Reflective Coating

Abstract

The coated article includes a substrate and a metallic functional layer on at least a portion of the substrate. The metallic functional layer comprises a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. Another coated article includes a glass substrate and a coating on at least a portion of the substrate. The coating includes a dielectric layer, a metallic functional layer, and a protective layer. The present invention also provides a method of making the coated article.

Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims priority to U.S. Provisional Application No. 63 / 406,330, filed September 14, 2022, and U.S. Patent Application No. 18 / 244,958, filed September 12, 2023, the disclosures of which are incorporated herein by reference in their entireties.

[0002] Background of the Invention FIELD OF THE INVENTION The present invention generally relates to a coated article comprising a substrate and a metallic functional layer comprising a metal alloy and a method of making the coated article. [Background technology]

[0003] High-temperature manufacturing processes, such as pyrolytic spraying, can enable coatings to be mechanically and chemically durable enough to be used on the first surface of architectural glass windows. However, the coatings can be rough with low film quality, and this spraying technique does not allow for precise control of material quality and thickness. Alternatively, magnetron sputtering deposition (MSVD) is an advanced technology for both material quality and thickness and composition uniformity. Typical MSVD coatings are soft due to the low-temperature process and do not have excellent durability properties. Therefore, it would be desirable to provide a coating that can be deposited by MSVD that has enhanced chemical and mechanical durability.

[0004] A smart mirror (also called a two-way mirror or one-way mirror) is a reciprocal mirror that is reflective on one side and transparent on the other. A sense of unidirectional transmission is achieved when one side of the mirror is brightly illuminated and the other side is dark. This allows for viewing from the darkened side, but not vice versa. Light always travels equally in both directions, but if one side is brightly illuminated and the other side is kept dark, it becomes difficult to see from the brightly lit side because the darker side is obscured by the much brighter reflection of the illuminated side.

[0005] Smart mirrors have several useful applications. For example, placing a smart mirror in front of the display of an electronic device such as a computer or TV allows the user to see the information behind it when the display is activated due to the transparency of the smart mirror, but the information on the display cannot be seen due to the high reflectivity of the front surface and the darkness of the display on the other side. Another application of smart mirrors is in police interrogation rooms. In this case, the smart mirror can allow a police officer to view a suspect being interrogated in a well-lit room, while allowing many other officers to closely observe the suspect from another dark room through a one-way mirror. The suspect cannot see the police officer in the dark room, but the police officer can see the suspect through the smart mirror. Summary of the Invention

[0006] The coated article of the present invention comprises a substrate and a metallic functional layer on at least a portion of the substrate, the metallic functional layer comprising a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys.

[0007] Another coated article of the present invention comprises a glass substrate and a coating on at least a portion of the substrate. The coating comprises a dielectric layer on the substrate, a metal functional layer, and a protective layer on the metal functional layer. The metal functional layer comprises a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys.

[0008] The present invention also relates to a method of making a coated article, comprising providing a substrate and forming a metallic functional layer on at least a portion of the substrate. The metallic functional layer comprises a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. The metallic functional layer is formed by a process comprising depositing the metal alloy by magnetron sputtering deposition.

[0009] The present invention also relates to a method for making a coated article, the method comprising providing a substrate and forming a coating on at least a portion of the substrate. The coating comprises a dielectric layer on the substrate, a metallic functional layer, and a protective layer on the metallic functional layer. The metallic functional layer comprises a metallic alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. The metallic functional layer is formed by a process comprising depositing the metallic alloy by magnetron sputtering deposition.

[0010] The present invention will now be described with reference to the following drawings, in which like reference numerals identify like parts throughout. [Brief explanation of the drawings]

[0011] [Figure 1A] FIG. 1A is a side view (not to scale) of a substrate having a coating of the present invention.

[0012] [Figure 1B] FIG. 1B is a side view (not to scale) of an insulating glass unit (IGU) having a coating of the present invention.

[0013] [Figure 2] FIG. 2 is a side view (not to scale) of a coating incorporating features of the present invention.

[0014] [Figure 3]FIG. 3 is a side view (not to scale) of another coating incorporating features of the present invention.

[0015] [Figure 4] FIG. 4 is a side view (not to scale) of another coating incorporating features of the present invention.

[0016] [Figure 5] FIG. 5 is a side view (not to scale) of another coating incorporating features of the present invention.

[0017] [Figure 6] FIG. 6 is a side view (not to scale) of another coating incorporating features of the present invention.

[0018] [Figure 7] FIG. 7 is a side view (not to scale) of another coating incorporating features of the present invention.

[0019] [Figure 8] FIG. 8 is a side view (not to scale) of another coating incorporating features of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0020] As used herein, spatial or directional terms such as "left," "right," "inside," "outside," "top," and "bottom" refer to the present invention as shown in the drawings. However, it should be understood that the present invention can assume various alternative orientations, and therefore, such terms should not be considered limiting. Furthermore, as used herein, all numbers used in the specification and claims expressing dimensions, physical properties, processing parameters, quantities of ingredients, reaction conditions, and the like, should be understood to be modified in all instances by the term "approximately." Accordingly, unless indicated to the contrary, the numerical values ​​set forth in the following specification and claims may vary depending upon the desired properties sought to be obtained by the present invention. At the very least, and without attempting to limit the application of the doctrine of equivalents to the claims, each numerical value should be construed at least in light of the number of reported significant digits and by applying ordinary rounding techniques. Furthermore, all ranges disclosed herein should be understood to encompass the beginning and end values ​​of the range, as well as any subranges subsumed within that range. For example, a range stated as "1 to 10" should be considered to include all subranges between (and including) the minimum value of 1 and the maximum value of 10, i.e., all subranges beginning with a minimum value of 1 or greater and ending with a maximum value of 10 or less, e.g., 1 to 3.3, 4.7 to 7.5, 5.5 to 10, etc. Furthermore, as used herein, the terms "formed on," "deposited on," or "provided on" mean formed, deposited, disposed, or provided on a surface, but not necessarily in contact with the surface. For example, a coating layer "formed on" a substrate does not exclude the presence of one or more other coating layers or films of the same or different composition located between the formed coating layer and the substrate. As used herein, the terms "polymer" or "polymeric" include oligomers, homopolymers, copolymers, and terpolymers, e.g., polymers formed from two or more types of monomers or polymers. The terms "visible region" or "visible light" refer to electromagnetic radiation having wavelengths ranging from 380 nm to 800 nm.The terms "infrared region" or "infrared radiation" refer to electromagnetic radiation having wavelengths ranging from greater than 800 nm to 100,000 nm. The terms "ultraviolet region" or "ultraviolet radiation" refer to electromagnetic energy having wavelengths ranging from 300 nm to less than 380 nm. Furthermore, all documents referenced herein, including but not limited to issued patents and patent applications, are to be considered "incorporated by reference" in their entirety. As used herein, the term "film" refers to a coating region of a desired or selected coating composition. A "layer" can include one or more "films," and a "coating" or "coating stack" can include one or more "layers." The terms "metal" and "metal oxide" include silicon and silica, respectively, as well as conventionally recognized metals and metal oxides, although silicon is sometimes not traditionally considered a metal. Thickness values ​​are geometric thickness values ​​unless otherwise indicated.

[0021] The description of the invention may describe certain features as "particularly" or "preferably" within certain limitations (e.g., "preferably," "more preferably," or "most preferably" within certain limitations). It is to be understood that the invention is not limited to these particular or preferred limitations, but rather encompasses the full scope of the present disclosure.

[0022] As used herein, the weight percentage (wt %) of a metal oxide, metal alloy, metal nitride, or metal oxynitride is based on the total weight of the metal component and excludes the weight of any oxide, nitride, or oxynitride component. As will be readily understood by those skilled in the art, the weight percentage of a metal functional layer as used herein refers to the weight percentage of the metal target used to deposit the metal functional layer.

[0023] The present invention relates to a coated article. The coated article may be a smart mirror. A smart mirror (also called a two-way mirror or one-way mirror) is a reciprocal mirror that is reflective on one side and transparent on the other side. The coated article comprises a substrate. A metal functional layer is on at least a portion of the substrate. The metal functional layer comprises a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. Optionally, the coated article may also have a protective layer, a base layer, or a dielectric layer. For example, the coated article comprises a substrate coated with a coating (FIG. 1A). The coating comprises a dielectric layer, a metal functional layer, a protective layer, and optionally a second dielectric layer and / or a base layer.

[0024] Coated article 10 includes substrate 12. Substrate 12 can be of any desired material having any desired characteristics, such as being opaque, semi-transparent, or transparent to visible light. For example, substrate 12 can be transparent or semi-transparent to visible light. "Transparent" means having a visible light transmittance of greater than 0% to 100%. Alternatively, substrate 12 can be semi-transparent. "Semi-transparent" means allowing electromagnetic energy (e.g., visible light) to pass through but dissipating this energy such that objects on the opposite side of the viewer cannot be clearly seen. Examples of suitable materials include, but are not limited to, plastic substrates (such as acrylic polymers such as polyacrylates; polyalkyl methacrylates such as polymethyl methacrylate, polyethyl methacrylate, polypropyl methacrylate; polyurethanes; polycarbonates; polyalkyl terephthalates such as polyethylene terephthalate (PET), polypropylene terephthalate, polybutylene terephthalate; polysiloxane-containing polymers; or copolymers of any monomers therefor, or any mixtures thereof); ceramic substrates; glass substrates; or mixtures or combinations of any of the above. For example, the substrate 12 can be conventional soda-lime silicate glass, borosilicate glass, or lead glass. The glass can be clear glass. "Clear glass" means untinted or uncolored glass. Alternatively, the glass can be tinted or otherwise colored glass. The glass can be annealed or heat-treated glass. As used herein, the term "heat-treated" means tempered or at least partially tempered. The glass can be of any type, such as conventional float glass, and of any composition with any value of optical properties, such as visible transmittance, ultraviolet transmittance, infrared transmittance, and / or total solar energy transmittance. "Float glass" means glass formed by the conventional float process in which molten glass is deposited onto a molten metal bath and controllably cooled to form a float glass ribbon.Examples of float glass processes are disclosed in US Pat. No. 4,466,562 and US Pat. No. 4,671,155.

[0025] Substrate 12 may comprise, for example, clear float glass, or may be tinted or colored glass. Substrate 12 may be of any desired dimensions, such as length, width, shape, or thickness. In one non-limiting embodiment, substrate 12 may be 1 mm to 30 mm thick, such as 2.5 mm to 25 mm thick, such as 2.5 mm to 10 mm thick.

[0026] In some embodiments, substrate 12 can be monolithic glass. "Monolithic" means having a single structural support or member, e.g., having a single substrate.

[0027] The coated article has a metallic functional layer 60 deposited on at least a portion of a major surface of the substrate 12. The metallic functional layer 60 provides (a) reflectance of electromagnetic radiation in at least a portion of the infrared radiation region of the electromagnetic spectrum, e.g., in the solar infrared radiation region and / or the thermal infrared radiation region of the electromagnetic spectrum, and / or (b) absorbance of electromagnetic radiation in one or more regions of the electromagnetic spectrum, e.g., at least a portion of the visible radiation region and / or the infrared radiation region and / or the ultraviolet radiation region of the electromagnetic spectrum. The metallic functional layer 60 can comprise a metal alloy, such as, but not limited to, a metal alloy comprising silicon and / or cobalt. Non-limiting examples of suitable metal alloys include silicon-aluminum alloys and silicon-cobalt alloys.

[0028] In some embodiments, the metal functional layer 60 may be substantially free, essentially free, or completely free of iron. As used in this context, the term "substantially free" means that the metal functional layer contains less than 1% iron by weight, "essentially free" means that the metal functional layer contains less than 0.1% iron by weight, and "completely free" means that the metal functional layer contains less than 0.01% iron by weight.

[0029] In another exemplary embodiment, the metal functional layer 60 comprises silicon. For example, the metal functional layer 60 can comprise a metal alloy comprising 50% to 99%, 60% to 99%, 75% to 99%, 80% to 99%, 85% to 99%, or 90% to 99% silicon by weight. In one non-limiting embodiment, the metal functional layer 60 comprises a silicon-aluminum alloy comprising 70% to 100% silicon and 0% to 30% aluminum by weight, e.g., 80% to 95% silicon and 5% to 20% aluminum by weight, e.g., 85% to 99% silicon and 1% to 15% aluminum by weight, e.g., 85% to 95% silicon and 5% to 15% aluminum by weight, or 90% to 95% silicon and 5% to 10% aluminum by weight.

[0030] In another exemplary embodiment, the metal functional layer includes silicon and cobalt. For example, the metal functional layer 60 includes a metal alloy including 30% to 85% by weight of silicon and 15% to 70% by weight of cobalt, such as 50% to 90% by weight of silicon and 10% to 50% by weight of cobalt, such as 50% to 70% by weight of silicon and 30% to 50% by weight of cobalt, for example, 65% to 75% by weight of silicon and 25% to 35% by weight of cobalt.

[0031] The metal functional layer 60 can have any desired thickness, such as in the range of 1 nanometer (nm) to 100 nm, 5 nm to 50 nm, 10 nm to 50 nm, 10 nm to 45 nm, 20 nm to 40 nm, 20 nm to 50 nm, 20 nm to 60 nm, 30 nm to 45 nm, 10 nm to 35 nm, or 20 nm to 30 nm.

[0032] The coated article 10, for example, in the non-limiting embodiment shown in FIG. 2, can include a protective layer 80 deposited on the metal functional layer 60 to help protect underlying layers, such as the metal functional layer, from mechanical and chemical attack during processing. The protective layer 80 can be the outermost layer of the coating 30. The protective layer 80 can be an oxygen barrier coating layer to prevent or reduce the passage of ambient oxygen into the underlying layers of the coating 30, such as during heating or flexing. The protective layer 80 can be of any desired material or mixture of materials. For example, the protective layer can comprise a metal oxide layer, a metal nitride layer, or a mixture thereof. In one exemplary embodiment, the protective layer 80 can include a layer having one or more metal oxide materials, such as, but not limited to, oxides of aluminum, silicon, or mixtures thereof. For example, the protective coating 80 may comprise a range of 0 wt. % to 100 wt. % alumina and / or 100 wt. % to 0 wt. % silica, e.g., 5 wt. % to 95 wt. % alumina and 95 wt. % to 5 wt. % silica, e.g., 10 wt. % to 90 wt. % alumina and 90 wt. % to 10 wt. % silica, e.g., 15 wt. % to 90 wt. % alumina and 85 wt. % to 10 wt. % silica, e.g., 50 wt. % to 75 wt. % alumina and 50 wt. % to 25 wt. % silica, e.g., 50 wt. % to 70 wt. % alumina and 50 wt. % to 30 wt. % silica, e.g., 35 wt. % to 10 wt. % silica. The coating layer may be a single coating layer containing 0% by weight of alumina and 65% to 0% by weight of silica, for example, 70% to 90% by weight of alumina and 30% to 10% by weight of silica, for example, 75% to 85% by weight of alumina and 25% to 15% by weight of silica, for example, 88% by weight of alumina and 12% by weight of silica, for example, 65% to 75% by weight of alumina and 35% to 25% by weight of silica, for example, 70% by weight of alumina and 30% by weight of silica, for example, 60% to less than 75% by weight of alumina and more than 25% to 40% by weight of silica.Other materials, such as aluminum, chromium, hafnium, yttrium, nickel, boron, phosphorus, titanium, zirconium, and / or oxides thereof, can also be present, such as to adjust the refractive index of protective layer 80. In one non-limiting embodiment, the refractive index of protective layer 80 can be in the range of 1 to 3, such as 1 to 2, such as 1.4 to 2, such as 1.4 to 1.8.

[0033] In one non-limiting embodiment, the protective layer 80 is a combination silica and alumina coating. The protective coating 80 can be sputtered from two cathodes (e.g., one silicon and one aluminum) or from a single cathode containing both silicon and aluminum. This silicon oxide / aluminum protective layer 80 is a combination of Si x Al 1-x O (1.5+x) / 2 where x can vary from greater than 0 to less than 1.

[0034] In another non-limiting embodiment, protective layer 80 comprises a combination of titania and alumina.

[0035] In one non-limiting embodiment, the protective layer 80 is silicon oxide (SiO x ), silicon nitride (Si3N4 or SiN x ), silicon oxynitride (SiO x N y ), silicon aluminum oxide (SiAlO x ), silicon aluminum nitride (SiAlN x ), silicon aluminum oxynitride (SiAlO x N y), mixtures thereof, and / or alloys thereof, which may impart increased durability to the metal functional layer 60. The protective layer 80 may be formed from silicon nitride deposited with other materials having better electrical conductivity to improve silicon sputtering. For example, during deposition, the silicon cathode may contain a small amount of aluminum (e.g., up to 20 wt %, up to 15 wt %, up to 10 wt %, or up to 5 wt %) to improve sputtering. In that case, the resulting silicon nitride protective layer contains a small percentage of aluminum, e.g., up to 15 wt %, e.g., up to 10 wt % aluminum, e.g., up to 5 wt % aluminum. A coating layer deposited from a silicon cathode having up to 10 wt % aluminum (added to increase the cathode's electrical conductivity) is referred to herein as a "silicon nitride" layer, even though a small amount of aluminum may be present. It is believed that small amounts of aluminum in the cathode (e.g., 15% by weight or less, e.g., 10% by weight or less, e.g., 5% by weight or less) form aluminum nitride in a predominantly silicon nitride protective layer 80. Protective layer 80 may be formed in a nitrogen atmosphere, although it should be understood that other gases, such as oxygen, may be present in the atmosphere during deposition of protective layer 80.

[0036] The protective layer 80 can be of any desired thickness. The protective layer 80 can have a thickness ranging from 1 nm to 250 nm, 1 nm to 150 nm, 5 nm to 150 nm, 10 nm to 120 nm, 100 nm to 140 nm, 5 nm to 70 nm, 30 nm to 70 nm, 5 nm to 30 nm, or 10 nm to 30 nm. The protective layer 80 is the outermost layer of the coated article. Furthermore, the protective layer 80 can be of a non-uniform thickness. By "non-uniform thickness," we mean that the thickness of the protective layer 80 can vary over a given unit area, e.g., the protective layer 80 can have high and low spots or regions.

[0037] In another non-limiting embodiment, the protective layer 80 can be a multilayer coating comprising a first film and a second film formed on the first film. The first film can include alumina, silica, titania, zirconia, tin oxide, or a mixture thereof. In one specific non-limiting embodiment, the first film can include alumina or a mixture or alloy including alumina and silica. For example, the first film can include more than 5 wt.% alumina, e.g., more than 10 wt.% alumina, e.g., more than 15 wt.% alumina, e.g., more than 30 wt.% alumina, e.g., more than 40 wt.% alumina, e.g., 50 wt.%-70 wt.% alumina, e.g., a silica / alumina mixture having a range of 60 wt.%-100 wt.% alumina and 0 wt.%-40 wt.% silica, e.g., 60 wt.% alumina and 40 wt.% silica. In another example, the first layer can include zinc stannate. In another example, the first film can include zirconia. In one non-limiting embodiment, the first film can have a thickness in the range of greater than 0 nm to 1000 nm, for example, 10 nm to 25 nm, for example, 10.1 nm to 25 nm, for example, 15 nm to 20 nm, for example, 16 nm.

[0038] The second film of the protective layer 80 may include, for example, a metal oxide or a metal nitride. The second film may be titania, alumina, silica, zirconia, tin oxide, a mixture thereof, or an alloy thereof. For example, the second film may include a mixture of titania and alumina; a mixture of titania and silica; or zirconia. Examples of the second film include a titania / alumina mixture having 40% to 60% by weight alumina and 40% to 60% by weight titania; 45% to 55% by weight alumina and 45% to 55% by weight titania; 48% to 52% by weight alumina and 48% to 52% by weight titania; 49% to 51% by weight alumina and 49% to 51% by weight titania; or 50% by weight alumina and 50% by weight titania. An example of the second film may include titanium aluminum oxide (TiAlO). Another example of the second film is a silica / alumina mixture having more than 40% by weight silica, for example, more than 50% by weight silica, for example, more than 60% by weight silica, for example, more than 70% by weight silica, for example, more than 80% by weight silica, for example, a silica / alumina mixture having a range of 80% to 90% by weight silica and 10% to 20% by weight alumina, for example, 85% by weight silica and 15% by weight alumina. In one non-limiting embodiment, the second film can have a thickness in the range of more than 0 nm to 2,000 nm, for example, 5 nm to 500 nm, for example, 5 nm to 200 nm, for example, 10 nm to 100 nm, for example, 20 nm to 50 nm, for example, 22 nm to 35 nm, for example, 22 nm. Non-limiting examples of suitable protective layers are described, for example, in U.S. Patent Application Publication Nos. 2004 / 0106017; 2002 / 0172775; 2003 / 0228484; 2004 / 0023080; 2004 / 0023038; and 2003 / 0228476.

[0039] In a non-limiting example, the protective layer 80 can include an additional third film formed on the second film. This third film can be any of the materials used to form the first or second film. The third film can include, for example, alumina, silica, titania, zirconia, tin oxide, or a mixture thereof. For example, the third film can include a mixture of silica and alumina. In another example, the third film includes zirconia.

[0040] In one non-limiting embodiment, the coated article can include a base layer 50 deposited over the substrate 12 and below the metallic functional layer 60, as shown, for example, in FIG. 3. The base layer 50 can impart various performance benefits to the coated article, such as acting as a sodium ion barrier between the substrate 12 and the overlying coating layer. The base layer 50 can include any of the materials described above with respect to the outermost protective layer 80. For example, the base layer can be made of tin oxide (SnO x ), silicon oxide (SiO x ), silicon nitride (Si3N4 or SiN x ), silicon oxynitride (SiO x N x ), silicon aluminum oxide (SiAlO x ), silicon aluminum nitride (SiAlN x ), silicon aluminum oxynitride (SiAlO x N x ), mixtures thereof, and / or alloys thereof. Base layer 50 can be a multi-layer coating comprising a first film and a second film formed on the first film. In one non-limiting embodiment, the base layer comprises one or more films, each film comprising SnO x , SiO x , Si3N4, SiO x N x , SiAlO x , SiAlN x or SiAlO x N xFor example, the base layer may comprise two films, each of which is SiAlO x or SiAlN x Includes.

[0041] In one non-limiting embodiment, base layer 50 may be comprised of a film of a metal nitride, such as Si3N4 and / or SiAlN, disposed over and in contact with a film of a metal oxynitride, such as SiAlON. Examples of metal oxynitride films may also or alternatively include alloys and / or mixtures of metal nitrides.

[0042] The base layer 50 can be of any desired thickness. The base layer 50 can have a thickness in the range of 1 nm to 250 nm, 1 nm to 150 nm, 5 nm to 150 nm, 10 nm to 120 nm, 15 nm to 100 nm, 30 nm to 110 nm, 100 nm to 140 nm, 70 nm to 110 nm, or 30 nm to 80 nm.

[0043] In one non-limiting embodiment, the coated article can include at least one dielectric layer. For example, a dielectric layer 40 can be deposited on the substrate 12 and below the metal functional layer 60, as shown, for example, in Figures 4, 5, and 6. As shown in Figures 4 and 5, the dielectric layer 40 can be deposited directly on the substrate 12 and below the metal functional layer 60. In another embodiment, the coated article 10 includes a dielectric layer 40 deposited directly on the substrate 12 and below the base layer 50 (Figure 6).

[0044] Alternatively, the coated article 10 can include a dielectric layer 70 deposited directly above the metal functional layer 60 and below the protective layer 80 (FIG. 7). In another non-limiting embodiment, the dielectric layer 70 is directly above the protective layer 80 and is the outermost layer (FIG. 8).

[0045] The dielectric layer(s) 40, 70 can be a single layer or can comprise more than one film of an antireflective and / or dielectric material, such as, but not limited to, a metal oxide, an oxide of a metal alloy, a metal nitride, a metal oxynitride, or a mixture thereof. The dielectric layer(s) 40, 70 can be transparent to visible light. Examples of suitable metal oxides for the dielectric layer(s) 40, 70 include oxides of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, and mixtures thereof. These metal oxides can have small amounts of other materials, such as manganese in bismuth oxide or tin in indium oxide. Additionally, oxides containing zinc and tin (e.g., zinc stannate, as defined below), oxides of indium-tin alloys, metal alloys, or metal mixtures can be used, such as silicon nitride, aluminum silicon nitride, or aluminum nitride. Additionally, doped metal oxides can be used, such as antimony- or indium-doped tin oxide or nickel- or boron-doped silicon oxide. The dielectric layer(s) 40, 70 may be a metal oxide film, e.g., a substantially single-phase film such as zinc stannate, or may be a mixture of phases composed of zinc and tin oxides, or may be composed of multiple films. For example, the dielectric layer(s) may comprise one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

[0046] The dielectric layer(s) 40, 70 (whether a single film or multiple film layers) can have any thickness, such as in the range of 1 nm to 200 nm, 1 nm to 150 nm, 1 nm to 100 nm, 5 nm to 140 nm, 5 nm to 100 nm, 10 nm to 50 nm, 30 nm to 70 nm, 80 nm to 120 nm, 100 nm to 140 nm, or 1 nm to 10 nm.

[0047] The reflectivity of the coated article 10 can be increased when a dielectric layer(s) 40, 70 having a high refractive index is utilized. In one non-limiting embodiment, the dielectric layer(s) 40, 70 can have a refractive index of at least 1.4, at least 1.5, at least 1.8, or at least 2.0. In one non-limiting embodiment, the dielectric layer(s) 40, 70 can have a refractive index in the range of 1.4 to 2.5, 1.4 to 2.0, or 1.5 to 2.0.

[0048] The coated article 10 may include more than one dielectric layer. Each dielectric layer may comprise the same or different material and may have the same or different thickness as the other dielectric layers. For example, the coated article 10 may include at least two dielectric layers. In one non-limiting embodiment, the coated article may include a dielectric layer 40 above the substrate 12 and below the metal functional layer 60, and a dielectric layer 70 above the metal functional layer 60 and below the protective layer 80, as shown in FIG. 5.

[0049] In one non-limiting embodiment, the coated article 10 can optionally include a primer layer over the metal functional layer 60. The primer layer can be a single film or multiple film layers. The primer layer can include an oxygen scavenger material that can be sacrificed during the deposition process to prevent decomposition or oxidation of the metal functional layer 60 during the sputtering process or subsequent heating process. The primer layer can also absorb at least a portion of the electromagnetic radiation, such as visible light, that passes through the coating 30. Examples of materials useful for the primer layer include titanium, silicon, silicon dioxide, silicon nitride, silicon oxynitride, nickel, zirconium, aluminum, cobalt, chromium, titanium, aluminum, alloys thereof, or mixtures thereof. In one non-limiting embodiment, the primer layer includes titanium, titanium and aluminum, or zinc and aluminum, which are deposited as metals, and at least a portion of the titanium, titanium and aluminum, or zinc and aluminum is subsequently oxidized. In another embodiment, the primer layer includes a nickel-chromium alloy, such as Inconel. In another embodiment, the primer layer includes a cobalt-chromium alloy, such as Stellite®.

[0050] The primer layer may have a thickness in the range of 0.5 nm to 5 nm, such as 1 nm to 4 nm, for example 1 nm to 2.5 nm.

[0051] The present invention also relates to a coated article comprising a glass substrate and a coating on at least a portion of the substrate. The coating comprises a dielectric layer on the substrate, a metal functional layer, and a protective layer on the metal functional layer, the metal functional layer comprising a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. The dielectric layer, metal functional layer, and protective layer of the coating can be any of the layers described hereinabove. Optionally, the coating further comprises a second dielectric layer and / or a base layer. The optional second dielectric layer and optional base layer of the coating can be any of the layers described hereinabove.

[0052] An exemplary, non-limiting coated article 10 of the present invention is shown in Figure 2. The coated article 10 includes a metal functional layer 60 deposited on, and optionally in direct contact with, a substrate 12. The coated article 10 further includes a protective layer 80 deposited on, and optionally in direct contact with, the metal functional layer 60. The metal functional layer 60 and the protective layer 80 form a coating 30 over, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 can be glass.

[0053] Another exemplary, non-limiting coated article 10 of the present invention is shown in Figure 3. The coated article 10 includes a base layer 50 deposited on, and optionally in direct contact with, a substrate 12. The coated article 10 further includes a metal functional layer 60 deposited on, and optionally in direct contact with, the base layer 50. The coated article 10 further includes an outermost protective layer 80 deposited on, and optionally in direct contact with, the metal functional layer 60. The base layer 50, the metal functional layer 60, and the protective layer 80 form a coating 30 over, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 can be glass.

[0054] Another exemplary, non-limiting coated article 10 of the present invention is shown in Figure 4. The coated article 10 includes a dielectric layer 40 disposed on, and optionally in direct contact with, at least a portion of a substrate 12. The coated article 10 further includes a metal functional layer 60 disposed on, and optionally in direct contact with, the dielectric layer 40. The coated article 10 further includes a protective layer 80 disposed on, and optionally in direct contact with, the metal functional layer 60. The dielectric layer 40, the metal functional layer 60, and the protective layer 80 form a coating 30 disposed on, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 can be glass.

[0055] Another exemplary, non-limiting coated article 10 of the present invention is shown in FIG. 5. The coated article 10 includes a first dielectric layer 40 disposed over, and optionally in direct contact with, at least a portion of a substrate 12. The coated article 10 further includes a metal functional layer 60 disposed over, and optionally in direct contact with, the first dielectric layer 40. The coated article 10 further includes a second dielectric layer 70 disposed over, and optionally in direct contact with the metal functional layer 60. The coated article 10 further includes a protective layer 80 disposed over, and optionally in direct contact with the second dielectric layer 70. The first dielectric layer 40, the metal functional layer 60, the second dielectric layer 70, and the protective layer 80 form a coating 30 disposed over, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 may be glass.

[0056] Another exemplary, non-limiting coated article 10 of the present invention is shown in FIG. 6. The coated article 10 includes a dielectric layer 40 disposed on, and optionally in direct contact with, at least a portion of a substrate 12. The coated article 10 further includes a base layer 50 disposed on, and optionally in direct contact with, the dielectric layer 40. The coated article 10 further includes a metal functional layer 60 disposed on, and optionally in direct contact with the base layer 50. The coated article 10 further includes a protective layer 80 disposed on, and optionally in direct contact with the metal functional layer 60. The dielectric layer 40, base layer 50, metal functional layer 60, and protective layer 80 form a coating 30 disposed on, and optionally in direct contact with, at least a portion of a substrate 12. The substrate 12 may be glass.

[0057] Another exemplary, non-limiting coated article 10 of the present invention is shown in Figure 7. The coated article 10 includes a metal functional layer 60 deposited on, and optionally in direct contact with, a substrate 12. The coated article 10 further includes a dielectric layer 70 deposited on, and optionally in direct contact with, the metal functional layer 60. The coated article 10 further includes a protective layer 80 deposited on, and optionally in direct contact with the dielectric layer 70. The metal functional layer, the dielectric layer, and the protective layer form a coating 30 deposited on, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 can be glass.

[0058] Another exemplary, non-limiting coated article 10 of the present invention is shown in Figure 8. The coated article 10 includes a metal functional layer 60 deposited on, and optionally in direct contact with, a substrate 12. The coated article 10 further includes a protective layer 80 deposited on, and optionally in direct contact with, the metal functional layer 60. The coated article 10 further includes a dielectric layer 70 deposited on, and optionally in direct contact with, the protective layer 80. The metal functional layer 60, the protective layer 80, and the dielectric layer 70 form a coating 30 deposited on, and optionally in direct contact with, at least a portion of the substrate 12. The substrate 12 can be glass.

[0059] The dielectric layer(s) 40, 70, base layer 50, metal functional layer 60, protective layer 80, and optional primer layer can be deposited by any conventional method, such as, but not limited to, conventional chemical vapor deposition (CVD) and / or physical vapor deposition (PVD) processes. Examples of CVD processes include spray pyrolysis. Examples of PVD processes include electron beam evaporation and vacuum sputtering (such as magnetron sputtering deposition (MSVD)). Other coating methods, such as, but not limited to, sol-gel deposition, can also be used. In one non-limiting embodiment, the layers of coating 30 can be deposited by MSVD. Examples of MSVD coating equipment and methods are well understood by those skilled in the art and are described, for example, in U.S. Patent Nos. 4,379,040, 4,861,669, 4,898,789, 4,898,790, 4,900,633, 4,920,006, 4,938,857, 5,328,768, and 5,492,750. In one non-limiting embodiment, a cobalt chromium alloy is used as the magnetron sputtering target to deposit the metallic functional layer 60.

[0060] The coating 30 of the present invention can provide desirable physical properties, including, but not limited to, durability properties such as moisture resistance and chemical resistance. In some non-limiting embodiments, the presence of the dielectric layer(s) 40, 70 and / or protective layer 80 has been found to enhance the durability of the coating.

[0061] The materials used in coating layers, such as metal functional layer 60, can be selected to achieve the desired color characteristics of coating 30. Coating 30 can consist essentially of the materials described herein so that the desired color characteristics of the coating are achieved. For example, coating 30 consisting essentially of the materials described herein may include additional materials as long as the color characteristics of the coating are not affected. Color coordinates a*, b*, and L* are those of the conventional CIE (1931) and CIELAB systems, as understood by those skilled in the art.

[0062] In one non-limiting implementation of the present invention, the coated article 10 has a transmittance L* in the range of 45 to 60, such as 45 to 58, or 45 to 56.

[0063] In one non-limiting implementation of the present invention, the coated article 10 has a transmittance (T)a* in the range of -1.0 to 13.0, such as -1.0 to -11.5, -0.5 to 13.0, -0.5 to -11.5, -0.5 to 1.0, 9.0 to 11.5, or 3.5 to 11.5.

[0064] In one non-limiting implementation of the present invention, the coated article 10 has a transmittance (T)b* in the range of -1.0 to 13.0, such as -0.5 to 13.0, -0.5 to 7.5, 8.5 to 13.0, or 2.5 to 13.0.

[0065] In one non-limiting implementation of the present invention, the coated article 10 has a visible light transmittance (LTA) in the range of 15-35, such as 15-30, 15-28, or 17-27.

[0066] In one non-limiting implementation of the invention, the coated article 10 has a film side reflectance (Rf)L* in the range of 70 to 90, such as in the range of 75 to 90, 80 to 90, or 85 to 90. In one non-limiting implementation of the invention, the coated article 10 has an RfL* of at least 75, such as at least 80, or at least 85.

[0067] In one non-limiting implementation of the present invention, the coated article 10 has an Rfa* in the range of −10.0 to 0.0, such as −9.0 to 0.0, −9.0 to −0.3, −8.5 to 0.0, −4.5 to 0.0, or −8.5 to −3.0.

[0068] In one non-limiting implementation of the present invention, the coated article 10 has an Rfb* in the range of −4.0 to 13.0, such as −4.0 to 12.0, −3.0 to 12.0, or −2.0 to 0.0.

[0069] In one non-limiting implementation of the invention, the coated article 10 has a glass-side reflectance (Rg)L* in the range of 70 to 85, such as 72 to 85, 75 to 85, 72 to 82, or 75 to 82. In one non-limiting implementation of the invention, the coated article 10 has an RgL* of at least at least 70, such as at least 75, such as at least 80.

[0070] In one non-limiting implementation of the present invention, the coated article 10 has an Rga* in the range of −10.0 to 0.0, such as −9.0 to 0.0, −9.0 to −1.0, −9.0 to −2.0, or −8.0 to −2.0.

[0071] In one non-limiting implementation of the present invention, the coated article 10 has an Rgb* in the range of -6.0 to 15.0, for example, -5.5 to 15.0, -5.0 to 15.0, or -5.0 to 4.5.

[0072] Certain embodiments of the present invention are particularly useful as coatings for smart mirrors or displays. For example, the coatings of the present invention may be applied to smart mirrors or electronic display applications used in interrogation rooms.

[0073] The present invention also relates to a method for making a coated article. A substrate is provided. A metallic functional layer is formed on at least a portion of the substrate, the metallic functional layer comprising a metallic alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. The metallic functional layer is formed by a process comprising depositing the metallic alloy by magnetron sputtering deposition. The method may further include, optionally, forming a protective layer. The protective layer may be any of the protective layers described herein. The method may further include, optionally, forming at least one dielectric layer. The at least one dielectric layer may be any of the dielectric layers described herein. The method may further include, optionally, forming a base layer. The base layer may be any of the base layers described herein.

[0074] The present invention also relates to a method for making a coated article, in which a substrate is provided and a coating is formed on at least a portion of the substrate. The coating comprises a dielectric layer on the substrate. The coating comprises a metallic functional layer. The coating comprises a protective layer on the metallic functional layer. The metallic functional layer comprises a metal alloy selected from the group consisting of silicon-aluminum alloys and silicon-cobalt alloys. The metallic functional layer is formed by a process comprising depositing the metal alloy by magnetron sputtering deposition. The dielectric layer and the protective layer can be any of the dielectric layers and protective layers described herein. The coating can optionally further comprise a second dielectric layer. The second dielectric layer can be any of the dielectric layers described herein. The coating can optionally further comprise a base layer. The base layer can be any of the base layers described herein.

[0075] The coated articles described herein can be used in architectural transparencies, such as, but not limited to, insulated glass units. As used herein, the term "architectural transparency" refers to any transparency placed in a building, such as, but not limited to, windows and skylights. However, it should be understood that the present invention is not limited to use with such architectural transparencies and can be practiced with transparencies in any desired field, such as, but not limited to, laminated or non-laminated residential and / or commercial windows, insulated glass units, and / or transparencies for land, air, space, water, and underwater vehicles. Therefore, it should be understood that the specifically disclosed exemplary embodiments are presented merely to illustrate the general concepts of the present invention, and that the present invention is not limited to these specific exemplary embodiments. Furthermore, while a typical "transparency" can have sufficient visible light transmittance to allow materials to be seen through the transparency, in the practice of the present invention, a "transparency" need not be transparent to visible light; it may be semi-transparent or opaque.

[0076] A non-limiting insulating glass unit 110 incorporating features of the present invention is provided in FIG. 1B. The insulating glass unit 110 includes a first ply 112 having a first major surface 114 (first side) and an opposite second major surface 116 (second side). In the non-limiting embodiment shown, the first major surface 114 faces the exterior of the building, i.e., the exterior major surface, and the second major surface 116 faces the interior of the building. The insulating glass unit 110 also includes a second ply 118 having an exterior (first) major surface 120 (third side) and an interior (second) major surface 122 (fourth side) and spaced apart from the first ply 112. In some embodiments, the insulating glass unit includes a third ply having a fifth side and an opposite sixth side. This numbering of the ply surfaces follows conventional practice in the fenestration art. The plies 112, 118 can have any desired visible, infrared, or ultraviolet radiation transmittance and / or reflectance. For example, the plies 112, 118 can have any desired amount of visible light transmittance, such as from greater than 0% to 100%.

[0077] Each of the plies 112, 118 can be, for example, clear float glass, or can be tinted or colored glass, or one ply 112, 118 can be clear glass and the other ply 112, 118 can be colored glass. Without limitation to the present invention, examples of glass suitable for the first ply 112 and / or the second ply 118 are described in U.S. Patent Nos. 4,746,347; 4,792,536; 5,030,593; 5,030,594; 5,240,886; 5,385,872; and 5,393,593.

[0078] The first ply 112 and the second ply 118 can be connected together in any suitable manner, such as by adhesively bonding to a conventional spacer frame 124. A gap or chamber 126 is formed between the two plies 112, 118. The chamber 126 can be filled with a selected atmosphere, such as air or a non-reactive gas such as argon or krypton gas. A coating 130 is formed on at least a portion of one of the plies 112, 118, such as, but not limited to, on at least a portion of the second side 116 or at least a portion of the third side 120. However, if desired, the coating 130 can also be on the first side 114 or the fourth side 122. The coating 130 can comprise, consist essentially of, or consist of any of the coatings described herein. Examples of insulating glass units can be found, for example, in U.S. Patent Nos. 4,193,236, 4,464,874, 5,088,258, and 5,106,663.

[0079] The invention is further described in the following numbered clauses:

[0080] Clause 1. A coated article, comprising: a substrate; and a metallic functional layer on at least a portion of the substrate, the metallic functional layer comprising a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys.

[0081] Clause 2. The coated article of clause 1, wherein the metal functional layer has a thickness in the range of 20 nm to 40 nm, 20 nm to 60 nm, 30 nm to 45 nm, or 20 nm to 30 nm.

[0082] Clause 3. The coated article of clause 1 or 2, wherein the metallic functional layer comprises 60% to 99% by weight silicon.

[0083] Clause 4. The coated article of any one of clauses 1-3, wherein the metallic functional layer comprises a silicon aluminum alloy or a silicon cobalt alloy.

[0084] Clause 5. The coated article of any one of clauses 1-4, wherein the metal functional layer comprises 70% to 100% by weight silicon and 0% to 30% by weight aluminum, 80% to 95% by weight silicon and 5% to 20% by weight aluminum, or 85% to 95% by weight silicon and 5% to 15% by weight aluminum.

[0085] Clause 6. The coated article of any one of clauses 1-4, wherein the metal functional layer comprises 30% to 85% by weight silicon and 15% to 70% by weight cobalt, or 50% to 70% by weight silicon and 30% to 50% by weight cobalt.

[0086] Clause 7. The coated article of any one of clauses 1-6, wherein the metallic functional layer is essentially free, substantially free, or completely free of iron.

[0087] Clause 8. The coated article of any one of clauses 1-7, further comprising a protective layer over the metal functional layer.

[0088] Clause 9. The coated article of clause 8, wherein the protective layer comprises a metal oxide layer, a metal nitride layer, or a mixture thereof.

[0089] Clause 10. The coated article of clause 8 or 9, wherein the protective layer comprises titania, silica, alumina, silicon oxide, silica aluminum oxide, silicon nitride, silicon aluminum nitride, silicon aluminum oxynitride, zirconia, or a mixture thereof.

[0090] Clause 11. The coated article of any one of clauses 8 to 10, wherein the protective layer has a thickness of 5 nm to 70 nm, 5 nm to 30 nm, 30 nm to 70 nm, or 10 nm to 30 nm.

[0091] Clause 12. The coated article of any one of clauses 1-11, further comprising a base layer over the substrate and below the metal functional layer.

[0092] Clause 13. The coated article of clause 12, wherein the base layer has a thickness of 30 nm to 110 nm, 30 nm to 80 nm, or 70 nm to 110 nm.

[0093] Clause 14. The coated article of any one of clauses 1-13, further comprising at least one dielectric layer.

[0094] Clause 15. The coated article of clause 14, wherein the dielectric layer comprises one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

[0095] Clause 16. The coated article of clause 14 or 15, wherein each dielectric layer has a thickness of 5 nm to 140 nm, 80 nm to 120 nm, 100 nm to 140 nm, or 1 nm to 10 nm.

[0096] Clause 17. The coated article of any one of clauses 1-16, wherein the substrate is a glass substrate.

[0097] Clause 18. A coated article comprising: a glass substrate; and a coating on at least a portion of the substrate, the coating comprising a dielectric layer on the substrate, a metal functional layer, and a protective layer on the metal functional layer, the metal functional layer comprising a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys.

[0098] Clause 19. The coated article of clause 18, wherein the metallic functional layer is on top of the dielectric layer.

[0099] Clause 20. The coated article of clause 18 or 19, further comprising a second dielectric layer over the metal functional layer, the protective layer being over the second dielectric layer.

[0100] Clause 21. The coated article of any of clauses 18-20, further comprising a base layer on the dielectric layer, the metal functional layer being on the base layer.

[0101] Clause 22. The coated article of clause 18 or 20, wherein the dielectric layer is on top of the protective layer.

[0102] Clause 23. The coated article of any of clauses 18-22, wherein the metal functional layer has a thickness in the range of 20 nm to 40 nm, 20 nm to 60 nm, 30 nm to 45 nm, or 20 nm to 30 nm.

[0103] Clause 24. The coated article of any one of clauses 18 to 23, wherein the metal functional layer comprises 60% to 99% by weight silicon.

[0104] Clause 25. The coated article of any one of clauses 18-24 or 32, wherein the metallic functional layer comprises a silicon aluminum alloy or a silicon cobalt alloy.

[0105] Clause 26. The coated article of any one of clauses 18-24, wherein the metal functional layer comprises 70% to 100% by weight silicon and 0% to 30% by weight aluminum, 80% to 95% by weight silicon and 5% to 20% by weight aluminum, or 85% to 95% by weight silicon and 5% to 15% by weight aluminum.

[0106] Clause 27. The coated article of any one of clauses 18-24, wherein the metal functional layer comprises 30% to 85% by weight silicon and 15% to 70% by weight cobalt, or 50% to 70% by weight silicon and 30% to 50% by weight cobalt.

[0107] Clause 28. The coated article of any one of clauses 18-27, wherein the metal functional layer is essentially free, substantially free, or completely free of iron.

[0108] Clause 29. The coated article of any one of clauses 18-28, wherein the dielectric layer comprises one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

[0109] Clause 30. The coated article of any of clauses 18-29, wherein the dielectric layer comprises silicon nitride or aluminum silicon nitride.

[0110] Clause 31. The coated article of any one of clauses 18 to 30, wherein the dielectric layer has a thickness of 5 nm to 140 nm, 80 nm to 120 nm, 100 nm to 140 nm, or 1 nm to 10 nm.

[0111] Clause 32. The coated article of any one of clauses 18-31, wherein the protective layer comprises a metal oxide layer, a metal nitride layer, or a mixture thereof.

[0112] Clause 33. The coated article of any of clauses 18-32, wherein the protective layer comprises at least one of titania, silica, alumina, silicon oxide, silica aluminum oxide, silicon nitride, silicon aluminum nitride, silicon aluminum oxynitride, zirconia, or a mixture thereof.

[0113] Clause 34. The coated article of any one of clauses 18 to 33, wherein the protective layer has a thickness of 5 nm to 70 nm, 5 nm to 30 nm, 30 nm to 70 nm, or 10 nm to 30 nm.

[0114] Clause 35. The coated article of any one of clauses 21 or 23-34, wherein the base layer has a thickness of 30 nm to 110 nm, 30 nm to 80 nm, or 70 nm to 110 nm.

[0115] Clause 36. A method of making a coated article, comprising providing a substrate and forming a metallic functional layer on at least a portion of the substrate, wherein the metallic functional layer comprises a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys, and wherein the metallic functional layer is formed by a process comprising depositing the metal alloy by magnetron sputtering deposition.

[0116] Clause 37. The method of Clause 36, wherein the metal functional layer has a thickness in the range of 20 nm to 40 nm, 20 nm to 60 nm, 30 nm to 45 nm, or 20 nm to 30 nm.

[0117] Clause 38. The method of clause 36 or 37, wherein the metal functional layer comprises 60% to 99% by weight silicon.

[0118] Clause 39. The method of any one of clauses 36-38, wherein the metallic functional layer comprises a silicon aluminum alloy or a silicon cobalt alloy.

[0119] Clause 40. The method of any one of clauses 36 to 39, wherein the metal functional layer comprises 70% to 100% by weight silicon and 0% to 30% by weight aluminum, 80% to 95% by weight silicon and 5% to 20% by weight aluminum, or 85% to 95% by weight silicon and 5% to 15% by weight aluminum.

[0120] Clause 41. The method of any one of clauses 36 to 39, wherein the metal functional layer comprises 30% to 85% by weight silicon and 15% to 70% by weight cobalt, or 50% to 70% by weight silicon and 30% to 50% by weight cobalt.

[0121] Clause 42. The method of any one of clauses 36 to 41, wherein the metal functional layer is essentially free, substantially free, or completely free of iron.

[0122] Clause 43. The method of any one of clauses 36 to 42, further comprising providing a protective layer over the metal functional layer.

[0123] Clause 44. The method of Clause 43, wherein the protective layer comprises a metal oxide layer, a metal nitride layer, or a mixture thereof.

[0124] Clause 45. The method of clause 43 or 44, wherein the protective layer comprises titania, silica, alumina, silicon oxide, silica aluminum oxide, silicon nitride, silicon aluminum nitride, silicon aluminum oxynitride, zirconia, or a mixture thereof.

[0125] Clause 46. The method of any one of Clauses 43 to 45, wherein the protective layer has a thickness of 5 nm to 70 nm, 5 nm to 30 nm, 30 nm to 70 nm, or 10 nm to 30 nm.

[0126] Clause 47. The method of any one of clauses 36 to 46, further comprising a base layer over the substrate and below the metal functional layer.

[0127] Clause 48. The method of Clause 47, wherein the base layer has a thickness of 30 nm to 110 nm, 30 nm to 80 nm, or 70 nm to 110 nm.

[0128] Clause 49. The method of any one of clauses 36-48, further comprising at least one dielectric layer.

[0129] Clause 50. The method of Clause 49, wherein the dielectric layer comprises one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

[0130] Clause 51. The method of clause 49 or 50, wherein each dielectric layer has a thickness of 5 nm to 140 nm, 80 nm to 120 nm, 100 nm to 140 nm, or 1 nm to 10 nm.

[0131] Clause 52. The method of any one of clauses 36 to 51, wherein the substrate is a glass substrate.

[0132] Clause 53. A method of making a coated article, comprising: providing a substrate; and forming a coating on at least a portion of the substrate, the coating comprising a dielectric layer on the substrate, a metallic functional layer, and a protective layer on the metallic functional layer, the metallic functional layer comprising a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys, the metallic functional layer being formed by a process comprising depositing the metal alloy by magnetron sputtering deposition.

[0133] Clause 54. The method of Clause 53, wherein the metal functional layer overlies the dielectric layer.

[0134] Clause 55. The method of clause 53 or 54, further comprising a second dielectric layer over the metal functional layer, the protective layer being over the second dielectric layer.

[0135] Clause 56. The method of any of clauses 53 to 55, further comprising a base layer on the dielectric layer, the metal functional layer being on the base layer.

[0136] Clause 57. The method of clause 53 or 55, wherein the dielectric layer is on the protective layer.

[0137] Clause 58. The method of any of clauses 53 to 57, wherein the metal functional layer has a thickness in the range of 20 nm to 40 nm, 20 nm to 60 nm, 30 nm to 45 nm, or 20 nm to 30 nm.

[0138] Clause 59. The method of any one of clauses 53 to 58, wherein the metal functional layer comprises 60% to 99% by weight silicon.

[0139] Clause 60. The method of any one of clauses 53-59 or 67, wherein the metallic functional layer comprises a silicon aluminum alloy or a silicon cobalt alloy.

[0140] Clause 61. The method of any one of clauses 53 to 59, wherein the metal functional layer comprises 70% to 100% by weight silicon and 0% to 30% by weight aluminum, 80% to 95% by weight silicon and 5% to 20% by weight aluminum, or 85% to 95% by weight silicon and 5% to 15% by weight aluminum.

[0141] Clause 62. The coated article of any one of clauses 53-59, wherein the metal functional layer comprises 30% to 85% by weight silicon and 15% to 70% by weight cobalt, or 50% to 70% by weight silicon and 30% to 50% by weight cobalt.

[0142] Clause 63. The method of any one of clauses 53 to 62, wherein the metal functional layer is essentially free, substantially free, or completely free of iron.

[0143] Clause 64. The method of any one of clauses 53-63, wherein the dielectric layer comprises one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

[0144] Clause 65. The method of any of clauses 53-64, wherein the dielectric layer comprises silicon nitride or aluminum silicon nitride.

[0145] Clause 66. The method of any one of Clauses 53 to 65, wherein the dielectric layer has a thickness of 5 nm to 140 nm, 80 nm to 120 nm, 100 nm to 140 nm, or 1 nm to 10 nm.

[0146] Clause 67. The method of any one of clauses 53-66, wherein the protective layer comprises a metal oxide layer, a metal nitride layer, or a mixture thereof.

[0147] Clause 68. The method of any of clauses 53-67, wherein the protective layer comprises at least one of titania, silica, alumina, silicon oxide, silica aluminum oxide, silicon nitride, silicon aluminum nitride, silicon aluminum oxynitride, zirconia, or a mixture thereof.

[0148] Clause 69. The method of any one of Clauses 53 to 68, wherein the protective layer has a thickness of 5 nm to 70 nm, 5 nm to 30 nm, 30 nm to 70 nm, or 10 nm to 30 nm.

[0149] Clause 70. The method of any one of clauses 56 or 58-69, wherein the base layer has a thickness of 30 nm to 110 nm, 30 nm to 80 nm, or 70 nm to 110 nm.

[0150] The following examples illustrate various embodiments of the present invention, however, it should be understood that the invention is not limited to these particular embodiments.

[0151] example Table 1 shows exemplary coated articles 1-3 of the present invention. The reported thicknesses are physical thicknesses in nanometers (nm). The substrate was 6 mm of clear glass. A base layer was deposited on the glass surface. A silicon aluminum metal alloy (SiAl, 95 wt. % silicon and 5 wt. % aluminum) was deposited on the base layer. A protective silicon aluminum oxide layer (SiAlO x ) was deposited. [Table 1]

[0152] Table 2 shows exemplary coated articles 4 and 5 of the present invention. The reported thicknesses are physical thicknesses in nm. The substrate was 3.2 mm clear glass. A silicon aluminum metal alloy (95 wt. % silicon and 5 wt. % aluminum) was deposited on the glass substrate. A protective silicon aluminum oxide layer (SiAlO x A silicon aluminum nitride (SiAlN) layer was deposited on the protective layer. [Table 2]

[0153] Table 3 shows exemplary coated articles of the present invention. The reported thickness is the physical thickness in nm. The substrate was 6 mm clear glass. Silicon aluminum nitride (SiAlN) was deposited on the substrate. x A silicon aluminum nitride layer was deposited on the silicon aluminum nitride layer. A base layer was deposited on the silicon aluminum nitride layer. A silicon aluminum metal alloy (90 wt % silicon and 10 wt % aluminum) was deposited on the base layer. A protective layer was deposited on the SiAl layer. [Table 3]

[0154] Spectral characteristics Table 4 shows the spectral characteristics of Samples 1 to 3 in Table 1. "T" refers to transmittance, "Rf" refers to the reflection on the film side or coating side, and "Rg" refers to the reflection on the glass side. [Table 4]

[0155] Table 5 shows the spectral characteristics of Samples 4 and 5 in Table 2. [Table 5]

[0156] Table 6 shows the spectral characteristics of sample 6 in Table 3. [Table 6]

[0157] Those skilled in the art will readily appreciate that modifications may be made to the present invention without departing from the concepts disclosed in the foregoing description. Accordingly, the specific embodiments described in detail herein are exemplary only and do not limit the scope of the invention, which is to be accorded the full scope of the appended claims and any and all equivalents thereof.

Claims

1. A coated article comprising: A substrate; a metal functional layer on at least a portion of the substrate; Equipped with The metal functional layer is A coated article comprising a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys.

2. The coated article of claim 1, wherein the metallic functional layer has a thickness in the range of 20 nm to 40 nm.

3. The coated article of claim 1 , wherein the metallic functional layer comprises 60% to 99% by weight silicon.

4. The coated article of claim 3 , wherein the metallic functional layer comprises a silicon aluminum alloy or a silicon cobalt alloy.

5. Further comprising a protective layer on the metal functional layer; The coated article of claim 1 , wherein the protective layer comprises a metal oxide layer, a metal nitride layer, or a mixture thereof.

6. 6. The coated article of claim 5, wherein the protective layer comprises titania, silica, alumina, silicon oxide, silica aluminum oxide, silicon nitride, silicon aluminum nitride, silicon aluminum oxynitride, zirconia, or a mixture thereof.

7. The coated article of claim 5 further comprising a base layer over the substrate and below the metal functional layer.

8. further comprising at least one dielectric layer; 10. The coated article of claim 1, wherein the dielectric layer comprises one or more films selected from zinc tin oxide, zinc oxide, silica, silicon aluminum oxide, silicon nitride, aluminum nitride, silicon aluminum nitride, titanium oxide, and titanium nitride.

9. A coated article comprising: A glass substrate; a coating on at least a portion of the substrate, the coating comprising: a dielectric layer on the substrate; a metal functional layer; a protective layer on the metal functional layer; Equipped with A coated article wherein the metallic functional layer comprises a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys.

10. The coated article of claim 9 , wherein the metallic functional layer is present on the dielectric layer.

11. a second dielectric layer on the metal functional layer; The coated article of claim 10 , wherein the protective layer is present on the second dielectric layer.

12. a base layer on the dielectric layer; The coated article of claim 10 , wherein the metallic functional layer is on the base layer.

13. The coated article of claim 9 , wherein the dielectric layer is present over the protective layer.

14. The coated article of claim 9 , wherein the dielectric layer comprises silicon nitride or aluminum silicon nitride.

15. 1. A method of making a coated article, comprising: Providing a substrate; and forming a metal functional layer on at least a portion of the substrate; the metal functional layer comprises a metal alloy selected from the group consisting of silicon aluminum alloys and silicon cobalt alloys; The method, wherein the metallic functional layer is formed by a process comprising depositing the metallic alloy by magnetron sputtering deposition.

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