Apparatus and system for delivering a liquid flow and apparatus and method for non-immersion wet chemical processing of planar substrates

Abstract

The apparatus for delivering a liquid stream for wetting the surface of a vertically held planar substrate (1) includes a container (5) for holding the liquid. The container (5) is provided with at least one discharge passage through a sidewall of the container (5), each defining a respective inlet opening that opens into the interior (37) of the container (5). The apparatus is provided with at least one orifice (17; 40) on the exterior of the apparatus for delivering a liquid as a stream passing through at least one of the discharge passages. The apparatus is provided with at least one delivery port that opens into the interior (37) of the container (5) and is in liquid communication with at least one connection device (21; 62) for connecting the apparatus to a supply conduit (61) for supplying liquid to the apparatus. At least one overflow opening opens into the interior (37) of the container (5) at a level between the at least one discharge passage inlet opening and the highest level of the interior (37) of the container (5) for directing liquid from the interior (37) of the container (5).

Description

[Technical Field]

[0001] The present invention relates to an apparatus for delivering a stream of liquid for wetting the surface of a vertically held planar substrate, the apparatus includes a container for holding a liquid; the container includes at least one discharge passageway through a sidewall of the container, each defining a respective inlet opening opening into the interior of the container; the device is provided with at least one orifice on the exterior of the device for delivering a stream of liquid passing through at least one of the discharge passages; The device includes at least one delivery port opening into the interior of the container and in fluid communication with at least one connection device for connecting the device to a supply conduit for supplying a liquid to the device.

[0002] The present invention also relates to a system for delivering a flow of liquid to wet a surface of a vertically held planar substrate, the system comprising: at least one flooding device, each flooding device including a container for holding a liquid; the container includes at least one discharge passageway through a sidewall of the container, each defining a respective inlet opening opening into the interior of the container; a flooding device, the flooding device being provided with at least one orifice on the exterior of the device for delivering a flow of liquid passing through at least one of the discharge passages; and a liquid supply system for supplying liquid to the interior of each flooding device vessel.

[0003] The present invention also relates to an apparatus for non-immersion wet chemical processing of planar substrates.

[0004] The present invention also relates to a method of manufacturing an apparatus for delivering a stream of liquid to wet the surface of a vertically held planar substrate.

[0005] The present invention also relates to a method for wetting the surface of a vertically held planar substrate. [Background technology]

[0006] U.S. Patent No. 10,513,779 discloses a surface treatment system. The top edge of a substrate is clamped and held by a hanger clip. In one embodiment, pipes are provided on both sides of the substrate held by the hanger as processing solution discharge sections. Each pipe has holes that allow the processing solution to be discharged diagonally upward. The discharged processing solution flows down the surface of the substrate to the bottom and is then circulated and discharged again through the pipes by a pump. In another embodiment, the processing solution is discharged diagonally downward from an inclined surface. The processing solution pumped up by the pump is stored in a reservoir. When the liquid level rises above the edge of the inclined surface, the processing solution overflows onto the inclined surface. The processing solution that overflows onto the inclined surface comes into contact with the processing solution receiving member of the hanger and flows down onto the substrate. A problem with this system is that the inclination must extend to the bottom edge of the hanger, very close to the processing solution receiving member. This means that great care must be taken to avoid contact between the hanger and the fixed part of the treatment section.

[0007] U.S. Patent No. 9,359,676 discloses an electroless copper plating tank including a tank body mounted on a frame and a circulation pump that supplies processing liquid to a nozzle and circulates the processing liquid accumulated at the bottom of the tank. The processing liquid is sprayed from the nozzle of the nozzle toward a plate-shaped workpiece obliquely upward relative to the horizontal plane. Therefore, the processing liquid is attached to the top of the plate-shaped workpiece, which is clamped by a transport hanger inside the tank body. The liquid spray unit includes a round pipe as a pipe member having an internal space. Both longitudinal sides of the pipe are sealed. The nozzle includes multiple holes arranged at predetermined intervals along the longitudinal direction. Flexible pipes and piping are also connected to the liquid spray unit. The flexible piping and piping penetrate the side wall of the tank body. The nozzle's spray angle is set obliquely upward relative to the horizontal plane. Therefore, the flow of processing liquid sprayed from the nozzle moves along a parabolic path. The spray flow rate of the processing solution depends on the pressure from the pump and the size of the nozzle. The problem is that it is difficult to precisely control the pressure from the pump, and the pipes create back pressure, making it difficult to control the flow rate and therefore the contact angle of the liquid current with the work surface. It is almost inevitable that the current will impinge relatively violently on the work surface, causing turbulence that extends downward over the surface and results in uneven surface treatment. Summary of the Invention [Problem to be solved by the invention]

[0008] It is an object of the present invention to provide an apparatus, system, and method of the kind described above in the opening paragraph that allows a stream of liquid to impinge on a substrate surface or an adjacent surface in an apparatus that holds the substrate from a reasonable distance and at a relatively well-controlled angle. [Means for solving the problem]

[0009] This object is achieved in a first aspect by the device according to the invention, which device is characterized by at least one overflow port opening into the interior of the container at a level between the at least one discharge passage inlet opening and the highest level of the container interior, for example at least one overflow port opening into the interior of the container at a level between the at least one discharge passage inlet opening and the highest level of the container interior, for conducting liquid from the interior of the container.

[0010] The device includes a container for holding a liquid. In use, the liquid resides inside, which is generally bounded by at least a bottom wall and a side wall. Thus, it is possible to determine the level, i.e., the level relative to the bottom wall. The container may be covered or closed at the top. The interior of the container may be vented. The container is provided with at least one drain passage through the side wall of the container. The drain passage may, for example, be a simple opening or may be defined by a conduit extending through the side wall. The or each drain passage defines a respective inlet opening into the interior of the container through which, in use, liquid can flow from the interior of the container into the drain passage.

[0011] The device includes at least one orifice on the exterior of the device. The orifice may be defined by a discharge passage that terminates at an end opposite the inlet opening. In other embodiments, the discharge passage simply communicates with the orifice, for example, via an intermediate flow guide. The flow is free-flowing; that is, the flow is not guided from the point where the flow exits the orifice.

[0012] The device includes at least one delivery port that opens into the interior of the container and is in fluid communication with at least one connection device for connecting the device to a supply conduit for supplying liquid to the device. The connection device may be, for example, a fitting or a hose or pipe end that can be connected to the fitting. The liquid is generally pumped into the device by a pump external to the device.

[0013] The device includes at least one overflow opening into the interior of the container at a level between the at least one discharge passage inlet opening and the maximum level of the container interior, e.g., at least one overflow port opening into the interior of the container at a level between the at least one discharge passage inlet opening and the maximum level of the container interior. This overflow port or ports are configured to direct liquid out of the container, more specifically, out of the interior of the container. By supplying liquid at a sufficient rate, the level of the liquid in the container is maintained and is determined by the overflow, or at least a minimum overflow level. Because this level is below the maximum level of the container interior, a free surface of liquid exists inside the container. The pressure at which the liquid flows through the one or more discharge passages and then through the orifice is hydrostatic. There is no back pressure, as with the use of a spray bar. The pressure at which the liquid is supplied is not important. The flow of the liquid is gravity-driven. The flow exits the orifice at a substantially constant velocity determined solely by the level of the liquid inside the container (ignoring viscosity and streamline contraction), according to Toricelli's law. The direction of the opening point is not important, nor is the density of the liquid. There is no need to control the pump supplying the liquid to the device to maintain a constant pressure.

[0014] The flow exits the orifice as a jet that follows a parabolic path. Therefore, the flow impinges on the substrate or an adjacent portion of the substrate on a downward trajectory. This reduces the amount of turbulence in the flow along the surface of the substrate. Furthermore, because the velocity and direction are constant, the dimensions of the substrate or portion of the substrate holder where the liquid flow impinges, as well as the distance between that area and the orifice, can be optimized to ensure that a uniform film flow on the substrate is always established.

[0015] Because the level of the free liquid surface inside the vessel is determined by the overflow position, there is no need to control the level using a sensor and controller configured to control the liquid supply. This makes the device relatively robust and useful for applications where the process liquid is relatively aggressive. Furthermore, the supply pump can operate at essentially one operating point instead of being operated intermittently.

[0016] In one embodiment of the device, the orifice is formed by a slit.

[0017] Thus, the liquid flow is sheet-like or film-like. The liquid can impinge on the substrate or substrate-holding device and flow down a major surface of the substrate in a relatively uniform film across the width of the planar substrate. The film has a substantially uniform thickness and velocity across the width of the substrate. Furthermore, the slit has a relatively small height, so that the velocity is approximately constant across the height of the orifice. The orifice is formed where the slit emerges from the outer surface of the device.

[0018] In one example of any embodiment in which the orifice is formed by a slit, the slit has a height, width, and depth as viewed from the outside of the device, and the width decreases with increasing depth in the direction from the orifice towards the container.

[0019] Thus, to an observer moving through the slit toward the container, the slit appears to have decreasing lateral dimensions, i.e., decreasing width. The effect is to produce a sheet or film-like flow of liquid emerging as a jet from the orifice that does not constrict laterally. This increases the uniformity of the liquid flow rate.

[0020] In one example of any embodiment in which the orifice is formed by a slit, the slit has a width and depth height when viewed from the outside of the device, and at least a portion of the slit extending from the orifice has a uniform height, and the ratio of the range to the height of the entire portion having the uniform height has a value between 5 and 15, for example between 9 and 11.

[0021] The value of the ratio may be, for example, about 10. This ratio has been found to provide a relatively stable sheet-like flow of liquid, particularly for types of liquids commonly used in electrochemical processes such as plating.

[0022] In one example of any embodiment in which the orifice is formed by a slit, the discharge passage includes a portion between the slit and the inlet opening that widens outward in height towards the interior of the container.

[0023] Here, height refers to the distance between the lowest and highest surfaces bounding the discharge passage. This height therefore increases towards the interior of the container. The effect is primarily to avoid constriction of the liquid flow at the entrance to the discharge passage. The pressure drop across the discharge passage is also minimized. This results in a stable and uniform sheet-like liquid flow in use. In this embodiment, the slit height may be uniform.

[0024] In one embodiment of the device, the device includes a unitarily formed body having a cavity formed therein, the cavity at least partially defining the container interior.

[0025] The body may be obtained by molding, machining, or a combination thereof. In this embodiment, the effort required to seal the interior of the container is reduced. The dimensions may also have smaller tolerances. It is observed that the term cavity does not imply a completely closed hollow interior.

[0026] In one example of any embodiment in which the orifice is formed by a slit and the device includes a body that is integrally formed and has a cavity formed therein, the cavity at least partially defining the interior of the container, the device includes at least a first masking portion separate from the body and attached to the exterior of the body, and the slit is defined between the first masking portion and one of the protrusion of the container and a second masking portion attached to the exterior of the body.

[0027] In this embodiment, the body can be relatively large and the slit dimensions can be relatively accurately set.

[0028] In a particular example of an embodiment in which the orifice is formed by a slit and the device includes a body made integrally with the body and having a cavity formed therein, the cavity at least partially defining the interior of the container, the device includes at least a first masking portion attached to the exterior of the body separate from the body, the slit being defined between the first masking portion and one of the protruding portion of the container and a second masking portion attached to the exterior of the body, and the at least first masking portion at least partially closing the cavity.

[0029] Thus, the first masking portion forms a portion of the device wall, e.g., a sidewall. The first masking portion may, in particular, bound at least the interior of the container. If a slit is defined between the first masking portion and a second masking portion attached to the exterior of the body, separate from the body, the second masking portion may also partially close the cavity. The first and second masking portions may together close the cavity, but may also together close the discharge passage defining any port defined in the body. This embodiment can be implemented with relatively few parts.

[0030] In one embodiment of the device, at least one of the overflows extends beyond the top of a barrier separating the interior of the container from a space for receiving liquid directed from the interior of the container through the overflow.

[0031] Thus, a weir is formed inside the device, which determines the level of the liquid inside the container. This level can be maintained slightly above the top level during use, so that the inside of the container is always overflowing. Overflowing liquid is collected in the space during use and is then led out of the device from there. For example, there may be a port opening into the space for receiving the liquid. This port may be connected or connectable to a conduit. Compared to a simply overflowing open container, this embodiment allows for better separation of the liquid and the environment of the device.

[0032] In one example of any embodiment of the device, in which at least one of the overflows extends above the top of a barrier separating the interior of the container from a space for receiving liquid drawn from the interior of the container through the overflow, and the device includes a body made integrally with and having a cavity formed therein, the cavity at least partially defining the interior of the container, the cavity at least partially defining the interior of the container and the space for receiving liquid drawn from the interior of the container through the overflow.

[0033] The barrier may be separate from the body or may be integral with the body. This embodiment requires relatively few parts, particularly for sealing the space for receiving liquid inside the container and via the overflow. When there is more than one such space and associated overflow, each of the spaces may be at least partially defined by the body.

[0034] In one example of any embodiment in which at least one of the overflows extends above the top of a barrier separating the interior of the container from a space for receiving liquid directed from the interior of the container through that overflow, at least the interior of the container has an elongated shape when viewed from above, and each overflow is positioned on either side of the length of the interior of the container, extending above the top of a barrier separating the interior of the container from a respective space for receiving liquid directed from the interior of the container through that overflow.

[0035] In this embodiment, the volumetric flow rate of the overflowing liquid can be set relatively high, and a relatively uniform flow of the liquid inside the container is achieved due to the symmetrical arrangement, which can be particularly useful when the orifices are formed by longitudinally aligned slits.

[0036] In one embodiment of the device, the number of discharge passages is multiple.

[0037] The effect is that the sidewall portion through which the discharge passage extends remains relatively strong, compared to providing a single discharge passage with a wide area and / or cross-sectional area. The inlet openings may be arranged in a row, e.g., at a substantially constant level. The inlet openings and / or discharge passages may have corresponding shapes and dimensions. In a specific example, the interior of the container has a polygonal, e.g., quadrilateral, shape when viewed from above, and the inlet openings are arranged in a row extending over most of the dimension of one side. The spacing between the openings (in the direction in which the row extends) may be smaller than the corresponding dimension (i.e., the dimension in the same direction) of the inlet openings. All of this contributes to reducing the effect of streamline contraction, so that the speed at which the liquid emerges is more accurately determined solely by the level of the liquid in the container.

[0038] In one example embodiment where the number of discharge passages is multiple and the orifices are formed by slits, the discharge passages define respective outlet openings at opposite ends to respective inlet openings of the discharge passages, and the device includes channels extending parallel to and in liquid communication with the slits, the outlet openings opening into the channels.

[0039] The flow channels contribute to flow equalization so that the liquid flow has a relatively uniform velocity across the width of the slit.

[0040] In one example of any embodiment in which the orifice is formed by a slit, the discharge passage defines respective outlet openings at either end of the discharge passage to the respective inlet opening, and the device includes at least a first masking portion separate from the container and attached to the exterior of the container in front of the outlet openings, and the slit is defined between the first masking portion and one of a second masking portion attached to the exterior of the container and the protruding portion of the container.

[0041] The goal is to provide a relatively thin sheet or film of liquid flow. Therefore, the slit should have a relatively small height. For uniformity, the height should be relatively well-defined across the entire width of the slit. This can be achieved by defining the slit between a first masking portion attached to the exterior of the container and either a second masking portion or an integral protrusion on the container. The height can be set by a gauge with dimensions corresponding to the intended height of the slit. The first masking portion is positioned against the gauge and then secured to the container. The gauge is then removed to open the slit. This requires a good surface quality on the first masking portion and its mating (second masking portion or protrusion), but this is easier to achieve than if the slit were machined into a solid part. It is also easier to provide the orifice with a relatively sharp edge that ensures the liquid flow follows a parabolic trajectory.

[0042] In one example of any embodiment in which the number of discharge passages is two or more, the orifices are formed by slits, the discharge passages define respective discharge openings at opposite ends of the discharge passages relative to the respective inlet openings, the device includes a channel extending parallel to the slits and in liquid communication with the slits, the discharge openings open into the channel, the device includes at least a first masking portion separate from the container and attached to the exterior of the container in front of the discharge openings, the slit is defined between the first masking portion and one of a second masking portion attached to the exterior of the container and a protrusion on the container, and the channel is formed between the exterior of the container and the at least first masking portion.

[0043] This allows for relatively easy manufacturing, as the channels can be defined, for example, by grooves on the exterior of the container and / or chamfers on the first and / or second masking portions, i.e., the channel sidewalls can be machined into the exposed exterior surfaces of the components of the device and then closed by assembling the components.

[0044] In one example of any embodiment in which the orifice is formed by a slit, the slit has a height, width, and depth as viewed from the outside of the device, and the width decreases with increasing depth in the direction from the orifice towards the container.

[0045] Thus, to an observer moving through the slit toward the container, the slit appears to have decreasing lateral dimensions, i.e., decreasing width. The effect is to produce a sheet or film-like flow of liquid emerging as a jet from the orifice that does not constrict laterally. This increases the uniformity of the liquid flow rate.

[0046] In one embodiment, the at least one overflow comprises at least one overflow port extending through a sidewall of the container.

[0047] The apparatus is typically arranged in a station within the apparatus for wet-chemical, non-immersion surface treatment of substrates. The bottom of such a station typically includes a reservoir or sump in which processing liquid flows down across the major surface of the substrate and collects. Liquid exiting an overflow port extending through the sidewall of the vessel falls into a sink. A recirculation system may be used to return the collected liquid to the apparatus. In many applications, it is useful to aerate the processing liquid. The type of recirculation just described is suitable for this. Furthermore, relatively many and / or relatively large overflow ports can be provided as they extend through the sidewall of the vessel.

[0048] In a particular example of this embodiment, at least one, eg, all, of the at least one overflow port extending through the sidewall of the container is provided on an opposite side of the container from the at least one discharge passage.

[0049] This ensures that the overflowing liquid is kept well separated from the flow of liquid used to wet the substrate.

[0050] An example of any embodiment in which at least one overflow includes at least one overflow port extending through a sidewall of the container further includes at least one flow guide on the exterior of the container, the flow guide including a sloped surface portion below an external orifice of at least one of the at least one overflow ports extending through the sidewall of the container, the sloped surface portion extending to an outer surface in which the external orifice is defined, and sloped such that a lower end of the sloped surface portion is distal to the outer surface in which the external orifice is defined.

[0051] This ensures that overflow liquid is directed away from the apparatus and away from the substrate. Overflow liquid may be directed to the sidewall of a processing station of an apparatus for non-immersion wet chemical processing of a substrate in which the apparatus is located. This allows the apparatus to be located at a relatively high position within the processing station without overflow liquid splashing or generating spray when hitting liquid collecting at the bottom of the processing station.

[0052] In one example of this embodiment, the sloped surface portion transitions at the lower end into a finger-shaped surface portion, for example, a finger-shaped surface portion at an angle to the sloped surface portion.

[0053] Between adjacent fingers there are empty gaps through which liquid can flow, so the fingers break up the liquid flow, allowing for a higher amount of aeration of the overflowing processing liquid before collection and recirculation.

[0054] In one example of any embodiment in which the at least one overflow includes at least one overflow port extending through the sidewall of the container and the device further includes at least one flow guide external to the container, the flow guide includes a sloped surface portion below an external orifice of at least one of the at least one overflow ports extending through the sidewall of the container, the sloped surface portion extending to the outer surface in which the external orifice is defined, the lower end of the sloped surface portion being sloped distal to the outer surface in which the external orifice is defined, and at least a portion of the sloped surface portion proximal to the outer surface in which the external orifice is defined is laterally bounded by a portion defining an opposing upright surface portion.

[0055] This further helps to channel any spilled liquid so that splashing is minimized.

[0056] In one example of any embodiment in which the at least one overflow includes at least one overflow port extending through the sidewall of the container and the device further includes at least one flow guide external to the container, the flow guide includes a sloped surface portion below an external orifice of at least one of the at least one overflow ports extending through the sidewall of the container, the sloped surface portion extending to the outer surface in which the external orifice is defined and sloped such that a lower end of the sloped surface portion is distal to the outer surface in which the external orifice is defined, and the flow guide is a separate part from the container and attached to the exterior of the container.

[0057] This simplifies manufacturing.The flow guide may in particular comprise plate-like sections joined together, for example by gluing or welding or soldering.

[0058] In one embodiment of the device, the at least one overflow includes at least one overflow port defined in a conduit extending through at least a portion of the interior of the container, e.g., at least one overflow port opening into the interior of the container in a direction away from the bottom.

[0059] The conduit allows for the collection of overflow liquid for rapid recirculation and without contamination. Furthermore, it is possible to provide a relatively large number and / or relatively elongated overflow ports along the length of the conduit without substantially weakening the container. Also, the overflow ports in the conduit may face upward.

[0060] In one embodiment of the device, the at least one overflow includes at least one overflow port in fluid communication with a connection device for connecting to a conduit for carrying liquid overflowing away from the device and into the at least one overflow port.

[0061] This allows for recirculation and a relatively high rate of removal of liquid from the device. Thus, coupled with a high feed rate, the free surface level of the liquid inside the vessel is relatively impervious to disturbances. The connection device may be a fitting or simply a pipe or hose end that can be coupled to a fitting or connector.

[0062] In one embodiment, the at least one delivery port comprises, eg, consists of, at least one delivery port formed in a conduit that extends through at least a portion of the interior of the container.

[0063] Thus, liquid can enter the container over a range of dimensions, for example, in one dimension. This helps to ensure a uniform liquid level within the container. Furthermore, only one conduit is required through the side wall to deliver liquid at a relatively high speed and low pressure.

[0064] In one embodiment of the device, the container comprises a unitary body defining at least a bottom and at least walls that bound the interior of the container on all sides.

[0065] The unitary body can be a one-piece, integrally made body. The body may be molded and / or machined. The body may be made of metal, polymeric material, or composite material. Joints formed by bonding are largely avoided, thereby minimizing the risk of unintended leakage. The wall need not completely join the interior of the container. For example, there may be an opening closed by a stopper or cover separate from the body. In another embodiment, the interior wall of the container is completely contained within the body, where the wall bounds the interior of the container.

[0066] In example embodiments where the container includes a single body defining at least a bottom and at least walls that bound the interior of the container on all sides, the body leaves the interior of the container at least partially open at the top.

[0067] This facilitates manufacturing. Furthermore, the interior of the container does not need to be sealed.

[0068] In one example of this embodiment, the body partially bounds the interior of the container at an upper portion, and at least one, eg, a plurality of, openings are defined in the portion of the body partially bounding the interior of the container at an upper portion.

[0069] Thus, the portion of the top wall where the opening is defined acts as a strengthening strut to make the container more rigid and therefore shape stable.

[0070] An example of any embodiment in which the container includes a single body defining at least a bottom and at least walls that bound the interior of the container on all sides, and the body leaves the interior of the container at least partially open at the top, includes at least one cover attached to the body and closing the interior of the container at the top.

[0071] The cover helps to prevent contamination of the liquid inside the container.

[0072] In one embodiment of the device, at least the interior of the container has an elongated shape when viewed from above, and at least one, for example all, of the discharge passages extend through a longer sidewall of the interior of the container.

[0073] This is useful for relatively uniform wetting of a relatively large substrate.The elongated shape may, for example, be a polygon, for example a quadrilateral.

[0074] In one embodiment of the device, at least one of the at least one overflow comprises an overflow port that is elongated in shape, with a width greater than a height in the direction of flow.

[0075] This allows for a relatively large flow rate of overflowing liquid. The lower edge is generally at one level which corresponds to the intended level of the free surface of the liquid inside the container.

[0076] In one embodiment of the device, the at least one inlet opening is located at the bottom of the interior of the container.

[0077] The inlet opening can thus have its lower edge or lowest point at the level of the bottom of the interior of the container. This allows the device to be emptied for maintenance, etc. During use, stagnation of the processing liquid is essentially avoided. Furthermore, since gas rises to the top, the risk of bubbles in the processing liquid flowing through the discharge passage is kept relatively low.

[0078] One embodiment of the device includes at least one liquid displacement formation arranged to reduce the volume within the container available for occupancy by the liquid while leaving space adjacent the displacement formation for the liquid within the container, thereby forming a liquid column that extends to a bottom surface bounding the container interior.

[0079] It is therefore possible to provide a relatively high liquid column, e.g., a relatively large hydrostatic pressure at the inlet opening, without locating the inlet opening close to the bottom surface, whereas when the device is deactivated, the liquid level falls below the level of the inlet opening relatively quickly, since the displacement formation occupies part of the volume that would otherwise be occupied by the liquid.

[0080] In one example of any embodiment of the device, which includes at least one liquid displacement forming portion arranged to reduce the volume within the container available for occupancy by the liquid while leaving space adjacent the displacement forming portion for the liquid within the container to form a liquid column extending to a bottom surface bounding the container interior, the at least one displacement forming portion includes at least one replaceable displacement body mounted within the container.

[0081] This allows the device to be adapted for different applications: one or more of the displacement bodies can be removed or replaced to provide a larger volume available for occupation by the liquid.

[0082] In one example of any embodiment of the device including at least one liquid displacement forming portion arranged to reduce the volume within the container available for occupancy by the liquid while leaving space adjacent the displacement forming portion for the liquid within the container to form a liquid column extending to the bottom surface bounding the container interior, the at least one displacement forming portion is spaced apart from the bottom surface bounding the container interior.

[0083] The displacement formation may in particular be spaced a distance greater than the level of the inlet opening or openings relative to the bottom surface. The displacement formation in this embodiment provides the effect of making it possible to stop the flow of liquid through the orifice relatively quickly after the supply of liquid through the delivery port has stopped, but has little effect on the pressure distribution at the inlet opening to the discharge passage.

[0084] According to another aspect, the system for delivering a flow of liquid for wetting the surface of a vertically held planar substrate according to the invention is characterized in that the system is configured to maintain the level of the free surface of the liquid inside the container of each flooding device at a level between at least one discharge passage inlet opening and the highest level inside the container.

[0085] In one embodiment, the system is configured to maintain the level of the free surface of liquid in the container of each flooding device at a level between at least one discharge passage inlet opening and the highest level inside the container by using, alone or in combination, a device according to the invention as a flooding device, further comprising any of the features described above. When the flooding device is a device according to the invention, the resulting system is a relatively simple embodiment providing a liquid flow having a well-defined constant velocity, since the liquid supply system can be configured to supply liquid at a rate exceeding the flow rate of the liquid flow, so that the excess exits via an overflow, for example permanently via one or more overflow ports.

[0086] In another embodiment, a system includes a sensor device for maintaining a free surface level of liquid in a container, a controller, and a controllable liquid supply system.

[0087] In either case, the free surface level of the liquid within each flooding device vessel is between the level of at least one discharge passage inlet opening and the highest level within the vessel, so there is no back pressure. Hydrostatic pressure determines the flow rate out of the orifices. Liquid flow is gravity-driven. By maintaining a constant level, pressure fluctuations in the liquid supply to the flooding device do not affect the free-flowing flow of liquid exiting the flooding device orifices.

[0088] According to another aspect, an apparatus for non-immersion wet-chemical processing of planar substrates according to the present invention comprises at least one substrate holding device, at least one processing station, at least one support for at least suspending the substrate holding device in the processing station, and at least one system for delivering a flow of liquid according to the present invention, arranged in the processing station for directing a flow of liquid onto at least one of the substrate and the substrate holding device.

[0089] The substrate holder is suspended so that, in use, the planar substrate is held in an upright orientation. The major surfaces of the substrates are at a negligibly small angle to the vertical (their normals are essentially oriented horizontally). When a liquid stream is directed onto the substrate, a relatively uniform, film-shaped liquid stream is established over the associated major surface of the substrate, but over a small area above where the liquid stream impinges on the surface. When the stream is directed onto the substrate holder, even the existence of such a small area can be avoided by first allowing the liquid to flow over a sufficient distance over the flat surface of the substrate holder. In either case, the liquid stream impinges at a well-defined velocity and angle due to the fact that the liquid flow is gravity-driven.

[0090] In one embodiment of the apparatus, at least one of the substrate holding devices comprises: A support structure comprising: a support structure including at least one portion for engaging at least one of the at least one supports so as to suspend the support structure within a processing station of the apparatus; at least one clamping device supported by the support structure for holding the substrate in a plane; at least a first upper flow guide portion disposed on one side of the plane and having an inward-facing surface facing inward and an outward-facing surface facing outward relative to the plane; The outward facing surface is an upper outward-facing surface portion, wherein at least one of the systems for delivering a liquid flow is configured to direct the liquid flow to the upper outward-facing surface portion; a lower outward facing surface portion extending from a transition between at least a central portion of the upper outward facing surface portion and the lower outward facing surface portion to a lower edge; At least a portion of the lower outwardly facing surface portion extending to the lower edge is oriented at a less acute angle to the plane than the upper outwardly facing surface portion.

[0091] The substrate holding device is suitable for holding a substrate in a non-immersion wet chemical processing device during processing. In this type of processing, the substrate is not immersed in a bath of processing liquid, but is held within the device and wetted by liquid directed, in this case, through an upper flow guide. From there, the liquid flows downward onto the exposed areas of the substrate's major surface for processing. The liquid then drips into the bottom of a water bath or tank included in the device.

[0092] The planar substrate may be flexible such that the substrate is only planar when held by the clamping device.

[0093] The substrate holding device includes a support structure including at least one portion for engaging a support, such as to suspend the support structure within the device. Thus, the configuration and orientation of the at least one portion for engaging the support determines how the substrate holding device is oriented upward in use, and thus which outwardly facing surface portion is the upper outwardly facing surface portion and which is the lower outwardly facing surface portion. Similarly, the position, orientation, and configuration of the at least one clamping device determines the position and orientation of the plane, and therefore can be determined even when a substrate is not present.

[0094] The substrate holder includes at least a first upper flow guide disposed on one side of the plane and having an inward surface facing inward and an outward surface facing outward relative to the plane. That is, the first upper flow guide has an inward surface facing in the direction of the plane, not intersecting the plane, and an outward surface facing away from the plane. In this regard, the direction in which the inward surface faces has at least a component perpendicular to the plane. The outward surface faces in a direction that does not have such a component. In principle, the outward surface can include a portion facing in a direction exactly parallel to the plane.

[0095] The inward and outward surfaces do not need to be perfectly flat. The outward surface is generally unimpeded and easily wetted by the flow of liquid directed toward the upper outward surface portion. The lower outward surface portion is continuous with the upper outward surface portion, or at least its central portion, and extends to the lower edge of the outward surface portion, which is also the lower edge of the first upper flow guide. The lower edge may be straight or curved. An embodiment with a straight edge is relatively easy to implement.

[0096] Depending on whether both major surfaces of the substrate are to be processed, a second upper flow guide may be present on the opposite side of the plane. Generally, there may be at most one upper flow guide on either side of the two sides. The lower edge often spans the maximum dimension of the exposed area of ​​the major surface of any substrate held in the plane by the clamping device. This dimension is often determined by the support structure, which typically frames the area of ​​the plane that can hold substrates.

[0097] As previously described, devices and systems for delivering a liquid stream provide a liquid stream with a well-defined, generally consistent velocity and trajectory. This stream can therefore be directed toward the upper outward-facing surface portion such that the flow is always laminar when it reaches the lower edge. As a result, the entire exposed area of ​​the major surface is treated relatively uniformly across its width.

[0098] In one example of this embodiment, the strip on the inwardly facing surface extends longitudinally along the lower edge and laterally to the lower edge, and at least a central longitudinal portion of the strip is movable to engage the major surface of the planar substrate along the entire length of that portion.

[0099] It is possible to define a strip of inwardly facing surface, at least a central portion of which (viewed longitudinally along the length of the edge) is movable in use to engage the major surface of any planar substrate located within the plane defined by the at least one clamping device. Thus, there is no gap between the lower edge and the major surface. The engagement between at least the central portion of the strip and the major surface of the substrate is essentially uninterrupted along the length of the central portion. In use, liquid flowing down the upper and lower outwardly facing surface portions encounters a smooth transition to the exposed areas of the major surface of the planar substrate, where the flow continues as a uniform film. Relatively little or no vortices are present, ensuring uniform treatment of the exposed areas of the major surface of the substrate up to or near the line of contact with the lower edge.

[0100] The central longitudinal section of the strip is the portion that is in the middle when looking at the outward or inward facing surface. If the bottom edge is rounded at the corners of the longitudinal ends, there may be no engagement with the flat major surface of the planar substrate. In many embodiments, the strip is movable to engage the major surface of the planar substrate along the entire length of the strip.

[0101] The strips on the inwardly facing surface need not be micro-flat, especially if they are made of a material having a hardness substantially different from that of the substrate surface.

[0102] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, a strip on the inwardly facing surface extends longitudinally along the lower edge and laterally to the lower edge, at least a central longitudinal portion of the strip is movable to engage with a major surface of a planar substrate over the entire length of that portion, and at least one clamping device of the substrate holding devices includes at least one upper clamping device, an arm of the upper clamping device being positioned to engage with the major surface of the substrate at a level above the strip.

[0103] The effect is that the arms do not impede the flow of liquid from the first upper flow director onto and above the main surface of the substrate.

[0104] In one example of any embodiment of the device, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, a strip on the inwardly facing surface extends longitudinally along the lower edge and laterally to the lower edge, at least a central longitudinal portion of the strip is movable to engage a major surface of a planar substrate along its entire length, and at least one clamping device of the substrate holding devices includes at least one upper clamping device, the arms of the upper clamping device are positioned to engage a major surface of the substrate at a level above the strip, and the arms of the upper clamping device are positioned to engage a major surface between the plane and the strip.

[0105] Thus, the clamping engagement is between the upper flow director and the major surface of the substrate, which, in use, can be close to the top edge of the planar substrate, so that a majority of the major surface of the substrate is exposed and available for processing.

[0106] In one example of any embodiment in which the at least one clamping device includes at least one upper clamping device, and the arm of the upper clamping device is positioned to engage the main surface of the substrate at a height above the strip, the first upper flow guide forms the arm of the upper clamping device.

[0107] Therefore, a separate clamping device is not required and the substrate holding device can be relatively compact and have relatively few parts. The other arm of the upper clamping device can be included in or be a fixed part of the support structure of the substrate holding device.

[0108] In one example of any embodiment of the apparatus, in which at least one of the substrate holding devices comprises a support structure, at least one clamping device supported by the support structure for holding a substrate in a plane, and at least a first upper flow guide as defined above, at least one of the substrate holding devices comprising the at least first upper flow guide further comprises a second upper flow guide positioned on the opposite side of the plane from the first upper flow guide.

[0109] This embodiment is suitable for relatively uniform processing of both major surfaces of a planar substrate. The second upper flow director can include any or all of the features of the first upper flow director embodiment. In many such cases, the second upper flow director is at least a mirror image (within a plane) of the first upper flow director, even if the shape and dimensions are not identical.

[0110] In one example of this embodiment, the first and second upper flow guiders are positioned to clamp a substrate therebetween.

[0111] Therefore, no additional upper clamping device is required. This makes the device relatively compact and saves parts. One or more elastic components may be provided to bias the first and second flow guides, more specifically the strips on their inwardly facing surfaces, toward each other. At least a central longitudinal portion of the strip is movable to engage the major surface of the planar substrate over its entire length, resulting in a relatively long contact area extending substantially across the width of the substrate. This helps prevent damage to the substrate surface. Furthermore, when the substrate is held under tension, the tension is distributed relatively evenly across the width of the substrate.

[0112] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in the plane, and at least a first upper flow guide as defined above, at least a first of the upper flow guides is pivotally mounted to the support structure with a pivot axis extending parallel to the plane.

[0113] Therefore, regardless of the exact thickness of the planar substrate, it is relatively easy to move the strip, or a central portion thereof, into engagement with the major surface of the planar substrate. One or more biasing devices may be provided between the support structure and one or more pivoting upper flow guides to bias the strip toward the plane. If the lower edge is straight, the lower edge is at least approximately parallel to the pivot axis. The pivotable mounting may be a through-pivot protruding from one of the support structure and the upper flow guide, which is inserted into an opening in the other of the support structure and the upper flow guide, respectively.

[0114] In one example of any embodiment of the apparatus, wherein at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, at least a first of the upper flow guides includes a plate-like segment defining at least an inward-facing surface and an outward-facing surface.

[0115] This makes the upper flow guide relatively easy to manufacture by cutting segments from a plate-like material and joining them together, for example by welding or gluing. The portions of the upper flow guide that attach the upper flow guide to the support structure do not have to be made from plate-like segments. At least those portions that define the inward and outward surfaces are generally made from one or more plate-like segments.

[0116] In one example of any embodiment of the device, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, the outward surface portion folds inward toward the plane at the transition from the upper outward surface portion to the lower outward surface portion.

[0117] In particular, in combination with the features of the previous embodiment, this embodiment is relatively easy to manufacture. The transition may be along a straight line, for example a straight line parallel to the lower edge, for uniform flow across the width of the outward-facing surface (viewing that surface in the direction of the plane). This embodiment allows one or both of the upper and lower outward-facing surface portions to be flat but facing in a different direction than the other of the upper and lower outward-facing surface portions.

[0118] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, at least one of the upper outward-facing surface portion and the lower outward-facing surface portion is flat over at least a majority of its surface area.

[0119] This provides unimpeded flow across the relevant surface area.

[0120] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices comprises a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, at least the upper outward surface portions are bounded laterally by surfaces that face each other and extend at an angle to the plane, e.g., laterally.

[0121] The upper outward surface portion is the portion against which the flow of processing liquid impinges in use. Opposing surfaces extending at an angle to the plane bound the upper outward surface portion such that liquid cannot flow off the upper outward surface portion at its side edges but instead flows onto the lower outward surface portion.

[0122] In one example of any embodiment of the device, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, the lower edge extends between the side edges of the lower outward surface portion, and the side edges meet the lower edge at each corner of the lower outward surface portion.

[0123] Thus, the lower outwardly facing surface portion is essentially lip-shaped. The side edges may abut or lie adjacent to members of the support structure such that the lower outwardly facing surface portion extends partially between these members. The side edges, like the bottom edge, may be straight over most of their extent.

[0124] In one example of this embodiment, the outward facing surface further includes a lateral lower outward facing surface portion separate from the lower outward facing surface portion and adjacent to the upper outward facing surface portion, the lateral lower outward facing surface portion and the upper outward facing surface portion extending at an angle of less than 180° from each other.

[0125] The lower outward surface portion slopes inwardly in a planar direction toward its lower edge, while the lateral lower outward surface portion slopes outwardly toward its lower edge. This helps to wick processing liquid away from the portions of the support structure that laterally frame the substrate in use. Furthermore, when the surface portions are defined by plate-like segments, the lateral lower outward surface portions increase the rigidity of the upper flow guider.

[0126] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above, the at least one clamping device includes at least one lower clamping device positioned to engage the substrate at a lower edge of the substrate.

[0127] This allows the substrate device to be used to hold a relatively flexible substrate in a well-defined position in a plane, making the substrate less likely to wobble or warp.

[0128] In one example of any embodiment of the apparatus, where at least one of the substrate holding devices comprises a support structure, at least one clamping device supported by the support structure for holding the substrate in the plane, and at least a first upper flow guide as defined above, the substrate holding device further comprises at least a first lower flow guide disposed on each side of the plane and having an inwardly facing surface facing inward and an outwardly facing surface facing outward relative to the plane, the outwardly facing surface including at least one upper outwardly facing surface portion extending to an upper edge of the outwardly facing surface and sloping inward towards the plane in the direction of the upper edge, a strip of the inwardly facing surface extending longitudinally along the upper edge and laterally to the upper edge, at least a central longitudinal portion of the strip being movable to engage a major surface of the substrate over the entire length of the portion.

[0129] The lower flow guide directs film flow that reaches the bottom edge of the exposed major surface of the substrate away from the apparatus, which can help shield the support structure and / or the lower clamping apparatus from the processing liquid.

[0130] In one example of any embodiment where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, the upper edge extends between the side edges of the upper outward surface portion, and the side edges meet the upper edge at each corner of the upper outward surface portion.

[0131] This embodiment is easy to manufacture with a straight top edge and therefore a straight strip. A continuous line of contact with the flat major surface of a planar substrate can be achieved relatively easily.

[0132] In one example of this embodiment, the side edges extend from each corner of the upper outward surface portion to a respective second corner, and the upper outward surface portion widens at the second corner to increase the extent of the upper outward surface portion in a direction parallel to the upper edge.

[0133] In this embodiment, the portion of the lower flow director that defines the upper outwardly facing surface portion may be folded between lateral members of the support structure that surround the planar area on which the substrate is positioned to be held.

[0134] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, at least a portion of the upper outward surface portions are bounded laterally by surfaces that face each other and extend at an angle to the plane, e.g., laterally.

[0135] These opposing surfaces, which extend, for example, at an angle transverse to the plane, direct liquid flowing from the substrate's major surface onto the lower flow guider downward without spreading, so that the flow across the major surface being treated is also relatively uniform at the lower end of its exposed region.

[0136] In one example of any embodiment where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, the outward surface of the lower flow guide includes a lower outward surface portion adjacent to the upper outward surface portion, and the upper outward surface portion and the lower outward surface portion extend at an angle greater than 180° from each other.

[0137] The lower outward surface portion may be at a relatively small or negligible angle to the vertical in use, while the upper outward surface portion is inclined. The lower outward surface portion may shield the lower portion of a support structure or clamping device. In either case, the effect is that the equalized film flow does not separate at the lower end of the upper outward surface portion.

[0138] In one example of any embodiment where at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide portion as defined above, and at least a first lower flow guide portion as defined above, at least the upper outward surface portion is flat.

[0139] This provides a smooth, uniform and unimpeded flow across the upper outward facing surface portion.

[0140] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, the at least one clamping device includes at least one lower clamping device arranged to engage the substrate at a lower edge of the substrate, and an arm of the lower clamping device arranged to engage a major surface of the substrate at a level below the strip of the first lower flow guide.

[0141] Thus, the lower clamper arm does not impede flow across the major surface of the substrate at the bottom of the exposed area of ​​that major surface.

[0142] In one example of this embodiment, the arms of the lower clamping device are positioned to engage a major surface between the planar surface and the strip of the first lower flow director.

[0143] Thus, the lower clamping device and the first lower flow guide can be provided at the same level or coincidentally.

[0144] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, the at least one clamping device includes at least one lower clamping device positioned to engage the substrate at a lower edge of the substrate, and the first lower flow guide forms an arm of the lower clamping device.

[0145] Thus, a separate clamping device is not required. Furthermore, the strip can engage the substrate to clamp the substrate. At least a central longitudinal portion of the strip is movable to engage a major surface of the substrate along the entire length of that portion, so that a relatively large contact area exists between the clamping device and the substrate. When the substrate is held under tension, this tension is uniformly distributed. In either case, there are no acute stresses on isolated patches of the substrate surface.

[0146] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, and at least a first upper flow guide as defined above and at least a first lower flow guide as defined above, the substrate holding device further includes a second lower flow guide positioned on the opposite side of the plane from the first lower flow guide.

[0147] In this embodiment, both major surfaces of the substrate can be processed simultaneously. The second lower flow director can include any of the features of any of the first lower flow director embodiments. The second lower flow director can be at least a mirror image (within a plane) of the first lower flow director, e.g., identical in shape and dimensions.

[0148] In one example of this embodiment, the first and second lower flow directors are positioned to clamp the substrate therebetween.

[0149] Therefore, no separate clamping device is required.The substrate holding device is well suited for use in holding substrates of different thicknesses.

[0150] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in the plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, at least a first of the lower flow guides is pivotally mounted to the support structure with a pivot axis extending parallel to the plane.

[0151] This makes it relatively easy to move the inwardly facing surface strip into engagement with the surface of the substrate. One or more biasing devices can be provided between the support structure and the one or more pivoting lower flow guides to bias the inwardly facing surface strip toward the plane. If the upper edge is straight, the upper edge is at least approximately parallel to the pivot axis. The pivotable mounting portion can be a through pivot protruding from one of the support structure and the lower flow guide, and the pivot is inserted into an opening in the other of the support structure and the lower flow guide, respectively.

[0152] In one example of any embodiment in which at least one of the substrate holding devices includes a support structure, at least one clamping device supported by the support structure for holding the substrate in a plane, at least a first upper flow guide as defined above, and at least a first lower flow guide as defined above, at least a first of the lower flow guides includes a plate-like segment defining at least an inward-facing surface and an outward-facing surface.

[0153] This makes it relatively easy to manufacture the lower flow guide by cutting segments from a plate-shaped material and joining them together, for example by welding or gluing. The parts of the lower flow guide that attach the lower flow guide to the support structure do not have to be made of plate-shaped segments. However, at least those parts that define the inward and outward surfaces are generally made of one or more plate-shaped segments.

[0154] According to another aspect, the present invention provides a method of manufacturing any embodiment of an apparatus according to the present invention for delivering a stream of liquid for wetting a surface of a vertically held planar substrate, comprising: the discharge passages define respective outlet openings on opposite ends of the discharge passages to the respective inlet openings; the device includes at least a first masking part attached to the exterior of the container in front of the outlet opening, separate from the container; A slit is defined between the first masking portion and one of a second masking portion attached to the exterior of the container and the protruding portion of the container.

[0155] The present invention also provides a method of manufacturing any embodiment of an apparatus for delivering a stream of liquid to wet a surface of a vertically held planar substrate, comprising: The device includes a unitarily formed body having a cavity formed therein; the cavity at least partially defines an interior of the container; The orifice is formed by a slit, the device includes at least a first masking portion separate from the body and attached to the exterior of the body; The slit is defined between the first masking portion and one of the second masking portions attached to the protruding portion of the container and the exterior of the body.

[0156] Each of these two manufacturing methods: providing a container and at least a first masking portion; positioning a gauge having a dimension defining a height of the slit, as viewed in the flow direction, between the first masking portion and one of the second masking portion and the protrusion of the container defining the slit; securing at least a first masking portion to the container; and removing the gauge from the slit.

[0157] This method allows the liquid stream to emerge from the orifice in the form of a sheet, the sheet having a relatively well-defined height. Furthermore, this method allows for the slit height to be varied by using different sized gauges.

[0158] According to another aspect, in a method according to the invention for wetting the surface of a vertically held planar substrate, a liquid is supplied to at least one device according to the invention, and the flow rate of the liquid supplied to the device is at least equal to the total flow rate of the liquid through at least one discharge passage.

[0159] The flow rate may be particularly high, so that the free surface level of the liquid inside the container remains constant. However, the delivery rate does not need to be very precisely controlled. Furthermore, the delivery does not need to be intermittent, but can be continuous.

[0160] One embodiment of the method includes the steps of: attaching a substrate to a substrate holding device including a support structure and at least one clamping device supported by the support structure for holding the substrate in a plane; suspending the support structure to hold the substrate in an upright orientation; and directing a flow of liquid onto an upper outward surface portion of an outward surface of an upper flow guide disposed on one side of the plane, the outward surface facing outward relative to the plane, and establishing a film flow over the upper outward surface portion on a major surface of the substrate.

[0161] Thus, a uniform flow of the liquid is established before the liquid reaches the main surface of the substrate to be treated, which allows the main surface to be treated relatively uniformly over its entire height.

[0162] One embodiment of the method comprises the use of an apparatus according to the present invention.

[0163] Thus, the device, system and apparatus according to the invention are each suitable for use in the method according to the invention.

[0164] The invention will now be explained in more detail with reference to the accompanying drawings. [Brief explanation of the drawings]

[0165] [Figure 1] 1 is a cross-sectional view of a portion of a processing station of a non-immersion wet chemical processing apparatus for planar substrates. [Figure 2] 2 is a perspective view of one of two first flooding devices present in the portion of the station shown in FIG. 1; FIG. [Figure 3] FIG. 3 is a second perspective view of the first flooding device of FIG. 2. [Figure 4] FIG. 4 is a top view of the first flooding device of FIGS. 2 and 3 with the cover removed; [Figure 5] FIG. 5 is a cross-sectional view of the first flooding device taken along line AA in FIG. 4. [Figure 6] FIG. 6 is a side view of the first flooding device of FIGS. 2 to 5. [Figure 7] FIG. 7 is a cross-sectional view of the first flooding device taken along line BB in FIG. 6. [Figure 8] FIG. 8 is a perspective view of a main body forming a container in the first flooding device of FIGS. 2 to 7. [Figure 9] FIG. 9 is a perspective view of an upper masking portion of the first flooding device of FIGS. 2 to 8. [Figure 10] FIG. 10 is a front plan view of the upper masking part of FIG. 9. [Figure 11] FIG. 11 is a cross-sectional view of the upper masking portion of FIGS. 9 and 10. [Figure 12] FIG. 12 is a perspective view of a lower masking portion of the first flooding device of FIGS. 2 to 11. [Figure 13] FIG. 13 is a front plan view of the lower masking part of FIG. 12. [Figure 14] FIG. 14 is a cross-sectional view of the lower masking portion of FIGS. 12 and 13. [Figure 15] FIG. 2 is a perspective view of an alternative second flooding device for use in the portion of the station shown in FIG. 1; [Figure 16] FIG. 16 is a rear view of the second flooding device shown in FIG. 15. [Figure 17] FIG. 17 is a front view of the second flooding device shown in FIGS. 15 and 16. [Figure 18] FIG. 10 is a perspective view of a main body forming a container in the second flooding device. [Figure 19] FIG. 19 is a front view of a portion of the second flooding device shown in FIG. 18. [Figure 20] FIG. 10 is a perspective view of the lower masking portion of the second flooding device. [Figure 21] FIG. 21 is a top view of the lower masking part shown in FIG. 20. [Figure 22] FIG. 22 is a rear view of the lower masking part shown in FIGS. 20 and 21. [Figure 23] FIG. 10 is a perspective view of the upper masking portion of the second flooding device. [Figure 24] FIG. 24 is a rear view of the upper masking part shown in FIG. 23. [Figure 25] 10 is a cross-sectional view of a portion of the front wall of the second flooding device formed by the upper masking portion and the lower masking portion. FIG. [Figure 26] 2 is a perspective view of a substrate holding device for use in the apparatus of FIG. 1; [Figure 27] FIG. 27 is a front plan view of the substrate holding device of FIG. 26. [Figure 28] FIG. 28 is a cross-sectional view taken along line AA in FIG. 27. [Figure 29] FIG. 29 is a perspective view of a first upper flow guide portion included in the substrate holding device of FIGS. 26 to 28. [Figure 30] FIG. 30 is a cross-sectional view of the first upper flow guide portion of FIG. 29. [Figure 31]FIG. 31 is a detailed cross-sectional view of a portion of the first upper flow guider of FIGS. 29 and 30. [Figure 32] FIG. 29 is a perspective view of a second upper flow guide portion included in the substrate holding device of FIGS. 26 to 28. [Figure 33] FIG. 33 is a front plan view of the second upper flow guide portion of FIG. 32. [Figure 34] FIG. 34 is a cross-sectional view of the second upper flow guider of FIGS. 32 and 33. [Figure 35] FIG. 35 is a detailed cross-sectional view of a portion of the second upper flow guide portion of FIGS. 32 to 34. [Figure 36] 38 is a cross-sectional view of a portion of the first and second upper flow guiders of FIGS. 29 to 35 attached to the substrate holder of FIGS. 26 to 27. FIG. [Figure 37] FIG. 36 is a perspective view of one of two lower flow guide portions of the same shape included in the substrate holding device of FIGS. 26 to 35. [Figure 38] FIG. 38 is a cross-sectional view of the lower flow guide portion of FIG. 37. [Figure 39] FIG. 39 is a detailed cross-sectional view of a portion of the lower flow guide portion of FIGS. 37 and 38. [Figure 40] 39. FIG. 40 is a side view of the two lower flow guides shown in FIGS. 37 to 39 attached to the substrate holder of FIGS. DETAILED DESCRIPTION OF THE INVENTION

[0166] Below, we describe an embodiment of a non-immersion wet-chemical treatment apparatus for a planar substrate 1 (FIGS. 26-28). Instead of being immersed in a bath of treatment liquid, the substrate 1 is wetted on at least one side with a treatment liquid that flows in the form of a relatively thin film across the major surface of the substrate 1 on that side. This reduces the amount of treatment liquid required, providing environmental and economic benefits. Treatments can include rinsing, soil removal, etching, swelling, reduction, or plating, including, for example, electrodeless plating. In fact, the apparatus can include multiple treatment stations, each configured as described in more detail below, where the treatment liquid differs between at least two of the stations.

[0167] Although the substrate 1 is referred to as planar, the substrate may also be flexible, for example a foil. The device is particularly suitable for substrates such as printed circuit boards, semiconductor dies or integrated circuit substrates.

[0168] In the illustrated embodiment, the apparatus is configured to treat both major surfaces of a substrate 1, with the treatment liquid flowing down the surface in a uniform thin film stream across substantially the entire width of the relevant major surface. To this end, the substrate 1 is held in a substrate holder 2, which will be described in more detail below. The treatment liquid is directed onto the substrate holder 2 from both sides in the form of respective liquid streams. The streams are sheet-like and follow parabolic trajectories that intersect the surface of the substrate holder at an acute angle. A laminar flow is established before the liquid flows onto the major surfaces of the substrate 1.

[0169] Two examples of devices using the same substrate holder 2 will now be described in detail, which differ with respect to the device used to deliver the liquid flow.

[0170] Since both main surfaces of the substrate 1 are to be treated, the apparatus in the first example includes two first flooding devices 3a, 3b (FIG. 1) for delivering liquid flows. The first flooding devices 3a, 3b are identical, so only one is described and shown in detail.

[0171] The first flooding device 3 includes a body 4 (FIGS. 2-8) that forms a container 5 for holding a liquid. In the illustrated embodiment, the body 4 is made in one piece, although surface treatments, including coatings and anodizing, are possible. The body 4 may be molded or machined and made of metal or polymeric materials, including polymer composites. The body 4 defines a container interior for holding a liquid bounded by a bottom wall and side walls. The side walls are rectangular in shape when viewed from above, and the side walls bound the container interior. Otherwise, both the container interior and the body 4 have an elongated shape when viewed from above.

[0172] In the illustrated embodiment, the body 4 has a top wall that includes four elongated openings 6a-6d (FIGS. 4 and 8). The top wall bounds the container interior at the top. Thus, the body 4 leaves the container interior partially open at the top. A cover 7 is attached to the body 4 to cover the openings 6a-6d. In the illustrated embodiment, the cover 7 is secured to the body 4 by screws. Other types of fasteners or other types of attachment are conceivable, such as a reversible snap-lock connection.

[0173] The row of discharge passages through the sidewall of the container defined by the body 4 defines a respective row of inlet openings opening into the interior of the container 5. At the other end, the discharge passages define a row of outlet openings in the outer surface 8 of the body 4. The outlet openings are set back relative to the planar majority of the outer surface 8, where they are arranged in elongated recesses 9 extending in the direction of the rows. The discharge passages, inlet openings, and outlet openings have elongated cross-sections (transverse to the direction of flow). Their widths are greater than their heights. In the illustrated embodiment, the discharge passages, inlet openings, and outlet openings have elongated cross-sections with widths greater than the widths of the wall portions separating adjacent discharge passages. In the illustrated embodiment, the cross-sections are constant and the discharge passages are straight. The elongated recesses have lengths equal to at least 90% of the corresponding dimensions of the container interior. Each of these characteristics contributes to establishing a relatively uniform flow through the wall of the body 4 forming the container 5.

[0174] The illustrated first flooding device 3 includes an upper masking portion 10 (FIGS. 9 to 11) and a lower masking portion 11 (FIGS. 10 to 14). The upper masking portion 10 and the lower masking portion 11 are each attached to the outer surface 8 of the main body 4. The upper masking portion 10 and the lower masking portion 11 are attached in front of the outflow opening of the discharge passage. Attachment may be by screws or other fasteners.

[0175] The upper masking part 10, the lower masking part 11 and the elongated recess 9 together define an equalization channel 12 (FIG. 5) into which the outlet opening of the discharge passage opens. This equalization channel 12 is elongated and closed at its longitudinal ends.

[0176] The upper masking portion 10, in the illustrated embodiment, has a flat lower surface 13, but for a recess along the proximal edge of the body 4, this recess partially defines the equalization channel 12. The opposite edge of the lower surface 13 is relatively sharp.

[0177] The lower masking part 11 has an upper surface with a flat central portion 14 that is recessed relative to adjacent flat side edge portions 15a, 15b. The flat central portion 14 and the lower surface 13 of the upper masking part 10 therebetween define slits 16 (FIG. 5) that form orifices 17 through which a sheet of liquid is discharged in use.

[0178] Viewed from the outside, the slit 16 has a height, width, and depth. The height can range from 0.5 to 1.5 mm, e.g., 0.6 to 1.3 mm. The depth can be at least 10 mm, e.g., at least 25 mm. This helps ensure that the liquid flow exiting the orifice 17 is directed approximately horizontally upon exiting the orifice 17. The maximum value is not critical, but it can be up to 50 mm. The width decreases from the orifice 17 toward the container-forming body 4. The side edges 18a, 18b (FIG. 12) of the central portion 14 of the upper surface extend at an angle, e.g., between 20 and 40 degrees, relative to the straight leading edge 19. This helps prevent the sheet-like liquid flow exiting the orifice 17 from contracting laterally. The leading edge 19 is relatively sharp to ensure that a clearly defined liquid jet emerges from the orifice 17.

[0179] The height of the slit 16 can be set relatively accurately by placing a gauge between the upper masking part 10 and the lower masking part 11 when attaching them to the main body 4. After the upper masking part 10 and the lower masking part 11 are fixed in place, the gauge is removed to open the slit 16.

[0180] In use, liquid is supplied to the first flooding device 3 by a pump (not shown) through a supply pipe (not shown) connected to the supply conduit 20 via a fitting 21 (FIGS. 3, 4, 7). The supply conduit 20 enters the vessel interior through a sidewall at one longitudinal end of the body 4 and extends through substantially the entire vessel interior to the opposite longitudinal end. The supply conduit 20 is closed at its end. One or more delivery ports are provided along the length of the portion of the supply conduit 20 that extends through the vessel interior. In the illustrated embodiment, these ports comprise a relatively large number of small holes through the lower portion of the portion of the supply conduit 20 that extends through the vessel interior. Furthermore, the inlet opening of the discharge passage is further lowered, making it less likely that air bubbles will be trapped in the discharge passage.

[0181] The first flooding device 3 includes a plurality of overflow ports opening into the interior of the vessel at a level between the level of the inlet opening of the discharge passage and the highest level of the interior of the vessel, which is the highest level that the free surface of the liquid can reach in the absence of overflow ports, which is generally determined by the upper edge of the inner surface of the side wall that bounds the interior of the vessel.

[0182] The overflow ports include a plurality of sidewall overflow ports 22a-22d (FIG. 2) that extend through the sidewall of the body 4 that forms the container 5. The sidewall overflow ports 22a-22d are located on the opposite side of the body 4 that forms the container 5 from the discharge passage and are at a higher level.

[0183] In the illustrated embodiment, the sidewall overflow ports 22a-22d are multiple and arranged in a row at a common level. The sidewall overflow ports 22a-22d have elongated cross-sections with widths greater than their heights when viewed in the direction of flow. The lateral extent of the portion of the sidewall separating adjacent sidewall overflow ports 22a-22d is less than the width of any of the sidewall overflow ports 22a-22d. Compared to providing a single, very wide, slit-shaped overflow port, providing multiple sidewall overflow ports in a row results in a stronger sidewall for a given wall thickness.

[0184] The first flooding device 3 further includes a flow guide 23 attached to an outer surface 24 of the body 4 forming the vessel 5. In the illustrated embodiment, the sidewall overflow ports 22a-22d extend through both the sidewall of the body 4 and the plate-like portion of the flow guide 23. The external orifices of the sidewall overflow ports 22a-22d are formed in the plate-like portion of the flow guide 23. In other embodiments, the flow guide 23 may be positioned at a generally lower level than the sidewall overflow ports 22.

[0185] The external orifices are defined in a surface portion 25 (FIG. 5) that is generally parallel to the exterior surface 24. This parallel flow guide surface portion 25 transitions into an angled flow guide surface portion 26. The angled flow guide surface portion 26 is angled such that its lower end is distal to the parallel flow guide surface portion 25 in which the external orifices of the sidewall overflow ports 22a-22d are defined.

[0186] The angled flow guide surface portion 26 transitions into a finger-shaped surface portion 27 at the lower end of the angled flow guide surface portion 26. The finger-shaped surface portion 27 is curved so that the distal ends of the fingers point downward. The fingers are arranged in a row and spaced apart to break up the liquid flow, thereby increasing aeration.

[0187] Winglets 28a, 28b define upstanding surface portions 29a, 29b that face each other and laterally bound at least the upper portions of parallel flow guiding surface portion 25 and inclined flow guiding surface portion 26. These upstanding surface portions 29a, 29b guide the flow of liquid on inclined flow guiding surface portion 26. Inclined flow guiding surface portion 26 carries away any processing liquid that overflows from first flooding device 3 to a position close enough for the liquid to flow down along the sidewall of a processing station of the processing equipment in which first flooding device 3 is installed.

[0188] The overflow port of the first flooding device 3 further includes an elongated overflow port 30 within an overflow conduit 31 that extends through the interior of the body 4 forming the vessel 5. In the illustrated embodiment, the overflow conduit 31 extends longitudinally through the interior from one end to the other. The elongated overflow port 30 is slightly short.

[0189] In the illustrated embodiment, an elongated overflow port 30 opens inwardly away from the bottom of the interior of the body 4 forming the vessel 5. An overflow conduit 31 extends through a sidewall of the body 4 forming the vessel 5 to an overflow conduit fitting 32. The overflow conduit fitting 32 is connected to a return conduit 33 for returning the treatment liquid to a pump (not shown) or a reservoir in which the pump is located to pump the treatment liquid. One or more filters or settling reservoirs may be interposed between the return conduit 33 and the pump.

[0190] In an alternative embodiment, instead of a single elongated overflow port 30, there may be multiple overflow ports in the overflow conduit 31. A hose may be used in place of the return pipe 33.

[0191] The liquid flow emerging through the slit 16 defined between the upper masking portion 10 and the lower masking portion 11 flows in the form of a curved sheet, with the curvature (i.e., the flow trajectory) being essentially parabolic. The liquid flow emerges essentially horizontally. The velocity is determined solely by hydrostatic pressure. In use, the pump is configured to deliver liquid at a volumetric flow rate higher than the volume of liquid that can exit the first flooding device 3 through the discharge passage at the flow rate dictated by hydrostatic pressure. This ensures that there is always an overflow of processing liquid. The level of the free surface of the liquid inside the body 4 forming the vessel 5 is thereby relatively accurately determined and remains constant despite variations in the rate at which the liquid is delivered by the pump. Therefore, the exit velocity through the orifice 17 defined by the slit 16 formed between the upper masking portion 10 and the lower masking portion 11 is constant. The angle at which the liquid flow impinges on the substrate-holding device 2 is likewise constant.

[0192] The second flooding device 34 (FIGS. 15-25) includes a body 35 that forms a container for holding a liquid. In the illustrated embodiment, the body 35 is made in one piece, but surface treatments, including coatings and anodizing, are possible. The body 35 may be molded or machined and made of metal or polymeric materials, including polymer composites. In certain embodiments, the body 35 may be obtained by both molding and machining.

[0193] The body 35 defines a cavity 36 (FIG. 18). The cavity 36 at least partially defines a container interior 37 and two overflow spaces 38, 39. More specifically, the body 35 defines five-sided surfaces that bound the container interior 37 and the overflow spaces 38, 39. These are on all sides except for one side on which an orifice 40 is provided for delivering liquid as a liquid stream. On that side, the cavity 36 is closed by an upper masking portion 41 and a lower masking portion 42 attached to the exterior of the body 35.

[0194] The upper masking portion 41 and the lower masking portion 42 therefore form the side walls of the container.

[0195] The upper masking portion 41 and the lower masking portion 42 are attached, for example by screws or other fasteners, to a flat outer surface 43 (FIGS. 18, 19) of the body 35. In the illustrated embodiment, grooves 44 are formed, for example machined, in the outer surface 43 for seating one or more sealing elements (not shown).

[0196] A discharge passage is provided through the side wall of the container formed by the upper masking portion 41 and the lower masking portion 42. The discharge passage is defined between the upper masking portion 41 and the lower masking portion 42.

[0197] The discharge passage (FIG. 25) includes a flared portion 45 and a slit 46. The slit 46 forms an orifice 40 for discharging liquid that has passed through the discharge passage as a liquid stream for wetting one major surface of a substrate 1 held by the substrate holder 2 in use. The flared portion 45 interconnects the slit 46 and the vessel interior 37 and flares outwardly in height towards the vessel interior 37. This is achieved by providing chamfers 47, 48 on the upper and lower masking portions 41, 42, respectively.

[0198] The slit 46 has a height, width, and depth as viewed from the outside of the second flooding device 34. The height is uniform between the orifice 40 and the beginning of the flared discharge passage portion 45. The width decreases with increasing depth from the orifice toward the vessel interior 37. The slit 46 ensures that a sheet of liquid is discharged during use.

[0199] The height of the slit 46 may range from 0.5 to 1.5 mm, for example, from 0.6 to 1.3 mm. The depth may be at least 5 mm, for example, from 6 to 12 mm. The depth to height ratio may range from 5 to 15, for example, from 9 to 11 mm, for example, about 10.

[0200] In the illustrated embodiment, a flat portion of the lower surface 49 of the upper masking portion 41 bounds the slit 46. The slit 46 is otherwise defined by a central portion 50 that is recessed relative to the remainder of the upper surface 51 of the lower masking portion 42 (FIGS. 20, 21). This central surface portion 50 extends between two side edges 52a, 52b that are at an angle, e.g., an angle in the range of 20-40°, relative to a straight leading edge 53. This helps prevent lateral contraction of the sheet-like liquid flow emerging from the orifice 40 during use. The surface portion leading edge 53 is relatively sharp to ensure that a well-defined liquid jet emerges from the orifice 40.

[0201] In an alternative embodiment, the upper surface 51 may be flat and the slits 46 may be defined by recesses in the upper masking portion 41 .

[0202] The height of slit 46 can be set relatively accurately by placing a gauge between upper masking portion 41 and lower masking portion 42 when attaching them to main body 35. After upper masking portion 41 and lower masking portion 42 are secured in place, the gauge is removed to open slit 46.

[0203] It will be appreciated that the second flooding device 34 has an elongated shape when viewed from above, as do the body 35 and the vessel interior 37. The orifice 40 is similarly elongated and extends longitudinally. In the illustrated embodiment, the vessel interior 37 is bounded by a flat bottom surface 54.

[0204] The overflow spaces 38, 39 are provided on either side of the container interior 37 in the longitudinal direction. Thus, in the illustrated embodiment (FIG. 19), there are two overflows 55, 56. The discharge passage formed by the flared discharge passage portion 45 and the slit 46 defines an inlet opening that opens only into the container interior 37. There is no direct fluid connection between the overflow spaces 38, 39 and the discharge passage.

[0205] The overflow spaces 38, 39 are separated from the container interior 37 by respective barrier walls 57, 58. In the illustrated embodiment, the barrier walls 57, 58 are integral parts of the body 35. The barrier walls 57, 58 function as weirs that define the overflows 55, 56, which extend across their respective tops 59, 60. The tops 59, 60 are at a height (relative to the bottom surface 54 of the container interior 37) higher than the drain passages. The tops 59, 60 are at a lower level (relative to the bottom surface 54 of the container interior 37) than the upper edges of the side walls through which the drain passages extend, at least the side walls that bound the container interior 37. It will be recalled that in this embodiment, the side walls are formed by the upper masking portion 41 and the lower masking portion 42. Thus, in use, the liquid level can have a free surface at a level higher than the tops 59, 60, which allows liquid in the container interior 37 to overflow into the overflow spaces 38, 39.

[0206] In use, liquid is supplied to the second flooding device 34 by a pump (not shown) via a supply pipe connected to a supply conduit 61 via a fitting 62. The supply conduit 61 opens into the vessel interior 37 through a supply opening 63 in the bottom wall 54 that bounds the vessel interior 37. Thus, there is a relatively steady upward flow of liquid as it overflows via the overflows 55, 56. Stagnation zones in the vessel interior 37 are largely avoided.

[0207] The second flooding device 34 is provided with outflow ports, each opening into one of the overflow spaces 38, 39 via a respective outflow opening 64, 65 (FIG. 19). In the illustrated embodiment, the outflow ports extend through the side wall opposite the wall on which the discharge passage is provided. The outflow openings 64, 65 have at least a lower edge portion at the level of the bottom surface bounding the overflow spaces 38, 39 in which they are arranged to be emptied. Thus, when the operation of the second flooding device 34 is stopped, the overflow spaces 38, 39 can be completely emptied.

[0208] The outflow ports connect the overflow spaces 38, 39 with outflow conduit sections 66, 67 (Figures 15, 16) which are connected to a return conduit 68 for returning overflowed liquid to the pump. In use, the rate at which liquid is supplied is such that the liquid in the second flooding device 34 has an essentially constant level of free surface slightly above the minimum level of the overflows 55, 56, this minimum level being determined by the position of the tops 59, 60 of the barriers 57, 58.

[0209] The pressure of the liquid at the inlet opening formed by the discharge passage formed by the flared discharge passage portion 45 and the slit 46 is determined by the difference in height between the free surface of the liquid and the height of the discharge passage. However, there is a certain distance between the inlet opening and the bottom surface 54 that bounds the vessel interior 37. This improves longitudinal flow uniformity. When the operation of the second flooding device 34 is stopped, liquid should not continue to flow through the slit 46 for a long time. To achieve this, the illustrated second flooding device 34 includes a plurality of displacement bodies 69a-69f (FIGS. 18 and 19) arranged to reduce the volume of the vessel interior 37 available for liquid occupancy while leaving adjacent spaces for liquid to form a liquid column extending to the bottom surface 54. In the illustrated embodiment, the displacement bodies 69a-69f are suspended above the bottom surface 54. Furthermore, the displacement bodies 69a-69f are replaceable and can be removed without actually being replaced.

[0210] In an alternative embodiment, one or more displacement formations are provided which are an integral part of the body and project into the container interior 37 .

[0211] In the illustrated embodiment, the barriers 57, 58 bound the container interior 37 and have surfaces 70, 71 that slope inward (i.e., toward the center of the container interior 37) as the distance to the bottom surface 54 that bounds the container interior 37 increases. This also provides the advantage of allowing the flow of liquid through the drain passage to be stopped more quickly when the supply of liquid to the container interior 37 is stopped.

[0212] The substrate holding device 2 includes a support structure 72 (FIGS. 26 to 28) in the form of a frame which, when viewed perpendicularly to the main surface of the substrate 1, surrounds the substrate 1 on all sides.

[0213] In the illustrated embodiment, the support structure 72 includes laterally projecting arms 73 a, 73 b for engaging a support (not shown) to suspend the support structure 72 within a treatment station of a treatment device. In the illustrated embodiment, the laterally projecting arms 73 a, 73 b have downwardly opening claws 74 a, 74 b formed at their distal ends. These claws 74 a, 74 b can engage horizontally extending pins (not shown) on the respective supports. Examples of such supports are disclosed in WO 2020 / 260389.

[0214] In an alternative embodiment, the support structure 72 may include a hook or similar device for suspending the support structure 72 from an overhead conveyor, which in turn includes components that form supports for suspending the support structure 72 within a station of the treatment device.

[0215] In the illustrated embodiment, the substrate-supporting device 2 includes first and second upper flow guides 75, 76 and first and second lower flow guides 77a, 77b. The first and second lower flow guides 77a, 77b are identical, so only one of them will be described.

[0216] In use, substrate 1 is held in a plane by substrate holder 2. Substrate 1 occupies a planar area bounded by support structure 72. Upper flow guides 75, 76 are supported by support structure 72 and are located on either side of the plane, as are lower flow guides 77a, 77b.

[0217] The first and second upper flow directors 75, 76 form respective arms of an upper clamping device for clamping the substrate 1 near the upper edge of the substrate 1. The lower flow directors 77a, 77b form respective arms of a lower clamping device for clamping the substrate 1 proximate the lower edge of the substrate 1.

[0218] To this end, the first upper flow guide 75 is pivotally mounted to the support structure 72 by protruding upper pivot stubs 78a, 78b (FIG. 29) that define a pivot axis parallel to the plane in which the substrate 1 is held. The upper pivot stubs 78a, 78b are received in holes (not shown in detail) in the support structure 72. Upper biasing devices 79a, 79b (FIG. 36) bias the first upper flow guide 75 toward the second upper flow guide 76, exerting a clamping force. In the illustrated embodiment, the upper biasing devices 79a, 79b are coil springs. In alternative embodiments, they may include other types of elastic elements, gas springs, or magnets.

[0219] Each lower flow director 77 is provided with a protruding lower pivot stub 80 a , 80 b ( FIG. 37 ) for pivotally mounting to the support structure 72 .

[0220] The protruding lower pivot stub 80,b defines a pivot axis parallel to the plane in which the substrate 1 is held. The lower pivot stub 80,b is received in a hole (not shown in detail) in the support structure 72. The lower biasing devices 81a, 81b (FIG. 40) bias the lower flow directors 77a, 77b towards each other to apply the clamping force. In the illustrated embodiment, the lower biasing devices 81a, 81b are again coil springs. Alternative embodiments may include other types of resilient elements, gas springs, or magnets.

[0221] The first upper flow guide portion 75 has an inwardly facing surface 82 and an outwardly facing surface relative to a plane on which, in use, the substrate 1 is positioned to be held. The inwardly facing surface 82 includes a strip 83 for engaging a major surface of the substrate 1 without interruption over the entire longitudinal extent of the strip 83. The remainder of the inwardly facing surface 82 is spaced from the (flat) major surface when the strip 83 contacts that surface.

[0222] The strips 83 are provided with grooves or similar surface structures for better engagement, in other words the surface roughness of the strips 83 is higher than the surface roughness of the rest of the inwardly facing surface 82.

[0223] The outward surface includes an upper outward surface portion 84 that is positioned to direct the flow of processing liquid from one of the first flooding devices 3 a, 3 b or the second flooding device 34. The upper outward surface portion 84 is flat. In use, the upper outward surface portion 84 is oriented substantially parallel to a plane on which the substrate 1 is positioned to be held. This means that in use, the upper outward surface portion 84 is oriented substantially vertically. The distance between the flooding devices 3, 34 and the first upper flow directing portion 75 are such that the flow of liquid impinges on the upper outward surface portion 84 from above at an acute angle.

[0224] The first lower outward surface portion 85 extends from a fold line 86 that forms a transition between the central portion of the upper outward surface portion 84 and a lower edge 87. The first lower outward surface portion 85 is flat. The first lower outward surface portion 85 faces downward, i.e., the lower edge 87 is closer to the plane in which the substrate 1 is held than the fold line 86.

[0225] In the illustrated embodiment, the lower edge 87 is straight.

[0226] A lower edge 87 extends between the side edges of the first lower outward surface portion 85 , and the side edges meet the lower edge 87 at respective corners 88 a , 88 b of the first lower outward surface portion 85 .

[0227] The outward surface of the first upper flow director 75 further includes lateral lower outward surface portions 89a, 89b (FIGS. 28, 30, 31) that are distinct from the first lower outward surface portion 85 and adjacent to the upper outward surface portion 84. Although the transition is at the fold line 86, the lateral lower outward surface portions 89a, 89b face upward. Thus, each lateral lower outward surface portion 89a, 89b extends at an angle α (FIG. 31) that is less than 180° relative to the upper outward surface portion 84. The lateral lower outward surface portions 89a, 89b reinforce the first upper flow director 75 and direct liquid away from the support structure 72.

[0228] Upper outwardly facing surface portion 84 is bounded laterally by opposing surfaces 90 a, 90 b ( FIGS. 30 , 31 , 36 ) that face each other and extend, e.g., laterally, at an angle relative to a plane in which the substrate is configured to be held. Opposing surfaces 90 a, 90 b direct liquid to lower outwardly facing surface portion 85.

[0229] The second upper flow guide portion 76 (FIGS. 32-36) has an inwardly facing surface 91 and an outwardly facing surface relative to a plane in which the substrate 1 is positioned to be held in use. The inwardly facing surface 91 includes a strip 92 for engaging a major surface of the substrate 1 without interruption over the entire longitudinal extent of the strip 92. The remainder of the inwardly facing surface 91 is spaced apart from the (flat) major surface when the strip 92 contacts that surface.

[0230] The strips 92 are provided with grooves or similar surface structures for better engagement, in other words, the surface roughness of the strips 92 is higher than the surface roughness of the rest of the inwardly facing surface 91.

[0231] The outward surface includes an upper outward surface portion 93 along which one of the first flooding devices 3 a, 3 b or the second flooding device 34 is positioned to direct the flow of processing liquid. The upper outward surface portion 93 is flat. In use, the upper outward surface portion 93 is oriented substantially parallel to a plane on which the substrate 1 is positioned to be held. Thus, the upper outward surface portion 93 is oriented substantially vertically. The distance between the flooding devices 3, 34 and the second upper flow directing portion 76 are such that the flow of liquid impinges on the upper outward surface portion 93 from above at an acute angle.

[0232] The second lower outward surface portion 94 extends from a fold line 95 that forms a transition between the central portion of the upper outward surface portion 93 and a lower edge 96. The second lower outward surface portion 94 is flat. The second lower outward surface portion 94 faces downward, i.e., the lower edge 96 is closer to the plane in which the substrate 1 is held than the fold line 95.

[0233] In the illustrated embodiment, the bottom edge 96 is straight.

[0234] A lower edge 96 extends between the side edges of the first lower outward facing surface portion 94 , and the side edges meet the lower edge 96 at respective corners 97 a , 97 b of the first lower outward facing surface portion 94 .

[0235] The outward surface of the first upper flow director 76 further includes lateral lower outward surface portions 98a, 98b adjacent to the upper outward surface portion 93, distinct from the centrally located second lower outward surface portion 94. The transition occurs at the fold 95, but the lateral lower outward surface portions 98a, 98b face upward. Thus, each lateral lower outward surface portion 98a extends at an angle β ( FIG. 35 ) less than 180° relative to the upper outward surface portion 93. This angle β is generally greater than 90°. The lateral lower outward surface portions 98a, 98b reinforce the second upper flow director 76 and direct liquid away from the support structure 72.

[0236] Upper outwardly facing surface portion 93 is bounded laterally by opposing surfaces 99a, 99b (FIG. 33) that face each other and extend, for example laterally, at an angle relative to the plane in which the substrate is configured to be held. The opposing surfaces 99a, 99b direct liquid to lower outwardly facing surface portions 94, 98a, 98b.

[0237] Each lower flow guide 77 (FIGS. 37-40) has an inwardly facing surface 100 and an outwardly facing surface relative to a plane in which the substrate 1 is configured to be held in use. The inwardly facing surface 100 includes an elongated strip 101 for engaging a major surface of the substrate 1 without interruption over the entire longitudinal extent of the strip 101. The remainder of the inwardly facing surface 100 is spaced from the (flat) major surface of the substrate 1 when the strip 101 contacts that surface.

[0238] The strip 101 is provided with grooves or similar surface structures for better engagement, in other words the surface roughness of the strip 101 is higher than the surface roughness of the rest of the inwardly facing surface 100.

[0239] The outwardly facing surface includes an inclined upper outwardly facing surface portion 102 that extends to an upper edge 103 and slopes inwardly towards a plane in which the substrate 1 is placed so as to be held towards the upper edge 103 .

[0240] The sloped upper outwardly facing surface portion 102 is flat in the illustrated embodiment.

[0241] The strip 101 extends longitudinally along the upper edge 103 and laterally to the upper edge 103 .

[0242] An upper edge 103 extends between the side edges of the first sloped upper outward surface portion 102, and the side edges meet the upper edge 103 at first corners 104a, 104b of each sloped upper outward surface portion 102.

[0243] The side edges extend from the first corners 104a, 104b to the respective second corners 105a, 105b (Figure 37), and the sloped upper outward surface portion 102 widens to increase the width of the sloped upper outward surface portion 102.

[0244] The wider portion of the inclined upper outward surface portion 102 is bounded laterally by opposing surfaces 106 (only one of which is visible in the drawings) that face each other and extend, e.g., laterally, at an angle relative to a plane in which the substrate 1 is configured to be held. The plate-like segments 107 a, 107 b that define the opposing surfaces 106 are interconnected to the plate-like segments that define the oblique upper outward surface portion 102 by respective webs 108 a, 108 b that extend at an angle relative to both of them.

[0245] The lower outward surface portion 109 extends from a fold 110 that forms a transition between the sloped upper outward surface portion 102 and the lower outward surface portion 109. The lower outward surface portion 109 is flat. In use, the lower outward surface portion 109 is oriented approximately parallel to a plane in which the substrate 1 is placed to be held. In either case, the sloped upper outward surface portion 102 and the lower outward surface portion 109 extend at an angle greater than 90° to each other. The lower outward surface portion 109 primarily serves a shielding function to direct liquid away from the support structure.

[0246] In use, processing liquid is directed onto the upper outward surface portion 84, 93 of one of the first and second upper flow directors 75, 76, from where it flows as a uniform film stream over the lower outward surface portions 85, 94 onto the major surface of the substrate 1. The film stream then continued onto the sloped upper outward surface portion 102 of the lower flow director 77 before dropping from the substrate holder 2. The liquid is then collected for recirculation, optionally after filtration or another type of treatment. Substantially, the entire exposed area of ​​the major surface of the substrate 1 is relatively uniformly wetted.

[0247] The present invention is not limited to the above-described embodiments and may be modified within the scope of the appended claims. For example, the second upper flow guide portion 76 may pivot relative to the support structure 72 in the same manner as the first upper flow guide portion 75 in an alternative embodiment. [Explanation of symbols]

[0248] 1 board 2 Substrate holding device 3. First flooding device 4 Main unit 5 containers 6a~6d Upper wall opening 7 Cover 8 Anterolateral surface 9. Long, narrow recess 10 Upper masking part 11 Lower masking part 12 Equalization Channels 13 Underside of upper masking part 14 Center of the top surface of the lower masking part 15a, 15b Upper surface portions of the lower masking portion at the side end portions 16 Slit 17 Orifice 18a, 18b Side edges of the central portion of the upper surface of the lower masking part 19 Front edge of the center part of the upper surface of the lower masking part 20 Supply conduit 21 Supply fitting 22a~22d Sidewall overflow ports 23 Flow Guide 24 Posterolateral surface 25 parallel flow guide surface area 26 Inclined flow guide surface 27 Finger-shaped surface 28a, 28b Winglets 29a, 29b Upright surface area 30 Long and narrow overflow port 31 Overflow conduit 32 Overflow conduit fitting 33 Return pipe 34 Second flooding device 35 Main Unit 36 Cavity 37 Inside the container 38 First Overflow Space 39 Second Overflow Space 40 Orifice 41 Upper masking part 42 Lower masking part 43 Outer surface of the main body 44 Outer groove 45 Flare discharge passage 46 Slit 47 Chamfering of upper masking part 48 Chamfering of lower masking part 49 Underside of upper masking part 50 Central surface area 51 Upper surface of lower masking part 52a, 52b side surface edge 53 Front edge of surface 54 bottom 55 First Overflow 56 Second Overflow 57 The First Barrier 58 The Second Barrier 59 Top of the First Barrier 60 Top of the second barrier 61 Supply conduit 62 Supply joint 63 Supply opening 64 First Outlet Opening 65 Second Outlet Opening 66 First Outlet Conduit Section 67 Second Outlet Conduit Section 68 Return conduit 69a~69f Displacement body 70 First Barrier Surface 71 Second Barrier Surface 72 Support structure 73a, 73b arms 74a, 74b Nails 75 First upper flow guide 76 Second upper flow guide 77a, 77b Lower flow guide section 78a, 78b pivot stub 79a, 79b Upper biasing device 80a, 80b Pivot stub of lower flow guide 81a, 81b Lower biasing device 82 Inward-facing surface of first upper flow guide 83 Strip on the inward surface of the first upper flow guide 84 upper outward surface portion of the first upper flow guide 85 Lower outward surface portion of first upper flow guide 86 Fold on the outward surface of the first upper flow guide 87 Lower edge of first upper flow guide 88a, 88b Corners of the lower outward surface portion of the first upper flow guide portion 89a, 89b: Lateral lower outward surface portion of the first upper flow guide portion 90a, 90b: Opposing surfaces of the first upper flow guide portion 91 Inward-facing surface of second upper flow guide 92 Strip on the inward surface of the second upper flow guide 93 Upper outward surface portion of second upper flow guide 94 Lower outward surface portion of second upper flow guide 95 Folds on the outward surface of the second upper flow guide 96 Lower edge of second upper flow guide 97a, 97b Corners of the lower outward surface portion of the second upper flow guide 98a, 98b: Lateral lower outward surface portion of the second upper flow guide portion 99a, 99b: Opposing surfaces of the second upper flow guide portion 100 Inward-facing surface of lower flow guide 101 Strip on the inward surface of the lower flow guide 102 Sloped upper outward surface portion 103 Upper edge of lower flow guide 104a, 104b first corner 105a, 105b second corners 106 Opposing surface of lower flow guide 107a, 107b Plate-shaped segments of the lower flow guide 108a, 108b Web 109 Lower outward surface portion of the lower flow guide 110 Folds on the outward surface of the lower flow guide

Claims

1. 1. An apparatus for delivering a flow of liquid to wet the surface of a vertically held planar substrate (1), comprising: the device comprises a container (5) for holding a liquid, the container (5) includes at least one discharge passageway through a sidewall of the container (5), each defining a respective inlet opening opening into the interior (37) of the container (5); the device is provided with at least one orifice (17; 40) on the exterior of the device for delivering the liquid passing through at least one of the discharge passages as said flow, said device is provided with at least one delivery port opening into said interior (37) of said container (5) and in liquid communication with at least one connecting device (21; 62) for connecting said device to a supply conduit (61) for supplying liquid to said device; characterized by comprising at least one overflow opening opening into the interior (37) of the container (5) at a level between the at least one discharge passage inlet opening and the highest level of the container interior (37) for conducting liquid from the interior (37) of the container (5), Device.

2. The number of the discharge passages is plural.

10. The apparatus of claim 1.

3. the orifice (17; 40) is formed by a slit (16; 46), 3. The device according to claim 1 or 2.

4. the discharge passages defining respective outlet openings on opposite ends of the discharge passages to the respective inlet openings; the device includes a channel (12) extending parallel to and in liquid communication with the slit (16), the outlet opening opening into the channel (12); 4. The device according to claim 3, which relies on claim 2.

5. the discharge passages defining respective outlet openings on opposite ends of the discharge passages to the respective inlet openings; the device comprises at least a first masking part (10, 11) attached separately from the container (5) to the outside of the container (5) in front of the outlet opening, the slit (16) is defined between the first masking portion (10, 11) and one of a second masking portion (10, 11) attached to the exterior of the container (5) and a protruding portion of the container (5); 5. The device according to claim 3 or 4.

6. the slit (16) has a height, a width, and a depth when viewed from the outside of the device; said width decreasing with increasing depth in the direction from said orifice (17) to said container (5); 6. An apparatus according to any one of claims 3 to 5.

7. the at least one overflow comprises at least one overflow port (22a-22d) extending through a sidewall of the vessel (5); 7. An apparatus according to any one of claims 1 to 6.

8. the at least one overflow comprises at least one overflow port (30) defined in a conduit (31) extending through at least a portion of the interior (37) of the vessel (5), e.g., at least one overflow port (30) opening into the interior (37) of the vessel (5) in a direction away from a bottom of the interior (37); 8. An apparatus according to any one of claims 1 to 7.

9. the at least one overflow includes at least one overflow port (30) in liquid communication with a connecting device (32) for connecting to a conduit (33) for carrying liquid overflowing into the at least one overflow port (30) away from the device; At least the interior (37) of the container (5) has an elongated shape when viewed from above, At least one, e.g. all, of the discharge passages extend through the side wall of the longer side of the interior (37) of the container (5).

9. An apparatus according to any one of claims 1 to 8.

10. A system for delivering a flow of liquid to wet the surface of a vertically held planar substrate (1), comprising: For example, in the form of a device according to any one of claims 1 to 9, at least one flooding device (3; 34), Each flooding device (3; 34) comprises a container (5) for holding a liquid, the container (5) includes at least one discharge passageway through a sidewall of the container (5), each defining a respective inlet opening opening into the interior (37) of the container (5); a flooding device (3; 34) provided with at least one orifice (17; 40) external to said device (3) for delivering the liquid passing through at least one of said discharge passages as said flow; a liquid supply system for supplying liquid to the interior (37) of the vessel (5) of each flooding device (3; 34), the system is configured to maintain the level of the free surface of the liquid in the interior (37) of the vessel (5) of each flooding device (3; 34) at a level between the inlet opening of the at least one discharge passage and the highest level of the interior (37) of the vessel (5), system.

11. 23. An apparatus for non-immersion wet chemical processing of a planar substrate (1), comprising: at least one substrate holding device (2); at least one processing station; at least one support for at least suspending the substrate holding device (2) in the processing station; and at least one system according to claim 22, arranged in the processing station, for directing a flow of liquid onto at least one of the substrate (1) and the substrate holding device (2).

12. A method for manufacturing a device (3) according to claim 5 or 6, comprising the steps of: providing said container (5) and at least said first masking portion (10, 11); placing a gauge having a dimension defining the height of the slit (16) as viewed in the flow direction between the first masking portion (10, 11) and one of the protrusions of the container (5) defining the second masking portion (10, 11) and the slit (16); fixing at least the first masking part (10, 11) to the container (5); removing the gauge from the slit (16); A method comprising:

13. A method for wetting the surface of a vertically held planar substrate (1), comprising: A liquid is supplied to at least one device (3; 34) according to any one of claims 1 to 9, the flow rate of the liquid supplied to the device (3; 34) is at least equal to the total flow rate of liquid through the at least one discharge passage, method.

14. Attaching the substrate (1) to a substrate holding device (2) including a support structure (72) and at least one clamping device supported by the support structure (72) for holding the substrate (1) in a plane; suspending the support structure (72) to hold the substrate (1) in an upright orientation; directing the liquid flow onto an upper outward surface portion (84) of an outward surface of an upper flow guide (75) disposed on one side of the plane, the outward surface facing outward relative to the plane, and establishing a film flow on the upper outward surface portion (84) on the main surface of the substrate (1); The method of claim 13.

15. 15. A method according to claim 14, comprising the use of an apparatus according to claim 11.

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