Co-sputtering rare earth rotating target, manufacturing method and application method thereof

Abstract

An embodiment of the present invention relates to a co-sputtering rare earth rotary target, a manufacturing method thereof, and its application. The co-sputtering rare earth rotary target includes two end target tubes at the axial ends of the target, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes disposed in an axially intermediate region of the target between the two end target tubes, the plurality of rare earth target tubes and the plurality of co-sputtering target tubes being spaced apart and joined to each other by welding, the co-sputtering target tubes being selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and the end target tubes being non-rare earth or rare earth target tubes. A technical solution provided by the embodiment of the present invention combines a rare earth target tube and a co-sputtering element target tube such as aluminum or copper into the same rotary target, thereby enabling the rare earth and co-sputtering element to be simultaneously deposited on the surface of the neodymium-iron-boron alloy, improving the utilization rate and sputtering efficiency of the rare earth target and achieving beneficial technical effects such as shortening the grain boundary diffusion time and reducing the diffusion temperature.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application is filed based on and claims priority from a Chinese patent application bearing application number 202211099776.4 and filed on September 7, 2022, and the entirety of which is incorporated herein by reference.

[0002] FIELD OF THE INVENTION Embodiments of the present invention relate to the field of magnetic materials technology, and more particularly to co-sputtering rare earth rotating targets, methods of manufacture and applications thereof. [Background technology]

[0003] Rare earth targets are increasingly being used in fields such as magnetic material coating, grain boundary diffusion, memory, and electronic information. Magnetron sputter coating is one of the main methods for NdFeB grain boundary diffusion. Step-by-step sputtering of a single target and simultaneous sputtering of independent targets can be used. Step-by-step sputtering of a single target has low sputtering efficiency, while simultaneous sputtering of independent targets makes it difficult to control sputtering parameters. Furthermore, the utilization rate of rare earth metal and alloy planar targets is generally 30-50%, resulting in low target utilization. Summary of the Invention [Problem to be solved by the invention]

[0004] Based on the above-mentioned situation in the prior art, the objective of the embodiments of the present invention is to provide a co-sputtering rare earth rotary target, a manufacturing method and application method thereof, which allows multiple rotary targets to be simultaneously sputtered in a coating line, thereby achieving the objective of simultaneously depositing rare earth elements and co-sputtering elements on the surface of NdFeB, improving grain boundary diffusion, and optimizing magnetic performance. [Means for solving the problem]

[0005] In order to achieve the above object, according to one aspect of the present invention, there is provided a co-sputtering rare earth rotary target, the rare earth rotary target including a backing tube and a plurality of target tubes welded to the outside of the backing tube, the backing tube and the plurality of target tubes welded to the outside of the backing tube being of a concentric columnar structure; the plurality of target tubes welded to the outside of the backing tube include two end target tubes provided at axial ends of the target, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes provided in an intermediate region along the axial direction of the target between the two end target tubes, the plurality of rare earth target tubes and the plurality of co-sputtering target tubes being provided at intervals, and the respective target tubes being joined to each other by welding; The co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes.

[0006] Further, the rare earth target tube comprises a rotating target tube selected from terbium, dysprosium, holmium, and gadolinium; Preferably, the rare earth target tube comprises a rotating target tube selected from terbium and dysprosium.

[0007] Furthermore, the length of the end target tubes is 20 to 35 mm, the lengths of the rare earth target tube and the co-sputtering target tube are both 300 mm or less, and the length ratio between the rare earth target tube and the co-sputtering target tube provided in the intermediate region is 1.3 to 20.

[0008] Furthermore, a gap d is left between each of the joined target tubes, and the value of the gap d can be 0.1 mm≦d≦0.5 mm.

[0009] Furthermore, the co-sputtering target tube is an aluminum target tube or a copper target tube. When the co-sputtering target tube is an aluminum target tube, the length ratio between the rare earth target tube provided in the intermediate region and the co-sputtering target tube is 1.8 to 3.0. When the co-sputtering target tube is a copper target tube, the length ratio between the rare earth target tube provided in the intermediate region and the co-sputtering target tube is 6.0 to 10.0.

[0010] Furthermore, the outer diameters of the two rare earth target tubes adjacent to the end target tubes at both ends of the target decrease from outer diameter OD2 to outer diameter OD3 from the ends of the target toward the middle region, and outer diameter OD2 is equal to outer diameter OD1 of the end target tubes.

[0011] According to a second aspect of the present invention, there is provided a method for manufacturing the rare earth rotary target according to the first aspect of the present invention, the method comprising the steps of: a step of joining two end target tubes, a plurality of rare earth target tubes, and a plurality of co-sputtering target tubes, wherein the two end target tubes are provided at both ends along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals in an intermediate region along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals; joining each target tube by welding; and b. welding the joined target tube and backing tube together.

[0012] According to a third aspect of the present invention, there is provided a method of co-sputtering using a rare earth rotating target according to the first aspect of the present invention, said method comprising the steps of: placing the rare earth rotating target and the magnetic material in a coating line; performing evacuation and pre-sputtering, followed by sputter coating; and subjecting the magnetic body to a heat treatment and a tempering treatment.

[0013] Furthermore, the temperature of the heat treatment is 600 to 950°C, and preferably, the temperature of the heat treatment is 800 to 900°C; The heat treatment time is 5 to 10 hours.

[0014] Furthermore, the tempering temperature is 400 to 600°C, and the tempering time is 2 to 6 hours. [Effects of the Invention]

[0015] In summary, an embodiment of the present invention provides a co-sputtering rare earth rotary target, a manufacturing method and an application method thereof, wherein the co-sputtering rare earth rotary target includes two end target tubes provided at the axial ends of the target, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes provided in an intermediate region along the axial direction of the target between the two end target tubes, the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals and are joined to each other by welding, the co-sputtering target tubes are selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes. The technical solution provided in the embodiments of the present invention combines a rare earth target tube and a co-sputtering element target tube such as aluminum or copper into the same rotating target, and simultaneously sputters multiple rotating targets in a coating line, allowing rare earth such as terbium or dysprosium and the co-sputtering element to simultaneously adhere to the surface of NdFeB, which is conducive to subsequent grain boundary diffusion, improves the utilization rate of the rare earth target and the sputtering efficiency, and achieves beneficial technical effects such as shortening the grain boundary diffusion time and reducing the diffusion temperature. [Brief explanation of the drawings]

[0016] [Figure 1]1 is a schematic diagram of the overall structure of a co-sputtering rare earth rotary target provided in an embodiment of the present invention. [Figure 2] 1 is a flowchart of a method for manufacturing a co-sputtering rare earth rotary target provided in an embodiment of the present invention. [Figure 3] 1 is a flowchart of a co-sputtering method using a co-sputtering rare earth rotating target provided in an embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0017] In order to clarify the objectives, technical solutions and advantages of the present invention, the present invention will be described in more detail below with reference to the drawings in conjunction with specific embodiments. It should be understood that these descriptions are merely illustrative and do not limit the scope of the present invention. In addition, in the following description, descriptions of known structures and techniques will be omitted to avoid unnecessary confusion with the concept of the present invention.

[0018] Unless otherwise specified, technical or scientific terms used in one or more embodiments of the present invention have the common meanings understood by those skilled in the art to which this disclosure belongs. The use of words such as "first," "second," and similar terms in one or more embodiments of the present invention does not denote any order, quantity, or importance, but merely serves to distinguish different components. Words such as "comprise" or "comprise" mean that the elements or items appearing before the word cover the elements or items listed thereafter and their equivalents, but do not exclude other elements or items. Words such as "connect" or "connected" are not limited to physical or mechanical connections, but may also include electrical connections, whether direct or indirect. Terms such as "top," "bottom," "left," and "right" are used only to indicate relative positions, and if the absolute positions of the objects being described change, the relative positions may also change accordingly.

[0019] The technical solution of the present invention will be described in detail below with reference to the drawings. An embodiment of the present invention provides a co-sputtering rare earth rotary target, and Figure 1 shows a schematic diagram of the overall structure of the co-sputtering rare earth rotary target. As shown in Figure 1, the rare earth rotary target includes a backing tube 1 and a plurality of target tubes welded to the outside of the backing tube, and the backing tube 1 and the plurality of target tubes welded to the outside of the backing tube form a concentric columnar structure. The multiple target tubes welded to the outside of the backing tube include two end target tubes 2 and 3 located at the axial ends of the target, and multiple rare earth target tubes Ai (i = 1, 2, 3, ...) and multiple co-sputtering target tubes Bi (i = 1, 2, 3, ...) located in the intermediate region along the axial direction of the target between the two end target tubes. The multiple rare earth target tubes Ai (i = 1, 2, 3, ...) and multiple co-sputtering target tubes Bi (i = 1, 2, 3, ...) are spaced apart, and each target tube is joined to another by welding. This welding is low-temperature welding, and can be performed using low-temperature alloy welding materials such as indium and tin. A gap d should be left between each joined target tube during welding. The minimum gap is related to the expansion coefficient of the material, and the allowable value of gap d is 0.1 mm≦d≦0.5 mm. The end target tubes can be non-rare earth target tubes or rare earth target tubes.

[0020] FIG. 1 illustrates an example of a co-sputtering rare earth rotary target using six rare earth target tubes A1 to A6 and five co-sputtering target tubes B1 to B5. The number of target tubes can be selected by those skilled in the art according to actual needs as long as the requirement that the rare earth target tubes and the co-sputtering target tubes are spaced apart is met, and should not be construed as a limitation on the technical solution of the present invention.

[0021] Here, the co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and is preferably an aluminum target tube or a copper target tube, the end target tube is a stainless steel target tube or a titanium target tube, and the rare earth target tube includes a rotating target tube containing terbium, dysprosium, holmium, and gadolinium, and is preferably a rotating target tube containing terbium and dysprosium.

[0022] The length of one rare earth target tube is L Ai , the length of one sputtering target tube is L Bi The ratio of the length of the rare earth target tube and the co-sputtering target tube in the intermediate region is set to 1.3 to 20, i.e., ΣL Ai / ΣL Bi The range of values that can be taken by is 1.3 to 20. When the co-sputtering target tube is an aluminum target tube, the ratio of the length of the rare earth target tube provided in the intermediate region to the length of the co-sputtering target tube (i.e., ΣL Ai / ΣL Bi ) is 1.8 to 3.0, and when the co-sputtering target is a copper target, the ratio of the length of the rare earth target tube provided in the intermediate region to the length of the co-sputtering target tube (i.e., ΣL Ai / ΣL Bi ) is 6.0 to 10.0.

[0023] The outer diameters of the two rare earth target tubes adjacent to end target tube 2 and end target tube 3 at both ends of the target decrease from outer diameter OD2 to outer diameter OD3 from both ends toward the middle region, and outer diameter OD2 is equal to outer diameter OD1 of the end target tube. As shown in Figure 1, the outer diameter of end target tube 2 and end target tube 3 at both ends of the target is OD1, and the outer diameters of rare earth target tubes A1 and A6 adjacent to end target tube 2 and end target tube 3 are shaped like dog bones. Due to the characteristics of the magnetic field structure in the target tubes, the magnetic field at both ends is slightly stronger than in the middle, which causes the targets at both ends to be worn out more quickly. Therefore, in embodiments of the present invention, the target tubes are installed in irregular shapes (for example, with both ends shaped like dog bones) to improve target utilization. The outer diameters of the other two ends are OD2, and the outer diameters of the middle regions are OD3, with OD2 > OD3. The outer diameters of the co-sputtering targets B1 to B5 in the middle region are OD4, and the outer diameters of the other rare earth target tubes A2, A3, A4 and A5 are OD5, with OD3 = OD4 = OD5.

[0024] An embodiment of the present invention further provides a method for manufacturing a rare earth rotary target, the rare earth rotary target being the rare earth rotary target provided in the above embodiment of the present invention, and FIG. 2 shows a flow chart of the manufacturing method, which includes: a step of joining two end target tubes, a plurality of rare earth target tubes, and a plurality of co-sputtering target tubes, wherein the two end target tubes are provided at both ends along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals in an intermediate region along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals; joining each target tube by welding; and b. welding the joined target tube and backing tube together.

[0025] An embodiment of the present invention further provides a method for co-sputtering using a rare earth rotating target, where the rare earth rotating target is the rare earth rotating target provided in the above embodiment of the present invention, and FIG. 3 shows a flowchart of the co-sputtering method, which includes the following steps:

[0026] A rare earth rotating target and a magnetic material are placed on a coating line and sputtering is performed. The magnetic material is, for example, a neodymium-iron-boron magnetic material. In this step, the rare earth rotating target can be one or more targets. In the case of multiple targets, the targets are arranged parallel to each other. The power density of the target is 0.5 to 6 W / cm. 2 , preferably 3 to 5 W / cm 2 The weight gain of the magnetic material is controlled to 0.2 to 0.6%. The power density of the target is related to the sputtering efficiency, and the final effect is the same when the power is low and when the sputtering time is long, so the weight gain rate is mainly due to achieving the magnetic material performance, or shortening the time or lowering the temperature on the premise of achieving performance.

[0027] The magnetic body is subjected to heat treatment and tempering treatment, where the heat treatment temperature is 600 to 950°C, preferably 800 to 900°C, and the heat treatment time is 5 to 10 hours, and the tempering temperature is 400 to 600°C, and the tempering time is 2 to 6 hours.

[0028] When co-sputtering is performed using the rare earth rotating target provided in the embodiments of the present invention, the heat treatment temperature can be reduced by 50 to 150°C compared to a target without added co-sputtering elements. At the same heat treatment temperature, the heat treatment time can be shortened by 0.5 to 2 hours, and the target utilization rate can reach 85% or more. This simplifies and reduces experimental conditions, such as reducing the thermal diffusion temperature and the diffusion time, and improves the target utilization rate.

[0029] Specific examples and experimental data are given below.

[0030] Example 1 The total length of the rotating target is 1600 mm, the gap between two target tubes is 0.25 mm, and it is made up of nine terbium target tubes and eight aluminum tubes joined together. OD1 is 165 mm, OD2 is 165 mm, OD3 = OD4 = OD5 = 158 mm, L1 = L2 = 30 mm, and the end target tubes are made of stainless steel. A1 and A6 are both dog-bone shaped. ΣL Ai / ΣL Bi The ratio of was 2.7. A 6 mm thick neodymium iron boron was placed on the coating line, and the target power density was 4 W / cm 2 The weight increase ratio of the magnetic body was 0.4%, the heat treatment temperature was 900°C, the heat treatment time was 10 hours, and the tempering temperature and time were 500°C and 2 hours, respectively.

[0031] (Comparative Example 1) The co-sputtering target was a terbium target, and the weight gain ratio was 0.35%. The other conditions were the same as in Example 1.

[0032] Example 2 The temperature of the heat treatment was 850° C., and the other conditions were the same as those in Example 1.

[0033] Example 3 The heat treatment time was 8 hours, and the other conditions were the same as in Example 1.

[0034] Example 4 It consists of 10 terbium target tubes and 9 aluminum tubes joined together, and Ai / ΣL Bi The ratio of was 1.8, the heat treatment temperature was 850°C, the time was 10 hours, the weight increase ratio was 0.41%, and the other conditions were the same as in Example 1.

[0035] (Comparative Example 2) It consists of 11 terbium target tubes and 9 aluminum tubes joined together, and Ai / ΣLBi The ratio of was 1, the heat treatment temperature was 850°C, the time was 10 hours, the weight increase ratio was 0.47%, and the other conditions were the same as in Example 1.

[0036] (Comparative Example 3) It consists of 11 terbium target tubes and 10 aluminum tubes joined together, and Ai / ΣL Bi The ratio of was 4, the heat treatment temperature was 850°C, the time was 10 hours, the weight increase ratio was 0.38%, and the other conditions were the same as in Example 1.

[0037] Example 5 The co-sputtering target tube is a copper target tube, and is made up of 11 terbium target tubes and 10 copper tubes joined together. Ai / ΣL Bi The ratio was 10, and the other conditions were the same as in Example 2.

[0038] Example 6 The co-sputtering target tube is a copper target tube, and is made by joining 12 terbium target tubes and 10 copper tubes. Ai / ΣL Bi The ratio was 6, the weight increase ratio was 0.41%, and the other conditions were the same as in Example 2.

[0039] Comparative Example 4 The co-sputtering target tube is a copper target tube, and is made up of 11 terbium target tubes and 10 copper tubes joined together. Ai / ΣL Bi The ratio was 5, the weight increase ratio was 0.43%, and the other conditions were the same as in Example 2.

[0040] (Comparative Example 5) The co-sputtering target tube is a copper target tube, and is made by joining 12 terbium target tubes and 10 copper tubes. Ai / ΣL BiThe ratio was 26, the weight increase ratio was 0.36%, and the other conditions were the same as in Example 2.

[0041] Example 7 The co-sputtering target tube is a terbium tube + aluminum tube + copper tube, and ΣL Ai / ΣL Bi The ratio of terbium to aluminum to copper was 4.5, and the length ratio of terbium to aluminum to copper was 1:0.38:0.115. The other conditions were the same as in Example 2.

[0042] Example 8 The co-sputtering target tube is a dysprosium tube + aluminum tube. The total length of the rotating target is 1200mm, the gap between the two target tubes is 0.25mm, and it is composed of five terbium target tubes joined with four aluminum tubes. OD1 is 110mm, OD2 is 110mm, OD3=OD4=OD5=105mm, L1=L2=30mm, and the end target tube of the non-rare earth target tube is made of stainless steel. A1 and A6 are both dog bone shaped. ΣL Ai / ΣL Bi The ratio was 1.8, and the weight increase ratio was 0.41%. The other conditions were the same as in Example 2.

[0043] Example 9 The co-sputtering target tube is a dysprosium tube + copper tube, and ΣL Ai / ΣL Bi The ratio was 10, the weight increase ratio was 0.4%, and the other conditions were the same as in Example 2.

[0044] (Comparative Example 6) The sputtering target was a pure dysprosium target, and the weight increase ratio was 0.35%. The other conditions were the same as in Example 2.

[0045] (Comparative Example 7) LA1 and LA6 were not dog-bone shaped, had OD2=OD3=165 mm, and were heat-treated at a temperature of 850° C., with the other conditions being the same as in Example 1.

[0046] (Comparative Example 8) The material of the non-rare earth target tubes 2 and 3 was terbium, the heat treatment temperature was 850° C., and the other conditions were the same as in Example 1.

[0047] Table 1 shows the performance parameter table for each of the examples and comparative examples provided above. Performance parameter table for each example and comparative example JPEG2025526964000002.jpg116170

[0048] As can be seen from the data in Table 1 above, the co-sputtering rare earth rotary target provided in the embodiment of the present invention can simultaneously co-sputter rare earth and co-sputtering element in one target by controlling the length ratio between the rare earth target tube and the co-sputtering target tube and controlling the target structure, thereby improving sputtering efficiency, shortening or lowering the diffusion temperature, improving grain boundary diffusion, and optimizing magnetic material performance.

[0049] (1) Adding a certain amount of aluminum and copper while increasing the terbium content of the magnetic material at the same amount is beneficial in optimizing the magnetic material's performance. For example, when the terbium length / aluminum length ratio was 2.7, the coercivity increased by 0.8 KOe after adding aluminum compared to the addition of pure terbium. When the terbium length / copper length ratio was 10, the coercivity increased by 0.3 KOe after adding copper compared to the addition of pure terbium. When the terbium length / aluminum length / copper length ratio was 1:0.38:0.115, the coercivity increased by 0.7 KOe after adding aluminum and copper compared to the addition of pure terbium. When the dysprosium length / aluminum length ratio was 1.8, the coercivity increased by 0.5 KOe after adding aluminum compared to the addition of pure terbium.

[0050] (2) Compared to the addition of pure terbium, adding an appropriate amount of co-sputtering element can lower the diffusion temperature or shorten the diffusion time when achieving the same coercivity. For example, under the conditions of heat treatment temperature of 850°C for 10 hours when adding co-sputtering element, heat treatment temperature of 900°C for 8 hours when adding pure terbium, the coercivity of the magnetic material achieved 41 KOe or more in all cases.

[0051] (3) Replacing both ends of the target with end target tubes, or processing the target tubes A1 and A6 close to both ends of the target into a dog-bone shape, is advantageous in improving the target utilization rate. If both are adopted at the same time, the target utilization rate was as high as 88%.

[0052] In summary, embodiments of the present invention relate to a co-sputtering rare earth rotating target, a manufacturing method thereof, and its application. The co-sputtering rare earth rotating target includes two end target tubes at the axial ends of the target, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes in an axially intermediate region of the target between the two end target tubes, the plurality of rare earth target tubes and the plurality of co-sputtering target tubes being spaced apart and joined to each other by welding, the co-sputtering target tubes being selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and the end target tubes being non-rare earth or rare earth target tubes. The co-sputtering rare earth rotating target provided in embodiments of the present invention is applicable to the field of grain boundary diffusion by magnetic material coating, and can achieve simultaneous sputtering of rare earth and co-sputtering element targets such as aluminum and copper onto the surface of a magnetic material, improving sputtering efficiency, eliminating the need to manufacture alloy targets, and facilitating the recovery of remaining targets. By combining a rare earth target tube and a co-sputtering element target tube such as aluminum or copper on the same rotating target, and controlling the length ratio between the rare earth target and the useful target such as aluminum or copper, and matching it with the sputtering process, it is possible to realize precise control of the rare earth and the co-sputtering element, which is conducive to subsequent grain boundary diffusion, improves the utilization rate of the rare earth target and the sputtering efficiency, and achieves the beneficial technical effects of shortening the grain boundary diffusion time and reducing the diffusion temperature.

[0053] It should be understood that the above-mentioned specific embodiments of the present invention are merely for illustrative purposes of explaining and interpreting the principles of the present invention, and are not intended to limit the present invention. Therefore, any modifications, equivalent replacements, improvements, etc. made without departing from the spirit and scope of the present invention should fall within the scope of protection of the present invention. Furthermore, the appended claims of the present invention are intended to cover all changes and modifications that fall within the scope and boundaries of the appended claims, or equivalent forms of these scopes and boundaries. [Explanation of symbols]

[0054] 1-Backing tube 2, 3-end target tube A1~A6 - Rare earth target tubes B1~B4 - Co-sputtering target tube OD1 - outer diameter of the end target tubes on both ends of the rotating target OD2, OD3 - outer diameter of dog-bone shaped segments A1 and A6 that approach the target tube at both ends OD2>OD3, OD4 - outer diameter of sputtering target tube OD5 - outer diameter of the rare earth target tube in the middle region L1 - Length of the end target tube at each end LA - length of one rare earth target tube LB-1 Co-sputtering target tube length

Claims

1. A co-sputtering rare earth rotating target, the rare earth rotating target including a backing tube and a plurality of target tubes welded to the outside of the backing tube, the backing tube and the plurality of target tubes welded to the outside of the backing tube having a concentric columnar structure; the plurality of target tubes welded to the outside of the backing tube include two end target tubes provided at axial ends of the target, and a plurality of rare earth target tubes and a plurality of co-sputtering target tubes provided in an intermediate region along the axial direction of the target between the two end target tubes, the plurality of rare earth target tubes and the plurality of co-sputtering target tubes being provided at intervals, and the respective target tubes being joined to each other by welding; The co-sputtering rare earth rotating target is characterized in that the co-sputtering target tube is selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes.

2. the rare earth target tube comprises a rotating target tube selected from terbium, dysprosium, holmium, and gadolinium; 2. The rare earth rotating target of claim 1, wherein the rare earth target tube comprises a rotating target tube selected from terbium and dysprosium.

3. The rare earth rotary target according to claim 1, characterized in that the length of the end target tube is 20 to 35 mm, the length of the rare earth target tube and the co-sputtering target tube are both 300 mm or less, and the length ratio of the rare earth target tube and the co-sputtering target tube provided in the intermediate region is 1.3 to 20.

4. 2. The rare earth rotary target according to claim 1, wherein a gap d is left between each of the joined target tubes, and the value of the gap d is within the range of 0.1 mm≦d≦0.5 mm.

5. The rare earth rotary target according to claim 1, wherein the co-sputtering target tube is an aluminum target tube or a copper target tube, and when the co-sputtering target tube is an aluminum target tube, the ratio of the length of the rare earth target tube provided in the intermediate region to the co-sputtering target tube is 1.8 to 3.0, and when the co-sputtering target tube is a copper target tube, the ratio of the length of the rare earth target tube provided in the intermediate region to the co-sputtering target tube is 6.0 to 10.

0.

6. 2. The rare earth rotary target according to claim 1, wherein the outer diameters of the two rare earth target tubes adjacent to the end target tubes at both ends of the target decrease from an outer diameter OD2 to an outer diameter OD3 from the ends of the target toward the intermediate region, and the outer diameter OD2 is equal to the outer diameter OD1 of the end target tubes.

7. a step of joining two end target tubes, a plurality of rare earth target tubes, and a plurality of co-sputtering target tubes, wherein the two end target tubes are provided at both ends along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals in an intermediate region along the axial direction of the target, and the plurality of rare earth target tubes and the plurality of co-sputtering target tubes are provided at intervals; joining each target tube and backing tube by welding; and welding the joined target tube and backing tube together.

8. placing the rare earth rotating target and the magnetic material in a coating line; performing evacuation and pre-sputtering, followed by sputter coating; 7. A method for co-sputtering using the rare earth rotating target according to claim 1, further comprising the steps of: heat treating and tempering the magnetic body.

9. The temperature of the heat treatment is 600 to 950°C, preferably, the temperature of the heat treatment is 800 to 900°C; 9. The method according to claim 8, wherein the duration of the heat treatment is 5 to 10 hours.

10. 9. The method according to claim 8, wherein the tempering temperature is 400-600°C and the tempering time is 2-6 hours.

Images