Method for generating reference status data for monitoring a chamber status, method for monitoring a chamber status, and apparatus for monitoring a chamber status - Patents.com

Abstract

A method for monitoring a status of a chamber is provided, the method including: obtaining a reference status data set reflecting a status of the chamber; transmitting radio waves within a specific frequency range inside the chamber to be monitored and receiving radio waves reflected by the interior space of the chamber; generating current status data of the chamber using the received radio waves; generating monitoring information for a current status of the chamber using the reference status data set and the current status data; and providing the monitoring information.

Description

[Technical Field]

[0001] The present disclosure relates to a method for generating reference status data for monitoring the status of a chamber, a method for monitoring the status of a chamber, and a device for monitoring the status of a chamber. [Background technology]

[0002] In semiconductor or display manufacturing and inspection processes, it is important to check whether the status of equipment for the process is within a verified normal range and whether the process conditions are set properly. For example, the status of an ongoing process can be partially checked by detecting certain plasma physical quantities, but it is difficult to personally check the status, for example, whether the equipment is properly assembled before the process starts or whether the equipment status is normal during the process. Ultimately, the only option is to check the process results by performing test runs, which incurs additional costs and time. In addition, even if the process results are incorrect, it is difficult to identify the cause of the problem. Summary of the Invention [Problem to be solved by the invention]

[0003] The present disclosure is directed to providing monitoring of the status of a chamber.

[0004] The present disclosure is directed to providing monitoring of the chamber status not only when a process is in progress, but also when no process is in progress.

[0005] The present disclosure is directed to providing a means for comparing the status of multiple chambers.

[0006] The technical problems to be solved by the present disclosure are not limited to the above-mentioned technical problems, and other technical problems not mentioned will be clearly understood by those skilled in the art from the present disclosure. [Means for solving the problem]

[0007] According to one embodiment, a method for generating reference status data for monitoring the status of a chamber includes the following steps: preparing a chamber in a first status, the chamber including a plurality of parts, wherein a geometric shape of an internal space of the chamber is defined by the plurality of parts, and wherein the first status is defined by a combination of the geometric statuses of each of the plurality of parts; transmitting radio waves in a specific frequency range to the internal space of the chamber in the first status and receiving radio waves reflected by the internal space of the chamber; and generating first reference status data of the chamber in the first status by using the radio waves received by an antenna.

[0008] The method further includes preparing the chamber in a second status in which the geometric status of at least some of the plurality of parts has changed from the chamber in the first status; and generating second reference status data by transmitting and receiving radio waves to and from the chamber in the second status.

[0009] The step of transmitting and receiving radio waves includes a step of transmitting radio waves from outside the chamber to the interior space of the chamber through a viewport formed in the chamber, and a step of receiving radio waves reflected by the interior space of the chamber.

[0010] According to one embodiment, a method for generating reference status data for monitoring the status of a chamber includes the steps of: preparing a chamber in a first status including a plurality of components, wherein the geometric and electrical status of the internal space of the chamber is defined by the plurality of components, and wherein the first status is defined by a combination of the geometric and electrical status of each of the plurality of components; transmitting radio waves in a specific frequency range to the internal space of the chamber in the first status and receiving radio waves reflected by the internal space of the chamber; and generating first reference status data of the chamber in the first status by using the radio waves received by an antenna.

[0011] According to one embodiment, a method for monitoring the status of a chamber includes: acquiring a reference status data set reflecting the status of the chamber; transmitting radio waves within a specific frequency range to the interior space of the chamber to be monitored and receiving the radio waves reflected by the interior space of the chamber; generating current status data of the chamber using the received radio waves; generating monitoring information for the current status of the chamber using the reference status data set and the current status data; and providing the monitoring information, wherein the reference status data set includes a plurality of reference status data reflecting a plurality of statuses of the chamber, and wherein generating the monitoring information includes calculating a similarity between each of the plurality of reference status data and the current status data, and generating the monitoring information based on the similarity.

[0012] The reference status data set includes first reference status data reflecting a first status of the chamber and second reference status data reflecting a second status of the chamber, wherein generating the monitoring information includes calculating a first similarity between the first reference status data and the current status data; calculating a second similarity between the second reference status data and the current status data; and generating the monitoring information based on the first similarity and the second similarity.

[0013] The monitoring information includes information indicating that the chamber is in a status where at least the first status and the second status overlap when the first similarity is greater than or equal to a first reference value and the second similarity is greater than or equal to a second reference value.

[0014] The reference status data set includes a plurality of reference status data reflecting a plurality of statuses of the chamber, and wherein generating the monitoring information includes calculating a similarity between each of the plurality of reference status data and the current status data; and generating the monitoring information based on the similarity.

[0015] The reference status data set includes a plurality of reference status data reflecting a plurality of statuses of the chamber, wherein the method further includes a step of setting the current status data as new reference status data if all similarities between each of the plurality of reference status data and the current status data are lower than a reference value.

[0016] The method further includes setting the current status data as new reference status data if a user input is received setting the current status of the chamber as a reference status.

[0017] The specific frequency range includes a first frequency section and a second frequency section, and wherein the step of generating the monitoring information includes: calculating a first similarity between data corresponding to at least a portion of the first frequency section among the plurality of reference status data of the reference status data set and data corresponding to the first frequency section among the current status data; calculating a second similarity between data corresponding to at least a portion of the second frequency section among the plurality of reference status data of the reference status data set and data corresponding to the second frequency section among the current status data; and generating the monitoring information based on the first similarity and the second similarity.

[0018] The step of providing the monitoring information includes outputting an alarm in consideration of a similarity between the reference status data set and the current status data.

[0019] The step of transmitting and receiving radio waves includes a step of transmitting radio waves from outside the chamber to the interior space of the chamber through a viewport formed in the chamber, and a step of receiving radio waves reflected by the interior space of the chamber.

[0020] The reference status data set includes first process reference status data for a first process and second process reference status data for a second process, and wherein generating the monitoring information includes: acquiring process information; and generating the monitoring information using one of the first process reference status data and the second process reference status data and the current status data based on the process information.

[0021] According to one embodiment, a non-transitory computer-readable medium may be provided having instructions stored thereon, the instructions, when executed by one or more processors of a device, causing the device to perform a method.

[0022] According to one embodiment, a device for monitoring the status of a chamber includes: an antenna for transmitting radio waves within a frequency range of 300 MHz or higher and 30 GHz or lower to the inside of the chamber and receiving the radio waves reflected by the internal space of the chamber; a bracket for fixing the antenna to the outside of the chamber; a signal processing unit for applying an electric signal to the antenna and acquiring the electric signal from the antenna; a communication unit for communicating with the outside; and a control unit for generating monitoring information for the status of the chamber.

[0023] The bracket is designed to fix the position of the antenna outside a viewport formed in the chamber.

[0024] The positional relationship between the bracket and the antenna is designed so that one end of the antenna adjacent to the viewport is a predetermined distance from one side of the viewport adjacent to the antenna.

[0025] The position of the antenna is fixed by the bracket so as to correspond to a viewport or separate port for the antenna formed in the chamber, and the position of the antenna is fixed by the bracket so that one end of the antenna adjacent to the viewport or separate port for the antenna is a predetermined distance from one side of the viewport or separate port adjacent to the antenna.

[0026] The device further includes an electromagnetic shield disposed outside the chamber and surrounding the antenna.

[0027] The control unit generates status data regarding radio waves transmitted from and received by the antenna and uses the status data to generate the monitoring information.

[0028] The control unit generates status data relating to the ratio between an input voltage applied to the antenna and an output voltage output from the antenna, and uses the status data to generate the monitoring information.

[0029] However, the solutions to the problems of the present disclosure are not limited to the above solutions, and solutions not mentioned may be clearly understood by those skilled in the art from the present disclosure. [Effects of the invention] According to an embodiment of the present disclosure, radio waves are transmitted inside the chamber and the radio waves reflected by the interior space of the chamber are received and analyzed, thereby monitoring the status of the chamber with less cost and time.

[0030] The effects of the present disclosure are not limited to the above-mentioned effects, and other effects not mentioned will be clearly understood by those skilled in the art from the present disclosure. [Brief explanation of the drawings]

[0031] [Figure 1] FIG. 1 is a block diagram illustrating a monitoring device according to an embodiment. [Figure 2] 1 is a schematic diagram illustrating a monitoring device installed in a chamber, according to an embodiment. [Figure 3] 1 is a schematic diagram illustrating a monitoring device installed in a chamber, according to an embodiment. [Figure 4] 10 is a graph showing an S11 parameter, which is an example of status data. [Figure 5] 1 is a flowchart illustrating a method for generating reference status data, according to an embodiment. [Figure 6] 1 is a flowchart illustrating a method for generating reference status data, according to an embodiment. [Figure 7] FIG. 2 illustrates a reference status dataset including a reference status sub-dataset, according to an embodiment. [Figure 8] 1 is a flowchart illustrating a method for monitoring a chamber, according to an embodiment. [Figure 9] 1 is a flowchart illustrating a method for monitoring a chamber, according to an embodiment. [Figure 10] FIG. 10 illustrates a display of monitoring information according to an embodiment. [Figure 11] FIG. 10 illustrates an analysis of each frequency section of the status data, according to an embodiment. [Figure 12] 1 is a block diagram showing a monitoring system according to an embodiment; [Figure 13] 1 is a schematic diagram illustrating a monitoring system installed in a process device, according to an embodiment. [Figure 14] FIG. 10 is a diagram showing the status of the chambers used in the experimental examples. [Figure 15] FIG. 10 is a diagram showing the status of the chambers used in the experimental examples. [Figure 16] FIG. 10 is a diagram showing the status of the chambers used in the experimental examples. [Figure 17] FIG. 10 is a diagram showing the status of the chambers used in the experimental examples. [Figure 18] FIG. 10 is a diagram showing experimental results in an experimental example. [Figure 19] FIG. 10 is a diagram showing experimental results in an experimental example. [Figure 20] FIG. 10 is a diagram showing experimental results in an experimental example. [Figure 21] FIG. 10 is a diagram showing experimental results in an experimental example. DETAILED DESCRIPTION OF THE INVENTION

[0032] The embodiments described in this disclosure are intended to clearly explain the concept of the present disclosure to those skilled in the art to which the present disclosure pertains, and therefore the present disclosure is not limited to the embodiments described in this disclosure, and the scope of the present disclosure should be construed as including modifications or variations within the concept of the present disclosure.

[0033] The terms used in this disclosure are currently common terms widely used in consideration of the functions in this disclosure. However, the terms may change depending on the intentions of those skilled in the art, precedents, or the emergence of new technologies. However, if a specific term is defined and used as having an optional meaning, the meaning of the term will be explained. Therefore, the terms used in this disclosure should be interpreted based on the actual meaning of the term and the details throughout this disclosure, rather than simply the name of the term.

[0034] The drawings attached to this disclosure are intended to facilitate explanation of the present disclosure, and the shapes shown in the drawings may be exaggerated to facilitate understanding of the present disclosure, so the present disclosure is not limited by the drawings.

[0035] In this disclosure, if it is determined that a detailed description of a known structure or function related to the present disclosure would obscure the subject matter of the present disclosure, the detailed description will be omitted. In addition, throughout this disclosure, terms such as first, second, etc. are used only to distinguish one element from another, unless otherwise specified.

[0036] According to the present disclosure, a monitoring device may be provided. The monitoring device transmits radio waves to the inside of a chamber of process equipment such as semiconductor process equipment and display process equipment, and receives radio waves reflected by the internal space of the chamber, thereby monitoring the geometric status of the internal space of the chamber. More specifically, the chamber includes multiple components, such as a lower electrode on which a substrate such as a wafer is placed, an upper electrode facing the lower electrode, pins for supporting the substrate, and a baffle. The geometric status of the chamber may be defined by a combination of geometric statuses, such as the position or shape of each component. In this specification, even if the same radio waves are transmitted to the inside of the chamber, the received radio waves may vary depending on the geometric status of the chamber. For example, if the geometric status of some of the components changes, for example, if the position or shape of some of the components changes, the radio waves received after the change may differ from the radio waves received before the change, even if the same radio waves are transmitted to the inside of the chamber. In other words, how the radio waves are reflected by the internal space of the chamber may vary depending on the geometric status of the chamber. In other words, the received reflected waves may reflect the geometric status of the chamber.

[0037] Accordingly, the monitoring device can monitor chambers in which no process is in progress (as well as chambers in which a process is in progress). For example, the monitoring device can monitor chambers in which no process is in progress by monitoring the geometric status of the internal space of the chamber, for example, to determine the assembly status of the process equipment when the process equipment was manufactured, or to determine the results of preventive maintenance (PM) of the process equipment. As another example, the monitoring device can monitor chambers in which a process is in progress by monitoring the geometric status of the internal space of the chamber, for example, to proceed with the process while checking that each process step is proceeding normally, or to predict the timing of preventive maintenance.

[0038] As described above, the devices and methods for monitoring the status of a chamber disclosed herein monitor whether the equipment is properly assembled before the process begins, or whether the status of the equipment is normal between and during the process. That is, the objects monitored by the devices and methods disclosed herein may include the geometric shape of each of the components inside the chamber, the wear level of each of the components, the relative positional relationship between each of the components, unwanted deposition of by-products generated by processing a target substrate through the chamber on the inner walls of the chamber and the surfaces of each component inside the chamber, etc.

[0039] On the other hand, the objects monitored by the devices and methods disclosed herein may not include the state of materials and energy supplied to the chamber being monitored (e.g., activated species, etching gases, inert gases flowing into the chamber to perform the required process, RF power, or plasmas thereof, etc.).

[0040] 1 is a block diagram illustrating a monitoring device according to an embodiment. Referring to FIG. 1, the monitoring device 100 may include an antenna 110, a signal processing unit 120, a communication unit 130, a control unit 140, and a storage unit 150.

[0041] Monitoring device 100 may transmit and receive radio waves via antenna 110. Antenna 110 may receive electrical signals to transmit radio waves. Antenna 110 may receive radio waves and convert the radio waves into electrical signals. Monitoring device 100 may include one antenna 110. Alternatively, monitoring device 100 may include two or more antennas 110. In this case, one or some of the two or more antennas 110 may be for transmitting radio waves and the others may be for receiving radio waves. Alternatively, each of two or more antennas 110 may be for transmitting and receiving radio waves at different locations.

[0042] Monitoring device 100 may apply an electrical signal to antenna 110 and acquire an electrical signal from antenna 110 via signal processing unit 120. Signal processing unit 120 may apply an electrical signal within a specific frequency range to antenna 110. Signal processing unit 120 may acquire an electrical signal within a specific frequency range from antenna 110.

[0043] The monitoring device 100 may generate status data via the signal processing unit 120, which will be described in more detail below.

[0044] The monitoring device 100 may perform communication with the outside world via the communication unit 130. For example, the communication unit 130 may transmit status data and monitoring information to the outside world.

[0045] The communication unit 130 may perform wired or wireless communication, and may be, for example, but not limited to, a wired / wireless local area network (LAN) module, a WAN module, an Ethernet module, a Bluetooth module, a ZigBee module, a Universal Serial Bus (USB) module, an IEEE 1394 module, a Wi-Fi module, an Ether-CAT module, a DeviceNet module, or a combination thereof.

[0046] The monitoring device 100 may generate the monitoring information via the control unit 140. The control unit 140 may generate the monitoring information based on the status data, as will be described in more detail below.

[0047] The control unit 140 may be implemented as a computer or similar device in accordance with hardware, software, or a combination thereof. Hardware-wise, the control unit 140 may be one or more processors. Alternatively, the control units 140 may be provided as processors that are physically separated from each other and cooperate via communication. The control unit 140 may be, for example, but is not limited to, a central processing unit (CPU), a graphics processing unit (GPU), a digital signal processor (DSP), a state machine, a field programmable gate array (FPGA), an application specific integrated circuit (ASIC), a radio frequency integrated circuit (RFIC), or a combination thereof. Software-wise, the control unit 140 may be provided in the form of a program that drives the hardware control unit 140.

[0048] The monitoring device 100 may store various types of data and programs in the storage unit 150. For example, the storage unit 150 may store status data generated by the signal processing unit 120. As another example, the storage unit 150 may store monitoring information generated by the control unit 140.

[0049] Storage unit 150 may be, for example, but is not limited to, a non-volatile semiconductor memory, a hard disk, a flash memory, a solid-state drive (SSD), a random access memory (RAM), a read-only memory (ROM), an electrically erasable programmable read-only memory (EEPROM), other types of tangible non-volatile recording media, or a combination thereof.

[0050] The monitoring device 100 may further include a fixing portion 160. The fixing portion 160 may fix the antenna 110 to a location close to the chamber. For example, the fixing portion 160 may fix the antenna 110 so that the antenna 110 and the chamber are spaced apart by a predetermined distance. The predetermined distance may be, for example, but is not limited to, 1 mm, 3 mm, 5 mm, 7 mm, or 1 cm. As another example, the fixing portion 160 may fix the antenna 110 so that the antenna 110 and the chamber are in contact with each other. The fixing portion 160 may be, for example, but is not limited to, a bracket.

[0051] Monitoring device 100 may further include output unit 170. For example, output unit 170 may be a display. Monitoring device 100 may display monitoring information via the display. As another example, output unit 170 may be a speaker. Monitoring device 100 may output an alarm via the speaker.

[0052] Monitoring device 100 may further include an electromagnetic wave shield 180. Electromagnetic wave shield 180 prevents antenna 110 from being affected by external electromagnetic waves or reduces the effect of such waves. For example, electromagnetic wave shield 180 may be disposed outside the chamber to surround antenna 110. Electromagnetic wave shield 180 may be made of various materials capable of blocking electromagnetic waves.

[0053] It may be possible to provide an integrated type monitoring device 100. For example, the monitoring device 100 may be provided in a form in which the antenna 110, the signal processing unit 120, the communication unit 130, the control unit 140, the storage unit 150, and the fixed part 160 are integrated.

[0054] Alternatively, there may be provided a separate type of monitoring device 100. For example, the monitoring device 100 may be provided in a form in which the antenna 110 and other elements are separate.

[0055] Not all elements shown in Fig. 1 are essential elements of the monitoring device, and at least one or some of the elements of the monitoring device shown in Fig. 1 may be omitted. In addition, the monitoring device may further include elements not shown in Fig. 1.

[0056] The monitoring device may be implemented using a network analyzer such as a vector network analyzer (VNA).

[0057] For example, the signal processing unit, the communication unit, the control unit, and the storage unit may be realized using a network analyzer.

[0058] As another example, the signal processing unit may be realized using a network analyzer, in which case, in addition to the network analyzer, the monitoring device may include additional devices for realizing a communication unit, a control unit, and a storage unit.

[0059] A monitoring device may be installed within the chamber.

[0060] 2 and 3 are schematic diagrams illustrating a monitoring device installed in a chamber, according to an embodiment.

[0061] 2, the antenna may be located outside the chamber 10. For example, the antenna may be located outside a viewport 11 formed in the chamber 10.

[0062] The antenna may be mounted outside the chamber 10 by a fixed portion. For example, the antenna may be mounted outside the chamber 10 by a fixed portion such that the antenna and the chamber 10 are spaced apart a predetermined distance. As another example, the antenna may be mounted outside the chamber 10 by a fixed portion such that the antenna and the chamber 10 are in contact with each other.

[0063] Although not shown, the antenna may be located inside the chamber. For example, the antenna may be located inside a viewport formed in the chamber. The antenna may be attached to the inside of the chamber by a fixture. However, if the antenna is located inside the chamber, the antenna may contaminate the chamber or may become contaminated as the process progresses, which may be disadvantageous compared to locating the antenna outside the chamber.

[0064] Referring to FIG. 3, in the case of an integrated type monitoring device 100, the monitoring device 100 can be used in a form attached to the chamber 10.

[0065] In the case of separate types of monitoring devices, the monitoring device may be used in a configuration in which only one or some elements of the monitoring device are attached to the chamber, and other elements are connected to the elements attached to the chamber via wires. For example, the monitoring device may be used in a configuration in which an antenna is attached to the chamber, and other elements are connected to the antenna via wires. The connecting wires may be, for example, coaxial cables.

[0066] 2 and 3, the antenna is positioned relative to the viewport, but in addition to the viewport, the antenna may be positioned relative to a ceramic or other region of the chamber through which radio waves penetrate. For example, in addition to the presence of a viewport, an additional port for mounting the antenna may be formed in the chamber, and the antenna may be positioned relative to the additional port.

[0067] 2 and 3 as including one antenna, the monitoring device may include two or more antennas, as noted above, where one or some of the two or more antennas may be attached to one region of the chamber and others may be attached to another region of the chamber.

[0068] Below, a method for monitoring the status of the chamber is described in more detail.

[0069] The monitoring device may generate status data.

[0070] The status data may relate to radio waves incident from the antenna to the inside of the chamber (hereinafter referred to as "incident waves") and radio waves reflected by the interior space of the chamber and received by the antenna (hereinafter referred to as "reflected waves"). The status data may relate to voltages applied to the antenna and voltages output from the antenna.

[0071] The status data may correspond to a particular frequency range. The status data may be generated for a particular frequency range.

[0072] The status data may be defined using the incident wave and the reflected wave. For example, the status data may be defined using the ratio between the incident wave and the reflected wave, such as the ratio of the reflected wave to the incident wave. The status data may be, for example, but not limited to, S parameters, H parameters, Y parameters, Z parameters, or parameters calculated therefrom.

[0073] In some embodiments, the status data may be S-parameters.

[0074] In some other embodiments, the status data may be an H parameter.

[0075] In some other embodiments, the status data may be a Y parameter.

[0076] In some other embodiments, the status data may be a Z parameter.

[0077] In some other embodiments, the status data may be a parameter derived from at least one selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0078] Additionally, in some other embodiments, the status data may be a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0079] Additionally, in some other embodiments, the status data may be a parameter derived from a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0080] That is, the status data may be i) an S parameter, ii) an H parameter, iii) a Y parameter, iv) a Z parameter, v) a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters, vi) a parameter derived from an S parameter, H parameter, Y parameter, and Z parameter, or vii) a parameter derived from a combination of at least two parameters selected from the group of S parameters, H parameters, Y parameters, and Z parameters.

[0081] For example, the status data may be represented as the following n×2 matrix: (First frequency) (Size of reflected wave / Size of incident wave) (Second frequency) (Size of reflected wave / Size of incident wave) … (nth frequency)(size of reflected wave / size of incident wave) As another example, the status data may be represented as the following n×3 matrix: (First frequency) (Incident wave size) (Reflected wave size) (Second frequency) (Incident wave size) (Reflected wave size) … (nth frequency)(size of incident wave)(size of reflected wave) In this specification, n represents the number of frequencies at which the status data is measured. The first frequency is the lower limit of the frequencies at which the status data is measured. The nth frequency is the upper limit of the frequencies at which the status data is measured. The first through nth frequencies are the frequency range at which the status data is measured.

[0082] The status data may include parameter values ​​for a specific frequency range. In the above example, (size of reflected wave / size of incident wave), (size of incident wave), and (size of reflected wave) may be parameter values. The number of parameter values ​​included in the status data may be, for example, but is not limited to, at least 500, 1000, 1500, or 2000. Considering the status data, multiple status data belonging to a specific frequency range may include multiple peaks belonging to the specific frequency range. The number of peaks included in the status data may be, for example, but is not limited to, at least 5, 10, 20, 50, or 100.

[0083] The status data may correspond to a particular point in time. The status data may be generated at a particular point in time. For example, the particular point in time may be a point in time when a process is not in progress, such as when assembly of process equipment is completed when the equipment is manufactured, or when preventive maintenance of process equipment is completed. As another example, the particular point in time may be a point in time when a process is in progress, such as at a particular stage of the process.

[0084] Figure 4 is a graph showing the S11 parameter, an example of status data. Figure 4 shows the S11 parameter in dB for the frequency range from 3 GHz to 8.5 GHz. In Figure 4, several dozen peaks are observed, but the number of peaks may vary depending on the criteria for counting the peaks.

[0085] The status data may reflect the geometric status of the chamber. For example, if the geometric status of a component, such as the position or shape of the component contained inside the chamber, is changed, the status data after the change may differ from the status data before the change. As another example, if a portion of a component is broken, the status data may differ from the status data when there is no breakage. As yet another example, the status data when a foreign object is present inside the chamber may differ from the status data when there is no foreign object present.

[0086] The status data may also reflect the electrical status of the chamber. For example, the status data may reflect the electrical status of the chamber because the conductivity and permittivity are determined by the material properties of the chamber or components. As another example, if a polymer film forms on the inner walls of the chamber as the process progresses, the permittivity of the walls will change and the status data may reflect the electrical status of the chamber.

[0087] According to an embodiment, the monitoring device may transmit radio waves of each frequency within a specific frequency range to the inside of the chamber and generate status data by receiving the radio waves reflected by the interior space of the chamber. For example, the monitoring device may transmit radio waves of a first frequency to the inside of the chamber and receive the radio waves reflected by the interior space of the chamber to generate a first parameter value, and may transmit radio waves of a second frequency to the inside of the chamber and receive the radio waves reflected by the interior space of the chamber to generate a second parameter value. By performing this for all frequencies, the monitoring device may generate status data corresponding to the specific frequency range.

[0088] To monitor a chamber, the chamber may be in a status that is a standard for chamber monitoring, and the chamber in the standard status and the chamber in the current status may be compared to monitor the chamber in the current status. In this manner, the chamber status that is the standard for chamber monitoring may be referred to as a reference status. For example, the reference status may be a golden chamber status. As another example, the reference status may be a chamber status that is of interest to a user. Examples of chambers that are of interest to a user may include, but are not limited to, a chamber in a good assembly status, a chamber for which preventive maintenance has been completed, a chamber with good process results, a chamber in a bad status, a chamber in a preventive maintenance required status, and a chamber in an accident status.

[0089] The monitoring device may generate status data of the chamber at a reference status (hereinafter referred to as "reference status data").

[0090] 5 and 6 are flow charts illustrating a method for generating reference status data according to an embodiment.

[0091] Referring to FIG. 5, a method for generating reference status data may include: in step S102, preparing a chamber in a first status, the chamber including a plurality of components; in step S104, transmitting radio waves to the inside of the chamber in the first status and receiving the radio waves reflected by the internal space of the chamber in the first status; and in step S106, using the received radio waves to generate first reference status data of the chamber in the first status.

[0092] In step S102, the monitoring device may be installed in a chamber containing a plurality of parts in a first status, which may be the chamber in the reference status described above.

[0093] In step S104, the monitoring device may transmit radio waves within a specific frequency range to the inside of the chamber in the first state and receive the radio waves reflected by the interior space of the chamber in the first state.

[0094] The particular frequency range may be determined taking into consideration the characteristics of the object being monitored using the devices and methods for monitoring the status of a chamber disclosed herein.

[0095] For example, as described above, the devices and methods for monitoring the status of a chamber disclosed herein monitor whether the equipment (chamber) is properly assembled before a process is started, or whether there are any abnormalities on the interior walls of the equipment or on the surfaces of various components disposed inside the equipment resulting from the process during and after the process is completed, etc. That is, the objects monitored by the devices and methods disclosed herein may include the geometry of each of the components inside the chamber, the wear level of each of the components, the relative positions of each of the components, unwanted deposition of by-products generated by processing a target substrate through the chamber on the interior walls of the chamber and the surfaces of each component inside the chamber, etc. On the other hand, the objects monitored by the devices and methods disclosed herein may not include the state of materials and energy supplied to the chamber being monitored (e.g., activated species, etching gases, inert gases flowing into the chamber to perform the required process, RF power, or plasmas thereof, etc.).

[0096] Accordingly, the particular frequency ranges used in the devices and methods disclosed herein can be determined as frequency bands that are advantageous for monitoring the geometry of each of the components inside the chamber, the relative positional relationships between each of the components, the wear level of each of the components, or the unwanted deposition of by-products generated by processing the target substrate through the chamber on the inner walls of the chamber and the surfaces of each component inside the chamber.

[0097] On the other hand, a particular frequency range can be determined as a frequency band that is not affected or is relatively less affected by the materials supplied to the chamber that are being monitored during substrate processing and that are affected by the energy conditions in the chamber (e.g., activated species, etching gases, inert gases flowing into the chamber to perform the required process, RF power or their plasma, etc.).

[0098] According to some embodiments, the specific frequency range may be determined as a frequency band having a wavelength between 1 mm and 1000 mm, i.e., the specific frequency range may be between 300 MHz and 300 GHz.

[0099] According to some other embodiments, the specific frequency range may be determined as a frequency band having a wavelength between 10 mm and 500 mm, i.e., the specific frequency range may be between 600 MHz and 30 GHz.

[0100] According to some other embodiments, the specific frequency range may be from 1 GHz to 20 GHz.

[0101] The particular frequency range may depend on the size of the interior space of the chamber and / or the size of the components contained within the chamber.

[0102] The lower limit of a particular frequency range may depend on the size of the interior space of the chamber, for example, the larger the size of the interior space of the chamber, the smaller the lower limit.

[0103] The upper limit of a particular frequency range may depend on the size of the components contained in the chamber, for example, the smaller the component size, the higher the upper limit.

[0104] Step S104 may include transmitting radio waves to the inside of the chamber in the first status. For example, step S104 may include transmitting radio waves from the outside of the chamber in the first status to the inside of the chamber in the first status.

[0105] Step S104 may include receiving radio waves reflected by the interior space of the chamber in the first status. For example, step S104 may include receiving radio waves reflected by the interior space of the chamber in the first status by an outside of the chamber in the first status.

[0106] In step S106, the monitoring device may generate first reference status data for the chamber in the first status using the received radio waves. The above details of the step of generating status data may be similarly applied to the above step of generating first reference status data using the received radio waves, so redundant descriptions thereof will be omitted.

[0107] The above method for generating reference status data may proceed as shown in FIG.

[0108] Referring to FIG. 6, a method for generating reference status data may include: in step S202, preparing a chamber in a second status; in step S204, transmitting radio waves to the inside of the chamber in the second status and receiving the radio waves reflected by the interior space of the chamber in the second status; and in step S206, using the received radio waves to generate second reference status data of the chamber in the second status.

[0109] In step S202, the monitoring device may be installed in a chamber containing multiple parts that is in a second status, which may be the chamber in the reference status described above.

[0110] The chamber in the second status may be a chamber in a different status than the chamber in the first status.

[0111] The status of a chamber may be defined by a combination of the geometrical statuses of the components contained in the chamber. Thus, chambers in which at least some of the components have different geometrical statuses may be in different statuses.

[0112] The status of a chamber may vary depending on the position of the part, for example, a chamber with a first part in a first position and a chamber with a first part in a second position may be in different statuses.

[0113] The status of a chamber may vary depending on the shape of the part. For example, a chamber with a first portion having a normal shape and a chamber with a first portion having an abnormal shape (e.g., a broken part) may have different statuses. As another example, a chamber with a first portion having a normal shape and a second portion having an abnormal shape may have different statuses from a chamber with a first portion having an abnormal shape and a second portion having a normal shape.

[0114] The status of a chamber can vary depending on whether a part is present, for example, a chamber with a first part present and a chamber without a first part present (e.g., the part has been removed) can be in different statuses.

[0115] The status of a chamber may vary depending on whether a foreign object is present, for example, a chamber with a foreign object present and a chamber without a foreign object may have different statuses.

[0116] The above factors that define the status of a chamber can be applied independently. For example, consider a case where a first part changes the status of a chamber. Assuming that the first part has five positions, two shapes (normal / abnormal), and two states (present and absent), the first part causes the chamber to have at least 20 different statuses (5 x 2 x 2 = 20). If the second part causes the chamber to have 20 different statuses, the first and second parts cause the chamber to have at least 400 different statuses (20 x 20 = 400).

[0117] In step S204, the monitoring device may transmit radio waves within a specific frequency range to the inside of the chamber in the second state and receive radio waves reflected by the internal space of the chamber in the second state. The above details of step S104 may be similarly applied thereto, so redundant description will be omitted.

[0118] In step S206, the monitoring device may generate second reference status data for the chamber in the second status using the received radio waves. The above details of the step of generating status data can be similarly applied to the above step of generating second reference status data using the received radio waves, so redundant descriptions thereof will be omitted.

[0119] While the steps of generating reference status data for a chamber in two statuses have been described with reference to Figures 5 and 6, reference status data for a chamber in three or more statuses may be generated in a similar manner. By generating multiple reference status data as described above, a reference status data set or a reference status library may be constructed.

[0120] Optionally, the reference status data set may include multiple reference status sub-data sets, for example, the multiple reference status sub-data sets may each relate to a different process, and the reference status sub-data set may include at least one of the reference status data.

[0121] 7 is a diagram illustrating a reference status data set including a reference status subdataset, according to an embodiment. Referring to FIG. 7, the reference status data set may include a first process reference status subdataset for a first process and a second process reference status subdataset for a second process. Each of the first process reference status subdataset and the second process reference status subdataset may include at least one of the reference status data.

[0122] To monitor the current status of the chamber, for example, to determine the assembly status of the process equipment when the process equipment was manufactured, to determine the results of preventive maintenance (PM) of the process equipment, to proceed with the process while checking whether each process step is proceeding normally, or to predict the timing of preventive maintenance, the monitoring device may monitor the current status of the chamber by using reference status data and current status data (hereinafter referred to as "current status data") of the chamber. For example, the monitoring device may compare the reference status data and the current status data to monitor the current status of the chamber.

[0123] 8 and 9 are flow charts illustrating a method for monitoring a chamber, according to an embodiment.

[0124] Referring to FIG. 8, a method for monitoring a chamber may include: acquiring a reference status data set in step S310; transmitting radio waves to the inside of the chamber and receiving radio waves reflected by the interior space of the chamber in step S320; generating current status data of the chamber using the received radio waves in step S330; generating monitoring information using the reference status data set and the current status data in step S340; and providing the monitoring information in step S350.

[0125] In step S310, the monitoring device may obtain a reference status data set, which may be generated as described above.

[0126] In step S320, the monitoring device may transmit radio waves within a specific frequency range to the inside of the monitored chamber and receive radio waves reflected by the interior space of the monitored chamber. The above details of step S104 may be similarly applied thereto, so redundant description will be omitted.

[0127] In step S330, the monitoring device may use the received radio waves to generate current status data of the chamber. The above details of the step of generating status data can be similarly applied to the above step of generating current status data using the received radio waves, so redundant descriptions thereof will be omitted.

[0128] In step S340, the monitoring device may generate monitoring information using the reference status data set and the current status data.

[0129] The monitoring information may include status data.

[0130] The monitoring information may include information indicating which reference status the current status is.

[0131] The monitoring information may include information regarding the degree of similarity between the reference status data and the current status data. The higher the degree of similarity, the more similar the current status and the reference status may be understood or determined. Alternatively, if the degree of similarity exceeds a similarity criterion value, the current status may be understood or determined to be the reference status. In other words, the current status of the chamber may be determined by referring to the degree of similarity.

[0132] The monitoring information may include a scatter plot of the current status data against the reference status data, which allows a user to visually determine the relationship between the reference status data and the current status data.

[0133] The monitoring information may include a history of the chamber being determined to be in a reference status in the past. Examples of the history may include, but are not limited to, the date, time, and number of times the reference status occurred.

[0134] The monitoring information may include a description of the reference status, which may be, for example, but not limited to, what the reference status means, and various details regarding the reference status.

[0135] Referring to FIG. 9, step S340 may include: in step S341, calculating a similarity between the current status data and each reference status data included in the reference status data set; and in step S342, generating monitoring information based on the similarity.

[0136] In step S341, the monitoring device may calculate a similarity between the current status data and each reference status data included in the reference status data set. The monitoring device may calculate a first similarity between the current status data and the first reference status data, and a second similarity between the current status data and the second reference status data. That is, multiple similarity degrees are calculated for the current status data.

[0137] The similarity may be calculated using, for example, but not limited to, graph similarity algorithms such as mean, sum of squares (SOS), cosine similarity, correlation integral techniques, or convolution techniques.

[0138] Below, some examples of similarity calculations are described.

[0139] As an example of similarity calculation, the monitoring device may calculate the similarity by using the difference between the reference status data and the current status data within a specific frequency range. For example, referring to Equation 1 below, the monitoring device may calculate the sum of squares of the difference between the parameter values ​​of the reference status data and the parameter values ​​of the current status data within a specific frequency range as the similarity. [Formula 1]

number

[0140] As another example of similarity calculation, referring to Equation 2 below, the monitoring device may calculate the similarity by using the cosine similarity between the reference status data and the current status data within a particular frequency range. [Formula 2]

number

[0141] Although the use of multiple reference status data has been primarily described with reference to Figures 8 and 9, a single reference status data may be used, in which case the above details may apply as well.

[0142] In step S350, the monitoring device may provide monitoring information.

[0143] Step S350 may include displaying the monitoring information via a display unit.

[0144] 10 is a diagram illustrating the display of monitoring information according to an embodiment. Referring to FIG. 10, the monitoring device may display monitoring information including status data 21, information on similarity 22, and a scatter plot 23 via a display unit 171.

[0145] Step S350 may include transmitting the monitoring information to an external device, such as a process equipment and a fab fault detection and classification (FDC) system.

[0146] Step S350 may include outputting an alarm, where outputting an alarm in this specification may mean that the monitoring device outputs the alarm directly via an output or transmits an alarm signal to an external device.

[0147] The monitoring device may output an alarm by considering the similarity between the reference status data and the current status data. For example, if the reference status is an abnormal status such as an accident or a dangerous situation, the monitoring device may output an alarm when the similarity exceeds a reference value. As another example, if the reference status is a normal status such as a golden chamber status, the monitoring device may output an alarm when the similarity is lower than a reference value. In this specification, the reference values ​​for the abnormal status and the normal status may be the same or different from each other.

[0148] The method for monitoring a chamber may further include setting the current status data as new reference status data. The monitoring device may set the current status data as new reference status data.

[0149] According to an embodiment, the monitoring device may set the current status data as the new reference status data based on the similarity between the reference status data and the current status data. For example, if all similarities between the reference status data included in the reference status data set and the current status data are lower than a reference value, the monitoring device may set the current status data as the new reference status data.

[0150] According to another embodiment, the monitoring device may obtain user input to set the current status as the reference status and may set the current status data as the new reference status data. For example, if a new type of failure occurs, the user may want to record status data for that situation so that the status data can be used in the future. In this case, the user may input user input to the monitoring device to set the current status as the reference status. Having obtained the user input, the monitoring device may set the current status data as the new reference status data.

[0151] Optionally, the monitoring device may represent the current status as a status in which two or more reference statuses overlap. In this case, the information included in the monitoring information and indicating which reference status the current status is may indicate that the current status is a status in which two or more reference statuses overlap. For example, if there are two or more reference statuses that exceed a similarity criterion value of the current status, the monitoring device may represent the current status as a status in which two or more reference statuses overlap.

[0152] Optionally, the monitoring device may analyze the status data of each frequency section to calculate the similarity.

[0153] In the status data for a specific frequency range, the specific frequency range may be divided into multiple frequency sections. The monitoring device may calculate a similarity for each frequency section and monitor the chamber based on the similarity for each frequency section. For example, the monitoring device may monitor the chamber by directly using the similarity for each frequency section. As another example, the monitoring device may calculate a similarity for the entire frequency range by using the similarity for each frequency section, and monitor the chamber by using the similarity for the entire frequency range.

[0154] 11 is a diagram illustrating an analysis of each frequency section of status data according to an embodiment. Referring to FIG. 11, the entire frequency range from 3 GHz to 8.5 GHz can be divided into five frequency sections S1, S2, S3, S4, and S5 in increments of 1.1 GHz. The monitoring device can calculate similarities of the frequency sections to calculate the five similarities and monitor the chamber based on the five similarities.

[0155] With reference to FIG. 11, the chamber has been described as being divided into five frequency sections at 1.1 GHz intervals for monitoring, however this is by way of example only and the size or number of frequency sections is not limited to this.

[0156] Although the above-described method for monitoring a chamber has primarily been described with respect to monitoring the geometric status of the chamber's interior space, the chamber monitoring method is not limited thereto. A chamber monitoring method according to an embodiment may also monitor electrical characteristics of the chamber's interior space. For example, a monitoring device may use the above-described status data to perform process monitoring, such as plasma monitoring or cleaning endpoint monitoring. As another example, a monitoring device may use the above-described status data to monitor the deposition of a material, such as a polymer, on the chamber's interior walls as a process progresses. As yet another example, a monitoring device may use the above-described status data to monitor changes in the dielectric constant due to insufficient surface finish of the chamber's interior space or components.

[0157] A monitoring system may be provided that includes at least one monitoring device as described above. The monitoring system may be installed in a process tool that includes at least one chamber.

[0158] Fig. 12 is a block diagram showing a monitoring system according to an embodiment. Referring to Fig. 12, the monitoring system may include one or more monitoring devices 100 and a management device 200. In this specification, the monitoring device 100 is the monitoring device 100 described above, and therefore redundant description thereof will be omitted.

[0159] The monitoring system may include a management device 200. The management device 200 may manage the monitoring devices 100.

[0160] The management device 200 may include a communication unit 210 , a storage unit 220 , and a control unit 230 .

[0161] The management device 200 may perform communication with the outside via the communication unit 210. For example, the management device 200 may obtain monitoring information from the monitoring device 100 via the communication unit 210. As another example, the management device 200 may transmit monitoring information to an external device, such as a process equipment, a fab, etc., via the communication unit 210. Redundant descriptions of the same as the communication unit 210 of the monitoring device 100 will be omitted.

[0162] The management device 200 may store various types of data and programs in the storage unit 220. For example, the storage unit 220 may store monitoring information. As another example, the storage unit 220 may store reference status data. Redundant descriptions of the storage unit 220 of the monitoring device 100 that are similar to the storage unit 220 of the monitoring device 100 will be omitted.

[0163] The control unit 230 may perform various types of information processing and calculations in the management device 200. The control unit 230 may control other elements that constitute the management device 200. Redundant descriptions of the same as the control unit 230 of the monitoring device 100 will be omitted.

[0164] FIG. 13 is a schematic diagram illustrating a monitoring system installed in a process device according to an embodiment, where the monitoring device is an integrated type. Referring to FIG. 13 , a monitoring device 100 may be attached to each chamber 10 of the process device 1. The monitoring device 100 may generate status data for the chamber 10 to which the monitoring device 100 is attached. The monitoring device 100 may generate monitoring information based on the status data. Alternatively, the monitoring device 100 may transmit the status data to a managing device 200, and the managing device 200 may generate the monitoring information.

[0165] Methods according to embodiments may be performed by processing logic including hardware, firmware, software, or a combination thereof. Methods according to embodiments may be performed by a processor executing code stored on a non-transitory computer-readable medium. Examples of non-transitory computer-readable medium include magnetic media such as hard disks, floppy disks, and magnetic tapes; optical media such as CD-ROMs and DVD-ROMs; magneto-optical media such as floptical disks; and hardware devices specifically structured to store and execute program instructions, such as ROM, RAM, and flash memory.

[0166] Although the present disclosure has been described above with reference to the embodiments, the present disclosure is not limited thereto. It will be apparent to those skilled in the art to which the present disclosure pertains that various changes or modifications may be made within the spirit and scope of the present disclosure, and that such changes or modifications are included within the scope of the appended claims. [Experimental Example] In the following, experimental examples are described in which monitoring information such as status data, similarity, and scatter plots are generated according to the geometric status of the chambers. The following experimental examples are illustrative and are not intended to limit the scope of the present disclosure in any way.

[0167] These experiments were conducted to verify whether the geometry of the interior space of the chamber could be monitored via the monitoring methods described above.

[0168] First, a chamber containing three lift pins and a baffle was prepared, and the following wafers were prepared: a half wafer, a prime wafer, a seasoning wafer, a wafer coated with 700 nm thick PR (PR-coated wafer), a seasoning wafer with a Kapton film covering 5% of the area (Kapton 5% coverage seasoning wafer), a seasoning wafer with a Kapton film covering 15% of the area (Kapton 15% coverage seasoning wafer), and a seasoning wafer with a Kapton film covering 50% of the area (Kapton 50% coverage seasoning wafer). In addition, M4 bolts were prepared.

[0169] The monitoring devices, including the antenna and VNA, were then prepared and installed in the chamber.

[0170] The chamber, wafer, and bolts were then used to prepare the chamber in 25 different states, and for each of the states, the S11 parameter was measured in the frequency range of 3 GHz to 8.5 GHz to generate a reference state data set containing 25 reference state data.

[0171] The status of the chambers used in the experiments is shown in Figures 14 to 17. *The basic status refers to the status in which the vacuum is maintained while waiting for processing.

[0172] The lift pins up (no wafer) status refers to a status in which all three lift pins are in the up state without a wafer (FIG. 15(a)).

[0173] The lift pins down (no wafer) status refers to the status where all three lift pins are down without a wafer.

[0174] The lift pins up (with wafer) status refers to the status where all three lift pins are in the up state and a wafer is placed on the lift pins.

[0175] The lift pins down (wafer present) status refers to a status in which all three lift pins are in the down state and a wafer is placed on the lift pins.

[0176] The lift pin up (no #3 pin) status refers to the status where the lift pins are in the up state without a wafer and pin 3 is not present ((b) in FIG. 15).

[0177] The lift pin down (no #3 pin) status refers to the status where the lift pins are down without a wafer and pin 3 is not present.

[0178] Lift pin up (no #2 pin) status refers to the status where the lift pins are up without a wafer and pin 2 is not present.

[0179] The lift pin down (no #2 pin) status refers to the status where the lift pins are down without a wafer and pin 2 is not present.

[0180] Lift pins up (no #1 pin) status refers to the status where the lift pins are up without a wafer and pin 1 is not present.

[0181] The lift pin down (no #1 pin) status refers to the status where the lift pins are down without a wafer and pin 1 is not present.

[0182] The lift pin up (#3 pin broken) status refers to a status in which the lift pins are in an up state without a wafer and pin 3 is broken ((c) in FIG. 15).

[0183] The lift pin down (#3 pin broken) status refers to the status where the lift pin is down without a wafer and pin 3 is broken.

[0184] The chamber isolation 380 mTorr status refers to the status in which the chamber is isolated by closing the valve on the flow path to the pump in the basic status, and then the internal pressure increases to 380 mTorr.

[0185] The pumping status after 5 minutes of separation indicates the status in which pumping is started by opening the valve on the flow path to the pump after 5 minutes have passed since the separation in the chamber separation 380 mTorr status was canceled.

[0186] The status without the baffle section refers to the status of the chamber without the baffle ((a) in Figure 16).

[0187] The M4 bolt status on the baffle refers to the status of the chamber where the M4 bolt is placed on the baffle (FIG. 16(b)).

[0188] The half-wafer status refers to the status in which a half-wafer is placed in the chamber (FIG. 17(a)).

[0189] The prime wafer status refers to a status in which a prime wafer is placed in the chamber.

[0190] The seasoning wafer status refers to the status in which a seasoning wafer is placed in the chamber (FIG. 17(b)).

[0191] The PR-coated wafer status refers to the status in which a PR-coated wafer is placed in the chamber ((c) in FIG. 17).

[0192] The Kapton 5% coverage seasoning wafer status refers to the status in which a seasoning wafer with a Kapton film covering 5% of the area was placed in the chamber (FIG. 17(d)).

[0193] The Kapton 15% coverage seasoning wafer status refers to the status in which a seasoning wafer with a Kapton film covering 15% of the area was placed in the chamber (FIG. 17(e)).

[0194] The Kapton 50% coverage seasoning wafer status refers to the status in which a seasoning wafer with a Kapton film covering 50% of the area is placed in the chamber (FIG. 17(f)).

[0195] The vented chamber status refers to the status in which the chamber in the base status has been vented to atmospheric pressure.

[0196] In the above states of the chamber, the lift pins are in the down position unless otherwise stated.

[0197] Then, an arbitrary status was set as the current status, and a scatter plot of the current status data against the reference status data and the similarity between them was generated. Here, the similarity was calculated using the sum of squares according to Equation 1 and the cosine similarity according to Equation 2.

[0198] Figure 18 shows the similarity when the lift pins up (wafer present) status (status 4) is set as the current status. (a) shows a table of similarities, (b) shows a graph of sum-of-squares similarity, and (c) shows a graph of cosine similarity. In Figure 18, it can be seen that status 4 is well distinguished from the other statuses.

[0199] Figure 19 shows the similarity when the lift pin up (no #2 pin) status (status 8) is set as the current status. (a) shows a table of similarities, (b) shows a graph of sum-of-squares similarity, and (c) shows a graph of cosine similarity. In Figure 19, status 8 was similar to several statuses, but was distinguished by considering a sum-of-squares similarity of 10 or greater and cosine similarity to four decimal places.

[0200] Figure 20 shows the similarity when the status without a baffle (status 16) is set as the current status. (a) shows a similarity table, (b) shows a graph of sum-of-squares similarity, and (c) shows a graph of cosine similarity. In Figure 20, it can be seen that status 16 is better distinguished from the other statuses than in Figure 18.

[0201] Figure 21 shows a scatter plot where a base status (Status 1) is used as the reference status for the other statuses. The labels shown in each scatter plot are the same as those shown in Figure 14. Figure 21 visually confirms that the scatter plot varies by status.

[0202] Description of reference numbers in the drawings 100: Monitoring devices 110: Antenna 120: Signal processing unit 130: Communication unit 140: Control unit 150: Storage unit 160: Fixed part 170: Output section 180: Electromagnetic wave shielding 200: Managed Device 210: Communication unit 220: Storage unit 230: Control unit

Claims

1. 1. A method for generating reference status data for monitoring a status of a chamber, the method comprising: Providing the chamber in a first status, where the chamber includes a plurality of parts; wherein a geometric shape of an interior space of the chamber is defined by the plurality of parts; wherein the first status is defined by a combination of a geometric status of each of the plurality of parts; transmitting radio waves within a frequency range of 300 MHz or higher and 30 GHz or lower from outside or inside the chamber in the first status to an internal space of the chamber in the first status, and receiving radio waves reflected by the internal space of the chamber; calculating, in said frequency range, one parameter selected from the group consisting of: i) an S parameter, ii) an H parameter, iii) a Y parameter, iv) a Z parameter, and v) one parameter derived from said S parameter, said H parameter, said Y parameter, and said Z parameter; and generating first reference status data for the chamber at the first status using the calculated parameters; A method comprising:

2. providing the chamber in a second status in which the geometric status of at least some of the plurality of parts has changed from the chamber in the first status; and generating second reference status data by transmitting and receiving radio waves to and from the chamber in the second status; The method of claim 1 , comprising:

3. 2. The method of claim 1, wherein the step of transmitting and receiving radio waves includes transmitting radio waves from outside the chamber into the interior space of the chamber through a viewport formed in the chamber, and receiving radio waves reflected by the interior space of the chamber.

4. 1. A method for generating reference status data for monitoring a status of a chamber, the method comprising: Providing the chamber in a first state containing a plurality of parts; wherein the geometric and electrical status of the interior space of the chamber is defined by the plurality of parts; wherein the first status is defined by a combination of a geometric and electrical status of each of the plurality of components; transmitting radio waves within a frequency range of 300 MHz or higher and 30 GHz or lower from outside or inside the chamber in the first status to an internal space of the chamber in the first status, and receiving radio waves reflected by the internal space of the chamber; calculating, in said frequency range, one parameter selected from the group consisting of: i) an S parameter, ii) an H parameter, iii) a Y parameter, iv) a Z parameter, and v) one parameter derived from said S parameter, said H parameter, said Y parameter, and said Z parameter; and generating first reference status data for the chamber at the first status using the calculated parameters; A method comprising:

5. 1. A method for monitoring a status of a chamber, the method comprising: obtaining a reference status data set reflecting the status of the chamber; transmitting radio waves within a specific frequency range into the interior space of the chamber to be monitored and receiving radio waves reflected by the interior space of the chamber; generating current status data for the chamber using the received radio waves; generating monitoring information for a current status of the chamber using the reference status data set and the current status data; and Providing said monitoring information Equipped with wherein the reference status data set includes a plurality of reference status data reflecting a plurality of statuses of the chamber; Here, the step of generating the monitoring information includes: calculating a similarity between each of the plurality of reference status data and the current status data; and generating the monitoring information based on the similarity. method.

6. the reference status data set includes first reference status data reflecting a first status of the chamber and second reference status data reflecting a second status of the chamber; Here, the step of generating the monitoring information includes: calculating a first similarity between the first reference status data and the current status data; calculating a second similarity between the second reference status data and the current status data; and generating the monitoring information based on the first similarity and the second similarity; The method of claim 5 , comprising:

7. 7. The method of claim 6, wherein the monitoring information includes information indicating that the chamber is in at least an overlapping status of the first status and the second status when the first similarity is greater than or equal to a first reference value and the second similarity is greater than or equal to a second reference value.

8. the reference status data set includes the plurality of reference status data reflecting the plurality of statuses of the chamber; The method according to claim 5, wherein the method further comprises a step of setting the current status data as new reference status data when all similarities between each of the plurality of reference status data and the current status data are lower than a reference value.

9. The method of claim 5 , further comprising setting the current status data as new reference status data if user input is obtained to set the current status of the chamber as a reference status.

10. the particular frequency range includes a first frequency section and a second frequency section, The step of generating the monitoring information comprises: calculating a first similarity between at least some of the reference status data in the reference status data set, the data corresponding to the first frequency section, and the current status data, the data corresponding to the first frequency section; calculating a second similarity between data corresponding to the second frequency section of at least some of the plurality of reference status data of the reference status data set and data corresponding to the second frequency section of the current status data; and The method of claim 5 , further comprising generating the monitoring information based on the first similarity measure and the second similarity measure.

11. The method of claim 5 , wherein the step of providing monitoring information comprises the step of outputting an alarm taking into account a similarity between the reference status data set and the current status data.

12. 6. The method of claim 5, wherein the step of transmitting and receiving radio waves includes the steps of transmitting radio waves from outside the chamber into the interior space of the chamber through a viewport formed in the chamber, and receiving radio waves reflected by the interior space of the chamber.

13. the reference status data set includes first process reference status data for a first process and second process reference status data for a second process, The step of generating the monitoring information comprises: acquiring process information; and 6. The method of claim 5, further comprising generating the monitoring information using one of the first process referenced status data and the second process referenced status data, and the current status data based on the process information.

14. A computer program storing instructions, comprising: A computer program product comprising instructions which, when executed by one or more processors of a device, cause the device to perform the method of any one of claims 1 to 13.

15. 1. A device for monitoring a status of a chamber, the device comprising: an antenna for transmitting radio waves within a frequency range of 300 MHz or higher and 30 GHz or lower to the inside of the chamber and receiving radio waves reflected by the interior space of the chamber; a bracket for securing the antenna to the exterior of the chamber; a signal processing unit for applying an electrical signal to the antenna and obtaining the electrical signal from the antenna; A communication unit for communicating with the outside; and a control unit for generating monitoring information for the status of the chamber; Equipped with wherein the control unit calculates, using the radio waves received by the antenna, one parameter selected from the group consisting of: i) an S parameter, ii) an H parameter, iii) a Y parameter, iv) a Z parameter, and v) one parameter derived from the S parameter, the H parameter, the Y parameter, and the Z parameter, in the frequency range; generating current status data for the chamber using the calculated parameters; generating said monitoring information based on said generated current status data and a pre-stored reference status data set; device.

16. The device of claim 15 , wherein the bracket is designed to fix the position of the antenna outside of a viewport formed in the chamber.

17. 17. The device of claim 16, wherein a positional relationship between the bracket and the antenna is designed such that one end of the antenna adjacent the viewport has a predetermined distance from one side of the viewport adjacent the antenna.

18. 16. The device of claim 15, wherein the position of the antenna is fixed by the bracket to correspond to a viewport formed in the chamber or a separate port for the antenna.

19. 17. The device of claim 16, wherein the position of the antenna is fixed by the bracket such that one end of the antenna adjacent the viewport or separate port for the antenna is a predetermined distance from one side of the viewport or separate port adjacent the antenna.

20. 16. The device of claim 15, further comprising an electromagnetic shield disposed on the exterior of the chamber surrounding the antenna.

21. 21. The device of claim 15, wherein the control unit generates status data regarding the radio waves transmitted from and received by the antenna, and uses the status data to generate the monitoring information.

22. 21. The device of claim 15, wherein the control unit generates status data relating to a ratio between an input voltage applied to the antenna and an output voltage output from the antenna, and uses the status data to generate the monitoring information.

Images