Pyrolyzed gas purifying and cooling device, pyrolyzed gas purifying and cooling method, organic-substance manufacturing device, and organic-substance manufacturing method

Abstract

To provide a method and an apparatus for producing an organic substance, capable of efficiently cooling a synthetic gas and converting the synthetic gas into the organic substance with high conversion efficiency by using a microbial catalyst.SOLUTION: The apparatus for purifying and cooling pyrolysis gas comprises a gasification furnace 10 for gasifying waste to produce pyrolysis gas, a cyclone 11 for recovering dust in the pyrolysis gas by passing the pyrolysis gas discharged from the gasification furnace 10, and a heat exchanger 20 for passing and cooling the pyrolysis gas passed through the cyclone 11.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a pyrolysis gas purification and cooling apparatus and method for purifying and cooling pyrolysis gas derived from waste, as well as an organic substance production apparatus and method for producing organic substances using synthesis gas derived from waste as a raw material. [Background technology]

[0002] A widely known technology involves pyrolysis of various types of waste, such as industrial waste and municipal waste, in a gasification furnace to generate pyrolysis gas, which is then reformed in a reformer to obtain synthesis gas. The synthesis gas obtained can be burned as is and used for power generation, or, if necessary, heat can be recovered in a boiler or the like and then used for power generation. Furthermore, in recent years, attempts have been made to utilize synthesis gas as a raw material for chemical synthesis, for example, by converting it into organic substances such as ethanol using a microbial catalyst (see, for example, Patent Document 1).

[0003] Pyrolysis gas derived from waste contains many impurities such as tar and char, making it difficult to use it directly for power generation or chemical synthesis. Furthermore, waste-derived pyrolysis gas contains phase-transition impurities, such as sublimable substances such as naphthalene, 1-naphthol, and 2-naphthol, which can undergo a phase transition between gas and solid phases, due to the gasification of substances containing many components other than carbon. Therefore, waste-derived pyrolysis gas is generally purified to remove these impurities before use. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] International Publication No. 2015 / 037710 Summary of the Invention [Problem to be solved by the invention]

[0005] Pyrolysis gas derived from waste is hot when generated, but before it can be utilized, it must be cooled to a low temperature. For example, when converting pyrolysis gas into organic substances such as ethanol using a microbial catalyst, it must be cooled to below 40°C. Therefore, waste-derived pyrolysis gas must be cooled while undergoing gas purification. However, when waste-derived pyrolysis gas is cooled, phase-transition impurities in the gas precipitate in coolers, filters, etc., and dust components such as tar and char adhere to and grow on the surface, which can lead to reduced cooling efficiency or blockage of the gas flow path. To avoid these problems, frequent cleaning of phase-transition impurities and dust components is required, which complicates maintenance and increases operating costs.

[0006] Therefore, the present invention aims to provide a pyrolysis gas purification and cooling device and a pyrolysis gas purification and cooling method that can prevent a decrease in cooling efficiency or blockage of the gas flow path, efficiently remove impurities from pyrolysis gas derived from waste, and suitably cool and purify the pyrolysis gas, as well as an organic substance production device and an organic substance production method that produce organic substances using synthetic gas derived from waste as a raw material. [Means for solving the problem]

[0007] As a result of extensive research, the inventors have found that the above problem can be solved by placing a cyclone downstream of the gasification furnace and passing the pyrolysis gas discharged from the gasification furnace through the cyclone, and have completed the first embodiment of the present invention described below. That is, the first aspect of the present invention provides the following [1] to

[28] . [1] A pyrolysis gas purification and cooling system comprising: a gasification furnace that gasifies waste to produce pyrolysis gas; a cyclone that recovers dust from the pyrolysis gas by passing the pyrolysis gas discharged from the gasification furnace; and a heat exchanger that cools the pyrolysis gas that has passed through the cyclone. [2] The pyrolysis gas purification and cooling device according to [1], wherein the temperature of the pyrolysis gas supplied to the cyclone is 500°C or higher and 1,100°C or lower. [3] The pyrolysis gas purification and cooling device according to [1] or [2], wherein the pyrolysis gas is cooled to a temperature of 30°C or higher and 300°C or lower by the heat exchanger. [4] A pyrolysis gas purification and cooling device according to any one of [1] to [3], further comprising a reforming furnace arranged downstream of the cyclone and reforming the pyrolysis gas discharged from the gasification furnace. [5] A pyrolysis gas purification and cooling device according to any one of [1] to [3], further comprising a reforming furnace arranged upstream of the cyclone and reforming the pyrolysis gas discharged from the gasification furnace. [6] The pyrolysis gas purification and cooling device according to any one of [1] to [5], wherein the dust recovered by the cyclone is supplied to the gasification furnace. [7] A pyrolysis gas purification and cooling device according to any one of [1] to [6], further comprising a gas cooling tower arranged downstream of the heat exchanger, through which the pyrolysis gas cooled by the heat exchanger is passed and cooled by water spray. [8] A pyrolysis gas purification and cooling device according to any one of [1] to [7], further comprising a filtering dust collector arranged downstream of the heat exchanger and through which the pyrolysis gas cooled by the heat exchanger passes. [9] A pyrolysis gas purification and cooling device according to any one of [1] to [8], further comprising a scrubber arranged downstream of the heat exchanger and through which the pyrolysis gas cooled by the heat exchanger passes.

[10] A pyrolysis gas purification and cooling system according to any one of [1] to [9], comprising a filter-type dust collector and a scrubber, the filter-type dust collector and the scrubber being arranged in parallel downstream of the heat exchanger.

[11] The pyrolysis gas purification and cooling device according to

[10] , further comprising a differential pressure measuring device for measuring the differential pressure between the upstream and downstream stages of the filter-type dust collector.

[12] A pyrolysis gas purification and cooling device according to

[10] or

[11] , comprising a concentration measuring device for measuring the concentration of at least one selected from phase transition impurities and solid impurities in the pyrolysis gas discharged from the gasification furnace.

[13] A pyrolysis gas purification and cooling device according to any one of

[10] to

[12] , comprising a flow path switching unit that selectively switches between the filtering dust collector and the scrubber through which the pyrolysis gas passes.

[14] An organic substance manufacturing apparatus further comprising an organic substance production unit that produces organic substances by contacting the synthesis gas obtained by treating the pyrolysis gas using the pyrolysis gas purification and cooling device described in any one of [1] to

[13] with a microbial catalyst.

[15] A method for purifying and cooling pyrolysis gas, comprising the steps of: gasifying waste in a gasification furnace to generate pyrolysis gas; passing the pyrolysis gas discharged from the gasification furnace through a cyclone to recover dust from the pyrolysis gas; and cooling the pyrolysis gas that has passed through the cyclone by passing it through a heat exchanger.

[16] The method for purifying and cooling a pyrolysis gas according to

[15] , wherein the temperature of the pyrolysis gas supplied to the cyclone is 500°C or higher and 1,100°C or lower.

[17] The method for purifying and cooling a pyrolysis gas according to

[15] or

[16] , wherein the pyrolysis gas is cooled to a temperature of 30°C or higher and 300°C or lower in the heat exchanger.

[18] A method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[17] , further comprising a step of passing the pyrolysis gas discharged from the gasification furnace through a reforming furnace after passing through the cyclone to reform it.

[19] A method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[18] , further comprising a step of passing the pyrolysis gas discharged from the gasification furnace through a reforming furnace to reform it before passing it through the cyclone.

[20] The method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[19] , wherein the dust recovered by the cyclone is supplied to the gasification furnace.

[21] A method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[20] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a gas cooling tower and cooling it with water sprayed inside the gas cooling tower.

[22] The method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[21] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a filter-type dust collector.

[23] The method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[22] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a scrubber.

[24] A method for purifying and cooling a pyrolysis gas according to any one of

[15] to

[23] , comprising a step of passing the pyrolysis gas through either a filtering dust collector or a scrubber arranged in parallel downstream of the heat exchanger.

[25] The method for purifying and cooling a pyrolysis gas according to

[24] , further comprising a step of measuring the differential pressure between the upstream and downstream stages of the filter-type dust collector using a differential pressure measuring device.

[26] A method for purifying and cooling pyrolysis gas according to

[24] or

[25] , comprising a step of measuring the concentration of at least one selected from phase transition impurities and solid impurities in the pyrolysis gas discharged from the gasification apparatus using a concentration measuring device.

[27] A method for purifying and cooling pyrolysis gas according to

[25] or

[26] , further comprising a step of selectively switching the supply of the synthesis gas to the filtering dust collector or the scrubber using a flow path switching unit depending on the measurement results of at least one of the differential pressure measuring device and the concentration measuring device.

[28] A method for producing organic substances, further comprising a step of contacting the synthesis gas obtained by treating the pyrolysis gas using the pyrolysis gas purification and cooling method described in any one of

[15] to

[27] with a microbial catalyst to produce organic substances.

[0008] The present invention also provides the following second embodiment: In the second embodiment, it is possible to obtain a synthesis gas that has a high content of at least one of hydrogen and carbon monoxide and that has been appropriately cooled by a heat exchanger. That is, the second aspect of the present invention provides the following

[29] to

[48] .

[29] A pyrolysis gas purification and cooling device comprising: a gasification furnace that gasifies waste to produce pyrolysis gas; a reforming furnace that reforms the pyrolysis gas discharged from the gasification furnace; and a heat exchanger that passes the pyrolysis gas that has passed through the reforming furnace to cool it.

[30] The pyrolysis gas purification and cooling device according to

[29] , wherein the pyrolysis gas is cooled to a temperature of 30°C or higher and 300°C or lower by the heat exchanger.

[31] A pyrolysis gas purification and cooling device according to

[29] or

[30] , further comprising a gas cooling tower arranged downstream of the heat exchanger and through which the pyrolysis gas cooled by the heat exchanger is passed and cooled by water spray.

[32] A pyrolysis gas purification and cooling device according to any one of

[29] to

[31] , further comprising a filter-type dust collector arranged downstream of the heat exchanger and through which the pyrolysis gas cooled by the heat exchanger passes.

[33] A pyrolysis gas purification and cooling device according to any one of

[29] to

[32] , further comprising a scrubber arranged downstream of the heat exchanger and through which the pyrolysis gas cooled by the heat exchanger passes.

[34] A pyrolysis gas purification and cooling system according to any one of

[29] to

[33] , comprising a filter-type dust collector and a scrubber, the filter-type dust collector and the scrubber being arranged in parallel downstream of the heat exchanger.

[35] The pyrolysis gas purification and cooling device according to

[34] , further comprising a differential pressure measuring device for measuring the differential pressure between the upstream and downstream stages of the filter-type dust collector.

[36] A pyrolysis gas purification and cooling device according to

[34] or

[35] , comprising a concentration measuring device for measuring the concentration of at least one selected from phase transition impurities and solid impurities in the pyrolysis gas discharged from the gasification furnace.

[37] A pyrolysis gas purification and cooling device according to any one of

[34] to

[36] , comprising a flow path switching unit that selectively switches between the filtering dust collector and the scrubber through which the pyrolysis gas passes.

[38] An organic substance manufacturing apparatus further comprising an organic substance production section that produces organic substances by contacting the synthesis gas obtained by treating the pyrolysis gas using the pyrolysis gas purification and cooling device described in any one of

[29] to

[37] with a microbial catalyst.

[39] A method for purifying and cooling pyrolysis gas, comprising the steps of: gasifying waste in a gasification furnace to generate pyrolysis gas; passing the pyrolysis gas discharged from the gasification furnace through a reforming furnace to reform the pyrolysis gas; and cooling the pyrolysis gas that has passed through the reforming furnace by passing it through a heat exchanger.

[40] The method for purifying and cooling a pyrolysis gas according to

[39] , wherein the pyrolysis gas is cooled to a temperature of 30°C or higher and 300°C or lower in the heat exchanger.

[41] A method for purifying and cooling a pyrolysis gas according to

[39] or

[40] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a gas cooling tower and cooling it with water sprayed inside the gas cooling tower.

[42] The method for purifying and cooling a pyrolysis gas according to any one of

[39] to

[41] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a filter-type dust collector.

[43] The method for purifying and cooling a pyrolysis gas according to any one of

[39] to

[42] , further comprising a step of passing the pyrolysis gas cooled in the heat exchanger through a scrubber.

[44] A method for purifying and cooling a pyrolysis gas according to any one of

[39] to

[43] , comprising a step of passing the pyrolysis gas through either a filtering dust collector or a scrubber arranged in parallel downstream of the heat exchanger.

[45] A method for purifying and cooling a pyrolysis gas according to

[44] , which includes a step of measuring the differential pressure between the upstream and downstream stages of the filter-type dust collector using a differential pressure measuring device.

[46] A method for purifying and cooling pyrolysis gas according to

[44] or

[45] , comprising a step of measuring the concentration of at least one selected from phase-transition impurities and solid impurities in the pyrolysis gas discharged from the gasification apparatus using a concentration measuring device.

[47] A method for purifying and cooling pyrolysis gas according to

[45] or

[46] , further comprising a step of selectively switching the supply of the synthesis gas to the filtering dust collector or the scrubber using a flow path switching unit depending on the measurement results of at least one of the differential pressure measuring device and the concentration measuring device.

[48] ​​A method for producing organic substances, further comprising a step of contacting the synthesis gas obtained by treating the pyrolysis gas using the pyrolysis gas purification and cooling method described in any one of

[39] to

[47] with a microbial catalyst to produce organic substances. [Effects of the Invention]

[0009] According to the present invention, it is possible to provide a pyrolysis gas purification and cooling device and a pyrolysis gas purification and cooling method that can prevent a decrease in cooling efficiency or blockage of the gas flow path, efficiently remove impurities from pyrolysis gas derived from waste, and suitably cool and purify the pyrolysis gas, as well as an organic substance production device and an organic substance production method that produce organic substances using synthesis gas derived from waste as a raw material. [Brief explanation of the drawings]

[0010] [Figure 1] 1 is a schematic diagram showing the overall configuration of an organic substance manufacturing apparatus according to a first embodiment of the present invention. [Figure 2] 1 is a schematic diagram showing the configuration of a pyrolysis gas purification and cooling device according to a first embodiment of the present invention. [Figure 3] FIG. 2 is a schematic diagram showing a first modified example of the configuration of the pyrolysis gas purification and cooling device according to the first embodiment of the present invention. [Figure 4] FIG. 3 is a schematic diagram showing a second modified example of the configuration of the pyrolysis gas purification and cooling device according to the first embodiment of the present invention. [Figure 5] FIG. 3 is a schematic diagram showing a third modified example of the configuration of the pyrolysis gas purification and cooling device according to the first embodiment of the present invention. [Figure 6] FIG. 4 is a schematic diagram showing a fourth modified example of the configuration of the pyrolysis gas purification and cooling device according to the first embodiment of the present invention. [Figure 7] FIG. 4 is a schematic diagram showing the overall configuration of an organic substance manufacturing apparatus according to a second embodiment of the present invention. [Figure 8] FIG. 10 is a schematic diagram showing the configuration of a pyrolysis gas purification and cooling device according to a third embodiment of the present invention. [Figure 9]FIG. 10 is a schematic diagram showing a first modified example of the configuration of a pyrolysis gas purification and cooling device according to a third embodiment of the present invention. [Figure 10] FIG. 10 is a schematic diagram showing a second modified example of the configuration of the pyrolysis gas purification and cooling device according to the third embodiment of the present invention. [Figure 11] FIG. 10 is a schematic diagram showing a third modified example of the configuration of the pyrolysis gas purification and cooling device according to the third embodiment of the present invention. [Figure 12] FIG. 10 is a schematic diagram showing the overall configuration of an organic substance manufacturing apparatus according to a fourth embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0011] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals.

[0012] (First embodiment) As shown in Fig. 1, an organic substance manufacturing apparatus 1 according to a first embodiment of the present invention includes a pyrolysis gas purification and cooling device 2. Hereinafter, the organic substance manufacturing apparatus 1 according to the first embodiment of the present invention and the method for manufacturing an organic substance will be described in detail with reference to the embodiment.

[0013] The organic substance manufacturing device 1 includes a pyrolysis gas purification and cooling device 2 that gasifies waste to produce pyrolysis gas G1 and performs processes on the pyrolysis gas G1 including at least purification and cooling processes, and an organic substance production section 3 that brings the synthesis gas G2 obtained by processing the pyrolysis gas G1 using the pyrolysis gas purification and cooling device 2 into contact with a microbial catalyst to produce organic substances.

[0014] (Pyrolysis gas purification and cooling equipment) 1, the pyrolysis gas purification and cooling system 2 in the first embodiment includes at least a gasification furnace 10, a cyclone 11 arranged downstream of the gasification furnace 10, and a heat exchanger 20 arranged downstream of the cyclone 11. The pyrolysis gas purification and cooling system 2 further includes a reformer 12 downstream of the cyclone 11 and upstream of the heat exchanger 20. The pyrolysis gas purification and cooling system 2 further includes one or more processing devices downstream of the heat exchanger 20 (hereinafter, these may be collectively referred to as "post-stage processing devices 13"). In this specification, the term "later stage" refers to the later stage along the supply flow of pyrolysis gas G1. The term "earlier stage" refers to the earlier stage along the supply flow of pyrolysis gas G1. The supply flow of pyrolysis gas G1 refers to the flow from when pyrolysis gas G1 is discharged from the gasifier 10 until synthesis gas G2 reformed in the reformer 12 is introduced into the organic substance generation unit 3.

[0015] <Gasification furnace> The gasifier 10 is a device that generates waste-derived pyrolysis gas G1 by burning or pyrolyzing waste. The waste to be gasified in the gasifier 10 may be industrial waste such as industrial solid waste, or general waste such as municipal solid waste (MSW), including combustible materials such as plastic waste, food waste, discarded tires, biomass waste, food waste, construction materials, wood, wood chips, fiber, and paper. Of these, municipal solid waste (MSW) is preferred. The gasifier 10 is not particularly limited, and examples thereof include a kiln gasifier, a fixed-bed gasifier, a fluidized-bed gasifier, a shaft furnace, a Thermoselect furnace, and a plasma gasifier. In addition to the waste, oxygen or air, and optionally steam, are also fed into the gasifier 10. The gasifier 10 heats the waste to, for example, 500 to 1,100°C, preferably 500 to 700°C, to pyrolyze it, and then gasifies it by appropriately partial oxidation. The pyrolysis gas G1 contains not only carbon monoxide and hydrogen, but also tar and char. The pyrolysis gas G1 is supplied to a pyrolysis gas purification and cooling device 2. Solids generated as incombustible materials in the gasifier 10 are appropriately recovered.

[0016] <Cyclone> The cyclone 11 is a device that introduces the pyrolysis gas G1 obtained in the gasification furnace 10 and rotates the pyrolysis gas G1 passing through the cyclone 11 to generate centrifugal force, which separates and removes solid dust components contained in the pyrolysis gas G1 and recovers them. In this specification, "dust components" refers to solid components such as tar and char contained in the pyrolysis gas G1. By separating and removing dust components from the pyrolysis gas G1 using the cyclone 11, the dust content in the pyrolysis gas G1 can be reduced, and a decrease in cooling efficiency or blockage of the gas flow path due to dust components can be prevented in the subsequent stage. The pyrolysis gas G1 from which dust components have been separated and removed by the cyclone 11 is supplied to the reformer 12. In this specification, "removal" means reducing the concentration of the target substance in the gas by removing at least a portion of the target substance from the gas, and is not limited to completely removing the target substance.

[0017] The temperature of the pyrolysis gas G1 supplied to the cyclone 11 is not particularly limited as long as it is within the heat resistance temperature range of the cyclone 11, but is, for example, 500°C or higher and 1,100°C or lower, preferably 500°C or higher and 900°C or lower, and more preferably 500°C or higher and 700°C or lower. By setting the temperature of the pyrolysis gas G1 supplied to the cyclone 11 within the above range, dust can be suitably separated and removed.

[0018] The dust separated and removed by the cyclone 11 and recovered is preferably reused, and more preferably supplied to the gasifier 10 via a dust supply path 11a provided in the cyclone 11. Since the main component of the dust separated and removed by the cyclone 11 is a carbon component, by re-supplying it to the gasifier 10, the carbon monoxide content in the synthesis gas G2 described below can be adjusted.

[0019] <Reforming furnace> In the reformer 12, the pyrolysis gas G1 obtained in the gasifier 10 is reformed, the content of at least one of hydrogen and carbon monoxide in the pyrolysis gas G1 increases, and the pyrolysis gas G1 is discharged as synthesis gas G2. In the reformer 12, for example, tar and char contained in the pyrolysis gas G1 are reformed into hydrogen, carbon monoxide, etc. The temperature of the synthesis gas G2 in the reformer 12 is not particularly limited, but is, for example, 900° C. or higher, preferably 900° C. or higher and 1,300° C. or lower, and more preferably 1,000° C. or higher and 1,200° C. By keeping the temperature in the reformer 12 within the above range, it becomes easier to obtain synthesis gas G2 with high carbon monoxide and hydrogen contents.

[0020] The temperature of the synthesis gas G2 discharged from the reformer 12 is the same as the temperature of the synthesis gas G2, for example, 900°C or higher, preferably 900°C or higher and 1,300°C or lower, and more preferably 1,000°C or higher and 1,200°C or lower. The synthesis gas G2 discharged from the reformer 12 contains carbon monoxide and hydrogen. The synthesis gas G2 contains, for example, 0.1% to 80% by volume of carbon monoxide and 0.1% to 80% by volume of hydrogen. The carbon monoxide concentration in the synthesis gas G2 is preferably 10% by volume or more and 70% by volume or less, more preferably 20% by volume or more and 55% by volume or less. The hydrogen concentration in the synthesis gas G2 is preferably 10% by volume or more and 70% by volume or less, more preferably 20% by volume or more and 55% by volume or less.

[0021] The synthesis gas G2 may contain carbon dioxide, nitrogen, oxygen, and the like in addition to hydrogen and carbon monoxide. The carbon dioxide concentration in the synthesis gas G2 is not particularly limited, but is preferably 0.1% by volume or more and 40% by volume or less, and more preferably 0.3% by volume or more and 30% by volume or less. It is particularly preferable to lower the carbon dioxide concentration when ethanol is produced using a microbial catalyst, and from this perspective, the carbon dioxide concentration is more preferably 0.5% by volume or more and 25% by volume or less. The nitrogen concentration in the synthesis gas G2 is usually 40% by volume or less, and preferably 1% by volume or more and 20% by volume or less. The oxygen concentration in the synthesis gas G2 is usually 5% by volume or less, and preferably 1% by volume or less. The lower the oxygen concentration, the better, and it is sufficient if it is 0% by volume or more. However, oxygen is generally inevitably contained in many cases, and the oxygen concentration is practically 0.01% by volume or more.

[0022] The concentrations of carbon monoxide, carbon dioxide, hydrogen, nitrogen, and oxygen in the synthesis gas G2 can be kept within a predetermined range by appropriately changing combustion conditions such as the type of waste, the temperatures of the gasifier 10 and the reformer 12, and the oxygen concentration of the feed gas supplied to the gasifier 10. For example, if it is desired to change the carbon monoxide or hydrogen concentration, one method is to change the waste to one with a high ratio of hydrocarbons (carbon and hydrogen), such as waste plastic, and if it is desired to decrease the nitrogen concentration, one method is to supply gas with a high oxygen concentration to the gasifier 10. Furthermore, the synthesis gas G2 may be adjusted in concentration as appropriate for each of the components carbon monoxide, carbon dioxide, hydrogen, and nitrogen by adding at least one of these components to the synthesis gas G2. The volume percentage of each substance in the synthesis gas G2 mentioned above means the volume percentage of each substance in the synthesis gas G2 discharged from the reformer 12.

[0023] <Heat exchanger> The synthesis gas G2 discharged from the reformer 12 passes through the heat exchanger 20. The heat exchanger 20 is a device that cools the synthesis gas G2 using a heat medium. The heat exchanger 20 cools the synthesis gas G2 by transferring the thermal energy of the synthesis gas G2 to the heat medium. A boiler is preferably used as the heat exchanger 20. A boiler is a device that circulates water as a heat medium inside and heats the circulating water with the thermal energy of the synthesis gas G2 to produce steam. When a boiler is used as the heat exchanger 20, it becomes possible to easily heat other devices with the steam generated in the boiler, and the thermal energy of the synthesis gas G2 can be easily reused.

[0024] However, the heat exchanger 20 can be anything other than a boiler. The heat exchanger 20 other than a boiler may have any configuration as long as it transfers thermal energy from the synthesis gas G2 to the heat transfer medium. However, a partition type in which the synthesis gas G2 and the heat transfer medium do not come into direct contact is preferred. The heat transfer medium may be either a gas or a liquid, or may be one that undergoes a phase change between gas and liquid. Furthermore, the heat transfer medium may be passed through a flow path of any shape, such as a tubular or plate-shaped path, to transfer thermal energy from the synthesis gas G2. Using a boiler as the heat exchanger 20 makes it difficult to cool to temperatures below 100°C, for example. However, using a heat exchanger 20 other than a boiler makes it possible to cool to temperatures below 100°C. Furthermore, the heat exchanger 20 may be a combination of two or more heat exchangers, such as a combination of a boiler and a heat exchanger other than a boiler.

[0025] As described above, the heat exchanger 20 cools the synthesis gas G2 supplied at a high temperature, for example, 900°C or higher, to a temperature of, for example, 30°C to 300°C, preferably 40°C to 240°C. Generally, when the synthesis gas G2 containing phase-transition impurities and dust is cooled to 240°C or lower, the phase-transition impurities such as naphthalene solidify and precipitate. The dust particles adsorb onto the surfaces of the precipitated phase-transition impurities, causing the gas flow path to become thicker and blockage. However, the synthesis gas G2 supplied to the heat exchanger 20 passes through the cyclone 11, where the dust particles are separated and removed. Therefore, even when the synthesis gas G2 is cooled to 240°C or lower, the dust particles are removed from the synthesis gas G2, preventing the synthesis gas G2 from becoming thicker due to the dust particles. Therefore, the synthesis gas G2 can be sufficiently cooled by the heat exchanger 20, reducing the cooling load on downstream processing equipment. For example, by cooling the synthesis gas G2 to 100°C or below, it is possible to omit the installation of part of the downstream cooling equipment (for example, a cooling tower, which will be described later). Also, for example, by cooling the synthesis gas G2 to about 40°C using the heat exchanger 20, synthesis gas G2 at a temperature appropriate for the microbial catalyst can be supplied to the organic substance production unit 3 without the need for a separate cooling device.

[0026] <Post-processing equipment> The pyrolysis gas purification and cooling system 2 includes a downstream treatment device 13 disposed downstream of the heat exchanger 20, such as a gas cooling tower, a filter-type dust collector, a scrubber, an oil scrubber, a gas chiller, or other moisture separators, a low-temperature separation (cryogenic) separator, a particulate separator composed of various filters, a desulfurization device (sulfide separator), a membrane separation device, a deoxygenation device, a pressure swing adsorption (PSA) separator, a temperature swing adsorption (TSA) separator, a pressure temperature swing adsorption (PTSA) separator, a separator using activated carbon, a separator using a deoxygenation catalyst, specifically, a separator using a copper catalyst or a palladium catalyst, a shift reactor, etc. These may be used alone or in combination of two or more.

[0027] Next, an example of the post-treatment device 13 will be described in more detail with reference to Fig. 2. The post-treatment device 13 shown in Fig. 2 includes a gas cooling tower 21 arranged downstream of the heat exchanger 20, a filter dust collector 22 arranged downstream of the gas cooling tower 21, and a scrubber 23 arranged downstream of the filter dust collector 22. In addition, the downstream treatment device 13 may further include other treatment devices (not shown) downstream of the scrubber 23, and the synthesis gas G2 discharged from the scrubber 23 may be appropriately treated, such as purified and cooled, by the downstream treatment device.

[0028] When the pyrolysis gas purification and cooling system 2 includes the post-treatment device 13 shown in FIG. 2 , the heat exchanger 20 cools the gas to a temperature of, for example, 100°C to 300°C, preferably 120°C to 240°C, and more preferably 140°C to 200°C. In the case of including the post-treatment device 13 shown in FIG. 2 , a gas cooling tower 21 is disposed downstream of the heat exchanger 20. Therefore, if the temperature cooled by the heat exchanger 20 is set within the above range, the synthesis gas G2 can be supplied to the gas cooling tower 21 at a relatively low temperature, eliminating the need for excessive cooling in the gas cooling tower 21. This reduces the amount of water sprayed onto the synthesis gas G2 in the gas cooling tower 21, and eliminates the need to supply the synthesis gas G2 with a high moisture content to the filter dust collector 22 and the scrubber 23. This reduces the amount of water moving from the gas cooling tower 21 to the scrubber 23 and also prevents excessive water condensation in the filter dust collector 22.

[0029] Gas Cooling Tower The gas cooling tower 21 is a facility that cools the gas (synthesis gas G2) passing through it by spraying water. The gas cooling tower 21 has one or more water spray ports 24 on its inner circumferential surface for spraying water onto the synthesis gas G2. Preferably, two or more water spray ports 24 are provided, and more preferably, the two or more water spray ports 24 are provided at different height positions in the cooling tower 21. By providing multiple water spray ports 24 and positioning them at different height positions, the synthesis gas G2 can be cooled sufficiently and efficiently by water spray.

[0030] The synthesis gas G2 is introduced into the gas cooling tower 21 preferably from its upper side, and the synthesis gas G2 is passed through the interior of the gas cooling tower 21 so as to form a downward current, and is cooled by water sprayed from the water spray nozzles 24 while passing through the interior of the gas cooling tower 21. In this case, the synthesis gas G2 is preferably discharged from the lower side of the gas cooling tower 21.

[0031] The synthesis gas G2 introduced into the gas cooling tower 21 has a temperature of 100°C or higher, while the water sprayed from the water spray nozzles 24 is lower than 100°C. Therefore, the synthesis gas G2 is cooled by this temperature difference and also by the heat of vaporization when the water sprayed from the water spray nozzles 24 vaporizes. It is preferable that some of the vaporized water is mixed into the synthesis gas G2 as water vapor. Note that the water sprayed from the water spray nozzles 24 may be partially or completely vaporized when sprayed.

[0032] In the gas cooling tower 21, the synthesis gas G2 is preferably cooled to a temperature of 100°C or higher and 200°C or lower, and is discharged to the outside of the gas cooling tower 21 in the above temperature range. By cooling the synthesis gas G2 to 200°C or lower, the synthesis gas G2 can be purified in the filter-type dust collector 22, which will be described later, without damaging the filter-type dust collector 22 or reducing its dust collection performance. Furthermore, by setting the temperature to 100°C or higher, most of the sprayed water is vaporized and mixed into the synthesis gas G2. Therefore, in the gas cooling tower 21, a large amount of sprayed water is not discharged, and therefore there is no need to install large-scale drainage equipment in the gas cooling tower 21.

[0033] However, a part of the water sprayed into the gas cooling tower 21 may fall as a liquid below the gas cooling tower 21 and be collected. In addition, solid impurities such as tar and char remaining in the synthesis gas G2 may also fall below by colliding with the sprayed water and be collected.

[0034] In the gas cooling tower 21, the synthesis gas G2 is preferably cooled to a temperature of 120°C or higher and 180°C or lower, and even more preferably 130°C or higher and 170°C or lower, and is then cooled to these temperatures and discharged to the outside. Cooling the synthesis gas G2 to 120°C or higher can prevent a large amount of water mixed into the synthesis gas G2 from liquefying in the gas cooling tower 21 and further in the filter dust collector 22 described below. Furthermore, setting the temperature to 180°C or lower makes it even easier to avoid damage to and deterioration of the filter dust collector 22.

[0035] 《Filtering dust collector》 The synthesis gas G2 cooled in the gas cooling tower 21 passes through a filter-type dust collector 22. A so-called bag filter can be used as the filter-type dust collector 22, and the filter-type dust collector 22 includes a casing and a filter medium housed inside the casing. The filter medium is not particularly limited, but examples of the filter medium include woven fabric or felt made of glass fiber or PTFE fiber. The synthesis gas G2 may contain solid impurities such as tar and char that were not completely removed by the cyclone 11, but the solid impurities are removed by passing through the filter dust collector 22. Removing the solid impurities can prevent the solid impurities from clogging the devices downstream of the filter dust collector 22. For example, in the organic substance production unit 3, gas is generally blown into the reactor through a sparger, but clogging of the sparger with solid impurities can be prevented. Furthermore, removing the solid impurities makes it easier to increase the activity of the microbial catalyst in the organic substance production unit 3 and can prevent the microbial catalyst from dying due to the influence of impurities, allowing organic substances to be synthesized with high conversion efficiency.

[0036] As described above, the synthesis gas G2 is cooled in the gas cooling tower 21, and therefore the temperature of the synthesis gas G2 when passing through the filter-type dust collector 22 is preferably 100°C or higher and 200°C or lower, more preferably 120°C or higher and 180°C or lower, and even more preferably 130°C or higher and 170°C or lower. This prevents the filter-type dust collector 22 from being damaged by the high-temperature synthesis gas G2 or from having its filtering performance reduced. Furthermore, it is also possible to prevent a large amount of the synthesis gas G2 contained in the synthesis gas G2 from being liquefied in the filter-type dust collector 22.

[0037] Scrubba The synthesis gas G2 cooled in the gas cooling tower 21 passes through the scrubber 23. In this embodiment, the synthesis gas G2 cooled in the gas cooling tower 21 and discharged from the filter-type dust collector 22 passes through the scrubber 23, which is arranged downstream of the filter-type dust collector 22. The synthesis gas G2 contains various impurities in addition to the solid impurities described above, such as water-soluble impurities. Examples of water-soluble impurities include acid gases such as hydrogen sulfide, hydrogen chloride, and hydrocyanic acid, basic gases such as ammonia, and oxides such as NOx and SOx. These water-soluble impurities are removed by passing through the scrubber 23. The synthesis gas G2 also contains oily impurities such as BTEX (benzene, toluene, ethylbenzene, xylene), naphthalene, 1-naphthol, and 2-naphthol, but these may also be removed appropriately in the scrubber 23, and solid impurities that could not be collected by the filter-type dust collector 22 may also be removed appropriately.

[0038] The scrubber 23 is not particularly limited as long as it has a configuration that brings the synthesis gas G2 into contact with water, but it is preferable that the scrubber 23 has a configuration that brings water (for convenience, also referred to as "wash water") sprayed from a nozzle 25 provided at the top into contact with the synthesis gas G2, as shown in Fig. 2. In this case, the scrubber 23 may be provided with an inlet passage 27, a supply passage 28, a discharge passage 29, etc. Furthermore, a reservoir 26 in which wash water is stored is provided below the scrubber 23. The wash water stored in the reservoir 26 may be appropriately stirred by a stirring device (not shown).

[0039] The inlet passage 27 is a path for introducing the synthesis gas G2 into the scrubber 23, and the inlet 27A of the inlet passage 27 is provided, for example, above the liquid level of the cleaning water stored in the storage section 26 inside the scrubber 12. The supply path 28 circulates water in the scrubber 23 and supplies wash water to bring it into contact with the synthesis gas G2. Specifically, the supply path 28 sprays wash water stored in the storage section 26 downward from the nozzles 25 inside the scrubber 23 and brings it into contact with the synthesis gas G2. Here, the supply path 28 is provided with, for example, a pump (not shown), and the wash water is pressure-fed to the nozzles 25 by the pump. Then, the wash water is sprayed downward from the nozzles 25 inside the scrubber 12. The discharge path 29 is provided at the top of the scrubber 12 and discharges the synthesis gas G2 to the outside after coming into contact with the wash water sprayed from the nozzles 25. The cleaning water used in the scrubber 23 may be water alone, or may contain chemicals as appropriate.

[0040] Furthermore, the scrubber 23 may be provided with a removal device 19. The removal device 19 is, for example, a device for removing impurities (oil-based impurities, solid impurities, water-soluble impurities, etc.) contained in the wash water. For example, a circulation path is provided for circulating the water in the reservoir 26, and the removal device 19 may be provided midway through this path. The removal device 19 may remove, for example, oil-based impurities contained in the wash water, solid impurities not dissolved in the wash water, water-soluble impurities dissolved in the wash water, etc. Therefore, the removal device 19 may be an oil-water separator, a filter for removing solid impurities, a combination of two or more of these, or any other configuration that can remove impurities contained in the wash water. By providing the removal device 19, the scrubber 23 prevents impurities from accumulating in the wash water.

[0041] The synthesis gas G2 may be cooled by contacting it with water in the scrubber 23. As described above, the synthesis gas G2 is cooled in the gas cooling tower 21 and introduced into the scrubber 23 in a state cooled to a predetermined temperature (preferably 100°C or higher and 200°C or lower, more preferably 120°C or higher and 180°C or lower, and even more preferably 130°C or higher and 170°C). On the other hand, the temperature of the water that comes into contact with the synthesis gas G2 in the scrubber 23 is less than 100°C, preferably 0°C or higher and 40°C or lower, and more preferably 5°C or higher and 30°C or lower. In this specification, the "temperature of water in contact with the synthesis gas G2" refers to, in the case where wash water is circulated and brought into contact with the synthesis gas G2 as described above, measuring the temperature of the water immediately before the water comes into contact with the synthesis gas G2, that is, the temperature of the water (wash water) sprayed from the nozzle 15. In addition, in the case where the synthesis gas G2 is introduced into stored water (wash water) as will be described later, measuring the temperature of the wash water stored in the storage section 26.

[0042] In the scrubber 23, the synthesis gas G2 comes into contact with water at the above temperature, and is thereby cooled in the scrubber 23 to a temperature below 100°C, preferably 40°C or lower, and more preferably 38°C or lower. When the synthesis gas G2 is cooled in the scrubber 23 to a predetermined temperature below the boiling point of water in this manner, at least a portion of the water (water vapor) mixed into the synthesis gas G2 is condensed and removed in the gas cooling tower 22. Therefore, it is possible to appropriately remove water without separately providing a large-scale device for removing the mixed water using the gas cooling tower 22. Furthermore, by cooling the synthesis gas G2 to 40°C or lower, it is possible to supply the synthesis gas G2 at an appropriate temperature to the organic substance generation unit 3 without separately providing a cooling device. Furthermore, even if a cooling device is included in the treatment device provided downstream of the scrubber 23, the load on the cooling device can be reduced. By contacting the synthesis gas G2 with water, it is preferable that the synthesis gas G2 is cooled to a temperature of, for example, 0°C or higher, and preferably to a temperature of 5°C or higher.

[0043] The scrubber 23 is preferably provided with a temperature control device (not shown), which controls the temperature of the wash water. The temperature control device may be attached to the supply path 28, for example, to adjust the temperature of the wash water passing through the supply path 28, or may be attached to the outer periphery of the scrubber 23 to adjust the temperature of the wash water stored in the reservoir 26 of the scrubber 23. The temperature control device may cool the wash water passing through the supply path 28 or the wash water stored in the reservoir 26 to keep the temperature within the above-mentioned range. The water stored in the reservoir 26 may also be replaced as needed to maintain the temperature of the water coming into contact with the synthesis gas G2 within a certain temperature range.

[0044] In the above description, the scrubber 23 has been described as a mode in which the synthesis gas G2 comes into contact with the cleaning water sprayed from the nozzle 25, but the synthesis gas G2 may also be introduced into the cleaning water stored in the storage section 26. In this case, the supply path 28 and the nozzle 25 are omitted, and the cleaning water is not sprayed from the nozzle. Also, the inlet 27A of the introduction path 27 is disposed below the liquid level of the cleaning water stored in the storage section 26. The synthesis gas G2 comes into contact with the cleaning water stored in the storage section 26, and thereby the synthesis gas G2 is preferably cleaned and cooled. Even when synthesis gas G2 is introduced into the cleaning water stored in the storage section 26, the temperature of the water in contact with the synthesis gas G2 and the temperature of the synthesis gas G2 (i.e., the temperature of the synthesis gas G2 introduced into the scrubber 23, and the temperature of the synthesis gas G2 after cooling) are as described above.

[0045] Next, a first modified example of the post-treatment device 13 will be described in more detail with reference to Fig. 3. The post-treatment device 13 shown in Fig. 3 includes a filter-type dust collector 22 arranged downstream of the heat exchanger 20, and a scrubber 23 downstream of the filter-type dust collector 22. That is, although the above embodiment has shown a configuration in which the gas cooling tower 21 is provided, the gas cooling tower 21 may be omitted. When the gas cooling tower 21 is omitted, the synthesis gas G2 that has passed through at least the filter-type dust collector 22 and the scrubber 23 is brought into contact with a microbial catalyst in the organic substance generation section 3 and converted into organic substances. The synthesis gas G2 supplied to the filter-type dust collector 22 and the scrubber 23 passes through the cyclone 11, and therefore dust components are separated and removed in the cyclone 11, and therefore the load on the purification process of each of the filter-type dust collector 22 and the scrubber 23 is maintained low. Furthermore, the synthesis gas G2 discharged from the scrubber 23 may be further purified by other devices in the post-treatment device 13.

[0046] 3, the cooling temperature in the heat exchanger 20 is, for example, 100°C or higher and 200°C or lower, preferably 120°C or higher and 180°C or lower, and more preferably 130°C or higher and 170°C or lower. When the post-processing device 13 shown in FIG. 3 is provided, the filter-type dust collector 22 is disposed downstream of the heat exchanger 20, so that the heat exchanger 20 must cool the gas to a temperature equal to or lower than the heat resistance temperature of the filter-type dust collector 22. Setting the cooling temperature in the heat exchanger 20 within the above range prevents the filter-type dust collector 22 from being damaged by the high-temperature synthesis gas G2 and prevents a decrease in filtering performance.

[0047] Next, a second modified example of the post-treatment device 13 will be described in more detail with reference to FIG. 4. The post-treatment device 13 shown in FIG. 4 includes a gas cooling tower 21 disposed downstream of the heat exchanger 20 and a filter-type dust collector 22 disposed downstream of the gas cooling tower 21. That is, although the above embodiment has shown a configuration in which the scrubber 23 is provided, the scrubber 23 may be omitted. When the scrubber 23 is omitted, the synthesis gas G2 that has passed through at least the gas cooling tower 21 and the filter-type dust collector 22 is brought into contact with a microbial catalyst in the organic substance generation section 3 and converted into organic substances. In this embodiment, the synthesis gas G2 discharged from the filter-type dust collector 22 is typically at a relatively high temperature (for example, 100°C or higher). However, when the scrubber 23 is omitted, it is preferable that a cooling device other than the scrubber 23 be provided downstream of the filter-type dust collector 22, and the synthesis gas G2 discharged from the filter-type dust collector 22 be cooled by a cooling device other than the scrubber 23. Furthermore, when the scrubber 23 is omitted, in addition to the cooling device, one or more treatment devices selected from the above-mentioned downstream treatment devices may be provided downstream of the filter dust collector 22, and the synthesis gas G2 discharged from the filter dust collector 22 may be appropriately treated in the downstream treatment device. Furthermore, in cases where there is no need to purify the organic substance produced in the organic substance production unit 3 or where there is no need to separate water from the organic substance-containing liquid, the separation device 31 may be omitted. The synthesis gas G2 discharged from the filter-type dust collector 22 may be further purified by a treatment device arranged in the subsequent stage of the filter-type dust collector 22.

[0048] When the pyrolysis gas purification and cooling system 2 includes the post-treatment device 13 shown in FIG. 4, the cooling temperature in the heat exchanger 20 is, for example, 150°C to 300°C, preferably 170°C to 280°C, and more preferably 190°C to 260°C. When the post-treatment device 13 shown in FIG. 4 is included, the gas cooling tower 21 is disposed downstream of the heat exchanger 20. Therefore, by keeping the temperature within the above range, the synthesis gas G2 at a relatively low temperature is supplied to the gas cooling tower 21, eliminating the need for excessive cooling in the gas cooling tower 21. This reduces the amount of water sprayed onto the synthesis gas G2 in the gas cooling tower 21, and eliminates the need to supply the synthesis gas G2 with a high moisture content to the filter dust collector 22. This also prevents excessive water condensation in the filter dust collector 22.

[0049] Next, a third modified example of the post-treatment device 13 will be described in more detail with reference to Fig. 5. The post-treatment device 13 shown in Fig. 5 includes a gas cooling tower 21 disposed downstream of the heat exchanger 20, and a scrubber 23 downstream of the gas cooling tower 21. That is, although the above embodiment shows a configuration in which the filter-type dust collector 22 is provided, the filter-type dust collector 22 may be omitted. If the filter-type dust collector 22 is omitted, the synthesis gas G2 cooled in the gas cooling tower 21 will be supplied to the scrubber 23 without passing through the filter-type dust collector 22, but this does not pose a problem because the synthesis gas G2 passes through the cyclone 11 and dust is separated and removed in the cyclone 11. The synthesis gas G2 discharged from the scrubber 23 may be further purified by other devices in the post-treatment device 13.

[0050] When the pyrolysis gas purification and cooling system 2 includes the post-stage treatment device 13 shown in FIG. 5, the cooling temperature in the heat exchanger 20 is, for example, 200°C or higher and 300°C or lower, preferably 210°C or higher and 290°C or lower, and more preferably 220°C or higher and 280°C or lower. When the post-stage treatment device 13 shown in FIG. 5 is included, the gas cooling tower 21 is disposed downstream of the heat exchanger 20. Therefore, when the temperature is within the above range, the synthesis gas G2 at a relatively low temperature is supplied to the gas cooling tower 21, and excessive cooling in the gas cooling tower 21 is not required. This allows the amount of water sprayed onto the synthesis gas G2 in the gas cooling tower 21 to be reduced, and furthermore, it is not necessary to supply the synthesis gas G2 with a high moisture content to the scrubber 23. This allows the amount of water transferred from the gas cooling tower 21 to the scrubber 23 to be reduced.

[0051] Next, a fourth modified example of the post-treatment device 13 will be described in more detail with reference to Fig. 6. The post-treatment device 13 shown in Fig. 6 includes a filter-type dust collector 22 arranged after the heat exchanger 20. That is, although the above embodiment shows a configuration in which the gas cooling tower 21 and the scrubber 23 are provided, the gas cooling tower 21 and the scrubber 23 may be omitted. The synthesis gas G2 discharged from the filter-type dust collector 22 may be further purified by other devices in the post-treatment device 13.

[0052] When the pyrolysis gas purification and cooling system 2 includes the post-processing device 13 shown in FIG. 6, the heat exchanger 20 cools the gas to a temperature of, for example, 30°C to 60°C, preferably 35°C to 55°C, and more preferably 40°C to 50°C. In the case of the post-processing device 13 shown in FIG. 6, the filter dust collector 22 is disposed downstream of the heat exchanger 20, and no other cooling device is provided. Therefore, by setting the cooling temperature in the heat exchanger 20 within the above range, it is possible to prevent the filter dust collector 22 from being damaged by the high-temperature synthesis gas G2 or a decrease in filtering performance. Furthermore, it is easy to increase the activity of the microbial catalyst in the organic substance generation section 3 downstream of the post-processing device 13, and it is also possible to prevent the microbial catalyst from dying due to the influence of impurities.

[0053] In the above explanation, several modified configurations of the post-stage treatment device 13 have been shown, but the configuration is not limited to these, and any configuration can be used as long as it is capable of supplying a synthesis gas G2 suitable for the organic substance generation unit 3 arranged in a subsequent stage. For example, if the synthesis gas G2 can be sufficiently purified by the cyclone 11, the configuration may include only the gas cooling tower 21 among the gas cooling tower 21, filter-type dust collector 22, and scrubber 23. Also, if the gas cooling tower 21, filter-type dust collector 22, and scrubber 23 can be configured to include only the scrubber 23. Furthermore, if the synthesis gas G2 can be sufficiently purified and cooled by the cyclone 11 and the heat exchanger 20, the gas cooling tower 21, filter-type dust collector 22, and scrubber 23 may all be omitted from the post-stage treatment device 13.

[0054] <Organic substance generation section> As described above, the synthesis gas G2 that has passed through at least the cyclone 11 and the heat exchanger 20 in the pyrolysis gas purification and cooling device 2 is supplied to the organic substance production section 3, as shown in Fig. 1. The synthesis gas G2 supplied to the organic substance production section 3 is preferably synthesis gas G2 that has passed through the heat exchanger 20, gas cooling tower 21, filter-type dust collector 22, and scrubber 23 in this order. The organic substance production section 3 produces organic substances by bringing the synthesis gas G2 into contact with a microbial catalyst. A gas-assimilating microorganism is preferably used as the microbial catalyst. The organic substance production unit 3 includes a fermenter (reactor) filled with a culture solution containing water and a microbial catalyst. Syngas G2 is supplied to the inside of the fermenter, and the syngas G2 is converted into organic substances inside the fermenter. The organic substances preferably contain either ethanol or isopropanol, and more preferably contain ethanol.

[0055] The fermenter is preferably a continuous fermentation apparatus, and may be any of agitation type, airlift type, bubble column type, loop type, open bond type, and photobio type. The synthesis gas G2 and the culture solution may be continuously supplied to the fermenter, but it is not necessary to supply the synthesis gas G2 and the culture solution simultaneously, and the synthesis gas G2 may be supplied to a fermenter to which the culture solution has been previously supplied. The synthesis gas G2 is generally blown into the fermenter through a sparger or the like. The medium used to cultivate a microbial catalyst is not particularly limited as long as it has an appropriate composition depending on the bacterium, but is a liquid containing water as the main component and nutrients (e.g., vitamins, phosphoric acid, etc.) dissolved or dispersed in this water. In the organic substance producing section 3, organic substances are produced by microbial fermentation using a microbial catalyst, and an organic substance-containing liquid is obtained.

[0056] The temperature of the fermenter is preferably controlled to 40° C. or less. By controlling the temperature to 40° C. or less, the microbial catalyst in the fermenter does not die, and organic substances such as ethanol are efficiently produced by contacting the synthesis gas G2 with the microbial catalyst. The temperature of the fermenter is more preferably 38°C or lower, and in order to enhance catalytic activity, it is preferably 10°C or higher, more preferably 20°C or higher, and even more preferably 30°C or higher.

[0057] <Separation device> The organic substance producing apparatus 1 includes a separation device 31 that separates at least water from the organic substance-containing liquid. The separation device 31 preferably includes a distillation device 33, and more preferably includes a solid-liquid separation device 32 in the upstream stage of the distillation device 33. It is more preferable that the separation device 31 is a combination of the solid-liquid separation device 32 and the distillation device 33. The separation step performed using the combination of the solid-liquid separation device 32 and the distillation device 33 will be specifically described below.

[0058] 《Solid-liquid separator》 The organic substance-containing liquid obtained in the organic substance production unit 3 may be separated in a solid-liquid separator 32 into a solid component mainly composed of microorganisms and a liquid component containing organic substances. The organic substance-containing liquid obtained in the organic substance production unit 3 contains, in addition to the target organic substance, microorganisms and their carcasses contained in the fermenter as solid components, so solid-liquid separation is performed to remove these. The solid-liquid separator 32 may be a filter, a centrifuge, or a device using a solution precipitation method. The solid-liquid separator 32 may also be a device (e.g., a heat drying device) that evaporates the liquid component containing the organic substance from the organic substance-containing liquid and separates it from the solid component. In this case, all of the liquid component containing the target organic substance may be evaporated, or the liquid component may be partially evaporated so that the target organic substance is preferentially evaporated.

[0059] Distillation Apparatus The distillation apparatus 33 performs distillation to separate the target organic substances. The distillation apparatus 33 can purify large amounts of organic substances to high purity with a simple operation through separation by distillation. In the separation process performed by the distillation apparatus 33 in combination with the solid-liquid separation apparatus 32, the distillation apparatus 33 further performs distillation to separate the target organic substances from the liquid components separated by the solid-liquid separation apparatus 32, thereby purifying large amounts of organic substances to higher purity. A known distillation column or the like can be used as the distillation apparatus 33. The distillation may be performed, for example, such that the distillate contains the target organic substance (e.g., ethanol) at a high purity, while the bottoms (i.e., distillation residue) contains water as the main component (e.g., 70% by mass or more, preferably 90% by mass or more). By performing the distillation in this manner, the target organic substance and water can be largely separated.

[0060] The temperature inside the distillation apparatus 33 during distillation of an organic substance (for example, ethanol or isopropanol) is not particularly limited, but is preferably 100° C. or less, and more preferably about 70 to 95° C. By setting the temperature inside the distillation apparatus 33 within the above range, it is possible to reliably separate the necessary organic substance from other components such as water. The pressure inside the distillation apparatus 33 during distillation of the organic substances may be normal pressure, but is preferably less than atmospheric pressure, more preferably about 60 to 150 kPa (gauge pressure). By setting the pressure inside the distillation apparatus 33 within the above range, the separation efficiency of the organic substances can be improved, and the yield of the organic substances can be increased.

[0061] The distillation apparatus 33 preferably utilizes thermal energy obtained from the synthesis gas G2 by the heat exchanger 20 described above for distillation. The distillation apparatus 33 can increase the temperature inside the distillation apparatus 33 during the distillation of the organic substance by reusing the thermal energy obtained from the synthesis gas G2 in the heat exchanger 20. In this way, by the distillation apparatus 33 reusing the thermal energy obtained from the synthesis gas G2 in the heat exchanger 20, the amount of energy used in the entire organic substance production process can be reduced. The thermal energy obtained from the synthesis gas G2 in the heat exchanger 20 can be transferred via a thermal energy path 33a connecting the heat exchanger 20 and the distillation apparatus 33. The thermal energy path 33a is not particularly limited and may have any configuration that transfers the thermal energy of the synthesis gas G2 from the heat exchanger 20 to the distillation apparatus 33 using a heat medium. The heat medium may be either a gas or a liquid, and may also be one that undergoes a phase change between gas and liquid. Furthermore, as described above, the heat exchanger 20 is preferably a boiler, and therefore, steam is preferred as the heat medium. By using steam as a heat medium, it is easy to reuse the thermal energy of the synthesis gas G2. When steam is used as a heat medium, part of the steam may be liquefied.

[0062] The water separated in the separator 31 is preferably reused, and more preferably supplied to the gas cooling tower 21 and used for water spray in the gas cooling tower 21. Reusing the water in this manner prevents the water no longer needed in the organic substance production section 3 from being discharged as wastewater, which is preferable from the standpoints of environmental protection and economy. The organic substance production apparatus 1 may also have a water supply path 31a that is connected to the separator 31 and the gas cooling tower 21 and supplies the water obtained in the separator 31 to the gas cooling tower 21. The water supply path 31a is not particularly limited, but may be composed of piping or the like. The water separated in the separator 31 may also be further purified to increase its purity before being supplied to the gas cooling tower 21.

[0063] As described above, according to this embodiment, by separating and removing dust from the pyrolysis gas G1 using the cyclone 11, the dust content in the pyrolysis gas G1 can be reduced, and a decrease in cooling efficiency or blockage of the gas flow path caused by the dust can be prevented in the subsequent stage. Furthermore, according to this embodiment, the thermal energy obtained from the synthesis gas G2 by the heat exchanger 20 can be used to increase the temperature inside the distillation apparatus 33 during the distillation of the organic substance. This makes it possible to reduce the amount of energy procured from outside for the distillation in the distillation apparatus 33, thereby enabling a reduction in the amount of energy used in the entire production process of the organic substance.

[0064] According to this embodiment, by providing a cyclone 11 downstream of the gasification furnace 10, the synthesis gas G2 supplied to the heat exchanger 20 passes through the cyclone 11, where dust is separated and removed. Even if the synthesis gas G2 is cooled to 240°C or less in the heat exchanger 20, it is possible to suppress expansion due to the dust. Furthermore, by cooling the synthesis gas G2 to 100°C or less in the heat exchanger 20, it is possible to omit the installation of part of the downstream cooling device. Furthermore, by cooling the synthesis gas G2 to about 40°C in the heat exchanger 20, it is possible to supply the synthesis gas G2 at a temperature appropriate for the microbial catalyst to the organic matter production unit 3 without providing a separate cooling device.

[0065] In the above embodiment, the pyrolysis gas G1 is obtained from waste in the gasifier 10. However, the pyrolysis gas G1 may be generated from sources other than waste in the gasifier 10. For example, the pyrolysis gas G1 may be generated from fossil resources such as natural gas, coal, heavy oil, petroleum exhaust gas, and oil shale, or from biomass other than waste. Furthermore, the pyrolysis gas G1 may be a by-product gas in various manufacturing processes such as a steel manufacturing process. For example, the gasifier 10 may be part of a steel manufacturing facility.

[0066] (Second embodiment) Next, a second embodiment of the present invention will be described. In the following, the second embodiment will be described by omitting the explanation of the overlapping parts with the first embodiment, and will focus on the differences from the first embodiment. The organic substance producing apparatus 1 in the second embodiment differs from the first embodiment in that a reformer 12 is disposed in front of a cyclone 11, as shown in FIG.

[0067] The cyclone 11 in the second embodiment is a device that introduces the synthesis gas G2 obtained in the reformer 12 and swirls the synthesis gas G2, which is a mixture of solids and gases, to generate centrifugal force, which separates and removes solid dust components such as tar and char from the synthesis gas G2. By separating and removing dust components from the synthesis gas G2 using the cyclone 11, the dust content in the synthesis gas G2 can be reduced, and it is possible to prevent a decrease in cooling efficiency or blockage of the gas flow path caused by the dust components in a subsequent stage. The synthesis gas G2 from which the dust components have been separated and removed by the cyclone 11 is supplied to the heat exchanger 20.

[0068] In the above explanation, the gasification furnace 10 and the reformer 12 have been described as being different from each other, but the gasification furnace 10 and the reformer 12 may be integrated into one device, or any type of gasification device may be used as long as it is capable of producing synthesis gas G2.

[0069] The organic substance manufacturing apparatus and organic substance manufacturing method according to the second embodiment of the present invention can achieve the same effects as those described in the organic substance manufacturing apparatus and organic substance manufacturing method according to the first embodiment.

[0070] (Third embodiment) Next, a third embodiment of the present invention will be described. In the following, the description of the third embodiment will be omitted for the overlapping parts with the first embodiment, and only the differences from the first embodiment will be described. 8, the organic substance manufacturing apparatus 1 in the third embodiment is different in that it includes a filter-type dust collector 22 and a scrubber 23 as post-processing devices 13, and the filter-type dust collector 22 and the scrubber 23 are arranged in parallel at the post-stage of the heat exchanger 20. That is, in the organic substance manufacturing apparatus 1 in the third embodiment, the synthesis gas G2 discharged from the heat exchanger 20 is supplied to either the filter-type dust collector 22 or the scrubber 23 and subjected to a purification process.

[0071] 8 is provided, the cooling temperature in the heat exchanger 20 is, for example, 100°C or higher and 200°C or lower, preferably 120°C or higher and 180°C or lower, and more preferably 130°C or higher and 170°C or lower. When the post-treatment device 13 shown in Fig. 8 is provided, the filter dust collector 22 is disposed downstream of the heat exchanger 20, so that the heat exchanger 20 needs to cool the filter dust collector 22 to a temperature lower than its heat resistance temperature. Setting the temperature to which the heat exchanger 20 cools within the above range prevents the filter dust collector 22 from being damaged by the high-temperature synthesis gas G2 and prevents a decrease in filtering performance.

[0072] The organic substance producing apparatus 1 in the third embodiment further includes a differential pressure measuring device 40 and a flow path switching unit 41.

[0073] <Differential pressure measuring instrument> The differential pressure measuring device 40 measures the differential pressure between the upstream and downstream of the filter-type dust collector 22. The differential pressure measuring device 40 measures the differential pressure between the synthesis gas G2 supplied to the filter-type dust collector 22 and the synthesis gas G2 discharged from the filter-type dust collector 22, and if the differential pressure exceeds a predetermined pressure (reference value), it is determined that a blockage has occurred in the filter-type dust collector 22. If the measurement result of the differential pressure measuring device 40 indicates that the differential pressure does not exceed the reference value, the organic substance production apparatus 1 operates normally, in which the synthesis gas G2 is supplied to the filter-type dust collector 22 and the synthesis gas G2 is purified by the filter-type dust collector 22. On the other hand, if the measurement result of the differential pressure measuring device 40 indicates that the differential pressure exceeds the reference value, the supply of the synthesis gas G2 to the filter-type dust collector 22 is stopped and the synthesis gas G2 is supplied to the scrubber 23 in order to perform maintenance to unclog the filter-type dust collector 22. The reference value in the differential pressure measuring device 40 refers to the value indicated by the differential pressure measuring device 40 when the filtering dust collector 22 is properly refining the synthesis gas G2. As the differential pressure measuring device 40, a known measuring device capable of measuring the differential pressure between the upstream and downstream stages of the filtering dust collector 22 can be used.

[0074] <Flow path switching section> The organic substance manufacturing apparatus 1 includes a flow path switching unit 41 that selectively switches between the filter-type dust collector 22 and the scrubber 23 through which the synthesis gas G2 passes. The flow path switching unit 41 can be configured, for example, by a two-way switching valve or a three-way switching valve. The flow path switching unit 41 selectively switches the supply destination of the synthesis gas G2 discharged from the heat exchanger 20 to either the filter-type dust collector 22 or the scrubber 23. For example, during normal operation of the organic substance manufacturing apparatus 1, the flow path switching unit 41 selects the filter-type dust collector 22 as the supply destination of the synthesis gas G2. In this way, by selecting the filter-type dust collector 22 as the supply destination of the synthesis gas G2 during normal operation of the organic substance manufacturing apparatus 1, the operation of the scrubber 23 can be stopped and no wastewater is generated from the scrubber 23, thereby eliminating the problems of wastewater treatment costs and environmental load. Furthermore, when the organic substance production apparatus 1 is not in normal operation, for example, when clogging occurs in the filter dust collector 22, the flow path switching unit 41 selects the scrubber 23 as the supply destination of the synthesis gas G2. In this way, by using the scrubber 23 when the organic substance production apparatus 1 is not in normal operation, continuous operation is possible without stopping the production of the synthesis gas G2, thereby preventing a decrease in production efficiency. Furthermore, when a microbial catalyst is used in the organic substance production unit 5, continuous operation is possible, so the purified synthesis gas G2 can be continuously supplied to the organic substance production unit 5, preventing the microbial catalyst from dying.

[0075] The flow path switching unit 41 may select a supply destination of the synthesis gas G2 discharged from the gasification apparatus 2 according to the measurement results obtained by the differential pressure measuring instrument 40. Specifically, the differential pressure measuring instrument 40 measures the differential pressure between the upstream and downstream stages of the filtering dust collector 22, and if the differential pressure does not exceed a reference value, the flow path switching unit 41 supplies the synthesis gas G2 to the filtering dust collector 22. On the other hand, the differential pressure measuring instrument 40 measures the differential pressure between the upstream and downstream stages of the filtering dust collector 22, and if the differential pressure exceeds a reference value, it is determined that a blockage has occurred in the filtering dust collector 22, and the flow path switching unit 41 supplies the synthesis gas G2 to the scrubber 23.

[0076] Next, a first modified example of post-processing device 13 provided in organic substance producing apparatus 1 in the third embodiment will be described in more detail with reference to Fig. 9. Post-processing device 13 shown in Fig. 9 includes a concentration measuring device .

[0077] <Concentration measuring device> The concentration measuring device 42 is a device that measures the concentration of impurities in the synthesis gas G2 discharged from the heat exchanger 20, and measures, for example, the concentration of at least one selected from phase transition impurities and solid impurities in the synthesis gas G2. The concentration of a specific impurity (for example, at least one selected from phase-transition impurities and solid impurities) is measured by a concentration measuring device 42, and if the concentration of the impurity exceeds a predetermined value (reference value), it is determined that the purification processing capacity of the filter-type dust collector 22 is exceeded, and synthesis gas G2 is supplied to the scrubber 23 to avoid clogging of the filter-type dust collector 22. The concentration of a specific impurity may be the concentration of a phase-transition impurity. Phase-transition impurities are impurities that can undergo a phase transition between a gas phase and a solid phase, such as sublimable substances such as naphthalene, 1-naphthol, and 2-naphthol. The concentration of a phase-transition impurity may be the concentration of a specific component of the phase-transition impurities or the concentration of the total amount of the phase-transition impurities. The concentration of naphthalene is an example of the concentration of specific components of phase transition impurities. Naphthalene is contained in large amounts in waste-derived synthesis gas, and by measuring the concentration of naphthalene as a representative component, the concentration of phase transition impurities contained in the entire synthesis gas can be roughly determined. The standard value for the concentration of phase transition impurities is, for example, a naphthalene concentration of 500 ppm or more. The concentration of a specific component may also be the concentration of the total amount of two or more components such as naphthalene, 1-naphthol, and 2-naphthol.

[0078] Regarding solid impurities, the concentration of the entire solid impurities may be measured, or the concentration of a specific component of the solid impurities may be measured. The concentration of the entire solid impurities may be measured, for example, by adjusting the synthesis gas G2 to a predetermined temperature and measuring the concentration of the entire solid impurities contained in the synthesis gas G2 adjusted to that constant temperature. Furthermore, the concentration of a specific component of the solid impurities may be measured, such as the concentration of tar alone, char alone, or the total amount of tar and char. The standard value for the concentration of solid impurities is, for example, a tar concentration of 5 g / Nm 3 and the dust concentration is 50g / Nm 3 However, these solid impurities and concentration ranges are only examples, and other solid impurities and concentration ranges are also applicable.

[0079] Furthermore, the concentrations of both phase-transition impurities and solid impurities may be measured. Specifically, the concentrations of both phase-transition impurities and solid impurities may be measured, or the total concentration may be measured. Furthermore, the concentrations of both a specific component of phase-transition impurities and a specific component of solid impurities may be measured. When the concentrations of two or more components are measured, although not particularly limited, for example, it is recommended that the synthesis gas G2 be supplied to the scrubber 23 when the concentration of one of the measured components exceeds a reference value.

[0080] Examples of the concentration measuring instrument 42 include various measuring instruments such as a gas chromatography instrument, a mass spectrometer, a gas chromatography-mass spectrometer, a secondary ion mass spectrometer, an atomic absorption spectrometer, a Raman spectrometer, and a Fourier transform infrared spectrometer. The concentration of solid impurities may be measured by collecting the solid impurities using an adsorbent, filter, or the like maintained at a specific temperature, and measuring the collected components with the above-mentioned measuring device. The concentration of phase transfer impurities may also be measured by collecting the solid impurities using an adsorbent, or the like, and measuring the collected components with the above-mentioned measuring device.

[0081] The flow path switching unit 41 may select a supply destination of the synthesis gas G2 discharged from the heat exchanger 20 according to the measurement results of the concentration measuring device 42 described above. Specifically, the concentration measuring device 42 measures the concentration of a specific impurity (for example, at least one selected from phase-transition impurities and solid impurities), and if the concentration does not exceed a reference value, it is determined that the concentration is within the range of the purification treatment capacity of the filtering-type dust collector 22, and the flow path switching unit 41 supplies the synthesis gas G2 to the filtering-type dust collector 22 as normal operation. On the other hand, if the concentration measuring device 42 measures the concentration of at least one of phase-transition impurities and solid impurities, and if the concentration of at least one of phase-transition impurities and solid impurities exceeds a reference value, it is determined that the purification treatment capacity of the filtering-type dust collector 22 is exceeded, and in order to avoid clogging of the filtering-type dust collector 22, the flow path switching unit 41 supplies the synthesis gas G2 to the scrubber 23 as operation other than normal operation. As described above, in this embodiment, by utilizing the measurement results of the concentration measuring instrument 42, clogging of the filter-type dust collector 22 can be prevented and the amount of wastewater from the scrubber 23 can be reduced.

[0082] Next, a second modified example of the post-processing device 13 provided in the organic substance producing apparatus 1 in the third embodiment will be described in more detail with reference to Fig. 10. The post-processing device 13 shown in Fig. 10 is provided with a concentration measuring device 42 and a differential pressure measuring device 40.

[0083] The downstream treatment device 13 shown in FIG. 10 is provided with a concentration measuring device 42 and a differential pressure measuring device 40, and can selectively switch between the filtration type dust collector 22 and the scrubber 23, through which the synthesis gas G2 passes, depending on the measurement results of the concentration measuring device 42 and the differential pressure measuring device 40. In this embodiment, first, the concentration measuring instrument 42 measures the concentration of impurities in the synthesis gas G2 discharged from the gasification apparatus 2, and if the impurity concentration does not exceed the standard value, the synthesis gas G2 is supplied to the filter-type dust collector 22, and if the impurity concentration exceeds the standard value, the synthesis gas G2 is supplied to the scrubber 23. In other words, by using the measurement result of the concentration measuring instrument 42, clogging of the filter-type dust collector 22 can be prevented and the amount of wastewater from the scrubber 23 can be reduced. In addition, in this embodiment, in addition to measuring the concentration with the concentration measuring device 42, the differential pressure measuring device 40 measures the differential pressure between the upstream and downstream stages of the filter-type dust collector 22.This makes it possible to address the blockage of the filter-type dust collector 22 due to causes other than the concentration of impurities in the synthesis gas G2, such as deterioration over time, by supplying the synthesis gas G2 to the scrubber 23, thereby enabling continuous operation of the organic substance manufacturing apparatus 1.

[0084] Next, a third modified example of the post-processing device 13 provided in the organic substance manufacturing apparatus 1 in the third embodiment will be described in more detail with reference to Fig. 11. The post-processing device 13 shown in Fig. 11 includes a plurality of filter-type dust collectors 22, and the plurality of filter-type dust collectors 22 and scrubbers 23 are arranged in parallel at the rear of the gasification apparatus 2.

[0085] The downstream treatment device 13 shown in Figure 11 has two filter-type dust collectors 22 arranged in parallel downstream of the gasification device 2, and during normal operation of the organic substance production device 1, synthesis gas G2 is supplied to at least one of the filter-type dust collectors 22, and the synthesis gas G2 is purified. Each filter-type dust collector 22 is preferably provided with a differential pressure measuring device 40, which measures the differential pressure between the upstream and downstream stages of the filter-type dust collector 22. If the measurement result of the differential pressure measuring device 40 indicates that the differential pressure exceeds a reference value, the supply of the synthesis gas G2 is stopped in order to perform maintenance to unclog the filter-type dust collector 22 for which the differential pressure is being measured, and the synthesis gas G2 is supplied to another filter-type dust collector 22, or the synthesis gas G2 is supplied to the scrubber 23. In this case, the other filter-type dust collector 22 is given priority as the supply destination of the synthesis gas G2, and by minimizing the operation of the scrubber 23, it is possible to eliminate problems of wastewater treatment costs from the scrubber 23 and environmental load.

[0086] The downstream processing device 13 shown in FIG. 11 is configured with a differential pressure measuring device 40 and a concentration measuring device 42 installed side by side, but the concentration measuring device 42 may be omitted, and the differential pressure measuring device 40 may be omitted.

[0087] In the above embodiment, the configuration is described as having one or two filter-type dust collectors 22, but this is not limited to this, and three or more filter-type dust collectors 22 and scrubbers 23 may be arranged in parallel at the downstream of the gasification apparatus 2. Furthermore, in the above embodiment, a configuration in which the differential pressure measuring device 20 is provided alone, a configuration in which the concentration measuring device 21 is provided alone, and a configuration in which the differential pressure measuring device 20 and the concentration measuring device 21 are provided together have been shown, but both the differential pressure measuring device 20 and the concentration measuring device 21 may be omitted. When both the differential pressure measuring device 20 and the concentration measuring device 21 are omitted, by periodically switching the supply destination of the synthesis gas G1 to the differential pressure measuring device 20 or the concentration measuring device 21, it is possible to reduce the amount of wastewater from the scrubber 23 while suppressing clogging of the differential pressure measuring device 20, and to efficiently remove impurities from the waste-derived synthesis gas G2.

[0088] In the above embodiment, the downstream treatment device 13 is not limited to the above configuration, and the above devices listed as the downstream treatment device 13 in the first embodiment may be appropriately provided upstream of the flow path switching unit 41 or downstream of the filter dust collector 22 and the scrubber 23. In this embodiment, a gas cooling tower 21 may be provided upstream of the flow path switching unit 41 and downstream of the heat exchanger 20. In this case, the behavior of the heat exchanger 20 and the gas cooling tower 21 is the same as that described in the first embodiment.

[0089] The organic substance manufacturing apparatus and organic substance manufacturing method according to the third embodiment of the present invention can achieve the same effects as those described in the organic substance manufacturing apparatus and organic substance manufacturing method according to the first embodiment. In the above description of the third embodiment, the cyclone 11 is arranged upstream of the reformer 12, but in the third embodiment, the reformer 12 may be arranged upstream of the cyclone 11, as described in the second embodiment.

[0090] (Fourth embodiment) Next, a fourth embodiment of the present invention will be described. In the following, the description of the fourth embodiment will be omitted for the overlapping parts with the first embodiment, and only the differences from the first embodiment will be described. As shown in Figure 12, the organic substance manufacturing apparatus 1 in the fourth embodiment differs in that it includes a gasification furnace 10 that gasifies waste to produce pyrolysis gas, a reforming furnace 12 that reforms the pyrolysis gas G1 discharged from the gasification furnace 10, and a heat exchanger 20 that passes the pyrolysis gas G1 that has passed through the reforming furnace 12 and cools it. The organic substance manufacturing apparatus 1 (pyrolysis gas purification and cooling apparatus 2) is equipped with a gasification furnace 10, a reforming furnace 12, and a heat exchanger 20, and is capable of obtaining a synthesis gas G2 that has a high content of at least one of hydrogen and carbon monoxide and is appropriately cooled by the heat exchanger 20.

[0091] Furthermore, although the above embodiments have been described with reference to configurations in which the cyclone 11 is provided, the cyclone 11 is omitted in the present embodiment. When the cyclone 11 is omitted, the synthesis gas G2 cooled in the heat exchanger 20 is supplied to the post-treatment device 13 without passing through the cyclone 11. For example, the cyclone 11 may be omitted when the waste contains a small amount of solid impurities or when synthesis gas G2 is produced using a raw material other than the waste.

[0092] The organic substance production apparatus 1 in the fourth embodiment is similar to the first or third embodiment except that the cyclone 11 is omitted. Therefore, although the organic substance production apparatus 1 in the fourth embodiment includes a gasification furnace 10, a reformer 12, and a heat exchanger 20, the organic substance production apparatus 1 in the fourth embodiment may also include a downstream treatment device 13 and the like as appropriate. The downstream treatment device 13 is as described in the first and third embodiments, and it is preferable that the organic substance production apparatus 1 includes at least one of a gas cooling tower 21, a filter-type dust collector 22, and a scrubber 23 in the downstream treatment device 13. In this case, the post-treatment device 13 may have the configuration shown in the first embodiment and each modified example. That is, as shown in FIG. 2, it may be configured to include a gas cooling tower 21 arranged downstream of the heat exchanger 20, a filter-type dust collector 22 arranged downstream of the gas cooling tower 21, and a scrubber 23 arranged downstream of the filter-type dust collector 22. As shown in FIG. 3, it may be configured to include a filter-type dust collector 22 arranged downstream of the heat exchanger 20 and a scrubber 23 downstream of the filter-type dust collector 22. As shown in FIG. 4, it may be configured to include a gas cooling tower 21 arranged downstream of the heat exchanger 20 and a filter-type dust collector 22 arranged downstream of the gas cooling tower 21. As shown in FIG. 5, it may be configured to include a gas cooling tower 21 arranged downstream of the heat exchanger 20 and a scrubber 23 downstream of the gas cooling tower 21. As shown in FIG. 6, it may be configured to include a filter-type dust collector 22 arranged downstream of the heat exchanger 20. Furthermore, the post-treatment device 13 may have the configuration shown in the third embodiment and each modified example. That is, as shown in Fig. 8, a filter-type dust collector 22 and a scrubber 23 may be arranged in parallel downstream of the heat exchanger 20, and a flow path switching unit 41 may be provided. Alternatively, as shown in each modified example of the third embodiment, a differential pressure measuring device 40 and a concentration measuring device 42 may be provided, or a gas cooling tower 21 may be provided upstream of the flow path switching unit 41 and downstream of the heat exchanger 20 (see Figs. 9 to 11). The details of these are as described above, and therefore a description thereof will be omitted.

[0093] (Other embodiments) For example, in the above description, one cyclone 11 is provided in the pyrolysis gas purification and cooling device 2, but the number is not limited to one, and two or more cyclones 11 may be provided. For example, a cyclone 11 may be provided in the rear stage of the gasification furnace 10 and in the rear stage of the reformer furnace 12. Furthermore, two or more cyclones 11 may be provided in series.

[0094] Furthermore, in the above description, the gasifier 10 has been described as producing the synthesis gas G2 from waste, but the gasifier 10 may also produce the synthesis gas G2 from sources other than waste. For example, the synthesis gas G2 may be produced from fossil resources such as natural gas, coal, heavy oil, petroleum exhaust gas, and oil shale, or from biomass other than waste. Furthermore, the synthesis gas G2 may be a by-product gas in various manufacturing processes such as a steel manufacturing process, and for example, the gasifier 10 may be part of a steel manufacturing facility. [Explanation of symbols]

[0095] 1 Organic substance production equipment 2. Pyrolysis gas purification and cooling equipment 3 Organic substance generation part 10 Gasifier 11. Cyclone 11a Dust supply route 12 Reformer 13 Post-processing device 19 Removal device 20 Heat exchanger 21 Gas Cooling Tower 22 Filter dust collector 23 Scrubba 24 Water spray nozzle 25 nozzles 26 Storage section 27 Introductory path 28 Supply route 29 Exhaust channel 31 Separation device 31a Water supply route 32 Solid-liquid separator 33 Distillation Apparatus 33a Thermal Energy Pathway 40 Differential pressure measuring instrument 41 Flow path switching section 42 Concentration measuring device G1 Pyrolysis gas G2 Syngas

Claims

[Claim 1] a gasification furnace that gasifies waste to generate pyrolysis gas; a cyclone that recovers dust from the pyrolysis gas by passing the pyrolysis gas discharged from the gasification furnace; a heat exchanger that cools the pyrolysis gas that has passed through the cyclone; A pyrolysis gas purification and cooling device comprising:

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