Susceptor Support Assembly for Chemical Vapor Deposition Chamber

Abstract

An apparatus for rotating a substrate within a deposition chamber is described. The substrate is rotated using a substrate support assembly having a shaft and a susceptor coupled to the upper portion of the shaft. The susceptor and the shaft are coupled together using a toothed feature. The toothed feature includes a plurality of teeth or protrusions on a coupling portion of the shaft that interlock with recesses disposed on the bottom of the susceptor. A lift pin assembly is further coupled to the shaft and configured to raise and lower the substrate from the susceptor.

Description

Technical Field

[0001] Embodiments of the present disclosure generally relate to substrate support devices for use within a processing chamber. More specifically, embodiments of the present disclosure relate to a substrate support shaft and corresponding susceptor for use within a deposition chamber for semiconductor processing.

Background Art

[0002] Semiconductor substrates are processed for a variety of applications including the manufacture of integrated devices and microdevices. One way to process a substrate involves depositing a material such as a semiconductor material or a conductive material on the upper surface of the substrate. For example, epitaxial deposition is one deposition process that deposits films of various materials on the surface of a substrate within a processing chamber. In an epitaxial deposition process, high-quality films having a crystalline structure can be produced on a substrate. The epitaxial deposition process is carried out under various process conditions such as temperature, pressure, and precursor flow rate within the processing chamber. The quality and consistency of the epitaxial layer depend on accurate temperature and flow control within the chamber.

[0003] During deposition of a film on a substrate, the substrate generally rotates about the axis of symmetry of the substrate. The speed and uniformity of rotation further affect the deposition of the film on the substrate surface. Various components within the substrate support assembly introduce tilt and wobble into the motion of the susceptor. The wobble and tilt of the susceptor reduce the deposition uniformity of the substrate and increase the difficulty of performing processes and maintenance on the susceptor.

[0004] Therefore, there is a need for an improved device that reduces wobble and tilt of the susceptor during substrate processing.

Summary of the Invention

[0005] This disclosure generally relates to a substrate support assembly configured for use in semiconductor processing. In one embodiment, the substrate support assembly includes a susceptor, a shaft, and a shaft coupling. The susceptor includes a substrate support surface, a coupling surface, and a toothed recess within the coupling surface. The shaft includes a first distal end and a second distal end opposite the first distal end. The shaft coupling is coupled to the first distal end of the shaft and disposed within the toothed recess.

[0006] In another embodiment, the susceptor is described. The susceptor is configured for use in semiconductor processing. The susceptor includes a substrate support surface, a coupling surface opposite the substrate support surface, and a toothed recess disposed within the coupling surface. The toothed recess further includes a central opening and a plurality of wings extending outward from the central opening across the coupling surface.

[0007] In another embodiment, the shaft is described. The shaft is configured for use in semiconductor processing. The shaft includes a first distal end, a second distal end opposite the first distal end, and a shaft coupling coupled to the first distal end of the shaft. The shaft coupling includes a coupling contact surface and a plurality of protrusions extending outward from a central portion of the coupling contact surface such that the coupling contact surface is toothed.

[0008] To gain a more detailed understanding of the above-described features of the present disclosure, a more detailed description of the present disclosure, briefly summarized above, can be obtained by reference to the embodiments illustrated in the accompanying drawings. However, it should be noted that the accompanying drawings illustrate only exemplary embodiments and other embodiments having equivalent effects may also be recognized, and thus the scope of the present disclosure should not be considered to be limited thereby.

Brief Description of the Drawings

[0009]

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DETAILED DESCRIPTION OF THE INVENTION

[0010] For ease of understanding, the same reference numerals are used, where possible, to identify the same elements common to the figures. It is contemplated that the elements and features of one embodiment may be advantageously incorporated into other embodiments without further elaboration.

[0011] The present disclosure relates to a substrate support assembly including a susceptor and a shaft. The susceptor and the shaft are coupled together using a toothed configuration. The use of the toothed configuration within the described susceptor and shaft configurations reduces wobbling of the susceptor during substrate processing, e.g., during epitaxial deposition processing, and during rotation of the substrate support assembly. Wobbling of the susceptor and the substrate disposed thereon during processing can cause asymmetric and / or non-uniform film thickness growth.

[0012] The toothed configuration described herein provides a simple and reliable connection between the rotating shaft and the susceptor / susceptor support mechanism, thereby reducing wobbling. Each of the susceptor, the shaft, and the lift pins that are to be disposed through the shaft is one of or a combination of graphite, quartz, a thermoplastic, or a metal. The susceptor is a material formed of a material having a high thermal conductivity, such as graphite. The shaft is formed of an optically transparent material so as to enable uniform heating of the substrate. The use of a single shaft and the light transmissibility of the components of the substrate support assembly further reduce shadowing caused by the shaft and / or the lift pins. The toothed interface between the shaft and the susceptor can be further described as a spline interface or a gear interface. The use of the toothed interface further enables the distribution of stress along a plurality of surfaces within the interface between the shaft and the susceptor. The reduced stress reduces the possibility of deformation, chipping, or flaking at the interface. The shape of the toothed interface reduces the stress at a single point. For example, the use of a curved contact surface on each extension / projection of the toothed interface helps to distribute the load along a curved surface instead of a single point or a group of points.

[0013] The interface at the bottom of the shaft with respect to the rotating assembly further enables the reduction of warping and damage to the shaft by using a plurality of pins disposed between the shaft and the rotating assembly. The plurality of pins are disposed in the grooves of the shaft and held in place between the shaft and the rotating assembly joint. The shape, configuration, and material of the pins further reduce the stress on the shaft and enable the rotation of the shaft and subsequently the susceptor.

[0014] FIG. 1 is a schematic view of a type of deposition chamber 100. The deposition chamber 100 is utilized to grow an epitaxial film on a substrate such as the substrate 102. The deposition chamber 100 generates a direct and alternating current of a precursor across the upper surface 150 of the substrate 102.

[0015] The deposition chamber 100 includes an upper body 156, a lower body 148 disposed below the upper body 156, and a flow module 112 disposed between the upper body 156 and the lower body 148. The upper body 156, the flow module 112, and the lower body 148 form the chamber body. A substrate support assembly 105, an upper dome 108, a lower dome 110, a plurality of upper lamps 141, and a plurality of lower lamps 143 are disposed within the chamber body. As shown, a controller 120 is in communication with the deposition chamber 100 and is used to control processes as described herein. The substrate support assembly 105 includes a susceptor 106 and a shaft 118 coupled to the substrate support 106. The susceptor 106 is disposed between the upper dome 108 and the lower dome 110. The plurality of upper lamps 141 are disposed between the upper dome 108 and the lid 154. The lid 154 includes a plurality of sensors 153 disposed for measuring the temperature within the deposition chamber 100. The plurality of lower lamps 143 are disposed between the lower dome 110 and the floor 152. The plurality of lower lamps 143 form a lower lamp assembly 145.

[0016] The processing volume 136 is formed between the upper dome 108 and the lower dome 110. A susceptor 106 is disposed in the processing volume 136. The susceptor 106 includes an upper surface on which the substrate 102 is disposed. The shaft is connected to the motion assembly 121. The motion assembly 121 includes one or more actuators and / or adjustment devices for moving and / or adjusting the substrate support assembly 105. The motion is first imparted to the shaft 118, and the shaft 118 transmits this motion to the susceptor 106 within the processing volume 136. The motion assembly 121 includes a rotation actuator 122 for rotating the shaft 118 and the susceptor 106 about the vertical axis A of the deposition chamber 100. The motion assembly 121 further includes a vertical actuator 124 for raising and lowering the substrate support assembly 105 in the z-direction. The motion assembly 121 includes an inclination adjustment device 126 used to adjust the orientation of the plane of the susceptor 106, and a lateral adjustment device 128 used to adjust the position of the shaft 118 and the susceptor 106 left and right within the processing volume 136.

[0017] The susceptor 106 may include lift pin holes 107 disposed therein. The lift pin holes 107 are sized to accommodate lift pins 132 for lifting the substrate 102 from the susceptor 106 either before or after the deposition process is carried out. The lift pins 132 may be placed on lift pin stoppers 134 when the susceptor 106 is lowered from the processing position to the transfer position.

[0018] The flow module 112 includes a plurality of process gas inlets 114, a plurality of purge gas inlets 164, and one or more exhaust gas outlets 116. The plurality of process gas inlets 114 and the plurality of purge gas inlets 164 are disposed on the opposite side of the flow module 112 from the one or more exhaust gas outlets 116. One or more flow guides 146 are disposed below the plurality of process gas inlets 114 and the one or more exhaust gas outlets 116. The flow guide 146 is disposed above the purge gas inlet 164. The liner 163 is disposed on the inner surface of the flow module 112 to protect the flow module 112 from reactive gases used during the deposition process. The process gas inlet 114 and the purge gas inlet 164 are positioned to flow gas parallel to the upper surface 150 of the substrate 102 disposed within the processing volume 136. The process gas inlet 114 is in fluid communication with a process gas source 151. The purge gas inlet 164 is in fluid communication with a purge gas source 162. The one or more exhaust gas outlets 116 are in fluid communication with an exhaust pump 157. Each of the process gas source 151 and the purge gas source 162 may be configured to supply one or more precursors or process gases into the processing volume 136.

[0019] Each of FIGS. 2, 3A and 3B, 4, 5A-5D, and 6A and 6B shows either an overall view or a partial view of the substrate support assembly 105. The substrate support assembly 105 includes a susceptor 106 coupled to the upper distal end of a shaft 118. The coupling between the susceptor 106 and the shaft 118 is implemented at a shaft coupling portion. The shaft coupling portion is a toothed feature that extends into a corresponding toothed recess within the susceptor 106. The toothed feature includes a plurality of engaging portions extending from a central member and is configured to distribute the torque load applied to the shaft and the susceptor by rotation of the susceptor and the substrate disposed on the susceptor. The toothed feature includes a plurality of teeth or protrusions intended to interact with a gap, fin, or opening within the toothed recess. By using a single shaft and toothed feature to couple the susceptor 106 and the shaft 118, it is possible to reduce the amount of wobbling of the rotating susceptor 106. The use of a plurality of arms and corresponding fingers for holding the susceptor 106 is reduced or eliminated by the toothed feature. The toothed feature and the shaft may further be formed of a quartz material to reduce shadowing.

[0020] FIG. 2 is a schematic isometric view of the substrate support assembly 105. The substrate support assembly includes a susceptor 106 and a shaft 118. The susceptor 106 and the shaft 118 are coupled together at a toothed interface. The toothed interface includes a susceptor coupling portion 212 within the coupling surface 204 of the susceptor 106 and a shaft coupling portion 202 coupled to the first distal end 206 of the shaft 118. The second distal end 316 (FIG. 3A) is coupled to a shaft motion coupling portion 208 of the shaft motion assembly 210.

[0021] The susceptor coupling portion 212 and the shaft coupling portion 202 are fitted together, whereby the shaft coupling portion 202 is inserted into the toothed recess 402 (FIG. 4) of the susceptor coupling portion 212. The toothed recess 402 and the shaft coupling portion 202 are fitted together, whereby the toothed recess 402 has a shape similar to (e.g., corresponding to) the shape of the shaft coupling portion 202. In some embodiments, the toothed recess 402 has an inverted shape with respect to the shaft coupling portion 202, whereby a recess having the same shape and dimensions as the shaft coupling portion 202 is formed. Accordingly, the susceptor coupling portion 212 can be regarded as the female part of the coupling portion, and the shaft coupling portion 202 is regarded as the male part of the coupling portion.

[0022] The joint surface 204 is the bottom surface of the susceptor 106, whereby the joint surface 204 is disposed on the opposite side of the substrate receiving surface or the substrate support surface. The substrate support surface is the upper surface of the susceptor 106 on which the substrate 102 is disposed. The susceptor coupling portion 212 is a part of the joint surface 204, whereby the susceptor coupling portion 212 extends from the center of the joint surface 204 away from the upper surface and the joint surface 204 of the susceptor 106.

[0023] The second distal end 316 of the shaft 118 is coupled to the shaft motion coupling portion 208. The second distal end 316 is disposed at the opposite end of the shaft 118 from the first distal end 206. The shaft motion coupling portion 208 is the upper part of the shaft motion assembly 210. The shaft motion assembly 210 is a part of the rotation assembly and can be a part of the motion assembly 121 such as the rotation actuator 122 in FIG. 1. The shaft motion assembly 210 includes one or more motors or actuators and is configured to enable the rotation of the shaft motion coupling portion 208, and subsequently the shaft 118 and the susceptor 106.

[0024] Figure 3A is a schematic cross-sectional view of the shaft 118. The shaft 118 includes a shaft body 318 having a first distal end 206 and a second distal end 316. The first distal end 206 is coupled to the shaft coupling portion 202. The second distal end 316 is configured to be inserted into the shaft movement coupling portion 208. The shaft coupling portion 202 includes a body having a coupling contact surface 312, a shaft insertion surface 314 disposed on the opposite side of the coupling contact surface 312, and an outer surface 310 disposed between the coupling contact surface 312 and the shaft insertion surface 314. The coupling contact surface 312 further includes a plurality of features 302 disposed to be coupled to a plurality of features 406 (FIG. 4) disposed on the susceptor coupling portion 212.

[0025] The shaft body 318 is a cylindrical body. The shaft body 318 is formed of an optically transparent material such as quartz. The use of an optically transparent material as the shaft body 318 reduces the shadowing effect of the shaft body 318 on the susceptor 106. The second distal end 316 of the shaft body 318 has a smaller diameter than the first distal end 206, whereby the outer surface 320 of the shaft body 318 has a diameter at the first distal end 206 of the shaft body 318 that is larger than the diameter at the second distal end 316 of the shaft body 318.

[0026] The upper surface 306 of the shaft 118 is configured to be disposed within the shaft receiving opening 308 of the shaft coupling portion 202. The shaft receiving opening 308 is configured such that the first distal end 320 of the shaft is disposed therein, whereby the upper surface 306 of the shaft 118 supports the weight of the shaft coupling portion 202 and any susceptor 106 or substrate 102 disposed thereon. The shaft receiving opening 308 is disposed through the shaft insertion surface 314, and the shaft 118 is inserted into the shaft receiving opening 308. The shaft receiving opening 308 and the upper surface 306 of the shaft 118 may both be welded, joined, brazed, or soldered. In some embodiments, the shaft receiving opening 308 and the upper surface 306 are removed such that the shaft 118 is formed of a single integrally formed material.

[0027] The coupling contact surface 312 is disposed on the opposite side of the shaft coupling portion 202 from the shaft 118. Since the coupling contact surface 312 is configured to be inserted into the toothed recess 402, it functions as a fitting feature. The susceptor 106 is placed on the coupling contact surface 312 and configured to facilitate fitting and / or engagement therebetween. The coupling contact surface 312 includes a plurality of features 302 and a central alignment opening 304. The plurality of features 302 are a plurality of recesses extending into the coupling contact surface 312. The plurality of features 302 are configured to receive a plurality of features 406 (FIG. 4) extending from the corresponding toothed recess 402. The plurality of features 406 of the toothed recess 402 are a first plurality of features, and the plurality of features 302 of the coupling contact surface 312 are a second plurality of features. The first plurality of features extend into (e.g., engage with and / or align with) the first plurality of features.

[0028] The plurality of features 302 assist in aligning the coupling contact surface 312 with the toothed recess 402 and reduce variations and movement of the toothed recess 402 relative to the coupling contact surface 312. The central alignment opening 304 is configured to receive a protrusion from the center of the toothed recess 402. The central alignment opening 304 is configured to align the shaft coupling portion 202 and the toothed recess 402 about their centers.

[0029] Figure 3B is a schematic plan view of the shaft coupling portion 202. As shown, the shaft coupling portion 202 includes a plurality of convex portions 322 that extend outward from the center of the shaft coupling portion 202 and the coupling contact surface 312. The plurality of convex portions 322 are teeth or protrusions that extend outward and are configured to interlock with a corresponding portion of the toothed recess 402. Each of the plurality of convex portions 322 includes a curved outer surface 324. The curved outer surface 324 forms the side surface of each of the convex portions 322, whereby the curved outer surface 324 is configured to be compressed when the shaft 118 rotates to cause the rotation of the susceptor 106. In some embodiments, the curved outer surface 324 of each of the convex portions 322 forms a semi-circle. The outermost surface of each of the plurality of convex portions 322 is the outer surface 310 of the shaft coupling portion 202.

[0030] One of the plurality of features 302 is disposed on each of the convex portions 322, whereby each of the convex portions 322 includes the feature 302 disposed along this center line. In some embodiments, there are fewer features 302, whereby the number of features 302 per convex portion 322 is less than one, and the ratio of features 302 to convex portions 322 is from about 1:3 to about 1:1, for example, from about 1:2.5 to about 1:1.5, for example, about 1:2.

[0031] By utilizing the plurality of convex portions 322, the stress applied to any one part of the shaft coupling portion 202 during rotation is reduced. However, the number of convex portions 322 can be limited because as the number of convex portions 322 increases, the structural integrity of each of the convex portions 322 is reduced and the manufacture of the shaft coupling portion 202 becomes more difficult. In some embodiments, there are 3 or more convex portions 322, such as 5 to 12 convex portions 322, such as 6 to 10 convex portions 322, such as 7 to 9 convex portions, such as 8 convex portions.

[0032] FIG. 4 is a schematic bottom view of susceptor 106. The toothed recess 402 is disposed within susceptor coupling portion 212. The toothed recess 402 includes a central opening 405 and a plurality of vanes 410 extending outward from the central opening 405 across the susceptor coupling portion 212. The plurality of vanes 410 are extensions of the central opening 405 and are shaped to substantially match the shape of shaft coupling portion 202 and the plurality of protrusions 322. The toothed recess further includes a central alignment protrusion 404. The central alignment protrusion 404 is configured to fit within the central alignment opening 304 of shaft coupling portion 202. Each of the plurality of vanes 410 of toothed recess 402 includes a sidewall 408. The sidewall 408 of each vane 410 of toothed recess 402 has a curved portion, whereby at least a portion of each vane 410 has a curved sidewall 408.

[0033] Each of sidewalls 408 is configured to be compressed when shaft 118 rotates to cause rotation of susceptor 106. In some embodiments, each sidewall 408 of vane 410 forms a semi-circle. Each of sidewalls 408 is curved to distribute the compressive force provided by protrusion 322 of shaft coupling portion 202 over a wider surface, reducing deformation and potential damage to susceptor 106.

[0034] One feature 406 of the plurality of features 406 is disposed on each of vanes 410 such that each of vanes 410 includes a feature 406 disposed along this centerline. In some embodiments, there are fewer features 406 such that the ratio of features 306 to vanes 410 is from about 1:3 to about 1:1, such as from about 1:2.5 to about 1:1.5, such as about 1:2, by having less than one feature 406 per vane 410. Each of the features 406 of toothed recess 402 is a pin extending from the bottom surface of toothed recess 402 to one of the features 302 of shaft coupling portion 202.

[0035] In some alternative embodiments, feature 302 is a pin, while feature 406 is a recess configured to receive the pin forming feature 302 of shaft coupling 202.

[0036] By utilizing a plurality of vanes 410, the stress applied to any one portion of the toothed recess 402 during rotation is reduced. However, the number of vanes 410 may be limited because as the number of vanes 410 increases, the structural integrity of each of the vanes 410 decreases, making the manufacture of the toothed recess 402 more difficult. In some embodiments, there are 3 or more vanes 410, such as 5 - 12 vanes 410, such as 6 - 10 vanes 410, such as 7 - 9 vanes 410, such as 8 vanes 410.

[0037] The susceptor 106 is formed of a high - thermal - conductivity material to enable a uniform thermal distribution to the susceptor 106. Thus, the susceptor 106 may be a graphite or silicon carbide material. In some embodiments, the susceptor 106 is a quartz material that optically renders the susceptor 106 transparent to the light emitted by the lamp within the deposition chamber 100.

[0038] Figures 5A - 5D are schematic views of a portion of the shaft kinematic coupling 208. Figure 5A is a schematic isometric view of the shaft kinematic coupling 208 in which the shaft 118 is disposed. The shaft kinematic coupling 208 includes a flange 502 into which the second distal end 316 of the shaft 118 is inserted. The flange 502 has a lower shaft 504 that may be disposed within the shaft kinematic assembly 502. A plurality of pin rollers 508 are disposed between the groove 506 within the second distal end 316 of the shaft 118 and the flange 502. The plurality of pin rollers 508 helps to hold the shaft 118 in place relative to the flange 502.

[0039] Figure 5B is a schematic side view of the shaft kinematic coupling 208 in which the shaft 118 is disposed. As shown in Figure 5B, each of the grooves 506 is disposed within the second distal end 316 of the shaft 118, whereby the grooves 506 extend inwardly into the shaft 118.

[0040] FIG. 5C is a schematic cross-sectional view of a shaft motion coupling portion 208 in which a shaft 118 is disposed. The pin roller 508 has a cylindrical side wall and extends to a radially projecting portion 514 of a central opening 512 of the flange 502. The central opening 512 of the flange 502 is an opening configured to receive the second distal end 316 of the shaft 118 within the flange 502. The inner surface of the central opening 512 can be aligned with the interior of one of the grooves 506.

[0041] FIG. 5D is a schematic plan view of the shaft motion coupling portion 208. As shown in FIG. 5D, each of the radially projecting portions 514 is an extension of the central opening 512 and extends outwardly. The central opening 512 includes a side wall 510. The side wall 510 is circular, where the radially projecting portions 514 that form projections from the circle form the side wall 510. The pin rollers 508 are disposed within each of the radially projecting portions 514, whereby each of the pin rollers 508 is disposed between the side wall 510 and the shaft 118. The shapes of the radially projecting portions 514 and the grooves 506 are configured to hold the pin rollers 508 in place, and the pin rollers 508 are configured to couple the movement of the flange 502 to the shaft 118.

[0042] In some embodiments, there are two or more pin rollers 508 and two or more radially projecting portions 514, for example, three or more pin rollers 508 and three or more radially projecting portions 514. The use of multiple pin rollers 508 and radially projecting portions 514 helps to distribute the load on any one surface of the shaft 118 and prevent breakage or chipping of the shaft 118.

[0043] Each of the pin rollers 508 is formed of a thermoplastic material, metal, graphite, or silicon carbide material. The pin rollers 508 are configured to withstand the stress that provides rotation to the shaft 118 without causing breakage or excessive deformation. The flange 502 is formed of a metal or metal alloy, such as one or more of nickel, chromium, molybdenum, and niobium. The flange 502 is configured such that deformation during the application of a large force to the pin rollers 508 and the shaft 118 is reduced.

[0044] Figures 6A and 6B are schematic isometric views of substrate support assemblies 600a, 600b. The substrate support assemblies 600a, 600b of Figures 6A and 6B further illustrate various lift pin devices, and using this device, by raising and lowering the substrate from the susceptor 106, a plurality of lift pins 604 may be sent through the susceptor 106 to raise and lower the substrate. The lift pins 604 within each of the substrate support assemblies 600a, 600b are formed of a quartz material.

[0045] Figure 6A shows a substrate support assembly 600a including a lift pin assembly. The lift pin assembly forms a sleeve 608 disposed around the shaft 118. The sleeve 608 extends from the shaft motion coupling portion 608 to the upper portion of the shaft 118. The sleeve 608 is a hollow cylinder surrounding the shaft 118. A plurality of lift pin support arms 606 extend outward from the sleeve 608. The lift pins 604 are disposed on each of the lift pin support arms 606 at the distal end 602 on the opposite side of the sleeve 608. The lift pin support arms 606 may be one of a quartz material, a silicon carbide material, or a graphite material.

[0046] In the embodiments described herein, the lift pin support arm 606 is disposed at a normal angle with respect to the lift pin 604 itself. There is a single lift pin 604 extending from each of the lift pin support arms 606. The single lift pin 604 extends upward from the lift pin support arm 606 away from the sleeve 608. There are three or more lift pin support arms 606 and lift pins 604, for example, four or more lift pin support arms 606 and lift pins 604.

[0047] FIG. 6B shows a substrate support assembly 600b that utilizes a linear motion device 610 disposed on the side of the substrate support assembly 105. At least a portion of the linear motion device 610 of the substrate support assembly 600b may be disposed outside the processing volume 136. The linear motion device 610 includes a linear actuator 612 and a Y-shaped lift pin support member 614 that extends into the processing volume 136 toward the shaft 118. The lift pin support member 614 includes a central neck 620 at the distal end of the lift pin support member 614 distal from the linear actuator 612. The central neck 620 is a ring disposed around the shaft 118. Two arms 616 extend from the central neck 620 away from the lift pin support member 614. The two arms 616 are of similar length, are disposed at the distal end from the central neck 620, and include lift pins 604 that extend upward through the susceptor 106. A third lift pin 604 is disposed on the lift pin support member 614 and extends upward from the lift pin support member 614. The third lift pin 604 is disposed between the connection to the linear actuator 612 and the central neck 620.

[0048] The substrate support assemblies 600a, 600b described herein are enabled at least in part by the use of a single shaft 118 and a toothed interface between the substrate 106 and the shaft 118. The substrate support assemblies 600a, 600b are configured such that shadowing in the susceptor is reduced.

[0049] Embodiments of the substrate support assembly 105 described herein are configured to reduce shadowing and reduce wobbling as compared to other substrate support assemblies 105. The use of mating features, such as serrated features, for coupling the shaft 118 and the susceptor 106 enables the reduction of shadowing and the reduction of wobbling. When the susceptor 106 and the shaft 118 are heated, the thermal expansion of the serrated features may further reduce the movement of the susceptor and the substrate disposed thereon.

[0050] The foregoing is directed to embodiments of the present disclosure, but other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof, and the scope of the present disclosure is determined by the following claims.

Claims

1. A substrate support assembly configured for use in semiconductor processing, comprising: a susceptor, a substrate support surface, a coupling surface, and the susceptor including a toothed recess within the coupling surface; a shaft, a first distal end, and a second distal end opposite the first distal end; and a shaft coupling portion coupled to the first distal end of the shaft and disposed within the toothed recess. The substrate support assembly as claimed in claim 1.

2. The substrate support assembly as claimed in claim 1, wherein the toothed recess includes a central opening and a plurality of wings extending outward from the central opening across the coupling surface. The substrate support assembly as claimed in claim 1.

3. The substrate support assembly as claimed in claim 2, wherein each of the plurality of wings is an extension of the central opening, and three or more wings extend radially outward from the central opening. The substrate support assembly as claimed in claim 2.

4. The substrate support assembly as claimed in claim 3, wherein the central opening has a circular cross-section. The substrate support assembly as claimed in claim 3.

5. The substrate support assembly as claimed in claim 1, wherein the toothed recess further includes a plurality of first features. The substrate support assembly as claimed in claim 1.

6. The substrate support assembly as claimed in claim 5, wherein the shaft coupling portion further includes a plurality of second features on a coupling surface of the shaft coupling portion. The substrate support assembly as claimed in claim 5.

7. The substrate support assembly as claimed in claim 6, wherein the first features are a plurality of pins extending from the toothed recess, the second features are a plurality of recesses extending into the coupling surface, and the plurality of pins extend into the plurality of recesses. The substrate support assembly as claimed in claim 6.

8. The substrate support assembly as claimed in claim 1, further comprising a shaft motion coupling portion coupled to the second distal end of the shaft. The substrate support assembly as claimed in claim 1.

9. The substrate support assembly as claimed in claim 8, wherein the shaft motion coupling portion includes a central opening and a plurality of radial protrusions extending outward from the central opening, and the second distal end of the shaft includes a plurality of grooves disposed therein. The substrate support assembly as claimed in claim 8.

10. The substrate support assembly as claimed in claim 9, wherein the plurality of radial protrusions are extensions of the central opening, and pins are disposed between each of the radial protrusions and each of the grooves. The substrate support assembly as claimed in claim 9.

11. A susceptor configured for use in semiconductor processing, comprising: a substrate support surface; a coupling surface opposite the substrate support surface; and a toothed recess disposed within the coupling surface, the toothed recess including a central opening and ​ A toothed recess further including a plurality of vanes extending outward from the central opening across the joint surface. A susceptor comprising the same.

12. At least a part of each wall of the plurality of vanes is curved. The susceptor according to claim 11.

13. The susceptor according to claim 11, wherein three or more vanes extend radially outward from the central opening.

14. The susceptor according to claim 11, wherein the susceptor is formed of a graphite material.

15. The susceptor according to claim 11, wherein the surface of the substrate support is circular.

16. A shaft configured for use in semiconductor processing, comprising: A first distal end; A second distal end opposite the first distal end; A shaft coupling portion coupled to the first distal end of the shaft, the shaft coupling portion including: A coupling contact surface; and A plurality of protrusions extending outward from the central portion of the coupling contact surface such that the coupling contact surface is serrated. A shaft comprising the same.

17. The shaft according to claim 16, further including a plurality of features on the coupling contact surface of the shaft coupling portion.

18. The shaft according to claim 17, wherein the plurality of features are a plurality of recesses extending into the coupling contact surface.

19. The shaft according to claim 16, having three or more protrusions.

20. The shaft according to claim 16, wherein the second distal end of the shaft further includes a plurality of grooves.

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