Purge gas amplification device

Abstract

The container includes a deflector disposed inside the substrate container and having a longitudinal opening and a deflection surface, and a gas distributor configured to provide a purge gas for purging the inside of the substrate container. The gas distributor is configured such that at least a part of the purge gas flows into a gap formed between the gas distributor and the deflector. The deflector is configured such that at least a part of the purge gas in the gap flows through the longitudinal opening. The deflector directs the gas flow pattern of the purge gas from the gas distributor toward the outlet of the substrate container in order to improve the purge effectiveness of the substrate container.

Description

Technical Field

[0001] The present disclosure relates to one or more embodiments of a substrate container in which one or more deflectors are disposed therein to improve the gas flow pattern within the substrate container and improve purge effectiveness.

Background Art

[0002] Wafer containers are used during the storage and / or etching of semiconductor wafers. When wafers are stored in a wafer container, undesirable gases such as water vapor may leak out. The undesirable gas can be purged from the container by introducing a purge gas into the wafer container by one or more gas distributors.

Summary of the Invention

[0003] The present disclosure relates to one or more embodiments of a substrate container in which one or more deflectors are disposed therein to improve the gas flow pattern within the substrate container and improve purge effectiveness.

[0004] In some embodiments, the system includes a deflector disposed inside the substrate container and having a longitudinal opening and a deflection surface, and a gas distributor configured to provide a purge gas for purging the interior of the substrate container. The gas distributor is configured such that at least a portion of the purge gas flows into a gap formed between the gas distributor and the deflector. The deflector is configured such that at least a portion of the purge gas within the gap flows through the longitudinal opening. The deflector is configured to direct the gas flow pattern of the purge gas from the gas distributor towards the outlet of the substrate container to improve the purge effectiveness of the substrate container. In one embodiment, the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other. In one embodiment, the first component is configured to engage the gas distributor. In one embodiment, the first component is configured to engage a mechanism provided on the substrate container.

[0005] In some embodiments, the system includes a substrate container having an interior disposed to store a substrate, a deflector disposed within the interior of the substrate container and having a longitudinal opening, and a gas distributor disposed to provide a purge gas for purging the interior of the substrate container. The gas distributor is configured such that at least a portion of the purge gas flows into the interior of the substrate container through the longitudinal opening. The longitudinal opening is disposed to direct the purge gas toward a central portion within the interior of the substrate container. The deflector can direct the gas flow pattern of the purge gas from the gas distributor to an outlet of the substrate container to improve the purge effectiveness of the substrate container. In one embodiment, the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other. In one embodiment, the first component is configured to engage with the gas distributor. In one embodiment, the first component is configured to engage with a mechanism provided on the substrate container.

[0006] In some embodiments, the longitudinal opening is disposed to direct the purge gas away from the central portion, toward a front opening of the substrate container, or toward a back of the substrate container.

[0007] Refer to the accompanying drawings, which form a part of this disclosure and illustrate non-limiting exemplary embodiments of a purge gas amplification device. The use of the same reference numerals in different figures indicates similar or identical items.

Brief Description of the Drawings

[0008]

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[0009] The present disclosure relates to a substrate container in which one or more deflectors are disposed therein to improve the gas flow pattern within the substrate container and improve purge effectiveness.

[0010] By including one or more deflectors within the substrate container, the gas flow pattern of the purge gas during purging can be improved, and thus the purge effectiveness of the substrate container can be improved. The deflector can direct the gas flow pattern of the purge gas, for example, such that a larger portion of the purge gas flows near or between substrates and a smaller portion flows around the substrates, toward the substrates disposed within the substrate container. The portion flowing near or between the substrates can more effectively remove unwanted vapor or particles from the substrates, and thus can improve the performance and purge effectiveness of the substrate container. In some embodiments, the deflector can be a purge gas amplification device.

[0011] In the following detailed description, reference is made to the accompanying drawings which form a part hereof. In the drawings, like reference numerals generally identify like components unless context dictates otherwise. Further, unless otherwise specified, the description of each successive drawing may refer to features from one or more of the previous drawings in order to provide a clearer context and more substantial description of the exemplary embodiments. However, the exemplary embodiments described in the detailed description, the drawings, and the claims are not intended to be limiting. Other embodiments may be utilized and other changes may be made without departing from the spirit or scope of the subject matter presented herein. As generally described herein and illustrated in the drawings, aspects of the present disclosure may be arranged, substituted, combined, separated, and designed in a variety of different configurations, and all of these are expressly contemplated herein.

[0012] Certain embodiments of the present disclosure are described herein with reference to the accompanying drawings, but it should be understood that the embodiments of the present disclosure are merely examples of the present disclosure that can be implemented in various forms. To avoid unnecessarily obscuring the present disclosure with details of well-known functions or structures, well-known functions or structures are not described in detail. Therefore, the specific structural and functional details disclosed herein should not be construed as limiting, but rather as a representative basis for teaching those skilled in the art to utilize the present disclosure in any appropriately detailed structure and, as a basis for the claims. In this specification and the drawings, like reference numerals represent elements that can perform the same, similar, or equivalent functions.

[0013] The scope of the present disclosure must be determined by the appended claims and their legal equivalents, rather than by the examples provided herein. For example, the steps recited in any method claim may be performed in any order and are not limited to the order presented in the claims. Further, elements are not essential to the practice of the present disclosure unless specifically described herein as "critical" or "essential".

[0014] As disclosed and recited herein, "disposing" can relate to a physical or functional feature that is permanently or temporarily positioned, attached, engaged, joined, etc. to another physical or functional feature via any one or means suitable for one or both of the physical or functional features, such as, for example, by an adhesive, a fitting, welding, one or more fasteners, friction, or combinations thereof.

[0015] As disclosed and recited herein, a "stabilizing device" can relate to one or more structures that limit, reduce, or prevent movement of a gas distributor and / or a deflector relative to each other or relative to a substrate container that includes the gas distributor and / or the deflector. As used herein, the stabilizing device can be connected to any one or more of the gas distributor, the deflector, and / or the substrate container. By including a stabilizing device 145 that reduces or limits movement, a flow pattern that optimizes purge effectiveness can be maintained without changing the relative positions. By including a stabilizing device that reduces or limits such movement, a flow pattern that provides a high purge effectiveness can be maintained while maintaining the relative positions.

[0016] FIG. 1 shows a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. FIG. 2A shows a cross-sectional view of the substrate container 100 according to the exemplary embodiment of FIG. 1. The cross-sectional view shown in FIG. 2A can be a cross-sectional view along line 2-2 in FIG. 1.

[0017] As shown in FIGS. 1 and 2, the substrate container 100 includes a first side surface 102, a second side surface 104, a bottom surface 106, a top surface 108, a back 112, and a front opening 110.

[0018] The first side 102, the second side 104, the bottom surface 106, and the top surface 108 define the front opening 110 of the substrate container 100. The front opening 110 can be closed by a door coupled to the substrate container 100. The substrate container 100 can be accessed by moving (e.g., opening, removing) the door. For example, the door can be coupled to the substrate container 100 by fitting the door into the front opening 110 of the substrate container 100 and optionally operating a latch (not shown). The door can be operated manually or automatically (e.g., opened or closed). The door can be operated by an operator, a robotic arm, etc. The door can include one or more latches for engaging the substrate container 100. When closed, the door is configured to seal the substrate container 100 from the surrounding environment of the substrate container against foreign objects such as, but not limited to, moisture, dust particles. The back 112 is disposed at the rear end 113 (shown by FIGS. 1 and 2) of the substrate container 200. The first side 102, the second side 104, the bottom surface 106, the top surface 108, the back 112, and the door of the substrate container 100 separate the interior 140 of the substrate container 100 from the outside of the substrate container 100.

[0019] The interior 140 is disposed within the substrate container 100 and is defined by the first side 102, the second side 104, the bottom surface 106, the top surface 108, the back 112, and the front opening 110. The interior 140 can be a space utilized for storing one or more substrates. The interior 140 can accommodate other components of the substrate container 100, such as the gas distributor 120, the deflector 130, etc.

[0020] The first side 102 and the second side 104 can each include one or more shelves 118 that project laterally into the interior 140 from their respective sides. Each shelf 118 from the first side 102 and the second side 104 jointly defines substrate slots configured to receive and support substrates. When a substrate is held in each substrate slot within the substrate container 100, the volume occupied by the substrate can be the interior portion 101. In some embodiments, the interior portion 101 can be a cylindrical volume that is concentric with the substrates held within the substrate container 100 and surrounded by the top surface 108 and the bottom surface 106 of the substrate container 100.

[0021] In some embodiments, the substrate can be one or more substrates used, for example, for semiconductor manufacturing. In some embodiments, the substrate container 100 is a container for accommodating one or more substrates. In some embodiments, the substrate container 100 can be, for example, a front-opening unified pod (FOUP).

[0022] In some embodiments, one or more purge gas inlets 125 can be disposed on the substrate container 100. The purge gas inlet 125 is connected to a purge gas source 190. The purge gas source 190 can be connected to the purge gas inlet 125 by fluidly coupling the purge gas source 190 and the purge gas inlet 125, and supplies a purge gas used to purge the interior 140 of the substrate container 100.

[0023] It is understood that the position of the purge gas inlet 125 is exemplary and not limited to the illustrated position of the substrate container 100. For example, at least a portion of the purge gas inlet 125 can be disposed in the shoulder portion 114 and / or the lip portion 115 of the substrate container 100. It is further understood that one or more purge gas inlets 125 can be disposed on any one or more of the first side 102, the second side 104, the bottom surface 106, and the top surface 108 of the substrate container 100.

[0024] In the exemplary example of FIG. 1, the purge gas source 190 is shown to be fluidly connected or coupled to the substrate container 100 at the bottom surface 106. It is understood that the purge gas source 190 can be fluidly connected to the substrate container 100 from any of the first side surface 102, the second side surface 104, the bottom surface 106, the top surface 108, and the back 112.

[0025] The shoulder portion 114 can be disposed within or near the rear end 113 of the interior 140 of the substrate container 100. In some embodiments, the shoulder portion 114 is the volume at the rear end of the interior 140 of the substrate container 100 between the inner portion 101, the bottom surface 106, the top surface 108, and the back 112. For example, the shoulder portion 114 can include the position H3 (as shown in FIG. 13 and described below). The position H3 is disposed at or near the rear end 113 and is disposed close to the substrate such that the purge gas is directed by the deflector 130 at a position closer to the substrate. Since it is closer to the substrate, the deflector 130 can create a stronger guiding effect when directing the gas flow pattern in the substrate container to flow between and around the substrates, removing any foreign matter. The foreign matter can include any solid, liquid, or vaporous substance that interferes with the substrate. Examples of foreign matter can include, but are not limited to, moisture, dust particles, etc. The rear end of the interior 140 of the substrate container 100 can be the end of the interior 140 opposite the door of the substrate container 100 with respect to the center of the substrate container 100.

[0026] The lip portion 115 can be disposed within or near the front opening 110 of the interior 140 of the substrate container 100. In some embodiments, the lip portion 115 is the volume at the front end of the interior 140 of the substrate container 100 between the inner portion 101, the bottom surface 106, the top surface 108, and the front opening 110. The front end of the interior 140 of the substrate container 100. The interior 140 can be the end of the interior 140 adjacent to the door of the substrate container 100.

[0027] To distribute purge gas from the purge gas source 190, one or more gas distributors 120 can be disposed within the substrate container 100. For example, the gas distributor 120 can guide the purge gas to flow longitudinally with respect to the gas distributor 120 before laterally distributing it within the interior 140 of the substrate container 100. In some embodiments, one or more of the gas distributors 120 are disposed over the purge gas inlet 125 to distribute the purge gas into the interior 140 of the substrate container 100. In some embodiments, the purge gas can flow laterally in any direction including away from the center of the substrate container 100.

[0028] To direct the purge gas flowing from each one of the gas distributors 120, one or more deflectors 130 can be disposed on any one or more of the gas distributors 120. For example, the deflector 130 can direct the purge gas by changing one or more of the angles of the surface of the deflector 130 on which the purge gas is induced. Thus, in some embodiments, the deflector directs the purge gas inwardly (i.e., towards the inner portion 101 and / or away from the first side surface 102 and the second side surface 104). In other embodiments, the deflector directs the purge gas outwardly (i.e., away from the inner portion 101 and / or towards the first side surface 102 and the second side surface 104).

[0029] Figure 2B shows a perspective view of deflector 130 according to the exemplary embodiment of FIG. 1. The deflector 130 can include one or more structures of various shapes that deflect the purge gas within the substrate container 100. For example, the deflector 130 can be an elongated member having a first end 130A and a second end 130B, a first side surface 130C, a second side surface 130D, a first surface 130E, and a second surface 130F. The first surface 130E and / or the second surface 130F can be curved such that the first side surface 130C and the second side surface 130D are arranged to form a longitudinal opening 135 with respect to each other. In some embodiments, the distance between the first side surface 130C and the second side surface 130D can be selected according to the diameter of the dispenser 120. For example, in some embodiments, the distance can be between 0.75 and 25 mm.

[0030] The deflector 130 can be made of any (one or more) materials suitable for deflecting the purge gas within the substrate container 100 (e.g., plastic, metal, etc., or combinations thereof). In some embodiments, the material can be selected to withstand the operating and / or cleaning processes of the substrate container 100, such as the operating and / or cleaning temperature, pressure, chemicals, etc.

[0031] Returning to FIG. 2A, the deflector 130 is arranged to direct the gas flow pattern of the purge gas within the substrate container 100 based on one or more arrangements on the inner surface of the deflector 130. For example, in some embodiments, the deflector 130 modifies the gas flow pattern provided by the inner surface by directing the purge gas towards the further central volume or interior portion 101 and / or away from the first side surface 102 and the second side surface 104. For example, without the deflector 130, when the purge gas exits the gas distributor 120, the purge gas can disperse in all directions away from the gas distributor 120. Since it has a deflector surface 136 disposed on the gas distributor 120 that blocks some of the flow directions towards the side surfaces 102 or 104, the deflector 130 can change the flow direction of at least a portion of the purge gas towards the substrate so that foreign matter on or near the substrate is removed by the purge gas. In some embodiments, the deflector 130 generates a gas flow pattern having a greater proportion of the purge gas flow between or near the substrates by directing the purge gas further towards the center of the substrate container 100. With a greater proportion of the purge gas, the purge gas can more effectively remove foreign matter from the substrate compared to without the deflector 130. In some embodiments, the gas flow pattern can be a flow pattern from the gas distributor 120 to one or more purge gas outlets 111 of the substrate container 100. In some embodiments, the gas flow pattern can be a flow pattern from the gas distributor 120 to the front opening 110 of the substrate container 100.

[0032] Purge effectiveness can be measured over time by the relative humidity (e.g., in percentage) within the substrate container 100 at a predetermined flow rate of purge gas supplied to the gas dispenser 120. For example, when a predetermined amount of purge gas is supplied to the substrate container 100, the relative humidity measured within the substrate container 100 can be recorded and plotted over time, as shown, for example, in FIG. 16. A plot of the substrate container 100 with the deflector 130 can be compared to a plot of the substrate container 100 without the deflector 130. A plot of the substrate container 100 without the deflector 130 can serve as a control for determining whether the deflector improves purge effectiveness. When the plot of the substrate container 100 with the deflector 130 is compared to the control, a more rapid and / or consistent decrease in relative humidity in the plot with the deflector 130 indicates improved purge effectiveness. Non-limiting examples of a more rapid decrease can include a greater decrease per unit time or the same amount of decrease in a shorter time, compared to the decrease of the control. Non-limiting examples of a more consistent decrease can be relative humidity measurements per unit time having a smaller variance than the variance of the control.

[0033] Returning to FIG. 2A, in some embodiments, one or more of the outlets 111 can be a front opening 110, for example, with the door open. The door can be operable, for example, manually opened or closed, or automatically operated. The door can be operated by an operator, a robotic arm, etc. The door can include one or more latches for engaging the substrate container 100. When closed, the door is configured to seal the substrate container 100 from the surrounding environment of the substrate container 100 against foreign matter such as, but not limited to, moisture, dust particles. In FIG. 2A, the door is removed to show the internal structure of the substrate container 100. The outlet 111 can connect the interior 140 of the substrate container 100 to the exterior of the substrate container 100 so that purge gas can be discharged from the substrate container 100 after flowing through the interior 140 of the substrate container 100. For example, the outlet 111 can be a one-way valve that allows purge gas to flow from the interior 140 of the substrate container 100 to the exterior. In other embodiments, one or more of the outlets 111 can be one or more purge gas outlets 111 disposed on the substrate container 100.

[0034] In some embodiments, the substrate container 100 can include one or more stabilization devices 145. The stabilization devices 145 can stabilize the gas distributor 120 and / or the deflector 130 and reduce the movement of the gas distributor 120 and / or the deflector 130 relative to each other and / or relative to the substrate container 100. The stabilization devices 145 can provide additional connections between the gas distributor 120, the deflector 130, and / or the substrate container 100. In some examples, the additional connections can rigidly connect the gas distributor 120, the deflector 130, and / or the substrate container 100 together to reduce relative movement. The movement can change the relative positions between the gas distributor 120, the deflector 130, and / or the substrate container 100. The relative positions can be optimized to produce the most effective flow pattern having the highest purge effectiveness in a particular substrate or a particular purge process. The movement that changes the relative positions can change the flow pattern and reduce the purge effectiveness. By including the stabilization devices 145 that reduce or limit the movement, a flow pattern that optimizes the purge effectiveness can be maintained without changing the relative positions.

[0035] FIG. 3 shows a perspective view of the gas distributor 120 and the deflector 130 according to one or more exemplary embodiments of the purge gas amplification device. FIG. 4 shows a cross-sectional view of the gas distributor 120 and the deflector 130 according to, for example, the exemplary embodiment of FIG. 3. The cross-sectional view shown in FIG. 4 is a cross-sectional view along line 4-4 in FIG. 3.

[0036] As shown in FIGS. 3 and 4, the deflector 130 engages with the gas distributor 120. The gas distributor 120 can be configured to provide a purge gas for purging the interior 140 of the substrate container 100, as shown, for example, in FIG. 1. The gas distributor 120 can distribute the purge gas in the longitudinal direction L with respect to the gas distributor 120. The gas distributor 120 can be a nozzle, a diffuser, or the like. In some embodiments, the gas distributor 120 can be an elongated member. The gas distributor 120 can protrude from and into the substrate container 100.

[0037] In the illustrated embodiment, the gas distributor 120 can be a diffuser having a porous body. The first end 120A of the gas distributor 120 can be fluidly connected to a purge gas source 190, for example, via a purge gas inlet 125 (shown in FIG. 1). The purge gas source 190 can supply a flow of purge gas (e.g., purified and dried air) that flows through the porous body in the longitudinal direction L. The porous body can include channels 120B in the longitudinal direction L for distributing the purge gas in the longitudinal direction L. After being distributed within the channels 120B, the purge gas can then flow radially through the porous body in the radial direction R and be discharged into the interior 140 of the substrate container 100. In some embodiments, the purge gas can flow radially through the outer surface 122 of the gas distributor 120 in the radial direction R and be discharged into the interior 140 of the substrate container 100.

[0038] In some embodiments, the second end 120C of the diffuser can be capped. For example, the channels 120B can extend in the longitudinal direction L up to before the second end 120C so that the pressure of the purge gas can accumulate within the channels 120B before the purge gas flows through the porous body in the radial direction R. In some embodiments, the pressure of the purge gas can accumulate within the channels 120B before the purge gas flows through the second end 120C of the porous body.

[0039] The deflector 130 has a longitudinal opening 135 and a deflection surface 136. The longitudinal opening 135 and the deflection surface 136 can collectively guide the purge gas to flow in a predetermined direction by adjusting the flow direction of at least a portion of the purge gas leaving the gas distributor 120. The predetermined direction can be based on a desired flow through the substrate container 100. The deflector 130 can be arranged and / or oriented such that the flow is directed in the predetermined direction. The deflector 130 can be oriented such that the longitudinal opening 135 is centered on a line connecting the gas distributor 120 and the center of the substrate container 100. The deflector 130 can be a curved structure arranged to direct and / or deflect the purge gas flowing within the interior 140 of the substrate container 100. In some embodiments, the deflector 130 can be made of a non-permeable and / or non-porous material with respect to the purge gas. For example, the deflector 130 can be made of plastic, metal, or the like.

[0040] In some embodiments, the deflection surface 136 faces the gas distributor 120 so as to deflect the flow of the purge gas exiting the gas distributor 120 toward the center of the substrate container 100, away from the center of the substrate container 100, or at an angle with respect to the center line 116 of the substrate container 100, as further discussed with respect to FIGS. 7-8C.

[0041] In some embodiments, the gas distributor 120 can discharge a purge gas into the interior 140 of the substrate container 100. At least a portion of the purge gas from the gas distributor 120 flows into a gap 138 formed between the gas distributor 120 and the deflector 130. At least a portion of the purge gas within the gap 138 flows through the longitudinal opening 135. In some embodiments, the deflector 130 is radially spaced from the gas distributor 120 to form the gap 138. In some embodiments, the gap 138 between the gas distributor 120 and the deflector surface 136 is between 0.5 and 3 millimeters. In some embodiments, the gap 138 between the gas distributor 120 and the deflector surface 136 is in the range of 1 to 2 millimeters. In some embodiments, the gap 138 between the gas distributor 120 and the deflector surface 136 varies along the longitudinal direction L. In some embodiments, the gap 138 becomes smaller towards the second end 120C of the gas distributor 120 and larger towards the first end 120A.

[0042] In some embodiments, the deflector 130 engages with the gas distributor 120. To maintain the relative angular position between the gas distributor 120 and the deflector 130 and / or the deflection surface 136, the deflector 130 is moved at a constant interval relative to the gas distributor 120 by an indexer. The indexer can be one or more mechanisms or structures that can repeatedly maintain the relative angular position or rotational position, for example, by rotating the gas distributor 120 at discrete angles. In some embodiments, the movement of the substrate container 100 or the flow of fluid within the interior 140 of the substrate container 100 can affect the deflector 130 or the gas distributor 120 relative to the substrate container 100. It is understood that the fluid can include any substance that can flow, including but not limited to gases, liquids, etc. Non-limiting examples of the fluid can include purge gas, cleaning liquid, etc. This effect can, for example, but not be limited to, result in a change in the relative angular position between the deflector 130 and the substrate container 100. The indexer can maintain the relative angular position by resisting the force that can move or rotate the gas distributor 120 or the deflector 130 relative to the substrate container 100 by providing a connection. The connection can be between the deflector 130 and the gas distributor 120, between the deflector 130 and the substrate container 100, or between the gas distributor 120 and the substrate container 100. In some embodiments, the connection can be between the gas distributor 120, the deflector 130, and the substrate container 100. In some embodiments, the connection is rigid to resist or dissipate the force that can move or rotate the gas distributor 120 or the deflector 130 relative to the substrate container 100. In some embodiments, the deflector 130 can engage directly or indirectly with the gas distributor 120 via the indexer, for example, forming an interference fit, snap fit, clip mechanism, etc., creating friction between the deflector 130 and the gas distributor 120 to resist the influence.

[0043] In some embodiments, one or more ribs 132 can be an embodiment of an indexer. The rib 132 can engage with the gas distributor 120 to attach the deflector 130 to the gas distributor 120, for example, by an interference fit, a snap fit, a clip mechanism, or the like. The rib 132 extends from the deflection surface 136 of the deflector 130. The distal end 134 of the rib 132 engages with the outer surface 122 of the gas distributor 120 such that the relative angular position between the gas distributor 120, the deflector 130, and / or the deflection surface 136 is maintained. The influence can, for example, but is not limited to, result in a change in the relative angular position between the deflector and the substrate container. In some embodiments, the movement of the substrate container 100 or the flow of fluid within the substrate container 100 can affect the deflector 130 or the gas distributor 120 relative to the substrate container 100. The rib 132 can maintain the relative angular position by resisting the force that can move or rotate the gas distributor 120 or the deflector 130 relative to the substrate container 100 by providing a connection. The connection can be between the deflector 130 and the gas distributor 120 via the rib 132. In some embodiments, the connection is rigid to resist or dissipate the force that can move or rotate the gas distributor or the deflector relative to the substrate container. The rib 132 can create a connection and maintain the relative angular position, for example, by creating interference between the rib 132 and the gas distributor 120 to generate friction to resist the influence, or by the rib 132 forming an interference fit, a snap fit, a clip mechanism, or the like between the deflector 130 and the gas distributor. In some embodiments, one or more ribs 132 or indexers that attach the diffuser 130 to the gas distributor 120 can be a diffuser-deflector assembly.

[0044] FIG. 5 shows a gas distributor 120 and a deflector 230 according to one or more exemplary embodiments of a purge gas amplification device. For example, when compared with the deflector 130 of FIG. 4, the deflector 230 is a constricted deflector having a longitudinal opening 235 that is narrower than the longitudinal opening 135. The narrower longitudinal opening 235 can affect the gas flow pattern by accelerating the linear velocity of the purge gas exiting the deflector 230 and by further controlling the direction of the purge gas leaving the deflector 240.

[0045] FIG. 6 shows a gas distributor 120 and a deflector 330 according to one or more exemplary embodiments of a purge gas amplification device. For example, when compared with the deflector 130 of FIG. 4, the deflector 330 includes a lid 331. The lid 331 of the deflector 330 can be disposed over the second end 120C of the gas distributor 120. The lid 331 can deflect the purge gas leaving the gas distributor 120 in the longitudinal direction L radially (as shown in FIG. 4) in the direction R.

[0046] FIG. 7 is a cross-sectional view of a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. As shown in FIG. 7, the substrate container 100 includes a gas distributor 120 that engages a deflector 130 disposed in a shoulder portion 114 of the substrate container 100. The longitudinal opening 135 deflects the purge gas leaving the deflector 130 along direction 139A. The angle between direction 139A and the centerline 116 can be from 0° to 80°. In some embodiments, the angle can be from 15° to 25°. Direction 139A can be determined according to the application, for example, for different sizes and / or arrangements of substrates stored therein, for different compositions, temperatures, pressures, flow rates, etc. of the purge gas.

[0047] FIG. 8A is a partial cross-sectional view of a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. Compared to the substrate container 100 of FIG. 7, the substrate container 100 of FIG. 8A includes a gas distributor 120 disposed within a lip portion 115 of the substrate container 100. The deflector 130 engages with the gas distributor 120 and directs the purge gas exiting the deflector 130 in direction 139B. The angle between direction 139B and the centerline 116 can be any angle from, for example, 0° to 80°. In some embodiments, the angle can be from 15° to 25°. Direction 139B can be determined according to the application, for example, for different sizes and / or arrangements of substrates stored therein, for different compositions, temperatures, pressures, flow rates, etc. of the purge gas.

[0048] FIG. 8B is a partial cross-sectional view of a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. Compared to the substrate container 100 of FIG. 8A, the deflector 130 is arranged to direct the purge gas exiting the deflector 130 in direction 139C. Direction 139C can be parallel to the centerline 116 and can be in a direction away from the lip portion 115 such that the deflector 130 directs the purge gas towards the back 112 of the substrate container 100.

[0049] FIG. 8C is a partial cross-sectional view of a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. Compared to the substrate container 100 of FIG. 8A, the deflector 130 is arranged to direct the purge gas exiting the deflector 130 in direction 139D. Direction 139D can be parallel to the centerline 116 and can be in a direction towards the lip portion 115 such that the deflector 130 directs the purge gas towards the front opening 110 of the substrate container 100.

[0050] FIG. 9 is a perspective view of the gas distributor 620 and deflector 630 according to one or more exemplary embodiments of the purge gas amplification device. FIG. 10 shows a schematic diagram of the mating surface 100A on the substrate container 100 according to the exemplary embodiment of FIG. 9. FIG. 10 can be a detailed view at position 14 (shown in FIG. 7) taken from the interior 140 of the substrate container 100 towards the upper surface 108 of the substrate container 100. In some embodiments, the first joint member 645A shown in FIG. 9 mates with the second joint member 645B shown in FIG. 10 to form a spline joint.

[0051] As shown in FIGS. 9 and 10, the gas distributor 620 is an elongated member having a first end 620A and a second end 620B. The first end 620A can be fluidly connected to a purge gas inlet 125 that supplies purge gas to the gas distributor 620 for distribution within the substrate container 100 (shown in FIG. 11).

[0052] The deflector 630 can engage with the gas distributor 620 to deflect the purge gas leaving the gas distributor 620. The deflector 630 can be an elongated member having a rib 633 disposed at one end and a lid 635 disposed at the other end. The rib 633 can be attached to the first end 620A of the gas distributor 620, for example, by an interference fit, snap fit, clip mechanism, or the like. The lid 635 can be attached to the second end 620B, for example, by one or more fasteners, adhesives, clips, or the like.

[0053] As long as the relative angular position between the deflector 630 and the gas distributor 620 can be maintained, it is understood that the deflector 630 can engage with the gas distributor 620 by one or more structures. In some embodiments, when the deflector 630 engages with the gas distributor 620 by an indexer. To maintain the relative angular position between the gas distributor 620 and the deflector 630 and / or the deflection surface 636, the deflector 630 is moved at a constant interval relative to the gas distributor 620 by an indexer. In some embodiments, the movement of the substrate container 100 or the flow of fluid within the interior 140 of the substrate container 100 can affect the deflector 630 or the gas distributor 620 relative to the substrate container 100. This effect can, for example, but is not limited to, result in a change in the relative angular position between the deflector 630 and the substrate container 100. The indexer can maintain the relative angular position by resisting the force that can move or rotate the gas distributor 620 or the deflector 630 relative to the substrate container 100 by providing a connection. The connection can be between the deflector 630 and the gas distributor 620, between the deflector 630 and the substrate container 100, or between the gas distributor 620 and the substrate container 100. In some embodiments, the connection can be between the gas distributor 620, the deflector 630, and the substrate container 100. In some embodiments, the connection is rigid to resist or eliminate the force that can move or rotate the gas distributor 620 or the deflector 630 relative to the substrate container 100. In some embodiments, the deflector 630 can engage directly or indirectly with the gas distributor 620 via an indexer, for example, forming an interference fit, snap fit, clip mechanism, etc., to generate friction between the deflector 630 and the gas distributor 620 to resist the influence.

[0054] The stabilization device 640 can be disposed on the deflector 630 and / or the gas distributor 620 to stabilize the deflector 630 and / or the gas distributor 620. The deflector 630 and / or the gas distributor 620 can be stabilized when the deflector 630 and / or the gas distributor 620 is shorter or substantially shorter than the internal height of the substrate container 100. In some embodiments, the internal height can be the distance between the bottom surface 106 and the top surface 108 (shown in FIG. 1). The stabilization device 640 can be stabilized, for example, by providing a connection to the substrate container 100.

[0055] The stabilization device 640 can include a first end 640A and a second end 640B. In some embodiments, the first end 640A of the stabilization device 640 can engage the second end 620B of the gas distributor 620 and / or the deflector 630. The second end 640B of the stabilization device 640 can engage the substrate container 100 (shown in FIG. 1). In some embodiments, the second end 640B of the stabilization device 640 can engage the first side surface 102, the second side surface 104, the bottom surface 106, the top surface 108, and / or the back 112 of the substrate container 100.

[0056] The stabilization device 640 can stabilize the gas distributor 620 and / or the deflector 630 to reduce the movement of the gas distributor 620 and / or the deflector 630 relative to each other and / or relative to the substrate container 100. The stabilization device 640 can provide additional connections between the gas distributor 620, the deflector 630, and / or the substrate container 100. In some examples, the additional connections can rigidly connect the gas distributor 620, the deflector 630, and / or the substrate container 100 together to reduce relative movement. Reducing the movement can, for example, stabilize the gas distributor 620 and / or the deflector 630 relative to the substrate container 100 such that fluctuations in purge performance caused by the relative positions between the gas distributor 620, the deflector 630, and / or the substrate container 100 can be reduced. The movement can change the relative positions between the gas distributor 620, the deflector 630, and / or the substrate container 100. The relative positions can be optimized to generate the most effective flow pattern having the highest purge effectiveness in a particular substrate or particular purge process. The movement that changes the relative positions can change the flow pattern and reduce the purge effectiveness. By including the stabilization device 640 that reduces or limits the movement, a flow pattern that optimizes the purge effectiveness can be maintained without changing the relative positions.

[0057] In some embodiments, the stabilizer 640 can be part of an indexer 645 to maintain the relative angular position between the gas distributor 620 and the stabilizer 640, or between the deflector 630 and the stabilizer 640. The indexer 646 can be a spline joint having a first joint member 645A and a second joint member 645B. The first joint member 645A and the second joint member 645B can engage with each other at one or more relative angular positions and maintain the angular position. In some embodiments, movement near the deflector 630 (e.g., movement of the substrate container 100 between devices) or fluid flow (e.g., flowing streams of purge gas, cleaning solution, etc.) can push the deflector 630 and provide a force to rotate the deflector 630 relative to the gas distributor 620. The indexer 645 can maintain the relative angular position, for example, by friction between the indexer 645 and the gas distributor 620 that resists the force. In some embodiments, the first joint member 645A is disposed on the second end 640B of the stabilizer 640. The second joint member 645B is disposed on the substrate container 100.

[0058] In some embodiments, the first joint member 645A is a male member arranged to fit with a female member, the second joint member 645B. The first joint member 645A can include patterns and / or protrusions that extend outwardly to engage with patterns and / or recesses recessed within the second joint member 645B such that the first joint member 645A and the second joint member 645B can fit at one or more relative angular positions. In some embodiments, the first joint member 645A engages with the second joint member 645B by, for example, a spring, an interference fit, a friction fit, etc.

[0059] In some embodiments, the stabilization device 640 can optionally or alternatively engage with a stabilization device 145 (also shown in FIG. 1). As discussed in FIG. 1, the stabilization device 145 can stabilize the gas distributor 120 and / or the deflector 130. Compared to the embodiment of FIG. 1, the gas distributor 620 and the deflector 630 are shorter than the gas distributor 120 and / or the deflector 130. The stabilization device 640 can function as an extender or adapter that allows the gas distributor 620 and the deflector 630 to engage with and thereby be stabilized by the stabilization device 145 disposed within the substrate container 100 according to the illustration of FIG. 1. It is understood that by including the stabilization device 640, the gas distributor 620 and the deflector 630 can replace the gas distributor 120 and the deflector 130 in the embodiment of the substrate container 100 as illustrated in FIG. 1.

[0060] The stabilization device 145 can firmly include a first end 145A attached to a second end 145B by a stabilization device body 145C. The first end 145A can be a c-shaped clip that is at least partially wound around the stabilization device 640 and attached to the stabilization device 640 by firmly gripping the stabilization device 640. The second end 145B can engage with the substrate container 100 by any attachment means such as an adhesive, a fastener, welding, a clip, an interference fit, etc.

[0061] FIG. 11 shows an indexer 745 according to one or more exemplary embodiments of a purge gas amplification device. As shown in FIG. 11, the substrate container 100 includes a gas distributor 720 and a deflector 730. The indexer 745 is directly or indirectly connected to the gas distributor 720 and / or the deflector 730 to maintain a relative angular position between the gas distributor 720 and the deflector 730 or the deflection surface of the deflector 730. It is understood that the gas distributor 720 and the deflector 730 can each be any of the gas distributors and deflectors as described in FIGS. 1 - 14.

[0062] The indexer 745 extends through the substrate container 100 such that the indexer 745 can be adjusted from outside the substrate container 100. For example, to change the relative angular position from a first angle to a second angle, the relative angular position between the gas distributor 720 and the deflector 730 or the deflection surface of the deflector 730 can be changed by a force that rotates the indexer 745 from outside the substrate container 100. It is understood that the indexer 745 can extend through the upper surface 108 and / or the bottom surface 106 (shown in FIG. 1) of the substrate container 100 such that the indexer can be adjusted from the upper surface and / or the bottom surface (shown in FIG. 1) of the substrate container 100 by a user, a robotic arm, etc.

[0063] In some embodiments, the indexer 745 includes a first member 750 and a second member 770. The first member 750 can include a head 760 disposed outside the substrate container 100. In some embodiments, the head 760 can be connected to the first member 750 by, for example, one or more fasteners, welding, adhesives, interference fits, etc., or by being formed from the same piece of material. The first member 750 can engage the second member 770 and / or the substrate container 100, for example, by a spring on which a load is applied to press the first member 750 against the second member 770 and / or the substrate container 100.

[0064] For example, when a force is applied to the indexer 745 by rotating the first member 750, the indexer 745 can move from a first angle. The force can rotate the indexer 745 to a second angle. When the force is removed, the indexer 745 remains at the second angle. For example, when the force applied by a user or a robotic arm that rotates the indexer 745 is removed, the indexer maintains the relative angular position at the second angle. In some embodiments, the force can be applied to the first member 750 via the head 760.

[0065] In some embodiments, the force to rotate the indexer 745 can be applied by a user or a robotic arm. The second member 770 can be marked so that the user can repeatedly rotate the deflector 730 from the outside of the substrate container 100 by rotating the indexer 745. The first member 750 can engage with a robotic arm that rotates the indexer 745, for example, during substrate manufacturing, to change the relative angular position between the deflector 730 and the gas distributor 720. In some embodiments, the head 760 can be rotated by a robotic arm that controls (e.g., rotates or maintains) the angular position via a servo motor. In some embodiments, the second member 770 can be a marked claw 770 that can be connected to the substrate container 100 and can be independent of the rotational movement of the head 760. The marked claw 770 can be marked at an angular position, for example, from 0 degrees to 80 degrees from a reference point. Thereby, the head 760 can repeatedly rotate to a specific angular position by visual reference to the marked claw 770.

[0066] FIG. 12A shows a perspective view of a gas distributor 820 and a deflector 830 according to one or more exemplary embodiments of a purge gas amplification device. FIG. 12B shows another cross-sectional view of the gas distributor 820 and the deflector 830 according to the exemplary embodiment of FIG. 12A. FIG. 12C shows yet another cross-sectional view of the gas distributor and the deflector according to the exemplary embodiment of FIG. 12A. FIG. 12D shows yet another cross-sectional view of the gas distributor and the deflector according to the exemplary embodiment of FIG. 12A. The cross-sectional view shown in FIG. 12B can be a cross-sectional view taken along line 12B-12B in FIG. 12A. The cross-section shown in FIG. 12C can be a cross-section taken along line 12C-12C in FIG. 12A. The cross-sectional view shown in FIG. 12D can be a cross-sectional view taken along line 12D-12D in FIG. 12A. It is understood that the gas distributor 820 and the deflector 830 can each be any of the distributors and deflectors as shown in FIGS. 1-15. The gap 840 between the gas distributor 840 and the deflection surface of the gas deflector 830 varies along the longitudinal direction L. In the illustrated example, the width of the gap 84f0 expands from W1 to W2 and W3 along the longitudinal direction L.

[0067] FIG. 13 shows a cross-sectional view of the substrate container 100 according to one or more exemplary embodiments of the purge gas amplification device. The cross-sectional view shown in FIG. 13 can be a cross-sectional view along line 2-2 of FIG. 1 to illustrate an example of a position where the gas distributor 120 and the deflector 130 can be installed within the substrate container 100. It is understood that the gas distributor 120 and the deflector 130 can be disposed at any location within and outside the inner portion 101 of the substrate container 100 that can be occupied by the substrate. In some embodiments, the gas distributor 120 and the deflector 130 are arranged so as not to interfere with the insertion and / or removal of the substrate. For example, the gas distributor 120 and the deflector 130 are arranged at a distance greater than the diameter of the substrate designed to be disposed within the substrate container 100 such that the substrate can be inserted or removed without contacting the gas distributor 120 and the deflector 130 or without the need to remove the gas distributor 120 and the deflector 130. As shown in FIG. 13, one or more gas distributors 120 can be disposed within the substrate container 100. As a non-limiting example, the gas distributor 120 can be located at any of the exemplary positions H1 to H5 and H8 within the substrate container 100. As illustrated in FIG. 13, the position H1 is disposed at the rear end portion of the interior 140 of the substrate container 100. The position H3 is disposed within the shoulder portion 114 of the substrate container 100. The position H5 is disposed within the lip portion 115 of the substrate container 100. The position H8 is disposed across the lip portion 115 and above the front opening 110 of the substrate container 100. In some embodiments, the position H8 is disposed on the upper surface 108 (shown in FIG. 1) of the substrate container 100. It is understood that one or more gas distributors disposed at H1 to H5 can be disposed perpendicular to the substrate. In some embodiments, the gas distributor 120 and the deflector 130 of FIG. 1 can be said to be disposed perpendicular to the substrate container 100. In some embodiments, the gas distributor and / or deflector disposed at H8 can be disposed horizontally with respect to the vertically disposed gas distributors (e.g., the gas distributor 120 and the deflector 130 of FIG. 1).

[0068] FIG. 14 shows a cross-sectional view of a deflector 930 disposed within a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. The deflector 930 can be any one of the deflectors shown in FIGS. 1-16. In the illustrated example, the deflector 930 is disposed within the lip portion 115 of the substrate container 100. The deflector 930 can have an elongated body for directing the gas flow pattern of the purge gas from a gas distributor to an outlet of the substrate container 100 within the interior 140 of the substrate container 100 in order to improve purge effectiveness. The purge gas can be supplied to the interior 140 of the substrate container 100 from one or more gas distributors and / or purge gas inlets disposed at other locations within the interior 140 of the substrate container 100. For example, compared to the deflector 130 of FIG. 1, the deflector 930 is disposed within the substrate container 100 to deflect the gas flow pattern of the purge gas within the substrate container 100 without engaging the gas distributor, while the gas distributor can be disposed at other locations within the substrate container 100, such that the deflector 930 is an empty deflector. In some embodiments, the deflector 930 is not engaged with or disposed over the gas distributor. In some embodiments, the deflector 930 is not disposed over or is disposed over but not configured to supply purge gas to the purge gas outlet. In some embodiments, the deflector 930 can be disposed at or near H5 (shown in FIG. 13) in order to direct the gas flow pattern of the purge gas to improve purge effectiveness.

[0069] FIG. 15A is a table summarizing experimental results of a gas distributor and a deflector for improving purge effectiveness according to one or more exemplary embodiments of a purge gas amplification device. The experiments of FIG. 15A are conducted within a substrate container having a product name of A300, manufactured by ENTEGRIS™. Gas distributors with and without deflectors are disposed at positions H1, H2, H3, H5, and H3 and H5. As shown in the summary, a gas distributor having a deflector disposed at position H3, H5, or H3 and H5 functions consistently better or is improved than the same substrate container without a gas distributor having a deflector installed at that position at a given purge gas flow rate. In particular, when the gas distributor and the deflector are disposed at both the H3 position and the H5 position, the purge effectiveness is always improved with purge gases of different flow rates.

[0070] FIG. 15B is a table summarizing experimental results of a gas distributor and a deflector for improving purge effectiveness according to one or more exemplary embodiments of a purge gas amplification device. The experiments of FIG. 15B are conducted within a substrate container having a product name of SPECTRA™, manufactured by ENTEGRIS™. Gas distributors with and without deflectors are disposed at positions H1; H3; H5; H3 and H5; and H1, H3, and H5. As shown in the summary, a gas distributor having a deflector disposed at positions H3; H5; H3 and H5; and H1 (without gas distributor), H3, and H5 functions better or is improved than the same substrate container without a gas distributor having a deflector installed at that position at a given purge gas flow rate.

[0071] FIG. 16 shows a test method of a substrate container having one or more gas distributors and deflectors disposed therein according to one or more exemplary embodiments of a purge gas amplification device. FIGS. 17 - 18 show test results of a substrate container having one or more gas distributors and deflectors disposed therein according to one or more exemplary embodiments of a purge gas amplification device.

[0072] Purge effectiveness is indicated by the decrease in relative humidity within the substrate container compared to the control. The experiment is conducted by supplying a predetermined flow rate of purge gas to the substrate container. In the experimental results shown in FIGS. 17 - 18, the flow rate is 200 standard liters per minute (SLPM). The purge gas is purified and dried air (CDA gas). The relative humidity is expressed as a percentage.

[0073] As shown and described in any of FIGS. 1 - 16 above, 200 SLPM of purge gas is supplied into the substrate container in five distributions via an embodiment of a conventional diffuser and / or gas distributor and / or deflector.

[0074] The five distributions are: (1) 200 SLPM for the conventional diffuser and 0 SLPM for the embodiment of the gas distributor with or without a deflector; (2) 150 SLPM for the conventional diffuser and 50 SLPM for the embodiment of the gas distributor with or without a deflector; (3) 100 SLPM for the conventional diffuser and 100 SLPM for the embodiment of the gas distributor with or without a deflector; (4) 50 SLPM for the conventional diffuser and 150 SLPM for the embodiment of the gas distributor with or without a deflector; and (5) 0 SLPM for the conventional diffuser and 200 SLPM for the embodiment of the gas distributor with or without a deflector.

[0075] The purge effectiveness with all the purge gas supplied to the conventional diffuser (i.e., 200 SLPM for the diffuser and 0 SLPM for the embodiment of the gas distributor with or without a deflector) is used as a control for evaluating the purge effectiveness by adding embodiments of gas distributors and / or deflectors arranged at various positions within the substrate container. A faster and / or greater decrease in relative humidity demonstrates better or improved purge effectiveness. For example, the relative humanity associated with the gas distribution in 2001 has a greater decrease than that of the gas distribution in 2004, so the distribution 2001 is better than the distribution 2004.

[0076] As shown in FIG. 16, five distributions of purge gas are sequentially provided during the experiment such that the elapsed time on the y-axis indicates the flow rate distribution in FIGS. 17-18. For example, when 200 SLPM is provided to the diffuser and 0 SLPM is provided to the gas distributor embodiments with or without deflectors arranged at various positions within the substrate container (i.e., 200 / 0 shown in the chart), in 2001, the first decrease in relative humidity occurs.

[0077] Measure the relative humidity at the center, front, left, rear, and right inside the substrate container, and plot the relative humidity RH (%) on the x-axis and the elapsed time (seconds) on the y-axis. To show the purge effectiveness of the substrate container and to suggest that the gas flow pattern of the purge gas is more effective and improved compared to the control, the numerical average of the obtained relative humidity values is displayed below "Average". It is understood that the efficiency improvement of the gas flow pattern of the purge gas can also be shown by the local decrease in relative humidity. As shown in FIGS. 16-18, the local relative humanity can be indicated by "Center", "Front", "Left", "Rear", or "Right".

[0078] It is understood that the chart in FIG. 16 is a legend for illustrating the experimental results in FIGS. 17-18. The chart in FIG. 16 is not the experimental result of the embodiment described in this application.

[0079] FIG. 17 shows the experimental results of the gas distributor arranged at H3 (shown in FIG. 13) and the deflector arranged at an angle of 25° according to an embodiment. The solid line in FIG. 17 represents the relative humidity of the gas distributor arranged at H3 without a deflector. The dashed line in FIG. 17 represents the relative humidity of the gas distributor arranged at H3 with a deflector arranged at an angle of 25° respectively.

[0080] As shown in FIG. 17, for example, in 2105 (i.e., all at 200 SLPM for the gas distributor in H3), since the relative humidity decreased lower than 2101 (i.e., as a control, all at 200 SLPM for the dispenser), including the embodiment of the gas distributor in H3 improves the purge effectiveness. FIG. 17 further shows that having a deflector disposed on the gas distributor improves the purge effectiveness. For example, in 2103 and 2104, the dashed line drops below the solid line, indicating a greater decrease in relative humidity, and thus having a deflector results in a better or improved gas flow pattern and purge effectiveness. The improvement is more pronounced in front of the substrate container such that when more purge gas is distributed to the gas distributor in H3 and the gas distributor in H3 with a deflector, the relative humidity decreases more significantly.

[0081] FIG. 18 shows the experimental results of a gas distributor disposed in H5 (shown in FIG. 13) and a deflector disposed at an angle of 15° according to an embodiment. The solid line in FIG. 18 represents the relative humidity of the gas distributor disposed in H5 without a deflector. The dashed line in FIG. 18 represents the relative humidity of the gas distributor disposed in H5 having a deflector disposed at an angle of 15° respectively.

[0082] FIG. 14B shows a cross-sectional view of a deflector 930 disposed within a substrate container 100 according to one or more exemplary embodiments of a purge gas amplification device. Compared to the embodiment of FIG. 14A, a stabilization device 945 is included to stabilize the deflector 930. The stabilization device 945 can be a ridged member having a first end attached to the tip 918 of the shelf 118. The second end of 945 can be attached to the deflector 930 to stabilize the deflector 930. It is understood that the stabilization device 945 can be attached to the deflector 930 and / or the tip 918 of the shelf 118 by any attachment means such as an adhesive, a fastener, welding, a clip, an interference fit, etc. It is understood that the stabilization device 945 is optionally disposed to stabilize any deflector as disclosed herein and is not limited to stabilizing the deflector 930 which is an empty deflector.

[0083] FIG. 20 shows a cross-sectional view of an atomizer and a deflector according to one embodiment. The atomizer 1000 is, for example, an atomizer tower configured to allow the release of purge gas into a substrate container. The atomizer 1000 can be disposed within the substrate container at any suitable location including, by way of non-limiting example, any of H1 - H5 described above and shown in FIGS. 15A and 15B.

[0084] The deflector 1002 at least partially surrounds the spreader 1000. The deflector 1002 includes an opening 1004 defined by a deflector tip 1006. The opening 1004 is located on the opposite side of the back surface 1008 of the deflector 1002. The deflector tips 1006 are angled towards each other as shown in FIG. 20 and define an opening angle α. In one embodiment, the opening angle α can be an acute angle that enables the opening 1004 to operate as a nozzle and impart directional specificity to the flow provided by the spreader 1000 and the deflector 1002. The opening angle α can be any suitable angle selected based on the desired inflow and / or outflow velocity for the purge flow, the desired directional specificity, or any other such suitable characteristic of the flow provided by the spreader 1000 and the deflector 1002. The line that contacts the deflector 1002 at the deflector tip 1006 can form an angle θ with the line that contacts the rearmost point of the back surface 1008 of the deflector 1002. The angles θ can each be obtuse angles. The angle θ can define a nozzle, as described above for the acute opening angle α, and can be selected to provide suitable characteristics for the flow exiting the deflector 1002 through the opening 1004.

[0085] FIG. 21A shows an exploded perspective view of a deflector according to one embodiment. The deflector 1100 includes a first part 1102 and a second part 1104, which can be joined to each other as described below. The first part 1102 includes a first deflector surface 1106, a first deflector edge 1108, a spreader engagement mechanism 1110, and a container engagement mechanism 1112. The second part 1104 includes a second deflector surface 1114, a second deflector edge 1116, and a drain 1118. The second part 1104 further includes a first attachment mechanism 1120 and a second attachment mechanism 1122.

[0086] The first component 1102 and the second component 1104 are configured to be joined to each other by mechanical attachment, such as forming a snap fit between the first component 1102 and the second component 1104. In one embodiment, the snap fit includes a first attachment mechanism 1120, such as a cylindrical protrusion provided on the second component 1104 that engages a corresponding opening in the first component 1102, and a second attachment mechanism 1122, such as a tab including a snap fit protrusion that engages an attachment opening 1126 that can be seen in FIG. 21B and is discussed below. In one embodiment, the first component 1102 and the second component 1104 can be joined to each other after the attachment of the first component 1102 to the diffuser by the diffuser engagement mechanism 1110.

[0087] The diffuser engagement mechanism 1110 is one or more mechanisms that can be sized, shaped, and arranged such that the first component 1102 can be joined to a diffuser, such as any of the diffusers disclosed herein, by mechanical engagement of the diffuser by the diffuser engagement mechanism 1110. In one embodiment, the diffuser engagement mechanism 1110 is configured such that the first component 1102 can be slid on the diffuser with the diffuser inserted into a channel defined by the diffuser engagement mechanism 1110. The diffuser engagement mechanism 1110 can partially surround and contact the diffuser such that the first component 1102 is rotatably coupled to the diffuser.

[0088] When the first component 1102 and the second component 1104 are joined to each other, the first deflector surface 1106 and the second deflector surface 1114 meet to form a combined deflector surface configured to deflect and / or direct the gas leaving the diffuser. The first deflector edge 1108 and the second deflector edge 1116 define an opening of the deflector 1100. In one embodiment, the first deflector edge 1108 and the second deflector edge 1116 are configured to define the opening such that the opening has an acute opening angle α as described above and shown in FIG. 20.

[0089] The container engagement mechanism 1112 is a mechanism configured to form a mechanical connection to a substrate container in which the deflector 1100 is installed in order to maintain the position of the deflector 1100 and the spreader to which the deflector 1100 is attached. The connection formed by the container engagement mechanism 1112 is a connection that can be selectively disengaged, for example, a snap fit that can also be unsnapped without damaging the container or the container engagement mechanism 1112. The container engagement mechanism 1112 can be configured to engage any suitable corresponding mechanism provided on the container, such as one or more substrate supports contained within the container, a mechanism provided on or extending from the outer shell of the container.

[0090] A drain 1118 is provided on the second component 1104. The drain 1118 is configured to define an opening through the deflector 1100 such that fluid can flow downward within and through the drain 1118 when the spreader is rotated so that the spreader extends horizontally and the deflector 1100 is oriented such that the drain 1118 is at the bottom of the deflector 1100. The drain 1118 can be arranged, sized, and shaped to control the flow of gas from the spreader through the drain 1118, for example, to reduce or minimize such gas flow relative to the gas flow through the opening defined by the first and second deflector edges 1108, 1116. The arrangement, size, and shape of the drain 1118 can be selected such that the pressure drop across the drain 1118 relative to the opening defined by the first and second deflector edges 1108, 1116 is such that purge gas from the spreader is significantly more likely to exit the deflector 1100 through the opening.

[0091] Drain 1118 can be used to allow water to flow out of deflector 1100 after cleaning of the atomizer and deflector 1100. In such cleaning, the container engagement mechanism 1112 can be removed from the body of the container such as the outer shell or one or more substrate supports, the atomizer is rotated to a horizontal position, and water can flow down through drain 1118 into deflector 1100 and out of deflector 1100.

[0092] Outside of drain 1118, first part 1102 and second part 1104 meet and can be in proximity to or in contact with each other to reduce, minimize, or prevent gas provided by the atomizer from escaping from deflector 1100 through paths other than the opening defined by first and second deflector edges 1108, 1116.

[0093] FIG. 21B shows another exploded perspective view of the deflector of FIG. 21A. In the exploded perspective view of deflector 1100 in FIG. 21B, first part 1102 can be seen as including drain opening 1124 and mounting opening 1126. Drain opening 1124 is an opening in first part 1102 through which drain 1118 provided on second part 1104 can at least partially extend so as to provide a path through which fluid can exit deflector 1100 even when first part 1102 and second part 1104 are joined to each other.

[0094] In the embodiments shown in FIGS. 21A and 21B, drain 1118 is provided on second part 1104 and drain opening 1124 is provided on first part, but it is understood that at least some of drain 1118 can be alternatively provided on first part 1102 and the corresponding drain opening 1124 can be provided on second part 1104.

[0095] The attachment opening 1126 is configured to engage with a second attachment mechanism 1122 provided on the second component 1104 such that a snap fit can be formed to join the first component 1102 and the second component 1104. In one embodiment, at least some of the second attachment mechanism 1122 can instead be provided on the first component 1102, and the corresponding attachment openings 1126 are instead provided on the second component 1104.

[0096] FIG. 22 shows a flowchart of a method for installing a deflector within a substrate container. Method 1200 includes attaching a first component of the deflector to a dispenser 1202, attaching a second component of the deflector to the first component of the deflector 1204, and optionally, at 1206, engaging the deflector with a mechanism provided on the substrate container.

[0097] A first component of the deflector, such as the first component 1102 discussed above and shown in FIGS. 21A and 21B, is attached to the dispenser at 1202. The attachment of the first component of the deflector to the dispenser can include sliding the dispenser into one or more dispenser engagement mechanisms provided on the first component of the deflector, for example, inserting the dispenser into a channel defined by the engagement mechanism. The dispenser engagement mechanism can be, for example, the dispenser engagement mechanism 1110 discussed above and shown in FIGS. 21A and 21B.

[0098] The second component of the deflector, such as the second component 1104 discussed above and shown in FIGS. 21A and 21B, is attached to the first component of the deflector at 1204. The second component can be joined to the first component through one or more snap fits between corresponding attachment mechanisms provided on the first and second components of the deflector, such as any suitable mechanical connection or combination thereof, for example, as non-limiting examples, the first and second attachment mechanisms 1120, 1122 and attachment openings 1126 described above and shown in FIGS. 21A and 21B. When the second component of the deflector is attached to the first component of the deflector at 1204, the first and second deflectors can provide a deflector surface configured to deflect the flow from the diffuser, for example, according to the combination of the first deflector surface 1106 and the second deflector surface 1114 as described above and shown in FIGS. 21A and 21B.

[0099] Optionally, at 1206, the deflector can be attached to the substrate container mechanism. The deflector can include a container engagement mechanism, such as the container engagement mechanism 1112 described above and shown in FIGS. 21A and 21B. The container engagement mechanism can engage a connection, such as a snap fit, formed between a corresponding mechanism provided on the substrate container at 1206 and, for example, the container engagement mechanism and the corresponding mechanism of the substrate container. The corresponding mechanism can be any suitable mechanism provided on the container. In one embodiment, the corresponding mechanism of the substrate container can be an existing mechanism of the container, such as one or more of a substrate support, a substrate tray, or other such structures. In one embodiment, the corresponding mechanism of the substrate container is a protrusion or other dedicated structure for connecting to the container engagement mechanism. In one embodiment, the container engagement mechanism can be arranged to engage the container by rotation of the diffuser from an installation position where one or both of 1202 and / or 1204 are performed to an operating position where the container engagement mechanism and the corresponding mechanism of the substrate container are joined to each other.

[0100] Optionally, in one embodiment, the dispenser assembled and installed according to method 1200 can be rotated from the operating position to the cleaning position to enable cleaning and drying of the dispenser and the deflector by allowing a cleaning fluid, such as or including water, to escape from the deflector through a drain provided on the deflector, such as drain 1118 shown in FIGS. 21A and 21B, described above.

[0101] Aspect: Aspect 1. A system comprising a deflector disposed inside a substrate container and having a longitudinal opening and a deflection surface, and a gas dispenser configured to provide a purge gas for purging the interior of the substrate container wherein the gas dispenser is configured such that at least a portion of the purge gas flows into a gap formed between the gas dispenser and the deflector, the deflector is configured such that at least a portion of the purge gas in the gap flows through the longitudinal opening, and the deflector has an opening angle, and the opening angle is an acute angle, the system. Aspect 2. The system according to Aspect 1, wherein the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other. Aspect 3. The system according to Aspect 2, wherein the first component is configured to engage with the gas dispenser. Aspect 4. The system according to Aspect 2, wherein the first component is configured to engage with a mechanism provided on the substrate container. Aspect 5. A system comprising a substrate container having an interior configured to store a substrate, and a deflector disposed inside the substrate container and having a longitudinal opening, and a gas dispenser configured to provide a purge gas for purging the interior of the substrate container wherein The gas distributor is configured such that at least a portion of the purge gas flows into the interior of the substrate container through the longitudinal opening, The deflector is configured such that the longitudinal opening directs the purge gas, and The deflector has an opening angle, and the opening angle is an acute angle, system. Aspect 6. The system according to aspect 5, wherein the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other. Aspect 7. The system according to aspect 6, wherein the first component is configured to engage with the gas distributor. Aspect 8. The system according to any one of aspects 6 to 7, wherein the first component is configured to engage with a mechanism provided on the substrate container. Aspect 9. The system according to any one of aspects 5 to 8, further comprising an indexer configured to maintain a relative angular position between the gas distributor and the deflector or the deflection surface. Aspect 10. The system according to any one of aspects 5 to 9, further comprising one or more ribs extending from the deflection surface and configured to engage with the gas distributor to maintain a relative angular position. Aspect 11. The indexer includes a spline joint having a first joint member and a second joint member, The first joint member is disposed on the deflector, and The second joint member is disposed on the substrate container. The system according to any one of aspects 5 to 10. Aspect 12. A stabilization device having a first end and a second end, The first end of the stabilization device engages with the deflector, and The second end of the stabilization device engages with the substrate container to stabilize the deflector and the gas distributor. The system according to any one of aspects 5 to 11, further comprising a stabilization device. Aspect 13. The stabilization device is disposed together with the indexer, and further, The indexer is disposed to maintain a relative angular position between the gas distributor and the deflector or the deflection surface, The indexer includes a spline joint having a first joint member and a second joint member, The first joint member is disposed on the second end of the stabilization device, and The second joint member is disposed on the substrate container, the system according to any one of aspects 5 to 12. Aspect 14. A force for rotating the indexer from outside the substrate container changes the relative angular position from a first angle to a second angle, and The indexer extends through the substrate container such that when the force is removed, the indexer maintains the relative angular position at the second angle, the system according to any one of aspects 9 to 13. Aspect 15. Directing a purge gas from a gas distributor disposed within the substrate container to a longitudinal opening within the deflector, Directing at least a portion of the purge gas, and Deflecting the purge gas within the substrate container to direct the gas flow pattern of the purge gas, the gas flow pattern extending from the gas distributor to the outlet of the substrate container to improve purge effectiveness, deflecting including, method. Aspect 16. Directing a purge gas from the gas distributor to the longitudinal opening is including directing at least a portion of the purge gas from the gas distributor to a gap formed between the deflector and the gas distributor, the method according to aspect 15. Aspect 17. A system, A substrate container having an interior configured to store a substrate, A deflector disposed within the interior of the substrate container and having a longitudinal opening and a deflecting surface, and One or more gas distributors configured to provide a purge gas for purging the interior of the substrate container, The deflector is disposed on one of the one or more gas distributors, The longitudinal opening is disposed to direct the purge gas, The deflector is arranged to direct the gas flow pattern of the purge gas from the gas distributor to the outlet of the substrate container in order to improve the purge effectiveness of the substrate container, and The substrate container is a system including a center line, a shoulder portion and a lip portion. Aspect 18. The system according to aspect 17, wherein one or more gas distributors are arranged at the shoulder portion of the substrate container. Aspect 19. The system according to at least one of aspect 17 or aspect 18, wherein one or more gas distributors are arranged at the lip portion of the substrate container. Aspect 20. The first gas distributor and the second gas distributor of one or more gas distributors are arranged at the shoulder portion of the substrate container, and The third gas distributor and the fourth gas distributor of one or more gas distributors are arranged within the lip portion of the substrate container. The system according to any one of aspects 17 to 19. Aspect 21. The first gas distributor is on the opposite side of the second gas distributor with respect to the center line, and The third gas distributor is on the opposite side of the fourth gas distributor with respect to the center line. The system according to any one of aspects 17 to 20. Aspect 22. The angle between the center line and the flow direction of the purge from the longitudinal opening is 0° to 80°. The system according to any one of aspects 17 to 21. Aspect 23. The angle is 15° to 25°. The system according to any one of aspects 17 to 22. Aspect 24. At least one other of one or more gas distributors is arranged across the lip portion. The system according to any one of aspects 17 to 23. Aspect 25. Further comprising an empty deflector arranged at the lip portion of the substrate container, and The empty deflector includes an elongated body for directing the gas flow pattern of the purge gas from the gas distributor to the outlet of the substrate container to improve the purge effectiveness. The system according to any one of aspects 17 to 24. Aspect 26. The system according to any one of Aspects 1, 3 to 14, and 17 to 25, wherein the longitudinal opening is arranged to direct the purge gas towards the central portion inside the substrate container. Aspect 27. The system according to any one of Aspects 1, 3 to 14, and 17 to 25, wherein the longitudinal opening is arranged to direct the purge gas away from the central portion inside the substrate container. Aspect 28. The system according to any one of Aspects 1, 3 to 14, and 17 to 25, wherein the longitudinal opening is arranged to direct the purge gas towards the back of the substrate container. Aspect 29. The method according to Aspect 15 or 16, wherein directing at least a part of the purge gas includes directing a part of the purge gas towards the central portion inside the substrate container. Aspect 30. The method according to Aspect 15 or 16, wherein directing at least a part of the purge gas includes directing the purge gas to direct a part of the purge gas away from the central portion inside the substrate container. Aspect 31. The method according to Aspect 15 or 16, wherein directing at least a part of the purge gas includes directing the purge gas to direct a part of the purge gas towards the back of the substrate container.

Claims

1. A system comprising: a deflector disposed inside a substrate container and having a longitudinal opening and a deflection surface; and a gas distributor configured to provide a purge gas for purging the inside of the substrate container. The gas distributor is configured such that at least a part of the purge gas flows into a gap formed between the gas distributor and the deflector. The deflector is configured such that at least a part of the purge gas in the gap flows through the longitudinal opening of the deflector. The deflector has an acute opening angle.

2. The system according to claim 1, wherein the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other.

3. The system according to claim 2, wherein the first component is configured to engage with the gas distributor.

4. The system according to claim 2, wherein the first component is configured to engage with a mechanism provided on the substrate container.

5. The gas distributor is an elongated member. The deflection surface is radially spaced from the gas distributor.

6. The system according to claim 1, wherein the gap between the gas distributor and the deflection surface is 0.5 to 3 millimeters.

7. A system comprising: a substrate container having an interior configured to store a substrate; a deflector disposed inside the substrate container and having a longitudinal opening and a deflection surface; and a gas distributor disposed to provide a purge gas for purging the inside of the substrate container. The gas distributor is configured such that at least a part of the purge gas flows into the interior of the substrate container through the longitudinal opening. The deflector is configured such that the longitudinal opening is disposed to direct the purge gas. The deflector has an acute opening angle.

8. The system according to claim 7, wherein the deflector includes a first component and a second component, and the first component and the second component are configured to be joined to each other.

9. The system according to claim 8, wherein the first component is configured to engage with the gas distributor.

10. The system according to claim 8, wherein the first component is configured to engage with a mechanism provided on the substrate container.

10. The system according to claim 8, wherein the first component is configured to engage with a mechanism provided on the substrate container.

11. The system according to claim 7, further comprising an indexer arranged to maintain a relative angular position between the gas distributor and the deflector or the deflecting surface.

12. The system according to claim 11, further comprising one or more ribs extending from the deflecting surface and arranged to engage with the gas distributor to maintain the relative angular position.

13. The indexer includes a spline joint having a first joint member and a second joint member, the first joint member is disposed on the deflector, the second joint member is disposed on the substrate container. The system according to claim 11.

14. The system further comprises a stabilizing device having a first end and a second end, the first end of the stabilizing device engages with the deflector, the second end of the stabilizing device engages with the substrate container to stabilize the deflector and the gas distributor. The system according to claim 7.

15. The stabilizing device is arranged together with the indexer, and further, the indexer is arranged to maintain a relative angular position between the gas distributor and the deflector or the deflecting surface, the indexer includes a spline joint having a first joint member and a second joint member, the first joint member is disposed on the second end of the stabilizing device, the second joint member is disposed on the substrate container. The system according to claim 14.

16. A force for rotating the indexer from outside the substrate container changes the relative angular position from a first angle to a second angle, the indexer extends through the substrate container such that when the force is removed, the indexer maintains the relative angular position at the second angle. The system according to claim 11.

17. The system according to claim 7, wherein the longitudinal opening is arranged to direct the purge gas towards a central portion inside the substrate container.

18. The system according to claim 7, wherein the longitudinal opening is arranged to direct the purge gas away from a central portion inside the substrate container.

19. The system according to claim 7, wherein the longitudinal opening is arranged to direct the purge gas towards the back of the substrate container.

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