an acidic or corrosive gas, causing corrosion or defects.

[0066] Meanwhile, the gas supply system 1 according to one embodiment may be configured so that there is no stagnation section when the fluid flows between the first purge valve 2011 and the first exhaust valve 3101. For example, the stagnation section may include components involved in the flow of the fluid, such as a valve that controls the flow of the fluid, a regulator that controls the pressure of the fluid, or a flow control device 2024 that controls the flow of the fluid. For example, when there is no stagnation section for the fluid flowing between the first purge valve 2011 and the first exhaust valve 3101, the purging effect in that section can be maximized.

[0067] In the conventional gas supply system, a vacuum may be created between the first purge valve 8011 and the second purge valve 8012 to prevent the purge gas from mixing with the process gas when the process gas is supplied. In this case, as the conventional gas supply system is used for a long period of time, trace amounts of oxygen and moisture may flow into the piping between the first purge valve 8011 and the second purge valve 8012. Furthermore, trace amounts of purge gas may flow into the supply line, causing the process gas and purge gas to become mixed. For example, if trace amounts of oxygen and moisture flowing into the piping between the first purge valve 8011 and the second purge valve 8012 are mixed with the purge gas when the purge gas is injected and flow into the supply line 700, this may cause corrosion of the piping and / or component failure.

[0068] Meanwhile, the gas supply system 1 according to one embodiment can exhaust a small amount of purge gas, oxygen, or moisture present in the purge line 200 through the third exhaust valve 3201 before injecting the purge gas. In this case, by blocking the inflow of oxygen or moisture into the supply line 100, corrosion of the piping and / or component defects can be reduced or prevented. The differences between the gas supply system 1 described in this specification and conventional gas supply systems are merely illustrative. Therefore, it should be noted that the present invention is not limited to this.

[0069] It should be noted that the connection relationships of the individual gas supply lines 100 described in this specification are exemplary and can be changed by a person skilled in the art depending on the installation location and other environments of the gas supply system 1, and the presence or absence, connection positions, number, and types of valves and sensors connected to each gas supply line 100 can also be changed.

[0070] In accordance with an embodiment, the gas supply system 1 may purge the supply line 100 using a gas supply method before supplying a process gas to the supply line 100 after switching the gas container. The gas supply method according to an embodiment may be performed from an initial state in which all valves are closed. In one embodiment, the gas supply method includes a step of opening the second exhaust valve 3102 and then checking whether there is an abnormality in the vacuum pump using a pressure sensor. Then, a step of opening the first exhaust valve 3101 and the second supply valve 1012 to evacuate is performed. Then, a step of opening the third exhaust valve 3201 and the second purge valve 2012 to evacuate is performed. The order of the step of opening the first exhaust valve 3101 and the second supply valve 1012 to evacuate and the step of opening the third exhaust valve 3201 and the second purge valve 2012 to evacuate may be reversed. Then, pulse venting may be performed by closing the third exhaust valve 3201, opening the first purge valve 2011, and repeatedly opening and closing the fourth purge valve 2022.

[0071] In one embodiment, by maintaining the pressure between the second purge valve 2012 and the first purge valve 2011 lower than the internal pressure of the supply line 100, it is possible to reduce or prevent gas from flowing from the purge line 200 into the supply line 100. In other words, since gas flows from a high pressure to a low pressure, impurities such as oxygen or moisture do not flow from the piping between the second purge valve 2012 and the purge valve 2011, where the internal pressure is relatively lower than that of the supply line 100, to the supply line 100, where the internal pressure is relatively higher, but instead flow from the supply line 100 into the piping between the second purge valve 2012 and the first purge valve 2011. In this case, while sound pressure is maintained in the piping between the second purge valve 2012 and the first purge valve 2011, gas that reacts with the oxidizing gas flows into the piping between the second purge valve 2012 and the first purge valve 2011, causing corrosion of the piping and components. Here, when purging the first purge valve 2011 and the supply line 100, the purge gas and the moisture and oxygen gases that have been flowing in are mixed and flow into the supply line 100, where they react. For example, gases that react with moisture or oxygen may include HF, HCl, or HBr. In this case, corrosion of the piping and components may occur. To prevent this, exhaust may be performed on both sides of the first purge valve 2011. In other words, the gas supply method may be performed by closing the first purge valve 2011 and opening the second purge valve 2012 to exhaust both sides of the first purge valve 2011 through the second exhaust line 320. The gas supply method may also be performed by opening the second exhaust valve 3102, the first exhaust valve 3101, and the second supply valve 1012 to exhaust the supply line 100.

[0072] In one embodiment, nitrogen gas or trace amounts of moisture can be purged via purging with a viscous material. For example, purging with a viscous material refers to purging using a viscous material. In one embodiment, the gas supply method can remove moisture molecules from the piping by causing moisture molecules and purge gas molecules to collide with an oxidizing gas in the piping via purging with a viscous material, efficiently remove the oxidizing gas from the piping, vaporize moisture mixed in the purge gas during purging, or maintain a pressure lower than saturated water vapor to vaporize liquid moisture in the piping, thereby discharging both moisture and the purge gas.

[0073] In one embodiment, the gas supply method adjusts the pressure and flow rate when supplying the purge gas. For example, the gas supply method may adjust the pressure and flow rate of the purge gas so that the pressure and flow rate of the purge gas are within a specific range. For example, the gas supply method may adjust the pressure and flow rate of the purge gas through multiple pressure and flow rate adjusting components provided in the purge line. In one embodiment, increasing the number of purge gas supply / shutoff cycles and the purge time can efficiently remove moisture in a short period of time. In one embodiment, the lower limit of the purge gas pressure supplied by the gas supply method may be a pressure and flow rate that allows purging of viscous materials. In one embodiment, the pressure and flow rate at which the purge gas flows as viscous materials may be determined according to the diameter of the piping. In one embodiment, the lower limit pressure and flow rate may be determined by the Knudsen number K. For example, the Knudsen number K is the mean free travel distance of a gas divided by a representative length of an object (e.g., the diameter of the piping). For example, when the Knudsen number K is smaller than 1, the number of collisions between gas molecules increases. For example, the lower limit pressure and flow rate may be greater than or equal to the pressure and flow rate that make the Knudsen number for a given pipe diameter less than 1. In one embodiment, the upper limit pressure and flow rate of the purge gas supplied by the gas supply method may be less than or equal to the saturated vapor pressure of water in the pipe so that water molecules adsorbed on the wall surface of the pipe can evaporate. For example, the type of gas for purging viscous materials may include at least one of helium, neon, argon, and nitrogen. However, it should be noted that the types of purge gas are merely exemplary and are not limited to these.

[0074] A gas supply method according to one embodiment includes the steps of opening a second exhaust valve, continuously applying sound pressure through an exhaust unit, opening a first exhaust valve and a second supply valve, opening a third exhaust valve and a second purge valve, closing the third exhaust valve and opening the first purge valve, and repeatedly opening and closing a fourth purge valve, although it should be noted that each step may be omitted or repeated, or the order of steps may be changed.

[0075] In one embodiment, the gas supply method is performed with the gas container G closed. In one embodiment, the gas supply method involves applying sound pressure through the exhaust section V to create a vacuum in the internal space of the line, and then supplying a small amount of purge gas to control the pressure inside the piping to below the saturated vapor pressure of moisture. In this case, the supply line 100 can be purged by repeatedly supplying small amounts of purge gas. In this case, moisture in the purge gas can be vaporized and discharged simultaneously with the injection of the purge gas.

[0076] In one embodiment, the gas supply method may further include, after the step of closing the second exhaust valve 3102, detecting the presence or absence of a vacuum via the exhaust pressure sensor 4002. In one embodiment, the gas supply method may include the step of detecting the presence or absence of a vacuum via the exhaust pressure sensor 4002, and closing the first exhaust valve 3101 or all valves if the magnitude of the pressure change is equal to or less than a set value for a certain period of time. In one embodiment, if the magnitude of the pressure change is equal to or less than a set value for a certain period of time, it is determined that purging is complete.

[0077] Although the embodiments of the present invention have been described in detail above with reference to the drawings, the present invention is not limited to the above-described embodiments, and a person skilled in the art may apply various technical modifications and variations based on the above. For example, the described techniques may be performed in an order different from that described, and / or the components of the described systems, structures, devices, circuits, etc. may be combined or combined in a form different from that described, or may be substituted or replaced by other components or equivalents, and still achieve appropriate results.

[0078] Therefore, the scope of the present invention is not limited to the disclosed embodiments, but is defined by the scope of the appended claims and equivalents thereof. [Explanation of symbols]

[0079] 1: Gas supply system G: Gas bottle R: Process target V: Exhaust section P: Purge gas supply unit 100: Supply line 200: Purge line 310: First exhaust line 320: Second exhaust line

Claims

1. 1. A gas supply system comprising: a supply line connecting the gas container and the process object; a purge line connected to a first point of the supply line and connected to a purge gas supply unit that supplies a purge gas; a first exhaust line connected to a second point of the supply line and connecting the supply line to an exhaust section that provides sound pressure; a second exhaust line connected to a third point of the purge line and connecting the purge line to a fourth point of the first exhaust line; a gas supply system,

2. the first point of the supply line is closer to the gas container than the second point; The supply line includes: a supply pressure sensor for detecting an internal pressure of the supply line; The gas supply system of claim 1 , further comprising a first supply valve coupled thereto to control the flow of fluid traveling through the supply line.

3. The purge line includes: a first purge valve connected between the first point and the third point to control the flow of fluid through the purge line; a second purge valve disposed between the first purge valve and a third point to control the flow of fluid through the purge line; a purge pressure sensor disposed between the first purge valve and the second purge valve and configured to detect an internal pressure of the purge line; a first regulator disposed between the third point and the purge gas supply unit, for adjusting the internal pressure of the purge line; The gas supply system of claim 1 , further comprising a flow control device disposed between the first regulator and the third point.

4. The first exhaust line includes: a first exhaust valve disposed between the second point and the fourth point; a second exhaust valve disposed between the fourth point and the exhaust portion; The second exhaust line includes: a third exhaust valve for adjusting the gas supply; 2. The gas supply system of claim 1, further comprising an exhaust pressure sensor connected between the third exhaust valve and a fourth point to detect an internal pressure of the line.

5. The purge line includes: a first purge valve connected between the first point and a third point to control the flow of fluid through the purge line; a fourth purge valve disposed between the third point and a purge supply, the fourth purge valve controlling the flow of fluid through the purge line; a purge pressure sensor disposed between the first purge valve and the fourth purge valve and configured to detect an internal pressure of the purge line; a first regulator disposed between the fourth purge valve and the purge gas supply unit and configured to adjust the internal pressure of the purge line; The gas supply system of claim 1 , further comprising a flow control device coupled between the first regulator and a fourth purge valve.

6. The gas supply system according to claim 1 , further comprising a second regulator connected to the supply line for controlling the pressure of the supply line.

7. The gas supply system of claim 1 , further comprising a second supply valve connected to the supply line for controlling the flow of the supply line.

8. The gas supply system of claim 1 , further comprising a supply filter connected to the supply line.

9. The gas supply system of claim 1 , further comprising a first exhaust valve connected to the first exhaust line between the second point and the fourth point.

10. The gas supply system of claim 3 , further comprising a fourth purge valve connected to a rear end of the flow rate regulator, the fourth purge valve being connected to the purge line.

11. A method for supplying gas through the gas supply system according to any one of claims 1 to 10, comprising: opening a second exhaust valve; an exhaust section continuously applying sound pressure; opening a first exhaust valve and a second supply valve; opening a third exhaust valve and a second purge valve; closing the third exhaust valve and opening the first purge valve; repeatedly opening and closing the fourth purge valve; A gas supply method comprising:

12. The gas supply method of claim 11 , further comprising the step of detecting the presence or absence of a vacuum with the exhaust pressure sensor after the step of opening the second exhaust valve.

13. 12. The gas supply method according to claim 11, further comprising the step of detecting the presence or absence of a vacuum via the exhaust pressure sensor, and closing the first exhaust valve or all valves if the range of pressure change is equal to or less than a set value for a certain period of time.

14. The gas delivery method of claim 11 , further comprising evacuating the second exhaust line with the first purge valve closed.

15. The gas delivery method of claim 11 , further comprising evacuating the first exhaust line.

16. A gas supply method through the gas supply system according to any one of claims 1 to 10, providing all valves closed; evacuating the first exhaust line and the supply line while the first supply valve, the fourth purge valve, and the first purge valve are closed; evacuating the second exhaust line and the purge line under vacuum; After closing the second exhaust line, pulse venting between the first pressure and the second pressure using the flow regulator in the purge line and the fourth purge valve; A gas supply method comprising:

17. the first pressure is a pressure that makes the Knudsen number for the pipe diameter less than 1; 17. The gas supply method according to claim 16, wherein the second pressure is equal to or less than the saturated vapor pressure of water in the pipe so that water molecules in the pipe can evaporate.

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