Laser etching apparatus, laser etching system, electrode etched using a laser, and method for manufacturing the electrode

Abstract

A laser etching apparatus for etching an active material portion on an electrode sheet including an active material portion and a plain portion according to an embodiment of the present invention includes a laser unit that irradiates the active material portion with a laser, a blower unit that blows air toward the plain portion against foreign matter generated by etching of the active material portion, and a suction unit that is disposed on the opposite side of the blower unit with the laser unit interposed therebetween and sucks the foreign matter, and the laser unit, the blower unit, and the suction unit can be disposed in a direction crossing the moving direction of the electrode sheet.

Description

Technical Field

[0001] This application claims the benefit of priority based on Korean Patent Application No. 10-2022-0072395 filed on June 14, 2022 and Korean Patent Application No. 10-2023-0057012 filed on May 2, 2023, and all contents disclosed in the documents of the Korean patent applications are incorporated herein by reference in their entirety.

[0002] The present invention relates to a laser etching apparatus, a laser etching system, an electrode etched using a laser, and a method for manufacturing the electrode.

Background Art

[0003] Research and development are being conducted on power production based on environmentally friendly energy sources in order to address environmental pollution and the depletion of oil resources. In particular, research on secondary batteries is actively underway, and research is being conducted from various aspects such as the materials, structure, processes, and systems of secondary batteries.

[0004] A secondary battery undergoes various processes during the manufacturing process. Generally, a secondary battery is produced through processes such as an electrode process, an assembly process, and a formation process. Among the above-mentioned processes, in particular, in the electrode process, a process of coating an active material on an electrode sheet in a predetermined pattern is performed, and technologies related to the blending conditions of raw materials, temperature, and process conditions of the coating apparatus have been proposed in order to manage the coating quality.

[0005] According to the prior art, when an active material is coated on an electrode sheet in a predetermined pattern, slides or mismatches may occur at the edges of the coating region, and there is a risk that the performance and quality of the electrode assembly may deteriorate due to a decrease in coating quality.

Summary of the Invention

Problems to be Solved by the Invention

[0006] The problem to be solved by the present invention is to provide a laser etching apparatus, a laser etching system, an electrode etched using a laser, and a method for manufacturing the electrode, which can improve the coating quality of the active material by laser etching.

Means for Solving the Problem

[0007] A laser etching apparatus for etching the active material portion on an electrode sheet including an active material portion and a plain portion according to an embodiment of the present invention includes a laser unit that irradiates the active material portion with a laser, a blower unit that blows air toward the plain portion against foreign matter generated by etching the active material portion, and a suction unit that is disposed on the opposite side of the blower unit with the laser unit interposed therebetween and sucks the foreign matter, and the laser unit, the blower unit, and the suction unit can be arranged in a direction crossing the moving direction of the electrode sheet.

[0008] A laser etching system for etching a first active material portion and a second active material portion on an electrode sheet including a first active material portion, a second active material portion, and a plain portion located between the first active material portion and the second active material portion according to an embodiment of the present invention includes a first laser etching apparatus that etches the first active material portion and a second laser etching apparatus that etches the second active material portion, and each of the first laser etching apparatus and the second laser etching apparatus includes a laser unit that irradiates the active material portion with a laser, a blower unit that blows air toward the plain portion against foreign matter generated by etching the active material portion, and a suction unit that is disposed on the opposite side of the blower unit with the laser unit interposed therebetween and sucks the foreign matter, and the laser unit, the blower unit, and the suction unit can be arranged in a direction crossing the moving direction of the electrode sheet.

[0009] The electrode according to an embodiment of the present invention includes an active material portion in which an active material is coated on an electrode sheet, and a plain portion on which the active material is not coated on the electrode sheet, and a heat affected zone (HAZ) having a width of 200 μm or less can be formed at the boundary between the active material portion and the plain portion.

[0010] The method for manufacturing an electrode according to an embodiment of the present invention includes a step of coating an active material on an electrode sheet to form an active material portion and a plain portion, and a step of etching a part of the edge of the active material portion. The etching step includes a process of irradiating a laser on a part of the edge using a laser unit for etching, a process of blowing air toward the plain portion using a blowing unit for foreign matters generated by etching a part of the edge, and a process of sucking the foreign matters blown and diffused using a suction unit disposed on the opposite side of the blowing unit across the laser unit.

Advantages of the Invention

[0011] According to a preferred embodiment of the present invention, the coating quality of the active material in the electrode process can be improved. According to a preferred embodiment of the present invention, even if a part of the coated active material is managed by etching, the diffusion of foreign matters generated by etching can be effectively prevented.

Brief Description of the Drawings

[0012]

Figure 1

Figure 2

Figure 3

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Figure 9

Embodiments for Carrying Out the Invention

[0013] Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail so that those having ordinary knowledge in the technical field to which the present invention pertains can easily implement it. However, the present invention may be realized in various different forms and is not limited or restricted by the following embodiments.

[0014] In order to clearly explain the present invention, detailed descriptions of parts not related to the explanation or related known technologies that may unnecessarily obscure the gist of the present invention are omitted. In this specification, when attaching reference numerals to the components of each drawing, the same or similar reference numerals are attached to the same or similar components throughout the specification.

[0015] In addition, the terms and words used in this specification and the claims are not to be construed as being limited to their ordinary or dictionary meanings. Instead, in accordance with the principle that the inventor can appropriately define the concept of the terms in order to best explain his or her invention, they are to be construed in a meaning and concept consistent with the technical idea of the present invention.

[0016] FIG. 1 is a schematic diagram showing an example of coating an active material on the electrode sheet 10. In the process of manufacturing a secondary battery, in the electrode process, a process of coating an active material on the electrode sheet 10 can be passed through. The active material can be coated on the electrode sheet (or the electrode current collector) in a predetermined pattern, and on the electrode sheet 10, an active material portion 20 formed by coating the active material and a plain portion 30 where the active material is not coated can be formed.

[0017] As shown in FIG. 1, the active material portion 20 can include an active material portion 20 having a regular arrangement by coating the active material on the electrode sheet 10 in a predetermined pattern (stripe coating). A plain portion 30 can be formed between the active material portions 20. The predetermined pattern is not limited to stripe coating, and may be intermittent coating, and is not particularly limited.

[0018] FIGS. 2 to 3 are schematic diagrams showing regions where etching can be applied when coating an active material on the electrode sheet 10 according to an embodiment of the present invention. FIG. 2 is a side view of the electrode sheet 10, and FIG. 3 is a plan view of the electrode sheet 10. The above description can be applied in the same or similar manner hereinafter.

[0019] Referring to FIG. 2, the active material can be coated on both sides of the electrode sheet 10. For example, by coating the active material on the upper surface of the electrode sheet 10, the upper active material portion 21 can be formed, and by coating the active material on the lower surface of the electrode sheet 10, the lower active material portion 22 can be formed. In this case, sliding (displacement) may occur during the coating of the upper active material portion 21, and a mismatch (inconsistency) may occur with the lower active material portion 22. When sliding occurs during the coating of the upper active material portion 21 and a mismatch occurs with the lower active material portion 22, etching of the boundary region 11, which is the edge region of the upper active material portion 21, may be required to eliminate the mismatch and improve the coating quality. Also, different from what is shown in FIG. 2, sliding may occur in the lower active material portion 22, and a mismatch may occur with the upper active material portion 21. In this case, etching of the edge region of the lower active material portion 22 may be required to eliminate the mismatch. The edge region may be the boundary region between the active material portions 21, 22 and the non-patterned portion (for example, the non-patterned portion 30).

[0020] Referring to FIG. 3, a plurality of active material portions 20a, 20b, 20c can be formed on the electrode sheet 10. Although FIG. 3 shows the active material portions 20a, 20b, 20c formed in a stripe pattern, the following description is not limited to this. Each of the first active material portion 20a, the second active material portion 20b, and the third active material portion 20c can be coated on the electrode sheet 10 in a stripe pattern in parallel. The coated first active material portion 20a, second active material portion 20b, and third active material portion 20c require etching to the extent required for the subsequent process (for example, the notching process). For example, when a notching process for forming an electrode tab is performed after coating the first active material portion 20a, second active material portion 20b, and third active material portion 20c in the electrode process, etching of the preliminary notching region 12 is required during the coating process. During the notching process, notching of a part of the preliminary notching region 12 can be performed to form the electrode tab.

[0021] Although the boundary region 11 and the preliminary notch region 12 have been described with reference to FIGS. 2 and 3, the regions that require etching are not limited to these, and the following description can be applied without particular limitation when etching is performed on the regions that require etching.

[0022] FIG. 4 is a schematic diagram of a laser etching system 100 according to an embodiment of the present invention. The above description can be applied in the same or similar manner hereinafter.

[0023] The laser etching system 100 can perform laser etching on regions that require etching, such as the boundary region 11 or the preliminary notch region 12. The laser etching system 100 can include a laser etching device 101, and the laser etching device 101 can be used to perform etching on the active material portion (for example, the first active material portion 20a). For example, the laser etching device 101 can perform etching on the edge of the first active material portion 20a at a predetermined position in the traveling direction of the electrode sheet 10. The electrode sheet 10 can be etched by the laser etching device 101 in a predetermined region at a predetermined interval while moving along the traveling direction.

[0024] Hereinafter, the laser etching device 101 of the laser etching system 100 will be described in detail. FIG. 5 is a schematic diagram showing the state in which the laser etching device 101 of the laser etching system 100 according to an embodiment of the present invention and the first laser etching device 101 etch the first active material portion 20a, and FIG. 6 is a schematic diagram showing a modified example of the laser etching device 101 shown in FIG. 5, which is a laser etching device 101'. The above description can be applied in the same or similar manner hereinafter. Also, hereinafter, the first active material portion 20a will be described as an example, but it is not particularly limited.

[0025] As described above, the active material portions 20a, 20b, and 20c can be coated on the electrode sheet 10, and the laser etching apparatus 101 can perform etching on the first active material portion 20a. In the following, the description will be given by taking the laser etching apparatus 101 performing etching on the first active material portion 20a as an example, but it is not limited thereto.

[0026] Referring to FIGS. 5 and 6 for description, the laser etching apparatus 101 can include a laser unit 110. The laser unit 110 can irradiate the first active material portion 20a with a laser. For example, the laser unit 110 can irradiate the edge of the first active material portion 20a with a laser to etch the edge of the first active material portion 20a. When the first active material portion 20a is irradiated with a laser, foreign matters (for example, residues of the etched active material) may be generated by laser etching. The edge may be the boundary between the first active material portion 20a and the non-patterned portion 30.

[0027] The laser etching apparatus 101 can include a blower unit 120. The blower unit 120 can blow air against foreign matter generated by the etching of the first active material portion 20a. For example, the blower unit 120 can be located above the first active material portion 20a and can blow air from above the first active material portion 20a toward the plain portion 30 side against the foreign matter. In this case, the foreign matter generated by the etching can scatter in the direction away from the first active material portion 20a toward the plain portion 30 side or the second active material portion 20b side. The blower unit 120 can blow air at a blowing angle of 10 to 80 degrees based on the surface of both sides of the electrode sheet 10 that receives the blowing. When the blower unit 120 blows air at an angle greater than 80 degrees, the foreign matter can be blown onto the first active material portion 20a. Also, when the blower unit 120 blows air at an angle less than 10 degrees, the foreign matter can be blown toward the second active material portion 20b side before the suction unit 130 described later suctions the foreign matter. Also, the diffusion prevention effect by the barrier 140 described later can be reduced. The blowing angle of the blower unit 120 may be an angle effective for the suction unit 130 to suction the foreign matter generated by the etching or an angle that can maximize the diffusion prevention effect by the barrier 140. Also, the blower unit 120 can blow air at a blowing pressure of 0.2 to 5.0 bar. For example, when etching with a laser so that a large amount of foreign matter is generated (or when the etching range is wide), the blower unit 120 can increase the blowing pressure. As another example, when etching with a laser so that a small amount of foreign matter is generated (or when the etching range is narrow), the blower unit 120 can lower the blowing pressure. When the blower unit 120 increases or decreases the blowing pressure, it is effective to blow air at a pressure in the range of 0.2 to 5.0 bar, and when the blowing pressure is out of the range, the blowing may not be properly performed.

[0028] The blower unit 120 can be preset to a predetermined blowing angle or blowing pressure according to the type and state of the foreign matter generated by the etching and may be adjusted in real time. However, it is not limited to this.

[0029] The laser etching apparatus 101 can include a suction unit 130. The suction unit 130 can suck foreign matter. The suction unit 130 can be arranged on the opposite side of the air blowing unit 120 with the laser unit 110 interposed therebetween. The suction unit 130 can be located above the plain portion 30. For example, the suction unit 130 can be located between the boundary on the plain portion 30 side of the etching range and the second active material portion 20b in order to effectively suck the foreign matter generated when the laser unit 110 irradiates the laser within the etching range. In other words, the suction unit 130 is located above the plain portion 30 between the first active material portion 20a and the second active material portion 20b, and at this time, it can be located in a region outside the etching range. However, it is not limited thereto. The suction unit 130 can suck the foreign matter generated by laser etching. By sucking the foreign matter blown by the air blowing unit 120 with the suction unit 130, it is possible to prevent the foreign matter from diffusing into the adjacent second active material portion 20b. The suction pressure of the suction unit 130 can be preset or adjusted. For example, the suction pressure of the suction unit 130 can be the same as the air blowing pressure of the air blowing unit 120, or may be greater than the air blowing pressure.

[0030] The laser etching apparatus 101 can include a barrier 140. The barrier 140 can prevent the diffusion of foreign matter. For example, when the air blowing unit 120 blows air against the foreign matter, the barrier 140 can prevent the foreign matter from diffusing into the second active material portion 20b by the blowing. The barrier 140 may be in a form extending in a direction perpendicular to the electrode sheet 10 (or the upper surface of the electrode sheet 10). For example, as described above, the barrier 140 extends in a direction perpendicular to the upper surface of the electrode sheet 10 and can block the path through which the foreign matter scatters into the second active material portion 20b by the blowing.

[0031] The laser etching apparatus 101 can include at least a laser unit 110, a blower unit 120, and a suction unit 130. The laser unit 110, the blower unit 120, and the suction unit 130 of the laser etching apparatus 101 can be arranged in a direction crossing the traveling direction (or moving direction) of the electrode sheet 10. For example, the laser unit 110 can be arranged on the edge of the first active material portion 20a to irradiate the edge of the first active material portion 20a with a laser.

[0032] The blower unit 120 can be arranged on the first active material portion 20a to blow air against foreign matter in the direction from the first active material portion 20a toward the second active material portion 20b. In this case, the blower unit 120 can be arranged inside the first active material portion 20a rather than the laser unit 110. In other words, the blower unit 120 can be arranged farther from the edge of the first active material portion 20a than the laser unit 110.

[0033] The suction unit 130 can be arranged on the opposite side of the blower unit 120 with respect to the laser unit 110. For example, the suction unit 130 can be arranged on the plain portion 30 or the second active material portion 20b.

[0034] As described above, when the laser unit 110, the blower unit 120, and the suction unit 130 are arranged in a direction crossing the traveling direction of the electrode sheet 10 (for example, the vertical direction, the inclined direction), it is possible to effectively prevent the foreign matter blown by the blower unit 120 from accumulating on the etching target again. For example, it is possible to suppress the foreign matter on the first active material portion 20a blown by the blower unit 120 from accumulating on the first active material portion 20a again.

[0035] The laser unit 110, the blower unit 120, and the suction unit 130 can be linearly arranged along a direction crossing the traveling direction of the electrode sheet 10. When linearly arranged, the suction unit 130 can effectively suck the foreign matter blown by the blower unit 120.

[0036] Also, when the laser etching apparatus 101 further includes a barrier 140, not only the above-described effects can be obtained, but also the influence on adjacent active material portions can be prevented. For example, via the barrier 140, it is possible to suppress the accumulation of foreign matter in the first active material portion 20a blown by the blower unit 120 on the second active material portion 20b.

[0037] Referring to FIG. 6 for description, a laser etching apparatus 101' which is a modified example of the laser etching apparatus 101 may include a barrier 140'. The barrier 140' may include a bent portion. The barrier 140' includes a portion extending in a direction perpendicular to the electrode sheet 10 (or the upper surface of the electrode sheet 10). At this time, it may include a bent portion curved from the end on the electrode sheet 10 side toward the plain portion 30 side or the suction unit 130 side. When the barrier 140' includes a bent portion, foreign matter diffusing in the diagonal direction can be blocked. For example, by preventing the foreign matter scattered by the blower unit 120 from moving in the diagonal direction with respect to the second active material portion 20b, the diffusion of the foreign matter can be effectively prevented. Also, when the barrier 140' includes a bent portion, the blowing path (or the air flow) by the blower unit 120 can be guided. For example, when the blower unit 120 blows air, the blowing path of the air can be guided so that the air flow is directed toward the suction unit 130 side, and the suction of the suction unit 130 can be made more effective.

[0038] The barriers 140 and 140' described with reference to FIGS. 5 to 6 can be located above the other active material part adjacent to the one active material part where etching is performed. For example, the barriers 140 and 140' can be located above the second active material part 20b, which is the other active material part adjacent to the first active material part 20a, with the ground part 30 interposed between the first active material part 20a, which is the one active material part etched by the laser unit 110. Specifically, it can be located above the edge on the ground part 30 side of the second active material part 20b so that foreign matter does not diffuse into the second active material part 20b. However, it is not limited to this, and the barriers 140 and 140' can be located above the ground part 30. For example, the barriers 140 and 140' are located above the ground part 30, and at this time, they can be located on the second active material part 20b side on the ground part 30.

[0039] The barriers 140 and 140' can be located closer to the other active material part adjacent to the one active material part than to the one active material part where etching is performed. For example, the distance between the first active material part 20a, which is the one active material part etched by the laser unit 110, and the barriers 140 and 140' may be farther than the distance between the second active material part 20b, which is the other active material part adjacent to the first active material part 20a with the ground part 30 interposed therebetween, and the barriers 140 and 140'.

[0040] The barriers 140 and 140' can be located closer to the second active material part 20b than to the suction unit 130. For example, although it is blown by the blower unit 120, at this time, in order to prevent foreign matter that is not being sucked by the suction unit 130 from diffusing into the second active material part 20b, the distance between the barriers 140 and 140' and the second active material part 20b may be smaller than the distance between the suction unit 130 and the second active material part 20b.

[0041] As described above, an electrode can be manufactured by a method of etching the first active material part 20a using the laser etching apparatus 101. In the method for manufacturing an electrode, the step of etching the first active material portion 20a using the laser etching apparatus 101 will be described. However, the step of etching the second active material portion 20b using the laser etching apparatus 102 described later can also be applied in the same or similar manner.

[0042] The method for manufacturing an electrode can include a step of coating an active material on the electrode sheet 10 to form the active material portions 20a, 20b and the plain portion 30. The method for manufacturing an electrode can include a step of etching a part of the edge of the first active material portion 20a. The etching step can include a process of irradiating a laser to a part of the edge of the first active material portion 20a using the laser unit 110 for etching, a process of blowing air toward the plain portion 30 using the air blowing unit 120 for foreign matters generated by etching a part of the edge, and a process of sucking the foreign matters blown and diffused using the suction unit 130 disposed on the opposite side of the air blowing unit 120 across the laser unit 110. The part of the edge may be a part of the boundary between the first active material portion 20a and the plain portion 30.

[0043] FIG. 7 is a schematic diagram of a laser etching system 100' according to another embodiment of the present invention. The laser etching system 100' can include laser etching apparatuses 101 and 102. The above description can also be applied in the same or similar manner hereinafter.

[0044] The laser etching system 100' can include a laser etching device 101 and a laser etching device 102. The laser etching device 101 and the laser etching device 102 can be sequentially arranged along the moving direction (or the traveling direction) of the electrode sheet 10. In other words, the laser etching device 101 and the laser etching device 102 are arranged along the traveling direction (for example, the display direction of the arrow) of the electrode sheet 10, and at this time, they can be arranged at a predetermined distance apart along the traveling direction. Further, the laser etching device 101 is arranged adjacent to the first active material portion 20a to etch the first active material portion 20a, and the laser etching device 102 can be arranged adjacent to the second active material portion 20b to etch the second active material portion 20b. The laser etching device 101 can etch the edge of the first active material portion 20a that forms a boundary with the blank portion 30, and the laser etching device 102 can etch the edge of the second active material portion 20b that forms a boundary with the blank portion 30. In other words, the laser etching device 101 and the laser etching device 102 are respectively arranged at predetermined positions, and while the electrode sheet 10 moves along the traveling direction, etching can be performed on the edges of the first active material portion 20a and the second active material portion 20b respectively. The edge may be the boundary between the active material portions 20a, 20b and the blank portion 30.

[0045] FIG. 8 is a diagram showing a state in which the laser etching device 102 of the laser etching system 100' according to another embodiment of the present invention etches the second active material portion 20b. The above description can be applied in the same or similar manner hereinafter.

[0046] Referring to FIG. 8, the laser etching apparatus 102 can include a laser unit 210, a blower unit 220, a suction unit 230, and a barrier 240, which respectively correspond to the laser unit 110, the blower unit 120, the suction unit 130, and the barrier 140 of the above-described laser etching apparatus 101. Alternatively, in the case of the barrier 240, although not shown, it may correspond to the barrier 140' of the laser etching apparatus 101', which is a modified example of the laser etching apparatus 101.

[0047] In order to etch the second active material portion 20b, the laser unit 210, the blower unit 220, the suction unit 230, and the barrier 240 can be arranged in a direction symmetric to the laser etching apparatuses 101 and 101'. However, the same or similar descriptions can be applied to the arrangement positions and operations of the laser unit 210, the blower unit 220, the suction unit 230, and the barrier 240.

[0048] FIG. 9 is a diagram showing a heat affected zone 400 formed at the boundary between the first active material portion 20a and the non-patterned portion 30 according to an embodiment of the present invention. The above description can also be applied identically or similarly hereinafter.

[0049] The electrode can include a first active material portion 20a in which an active material is coated on the electrode sheet 10, and a non-patterned portion 30 in which no active material is coated on the electrode sheet 10. The boundary between the laser-etched first active material portion 20a and the non-patterned portion 30 (or the edge of the first active material portion 20a) can form a part of the electrode. A heat affected zone (HAZ) 400 can be formed at the boundary between the first active material portion 20a and the non-patterned portion 30 by laser etching. The heat affected zone 400 can have a lower brightness than the non-patterned portion 30. Also, the heat affected zone 400 can preferably have a width of 200 μm or less. When the heat affected zone 400 is formed within the above width and the electrode is manufactured, the influence of laser etching can be minimized, so that the coating quality and the electrode quality can be improved.

[0050] The present invention has been described above with reference to the limited embodiments and drawings. However, the present invention is not limited thereto, and various implementations are possible within the scope equivalent to the technical idea of the present invention and the claims described below by those having ordinary knowledge in the technical field to which the present invention pertains.

Explanation of Reference Numerals

[0051] 10: Electrode sheet 11: Boundary region 12: Preliminary notch region 20: Active material part 20a: First active material part 20b: Second active material part 20c: Third active material part 21: Upper active material part 22: Lower active material part 30: Plain part 100, 100’: Laser etching system 101, 101’: Laser etching apparatus 102: Laser etching apparatus 110: Laser unit 120: Air supply unit 130: Suction unit 140, 140’: Barrier 210: Laser unit 220: Air supply unit 230: Suction unit 240: Barrier 400: Heat affected part

Claims

1. A laser etching apparatus for etching a active material portion on an electrode sheet including the active material portion and a non-patterned portion, a laser unit that irradiates the active material portion with a laser, a blower unit that blows air toward the non-patterned portion against foreign matter generated by etching the active material portion, and a suction unit that is disposed on the opposite side of the blower unit with the laser unit interposed therebetween and sucks the foreign matter, wherein the laser unit, the blower unit, and the suction unit are arranged in a direction crossing the moving direction of the electrode sheet. Laser etching apparatus.

2. The laser etching apparatus according to claim 1, further comprising a barrier that is disposed on the opposite side of the blower unit with the suction unit interposed therebetween and prevents diffusion of the foreign matter.

3. The blower unit is located above the active material portion, The suction unit is located above the non-patterned portion. The laser etching apparatus according to claim 1.

4. The laser etching apparatus according to claim 2, wherein the barrier is located above another active material portion adjacent to the one active material portion to be etched by the laser unit with the non-patterned portion interposed therebetween.

5. The distance between the one active material portion to be etched by the laser unit and the barrier is farther than the distance between the barrier and another active material portion adjacent to the one active material portion with the non-patterned portion interposed therebetween. The laser etching apparatus according to claim 2.

6. The laser etching apparatus according to claim 4, wherein the barrier is provided with a bent portion that curves toward the suction unit at the end.

7. The blower unit blows air at a blowing angle of 10 to 80 degrees with respect to the surface of the electrode sheet that receives the blowing among both surfaces of the electrode sheet. The laser etching apparatus according to claim 1.

8. The laser etching apparatus according to claim 1, wherein the air blowing unit blows air at an air blowing pressure of 0.2 to 5.0 bar.

9. A laser etching system for etching a first active material portion and a second active material portion on an electrode sheet including a first active material portion, a second active material portion, and a plain portion located between the first active material portion and the second active material portion, a first laser etching apparatus for etching the first active material portion; a second laser etching apparatus for etching the second active material portion, Each of the first laser etching apparatus and the second laser etching apparatus includes a laser unit that irradiates the active material portion with a laser, an air blowing unit that blows foreign matter generated by etching of the active material portion toward the plain portion, and a suction unit that is disposed on the opposite side of the air blowing unit with the laser unit interposed therebetween and sucks the foreign matter, The laser unit, the air blowing unit, and the suction unit are arranged in a direction crossing the moving direction of the electrode sheet. Laser etching system.

10. The laser etching system according to claim 9, further including a barrier disposed on the opposite side of the air blowing unit with the suction unit interposed therebetween to prevent diffusion of the foreign matter.

11. The laser etching system according to claim 9, wherein the first laser etching apparatus and the second laser etching apparatus are sequentially arranged along the moving direction of the electrode sheet.

12. The first laser etching apparatus etches an edge forming a boundary with the plain portion in the first active material portion, The second laser etching apparatus etches an edge forming a boundary with the plain portion in the second active material portion. Laser etching system according to claim 9.

13. An active material portion in which an active material is coated on an electrode sheet, and a plain portion on the electrode sheet where the active material is not coated, and includes, at the boundary between the active material portion and the plain portion, a heat affected zone (HAZ) having a width of 200 μm or less is provided. An electrode.

14. The electrode according to claim 13, wherein the heat affected zone has a lower brightness than the plain portion.

15. A step of coating an active material on an electrode sheet to form an active material portion and a plain portion, and a step of etching a part of the edge of the active material portion, and includes, The step of etching, a process of etching by irradiating a part of the edge with a laser using a laser unit, a process of blowing air toward the plain portion using a blowing unit for foreign matter generated by etching a part of the edge, and a process of sucking the foreign matter blown and diffused using a suction unit disposed on the opposite side of the blowing unit across the laser unit. A method for manufacturing an electrode.

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