Sensors and electronic devices

Abstract

To provide sensors and electronic devices capable of improving performance. [Solution] According to the embodiment, the sensor includes an element unit and a control unit. The element unit includes a base, a first fixed unit, a first other fixed unit, a first fixed electrode, a first other fixed electrode, and a first movable member. The first movable member includes a first movable base, a first beam, and a first movable structure. In the first operation, the control unit controls a first potential between the first other fixed electrode and the first other movable electrode. In the second operation, the control unit applies a first AC voltage between the first fixed electrode and the first movable electrode.

Description

Technical Field

[0001] Embodiments of the present invention relate to sensors and electronic devices.

Background Art

[0002] For example, there are sensors using MEMS structures. In sensors, improvement of characteristics is desired.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] Embodiments provide a sensor and an electronic device capable of improving characteristics.

Means for Solving the Problems

[0005] According to the embodiment, the sensor includes an element section and a control section. The element section includes a base, a first fixed section fixed to the base, a first other fixed section fixed to the base, a first fixed electrode fixed to the base, a first other fixed electrode fixed to the base, and a first movable member. A first gap is provided between the base and the first movable member. The first movable member includes a first movable base supported by the first other fixed section, a first beam, and a first movable structure. The first beam includes a first beam section, a first other beam section, and a first intermediate beam section. The first beam section is connected to the first fixed section. The first other beam section is connected to the first movable base. The second direction from the first beam section to the first other beam section intersects with the first direction from the base to the first other fixed section. The first intermediate beam section is located between the first beam section and the first other beam section. The first movable structure includes a first movable electrode, a first other movable electrode, and a first movable connector. The direction from the first movable electrode to the first other movable electrode is along a third direction intersecting a plane including the first and second directions. The first movable electrode and the first other movable electrode extend along the second direction. The first movable connector is connected to the first intermediate beam. The first movable connector extends along the third direction. The first movable connector is connected to the first movable electrode and the first other movable electrode. The control unit is configured to perform a first operation and a second operation. In the first operation, the control unit is configured to control a first potential between the first other fixed electrode and the first other movable electrode. In the second operation, the control unit is configured to apply a first AC voltage between the first fixed electrode and the first movable electrode. [Brief explanation of the drawing]

[0006] [Figure 1] Figure 1 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 2] Figure 2 is a schematic plan view illustrating a sensor according to the first embodiment. [Figure 3] Figure 3 is a schematic cross-sectional view illustrating a sensor according to the first embodiment. [Figure 4]Figure 4 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 5] Figure 5 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 6] Figure 6 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 7] Figure 7 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 8] Figure 8 is a schematic plan view illustrating a part of the sensor according to the first embodiment. [Figure 9] Figure 9 is a schematic diagram illustrating an electronic device according to the second embodiment. [Figure 10] Figures 10(a) to 10(g) are schematic diagrams illustrating applications of the electronic device according to the embodiment. [Figure 11] Figures 11(a) and 11(b) are schematic diagrams illustrating applications of the sensor according to the embodiment. [Modes for carrying out the invention]

[0007] The embodiments of the present invention will be described below with reference to the drawings. Drawings are schematic or conceptual, and the relationships between the thickness and width of each part, as well as the ratios of the sizes of different parts, are not necessarily identical to those of reality. Even when representing the same part, the dimensions and ratios may be depicted differently in different drawings. In this specification and in each figure, elements similar to those described above are denoted by the same reference numerals with respect to previously shown figures, and detailed explanations are omitted as appropriate.

[0008] (First Embodiment) Figure 1 is a schematic plan view illustrating a part of the sensor according to the first embodiment. Figure 2 is a schematic plan view illustrating a sensor according to the first embodiment. Figure 3 is a schematic cross-sectional view illustrating a sensor according to the first embodiment. Figure 3 is a cross-sectional view taken along the line Y1-Y2 in Figure 2. Figure 4 is a schematic plan view illustrating a part of the sensor according to the first embodiment. As shown in Figures 1 to 3, the sensor 110 according to this embodiment includes an element unit 10E and a control unit 70.

[0009] As shown in Figures 2 and 3, the element portion 10E includes a base 50S, a first fixing portion 51F, and a first other fixing portion 50F. The first fixing portion 51F and the first other fixing portion 50F are fixed to the base 50S. For example, the first fixing portion 51F may be fixed to the base 50S via the first other fixing portion 50F. In this case, a gap may be provided between the base 50S and the first fixing portion 51F. The relative positions of the first fixing portion 51F and the base 50S are substantially fixed. As will be described later, the element portion 10E may further include a second fixing portion 52F.

[0010] As shown in Figure 1, the element section 10E further includes a first fixed electrode 21 and a first other fixed electrode 21A. The first fixed electrode 21 and the first other fixed electrode 21A are fixed to the substrate 50S. In Figure 2, these fixed electrodes are omitted.

[0011] As shown in Figure 2, the element section 10E further includes a first movable member 10M. The first movable member 10M is supported by a first fixed part 50F. As shown in Figure 3, a first gap 10Z is provided between the base 50S and the first movable member 10M. The element section 10E has a MEMS (Micro Electro Mechanical Systems) structure.

[0012] As shown in Figure 1, the first movable member 10M includes a first movable base 10A, a first beam 11, and a first movable structure 11A. The first movable base 10A is supported by a first fixed part 50F.

[0013] The first beam 11 includes a first beam portion 11a, a first other beam portion 11b, and a first intermediate beam portion 11c. The first beam portion 11a is connected to the first fixed portion 51F. The first other beam portion 11b is connected to the first movable base 10A. The second direction D2 from the first beam portion 11a to the first other beam portion 11b intersects with the first direction D1 (see FIG. 3) from the base body 50S to the first other fixed portion 50F.

[0014] The first direction D1 is the Z-axis direction. One direction perpendicular to the Z-axis direction is the X-axis direction. The direction perpendicular to the Z-axis direction and the X-axis direction is the Y-axis direction. In the example of the sensor 110, the second direction D2 may be the X-axis direction.

[0015] The first intermediate beam portion 11c is between the first beam portion 11a and the first other beam portion 11b. For example, the first intermediate beam portion 11c may be at the center of the first beam portion 11a and the first other beam portion 11b.

[0016] The first movable structure 11A includes a first movable electrode 31, a first other movable electrode 31A, and a first movable connection portion 31C. The direction from the first movable electrode 31 to the first other movable electrode 31A is along the third direction D3. The third direction D3 intersects with the plane including the first direction D1 and the second direction D2. The third direction D3 may be, for example, the Y-axis direction.

[0017] The first movable electrode 31 and the first other movable electrode 31A extend along the second direction D2. The length of the first movable electrode 31 along the second direction D2 is longer than the length of the first movable electrode 31 along the third direction D3. The length of the first other movable electrode 31A along the second direction D2 is longer than the length of the first other movable electrode 31A along the third direction D3.

[0018] The first movable connection portion 31C is connected to the first intermediate beam portion 11c. The first movable connection portion 31C extends along the third direction D3. For example, the length of the first movable connection portion 31C along the third direction D3 is longer than the length of the first movable connection portion 31C along the second direction D2. The first movable connection portion 31C is connected to the first movable electrode 31 and the first other movable electrode 31A.

[0019] The control unit 70 is configured to perform a first operation and a second operation. In the first operation, the control unit 70 is configured to control a first potential E1 between the first fixed electrode 21A and the first movable electrode 31A. In the second operation, the control unit 70 is configured to apply a first AC voltage V1 between the first fixed electrode 21 and the first movable electrode 31.

[0020] For example, in the second operation, the first beam 11 vibrates due to the first AC voltage V1. Meanwhile, stress is applied to the first beam 11 due to the acceleration applied to the element section 10E. This stress causes, for example, a change in the resonant frequency of the first beam 11. By detecting the change in resonant frequency, it is possible to detect the acceleration applied to the element section 10E. The method for detecting the resonant frequency is arbitrary. For example, information regarding the resonant frequency may be detected electrically or optically. The second operation corresponds to at least a part of the detection operation.

[0021] In this embodiment, during the first operation, the first potential E1 between the first fixed electrode 21A and the first movable electrode 31A is controlled. This allows for proper control of the vibration characteristics (e.g., resonant frequency) of the first beam 11, for example, when there is no external acceleration. For example, a correction is performed. The first operation corresponds to, for example, a correction operation (or adjustment operation).

[0022] For example, variations in the manufacturing process of the element part 10E may cause non-uniformity in the structure contained in the element part 10E. Due to this structural non-uniformity, the vibration characteristics (e.g., resonant frequency) of the first beam 11 may shift from the target value. Even in such cases, by appropriately controlling the first potential E1, the vibration characteristics (e.g., resonant frequency) of the first beam 11 can be brought closer to the target value. This enables detection with higher accuracy. According to this embodiment, a sensor capable of improving characteristics can be provided.

[0023] In the example of sensor 110, the element section 10E further includes a first opposing fixed electrode 21C. The first opposing fixed electrode 21C is fixed to the base 50S. The first opposing fixed electrode 21C faces the first movable electrode 31. The control unit 70 is configured to detect a first signal S1 between the first opposing fixed electrode 21C and the first movable electrode 31 in the second operation. The first signal S1 corresponds to the vibration state of the first beam 11. The vibration state of the first beam 11 (e.g., resonant frequency) can be electrically detected using the first opposing fixed electrode 21C.

[0024] The first signal S1 is configured to change in response to changes in acceleration applied to the element section 10E. For example, the first signal S1 responds to changes in the first resonant frequency of the first beam 11, which changes in response to changes in acceleration. On the other hand, as already described, the control unit 70 is configured to control the first potential E1 in the first operation to correct the first resonant characteristics of the first beam 11.

[0025] As shown in Figure 1, in the sensor 110, at least a portion of the first movable electrode 31 is located between the first fixed electrode 21 and the first opposing fixed electrode 21C in the third direction D3.

[0026] In the third direction D3, the first movable electrode 31 is located between the first beam 11 and the first other movable electrode 31A. The distance along the third direction D3 between the first beam 11 and the first movable electrode 31 is shorter than the distance along the third direction D3 between the first beam 11 and the first other movable electrode 31A. For example, stable detection and stable adjustment operations become easier.

[0027] For example, the distance along the third direction D3 between the first beam 11 and the first movable electrode 31 may be shorter than the distance along the third direction D3 between the first movable electrode 31 and the first other movable electrode 31A. The length of the first movable electrode 31 along the second direction D2 may be longer than the length of the first other movable electrode 31A along the second direction D2.

[0028] In the example shown in Figure 1, at least a portion of the first movable electrode 31A lies between a portion of the first fixed electrode 21A and another portion of the first fixed electrode 21A in the third direction D3. The first movable electrode 31A includes a portion (first opposing portion) that faces a portion of the first fixed electrode 21A in the third direction D3. For example, the length of the first opposing portion in the second direction D2 may be substantially the same as the length of the first opposing portion in the second direction D2. At least a portion of the first movable electrode 31A lies between a portion of the first fixed electrode 21A and another portion of the first fixed electrode 21A in the second direction D2. This allows for more stable control of the vibration characteristics of the first beam 11.

[0029] Figure 4 shows an enlarged example of the portion including the first movable structure 11A. In Figure 4, the fixed electrodes (e.g., the first fixed electrode 21 and the first opposing fixed electrode 21C) are omitted. As shown in Figures 1 and 4, the element portion 10E may further include a first fixed structure 15a. The first fixed structure 15a is fixed to the base 50S. The first fixed structure 15a faces the first movable structure 11A. For example, the first fixed structure 15a faces the first other movable electrode 31A in the third direction D3. The potential of the first fixed structure 15a may be the same as the potential of the first movable structure 11A. The first fixed structure 15a may, for example, suppress excessive displacement of the first movable structure 11A. The first fixed structure 15a may, for example, be a stopper.

[0030] As shown in Figure 1, the first movable electrode 31 and the first fixed electrode 21 may constitute a first comb-tooth electrode pair. The first movable electrode 31 and the first opposing fixed electrode 21C may constitute a first opposing comb-tooth electrode pair.

[0031] As shown in Figure 1, for example, the first movable structure 11A may be symmetrical with respect to the first straight line Ln1 that passes through the first intermediate beam section 11c and lies along the third direction D3. This allows for detection with higher accuracy.

[0032] As shown in Figure 1, the element portion 10E may further include a second fixed electrode 22 and a second other fixed electrode 22A. The second fixed electrode 22 and the second other fixed electrode 22A are fixed to the base body 50S. The first movable member 10M may further include a second beam 12 and a second movable structure 12A.

[0033] The first beam 11 is located between the second movable structure 12A and the first movable structure 11A in the third direction D3. The second beam 12 is located between the second movable structure 12A and the first beam 11 in the third direction D3. The second beam 12 extends along the second direction D2.

[0034] For example, the second beam 12 includes a second beam section 12a, a second other beam section 12b, and a second intermediate beam section 12c. The second beam section 12a is connected to the first fixed section 51F. The second other beam section 12b is connected to the first movable base section 10A. The direction from the second beam section 12a to the second other beam section 12b is along the second direction D2. The second intermediate beam section 12c is located between the second beam section 12a and the second other beam section 12b. The second intermediate beam section 12c may be at the center of the second beam section 12a and the second other beam section 12b.

[0035] The second movable structure 12A includes a second movable electrode 32, a second other movable electrode 32A, and a second movable connector 32C. The direction from the second other movable electrode 32A to the second movable electrode 32 is along the third direction D3. The second movable electrode 32 and the second other movable electrode 32A extend along the second direction D2. The second movable connector 32C is connected to the second intermediate beam 12c. The second movable connector 32C extends along the third direction D3. The second movable connector 32C is connected to the second movable electrode 32 and the second other movable electrode 32A.

[0036] The control unit 70 is configured to control the second potential E2 between the second fixed electrode 22A and the second movable electrode 32A in the first operation. In the second operation, the control unit 70 is configured to apply a first AC voltage V1 between the second fixed electrode 22 and the second movable electrode 32.

[0037] In the first operation (for example, adjustment operation), the second potential E2 is controlled, thereby correcting (adjusting) the vibration characteristics of the second beam 12 (for example, the resonant frequency).

[0038] As shown in Figure 1, the element unit 10E may further include a second opposing fixed electrode 22C. The second opposing fixed electrode 22C is fixed to the base 50S. The second opposing fixed electrode 22C faces the second movable electrode 32. The control unit 70 may be configured to detect a second signal S2 between the second opposing fixed electrode 22C and the second movable electrode 32 during the second operation. The second signal S2 is configured to change in accordance with the change in acceleration applied to the element unit 10E. By detecting the second signal S2, information regarding acceleration can be obtained.

[0039] For example, the second signal S2 corresponds to the change in the second resonant frequency of the second beam 12, which changes in accordance with the change in acceleration. The control unit 70 may be configured to output a first value based on the first signal S1 and the second signal S2 in the second operation. For example, the first value may include the calculation result of the first signal S1 and the second signal S2. This suppresses the effects of noise, for example.

[0040] The first action described above (e.g., adjustment action) may correct the difference in the resonant frequencies of the two beams. For example, by controlling the first action, an appropriate soft spring effect can be obtained. For example, an appropriate tuning fork action can be obtained in the two beams. For example, a high Q factor can be obtained. For example, the effects of characteristic degradation caused by variations in the manufacturing process can be suppressed. For example, thermomechanical noise can be reduced. High-precision detection results can be obtained.

[0041] For example, the control unit 70 is configured to control the second potential E2 in the first operation to correct the second resonance characteristic of the second beam 12.

[0042] For example, the control unit 70 may be configured in the first operation to make the first absolute value of the first potential E1 greater than the second absolute value of the second potential E2 when the first resonant frequency of the first beam 11 is higher than the second resonant frequency of the second beam 12. The control unit 70 may be configured in the first operation to make the absolute value of the first potential E1 greater than 0 and the second absolute value of the second potential E2 substantially 0 when the first resonant frequency is higher than the second resonant frequency.

[0043] For example, in the first operation, the control unit 70 may be configured to make the second absolute value of the second potential E2 greater than the first absolute value of the first potential E1 when the second resonant frequency of the second beam 12 is higher than the first resonant frequency of the first beam 11. In the first operation, the control unit 70 may be configured to make the absolute value of the second potential E2 greater than 0 and substantially reduce the first absolute value of the first potential E1 to 0 when the second resonant frequency is higher than the first resonant frequency.

[0044] As shown in Figure 1, in the sensor 110, at least a portion of the second movable electrode 32 is located between the second fixed electrode 22 and the second opposing fixed electrode 22C in the third direction D3.

[0045] In the third direction D3, the second movable electrode 32 is located between the second beam 12 and the second other movable electrode 32A. The distance along the third direction D3 between the second beam 12 and the second movable electrode 32 is shorter than the distance along the third direction D3 between the second beam 12 and the second other movable electrode 32A. For example, stable detection operation and stable adjustment operation become easier.

[0046] For example, the distance along the third direction D3 between the second beam 12 and the second movable electrode 32 may be shorter than the distance along the third direction D3 between the second movable electrode 32 and the second other movable electrode 32A. The length of the second movable electrode 32 along the second direction D2 may be longer than the length of the second other movable electrode 32A along the second direction D2.

[0047] In the example shown in Figure 1, at least a portion of the second movable electrode 32A lies between a portion of the second fixed electrode 22A and another portion of the second fixed electrode 22A in the third direction D3. The second movable electrode 32A includes a portion (second opposing portion) that faces a portion of the second fixed electrode 22A in the third direction D3. For example, the length of the second opposing portion in the second direction D2 may be substantially the same as the length of the second opposing portion in the second direction D2. At least a portion of the second movable electrode 32A lies between a portion of the second fixed electrode 22A and another portion of the second fixed electrode 22A in the second direction D2. This allows for more stable control of the vibration characteristics of the second beam 12.

[0048] As shown in Figure 1, the element section 10E may further include a second fixed structure 15b. The second fixed structure 15b is fixed to the base 50S. The second fixed structure 15b faces the second movable structure 12A. For example, in the third direction D3, the second fixed structure 15b faces the second other movable electrode 32A. The potential of the second fixed structure 15b may be the same as the potential of the second movable structure 12A. The second fixed structure 15b may, for example, suppress excessive displacement of the second movable structure 12A. The second fixed structure 15b may be, for example, a stopper.

[0049] As shown in Figure 1, the second movable electrode 32 and the second fixed electrode 22 may constitute a second comb-tooth electrode pair. The second movable electrode 32 and the second opposing fixed electrode 22C may constitute a second opposing comb-tooth electrode pair.

[0050] As shown in Figure 1, for example, the second movable structure 12A may be symmetric with respect to the first line Ln1. This allows for detection with higher accuracy.

[0051] As shown in Figure 2, the second straight line Ln2 is defined as a line passing through the center in the third direction D3 between the first beam 11 and the second beam 12 and along the second direction D2. The first member, including the first beam 11 and the first movable structure 11A, may be symmetrical with respect to the second member, including the second beam 12 and the second movable structure 12A, with respect to the second straight line Ln2 as the axis. This allows for detection with higher accuracy.

[0052] As shown in Figure 1, in the example of the sensor 110, the element portion 10E includes a second fixed portion 52F, a third fixed electrode 23, a third other fixed electrode 23A, a fourth fixed electrode 24, and a fourth other fixed electrode 24A. The second fixed portion 52F is fixed to the base body 50S. For example, the second fixed portion 52F may be fixed to the base body 50S via a first other fixed portion 50F. In this case, a gap may be provided between the base body 50S and the second fixed portion 52F. The relative positions of the second fixed portion 52F and the base body 50S are substantially fixed. The third fixed electrode 23, the third other fixed electrode 23A, the fourth fixed electrode 24, and the fourth other fixed electrode 24A are fixed to the base body 50S.

[0053] At least a portion of the first other fixing portion 50F is located between at least a portion of the first fixing portion 51F and at least a portion of the second fixing portion 52F in the second direction D2.

[0054] The first movable member 10M includes a third beam 13, a third movable structure 13A, a fourth beam 14, and a fourth movable structure 14A. The third beam 13 is located between the fourth movable structure 14A and the third movable structure 13A in the third direction D3. The fourth beam 14 is located between the fourth movable structure 14A and the third beam 13 in the third direction D3.

[0055] The third beam 13 includes a third beam section 13a, a third other beam section 13b, and a third intermediate beam section 13c. The third beam 13 extends, for example, along a second direction D2. The third beam section 13a is connected to a second fixed section 52F. The third other beam section 13b is connected to a first movable base 10A. The direction from the third other beam section 13b to the third beam section 13a is along the second direction D2. The third intermediate beam section 13c is located between the third other beam section 13b and the third beam section 13a. The third intermediate beam section 13c may be at the center of the third other beam section 13b and the third beam section 13a.

[0056] The third movable structure 13A includes a third movable electrode 33, a third other movable electrode 33A, and a third movable connector 33C. The direction from the third movable electrode 33 to the third other movable electrode 33A is along the third direction D3. The third movable electrode 33 and the third other movable electrode 33A extend along the second direction D2. The third movable connector 33C is connected to the third intermediate beam 13c. The third movable connector 33C extends along the third direction D3. The third movable connector 33C is connected to the third movable electrode 33 and the third other movable electrode 33A.

[0057] The fourth beam 14 includes a fourth beam section 14a, a fourth other beam section 14b, and a fourth intermediate beam section 14c. The fourth beam 14 extends, for example, along a second direction D2. The fourth beam section 14a is connected to a second fixed section 52F. The fourth other beam section 14b is connected to a first movable base 10A. The direction from the fourth other beam section 14b to the fourth beam section 14a is along the second direction D2. The fourth intermediate beam section 14c is located between the fourth other beam section 14b and the fourth beam section 14a. The fourth intermediate beam section 14c may be at the center of the fourth other beam section 14b and the fourth beam section 14a.

[0058] The fourth movable structure 14A includes a fourth movable electrode 34, a fourth other movable electrode 34A, and a fourth movable connector 34C. The direction from the fourth other movable electrode 34A to the fourth movable electrode 34 is along the third direction D3. The fourth movable electrode 34 and the fourth other movable electrode 34A extend along the second direction D2. The fourth movable connector 34C is connected to the fourth intermediate beam section 14c. The fourth movable connector 34C extends along the third direction D3. The fourth movable connector 34C is connected to the fourth movable electrode 34 and the fourth other movable electrode 34A.

[0059] The control unit 70 is configured to control the third potential E3 between the third fixed electrode 23A and the third movable electrode 33A in the first operation. The control unit 70 is configured to control the fourth potential E4 between the fourth fixed electrode 24A and the fourth movable electrode 34A in the first operation.

[0060] The control unit 70 may be configured to apply a second AC voltage V2 between the third fixed electrode 23 and the third movable electrode 33 during the second operation. The control unit 70 may also be configured to apply a second AC voltage V2 between the fourth fixed electrode 24 and the fourth movable electrode 34 during the second operation. The second AC voltage V2 may be different from the first AC voltage V1.

[0061] In the sensor 110, the control unit 70 is configured to control the third potential E3 in the first operation to correct the third resonance characteristic of the third beam 13. The control unit 70 is also configured to control the fourth potential E4 in the first operation to correct the fourth resonance characteristic of the fourth beam 14.

[0062] For example, in the first operation, the control unit 70 may be configured to make the third absolute value of the third potential E3 greater than the fourth absolute value of the fourth potential E4 when the third resonant frequency of the third beam 13 is higher than the fourth resonant frequency of the fourth beam 14. In the first operation, the control unit 70 may be configured to make the absolute value of the third potential E3 greater than 0 and substantially reduce the fourth absolute value of the fourth potential E4 to 0 when the third resonant frequency is higher than the fourth resonant frequency.

[0063] For example, in the first operation, the control unit 70 may be configured to make the fourth absolute value of the fourth potential E4 greater than the third absolute value of the third potential E3 when the fourth resonant frequency of the fourth beam 14 is higher than the third resonant frequency of the third beam 13. In the first operation, the control unit 70 may be configured to make the absolute value of the fourth potential E4 greater than 0 and substantially reduce the third absolute value of the third potential E3 to 0 when the fourth resonant frequency is higher than the third resonant frequency.

[0064] The first potential E1, second potential E2, third potential E3, and fourth potential E4 can be controlled, for example, by applying a DC voltage.

[0065] As will be described later, the third resonant frequency may be different from the first resonant frequency. The fourth resonant frequency may be different from the second resonant frequency. The vibration characteristics (e.g., frequency) based on the second AC voltage V2 may be different from the vibration characteristics (e.g., frequency) based on the first AC voltage V1.

[0066] The third movable structure 13A may be symmetrical with respect to the third straight line Ln3 that passes through the third intermediate beam section 13c and lies along the third direction D3. The fourth movable structure 14A may be symmetrical with respect to the third straight line Ln3.

[0067] As shown in Figures 1 and 3, the element portion 10E may include an extended fixing portion 10B. The extended fixing portion 10B is connected to a first other fixing portion 50F. The extended fixing portion 10B is fixed to the base body 50S. The extended fixing portion 10B may be fixed to the base body 50S via the first other fixing portion 50F. In this case, a gap may be provided between the base body 50S and the extended fixing portion 10B. The relative positions of the extended fixing portion 10B and the base body 50S are substantially fixed. The first movable member 10M may further include a third movable base portion 10C and a fourth movable base portion 10D. The first movable base portion 10A is located between the extended fixing portion 10B and the fourth movable base portion 10D in the third direction D3. The third movable base portion 10C is located between the extended fixing portion 10B and the first movable base portion 10A in the third direction D3.

[0068] The third width (third length) of the third movable base 10C along the second direction D2 is shorter than the second width (second length) of the extending fixed portion 10B along the second direction D2. The third width (third length) is shorter than the first width (first length) of the first movable base 10A along the second direction D2. The third movable base 10C functions, for example, as a pivot portion. The fourth width (fourth length) of the fourth movable base 10D along the second direction D2 is longer than the second length and longer than the first length. The fourth movable base 10D functions, for example, as a proof mass. In response to the acceleration received by the element portion 10E, the fourth movable base 10D is displaced, for example, along the second direction D2. Stress based on the displacement is effectively applied to multiple beams. High-sensitivity detection is performed.

[0069] The third movable connector 33C may be symmetrical with respect to the first movable connector 31C with respect to the fourth straight line Ln4 (see Figure 2) that passes through the third movable base 10C and lies along the third direction D3. The fourth movable connector 34C may be symmetrical with respect to the second movable connector 32C with respect to the fourth straight line Ln4. The third movable connector 33C does not have to be symmetrical with respect to the first movable connector 31C with respect to the fourth straight line Ln4. The fourth movable connector 34C does not have to be symmetrical with respect to the second movable connector 32C with respect to the fourth straight line Ln4. The position of the third movable connector 33C in the second direction D2 may be symmetrical with respect to the fourth straight line Ln4 with respect to the position of the first movable connector 31C in the second direction D2. The position of the fourth movable connector 34C in the second direction D2 may be symmetrical with respect to the fourth straight line Ln4 with respect to the position of the second movable connector 32C in the second direction D2.

[0070] The first movable electrode 31 and the third movable electrode 33 may satisfy at least one of the first, second, third, fourth, fifth, sixth, seventh, eighth, and ninth conditions.

[0071] In the first condition, the third mass of the third movable electrode 33 is different from the first mass of the first movable electrode 31. In the second condition, the third thickness of the third movable electrode 33 along the first direction is different from the first thickness of the first movable electrode 31 along the first direction. In the third condition, at least a portion of the third material contained in the third movable electrode 33 is different from at least a portion of the first material contained in the first movable electrode 31.

[0072] In condition 4, the third movable electrode 33 includes a third hole 33h, while the first movable electrode 31 does not include a hole (e.g., a first hole 31h). In condition 5, the third size of the third hole 33h included in the third movable electrode 33 is different from the first size of the first hole 31h included in the first movable electrode 31. In condition 6, the third density of the third hole 33h is different from the first density of the first hole 31h. In condition 7, the third number of the third hole 33h is different from the first number of the first hole 31h. In condition 8, the third shape of the third hole 33h is different from the first shape of the first hole 31h.

[0073] In condition 9, the third layer structure of the third movable electrode 33 is different from the first layer structure of the first movable electrode 31.

[0074] Under these conditions, the vibration frequency in the structure including the third movable electrode 33 is different from the resonance frequency in the structure including the first movable electrode 31. For example, the third resonance frequency of the third beam 13 is different from the first resonance frequency of the first beam 11. For example, detection of a wide dynamic range is possible.

[0075] The second movable electrode 32 and the fourth movable electrode 34 may satisfy conditions similar to those described above.

[0076] The first condition may include the third mass of the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C being different from the first mass of the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C. The second condition may include the third thickness of the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C along the first direction being different from the first thickness of the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C along the first direction. The third condition may include at least a portion of the third material included in the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C being different from at least a portion of the first material included in the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C.

[0077] The fourth condition may include the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C including a third hole 33h, while the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C not including a hole (e.g., a first hole 31h). The fifth condition may include the third size of the third hole 33h included in the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C being different from the first size of the first hole 31h included in the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C. The ninth condition may include the third layer structure of the third movable electrode 33, the third other movable electrode 33A, and the third movable connector 33C being different from the first layer structure of the first movable electrode 31, the first other movable electrode 31A, and the first movable connector 31C.

[0078] Under these conditions, the third resonant frequency of the third beam 13 is different from the first resonant frequency of the first beam 11. For example, a wide dynamic range can be detected.

[0079] The second movable electrode 32, the second other movable electrode 32A, the second movable connector 32C, the fourth movable electrode 34, the fourth other movable electrode 34A, and the fourth movable connector 34C may satisfy the same conditions as the above multiple conditions. For example, the configuration of the third movable structure 13A may differ from the configuration of the first movable structure 11A. For example, the configuration of the fourth movable structure 14A may differ from the configuration of the fourth movable structure 14A.

[0080] As shown in Figure 1, in the sensor 110, the element portion 10E further includes a third opposing fixed electrode 23C and a fourth opposing fixed electrode 24C. The third opposing fixed electrode 23C and the fourth opposing fixed electrode 24C are fixed to the base 50S. The third opposing fixed electrode 23C faces the third movable electrode 33. The fourth opposing fixed electrode 24C faces the fourth movable electrode 34.

[0081] The control unit 70 is configured to detect a third signal S3 between the third opposing fixed electrode 23C and the third movable electrode 33 during the second operation. The third signal S3 is configured to change in accordance with the change in acceleration applied to the element unit 10E. The control unit 70 is configured to detect a fourth signal S4 between the fourth opposing fixed electrode 24C and the fourth movable electrode 34 during the second operation. The fourth signal S4 is configured to change in accordance with the change in acceleration. The vibration characteristics (e.g., frequency) based on the second AC voltage V2 may be different from the vibration characteristics (e.g., frequency) based on the first AC voltage V1.

[0082] For example, the third signal S3 corresponds to the change in the third resonant frequency of the third beam 13, which changes in accordance with the change in acceleration. For example, the fourth signal S4 corresponds to the change in the fourth resonant frequency of the fourth beam 14, which changes in accordance with the change in acceleration. The control unit 70 may be configured to output a third value based on a second value corresponding to the difference between the fourth resonant frequency and the third resonant frequency, and a first value, in the second operation.

[0083] As shown in Figure 1, in the sensor 110, at least a portion of the third movable electrode 33 is located between the third fixed electrode 23 and the third opposing fixed electrode 23C in the third direction D3.

[0084] In the third direction D3, the third movable electrode 33 is located between the third beam 13 and the third other movable electrode 33A. The distance along the third direction D3 between the third beam 13 and the third movable electrode 33 is shorter than the distance along the third direction D3 between the third beam 13 and the third other movable electrode 33A. For example, stable detection operation and stable adjustment operation become easier.

[0085] For example, the distance along the third direction D3 between the third beam 13 and the third movable electrode 33 may be shorter than the distance along the third direction D3 between the third movable electrode 33 and the third other movable electrode 33A. The length of the third movable electrode 33 along the second direction D2 may be longer than the length of the third other movable electrode 33A along the second direction D2.

[0086] In the example shown in Figure 1, at least a portion of the third movable electrode 33A lies between a portion of the third fixed electrode 23A and another portion of the third fixed electrode 23A in the third direction D3. The third movable electrode 33A includes a portion (third opposing portion) that faces a portion of the third fixed electrode 23A in the third direction D3. For example, the length of the third opposing portion in the second direction D2 may be substantially the same as the length of the third opposing portion in the second direction D2. At least a portion of the third movable electrode 33A lies between a portion of the third fixed electrode 23A and another portion of the third fixed electrode 23A in the second direction D2. This allows for more stable control of the vibration characteristics of the first beam 11.

[0087] As shown in Figure 1, the element section 10E may further include a third fixed structure 15c. The third fixed structure 15c is fixed to the base 50S. The third fixed structure 15c faces the third movable structure 13A. For example, the third fixed structure 15c faces the third other movable electrode 33A in the third direction D3. The potential of the third fixed structure 15c may be the same as the potential of the third movable structure 13A. The third fixed structure 15c may, for example, suppress excessive displacement of the third movable structure 13A. The third fixed structure 15c may, for example, be a stopper.

[0088] As shown in Figure 1, the third movable electrode 33 and the third fixed electrode 23 may constitute a third comb-tooth electrode pair. The third movable electrode 33 and the third opposing fixed electrode 23C may constitute a third opposing comb-tooth electrode pair.

[0089] As shown in Figure 1, for example, the third movable structure 13A may be symmetrical with respect to the third straight line Ln3 that passes through the third intermediate beam section 13c and aligns with the third direction D3. This allows for detection with higher accuracy.

[0090] As shown in Figure 1, in the sensor 110, at least a portion of the fourth movable electrode 34 is located between the fourth fixed electrode 24 and the fourth opposing fixed electrode 24C in the third direction D3.

[0091] In the third direction D3, the fourth movable electrode 34 is located between the fourth beam 14 and the fourth other movable electrode 34A. The distance along the third direction D3 between the fourth beam 14 and the fourth movable electrode 34 is shorter than the distance along the third direction D3 between the fourth beam 14 and the fourth other movable electrode 34A. For example, stable detection operation and stable adjustment operation become easier.

[0092] For example, the distance along the third direction D3 between the fourth beam 14 and the fourth movable electrode 34 may be shorter than the distance along the third direction D3 between the fourth movable electrode 34 and the fourth other movable electrode 34A. The length of the fourth movable electrode 34 along the second direction D2 may be longer than the length of the fourth other movable electrode 34A along the second direction D2.

[0093] In the example shown in Figure 1, at least a portion of the fourth movable electrode 34A lies between a portion of the fourth fixed electrode 24A and another portion of the fourth fixed electrode 24A in the third direction D3. The fourth movable electrode 34A includes a portion (fourth opposing portion) that faces a portion of the fourth fixed electrode 24A in the third direction D3. For example, the length of the fourth opposing portion in the second direction D2 may be substantially the same as the length of the fourth opposing portion in the second direction D2. At least a portion of the fourth movable electrode 34A lies between a portion of the fourth fixed electrode 24A and another portion of the fourth fixed electrode 24A in the second direction D2. This allows for more stable control of the vibration characteristics of the fourth beam 14.

[0094] As shown in Figure 1, the element section 10E may further include a fourth fixed structure 15d. The fourth fixed structure 15d is fixed to the base 50S. The fourth fixed structure 15d faces the fourth movable structure 14A. For example, in the third direction D3, the fourth fixed structure 15d faces the fourth other movable electrode 34A. The potential of the fourth fixed structure 15d may be the same as the potential of the fourth movable structure 14A. The fourth fixed structure 15d may, for example, suppress excessive displacement of the fourth movable structure 14A. The fourth fixed structure 15d may, for example, be a stopper.

[0095] As shown in Figure 1, the fourth movable electrode 34 and the fourth fixed electrode 24 may constitute a fourth comb-tooth electrode pair. The fourth movable electrode 34 and the fourth opposing fixed electrode 24C may constitute a fourth opposing comb-tooth electrode pair.

[0096] As shown in Figure 1, for example, the fourth movable structure 14A may be symmetrical with respect to the third line Ln3. This allows for detection with higher accuracy.

[0097] Figures 5 to 8 are schematic plan views illustrating a part of the sensor according to the first embodiment. These figures illustrate various configurations of the first beam 11 and the first movable structure 11A. In these figures, the first fixed electrode 21 and the first opposing fixed electrode 21C are omitted.

[0098] As shown in Figure 5, in the sensor 111 according to this embodiment, the fixed structure (first fixed structure 15a) is omitted. In the sensor 111, the first other movable electrode 31A includes a portion (first opposing portion) that faces a part of the first other fixed electrode 21A in the third direction D3. The first other movable electrode 31A includes a portion (first other opposing portion) that faces another part of the first other fixed electrode 21A in the third direction D3. For example, the length of the first opposing portion in the second direction D2 may be substantially the same as the length of the first other opposing portion in the second direction D2.

[0099] As shown in Figure 6, in the sensor 112 according to the embodiment, the direction from the first other movable electrode 31A to the first other fixed electrode 21A is along the third direction D3. The first other movable electrode 31A is not sandwiched between multiple regions included in the first other fixed electrode 21A.

[0100] As shown in Figure 7, in the sensor 113 according to the embodiment, a portion of the first other movable electrode 31A is provided between one portion included in the first other fixed electrode 21A and another portion included in the first other fixed electrode 21A in the third direction D3. The distance along the third direction D3 between the portion of the first other movable electrode 31A and one portion included in the first other fixed electrode 21A is different from the distance along the third direction D3 between the portion of the first other movable electrode 31A and another portion included in the first other fixed electrode 21A.

[0101] As shown in Figure 8, in the sensor 114 according to this embodiment, the first movable electrode 31A and the first fixed electrode 21A constitute a comb-shaped electrode.

[0102] In sensors 111 to 114, the configuration may be the same as that of sensor 110, except for the parts mentioned above. In sensors 111 to 114, the configuration described for the first other movable electrode 31A and the first other fixed electrode 21A may be applied to the other movable electrodes and other fixed electrodes.

[0103] (Second Embodiment) The second embodiment relates to an electronic device. Figure 9 is a schematic diagram illustrating an electronic device according to the second embodiment. As shown in Figure 9, the electronic device 310 according to the embodiment includes a sensor according to the first embodiment and a circuit control unit 170. In the example in Figure 9, a sensor 110 is depicted as the sensor. The circuit control unit 170 can control a circuit 180 based on a detection signal S0 obtained from the sensor. The circuit 180 is, for example, a control circuit for a drive device 185. According to the embodiment, for example, a circuit 180 for controlling a drive device 185 can be controlled with high precision.

[0104] Figures 10(a) to 10(g) are schematic diagrams illustrating applications of the electronic device according to the embodiment. As shown in Figure 10(a), the electronic device 310 may be at least part of a robot. As shown in Figure 10(b), the electronic device 310 may be at least part of a machine robot installed in a manufacturing plant or the like. As shown in Figure 10(c), the electronic device 310 may be at least part of an automated guided vehicle in a factory or the like. As shown in Figure 10(d), the electronic device 310 may be at least part of a drone (unmanned aerial vehicle). As shown in Figure 10(e), the electronic device 310 may be at least part of an airplane. As shown in Figure 10(f), the electronic device 310 may be at least part of a ship. As shown in Figure 10(g), the electronic device 310 may be at least part of an automobile. The electronic device 310 may include, for example, at least one of a robot and a mobile body.

[0105] Figures 11(a) and 11(b) are schematic diagrams illustrating applications of the sensor according to the embodiment. As shown in Figure 11(a), the sensor 430 according to the embodiment includes the sensor according to the first embodiment and a transmitting / receiving unit 420. In the example in Figure 11(a), the sensor 110 is depicted as the sensor. The transmitting / receiving unit 420 can transmit the signal obtained from the sensor 110 by, for example, at least one of wireless and wired methods. The sensor 430 is installed, for example, on a slope surface 410 such as a road 400. The sensor 430 can monitor the state of, for example, a facility (e.g., infrastructure). The sensor 430 may be, for example, a state monitoring device.

[0106] For example, the sensor 430 detects changes in the condition of the slope surface 410 of the road 400 with high accuracy. Changes in the condition of the slope surface 410 include, for example, changes in the inclination angle and changes in the vibration state. The signal (inspection result) obtained from the sensor 110 is transmitted by the transmitting / receiving unit 420. The condition of the facility (e.g., infrastructure) can be monitored, for example, continuously.

[0107] As shown in Figure 11(b), the sensor 430 is installed, for example, on a part of a bridge 460. The bridge 460 is built over a river 470. For example, the bridge 460 includes at least one of a main girder 450 and a pier 440. The sensor 430 is installed on at least one of the main girder 450 and the pier 440. For example, the angle of at least one of the main girder 450 and the pier 440 may change due to deterioration or other reasons. For example, the vibration state may change in at least one of the main girder 450 and the pier 440. The sensor 430 can detect these changes with high accuracy. The detection results can be transmitted to any location by the transmitting / receiving unit 420. Anomalies can be effectively detected.

[0108] The embodiments include the following technical proposals. (Technical proposal 1) The element part, Control unit and Equipped with, The aforementioned element section is Substrate and, A first fixing part fixed to the base, A first other fixing part fixed to the base, A first fixed electrode fixed to the substrate, A first fixed electrode fixed to the substrate, First movable member and Includes, A first gap is provided between the base and the first movable member. The above first movable member is, The first movable base supported by the first fixed part, The first beam and, First movable structure and Includes, The first beam includes a first beam section, a first other beam section, and a first intermediate beam section. The first beam section is connected to the first fixing section, The first other beam section is connected to the first movable base section. The second direction from the first beam to the first other beam intersects with the first direction from the base to the first other fixing part. The first intermediate beam section is located between the first beam section and the first other beam section. The first movable structure is, First movable electrode and The first other movable electrode, First movable connection part and Includes, The direction from the first movable electrode to the first other movable electrode is along a third direction that intersects the plane including the first and second directions. The first movable electrode and the first other movable electrode extend along the second direction, The first movable connection is connected to the first intermediate beam section, The first movable connection extends along the third direction, The first movable connection is connected to the first movable electrode and the first other movable electrode, The control unit is configured to perform the first and second operations. The control unit is configured to control the first potential between the first fixed electrode and the first movable electrode during the first operation. The control unit is configured to apply a first AC voltage between the first fixed electrode and the first movable electrode during the second operation.

[0109] (Technical proposal 2) The element portion further comprises a first opposing fixed electrode fixed to the substrate, The first opposing fixed electrode is opposite the first movable electrode, The control unit is configured to detect a first signal between the first opposing fixed electrode and the first movable electrode in the second operation. The sensor according to Technical Proposal 1, wherein the first signal is configured to change in accordance with the change in acceleration applied to the element.

[0110] (Technical proposal 3) The sensor according to Technical Proposal 2, wherein the first signal corresponds to a change in the first resonant frequency of the first beam, which changes in accordance with the change in acceleration.

[0111] (Technical proposal 4) The sensor according to Technical Proposal 2, wherein the control unit is configured to control the first potential in the first operation to correct the first resonance characteristics of the first beam.

[0112] (Technical proposal 5) The sensor according to any one of Technical Proposals 2 to 4, wherein at least a portion of the first movable electrode is located between the first fixed electrode and the first opposing fixed electrode in the third direction.

[0113] (Technical proposal 6) In the third direction, the first movable electrode is located between the first beam and the first other movable electrode, as described in any one of Technical Proposals 1 to 5.

[0114] (Technical proposal 7) The sensor according to any one of Technical Proposals 1 to 6, wherein at least a portion of the first movable electrode is located between a portion of the first fixed electrode and the other portion of the first fixed electrode in the third direction.

[0115] (Technical proposal 8) The element portion further includes a first fixed structure fixed to the substrate, The first fixed structure is a sensor according to any one of Technical Proposals 1 to 7, facing the first movable structure.

[0116] (Technical proposal 9) The first movable electrode and the first fixed electrode constitute a first comb-tooth electrode pair. The sensor according to Technical Proposal 2, wherein the first movable electrode and the first opposing fixed electrode constitute a first opposing comb-tooth electrode pair.

[0117] (Technical proposal 10) The sensor according to any one of Technical Proposals 1 to 9, wherein the first movable structure is symmetrical with respect to a first straight line passing through the first intermediate beam and along the third direction.

[0118] (Technical proposal 11) The aforementioned element section is A second fixed electrode fixed to the substrate, A second fixed electrode fixed to the substrate, Includes, The above first movable member is, The second beam and The second movable structure, It further includes, The first beam is located between the second movable structure and the first movable structure in the third direction. The second beam is located between the second movable structure and the first beam in the third direction. The aforementioned second beam includes a second beam section, a second other beam section, and a second intermediate beam section. The second beam section is connected to the first fixing section, The second beam section is connected to the first movable base section. The direction from the second beam section to the second other beam section is along the second direction, The second intermediate beam section is located between the second beam section and the second other beam section. The second movable structure is The second movable electrode, The second other movable electrode, The second movable connection part, Includes, The direction from the second movable electrode to the second movable electrode is along the third direction, The second movable electrode and the second other movable electrode extend along the second direction, The second movable connection is connected to the second intermediate beam, The second movable connection extends along the third direction, The second movable connector is connected to the second movable electrode and the second other movable electrode, The control unit is configured to control the second potential between the second fixed electrode and the second movable electrode in the first operation. The sensor according to Technical Proposal 3, wherein the control unit is configured to apply a second AC voltage between the second fixed electrode and the second movable electrode in the second operation.

[0119] (Technical proposal 12) The element portion further comprises a second opposing fixed electrode fixed to the substrate, The second opposing fixed electrode faces the second movable electrode, The control unit is configured to detect a second signal between the second opposing fixed electrode and the second movable electrode during the second operation. The sensor according to technical proposal 11, wherein the second signal is configured to change in accordance with the change in acceleration.

[0120] (Technical proposal 13) The second signal corresponds to the change in the second resonant frequency of the second beam, which changes in accordance with the change in acceleration. The sensor according to technical proposal 12, wherein the control unit is configured to output a first value based on the first signal and the second signal in the second operation.

[0121] (Technical proposal 14) The sensor according to technical proposal 13, wherein the control unit is configured to control the second potential in the first operation to correct the second resonance characteristic of the second beam.

[0122] (Technical proposal 15) The sensor according to technical proposal 13, wherein the control unit is configured to make the first absolute value of the first potential greater than the second absolute value of the second potential when the first resonant frequency is higher than the second resonant frequency in the first operation.

[0123] (Technical proposal 16) The aforementioned element section is A second fixing part fixed to the base, A third fixed electrode fixed to the substrate, A third fixed electrode fixed to the substrate, A fourth fixed electrode fixed to the substrate, A fourth fixed electrode fixed to the substrate, Includes, At least a portion of the first other fixing part is located between at least a portion of the first fixing part and at least a portion of the second fixing part in the second direction. The above first movable member is, The third beam and The third movable structure, The fourth beam and, The fourth movable structure, Includes, The third beam is located between the fourth movable structure and the third movable structure in the third direction. The fourth beam is located between the fourth movable structure and the third beam in the third direction. The aforementioned third beam includes a third beam section, a third other beam section, and a third intermediate beam section. The third beam section is connected to the second fixing section, The third beam section is connected to the first movable base section. The direction from the third beam section to the third beam section is along the second direction, The third intermediate beam section is located between the third other beam section and the third beam section. The third movable structure is, The third movable electrode, The third other movable electrode, The third movable connection part, Includes, The direction from the third movable electrode to the third other movable electrode is along the third direction, The third movable electrode and the third other movable electrode extend along the second direction, The third movable connection is connected to the third intermediate beam, The third movable connection extends along the third direction, The third movable connection is connected to the third movable electrode and the third other movable electrode, The fourth beam includes a fourth beam section, a fourth other beam section, and a fourth intermediate beam section. The fourth beam section is connected to the second fixing section, The fourth beam section is connected to the first movable base section. The direction from the fourth beam section to the fourth beam section is along the second direction, The fourth intermediate beam section is located between the fourth other beam section and the fourth beam section. The fourth movable structure is, The fourth movable electrode, The fourth other movable electrode, The fourth movable connection part, Includes, The direction from the fourth movable electrode to the fourth movable electrode is along the third direction, The fourth movable electrode and the fourth other movable electrode extend along the second direction, The fourth movable connection is connected to the fourth intermediate beam, The fourth movable connection extends along the third direction, The fourth movable connector is connected to the fourth movable electrode and the fourth other movable electrode, The control unit is configured to control the third potential between the third fixed electrode and the third movable electrode in the first operation. The control unit is configured to control the fourth potential between the fourth fixed electrode and the fourth movable electrode in the first operation. The control unit is configured to apply a first AC voltage between the third fixed electrode and the third movable electrode in the second operation. The sensor according to technical proposal 13, wherein the control unit is configured to apply the first AC voltage between the fourth fixed electrode and the fourth movable electrode in the second operation.

[0124] (Technical proposal 17) The first movable member further includes a second movable base, a third movable base, and a fourth movable base, The second movable base is supported by the first fixed part, The first movable base is located between the second movable base and the fourth movable base in the third direction. The third movable base is located between the second movable base and the first movable base in the third direction. The third length of the third movable base along the second direction is shorter than the second length of the second movable base along the second direction, and shorter than the first length of the first movable base along the second direction. The fourth length of the fourth movable base along the second direction is longer than the second length and longer than the first length. The third movable connection portion is symmetrical to the first movable connection portion with respect to a fourth straight line passing through the third movable base portion and along the third direction, The fourth movable connection is symmetrical with respect to the second movable connection with respect to the fourth straight line. The first movable electrode and the third movable electrode satisfy at least one of the first, second, third, fourth, fifth, sixth, seventh, eighth, and ninth conditions, In the first condition described above, the third mass of the third movable electrode is different from the first mass of the first movable electrode, In the second condition described above, the third thickness of the third movable electrode along the first direction is different from the first thickness of the first movable electrode along the first direction. In the third condition described above, at least a portion of the third material included in the third movable electrode differs from at least a portion of the first material included in the first movable electrode, In the fourth condition described above, the third movable electrode includes a third hole, and the first movable electrode does not include a first hole. In the fifth condition described above, the third size of the third hole included in the third movable electrode is different from the first size of the first hole included in the first movable electrode. In the sixth condition described above, the third density of the third pore is different from the first density of the first pore. In the seventh condition above, the third number of the third holes is different from the first number of the first holes, In the eighth condition, the third shape of the third hole is different from the first shape of the first hole. The sensor according to technical proposal 16, wherein, in the ninth condition described above, the third layer structure of the third movable electrode is different from the first layer structure of the first movable electrode.

[0125] (Technical proposal 18) The aforementioned element section is A third opposing fixed electrode fixed to the substrate, A fourth opposing fixed electrode fixed to the substrate, Furthermore, The third opposing fixed electrode faces the third movable electrode, The above fourth opposing fixed electrode faces the above fourth movable electrode, The control unit is configured to detect a third signal between the third opposing fixed electrode and the third movable electrode in the second operation. The third signal is configured to change in accordance with the change in acceleration, The control unit is configured to detect a fourth signal between the fourth opposing fixed electrode and the fourth movable electrode in the second operation. The fourth signal is configured to change in accordance with the change in acceleration, The third signal corresponds to the change in the third resonant frequency of the third beam, which changes in accordance with the change in acceleration. The fourth signal corresponds to the change in the fourth resonant frequency of the fourth beam, which changes in accordance with the change in acceleration. The sensor according to proposal 16 or 17, wherein the control unit is configured to output a third value based on a second value corresponding to the difference between the third resonant frequency and the third resonant frequency, and the first value, in the second operation.

[0126] (Technical proposal 19) The control unit is configured to control the third potential in the first operation to correct the third resonance characteristic of the third beam. The control unit is configured to control the fourth potential in the first operation to correct the fourth resonance characteristic of the fourth beam. The sensor according to technical proposal 18, wherein the control unit is configured to make the third absolute value of the third potential greater than the fourth absolute value of the fourth potential when the third resonant frequency is higher than the fourth resonant frequency in the first operation.

[0127] (Technical proposal 20) A sensor described in any one of Technical Proposals 1 to 19, A circuit control unit capable of controlling the circuit based on the signal obtained from the sensor, An electronic device equipped with [a specific feature / feature].

[0128] According to the embodiment, sensors and electronic devices capable of improving characteristics are provided.

[0129] The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, the specific configuration of each element included in the sensor, such as the substrate, element part, fixing part, and control part, is included within the scope of the present invention as long as it can be implemented in the same way and similar effects can be obtained by appropriately selecting from the range known to those skilled in the art.

[0130] Furthermore, combinations of two or more elements from any of the specific examples, to the extent technically feasible, are also included within the scope of the present invention, insofar as they encompass the gist of the invention.

[0131] Furthermore, all sensors and electronic devices that a person skilled in the art can implement by appropriately modifying the design based on the sensors and electronic devices described above as embodiments of the present invention also fall within the scope of the present invention, insofar as they encompass the gist of the present invention.

[0132] Furthermore, within the scope of the concept of the present invention, a person skilled in the art could conceive of various modifications and alterations, and it is understood that such modifications and alterations also fall within the scope of the present invention.

[0133] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of Symbols]

[0134] 10A, 10C, 10D: 1st, 3rd, 4th movable base, 10B: Extended fixed part, 10E: Element part, 10M: 1st movable member, 10Z: 1st gap, 11~14: 1st~4th beam, 11A~14A: 1st~4th movable structure, 11a~14a: 1st~4th beam part, 11b to 14b: first to fourth other beam parts, 11c to 14c: first to fourth intermediate beam parts, 15a to 15d: first to fourth fixed structures, 21 to 24: first to fourth fixed electrodes, 21A to 24A: first to fourth other fixed electrodes, 21C to 24C: first to fourth opposing fixed electrodes, 31~34: 1st~4th movable electrode, 31A~34A: 1st~4th movable electrodes, 31C~34C: 1st~4th movable connection parts, 31h, 33h: 1st and 3rd holes, 50F: 1st fixed part, 50S: base body, 51F, 52F: 1st and 2nd fixed parts, 70: control unit, 110~114: sensors, 170: circuit control unit, 180: circuit, 185: drive unit, 310: electronic device, 400: road, 410: slope surface, 420: transmitting and receiving unit, 430: sensor, 440: bridge pier, 450: main girder, 460: bridge, 470: river, D1~D3: 1st~3rd directions, E1~E4: 1st~4th potentials, Ln1~Ln4: 1st~4th straight lines, S0: detection signal, S1-S4: 1st-4th signals, V1, V2: 1st and 2nd AC voltages

Claims

1. The element part, Control unit and Equipped with, The aforementioned element section is Substrate and, A first fixing part fixed to the base, A first other fixing part fixed to the base, A first fixed electrode fixed to the substrate, A first fixed electrode fixed to the substrate, First movable member and Includes, A first gap is provided between the base and the first movable member. The first movable member is, The first movable base supported by the first fixed part, The first beam and, First movable structure and Includes, The first beam includes a first beam section, a first other beam section, and a first intermediate beam section. The first beam section is connected to the first fixing section, The first other beam section is connected to the first movable base section. The second direction from the first beam to the first other beam intersects with the first direction from the base to the first other fixing part. The first intermediate beam section is located between the first beam section and the first other beam section. The first movable structure is First movable electrode and The first other movable electrode, First movable connection part and Includes, The direction from the first movable electrode to the first other movable electrode is along a third direction that intersects a plane including the first and second directions. The first movable electrode and the first other movable electrode extend along the second direction, The first movable connection is connected to the first intermediate beam, The first movable connection portion extends along the third direction, The first movable connection portion is connected to the first movable electrode and the first other movable electrode, The control unit is configured to perform the first and second operations. The control unit is configured to control the first potential between the first fixed electrode and the first movable electrode during the first operation. The control unit is configured to apply a first AC voltage between the first fixed electrode and the first movable electrode during the second operation.

2. The element portion further comprises a first opposing fixed electrode fixed to the substrate, The first opposing fixed electrode faces the first movable electrode, The control unit is configured to detect a first signal between the first opposing fixed electrode and the first movable electrode in the second operation. The sensor according to claim 1, wherein the first signal is configured to change in accordance with the change in acceleration applied to the element.

3. The sensor according to claim 2, wherein the first signal corresponds to a change in the first resonant frequency of the first beam, which changes in accordance with the change in acceleration.

4. The aforementioned element section is A second fixed electrode fixed to the substrate, A second fixed electrode fixed to the substrate, Includes, The first movable member is, The second beam and The second movable structure, It further includes, The first beam is located between the second movable structure and the first movable structure in the third direction. The second beam is located between the second movable structure and the first beam in the third direction. The aforementioned second beam includes a second beam section, a second other beam section, and a second intermediate beam section. The second beam section is connected to the first fixing section, The second beam section is connected to the first movable base section. The direction from the second beam section to the second other beam section is along the second direction, The second intermediate beam section is located between the second beam section and the second other beam section. The second movable structure described above is The second movable electrode, The second other movable electrode, The second movable connection part, Includes, The direction from the second movable electrode to the second movable electrode is along the third direction, The second movable electrode and the second other movable electrode extend along the second direction, The second movable connection is connected to the second intermediate beam, The second movable connection extends along the third direction, The second movable connection is connected to the second movable electrode and the second other movable electrode, The control unit is configured to control the second potential between the second fixed electrode and the second movable electrode in the first operation. The sensor according to claim 3, wherein the control unit is configured to apply a second AC voltage between the second fixed electrode and the second movable electrode in the second operation.

5. The element portion further comprises a second opposing fixed electrode fixed to the substrate, The second opposing fixed electrode faces the second movable electrode, The control unit is configured to detect a second signal between the second opposing fixed electrode and the second movable electrode during the second operation. The sensor according to claim 4, wherein the second signal is configured to change in accordance with the change in acceleration.

6. The second signal corresponds to the change in the second resonant frequency of the second beam, which changes in accordance with the change in acceleration. The sensor according to claim 5, wherein the control unit is configured to output a first value based on the first signal and the second signal in the second operation.

7. The sensor according to claim 6, wherein the control unit is configured to control the second potential in the first operation to correct the second resonance characteristic of the second beam.

8. The sensor according to claim 6, wherein the control unit is configured to make the first absolute value of the first potential greater than the second absolute value of the second potential when the first resonant frequency is higher than the second resonant frequency in the first operation.

9. The aforementioned element section is A second fixing part fixed to the base, A third fixed electrode fixed to the substrate, A third fixed electrode fixed to the substrate, A fourth fixed electrode fixed to the substrate, A fourth other fixed electrode fixed to the substrate, Includes, At least a portion of the first other fixing portion is located between at least a portion of the first fixing portion and at least a portion of the second fixing portion in the second direction. The first movable member is, The third beam and The third movable structure, The fourth beam and The fourth movable structure, Includes, The third beam is located between the fourth movable structure and the third movable structure in the third direction. The fourth beam is located between the fourth movable structure and the third beam in the third direction. The aforementioned third beam includes a third beam section, a third other beam section, and a third intermediate beam section. The third beam section is connected to the second fixing section, The third beam section is connected to the first movable base section. The direction from the third beam section to the third beam section is along the second direction, The third intermediate beam section is located between the third other beam section and the third beam section. The third movable structure is, The third movable electrode, The third other movable electrode, The third movable connection part, Includes, The direction from the third movable electrode to the third other movable electrode is along the third direction, The third movable electrode and the third other movable electrode extend along the second direction, The third movable connection is connected to the third intermediate beam, The third movable connection extends along the third direction, The third movable connection portion is connected to the third movable electrode and the third other movable electrode, The fourth beam includes a fourth beam section, a fourth other beam section, and a fourth intermediate beam section. The fourth beam section is connected to the second fixing section, The fourth other beam section is connected to the first movable base section. The direction from the fourth beam section to the fourth beam section is along the second direction, The fourth intermediate beam section is located between the fourth other beam section and the fourth beam section. The fourth movable structure is, The fourth movable electrode, The fourth other movable electrode, The fourth movable connection part, Includes, The direction from the fourth movable electrode to the fourth movable electrode is along the third direction, The fourth movable electrode and the fourth other movable electrode extend along the second direction, The fourth movable connection is connected to the fourth intermediate beam, The fourth movable connection extends along the third direction, The fourth movable connector is connected to the fourth movable electrode and the fourth other movable electrode, The control unit is configured to control the third potential between the third fixed electrode and the third movable electrode in the first operation. The control unit is configured to control the fourth potential between the fourth fixed electrode and the fourth movable electrode in the first operation. The control unit is configured to apply the first AC voltage between the third fixed electrode and the third movable electrode during the second operation. The sensor according to claim 6, wherein the control unit is configured to apply the first AC voltage between the fourth fixed electrode and the fourth movable electrode in the second operation.

10. The first movable member further includes a second movable base, a third movable base, and a fourth movable base, The second movable base is supported by the first fixed part, The first movable base is located between the second movable base and the fourth movable base in the third direction. The third movable base is located between the second movable base and the first movable base in the third direction. The third length of the third movable base along the second direction is shorter than the second length of the second movable base along the second direction, and shorter than the first length of the first movable base along the second direction. The fourth length of the fourth movable base along the second direction is longer than the second length and longer than the first length. The third movable connection portion is symmetrical to the first movable connection portion with respect to a fourth straight line passing through the third movable base portion and along the third direction, The fourth movable connection is symmetrical with respect to the second movable connection with respect to the fourth straight line. The first movable electrode and the third movable electrode satisfy at least one of the first, second, third, fourth, fifth, sixth, seventh, eighth, and ninth conditions, In the first condition described above, the third mass of the third movable electrode is different from the first mass of the first movable electrode, In the second condition described above, the third thickness of the third movable electrode along the first direction is different from the first thickness of the first movable electrode along the first direction. In the third condition described above, at least a portion of the third material included in the third movable electrode is different from at least a portion of the first material included in the first movable electrode, In the fourth condition described above, the third movable electrode includes a third hole, and the first movable electrode does not include a first hole. In the fifth condition, the third size of the third hole included in the third movable electrode is different from the first size of the first hole included in the first movable electrode. In the sixth condition, the third density of the third pore is different from the first density of the first pore. In the seventh condition above, the third number of the third holes is different from the first number of the first holes, In the eighth condition, the third shape of the third hole is different from the first shape of the first hole. The sensor according to claim 9, wherein, in the ninth condition, the third layer structure of the third movable electrode is different from the first layer structure of the first movable electrode.

11. A sensor according to any one of claims 1 to 10, A circuit control unit capable of controlling the circuit based on the signal obtained from the sensor, An electronic device equipped with [a specific feature / feature].

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