Method and system for providing plasma treatment to optical surface

Abstract

To provide a technique for improving the effectiveness of observation equipment by reducing condensation buildup.SOLUTION: A plasma generation apparatus for treating an object includes a housing, a plasma generation zone within the housing configured to accommodate the object, circuitry for supplying energy and performing plasma treatment to increase the hydrophilicity of the object to a desired level, at least one sensor configured to measure at least one plasma activation parameter during the plasma treatment, and at least one processor configured to determine, on the basis of the at least one plasma activation parameter, that the plasma treatment falls below a threshold for increasing the hydrophilicity of the object to a desired level and output a notification indicating a failure of the plasma treatment.SELECTED DRAWING: Figure 7

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims the benefit of priority to U.S. Provisional Patent Application No. 63 / 178,024, filed April 22, 2021, and Israeli Patent Application No. 288770, filed December 8, 2021, each of which is incorporated herein by reference in its entirety.

[0002] The present disclosure, in some embodiments, relates to the field of observation instruments, and more particularly to techniques for improving the effectiveness of observation instruments by reducing the accumulation of condensation. [Background technology]

[0003] Medical scopes are widely used in medical procedures, particularly minimally invasive surgical procedures. These scopes generally fall into two categories: endoscopes and laparoscopes, both of which are used to visualize internal regions of the body. Endoscopes are commonly used to obtain visual information about the interior of hollow organs or cavities, such as the digestive tract. Laparoscopes are generally inserted through small incisions in a patient's skin. Simply put, both are often referred to as endoscopes. By way of example only, endoscopes can be used to perform arthroscopy, bronchoscopy, colonoscopy, cystoscopy, enterostomy, hysteroscopy, laparoscopy, laryngoscopy, mediastinoscopy, sigmoidoscopy, esophagogastroduodenoscopy, and ureteroscopy. Medical scopes used to perform these procedures have an optical system (e.g., a lens) at one end, as described below.

[0004] Endoscopes often include a distal end configured to be inserted into a patient's body and a proximal end configured to remain outside the patient's body during a procedure. The distal end typically includes a viewport, such as a lens or window, or the bare end of an optical fiber, or even a mirror (e.g., a dental mirror). Through the viewport, the scope allows for the collection of an image of the area around the viewport using a light-sensitive device, such as a CCD. The viewport may be intended to collect light from the front of the device (i.e., from an area coincident with the longitudinal axis of the device), or the viewport may be tilted at an angle relative to the longitudinal axis or oriented perpendicular to the longitudinal axis of the device (e.g., as demonstrated in colonoscopy). The proximal end often includes or is connected to controls (e.g., a handle) configured to be operated by the physician and possibly including user interface components such as switches, a navigation stick, a touchscreen, and a touchpad.

[0005] A laparoscope often includes a rod or shaft that is in a fixed or relatively fixed position and may include a viewport, optionally including an objective lens at its distal end and an eyepiece and / or integrated visual display at its proximal end. The scope may also be connected to a remote visual display or video camera for recording the surgical procedure.

[0006] In laparoscopic procedures, a patient's abdominal or pelvic cavity is accessed through one or more relatively small incisions (usually between about 3 mm and about 15 mm), and a laparoscope can be inserted through one of these incisions to allow the surgeon to view the internal organs that are the target of surgery. Typically, an insufflation device is used to inflate the abdomen with gas (usually carbon dioxide) to raise the abdominal wall above the internal organs, expanding the abdominal cavity space and creating sufficient working and viewing space for the surgeon.

[0007] The local environment within a patient's abdominal cavity is generally humid and warm compared to the endoscope or laparoscope being inserted. As a result, laparoscope viewports tend to become blurred, for example, due to fogging, i.e., condensation of steam on the viewport, or due to the accumulation of droplets, such as blood droplets, resulting from surgical activity during the procedure. A similar phenomenon can occur with non-laparoscopic endoscopes. Such fogging can obstruct the surgeon's view and may require the surgeon to remove the scope from the body to wipe the lens. Summary of the Invention

[0008] Embodiments consistent with the present disclosure provide systems and methods generally related to plasma treatment to prevent fogging on optical surfaces. The disclosed systems and methods may be implemented using a combination of conventional and specialized hardware and software, such as machines specifically constructed and / or programmed to perform the functions associated with the disclosed method steps. In accordance with other disclosed embodiments, a non-transitory computer-readable storage medium may store program instructions that are executable by at least one processing device to perform any of the steps and / or methods described herein.

[0009] In accordance with disclosed embodiments, systems, devices, methods, and computer-readable media for treating an object with plasma are disclosed. For example, a plasma generation apparatus for treating an object is disclosed. These embodiments may include a housing, a plasma generation zone within the housing configured to accommodate the object, circuitry for supplying energy and performing plasma treatment to increase the hydrophilicity of the object to a desired level, at least one sensor configured to measure at least one plasma activation parameter during plasma treatment, and at least one processor. The at least one processor may be configured to determine, based on the at least one plasma activation parameter, that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to a desired level and output a notification indicating a failure of the plasma treatment.

[0010] In accordance with disclosed embodiments, systems, devices, methods, and computer-readable media for treating an elongated tool with plasma are disclosed, which may include a housing, a bore within the housing having an open end on a surface of the housing for insertion of the elongated tool therein, at least one vacuum pump for creating a vacuum within at least a portion of the bore, an insertion detector for determining when the elongated tool is inserted into the bore, a vacuum sensor associated with the housing for determining a degree of negative pressure within at least a portion of the bore, a plasma generator for generating plasma within the bore, and at least one processor, which may be configured to receive an insertion signal from the insertion detector indicating that the elongated tool is within the bore, responsive to the insertion signal, activate the at least one vacuum pump to generate a negative pressure within at least a portion of the bore, receive a signal from the vacuum sensor and determine therefrom that the negative pressure within at least a portion of the bore is sufficient for plasma generation, and activate the plasma generator after determining that the negative pressure within at least a portion of the bore is sufficient for plasma generation, thereby exposing a distal end region of the elongated tool to plasma.

[0011] In accordance with disclosed embodiments, systems, devices, methods, and computer-readable media are disclosed for suppressing condensation distortion on an optical element. For example, an apparatus for suppressing condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity is disclosed. These embodiments may include a housing, a cavity within the housing sized to removably retain at least a portion of the medical instrument therein, the portion including the optical element, a plasma activation zone within the cavity positioned such that the optical element is located within the plasma activation zone when at least a portion of the medical instrument is retained within the cavity, a plasma generator configured to, upon activation, form a plasma cloud within the plasma activation zone adjacent the optical element, and a controller configured to operate the plasma generator for a duration sufficient to hydrophilize the optical element prior to insertion into the body cavity.

[0012] In accordance with disclosed embodiments, systems, devices, methods, and computer-readable media for suppressing condensation distortion on an optical element are disclosed, which may include a housing, a chamber within the housing, an electrical circuit within the housing, a plasma activation region associated with the chamber and configured to hold an optical element in a manner exposing an optical surface of the optical element to the plasma activation region, the plasma activation region configured to contain a gas on a first side of a dielectric barrier, the electrical circuit configured to form an electrical connection with a first electrode located on the first side of the dielectric barrier, a second electrode connected to the electrical circuit and located on a second side of the dielectric barrier opposite the plasma activation region, and at least one processor, which may be configured to control electrical flow via the circuit to cause an electric field associated with a voltage drop between the first electrode and the second electrode to generate plasma in the plasma activation region, and to maintain the plasma generated in the plasma generation region for a period of time sufficient to render the optical surface hydrophilic.

[0013] In accordance with disclosed embodiments, systems, devices, methods, and computer-readable media are disclosed for generating plasma to treat an object. For example, a plasma generator for treating an object is disclosed. These embodiments may include a housing, a plasma generation zone within the housing configured to accommodate the object, a plasma generator for enabling the formation of plasma within the plasma generation zone, a plurality of vacuum pumps within the housing, each pump having a vacuum inlet, a plurality of conduits within the housing, the plurality of vacuum pumps connected in series such that, upon operation, the pumps in series create a vacuum within the plasma generation zone, and at least one processor configured to simultaneously operate the plurality of vacuum pumps while the object is within the region of the plasma generation zone.

[0014] Some disclosed embodiments include systems and methods for suppressing condensation distortion on optical elements of a medical device configured for insertion into a body cavity. The optical elements of the medical device can be treated to render at least one surface of the optical element superhydrophilic. Once treated, the medical device, along with the superhydrophilic optical element, is inserted into a body cavity and exposed to moisture, which forms a thin film barrier on at least one surface of the optical element, thereby suppressing condensation distortion.

[0015] In accordance with certain disclosed embodiments, systems, devices, methods, and computer-readable media are disclosed for processing instruments of different dimensions in a vacuum environment. These embodiments may include a housing having a channel for receiving elongated tools of various diameters, which may be divided into a vacuum chamber region and a non-vacuum region. These embodiments may also include an annular seal disposed between the vacuum chamber region and the non-vacuum region, the annular seal being formed from a flexible material and configured to form a vacuum seal with a wall of a first tool when inserted therein and with a wall of a second tool when inserted therein, the first tool having a diameter at least 1.5 times larger than the diameter of the second tool.

[0016] Some embodiments may include inserting a removable first housing into the housing during a first treatment session, the removable first housing being divided into a vacuum chamber region and a non-vacuum region separated by a first annular seal configured to adjust to various tool sizes; inserting an elongated first tool into the removable first housing during the first treatment session, the elongated first tool having a first region of a first dimension; sealing the first region of the first dimension with the first annular seal upon insertion of the elongated first tool; maintaining the elongated first tool within the first housing during establishment of at least a partial vacuum in the vacuum chamber region; and withdrawing the elongated first tool from the first housing. These embodiments may also include inserting a removable second housing into the housing during a second treatment session, the removable second housing being divided into a second vacuum chamber region and a second non-vacuum region separated by a second annular seal in an arrangement corresponding to the first annular seal; inserting a second elongated tool into the removable second housing during the second treatment session, the elongated second tool having a second region with a second dimension different from the first dimension; sealing the second region with the second dimension with the second annular seal upon insertion of the elongated second tool; maintaining the elongated second tool within the second housing while establishing at least a partial vacuum within the second vacuum chamber region; and withdrawing the elongated second tool from the second housing. Some disclosed embodiments may also include maintaining the removable first housing within the housing during a second treatment session; inserting an elongated second tool into the removable first housing during the second treatment session, the elongated second tool having a second region of a second dimension different from the first dimension; sealing the second region of the second dimension with a first annular seal upon insertion of the elongated second tool; maintaining the elongated second tool within the first housing during establishment of at least a partial vacuum in the vacuum chamber region; and withdrawing the elongated second tool from the first housing.

[0017] Some disclosed embodiments include an apparatus for preparing a medical device for a medical procedure. The medical device may have a distal segment configured to be inserted into a patient's body, and the distal segment may include an optical member having an optical surface. Some disclosed apparatuses include a control unit, an adapter configured to be engaged and disengaged from the control unit, and at least one electrode, where the at least one electrode may be included in the control unit, the adapter, or both (if more than one electrode is present). The control unit may include an EM power source and a housing having a slot, where the housing may be configured to receive the adapter within the slot. The control unit may also include an adapter identifier configured to receive an identification signal from a corresponding transponder, and a controller operatively associated with the adapter identifier. The adapter may include a hollow cylinder extending between an opening and a distal end of the hollow cylinder, the opening being dimensioned to allow insertion of the distal segment into the hollow cylinder. The adapter may also include a seal, where the seal is positioned within the hollow cylinder and defines a distal portion of the hollow cylinder between the seal and the distal end of the hollow cylinder. The seal is sized to fit snugly around the outer periphery of the distal segment when the distal segment is inserted into the hollow cylinder. The adapter may also include a transponder configured to transmit an identification signal identifying the adapter or its location to the adapter identifier when the adapter is in the slot. The device is configured such that when the distal segment is in the hollow cylinder of the adapter, the adapter is in the slot and the adapter identifier receives the identification signal from the transponder, and applies a plasma-generating EM field to the distal portion of the hollow cylinder with at least one electrode, the electrode receiving EM power from the power source.

[0018] According to some embodiments, the adapter includes a hollow cylinder extending between an opening sized and configured to receive a distal segment of the medical device and a distal end of the hollow cylinder. The adapter may also include a seal positioned within the hollow cylinder, defining a distal portion of the hollow cylinder between the seal and the distal end of the hollow cylinder, the seal being sized to closely fit around the outer periphery of the distal segment when the distal segment is inserted into the hollow cylinder. The adapter may also include a transponder configured to transmit an identification signal that identifies the adapter when the adapter is in the slot. In some embodiments, the transponder stores information identifying the adapter. In some embodiments, the transponder is configured to identify the adapter by transmitting the identification signal in response to a coded signal.

[0019] According to some embodiments, the adapter seal is sized to fit a distal segment having a perimeter within a range between a first perimeter of L and a second perimeter greater than 1.5L. The adapter may also include an electrical feedthrough that electrically connects external contacts outside the hollow cylinder to electrical conductors inside the hollow cylinder within the distal portion.

[0020] Some disclosed embodiments include methods of preparing at least a first medical device and a second medical device for a medical procedure performed on a single patient. Each such medical device has a distal segment including an optical element. The distal segment of one of the first and second medical devices has a circumference of L, and the distal segment of the other medical device has a circumference greater than 1.2L. Some disclosed methods include providing a plasma chamber having at least one electrode, the at least one electrode being electrically connectable to a power source and configured to apply a plasma-generating EM field within the plasma chamber. The plasma chamber may also include an opening and a seal, and the seal may be sized and configured to receive the distal segments of the first and second medical devices within the opening. A related method may also include inserting the distal segment of the first medical device through the opening into the plasma chamber so that the seal and distal end mate to seal the opening. Such methods may also include applying a plasma-generating EM field by providing EM power from a power source to the at least one electrode, thereby generating a plasma near the optical element. The method may further include repeating the steps of inserting the distal segment and applying an EM force to the second medical device.

[0021] In accordance with some disclosed embodiments, an adaptive seal made from a flexible material is disclosed. The seal may be configured with an outer tube and an inner annular ring mated together, with the inner annular ring extending radially along a wave-like curve having at least one wave crest between the outer tube and a central opening of the seal. The adaptive seal is thus configured to fit snugly against the outer surface of a member positioned within the central opening and having a smooth periphery within a range between a first periphery of L and a second periphery of 1.5L. The smooth periphery may include a convex curve that defines a convex shape and has no corners or sharp edges.

[0022] The foregoing summary provides specific examples of disclosed embodiments to provide a sense of the disclosure and is not intended to summarize every aspect of the disclosed embodiments. Additional features and advantages of the disclosed embodiments will be set forth in part in the description that follows, and in part will be obvious from the description, or may be learned by practice of the disclosed embodiments. The features and advantages of the disclosed embodiments will be realized and attained by means of the elements and combinations particularly pointed out in the appended claims.

[0023] It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosed embodiments, as claimed.

[0024] The accompanying drawings constitute a part of this specification and illustrate several embodiments of the present disclosure and, together with the description, serve to explain the principles of the disclosed embodiments as set forth in the appended claims.

[0025] The accompanying drawings, which are incorporated in and constitute a part of this disclosure, illustrate various disclosed embodiments. Dimensions of components and features shown in the figures have generally been chosen for convenience and clarity of presentation and have not necessarily been drawn to scale. The drawings are as follows: [Brief explanation of the drawings]

[0026] [Figure 1A] 1 is a perspective view of one embodiment of an apparatus for preparing a medical device for a medical procedure, consistent with some disclosed embodiments. FIG. [Figure 1B] 1B is a perspective view of the distal end of an example endoscope having a viewport suitable for being plasma treated by the apparatus of FIG. 1A. [Figure 1C] 1B is a perspective view of an example of a sterile screen of the device of FIG. 1A having a sterile sleeve for covering an example of a plasma applicator of the device of FIG. 1A, the sterile sleeve being rolled up before use. [Figure 1D]FIG. 1D is a perspective view of the sterile screen of FIG. 1C, with the sterile sleeve partially extended over the plasma applicator. [Figure 1E] FIG. 1D is a perspective view of the sterile screen of FIG. 1C with the sterile sleeve unfolded to cover the plasma applicator. [Figure 2] 1 is a cross-sectional view of one embodiment of a sheath of an apparatus for preparing a medical device, according to some embodiments of the present disclosure. [Figure 3A] 1 is a cross-sectional view of a sheath positioned inside a bore of a plasma applicator of an apparatus, according to certain disclosed embodiments. [Figure 3B] FIG. 3B is a cross-sectional view showing details of the sheath of FIG. 3A. [Figure 3C] 10 is a cross-sectional view of another embodiment of a sheath and generation field applicator for preparing a medical device for a medical procedure, consistent with certain disclosed embodiments. [Figure 4] 10 is a cross-sectional view of yet another embodiment of a sheath of an apparatus for preparing a medical device for a medical procedure, consistent with some disclosed embodiments. [Figure 5] 1A, 1B, and 1C are cross-sectional side, front, and top views, respectively, of a plasma generation system according to some disclosed embodiments. [Figure 6] 1 is a flowchart illustrating a method for suppressing condensation distortion on an optical element, consistent with certain disclosed embodiments. [Figure 7] FIG. 5D is a perspective view of the plasma generation system of FIGS. 5A-5C with the front end removed to reveal the internal components. [Figure 8] 1A and 1B show two views of a sheath containing an inserted medical device, according to some disclosed embodiments. [Figure 9] 9 illustrates how the sheath of FIG. 8 may be inserted into the plasma generation system of FIGS. 5A-5C, according to some disclosed embodiments. [Figure 10A] 1 illustrates a perspective view of a pump assembly according to certain disclosed embodiments. [Figure 10B] 10B shows a top view of the pump assembly of FIG. 10A. [Figure 10C] FIG. 10B shows a partial perspective view of a pump manifold for use in the pump assembly of FIG. 10A. [Figure 11] 5A-5C show cutaway perspective views of the plasma generation system of FIGS. 5A-5C, according to certain disclosed embodiments. [Figure 12] 5A-5C with two medical devices of various sizes that can be inserted into the channel. [Figure 13] 1 illustrates a partial perspective view of an integrated sheath and cover according to certain disclosed embodiments. [Figure 14] 1 is a flowchart illustrating a method of treating an elongated tool with a plasma, consistent with certain disclosed embodiments. [Figure 15] 1 is a flowchart illustrating a method for suppressing condensation distortion on an optical element of a medical device, consistent with certain disclosed embodiments. [Figure 16] 1 is a flowchart illustrating a method for determining when plasma processing is insufficient and outputting such notification, consistent with certain disclosed embodiments. [Figure 17] 1 is a flowchart illustrating a method for treating an elongated tool with a plasma, according to one embodiment of the present disclosure. [Figure 18] 1 is a flowchart illustrating a method for suppressing condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity, according to an embodiment of the present disclosure. [Figure 19] FIG. 1 is a block diagram of an exemplary process for suppressing condensation distortion on an optical element, consistent with an embodiment of the present disclosure. [Figure 20] 1 shows a flowchart of a method for generating a plasma to treat an object, consistent with disclosed embodiments. [Figure 21A]1 illustrates a perspective view of an apparatus including an operating unit and an adapter for preparing a medical device for a medical procedure, consistent with some disclosed embodiments. [Figure 21B] 21B illustrates a perspective view of a distal segment of a medical device having optical elements suitable for plasma processing with the apparatus of FIG. 21A, consistent with certain disclosed embodiments. [Figure 21C] 21B illustrates a perspective view of the device of FIG. 21A inside a sterile cup and covered by a cup cover, according to some disclosed embodiments. [Figure 22A] 1 illustrates an internal view of an adapter of a device for preparing a medical device for a medical procedure, according to some disclosed embodiments. [Figure 22B] 22B illustrates a cross-sectional perspective view of an adaptive vacuum seal of the adapter of FIG. 22A according to certain disclosed embodiments. [Figure 22C] 22B illustrates an internal view of the adapter of FIG. 22A inside the operating unit and housing the distal segment of the endoscope, according to certain disclosed embodiments. [Figure 23A] 1 illustrates an electrode arrangement configured to treat optical elements of a medical device with plasma, consistent with certain disclosed embodiments. [Figure 23B] 10 illustrates another electrode arrangement configured to treat optical elements of a medical device with plasma, consistent with certain disclosed embodiments. [Figure 23C] 10 illustrates a further electrode arrangement configured to treat optical elements of a medical device with plasma, consistent with certain disclosed embodiments. [Figure 24] 1 illustrates an apparatus for plasma treatment of a medical device, including an operating unit and an adapter, according to some disclosed embodiments. [Figure 25A] 25 illustrates the device of FIG. 24, where the adapter includes a transponder with a magnet, according to some disclosed embodiments. [Figure 25B] 25 illustrates the device of FIG. 24, where the adapter includes a transponder with a mirror, according to some disclosed embodiments. [Figure 25C] 25 illustrates the device of FIG. 24, wherein the adapter includes a transponder with a code sticker, according to some disclosed embodiments. [Figure 25D] 25 illustrates the device of FIG. 24, wherein the adapter includes a transponder with an RFID chip, according to some disclosed embodiments. [Figure 25E] 25 illustrates the device of FIG. 24, where the adapter includes a transponder with a smart card, according to some disclosed embodiments. [Figure 26] 1 illustrates a flowchart of a method for processing devices of different dimensions in a vacuum environment, consistent with certain disclosed embodiments. DETAILED DESCRIPTION OF THE INVENTION

[0027] Exemplary embodiments are described with reference to the accompanying drawings. In the drawings, which are not necessarily drawn to scale, the leftmost digit(s) of a reference number identifies the figure in which the reference number first appears. For convenience, the same reference numbers are used throughout the drawings to refer to the same or similar parts. While examples and features of the disclosed principles are described herein, modifications, adaptations, and other implementations are possible without departing from the spirit and scope of the disclosed embodiments. Additionally, the words "comprising," "having," "containing," and "including," as well as other similar forms, are intended to be equivalent in meaning and are open-ended in that the listing of one or more items following any one of these words is not intended to imply an exhaustive listing of such one or more items or to imply limitation to only the listed item or items. It should be noted that, as used in this disclosure and the appended claims, the singular forms "a," "an," and "the" include plural references unless the context clearly dictates otherwise.

[0028] Unless otherwise indicated, and as will become apparent from the following description, throughout this specification, discussions utilizing terms such as "processing," "calculating," "computing," "determining," "generating," "configuring," "selecting," "defining," "applying," "obtaining," "monitoring," "providing," "identifying," "segmenting," "classifying," "analyzing," "associating," "extracting," "storing," "receiving," "transmitting," and the like, include computational actions and / or processes that manipulate and / or transform data into other data, where the data is represented as a physical quantity, e.g., a quantity of electrons, and / or where the data represents a physical object. The terms “computer,” “processor,” “controller,” “processing unit,” “computing unit,” and “processing module” should be broadly interpreted to encompass, by way of non-limiting example, personal computers, wearable computers, smart glasses, tablets, smartphones, servers, computing systems, cloud computing platforms, communication devices, any kind of electronic device, component, or unit with data processing capabilities including a processor (e.g., digital signal processor (DSP), image signal processor (ISR), microcontroller, field programmable gate array (FPGA), application specific integrated circuit (ASIC), central processing unit (CPA), graphics processing unit (GPU), visual processing unit (VPU), etc.), possibly with embedded memory, single-core processor, multi-core processor, cores within a processor, any other electronic computing device, or any combination of the above.

[0029] Operations according to the teachings herein can be performed by a computer specially configured or programmed to perform the functions described.

[0030] As used herein, the phrases "for example," "such as," "for instance," and variations thereof describe non-limiting embodiments of the presently disclosed subject matter. As used herein, reference to features of "an embodiment," "one instance," "some instances," "other instances," or variations thereof means that the particular feature, structure, or characteristic being described may be included in at least one embodiment of the presently disclosed subject matter. Thus, appearances of such terms do not necessarily refer to the same embodiment(s). As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0031] Features of the subject matter of the present disclosure are described in terms of specific embodiments for brevity. However, it should be understood that features described in connection with one embodiment may also be applicable to other embodiments. Similarly, features described in terms of a particular combination may be considered separate embodiments either alone or in terms other than that particular combination.

[0032] In embodiments of the presently disclosed subject matter, one or more steps illustrated in the figures may be performed in a different order and / or one or more steps may be performed simultaneously, or vice versa. The figures illustrate general schematic diagrams of system architectures according to embodiments of the presently disclosed subject matter. Each module in the figures may be comprised of any combination of software, hardware, and / or firmware that performs the functions defined and described herein. The modules in the figures may be centralized in one location or distributed across more than one location.

[0033] Examples of the subject matter of the present disclosure are not limited in their application to the details of construction and the arrangement of components set forth in the following description or illustrated in the drawings. The subject matter may be practiced or carried out in various ways. Also, it is to be understood that the phraseology and terminology employed herein is for the purpose of description and should not be regarded as limiting.

[0034] In this document, elements of a drawing that are not depicted within the drawing but are labeled with numbers that appear in a previous drawing may have the same purpose and description as in the previous drawing.

[0035] The drawings in this document may not be to scale. Different scales may be used for different drawings and even within the same drawing, for example, different scales for different views of the same object or different scales for two adjacent objects.

[0036] In accordance with the disclosed embodiments, "at least one processor" may refer to any physical device or group of devices having electrical circuitry that performs logical operations on one or more inputs. For example, the at least one processor may include all or part of an application-specific integrated circuit (ASIC), a microchip, a microcontroller, one or more integrated circuits (ICs) including a microprocessor, a central processing unit (CPU), a graphics processing unit (GPU), a digital signal processor (DSP), a field-programmable gate array (FPGA), a server, a virtual server, or other circuitry suitable for executing instructions or performing logical operations. The instructions executed by the at least one processor may be preloaded, for example, into memory integrated or embedded in the controller, or may be stored in a separate memory. The memory may include random access memory (RAM), read-only memory (ROM), a hard disk, an optical disk, a magnetic medium, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing instructions. In some embodiments, the at least one processor may include more than one processor. Each processor may have a similar configuration, or the processors may be of different configurations that are electrically connected or disconnected from one another. For example, the processors may be separate circuits or integrated into a single circuit. When more than one processor is used, the processors may be configured to operate independently or in concert. The processors may be coupled electrically, magnetically, optically, acoustically, mechanically, or by other means that allow them to interact.

[0037] The disclosed embodiments may include and / or access data structures. Data structures consistent with the present disclosure may include any collection of data values ​​and relationships between them. Data may be stored linearly, horizontally, hierarchically, relationally, non-relationally, one-dimensionally, multidimensionally, computationally, orderedly, unorderedly, object-orientedly, centralizedly, decentralizedly, distributedly, customly, or in any manner that enables data access. By way of non-limiting example, data structures may include arrays, associative arrays, linked lists, binary trees, balanced trees, heaps, stacks, queues, sets, hash tables, records, tagged unions, ER models, and graphs. For example, data structures may include XML databases, RDBMS databases, SQL databases, or NoSQL alternatives for data storage / retrieval, such as MongoDB, Redis, Couchbase, Datastax Enterprise Graph, Elastic Search, Splunk, Solr, Cassandra, Amazon DynamoDB, Scylla, HBase, and Neo4J. The data structure may be a component of the disclosed system or a remote computing component (e.g., a cloud-based data structure). Data in the data structure may be stored in contiguous or non-contiguous memory. Furthermore, a data structure as used herein does not require co-location of information. It may be distributed across multiple servers, which may be owned or operated by the same or different entities, for example. Thus, the term "data structure" as used herein in the singular encompasses the plural data structures. Disclosed herein are systems, methods, and computer-readable media for rendering an object hydrophilic and / or treating the object using plasma. Some embodiments include a plasma generator for performing plasma treatment of the object. When plasma treatment is applied to a surface of the object, the increased hydrophilicity of the surface may prevent condensation of fluid droplets (e.g., spray) thereon.The presence of fluid droplets can be important when an object contains one or more optical elements because the droplets can affect the interaction of light with the object and cause distortions that interfere with optical performance. Each fluid droplet can act as an individual lens, distorting light rays as they pass through or reflect off its surface. The collective effect of many individual fluid droplets, each with different optical properties, can roughen the optical surface, preventing a clear image from being obtained from light passing through or reflected off the surface, resulting in reduced optical quality. However, applying a plasma treatment to the object surface can prevent fluid from accumulating as droplets by increasing the hydrophilicity of the object surface and altering the surface tension thereon. By increasing hydrophilicity, the fluid can coat the object as a thin, uniform fluid layer rather than accumulating as individual droplets. Dispersing the fluid as a thin, uniform coating on the object can reduce distortion of light waves interacting with the object surface by maintaining a uniform refractive index, preserving optical quality, and / or limiting degradation. Thus, plasma treatment can reduce the variation in the thickness of the fluid coating the object surface, and therefore the variation in the optical path length of light passing through the fluid coating.

[0038] In some embodiments, the object may be a medical device having an optical element, such as a laparoscopic or endoscopic viewport, a lens, a mirror, or any other medical device with optical functionality. Inserting an untreated optical element into a body cavity containing moisture can cause mist to accumulate on the optical element due to water and / or aqueous fluids (e.g., bodily fluids) condensing as droplets on the surface of the optical element. Condensation can distort the interaction of light waves with the optical element and adversely affect visibility through the optical element. Increasing the hydrophilicity of the optical element can reduce such distortion by preventing fluid from accumulating as individual droplets on the optical element.

[0039] For ease of explanation herein, references to endoscopes or laparoscopes are intended to refer broadly to both, and disclosures relating to one are intended to apply equally to the other unless otherwise specified.

[0040] Treating an endoscope viewport (e.g., an optical element) with plasma can increase the hydrophilicity of the viewport, thereby achieving complete wetting of the viewport with water and / or aqueous fluids. Complete wetting can be achieved by increasing the surface tension of the treated surface of the viewport above that of water, i.e., above 0.072 N / m. In some embodiments, plasma treatment can increase the surface tension of the viewport surface to greater than 0.08 N / m, or even greater than 0.1 N / m, for example, for a limited period of time after plasma treatment. When the surface tension of the treated surface of the viewport is greater than that of water, the viewport surface can be wetted such that, for example, the contact angle formed between the aqueous fluid molecules and the viewport is less than 10 degrees (e.g., less than 5 degrees, or substantially 0 degrees), rather than allowing aqueous fluids to accumulate as droplets on the surface. Thus, increasing hydrophilicity can eliminate or significantly reduce blurring caused by condensation of water (e.g., spray) as droplets onto the surface of the viewport. Instead, due to increased hydrophilicity, the fluid may form a thin, uniform layer on the surface of the viewport. This may maintain the optical quality of the viewport in its original (e.g., dry) state, or at least limit degradation of the optical quality when aqueous fluid is introduced into the viewport. Similarly, increasing the hydrophilicity of the viewport by plasma treatment may reduce the variation in fluid thickness on the surface of the treated viewport, which may result in reduced variation in the optical path length of light waves passing through fluid condensed on the treated viewport. The reduced variation in optical path length may improve the optical quality of the treated viewport when it comes into contact with a fluid, compared to the reduced optical quality typically associated with an untreated viewport after coming into contact with a fluid.

[0041] In some embodiments, a viewport at the distal end of the endoscope may be configured to collect images, for example, as the distal end of the endoscope is inserted into the body. In some embodiments, the viewport may be transparent, for example, as in a laparoscope. In some embodiments, the viewport may be reflective, such as a mirror for dental instruments. In some embodiments, the viewport may be both transparent and reflective (e.g., with a two-way mirror). The viewport may be made of glass, quartz, plastic, semiconductor, metal, or any other material suitable for optical applications.

[0042] According to some embodiments, a plasma generating device may be provided for treating an object with plasma. The plasma generating device may be located within a housing having a bore, slot, or other opening. Such an opening in the housing may be configured to receive an object, e.g., while encased in a sheath, for convenience and sterility. Alternatively, the opening in the housing may be configured to receive a shroud or sheath, which is subsequently configured to receive the object for treatment. The plasma generating device may apply an electric and / or electromagnetic field suitable for generating plasma inside the bore, thereby enabling treatment of an object therein, such as a viewport located at the distal end of an object positioned inside the sheath. According to some embodiments, the sheath may be provided with at least one electrode and at least one sheath electrical contact, which may be configured to electrically contact a corresponding electrical contact in the plasma generating device when the sheath is inserted into the bore. Thus, the at least one electrode may apply an electric and / or electromagnetic field to generate plasma within the sheath. When an object is treated with the generated plasma while encased in a sheath, the surface tension of the object's exterior surface can be increased above that of water, making the object highly hydrophilic (e.g., superhydrophilic) and preventing blurring caused by condensation buildup when in contact with a fluid.

[0043] FIG. 1A schematically illustrates a plasma generation system 100 according to some embodiments. The plasma generation system 100 may include an operational unit 120 and a plasma applicator 130 (also referred to herein as a plasma generation field applicator), which may be electrically connected to the operational unit 120, for example, via a cable 112. The term "plasma generator" may refer to any device or system capable of forming plasma. Such a device or system may be configured to treat an object with a plasma cloud by performing one or more actions and / or functions based on computer program instructions that may be generated and / or received from at least one processor. The formation of a plasma cloud may be achieved by subjecting a gas to an intense electromagnetic field to a point where the ionized gas-phase material becomes electrically conductive. The operational unit 120 may be associated with at least one processor 102 (e.g., a controller), a power source 104, such as a battery, circuitry 106, and at least one memory 108. The at least one processor 102 can be communicatively coupled to the at least one memory 108 using wired and / or wireless means, e.g., via a bus system 110. The at least one processor 102 can be further electrically coupled to the power supply 104 and the circuitry 106, e.g., via the bus system 110. The at least one processor 102 can be configured to execute one or more program code instructions related to one or more data items stored in the at least one memory 106. The at least one program code instructions can facilitate control of one or more operational aspects of the plasma generation system 100, e.g., to control the generation of plasma via the plasma applicator 130. For example, the at least one processor 102 can control and moderate one or more attributes of the energy provided by the power supply 104 to the plasma applicator 130 (e.g., as power) for purposes of generating plasma to treat an object, e.g., by controlling one or more components (e.g., switches, diodes, and other logic components) of the circuitry 106.While at least one processor 102, power supply 104, circuitry 106, and at least one memory 108 are shown inside operational unit 120, this is for illustrative purposes only and is not intended to limit the invention to the configuration shown. For example, at least one processor 102 and at least one memory 108 may include multiple local and / or remote processor and memory units, as is known in the art of distributed computing. Similarly, while FIG. 1A shows power supply 104 and circuitry 106 positioned within operational unit 120, this is not required; power supply 104 and / or circuitry 106 may be external to operational unit 120; for example, power supply 104 may be in a wall unit coupled to operational unit 120 via a cable.

[0044] FIG. 1B schematically illustrates an object 200 (e.g., a medical device such as an endoscope) in accordance with aspects of some embodiments. The object 200 may have a surface that may be prone to accumulating fluid as droplets. The plasma generation system 100 may be used to prepare the object 200, for example, for a medical procedure. The object 200 may include a distal end 210. The distal end 210 may include an optical element (e.g., a viewport) 220 configured to allow light to be collected from the optical element 220's surroundings. In some embodiments, the optical element 220 may include one or more substantially transparent elements, such as a window or lens, and may be made of a material such as glass or quartz, a semiconductor, or a plastic such as Perspex, allowing light from outside the object 200 to be collected inside the object 200 by a photosensitive device (not shown herein), such as a camera. Additionally or alternatively, according to some embodiments, optical element 220 may include one or more substantially reflective elements, such as mirrors that reflect light (e.g., rather than transmit it therethrough), toward, for example, a light collecting device and / or a light reflecting device (not shown herein) or a photosensitive device. Optical element 220 may include surface 222 that may be exposed to moisture, for example, during a medical procedure. As a result, if left untreated, for example, without protection against fogging, surface 222 may become covered in spray due to the accumulation of liquid droplets on surface 222, for example, but not limited to, due to condensation of vapor.

[0045] In some embodiments, the plasma generation system 100 may further include a protective shroud 110, which may be dimensioned to receive the distal end 210 of the object 200 therein. The protective shroud 110 may alternatively be referred to as a sheath. The plasma applicator 130 may include a slot 132 (e.g., a hole, cavity, or other opening) configured to receive the distal end 210 of the object 200 therein while the distal end 210 is encased within the protective shroud 110. In some embodiments, for use, the distal end 210 of the object 200 may be inserted into the protective shroud 110, and then the protective shroud 110 may be inserted into the slot 132 with the distal end 210 encased therein. According to some embodiments, the protective shroud 110 may be inserted into the slot 132, and then the distal end 210 may be inserted and advanced through the protective shroud 110.

[0046] Reference is now made to FIGS. 1C-1E, which together show schematic diagrams of a sterile screen 140, according to some disclosed embodiments. According to some embodiments, the plasma generation system 100 (FIG. 1A) may further include a sterile screen 140 having an opening 142. When using the sterile screen 140 with the plasma generation system 100, the protective shroud 110 may be inserted into the slot 132 through the opening 142 of the sterile screen 140, as described in further detail herein below. According to some embodiments, the protective shroud 110 may be a disposable, disposable, or replaceable part configured to be used during a single, e.g., partial, medical procedure performed on a single patient. According to some embodiments, the protective shroud 110 may function as a sterility barrier for the object 200 (FIG. 1B), preventing exposure of the object 200 to the patient's bodily fluids, for example, during the medical procedure. The protective shroud 110 can further prevent exposure of the object 200 to contaminants present within the plasma applicator 130, which may or may not be maintained in a sterile state during and after use. According to some embodiments, the sterile screen 140 can facilitate maintaining the plasma applicator 130 free of fluids (e.g., bodily fluids) that may be transferred through the object 200 during and after use.

[0047] According to some embodiments, the sterile screen 140 can be attached to a sterile sleeve 144, as shown schematically in FIGS. 1C, 1D, and 1E. The sterile sleeve 144 can extend between the sterile screen 140 and a sleeve distal end 146. According to some embodiments, the sterile sleeve 144 can be soft or flexible, such as a sock. Prior to use, the sterile sleeve 144 can be folded or rolled, as shown schematically in FIG. 1C. For use, the sterile sleeve 144 can be unfolded or unrolled to encase, wrap around, or apply to the plasma applicator 130, or a portion thereof, for example, by inserting the plasma applicator 130 through the sleeve distal end 146 and into the sterile sleeve 144. During use, the sterile sleeve 144 can be placed around the plasma applicator 130 to wrap around and apply the plasma applicator 130. Thus, by wearing the plasma applicator 130, inserting the protective shroud 110 through the opening 142 and into the slot 132 and / or the object 200 into the protective shroud 110 can ensure that contamination of the plasma applicator 130 can be substantially reduced. According to some embodiments, the sterile sleeve 144 can be substantially rigid and can have a shape, such as a tube, configured to accommodate the protective shroud 110 therein. According to some embodiments, the sterile sleeve 144 can include a double-sided adhesive pad (not shown herein) in its bottom, one side of which can be configured to adhere to the plasma applicator 130 and the other side of which can be configured to adhere to a flat surface, such as a desk, table, or another work surface. Thus, attaching the plasma applicator 130 to the work surface can stabilize the plasma applicator 130 and facilitate inserting and extracting the protective shroud 110 (or the object 200) from the plasma applicator 130.According to some embodiments, the sterile screen 140 can be attached to the protective shroud 110 together with the sterile sleeve 144, so that the insertion of the protective shroud 110 into the slot 132 and the encapsulation of the plasma applicator 130 by the sterile sleeve 144 can be performed substantially simultaneously.

[0048] Upon activation of power supply 104, plasma applicator 130 may be further configured to apply an electric field and / or electromagnetic field suitable for plasma generation when distal end 210 ( FIG. 1B ) of object 200 encased within protective shroud 110 is positioned inside slot 132. An electric field and / or electromagnetic field may be applied inside protective shroud 110 inside slot 132 with distal end 210 positioned therein. In some embodiments, distal end 210 includes a viewport 222 ( FIG. 1B ) having one or more optical elements, such as a viewport of an endoscope. Thus, an electric field and / or electromagnetic field suitable for plasma generation may be applied near viewport 222.

[0049] According to some embodiments, the plasma applicator 130 may be in fluid communication with a gas pump and, additionally or alternatively, a gas reservoir (neither of which are shown herein). As will be described in further detail below, the gas pump and gas reservoir may be used to controllably evacuate or controllably flush with a desired gas, respectively, near the distal end of the endoscope to facilitate plasma ignition. According to some embodiments, the preferred gas may be argon or nitrogen. According to some embodiments, a suitable gas pressure for plasma ignition after evacuation may be less than 0.1 Atm. According to some embodiments, the vicinity of the distal end of the endoscope may be pumped evacuated and then flushed with a desired gas. According to some embodiments, the gas pump and / or gas reservoir may optionally be located within the operational unit 120 (FIG. 1A).

[0050] The operation unit 120 may be configured to allow a user of the plasma generation system 100 to operate and control the device. Accordingly, the operation unit 120 may include one or more command switches and one or more controllers, e.g., physical or virtual switches, buttons, and controllers. The control unit may further include indicators, e.g., indication LEDs, displays, for providing the user with data and information necessary to operate the device, and possibly operation software executable by the at least one processor 102 for providing the user with operation and command screens for enabling the user to operate and command the device.

[0051] 2, an embodiment of a protective shroud 310 is shown in cross section, in accordance with aspects of some embodiments. The protective shroud 310 may be suitable for use with an object such as an endoscope 380, shown schematically inside the protective shroud 310 by dashed lines. The endoscope 380 may include a distal end 382 and a conductive surface (e.g., a metal surface 384) at the distal end 382. The distal end 382 of the endoscope 380 may be disposed with a viewport 390. The viewport 390 may further include an optical element 392 that may be subjected to plasma treatment as described herein.

[0052] Protective shroud 310 may include a hollow cylinder 312 extending between a proximal opening 314 and a cylinder distal end 316. Protective shroud 310 may further include a vacuum seal 320 having one or more (e.g., three) O-rings, such as O-rings 320a, 320b, and 320c. Vacuum seal 320 may be adapted to fit the outer dimensions (e.g., outer diameter) of endoscope 380 to allow endoscope 380 to be inserted into protective shroud 310 with little force, e.g., by hand, as is known in the art. Thus, vacuum seal 320 may be configured to maintain a pressure differential (or gas concentration differential) between an inner portion 322 of protective shroud 310 and an outer portion 324 of protective shroud 310 when endoscope 380 is positioned inside protective shroud 310. Vacuum seal 320 may also help to mechanically stabilize endoscope 380 inside protective shroud 310, thereby helping to prevent gas leakage between inner portion 322 and outer portion 324 of protective shroud 310. Vacuum seal 320 may further assist in plasma generation near viewport 390, as described further below.

[0053] The protective shroud 310 may further include a cathode 330 disposed on the hollow cylinder 312 and configured to establish an electrical feedthrough between the outer portion 324 of the protective shroud 310 and its inner portion 322. The cathode 330 may be flexible and electrically exposed on the inner portion 322 and the outer portion of the protective shroud 310, allowing insertion of the endoscope 380 into the protective shroud 310 while forming an electrical contact between the cathode 330 and a metal surface 384. The protective shroud 310 may further include an anode 340 disposed near the cylinder distal end 316. The anode 340 may be formed, for example, as a metal block having a circular, smooth surface 342 facing the inner portion 322. According to some embodiments, the surface 342 may be curved. According to some embodiments (not shown herein), the anode 340 may be formed as a pointed tip facing the inner portion 322. According to some embodiments, the anode 340 may be formed as a ring. The anode 340 may be mounted on a disk 344 made of a dielectric material, so that the disk 344 forms a dielectric barrier between the anode 340 positioned on one side of the dielectric barrier and the cathode 330 with the metal surface 384 of the endoscope 380 positioned on the other side of the dielectric barrier, with the metal surface 384 being at the same potential as the cathode 380. In other words, the disk 344 may be configured to ensure plasma generation during a dielectric barrier discharge (DBD) mode of operation by, for example, forming a dielectric barrier by blocking the line of sight between the anode 340 on one side of the dielectric barrier and the cathode 330 and the metal surface 384 of the endoscope 380 on the other side of the dielectric barrier. During DBD mode, plasma may be generated more uniformly across the available space near the viewport, but arcing or other types of specific, narrow electrical transport trajectories between the anode and cathode may be prevented.The cathode 330 and / or the anode 340 can receive electrical energy to generate electric and / or electromagnetic fields suitable for performing plasma processing via the circuitry 106, the power sources 104 and / or 530, the at least one processor 102, and the cable 112 (FIG. 1A).

[0054] It should be noted that the thickness of the dielectric barrier can substantially and strongly affect the uniformity of the electric and / or electromagnetic fields that generate the plasma near the viewport 390, and thus the quality of the plasma treatment. The "quality" of the plasma treatment herein may refer to the level of hydrophilicity achieved and the duration for which the electric and / or electromagnetic fields are activated to achieve that hydrophilicity. In other words, a high-quality plasma treatment may achieve a relatively high level of hydrophilicity (e.g., exceeding the surface tension of water, i.e., achieving a surface tension of greater than 0.072 N / M, on the treated surface) within a relatively short duration (e.g., 5 minutes, or 1 minute, or as short as 10 seconds, or even as short as 5 seconds of electric and / or electromagnetic field activation). The thickness of the dielectric barrier may generally be as thin as possible to facilitate plasma ignition, yet thick enough to prevent breakdown and arcing. Exemplary thicknesses of dielectric materials such as PET or polycarbonate in embodiments described herein may be in the range of about 0.3 mm to about 3 mm for RF electric and / or electromagnetic fields at frequencies in the MHz range (e.g., about 2 MHz).

[0055] According to some embodiments, the anode 340 can be configured to flexibly displace relative to the hollow cylinder 312 to facilitate reliable electrical contact between the anode 340 and the feed contactor, as described further below. According to some embodiments, the disk 344 can be supported relative to the cylinder 312 by a spring 346.

[0056] During operation, plasma-generating power (e.g., supplied by power supply 530) may be supplied between anode 340 and cathode 330. As a result, a plasma that generates electric and / or electromagnetic fields during DBD mode can be generated between anode 340 and metal surface 384 in electrical contact with cathode 330. The plasma-generating electric and / or electromagnetic fields can generate a plasma in the space between anode 340 and cathode 330, particularly near viewport 390 and adjacent optical element 392.

[0057] Referring now to FIG. 3A, FIG. 3A illustrates a portion of an embodiment of a plasma applicator 348 suitable for use with a protective shroud 310a, which differs slightly from the protective shroud 310 of FIG. 2, as described in more detail below. The plasma applicator 348 may be configured to receive energy for performing plasma processing, for example, via the circuitry 106, the power source 104, the at least one processor 102, and the cable 112 (FIG. 1A). The plasma applicator 348 may include a bore 350, which may be configured to receive the protective shroud 310a therein. In some embodiments, the endoscope 380 may be encased within the protective shroud 310a. The plasma applicator 348 may further include a cathode contactor 352, which may be configured to contact the cathode 330 when the protective shroud 310a is inside the bore 350. Electrical conductors 354, such as electrical wires, electrically connected to the cathode contactor 352 can be used to supply power generated by a power source (e.g., power source 104) to the cathode contactor 352 and the cathode 330. The plasma applicator 348 can further include an anode contactor 356, which can be configured to contact the anode 340 when the protective shroud 310a is inside the hole 350. Electrical conductors 358, such as electrical wires, electrically connected to the anode contactor 356 can be used to supply power generated by the power source to the anode 340. The anode contactor 356 can be flexibly supported, such as by springs 360, to facilitate reliable electrical contact between the anode contactor 356 and the anode 340 when the protective shroud 310a is inserted into the hole 350.

[0058] It should be noted that the characteristics of the electric and / or electromagnetic fields capable of generating plasma from a gas may depend significantly on the properties of the gas itself, as well as the geometry of the electrodes involved (e.g., the shape and arrangement of the electrodes used to apply the electric and / or electromagnetic fields, the distance between the electrodes, and any other physical aspects of the electrodes that affect the electric field). Generally, the higher the pressure of the gas, the higher the electric and / or electromagnetic field required to ignite the gas into plasma. Also, some gases ignite at lower fields than others. For example, if the gas is at a pressure of 0.8 KPa, plasma may be ignited in helium gas at atmospheric pressure using an RF field of about 7 KV (within a frequency between 1 MHz and 15 MHz) across a 1 cm distance between electrodes at a voltage of about 200 V. With similar electrode configurations and similar field frequencies, plasma can be ignited in air at atmospheric pressure at a voltage of about 20 KV and at 0.8 KPa at a voltage of about 800 V.

[0059] Thus, according to some embodiments, plasma applicator 348 may be configured to flow gas from a gas reservoir (not shown herein) into bore 350 or pump air through bore 350 to create a low-pressure zone in the space between electrode 330 and electrode 340 and facilitate plasma ignition. Thus, according to some embodiments, plasma applicator 348 may be coupled to hose 364, which may be in fluid communication with bore 350 a gas reservoir (not shown herein) containing a gas suitable for plasma generation, such as helium, argon, or nitrogen. A valve 366 controlled by a user-operable control unit (not shown herein) may be used to schedule and regulate the flow of gas into bore 350. During operation, according to some embodiments, after protective shroud 310a is introduced into bore 350 with endoscope 380 positioned therein, valve 366 may be opened to allow the flow of gas into bore 350. The protective shroud 310a may be permeable to gas flow through the opening 368 between the hollow cylinder 312 and the disk 344, allowing gas to enter the protective shroud 310a and flow toward the viewport 390. If too much gas enters the hole 350, it can freely escape through a gap in the hole 350 between the protective shroud 310a and the plasma applicator 348 (e.g., the gap is not sealed). After an appropriate period of gas flow (e.g., 5 seconds, 10 seconds, 30 seconds, or even 1 minute), the power supply may be activated to provide power to the anode 340 and cathode 330, generating a plasma-generating electric field near the viewport 390. According to some embodiments, the gas reservoir may be portable and suitable for one-time use.

[0060] According to some embodiments, hose 364 may be used to pump gas (e.g., air) from the protective shroud 310a, particularly from the space near the viewport 390, to facilitate plasma ignition. Air may be drawn into the hose 364 from near the viewport 390 through the opening 368 toward the bore 350. A vacuum seal 370 may allow a vacuum to be created near the viewport 390 by maintaining a pressure differential between the area near the cylinder end 316 and the area near the opening 314 in the protective shroud 310a. According to some embodiments, air may be pumped through the hose 364 by a vacuum pump (not shown herein) in fluid communication with the hose 364. According to some embodiments, the hose 364 may be in fluid communication with a pumpable container (not shown), which may be continuously pumped, for example, by a small vacuum pump. Fluid communication may be provided by the hose 364, which may be continuously pumped by being in constant fluid communication with the container. Once valve 366 is opened, a vacuum pump or pumping container may pump the cavity 350, particularly the space near viewport 390, depending on the specific embodiment. The volume of the pumping region within the fluid connection of cavity 350 and protective shroud 310a may be less than 10 cc, according to some embodiments; for example, a pumping container and hose of about 1000 cc (1 liter) may be sufficient to establish an appropriate vacuum level, e.g., between about 0.1 atm and about 0.01 atm, within less than about 5 seconds or less than about 10 seconds, which may be sufficient for about 30 seconds, or even about 1 minute, of plasma excitation to satisfactorily plasma treat optical element 392.

[0061] 3B, a close-up view of the anode 340 abutting the disk 344 is shown, according to some embodiments. The protective shroud 310a may further include a sterile filter 372 positioned within the opening 368 to maintain a sterile barrier between the protective shroud 310a and the plasma applicator 348. Maintaining a sterile barrier may be understood to mean that microorganisms cannot penetrate the sterile filter 372. For example, the microorganisms may include any form of prokaryotic or eukaryotic cell, including fungi and bacteria. According to some embodiments, a sterile filter 372 can be positioned within the opening 368 across the cylinder end 316 so that gas can enter the protective shroud 310a without introducing contaminants (e.g., sterilely) as it flows from the plasma applicator 348 into the protective shroud 310a and / or gas can enter the plasma applicator 348 without introducing contaminants (e.g., sterilely) as it flows from the interior portion 322 of the protective shroud 310a into the plasma applicator 348. Thus, the sterile filter 372 may prevent migration of contaminants from the plasma applicator 348 (e.g., around the aperture 350) onto the endoscope 380 and / or from the endoscope 380 onto the plasma applicator 348. Additionally or alternatively, a sterile filter can be positioned within the plasma applicator 348 or, for example, within the hose 364.

[0062] 3C schematically illustrates a plasma applicator 448 and a corresponding sheath 410 (e.g., a protective shroud) according to some illustrative embodiments. The plasma applicator 448 differs from the plasma applicator 348 only in that the plasma applicator 448 includes an applicator gas port 402 in fluid communication with the hose 364, and the sheath 410 includes a sheath gas port 404 configured to be in fluid communication with the applicator gas port 402. For example, within the space of the bore 450 of the plasma applicator 448, fluid communication between the inner portion 322 of the sheath 410 and the outer portion 324 of the sheath 410 may be prevented by a vacuum seal 408, such as an O-ring. Thus, when the sheath 410 is inserted into the plasma applicator 448, the sheath gas port 404 may be in fluid communication with the applicator gas port 402, thereby establishing fluid communication of the hose 364 to the inner portion 322 of the sheath 410. As a result, a plasma ignition facilitating gas (e.g., helium or argon) can be driven directly into the sheath 410 through the hose 364; additionally or alternatively, gas (e.g., air) can be pumped out of the sheath 410 through the hose 364. This can prevent fluid communication between the aperture 450 and the sheath's interior 322. A sterile filter 472 can be positioned inside the sheath gas port 404 to maintain a sterile barrier between the sheath's interior 322 and the plasma applicator 448. As described above with respect to the sterile filter 372 in FIG. 3B , gas can enter the sheath 410 sterilely as it flows from the plasma applicator 448 into the sheath's interior 322 and / or gas can enter the plasma applicator 448 sterilely as it flows from the sheath's interior 322 into the plasma applicator 448. Thus, the sterile filter 472 may prevent contamination from the plasma applicator 448 (e.g., around the hole 450) onto the endoscope 380 and / or may prevent contamination from the endoscope 380 onto the plasma applicator 448.

[0063] The sheath 410 may further differ from the protective shroud 310 in that it has a ring anode 440 formed as a ring on the outer periphery of the hollow cylinder 312 near the distal cylinder end 316 (instead of the anode 340 within the protective shroud 310). Thus, if the hollow cylinder 312 is made of a dielectric material, it may function as a dielectric barrier 444 between the anode 440 on one side of the dielectric barrier 444 and the cathode 330 and the metal surface 384 of the endoscope on the other side of the dielectric barrier 444, such that a plasma is generated within the sheath 410 during the DBD mode of operation as described above with respect to the protective shroud 310. According to some embodiments, the sheath 410 may include a stopper 442 inside the hollow cylinder 412. The stopper 442 can be configured to limit the advancement of the endoscope 380 into the sheath 410 so that a predetermined, desired gap can be established between the anode 440 and the metal surface 384 of the endoscope 380 to ensure plasma generation at a known field (a field determined by the voltage supplied between and the gap between the cathode 330 and the anode 440). Additionally, the stopper 442 can be used as a dielectric barrier in the line of sight between the anode 440 and the cathode 330 to help focus the plasma toward the viewport 390.

[0064] When the sheath 410 is inserted into the bore 450 of the plasma applicator 448, the anode contactor 456 of the plasma applicator 448 can contact the ring anode 440. The anode contactor 456, as described above, can be electrically connected to an electrical conductor 458, which is configured to connect to a power source (e.g., power source 530) to enable energy (e.g., electrical power) to be supplied to the ring anode 440, thereby generating a plasma-generating electric and / or electromagnetic field. Note that when the sheath 410 is inserted into the bore 450 as described above, the cathode 330 of the sheath 410 can be electrically connected to the cathode contactor 352. Thus, in operation, when properly connected, the power source can provide a plasma-generating electric and / or electromagnetic field between the ring anode 440 and the metal surface 384 of the endoscope 380 (during DBD mode) to generate a plasma generated near the viewport 390.

[0065] 4 schematically illustrates a sheath 510 in accordance with aspects of some embodiments. The sheath 510 may be configured to facilitate plasma ignition without pumping or flowing gas into the space surrounding the endoscope as described in the above embodiments. In other words, the sheath 510 may enable plasma treatment to be provided to the viewport of an endoscope in accordance with the teachings herein using a plasma applicator that is not connected to a gas reservoir or gas pump. Thus, the sheath 510 may not have a gas port, such as gas port 402, and may not be connected to a hose, such as hose 364.

[0066] The sheath 510 may include a hollow cylinder 312 extending between the opening 314 and the cylinder end 316. The sheath 510 may differ from the protective shroud 310 in that the sheath 510 may be bonded and sealed near the cylinder end 316, thereby substantially preventing the permeation or intrusion of gas molecules through the cylinder end 316. The sheath 510 may further differ from the protective shroud 310 in that it has a leak seal 530 inside the hollow cylinder 312 and a hermetic screen 518 within the hollow cylinder 312 disposed between the leak seal 530 and the cylinder end 316. The hermetic screen 518 may be configured to be impermeable to gas molecules, thereby defining a closed volume 520 between the hermetic screen 518 and the cylinder end 316. Thus, the closed volume 520 inside the sheath 510 may be airtight, i.e., remain sealed from the exterior portion 324 of the sheath 510. The enclosed volume 520 may contain a gas suitable for plasma ignition (eg, argon) at a gas pressure of about 1 atmosphere, so that at most a small pressure gradient exists across the hermetic screen.

[0067] The hermetic screen 518 may be frangible and configured to break (tear) when an endoscope, such as endoscope 380, is inserted into the sheath 510. According to some embodiments, the sheath 510 may further include one or more tear needles 522 flexibly mounted to the hollow cylinder 312 outside the enclosed volume 520 near the hermetic screen 518. The tear needles 522 may be configured to flexibly tilt toward the hermetic screen 518 and tear the hermetic screen when pushed by an object inserted into the sheath. Thus, in use, an endoscope can be inserted into the sheath 510 and the tear needles 522 can be pushed toward the hermetic screen 518 to affect a tear in the hermetic screen 518. The endoscope can be further advanced until the viewport of the endoscope is between the cathode 330 and the anode 340. Note that as the endoscope advances during insertion, it may first pass through leak seal 530 and then through hermetic screen 518, causing it to break. The endoscope can then be advanced further and positioned in place within sheath 510. When hermetic screen 518 breaks, the seal formed between leak seal 530 and the endoscope may prevent gas inside space 520 from freely flowing toward opening 324. During further advancement of the endoscope into sheath 510, the free volume of space 520 for gas may decrease, but pressure buildup within the region of closed space 520 may be prevented as gas escapes due to a pressure differential across leak seal 530. As a result, when endoscope 380 is fully inserted into sheath 510, closed space 520 between anode 340 and cathode 330, particularly the space near the viewport of the endoscope, may contain the gas that was substantially contained within space 520 prior to rupture of hermetic screen 518, at near atmospheric pressure, thereby facilitating plasma ignition therein. According to some embodiments, the hermetic screen 518 may be made of Mylar or metallized Mylar or Kapton or metallized Kapton, or the like.

[0068] Thus, according to aspects of the present disclosure, an apparatus (e.g., plasma generation system 100 of FIG. 1A) is provided for preparing an endoscope (200 of FIG. 1; 380 of FIGS. 2, 3A, and 3C) for an endoscopic procedure. The apparatus may include a sheath (110 of FIG. 1A; 310, 310a of FIGS. 2 and 3A; 410 of FIG. 3C; 510 of FIG. 4) that may be dimensioned to receive a distal end (210, 382) of the endoscope therein. The distal end may include a viewport (220, 390) that may be configured to allow collection of an image of an area surrounding the viewport therethrough.

[0069] The device may further include a plasma generating field applicator (130, 348, 448) that electrically connects to a power source. The plasma generating field applicator may have an aperture (132, 350, 450) that may be configured to receive the distal end of an endoscope enclosed within a sheath. The plasma generating field applicator may be configured to apply electrical power suitable for plasma generation within the sheath. The sheath may be detachable from the distal end of the endoscope and the plasma generating field applicator. According to some embodiments, the viewport of the endoscope may be transparent or may be a mirror.

[0070] According to some embodiments, the device may further include a sterile sleeve (144) extending between the first end (146) and the second end (140), the sterile sleeve configured to encapsulate the plasma generating field applicator and having a first opening on the first end configured to allow the plasma generating field applicator to be inserted into the sterile sleeve and a second opening (142) on the second end configured to allow an endoscope to be inserted into the plasma generating field applicator. According to some embodiments, the sterile sleeve may be flexible, and according to some embodiments, the sterile sleeve may be rigid. The sterile sleeve may be detachable from the plasma generating field applicator. According to some embodiments, the sterile sleeve may be attached to a sheath, and according to some embodiments, the sterile sleeve may be detachable from the sheath.

[0071] According to some embodiments, the sheath may include at least one electrode (340, 440) and a first sheath electrical contact (340, 440) electrically connected to the electrode. The first sheath electrical contact may be configured to electrically contact a corresponding first applicator electrical contact (356, 456) in the plasma-generating field applicator when the sheath is inserted into the bore (350, 450). This allows the at least one electrode to apply a plasma-generating field to the sheath interior portion (322) upon receiving power from the plasma-generating field applicator.

[0072] According to some embodiments, the sheath may further include a second sheath electrical contact (330) that may be configured to contact the endoscope when the distal end of the endoscope is received within the sheath. The second sheath electrical contact may be configured to electrically contact the second applicator electrical contact (352) when the sheath is inserted into the bore (350, 450).

[0073] According to some embodiments, the sheath may include a hollow, substantially rigid tube (312, 412) extending between an opening (314) configured to receive the distal end of the endoscope and the distal end of the sheath (316). According to some embodiments, the hollow tube may be a hollow cylinder (312, 412).

[0074] According to some embodiments, the sheath may further include a seal (320, 530) positioned along the inner circumference of the hollow tube between the opening and the distal end and sized to surround the endoscope (380) so as to fit snugly against the endoscope when it is received inside the hollow tube. According to some embodiments, the seal may include an O-ring.

[0075] According to some embodiments, the plasma generating field applicator (348, 448) can be coupled to a hose (364). The hose can be in controllable fluid communication with the apertures (350, 450). According to some embodiments, the plasma generating field applicator (348, 448) can include a control valve (366) that controllably fluidly connects the hose (364) to the apertures (350, 450). According to some embodiments, the plasma generating field applicator (348) can include an applicator gas port (402) in fluid communication with the hose, and the sheath (410) includes a sheath gas port (404). The sheath gas port can be configured to sealingly couple with the applicator gas port for fluidly connecting the hose to the interior portion (322) of the sheath. A sealed connection between the sheath gas port and the applicator gas port, for example by seal 408, can prevent fluid communication between the inner portion (322) of the sheath (which is fluidly connected to hose 364) and the bore (450) when the sheath is inserted into the bore.

[0076] According to some embodiments, the sheath (510) may include a seal (530) inside the hollow tube (312), which may be configured to fit snugly against the endoscope when the distal end of the endoscope is inserted into the hollow tube. The sheath (510) may further include a hermetic screen (518), which may be configured to extend across the hollow tube to define a closed, sealed space (520) between the hermetic screen and the distal end (316) of the hollow tube. According to some embodiments, the sheath may further include one or more tear needles (522), which may be positioned inside the hollow tube between the seal (530) and the hermetic screen (518) and configured to rupture the hermetic seal upon insertion of the endoscope into the hollow tube.

[0077] According to some embodiments, a method of preparing an endoscope for an endoscopic procedure is provided. The method may include providing a sheath (110, 310, 310a, 410, 510) dimensioned to receive a distal end (210, 382) of the endoscope therein, the distal end including a viewport (220, 390) configured to allow collection of an image of an area surrounding the viewport therethrough. The method may further include providing a plasma generating field applicator (130, 348, 448) electrically connected to a power source. The plasma generating field applicator may have a bore (132, 350, 450) configured to receive the distal end of the endoscope encased within the sheath. The plasma generating field applicator may be configured to apply electrical power (e.g., via electrodes 330, 340, and 440) suitable for plasma generation within the sheath. The sheath may be detachable from the plasma-generating field applicator and the distal end of the endoscope. The method may further include positioning the distal end of the endoscope encased in the sheath within the bore of the plasma-generating field applicator and plasma treating the viewport at the distal end of the endoscope by activating the power source to generate plasma within the sheath.

[0078] According to some embodiments, the method may further include preventing contamination of the plasma generating field applicator by the fluid dispersed on the distal end with a sheath. According to some embodiments, the plasma generating field applicator may include a hose (364), and the method may further include controllably flowing gas (by opening and closing valve 366) into the interior portion (322) of the sheath or pumping the interior portion of the sheath through the hose.

[0079] According to some embodiments, there is also provided a method of preparing an endoscope (380) for an endoscopy procedure, the endoscope comprising a distal end (382) including a viewport (390). The viewport may be made of a dielectric material and is proximal to a metal segment (384) at the distal end of the endoscope. The method may include placing the distal end of the endoscope within a closed plasma chamber (e.g., a sheath 310, 310a, 410, or 510, where insertion of the endoscope seals the inner portion 322 of the sheath, thereby defining a closed plasma chamber therein). The closed plasma chamber may include at least an anode (340, 440) and a cathode (330), the cathode being in electrical contact with the metal segment. The line of sight between the anode and cathode is blocked by a dielectric barrier (344, 444), and the method may further include generating a plasma in the vicinity of the viewport (322) during the DBD mode by applying a plasma-generating electromagnetic field between the anode and the cathode. According to some embodiments, the electrical barrier (444) can electrically insulate the anode (440) from gas in the vicinity of the viewport (322). According to some embodiments of the method, the viewport may be transparent, or alternatively reflective (e.g., a mirror) or semi-transparent (e.g., a two-way mirror that both reflects and transmits light). According to some embodiments of the method, the viewport may be made of glass, quartz, or plastic.

[0080] 5A, 5B, and 5C show three views of a plasma generation system 500 according to some embodiments of the present disclosure. The plasma generation system 500 may include a housing 510 having a cavity 502 and containing a plasma generation zone 504 (e.g., a plasma activation zone), and a plasma generator having at least a first electrical contact 522, a second electrical contact 524, an energy source 530 (e.g., a battery), and a transformer 526. The housing 510 may also contain a filter 506 and a controller 508. The transformer 526 may be a ring-shaped solenoid, shown in cross section as sections 526a and 526b. The transformer 526 may be electrically coupled to a power source 530 on one side (e.g., an input side) and electrically coupled to the first electrical contact 522 on the other side (e.g., an output side), for example, via one or more conductive wires and screws 528. The transformer 526 can convert the input voltage (e.g., 24V) to a substantially higher voltage (e.g., 10 kV to 20 kV). The first electrical contact 522 can be electrically coupled to the higher voltage level generated by the transformer 526, and the second electrical contact 524 can be connected to a lower potential, such as ground, to generate a substantially high electrical potential between the first electrical contact 522 and the second electrical contact 524. The first electrical contact 522 can be electrically coupled to an outer insulating surface of a protective shroud, such as the protective shroud 310a in FIG. 3A configured to encase the viewport 390 and insert into the cavity 502. The second electrical contact 524 can be electrically coupled to an optical element within the insulating protective shroud (e.g., the viewport 390 in FIG. 3A), thereby generating a substantial electrical potential between the optical element positioned within the insulating protective shroud and the first electrical contact 522.

[0081] The plasma generation system 500 may include a plasma generation zone 504 within the cavity 502, which may be positioned such that when at least a portion of an object having an optical element (e.g., the endoscope 308 with viewport 392 in FIG. 2 ) is retained within the cavity 502, the optical element is located within the plasma generation zone 504. Accordingly, the plasma generation zone 504 may receive the same electrical potential between the first electrical contact 522 and the second electrical contact 524, which may facilitate the generation of plasma within the plasma generation zone 504. Plasma generation within the plasma generation zone 504 may be further facilitated by creating a low pressure (e.g., a vacuum) within the plasma generation zone 504. The plasma generator may generate plasma for treating an object (e.g., a medical device) within the plasma generation zone 504 according to embodiments disclosed herein. The cavity 502 in the housing 510 may correspond to one or more of the slot 132 ( FIG. 1A ), the opening 142 ( FIG. 1D ), the opening 314 ( FIG. 2 ), the hole 350 ( FIG. 3A ), and the hole 450 ( FIG. 3C ). The plasma generation zone 504 may correspond to the plasma applicator 348 ( FIG. 3A ). The cavity 502 may provide access to the plasma generation zone 504, allowing an object to be inserted into the plasma generation zone 504, for example, to perform plasma treatment to increase the hydrophilicity of the object. The controller 508 may control one or more aspects of the plasma generator, such as the flow of gas into and / or out of the plasma activation zone 504 to generate the plasma, the generation of the electric and / or electromagnetic fields to generate the plasma, and any other parameters related to plasma generation by the plasma generator. The plasma generation system 500 may further include one or more sensors, such as a pressure sensor 1100 ( FIG. 11 ), a voltage sensor 514, and a plasma frequency sensor 512. It should be noted that while the voltage sensor 514 and plasma frequency sensor 512 are shown inside the plasma generation zone 504, this is just one example implementation and the voltage sensor and plasma frequency sensor may be positioned in any location that is electrically coupled to a voltage source (e.g., transformer 526).

[0082] FIG. 6 is a flowchart illustrating an example method 600 for suppressing condensation distortion on an optical element of a medical device configured for insertion into a body cavity, according to some embodiments of the present disclosure. Step 602 of method 600 may include exposing an optical element of the medical device to a plasma. Step 604 of method 600 may include maintaining the plasma in contact with the optical element for a period of time sufficient to render the optical element hydrophilic. Step 606 of method 600 may include removing the optical element from the plasma. Step 608 of method 600 may include inserting the medical device, the hydrophilic optical element, into a body cavity. Step 610 of method 600 may include suppressing condensation distortion by exposing the hydrophilic optical element to moisture, whereby the moisture forms a thin film barrier on the optical surface of the optical element.

[0083] 7 shows another cross-sectional view of a plasma generation system 500 (FIGS. 5A-5C), according to some embodiments of the present disclosure. As shown, the plasma generation system 500 is configured to treat an optical surface 706 of a medical device and can include an electrical circuit 700, a first pair of electrodes 702A and 702B designed to contact the disposable product, and a second pair of electrodes 704A and 704B designed to contact the medical device.

[0084] 8A shows a cross-sectional view of a sheath 800 with an endoscope 802, according to some embodiments of the present disclosure. As shown, the sheath 800 may include an annular seal 804, an opening 806 associated with a one-way valve 808, and an electrode 810. FIG. 8B shows another cross-sectional view of a sheath 800, according to one embodiment of the present disclosure, configured to removably receive a medical device (e.g., an endoscope 802) inserted therein. As shown, the sheath 800 may include at least one stop 812 configured to limit the movement of the endoscope 802.

[0085] 9 shows how the sheath 800 can be inserted into the plasma generation system 500. As shown, the plasma generation system can include a hole 900 sized to retain the sheath 800. Other relevant elements are shown in other figures.

[0086] FIG. 10A illustrates multiple vacuum pumps arranged within a plasma generation system 500 according to a following embodiment of the present disclosure. As illustrated, the plasma generation system 500 may include multiple vacuum pumps (e.g., vacuum pumps 1000A, 1000B, 1000C, and 1000D) and conduits (e.g., conduit 1002) connecting them in series. Other relevant elements are shown in other figures. FIGs. 10B and 10C illustrate exemplary cross-sectional views of a pump manifold of the plasma generation system 500, illustrating how multiple vacuum pumps are connected in series.

[0087] 11 shows another cross-sectional view of a plasma generation system 500 according to the present disclosure. As shown, the plasma generation system 500 can further include one or more sensors (e.g., a pressure sensor 1100 and other sensors configured to measure plasma activation parameters) and a display 1102 for displaying notifications.

[0088] 12 shows another cross-sectional view of a sheath 800, according to some embodiments. As shown, the sheath 800 can include an annular seal 1200 configured to allow for the formation of a vacuum chamber regardless of the diameter of the scope, and an adjustment cap 1202 that can be utilized when using a scope with a smaller diameter.

[0089] Figure 13 illustrates an integrated sheath and cover according to some embodiments of the present disclosure. Specifically, Figure 13 illustrates a receptacle 1300 (e.g., sheath 800) configured to be inserted into a cavity of a plasma generation system 500, a shield 1302 sterilely affixed to the proximal end of the receptacle 1300, and an adhesive 1304 for securing the shield 1302.

[0090] 14 is a flowchart illustrating a method 1400 for treating an elongated tool with plasma according to some embodiments of the present disclosure. Step 1402 of method 1400 may include receiving an insertion signal from a detector indicating that the elongated tool is within the bore. Step 1404 of method 1400 may include, in response to the insertion signal, activating at least one pump to generate a negative pressure within at least a portion of the bore. Step 1406 of method 1400 may include receiving a signal from a vacuum sensor and determining therefrom that the negative pressure within at least a portion of the bore is sufficient for plasma generation. Step 1408 of method 1400 may include exposing a distal end region of the elongated tool to plasma by activating a plasma generator after a determination is made that the negative pressure within at least a portion of the bore is sufficient for plasma generation.

[0091] FIG. 15 is a flowchart illustrating an example method for suppressing condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity, according to some embodiments of the present disclosure.

[0092] To ensure that the plasma treatment is sufficient to increase the hydrophilicity of the object to a desired level, the at least one processor may execute one or more program code instructions for monitoring the plasma treatment. The at least one processor may determine the effectiveness of the plasma treatment based on one or more parameters, such as may be measured by one or more sensors. In some embodiments, the processor may output a notification when the parameters indicate that the plasma treatment is not sufficient to increase the hydrophilicity of the object. In some embodiments, this notification may trigger adjustments and / or calibrations for the plasma treatment.

[0093] The following detailed description includes reference to the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or similar parts. While several exemplary embodiments are described herein, modifications, adaptations, and other implementations are possible. For example, substitutions, additions, or modifications may be made to the components illustrated in the drawings, and the exemplary methods described herein may be modified by substituting, reordering, removing, or adding steps of the methods of the disclosure. Therefore, the following detailed description does not limit the embodiments and examples of the present disclosure. Instead, the appropriate scope is defined by the appended claims.

[0094] In some embodiments, a plasma generation device for treating an object is provided. The term "plasma" can refer to a state of matter rich in charged particles, e.g., electrons and ions. As a result, plasma can be highly conductive and sensitive to electric and / or electromagnetic fields. The term "plasma generation device" can include any device or combination of components capable of generating plasma, for example, by transforming a gas (e.g., igniting the gas) to transition the gas into a plasma state or plasma cloud. The term "treating an object" can refer to a process, procedure, or protocol applied to modify one or more properties of a physical object. For example, plasma generation systems 100 (FIG. 1A) and 500 (FIGS. 5A-5C) illustrate exemplary implementations of plasma generation devices according to disclosed embodiments. In some embodiments, the plasma generation device can contain a gas and two electrodes (e.g., an anode and a cathode), which can apply an electric or electromagnetic field to the contained gas. The electric or electromagnetic field can ionize the contained gas to the point where the gas becomes a conductive plasma cloud.

[0095] In some embodiments, the object may include an optical element. An "optical element" may include any article of manufacture through which light may pass and / or be reflected. An optical element may be one or more combinations of a lens, polarizer, diffraction grating, prism, reflector, filter, viewing window, mirror, protective window, or any other component that transmits or reflects light. An optical element can alter one or more properties of light waves directed to or from the optical element, such as the intensity, phase, propagation direction, frequency, wavelength, or polarization of the light waves. For example, an optical element may be formed from metal, glass, plastic, semiconductor, or any other material that exhibits optical properties. The properties altered by this treatment may relate to the optical, electrical, magnetic, or conductive properties of the object. For example, an object may be treated by exposing it to a plasma cloud generated by a plasma generator. Exposing an object to a plasma can change the optical properties of the object by affecting the hydrophilicity of the object, for example, by causing the fluid to coat the object uniformly (e.g., evenly) instead of forming as individual (e.g., separate) droplets. One example of an optical element is optical element 392 (FIG. 3C), such as may be provided with viewport 390 (FIGS. 2, 3A, and 3C).

[0096] In some embodiments, the plasma generating device may have a housing. The term "housing" may refer to any support structure, frame, cage, enclosure, or enclosure capable of housing a plasma generator. The housing may be made of any suitable material, such as plastic, metal, glass, wood, or any other material capable of encasing a plasma generating device. In some embodiments, the housing may include one or more insulating materials that insulate the plasma generating device enclosed therein from one or more environmental conditions, such as electric and / or electromagnetic fields, light, humidity, temperature, shock, mechanical and / or acoustic vibrations, and any other environmental attributes that may affect plasma generation by the plasma generating device. An example of a housing for a plasma generating device is shown by housing 510 in FIGS. 5A-5C , which encloses plasma generation zone 504. Similarly, the exterior of plasma generating field applicator 130 ( FIG. 1A ) may form a housing consistent with disclosed embodiments.

[0097] In some embodiments, the housing may be provided with an aperture (e.g., a "cavity" or "slot"). In some embodiments, the aperture may be sized to removably retain at least a portion of an object. For example, a surface of the housing may expose an entrance to the aperture for inserting the object therein. The aperture may be of any suitable shape or size for accommodating an object. For example, the aperture may be tubular to accommodate a sheath configured to retain an elongated medical device. The aperture may have a cross-section that is circular, triangular, square, rectangular, oval, or any other regular or irregular shape. Examples of apertures located within the housing of a plasma generation device may be illustrated by slot 132 (FIGS. 1A and 1C), opening 142 (FIG. 1D), opening 314 (FIG. 2), aperture 350 (FIG. 3A), aperture 450 (FIG. 3C), and aperture 900 (FIG. 9).

[0098] Some embodiments may include a plasma generation device having a plasma generation zone within a housing. As used herein, the term "plasma generation zone" may refer to a physical volume or space in which a plasma cloud can be formed, for example, by igniting a gas introduced therein. The plasma generation zone may be any size. For example, the plasma generation zone may be 15 cm 3 Less than 10cm 3 Less than or equal to 5cm 3 5A is an exemplary implementation of a plasma generation zone according to disclosed embodiments. In some embodiments, the plasma generation zone may be positioned within a cavity configured to expose at least a portion of an object to plasma treatment by retaining at least a portion of the object therein. For example, the plasma generation zone (e.g., plasma generation zone 504) may be positioned within bore 350 (FIG. 3A), which may be configured to expose at least a portion of endoscope 380 to plasma by retaining at least a portion of endoscope 380 therein.

[0099] In some embodiments, the plasma generation zone can be associated with a cavity configured to hold an object in a manner that exposes at least a portion of the object to the plasma generation zone. The term "cavity" can refer to a chamber, crevice, or pit that can accommodate an object. A chamber within the plasma generation zone can accommodate at least a portion of the object inside the plasma generation zone along with the plasma cloud (e.g., generated by igniting gas flowing therein), thereby exposing at least a portion of the object to the plasma cloud. For example, a cavity can accommodate a viewport of an endoscope within the plasma generation zone, exposing the viewport to the plasma cloud generated inside the plasma activation zone after the gas is ignited. This can increase the hydrophilicity of the viewport, preventing the formation of aerosols when the viewport is subsequently inserted into the body. For example, referring to FIG. 5A, a processing device can have a cavity 502 disposed within a housing 510. The cavity 502 can be configured to hold a medical device (e.g., the endoscope 380 of FIG. 2) in a manner that exposes the optical element 392 located at the distal end of the endoscope 380 to the plasma generation zone 504.

[0100] In some embodiments, the plasma generation zone may be configured to accommodate an object. The term "accommodate" may refer to the ability to surround, hold, enclose, support, or otherwise contain an object, for example, within the plasma generation zone. For example, an object may be supported within the plasma generation zone to expose the object to the plasma cloud. The term "object" may refer to any physical component, such as an optical element. The optical element may include one or more of a mirror, a lens, a viewing window, or other optical surface. In some embodiments, the term "object" may also or alternatively include a medical instrument, such as one configured for insertion into a patient's body. For example, endoscope 380 ( FIG. 3A ) illustrates an exemplary implementation of an object according to disclosed embodiments.

[0101] In some embodiments, the object is at least a portion of a medical device, and the at least one processor is configured to output a notification indicating a failure of the plasma treatment before using the medical device during a medical procedure. The term "medical device" may refer to any apparatus or device used to perform a medical procedure. For example, the medical device may be an endoscope, laparoscope, gastroscope, cystoscope, ureteroscope, arthroscope, colonoscope, mirror (e.g., a dental mirror), intraoral scanner, or any other device suitable for insertion into a patient's body. In some embodiments, the medical device may have an elongated shape. The cross-section of the medical device may be circular, square, triangular, rectangular, oval, or any shape suitable for insertion into a patient's body. The width of the medical device may be uniform or may vary, and the edges of the medical device may be angular or curved. The term "notification" may refer to communication or transmission of information. For example, after determining that plasma treatment of the endoscope has failed, the at least one processor may communicate information indicating the failure to a physician before the physician uses the endoscope to perform an endoscopy. The notification may be in the form of text, sound, vibration, a visual alert (e.g., a flashing light), or any combination thereof. Referring to FIG. 2, optical element 392 positioned at the distal end of endoscope 380 is an exemplary implementation of an object that is at least a portion of a medical device, according to disclosed embodiments. Controller 508 (FIG. 5B) can output a notification via display 1102 indicating a plasma processing malfunction prior to using endoscope 380 during a medical procedure.

[0102] In some embodiments, the plasma generator may include a circuit for supplying energy to perform plasma processing. The term "circuit" may include any combination of electronic components (e.g., memory units, switches, gates, wires, transformers, and other electronic components) for performing one or more operations (e.g., logical operations) in response to receiving an electrical signal as an input (e.g., from a processor acting as a controller). The circuit may couple an energy source, such as a power supply, generator, battery, or rechargeable battery, to the plasma generator, enabling ignition of gases for the purpose of converting the gases into a plasma cloud. The energy source may be external to the plasma generator, for example, via a cable from a wall outlet. In some embodiments, the operating unit may be energized by an internal energy source such as a battery, e.g., a rechargeable battery. The circuit may control one or more aspects of the energy delivered by the energy source, such as the magnitude, intensity, frequency, phase, timing, and polarity, as well as the voltage associated with the energy, the current associated with the energy, and any other attribute that characterizes the energy. The circuit may adapt the energy according to the requirements of the plasma generator, for example, to ignite gases and generate a plasma cloud to perform plasma processing. Thus, the circuitry may include transformers, connecting wires and contacts, and one or more integrated circuits (ICs), which may include an application specific integrated circuit (ASIC), a microchip, a microcontroller, a microprocessor, and may include all or part of a central processing unit (CPU), a graphics processing unit (GPU), an accelerated processing unit (APU), a digital signal processor (DSP), a field programmable gate array (FPGA), or other circuitry suitable for executing computational instructions and / or capable of performing logical operations, for example, based on the computational instructions or input signals.The circuit may further include one or more memory units, such as random access memory (RAM), cache memory, read-only memory (ROM), hard disk, optical disk, magnetic media, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing data and / or computational instructions for performing logical operations. The circuit may further include one or more communication channels, coupling one or more ICs to the memory to enable the one or more ICs to receive stored computational instructions and / or data necessary to perform corresponding logical operations to control energy delivered to the plasma generator. The communication channels coupling the one or more ICs to the memory may include wired channels, such as one or more cables, fibers, wires, buses, and any other mechanically coupled communication channels. The communication channels may also or alternatively include wireless channels, such as short-wave, medium-wave, and long-wave wireless communication channels (e.g., Wi-Fi, Bluetooth, Zigbee, cellular, satellite), optical communication channels, and acoustic communication channels.

[0103] The term "energy" may refer to an electric and / or magnetic signal capable of inducing an electric and / or electromagnetic field. A circuit may control parameters of the energy, such as the timing, frequency, intensity, magnitude, and phase of the electric (e.g., voltage, current) and / or magnetic signal (e.g., direction, strength, density), to generate an electric and / or electromagnetic field capable of converting a gas subjected to the electric and / or electromagnetic field into a plasma cloud. For example, a transformer may convert a relatively low voltage supply (e.g., tens of volts) provided by a power source into a high voltage provided to a plasma generation zone, generating an electromagnetic field within which a plasma can be ignited. For example, an electric and / or electromagnetic field may ionize a gas until the gas becomes conductive to the point where it reaches a plasma state. Thus, a circuit may supply energy in a form suitable for performing plasma processing, for example, by adapting energy from an energy source to a signal capable of inducing an electric and / or electromagnetic field capable of converting a gas into a plasma cloud. For example, circuit 106 (FIG. 1A) may supply energy to perform plasma processing according to disclosed embodiments. The circuit 106 can adapt the electrical energy supplied by the power supply 530 (e.g., in response to one or more control operations by at least one processor 102 or 508) into a form suitable for generating an electric field and / or an electromagnetic field capable of generating plasma. The adapted energy can be supplied to the cathode 330, the anode 340, or the dielectric barrier 344 via the cathode contactor 352, the conductor 354, and the conductor 358 ( FIG. 3A ). For example, upon operation of the power supply 530, the circuit 106 can adapt the electrical energy supplied by the power supply 530 (e.g., in response to control instructions by at least one processor 102 or 508) and deliver the adapted electrical energy to the cathode 330 and the anode 340 via the conductors 354 and 358 to generate an electric field and / or an electromagnetic field suitable for generating plasma from gases present therein. As another example, the circuit 700 of FIG. 7 can provide energy for performing a plasma process.

[0104] Some embodiments may include providing energy to perform a plasma treatment to increase the hydrophilicity of an object to a desired level. The term "hydrophilicity" refers to the tendency or preference of a molecule to become hydrated. A hydrophilic compound may have thermodynamic properties that allow the compound to more readily bind with water molecules than a non-hydrophilic compound, e.g., a hydrophobic compound that does not readily bind with water (e.g., polar) molecules. A hydrophilic object may be wettable, allowing a liquid (e.g., water) to maintain contact with the object due to intermolecular interactions that balance adhesive and cohesive forces between the liquid and the object. The term "desired level" may refer to a level of hydrophilicity that achieves the formation of a substantially uniform fluid layer on the surface of the object when the fluid comes into contact with the object, thereby inhibiting, suppressing, or at least partially preventing the formation of fluid droplets (e.g., spray). The desired level may vary depending on the particular object and the particular intended use. The desired level of hydrophilicity may result in a sufficiently uniform fluid layer to ensure a minimum optical quality. For example, the desired level of hydrophilicity may be associated with a minimum variable thickness of the layer of fluid collecting on the object, or a minimum angle of incidence between the fluid accumulating on the surface of the object and the surface of the object, e.g., less than 30 degrees, less than 15 degrees, or less than 10 degrees. For example, with reference to Figure 3A, the circuit partially represented by cathode 330, anode 340, dielectric barrier 344, cathode contactor 352, conductors 354, and conductors 358 can provide energy to perform a plasma treatment to increase the hydrophilicity of endoscope 380 to a level where mist buildup during a medical procedure does not significantly reduce visibility through endoscope 380.

[0105] Some embodiments may include at least one processor maintaining the plasma treatment for a predetermined duration. For example, to achieve a desired level of hydrophilicity, the at least one processor may activate the plasma generator for a period of time sufficient to render the optical element hydrophilic prior to insertion into the body cavity. In some embodiments, the predetermined duration may be based on characteristics of the plasma generated for the plasma treatment, such as the type of gas used to generate the plasma and the conditions under which the plasma is generated (e.g., pressure, temperature, electric and / or electromagnetic field, voltage, current). In some embodiments, the predetermined duration may be based on physical properties of the object, such as the material from which the object is made, the shape of the object, the size of the object, the sharpness or smoothness of the object, or the optical properties of the object (e.g., transparency, reflectivity). In some embodiments, the predetermined duration is based on a desired level of hydrophilicity of the object. For example, a first object intended for a medical procedure requiring high precision may require greater hydrophilicity than a second object intended for a medical procedure requiring less precision. Additionally or alternatively, in some embodiments, the predetermined duration may be based on a desired and / or acceptable level of optical quality, the intended use of the object, and any other parameters (e.g., performance parameters) that may be affected by the hydrophilicity of the object. According to some disclosed embodiments, a period of time sufficient to render the object hydrophilic may be less than 1 minute, less than 45 seconds, less than 30 seconds, or less than 15 seconds.

[0106] 1A illustrates an exemplary implementation of a controller for maintaining plasma treatment for a predetermined duration, e.g., via a clock internal to the at least one processor 102. The at least one processor 102 may adapt one or more aspects of the energy provided by the power source 104, e.g., via the circuitry 106, and provide the adapted energy to the plasma-generating field applicator 130 via the cable 112. Additionally, the processor 102 may determine the predetermined duration based on characteristics of the plasma generated by the plasma-generating field applicator 130 for the plasma treatment, e.g., as may be stored in the memory 104, and / or physical properties of the object 200. In some embodiments, the at least one processor may determine the predetermined duration based on a desired level of hydrophilicity of the object 200, e.g., to prevent condensation of spray on optical elements of the object 200 when the object is inserted into the body during a medical procedure. 5B further illustrates an exemplary implementation of a controller 508 (e.g., at least one processor) for maintaining plasma treatment by the plasma generation system 500 for a predetermined duration depending on the desired level of hydrophilicity of the object. For example, if one object is needed for a procedure requiring a high level of precision, the controller 508 may apply treatment to the object for a relatively long period of time (e.g., 45 seconds). Meanwhile, if another object is needed for a procedure requiring a lower level of precision, the controller 508 may apply treatment to the object for a relatively short period of time (e.g., 15 seconds).

[0107] In some embodiments, the at least one processor is further configured to increase the duration of a subsequent plasma treatment in response to determining that the plasma treatment is below a threshold. For example, if a first plasma treatment on the object lasted only 15 seconds, preventing the object from achieving a hydrophilic state (e.g., the plasma treatment was below a threshold, potentially resulting in the formation of mist on the object), the at least one processor can increase the duration of a second plasma treatment on the object to 30 seconds. The second (e.g., longer) plasma treatment can render the treated object superhydrophilic (e.g., the plasma treatment exceeds a threshold, preventing the formation of mist on the object). For example, the at least one processor 102 or 508 can increase the duration of a subsequent plasma treatment by the plasma generation field applicator 130 in response to determining that a previous plasma treatment applied to the object 200 is below a threshold for preventing mist from forming on optical elements of the object 200.

[0108] According to some embodiments, the desired level of hydrophilicity is superhydrophilic. The term "superhydrophilic" can refer to a very high level of hydrophilicity, e.g., sufficient hydrophilicity to substantially reduce the contact angle between a fluid and the surface of an object, thereby, for example, allowing the fluid to coat the surface of the object as a substantially uniform (e.g., flat) layer. In some embodiments, after increasing the hydrophilicity of an object to a desired level, the contact angle between the fluid and the superhydrophilic surface of the object can be less than about 30°, e.g., less than about 15°, or less than about 10°, measured at, for example, 20°C and atmospheric pressure. Thus, while before plasma treatment, liquid droplets may accumulate on the surface of the object, distorting the optical behavior of the object, after plasma treatment, the surface of the object can be coated with a substantially uniform layer of fluid that does not distort the optical behavior of the object in a significant way. In some embodiments, increasing the hydrophilicity of an object to a desired level enhances the surface charge and surface energy of the object, allowing water molecules to bind to the surface of the object. According to some embodiments, the effect of plasma treatment on the hydrophilicity of an object may be limited in time, for example, less than 48 hours, less than 36 hours, less than 24 hours, or less than 12 hours.

[0109] In some embodiments, the desired level of hydrophilicity may be related to the quality of the plasma treatment. "The quality of the plasma treatment" may relate to the level of hydrophilicity achieved after activating the electric and / or electromagnetic fields to generate plasma for a given duration. For example, a high-quality plasma treatment may achieve a relatively high level of hydrophilicity (e.g., achieving a surface tension on the treated surface that exceeds the surface tension of water, i.e., greater than 0.072 N / M) after activating the electric and / or electromagnetic fields for a relatively short time (e.g., 5 minutes, or 1 minute, or as short as 10 seconds, or even as short as 5 seconds).

[0110] In some embodiments, the plasma generation apparatus may include at least one sensor configured to measure at least one plasma activation parameter during plasma processing. The term "sensor" may refer to a device or element capable of sensing. For example, a sensor may detect a change in absolute value or quantity and generate a corresponding signal or data. The sensor may be a physical sensor configured to sense a physical (e.g., analog and / or digital) signal, a software sensor configured to sense a digital signal (e.g., an analog signal converted to digital format, a digital signal generated by at least one processor, or a digital signal received from another device), or a combination of physical and software sensors. The term "measurement" may relate to detecting, checking, evaluating, estimating, or quantifying an attribute, e.g., a physical attribute. The sensor may measure the attribute as an instantaneous characteristic, a time-dependent characteristic, or a combination thereof. The term "plasma activation parameter" may relate to any condition within and / or near the plasma activation zone. For example, the sensor may be a pressure sensor, a voltage sensor, a current sensor, a plasma frequency sensor, a touch sensor, a time sensor, an optical sensor, a temperature sensor, an electric field sensor, a magnetic field sensor, or any other detector for measuring parameters related to plasma processing. In some embodiments, the sensor may measure a negative pressure within at least a portion of the cavity (e.g., via a vacuum sensor). In some embodiments, the sensor can detect when at least a portion of an object (e.g., an optical element) is within the cavity, e.g., ready to be exposed to plasma. For example, the sensor can be sensitive to touch, pressure, weight, magnetic or electrical conductivity, temperature, optical properties, or any other physical attribute for detecting the presence of at least a portion of the object. The term "during plasma treatment" can refer to a time span during which the object is exposed to the plasma cloud for the purpose of increasing the hydrophilicity of the object. The time span can relate to a range of possible times, a minimum time, a maximum time, or a recommended time.In some embodiments, this time span can include the period required to generate a plasma cloud from gases present in the plasma generation zone. In some embodiments, this time span can include the period required to introduce gas into the plasma generation zone. In some embodiments, this time span can include the period required to evacuate other gases (e.g., air) from the plasma generation zone. Referring to FIGS. 5 and 11, plasma generation system 500 includes one or more sensors for measuring plasma activation parameters, such as a pressure sensor 1100 (FIG. 11) for measuring pressure, a plasma frequency sensor 512 for measuring the frequency of the plasma generated in plasma generation zone 504, and a voltage sensor 514 for measuring the voltage, e.g., between anode 340 and cathode 330 (FIG. 4).

[0111] In some embodiments, the plasma generation device may include at least one processor. The at least one processor may include electrical circuitry for performing logical operations on input signals. For example, the at least one processor may include all or part of an ASIC, microchip, microcontroller, one or more integrated circuits (ICs) including a microprocessor, CPU, GPU, APU, DSP, FPGA, or other circuitry suitable for executing computational instructions and / or capable of performing logical operations, for example, based on computational instructions or input signals. The instructions executed by the at least one processor may be preloaded into memory integrated with or embedded in the controller (e.g., processor), or may be stored in a separate memory. The memory may include RAM, cache memory, ROM, hard disk, optical disk, magnetic media, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing such instructions. In some embodiments, the at least one processor may include multiple processors. Each processor may have a similar configuration or different configurations that may be electrically connected or disconnected from each other. The processors may be separate circuits or integrated into a single circuit. Multiple processors may be configured to operate independently or cooperatively. The processors may be coupled electrically, magnetically, optically, acoustically, mechanically, or by other means that allow them to interact. The processors may be physical and / or virtual (i.e., software-based). In some embodiments, multiple processors may be distributed and collectively accessed remotely and / or locally, as known in the art of cloud computing. Referring to FIG. 5B, controller 508 illustrates an exemplary implementation of at least one processor consistent with disclosed embodiments. Similarly, at least one processor 508 illustrates another exemplary implementation of at least one processor.

[0112] In some embodiments, the at least one processor may be configured to determine, based on at least one plasma activation parameter, that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to a desired level. The term "determining" may relate to a measurement, comparison, estimation, or calculation performed by the at least one processor on the at least one plasma activation parameter and one or more additional values, for example, stored in memory or received from another device. For example, the at least one processor may determine, based on the at least one plasma activation parameter, by comparing the at least one plasma activation parameter to a value (e.g., a minimum, maximum, or average value) stored in memory before the plasma treatment. In some embodiments, the term "threshold" may relate to an aspect of the plasma treatment, such as a power level, energy level, duration, intensity, magnitude, pressure, frequency, phase, temperature, or any other attribute that may affect the effectiveness of the plasma treatment in increasing the hydrophilicity of the object. In some embodiments, the term "threshold" may refer to a characteristic of the treated object, such as the level of hydrophilicity achieved, the angle of incidence of a fluid coming into contact with the treated object, the surface tension of the treated object, the surface charge of the treated object, the variability of fluid condensed on the surface of the treated object, the optical quality achieved through the treated object after the treated object comes into contact with the fluid, and any other characteristic indicative of the level of hydrophilicity achieved by the plasma treatment. For example, the controller 508 (FIG. 5B) may determine, based on plasma activation parameters (e.g., pressure sensed by the pressure sensor 1100 of FIG. 11), that the plasma treatment provided by the plasma generation system 500 (FIGS. 5A-5C) is not sufficient (e.g., below a threshold) to increase the hydrophilicity of the optical element 390 (FIG. 2) of the endoscope 380 to a desired level to prevent condensation that reduces visibility through the viewport of the endoscope 380. As a result, the controller 508 may determine a failure of the plasma treatment. According to some embodiments, the sensor inputs may be pressure and RF voltage measurements.Pressure measurements can be taken before igniting the plasma and any changes in pressure over time (e.g., above a threshold, such as 0.3 atm) can be reported. Thus, transformer 526 (FIG. 5B) can include a sensor for the RF power so that a drop in voltage below a threshold can signal a malfunction in the plasma process.

[0113] In some embodiments, the at least one processor may be configured to output a notification indicating a malfunction of the plasma processing. The term "output" may relate to the indication of information via an interface. The information may be indicated (i.e., output) visually, for example, via a visual display, a printer, one or more light-emitting diodes or bulbs, a dial, a gauge, a meter, or any other visual indicator. In some embodiments, the information may be indicated audibly (e.g., via a speaker) or tactilely (e.g., as a vibration generated by a DC motor coupled to an eccentric rotating mass (ERM)). In some embodiments, the notification may be a binary indication revealing either the success or failure of the plasma processing. In some embodiments, the notification may further indicate which of at least one plasma activation parameters the determination of the malfunction is based on. In some embodiments, the notification may include a recommendation to adjust or calibrate one or more system parameters to remedy the malfunction of the plasma processing. In some embodiments, the notification may include a recommendation to replace or fix one or more components of the plasma generation device to remedy the malfunction of the plasma processing. In some embodiments, the notification may be a warning indicating an impending malfunction of the plasma processing. In some embodiments, the alert may relate to one or more of the system parameters and / or system components mentioned above. For example, the controller 508 (FIG. 5B) may output a notification via the display 1102 (FIG. 11) indicating a malfunction of the plasma process.

[0114] In some embodiments, the at least one sensor is configured to measure at least one plasma activation parameter by sensing a pressure in the plasma generation zone during plasma processing, and the at least one processor is further configured to determine that the plasma processing fails to meet a threshold when the pressure is outside a pressure range. The term "pressure" can refer to a strain or force exerted over an area. For example, gas contained in the plasma generation zone can exert a force on the inner wall of the plasma generation zone. The force exerted by the gas can be measured as a plasma activation parameter, which can indicate when the gas is at a pressure suitable for plasma ignition, for example, after air has been exhausted from the plasma generation zone or after gas has flowed into the plasma generation zone to ignite the plasma. The term "pressure range" can refer to one or more of a pressure window, a minimum pressure, a maximum pressure, an average pressure, or a tolerance around the average pressure. In some embodiments, the pressure suitable for plasma ignition can be less than 0.1 Atm. The at least one processor may compare the sensed pressure with a predetermined pressure range (e.g., less than 0.1 Atm) stored in memory and determine that the sensed pressure does not meet the conditions necessary for successful plasma generation. As a result, the at least one processor may determine that the plasma treatment may be malfunctioning. For example, the controller 508 (FIG. 5B) may determine, based on the pressure sensed via the pressure sensor 1100 (FIG. 11), that the plasma treatment provided to the object by the plasma generation system 500 (FIGS. 5A-5C) is not sufficient (e.g., fails to meet a threshold) to increase the hydrophilicity of the object to a desired level, such as to prevent condensation that reduces visibility through the object.

[0115] In some embodiments, the at least one sensor is configured to measure at least one plasma activation parameter by detecting a voltage at an electrode that generates plasma during plasma processing, and the at least one processor is further configured to determine that the plasma processing fails to meet a threshold when the detected voltage is outside a pressure range. The term "voltage" may refer to a potential difference (e.g., measured in volts) between two points, such as between two electrodes (e.g., between an anode and a cathode). The term "voltage range" may refer to one or more of a minimum voltage, a maximum voltage, an average voltage, or a tolerance around the average voltage. For example, the voltage detected near the plasma generation zone can determine aspects of the electric and / or electromagnetic fields that generate the plasma. The term "electrode" may refer to an electrical contact made of a conductive material, such as a metal, a semiconductor, graphite, a conductive polymer, or any other material capable of conducting electric current. The electrode may be an anode or a cathode, and current typically flows from the cathode toward the anode. Thus, in some embodiments, the at least one sensor may include a voltage sensor that measures the voltage inside or near the plasma generation zone. At least one processor can receive the measured voltage and determine whether the voltage is sufficient to drive an electric and / or electromagnetic field capable of generating a plasma to increase the hydrophilicity of the object to a desired level. The at least one processor can compare the detected voltage with a predetermined voltage range stored in memory and determine that the detected voltage does not meet the conditions necessary for successful generation of plasma. As a result, the at least one processor can determine that the plasma process may be malfunctioning. Referring to FIG. 5A, the voltage sensor 514 can measure the voltage, for example, between the anode 340 and the cathode 330 (FIG. 4). The controller 508 can receive the measurement value from the voltage sensor 514 and, based on the measurement value, determine whether the plasma process is failing to meet a threshold.

[0116] In some embodiments, the characteristics of the electric and / or electromagnetic fields capable of generating plasma from a gas may depend on the geometry of the electrodes, e.g., the shape, arrangement, and distance between the electrodes used to induce the electric field. Additionally or alternatively, the electric and / or electromagnetic fields required to generate plasma may depend on the gas used to generate the plasma. Typically, gases at high pressure require higher electric and / or electromagnetic fields (e.g., measured as voltage per unit area) to ignite plasma in the gas. However, some gases may require lower electric and / or electromagnetic fields to ignite and form plasma than other gases. For example, plasma can be ignited in helium gas at atmospheric pressure using a radio frequency (RF) field (e.g., within a frequency range between 1 MHz and 15 MHz) of approximately 7 KV across a 1 cm distance between electrodes, whereas a voltage of approximately 200 V may be sufficient when the helium gas is at a pressure of 0.8 KPa. Using a similar arrangement of electrodes with a similar field frequency, a plasma can be ignited in air at atmospheric pressure using a voltage of about 20 KV, although if the air is at a pressure of 0.8 KPa, a lower voltage, for example 800 V, may be sufficient.

[0117] In some embodiments, at least one sensor is configured to measure at least one plasma activation parameter by detecting a plasma frequency during plasma processing, and at least one processor is configured to determine that the plasma processing fails to meet a threshold value when the detected plasma frequency is outside a plasma frequency range. The term "plasma frequency," e.g., "electron plasma frequency," may refer to the frequency at which electrons (e.g., negatively charged particles) in the plasma naturally oscillate relative to ions (e.g., positively and negatively charged particles) present in the plasma. The plasma frequency may range between 2 and 20 MHz. Each type (e.g., species) of plasma may have a different frequency. The term "plasma frequency range" may refer to one or more of a minimum plasma frequency, a maximum plasma frequency, an average plasma frequency, or a tolerance around the average plasma frequency. Referring to FIG. 5A, the plasma frequency sensor 512 may measure the frequency of the plasma generated in the plasma generation zone 504. The controller 508 may receive the measurement value from the plasma frequency sensor 512 and determine whether the plasma processing fails to meet a threshold value based on the measurement value.

[0118] In some embodiments, the at least one sensor includes at least one of a pressure sensor, a voltage sensor, or a plasma frequency sensor. The pressure sensor can include one or more of a pressure transducer, a pressure transmitter, a pressure sender, a pressure indicator, a piezometer, a manometer, or any other device capable of sensing or measuring pressure. The pressure sensor may be an absolute pressure sensor that measures pressure relative to a perfect vacuum, for situations where a certain reference is required, such as for monitoring a vacuum pump. Alternatively, the pressure sensor may measure pressure relative to atmospheric or ambient pressure, or relative to a pressure different from ambient pressure. The pressure sensor may include a force collector for measuring compression, load, or stress caused by the gas pushing or being pressed against the pressure sensor (e.g., when the pressure sensor is located inside the plasma generation zone). Additionally or alternatively, the pressure sensor may include one or more vibrating components, such as a vibrating wire, a crystal (e.g., quartz), a microelectromechanical system (MEMS), or any other vibrating component sensitive to resonant frequencies, for measuring changes in the resonant frequency of the gas. The voltage sensor can sense magnetic, electric, or electromagnetic fields to calculate a voltage quantity (e.g., potential) within an object. In some embodiments, the voltage sensor can be a contact sensor having a test probe configured to contact an electrical circuit. In some embodiments, the voltage sensor can be a non-contact voltage sensor configured to sense a weak current capacitively coupled from the circuit to the voltage sensor. The plasma frequency sensor can be a resonant frequency detector configured to measure the electron density of the plasma. Referring to FIGS. 5 and 11, the voltage sensor 514 and the plasma frequency sensor 512 (FIG. 5A) can measure the voltage and plasma frequency, respectively, of the plasma generated in the plasma generation zone 504. Similarly, the frequency sensor 1100 (FIG. 11) can measure the frequency of the plasma generated in the plasma generation zone 504 (FIG. 5A).The controller 508 (FIG. 5B) may receive measurements from one or more of the voltage sensor 514, the plasma frequency sensor 512, or the frequency sensor 1100 and, based on the measurements, may determine whether the plasma process is failing to meet the threshold.

[0119] In some embodiments, the plasma generation apparatus may further include a gas reservoir configured to flow gas into the plasma generation zone to perform the plasma treatment, and the at least one processor may be further configured to determine, based on gas characteristics, that the plasma treatment fails to meet a threshold. The term "gas reservoir" may refer to a sealable tank, balloon, or canister configured to contain a gas, e.g., at a pressure higher or lower than atmospheric pressure. In some embodiments, the gas reservoir may be portable, e.g., for a single plasma treatment. In some embodiments, the gas reservoir is a non-portable central gas reservoir. The gas reservoir may be configured to be fluidly connected to the plasma generation zone of the plasma generation apparatus, e.g., via a hose. The gas reservoir may be further configured to be fluidly connected to one or more pumps and / or valves for controlling and slowing the flow of gas from the gas reservoir to the plasma generation zone.

[0120] In some embodiments, the object is an endoscope, and the plasma generation device further includes a detachable sheath sized to receive the distal end of the endoscope, and the plasma generation zone is configured to apply plasma treatment to the distal end of the endoscope within the sheath. The term "detachable" may refer to being removable or separable. For example, the sheath may be removable from the distal end of the endoscope and the plasma generation device. The term "sheath" or "protective shroud" may refer to a covering or support structure that fits around the object. For example, the sheath may enclose optical elements of a medical device. In an exemplary embodiment, the sheath may be an elongated, flexible, disposable tube that retains a portion of the medical device within the sheath when the medical device is inserted into the plasma generation zone. In some embodiments, the sheath may include an authentication element (e.g., an RFID tag or any other automatically detectable identification device) that allows at least one processor to test the sheath before operating the plasma generation device with the sheath. The authentication element enables the at least one processor to determine whether the sheath is new and / or whether it has been used an acceptable number of times. Additionally or alternatively, the authentication element enables the at least one processor to test the sheath to determine whether it is from an approved manufacturer. Without such verification, an unauthorized sheath may be used, compromising sterility and / or effectiveness in suppressing spray on an object. The term "sized" may refer to something sized or designed (e.g., configured or constructed) according to measured proportions, e.g., length, width, and / or height. For example, the sheath may be sized to accommodate the distal end of an endoscope. The term "endoscope" may include any of the medical scopes described above. For example, an endoscope includes an elongated, tubular instrument having a light sensor (e.g., a camera) and a light source disposed at its distal end. An endoscope may be used to examine the human body, for example, during a medical procedure commonly referred to as endoscopy.For example, the distal end of an endoscope can be placed inside a removable sheath, and the sheath with the distal end of the endoscope can be placed inside the plasma generation zone so that the distal end of the endoscope is exposed to the plasma cloud while inside the sheath, for example, to perform plasma treatment. After plasma treatment is completed, the endoscope can be removed from the plasma generation zone while inside the sheath to maintain sterility, or the endoscope can be completely removed from the housing while the sheath remains within the housing. Protective shroud 110 in FIG. 1A, protective shroud 310 in FIG. 2, and sheath 800 in FIG. 8A are some examples of sheaths according to disclosed embodiments. As another example, protective shroud 310 can be sized (e.g., dimensioned) to receive distal end 382 of endoscope 380 (FIG. 2), with viewport 390 provided at distal end 382. Plasma generation zone 504 (FIG. 5A) applies plasma treatment to distal end 382 , thereby allowing plasma treatment to be applied to viewport 390 while viewport 390 is within protective shroud 310 .

[0121] In some embodiments, the plasma generation zone is configured to contain a plasma cloud on a first side of the dielectric barrier while an object is disposed on a second side of the dielectric barrier. The disk 344 in Figures 3A-3B shows an exemplary implementation of a dielectric barrier that separates an anode 340 positioned on one side of the disk 344 from a cathode 330 positioned on the other side of the disk 344. A plasma cloud can form on the cathode side 330, to which a viewport 390 of an endoscope 380 is exposed, while preventing arcing.

[0122] In some embodiments, the plasma generation apparatus further includes a plasma generator configured, upon activation, to form a plasma cloud within the plasma generation zone, and the at least one processor further configured to activate the plasma generator for a duration sufficient to increase the hydrophilicity of the object to a desired level. The plasma generators of FIGS. 5A-5C illustrate exemplary implementations of plasma generators according to disclosed embodiments. The plasma generator 506, upon activation, e.g., via the controller 508, can form a plasma cloud within the plasma generation zone 504. The controller 508 can further activate the plasma generator for a duration sufficient to increase the hydrophilicity of the viewport 390 (FIG. 2) of the endoscope 380 to a desired level, e.g., to prevent the formation of a mist on the viewport 390 during an endoscopic procedure.

[0123] In some embodiments, the desired level of hydrophilicity of the object is such that a liquid droplet striking the surface of the object has a contact angle of less than 10 degrees for at least 1 hour after plasma treatment. In some embodiments, the contact angle of a liquid droplet striking the surface after at least 1 hour of treatment can be less than 8.5 degrees, or less than 7.5 degrees.

[0124] The contact angle can indicate a degree of hydrophilicity, e.g., a desired or threshold level of hydrophilicity necessary for use of the object, such as for a medical procedure. The desired contact angle (e.g., less than 10 degrees, less than 8.5 degrees, or less than 7.5 degrees) can be related to the desired optical quality of the object's optical elements when the object is used for a medical procedure. Referring to FIG. 2 , the viewport 390 of an endoscope 380 can be treated with a plasma according to the present disclosure, such that for at least one hour after plasma treatment, the surface tension of the viewport 390 is greater than that of water, resulting in a contact angle of a water droplet striking the surface of the viewport 390 below 10 degrees. As a result, the viewport 390 can be substantially free from spray accumulation for at least one hour after plasma treatment, and the endoscope 380 can be used for a medical procedure and provide high optical quality.

[0125] FIG. 16 is a block diagram of an exemplary process 1600 for generating a plasma to treat an object, consistent with embodiments of the present disclosure. While the block diagram may be described below with reference to specific implementation embodiments shown in other figures, these implementations are provided for illustrative purposes only and are not intended to serve as limitations on the block diagram of FIG. 16. Because example processes are described throughout this disclosure, these aspects will not be repeated or will only be summarized with reference to FIG. 16. In some embodiments, process 1600 may be executed by at least one processor (e.g., controller 508 of FIG. 5B ) to perform the operations or functions described herein. In some embodiments, some aspects of process 1600 may be implemented as software (e.g., program code or instructions) stored in memory provided in at least one processor, or as a non-transitory computer-readable medium. In some embodiments, some aspects of process 1600 may be implemented as hardware (e.g., dedicated circuitry). In some embodiments, process 1600 may be implemented as a combination of software and hardware.

[0126] 16 includes process blocks 1602-1610. In block 1602, the entry of an object into the plasma generation zone is identified. This can be done, for example, via a processing means (e.g., controller 508 of FIG. 5B). For example, controller 508 can identify that distal end 382 (FIG. 2) positioned with viewport 390 of endoscope 380 enters plasma generation zone 504 of plasma generation system 500.

[0127] In block 1604, a circuit for supplying energy to generate plasma in a plasma generation zone can be activated to perform a plasma treatment to increase the hydrophilicity of the object to a desired level. For example, the at least one processor 508 can activate the circuit 106 to supply energy from the power source 104 to the device 130 to generate plasma in a plasma generation zone of the device 130 to perform the plasma treatment on the object 200. Alternatively, activation of the circuit can be performed by a switch or sensor that determines the ingress of the object. The plasma treatment can be controlled by the at least one processor 508 to increase the hydrophilicity of the object 200 to a desired level, for example, to prevent fluid from condensing as droplets on the optical surfaces of the object 200. As another example, controller 508 (FIG. 5B) can operate a circuit (e.g., circuit 700 of FIG. 7) to provide energy to cathode 330 and anode 340 via conductors 354 and 358 (FIG. 3A) (e.g., via cable 112 of FIG. 1A) to generate plasma within plasma generation zone 504 of plasma generation system 500. The plasma treatment can increase the hydrophilicity of viewport 390 (FIG. 3A) of endoscope 380 to a desired level. The desired level can be related to a desired optical quality when using endoscope 380 during a subsequent medical procedure.

[0128] In block 1606, at least one plasma activation parameter is measured during the plasma processing. As used in this context, "measuring" may refer to one or more of detecting, sensing, determining, or obtaining a value indicative of the plasma activation parameter. For example, controller 508 (FIG. 5B) may measure a pressure parameter related to the plasma processing via pressure sensor 1100 (FIG. 11). Additionally or alternatively, controller 508 may measure a voltage parameter related to the plasma processing via voltage sensor 514. Similarly, controller 508 may measure a plasma frequency parameter related to the plasma processing via plasma frequency sensor 514.

[0129] At block 1608, a determination is made that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to a desired level. For example, the controller 508 (FIG. 5B) may determine, based on a pressure parameter measured by the pressure sensor 1100 (FIG. 11), that the plasma treatment provided by the plasma generation system 500 is below a threshold for increasing the hydrophilicity of the viewport 390 of the endoscope 380 to a desired level (e.g., to ensure a desired optical quality when the endoscope 380 is subsequently used in a medical procedure). In a similar manner, the controller 508 may determine, based on a voltage parameter measured by the voltage sensor 514 and / or a plasma frequency parameter measured by the plasma frequency sensor 512, that the plasma treatment provided by the plasma generation system 500 is below a threshold.

[0130] A notification indicating a malfunction of the plasma process may be output at block 1610. For example, the controller 508 (FIG. 5B) may display a notification via the display 1102 (FIG. 11) indicating that a malfunction of the plasma process has occurred.

[0131] To facilitate treating an object with plasma, the plasma generating device may automatically trigger plasma generation upon detecting the insertion of an object (i.e., within a bore in the housing of the plasma generating device). The bore may be provided with one or more sensors for detecting the insertion of an object. The one or more sensors may communicate information related to the detection to at least one processor configured to, for example, automatically trigger plasma treatment of the object. When plasma generation occurs in a vacuum (e.g., a partial vacuum), a signal may be received from the vacuum sensor, and it may be determined that sufficient negative pressure exists for plasma generation. Once a determination of sufficient negative pressure is made, the plasma may be generated by supplying energy to the electrodes, and the object may be exposed to the plasma. For medical scopes, where speed, efficiency, and sterility are important, being able to use plasma to treat optical systems with limited human intervention can provide significant benefits.

[0132] In some embodiments, the at least one processor may trigger a plasma treatment corresponding to the type of object, e.g., based on information received from one or more sensors. For example, a first object may be of a type that requires a shorter plasma treatment than a second object that requires a longer plasma treatment. Alternatively, the first object may have a different hydrophilicity threshold (e.g., corresponding to preventing fogging for different applications and uses) than the second object. Thus, the at least one processor may trigger different plasma treatments for each of the first and second objects that correspond to the different hydrophilicity thresholds.

[0133] In some embodiments, an apparatus for treating an elongated tool with plasma may be provided. The term “apparatus” may include any apparatus or combination of components capable of treating an object with plasma, for example, by transforming a gas (e.g., igniting the gas) to transition the gas into a plasma state or plasma cloud and exposing the object to the plasma cloud. Plasma generation systems 100 (FIG. 1A) and 500 (FIGS. 5A-5C), as well as plasma applicator 348 (FIG. 3A), illustrate exemplary implementations of plasma generation apparatuses according to disclosed embodiments. The term “elongated tool” may refer to an object having a length that is substantially greater than its width. Object 200 (FIG. 1B), endoscope 380 (FIG. 2), and endoscope 802 (FIG. 8A) illustrate exemplary implementations of elongated tools. The term “plasma” may refer to a state of matter rich in charged particles, e.g., electrons and ions. As a result, plasma may be highly conductive and sensitive to electric and / or electromagnetic fields.

[0134] In some embodiments, the device may include a bore in the housing, which may have an open end on a surface of the housing for insertion of an elongated tool therein. The term "bore" may refer to a cavity, chamber, crevice, or pit capable of accommodating an object. The bore may accommodate at least a portion of the object inside the plasma generation zone, exposing at least a portion of the object to the plasma cloud. For example, the bore may accommodate an optical element of an endoscope, exposing the optical element to the plasma cloud generated by igniting gases flowing into the bore. This may increase the hydrophilicity of the optical element, thereby preventing the formation of a spray when the optical element is subsequently inserted into the body. In some embodiments, the bore may have an elongated shape to accommodate an elongated tool. The surface of the housing may include an opening exposing an entrance to the elongated bore. The opening allows the elongated tool to be inserted into the bore. Examples of apertures located within the housing of the plasma generating device may be represented by slot 132 (FIGS. 1A and 1C), aperture 350 (FIG. 3A), aperture 450 (FIG. 3C), cavity 502 (FIGS. 5A-5C), and aperture 900 (FIG. 9). Proximal openings 142 (FIG. 1D) and 314 (FIG. 2) illustrate exemplary implementations of open ends of apertures on the surface of the housing, consistent with disclosed embodiments.

[0135] In some embodiments, the apparatus includes at least one vacuum pump for creating a vacuum within at least a portion of the cavity. The term "vacuum" may refer to a region having a gas-phase pressure substantially lower than atmospheric or ambient pressure. As used herein, the term "vacuum" is intended to include a partial vacuum. That is, in the context of this disclosure, a vacuum includes an enclosed space from which at least a portion of air or other gases has been removed. The term "vacuum pump" may refer to an apparatus that draws or sucks particles from an enclosed volume to create a vacuum within the volume. Examples of vacuum pumps for creating a vacuum can be seen in FIG. 10A, which depicts multiple vacuum pumps (e.g., vacuum pumps 1000A, 1000B, 1000C, and 1000D). One or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D may be configured to create a vacuum within at least a portion of a hole, such as slot 132 (FIGS. 1A and 1C), hole 350 (FIG. 3A), hole 450 (FIG. 3C), cavity 502 (FIGS. 5A-5C), and hole 900 (FIG. 9).

[0136] In some embodiments, the device includes an insertion detector for determining when an elongated tool is inserted into the bore. An “insertion detector” may refer to any sensor capable of detecting the insertion of an object into the bore, such as a touch sensor that detects contact with an object, an optical sensor that can detect line of sight obstruction by an object in the bore or reflection of light by an object in the bore, a pressure sensor that can detect pressure exerted by an object, a weight sensor that can detect the weight of an object, a voltage and / or current sensor that can detect a change in electrical potential and / or current caused by the insertion of an object into the bore, and any other sensor capable of sensing an object. In some embodiments, the insertion detector may include a wireless receiver for detecting an identification tag associated with the object, such as an RFID tag (e.g., an authentication tag), and may be included in a sheath provided to retain the object in the bore, for example. In some embodiments, the insertion detector may include a mechanical sensor to detect tearing of a hermetic seal covering an entrance to the bore. Non-limiting examples of insertion detectors include one or both of the transmitter 24650 and transponder 24654 shown in Figures 25A-25E.

[0137] For example, electrodes 704A and 704B ( FIG. 7 ) configured to come into physical contact with an object illustrate an exemplary implementation of a sensor (e.g., a voltage sensor) for detecting the insertion of an object into an aperture. Electrodes 704A and 704B may be configured to electrically couple the inserted object to a cathode and / or anode associated with the aperture, thereby facilitating detection of when an object is inserted into the aperture. As another example, a sensor (not shown) associated with frangible hermetic screen 518 ( FIG. 4 ) and configured to emit a signal when frangible hermetic screen 518 breaks upon insertion of an elongated object into the aperture may illustrate another exemplary implementation for detecting when an object is inserted into the aperture. As another example, pressure sensor 1100 ( FIG. 11 ) may illustrate another exemplary implementation of an insertion sensor according to disclosed embodiments. The signal sensed by the insertion sensor can be provided to at least one processor (e.g., at least one processor 102 of FIG. 1A and / or controller 508 of FIG. 5B) using wired and / or wireless communication means. Based on the insertion signal, the at least one processor can determine the insertion of an object (e.g., object 200 of FIG. 1B, endoscope 380 of FIG. 2, or endoscope 802 of FIG. 8A) into the bore (e.g., slot 132 of FIG. 1A, bore 350 of FIG. 3A, bore 450 of FIG. 3C, cavity 502 of FIGS. 5A-5C, or bore 900 of FIG. 9).

[0138] In some embodiments, the device includes a vacuum sensor associated with the housing to determine the degree of negative pressure within at least a portion of the bore. In some embodiments, the vacuum sensor can include a pressure transducer, which can, for example, measure pressure and convert the pressure into an electrical signal via one or more strain gauges. In some embodiments, the vacuum sensor can sense pressure relative to a threshold value and output a binary signal indicating that the pressure is above or below the threshold. In some embodiments, the vacuum sensor can output an electrical signal proportional to the measured pressure. The vacuum sensor can be positioned proximate to the bore, for example, in fluid communication with the bore, to determine the degree of negative pressure inside the bore. Pressure sensor 1100 (FIG. 11) illustrates an exemplary implementation of a vacuum sensor according to disclosed embodiments. Pressure sensor 1100 can be enclosed within (e.g., associated with) housing 510 (FIGS. 5A-5C) and can determine the degree of negative pressure within cavity (e.g., bore) 502.

[0139] In some embodiments, the apparatus may include a plasma generator for generating plasma within the bore. The term "plasma generator" may refer to an apparatus configured to generate plasma, for example, inside a plasma generation zone. The term "plasma generation zone" may refer to a physical volume or space in which a plasma cloud can be formed, for example, by igniting a gas introduced therein. The plasma generation zone may be any size. For example, the plasma generation zone may be 15 cm 3 Less than 10cm 3 Less than or equal to 5cm 3The plasma generator can generate an electromagnetic field within a plasma generation zone such that when a gas is exposed to the electromagnetic field, the gas can be ignited and plasma can be generated. Plasma applicators 130 (FIG. 1A) and 348 (FIG. 3A) and the plasma generators of FIGS. 5A-5C (e.g., including at least first electrical contact 522, second electrical contact 524, an energy source such as battery 530, and transformer 526) illustrate exemplary implementations of plasma generators according to disclosed embodiments. Plasma applicators 130 and 348 and the plasma generators of FIGS. 5A-5C can be configured to generate plasma within slot 132, hole 350, and cavity 502, respectively.

[0140] In some embodiments, the apparatus includes at least one processor. In some embodiments, the at least one processor is configured to receive an insertion signal from the insertion detector indicating that the elongated tool is within the bore. The term "insertion signal" may refer to any signal indicating the presence of the elongated tool within the bore. For example, the output of any of the insertion detectors described above may constitute the insertion signal. In some embodiments, the insertion signal may be an analog signal (e.g., as an analog value or signal received from an analog insertion detector). In some embodiments, the insertion signal may be a digital signal (e.g., received by a digital device such as a digital processor, digital filter, diode, or any other device capable of providing a digital signal). In some embodiments, the insertion signal may be a binary signal indicating whether the elongated tool has been inserted into the bore. In some embodiments, the insertion signal may be a value equivalent to one or more threshold values ​​(e.g., stored in memory) for determining (e.g., by the at least one processor) whether the elongated tool has been inserted into the bore. In some embodiments, the insertion signal may include one or more of a touch signal from a touch sensor indicating physical contact between the elongated tool (or a sheath enclosing the elongated tool) and the bore, an optical signal from an optical sensor indicating line of sight obstruction or light reflection by an elongated object in the bore, a pressure signal from a pressure sensor indicating pressure exerted by an elongated object in the bore, a weight signal from a weight sensor indicating weight exerted by an elongated object in the bore, a voltage (and / or current) signal from a voltage (and / or current) sensor indicating a voltage (and / or current) level caused by inserting an elongated object into the bore, a wireless signal from a wireless receiver indicating insertion of an elongated object (e.g., associated with an authentication tag such as an RFID tag) into the bore, or any other measure indicative of insertion of an elongated object into the bore. For example, as described herein with reference to FIGS. 24 and 25A-25E, the identification signal from the transponder 24654 may correspond to an insertion signal from an insertion detector.

[0141] In some embodiments, the insertion signal may be associated with an insertion detector configured with a sheath encasing the elongated tool. For example, the sheath may be provided with at least one electrode and at least one sheath electrical contact configured to electrically contact a corresponding contact in the plasma generating device when the sheath is inserted into the bore. As another example, the sheath may be provided with an authentication tag, such as an RFID tag, that transmits a radio signal receivable by a radio receiver associated with the bore. In some embodiments, the insertion signal may be mechanical in nature, for example, associated with tearing of a hermetic seal covering the entrance to the bore. In some embodiments, the insertion signal may be associated with a portion of the elongated tool, for example, the distal end of the elongated tool. For example, the insertion detector may emit an insertion signal when the distal end of the elongated tool is inserted into the bore.

[0142] An exemplary implementation of an insertion sensor configured to transmit an insertion signal may be shown in FIG. 7. For example, upon insertion of a medical device 708 (e.g., an elongated tool) into the bore 712, electrodes 702A and 702B may be electrically coupled to the medical device 708 via electrodes 704A and 704B, thereby electrically coupling, for example, the medical device 708 or 200 ( FIG. 1A ) to the power source 530. As a result, either of electrodes 702A and 702B or 704A and 704B may transmit a voltage signal as an insertion signal indicative of the insertion of an object into the bore. Similarly, detecting a breach in the hermetic screen 518 ( FIG. 4 ) by the endoscope 380 (e.g., an elongated tool) when the endoscope 380 is inserted into the sheath 510 (e.g., with the sheath 510 fitted inside the bore of the device) may be another exemplary implementation of an insertion signal for detecting when an object is inserted into the bore. As another example, when endoscope 810 (FIG. 8) is inserted into sheath 800 (e.g., with sheath 800 fitting inside the bore of the device), the pressure sensed by pressure sensor 1100 (FIG. 11) may constitute an additional exemplary implementation of an insertion signal received from an insertion detector according to disclosed embodiments. The insertion sensor can transmit an insertion signal indicating the insertion to at least one processor (e.g., at least one processor 102 of FIG. 1A and / or controller 508 (FIG. 5B)) using wired and / or wireless communication means. Based on the insertion signal, the at least one processor 102 and / or controller 508 can determine that an elongated object (e.g., object 200 of FIG. 1B, endoscope 380 of FIG. 2, medical device 708 (FIG. 7), or endoscope 802 of FIG. 8A) has been inserted into a hole (e.g., slot 132 of FIG. 1A, hole 350 of FIG. 3A, hole 450 of FIG. 3C, cavity 502 of FIGS. 5A-5C, and hole 900 of FIG. 9).

[0143] In some embodiments, the at least one processor may be further configured to, in response to the insertion signal, activate at least one vacuum pump to generate a negative pressure within at least a portion of the bore. The term "activate" may refer to triggering (e.g., by issuing an electrical signal), turning on or switching on, or performing any other action to initiate pumping by the vacuum pump. The term "negative pressure" may refer to an air or gas pressure that is less than or lower than a reference pressure, such as atmospheric or ambient pressure. In some embodiments, the pressure may be less than 0.3 atm, or less than 0.2 atm, or less than 0.1 atm. In some embodiments, the effective pressure range may be between 0.300 and 0.001 atm. In some embodiments, the effective pressure range may be between 0.1 and 0.01 atm. The term "at least a portion of the bore" may refer to a section or region of the bore that is proximate the elongate tool such that a negative pressure is applied at least partially within the bore in the region of the elongate tool. Upon activation by the at least one processor, in response to receiving an insertion signal, the vacuum pump may generate a relatively low pressure (e.g., a negative pressure) to draw out (e.g., suck out) air and / or gas present within the bore, thereby reducing the pressure of the air and / or gas within the bore, at least in the area surrounding the elongated tool, relative to a base pressure.

[0144] For example, at least one processor 102 ( FIG. 1A ) or controller 508 ( FIG. 5B ) can receive an insertion signal from an insertion detector, such as a pressure signal from pressure sensor 1100 ( FIG. 11 ), a voltage signal from one or more of electrodes 704A and 704B ( FIG. 7 ), a signal indicative of a breach in hermetic screen 518 ( FIG. 4 ), and any of the other pressure sensing implementations described above. In response to the insertion signal, at least one processor 102 and / or controller 508 can activate at least one vacuum pump (e.g., vacuum pumps 1000A, 1000B, 1000C, and 1000D of FIG. 10A ) to generate a negative pressure (e.g., suction) within at least a portion of the aperture (e.g., slot 132 of FIGS. 1A and 1C , aperture 350 of FIG. 3A , aperture 450 of FIG. 3C , cavity 502 of FIG. 5A , or aperture 900 of FIG. 9 ). In some embodiments, at least a portion of the bore can be proximate the elongated object, and thus, negative pressure can be generated proximate the elongated tool (e.g., object 200 in FIG. 1B, endoscope 380 in FIG. 2, or endoscope 802 in FIG. 8A) within the bore.

[0145] In some embodiments, the at least one processor is configured to receive a signal from the vacuum sensor and determine therefrom that the negative pressure within at least a portion of the cavity is sufficient to generate plasma. The term "sufficient to generate plasma" may refer to a gas pressure low enough to allow any remaining gas, or any gas introduced after generating the negative pressure within the cavity, to ionize and generate plasma. Additionally, or alternatively, the negative pressure generated by the vacuum pump may be low enough so that the ratio or percentage of a specific type of gas (e.g., helium, argon, or nitrogen) introduced into the cavity after generating the negative pressure (e.g., after drawing air from the cavity) meets a gas concentration threshold required to generate a specific type of plasma corresponding to the specific type of gas.

[0146] For example, at least one processor 102 (FIG. 1A) and / or controller 508 (FIG. 5B) can receive signals from one or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) and determine from the signals that the pressure within at least a portion of the apertures, e.g., a portion of slot 132 (FIGS. 1A and 1C), aperture 350 (FIG. 3A), aperture 450 (FIG. 3C), cavity 502 (FIGS. 5A-5C), aperture 712 (FIG. 7), and aperture 900 (FIG. 9), is sufficiently low to generate plasma, e.g., by plasma applicator 130 (FIG. 1A), plasma applicator 348 (FIG. 3A), or a plasma generator of FIGS. 5A-5C. In some embodiments, the negative pressure may be facilitated by hose 364 (FIG. 3A) fluidly connecting the apertures to the vacuum pump. In some embodiments, the negative pressure may be maintained by a seal, such as vacuum seal 370 (FIG. 3A). In some embodiments, a pressure low enough (e.g., negative relative to base pressure) for plasma generation may be less than 0.3 atm, or less than 0.2 atm, or less than 0.1 atm. In some embodiments, the effective pressure range may be between 0.300 and 0.001 atm. In some embodiments, the effective pressure range may be between 0.1 and 0.01 atm.

[0147] In some embodiments, the generation of negative pressure and activation of the plasma generator occurs automatically in response to detecting the presence of an elongated tool within the bore. The term "automatically" can refer to direct, spontaneous, or consequential without intervention or action from outside the plasma generation system, such as by a human operator. Thus, the plasma generator may be activated automatically, e.g., directly, without intervention by agents and / or components external to the plasma generation device, or may be activated as a result of detecting the insertion of an elongated tool within the bore. For example, in response to detecting via an insertion sensor that an elongated tool (e.g., object 200 of FIG. 1B, endoscope 380 of FIG. 3A, medical instrument 708 of FIG. 7, or endoscope 802 of FIG. 8A) is within a cavity (e.g., slot 132 of FIG. 1A, cavity 350 of FIG. 3A, cavity 450 of FIG. 3C, cavity 502 of FIGS. 5A-5C, cavity 712 of FIG. 7, and cavity 900 of FIG. 9), at least one processor (e.g., processor 102 or controller 508) may, for example, One or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) may be activated to generate a negative pressure within the cavity and further activate the plasma generator, e.g., plasma generator 130 of FIGS. 5A-5C, automatically without intervention by agents or components external to the plasma generator (e.g., plasma applicator 130 of FIG. 1A, plasma applicator 348 of FIG. 3A, or plasma generator of FIGS. 5A-5C).

[0148] In some embodiments, the at least one processor is configured to expose the distal end region of the elongate tool to plasma by activating the plasma generator after a determination is made that the negative pressure within at least a portion of the bore is sufficient for plasma generation. The term "activate" may refer to triggering, turning on or switching on (e.g., by emitting an electrical signal), or performing any other action that initiates the generation of plasma by the plasma generator, for example, by initiating the generation of an electric and / or electromagnetic field in the plasma generator that can ignite plasma within the bore. For example, after determining that the pressure within one of the apertures, e.g., slot 132 (FIGS. 1A and 1C), aperture 350 (FIG. 3A), aperture 450 (FIG. 3C), cavity 502 (FIGS. 5A-5C), and aperture 900 (FIG. 9), is sufficiently low to generate plasma, at least one processor (e.g., processor 102 or controller 508) can expose the distal end of the elongated object to the plasma by sending an activation signal to plasma applicator 130, plasma applicator 348 (FIG. 3A), or any of the plasma generators of FIGS. 5A-5C to initiate plasma generation within at least a portion of the aperture, e.g., near distal end 210 of object 200 (FIG. 1B), distal end 382 with optical element 392 of endoscope 380 (FIG. 2), or optical surface 706 of medical device 708 (FIG. 7).

[0149] According to some embodiments, the bore is configured to receive a sheath therein, the sheath being sized to receive an elongated tool, and the device is further configured to induce plasma generation within the sheath. The terms "sheath" or "protective shroud" can interchangeably refer to a cover or support structure that houses an object or portion thereof. For example, the sheath can enclose optical elements of a medical device. In an exemplary embodiment, the sheath can be an elongated, disposable tube for housing a portion of a medical device when the medical device is inserted into a plasma generation zone. In some embodiments, the sheath can include an authentication element (e.g., an RFID tag or any other automatically detectable identification device) that allows the at least one processor to test the sheath before operation of the plasma generation device equipped with the sheath. The authentication element allows the at least one processor to determine whether the sheath is new and / or has been used an acceptable number of times. Additionally or alternatively, the authentication element may enable the at least one processor to test the sheath to determine whether it is from an approved manufacturer, thereby preventing the use of an unauthorized sheath that compromises sterility and / or effectiveness in suppressing spray on an object. The term "sized to receive an elongated tool" may refer to being formed, configured, or shaped to accommodate an object having dimensions corresponding to the elongated tool. Thus, the sheath may be formed to allow the elongated tool to be inserted therein. Similarly, the aperture may be shaped and / or sized to accommodate the sheath with the elongated tool inserted therein. The sheath may further be configured to allow the distal end of the elongated tool to be exposed to the plasma cloud while encased within the sheath.

[0150] For example, protective shrouds (a.k.a. sheaths) 310 (FIG. 2), 310a (FIG. 3A), 410 (FIG. 3C), and 800 (FIG. 9) are exemplary implementations of sheaths sized to receive an elongated tool, such as endoscope 380, consistent with disclosed embodiments. In some embodiments, the distal end of the elongated tool may be first introduced into the sheath. Plasma applicator 130 (FIG. 1A), plasma applicator 348, or the plasma generator of FIGS. 5A-5C may be provided with apertures, such as slot 132, aperture 350, or cavity 502, respectively, which may be configured to receive the above-referenced sheaths therein. Additionally, the sheath may be provided with one or more electrodes (e.g., cathode 330 and anode 340 in FIGS. 3A and 3C ) configured to be electrically coupled to a power source (e.g., power source 104 and / or 530), such as by electrical conductors 354 and 356, respectively. The cathode 330 and anode 340 may generate an electric and / or electromagnetic field and maintain a potential for generating plasma near the distal end (e.g., viewport 390) of the endoscope 380, which is positioned inside the sheath. Gas for generating plasma (e.g., helium, argon, nitrogen) may be flowed into the sheath 410 near the viewport 390 at the distal end of the endoscope 380, for example, via hose 364. The electric and / or electromagnetic field thus generated may ignite the gas flowing into the sheath, forming a plasma cloud near the viewport 390, thereby exposing the viewport 390 at the distal end of the endoscope 380 to plasma.

[0151] In some embodiments, the insertion detector is configured to sense the insertion of an elongated tool within the sheath in the bore and automatically initiate a plasma generation process upon sensing the insertion of the elongated tool within the sheath. The term "automatically" may refer to a direct result, as discussed above, without requiring intervention from outside the plasma generating device. According to some embodiments, the term "automatically initiating a plasma generation process" may refer to generating plasma independently (e.g., by bypassing) a controller, such that the detector directly triggers plasma generation. Thus, the plasma generation process may be automatically triggered upon insertion of an elongated tool within a sheath positioned within the bore of the plasma generating device. For example, FIGS. 1A, 3C, and 5A collectively illustrate exemplary implementations for an insertion detector configured to sense the insertion of an elongated tool within the sheath in the bore and automatically initiate plasma generation, consistent with disclosed embodiments. The sheath 410 (FIG. 3C) includes a cathode 330 configured to contact a metal surface 384, e.g., at the distal end of the endoscope 380. Upon insertion of endoscope 380 into sheath 410 positioned within bore 450, cathode 330 may become electrically coupled to endoscope 380 via metal surface 384. Cathode 330 may further be electrically coupled to power source 530, thereby electrically coupling endoscope 380 to power source 530 upon insertion of endoscope 380 into sheath 410 within bore 450. This electrical coupling allows at least one processor 102 (FIG. 1A) or controller 508 (FIG. 5B) to detect insertion of endoscope 380 into sheath 410 inside bore 450, such as by receiving an electrical signal from cathode 330, e.g., via circuit 106 or 700. Upon receiving the electrical signal (e.g., the insertion signal), the at least one processor may automatically activate a plasma generator, such as plasma applicator 130 (FIG. 1A), plasma applicator 348 (FIG. 3A), or the plasma generator of FIGS. 5A-5C.

[0152] According to some embodiments, the hole includes an electrical contact therein, configured to engage with a contact on the sheath to enable plasma generation within the sheath. The term "electrical contact" may refer to an electrical circuit component having a conductive section (e.g., made of a metal or semiconductor) that allows an electrical current to pass when the electrical contact is electrically coupled (e.g., physically contacted) with another electrical contact. The term "engage" may refer to joining, attaching, or connecting for the purpose of interacting. Thus, electrically coupling the hole's electrical contact to the sheath's electrical contact allows an electrical current to pass from an external power source into the sheath, for example, for the purpose of generating an electromagnetic field within the sheath to generate plasma.

[0153] 3A illustrates an exemplary implementation of a cavity 350 including electrical contacts therein configured to engage contacts on a sheath, consistent with disclosed embodiments. The cavity 350 may include a cathode contactor 352 configured to be coupled to an external power source (e.g., power source 104 and / or 530) via electrical conductors 354. The cathode contactor 352 may further be configured to be electrically coupled to and engage with the cathode 330 of the protective shroud 310a (e.g., sheath), thereby electrically coupling the cathode 330 of the protective shroud 310a to the external power source. The cavity 350 may further include an anode contactor 356, which may be configured to be electrically coupled to and engage with the anode 340 of the protective shroud 310a while the protective shroud 310a is positioned within the cavity 350. As a result, an electrical potential can be generated within the protective shroud 310a, for example, between the cathode 330 (electrically coupled to a power source) and the anode 340. This electrical potential may enable a plasma-generating electromagnetic field to be generated within the protective shroud 310a. The electromagnetic field can ignite gases present within the protective shroud 310a, generating a plasma cloud therein.

[0154] In some embodiments, the sheath includes a vacuum port and a vacuum seal therein, the vacuum port being fluidly connectable to at least one vacuum pump when positioned within the bore to enable generation of negative pressure within the sheath, and the vacuum seal being configured to engage the elongate tool upon insertion into the sheath to maintain negative pressure distal to the elongate tool (i.e., immediately proximate the distal end of the elongate tool when inserted into the sheath within the bore). The term "vacuum port" may refer to an opening configured to allow aspiration of gas or fluid, e.g., from the sheath, upon fluid connection to a vacuum source or pump, e.g., via a hose. The term "vacuum seal" may refer to a plug, closure, ring, flap, engagement, or fastener that is substantially impervious to gas or fluid leakage when the system is used within normal operating parameters. The term "fluidly connectable" may refer to being fluidly coupled, e.g., joined or attached, in a manner that allows fluid (e.g., including gas) to flow therethrough. The sheath may thus be fluidly coupled (e.g., in fluid communication) to at least one vacuum pump via a vacuum port and a vacuum seal. This arrangement may allow gas and / or air present within the sheath to be drawn in, creating a low-pressure zone (e.g., a relative vacuum relative to a reference pressure) within the sheath for the purpose of generating plasma. In some embodiments, one or more vacuum seals may be provided with the sheath encasing the elongated tool. The one or more vacuum seals may be adapted to fit over the outer diameter of the elongated tool, such that when the elongated tool is inserted into the sheath, the elongated tool may engage with the one or more vacuum seals, thereby sealing the interior of the sheath from the exterior of the sheath (e.g., via the elongated tool surrounded by the vacuum seal). This sealing may allow a pressure differential (e.g., gas concentration differential) to be maintained between the interior and exterior of the sheath, thereby assisting in plasma generation in plasma processing.

[0155] 3C and 10A , taken together, illustrate an exemplary implementation of a sheath including a vacuum port and a vacuum seal, where the vacuum port is fluidly connectable to at least one vacuum pump, consistent with disclosed embodiments. The sheath 410 can be configured with a sheath gas port 404 (e.g., a vacuum port) and a vacuum seal 408. The sheath gas port 404 can be fluidly connected to an applicator gas port 402 of the plasma applicator 448, which in turn can be fluidly connected to a vacuum source, such as one or more vacuum pumps 1000A, 1000B, 1000C, and 1000D in FIG. 10A , via a hose 364, thereby fluidly connecting the vacuum source to the interior of the sheath 410. The vacuum seal 408, e.g., an O-ring, can prevent leakage of gas or air, for example, from inside the sheath 410 through the hose 364 and into the space of the hole 450 on the outside of the sheath 410. As a result, when gas (e.g., air) is pumped out of the sheath 410 via the hose 364, it may create a low-pressure zone relative to ambient pressure within the sheath 410. Additionally, the vacuum seal 320 may engage the endoscope 380 to seal the interior of the sheath 410 (e.g., within which the distal end of the endoscope 380 resides) from the exterior of the sheath 410 (e.g., the space between the sheath 410 and the bore 450). Thus, the sealing sheath 410 may facilitate maintaining a negative pressure (e.g., relative to ambient pressure) inside the sheath 410.

[0156] In some embodiments, the elongated tool is a scope having an optical element located within its distal end region. The term "scope" can refer to a medical instrument configured to allow inspection or observation, such as an arthroscope, endoscope (as defined above), laparoscope, stethoscope, or microscope. The term "optical element," as described above, can refer to a component through which light passes or is reflected. A scope can be configured with an optical element that allows visual inspection. The optical element can be located in the distal end region of the scope so that when the scope is inserted into a bore, for example, from the distal end region, the optical element can be immersed within the bore, for example, near a plasma generation zone associated with the bore. Thus, the optical element can be exposed to the plasma cloud after activating the plasma generator. FIG. 3A shows an exemplary implementation of a scope having an optical element located in its distal end region, consistent with disclosed embodiments. The optical element 392 can be configured such that a viewport 390 is located at the distal end of the endoscope 380. When endoscope 380 is inserted distal-end-first into protective shroud 310a inside bore 450, viewport 390 with optical element 392 may be immersed within protective shroud 310a between cathode 330 and anode 340. When positioned in this manner, optical element 392 located in the distal end region of endoscope 380 may be exposed to a plasma cloud generated, for example, by an electromagnetic field generated by the electrical potential between cathode 330 and anode.

[0157] In some embodiments, at least one processor is configured to maintain operation of the plasma generator for a period of time sufficient to render the exterior surface of the optical element hydrophilic. The term "hydrophilic" may refer to the tendency or preference of a molecule to be hydrated. A hydrophilic compound may have thermodynamic properties that allow the compound to more readily bond with water molecules than a non-hydrophilic compound, e.g., a hydrophobic compound that does not readily bond with water (e.g., polar) molecules. A hydrophilic object may be wettable, allowing the liquid (e.g., water) to maintain contact with the object due to intermolecular interactions that balance adhesive and cohesive forces between the liquid and the object. The plasma generators of Figures 5A, 5B, and 5C illustrate exemplary implementations of plasma generators according to disclosed embodiments. At least one processor 102 (FIG. 1A) or controller 508 may maintain operation of the plasma applicator 130 or plasma generator of FIGS. 5A and 5B, respectively, for a length of time sufficient to render the outer surface of the optical element 392 of the viewport 390 hydrophilic, for example, to prevent a mist from forming on the viewport 390 during an endoscopy procedure. According to some disclosed embodiments, the period of time sufficient to render the optical element 392 hydrophilic may be less than 1 minute, less than 45 seconds, less than 30 seconds, or less than 15 seconds.

[0158] In some embodiments, the at least one processor is further configured to output a signal indicating a processing status of the plasma generator to a display. The term "display" may refer to an output device that visually presents information. A display may include, for example, a screen, one or more LEDs or bulbs, a dial, a gauge, a meter, or any other means for visually rendering data. Collectively, FIGS. 5A and 11 illustrate an exemplary embodiment of the display 1102 of FIG. 11 that outputs a signal (e.g., "alert") indicating a processing status of the plasma generator, consistent with disclosed embodiments. The controller 508 (FIG. 5B) can output a signal indicating a plasma processing status by the plasma generator of FIGS. 5A-5C to the display 1102.

[0159] In some embodiments, the at least one processor is further configured to calculate the number of plasma treatments remaining before required maintenance. The term "maintenance" may refer to repairing, servicing, restoring, or otherwise ensuring continued functionality. For example, required maintenance of a plasma generator may relate to any of charging a battery, replacing a power supply, replacing a seal, replacing or cleaning an electrical contact, replacing or cleaning a filter, refilling a gas canister, replacing a hose, fastening a wire, or performing any other action that affects plasma treatment by the plasma generator. At least one processor 102 (FIG. 1A) or controller 508 (FIG. 5B) illustrate exemplary implementations of at least one processor configured to calculate the number of plasma treatments remaining before maintenance of the apparatus is required, according to disclosed embodiments. For example, the at least one processor 102 may monitor one or more factors affecting subsequent plasma treatments by the plasma applicator 130, such as by recording the number of plasma treatments already performed, monitoring the status of the power source (e.g., battery) 530, monitoring the duration of the plasma treatment, monitoring the amount of gas remaining in the gas reservoir, monitoring the pressure in the plasma generation zone, monitoring the status (e.g., conductivity) of the cathode 330 and the anode 340, monitoring the pressure maintained in the borehole that indicates a seal failure, or any other measure that may affect the plasma treatments by the plasma applicator. Based on the one or more factors, the at least one processor 102 may determine the number of treatments that can be performed by the plasma applicator 130 before maintenance is required. Similarly, the controller 508 may monitor one or more factors affecting subsequent plasma treatments by the plasma generation system 500 to determine the number of plasma treatments remaining before maintenance is required.

[0160] In some embodiments, the at least one processor is further configured to detect a malfunction of at least one of the plasma generator or the at least one vacuum pump and output a malfunction indicator. The term "malfunction" may refer to a fault or defect that adversely affects performance. The term "outputting a malfunction indicator" may refer to indicating the malfunction via a user interface, for example, visually (e.g., via a display screen, warning light, gauge, or dial), audibly (e.g., via a speaker emitting a beep), as a vibration generated using an ERM, etc. At least one processor 102 ( FIG. 1A ) and controller 508 ( FIG. 5B ) illustrate an example implementation of at least one processor configured to detect a malfunction of the plasma generator or the vacuum pump and output a malfunction indicator according to disclosed embodiments. For example, the controller 508 can detect a malfunction of the plasma generation system 500 (e.g., by detecting insufficient power stored in the power supply 530, insufficient gas held in the gas reservoir, insufficient low pressure in the plasma generation zone 502, a faulty seal, a faulty wire or electrical contact, insufficient electromagnetic field generated in the plasma generation zone 502, and any other factor affecting the performance of the plasma generation system 500). Similarly, the controller 508 can detect a malfunction of one or more of the vacuum pumps 1000A, 1000B, 1000C, and 1000D, for example, by detecting insufficient low pressure in the plasma generation zone 502 or by detecting insufficient plasma generating gas flowing into the plasma generation zone 502. As a result, the controller 508 can output a malfunction indicator (e.g., "WARNING") via the display 1102 (FIG. 11). In a similar manner, the at least one processor 102 can detect a malfunction in any of the plasma applicator 130 and vacuum pumps 1000A, 1000B, 1000C, and 1000D and output a malfunction indicator via the display 1102.

[0161] In some embodiments, the at least one processor is further configured to output a warning signal when the optical element has not been sufficiently treated to achieve the predetermined level of hydrophilicity. The term "predetermined level of hydrophilicity" may refer to a level of hydrophilicity that allows a sufficient level of performance (e.g., optical quality) when the elongated object is used for a procedure, such as a medical procedure. For example, if the elongated tool is an endoscope, the predetermined level of hydrophilicity may correspond to a level of hydrophilicity that allows sufficient unobstructed visibility through the endoscope (e.g., due to spraying) for the entire duration of a colonoscopy, e.g., one hour. However, if the elongated tool is a dental mirror, the predetermined level of hydrophilicity may correspond to several minutes of unobstructed visibility through the mirror. In some embodiments, the predetermined level of hydrophilicity may be stored in memory corresponding to one or more system parameters necessary to achieve the predetermined level of hydrophilicity. Such system parameters may include time, temperature, pressure level, electromagnetic field parameters, gas species, gas level, battery level, and any other parameters that affect plasma processing. The at least one processor can identify the elongated tool, for example, based on the RFID tag, and can obtain one or more system parameters necessary to achieve a predetermined level of hydrophilicity corresponding to the elongated tool. The at least one processor can measure the one or more system parameters to determine if the optical element is not sufficiently processed and, in response, output a warning signal.

[0162] 11 shows an exemplary embodiment of a display 1102 that outputs a warning signal indicating that an optical element, e.g., optical element 392 of FIG. 3A, has not been sufficiently treated to achieve a predetermined level of hydrophilicity. For example, at least one processor 102 (FIG. 1A) or controller 508 (FIGS. 5A-5C) may retrieve the predetermined hydrophilicity level, e.g., from memory 108, after identifying the elongated tool based on the RFID tag, and determine that the plasma treatment applied to optical element 392 of endoscope 380 by plasma applicator 130 or plasma generator of FIGS. 5A-5C is not sufficient to achieve the predetermined level of hydrophilicity based on, e.g., the timing of the treatment, the type of gas used, the type of material treated, the intended use, the pressure level, the electromagnetic field characteristics, or any other parameters affecting the plasma treatment.

[0163] In some embodiments, a warning signal is output if the optical element is not sufficiently processed to achieve sufficient hydrophilicity. The term “sufficiently hydrophilic” can refer to a level of hydrophilicity that allows a threshold of optical quality for visibility, such as during a medical procedure. For example, if the elongated tool is an endoscope, sufficient hydrophilicity may correspond to allowing an unobstructed view through the endoscope's viewport (e.g., due to spray) throughout a colonoscopy procedure. As another example, if the elongated tool is configured for a procedure that requires the elongated tool's viewport to be immersed in air, such as a laparoscopy procedure, sufficient hydrophilicity may correspond to allowing an unobstructed view through the viewport throughout the procedure due to fogging or condensation. Collectively, FIGS. 5A, 5B, and 5C and FIG. 11 illustrate an exemplary embodiment of a display 1102 that outputs a warning signal to indicate that an optical element, such as optical element 392 of FIG. 3A, has not been sufficiently processed to achieve sufficient hydrophilicity, e.g., a level of hydrophilicity that allows viewing through optical element 392 when performing a colonoscopy using endoscope 380.

[0164] In some embodiments, the elongated tool includes a lens, and the at least one processor is configured to activate the plasma generator for a period of time sufficient to cause the lens to become superhydrophilic. The term "lens" can refer to an optical element that transmits light. The lens may be made of glass, plastic, or other crystals with refractive properties. The lens may also include a transparent protective cover with minimal or no refractive properties. The term "superhydrophilic" can refer to a very high level of hydrophilicity, e.g., hydrophilic enough to substantially reduce the contact angle between a fluid and the surface of an object, e.g., allowing the fluid to coat the surface of the object as a substantially uniform (e.g., flat) layer. In some embodiments, after increasing the hydrophilicity of the object to a desired level, the contact angle between the fluid and the superhydrophilic surface of the object may be less than about 5°, e.g., less than about 4°, less than about 3°, less than about 2°, less than about 1°, or even about 0°, e.g., when measured at 20°C and atmospheric pressure. For example, at least one processor can detect the insertion of a lens (or an element associated with the lens) and, based on the detection, activate a plasma generator to expose the lens to plasma for a period of time to make the lens superhydrophilic. FIG. 3A illustrates an exemplary embodiment of an elongated tool (e.g., endoscope 380) including a lens (e.g., optical element 392 of viewport 390). Upon detecting optical element 392 (e.g., via an RFID tag disposed with endoscope 380), at least one processor 102 ( FIG. 1A ) or controller 508 ( FIG. 5B ) can activate plasma generator 130 or the plasma generators of FIGS. 5A-5C for a period of time (e.g., between 15 seconds and 1 minute) sufficient to make optical element 392 superhydrophilic.

[0165] In some embodiments, the period of time sufficient to render the surface of the optical element hydrophilic is a period of time sufficient to render the surface of the optical element superhydrophilic. For example, when processor 102 (FIG. 1A) or controller 508 (FIG. 5B) activates plasma generator 130 or the plasma generators of FIGS. 5A-5C, respectively, to render the surface of optical element 392 of endoscope 380 hydrophilic, the surface of optical element 392 of endoscope 380 can become superhydrophilic. The processor can determine that superhydrophilicity has been reached based on one or more of the duration, pressure, temperature, and identity of the object being treated of the plasma exposure.

[0166] In some embodiments, the plasma generator is configured to cause a dielectric barrier discharge. The term "dielectric barrier discharge" may refer to a discharge between two electrodes when the electrodes are separated by an insulating dielectric barrier. FIGS. 3A-3B illustrate a plasma generator consistent with disclosed embodiments that, when activated, can cause a dielectric barrier discharge. The cathode 330 and anode 340 of the plasma applicator 348 are separated by a dielectric barrier 344. When separated by the dielectric barrier 344, a potential may be generated between the cathode 330 and the anode 340, causing or resulting in a dielectric barrier discharge. FIG. 3C illustrates another exemplary implementation of a plasma generator consistent with disclosed embodiments that, when activated, causes or results in a dielectric barrier discharge.

[0167] In some embodiments, the at least one processor is configured to control the plasma generator in a manner that causes a voltage drop of at least 1000 volts. The term "voltage drop" may refer to the difference in voltage or potential between two electrodes, such as between a cathode and an anode. At least one processor 102 (FIG. 1A) or controller 508 (FIG. 5B) illustrates an exemplary implementation of at least one processor configured to control a plasma generator (e.g., plasma generator 130 and the plasma generators of FIGS. 5A-5C, or plasma applicator 348). For example, the at least one processor can cause a voltage drop of at least 1000 V between cathode 330 and one of anodes 340 or 440 by modifying the electrical signal provided from power supply 530 to cathode 330 via circuit 106 or 700.

[0168] FIG. 17 is a block diagram of an exemplary process 1700 for treating an elongated tool with plasma, consistent with embodiments of the present disclosure. While the block diagram may be described below with reference to specific implementation embodiments shown in other figures, these implementations are provided for illustrative purposes only and are not intended to serve as limitations on the block diagram. Because example processes are described throughout this disclosure, these aspects will not be repeated or will merely be summarized with reference to FIG. 17. In some embodiments, process 1700 may be executed by at least one processor (e.g., at least one processor 102 of FIG. 1A or controller 508 of FIG. 5B) to perform the operations or functions described herein. In some embodiments, some aspects of process 1700 may be implemented as software (e.g., program code or instructions) stored in memory (e.g., memory 108) provided to at least one processor, or as a non-transitory computer-readable medium. In some embodiments, some aspects of process 1700 may be implemented as hardware (e.g., dedicated circuitry). In some embodiments, process 1700 may be implemented as a combination of software and hardware. Unless otherwise indicated, the sequence of process blocks may be arbitrary, the order in which one or more process blocks are performed may be changed, and one or more process blocks may be omitted.

[0169] FIG. 17 includes process blocks 1702-1710. In block 1702, an elongated tool is detected within the bore of the housing, the elongated tool including an optical element on its distal end. The detection may include determining, sensing, or identifying the elongated tool within the bore. The detection may further include detecting the elongated tool within a sheath housed within the bore. For example, the controller 508 (FIG. 5B) may identify that an endoscope 380 (FIG. 3A) is within the bore 502 of the housing 510. The endoscope 380 may include an optical element 392 configured such that a viewport 390 is positioned at the distal end of the endoscope 380. When the endoscope 380 is inserted into the bore 502, the optical element 392 can be located within the plasma generation zone 504 of the bore 502. The detection may also include determining that a protective sheath (eg, 310 or 410 ) surrounding the elongated tool 380 is also within the bore 450 .

[0170] In block 1704, upon detecting a tool within the bore, a negative pressure is generated within at least a portion of the bore in the region of the optical element. Generating negative pressure may include removing gas or air such that the pressure is less than atmospheric within at least some region of the bore (e.g., within the sheath within the bore). For example, upon detecting that endoscope 380 (FIG. 2) is inserted into bore 502 (FIG. 5A) of housing 510, controller 508 may activate one or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A). This may generate negative pressure within plasma generation zone 504 of bore 502, e.g., in the region of optical element 392 of endoscope 380.

[0171] In block 1706, the plasma generator is activated during the negative pressure period, thereby exposing the optical element to plasma for a period sufficient to render the surface of the optical element hydrophilic. Activation of the plasma generator can be performed in any of the ways described above. For example, controller 508 (FIG. 5B) can activate the plasma generators of FIGS. 5A-5C during the period when one or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) create negative pressure inside plasma generation zone 504. This exposes optical element 392 of endoscope 380 to plasma for a period of time (e.g., in the range of 15 seconds to 1 minute), rendering the surface of optical element 392 hydrophilic and preventing the accumulation of spray on optical element 392 during subsequent endoscopic examinations.

[0172] In block 1708, the generation of negative pressure and the activation of the plasma generator occur automatically in response to detecting the presence of an elongated tool within the bore. This can occur automatically in any of the manners described above. For example, in response to detecting the presence of endoscope 380 (FIG. 3A) within cavity 502 (FIG. 5A), controller 508 can automatically activate one or more of vacuum pumps 1000A, 1000B, 1000C, and 1000D (FIG. 10A) to generate negative pressure within cavity 502 and activate a plasma generator (e.g., the plasma generators of FIGS. 5A-5C), e.g., without intervention from outside of system 500.

[0173] In block 1710, the distal end region of the elongated tool is exposed to the plasma within the sheath, the bore is configured to receive the sheath therein, and the sheath is sized to receive the elongated tool. This can be done in any of the manners previously described. For example, the sheath 410 (FIG. 3C) can be sized to receive (e.g., house) the endoscope 380. Additionally, the bore 350 may be configured to receive the sheath 410 therein, e.g., by being sized to house the sheath 410 and configured to electrically couple the cathode 330 of the sheath 410 to the power source 530, such as via the cathode contactor 352 and the electrical conductor 354. Thus, electrically coupling the cathode 330 of the sheath 410 may generate an electromagnetic field within the sheath 410, which may generate a plasma near the distal end region (e.g., the optical element 392) of the endoscope 380. This may allow the distal end region of the endoscope 380 to be exposed to the plasma within the sheath 410 .

[0174] In block 1712, if the optical element has not been sufficiently processed to achieve sufficient hydrophilicity, a warning signal is output. The warning signal and insufficiency determination can be performed in any of the ways previously described. For example, the controller 508 (FIG. 5B) may determine the tool type corresponding to the optical element 392 (FIG. 3C) of the endoscope 380 via an RFID tag or a camera provided on the sheath 410, for example. The controller 508 can retrieve one or more parameters, for example, from the memory 108 (FIG. 1A), to perform processing to achieve sufficient hydrophilicity of the optical element 392. For example, the one or more parameters may relate to the amount of power available via power supply 530, the level of negative pressure generated by any of vacuum pumps 1000A, 1000B, 1000C, and 1000D ( FIG. 10A ), the type of gas entering plasma generation zone 504, the pressure of the gas or air within plasma generation zone 504, the characteristics of the electromagnetic field generated between cathode 330 and any of anodes 340 or 440, timing parameters, temperature parameters, and any other parameters that affect plasma processing by system 100 or 500. Controller 508 may obtain one or more measurements related to the plasma process applied to optical element 392 (e.g., via one or more sensors) and determine that optical element 392 is not sufficiently hydrophilic based on the one or more measurements and the one or more parameters. Accordingly, controller 508 may output a warning, such as via display 1102 ( FIG. 11 ).

[0175] Some disclosed embodiments include suppressing condensation distortion on optical elements of a medical instrument configured for insertion into a body cavity. Condensation may include moisture, moisture, wetting, droplets, or any other phenomenon in which water or other fluids collect on a surface. For example, condensation may include the formation of water droplets on a surface such as glass. Condensation distortion may include exaggeration, blurring, misrepresentation, distortion, or any other change caused by condensation that makes something appear different from its actual appearance. For example, condensation distortion may include a sprayy image viewed through a glass surface when the glass surface is covered with water droplets. During surgical procedures, condensation distortion causes various problems, including lens fogging, limiting clear visualization during such procedures. Therefore, suppressing condensation distortion is desirable. Suppressing condensation distortion may include restricting, suppressing, blocking, impeding, inhibiting, preventing, minimizing, or any other method of limiting condensation distortion. For example, inhibiting condensation distortion on a glass surface can include reducing fogging on the surface by limiting the number or size of water droplets that accumulate on the surface. Some disclosed embodiments include the use of an apparatus. The apparatus can include any one or more, individually or in combination, of accessories, devices, parts, equipment, machines, mechanisms, or arrangements configured to achieve any of the functions disclosed herein.

[0176] An optical element may include a lens, prism, mirror, or any other part of an optical instrument that either reflects light or allows light to pass through. Because water collecting on the surface of an optical element can distort the characteristics of light passing through the optical element, it may be desirable to suppress condensation distortion on the optical element. For example, an optical element may include a lens of a medical instrument such as an endoscope. A medical instrument may include a scope, catheter, tube, or any other device used on an internal or external body site for the diagnosis or treatment of a medical condition. A body cavity may include the peritoneum, dorsal cavity, cranial cavity, spinal cavity, ventral cavity, thoracic cavity, abdominopelvic cavity, abdominal cavity, pelvic cavity, intestine, stomach, esophagus, lungs, blood vessels, organs, or any other space or compartment within the body. In some examples, a body cavity may include a space housing multiple organs, such as the thoracic cavity. In other examples, a body cavity may include a single organ, such as the heart. In still other examples, a body cavity may include a blood vessel, such as the aorta. Insertion into a body cavity can include introducing, injecting, entering, implanting, implanting, or any other method of placement within a body cavity. In one example, insertion into a body cavity can include introducing an endoscope into a blood vessel by guiding the endoscope into the blood vessel.

[0177] Some disclosed embodiments include a housing. The housing can include any support structure, frame, cage, enclosure, or enclosure capable of housing any component of any device or method disclosed herein. The housing can be made of any suitable material, such as plastic, metal, glass, wood, or any other material capable of encasing a plasma generating device. In some embodiments, the housing can include one or more insulating materials that can insulate the plasma generating device enclosed therein from one or more environmental conditions, such as electric and / or electromagnetic fields, light, humidity, temperature, shock, mechanical and / or acoustic vibrations, and any other environmental attributes that may affect plasma generation by the plasma generating device.

[0178] Some embodiments include a cavity within the housing sized to removably retain at least a portion of a medical device therein, the portion including an optical element. The cavity may include a chamber, recess, tub, hole, pocket, aperture, indentation, socket, or any other type of open space within the housing. Removably retaining at least a portion of a medical device within the housing may include containing, holding, maintaining, locating, collecting, securing, or otherwise retaining any part, section, segment, component, element, element, unit, or any other portion of the entire medical device within the housing. The portion including the optical element may include the entire portion including the optical element or a portion of the portion including the optical element. For example, the cavity may include a bore formed in the housing, and the portion of the medical device may include the distal end of an endoscope including a lens configured to slide in and out of the bore.

[0179] Some disclosed embodiments include a plasma activation zone within the cavity, the plasma activation zone positioned such that the optical element is located within the plasma activation zone when at least a portion of the medical device is retained within the cavity. The plasma activation zone can include a physical volume or space in which a plasma cloud can be formed, for example, by igniting a gas introduced therein. The plasma activation zone can be any size. For example, the plasma activation zone can be 15 cm 3 Less than 10cm 3 Less than 5cm 3 Less than 3cm 3 Less than 2cm 3 Less than or equal to 1.4 cm 3In some instances, an electromagnetic field can be generated within the plasma activation zone, causing the gas to ignite and generate plasma when exposed to the field. The term "plasma" can refer to a state of matter rich in charged particles, e.g., electrons and ions. As a result, plasma can be highly conductive and sensitive to electric and / or electromagnetic fields. In some instances, the plasma is a low-temperature plasma, i.e., it contains electrons with much higher energy than ions. Low-temperature plasma can be particularly advantageous in applications involving frequent use of medical devices that may be sensitive to harsh treatments. It may be desirable to expose optical surfaces to plasma to improve the hydrophilicity of optical elements. Specifically, during hydrophilization, the surface is oxidized, and the bombardment of plasma ions forms hydroxyl groups on the surface. These hydroxyl groups are polar, and water, being polar, is attracted to the hydroxyl groups. Ultimately, this increases the surface's wettability and adhesion, thereby making the surface more hydrophilic.

[0180] Some disclosed embodiments include a plasma generator configured to operate to cause the formation of a plasma cloud within a plasma activation zone near the optical element. The plasma generator can include, for example, a device configured to generate plasma within the plasma activation zone. In some examples, the plasma is formed within the plasma generator by creating a vacuum within the chamber. In some embodiments, a small amount of gas can be channeled into the chamber, and when its molecules become ionized, it undergoes a phase change from gas to plasma. When surfaces are bombarded by plasma ions within the plasma generator chamber, the surfaces are modified on a very small scale. These plasma processes can alter surfaces by improving their adhesive capabilities, such as by making them hydrophilic or even superhydrophilic. In other examples, the plasma can be generated within a nozzle and then ejected with a stream of compressed air. The plasma cloud can include any volume of plasma generated by the plasma generator. The plasma generator can cause the formation of a plasma cloud within the plasma activation zone by any manner of generating or activating plasma, including arc discharge or corona discharge.

[0181] In some embodiments, the plasma generator induces the formation of a plasma cloud through a dielectric barrier discharge. A dielectric barrier discharge occurs between two electrodes separated by a dielectric. The presence of a dielectric barrier allows plasma sources such as these to operate with high-voltage sine waves or pulses. The discharge may consist of multiple microdischarges, but in some cases, a uniform discharge may occur as well. A pre-ionization system can be used to increase uniformity and the discharge gap. In dielectric barrier discharge embodiments, air (as opposed to a separate gas flow) may serve as the basis for plasma formation. The vicinity of an optical element can include an area within the optical element, the environment of the optical element, or any region near or around the optical element. In one example, a plasma cloud near an optical element may include a plasma cloud surrounding the optical element. In another example, a plasma cloud near an optical element may include a plasma cloud near a portion of the optical element.

[0182] Some disclosed embodiments include a controller configured to activate the plasma generator for a period of time sufficient to render the optical element hydrophilic prior to insertion into the body cavity. The controller may be configured to allow a user of the device to operate and control the device to activate the plasma generator. Thus, the controller may include one or more command switches and one or more controllers, e.g., physical or virtual switches, buttons, and controllers. The controller may further include indicators, e.g., indication LEDs, a display, to provide a user with data and information necessary to operate the device, and, in some cases, operating software executable by at least one processor to provide a user with operation and command screens to enable the user to operate and command the device to activate the plasma generator. The controller (e.g., at least one processor) may include electrical circuitry for performing logical operations on input signals. For example, the controller can include all or part of an ASIC, microchip, microcontroller, one or more integrated circuits (ICs) including a microprocessor, a CPU, a GPU, an APU, a DSP, an FPGA, or other circuitry suitable for executing computational instructions and / or capable of performing logical operations, e.g., based on computational instructions or input signals. The instructions executed by the controller may be preloaded into memory integrated or embedded in the processor, or may be stored in a separate memory. The memory may include RAM, cache memory, ROM, a hard disk, an optical disk, a magnetic medium, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing such instructions. The memory may also store data, which may include one or more inputs for executing one or more program code instructions and one or more outputs generated by executing one or more program code instructions. In some embodiments, the controller may include multiple processors.Each processor may have a similar configuration or different configurations that may be electrically connected or disconnected from one another. The processors may be separate circuits or integrated into a single circuit. Multiple processors may be configured to operate independently or in concert. The processors may be coupled electrically, magnetically, optically, acoustically, mechanically, or by other means that allow them to interact. The processors may be physical and / or virtual (i.e., software-based).

[0183] 5A-5C show three views of a plasma generation system 500 according to some embodiments of the present disclosure. As shown, the plasma generation system 500 can include a housing 510 having a cavity 502 and can house a plasma activation zone 504, a plasma generator 506, and a controller 508. The plasma generation system 500 can include a plasma activation zone 504 within the cavity 502, which can be positioned such that when at least a portion of a medical device having an optical element (e.g., an endoscope having a viewport) is retained within the cavity 502, the optical element is located within the plasma activation zone 504. The plasma generator 506 can generate plasma for treating an object (e.g., a medical device) within the plasma activation zone 504 according to embodiments disclosed herein. The cavity 502 can provide access to the plasma activation zone 504, allowing an object to be inserted into the plasma activation zone 504, for example, to perform plasma treatment to increase the hydrophilicity of the object. The controller 508 may control one or more aspects of the plasma generator 506, such as the flow of gas into and / or out of the plasma activation zone 504 to generate the plasma, the generation of the electric and / or electromagnetic fields to generate the plasma, and any other parameters associated with plasma generation by the plasma generator 506. The plasma generation system 500 may further include one or more sensors, such as a pressure sensor, a voltage sensor 514, and a plasma frequency sensor 512.

[0184] A period of time sufficient to render the optical element hydrophilic prior to insertion into a body cavity can include any time necessary for any desired procedure involving the optical element to produce a desired level of hydrophilicity of the optical element. In some examples, a period of time sufficient to render the optical element hydrophilic prior to insertion into a body cavity can be less than 1 minute, less than 45 seconds, less than 30 seconds, or less than 15 seconds.

[0185] In some embodiments, the medical device includes a scope having an elongated shaft, the cavity including an elongated channel for receiving the elongated shaft, and the plasma activation zone located proximate to the distal end of the elongated channel. The scope may include any instrument as described in more detail herein for viewing or examining any part of the body. The elongated shaft may include any long, narrow portion or section of the scope. The elongated channel may include any open or closed circuit. In some examples, the elongated channel may be tubular. The distal end of the elongated channel may include any portion located away from a specific region of the elongated channel, including the center of the elongated channel. In some examples, the distal end may include a portion of the elongated channel further away from the center of the elongated channel. In some examples, the distal end of the elongated channel may include both ends of the elongated channel.

[0186] In some embodiments, the scope includes a laparoscope or endoscope. As used herein, "endoscope" can include any scope having a distal end configured to be inserted into a patient's body and a proximal end configured to remain outside the patient's body during a procedure. In some embodiments, the optical element includes a lens element on the distal end of the elongated shaft. The lens element may include any transmissive optical device that focuses or disperses a light beam by refraction. A lens element can consist of a single piece of transparent material or several lenses, usually arranged along a common axis. The lens element may be made of materials such as glass or plastic. Typically, the distal end includes a viewport, such as a lens or window, or the bare end of an optical fiber, or even a mirror (e.g., a dental mirror). Through the viewport, the scope allows for the collection of an image of the surroundings of the viewport using a photosensitive device, such as a CCD. The viewport may be intended to collect light from the front of the device (i.e., from a region coincident with the longitudinal axis of the device), or the viewport may be tilted at an angle relative to the longitudinal axis or oriented perpendicular to the longitudinal axis of the device (e.g., as demonstrated in colonoscopy). The proximal end typically includes or is connected to a handle, which is held by the surgeon and optionally includes user interface components such as switches, navigation sticks, touchscreens, and touchpads. Endoscopes include a wide range of scopes, such as bronchoscopes, colonoscopes, cystoscopes, and laparoscopes. Laparoscopes, as a specific example, include a rigid or relatively rigid rod or shaft that includes a viewport and optionally includes an objective lens at its distal end and an eyepiece and / or integrated visual display at its proximal end. Scopes can also be connected to a remote visual display device or video camera to record the surgical procedure.

[0187] In some embodiments, the elongate channel is sized to receive a sheath that surrounds the portion of the elongate shaft that includes the optical element. A sheath can include any covering or support structure that fits around an object. For example, the sheath can enclose the optical element of a medical device. In one exemplary embodiment, the sheath can be an elongate, flexible, disposable tube that retains a portion of the medical device within the sheath when the medical device is inserted into the plasma activation zone. The term "sized to receive a sheath" can refer to being formed, configured, or shaped to accommodate an object having dimensions corresponding to the sheath. Thus, the elongate object can be shaped to allow the sheath to be inserted therein.

[0188] In some embodiments, the sheath is formed from a dielectric material. The dielectric material may include any electrical insulator that can be polarized by an applied electric field. The dielectric material may include glass, quartz, ceramics, or polymers. The dielectric material may be of any thickness necessary to achieve the desired dielectric effect. In some examples, the dielectric material may comprise the entire sheath. In other examples, the dielectric material may comprise only a portion of the sheath.

[0189] In some embodiments, the housing is configured such that a sheath surrounds the optical element when the optical element is within the plasma activation zone. The sheath surrounds the optical element when the optical element is within the plasma activation zone, but may include a sheath that encapsulates, surrounds, contains, or is otherwise disposed about any of the periphery of the optical element when the optical element is within the plasma activation zone. In some examples, the sheath can surround the entire optical element when the optical element is within the plasma activation zone. In other examples, the sheath can surround only a portion of the optical element when the optical element is within the plasma activation zone.

[0190] In some embodiments, the plasma cloud is further configured to generate a plasma cloud within the sheath. Generating a plasma cloud within the sheath may include causing the plasma cloud to be generated, activated, expanded, or any form of existence within the sheath. In some examples, the plasma cloud may be generated within the sheath. In other examples, the plasma cloud may be generated outside the sheath and then transported within the sheath. In some examples, the entire plasma cloud may be generated within the sheath. In other examples, only a portion of the plasma cloud may be generated within the sheath.

[0191] In some embodiments, the cavity is configured to receive a sheath, the sheath containing a sheath electrode therein and an external electrical contact, and the cavity contains an internal contact configured to allow energy to be supplied to the sheath electrode by forming an electrical connection with the external contact when the sheath is positioned within the cavity. The sheath may include any covering or support structure that fits around an object, as described above. The sheath electrode may include any electrical conductor used to make an electrical connection. For example, it may be electrically connected to a non-metallic portion of a circuit associated with the sheath. The electrical contact may include any electrical circuit component having a conductive section (e.g., made of a metal or semiconductor) through which an electric current can pass when the electrical contact is electrically coupled to another electrical circuit component (e.g., when in physical contact or when allowing a circuit to be completed without physical contact). The external electrical contact may include any electrical contact that can be disposed on the outer surface of the sheath. The internal contact may include any electrical contact that can be disposed on the inner surface of the cavity. The electrical connection may include any structure that allows electricity to flow through. The energy supply can include any source of electrical energy, such as a battery. Forming an electrical connection between the internal contact of the cavity and the external contact of the sheath allows for passing an electrical current from an external power source into the interior of the sheath, for example, to generate an electromagnetic field within the sheath and generate a plasma.

[0192] In some embodiments, at least a partial vacuum is established within a region that includes the plasma activation zone. A vacuum (interchangeably referred to herein as at least a partial vacuum) can include any region that has a gas-phase pressure substantially below atmospheric or ambient pressure. In some examples, a vacuum includes any free space that lacks sufficient particle barrier to allow the formation of a plasma.

[0193] Some embodiments include at least one pump configured to establish at least a partial vacuum within the sheath in the region of the sheath electrode. The pump configured to establish at least a partial vacuum within the sheath in the region of the sheath electrode can include any device that draws or aspirates particles from an enclosed volume to lower the ambient pressure within the volume. In some examples, the pump may establish the at least a partial vacuum by applying a negative pressure between 0.1 atm and about 0.01 atm. The region of the sheath electrode can include any region within a desired range of the sheath electrode. In some examples, the pump may establish a partial vacuum within the sheath directly over the sheath electrode. In other examples, the pump may establish a partial vacuum within the sheath electrode at a distance from the sheath electrode.

[0194] In some embodiments, the housing includes a housing electrode therein. The housing electrode may include any electrical conductor used to electrically connect with another portion of a circuit. For example, it may contact or otherwise electrically connect with a metallic or non-metallic portion of a circuit associated with the sheath. The housing electrode can be positioned anywhere on the housing. In some examples, the housing electrode may be connected to the housing. In other examples, the housing electrode may be incorporated either inside or outside the body of the housing.

[0195] In some embodiments, the housing electrode is configured to form an electrical circuit with the sheath electrode when the sheath is inserted into the elongate channel. The electrical circuit may include any closed-loop network that provides a return path for current flow. In some examples, the housing electrode may form an electrical circuit with the sheath electrode when the entire sheath is inserted into the elongate channel. In other examples, the housing electrode may form an electrical circuit with the sheath electrode when only a portion of the sheath is inserted into the elongate channel. In certain examples, partial contact between the sheath electrode and the housing electrode may be sufficient to form an electrical circuit. In other examples, the sheath electrode and the housing electrode may be spaced apart, and a closed loop may occur when current passes through a gap between the housing electrode and the sheath electrode. Such a gap may at least partially coincide with the plasma generation zone.

[0196] Some embodiments further include a circuit for transmitting power to the sheath electrode. The circuit may include any closed-loop network that provides a return path for current flow, as described herein. Transmitting power to the sheath electrode may include any manner of supplying power to the sheath electrode from a power source, such as a battery. For example, forming an electrical connection between an internal contact of the cavity and an external contact of the sheath may allow current to pass from the battery to the interior of the sheath, thereby transmitting power from the battery to the sheath electrode. As described above, a closed loop includes a loop in which a gap exists between the electrodes, as long as current can flow through the gap, such as when plasma is formed in the gap.

[0197] In some embodiments, the at least one pump includes multiple interconnected pumps. Multiple interconnected pumps may include two or more pumps interconnected as described herein. In some cases, it may be desirable to use multiple interconnected pumps instead of a single pump to achieve a higher vacuum level than would be possible using a single pump. In other examples, it may be desirable to use multiple interconnected pumps instead of a single pump to reduce the load or strain on the single pump. In yet other examples, it may be desirable to use multiple interconnected pumps instead of a single pump to provide a backup source of negative pressure if one of the pumps fails during plasma generation. For example, the at least one pump may include two interconnected pumps. In the event of a failure of the first pump, the second pump may operate to continue plasma generation without significant interruption.

[0198] In some embodiments, the plasma cloud is maintained for a period of time sufficient to render the optical element superhydrophilic before insertion into the body cavity. The term "superhydrophilic" can refer to a very high level of hydrophilicity, e.g., sufficient to substantially reduce the contact angle between the fluid and the surface of the object, thereby allowing the fluid to coat the surface of the object as a substantially uniform (e.g., flat) layer. In some embodiments, after increasing the hydrophilicity of the object to a desired level, the contact angle between the fluid and the superhydrophilic surface of the object may be less than about 10° or less than 5°, e.g., less than about 4°, less than about 3°, less than about 2°, less than about 1°, or even about 0°, for example, when measured at 20°C and atmospheric pressure. The period of time sufficient to render the optical element superhydrophilic before insertion into the body cavity can include any desired procedure involving the optical element, plus any time necessary to produce the desired level of superhydrophilicity of the optical element. In some examples, the period of time sufficient to render the optical element superhydrophilic before insertion into the body cavity can be less than 1 minute, less than 45 seconds, less than 30 seconds, or less than 15 seconds.

[0199] In some embodiments, the plasma generator is activated for a period of time sufficient to render the optical element superhydrophilic prior to insertion into the body cavity. The term "activate" may refer to triggering, turning on, or switching on (e.g., by transmitting an electrical signal), or performing any other action that initiates plasma generation by the plasma generator, for example, by initiating generation of an electric and / or electromagnetic field in the plasma generator that can ignite plasma within the cavity. The controller may activate the plasma generator either automatically or upon input by a user of the device for a period of time sufficient to render the optical element superhydrophilic prior to insertion into the body cavity. In one example, the controller may automatically activate the plasma generator for 30 seconds upon certain threshold conditions being met. In another example, the controller may activate the plasma generator for 45 seconds in response to user input in the form of a user pressing a button on the controller.

[0200] Disclosed embodiments may include a method for suppressing condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity. FIG. 18 illustrates an exemplary method 1800 for suppressing condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity, consistent with some embodiments of the present disclosure. As shown in step 1810, method 1800 may include removably inserting at least a portion of the medical instrument into a cavity, the portion including the optical element. Method 1800 may also include disposing the optical element within a plasma activation zone inside the cavity when at least a portion of the medical instrument is retained within the cavity, as shown in step 1812. Method 1800 may also include generating a plasma to cause formation of a plasma cloud within the plasma activation zone near the optical element, as shown in step 1814. Method 1800 may further include maintaining the plasma cloud for a period sufficient to render the optical element hydrophilic, as shown in step 1816. The method 1800 may further include inserting a hydrophilic optical element into the body cavity, as shown in step 1818.

[0201] As described above, the dielectric barrier discharge (DBD) mode of operation can provide one or more advantages, such as improving the quality of plasma processing by ensuring uniformity of the electric and / or electromagnetic fields during plasma processing near the viewport. This can be useful for processing optical surfaces where a high level of hydrophilicity may be desirable. Systems and methods that can provide plasma processing during the DBD mode of operation are described herein below. Furthermore, in some embodiments, when air plasma may be used during the DBD mode, the DBD mode of operation described herein below may simplify the plasma generator, for example, by avoiding the need for expensive gas canisters that require periodic refilling or replacement.

[0202] Some embodiments include suppressing condensation distortion on optical elements. The term "suppress" may refer to restricting, impeding, limiting, or otherwise preventing something from occurring. The term "distortion" may refer to altered, skewed, or otherwise inaccurate representation. The term "optical element" may refer to any component of an optical system designed to manipulate light, such as a window or lens, a mirror that reflects light, or a viewport (e.g., that of a medical scope). Optical elements may be made of materials such as glass, quartz, or plastics such as Perspex that allow some or most visible light to pass through. In some embodiments, optical elements may be made of reflective or semi-reflective materials such as metals or semiconductors. Moisture may accumulate as droplets (e.g., as condensation or mist) on the surface of an optical element, causing objects viewed through the optical element to appear differently (e.g., distorted) compared to objects viewed through an optical element without condensation accumulation. Some disclosed embodiments, when provided with a plasma treatment, may achieve a relatively high level of hydrophilicity, preventing the accumulation of droplets on the optical element by preventing the optical element from fogging or significantly reducing fogging that would otherwise occur in the absence of the plasma treatment. In other words, applying a plasma treatment to the optical element can suppress condensation distortion when the optical element is used, for example, during a medical procedure. The plasma applicator 130 in FIG. 1A illustrates an exemplary implementation of an apparatus for suppressing condensation distortion on an optical element. The plasma applicator 130 exposes the viewport 222 of the medical device 200 to plasma, preventing the viewport 222 from fogging (or at least significantly reducing fogging). The exposure to plasma may increase the hydrophilicity of the viewport 222, preventing or limiting the accumulation of droplets thereon. In other words, the plasma applicator 130 can suppress condensation distortion of the viewport 222.

[0203] Some embodiments include a chamber within the housing. The term "chamber" can refer to a slot, cavity, crevice, or pit that can accommodate an object. The chamber within the plasma generation zone can be sized to accommodate at least a portion of the object inside the plasma generation zone along with the plasma cloud (e.g., generated by igniting gas flowing therein), thereby exposing at least a portion of the object to the plasma cloud. For example, the chamber can accommodate an endoscope viewport within the plasma generation zone, exposing the viewport to the plasma cloud generated inside the plasma activation zone after the gas is ignited. This can increase the hydrophilicity of the viewport, which can limit or prevent the formation of spray when the viewport is subsequently inserted into the body. According to some embodiments, a protective shroud can form the chamber, and insertion of an object into the protective shroud can seal the interior of the protective shroud containing the object, thereby defining a closed plasma chamber therein. 1A can represent an exemplary implementation of a chamber (i.e., slot) in the housing (i.e., exterior surface) of an apparatus for suppressing condensation distortion on optical elements, consistent with disclosed embodiments. In some embodiments, a removable shroud can function as the chamber, while in other embodiments, the shroud can be omitted and the slot or recess in the housing itself can constitute the chamber.

[0204] According to some embodiments, the chamber is configured to receive an elongated tool with the optical element proximate the distal end of the elongated tool. The term "elongated tool" may refer to an object having a length substantially greater than its width. Examples of elongated tools include cannulas, probes, or tubes for use during medical procedures. Thus, the optical element undergoing plasma treatment may be positioned toward the distal end of the elongated tool, such as an optical element integrated with a camera positioned at the distal end of an endoscope or a dental mirror positioned at the distal end of a handle. The chamber can have an elongated shape to accommodate the elongated tool. A surface of the housing may include a slot or opening exposing an entrance to the elongated chamber. The slot or opening allows the elongated tool to be inserted into the chamber. For example, FIG. 3A illustrates an exemplary implementation of a chamber configured to receive an elongated tool with the optical element proximal to the distal end of the elongated tool, consistent with disclosed embodiments. Endoscope 380 (e.g., an elongated tool) can be provided with a viewport 390 (e.g., an optical element) having an outer surface 392 ( FIG. 2 ). Viewport 390 can be positioned proximate the distal end of endoscope 380. Slot 350 can expose an entrance to (e.g., form at least a portion of) the chamber and can be configured with an elongated shape, allowing the distal end of endoscope 380 to be positioned within the chamber with viewport 390 secured thereto.

[0205] Some embodiments include an electrical circuit within the housing. The electrical circuit may include one or more electronic components, such as wires, virtual and / or physical switches, and / or a controller configured to electrically connect the plasma-generating field applicator to a power source used to provide electrical power. Furthermore, the circuit may be facilitated by one or more software instructions for controlling the device. In other words, the term "electrical circuit" may include any combination of electronic components (e.g., conductors, memory units, switches, gates, wires, and / or other electronic components) for transmitting electrical energy or signals. Depending on the embodiment, the electrical circuit may facilitate the execution of one or more operations (e.g., logical and / or arithmetic operations) in response to receiving an electrical signal as an input (e.g., from a processor acting as a controller). The circuit may couple an energy source, such as a power source, generator, battery, or rechargeable battery, to the plasma generator, enabling ignition of the gas for the purpose of converting the gas into a plasma cloud. The energy source may be external to the plasma generator, for example, via a cable from a wall outlet. In some embodiments, the operating unit may be powered by an internal energy source, such as a battery, e.g., a rechargeable battery. The circuitry can control one or more aspects of the energy delivered by the energy source, such as the magnitude, intensity, frequency, phase, timing, polarity, as well as the voltage associated with the energy, the current associated with the energy, and any other attribute that characterizes the energy. The circuitry can adapt the energy according to the requirements of the plasma generating device, for example, to ignite gases and generate a plasma cloud to perform a plasma process.Thus, the circuitry may include one or more integrated circuits (ICs), which may include an application-specific integrated circuit (ASIC), microchip, microcontroller, microprocessor, and may include all or part of a central processing unit (CPU), graphics processing unit (GPU), accelerated processing unit (APU), digital signal processor (DSP), field-programmable gate array (FPGA), or other circuitry suitable for executing computational instructions and / or capable of performing logical operations, e.g., based on computational instructions or input signals. The circuitry may further include one or more memory units, e.g., random access memory (RAM), cache memory, read-only memory (ROM), hard disk, optical disk, magnetic media, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing data and / or computational instructions for performing logical operations. The circuitry may further include one or more communication channels, coupling the one or more ICs to the memory to enable the one or more ICs to receive stored computational instructions and / or data necessary to perform corresponding logical operations to control energy delivered to the plasma generating device. The communication channels coupling the one or more ICs to the memory may include wired channels, such as one or more cables, fibers, wires, buses, and any other mechanically coupled communication channels. The communication channels may also or alternatively include wireless channels, such as short-wave, medium-wave, and long-wave wireless communication channels (e.g., Wi-Fi, Bluetooth, Zigbee, cellular, satellite), optical communication channels, and acoustic communication channels.

[0206] In some embodiments, a plasma activation region is associated with the chamber. The term "plasma activation region" may refer to a physical volume, space, or zone where plasma can be generated. In some embodiments, this region may be an electrically isolated space or volume within the chamber that facilitates plasma generation during DBD mode. The electrically isolated region may be realized by a dielectric layer, thereby associating this region with the chamber. For example, with reference to FIGS. 3A-3B, a neighborhood 322 of a viewport 390 illustrates an exemplary implementation of a plasma activation region associated with the chamber, consistent with disclosed embodiments. The neighborhood 322 is located inside (e.g., associated with) a protective shroud 310a (e.g., the chamber). A disk 344 may form a dielectric barrier that blocks line of sight between the anode 340 and the cathode 330 and electrically insulates the anode 340 from gases flowing into the neighborhood 322. Thus, the neighborhood 322 is a plasma activation region associated with the chamber.

[0207] Some embodiments include a plasma activation region associated with the chamber and configured to hold the optical element in a manner that exposes the optical surface of the optical element to the plasma activation region. The term "hold" may refer to placing, containing, holding, or otherwise positioning. For example, an optical element (e.g., a viewport) may be contained (e.g., held) inside a closed chamber to which a plasma-generating electromagnetic field is applied. The term "expose" may refer to uncovering, uncovering, conforming, or otherwise exposing an object so that it interfaces with the surrounding environment, e.g., the plasma cloud. The term "optical surface" may refer to the surface of a viewport of a medical device, or the exterior or outer portion of an optical element, such as the surface of a lens, mirror, or glass. Thus, the viewport surface (e.g., optical surface) may be contained (e.g., held) in a chamber to which a plasma-generating electromagnetic field is applied, thereby exposing the viewport surface to the plasma activation region. For example, with reference to Figures 3A-3B, a viewport 390 (e.g., optical elements) of endoscope 380 may be housed (e.g., retained) within proximal portion 322 (e.g., plasma activation region), thereby exposing a surface 392 (e.g., optical surface) of viewport 390 to the plasma activation region of protective shroud 310a.

[0208] According to some embodiments, the optical element includes a lens, and the optical surface is a surface of the lens. The term “lens” may include one or more optical components capable of transmitting, focusing, refracting, dispersing, filtering, magnifying, miniaturizing, or otherwise manipulating the transmission of light waves passing therethrough. For example, an endoscope may be provided with one or more lenses for collecting and focusing light waves and capturing images during endoscopy. To prevent fogging of the lens surface during endoscopy, the lens surface of the endoscope may be treated with plasma using techniques described herein. Surface 222 of viewport 220 in FIG. 1A illustrates an exemplary implementation of a lens optical surface consistent with disclosed embodiments. To increase the hydrophilicity of surface 222 and prevent fogging when viewport 222 is used, for example, for a medical procedure, surface 222 may be treated with plasma using any of the techniques described herein.

[0209] Some embodiments include configuring the plasma activation region to contain a gas on a first side of a dielectric barrier. The term "contain" may refer to enclosing, storing, or otherwise holding within a limited or closed space. For example, a plasma-generating gas may be enclosed within the plasma activation region. The term "dielectric barrier" may refer to a layer made of a dielectric (e.g., insulating) material that can block the line of sight between two electrodes to which a plasma-generating field is applied. Plasma generation during DBD mode can be induced, for example, by electrically insulating one of the electrodes used to apply the field. Such insulation may be achieved by a dielectric layer that insulates the electrode from the gas in the region where plasma is generated. In other words, one electrode can be positioned on a first side of the dielectric barrier, and the other electrode can be positioned on a second side of the dielectric barrier. Thus, the dielectric barrier can divide the space into two sides, with a first electrode positioned within the first side and a second electrode positioned within the second side. For example, the two electrodes can be a cathode and an anode. The cathode may be positioned on one side (e.g., a first side) of the dielectric barrier, and the anode may be positioned on the other side (e.g., a second side) of the dielectric barrier. According to some embodiments, the plasma activation region may contain or store a gas on the cathode side (e.g., a first side) of the dielectric barrier. FIGS. 3A-3B show an exemplary implementation of a plasma activation region configured to contain a gas on the first side of the dielectric barrier, consistent with disclosed embodiments. A disk 344 may form a dielectric barrier between the anode 340 and the cathode 330 by blocking the line of sight therebetween. A plasma applicator 348 may allow gas to flow into the slots. The protective shroud may be gas flow permeable, allowing gas to flow into the protective shroud 310a toward the viewport 390, for example, near the cathode 330 at the portion 322. Alternatively, air may be contained in the protective shroud 310a.In any case, the vicinity 322 (e.g., plasma activation region) is configured to contain gas on the side (e.g., first side) of the disk 344 (e.g., dielectric barrier) on which the cathode 330 is positioned.

[0210] According to some embodiments, the gas that the plasma activation region is configured to contain is air. While gases such as argon or helium are commonly used to ignite plasma clouds, these gases prove costly and inconvenient to use repeatedly. Accordingly, the disclosed embodiments provide a plasma generation field applicator capable of igniting a plasma cloud from air contained within the chamber or protective shroud 310a. For example, depending on the volume of the chamber, plasma can be ignited in air at atmospheric pressure (e.g., without the use of gas from an external source) using a voltage of approximately 10-20 KV. When the air pressure drops to approximately 0.8 KPa, a plasma cloud can be ignited from air using a voltage of approximately 800 V. FIG. 3A illustrates an exemplary implementation of plasma activation configured to contain air, consistent with the disclosed embodiments. Hose 364 can pump some of the air out of protective shroud 310a (e.g., chamber) and reduce the air pressure therein; a voltage difference can be maintained between cathode 330 and anode 340 to induce an electric field and ignite a plasma cloud from the remaining low-pressure air.

[0211] According to some embodiments, the gas the plasma activation region is configured to contain is inert. Inert or noble gases, such as those made from elements such as helium or argon, can be used in plasma techniques, such as on the surface of an optical element, because they do not form free radicals that can react with other atoms or molecules. For this reason, inert gases, such as helium or argon, can flow into the plasma activation region via a tube or hose. FIG. 3C illustrates an exemplary implementation of a plasma activation region configured to contain an inert gas, consistent with disclosed embodiments. The hose 364 can be fluidly connected to a reservoir containing an inert gas, such as helium or argon. The hose 364 can allow the inert gas to flow through the applicator gas port 402 and the shroud gas port 404 into the protective shroud 310a and toward the vicinity 322 (FIG. 3A) near the viewport 390. The vacuum seal 408 establishes fluid communication between the hose 364 and the proximal portion 322 of the protective shroud 310a, allowing the inert gas to flow directly through the hose and into the protective shroud 310a.

[0212] Some embodiments include at least one pump for creating at least a partial vacuum within the plasma activation region. The term "vacuum" may refer to a region having a gas-phase pressure lower than atmospheric or ambient pressure. As used herein, the term "vacuum" is intended to include a partial vacuum. That is, in the context of this disclosure, a vacuum includes an enclosed space from which at least a portion of air or other gases has been removed. The term "pump" may refer to a device that draws or aspirates particles from an enclosed volume to create a vacuum or partial vacuum in the volume. For example, a hose in fluid communication with the interior of the device can remove air and create a partial vacuum therein. The partial vacuum can facilitate plasma generation, for example, by allowing gas to ionize and form a plasma. Figure 3A shows an exemplary implementation of an apparatus including a pump for creating at least a partial vacuum within the plasma activation region, consistent with disclosed embodiments. A hose 364 can pump gas (air) from the protective shroud 310a through an opening 368 into the vicinity 322 of the viewport 390. A vacuum pump in fluid communication with hose 364 can pump air through hose 364 .

[0213] In some embodiments, the gas pressure associated with the partial vacuum is less than 0.3 Atm or less than 0.1 Atm. As previously mentioned, lower pressures (e.g., partial vacuums) can facilitate plasma generation by allowing the plasma-generating gas to ionize. Thus, after pumping out the air or gas as described above, the pressure inside the plasma activation region can be significantly lower than atmospheric pressure. Referring to FIG. 3A, the vacuum seal 370 may enable the generation of a partial vacuum near the viewport 390 by maintaining a pressure differential between the interior and exterior of the protective shroud 310a of less than 0.1 Atm.

[0214] Some embodiments include a plasma activation region containing a gas on a first side of a dielectric barrier, and an electrical circuit configured to form an electrical connection with a first electrode disposed on the first side of the dielectric barrier. The term "electrode" refers to an electrical conductor through which electricity enters or exits an object, material, or region. Electrodes are typically configured in pairs, with one electrode being a cathode (e.g., a conventional current sink and a source of electron current) and the other electrode being an anode (e.g., a conventional current source and a sink of electron current). Thus, the cathode can be the first electrode of the pair, and the anode can be the second electrode of the pair. For example, an electrical circuit delivering current to the device can be electrically coupled to the cathode (e.g., the first electrode positioned on the first side of the dielectric barrier) via one or more wires. FIG. 1A, in conjunction with FIG. 3A, illustrates an exemplary implementation of an electrical circuit configured to form an electrical connection with a first electrode located on the first side of the dielectric barrier, consistent with disclosed embodiments. The plasma generating field applicator 348 (FIG. 3A) may be electrically connected to a power source, such as through an operating unit 120 (FIG. 1A) that includes an electrical circuit. An electrical conductor 354, such as an electrical wire, electrically connected to the cathode contactor 352 can provide power from the power source to the cathode contactor 352 and the cathode 330, e.g., on the cathode side of the disk 344. In other words, the electrical circuit of the operating unit 120 can form an electrical connection with the cathode 330 located on the first (e.g., cathode) side of the dielectric barrier formed by the disk 344.

[0215] Some embodiments include a second electrode connected to an electrical circuit. The term "second electrode" may refer to the second electrode of the cathode-anode pair described above. Accordingly, the second electrode may correspond to an anode electrode, which may be connected to an electrical circuit via one or more contactors or wires. FIG. 1A, in conjunction with FIG. 3A, illustrates an exemplary implementation of a second electrode connected to an electrical circuit, consistent with some disclosed embodiments. The plasma generation field applicator 348 (FIG. 3A) may be electrically connected to a power source, such as via the operation unit 120 (FIG. 1A) that includes the electrical circuit. The anode contactor 356 may be in contact with the anode 340 while the protective shroud 310a is inside the slot 350. The electrical conductor 358 may electrically connect the anode contactor 356 to a power source (e.g., via the electrical circuit of the operation unit 120), thereby connecting the anode 340 (e.g., the second electrode) to an electrical circuit. In other words, the anode 340 may be connected to the electrical circuit of the operational unit 120 via the electrical conductor 358 and the anode contactor 356 .

[0216] According to some embodiments, a second electrode is connected to the electrical circuit and is located on a second side of the dielectric barrier facing the plasma activation region. The term "second side of the dielectric barrier" may refer to the side opposite the first side of the dielectric barrier described above. Thus, if the first side corresponds to the side of the barrier where the cathode is positioned, the second side may correspond to the side of the barrier where the anode is positioned. The term "facing the plasma activation region" may refer to a zone or region on the side of the dielectric barrier facing the zone where the plasma is activated. Thus, if the plasma is activated on the cathode side (e.g., first side) of the dielectric barrier, an anode (e.g., second electrode) may be positioned on the other (e.g., opposite) side of the dielectric barrier. Figure 3A shows an exemplary implementation of a second electrode located on the second side of the dielectric barrier facing the plasma activation region, consistent with some disclosed embodiments. The anode 340 may be mounted on a disk 344, forming a dielectric barrier between the anode 340 and the cathode 330. Thus, the anode 340 is located on the other (e.g., second) side of the disk 344 relative to the cathode 330, which is located on the first side of the disk 344. Furthermore, the side of the disk 344 on which the anode 340 is located is opposite the side of the disk 344 in the vicinity 322 of the viewport 390 that corresponds to the plasma activation region.

[0217] According to some embodiments, the dielectric barrier and the first electrode are removable from the housing. The term "removable" can refer to being detachable, separable, or movable. For example, the dielectric barrier can be disengaged (e.g., removed) from the housing to change the operating mode, e.g., from a DBD to a non-DBD operating mode. As another example, the first electrode may be disengaged from the housing to allow the electrode to be replaced or cleaned, e.g., from deposit buildup. FIGS. 3A-3B illustrate exemplary implementations of the dielectric barrier and the first electrode that may be removable from the housing, consistent with disclosed embodiments. The cathode 330 (FIG. 3A) and the disk 344 (FIG. 3B) may be removable from the housing for application 348.

[0218] According to some embodiments, a dielectric barrier is configured to insulate the second electrode from gas within the chamber. The term "insulate" can refer to shielding, isolating, or otherwise preventing something from interacting with nearby matter or energy. For example, an anode (e.g., second electrode) positioned on one side of a dielectric barrier may be insulated by the dielectric barrier from interacting with gas present on the other side of the dielectric barrier. FIGS. 3A-3B illustrate an exemplary embodiment of a dielectric barrier configured to insulate the second electrode from gas within the chamber, consistent with the disclosed techniques. A disk 344 can form a dielectric barrier between the anode 340 and the cathode 330. The disk 344 can be an electrical barrier that electrically insulates the anode 340 from gas present in the vicinity 322 of the viewport 390.

[0219] According to some embodiments, the thickness of the dielectric barrier is between about 0.3 mm and about 3 mm. The thickness of the dielectric barrier can affect the quality of the plasma treatment, which can be measured by the level of hydrophilicity achieved and the time required to activate the electric field to achieve that hydrophilicity. In other words, a high-quality plasma treatment can correspond to a relatively high level of hydrophilicity. The thickness of the dielectric barrier can be thin enough to facilitate plasma ignition, yet thick enough to prevent breakdown and arcing, for example, between the anode and cathode. Exemplary thicknesses of dielectric materials such as PET or polycarbonate can range between 0.3 mm and about 3 mm for RF electric fields at frequencies within the MHz range (e.g., about 2 MHz).

[0220] Some embodiments include a stopper for maintaining a gap between the optical element and the second electrode, where the stopper functions as a dielectric barrier between the first and second electrodes. The term "stopper" may refer to any type of barrier that can be positioned inside the vessel to isolate or separate one portion of the vessel from another portion of the vessel. For example, a stopper or barrier can be positioned inside the plasma activation region to control the advancement of the optical element, e.g., to ensure a predetermined gap between the optical element and the anode for plasma generation. Furthermore, the stopper can block the line of sight between the cathode and the anode, thereby acting as a dielectric barrier therebetween, e.g., enabling a DBD mode of operation. FIG. 3C illustrates an exemplary implementation of a plasma generation device that further includes a stopper for maintaining a gap between the optical element and the second electrode, where the stopper functions as a dielectric barrier between the first and second electrodes, consistent with disclosed embodiments. The protective shroud 410 may be provided with a stopper 442. The stopper 442 may limit the advancement of the viewport 390 into the protective shroud 410 to ensure a predetermined gap between the surface 392 (FIG. 3A) of the viewport 390 and the ring anode 440. The predetermined gap can facilitate plasma generation therein. Additionally, the stopper 442 can block the line of sight between the cathode 330 and the anode 440, acting as a dielectric barrier therebetween, for example, enabling a DBD mode of operation.

[0221] Some embodiments include at least one processor. The at least one processor may include electrical circuitry for performing logical operations on input signals. For example, the at least one processor may include all or part of an ASIC, microchip, microcontroller, one or more controllers including a microprocessor, CPU, GPU, APU, DSP, FPGA, or other circuitry suitable for executing computational instructions and / or capable of performing logical operations, e.g., based on computational instructions or input signals. The instructions executed by the at least one processor may be preloaded into memory integrated with or embedded in the controller (e.g., processor) or may be stored in a separate memory. The memory may include RAM, cache memory, ROM, hard disk, optical disk, magnetic media, flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing such instructions. The memory may further store data, which may include one or more inputs for executing one or more program code instructions and one or more outputs generated by executing the one or more program code instructions. In some embodiments, the at least one processor may include multiple processors. Each processor may have a similar configuration or a different configuration that may be electrically connected or disconnected from one another. The processors may be separate circuits or integrated into a single circuit. Multiple processors may be configured to operate independently or in concert. The processors may be coupled electrically, magnetically, optically, acoustically, mechanically, or by other means that allow them to interact. The processors may be physical and / or virtual (i.e., software-based). The operational unit 120 in FIG. 1A may represent an exemplary implementation of at least one processor consistent with the disclosed embodiments. The operational unit 120 includes one or more command switches and a controller (e.g., a processor).

[0222] Some embodiments are configured to control the flow of electricity through a circuit. The term "control" can refer to managing, regulating, or otherwise adjusting. For example, at least one processor can regulate (e.g., control) the voltage difference between the cathode and anode by adjusting the electricity flowing through the circuit. The voltage difference can affect the electromagnetic field generated within the plasma activation region, thereby affecting the generation of plasma therein. Because gas and electrode characteristics can determine the attributes of the electromagnetic field required to ignite a plasma, at least one processor can regulate the flow of electricity through the circuit to generate an electromagnetic field appropriate for the type of gas and electrode characteristics. For example, if the gas is at a pressure of 0.8 KPa, plasma may be ignited in helium gas at atmospheric pressure using an RF field of approximately 7 KV across a distance of 1 cm between the cathode and anode, at a voltage of approximately 200 V. The operational unit 120 of FIG. 1A may illustrate an exemplary implementation of at least one processor configured to control electricity through a circuit consistent with disclosed embodiments. The operational unit 120 includes one or more command switches and a controller (eg, a processor) that can regulate the flow of electricity throughout the device 100 .

[0223] Some embodiments include controlling electricity flowing through a circuit to induce an electric and / or electromagnetic field associated with a voltage drop between a first electrode and a second electrode. The term “voltage drop” may refer to a potential difference or gap between the voltage levels of two electrodes. The voltage drop or potential difference may define an electric and / or electromagnetic field between the two electrodes, which can induce charged particles to move. Thus, at least one processor can control electrical parameters such as the timing, frequency, intensity, magnitude, and phase of the electricity (e.g., voltage, current) and / or magnetic signal (e.g., direction, intensity, density). By controlling the electricity flowing through the circuit, at least one processor can control the potential difference between the two electrodes, thereby controlling the electric field between them. The operating unit 120 in FIG. 1A illustrates an exemplary implementation of at least one processor (e.g., a controller) that can control the electricity flowing through the circuit of the plasma generation system 100, consistent with disclosed embodiments. 3A, by controlling electricity (e.g., via the operating unit 120 of FIG. 1A), a voltage drop (e.g., a potential difference) can be induced between the cathode 330 and the anode 340. The voltage drop can be related to the electric field between the cathode 330 and the anode 340.

[0224] According to some embodiments, the electrical circuit within the housing includes a plasma generating field applicator configured to create a voltage drop of at least 800 V. According to some embodiments, the electrical circuit within the housing includes a plasma generating field applicator configured to create a voltage drop of at least 1000 V. The characteristics of the gas (e.g., type, pressure, temperature) can determine one or more aspects of the electric field suitable for generating plasma from the gas, which in turn can determine the voltage level corresponding to the electric field. For example, when the electrodes are approximately 1 cm apart, plasma can be ignited at a voltage of approximately 800 V in air (e.g., gas) at 0.8 KPa for an RF frequency ranging between 1 MHz and 15 MHz. Similarly, plasma can be ignited at a voltage of approximately 1000 V. Thus, creating a potential difference (e.g., voltage drop) between two electrodes of at least 800 V or at least 1000 V can facilitate plasma ignition inside the plasma generating field applicator. 3A illustrates an exemplary implementation of a plasma generating field applicator configured to create a voltage drop (e.g., potential difference) of at least 800 V or at least 1000 V, consistent with disclosed embodiments. The above is provided by way of example only, as interrelationships exist between parameters affecting plasma ignition such that the parameters can be varied indefinitely depending on design constraints, as long as the plasma is ignited and maintained for a period of time sufficient to achieve the desired level of hydrophilicity.

[0225] In some embodiments, plasma is generated within the plasma activation region by generating an electric field between the first electrode and the second electrode. The term "plasma" can refer to a state of matter rich in charged particles, e.g., electrons and ions. As a result, plasma can be highly conductive and sensitive to electric and / or electromagnetic fields. Thus, at least one processor can control electricity to generate electric and / or electromagnetic fields inside the plasma activation region, such that gas subjected to the electric and / or electromagnetic fields can be converted into a plasma cloud. For example, the electric and / or electromagnetic fields can ionize the gas until it becomes more conductive to the point where it reaches a plasma state. Thus, the circuitry can control the electricity from the power source to be suitable for performing plasma processing, e.g., by adapting the electricity to signals capable of inducing electric and / or electromagnetic fields capable of converting the gas into a plasma cloud. Operation unit 120 (FIG. 1A) illustrates an exemplary implementation of at least one processor controlling electricity to perform plasma processing, according to disclosed embodiments. The operation unit 120 can adapt (e.g., control) the electricity provided by the power supply so as to be suitable for generating an electric field and / or an electromagnetic field capable of generating a plasma. The electricity can be supplied to any of the cathode 330, the anode 340, and the dielectric barrier 344 via any of the cathode contactor 352, the conductor 354, and the conductor 358 ( FIG. 3A ). For example, electricity controlled by the operation unit 120 can be delivered to the cathode 330 and the anode 340 via the conductors 354 and 358, generating an electric field and / or an electromagnetic field suitable for converting gas present therein into a plasma cloud.

[0226] Some embodiments include maintaining the generated plasma within the plasma generation region for a period of time sufficient to render the optical surface hydrophilic. As described above, the "quality" of the plasma treatment may correspond to the level of hydrophilicity achieved by the plasma treatment. The duration (e.g., period) for which the electric field is activated, and thus the plasma can be ignited to treat the optical surface, may correspond to the level (e.g., quality) of hydrophilicity required for a given application. For example, different applications (short vs. long) and optical elements (e.g., various shapes, sizes, and materials) may require different treatment qualities (e.g., hydrophilicity levels). Some optical elements may require a very high level of hydrophilicity (e.g., corresponding to a longer treatment), while other optical elements may be sufficient with a lower level of hydrophilicity (e.g., corresponding to a shorter treatment). In a similar manner, optical elements of different materials, shapes, or sizes may require different durations (e.g., periods) of plasma treatment to achieve the same level of hydrophilicity. Thus, "a period of time sufficient to render the optical surface hydrophilic" may depend on the material being treated (e.g., plastic, glass, metal), the shape of the optical element (e.g., flat or round), the type and duration of use (e.g., a short dental procedure versus a long abdominal surgery), the type of gas used (e.g., helium, argon, or air), the gas pressure (e.g., atmospheric pressure or lower pressure generated by a vacuum pump), the ambient temperature, and any other factors that may affect the hydrophilicity of the optical element. Thus, at least one processor can control the electricity in the circuit to maintain the plasma in the plasma generation region for a duration that meets the hydrophilicity requirements of a given optical element. A user can input the hydrophilicity requirements of a specific optical element via the user interface of the control unit. Operation unit 120 ( FIG. 1A ) illustrates an exemplary implementation of at least one processor for maintaining the generated plasma in the plasma generation region for a period of time sufficient to render the optical surface hydrophilic, consistent with disclosed embodiments. The operation unit 120 may include a user interface (e.g., switches, controllers, buttons, indications, displays) that allows a user to input one or more criteria for plasma treatment of the object 200, e.g., an optical element.For example, a user may provide one or more criteria to the operation unit 120, such as a target processing quality level, the type of material being processed, the size and shape of the optical element being processed, and any other criteria related to plasma processing of the optical element. The at least one processor in the operation unit 120 may control the characteristics of the electrical flow through the circuit to generate plasma in one of the plasma generation field applicators (130, 348, 448) based on the criteria, for example, by controlling the duration (e.g., period) of the treatment. In other words, the operation unit 120 (e.g., the at least one processor) may maintain the generated plasma in the plasma generation region (e.g., the vicinity 322 in FIG. 3A ) for a time sufficient to render the optical surface 392 of the optical element 390 hydrophilic.

[0227] FIG. 19 is a block diagram of an exemplary process 1900 for suppressing condensation distortion on an optical element, consistent with embodiments of the present disclosure. While the block diagram may be described below with reference to specific implementation embodiments shown in other figures, these implementations are provided for illustrative purposes only and are not intended to serve as limitations on the block diagram. Because example processes are described throughout this disclosure, these aspects will not be repeated or will merely be summarized with reference to FIG. 19. In some embodiments, process 1900 may be performed by at least one processor (e.g., at least one processor operating unit 120 of FIG. 1A ) to perform the operations or functions described herein. In some embodiments, some aspects of process 1900 may be implemented as software (e.g., program code or instructions) stored in memory provided in at least one processor, or as a non-transitory computer-readable medium. In some embodiments, some aspects of process 1900 may be implemented as hardware (e.g., dedicated circuitry). In some embodiments, process 1900 may be implemented as a combination of software and hardware.

[0228] FIG. 19 includes process blocks 1902-1908. In block 1902, the method may include detecting an optical element inserted into a plasma generation region within a housing, the plasma activation region configured to contain a gas on a first side of a dielectric barrier. The term "detecting" may refer to determining, sensing, or identifying, such as sensing the insertion of the optical element into the plasma generation region. Detecting may further include sensing the insertion of the optical element into a sheath that contains the plasma generation region. The sheath may be contained within a housing that encases components of the plasma generation device. The plasma generation device may include a dielectric barrier that separates the plasma activation region from other interior regions where plasma is generated. In this way, the plasma activation region can contain a gas only on one side of the dielectric barrier. For example, the cathode 330 (FIG. 3A) can come into physical contact with the metal surface 384 of the endoscope 380. The electrical contact allows for detection of insertion of the endoscope 380 into the protective shroud 310a, which in turn can detect insertion of the optical surface 392 of the viewport 390 (e.g., optical element) within a vicinity 322 (e.g., plasma generation zone) within a housing (e.g., applicator 130 of FIG. 1A). The vicinity 322 can contain gas on one side (e.g., the side of the cathode 330) of the disk 344 (e.g., dielectric barrier).

[0229] In some embodiments, the optical element is part of a medical instrument having an elongated shaft, and the optical element includes a lens on the distal end of the elongated shaft. For example, the medical instrument may be configured for insertion into the body, and insertion may be facilitated by an elongated cannula or handle (e.g., shaft), the distal end of which may be suitable for insertion into the body and the proximal end of which may be suitable for control by a physician from outside the body. The distal end may include a camera configured with an optical element including one or more lenses. The cannula may include one or more wires, fibers, or cables that allow for control (e.g., manipulation) of the distal end of the medical instrument within the body and for communication of information to and from the distal end, for example, for transfer of images collected by the camera (e.g., at the distal end) to a memory (e.g., at the proximal end). FIG. 2 illustrates an optical element that is part of a medical instrument having an elongated shaft, and includes a lens on the distal end of the elongated shaft, consistent with disclosed embodiments. An endoscope 380 (e.g., medical instrument) includes an elongated shaft that may be suitable for insertion into the body. The distal end of the elongate shaft of the endoscope 380 includes a viewport 390 (e.g., an optical element). The outer surface 392 that can be subjected to plasma treatment can be the outer surface of a lens.

[0230] In some embodiments, the medical instrument is a laparoscope or endoscope. For example, medical instruments such as laparoscopes and endoscopes can benefit from undergoing plasma treatment to prevent the viewports of these instruments from fogging during use. FIG. 3A shows an exemplary implementation of an endoscope 380 for undergoing plasma treatment, consistent with disclosed embodiments. The distal end of the endoscope 380 includes a viewport 390. A protective shroud 310a is sized to accommodate the elongated shape of the endoscope 380, or any other elongated medical instrument, such as a laparoscope.

[0231] At block 1904, the process may include electrically connecting a first electrode located on a first side of the dielectric barrier with a second electrode located on a second side of the dielectric barrier opposite the plasma activation region. Electrically connecting may refer to including components in a circuit and may not necessarily require a physical connection. For example, two electrodes may not be physically connected but may be closely spaced apart, allowing a voltage drop to occur within a common circuit; in such cases, the two spaced apart electrodes are considered to be electrically connected. By electrically connecting electrodes located on opposite sides of the dielectric barrier, plasma can be generated in the plasma activation region during DBD operation, allowing the plasma to be generated more uniformly and preventing arcing and other unpredictable and / or undesirable electrical communication between the first and second electrodes. FIG. 3A illustrates an exemplary implementation of electrically connected first and second electrodes, where the first electrode is disposed on a first side of the dielectric barrier and the second electrode is disposed on the other (e.g., second) side of the dielectric barrier opposite the plasma activation region. A disk 344 (e.g., a dielectric barrier) separates the cathode 330 (e.g., a first electrode) and the anode 340 (e.g., a second electrode). The cathode 330 is electrically connected to the protective shroud 310a near the vicinity 322 (e.g., the plasma activation region), while the anode 340 is located on the opposite side (e.g., second side) of the disk 344, opposite the vicinity 322.

[0232] At block 1906, plasma is generated within the plasma activation region by applying an electric field associated with a potential drop of greater than 1000 V between the first and second electrodes. As noted above, the voltage suitable for generating an electric field capable of igniting a plasma cloud may depend on several factors, such as the type of gas used (e.g., argon, helium, or air), the gas pressure, and the electrode geometry; examples are shown for generating plasma using voltages of 7 KV and 20 KV. In other words, in some embodiments, a voltage of greater than 1000 V can be applied between the first and second electrodes to generate plasma within the plasma activation region. FIG. 3A illustrates an exemplary implementation for generating plasma within the plasma activation region by applying an electric field associated with a potential drop of greater than 1000 V between the first and second electrodes, consistent with disclosed embodiments. A voltage of greater than 1000 V can be applied between cathode 330 (e.g., a first electrode) and anode 340 (e.g., a second electrode) via conductors 354 and 358, generating an electric field that can generate a plasma within vicinity 322 (e.g., a plasma activation region).

[0233] At block 1908, the process may include maintaining the generated plasma within the plasma generation region for a period of time sufficient to render the optical surface hydrophilic. As described above, the quality of the plasma treatment may correspond to the level of hydrophilicity achieved. For example, a particular material, device, or application may be associated with one or more threshold values ​​for hydrophilicity. An electric field may be maintained within the plasma generation region for a duration long enough (e.g., sufficient) to ensure that the level of hydrophilicity achieved meets the threshold value. For example, the operation unit 120 (FIG. 1A) may include one or more processors, controllers, and switches that maintain the plasma inside the plasma generation region for a duration sufficient to render the optical surface 390 (FIG. 3A) hydrophilic. The operation unit 120 may achieve this by controlling electrical current delivered to the cathode 330 and the anode 340 via the conductors 354 and 358, respectively, and the contactors 352 and 356, respectively, thereby controlling the electric field therebetween. For example, for a first set of applications and / or configurations of the plasma generation region, a period of time sufficient to render the optical surface hydrophilic is an activation electric field of less than one minute. For a second set of applications and / or configurations of the plasma-generation region, a duration of the activating electric field sufficient to render the optical surface hydrophilic is less than 10 seconds. For a third set of applications and / or configurations of the plasma-generation region, a duration of the activating electric field sufficient to render the optical surface hydrophilic is less than 5 seconds. The duration may be based on the type of material being treated (e.g., metal, glass, or plastic), the type and length of treatment intended for the optical surface (e.g., a short-duration dental procedure mirror versus a long-duration abdominal surgical endoscope), the size and shape of the optical surface (a flat dental mirror versus a rounded camera lens), and any other factors that may affect condensation of droplets on the optical surface.

[0234] Embodiments of the present disclosure may relate to systems, devices, methods, and computer-readable media for generating plasma and treating objects with the plasma. For ease of explanation, in some cases, related embodiments are described below with reference to the systems or methods, with the understanding that disclosed aspects of the systems and methods apply equally to the devices and computer-readable media as well as to each other. Some aspects of the related methods may be performed electronically over a network, which may be wired, wireless, or both. Other aspects of such methods may be performed using non-electronic means. In the broadest sense, the systems, methods, and computer-readable media disclosed herein are not limited to any particular physical and / or electronic means, but rather may be accomplished using many different means.

[0235] Some disclosed embodiments include a plasma generation device. As described elsewhere in this disclosure, a plasma generation device can include any device or combination of components capable of generating plasma, for example, by transforming a gas to transition the gas into a plasma state or plasma cloud. In some embodiments, the plasma generation device can include a mechanism for supplying a gas, such as helium or argon, and two electrodes (e.g., an anode and a cathode), or any other means suitable for applying an electric or electromagnetic field to the supplied gas. The electric or electromagnetic field can ionize the gas to the point where it becomes a conductive plasma cloud.

[0236] In some embodiments, the plasma generating device is configured to treat an object. For example, plasma generated by the plasma generating device can be applied to an object so that the plasma can react with molecules on the surface of the object. In some embodiments, the plasma can be applied to change the surface properties of the object, for example, by making the surface hydrophilic or hydrophobic or by changing the surface's conductivity. Additionally, or alternatively, the plasma can be applied to clean the surface of the object by decomposing and removing organic residues. For example, the plasma generation system 500 shown in FIGS. 5 and 7 illustrates an exemplary implementation of a plasma generation device according to disclosed embodiments. As shown in FIG. 7, the plasma generation system 500 can be configured to generate plasma to treat a surface of an object, such as an optical surface 706 of an endoscope 708 or another medical device. In some embodiments, the plasma generation system 500 can be configured to apply plasma to the object (e.g., optical surface 706) to change the hydrophilicity and / or other surface properties of the object.

[0237] Some disclosed embodiments include a housing. In some embodiments, the housing can include any structure, casing, frame, enclosure, or support that covers and / or protects other components of the plasma-generating device. For example, the housing can cover and protect the components of the plasma-generating device configured to induce a reaction that produces plasma (e.g., a vacuum chamber, one or more electrode pairs, and a mechanism for supplying reactant gases). As described elsewhere in this disclosure, the housing can be made of any suitable material, such as plastic, metal, glass, wood, or any other material capable of encasing a plasma-generating device, or any combination thereof. In some embodiments, the housing can be hollow, such that the housing can hold or house one or more other components. For example, the housing can include at least one hole, cavity, or hollow interior chamber that can hold or house at least a portion of an object to be treated with the plasma, and optionally, can hold or house at least a portion of a protective sheath or shroud that surrounds the object to be treated.

[0238] 7 illustrates an exemplary plasma generation device 500 that includes a housing 710, which may cover the exterior of the plasma generation device and enclose other components of the plasma generation device. The housing 710 may include an opening 712 through which a sheath 718 (also referred to as a protective shroud sheath 718) and an object to be treated (e.g., object 708) may be introduced into an interior cavity 714 (also referred to as a bore 714) of the housing. The cavity 714 may be sized and configured to removably retain at least a portion of the sheath 718, which may house at least a portion of the object 708.

[0239] Some disclosed embodiments include a plasma generation zone within a housing. As described elsewhere in this disclosure, the term "plasma generation zone" can refer to a physical volume or space within a housing where a plasma cloud can be formed, for example, by igniting a gas introduced therein. For example, the plasma generation zone can include a volume or space within a housing where a reaction to generate plasma can occur. In some embodiments, the plasma generation zone can be disposed between a pair of electrodes, which can be configured to apply an electric or electromagnetic field to ionize gas within the plasma generation zone, thereby generating plasma. In some embodiments, the plasma generation zone can be fluidly connected to a mechanism (e.g., a reservoir and / or a pump) for supplying a reactant gas for generating plasma, thereby delivering the gas into the plasma generation zone.

[0240] In some disclosed embodiments, the plasma generation zone is configured to accommodate an object, such as an object to be treated with plasma. As disclosed elsewhere in this disclosure, the term "accommodate" may refer to the ability to hold, enclose, support, or otherwise contain an object, for example, within the plasma generation zone. For example, an object can be supported within the plasma generation zone to expose at least a portion of the object to the plasma cloud. In some embodiments, the plasma generation zone may be sized or configured to accommodate the entire object. Additionally or alternatively, the plasma generation zone may be sized or configured to accommodate a portion of the object, for example, the distal end of the object, with another portion of the object remaining outside the plasma generation zone (and optionally, outside the plasma generator). In some embodiments, the object may be removable from the plasma generation zone. For example, the object may be delivered to or contained within the plasma generation zone for treatment with plasma, after which the object may be removed from the plasma generation zone.

[0241] In some embodiments, the plasma generation zone can be completely sealed from the external environment while the object is contained within the plasma generation zone. As a result, the plasma generation zone can be airtight. For example, one or more seals can be provided within the housing and / or sheath to form a vacuum seal around the outer diameter of the object being treated. The vacuum seal can be configured to maintain a pressure differential between the plasma generation zone and the external environment while the distal end (or any other desired portion) of the object is contained within the plasma generation zone. Thus, the pressure and / or contents within the plasma generation zone can be controlled (e.g., by at least one processor of the plasma generation device). In an alternative embodiment, the plasma generation zone can be open to the external environment.

[0242] 7 illustrates a plasma generation apparatus 500 including a plasma generation zone 716 disposed within a housing 710. In some embodiments, the plasma generation zone 716 can include an interior volume of the sheath 718 at or near the distal end of the sheath 718, such that the plasma generation zone 716 may be configured to accommodate at least a portion of the object 708 (including the optical surface 706) during plasma processing. Because the sheath 718 can be housed within a housing cavity 714, the plasma generation zone 716 can also be disposed within the cavity 714 at or near the end of the cavity opposite the opening 712. In some embodiments, the plasma generation zone 716 can be disposed between a pair of electrodes, which can be configured to ionize gas within the plasma generation zone 716 to generate plasma. As a non-limiting example, anodes 722A, 722B can be disposed within the housing 710 and can include one electrode, two electrodes, or any other suitable number of electrodes or electrical contacts. Additionally or alternatively, the sheath 718 may include a first electrode pair 702A, 702B and a second electrode pair 704A, 704B, one or both of which may be configured as a cathode. For example, in some embodiments, the first electrode pair 702A, 702B may be configured as a cathode. Power may be supplied between the anode and cathode to generate an electric or electromagnetic field for plasma generation.

[0243] In some embodiments, plasma generation zone 716 may be in fluid communication with hose 720, which may be in fluid communication with a gas reservoir or vessel (not shown) containing a gas suitable for plasma generation, such as helium, argon, or nitrogen. Thus, hose 720 may allow reactant gas from the gas reservoir to flow into cavity 714 and plasma generation zone 716. Additionally or alternatively, hose 720 may be in fluid communication with at least one vacuum pump, which may be configured to remove gas from plasma generation zone 716 and control the pressure within plasma generation zone 716.

[0244] In some disclosed embodiments, the object to be treated with plasma includes a medical device or instrument configured to be inserted or implanted within a patient's body. For example, the object may include an optical surface of an endoscope. As used herein, an endoscope may refer to an instrument configur...

Claims

1. 1. A plasma generating apparatus for treating an object, the plasma generating apparatus comprising: Housing and a plasma generation zone within the housing, the plasma generation zone configured to allow for accommodation of the object; a circuit for supplying energy and performing a plasma treatment to increase the hydrophilicity of the object to a desired level; at least one sensor configured to measure at least one plasma activation parameter during the plasma processing; at least one processor, determining, based on the at least one plasma activation parameter, that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to a desired level; Outputs a notification indicating a plasma processing failure at least one processor configured to A plasma generating device comprising:

2. 2. The plasma generation device of claim 1, wherein the at least one sensor is configured to measure the at least one plasma activation parameter by sensing a pressure in the plasma generation zone during the plasma treatment, and the at least one processor is further configured to determine that the plasma treatment fails to meet the threshold when the pressure is outside a pressure range.

3. 2. The plasma generation device of claim 1, wherein the at least one sensor is configured to measure the at least one plasma activation parameter by detecting a voltage at an electrode that generates plasma during the plasma process, and the at least one processor is further configured to determine that the plasma process fails to meet the threshold when the detected voltage is outside a voltage range.

4. 2. The plasma generation device of claim 1, wherein the at least one sensor is configured to measure the at least one plasma activation parameter by detecting a plasma frequency during the plasma process, and the at least one processor is configured to determine that the plasma process fails to meet the threshold when the detected plasma frequency is outside a plasma frequency range.

5. 2. The plasma generation apparatus of claim 1, wherein the plasma generation apparatus further comprises a gas reservoir configured to flow a gas into the plasma generation zone to perform the plasma treatment, and the at least one processor is further configured to determine that the plasma treatment fails to meet the threshold based on characteristics of the gas.

6. The plasma generating device of claim 1 , wherein the at least one sensor includes at least one of a pressure sensor, a voltage sensor, and a plasma frequency sensor.

7. The plasma generating device of claim 1 , wherein the object includes an optical element.

8. 2. The plasma generating device of claim 1, wherein the object is an endoscope, and the plasma generating device further comprises a detachable sheath sized to receive a distal end of the endoscope, and the plasma generation zone is configured to apply the plasma treatment to the distal end of the endoscope within the sheath.

9. 10. The plasma generating device of claim 1, wherein the object is at least a portion of a medical device, and the at least one processor is further configured to output a notification indicating a malfunction of the plasma treatment before using the medical device during a medical procedure.

10. The plasma generation apparatus of claim 1 , wherein the at least one processor is further configured to maintain the plasma treatment for a predetermined duration.

11. 11. The plasma generating apparatus of claim 10, wherein the predetermined duration is based on one of the characteristics of the plasma generated for the plasma treatment, the physical properties of the object, and the desired level of hydrophilicity of the object.

12. 11. The plasma generation apparatus of claim 10, wherein the at least one processor is further configured to increase a duration for a subsequent plasma treatment in response to determining that the plasma treatment is below the threshold.

13. The plasma generation zone comprises: the plasma generation zone is associated with a cavity configured to hold the object in a manner exposing at least a portion of the object to the plasma generation zone; or configured to contain a plasma cloud on a first side of the dielectric barrier while the object is disposed on a second side of the dielectric barrier; The plasma generating device according to claim 1, wherein the plasma generating device is either one of the above.

14. 2. The plasma generating apparatus of claim 1, wherein the plasma generating apparatus further comprises a plasma generator configured to be operated to cause the formation of a plasma cloud within the plasma generation zone, and wherein the at least one processor is further configured to operate the plasma generator for a period of time sufficient to increase the hydrophilicity of the object to the desired level.

15. 10. The plasma generating apparatus of claim 1, wherein the desired level of hydrophilicity of the object is such that a liquid droplet striking the surface of the object has a contact angle of less than 10 degrees for at least one hour after the plasma treatment.

16. 1. A method for generating a plasma to treat an object, the method comprising: Identifying the intrusion of an object into the plasma generation zone; activating a circuit for supplying energy to generate a plasma in the plasma generation zone to perform a plasma treatment to increase the hydrophilicity of the object to a desired level; measuring at least one plasma activation parameter during the plasma treatment; determining, based on the at least one plasma activation parameter, that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to the desired level; outputting a notification indicating a malfunction of the plasma process; A method comprising:

17. 1. A non-transitory computer-readable medium containing instructions that, when executed by at least one processor, cause the at least one processor to perform operations for generating a plasma to treat an object, the operations comprising: Identifying the intrusion of an object into the plasma generation zone; activating a circuit for supplying energy to generate a plasma in the plasma generation zone to perform a plasma treatment to increase the hydrophilicity of the object to a desired level; measuring at least one plasma activation parameter during the plasma treatment; 1. A non-transitory computer-readable medium comprising:

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