Traverse robot with multiple end effectors
By designing a multi-end effector walking robot, the problem of small footprint and efficient multi-chip processing in modern semiconductor manufacturing plants is solved, and flexible wafer flow and efficient production in limited space are achieved.
Patent Information
- Application Number
- JP2024544373
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-01-27
- Filing Date
- 2023-01-27
- Publication Date
- 2025-02-06
AI Technical Summary
The prior art is difficult to achieve small footprint, efficient production and flexible wafer flow processing in modern semiconductor manufacturing plants, especially the unmet need to process multiple wafers simultaneously in a limited space.
A walking robot with multiple end effectors is designed, including a platform, a driving unit and a movable arm assembly. The platform moves along a fixed base. The driving unit connects the movable arm assembly. The arm assembly connects multiple end effectors through multiple rotating joints, and can move in two opposite directions to achieve independent and simultaneous processing of multiple wafers.
It realizes simultaneous processing and flexible flow of multiple wafers in a limited space, improves production efficiency, and can independently and simultaneously move and transport wafers, adapting to the needs of different workstations.
Smart Images

Figure 2025503951000001_ABST
Abstract
Description
background
[0001] [Technical field] The exemplary and non-limiting embodiments relate generally to robots, and more particularly to a traverse robot with multiple end effectors that can be used in material handling vacuum environment systems and other applications. [Brief Description of the Prior Art]
[0002] Modern semiconductor manufacturing plants require wafer processing systems with features such as a small footprint (cost per unit of factory floor space), the ability to process multiple wafers simultaneously (productivity, e.g., number of wafers processed per unit time), and the ability to accommodate flexible wafer flows (recipe diversity, maintenance of process modules during operation).
[0003] The following summary is illustrative only and is not intended to limit the scope of the claims.
[0004] According to one view, the device is a platform configured to travel along a path of travel on a stationary base; a drive coupled to the platform; a movable arm assembly; Equipped with. The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; a second linkage coupled to the pivot base; Equipped with. The first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. The second linkage is a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The platform is configured to run on the stationary base along a movement path in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transport between at least one of the first to fourth substrate holding areas and a respective substrate workstation.
[0005] Another way of looking at it is: Providing a platform configured to travel along a path of travel on a stationary base; providing a drive coupled to the platform; connecting a pivot base of a movable arm assembly to said drive section; Includes. a first linkage of the movable arm assembly coupled to the pivot base; a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. a second linkage of the movable arm assembly coupled to the pivot base; a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The platform is configured to run on the stationary base along a movement path in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transport from at least one of the first to fourth substrate holding areas to a respective substrate workstation.
[0006] Another way of looking at it is: placing a first substrate on a first substrate holding area of a first end effector and a second substrate on a second substrate holding area of a second end effector; wherein the first end effector and the second end effector form part of a movable arm assembly, the movable arm assembly having a pivot base connected to a drive; The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. A second linkage is connected to the moving base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The method also includes: The method includes running a platform on a stationary base along a movement path in two opposing directions, and moving the drive unit and the movable arm assembly to cause independent and simultaneous substrate movement and substrate transport between at least one of the first to fourth substrate holding areas and a respective substrate workstation.
[0007] Alternatively viewed, a non-volatile program storage device readable by a machine tangibly embodied with a program of instructions executable by the machine to perform a process, the process comprising: placing a first substrate on a first substrate holding area of a first end effector; placing a second substrate on a second substrate holding area of a second end effector; placing a third substrate on a third substrate holding area of a third end effector; placing a fourth substrate on a fourth substrate holding area of a fourth end effector; However, the first to fourth end effectors form part of a movable arm assembly, and the movable arm assembly has a rotating base connected to a drive unit, The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and comprising the first end effector having at least the first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and comprising the second end effector having at least the second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; The movable arm assembly further comprises a second linkage coupled to the pivot base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and comprising the third end effector having at least the third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and comprising the fourth end effector having at least the fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The process also includes controlling movement of a platform on the stationary base in two opposing directions along a movement path, and controlling movement of the drive section and the movable arm assembly to effect independent and simultaneous substrate movement and substrate transport between at least one of the first through fourth substrate holding areas and a respective substrate workstation. [Brief description of the drawings]
[0008] The above aspects and other features are described below with reference to the accompanying drawings.
[0009] FIG. 1A is a schematic diagram of an example of a traverse robot.
[0010] FIG. 1B is a schematic cross-sectional view of an example of a rotation coupling.
[0011] 1C(a) and 1C(b) are schematic cross-sectional views of an exemplary rotary thermal coupling.
[0012] FIG. 1D is a schematic diagram of the internal components of the traverse robot of FIG. 1A.
[0013] FIG. 2 is a schematic diagram showing an example of a workstation environment with a narrow architecture and a robot's movement path in the workstation environment.
[0014] FIG. 3A is a schematic diagram of another example of a traverse robot.
[0015] FIG. 3B is a schematic diagram illustrating an alternative workstation environment and travel path for the robot of FIG. 3A.
[0016] FIG. 4A is a schematic diagram of the example robot of FIG. 3A operating in a linear path.
[0017] 4B-4D are schematic diagrams illustrating example operations of the robot of FIG. 3A.
[0018] FIG. 5 is a schematic diagram of another example of a traverse robot.
[0019] FIG. 6A is a schematic diagram of another example of a traverse robot.
[0020] FIG. 6B is a schematic diagram illustrating an alternative workstation environment and travel path for the robot of FIG. 6A.
[0021] FIG. 7A is a schematic diagram of the example robot of FIG. 6A operating in a linear motion path.
[0022] 7B-7E are schematic diagrams illustrating example operations of the robot of FIG. 6A.
[0023] FIG. 8-14 is a schematic diagram showing an example of a traverse robot.
[0024] Although features of the present disclosure will be described with reference to the exemplary embodiments illustrated in the drawings, it should be understood that these features can be embodied in many alternative embodiments, and that any suitable size, shape or type of elements or materials can be employed.
[0025] Referring to FIG. 1A, an exemplary embodiment of a traverse robot having multiple end effectors is shown at 100 and hereinafter referred to as "robot 100." Robot 100 includes a linear guide and drive mechanism 105, a traverse platform 110, and a robot arm 115. As shown, robot 100 may be supported by a stationary base 120. One feature described herein is to provide a robot (e.g., robot 100) that can navigate from one point to another in a system or environment having limited space or narrow architecture, has multiple end effectors that support simultaneous handling of multiple wafers, and can pick and place wafers from or to multiple workstations simultaneously or individually (to accommodate flexible wafer flow). Although robot 100 is shown (as with other exemplary robots disclosed herein) as traveling back and forth (or side to side) in a straight line, robot 100 may be capable of traveling a curvilinear path of travel.
[0026] The robot 100 may include or be connected to a controller 125. The controller 125 may include, for example, at least one processor and at least one memory that includes one or more computer programs.
[0027] 1A , the stationary base 120 may be a structure configured to support the robot 100. By way of example, the stationary base 120 may be a plate or frame extending along the direction of travel of the robot 100, may be the floor or wall of a vacuum chamber, or may be any other suitable structure capable of supporting the robot 100.
[0028] The linear guide and drive mechanism 105 may comprise a linear guide mechanism and a linear drive mechanism configured to enable travel of the traverse platform 110 relative to the stationary base 120. For example, travel of the traverse platform 110 may be enabled in a direction along the x-axis, as shown by arrow 130 in FIG. 1A.
[0029] The linear guide mechanism may be formed by a linear bearing mechanism. By way of example, the linear bearing mechanism may include one or more linear bearing rails attached to the stationary base 120 and one or more linear bearing blocks attached to the traverse platform 110. The linear guide mechanism may further include a shield configured to prevent components associated with the robot 100 from contacting the linear bearing rails, thus preventing debris from contaminating the linear bearings and particles from migrating from the linear bearings and depositing on the linear bearing rails.
[0030] Alternatively, the linear guide mechanism may be a wheel and rail system, a cable or belt suspension system, a magnetic support system, or any other suitable mechanism configured to constrain the motion of the traverse platform 110 relative to the stationary base 120. By way of example, it may include features as described in U.S. Patent Nos. 10,424,498, 10,269,604, 10,742,070, and U.S. Patent Publication No. US2020 / 0262660A1, all of which are incorporated herein by reference in their entireties.
[0031] The linear drive mechanism may include one or more linear actuators and one or more position sensors (not depicted in FIG. 1A for simplicity). The linear actuator of the linear drive mechanism may have a stationary part that may be attached to the stationary base 20 and a moving part that may be attached to the traverse platform 110. For example, the linear actuator may be a linear motor, such as a permanent magnet linear motor. In a linear actuator with a moving coil mechanism, the moving part may include a forcer with a coil and the stationary part may be formed by a magnet track. In a linear actuator with a moving magnetic mechanism, the moving part may include a magnet plate and the stationary part may be formed by a coil track.
[0032] Alternatively, the linear drive mechanism may be based on any suitable mechanism, such as a belt drive, band drive, cable drive, ball screw, lead screw, etc., capable of generating a force between the stationary base 120 and the traverse platform 110 substantially in the desired travel direction of the robot 100 (indicated by arrow 130).
[0033] The position sensor of the linear drive mechanism may be configured to measure the position of the traverse platform 110 along the desired direction of travel indicated by arrow 130. By way of example, the position sensor may be a position encoder, such as an optical, magnetic, inductive, or capacitive position encoder, a laser interferometer, or any other suitable device capable of directly or indirectly (in the case of a belt drive, band drive, cable drive, ball screw, lead screw, etc.) measuring the position of the traverse platform along the desired direction of travel indicated by arrow 130.
[0034] Data obtained from the position sensors may be used by controller 125 to control a linear actuator (such as a linear motor, a moving coil mechanism, a moving magnetic mechanism, etc.) to achieve a desired movement and stopping position of traverse platform 110 relative to stationary base 120 along a desired travel direction of robot 100 (arrow 130).
[0035] Referring to FIG. 1D, the traverse platform 110 may include a means for effecting movement of the traverse platform 110 and the robot arm 115, such as a drive 112. The drive 112 is disposed within the outer housing 135. The spindle assembly 111 may be disposed within the outer housing 135 and configured to rotate the robot arm 115. The spindle assembly may include a spindle housing, a motor MT, and a drive shaft 140. The drive shaft 140 extends from the outer housing 135 to the robot arm 115, and is partially depicted in FIG. 1A. In some embodiments, a vertical lift mechanism may be used. The vertical lift mechanism is configured to vertically raise and lower the spindle using a motor MZ. The motor MZ may include, for example, one or more linear rail bearing mechanisms and a motor driven ball screw 113.
[0036] When the traverse platform 110 is characterized by a vertical lift mechanism, the spindle housing and an inner portion of the outer housing 135 of the traverse platform 110 may include surfaces that face each other or are at least positioned proximate to each other to facilitate heat transfer from the spindle housing to the outer housing 135. As an example, the spindle housing and the outer housing 135 may be characterized by interleaved structures, such as fins, to increase the effective area available for heat transfer while allowing vertical movement of the spindle assembly relative to the outer housing 135. The effective surfaces may be treated to improve thermal emissivity. For example, various components may be made of aluminum and the active surfaces may be anodized. Additional and alternative power, communication, and thermal management mechanisms and features are described in U.S. Patent Publication No. US2021 / 0245372A1, filed February 10, 2021.
[0037] The traverse platform 110 may be sealed (e.g., at an isolation barrier 119) to isolate its interior space from an external environment, such as a vacuum environment. If a vertical lift mechanism is present, a bellows structure 117 may be utilized between the outer housing 135 and the spindle housing to accommodate vertical movement of the spindle.
[0038] The spindle of the traverse platform 110 may have a structure, such as a seal, that allows the drive shaft or a top of the drive shaft to be in an external environment, such as a vacuum environment. As an example, a substantially cylindrical isolation barrier between the rotor of the motor and the stator of the motor may be utilized to separate an internal environment on the stator side of the isolation barrier from an external environment (such as a vacuum environment) on the rotor side of the isolation barrier. In this case, the drive shaft may be entirely in the external environment (such as a vacuum environment). Alternative seal structures may also be used.
[0039] The robot 100 may have a distributed actuator structure. To provide distributed power to the linkages 150, 152, actuators, such as motors ML or MR, may be located on the pivot base 145 of the robot arm 115. In some embodiments, actuators (e.g., various motors) may be located in or on the various links of the linkage. These actuators may drive each link and linkage individually or in conjunction with actuators or motors located on the pivot base 145. Examples of robots with distributed actuator architectures are illustrated in US2022 / 0266456 and US2022 / 0297285, which are incorporated herein by reference in their entirety.
[0040] Returning to FIG. 1A, the robot arm 115 may include a pivot base 145 coupled to the drive shaft 140 and two or more linkages 150, 152 coupled to the pivot base 145. The pivot base 145 serves as a common upper arm for the linkages 150, 152 and pivots substantially about a geometric center of the structure that defines the pivot base. For example, the pivot base 145 pivots on the drive shaft 140 at a point that is equidistant from the sides and ends of the pivot base 145. As an example, the two or more linkages (first linkage 150 and second linkage 152) coupled to the pivot base 145 may each have a first link 155 and a second link 157.
[0041] The pivot base 145 may have multiple motors to drive the two or more linkages 150, 152. As an example, these motors may be disposed on any of two or more spindle assemblies, where each spindle is configured to drive any one of the two or more linkages 150, 152. As an example, the pivot base 145 may have a first motor (or actuator) configured to drive the first linkage 151 and a second motor (or actuator) configured to drive the second linkage 152.
[0042] To provide power to active components in the robot arm 115, one or more control modules associated with the motors are disposed in the pivot base 145 or in the traverse platform 110. To achieve communication between the control modules and the motors in the pivot base 145, one or more rotary couplings may be utilized. The rotary couplings may have a power coupling configured to transfer power through the rotary coupling and / or a communication link configured to transfer communication signals through the rotary coupling. For example, a rotary coupling may be utilized to transfer power from a spindle assembly of the traverse platform 110 to the pivot base 145 and to transfer communication signals between the spindle assembly of the traverse platform 110 and the pivot base 145 of the robot arm 115.
[0043] The power coupling may operate on various physical principles and combinations thereof, such as a slip ring structure having one or more conductive rings each in contact with one or more conductive brushes, a slip ring structure wetted with a conductive fluid such as an ionic liquid, non-contact capacitive coupling, non-contact inductive coupling, etc. An example of a power coupling operating on an inductive principle is described in US2016 / 022929, US2018 / 0105044, US2018 / 0105045.
[0044] As an example, the communication link may include two optical communication modules, one fixed relative to a housing of the spindle assembly of the traverse platform 110 and the other rotating with the pivoting base 145 of the robotic arm 115. The communication link may enable contactless data transfer between the spindle assembly of the traverse platform 110 and the pivoting base 145. As an example, the communication link may be incorporated into a communication network of the controller 125 and may facilitate bidirectional data transfer to and from one or more control modules associated with the motors (which are located on the pivoting base 145).
[0045] A simplified cross-sectional view of an example of an integrated rotary coupling that may include an inductive power coupling and an optical communication link is depicted at 170 in FIG. 1B.
[0046] Referring back to FIG. 1D, a rotary thermal coupling 121 may be utilized between the pivot base 145 and the housing of the spindle assembly of the traverse platform 110 to remove heat from the pivot base 145. This heat includes heat generated by an actuator (motor) attached to the pivot base 145. An exemplary rotary thermal coupling 121 may have two parts, each of which is characterized by having one or more cylindrical faces arranged coaxially with the axis of rotation. These are arranged such that the cylindrical face of one part of the thermal coupling 121 faces the cylindrical face of the other part. The heat may then be configured to be transferred through radiation across the gap between the two opposing cylindrical faces of the rotary thermal coupling 121. This mechanism of radiation may be supplemented by convection / conduction through the environment between the opposing cylindrical faces of the heat-to-power rotary coupling if residual gas is present in the vacuum environment.
[0047] As shown at 180 in the example of Figure 1C, an array of substantially cylindrical structures may be provided on each of the two portions of the rotary thermal coupling (shown at 180a) to increase the effective area and minimize the volume occupied by the exemplary rotary thermal coupling 121. These two arrays may be arranged in an interleaved fashion.
[0048] Alternatively, as depicted in 180b, the two portions of the rotary thermal coupling 121 may have opposing disk-shaped structures configured to allow for non-contact heat transfer across a gap between them. As another alternative, any other suitable shape or structure may be utilized for the rotary thermal coupling, such as, but not limited to, a cone or a sphere, or combinations thereof.
[0049] The active surfaces of the rotary thermal coupling may be treated to improve thermal emissivity, for example the two parts of the rotary thermal coupling may be made from aluminum and the active surfaces may be anodized.
[0050] To facilitate heat transfer between the pivot base 145 and the housing of the spindle assembly of the traverse platform 110, an exemplary rotary thermal coupling 121 may be mounted to the pivot base 145 and another portion of the rotary power coupling 121 may be mounted to the housing of the spindle assembly of the traverse platform 110 in a substantially coaxial arrangement with the axis of rotation of the drive shaft 140. Alternatively, the structure of the rotary thermal coupling 121 may be directly integrated into the pivot base 145 and / or the housing of the spindle assembly of the traverse platform 110.
[0051] As previously described, the robot arm 115 may include a pivot base 145 coupled to the drive shaft 140, and linkages 150, 152 coupled to the pivot base 145. By way of example, the linkages 150, 152 may include a first link 155 and a second link 157, respectively.
[0052] 1A, the first link 155 may have only one link, which includes an end effector (end effector A) configured to carry a payload, such as a semiconductor wafer. Similarly, the second link 157 may have only one link, which includes an end effector (end effector B) also configured to carry a payload, such as a semiconductor wafer.
[0053] 2, a number of workstations 200 are positioned along and adjacent ends of the path of travel 205 of the traverse platform 110. A robot 100 (as shown in FIG. 1A ) may be used to pick and place materials, such as semiconductor wafers, between these workstations 200. The workstations 200 may be arranged in pairs (workstation pairs), and the workstation pairs are positioned on opposite sides of the path of travel 205. In this paired arrangement, each workstation pair may have a left workstation (L) and a right workstation (R).
[0054] The controller 125 of the robot 100 may utilize the traverse platform 110 to position substantially in front of the workstation pair 200 and extend end effector A to the left workstation and end effector B to the right station, and end effector A to the right station and end effector B to the left station. If the recipe and wafer flow require that the wafer be moved from the left workstation to the right workstation or vice versa, the capability to access the left and right stations using either of the two end effectors A, B may be utilized for such purpose.
[0055] 3A and 3B, another exemplary embodiment of a robot 300 and its movement along a travel path 370 are diagrammatically shown. FIG. 3A illustrates a side view of the robot 300. The robot 300 includes or is associated with a controller 325. FIG. 3B illustrates a top view of a travel path 370 along which the robot 300 may move. The robot 300 may move, for example, along a stationary base 320. As diagrammatically shown in FIG. 3A, the robot 300 may include a movable traverse platform 310 and a robot arm 315. The robot arm 315 includes a pivot base 345 (the common upper arm of the robot 300) to which two linkages are attached. The robot 300 may also include a drive 312 for implementing the movement of the traverse platform 310 and the robot arm 315. The first linkage 350 of the pivot base 345 may include two links, e.g., an upper link 355 and a lower link 356. Each link is coupled to the pivot base 345 via a revolute joint, e.g., substantially coaxially arranged. Each of the two links 355, 356 may support an end effector configured to carry a payload, such as a semiconductor wafer. For example, the upper link 355 may support end effector A and the lower link 356 may support end effector C.
[0056] Similarly, the second linkage 352 of the pivot base 345 may include two links, an upper link 357 and a lower link 358. These links may also be coupled to the pivot base 345 via another set of revolute joints, for example, arranged substantially coaxially. Each of the two links 357, 358 may also support an end effector configured to carry a payload, such as a semiconductor wafer, to the workstation 200. For example, the upper link 357 may support end effector B and the lower link 358 may support end effector D. As depicted in FIG. 3B, the pivot base 345 (common upper arm) has a longitudinal member and is rotatably coupled to the traverse platform 310 substantially at a center point Z of the longitudinal member.
[0057] 4A-4D are diagrams illustrating the operation of the exemplary robot 300 of FIG. 3A. FIGS. 4A-4D show the use of a pivot base 345 (which pivots about point Z) as a common upper arm, and two pairs of forearms or end effectors, each attached to either end of the common upper arm. FIG. 4A 400 shows the lateral movement of the robot 300 in a straight line direction indicated by arrow 405. FIG. 4B 410 shows the rotation of the pivot base 345 about point Z in various directions. FIG. 4C 420 shows the transition of end effectors A and C from left to right, which is accompanied by the transition of end effectors B and D from right to left. FIG. 4D 430 shows how the robot 300 can extend and retract each end effector independently and simultaneously. Note that not all possible combinations are shown. U.S. Pat. No. 9,149,936 discloses an angled common upper arm, and is incorporated herein by reference in its entirety.
[0058] Some operations of the example robot of FIGS. 3A and 3B can be summarized as follows. · Extend end effector A independently to the left workstation. · Extend end effector C independently to the left workstation. · Extend end effectors A and C simultaneously to the left workstation. · Extend end effector B independently to the right workstation. · Extend end effector D independently to the right workstation. · End effectors B and D are simultaneously extended to the right workstation. · Extend end effector A independently to the right workstation. · Extend end effector C independently to the right workstation. · Extend end effectors A and C simultaneously to the right workstation. · Extend end effector B independently to the left workstation. · Extend end effector D independently to the left workstation. · Extend end effectors B and D simultaneously to the left workstation.
[0059] 1A, the exemplary robot 300 of FIGURE 3 having an additional pair of end effectors can pick up a processed wafer from the workstation 200 and immediately replace it with a new or unprocessed wafer carried by another end effector, and can be utilized to perform a rapid wafer exchange operation at the workstation 200. For example, the robot 300 may use end effector A to pick up a processed wafer from the left (or right) of the workstation 200 and use end effector B to place a fresh or unprocessed wafer in the same left (or right) position on the workstation 200.
[0060] Also, as with the robot 100, the ability of any end effector to access either the left or right position of the workstation 200 may be conveniently utilized to move wafers from left to right or vice versa as required by the recipe and wafer flow.
[0061] In Fig. 5, another exemplary embodiment of a robot 500 is diagrammatically shown. The robot 500 has a robot arm 515, which has a first linkage 550. The first linkage 550 can include a first link 553 (upper arm) coupled to a pivot base 545 (common upper arm) via a revolute joint, a second link 555 (forearm) coupled to the first link 553 via a revolute joint, and a third link 557 (wrist) coupled to the second link 555 via a revolute joint. The robot 500 also includes a traverse platform 510 that travels on a stationary base 520. The robot 500 also includes a drive 512 that effects the movement of the robot 500, for example, the movement of the traverse platform 510 and the robot arm 515. The robot 500 includes or is associated with a controller 525. The first link 553 is driven directly by a motor located on the pivot base 545, and the second link 555 is driven via a belt, band, or cable drive by another motor located on the pivot base 545. The third link 557 may be constrained to point radially relative to the rotational joint between the first link 553 and the pivot base 545 via a belt, band, or cable drive.
[0062] Similarly, the second linkage 552 may include a first link 554 (upper arm) coupled to the pivot base 545 (common upper arm) via a revolute joint, a second link 556 (forearm) coupled to the first link 554 via a revolute joint, and a third link 558 (wrist) coupled to the second link 556 via a revolute joint. The first link 554 is driven directly by a motor located on the pivot base 545, and the second link 556 is driven via a belt, band, or cable drive by another motor located on the pivot base 545. The third link 558 may be constrained to be radially oriented with respect to the revolute joint between the first link 554 and the pivot base 545 via a belt, band, or cable drive.
[0063] The example robot 500 of FIG. 5 can independently extend end effector A to a left workstation, independently extend end effector B to a right station, simultaneously extend end effector A to the left station and end effector B to the right station, independently extend end effector A to the right workstation, independently extend end effector B to the left station, and simultaneously extend end effector A to the right station and end effector B to the left station.
[0064] As with the exemplary embodiment of FIG. 1A, the ability to access left and right positions of the workstation 200 with either of the two end effectors may be conveniently utilized to move a wafer from a position to the left of the workstation 200 to a position to the right of the workstation 200, or vice versa, as required by the recipe and wafer flow.
[0065] In addition, compared to the exemplary embodiment of Fig. 1A, the exemplary robot 500 of Fig. 5 can simultaneously pick and place wafers between multiple workstations 200 located on the left and right. Furthermore, the ability to independently position two end effectors may be conveniently utilized to simultaneously correct the misalignment of a wafer on one end effector and simultaneously correct the misalignment of a wafer on the other end effector when two wafers are simultaneously transferred to a pair of workstations 200. These functions may improve productivity (the number of wafer processes per unit time).
[0066] 5, the exemplary robot 500 may have an architecture with distributed actuators. For example, multiple motors each driving one of the linkages may be distributed among the linkages and among the pivot base 545. The robot arm 515 may have a pivot base 545, which may be coupled to the drive unit 512. The connection between the pivot base 545 and the drive unit 512 may be considered a shoulder joint. The pivot base 545 may be located in an air environment or a non-vacuum environment. The linkages 550, 552 may be coupled to the pivot base 545 via a revolute joint. The linkages 550, 552 may also be in an air environment or a non-vacuum environment.
[0067] In the example robot 500, particularly with respect to a distributed actuator architecture in which actuators or motors associated with the robot arm 515 are distributed throughout the robot arm 515, the actuators or motors may be controlled by a control module located in close proximity to the corresponding motor.
[0068] In the example robot 500, the upper portion of the robot arm 515 may be located in or used in a vacuum environment, although the interior space above the linkages 550, 552 may be sealed off from the vacuum environment and filled with air, another gas mixture, or a single gas (e.g., nitrogen).
[0069] Another exemplary embodiment is shown diagrammatically in Figures 6A and 6B. Figure 6A is a side view of an exemplary robot 600. The robot 600 includes or is associated with a controller 625. The robot 600 includes a robot arm 615 coupled to a traverse platform 610 that travels on a stationary base 620. Figure 6B is a top view of a travel path 606 of the robot 600. The robot 600 also includes a drive 612 for moving the robot 600. As diagrammatically shown in Figures 6A and 6B, the first linkage 650 may include a first link 653 (first upper arm) coupled to a pivot base 645 (common upper arm) via a revolute joint, a second link 655 (first forearm) coupled to the first link 653 via a revolute joint, and a third link 657 (first wrist) coupled to the second link 655 via a revolute joint. The first link 653 may be directly driven by a first motor disposed on the pivot base 645, and the second link 655 may be coupled via a belt, band, or cable drive to a second motor disposed on the pivot base 645. The third link 657 may be constrained to point radially (relative to the rotary joint) between the first link 653 and the pivot base 645 via a belt, band, or cable drive. The third link 657 may have an end effector (end effector A) configured to carry a payload such as a semiconductor wafer.
[0070] Additionally, the first linkage 650 may have a second upper arm 653a coupled to the pivot base 645 via a revolute joint, a second forearm 655a coupled to the second upper arm 653a via a revolute joint, and a second wrist 657a coupled to the second forearm 655a via a revolute joint. The second upper arm 653a may be directly driven by a third motor disposed on the pivot base 645, the second forearm 655a may be coupled to a second motor disposed on the pivot base 645 via a belt, band, or cable drive, and the second wrist 657a may be radially constrained (relative to the revolute joint) to a point between the second upper arm 653a and the pivot base 645 via a belt, band, or cable drive. The second wrist 657a may have an end effector (end effector C) configured to carry a payload, such as a semiconductor wafer.
[0071] The second linkage 652 may be a mirror image of the first linkage 650. Herein, the end effector associated with the first wrist 671 of the second linkage 652 may be referred to as end effector B, and the end effector associated with the second wrist 673 of the second linkage 652 may be referred to as end effector D.
[0072] The robot 600 may also be adapted to exhibit a distributed actuator architecture, where each linkage or link has an actuator or motor mounted thereon that provides movement for the various links.
[0073] The operation of the exemplary robot 600 of FIGS. 6A and 6B is shown diagrammatically in FIGS. 7A-7E. FIG. 7A shows at 700 the robot 600 moving in a straight line traverse along a path of travel 706. FIG. 7B shows at 710 the robot arm 615 pivoting in various directions about point Z. FIG. 7C shows at 715 the transition of end effectors A and C from left to right, which is accompanied by the transition of end effectors B and D from right to left. FIG. 7D shows at 720 how the robot 600 can extend and retract each end effector independently and simultaneously. Note that not all possible combinations are shown. FIG. 7E at 725 shows how the robot 600 can simultaneously correct misalignment of two wafers as they are delivered to a pair of workstations 200. As shown in FIG. 7E, at least one of the end effectors may be L-shaped or at least angled. No. 9,149,936, the entirety of which is incorporated herein by reference, also discloses an angled or L-shaped end effector as part of a robotic arm, with two links connected in series thereto.
[0074] To summarize the operations in the above examples, the example robot 600 of FIG. 6A may operate as follows. · Extend end effector A independently to the left workstation. · Extend end effector B independently to the right workstation. · End effector A is extended to the left workstation while end effector B is extended to the right workstation. · Extend end effector C independently to the left workstation. · Extend end effector D independently to the right workstation. · End effector C is extended to the left workstation while end effector D is extended to the right workstation. · Extend end effectors A and C simultaneously to the left station. · Extend end effectors B and D simultaneously to the right station. · End effectors A and C are extended to the left workstation, while end effectors B and D are extended to the right workstation. · Extend end effector A independently to the right workstation. · Extend end effector B independently to the left workstation. · End effector A is extended towards the right workstation while end effector B is extended towards the left workstation. · Extend end effector C independently to the right workstation. · Extend end effector D independently to the left workstation. · End effector C is extended towards the right workstation while end effector D is extended towards the left workstation. · Extend end effectors A and C simultaneously to the right workstation. · End effectors B and D are simultaneously extended towards the left workstation. · End effectors A and C are extended to the right workstation, while end effectors B and D are extended to the left workstation.
[0075] Similar to the example robot 500 of FIG. 5, the ability to access left and right stations using either of the two end effectors may be conveniently utilized to move wafers from the left workstation to the right workstation or vice versa as the recipe and wafer flow require.
[0076] In addition, similar to the exemplary embodiment of FIG. 5, the exemplary robot 600 of FIG. 6A can simultaneously pick and place wafers between multiple workstations located on the left and right. Furthermore, the ability to independently position the two end effectors of the robot arm 615 may be conveniently utilized to simultaneously correct the misalignment of a wafer on one end effector and simultaneously correct the misalignment of a wafer on the other end effector when simultaneously transferring two wafers to a pair of workstations. These capabilities may increase productivity (number of wafers processed per unit time).
[0077] Although a multiple end effector traverse robot in accordance with the present invention has been described in the examples of Figures 1A-7E, any suitable linkage may be utilized. For example, each of the first linkage and the second linkage can be in the form of one of the following mechanical configurations: A first link and a second link coupled to the first link via a revolute joint, the second link having an end effector. a first link and two second links coupled to the first link via substantially coaxial revolute joints, each of the two second links having an end effector. The robot has two rigidly connected first links, each of which supports a second link via a rotational joint, and each of the second links has an end effector.
[0078] Furthermore, the following modifications of the robot shown as an example are also possible. One link contains three end effectors. A hub, pivot base, or common upper arm contains two switch blade arms. A hub, pivot base, or common upper arm contains two dual switch blade arms. The hub, pivot base, or common upper arm includes a butterfly arm. The robot drive has a Z-axis based on a linkage. The robot drive does not have a Z-axis. The robot is equipped with a rotating thermal coupling or other type of thermal coupling. The robot has fins along the Z axis.
[0079] Another exemplary embodiment is shown diagrammatically in FIG. 8. The robot 800 of this example includes or is associated with a controller 825. The robot 800 also includes a drive (similar to the above exemplary embodiment) and a traverse platform 810 that runs on a stationary base 820. A robot arm 815 on the traverse platform 810 includes a pivoting base 845 (common upper arm) with a first linkage 850 (first forearm) and a second linkage 852 (second forearm) (switch blade arm). The first linkage 850 and the second linkage 852 each have an end effector configured to carry a payload, such as a wafer. The first linkage 850 includes a first link 851 that is coupled to the pivoting base 845 via a revolute joint. The first linkage 850 also includes a first wrist 853 and a second wrist 855 that are coupled to the first link 851 along the same axis. First wrist 853 has end effector A and second wrist 855 has end effector B. First link 851 may be driven directly by a motor located on pivot base 845 (and / or on first link 851), or first wrist 853 and second wrist 855 may each be driven via a belt, band, or cable drive by another motor located on pivot base 845. Second linkage 852 is a mirror image of first linkage 850 and has end effectors C, D and is driven similarly to first linkage 850.
[0080] Another exemplary embodiment is shown diagrammatically in FIG. 9. The robot 900 in this example includes or is associated with a controller 925. The robot 900 also includes a drive. The robot 900 also includes a plurality of end effectors. Each end effector has a respective link. As shown, the robot has three links and three end effectors. Each end effector is configured to carry a payload, such as a semiconductor wafer. The robot 900 also includes a traverse platform 910 that runs on a stationary base 920. The robot arm 915 on the traverse platform 910 includes a pivoting base 945 (common upper arm). The pivoting base 945 includes a first linkage 950 (first forearm), a second linkage 952 (second forearm), and a third linkage 954 (third forearm). Each of the first linkage 950, the second linkage 952, and the third linkage 954 includes an end effector A, B, and C, respectively. The first linkage 950, the second linkage 952, and the third linkage 954 are all coupled to the pivot base 945 via, for example, substantially coaxially arranged revolute joints, and are directly driven by one or more motors in the pivot base 945.
[0081] Another exemplary embodiment is shown diagrammatically in FIG. 10. The robot 1000 of this example includes or is associated with a controller 1025. The robot 1000 also includes two butterfly arms. The robot 1000 also includes a traverse platform 1010 that runs on a stationary base 1020. The robot arm 1015 on the traverse platform 1010 includes a pivoting base 1045 (common upper arm) with a first linkage 1050 (first forearm) and a second linkage 1052 (second forearm). The first linkage 1050 includes a first link 1060 that is coupled to the pivoting base 1045. The first linkage 1050 also includes a second link 1062. A first end of the second link 1062 is coupled to a first end of the first link 1060. Another end of the second link 1062 includes an end effector A. The second linkage 1052 is a mirror image of the first linkage 1050, has end effectors C, D, and is driven similarly to the first linkage 1050. An actuator or motor may be disposed on one or more of the pivot base 1045, the first link 1060, or a link corresponding to the first link 1060 in the second linkage 1052.
[0082] 11, the first and second linkages may each include two rigidly coupled first links, each supporting a second link via a revolute joint, and each second link having an end effector configured to carry a payload, such as a semiconductor wafer.
[0083] Yet another example is shown diagrammatically in FIG. 12. In this example, the first and second linkages may each comprise a first link, two second links, and two third links. The two second links are coupled to the first link, e.g., via substantially coaxial revolute joints, and each of the third links is coupled to a corresponding second link via a revolute joint. Each of the third links may comprise an end effector configured to carry a payload, such as a semiconductor wafer. The movement of each of the third links may be mechanically constrained, e.g., by a belt, band, or cable arrangement, such that the movement of each of the third links is dependent on the movement of the corresponding second and first links.
[0084] Yet another example is shown diagrammatically in FIG. 13. In this example, the first and second linkages may each include two rigidly coupled first links, two second links each coupled to the corresponding first links via revolute joints, and two third links each coupled to the corresponding second links via revolute joints. Each of the third links may include an end effector configured to carry a payload, such as a semiconductor wafer. The movement of each of the third links may be mechanically constrained, for example by a belt, band, or cable arrangement, such that the movement of each of the third links is dependent on the movement of the corresponding first and second links.
[0085] The above description of an exemplary internal configuration of a traverse robot having multiple end effectors according to the present invention indicates that the motors that actuate the links of the robot arm may be located inside the robot arm, e.g., mounted on the traverse platform or pivot base. However, the motors that actuate the links of the robot arm may also be located on the spindle. Also, a system of shafts, pulleys, belts, bands, and / or cables may be utilized to couple the links to the motors. Alternatively, any suitable combination of motors located in the robot arm and motors located in the spindle may be used to actuate the links of the robot arm.
[0086] As previously indicated, the traverse platform in any embodiment may include: It may also include a vertical lift mechanism, which may include, for example, one or more linear rail bearing mechanisms and a motor-driven ball screw, configured to raise and lower the spindle (also referred to as the spindle platform) vertically.
[0087] In another example, the lift mechanism may include one or more lift linkages configured to move the spindle platform vertically (or, more precisely, in a direction that includes a vertical motion component) relative to the traverse platform and stabilize the angular attitude of the spindle platform (e.g., keep the spindle platform substantially horizontal). For example, as shown in FIG. 14, the lift linkage may include a parallelogram structure with bars, supports, struts, or other means. The lift linkage may also be actuated by a rotation drive, which may include a rotation motor and a rotation sensor.
[0088] Generally, each of the one or more linkages of the lift mechanism may include one or more links, joints (rotary or other suitable type), and / or pulley mechanisms (utilizing belts, bands, or cables), which may be actuated by one or more rotary motors, linear motors, columns, or other suitable means.
[0089] The linkage or linkages of the lift mechanism may be located on only one side of the traverse platform or on both sides. As another example, the linkage or linkages may be located on only one side of the traverse platform or on both sides. Alternatively, the linkage or linkages may be located in any suitable location on the traverse platform.
[0090] There are other examples and subtleties of suitable linkage based lift mechanisms, and it should be noted that embodiments in which there is no vertical lift mechanism are also within the scope of the present invention.
[0091] The features described herein may be provided in an apparatus. The features described herein may be provided in an assembly method for assembling an apparatus. The features described herein may be provided in a method of using an apparatus having the above-mentioned features. The features described herein may be provided in control software embodied in a memory and operable with a processor and capable of controlling the operation of the apparatus as described above.
[0092] In an exemplary embodiment, the apparatus comprises: a platform configured to travel along a path of travel on a stationary base; a drive coupled to the platform; a movable arm assembly; Equipped with. The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; a second linkage coupled to the pivot base; Equipped with. The first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. The second linkage is a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The platform is configured to travel on the stationary base along a movement path in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transport between at least one of the first to fourth substrate holding areas and a respective substrate workstation. At least one motor for moving at least one of the first linkage or the second linkage is disposed on the pivot base and at least one of the first linkage and the second linkage.
[0093] The pivot base may be configured to be pivotable relative to the drive unit at a point located substantially at a geometric center of the pivot base. The first upper link may be configured to be pivotable on the pivot base through the first pivot joint, and the first lower link may be configured to be pivotable on the pivot base through the second pivot joint such that a position of the first end effector and a position of the second end effector are reversed relative to the pivot base. The second upper link may be configured to be pivotable on the pivot base through the third pivot joint, and the second lower link may be configured to be pivotable on the pivot base through the fourth pivot joint such that a position of the third end effector and a position of the fourth end effector are reversed relative to the pivot base. The pivot base may be configured to be pivotable simultaneously with at least one of the first to fourth end effectors being extended to a respective substrate workstation. The pivoting base may be configured to pivot simultaneously when extension of the first end effector to a first substrate workstation of a plurality of substrate workstations and extension of the second end effector to a second substrate workstation of the plurality of substrate workstations occur simultaneously. The first upper link may include a first upper arm coupled to the pivoting base, a first forearm coupled to the first upper arm, and a first wrist to which the first end effector is attached. The first lower link may include a second upper arm coupled to the pivoting base, a second forearm coupled to the second upper arm, and a second wrist to which the second end effector is attached. The second upper link may include a third upper arm coupled to the pivoting base, a third forearm coupled to the third upper arm, and a third wrist to which the third end effector is attached. The second lower link may include a fourth upper arm coupled to the pivot base, a fourth forearm coupled to the fourth upper arm, and a fourth wrist to which the fourth end effector is attached. The second upper arm may be coupled to the pivot base and coaxial with the first upper arm.The fourth upper arm may also be coupled to the pivot base and coaxial with the third upper arm.At least one of the first to fourth end effectors may be curved.At least one of the movements of the first upper link, the first lower link, the second upper link and the second lower link may be adapted to compensate for misalignment in movement and transfer of the substrate to the substrate workstation.
[0094] In another exemplary embodiment, the method comprises: Providing a platform configured to travel along a path of travel on a stationary base; providing a drive coupled to the platform; connecting a pivot base of a movable arm assembly to said drive section; Includes. a first linkage of the movable arm assembly coupled to the pivot base; a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. a second linkage of the movable arm assembly coupled to the pivot base and a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint, the platform is configured to travel on the stationary base along a path of movement in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transfer from at least one of the first through fourth substrate holding areas to a respective substrate workstation.
[0095] The pivot base may be configured to be pivotable relative to the drive unit at a point located substantially at a geometric center of the pivot base. The first upper link may be configured to be pivotable on the pivot base through the first pivot joint, and the first lower link may be configured to be pivotable on the pivot base through the second pivot joint such that a position of the first end effector and a position of the second end effector are reversed relative to the pivot base. The second upper link may be configured to be pivotable on the pivot base through the third pivot joint, and the second lower link may be configured to be pivotable on the pivot base through the fourth pivot joint such that a position of the third end effector and a position of the fourth end effector are reversed relative to the pivot base. The pivot base may be configured to be pivotable simultaneously with at least one of the first to fourth end effectors being extended to a respective substrate workstation. The pivot base may be configured to be pivotable simultaneously when extension of the first end effector to a first substrate workstation of a plurality of substrate workstations and extension of the second end effector to a second substrate workstation of the plurality of substrate workstations occur simultaneously.
[0096] In another exemplary embodiment, the method comprises: placing a first substrate on a first substrate holding area of a first end effector and a second substrate on a second substrate holding area of a second end effector; wherein the first end effector and the second end effector form part of a movable arm assembly, the movable arm assembly having a pivot base connected to a drive; The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint. A second linkage is connected to the moving base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The method further includes running the platform on a stationary base along a movement path in two opposing directions, and moving the drive section and the movable arm assembly to effect independent and simultaneous substrate movement and substrate transport between at least one of the first to fourth substrate holding areas and a respective substrate workstation.
[0097] Moving the platform and moving the drive and the movable arm assembly may include rotating the pivot base simultaneously with at least one of the first through fourth end effectors being extended to a respective substrate workstation.
[0098] Another exemplary embodiment is a machine-readable non-volatile program storage device tangibly embodying a program of instructions executable by the machine to perform a process, the process comprising: placing a first substrate on a first substrate holding area of a first end effector; placing a second substrate on a second substrate holding area of a second end effector; placing a third substrate on a third substrate holding area of a third end effector; placing a fourth substrate on a fourth substrate holding area of a fourth end effector; However, the first to fourth end effectors form part of a movable arm assembly, and the movable arm assembly has a rotating base connected to a drive unit, The movable arm assembly includes: A pivot base coupled to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and comprising the first end effector having at least the first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and comprising the second end effector having at least the second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; The movable arm assembly further comprises a second linkage coupled to the pivot base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and comprising the third end effector having at least the third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and comprising the fourth end effector having at least the fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint. The process also includes controlling movement of a platform on the stationary base in two opposing directions along a path of movement, and controlling movement of the drive and the movable arm assembly to effect independent and simultaneous substrate movement and substrate transfer between at least one of the first through fourth substrate holding areas and a respective substrate workstation.
[0099] It should also be understood that the above description is merely illustrative. Various variations and modifications may occur to those skilled in the art. For example, the features recited in the various dependent claims may be combined with each other in any suitable combination. In addition, features from the various embodiments described above may be selectively combined to form new embodiments. This application is therefore intended to embrace all such variations, modifications and variations that fall within the scope of the appended claims.
Claims
1. a platform configured to travel on a stationary base along a path of travel; a drive coupled to the platform; A movable arm assembly; the movable arm assembly comprising: A rotation base connected to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; The movable arm assembly further comprises a second linkage coupled to the pivot base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint; the platform is configured to travel on the stationary base along a path of movement in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transfer between at least one of the first through fourth substrate holding areas and any of a plurality of substrate workstations disposed along the path of movement; at least one motor is disposed on the pivot base and on at least one of the first linkage and the second linkage for moving at least one of the first linkage and the second linkage; Device.
2. The apparatus of claim 1 , wherein the pivoting base is configured to be pivotable relative to the drive at a point located substantially at a geometric center of the pivoting base.
3. 2. The apparatus of claim 1, wherein the first upper link is configured to be rotatable on the pivot base through the first rotary joint, and the first lower link is configured to be rotatable on the pivot base through the second rotary joint such that a position of the first end effector and a position of the second end effector are reversed relative to the pivot base.
4. 4. The apparatus of claim 3, wherein the second upper link is configured to be rotatable on the pivot base through the third pivot joint, and the second lower link is configured to be rotatable on the pivot base through the fourth pivot joint such that a position of the third end effector and a position of the fourth end effector are reversed relative to the pivot base.
5. The apparatus of claim 1 , wherein the pivot base is configured such that at least one of the first through fourth end effectors is simultaneously extended and pivotable to a respective substrate workstation.
6. 6. The apparatus of claim 5, wherein the pivot base is configured to be pivotable simultaneously when extension of the first end effector to a first substrate workstation of a plurality of substrate workstations and extension of the second end effector to a second substrate workstation of the plurality of substrate workstations occur simultaneously.
7. the first upper link includes a first upper arm coupled to the rotating base, a first forearm coupled to the first upper arm, and a first wrist to which the first end effector is attached; the first lower link includes a second upper arm coupled to the pivot base, a second forearm coupled to the second upper arm, and a second wrist to which the second end effector is attached; the second upper link includes a third upper arm coupled to the rotation base, a third forearm coupled to the third upper arm, and a third wrist to which the third end effector is attached; the second lower link includes a fourth upper arm coupled to the pivot base, a fourth forearm coupled to the fourth upper arm, and a fourth wrist to which the fourth end effector is attached.
2. The apparatus of claim 1.
8. The apparatus of claim 7 , wherein the second upper arm is coupled to the pivot base and is coaxial with the first upper arm, and the fourth upper arm is also coupled to the pivot base and is coaxial with the third upper arm.
9. The apparatus of claim 8 , wherein at least one of the first through fourth end effectors is curved.
10. 10. The apparatus of claim 9, wherein at least one of the movements of the first upper link, the first lower link, the second upper link, and the second lower link is adapted to compensate for misalignment of movement and transfer of the substrate to a substrate workstation.
11. The apparatus of claim 1 , wherein the drive and the movable arm assembly are configured to cause movement and transfer of a substrate from a first substrate workstation on a first side of the path of movement to a second substrate workstation on a second side of the path of movement.
12. Providing a platform configured to travel on a stationary base along a path of travel; Providing a drive coupled to the platform; connecting a pivot base of a movable arm assembly to the drive section; A method comprising: a first linkage of the movable arm assembly coupled to the pivot base; a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; a second linkage of the movable arm assembly coupled to the pivot base and a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint; the platform is configured to travel on the stationary base along a path of movement in two opposing directions, and the drive and movable arm assembly are configured to effect independent and simultaneous substrate movement and substrate transfer from at least one of the first through fourth substrate holding areas to a respective substrate workstation; at least one motor is disposed on the pivot base and on at least one of the first linkage and the second linkage for moving at least one of the first linkage and the second linkage; method.
13. The method of claim 12 , wherein the pivoting base is configured to be pivotable relative to the drive at a point located substantially at a geometric center of the pivoting base.
14. 13. The method of claim 12, wherein the first upper link is configured to be rotatable on the pivot base through the first revolute joint, and the first lower link is configured to be rotatable on the pivot base through the second revolute joint such that a position of the first end effector and a position of the second end effector are reversed relative to the pivot base.
15. 15. The method of claim 14, wherein the second upper link is configured to be rotatable on the pivot base through the third revolute joint, and the second lower link is configured to be rotatable on the pivot base through the fourth revolute joint such that a position of the third end effector and a position of the fourth end effector are reversed relative to the pivot base.
16. The method of claim 12, wherein the pivot base is configured to be pivotable simultaneously with at least one of the first through fourth end effectors being extended to a respective substrate workstation.
17. 17. The method of claim 16, wherein the pivot base is configured to be pivotable simultaneously when extension of the first end effector to a first substrate workstation of a plurality of substrate workstations and extension of the second end effector to a second substrate workstation of the plurality of substrate workstations occur simultaneously.
18. 1. A method comprising: placing a first substrate on a first substrate holding area of a first end effector and a second substrate on a second substrate holding area of a second end effector; wherein the first end effector and the second end effector form part of a movable arm assembly, the movable arm assembly having a pivot base connected to a drive; The movable arm assembly includes: A rotation base connected to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and including a first end effector having at least a first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and including a second end effector having at least a second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; The movable arm assembly further comprises a second linkage coupled to the pivot base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and including a third end effector having at least a third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and including a fourth end effector having at least a fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint; The method further comprises: running a platform along a path of movement in two opposing directions on a stationary base; and moving said drive and said movable arm assembly to effect independent and simultaneous substrate movement and substrate transfer between at least one of said first through fourth substrate holding areas and a respective substrate workstation; moving the movable arm assembly with at least one motor disposed on at least one of the pivot base, the first linkage, and the second linkage; A method comprising:
19. 20. The method of claim 18, wherein moving the platform and moving the drive and the movable arm assembly comprises rotating the pivoting base simultaneously with at least one of the first through fourth end effectors being extended to a respective substrate workstation.
20. A machine-readable non-volatile program storage device tangibly embodying a program of instructions executable by the machine to perform a process, the process comprising: placing a first substrate on a first substrate holding area of a first end effector; placing a second substrate on a second substrate holding area of a second end effector; placing a third substrate on a third substrate holding area of a third end effector; placing a fourth substrate on a fourth substrate holding area of a fourth end effector; wherein the first to fourth end effectors form part of a movable arm assembly, the movable arm assembly having a pivot base connected to a drive; The movable arm assembly includes: A rotation base connected to the drive unit; a first linkage coupled to the pivot base; and the first linkage comprises: a first upper link coupled to the pivot base via a first rotary joint and comprising the first end effector having at least the first substrate holding area; a first lower link coupled to the pivot base via a second rotary joint and comprising the second end effector having at least the second substrate holding area; wherein the first revolute joint is substantially coaxial with the second revolute joint; The movable arm assembly further comprises a second linkage coupled to the pivot base, the second linkage comprising: a second upper link coupled to the pivot base via a third rotary joint and comprising the third end effector having at least the third substrate holding area; a second lower link coupled to the pivot base via a fourth revolute joint and comprising the fourth end effector having at least the fourth substrate holding area; wherein the third revolute joint is substantially coaxial with the fourth revolute joint; The process also comprises: controlling movement of a platform on a stationary base in two opposing directions along a path of movement; and controlling movement of the drive and the movable arm assembly to effect independent and simultaneous substrate movement and substrate transfer between at least one of the first through fourth substrate holding areas and a respective substrate workstation; controlling movement of the movable arm assembly with at least one motor disposed on at least one of the pivot base, the first linkage, and the second linkage; a non-volatile program storage device including: