Cleaning device, processing device and method for cleaning and / or processing pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or EUV lithography masks - Patent Application 20070122999

Abstract

The present invention relates to a cleaning device 44 for cleaning pot-shaped hollow bodies 12, the cleaning device 44 comprising at least one side wall 46 bounding a cleaning space 50, the side wall 46 forming at least one device opening 48 through which a hollow body 12 closed with a cover 30 can be taken into the cleaning space 50 by means of a gripping and moving device 18 in order to clean the hollow body outer surface 32, and at least one supply device 52 for supplying a cleaning fluid to the hollow body outer surface 32 of the hollow body 12 closed with the cover 30, the device opening 48 being configured so that the gripping and moving device 18 at least partially protrudes into the cleaning space 50 or stops at the same height as the device opening 48, at least during the supply of the cleaning fluid. The present invention further relates to a treatment device 42 comprising such a cleaning device 44, and to a method for cleaning pot-shaped hollow bodies using such a treatment device 42.

Description

[Technical Field]

[0001] The present invention relates to a cleaning device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or lithography masks.The present invention further relates to a processing device and a method for treating pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or lithography masks. [Background technology]

[0002] The production of highly integrated electronic circuits and other sensitive semiconductor components today takes place in factories where so-called semiconductor wafers go through numerous processing steps. Most of these processing steps are carried out with great effort in clean rooms that are kept free of contaminants, especially particles. The reason for such complex processing is that particles that come into contact with the semiconductor material of the semiconductor wafers can affect, among other things, the material properties of the semiconductor wafers, resulting in entire production lots becoming unusable and having to be discarded.

[0003] As the integration density of semiconductor circuits increases, maintaining cleanliness becomes increasingly important. Furthermore, as the size of clean rooms increases, the effort required to maintain cleanliness increases exponentially. Therefore, semiconductor wafers are not transported "unprotected" from one processing station to the next. Instead, special transport containers (known as FOUPs (front opening unified pods)) are used. A FOUP is a box-shaped transport container into which multiple semiconductor wafers are inserted. A FOUP is usually closed with a removable cover. Without the cover, a FOUP has a basic pot-like shape with a rectangular base. The inserted semiconductor wafers can be transported from one clean room protected from the environment to another clean room while the FOUP cover is closed. When the FOUP reaches the processing station, it is opened, and the semiconductor wafers are removed and processed accordingly. After the semiconductor wafer is processed, it is transferred back into the FOUP and then transported to the next processing station.

[0004] Because of the significant production downtime caused by semiconductor wafer contamination, FOUPs must be cleaned from time to time. FOUPs are particularly susceptible to contamination from wear debris from semiconductor wafers during loading and unloading.

[0005] The same applies to the transport containers for lithography masks, e.g., EUV lithography masks ("extreme ultraviolet radiation"). EUV lithography masks are used to manufacture very small integrated circuits. Lithography masks also need to be transported in the same way as semiconductors, and a similar situation arises. When we talk about FOUPs below, the statements in this regard apply equally to the transport containers for lithography masks.

[0006] Devices for cleaning FOUPs are known, for example, from US Pat. No. 5,238,703 A, WO 2005 / 001888, DE 102020129469 A1 and EP 1 899 084 B1.

[0007] In such devices, the FOUP is cleaned on both its inner and outer surfaces. The outer surface of a FOUP is typically much more contaminated than the inner surface. As a result, the cleaning fluid accumulates particles originating from both the outer and inner surfaces during the cleaning procedure. Particles can therefore be transported from the outer surface to the inner surface. However, satisfactory cleaning results can only be achieved if the particle count is reduced below a certain value. Because particles originate from the outer surface, the cleaning procedure must be performed for a correspondingly long period of time to remove a significant portion of the particles. This is disadvantageous in that, on the one hand, a relatively large amount of cleaning fluid is required, and, on the other hand, the FOUP cannot be used to transport semiconductor wafers during the cleaning process. This results in higher production costs for semiconductor wafers.

[0008] In the aforementioned German Patent Application No. 102020129469, both the exterior and interior surfaces can be cleaned with the same cleaning device. A first cleaning head is used to clean the interior surface, and a second cleaning head is used to clean the exterior surface. Here, a cover is separated from the rest of the FOUP, and the FOUP is placed on the support wall of the cleaning device so that the FOUP is sealed against the support wall. Here, the first cleaning head protrudes into the interior space of the FOUP. The second cleaning head is U-shaped and rotatably supported around an axis of rotation on the side wall of the cleaning device. While the cleaning fluid used to clean the interior surface can be guided in a limited manner, this is not at all true for the cleaning fluid used to clean the exterior surface. To prevent the cleaning fluid used to clean the exterior surface from being sprayed uncontrollably, a cover is provided that surrounds the FOUP and the second cleaning head when the FOUP is placed on the support wall. The cover and the mechanism for opening and closing the cover require a relatively large amount of apparatus effort. As mentioned, the exterior surface of a FOUP is usually more heavily contaminated than the interior surface. However, because FOUPs are often closed with a cover, the requirements for cleaning the interior surface are significantly higher than those for cleaning the exterior surface. In this regard, the equipment effort required for cleaning the exterior surface of a FOUP is not commensurate with the requirements of some applications. In some applications, therefore, exterior surface cleaning is omitted. However, omitting exterior surface cleaning is also not optimal, as this increases the risk of producing defective and unusable lots of semiconductor wafers. [Prior art documents] [Patent documents]

[0009] [Patent Document 1] U.S. Patent No. 5,238,703A [Patent Document 2] International Publication No. 2005 / 001888 [Patent Document 3] German Patent Application Publication No. 102020129469 [Patent Document 4] European Patent No. 1899084 Summary of the Invention [Problem to be solved by the invention]

[0010] The object of embodiments of the present invention is to provide a way to remedy the above drawbacks using simple and inexpensive means, in particular to propose a cleaning device and a treatment device which make it possible to clean the outer surface of a hollow body with low equipment effort.Furthermore, a fundamental object of embodiments of the present invention is to provide a corresponding method for cleaning the outer surface of a hollow body. [Means for solving the problem]

[0011] This object is achieved by the features specified in claims 1, 14 and 18. Advantageous embodiments are the subject of the dependent claims.

[0012] An embodiment of the invention relates to a cleaning device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or lithography masks, - Hollow body forming a hollow body opening that is closable or closed by a cover, Forming the outer surface of the hollow body a hollow body wall; - Cleaning devices - at least one side wall that defines the boundary of the cleaning space; the side wall forms at least one device opening through which a hollow body closed with a cover can be taken into the cleaning space by means of a gripping and moving device in order to clean the outer surface of the hollow body; and at least one supply device for supplying a cleaning fluid to the outer surface of the hollow body closed by the cover, - the device opening is configured such that, at least during the delivery of the cleaning fluid, the gripping and moving device at least partially projects into the cleaning space or rests flush with the device opening; and / or A placement device is arranged in the cleaning space, on which a gripping and moving device can place the hollow body closed with a cover for supplying cleaning fluid.

[0013] A valuable aspect of the proposed cleaning device is that the hollow body outer surface can be cleaned when the hollow body is closed with a cover. In this respect, it is not necessary to separate the cover from the rest of the hollow body for this purpose, which saves time. Furthermore, cleaning of the hollow body outer surface can be performed when the gripping and moving device is connected to the hollow body. Therefore, no fixed position is required. The gripping and moving device can translate or rotate the hollow body within a certain range while cleaning the hollow body outer surface, which allows the cleaning fluid used to reach difficult-to-reach places.

[0014] The cleaning device can be provided with a mounting device on which a hollow body closed with a cover can be mounted, if necessary. The connection between the hollow body and the gripping and moving device can be released after mounting. The gripping and moving device can move other hollow bodies while supplying cleaning fluid to the outer surface of the hollow body. The gripping and moving device can perform other tasks and can therefore be used more efficiently, especially when cleaning with the cleaning device takes a very long time.

[0015] As cleaning fluid, for example, nitrogen or compressed air can be used, and particularly preferably very clean dry air, also called XCDA (extreme clean dried air), but it is also possible to use water.

[0016] According to a further embodiment, the supply device can comprise a plurality of discharge nozzles facing or opening into the cleaning space. The use of discharge nozzles allows the cleaning fluid to be given a specific flow direction, which allows for the cleaning fluid to be distributed over the entire outer surface of the hollow body. This allows for an effective and thorough cleaning of the outer surface of the hollow body.

[0017] In a further developed embodiment, the discharge nozzles arranged in the side wall can be provided with or formed through through-holes, which reduces the required construction space. In addition, the through-holes can be distributed over the entire side wall, which allows the cleaning fluid to be drawn into the cleaning space uniformly.

[0018] In a further developed embodiment, the supply device may have a through hole arranged in the side wall; and The discharge nozzle may be mounted on the side wall in fluid communication with the through hole and may open into the cleaning space.

[0019] In this embodiment, the discharge nozzle is disposed in the cleaning space and is in fluid communication with the passage hole. Therefore, the cleaning fluid first flows through the passage hole and then through the discharge nozzle. The discharge nozzle can be positioned relatively close to the hollow body. This allows the cleaning fluid to be very targeted toward specific areas of the hollow body's exterior surface, for example, areas that are known from experience to be more contaminated and / or more difficult to access than other areas. This can also contribute to thorough cleaning of the hollow body's exterior surface.

[0020] In a further embodiment, the supply device can include multiple supply channels that communicate with the discharge nozzles and can direct the cleaning fluid to the discharge nozzles. In principle, every discharge nozzle can be connected to its own supply channel, but this would require more effort for the device. In this embodiment, one supply channel can be connected to multiple discharge nozzles, thereby reducing the effort required for the device.

[0021] A further developed embodiment can be characterized in that the supply channel is attached to the side wall and communicates with the through-hole. Since the side wall is necessary to delimit the cleaning space anyway, in this embodiment the side wall can also be used to receive the supply channel. An additional attachment or receptacle for the supply channel can be dispensed with, which reduces the construction space and the effort required for the device.

[0022] According to a further embodiment, the supply device can include a plurality of first discharge nozzles for supplying a first cleaning fluid into the cleaning space and a plurality of second discharge nozzles for supplying a second cleaning fluid. In this embodiment, the outer surface of the hollow body can be, for example, first cleaned with the first cleaning fluid, in particular water, and then cleaned with the second cleaning fluid, in particular air. In this case, the air also has a drying effect, which can improve the cleaning results. However, depending on the hollow body to be cleaned, it is also possible to use only the first cleaning fluid or only the second cleaning fluid without having to modify the cleaning device for this purpose.

[0023] In a further embodiment, it may be advantageous for the cleaning device to comprise a plurality of guide plates arranged in the cleaning space or cooperating with the cleaning space to guide the cleaning fluid therein. As mentioned with respect to the discharge nozzle, the guide plates may also impart a specific flow to the cleaning fluid in the cleaning space. The guide plates may also ensure that the cleaning fluid reaches the entire outer surface of the hollow body and / or is better directed towards areas that are typically more contaminated or more difficult to access.

[0024] In a further developed embodiment, the guide plate can be adjustable by means of the drive unit. By virtue of the adjustable guide plate, the flow of cleaning fluid can be adapted to hollow bodies of various shapes. In addition, a certain vigor can be imparted to the flow of cleaning fluid through the cleaning space, which in turn improves the cleaning effect.

[0025] In a further embodiment, the cleaning device comprises a closing unit which is able to at least partially close the device opening, in particular when the cleaning fluid is sprayed onto the hollow body outer surface.

[0026] The closing unit can prevent or limit uncontrolled discharge of the cleaning fluid, especially when using a gaseous fluid such as nitrogen or compressed air. The closing unit can be formed in the form of a cover that closes the device opening. The cover can also be configured here to at least substantially close the device opening when the gripping and moving device projects into the cleaning space during the supply of cleaning fluid. For this purpose, the cover can have, for example, multiple closable sections that can be moved very close to the gripping and moving device when a hollow body attached to the gripping and moving device projects into the cleaning space. If the cleaning device has a mounting device on which the hollow body can be mounted, the gripping and moving device can be separated from the hollow body when the cleaning fluid is sprayed onto the outer surface of the hollow body. The closing unit can then close the entire device opening.

[0027] In a further embodiment, the cleaning device comprises at least one discharge opening communicating with the cleaning space and allowing the cleaning fluid or the first and second cleaning fluids to flow out of the cleaning space. This allows a controlled flow to be generated in the cleaning space, which reduces turbulence and the formation of blind spots on the hollow body's outer surface, where the cleaning fluid cannot or only insufficiently act on the hollow body's outer surface. In addition, the cleaning fluid containing particles flows out of the cleaning device in a controlled manner, so that these particles cannot be deposited again on the hollow body's outer surface.

[0028] An embodiment of the invention relates to a processing device for processing pot-shaped hollow bodies, in particular carrier containers for semiconductor wafers or lithography masks, the processing device comprising: - A boundary wall enclosing the interior space; a gripping and moving device arranged in the interior space for moving the hollow body in the interior space; - a wall opening formed by a boundary wall and giving access to the interior space; - at least one processing unit for processing hollow bodies, a closure device according to any one of the preceding embodiments; Equipped with the hollow body closed by the cover is connected to a gripping and moving device during the supply of the cleaning fluid, ○ It is taken into the cleaning space, Removed from the cleaning space, and o It is held in the cleaning space by a gripping and moving device during the application of cleaning fluid.

[0029] The technical effects and advantages that can be achieved with the proposed treatment device are consistent with those discussed in relation to this cleaning device. It should be noted in summary that the outer surface of the hollow body can be cleaned without the need to separate the cover from the rest of the hollow body, thereby saving time. Furthermore, cleaning of the outer surface of the hollow body can be performed while the gripping and moving device is connected to the hollow body ("on the fly"). Therefore, no fixed position is required. The gripping and moving device can move the hollow body within a certain range, for example, pivot and / or rotate it, during cleaning of the outer surface of the hollow body, allowing the cleaning fluid used to reach difficult-to-reach places.

[0030] The cleaning device can be provided with a mounting device on which a hollow body closed with a cover can be mounted, if necessary. The connection between the hollow body and the gripping and moving device can be released after mounting. The gripping and moving device can move other hollow bodies while supplying cleaning fluid to the outer surface of the hollow body. The gripping and moving device can perform other tasks and can therefore be used more efficiently, especially when cleaning with the cleaning device takes a very long time.

[0031] In a further embodiment, the gripping and moving device can be provided with a cover unit for at least partially covering the device opening during the supply of cleaning fluid. The cover unit can, for example, comprise an extendable or foldable plate that covers the device opening when the cleaning fluid is sprayed onto the hollow body outer surface. This makes it possible to avoid uncontrolled discharge of the cleaning fluid from the cleaning space. This particularly reduces the possibility that particles removed from the hollow body outer surface along with the cleaning fluid can enter the interior space and there be redeposited on the hollow body outer surface or even the hollow body inner surface.

[0032] In a further developed embodiment, a treatment device can be provided which comprises an outlet channel for discharging the cleaning fluid or the first cleaning fluid and the second cleaning fluid, the outlet channel communicating with the discharge opening. In this embodiment, the cleaning fluid containing the particles removed from the outer surface of the hollow body flows out of the treatment device, so that these particles cannot be deposited again on the outer surface or the inner surface of the hollow body.

[0033] According to a further developed embodiment, a particle measuring device is arranged in the outlet path, which can determine the number of particles in the outflowing cleaning fluid, the outflowing first cleaning fluid and / or the outflowing second cleaning fluid. The number of particles contained in the outflowing cleaning fluid can be measured by the particle measuring device, which can provide a report on the progress of the cleaning process. The number of particles usually decreases as the cleaning time increases. A limit value for the number of particles can be defined. As soon as this limit value is exceeded, the cleaning process of the hollow body outer surface can be stopped. This allows a certain degree of cleaning to be defined for the hollow body outer surface. An excessively long cleaning process can be avoided.

[0034] A further embodiment specifies that the cleaning device comprises a temperature control unit for controlling the temperature of the cleaning fluid sprayed onto the outer surface of the hollow body. The temperature control unit can be integrated into the supply device so that the cleaning fluid is heated or cooled appropriately on its way into the cleaning space. The hollow body and particles adhering to the outer surface of the hollow body expand and contract due to temperature changes. However, since the particles generally have a different linear expansion coefficient than the hollow body, a relative movement occurs between the particles and the outer surface of the hollow body, facilitating the detachment of the particles from the outer surface of the hollow body. This facilitates the cleaning process.

[0035] According to a further embodiment, the mounting device is rotatably mounted around a rotation axis and can be rotated by a drive motor. The rotation speed at which the hollow body placed on the mounting device can be rotated can be selected so that the cleaning fluid residues remaining on the outer surface of the hollow body are scattered outward by the centrifugal force acting thereon. This is particularly useful when water or another liquid is used as the cleaning fluid, thereby assisting in the removal of the cleaning fluid from the outer surface of the hollow body.

[0036] An embodiment of the invention relates to a method for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or lithography masks, using a processing device according to one of the previously discussed embodiments, the method comprising: - taking the hollow body closed by the cover into the cleaning space by means of the gripping and moving device; - supplying a cleaning fluid to an outer surface of the hollow body closed by the cover using a supply device; The hollow body is connected to the gripping and moving device and is held in the cleaning space by the gripping and moving device during supply of cleaning fluid.

[0037] The technical effects and advantages that can be achieved with this method correspond to those discussed with respect to this cleaning device. In summary, it should be pointed out that the outer surface of the hollow body can be cleaned together with the cover attached to the hollow body. In this respect, it is not necessary to separate the cover from the rest of the hollow body for this purpose, which saves time. Furthermore, cleaning of the outer surface of the hollow body can be performed while the gripping and moving device is connected to the hollow body ("on the fly"). Therefore, no fixed position is required. The gripping and moving device can move the hollow body within a certain range while cleaning the outer surface of the hollow body, which allows the cleaning fluid used to reach difficult-to-reach places.

[0038] In the following, exemplary embodiments of the invention will be explained in more detail with reference to the accompanying drawings. [Brief explanation of the drawings]

[0039] [Figure 1A] 1 is a basic side view of a processing device as known in the prior art; [Figure 1B] FIG. 2 shows a separate basic view of the hollow body to be treated. [Figure 2A] 1 is a highly simplified basic diagram of a proposed treatment device with a first embodiment of a cleaning device according to the invention; FIG. [Figure 2B] 2B is a separate basic view of the first embodiment of the cleaning device shown in FIG. 2A along the cross section XX defined in FIG. 2A. [Figure 3] 2C is a basic plan view of a second embodiment of a cleaning device according to the invention, similar to the view selected in FIG. 2B; [Figure 4] FIG. 2B is a basic side view of a third embodiment of a cleaning device, similar to the view selected in FIG. 2A. DETAILED DESCRIPTION OF THE INVENTION

[0040] Fig. 1A shows a simplified representation of a treatment device 10 known from the prior art for treating pot-shaped hollow bodies 12. Fig. 1B shows a separate view of the hollow bodies 12. The treatment device 10 comprises a boundary wall 14 enclosing an interior space 16. The interior space 16 is provided with a gripping and moving device 18, by means of which the hollow bodies 12 to be treated can be moved within the interior space 16. In addition, a number of treatment units 20 are arranged in the interior space 16, which can be, for example, in the form of a cleaning device 22 and / or an evacuation device 24.

[0041] The boundary wall 14 is closable in a manner not shown in detail any further, forming a wall opening 26 through which the interior space 16 is accessible.

[0042] The processing device 10 operates as follows: A hollow body 12 to be processed (see FIG. 1B ) having a hollow body wall 28 forming a hollow body opening 29 that can be closed with a cover 30 and that forms a hollow body outer surface 32 and a hollow body inner surface 34 is transported to the wall opening 26 in a manner not shown in detail any further, so that the gripping and moving device 18 can grip the hollow body 12 using a correspondingly formed connecting part 36 and move it within the interior space 16. The hollow body 12 is fed to the cleaning device 22 by the gripping and moving device 18. FIG. 1A shows a cover handling unit 38, which can connect the cover 30 to the rest of the hollow body 12 and separate it from the hollow body 12. The cover handling unit 38 is then rotated together with the cover 30 by approximately 90°, thereby closing the process space opening 40 of the cleaning device 22. The hollow body 12, separated from the cover 30, is introduced into the cleaning device 22 through a separate process space opening, not shown here. A cleaning fluid, in particular water, is sprayed onto the hollow body inner surface 34 and the cover 30 in the cleaning device 22. Depending on the configuration of the cleaning device 22, it is also possible to spray the cleaning fluid onto the hollow body outer surface 32.

[0043] After the cleaning procedure is completed, the hollow body 12 is removed from the cleaning device 22 by the gripping and moving device 18, the cover handling unit 38 is rotated to the position shown in FIG. 1A, and the hollow body 12 is again connected to the cover 30.

[0044] The hollow body 12 is then fed together with the cover 30 to the exhaust device 24. For this purpose, a procedure is followed that is substantially similar to that for the cleaning device 22. In particular, the cover 30 is first separated from the hollow body 12. In the exhaust device 24, a vacuum is applied to the cover 30 and the hollow body 12, so that the residues of the cleaning fluid used in the cleaning device 22 evaporate.

[0045] Once the process has been stopped, the cover 30 is again connected to the hollow body 12 and moved by the gripping and moving device 18 into the wall opening 26, and the cleaned hollow body 12 together with the cover 30 is transported out of the interior space 16 of the processing device 10 and beyond. Having left the interior space 16, the hollow body 12 can then be used for transporting and storing semiconductor wafers, not shown here.

[0046] Figure 2A shows a processing device 42 according to the invention using a basic side view. The basic design of the processing device 42 according to the invention is similar to that of the prior art processing device 10 shown here in Figure 1A, so only the main differences will be highlighted below.

[0047] The treatment device 42 according to the invention is equipped with a cleaning device 441 according to a first embodiment, which serves for cleaning the hollow body outer surface 32 (see FIG. 1B) of the hollow body 12. The cleaning device 441 is shown separately in FIG. 2B using a basic cross-sectional view along the cross section XX defined in FIG. 2A, without the hollow body 12, and no claim is made to the completeness of the drawing or that the drawing is to scale. The cleaning device 441 comprises a side wall 46 which forms the boundary of the cleaning space 50 and which has a square cross section in plan view. The side wall 46 is therefore closed in FIG. 2B at the selected cross section XX.

[0048] The side wall 46 forms at least one device opening 48 through which the hollow body 12 closed with the cover 30 can be introduced into the cleaning space 50 using the gripping and moving device 18 in order to clean the hollow body outer surface 32. The cleaning device 441 is further equipped with a supply device 52 that can introduce a cleaning fluid into the cleaning space 50. According to a first embodiment of the cleaning device 441, the supply device 52 comprises a plurality of first discharge nozzles 54 that supply a first cleaning fluid into the cleaning space 50 and a plurality of second discharge nozzles 56 that supply a second cleaning fluid. Thus, two different cleaning fluids can be transported into the cleaning space 50, where the first cleaning fluid can be, for example, water and the second cleaning fluid can be, for example, air. Both the first discharge nozzle 54 and the second discharge nozzle 56 communicate with a passage hole 58 that passes through the side wall 46 and is connected to a supply channel 60 also attached to the side wall 46.

[0049] 2B, a total of four guide plates 62 are arranged in the cleaning space 50, which can be moved using a drive unit 64. The guide plates 62 can be raised and lowered and / or rotated by the drive unit 64, for example.

[0050] The treatment device 441 further includes a bottom wall 66 in which a discharge opening 67 is arranged. The bottom wall 66 rests on a bottom 68 of the treatment device 42. The bottom 68 has a plurality of openings 70 that open into outlet channels 72 arranged therebelow (see also FIG. 1A ). The cleaning device 441 is arranged such that the discharge openings 67 communicate with the openings 70. The cleaning fluid taken into the cleaning space 50 through the discharge nozzles 54, 56 can be discharged from the treatment device 42 through the discharge openings 67, the openings 70, and the outlet channels 72.

[0051] Located in the outlet 72 is a particle measuring device 74 that can determine the number of particles contained in the cleaning fluid.

[0052] The processing device 441 operates as follows: The hollow body 12 to be processed is gripped by the gripping and moving device 18, as already explained with reference to FIG. 1A, so that the hollow body 12 can be moved into the interior space 16. Before the hollow body 12 is fed to the cleaning device 22 using the gripping and moving device 18, the hollow body 12 is introduced into the cleaning space 50 of the cleaning device 441 through the device opening 48, as shown in FIG. 2A. Here, the connection between the hollow body 12 and the gripping and moving device 18 is maintained. The cover 30 is also not separated from the hollow body 12. It can also be seen from FIG. 2A that the gripping and moving device 18 slightly extends into the cleaning space 50, ensuring that the entire hollow body 12 is introduced into the cleaning space 50. In some applications, it may be advantageous to only partially introduce the hollow body 12 into the cleaning space 50. In that case, the gripping and moving device 18 does not extend into the cleaning space 50.

[0053] 1 and 2A, the gripping and moving device 18 for the processing device 42 according to the present invention is equipped with a cover unit 76 that can at least partially cover the device opening 48. The cover unit 76 can, for example, comprise an extendable or foldable plate 78. The plate 78 can also function as an abutment and can abut against the side wall 46 from above, thereby defining the position of the end of the hollow body 12 within the cleaning space 50 and avoiding collisions with the hollow body 12, in particular with the bottom wall 66.

[0054] 2A, the first cleaning fluid is transported through the first discharge nozzle 54 by the operation of a transport unit (not shown) and sprayed onto the hollow body outer surface 32, as indicated by the arrow in FIG. 2A. The cover unit 76 prevents the first cleaning fluid from reaching the interior space 16 through the device opening 48 in an uncontrolled manner. The hollow body 12 can be moved within the cleaning space 50 by the gripping and moving device 18 while the first cleaning fluid is being sprayed onto the hollow body outer surface 32. In this regard, vertical, rotational, lateral, and / or combinations of these movements can be performed. The movement can be selected almost freely, as long as no collision of the hollow body 12 with the cleaning device 441 occurs.

[0055] The first cleaning fluid sweeps across the hollow body outer surface 32, removing particles deposited thereon. The discharge nozzle 54, cover unit 76, and guide plate 62 direct the first cleaning fluid toward the discharge opening 67, so that the particle-laden first cleaning fluid exits the cleaning device 441 and the treatment device 42 through the discharge opening 67, the opening 70, and the outlet 72. A given volumetric unit of cleaning fluid then passes through a particle measuring device 74, which determines the number of particles contained in each volumetric unit. This determination continues using subsequent volumetric units. As soon as the number of particles falls below a certain limit, the supply of the first cleaning fluid can be terminated. A second cleaning fluid can then be sprayed onto the hollow body outer surface 32 through the second discharge nozzle 56. In this regard, a similar procedure to that for the first cleaning fluid is performed. The hollow body 12 is removed from the cleaning device 441 once the supply of the second cleaning fluid has been completed and is supplied to the cleaning device 22 and the exhaust device 24 as described in relation to Fig. 1A. Once the processing steps described in Fig. 1A have been completed, the hollow body 12 is moved by the gripping and moving device 18 to the wall opening 26, where the cleaned hollow body 12 together with the cover 30 leaves the interior space 16 of the cleaning device 441 and is transported beyond.

[0056] Alternatively, the hollow body 12 closed with the cover 30 can be fed to the cleaning device 441 only after the process steps carried out in the cleaning device 22 and the exhaust device 24 have been completed. It is also possible to feed the hollow body 12 closed with the cover 30 to the cleaning device 441 both before and after the process steps carried out in the cleaning device 22 and the exhaust device 24.

[0057] A second embodiment of a cleaning device 441 is shown with reference to the basic diagram of FIG. 3 . The basic design of the cleaning device 442 according to the second embodiment corresponds to that of the cleaning device 441 according to the first embodiment, and therefore only the differences will be discussed here. While the cleaning device 441 according to the first embodiment has a closed side wall 46 with four sections, the cleaning device 442 according to the second embodiment has a first side wall 461 and a second side wall 462 that run parallel and spaced apart at the bottom 68 of the treatment device 42. The device opening 48 therefore extends not only within the plane of FIG. 3 but also perpendicularly to it. Therefore, the hollow body 12 can be introduced into the cleaning space 50 not only from above but also from the side. This simplifies the movement of the gripping and moving device 18 required for introduction into the cleaning space. The bottom wall 66 of the cleaning device 442 according to the second embodiment is not provided with a bottom wall 66.

[0058] In addition, the cleaning device 442 according to the second embodiment comprises a plurality of discharge nozzles 80 capable of drawing a cleaning fluid, e.g., air, into the cleaning space 50. In the second embodiment shown, the discharge nozzles 80 of the first side wall 461 are connected to a common supply channel 60, in this case using through holes 58. The same applies analogously to the discharge nozzles 80 of the second side wall 462. A temperature control unit 81 is arranged in the common supply channel 60, capable of varying the temperature of the cleaning fluid.

[0059] In the cleaning device 441 according to the first embodiment, the volume flow rate through each discharge nozzle 54, 56 can be set individually and in particular can be switched on or off earlier or later than the other discharge nozzles 54, 56, which is not provided in the cleaning device 442 according to the second embodiment. However, in the second embodiment, the supply channel 60 is common, which simplifies the equipment effort.

[0060] Figure 4 shows a third embodiment of a cleaning device 443 according to the invention, similar to the view selected in Figure 2A. For the sake of clarity, components of the handling device 42 are not shown, in particular the gripping and moving device 18. The cleaning device 443 according to the third embodiment largely corresponds to the cleaning devices 441, 442 according to the first and second embodiments, so that only the essential differences will be highlighted below.

[0061] The cleaning device 443 according to the third embodiment is equipped with a placement device 82 on which the hollow body 12 can be placed. For this purpose, the hollow body 12 is taken into the cleaning space 50 by the gripping and moving device 18 until the hollow body 12 comes into contact with the placement device 82. Thereafter, the gripping and moving device 18 is released from contact with the hollow body 12.

[0062] In the illustrated embodiment of the cleaning device 443, the hollow body 12 is placed on the mounting device 82 together with the cover 30, but it is also possible to place the hollow body 12 on the mounting device 82 together with the hollow body wall 28 (see FIG. 1B). The mounting device 82 comprises a frame structure with rod- or bar-shaped carriers arranged adjacent to the bottom wall 66 and configured to hinder the flow of cleaning fluid as little as possible, in particular to ensure that the cleaning fluid can easily act on the cover 30. In this respect, it may be advantageous for the frame structure to have three circular support points on which the hollow body 12 can be placed.

[0063] The mounting device 82 can be mounted in the cleaning space 50. However, in the illustrated embodiment of the treatment device 42, the mounting device 82 is rotatably supported on the bottom 68 of the treatment device 42 and can be rotated about a rotation axis D by means of a drive motor 84. As a result of this rotation, the hollow body 12 mounted on the mounting device 82 can be rotated, which can improve the supply of cleaning fluid to difficult-to-access areas of the hollow body outer surface 32.

[0064] In an embodiment not shown, the aforementioned temperature control unit 81 (see FIG. 3) is provided to vary the temperature of the supplied cleaning fluid.

[0065] The support points in the illustrated embodiment of the treatment device 42 are formed by downholders 88 which are formed as suction cups 86 and serve to fix the hollow body 12 during the spraying of the cleaning fluid. The downholders 88 can also be formed in a different shape, for example in the form of a bracket. Thus, fixing arms or the like which can engage with the hollow body 12 from above or from the side can fix the hollow body 12 during the spraying of the cleaning fluid (not shown).

[0066] As mentioned, the mounting device 82 can be rotated about a rotation axis D by means of a drive motor 84. To prevent the hollow body 12 from slipping on the mounting device 82 during rotation due to bias or for other reasons, a holding rod 96 is provided which contacts or nearly contacts the hollow body wall 28 when the hollow body 12 is placed on the mounting device 82. The holding rod 96 may be connected to a net, not shown here, in a cage-like manner.

[0067] The cleaning device 443 according to the third embodiment further comprises a closing unit 90, which can close the cleaning space 50, in particular when the hollow body 12 is introduced into the cleaning space 50 and the cleaning fluid is to act thereon. The closing unit 90 comprises a closing body 92, not shown here, which is rotatably attached to the side wall 46 of the cleaning device 443 by means of attachment means 94, not shown in detail here. The attachment means 94 can comprise a hinge here. A setting device, not shown here, can further be provided, by which the closing unit 90 can be moved to open or close the device opening 48.

[0068] The hollow body 12 is taken into the cleaning space 50 by the gripping and moving device 18 and placed on the mounting device 82 when the closing unit 90 is in the open position (not shown). The downholders 88 are then activated, and the gripping and moving device 18 is separated from the hollow body 12. As soon as the gripping and moving device 18 leaves the cleaning device 443, the closing unit 90 can be moved to the closed position, as shown in FIG. 4 . A cleaning fluid can then be sprayed onto the hollow body outer surface 32. As mentioned, a first cleaning fluid, e.g., water, can be taken into the cleaning chamber 50 through the first outlet nozzle 54, and a second cleaning fluid, e.g., air, can be taken into the cleaning space 50 through the second discharge nozzle 56. The hollow body 12 can be rotated by the mounting device 82 at a speed sufficient to disperse water residues from the hollow body outer surface 32 before or during the supply of the second cleaning fluid. The retaining rod 96 prevents the hollow body 12 from sliding off during rotation.

[0069] When the cleaning of the hollow body outer surface 32 has stopped, the closing unit 90 is moved to the open position. The hollow body 12 is removed from the cleaning space 50 by the gripping and moving device 18 and is delivered for further processing.

[0070] Not shown (see FIG. 2A) is an embodiment of the closure unit 90 which can be set in the closed position even when the gripping and moving device 18 is still connected to the hollow body 12. The closure body 92 can be provided with a corresponding part for this purpose, which can be pressed against the gripping and moving device 18.

[0071] The closing unit 90 has the effect that at least a portion of the cleaning fluid cannot leave the cleaning space 50 of the cleaning device 443 through the device opening 48 in an uncontrolled manner.

[0072] Although all illustrated embodiments of the cleaning device 44 allow for a temperature change of the cleaning fluid supplied, only the embodiment shown in Fig. 4 allows for the hollow body 12 to be rotated about its own axis in order to scatter the cleaning fluid residues from the hollow body outer surface 32. The hollow body 12 can also be rotated about its own axis using the gripping and moving device 18, i.e. when the hollow body 12 is connected to the gripping and moving device 18, but the achievable rotation speed is too slow to remove the cleaning fluid residues from the hollow body outer surface 32 to a sufficient extent. [Explanation of symbols]

[0073] 10 Prior art processing devices 12 Hollow body 14 Boundary wall 16 Interior Space 18 Grasping and moving devices 20 Processing Unit 22 Cleaning Device 24 Exhaust Device 26 Wall Opening 28 Hollow body wall 29 Hollow body opening 30 Cover 32 Hollow body outer surface 34 Inner surface of hollow body 36 Connecting part 38 Cover operation unit 40 Process space opening 42 Processing Device 44 Cleaning Device 441 Cleaning Device 442 Cleaning Device 443 Cleaning Device 46 Side wall 461 First Side Wall 462 Second Side Wall 48 Device Opening 50 Cleaning space 52 Supply Device 54 First discharge nozzle 56 Second discharge nozzle 58 Passing hole 60 Supply route 62 Guide Plate 64 Drive Unit 66 Bottom wall 67 Discharge opening 68 Bottom 70 aperture 72 Outflow channel 74 Particle measurement devices 76 Cover Unit 78 Plate 80 discharge nozzle 81 Temperature Control Unit 82 Mounting Device 84 Drive motor 86 Sucker 88 Downholder 90 Closure Unit 92 Closed body 94 Mounting means 96 Retaining Rod D rotation axis

Claims

1. A cleaning device (44) for cleaning a pot-shaped hollow body (12), in particular a transport container for semiconductor wafers or lithography masks, comprising: said hollow body (12) forming a hollow body opening (29) that is closable or closed by a cover (30), Forming the hollow body outer surface (32) A hollow body wall (28) is provided. said cleaning device (44) at least one side wall (46) that bounds the cleaning space (50); a side wall (46) which forms at least one device opening (48) through which the hollow body (12) closed with the cover (30) can be taken into the cleaning space (50) by means of a gripping and moving device (18) in order to clean the hollow body outer surface (32); at least one supply device (52) for supplying a cleaning fluid to the hollow body outer surface (32) of the hollow body (12) closed by the cover (30); Equipped with - said device opening (48) is configured such that, at least during the supply of said cleaning fluid, said gripping and moving device (18) at least partially projects into said cleaning space (50) or rests flush with said device opening (48); and / or a placement device (82) is arranged in the washing space (50) on which the gripping and moving device (18) can place the hollow body closed with the cover (30) for supplying the washing fluid; A cleaning device (44).

2. the supply device (52) comprises a plurality of discharge nozzles (54, 56, 80) facing or opening into the cleaning space (50), The cleaning device (44) of claim 1.

3. The discharge nozzles (54, 56, 80) arranged in the side wall (46) have or are formed through a through hole (58), A cleaning device (44) according to claim 2.

4. - said supply device (52) has a through hole (58) arranged in said side wall (46); the discharge nozzles (54, 56, 80) are attached to the side wall (46) in fluid communication with the passage holes (58) and open into the cleaning space (50); 3. The cleaning device (44) of claim 2, characterized in that:

5. the supply device (52) comprises a plurality of supply passages (60) that communicate with the discharge nozzles (54, 56, 80) and can guide the cleaning fluid to the discharge nozzles (54, 56, 80), A cleaning device (44) according to any one of claims 2 to 4.

6. The supply passage (60) is attached to the side wall (46) and communicates with the through hole (58). A cleaning device (44) according to any of claims 3 and 5 or claims 4 and 5.

7. the supply device (52) comprises a plurality of first discharge nozzles (54) for supplying a first cleaning fluid into the cleaning space (50) and a plurality of second discharge nozzles (56) for supplying a second cleaning fluid into the cleaning space (50), A cleaning device (44) according to any one of claims 2 to 6.

8. characterised in that the cleaning device (44) comprises a plurality of guide plates arranged in the cleaning space (50) or cooperating with the cleaning space (50) to guide the cleaning fluid therein. A cleaning device (44) according to any one of claims 1 to 7.

9. The guide plate (62) is adjustable by means of a drive unit (64). A cleaning device (44) according to claim 8.

10. The cleaning device (44) is characterized in that it comprises a closing unit (90) capable of at least partially closing the device opening (48), A cleaning device (44) according to any one of claims 1 to 9.

11. the cleaning device (44) comprises at least one discharge opening (67) communicating with the cleaning space (50) and allowing the cleaning fluid or the first cleaning fluid and the second cleaning fluid to flow out of the cleaning space (50), A cleaning device (44) according to any one of claims 1 to 10.

12. the cleaning device (44) comprises a temperature control unit (81) for controlling the temperature of the cleaning fluid sprayed onto the hollow body outer surface (32), A cleaning device (44) according to any one of claims 1 to 11.

13. The mounting device (82) is mounted rotatably around a rotation axis (D) and is rotatable by means of a drive motor (84). A cleaning device (44) according to any one of claims 1 to 12.

14. A processing device (42) for processing pot-shaped hollow bodies (12), in particular transport containers for semiconductor wafers or lithography masks, said processing device (42) comprising: a boundary wall (14) enclosing an internal space (16); a gripping and moving device (18) arranged in said interior space (16) for moving said hollow body (12) within said interior space (16); a wall opening (26) formed by said boundary wall (14) and giving access to said internal space (16); at least one treatment unit (20) for treating said hollow bodies (12); - a cleaning device (44) according to any one of claims 1 to 13; Equipped with - said hollow body (12), closed by a cover (30), is connected to said gripping and moving device (18) during the supply of cleaning fluid; ○ taken into the cleaning space (50), removed from the cleaning space, and is held in the cleaning space (50) by the gripping and moving device (18) during the supply of the cleaning fluid, the device opening (48) is configured so that, at least during the supply of the cleaning fluid, the gripping and moving device (18) at least partially projects into the cleaning space (50) or stops flush with the device opening (48); A processing device (42).

15. the gripping and moving device (18) comprises a cover unit (76) for at least partially covering the device opening (48) during the supply of the cleaning fluid, The processing device (42) of claim 14.

16. the treatment device (42) comprises an outlet (72) for discharging the cleaning fluid or the first cleaning fluid and the second cleaning fluid, the outlet (72) communicating with a discharge opening (67), A processing device (42) according to claim 14 or 15.

17. a particle measuring device (74) disposed in the outlet path (72) for determining the number of particles in the outlet cleaning fluid, the outlet first cleaning fluid, and / or the outlet second cleaning fluid; The processing device (42) of claim 14.

18. 18. A method for cleaning a pot-shaped hollow body (12), in particular a transport container for semiconductor wafers or lithography masks, using a treatment device (42) according to any one of claims 14 to 17, said method comprising the steps of: - taking the hollow body (12) closed by the cover (30) into the cleaning space (50) by means of the gripping and moving device (18); - supplying a cleaning fluid to the hollow body outer surface (32) of the hollow body (12) closed by the cover (30) using the supply device (52); wherein the hollow body (12) is coupled to the gripping and moving device (18) and held in the cleaning space (50) by the gripping and moving device (18) during the supply of the cleaning fluid.

Images