Mounting table and substrate processing apparatus having the same

Abstract

To provide a mounting table capable of easily improving reduction of a clearance between two substrates in a storage container, and to provide a substrate processing apparatus including the mounting table.SOLUTION: The load port (5) includes a stage (9) on which the cassette (C) is placed, the stage (9) having a front opening (11) through which the substrate (W) is loaded into and unloaded from the cassette (C) in a first direction, an inclination detection sensor (47) configured to detect an inclination of the substrate (W) in the cassette (C) placed on the stage (9), and an inclination adjustment mechanism (49) configured to adjust the inclination of the substrate (W) in the cassette (C) placed on the stage (9). AX2. The inclination adjustment mechanism 49 rotates the cassette C about the horizontal shaft AX2 based on the inclination of the substrate W detected by the inclination detection sensor 47, thereby adjusting the inclination of the substrate W so that the substrate W becomes horizontal.SELECTED DRAWING: Figure 5

Description

[Technical Field]

[0001] The present invention relates to a mounting table for mounting a container for storing substrates, and a substrate processing apparatus including the mounting table. Examples of the substrate include semiconductor substrates, FPD (Flat Panel Display) substrates, photomask glass substrates, optical disk substrates, magnetic disk substrates, ceramic substrates, and solar cell substrates. Examples of the FPD include liquid crystal display devices and organic EL (electroluminescence) display devices. [Background technology]

[0002] A conventional substrate processing apparatus includes a stage on which a carrier (e.g., a cassette) that stores multiple substrates is placed, and a transfer robot that transfers the substrates. The transfer robot removes the substrates from the carrier placed on the stage and returns the substrates to the carrier after the predetermined processing has been performed (see, for example, Patent Documents 1 and 2).

[0003] Patent Document 1 also discloses a cassette tilt adjustment mechanism that can adjust the tilt of a cassette stage (stage). The cassette tilt adjustment mechanism has three vertical adjustment shafts. The three vertical adjustment shafts surround the center of the cassette stage in a plan view. The two front vertical adjustment shafts adjust the left-right tilt of the cassette stage, and the single rear vertical adjustment shaft adjusts the front-to-back tilt of the cassette stage.

[0004] Patent Document 1 also discloses a tilt recognition unit that recognizes the tilt of a cassette stage. The tilt recognition unit has an optical sensor that is positioned so that its optical axis is parallel to the cassette stage's mounting surface. Based on the tilt recognized by the tilt recognition unit, a tilt adjustment mechanism is controlled so that the cassette stage's "mounting surface" and the robot hand's holding surface are parallel to each other.

[0005] Furthermore, Patent Document 2 discloses a substrate state acquisition unit that acquires the tilt of the substrate relative to the horizontal in the front-to-rear direction. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Patent No. 6126869 [Patent Document 2] Patent No. 6415220 Summary of the Invention [Problem to be solved by the invention]

[0007] However, the following problem may occur. This problem will be explained below. Pairs of grooves for storing a plurality of substrates in a substantially horizontal position are provided on the left and right side walls of a storage container (e.g., a cassette). The pairs of grooves are formed so as to extend from the front opening, through which the substrates are loaded and unloaded, to the rear opening. Furthermore, each groove is formed with a V-shaped cross section, so that the substrates stored in each pair of grooves are placed on an inclined surface.

[0008] For example, before placing the storage container on the stage, the substrates are pushed into the V-shaped groove on the back opening side of the storage container to align them. As a result, when the storage container is placed on the stage, the substrates are tilted so that the front opening side is lower than the back opening side. When the substrates are tilted in this way, the clearance between two substrates decreases so that the hand (or arm) of the transfer robot can enter horizontally.

[0009] The present invention has been made in consideration of the above circumstances, and aims to provide a mounting table that can easily improve the reduction in clearance between two substrates in a storage container, and a substrate processing apparatus equipped with the same. [Means for solving the problem]

[0010] In order to achieve the above object, the present invention has the following configuration: That is, a mounting table according to the present invention includes a stage on which a storage container for storing substrates is placed, the storage container having a first opening for inserting and removing the substrate in a first horizontal direction relative to the storage container, a tilt detection sensor that detects a tilt of the substrate in the storage container placed on the stage about a horizontal axis that extends in a second horizontal direction that is perpendicular to the first horizontal direction in a plan view, and a tilt adjustment mechanism that adjusts the tilt of the substrate in the storage container placed on the stage, wherein the tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the storage container about the horizontal axis based on the tilt of the substrate detected by the tilt detection sensor.

[0011] In the mounting table according to the present invention, the tilt detection sensor detects the tilt of a substrate in a storage container placed on the stage, the tilt being about a horizontal axis extending in a second horizontal direction perpendicular to the first horizontal direction in a plan view. Here, the first horizontal direction is the direction in which substrates are inserted into and removed from the storage container. The tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the storage container about the horizontal axis based on the tilt of the substrate detected by the tilt detection sensor. This makes it easy to reduce the reduction in clearance between two substrates in the storage container when the storage container stores multiple substrates.

[0012] Furthermore, in the above-mentioned mounting table, it is preferable that the tilt detection sensor includes a first distance sensor and a second distance sensor each provided below the stage, the first distance sensor measures a first vertical distance to a first measurement position set on the underside of the substrate, the second distance sensor measures a second vertical distance to a second measurement position set on the underside of the substrate, the first measurement position and the second measurement position are spaced apart in the first horizontal direction, and the tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the storage container around the horizontal axis based on the first distance and the second distance measured by the first distance sensor and the second distance sensor.

[0013] For example, there is a method of detecting the tilt of the substrate by irradiating light horizontally, obtaining the height position where the light is blocked, and comparing this with the substrate position (design value) stored in a memory unit (i.e., a method of detecting the tilt of the substrate in the lateral direction). In this case, if the substrate is warped, it is difficult to distinguish whether the obtained height position is due to the tilt of the substrate or to some other cause (e.g., warpage of the substrate). However, in the present invention, the tilt of the substrate is detected from below the substrate using two distance sensors installed below the stage. Therefore, the tilt of the substrate can be detected relatively accurately.

[0014] Furthermore, in the above-described mounting table, the first and second measurement positions are preferably set at the peripheral portion of the lower surface of the substrate. If the distance is measured at the center of the substrate, there is a possibility that the detection of the tilt may become unstable due to the influence of, for example, warpage. According to the present invention, the distance is measured at the peripheral portion of the substrate. Therefore, the detection of the tilt of the substrate is stable, and the tilt of the substrate W can be obtained with relatively high accuracy.

[0015] In the above-described mounting table, the first distance sensor and the second distance sensor are, for example, laser distance sensors.

[0016] Furthermore, in the above-mentioned mounting table, it is preferable that the tilt detection sensor comprises a single distance sensor provided below the stage and a sensor moving unit that moves the single distance sensor in the first horizontal direction, the single distance sensor measures a first vertical distance to a first measurement position set on the underside of the substrate, and is moved by the sensor moving unit to measure a second vertical distance to a second measurement position set on the underside of the substrate, the first measurement position and the second measurement position being spaced apart in the first horizontal direction, and the tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the storage container around the horizontal axis based on the first distance and the second distance measured by the single distance sensor.

[0017] In the present invention, the tilt of the substrate is detected from below the substrate by a single distance sensor provided below the stage. Therefore, the tilt of the substrate can be detected relatively accurately. Furthermore, the single distance sensor is moved horizontally by a sensor moving unit, so that the first measurement position and the second measurement position for measuring the first distance and the second distance can be easily changed.

[0018] In the above-described mounting table, the tilt adjustment mechanism preferably adjusts the tilt of the substrate so that the substrate is horizontal by rotating the stage on which the container is placed about the horizontal axis. Therefore, the tilt of the substrate can be adjusted by rotating the stage.

[0019] In the above-described mounting table, the stage preferably includes a front support portion that supports a front portion of the storage container and a rear support portion that supports a rear portion of the storage container, and the tilt adjustment mechanism preferably adjusts the tilt of the substrate so that the substrate is horizontal by raising and lowering at least one of the front support portion and the rear support portion to rotate the storage container about the horizontal axis. The tilt of the substrate can be adjusted by raising and lowering at least one of the front support portion and the rear support portion that support the storage container.

[0020] In addition, in the above-mentioned mounting table, an example of the storage container is a carrier that can be transported from the stage.In addition, in the above-mentioned mounting table, an example of the storage container is an open cassette.In addition, in the above-mentioned mounting table, an example of the storage container is a buffer main body fixed to the stage.

[0021] A substrate processing apparatus according to the present invention includes the above-described mounting table and a transport robot having a hand capable of holding the substrate in a horizontal position and movable to transport the substrate.An example of the above-described mounting table is a load port. [Effects of the Invention]

[0022] According to the mounting table and the substrate processing apparatus including the mounting table of the present invention, it is possible to easily improve the reduction in the clearance between two substrates in a storage container. [Brief explanation of the drawings]

[0023] [Figure 1] 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to a first embodiment. [Figure 2] FIG. 2 is a plan view of the cassette placed on the stage. [Figure 3] FIG. 10 is a bottom view of the cassette placed on the stage. [Figure 4] FIG. 10 is a front view showing a mapping mechanism of the load port. [Figure 5] FIG. 2 is a vertical cross-sectional view showing a tilt detection sensor and a tilt adjustment mechanism of the load port. [Figure 6] 10 is a vertical cross-sectional view showing a state in which the lowermost substrate is adjusted to be horizontal by the tilt adjustment mechanism. FIG. [Figure 7] FIG. 2 is a block diagram showing a control system of the substrate processing apparatus. [Figure 8] 10 is a flowchart illustrating an operation of the substrate processing apparatus. [Figure 9] FIG. 10 is a vertical cross-sectional view showing a tilt detection sensor and a tilt adjustment mechanism of a load port according to a second embodiment. [Figure 10] FIG. 10(a) is a vertical cross-sectional view showing a tilt detection sensor and a tilt adjustment mechanism of a buffer according to a third embodiment, and FIG. 10(b) is a front view of a buffer body placed on a stage. [Figure 11] FIG. 11 is a vertical cross-sectional view showing an inclination detection sensor and an inclination adjustment mechanism of a collection unit according to a third embodiment. [Figure 12] 10(a) and 10(b) are vertical cross-sectional views showing a tilt adjustment mechanism according to a modified example. [Figure 13] 10(a) is a vertical cross-sectional view showing an inclination adjustment mechanism according to another modified example, and FIG. 10(b) is a plan view thereof. [Figure 14] 10A and 10B are vertical cross-sectional views illustrating the operation of the tilt detection sensor according to another modified example. [Figure 15] FIG. 10 is a cross-sectional view showing a tilt detection sensor according to another modified example. [Figure 16] 10A and 10B are vertical cross-sectional views illustrating the operation of the tilt detection sensor according to another modified example. [Figure 17] FIG. 10 is a vertical cross-sectional view showing a tilt detection sensor according to another modified example. DETAILED DESCRIPTION OF THE INVENTION

[0024] Examples of the present invention will be described below. [Example]

[0025] A first embodiment of the present invention will be described below with reference to the drawings. Fig. 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to the first embodiment.

[0026] <1. Configuration of the substrate processing apparatus> Referring to Fig. 1, a substrate processing apparatus 1 performs a predetermined process on a substrate W. The substrate processing apparatus 1 includes an indexer block 2 and a processing block 3. The indexer block 2 and the processing block 3 are arranged in the horizontal X direction.

[0027] <1-1. Indexer block configuration> The indexer block 2 includes at least one (for example, four) load port 5, a main body 7, and a transport robot IR. The four load ports 5 are provided on an outer wall 7A of the main body 7. The four load ports 5 are arranged in the horizontal Y direction perpendicular to the X direction. A cassette C for storing multiple substrates W is placed on each load port 5. More specifically, the cassette C is placed on a stage 9 provided on the load port 5.

[0028] Fig. 2 is a plan view of the cassette C placed on the stage 9. Fig. 3 is a bottom view of the cassette C placed on the stage 9. Fig. 4 is a front view of the cassette C placed on the stage 9. Fig. 5 is a vertical cross-sectional view of the cassette C placed on the stage 9 as seen from the left side.

[0029] 2 to 5, the structure of the cassette C will be described. The cassette C is also called an "open cassette." The cassette C has a front opening 11 provided on the front side and a rear opening 13 provided on the rear side. The front opening 11 is an opening for inserting and removing substrates W into and from the cassette C in the X direction. The rear opening 13 is provided on the opposite side of the front opening 11 across the multiple substrates W in the cassette C. The width (Y direction) of the rear opening 13 is set to be smaller than the diameter of the substrates W in a plan view, that is, when viewed from the top side of the cassette C as in FIG. 2. As a result, the rear opening 13 cannot insert and remove multiple substrates W like the front opening 11.

[0030] The cassette C also has an upper wall 15 formed on its upper surface, a left side wall 17 formed on its left side, a right side wall 19 formed on its right side, and an H-shaped lower wall 21 formed on its lower surface. As shown in Fig. 3, the lower surface of the cassette C has no walls (H-shaped lower wall 21) on the front opening 11 side and the rear opening 13 side, and is open.

[0031] The cassette C also has multiple pairs of grooves 23, 24 (e.g., 25 pairs or 13 pairs) for storing multiple substrates W (e.g., 25 or 13 substrates W). Each pair of grooves 23, 24 is also called a "slot." The multiple pairs of grooves 23, 24 are provided on the left and right inner walls of the cassette C. In FIGS. 2 to 5, the multiple pairs of grooves 23, 24 are arranged in a vertical direction (Z direction) perpendicular to the X and Y directions. As shown in FIG. 2, each pair of grooves 23, 24 is formed so as to extend from the front opening 11 to the rear opening 13. As shown in FIG. 4, the grooves 23, 24 are formed to have a V-shaped cross section.

[0032] Each substrate W is, for example, a circular substrate having a diameter of 200 mm (8 inches). The diameter of the substrate W is not limited to 200 mm, and may be, for example, 100 mm (4 inches), 150 mm (6 inches), or 300 mm (12 inches).

[0033] Next, the four load ports 5 will be described. Each of the four load ports 5 includes a mapping mechanism 27 in addition to a stage 9. As shown in FIGS. 2 and 4, the mapping mechanism 27 includes a substrate detection sensor 29, an arm 31, a pillar member 33, and an elevator 35.

[0034] The board detection sensor 29 is, for example, a transmission type sensor and includes a light projector 29A and a light receiver 29B. The arm 31 is a U-shaped or C-shaped member in a plan view. For example, the light projector 29A is provided at a first end of the arm 31 on the front opening 11 side, and the light receiver 29B is provided at a second end of the arm 31 on the rear opening 13 side. The light receiver 29B faces the light projector 29A in the horizontal direction. The light projector 29A emits light horizontally. The light emitted horizontally from the light projector 29A passes through the front opening 11 and the rear opening 13 in this order, and then enters the light receiver 29B. The positions of the light projector 29A and the light receiver 29B may be reversed. The board detection sensor 29 may also be a reflective type sensor.

[0035] The arm 31 is fixed to the upper end of a pillar member 33. The pillar member 33 is formed to extend in the vertical direction (Z direction). As shown in FIG. 4, the pillar member 33 is passed through a hole 9A provided in the stage 9. The substrate detection sensor 29, the arm 31, and the pillar member 33 are raised and lowered by a lifting unit 35.

[0036] The lifting unit 35 includes a screw shaft 37, a guide rail 39, a slider 41, an electric motor 43, and a height sensor 45. The screw shaft 37 and the guide rail 39 are formed to extend in the vertical direction (Z direction). The screw shaft 37 penetrates the slider 41 while meshing with an internal thread 41A of the slider 41. The guide rail 39 is passed through a guide hole 41B of the slider 41. The slider 41 is guided in the vertical direction (Z direction) by the guide rail 39. A pillar member 33 is fixed to the slider 41.

[0037] The output rotation shaft 43A of the electric motor 43 is connected to, for example, the lower end of the screw shaft 37. The screw shaft 37 is rotatable about a vertical axis AX1. For example, when the electric motor 43 rotates the screw shaft 37 forward about the vertical axis AX1, the slider 41, the board detection sensor 29, etc. rise. On the other hand, when the electric motor 43 rotates the screw shaft 37 backward about the vertical axis AX1, the slider 41, the board detection sensor 29, etc. descend.

[0038] The height sensor 45 is configured by, for example, a linear encoder or a rotary encoder. The height sensor 45 detects the height position of the board detection sensor 29, that is, the height position of the axis (optical axis) of the light irradiated from the projector 29A, by detecting, for example, the height position of the slider 41.

[0039] With light being emitted from the light projector 29A of the substrate detection sensor 29, the lifting unit 35 lowers the substrate detection sensor 29. When the light receiver 29B detects light from the light projector 29A, it detects that there is no substrate W between the light projector 29A and the light receiver 29B. On the other hand, when the light receiver 29B does not detect light from the light projector 29A, it detects that there is a substrate W. The height sensor 45 measures the height position of the optical axis. Therefore, for example, it can detect the presence or absence of a substrate W in the cassette C and the height of the substrate W that is present.

[0040] As shown in FIG. 5, each load port 5 further includes an inclination detection sensor 47 and an inclination adjustment mechanism 49.

[0041] The tilt detection sensor 47 detects the tilt of the substrate W in the cassette C placed on the stage 9. That is, the tilt detection sensor 47 detects the tilt of the substrate W around a horizontal axis AX2 extending in the Y direction perpendicular to the insertion / removal direction (X direction) of the substrate W in a plan view. The tilt detection sensor 47 includes two distance sensors 51 and 52.

[0042] Each of the two distance sensors 51, 52 is, for example, a laser light distance sensor. Each of the distance sensors 51, 52 is a reflective sensor. Each of the distance sensors 51, 52 includes, for example, a light-emitting element and a light-receiving element (position detection element). The two distance sensors 51, 52 are each provided below the stage 9. The two distance sensors 51, 52 are arranged in the X direction as shown in FIGS. 2 and 5. Note that in FIGS. 2 and 5, the distance sensor 51 is arranged closer to the rear opening 13 than the center of the substrate W, and the distance sensor 52 is arranged closer to the front opening 11 than the center of the substrate W.

[0043] The two distance sensors 51 and 52 each emit a laser beam in a vertically upward direction. The laser beam emitted from the distance sensor 51 passes through a hole 9C provided in the stage 9 and reaches the lower surface of the substrate W. The laser beam of the distance sensor 51 reflected by the lower surface of the substrate W passes through the hole 9C and returns to the distance sensor 51. Similarly, the laser beam emitted from the distance sensor 51 and the reflected laser beam pass through a hole 9D provided in the stage 9.

[0044] The distance sensor 51 measures a first vertical distance DT1 to a first measurement position PT1 set on the lower surface of the substrate W. The distance sensor 52 measures a second vertical distance DT2 to a second measurement position PT2 set on the lower surface of the substrate W.

[0045] The first measurement position PT1 and the second measurement position PT2 are located at positions spaced apart in the X direction. The first measurement position PT1 and the second measurement position PT2 are preferably located at positions spaced apart in the X direction through the center of the substrate W. When viewed from the bottom (lower surface), the first measurement position PT1 and the second measurement position PT2 are preferably located on a line L1 that passes through the center of the substrate W and extends in the X direction. However, the first measurement position PT1 and the second measurement position PT2 do not have to be located on the line L1, and are preferably located near the line L1. Furthermore, the first measurement position PT1 and the second measurement position PT2 are set on the peripheral portion of the lower surface of the substrate W, as shown in FIG. 3.

[0046] Specifically, the first measurement position PT1 and the second measurement position PT2 are each set, for example, at a position 10 mm from the edge of the substrate W toward the center of the substrate W. If the distance is measured at the center of the substrate W, there is a possibility that detection of the tilt will become unstable due to the influence of deformation such as warping or a pattern formed on the substrate W (including during formation). Therefore, the two distance sensors 51, 52 each measure the distance to the underside of the peripheral edge of the substrate W. This stabilizes detection of the tilt of the substrate W, and the tilt of the substrate W can be obtained with relatively high accuracy.

[0047] Although the two distance sensors 51 and 52 each emit laser light, they may emit light of a wavelength other than laser light.Furthermore, the two distance sensors 51 and 52 may each be an ultrasonic distance sensor.

[0048] The tilt adjustment mechanism 49 adjusts the tilt of the substrate W in the cassette C placed on the stage 9. That is, the tilt adjustment mechanism 49 rotates the stage 9 (and the cassette C) on which the cassette C is placed, around the horizontal axis AX2, based on the tilt of the substrate W detected by the tilt detection sensor 47. In this way, the tilt adjustment mechanism 49 adjusts the tilt of the substrate W so that the substrate W is horizontal.

[0049] 5, the tilt adjustment mechanism 49 includes two linear actuators 55 and 56. This causes the stage 9 to tilt around a horizontal axis AX2. The first linear actuator 55 raises and lowers the stage 9 at a position on the rear side (rear opening 13) of the cassette C. In contrast, the second linear actuator 56 raises and lowers the stage 9 at a position on the front side (front opening 11) of the cassette C.

[0050] The first linear actuator 55 includes a rod 59, a screw shaft 61, a guide rail 63, a slider 65, and an electric motor 67. The rod 59, the screw shaft 61, and the guide rail 63 are each formed to extend in the vertical direction (Z direction). The upper end portion of the rod 59 of the first linear actuator 55 contacts the lower surface of the stage 9. The lower end portion of the rod 59 is fixed to the slider 65. The screw shaft 61 penetrates the slider 65 while engaging with an internal thread 65A of the slider 65. The guide rail 63 passes through a guide hole 65B of the slider 65. The slider 65 is guided in the vertical direction (Z direction) by the guide rail 63.

[0051] The output rotation shaft 67A of the electric motor 67 is connected to, for example, the lower end of the screw shaft 61. The screw shaft 61 is rotatable about a vertical axis. For example, when the electric motor 67 rotates the screw shaft 61 in the forward direction about the vertical axis, the slider 65 and the rod 59 rise. As a result, the stage 9 rises at a position closer to the rear side of the cassette C than the position on the front side of the cassette C. On the other hand, when the electric motor 67 rotates the screw shaft 61 in the reverse direction about the vertical axis, the slider 65 and the rod 59 descend. As a result, the stage 9 descends at a position closer to the rear side of the cassette C than the position on the front side of the cassette C.

[0052] The second linear actuator 56 is configured in substantially the same manner as the first linear actuator 55. Therefore, the components of the second linear actuator 56 are each given the same reference numerals as the components of the first linear actuator 55. The upper end portion of the rod 59 of the second linear actuator 56 is rotatably connected to a connecting portion 9B fixed to the underside of the stage 9 around a horizontal axis AX2. The horizontal axis AX2 extends in the Y direction.

[0053] 5, for example, the distance sensor 51 measures a first distance DT1 and the distance sensor 52 measures a second distance DT2 for the bottom substrate W in the cassette C placed on the stage 9. At this time, it is assumed that the first distance DT1 is greater than the second distance DT2 (first distance DT1>second distance DT2).

[0054] The tilt adjustment mechanism 49 performs tilt adjustment using at least one of the two linear actuators 55, 56. That is, the tilt adjustment may be performed by operating both of the two linear actuators 55, 56. Alternatively, the tilt adjustment may be performed by operating only the first linear actuator 55. Alternatively, the tilt adjustment may be performed by operating only the second linear actuator 56.

[0055] 6, the first linear actuator 55 rotates the cassette C and the stage 9 around the horizontal axis AX2 based on the first distance DT1 and the second distance DT2 measured by the two distance sensors 51, 52. For example, the first linear actuator 55 lowers the rod 59 so that the first distance DT1 and the second distance DT2 measured by the two distance sensors 51, 52 have the same value (first distance DT1 = second distance DT2). As a result, the first linear actuator 55 adjusts the inclination of the lowermost substrate W so that the lowermost substrate W is horizontal.

[0056] Returning to FIG. 1, the transport robot IR is provided inside the main body 7. The transport robot IR is configured to be movable in order to transport substrates W. The transport robot IR also transports substrates W between the four cassettes C of the four load ports 5 and a buffer BF, which will be described later. The transport robot IR includes a hand 71, a forward / backward moving unit 73, a lifting / rotating unit 75, and a horizontal moving unit 77.

[0057] The hand 71 is capable of holding one substrate W in a horizontal position. The hand 71 is formed in an I-shape in a plan view. The hand 71 may also be formed in a C-shape or a Y-shape. The advancing / retreating unit 73 moves the hand 71 forward and backward. The lifting / rotating unit 75 raises and lowers the hand 71 and the advancing / retreating unit 73. The lifting / rotating unit 75 also rotates the hand 71 and the advancing / retreating unit 73 about a vertical axis to change the orientation of the hand 71. The horizontal moving unit 77 moves the hand 71, the advancing / retreating unit 73, and the lifting / rotating unit 75 along a guide rail 77A formed to extend in the Y direction.

[0058] Each of the advancing / retreating unit 73, the lifting / rotating unit 75, and the horizontal moving unit 77 includes, for example, a screw shaft and an electric motor. The lifting / rotating unit 75 further includes an electric motor for changing the orientation of the hand 71. The transport robot IR may include, instead of at least the advancing / retreating unit 73, an articulated arm for moving the hand 71.

[0059] The load port 5 corresponds to the mounting table of the present invention. The cassette C corresponds to the carrier and storage container of the present invention. In this embodiment, the X direction corresponds to the first horizontal direction of the present invention, and the Y direction corresponds to the second horizontal direction of the present invention. The two distance sensors 51 and 52 correspond to the first distance sensor and the second distance sensor of the present invention.

[0060] <1-2. Processing block configuration> The processing block 3 performs a preset process on the substrate W. The processing block 3 is provided on the opposite side of the four load ports 5 across the main body 7 of the indexer block 2. The processing block 3 is adjacent to the indexer block 2. The processing block 3 includes a transport space 79, at least one processing unit 81, and a recovery unit 83. The at least one processing unit 81 and the recovery unit 83 are arranged along the transport space 79.

[0061] The transport space 79 is formed to extend in the X direction from the indexer block 2. The transport space 79 includes a buffer BF and a transport robot TR. The buffer BF is disposed between the two transport robots IR and TR. The buffer BF can store multiple substrates W in a substantially horizontal position.

[0062] The transport robot TR has a hand 85 capable of holding a substrate W in a horizontal position and is capable of transporting the substrate W. The transport robot TR is configured similarly to the transport robot IR. A horizontal movement unit 77 of the transport robot TR moves the hand 85, the advancing / retreating unit 73, etc. in the X direction. A guide rail 77B of the transport robot TR is formed to extend in the X direction. The transport robot TR transports the substrate W between at least one processing unit 81, a buffer BF, and a recovery unit 83.

[0063] The processing unit 81 may be, for example, a liquid processing unit. The liquid processing unit performs a coating process using a resist liquid or the like, a development process, or a cleaning process on the substrate W. The liquid processing unit includes a holding and rotating unit that holds and rotates one substrate W in a horizontal position, and a nozzle that ejects a processing liquid (e.g., a resist liquid, a developer, or a cleaning liquid) onto the upper surface of the substrate W held by the holding and rotating unit. The holding and rotating unit includes a chuck that holds one substrate W, and an electric motor that rotates the chuck around a vertical axis that passes through the center of the substrate W held by the chuck.

[0064] The processing unit 81 may also be, for example, a heat processing unit. The heat processing unit includes, for example, a plate on which one substrate W is placed and an electric heater for heating the plate. The heat processing unit may also be a unit that performs a cooling process on the substrate W. In this case, the unit that performs the cooling process includes a plate and a mechanism or Peltier element that circulates a coolant such as water.

[0065] Furthermore, the processing unit 81 may be a unit that performs exposure processing or backside polishing (grinding) processing. A processing unit that performs backside polishing processing includes a holding and rotating part and a polishing tool that is brought into contact with the upper surface (backside) of the substrate W held and rotated by the holding and rotating part. The number and types of processing units 81 are prepared as needed.

[0066] The recovery unit 83 includes a recovery cassette CC for storing a plurality of substrates W, and a stage 89 on which the recovery cassette CC is placed. The recovery cassette CC is used to recover, for example, substrates W that have failed processing, without returning them to the cassette C on the load port 5. The recovery cassette CC has the same configuration as the cassette C shown in FIGS. 2 to 5, but may be different from the cassette C.

[0067] 1 and 7, the substrate processing apparatus 1 includes a control unit 91 and a storage unit (storage medium) 92. The control unit 91 controls each component of the substrate processing apparatus 1. The control unit 91 includes one or more processors, such as a central processing unit (CPU). The storage unit 92 includes at least one of a read-only memory (ROM), a random-access memory (RAM), and a hard disk. The storage unit 92 stores computer programs required to control each component of the substrate processing apparatus 1. The storage unit 92 also stores various operations (for example, step S02, which will be described later).

[0068] <2. Operation of the substrate processing device> Next, the operation of the substrate processing apparatus 1 will be described with reference to the flowchart in Fig. 8. In this description, the lowest substrate W of, for example, 25 substrates W stored in a cassette C is adjusted to be horizontal. Also, it is assumed that the remaining 24 substrates W are also horizontal after the lowest substrate W has been adjusted to be horizontal. Also, the tilt adjustment in step S02 is performed for each of the four load ports 5.

[0069] [Step S01] Place the cassette Referring to Figure 1, an operator or a robot places a cassette C on the stage 9 of one of the four load ports 5. The cassette C is positioned at a preset position on the stage 9 by a guide (not shown). This cassette C stores 25 unprocessed substrates W.

[0070] Before placing the cassette C on the stage 9, an operator or the like turns the front opening 11 of the cassette C upward in order to align the positions of the 25 substrates W. As a result, the 25 substrates W are pushed by their own weight into the depths of the V-shaped cross-sectional grooves 23, 24 on the rear opening 13 side of the cassette C.

[0071] Thereafter, when placing the cassette C on the stage 9, the operator or the like changes the orientation of the cassette C so that the front opening 11 faces the main body 7 of the indexer block 2. If the cassette C is placed on the horizontal mounting surface of the stage 9 in this state, each substrate W that has entered the deepest part of the V-shaped cross-sectional grooves 23, 24 will be tilted so that its position on the front opening 11 side is lower than its position on the rear opening 13 side.

[0072] When the substrates W are tilted in this way, the clearance CL between the two substrates W decreases, which increases the possibility that the hand 71 of the transport robot IR will come into contact with the substrates W. Therefore, in the next step S02, instead of horizontalizing the mounting surface FA of the cassette C on the stage 9, the tilt is adjusted so that the substrates W are horizontal.

[0073] [Step S02] Tilt adjustment After the cassette C is placed on the stage 9, as shown in Fig. 5, two distance sensors 51, 52 provided below the stage 9 begin irradiating laser light. The distance sensor 51 measures a first distance DT1 to a first measurement position PT1 on the underside of the lowest substrate W. The distance sensor 52 measures a second distance DT2 to a second measurement position PT2 on the underside of the lowest substrate W. The control unit 91 recognizes the inclination of the lowest substrate W from the difference between the first distance DT1 and the second distance DT2. At this point in time, for example, it is assumed that the first distance DT1 is longer than the second distance DT2 (first distance DT1>second distance DT2).

[0074] Thereafter, the tilt adjustment mechanism 49 rotates the stage 9 and the cassette C around the horizontal axis AX2 based on the first distance DT1 and the second distance DT2 measured by the two distance sensors 51, 52. This adjusts the tilt of the substrates W so that the lowest substrate W is horizontal. For example, the first linear actuator 55 lowers the rod 59. This causes the stage 9 to lower at a position closer to the rear side of the cassette C than at a position closer to the front side of the cassette C.

[0075] For example, the tilt adjustment is performed until the first distance DT1 measured by the distance sensor 51 and the second distance DT2 measured by the distance sensor 52 match (second distance DT2 = first distance DT1). The tilt adjustment is also performed until the tilt becomes 1 / 600 (height / length of base) or less. In other words, when the tilt becomes 1 / 600 or less, the control unit 91 determines that the substrate W, whose distance is being measured by the two distance sensors 51 and 52, has become horizontal.

[0076] When the second distance DT2 is longer than the first distance DT1, for example, the first linear actuator 55 raises the rod 59 so that the lowermost substrate W becomes horizontal. After adjusting the tilt, the two distance sensors 51 and 52 stop emitting the laser light.

[0077] Alternatively, the tilt adjustment may be performed each time a cassette C containing 25 unprocessed substrates W is placed on the stage 9. Alternatively, the number of times the cassette C is placed on the stage 9 may be counted by the control unit 91, and the tilt adjustment may be performed each time that number reaches a preset number. Alternatively, the tilt adjustment may be performed every time a preset number of hours or days have elapsed. In the flowchart of FIG. 8, if the tilt adjustment is not performed in step S02, the process proceeds directly to step S03 after step S01.

[0078] [Step S03] Mapping After the tilt adjustment, a mapping operation is performed. A more detailed explanation will be given. The mapping mechanism 27 activates the substrate detection sensor 29 by irradiating light from the projector 29A. Thereafter, the mapping mechanism 27 raises the substrate detection sensor 29 in the vertical direction while activating the substrate detection sensor 29. Note that the mapping mechanism 27 may also lower the substrate detection sensor 29 while activating the substrate detection sensor 29.

[0079] When the light receiver 29B detects light from the light projector 29A, the mapping mechanism 27 detects that a substrate W is not present. On the other hand, when the light receiver 29B cannot detect light from the light projector 29A, the mapping mechanism 27 detects that a substrate W is present. Furthermore, the height sensor 45 of the mapping mechanism 27 measures the height position of the substrate detection sensor 29. Therefore, the mapping mechanism 27 can obtain the presence or absence of a substrate W in the cassette C placed on the stage 9, and the height position of the present substrate W. In this description, the cassette C stores 25 substrates W. Therefore, the mapping mechanism 27 obtains the presence of 25 substrates W and the height positions of the 25 substrates W.

[0080] Furthermore, since the tilt adjustment was performed in step S02, the reduction in the clearance CL between the two substrates W in the cassette C has been improved. Therefore, the positions of the 25 substrates W present are acquired in a state in which the reduction in the clearance CL has been improved.

[0081] [Step S04] Removing the substrate The transport robot IR causes the hand 71 to enter the cassette C based on the height positions of the 25 substrates W acquired by the mapping mechanism 27. As a result, the transport robot IR uses the hand 71 to remove the substrates W from the cassette C on the stage 9 and transport the removed substrates W to the buffer BF in the processing block 3. The transport robot IR transports the 25 substrates W from the cassette C to the buffer BF. The 25 substrates W are aligned vertically in the cassette C. The transport robot IR may remove the 25 substrates W from the cassette C in order from the top, or may remove the 25 substrates W in order from the bottom. The transport robot IR may also remove any substrate W from the cassette C.

[0082] [Step S05] Substrate processing The transport robot TR in the processing block 3 takes out the substrate W from the buffer BF and transports it to a preset processing unit 81. The processing unit 81 to which the substrate W has been transported performs a preset processing on the substrate W. The transport robot TR transports the substrate W that has been subjected to the preset processing to the buffer BF. Note that, for example, a substrate W that has failed processing is transported by the transport robot TR to a collection cassette CC in the collection unit 83.

[0083] [Step S06] Storing the board As described above, the tilt adjustment was performed in step S02, and therefore the reduction in the clearance CL between the two substrates W in the cassette C has been improved. Therefore, the transport robot IR can transport the processed substrate W from the buffer BF to the cassette C relatively easily. The transport robot IR may store the substrate W facing upward in the pair of grooves 23, 24 at the bottom of the cassette C, or may store the substrate W facing downward in the pair of grooves 23, 24 at the top of the cassette C. The transport robot IR may also store the substrate W in any pair of grooves 23, 24 of the cassette C.

[0084] [Step S07] Transporting the cassette When the 25 substrates W are returned to the cassette C placed on the stage 9, the operator or the robot transports the cassette C from the stage 9.

[0085] According to this embodiment, the tilt detection sensor 47 detects the tilt of the substrate W in the cassette C placed on the stage 9, that is, the tilt about a horizontal axis AX2 extending in a second horizontal direction (Y direction) perpendicular to the first horizontal direction (X direction) in a plan view. Here, the first horizontal direction is the direction in which the substrate W is inserted into or removed from the cassette C. Furthermore, the tilt adjustment mechanism 49 adjusts the tilt of the substrate W so that the substrate W is horizontal by rotating the cassette C about the horizontal axis AX2 based on the tilt of the substrate W detected by the tilt detection sensor 47. This makes it possible to easily improve the reduction in the clearance CL between two substrates W in the cassette C when the cassette C stores multiple substrates W.

[0086] Another method is to detect the tilt of the substrate W by irradiating light horizontally, obtaining the height position where the light is blocked, and comparing this with the position (design value) of the substrate W stored in a memory unit (i.e., a method of detecting the tilt of the substrate W in the lateral direction). In this case, if the substrate W is warped, it is difficult to distinguish whether the obtained height position is due to the tilt of the substrate W or to some other cause (e.g., warpage of the substrate W). However, in this embodiment, the tilt of the substrate W is detected from below the substrate W by two distance sensors 51, 52 provided below the stage 9. Therefore, the tilt of the substrate W can be detected relatively accurately.

[0087] Furthermore, the tilt adjustment mechanism 49 rotates the stage 9 on which the cassette C is placed about the horizontal axis AX2, thereby adjusting the tilt of the substrate W so that the substrate W is horizontal. Therefore, the tilt of the substrate W can be adjusted by rotating the stage 9.

[0088] Furthermore, when the cassette C is placed on the stage 9, the H-shaped bottom wall 21 provided on the underside of the cassette C is open on the front opening 11 side and the rear opening 13 side, without covering the substrates W stored in the cassette C. Therefore, the two distance sensors 51, 52 provided below the stage 9 can easily measure the first distance DT1 and the second distance DT2. Note that even if the wall of the cassette C is transparent, it is difficult for the two distance sensors 51, 52 to measure the first distance DT1 and the second distance DT2 through the wall. [Example]

[0089] Next, a second embodiment of the present invention will be described with reference to the drawings. Note that descriptions that overlap with the first embodiment will be omitted. Fig. 9 is a side view showing the configuration of a load port 5 according to the second embodiment.

[0090] In the first embodiment, the tilt detection sensor 47 includes two distance sensors 51 and 52. In contrast, in the second embodiment, the tilt detection sensor 47 does not include the distance sensor 52, but includes a single distance sensor 51 and a sensor moving unit 101 that moves the single distance sensor 51 in the X direction.

[0091] Please refer to Fig. 9. A single distance sensor 51 is provided below the stage 9. The single distance sensor 51 irradiates a laser beam in a vertically upward direction.

[0092] The sensor moving unit 101 includes a screw shaft 103, a guide rail 105, a slider 107, and an electric motor 109. The screw shaft 103 and the guide rail 105 are each formed to extend in the X direction. The screw shaft 103 penetrates the slider 107 while meshing with an internal thread 107A of the slider 107. The guide rail 105 passes through a guide hole 107B of the slider 107. The slider 107 is guided in the X direction by the guide rail 105. A single distance sensor 51 is attached to the slider 107. An output rotation shaft 109A of the electric motor 109 is connected to one end of the screw shaft 103.

[0093] The screw shaft 103 is rotatable around a horizontal axis extending in the X direction. For example, when the electric motor 109 rotates the screw shaft 103 in the forward direction around the horizontal axis, the single distance sensor 51 and the slider 107 move to the rear side of the cassette C. On the other hand, when the electric motor 109 rotates the screw shaft 103 in the reverse direction around the horizontal axis, the single distance sensor 51 and the slider 107 move to the front side of the cassette C.

[0094] Here, the operation of tilt adjustment will be described. The single distance sensor 51 is moved to the rear side of the cassette C. The single distance sensor 51 then measures a first vertical distance DT1 to a first measurement position PT1 set on the underside of the substrate W. Furthermore, the single distance sensor 51 is moved to the front side of the cassette C by the sensor moving unit 101, thereby measuring a second vertical distance DT2 to a second measurement position PT2 set on the underside of the substrate W. Note that the order of measurements may be reversed. That is, the first distance DT1 may be measured after the second distance DT2 is measured.

[0095] For example, the first linear actuator 55 of the tilt adjustment mechanism 49 rotates the cassette C and the stage 9 around the horizontal axis AX2 based on the first distance DT1 and the second distance DT2 measured by a single distance sensor 51, thereby adjusting the tilt of the substrate W so that the substrate W whose first distance DT1, etc. has been measured becomes horizontal.

[0096] According to this embodiment, when a cassette C stores a plurality of substrates W, as in embodiment 1, it is possible to easily improve the reduction in the clearance CL between two substrates W in the cassette C. Furthermore, in this embodiment, the inclination of the substrate W is detected from below the substrate W by a single distance sensor 51 provided below the stage 9. Therefore, the inclination of the substrate W can be detected relatively accurately. Furthermore, since the single distance sensor 51 is moved horizontally by the sensor moving unit 101, it is easy to change the first measurement position PT1 and the second measurement position PT2 for measuring the first distance DT1 and the second distance DT2. [Example]

[0097] Next, a third embodiment of the present invention will be described with reference to the drawings. Descriptions that overlap with those of the first and second embodiments will be omitted. Fig. 10(a) is a vertical cross-sectional view showing the configuration of a buffer BF according to the third embodiment. Fig. 10(b) is a front view mainly showing a buffer body 111 of the buffer BF. Fig. 11 is a vertical cross-sectional view showing the configuration of a recovery unit 83 according to the third embodiment.

[0098] In the first and second embodiments, the inclination of the substrate W in the cassette C placed on the stage 9 of each load port 5 is adjusted. In this regard, in the third embodiment, the inclination of the substrate W in the buffer BF may be adjusted. Also, the inclination of the substrate W in the collection cassette CC may be adjusted.

[0099] 10(a) and 10(b), the buffer BF includes a buffer body 111, a stage 113, two distance sensors 115 and 116 (tilt detection sensors), and two linear actuators 117 and 118 (tilt adjustment mechanisms).

[0100] The buffer body 111 is placed on the upper surface of the stage 113 and fixed to the stage 113. The buffer body 111 has a left side wall 121, a right side wall 122, and a ceiling wall 123. The buffer body 111 also has a first opening 131 and a second opening 132.

[0101] The first opening 131 and the second opening 132 are arranged in the X direction. The second opening 132 faces the first opening 131. The first opening 131 is provided on the transport robot IR side. The transport robot IR accesses the buffer main body 111 with its hand 71 through the first opening 131. The second opening 132 is provided on the transport robot TR side. The transport robot TR accesses the buffer main body 111 with its hand 85 through the second opening 132.

[0102] The buffer main body 111 includes multiple pairs (e.g., 25 pairs) of shelf portions 125, 126 for storing multiple (e.g., 25) substrates W. Each pair of shelf portions 125, 126 is arranged in the vertical direction. The multiple pairs of shelf portions 125, 126 are provided on the left and right inner walls (the left wall 121 and the right wall 122) of the buffer main body 111.

[0103] The two distance sensors 115 and 116 are configured in the same manner as the two distance sensors 51 and 52 of the load port 5. An overview of the two distance sensors 115 and 116 will be described.

[0104] The two distance sensors 115 and 116 are each provided below the stage 113. The two distance sensors 115 and 116 detect the inclination of the substrate W in the buffer main body 111 fixed to the stage 113. The two distance sensors 115 and 116 detect the inclination of the substrate W about a horizontal axis AX3 extending in the Y direction perpendicular to the direction (X direction) in which the substrate W is loaded and unloaded in a plan view. The two distance sensors 51 and 52 each emit laser light in a vertically upward direction. The distance sensor 115 measures a first vertical distance DT1 to a first measurement position PT1 set on the underside of the substrate W. The distance sensor 116 measures a second vertical distance DT2 to a second measurement position PT2 set on the underside of the substrate W.

[0105] When viewed from the bottom side, the first measurement position PT1 and the second measurement position PT2 are disposed on a straight line that passes through the center of the substrate W and extends in the X direction. The first measurement position PT1 and the second measurement position PT2 are spaced apart in the X direction. Furthermore, the first measurement position PT1 and the second measurement position PT2 are set on the peripheral portion of the bottom surface of the substrate W, as shown in FIG. 10(a).

[0106] The two linear actuators 117 and 118 are configured in the same manner as the two linear actuators 55 and 56 of the load port 5. An overview of the two linear actuators 117 and 118 will now be described.

[0107] At least one of the two linear actuators 117, 118 adjusts the inclination of the substrate W in the buffer body 111 fixed to the stage 113. That is, at least one of the two linear actuators 117, 118 rotates the stage 113 (and the buffer body 111) to which the buffer body 111 is fixed around the horizontal axis AX3 based on the inclination of the substrate W (first distance DT1 and second distance DT2) detected by the two distance sensors 115, 116. In this way, at least one of the two linear actuators 117, 118 adjusts the inclination of the substrate W so that the substrate W is horizontal.

[0108] For example, the upper end portion of rod 59 of second linear actuator 118 is rotatably connected around horizontal axis AX3 to connecting portion 113B provided on the underside of stage 113. Also, stage 113 is provided with holes 113C and 113D that allow laser beams from two distance sensors 115 and 116 to pass through.

[0109] 11, the recovery unit 83 includes, in addition to the recovery cassette CC and the stage 89, two distance sensors 141 and 142 and two linear actuators 143 and 144.

[0110] The two distance sensors 141, 142 are configured in the same manner as the two distance sensors 51, 52 of the load port 5. However, the two distance sensors 141, 142 are arranged in the Y direction. The two linear actuators 143, 144 are configured in the same manner as the two linear actuators 55, 56 of the load port 5.

[0111] The two distance sensors 141, 142 are each provided below the stage 89. The two distance sensors 141, 142 detect the inclination of the substrate W in the collection cassette CC placed on the stage 89. The two distance sensors 141, 142 detect the inclination of the substrate W about a horizontal axis AX4 extending in the X direction perpendicular to the insertion / removal direction (Y direction) of the substrate W in a plan view. The two distance sensors 141, 142 measure a first distance DT1 and a second distance DT2.

[0112] At least one of the two linear actuators 143, 144 rotates the stage 89 (and the collection cassette CC) on which the collection cassette CC is placed, about the horizontal axis AX4, based on the inclination of the substrate W (first distance DT1 and second distance DT2) detected by the two distance sensors 141, 142. As a result, at least one of the two linear actuators 143, 144 adjusts the inclination of the substrate W so that the substrate W is horizontal. For example, after adjusting the inclination, the transport robot TR transports the substrate W to be collected in order from the lower side of the pairs of grooves 23, 24 of the collection cassette CC. Note that the transport robot TR may transport the substrate W to any pair of grooves 23, 24 of the collection cassette CC.

[0113] For example, the upper end portion of the rod 59 of the second linear actuator 144 is rotatably connected around a horizontal axis AX4 to a connecting portion 89B provided on the underside of the stage 89. The stage 89 is provided with holes 89C and 89D that allow the laser beams of the two distance sensors 141 and 142 to pass through.

[0114] According to this embodiment, it is possible to easily improve the reduction in the clearance CL between the buffer main body 111 and the two substrates W in the collection cassette CC, and also to reduce the burden of adjustment on the operator.

[0115] Each buffer BF and recovery unit 83 corresponds to a mounting table of the present invention. When the recovery unit 83 corresponds to a mounting table of the present invention, for example, the Y direction corresponds to a first horizontal direction of the present invention, and the X direction corresponds to a second horizontal direction of the present invention. Each buffer main body 111 and recovery cassette CC correspond to a storage container of the present invention.

[0116] The two distance sensors 115 and 116 correspond to the tilt detection sensors of the present invention. The two distance sensors 141 and 142 correspond to the tilt detection sensors of the present invention. The two linear actuators 117 and 118 correspond to the tilt adjustment mechanisms of the present invention. The two linear actuators 143 and 144 correspond to the tilt adjustment mechanisms of the present invention.

[0117] In this embodiment, both the buffer BF and the recovery unit 83 are equipped with, for example, two distance sensors and two linear actuators, and are able to detect the tilt of the substrate W and adjust the tilt of the substrate W so that the substrate W is horizontal. In this regard, one of the buffer BF and the recovery unit 83 may be able to detect the tilt of the substrate W and adjust the tilt of the substrate W so that the substrate W is horizontal.

[0118] In this embodiment, the buffer BF is equipped with two distance sensors 115 and 116, and the collection unit 83 is equipped with two distance sensors 141 and 142. In this regard, at least one of the buffer BF and the collection unit 83 may be equipped with a single distance sensor and a sensor moving unit, as in the second embodiment.

[0119] The present invention is not limited to the above-described embodiment, but can be modified as follows.

[0120] (1) In the above-described embodiment, the load port 5 is provided with two linear actuators 55, 56 as the tilt adjustment mechanism 49. However, as shown in FIG. 12(a), for example, the load port 5 may be provided with a single linear actuator 55 and a support unit 147. In this case, for example, the support unit 147 is connected to the connection unit 9B of the stage 9 around the horizontal axis AX2.

[0121] 12(b), the load port 5 may include a support 149 and a single linear actuator 56. In this case, for example, the upper end portion of the support 149 is connected to the connecting portion 9B of the stage 9 around the horizontal axis AX2, and the upper end portion of the rod 59 of the single linear actuator 56 contacts the lower surface of the stage 9. Alternatively, the upper end portion of the support 149 may contact the lower surface of the stage 9, and the upper end portion of the rod 59 of the single linear actuator 56 may be connected to the connecting portion 9B of the stage 9 around the horizontal axis AX2. Neither of the supports 147, 149 is configured to raise or lower the stage 9. This modification is not limited to the load port 5, and the same applies to the buffer BF and the recovery unit 83 of the third embodiment. This also applies to the following modifications.

[0122] (2) In the above-described embodiment and modified example (1), the upper end portion of the rod 59 of the second linear actuator 56 is rotatably connected to the connecting portion 9B of the stage 9. Alternatively, the upper end portion of the rod 59 of the first linear actuator 55 may be rotatably connected to the connecting portion of the stage 9.

[0123] (3) In the above-described embodiment and modified example, the tilt adjustment mechanism 49 of the load port 5 tilts the stage 9 on which the cassette C is placed. However, the tilt adjustment mechanism 49 of the load port 5 may tilt the cassette C without tilting the stage 9.

[0124] As shown in Figures 13(a) and 13(b), the stage 9 includes, for example, a front support portion 151 and a rear support portion 153. The front support portion 151 and the rear support portion 153 are arranged in the X direction in which the substrate W is loaded and unloaded. The front support portion 151 supports the front portion of the cassette C from below. The rear support portion 153 supports the rear portion of the cassette C from below. The cassette C is positioned on the upper surfaces of the front support portion 151 and the rear support portion 153 by guides (not shown).

[0125] The tilt adjustment mechanism 49 adjusts the tilt of the substrate W so that the substrate W is horizontal by raising and lowering at least one of the front support part 151 and the rear support part 153 in order to rotate the cassette C about the horizontal axis AX2. Specifically, the upper end portion of the rod 59 of the first linear actuator 55 passes through a hole 9E in the stage 9 and is connected to the lower surface of the rear support part 153. Furthermore, the upper end portion of the rod 59 of the second linear actuator 56 passes through a hole 9F in the stage 9 and is connected to a connecting part 151A provided on the lower surface of the front support part 151 so as to be rotatable about the horizontal axis AX2.

[0126] The tilt of the substrate W can be adjusted by raising and lowering at least one of the front support portion 151 and the rear support portion 153, which support the cassette C, respectively.

[0127] (4) In the above-described embodiment and modified example, for example, the two distance sensors 51, 52 measured the first distance DT1 and the second distance DT2 for a product substrate (substrate W) stored in a cassette. Then, the product substrate used for the measurements was adjusted to be horizontal. In this regard, for example, the two distance sensors 51, 52 may measure the first distance DT1 and the second distance DT2 for a reference substrate (substrate W) for tilt adjustment instead of the product substrate, and the reference substrate may be adjusted to be horizontal.

[0128] The product substrate is a substrate W to be processed by the substrate processing apparatus 1, and is a substrate W on which a pattern is formed. The reference substrate is, for example, a substrate W that is free of warp and has accurately formed dimensions, such as diameter. The tilt adjustment using the reference substrate may be performed when the substrate processing apparatus 1 is assembled or when maintenance of the substrate processing apparatus 1 is performed. The tilt adjustment using the reference substrate only requires that at least one reference substrate is stored in the cassette C.

[0129] (5) In the above-described embodiment and modified example, even when cassette C stores a plurality of substrates W (e.g., 25 substrates), the tilt of the lowest substrate W is detected and that substrate W is adjusted to be horizontal. In this regard, the tilt of each of the plurality of substrates W (e.g., 25 substrates) may be detected and adjusted to be horizontal.

[0130] (6) In the above-described embodiment and modified examples, a cassette C is placed on the stage 9 of the load port 5 as a storage container. In this regard, the storage container may be a carrier that can be transported from the stage 9. The carrier stores a plurality of substrates W. The carrier may be, for example, a sealed container that includes the cassette C and has an openable and closable lid known as a FOUP (Front-Opening Unified Pod).

[0131] In this case, in order to measure the first distance DT1 and the second distance DT2 using the two distance sensors 51, 52, the FOUP may be provided with at least one window portion that can be opened and closed to allow the laser light from each of the two distance sensors 51, 52 to pass through.

[0132] (7) In the above-described embodiment and modified example, the distance sensor 51 and the distance sensor 52 are each provided below the stage 9. However, the distance sensor 51 and the distance sensor 52 may each be provided above the stage 9. In this case, the two distance sensors 51 and 52 each irradiate laser light vertically downward. The two distance sensors 51 and 52 measure a first distance DT1 and a second distance DT2 to the upper surface of the substrate W. Since the upper side of the cassette C is largely covered by the upper wall 15 as shown in FIG. 2, at least one openable and closable window may be provided in the upper wall 15 to allow the laser light from the distance sensor 51 and the distance sensor 52 to pass through.

[0133] (8) In the above-described embodiment and modified example, for example, two distance sensors 51, 52 provided below the stage 9 are used as the tilt detection sensor 47. Alternatively, for example, the mapping mechanism 27 may detect the tilt of the substrate W around the horizontal axis AX2. In this case, for example, the mapping mechanism 27 lowers the substrate detection sensor 29 while causing the light receiver 29B to detect light emitted from the light projector 29A of the substrate detection sensor 29. At this time, the height sensor 45 measures the height position of the substrate detection sensor 29 as shown in FIG. 14. This makes it possible to detect the width in the height direction where the light is blocked as the thickness TK of the specified substrate W1. The control unit 91 detects the tilt of the substrate W when the width in the height direction where the light is blocked is greater than the thickness of the substrate W stored in the memory unit 92.

[0134] For example, the tilt adjustment mechanism 49 adjusts the substrate W1 in the cassette C placed on the stage 9 so that the detected thickness of the substrate W1 falls within a preset range. This makes the substrate W1 horizontal.

[0135] 2, the light projector 29A and the light receiver 29B of the mapping mechanism 27 of this modified example are provided on the front and rear sides of the cassette C. In this regard, the light projector 29A and the light receiver 29B (substrate detection sensor 29) may be provided only on the front side. As shown in FIG. 15, the light projector 29A and the light receiver 29B are arranged in the Y direction perpendicular to the X direction in which the substrate W is inserted and removed. This allows the optical axis from the light projector 29A to the light receiver 29B to intersect with the peripheral edge of the substrate W on the front side of the cassette C.

[0136] The mapping mechanism 27 shown in FIG. 16 lowers the substrate detection sensor 29 while causing the light receiver 29B to detect light emitted from the light projector 29A of the substrate detection sensor 29 shown in FIG. 15. At this time, the height sensor 45 measures the height position of the substrate detection sensor 29 as shown in FIG. 16. This acquires the height position of the substrate W1 on the front side of the cassette C. The control unit 91 then compares the acquired height position with the reference height position of the substrate W1 stored in the memory unit 92. The control unit 91 detects the inclination of the substrate W1 if the acquired height position differs from the reference height position. The inclination adjustment mechanism 49 adjusts the substrate W1 in the cassette C placed on the stage 9 so that the acquired height position of the substrate W1 approximately coincides with the reference height position. This makes the substrate W1 horizontal.

[0137] (9) In the above-described embodiment and modified example, for example, two distance sensors 51, 52 provided below the stage 9 are used as the tilt detection sensor 47. Instead of this, a camera 161 shown in Fig. 17 may be used. As with the method shown in Fig. 16, the height position of a predetermined substrate W1 on the front side of the cassette C may be detected based on a two-dimensional or three-dimensional image captured by the camera 161.

[0138] (10) In the above-described embodiment and modified example, the two transport robots IR and TR transfer the substrates W via the buffer BF. However, the two transport robots IR and TR may transfer the substrates W directly.

[0139] (11) In the above-described embodiment and modified example, the buffer BF is provided in the transport space 79. However, the buffer BF may be provided in the main body 7 of the indexer block 2. The buffer BF may also be provided in an area where the processing unit 81 is provided, such as the recovery unit 83. In this case, for example, only one of the transport robots IR and TR may be able to access the buffer BF.

[0140] (12) In the above-described embodiment and modified example, the recovery unit 83 is provided in the area where the processing unit 81 is provided. However, the recovery unit 83 may be provided in at least one of the main body 7 of the indexer block 2 and the transport space 79.

[0141] (13) In the above-described embodiment and modified example, the horizontal axis AX2, which is the reference for tilting (rotating) the substrate W, etc., is, for example, the shaft portion of the connecting portion 9B shown in Fig. 5. The horizontal axis AX2 is not limited to that shaft portion.

[0142] (14) In the above-described embodiment and modified examples, any one of the load port 5, buffer BF, and recovery unit 83 may be provided with a control unit and a memory unit in addition to the control unit 91 and memory unit 92. In this case, for example, the control unit controls each component of the load port 5 and is capable of communicating with the control unit 91. The control unit includes one or more processors, such as a central processing unit (CPU). The memory unit is configured similarly to the memory unit 92. The memory unit stores, for example, computer programs required to control each component of the load port 5. The memory unit also stores various operations. [Explanation of symbols]

[0143] 1... Substrate processing equipment 5 … Loading port IR...Transport robot 9... Stage C... Cassette 11 … Front opening 13 … Rear opening 27 ... Mapping mechanism 47...Tilt detection sensor 49...Tilt adjustment mechanism 51,52 … distance sensor PT1: First measurement position PT2: Second measurement position DT1: First distance DT2 … 2nd distance 55,56 … Linear actuator 83... Recovery Unit 89... Stage CC... Collection cassette 91 ... Control section 92 … Storage section 101 ... Sensor moving part BF... Buffer 111 ... buffer body 113... Stage 115,116 … distance sensor 117,118 … Linear actuator 131 ... First opening 132 ... Second opening 141,142 … distance sensor 143,144 … Linear actuator AX1: Vertical axis AX2, AX3, AX4 … Horizontal axis 151 … Front side support part 153 ... Rear support part

Claims

1. A mounting table on which a container for storing substrates is placed, a stage on which the container is placed, the stage having a first opening for inserting and removing the substrate in a first horizontal direction relative to the container; a tilt detection sensor that detects a tilt of the substrate in the storage container placed on the stage, the tilt being about a horizontal axis that extends in a second horizontal direction perpendicular to the first horizontal direction in a plan view; a tilt adjustment mechanism that adjusts the tilt of the substrate in the storage container placed on the stage, The tilt adjustment mechanism is characterized in that the tilt of the substrate is adjusted so that the substrate is horizontal by rotating the storage container around the horizontal axis based on the tilt of the substrate detected by the tilt detection sensor.

2. The stage according to claim 1 , the tilt detection sensor includes a first distance sensor and a second distance sensor, each of which is provided below the stage; the first distance sensor measures a first distance in a vertical direction to a first measurement position set on a lower surface of the substrate; the second distance sensor measures a second distance in a vertical direction to a second measurement position set on the lower surface of the substrate; the first measurement position and the second measurement position are spaced apart in the first horizontal direction, The tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the storage container around the horizontal axis based on the first distance and the second distance measured by the first distance sensor and the second distance sensor.

3. The mounting table according to claim 2, The mounting table is characterized in that the first measurement position and the second measurement position are each set on a peripheral portion of the lower surface of the substrate.

4. The mounting table according to claim 2, The mounting table, wherein the first distance sensor and the second distance sensor are each a laser distance sensor.

5. The stage according to claim 1 , The tilt detection sensor is a single distance sensor provided below the stage; a sensor moving unit that moves the single distance sensor in the first horizontal direction, The single distance sensor measuring a first distance in a vertical direction to a first measurement position set on the underside of the substrate, and measuring a second distance in a vertical direction to a second measurement position set on the underside of the substrate by moving the sensor moving unit; the first measurement position and the second measurement position are spaced apart in the first horizontal direction, The tilt adjustment mechanism is characterized in that the tilt of the substrate is adjusted so that the substrate is horizontal by rotating the storage container around the horizontal axis based on the first distance and the second distance measured by the single distance sensor.

6. The mounting table according to any one of claims 1 to 5, The tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by rotating the stage on which the storage container is placed about the horizontal axis.

7. The mounting table according to any one of claims 1 to 5, The stage is a front support portion that supports a front portion of the storage container; a rear support portion that supports a rear portion of the storage container, The tilt adjustment mechanism adjusts the tilt of the substrate so that the substrate is horizontal by raising and lowering at least one of the front support portion and the back support portion in order to rotate the storage container around the horizontal axis.

8. The mounting table according to any one of claims 1 to 5, The mounting table is characterized in that the storage container is a carrier that can be transported from the stage.

9. The mounting table according to any one of claims 1 to 5, The mounting table is characterized in that the storage container is an open cassette.

10. The mounting table according to any one of claims 1 to 5, The mounting table is characterized in that the storage container is a buffer body fixed to the stage.

11. A mounting table according to any one of claims 1 to 5; a transfer robot having a hand capable of holding the substrate in a horizontal position and movable to transfer the substrate.

12. 12. The substrate processing apparatus according to claim 11, The substrate processing apparatus is characterized in that the mounting table is a load port.

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