Adaptive pulse shaping using matched sensors

Abstract

This disclosure relates to an RF generator system and the control of an RF generator. [Solution] The RF generator includes an RF power source and an RF control module coupled to the RF power source. The RF control module is configured to generate at least one control signal to change at least one of the RF output signal from the RF power source or the impedance between the RF power source and the load. The RF output signal includes an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust at least one control signal to change at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. At least one of the amplitude, frequency, or impedance is adjusted according to a respective feedforward adjustment that changes according to the respective detected pulse parameter detected between the matching network and the load.

Description

[Technical Field]

[0001] Cross-reference of related applications This application claims priority to U.S. Utility Patent Application No. 17 / 396,901, filed on 9 August 2021. The entire disclosure of the above application is incorporated herein by reference.

[0002] This disclosure relates to an RF generator system and control of an RF generator. [Background technology]

[0003] The background art provided herein is intended to provide an overall context for this disclosure. The work of the inventors named herein, as described herein, and any other description that may otherwise not qualify as prior art at the time of filing, are not considered prior art to this disclosure, either explicitly or implicitly.

[0004] Plasma manufacturing is frequently used in semiconductor manufacturing. In plasma manufacturing, ions are accelerated by an electric field to etch material from the surface of a substrate or to deposit material onto the substrate surface. In a basic implementation, the electric field is generated based on an RF or DC power signal produced by a respective RF or DC generator in the power transfer system. For plasma etching to be performed effectively, the power signal generated by the generator must be precisely controlled.

[0005] The background art provided herein is intended to provide an overall context for this disclosure. The work of the inventors named herein, as described herein, and any other description that may otherwise not qualify as prior art at the time of filing, are not considered prior art to this disclosure, either explicitly or implicitly. [Prior art documents] [Patent Documents]

[0006] [Patent Document 1] U.S. Patent No. 7,602,127 [Patent Document 2] U.S. Patent No. 8,110,991 [Patent Document 3] U.S. No. 8,395,322 [Patent Document 4] U.S. Patent No. 10,821,542 [Patent Document 5] U.S. Patent No. 10,546,724 [Patent Document 6] U.S. Patent No. 10,49,857 [Patent Document 7] U.S. Patent No. 9,41,480 [Patent Document 8] U.S. Patent Application No. 17 / 102,598 [Overview of the project] [Means for solving the problem]

[0007] One or more computer systems may be configured to perform a specific operation or action by having software, firmware, hardware, or a combination thereof installed on the system that triggers an action during operation or causes the system to perform an action. One or more computer programs may be configured to perform a specific operation or action by including instructions that cause the device to perform an action when executed by a data processing device. One common embodiment includes an RF generator having an RF power source. The generator also includes an RF control module, which is coupled to the RF power source and configured to generate at least one control signal for changing at least one of the RF output signal from the RF power source or the impedance between the RF power source and the load, the RF output signal including an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust at least one control signal for changing at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. The generator also includes that at least one of the amplitude, frequency, or impedance is adjusted according to a respective feedforward adjustment that changes according to a respective detected pulse parameter detected between a matching network and the load. Other embodiments of this model include a corresponding computer system, apparatus, and a computer program recorded in one or more computer storage devices, each configured to perform the actions of the Method.

[0008] The implementation may include one or more of the following features: An RF generator in which each feedforward adjustment changes at least one of amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment adjusts at least one of a setpoint or actuator. The RF control module is further configured to further adjust at least one of amplitude, frequency, or impedance according to RF parameters sensed between the RF power source and the matching network, and at least one of amplitude, frequency, or impedance is further adjusted according to the respective feedback signals that change according to the RF parameters. The RF control module may further include a setpoint modifier, which receives a requested pulse shape including pulse setpoint parameters, receives each sensed pulse parameter and adjusts the pulse setpoint parameter according to each sensed pulse parameter to output the adjusted pulse shape. The RF control module may further include a pulse combiner configured to receive a tuned pulse shape and output a pulse setpoint profile according to the tuned pulse shape, the pulse setpoint profile including RF parameter setpoints for controlling an RF power source. At least one control signal changes according to the RF parameter setpoints for controlling the RF power source. The amplitude of the RF signal changes according to at least one of the amplitudes of the at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitudes of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.The RF control module is further configured to adjust at least one of the amplitude, frequency, or impedance according to RF parameters sensed between the RF power source and the matched network, with the amplitude, frequency, or impedance being adjusted according to the respective feedback signals that vary according to the RF parameters. Each sensed pulse parameter is communicated between the post-matched sensor and the RF control module using either an analog or digital communication link. The digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), a fiber optic link, or a Gigabit transceiver data link. Each feedforward adjustment is determined according to parameters generated by one of the plant model or inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load. Each feedforward adjustment adjusts at least one of the setpoints or actuators. Implementations of the techniques described may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0009] One general embodiment includes a non-temporary computer-readable medium for storing instructions. The non-temporary computer-readable medium for storing instructions also includes generating an RF output signal to a load. The instructions also include generating an RF output signal or at least one control signal for changing the impedance between an RF power source and a load, the RF output signal including an RF signal modulated by a pulse signal. The instructions also include adjusting at least one control signal to change the amplitude or frequency of the RF output signal or at least one of the impedance between the RF power source and the load in order to control the shape of the pulse signal. The instructions also include adjusting at least one of the amplitude, frequency, or impedance in accordance with each feedforward adjustment which changes according to each pulse parameter sensed between the matched network and the load. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0010] The implementation may include one or more of the following features: A non-temporary computer-readable medium in which each feedforward adjustment changes at least one of amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, reflected power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of at least one control signal or the amplitude of rail voltage applied to an RF power source. Each feedforward adjustment changes at least one of the amplitude of at least one control signal or the amplitude of rail voltage applied to an RF power source. At least one of the amplitude, frequency, or impedance of the RF signal is further adjusted according to each feedback signal which changes according to RF parameters sensed between the matching network and the load. A non-temporary computer-readable medium in which instructions may include receiving a requested pulse shape including at least one pulse setpoint parameter, receiving each pulse parameter, and adjusting at least one pulse setpoint parameter according to each pulse parameter to output the adjusted pulse shape. A non-temporary computer-readable medium in which a command may include receiving a tuned pulse shape and outputting a pulse setpoint profile according to the tuned pulse shape, the pulse setpoint profile including RF parameter setpoints for controlling an RF power source. At least one control signal changes according to RF parameter setpoints for controlling an RF power source. The amplitude of an RF signal changes according to at least one of the amplitudes of at least one control signal or the amplitude of a rail voltage applied to the RF power source, and each feedforward adjustment changes at least one of the amplitudes of at least one control signal or the amplitude of a rail voltage applied to the RF power source. The amplitude, frequency, or impedance is tuned according to a feedback signal that changes according to RF parameters sensed between the matched network and the load. A non-temporary computer-readable medium in which a command may include communicating each pulse parameter sensed between the matched network and the load between a post-matched sensor and an RF control module using one of analog or digital communication links.The digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmission Control Protocol (TCP), a User Datagram Protocol (UDP), an optical fiber link, or a gigabit transceiver data link. The instructions may include determining respective feedforward adjustments according to parameters generated by one of a plant model or an inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load. Implementations of the techniques described may include hardware, a method or process, or computer software on a computer-accessible medium.

[0011] One general aspect includes a method for controlling an RF signal. The method also includes generating an RF output signal to the load. The method also includes generating a control signal for varying the RF output signal, the RF output signal including an RF signal modulated by a pulse signal. The method also includes adjusting the control signal to vary at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load to control the shape of the pulse signal. The method also includes adjusting at least one of the amplitude, frequency, or impedance according to respective feedforward adjustments that vary according to respective pulse parameters detected between the matching network and the load. Other embodiments of this aspect include corresponding computer systems, devices, and computer programs recorded on one or more computer storage devices, each configured to perform the actions of the method.

[0012] The implementation may include one or more of the following features: The method may include a step of changing at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transfer power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source. At least one of the amplitude, frequency, or impedance is further adjusted according to a feedback signal that changes according to the respective RF parameters sensed between the matching network and the load. The method may include a step of receiving a requested pulse shape including at least one pulse setpoint parameter, a step of receiving each pulse parameter, and a step of adjusting at least one pulse setpoint parameter according to each pulse parameter to output an adjusted pulse shape. The method may include a step of receiving an adjusted pulse shape and a step of outputting a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile including at least one RF parameter setpoint for controlling the RF power source. The method may include the step of communicating between post-matching sensors the respective pulse parameters detected between the matched network and the load using either an analog or digital communication link. The method may also include the step of determining each feedforward adjustment according to parameters generated by either a plant model or an inverse plant model that describes the variation of the pulse signal as it propagates to the load. Implementations of the described technique may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0013] One general embodiment includes an RF generator having an RF power source. The generator also includes an RF control module, which is coupled to the RF power source and configured to generate at least one control signal to change at least one of the RF output signal output by the RF power source or the impedance between the RF power source and the load, the RF output signal including an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust at least one control signal to change at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. The generator also includes a digital communication link between the RF control module and a sensor disposed between a matched network and the load, the respective sensed pulse parameter detected by the sensor being communicated from the sensor to the RF power source via the digital communication link. The generator also includes that at least one of the amplitude, frequency, or impedance is adjusted according to a respective feedforward adjustment which changes according to the respective sensed pulse parameter. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0014] The implementation may include one or more of the following features: An RF generator in which each feedforward adjustment changes at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transfer power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. The RF control module is further configured to adjust at least one of the amplitude, frequency, or impedance according to an RF signal parameter sensed between the RF power source and the matching network, and at least one of the amplitude, frequency, or impedance is adjusted according to at least one respective feedback signal which changes according to an RF parameter sensed between the matching network and the load. Each feedforward adjustment adjusts at least one of the setpoints or actuators. The RF control module may further include a setpoint modifier, which is configured to receive a requested pulse shape including at least one pulse setpoint parameter, receive each detected pulse parameter, and adjust at least one pulse setpoint parameter according to each detected pulse parameter to output an adjusted pulse shape. The RF control module may further include a pulse combiner, which is configured to receive the adjusted pulse shape and output a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile including RF parameter setpoints for controlling the RF power source. At least one control signal changes according to the RF parameter setpoints for controlling the RF power source. The amplitude of the RF signal changes according to at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source.The RF control module is further configured to further adjust at least one of amplitude, frequency, or impedance according to RF signal parameters detected between the RF power source and the matching network, and the amplitude, frequency, or impedance of the RF signal is adjusted according to respective feedback signals that vary according to RF parameters detected between the matching network and the load. The digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmission Control Protocol (TCP), a User Datagram Protocol (UDP), an optical fiber link, or a gigabit transceiver data link. Each feedforward adjustment is determined according to parameters generated by one of a plant model or an inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load. Implementations of the techniques described may include hardware, a method or process, or computer software on a computer-accessible medium.

[0015] One general embodiment includes a non-temporary computer-readable medium for storing instructions. The non-temporary computer-readable medium for storing instructions also includes generating an RF output signal to a load. The instructions also include generating at least one control signal for changing the RF output signal or the impedance between an RF power source and a load, the RF output signal including an RF signal modulated by a pulse signal. The instructions also include digitally communicating pulse parameters detected by sensors disposed between a matched network and a load, the pulse parameters being communicated from the sensors to the RF power source via a digital communication link. The instructions also include adjusting at least one control signal to change the amplitude or frequency of the RF output signal or the impedance between the RF power source and a load in order to control the shape of the pulse signal. The instructions also include adjusting at least one of the amplitude, frequency, or impedance according to each feedforward adjustment that changes according to the pulse parameter. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0016] The implementation may include one or more of the following features: A non-temporary computer-readable medium in which each feedforward adjustment changes at least one of amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, reflected power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment changes at least one of the amplitude of at least one control signal or the amplitude of the rail voltage applied to the RF power source. At least one of the amplitude, frequency, or impedance of the RF signal is further adjusted according to each feedback signal which changes according to RF parameters sensed between the matching network and the load. Each feedforward adjustment adjusts at least one of the setpoint or actuator. A non-temporary computer-readable medium in which instructions may include receiving a requested pulse shape including at least one pulse setpoint parameter, receiving a pulse parameter, and adjusting at least one pulse setpoint parameter according to the pulse parameter to output an adjusted pulse shape. The instruction may include receiving a tuned pulse shape and outputting a pulse setpoint profile according to the tuned pulse shape, wherein the pulse setpoint profile includes at least one RF parameter setpoint for controlling an RF power source, in a non-temporary computer-readable medium. At least one control signal changes according to at least one RF parameter setpoint for controlling an RF power source. The amplitude of the RF signal changes according to at least one of the amplitudes of the at least one control signal or the amplitude of the rail voltage applied to the RF power source, and each feedforward adjustment changes at least one of the amplitudes of the at least one control signal or the amplitude of the rail voltage applied to the RF power source. The amplitude, frequency, or impedance is adjusted according to a feedback signal that changes according to RF parameters sensed between the matching network and the load.A non-transient, computer-readable medium in which instructions may include communicating pulse parameters sensed between a matched network and a load, using a digital communication link, between a post-matched sensor and an RF control module. The digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), a fiber optic link, or a Gigabit transceiver data link. A non-transient, computer-readable medium in which instructions may include determining respective feedforward adjustments according to parameters generated by one of a plant model or inverse plant model describing variations in the pulse signal as the pulse signal propagates to the load. Implementations of the described technique may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0017] One general embodiment includes a method for controlling an RF signal. The method also includes the step of generating an RF output signal to a load. The method also includes the step of generating a control signal for changing the RF output signal, the RF output signal including an RF signal modulated by a pulse signal. The method also includes the step of digitally communicating each pulse parameter detected by a sensor disposed between a matched network and a load, the each pulse parameter being communicated from the sensor to an RF power source via a digital communication link. The method also includes the step of adjusting the control signal to change at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. The method also includes the step of adjusting at least one of the amplitude, frequency, or impedance of the pulse signal according to each feedforward adjustment which changes according to each pulse parameter. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0018] The implementation may include one or more of the following features: The method may include the step of changing at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transmitted power, reflected power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power supply. Each feedforward adjustment changes at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source. At least one of the amplitude, frequency, or impedance is adjusted according to a feedback signal that changes according to the respective RF parameters sensed between the matching network and the load. The method may include the steps of receiving a requested pulse shape including at least one pulse setpoint parameter, receiving each pulse parameter, and adjusting at least one pulse setpoint parameter according to each pulse parameter to output an adjusted pulse shape. The method may include the steps of receiving an adjusted pulse shape and outputting a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile including at least one RF parameter setpoint for controlling the RF power source. Each feedforward adjustment adjusts at least one setpoint or actuator. The method may include the step of communicating each pulse parameter sensed between the matched network and the load between the post-matched sensor and the RF control module using a digital communication link. The method may also include the step of determining each feedforward adjustment according to parameters generated by one of the plant models or inverse plant models that describe the variation of the pulse signal as the pulse signal propagates to the load. Implementations of the techniques described may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0019] One general embodiment includes an RF generator having an RF power source. The generator also includes an RF control module, which is coupled to the RF power source and configured to generate at least one control signal for changing at least one of the RF output signal output by the RF power source or the impedance between the RF power source and the load, the RF output signal including an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust at least one control signal for changing at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. The generator also includes one of a plant model or an inverse plant model. The generator also includes the fact that at least one of the amplitude, frequency or impedance of the pulse signal is adjusted according to each feedforward signal which changes according to each pulse parameter sensed between a matched network and the load. The generator also includes the fact that each feedforward signal is determined according to parameters generated by one of the plant model modules or inverse plant model modules. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0020] The implementation may include one or more of the following features: An RF generator in which a plant model module generates a plant model following the fluctuations of the pulse signal produced by the plant, and an inverse plant model module generates an inverse plant model following the inverse of the fluctuations of the pulse signal produced by the plant. The plant model module receives a pulse profile from an RF control module and the difference between the modeled pulse profile output by the plant model module and each pulse parameter. The RF generator may include a delay module positioned between the RF control module and the plant model module, which introduces a predetermined delay to the pulse signal in order to synchronize the pulse signal with the modeled pulse profile output by the plant model module. The inverse plant model module receives each pulse parameter and the difference between the pulse profile from the RF control module and the modeled adaptive inverse pulse profile output by the inverse plant model module. The RF control module includes a copy of the inverse plant model generated by the inverse plant model module, and each feedforward signal applies the inverse of the plant model to the pulse signal. Each feedforward signal varies at least one of its amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, reflected power, or reflection coefficient. The amplitude of the RF signal varies according to at least one of the amplitudes of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward signal varies at least one of the amplitudes of at least one control signal or the amplitude of the rail voltage applied to the RF power source. The RF control module is further configured to adjust at least one of its amplitude, frequency, or impedance according to RF signal parameters sensed between the RF power source and the matching network, and at least one of the amplitude, frequency, or impedance of the RF signal is adjusted according to each feedback signal which varies according to RF parameters sensed between the matching network and the load.Each feedforward signal adjusts at least one setpoint or actuator. Each pulse parameter detected between the matching network and the load is communicated between the post-matched sensor and the RF control module using either an analog or digital communication link. Implementations of the described techniques may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0021] One general embodiment includes a non-temporary computer-readable medium for storing instructions. The non-temporary computer-readable medium for storing instructions also includes generating an RF output signal to a load. The instructions also include generating at least one control signal for changing the RF output signal or the impedance between an RF power source and a load, the RF output signal including an RF signal modulated by a pulse signal. The instructions also include sensing the respective pulse parameters between a matched network and a load. The instructions also include determining the respective feedforward adjustments to at least one control signal according to one of a plant model or an inverse plant model, the plant model or inverse plant model changing according to the respective pulse parameters. The instructions also include applying the respective feedforward adjustments to at least one control signal to change at least one of the amplitude, frequency, or impedance of the RF output signal in order to control the shape of the pulse signal. Other embodiments of this embodiment include a corresponding computer system, apparatus, and computer program recorded in one or more computer storage devices, each configured to perform the actions of the method.

[0022] The implementation may include one or more of the following features: A non-temporary computer-readable medium in which a plant model receives a pulse profile and the difference between the modeled pulse profile output by the plant model and each pulse parameter. A non-temporary computer-readable medium in which instructions further include delaying the pulse profile to synchronize it with the modeled pulse profile. An inverse plant model receives each pulse parameter and the difference between the pulse profile and a modeled adaptive inverse pulse profile output by the inverse plant model. A non-temporary computer-readable medium in which instructions may include copying the inverse plant model and changing each feedforward adjustment to apply the inverse of the plant model to the pulse signal. Each feedforward adjustment changes at least one of amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, reflected power, or reflection coefficient. The amplitude of the RF signal changes according to at least one of the amplitudes of at least one control signal or the amplitude of the rail voltage applied to the RF power source. Each feedforward adjustment modifies at least one of the amplitudes of at least one control signal or the amplitude of the rail voltage applied to the RF power source. The amplitude, frequency, or impedance is adjusted according to each feedback signal, which changes according to the RF parameters sensed between the matching network and the load. Each feedforward adjustment modifies at least one of the setpoints or actuators. Each pulse parameter sensed between the matching network and the load is communicated between the post-matched sensor and the RF control module using either an analog or digital communication link. Implementations of the techniques described may include hardware, methods or processes, or computer software on a computer-accessible medium.

[0023] Further applicable fields of this disclosure will become apparent from the modes for carrying out the invention, the claims, and the drawings. The detailed description and specific examples are intended for illustrative purposes only and are not intended to limit the scope of this disclosure.

[0024] This disclosure will be better understood from the detailed description and accompanying drawings. [Brief explanation of the drawing]

[0025] [Figure 1] This is a schematic diagram of a power transmission system having multiple power sources configured according to various embodiments of the present disclosure. [Figure 2] This figure shows the waveforms of the RF signal and the pulses that modulate the RF signal. [Figure 3] This figure shows the pulse shape of an RF generator that uses a conventional method for generating pulse shapes. [Figure 4] This figure shows the waveform of an RF generator with an ideal pulse shape. [Figure 5] This is a block diagram of an RF generation system that uses amplitude control configured in accordance with this disclosure. [Figure 6] This is a block diagram of an RF generation system using one or more amplitude control, frequency control, and matching networks, configured in accordance with this disclosure. [Figure 7] This is a block diagram of an RF generation system using one or more of amplitude control, frequency control, matched network control, and rail voltage control, as configured in accordance with this disclosure. [Figure 8] This is a block diagram of an RF generation system using one or more of amplitude control, frequency control, matched network control, and feedforward rail voltage control, as configured in accordance with this disclosure. [Figure 9A] This is a block diagram of an RF power generation system including one or more feedforward adjustments for amplitude, frequency, matching network components, and rail voltage setpoint control. [Figure 9B]This is a block diagram of an RF power generation system including one or more feedforward adjustments for amplitude, frequency, matching network components, and rail voltage setpoint control. [Figure 10] This figure shows a first method for feedforward control using the setpoint adjustments described herein. [Figure 11] This figure shows a second method for feedforward control using actuator adjustment according to the present disclosure. [Figure 12] This figure shows the RF generation system used by the adaptive plant model to generate feedforward parameters. [Figure 13] This figure shows an RF generation system where an adaptive plant model is used to adjust feedforward parameters, illustrating the interaction of the adaptive plant model with a feedforward setpoint adjustment module. [Figure 14] This figure shows an RF generation system in which an adaptive inverse model is used to generate feedforward tuning parameters. [Figure 15] This is a block diagram of an RF generation system showing the interaction between the adaptive inverse plant model and feedforward setpoint tuning, where the adaptive inverse plant model is used to tune the feedforward parameters. [Figure 16] This is a functional block diagram of an exemplary control module configured according to various embodiments. [Figure 17] This is a flowchart illustrating the operation of a control system configured according to the principles of this disclosure. [Modes for carrying out the invention]

[0026] In drawings, reference numbers may be reused to identify similar and / or identical elements.

[0027] A power system may include a DC or RF power generator, or a DC or RF generator, a matching network, and a load (a process chamber, plasma chamber, or a reactor with fixed or variable impedance). The power generator produces a DC or RF power signal, which is received by the matching network or an impedance-optimizing controller or circuit. The matching network or impedance-optimizing controller or circuit matches the input impedance of the matching network to the characteristic impedance of the transmission line between the power generator and the matching network. Impedance matching helps to maximize the amount of power sent to the matching network ("forward power") and minimize the amount of power reflected from the matching network to the power generator ("reverse power" or "reflected power"). When the input impedance of the matching network matches the characteristic impedance of the transmission line and the generator, forward power may be maximized and reverse power may be minimized.

[0028] In the field of power sources and power supplies, there are generally two methods for applying a power signal to a load. The first, more traditional method is to apply a continuous power signal to the load. In continuous mode or continuous wave mode, the continuous power signal is typically a constant DC power signal or sinusoidal RF power signal continuously output from the power source to the load. In the continuous mode method, the power signal is assumed to be a constant DC output or sinusoidal output, and the amplitude of the power signal and / or the frequency of the RF power signal can be varied to change the output power applied to the load.

[0029] A second approach to applying a power signal to a load involves pulsing the RF signal rather than applying a continuous RF signal to the load. In pulsed operation mode, the RF signal is modulated by a modulating or pulsed signal to define the envelope of the modulated power signal. The RF signal can be, for example, a sinusoidal RF signal or another time-varying signal. The power delivered to the load is typically changed by changing the modulating or pulsed signal.

[0030] In a typical power supply configuration, the output power applied to the load is determined by using sensors that measure the voltage and current of the forward power and reflected power or the RF signal applied to the load. One of these sets of signals is analyzed in the control loop. This analysis typically determines the power values ​​used to adjust the power supply output to vary the power applied to the load. In power transfer systems where the load is a process chamber or other nonlinear or time-varying load, the applied power depends in part on the load's impedance, so the changing impedance of the load causes a corresponding change in the power applied to the load.

[0031] In systems where the manufacturing of various devices relies on the introduction of power to a load to control the manufacturing process, power is typically transmitted in one of two configurations. In the first configuration, power is capacitively coupled to the load. Such systems are called capacitively coupled plasma (CCP) systems. In the second configuration, power is inductively coupled to the load. Such systems are typically called inductively coupled plasma (ICP) systems. Power coupling to a plasma can also be achieved via wave coupling at microwave frequencies. Such techniques typically use electron cyclotron resonance (ECR) or microwave sources. Helicon sources are another form of wave-coupled source, typically operating at RF frequencies similar to those of conventional ICP and CCP systems. The power transmission system may include at least one bias power and / or source power applied to one or more electrodes of the load. The source power typically generates a plasma to control the plasma density, and the bias power modulates ions in sheath formation. Depending on various design considerations, the bias and source may share the same electrode or use separate electrodes.

[0032] When a power transfer system drives a time-varying or nonlinear load, such as a process chamber or plasma chamber, the power absorbed by the bulk plasma and plasma sheath results in an ion density with a range of ion energies. One characterization of ion energy is the ion energy distribution function (IEDF). The IEDF can be controlled using bias power. One way to control the IEDF for a system in which multiple RF power signals are applied to the load is by varying the multiple RF signals, which are related by amplitude, frequency, and phase. The relative amplitude, frequency, and phase of the multiple RF power signals can also be related by a Fourier series and associated coefficients. The frequencies between the multiple RF power signals may be fixed, and the relative phases between the multiple RF signals may also be fixed. Examples of such systems can be found by referring to U.S. Patents 7,602,127, 8,110,991, and 8,395,322, all of which are assigned to the assignee of this application and incorporated herein by reference.

[0033] Time-varying or nonlinear loads can exist in various applications. In some applications, a plasma processing system may also include components for plasma generation and control. One such component is a nonlinear load implemented as a process chamber, such as a plasma chamber or reactor. A typical plasma chamber or reactor used in a plasma processing system, for example, for thin-film fabrication, may utilize a dual power system. One power generator (source) controls plasma generation, and a power generator (bias) controls the ion energy. Examples of dual power systems include those described in U.S. Patents 7,602,127, 8,110,991, and 8,395,322, mentioned above. The dual power systems described in the patents mentioned above require a closed-loop control system to adapt the power supply operation for the purpose of controlling the ion density and its corresponding IEDF.

[0034] Several techniques exist for controlling process chambers, including those that can be used to generate plasma. For example, in RF power transfer systems, the phases and frequencies of multiple driving RF signals operating at the same or nearly the same frequencies can be used to control plasma generation. For RF-driven plasma sources, periodic waveforms that affect the dynamics of the plasma sheath and the corresponding ion energy are generally known and controlled by the interaction of the frequency and associated phase of the periodic waveform. Another technique in RF power transfer systems involves dual frequency control; that is, two RF frequency sources operating at different frequencies are used to power the plasma chamber to allow substantially independent control of ion and electron density.

[0035] Another approach utilizes a broadband RF power source to drive the plasma chamber. The broadband approach presents several challenges. One challenge is coupling the power to the electrodes. A second challenge is that the transfer function of the generated waveform to the actual sheath voltage for the desired IEDF must be formulated for a wide-process space to support material surface interactions. In one approach in an inductively coupled plasma system, controlling the power applied to the source electrode controls the plasma density, while controlling the power applied to the bias electrode modulates ions to control the IEDF and thus the etching rate. By using control of the source and bias electrodes, the etching rate is controlled via ion density and energy.

[0036] As integrated circuit and device manufacturing continues to evolve, so do the power requirements for controlling the manufacturing process. For example, in the manufacturing of memory devices, the requirements for bias power continue to increase. Increased power generates higher-energy ions for faster surface interactions, thereby increasing etching rate and ion directivity. In RF systems, increased bias power may be accompanied by requirements for lower bias frequencies and an increase in the number of bias power sources coupled to the plasma sheath created in the plasma chamber. Increased power at lower bias frequencies and an increase in the number of bias power sources result in intermodulation distortion (IMD) radiation from sheath modulation. IMD radiation can significantly reduce the power transmitted by the source from which plasma generation originates. U.S. Patent No. 10,821,542, issued 3 November 2020, titled Pulse Synchronization by Monitoring Power in Another Frequency Band, assigned to the assignee of this application and incorporated herein by reference, describes a method of pulse synchronization by monitoring power in another frequency band. In the referenced U.S. patent application, the pulsation of the second RF generator is controlled in accordance with the detection of the pulsation of the first RF generator in the second RF generator, thereby synchronizing the pulsation between the two RF generators.

[0037] Figure 1 shows an RF generator or power supply system 110. The power supply system 110 includes a pair of radio frequency (RF) generators 112a and 112b, also called power supplies, matching networks 118a and 118b, and a load 132, such as a nonlinear load, which may be a plasma chamber, a process chamber, etc. In various embodiments, the RF generator 112a is called the source RF generator or power supply, and the matching network 118a is called the source matching network. Also in various embodiments, the RF generator 112b is called the bias RF generator or power supply, and the matching network 118b is called the bias matching network. The components may be referred to individually or collectively using reference numbers without subscripts or prime symbols.

[0038] In various embodiments, the source RF generator 112a receives a control signal 130 from the matching network 118b, a control signal 130' from the generator 112b, or a control signal 130' from the bias RF generator 112b. As will be described in more detail, the control signals 130 or 130' represent input signals to the source RF generator 112a that indicate one or more operating characteristics or parameters of the bias RF generator 112b. In various embodiments, a synchronous bias detector 134 detects the RF signal output from the matching network 118b to the load 132 and outputs a synchronous or trigger signal 130 to the source RF generator 112a. In various embodiments, a synchronous or trigger signal 130', rather than a trigger signal 130, may be output from the bias RF generator 112b to the source RF generator 112a. The difference between the trigger or synchronous signal 130 and the trigger or synchronous signal 130' may be due to the influence of the matching network 118b, which can adjust the phase between the input signals to the matching network and the output signals from the matching network. Signals 130 and 130' contain information about the operation of the bias RF generator 112b, which in various embodiments allows for predictive responsiveness to address periodic fluctuations in the impedance of the load 132 caused by the bias RF generator 112b. When there is no control signal 130 or 130', the RF generators 112a and 112b operate autonomously.

[0039] The RF generators 112a and 112b include RF power sources 114a and 114b, also called power sources, power amplifiers, or RF power amplifiers, respectively, RF sensors 116a and 116b, and control modules 120a and 120b, also called controllers or processors. The RF power sources 114a and 114b generate their respective RF power signals 122a and 122b, which are output to their respective sensors 116a and 116b. The sensors 116a and 116b receive the outputs of the RF power sources 114a and 114b and generate their respective RF output signals or RF power signals f1 and f2. The sensors 116a and 116b output signals that vary according to various parameters detected from the load 132. Although sensors 116a and 116b are shown within their respective RF generators 112a and 112b, RF sensors 116a and 116b may be located outside the RF power generators 112a and 112b, such as post-matching sensors 166a and 166b positioned between their respective matching networks 118a and 118b and the load 132. Such external sensing may occur at the output of the RF generator, at the input of an impedance matching device located between the RF generator and the load, or between the output of an impedance matching device (including within the impedance matching device) and the load. In various configurations, the closer the sensors can be to the load, the more accurate and repeatable RF power transfer functions such as power transfer, pulse shaping, and impedance matching may become.

[0040] Sensors 116a, 116b, 166a, and 166b detect various operating parameters and output signals X and Y. Sensors 116a, 116b, 166a, and 166b may include voltage sensors, current sensors, and / or directional coupler sensors. Sensors 116a, 116b, 166a, and 166b (i) voltage V and current I, and / or (ii) forward power P output from their respective RF power sources 114a, 114b, and / or RF generators 112a, 112b. FWD, or the reverse power or reflected power P received from the respective matching networks 118a, 118b, or 132 connected to the respective sensors 116a, 116b, 166a, 166b REV The sensor can detect the phase angle between the current waveform and the voltage waveform, and / or the phase angle between the forward voltage signal and the reflected voltage signal. Either of these methods can be used to determine the complex impedance at the operating frequency and / or the harmonics at the operating frequency. Voltage V, current I, forward power P FWD , and reverse power P REV These may be scaled, filtered, or scaled and filtered versions of the actual voltage, current, forward power, and reverse power associated with each RF power source 114a, 114b. Sensors 116a, 116b, 166a, 166b may be analog sensors, digital sensors, or a combination thereof. In digital implementations, sensors 116a, 116b, 166a, 166b may include an analog-to-digital (A / D) converter and a signal sampling component with a corresponding sampling rate. Signals X and Y are voltage V and current I, and forward (or source) power P. FWD and the reverse (or reflected) power P REV, or it can represent any of the other parameters, such as the reflection coefficient gamma (Γ). In various configurations, the internal sensors 116a, 116b may have the same operation as the post-matched sensors 166a, 166b. The post-matched sensors 166a, 166b may require specific calibration due to the different impedances found at the post-matched position. In various configurations, for pulse shaping purposes, pulse samples are collected sequentially and packetized for digital transmission to the controller so that the controller obtains an accurate representation of all parts of the pulse. In various other configurations, each sample may be indexed from a common synchronization signal so that pulse feedback information can be reconstructed after digital data transmission. These techniques are not required for analog transmission. In various other configurations, some form of pre-matched sensor 116a, 116b may be required for generator protection. This pre-matched sensor may also assist in impedance matching, thus reducing stress on the generator and improving power transfer capability.

[0041] Sensors 116a, 116b, 166a, and 166b generate sensor signals X and Y, respectively, which are received by control modules 120a and 120b, also called power controllers. Control modules 120a and 120b process the respective X signals 124a and 126a and Y signals 124b and 126b and generate one or more feedforward or feedback control signals 128a and 128b to the respective RF power sources 114a and 114b. The RF power sources 114a and 114b adjust the RF power signals 122a and 122b based on one or more feedback or feedforward control signals. In various embodiments, control modules 120a and 120b can control the respective harmonic networks 118a and 118b via their respective control signals 121a and 121b. The control modules 120a and 120b may include at least a proportional-integral-derivative (PID) controller or a subset thereof, and / or a direct digital synthesis (DDS) component, and / or any of the various components described below in relation to the module.

[0042] In various embodiments, control modules 120a, 120b are PID controllers or subsets thereof, and may include functions, processes, processors, modules, or submodules. Control signals 128a, 128b may be drive signals and may include DC offset or rail voltage, amplitude, frequency, and phase components of voltage or current. In various embodiments, feedback control signals 128a, 128b may be used in one or more control loops. In various embodiments, the multiple control loops may include proportional-integral-derivative (PID) control loops for RF drive and rail voltage. In various embodiments, control signals 128a, 128b may be used in single-input single-output (SISO) or multiple-input multiple-output (MIMO) control schemes. An example of a MIMO control scheme can be found by reference to U.S. Patent No. 10,546,724, filed January 28, 2020, titled Pulsed Bidirectional Radio Frequency Source / Load, which has been assigned to the assignee of this application and is incorporated herein by reference. In other embodiments, signals 128a, 128b can provide feedforward control as described in U.S. Patent No. 10,49,857, which has been assigned to the assignee of this application and is incorporated herein by reference.

[0043] In various embodiments, the power supply system 110 may include a control module 120', also called a power control module. The control module 120' may be located outside of either or both of the RF generators 112a, 112b, and may be referred to as an external or common controller 120'. In various embodiments, the control module 120' may implement one or more functions, processes, or algorithms described herein with respect to one or both of the control modules 120a, 120b. Thus, the control module 120' communicates with the respective RF generators 112a, 112b via their respective pairs of links 136, 138, the pairs of links enabling the exchange of data and control signals between the control module 120' and the RF generators 112a, 112b as appropriate. In various embodiments, the control modules 120a, 120b, and 120' can perform distributed and cooperative analysis and control of the RF generators 112a, 112b. In various other embodiments, the control module 120' can analyze and control the RF generators 112a and 112b, eliminating the need for their respective local control modules 120a and 120b.

[0044] In various embodiments, the RF power source 114a, sensors 116a, 166a, control module 120a, and matching network 118a may be referred to as the source RF power source 114a, source sensors 116a, 166a, source control module 120a, and source matching network 118a. Similarly, in various embodiments, the RF power source 114b, sensors 116b, 166b, control module 120b, and matching network 118b may be referred to as the bias RF power source 114b, bias sensors 116b, 166b, bias control module 120b, and bias matching network 118b. In various embodiments, as described above, the term source refers to an RF generator that produces plasma, and the term bias refers to an RF generator that adjusts the plasma ion energy distribution function (IEDF). In various embodiments, the source RF power supply and the bias RF power supply operate at different frequencies. In various embodiments, the source RF power supply operates at a higher frequency than the bias RF power supply. In various other embodiments, the source RF power supply and the bias RF power supply operate at the same frequency or substantially the same frequency.

[0045] According to various embodiments, the source RF generator 112a and the bias RF generator 112b include a number of ports for communicating with the outside. The source RF generator 112a includes a pulse-synchronized output port 140, a digital communication port 142, and an RF output port 144. The bias RF generator 112b includes an RF input port 148, a digital communication port 150, and a pulse-synchronized input port 152. The pulse-synchronized output port 140 outputs a pulse-synchronized signal 156 to the pulse-synchronized input port 152 of the bias RF generator 112b. The digital communication port 142 of the source RF generator 112a and the digital communication port 150 of the bias RF generator 112b communicate via a digital communication link 157. The RF output port 144 generates an RF control signal 158 which is input to the RF input port 148. In various embodiments, the RF control signal 158 is substantially the same as the RF control signal that controls the source RF generator 112a. In various other embodiments, the RF control signal 158 is the same as the RF control signal that controls the source RF generator 112a, but is phase-shifted within the source RF generator 112a according to the requested phase shift generated by the bias RF generator 112b. Thus, in various embodiments, the source RF generator 112a and the bias RF generator 112b are driven by substantially identical RF control signals, or by substantially identical RF control signals that are phase-shifted by a predetermined amount.

[0046] Figure 2 shows a voltage-versus-time plot illustrating a pulse operation mode for transferring power to a load such as the load 132 in Figure 1. In Figure 2, the RF signal 210 is modulated by pulse 212. When pulse 212 is on, as shown in the period or region 214 of pulse 212, the RF generator 112 outputs the RF signal 210. Conversely, during the period or region 216 of pulse 212, pulse 212 is off, and the RF generator 112 does not output the RF signal 210. Pulse 212 can repeat with a constant or variable duty cycle. Furthermore, pulse 212 does not have to be a sine wave as shown in Figure 2. As an example that is not limited, pulse 212 can be trapezoidal, triangular, Gaussian, or multistate. The pulse may have a predetermined period, and may repeat over each period or vary from period to period. Furthermore, pulse 212 may have multiple on and off regions with varying amplitude and length. Multiple regions may be repeated within a fixed or variable period to define a fixed, variable, or arbitrary envelope for an RF signal.

[0047] Referring to Figure 3, which shows a typical pulse shape in a plasma chamber and how the pulse shape changes over time. Pulse 312 has a first shape at a predetermined point in time. After a pre-selected time, such as 500 hours, the shape of pulse 312 progresses to the shape of pulse 314. The change in pulse shape from pulse 312 to pulse 314 can adversely affect the production in the plasma chamber. Note that pulses 312 and 314 represent pulses measured at a load such as a plasma chamber. Measurements of pulses away from the load, such as in front of a matching network, may not accurately represent the pulses transmitted to the load. The shapes of pulses 312 and 314 may not be considered optimal for various plasma operations.

[0048] Figure 4 shows pulse 412 at a first time point having a preferred shape for a given plasma operation. As can be seen from Figure 4, the pulse shape remains substantially constant over time, as shown by pulse 414. In various configurations, the pulse shapes can be compared over 500 hours. Thus, pulse 412 represents a substantially preferred pulse shape for the selected plasma operation, and pulse 414 demonstrates the temporal consistency of the preferred pulse shape.

[0049] One technique to enable an RF generation system to output an optimal pulse shape for a load such as a plasma chamber is to use a closed-loop system with sensors located between the matching network and the plasma chamber, such as those shown in sensors 166a and 166b in Figure 1. However, conventional techniques focus on controlling the pulse shape at the output of the RF generator, rather than the pulse shape between the matching network and the load. The reason for placing an RF sensor between the RF generator and the matching network is that post-matched sensors are typically customized for the plasma chamber or load and may be less accurate than RF sensors placed between the RF generator and the matching network in various configurations. For example, typical analog post-matched voltage sensors can have challenges such as high noise levels and ground loops / offsets in general. Post-matched sensors are used to measure the voltage amplitude at the post-matched node and adjust the power increase or decrease to achieve a voltage setpoint. Such conventional bias voltage leveling feedback has not been used for pulse shaping and has been limited to controlling the RF voltage amplitude in a stable state. U.S. Patent No. 9,41,480, assigned to the assignee of this application and incorporated herein by reference, describes a hypothetical sensor that estimates post-matched node values ​​using s-parameter transformation. While the methods presented in the cited patents offer various improvements, the values ​​of the matched nodes may be affected by manufacturing variations and temperature in the matched network.

[0050] In various configurations, the subject matter described herein combines one or more elements to provide improved pulse shaping control, including a post-matching sensor for measuring pulses, a digitally implemented control loop that provides values ​​from the post-matching sensor to an RF generator controller via a digital communication link, and an adaptive plant model for setting adjustments to shape pulses using feedforward control.

[0051] In various embodiments, the RF power generation system of the Disclosure receives an input defining a desired pulse shape and compares the desired pulse shape to the current pulse shape measured at a post-matched sensor. The RF power generation system determines what pulse shape modification is required for the pulse shape measured by the post-matched sensor to become the desired pulse shape. The RF power generation system achieves the desired post-matched pulse shape by controlling the amplitude and frequency of one or more power amplifiers that generate the output pulses. As described herein, amplitude control may include changing the amplitude of a control signal input to the power amplifier and the amplitude of a rail voltage applied to the power amplifier. Controlling the pulse shape in the manner described herein results in at least a consistent short-term pulse shape and improved long-term pulse shape drift.

[0052] In the various configurations described herein, data from the post-matched sensor does not need to be communicated to the pulse shaping component in real time, as the data is stored before it is synchronized with the pulse and transmitted to the RF generator. Such methods take into account that the pulse shape is consistent over shorter periods. The adjustments made by the RF generator to manipulate the pulse shape utilize the sensor output for future pulse states, thereby improving and maintaining the pulse shape over time.

[0053] Figure 5 shows a block diagram of the RF generation system 510, where the requested pulse shape is input to the setpoint modifier 512. The requested pulse shape includes one or more pulse setpoints for pulse parameters that define the pulse shape, which include amplitude, frequency, rise time, fall time, ramp time, RF phase angle, target impedance, total energy over a single pulse, overshoot, setpoint time, and quantities mathematically derived from these pulse parameters, for the entire duration of one or more sections of a repeating simple pulse or a repeating complex pulse. The system bus data link input 514 receives matched sensor outputs, such as those from sensors 166a and 166b in Figure 1. The matched sensor outputs and the requested pulse shape are input to the setpoint modifier module 512, which determines what modifications should be made to the requested pulse shape to generate the desired pulse shape at a load such as load 132 in Figure 1. The setpoint modifier 512 applies adjustments by modifying the setpoints for the pulse parameters and outputs the adjusted pulse shape parameters to the pulse combiner 516. The pulse combiner 516 receives the adjusted pulse shape parameters and combines the pulse setpoints. The pulse setpoint profile is input to the RF control module 518 or the RF power control module.

[0054] The control module 518 outputs a control signal to the power amplifier 522. The control signal output to the power amplifier 522 includes frequency and amplitude components, which, upon input to the power amplifier 522, are amplified to generate an RF signal or RF output signal that is modulated by the required pulse shape. The modulated RF signal is output to the sensor 524. Sensor 524 generally corresponds to sensors 116a and 116b in Figure 1. Sensor 524 outputs an RF signal to a matched network (not shown in Figure 5), such as matched networks 118a and 118b in Figure 1. The control module 518 includes an amplitude module 520. As shown in Figure 5, the amplitude module 520 receives a pulse setpoint profile and generates an amplitude control signal that changes according to the required pulse shape.

[0055] Figure 6 shows an RF generation system 610 configured similarly to Figure 5. The RF generation system 610 operates similarly to the RF generation system 510 described in Figure 5. Components in Figure 6 that are similar to those in Figure 5 are similarly numbered, with 6 as the leading number instead of 5. Such numbering continues throughout this disclosure. The RF control module 618 also includes an impedance frequency module 626. The impedance module 626 controls impedance matching between the RF generator's power amplifier 622 and the load by varying one or both of the RF frequencies, as shown in Figure 5, or by components of a matching network, as will be described in more detail herein. The control module 618 generates the desired pulse shape by both controlling the amplitude using the amplitude module 620 and controlling the frequency using the impedance module 626. Thus, the power amplifier 622 receives a control signal having amplitude and frequency components, and both the amplitude and frequency components are varied to provide the desired pulse shape at the load. As explained above, the pulse shape is achieved by controlling the power amplifier 622 to generate pulses such that when applied to a load such as load 132 in Figure 1, the pulse applied to load 132 is close to the desired pulse shape.

[0056] As described above, the impedance module 626 controls impedance matching between the RF generator's power amplifier 622 and the load by changing the RF frequency or one or both of the components of the matching network. Figure 6 includes a matching network 680 positioned between the power amplifier 622 and the sensor 624. The impedance module 626 outputs a matching control signal to the matching network 680. The matching control signal may include commands for controlling one or more components of the matching network 680, and the components may be one or more more responsive components, such as capacitors or inductors for adjustment or load reactance. The commands may be one or more control signals for controlling one or more actuators associated with each of the one or more components of the matching network 680. In other configurations, the commands may be analog or digital commands input to a matching network controller that converts analog or digital commands into signals for controlling one or more actuators associated with each of the one or more components of the matching network 680.

[0057] Figure 7 shows an RF generation system 710, which includes an RF control module 718 similar to that in Figure 6, and also includes a rail voltage module 730. The rail voltage control module 730 may include one or more DC power supplies and a controller for controlling one or more power supplies. The DC power supplies and controllers may be combined in a single module or may be one or more separate components. Components in Figure 7 similar to those in Figure 6 are referred to using reference numbers beginning with "7" instead of "6". Such similar components may not be described herein. This arrangement is used throughout this specification. The rail voltage module 730 receives a rail setpoint and generates a rail voltage to the power amplifier 722. The rail voltage setpoint input to the rail voltage module 730 may be received from the user, as well as a source of the requested pulse shape, or may be set by one or a combination of the controllers described above, such as one of the control modules 120a, 120b, 120'. The rail voltage module 730 receives the rail setpoint and generates a rail voltage to the power amplifier 722 corresponding to the rail setpoint. In various configurations, the rail voltage can be configured to be as low as practically possible in order to maintain the operational efficiency of the power amplifier 722. The amplitude signal input to the power amplifier 722 from the control module 718 is controlled in amplitude within a range set by the rail voltage output by the rail voltage module 730. The operation of the control module 718 to change the amplitude of the input signal to the power amplifier 722 improves response time compared to changing the rail voltage applied to the power amplifier 722. In various configurations, the rail voltage setpoint may be continuous, such as varying within a range of 30V to 300V, or discrete, such as 30V, 100V, 300V, depending on the architecture of the power amplifier.

[0058] Figure 8 shows an RF power generation system 810 configured similarly to the RF power generation system 610 in Figure 6 and the RF power generation system 710 in Figure 7. The RF power generation system 810 in Figure 8 further includes a feedforward rail setpoint adjustment module 832. The feedforward rail setpoint adjustment module 832 receives at least the rail parameters of the pulse setpoint profile from the pulse combiner 816. The pulse combiner 816 also outputs the pulse setpoint profile to the RF control module 818. The feedforward rail setpoint adjustment module 832 receives the pulse setpoint profile from the pulse combiner 816 and applies feedforward adjustments to the rail setpoint profile to generate rail setpoints to the rail voltage module 830. Thus, the feedforward rail setpoint adjustment module 832 applies feedforward adjustments to the rail voltage portion of the pulse setpoint profile to change the rail voltage applied to the power amplifier 822. In various configurations, changing the rail voltage applied to the power amplifier 822 results in improved responsiveness to limit or eliminate rail drop during long pulses.

[0059] Figure 9A shows an RF power generation system 910 configured similarly to Figures 5 to 8, further including a feedforward setpoint adjustment module 938. The feedforward setpoint adjustment module 938 receives a pulse setpoint profile from the pulse combiner 916. In various configurations, the pulse setpoint profile can define at least one or more of the rail voltage, amplitude, or impedance to control the transfer of power from the power amplifier 922 to the load. As shown in Figure 9A, the feedforward setpoint adjustment module 938 generates a feedforward-adjusted rail setpoint input to the rail voltage module 930, a feedforward-adjusted amplitude setpoint input to the control module 918, and a feedforward-adjusted impedance setpoint input to the RF control module 918. The impedance setpoint determines either or both the frequency of the power amplifier 922 or the setting of the matching network 980. The generation of the feedforward setpoint adjustments will be described in more detail. In a high-power RF generator system, multiple identical low-power modules are combined to generate output power. The controller described can also enable / disable a subset of power modules as additional actuators for amplitude control.

[0060] In various configurations, the feedforward setpoint adjustment module 938 can implement single-input single-output (SISO) or multiple-input multiple-output (MIMO) techniques for one or more output variables. In one non-limited configuration, the feedforward setpoint adjustment module 938 may generate setpoint adjustments to pulse setpoint profiles to adjust one or more amplitudes and impedances using frequency or matching network control, rail setpoints, or a number of power amplifier modules that are enabled or disabled using SISO or MIMO-based control. In one non-limited configuration, the amplitude may be controlled using either SISO or MIMO, the impedance may be controlled using either SISO or MIMO to control a component of the frequency or matching network, and the rail voltage may be controlled using either SISO or MIMO. In various configurations, the rail voltage may be controlled independently. In various other configurations, a SISO loop or MIMO loop may be used for the feedforward and / or feedback portion of the control for any of the output parameters, such as amplitude setpoints and impedance setpoints, by controlling either or both the frequency or matching network components and the rail voltage setpoints. In a further, less limiting example, one control technique could use MIMO control for frequency, and SISO control could be used with multiple individual SISO control loops for the rail voltage and amplitude setpoints for the power amplifier 922.

[0061] Figure 9B shows a variation of the configuration in Figure 9A. In Figure 9B, the order of the control module 918 and the feedforward setpoint adjustment module 938 is changed so that feedforward adjustments are applied to the respective amplitude, frequency, matching network component, and rail voltage modules. Thus, instead of the feedforward setpoint adjustment module 938 adjusting the setpoint as shown in Figure 9A, in Figure 9B, feedforward control is used to adjust the actuator or actuator value.

[0062] Figure 10 shows enlarged views of the feedforward setpoint adjustment module 938 and RF control module 918 in Figure 9A, referred to as the feedforward setpoint adjustment module 1038 and RF control module 1018. The feedforward setpoint adjustment module 1038 receives pulse setpoint profile components for, for example, power applied to the load and input to the combiner 1040. Feedforward setpoint adjustments for amplitude adjustment are also input to the combiner 1040. Similarly, the combiner 1042 receives pulse setpoint profile components for controlling frequencies for impedance control, such as the fundamental frequency of the RF signal applied to the load. As described herein, the combiner 1042 also receives feedforward setpoint adjustments for adjusting the frequency components of the pulse setpoint profile. Similarly, the combiner 1082 receives pulse setpoint profile components for, for example, controlling the matched network components for impedance control. As described herein, the combiner 1082 also receives feedforward setpoint adjustments for adjusting the matched network components of the pulse setpoint profile. Combiner 1040 combines the pulse setpoint profile component (for power) and the feedforward setpoint adjustment and outputs the signal to combiner 1044 of RF control module 1018. Similarly, combiner 1042 combines the pulse setpoint profile component (for frequency) and the feedforward impedance setpoint adjustment for frequency and outputs the combined signal to combiner 1046 of RF control module 1018. Similarly, combiner 1082 combines the pulse setpoint profile component (for matched network control) and the feedforward impedance setpoint adjustment for matched network control and outputs the combined signal to combiner 1084 of RF control module 1018.

[0063] The combiner 1044 determines the difference between the feedforward-adjusted setpoint output by the combiner 1040 and the power control feedback value. In various configurations, the power control feedback power value is the forward power PFWD 、Reverse power P REV 、or transmitted power P DEL It can be. The synthesizer 1046 determines the difference between the adjusted feedforward set value output by the synthesizer 1042 and the frequency control feedback measurement value. The synthesizer 1084 determines the difference between the adjusted feedback set value output by the synthesizer 1084 and the frequency control feedback value. In various configurations, the impedance control feedback value is the reverse power P REV 、forward power P FWD 、transmitted power P DEL 、or can be determined based on the reflection coefficient gamma (Γ).

[0064] The amplitude feedback module 1020 receives the difference signal output by the combiner 1044 and generates an amplitude actuator signal for controlling the actuator of a power amplifier, such as the power amplifier described above. The impedance feedback module 1026 may include either or both of the frequency feedback module 1026a and the matched network feedback module 1026b. The frequency feedback module 1026 receives the difference signal output by the combiner 1046 and generates a frequency actuator signal for controlling the frequency output by the power amplifier described above. Similarly, the matched network module 1026b receives the difference signal output by the combiner 1084 and generates one or more matched network actuator signals for controlling the components of the matched network described above. In various configurations, the feedforward setpoint adjustment of the impedance feedback module 1026 is varied to minimize the reflection coefficient Γ or other feedback measurements described above. The feedforward setpoint adjustment module 1038 adjusts the setpoint to control the pulse shape setpoint. The frequency actuator signal generated by the frequency feedback module 1026a and the matched network actuator signal generated by the matched network feedback module 1026b work together to perform their respective frequency tuning and matched network tuning in order to minimize the reflection coefficient or other impedance feedback measurements described above.

[0065] Figure 11 shows a control module similar to that in Figure 10, but the control modules in Figure 11 are arranged in the reverse order, so that the RF control module 1118 generates the control signal, which is then adjusted by the feedforward actuator adjustment module 1138. Figure 11 shows an enlarged view of the RF control module 918 and the feedforward setpoint adjustment module 938 in Figure 9B. In Figure 10, the feedforward adjustment is performed before the generation of the actuation signal, whereas in Figure 11, the feedforward adjustment is applied to the actuator signal. Note that the configuration in Figure 10 or Figure 11 can be implemented in the various RF power generation systems described herein, depending on the choice of design.

[0066] In Figure 11, the pulse setpoint profile component for power is the forward power P FWD , reverse power P REV , or the transmitted power P DELThe pulse setpoint profile component for power and the power control feedback signal are input to the combiner 1150 along with the power feedback control value or signal. The combiner 1150 determines the difference between the pulse setpoint profile component for power and the power control feedback signal to generate an error signal input to the amplitude feedback module 1120. The pulse setpoint profile component for controlling frequency for impedance control is input to the combiner 1152 along with the impedance feedback control value or signal, based on measurements such as those described above, which change according to the effect of frequency on impedance. The combiner 1152 determines the difference between the pulse setpoint profile for controlling frequency for impedance control and the impedance feedback control value or signal to generate an error signal input to the frequency feedback module 1126a. The combiner 1186 determines the difference between the pulse setpoint profile for controlling components of the matched network for impedance control and the impedance feedback control value or signal based on measurements described above to generate an error signal input to the matched network feedback module 1126b. The amplitude feedback module 1120 outputs a control signal to control the amplitude of the power amplifier output, such as the power amplifier in Figure 1. The frequency feedback module 1126a outputs a frequency control signal to change the frequency of the RF signal output by the RF power amplifier. The matched network feedback module 1126b outputs one or more control signals to change one or more components of the matched network.

[0067] The control signal is input to the feedforward actuator adjustment module 1138. The feedforward actuator adjustment module 1138 includes a first combiner 1154 that combines the feedforward amplitude actuator adjustment with the actuator signal output by the amplitude feedback module 1120. Combiner 1156 combines the feedforward frequency actuator adjustment with the actuator signal output from the feedback frequency module 1126. Combiners 1188a and 1188b, respectively, combine their respective feedforward matched network actuator adjustment 1 and matched network actuator adjustment 2 with the actuator signal output from the frequency feedback module 1126a. Thus, combiner 1154 outputs the amplitude actuator signal to the power amplifier, combiner 1156 outputs the frequency actuator signal to the power amplifier, combiner 1088a outputs the first matched network actuator signal to the matched network, and combiner 1088b outputs the second matched network actuator signal to the matched network.

[0068] In the RF power generation systems described herein, signals from matched sensors such as sensors 166a and 166b may be provided by analog or digital links or digital communication links, such as system bus data links, or by other data links such as Ethernet industrial buses, optical fibers, or Gigabit transceiver data link connections, including Transmit Control Protocol (TCP) or User Data Link Protocol (UDP). In various configurations, instantaneous data transfer from matched sensors is not usually required, as the data is synchronized with pulses and stored before transmission from the matched sensors to the RF generator. This technique is particularly effective in situations where the pulse shape is consistent for a relatively short period relative to the pulse width. Adjustments made to the pulse shape by the generator facilitate adjustments to future pulse states by utilizing pulse shape data received from the matched sensors to improve the pulse shape over time. Conventional communication of the detected RF signal parameters used in analog methods has limited effectiveness in controlling the pulse shape based on measured data. However, considering that the pulse data measured in the matched sensor will have a periodic and repetitive nature, using digitally communicated sensor signals improves the signal-to-noise ratio, which makes the matched sensor more effective at detecting pulse parameters, such as the parameters described above for pulse shape control.

[0069] Referring to Figures 12 to 15, various techniques can be used to improve and maintain the pulse shape over time. In various configurations, adaptive modeling techniques, such as those shown in Figure 12, can be used to estimate the pulse dynamics between the commanded or requested pulse shape and the pulse shape measured by the post-matched sensor at the input to the load. The adaptive model defines a plant model that can be used to determine pulse parameters for both the feedforward controller and the feedback controller in order to help match the pulse shape to these operating conditions. Pulse parameters may include pulse amplitude, pulse length, rail voltage, and impedance (frequency and matching network control). In the RF generation systems described in Figures 12 to 15, to improve the model, the model is built from setting-value profile generation to the post-matched sensor near the reactor or load.

[0070] Referring to the RF pulse shaping system 1200 in Figure 12, the RF pulse shaping system 1200 receives the required pulse shape which is input to the RF power generation system 1210. The RF power generation system 1210 includes a setpoint profile generation module 1260 and an RF pulse generation module 1262. The RF power generation system 1210 outputs a pulsed RF signal to an output network 1264 which includes a matching network 1266 and a post-matching sensor 1224, providing output power to a load 1268. The RF pulse shaping system 1200 also includes an adaptive plant model 1270, also called a learned plant model, which generates feedforward coefficients to the RF power generation system 1210.

[0071] The adaptive plant model 1270 receives a pulse setpoint profile that defines the pulse profile output by the setpoint profile generation module 1260 and constructs an expected and modeled pulse shape that will be measured by the sensor 1224. The modeled pulse shape is compared with the measured pulse shape output from the sensor 1224. Thus, the adaptive plant model 1270 acts as a transfer function acting on the pulse setpoint profile received from the setpoint profile generation module 1260. The difference between the output of the adaptive plant model 1270 and the measured pulse shape output by the sensor 1224 is determined by the combiner 1272, which determines the difference between the output of the adaptive plant model 1270 and the measured pulse shape output by the sensor 1224. The difference output by the combiner 1272 is input to the adaptive plant model 1270 to adjust the model according to the difference. The adaptive plant model 1270 outputs adjustment coefficients or other plant model descriptors to the RF power generation system 1210. The RF power generation system 1210 includes a feedforward setpoint adjustment controller, either individually or in coordination with respect to Figures 8 to 11, between the setpoint profile generation module 1260 and the RF pulse generation module 1262.

[0072] Figure 13 shows the components of Figures 9A and 12, illustrating the interaction between the adaptive plant model 1270 and the feedforward setpoint adjustment module 938. As seen in Figure 13, the feedforward adjustment plant model parameters output by the adaptive plant model 1270 are input to the feedforward setpoint adjustment module 938. As an example without limitation, feedforward adjustments may be applied as shown in Figures 8 to 11. As also seen in Figures 8 to 11, the RF power generation system 1210 is implemented using substantially the components of Figure 9. Note that sensor 924 is located at the output of the power amplifier and is a pre-matching sensor, while sensor 1224 is configured as a post-matching sensor, similar to sensors 166A and 166B in Figure 1.

[0073] Referring further to Figures 12 and 13, the plant model 1270 may be estimated during the learning phase until sufficient data is accumulated to accurately model the plant. Furthermore, as seen in Figures 12 and 13, the adaptive plant model may be used to determine feedforward adjustments during the operation phase. Since the learning phase may overlap with the operation phase, the feedforward adjustments may be updated during operation throughout the learning process. During such overlap, the rate at which the plant model parameters output by the adaptive plant model 1270 are input to the feedforward setpoint adjustment module 938 may be considerably slower than the pulse repetition period. Furthermore, as described above, the learned plant model may include SISO and MIMO models and controllers. In various configurations, each of the rail setpoints, amplitude setpoints, and frequency setpoints may be adjusted using separate SISO or MIMO controllers.

[0074] Figure 14 shows an RF pulse shaping system 1400 configured similarly to Figure 12. While the RF pulse shaping system 1200 describes an adaptive plant model, the RF pulse shaping system 1400 describes an adaptive inverse model. The adaptive inverse model is shown in 1476, and a copy of the adaptive inverse model 1476' is included in the RF generator 1410. Since the adaptive inverse model 1476 models the inverse of the plant, applying the adaptive inverse model to the requested pulse shape cancels out the plant effect, so that the requested pulse shape input to the RF generator 1410 represents the pulse shape applied to the load 1468.

[0075] The setpoint profile generation module 1460 outputs the determined setpoint profile to the combiner 1472. The setpoint profile output by the setpoint profile generation module 1470 undergoes a modeling delay 1474 to synchronize the comparison between the setpoint profile output by the setpoint profile generation module 1460 and the inversely modeled pulse shape output by the adaptive inverse model module 1476. The adaptive inverse model module 1476 receives the pulse shape measured by the sensor 1424 and applies an inverse plant transfer function to output an inverse pulse setpoint profile. The combiner 1472 compares the output of the adaptive inverse model module 1476 with the output of the modeling delay 1474. The combiner 1472 determines the difference between the output of the adaptive inverse model module 1476 and the output of the setpoint profile generation module 1460. Thus, when the signal measured by the sensor 1424 is used as its input, the combiner 1472 compares the delayed version of the pulse profile generated by the profile generation module 1460 with the pulse profile generated by the inverse model module 1476. The difference is input to the adaptive inverse model module 1476, which adjusts the inverse model to improve accuracy. The adaptive inverse model 1476 can be copied to the RF generator 1410.

[0076] Similar to Figure 13, Figure 15 shows the structural relationship between the RF pulse shaping system 1400 in Figure 14 and the RF power generation system 910 in Figure 9. The adaptive inverse model generated by the adaptive inverse model module 1476 generates coefficients that are input to the feedforward setpoint adjustment module 938. The feedforward setpoint adjustment module 938 generates components corresponding to copy 1476' of the adaptive inverse model. Thus, the adaptive inverse model module 1476 determines the coefficients for implementing copy 1476' of the adaptive model.

[0077] In various embodiments, as described above with respect to Figures 13–15, there are multiple techniques for maintaining pulse shape, including adaptive modeling and adaptive inverse modeling. Adaptive modeling estimates the dynamics of the pulse response from setpoints to post-matched measurements. Then, to help match the pulse shape to current operating conditions, a plant model can be used to determine pulse parameters for both feedforward and feedback controllers. Figures 12 and 13 show examples of adaptive modeling techniques. One advantage of adaptive modeling techniques is that the model is built near the post-matched sensor location, typically near the load or plasma chamber.

[0078] In alternative configurations, adaptive inverse modeling techniques, such as those shown in Figures 14 and 15, allow for the preservation of pulse shape. In the inverse adaptive modeling technique, the setpoint profile is pre-tuned to allow the desired user pulse shape to propagate to the post-matched position after the conversion to the requested pulse shape, starting from the inverse. Thus, since the learned model is an inverse estimate of the plant dynamics, the plant applies the opposite effect of the inverse model when the desired pulse shape is tuned according to a copy of the adaptive inverse model, so that the pulse obtains the desired shape at the input to the reactor.

[0079] In various configurations, iterative learning control (ILC) can be used to learn the setpoint trajectory adjustments required to achieve the matched pulse shape. One variation of the ILC method leverages an adaptive plant model, which consists of A, B, and C matrices in state-space form. Plant model output y j (k) can be written as equation (1) shown below. y j (k)=C(qI-A) -1 Bu j (k) (1) Here C is a matrix that defines how the output is coupled to the plant. q is a forward time shift operator, I is the identity matrix, A is a matrix that defines the dynamic response of the plant, B is a matrix that defines how the inputs are connected to the plant. u j (k) is the value of the k-th discrete sample (time index) in the pulse profile of the j-th pulse iteration.

[0080] Using standard techniques, the parameters of the Q filter and L filter can then be determined using a plant model to enable fast and stable convergence of the ILC controller to the desired pulse profile. The Q filter and L filter are shown in equation (2) below. u j+1 (k)=Q(q)[u j (k)+L(q)e j (k+1)] (2) Here Q and L are filters, q, j, and k are as explained above with respect to equation (1), e is an error in the feedback control loop. Therefore, u j+1 (k) determines one or more feedforward adjustments to one or more pulse parameters of the pulse setpoint profile.

[0081] In the adaptive inverse plant model method, as shown in Figures 14 and 15, an inverse plant model may be used to construct an ILC update rule for updating feedforward adjustments, as shown in equation (3).

[0082]

number

[0083] Here

[0084]

number

[0085] This is an inverse plant model, u, j, k, and e are as described above with respect to equations (1) and (2). The estimated inverse plant model in equation (3) is used to determine the next controller actuator value based on the current actuation and current error. Thus, the u in equation (2) above j+1 (k) Similarly, u in equation (3) j+1 (k) determines one or more feedforward adjustments for one or more pulse parameters of the pulse setpoint profile. Equation (3) describes the feedforward adjustments for each actuator in the SISO control method. In the MIMO control method, equation (3) may be implemented as a matrix that describes the control of multiple actuators in response to multiple inputs. In various control methods, the matrix equation describing MIMO may also describe multiple single-loop SISOs as a special case.

[0086] In various other configurations, further variations of the ILC method involve the Extremum Search Control (ESC) method. In the ESC method, the actuator profile or reference trajectory or both is divided into a predetermined number of bins. At each pulse iteration, the current profile of the setpoint / actuation is applied and the error is measured. The local gradient of pulse shape error with respect to these bins / setpoints / actuations is then estimated and used to determine the direction in which the bin values ​​should be moved to reduce the overall pulse shape error. In some variations, various techniques can also be used to reduce the complexity of the setpoint / actuation profile, such as using a linear spline with a minimum number of knot points, or using other sets of basis functions such as Fourier basis functions or Legendre polynomial basis functions, in which case the actuator profile is determined by scaling the individual basis functions. An example of the ESC method can be found by referring to U.S. Patent Application No. 17 / 102,598, which is assigned to the assignee of this application and incorporated herein by reference.

[0087] Figure 16 incorporates the various components of the previous drawing. The control module 1610 may include an amplitude control module section 1612, a frequency control module section 1614a for impedance control, a harmonized network control module section 1614b for impedance control, and a rail control module section 1616. The amplitude control module section 1612 includes an amplitude controller 1620, a feedforward amplitude adjustment module 1622, and an amplitude model module 1624. The impedance control module section 1614a includes a frequency controller 1626, a feedforward frequency adjustment module 1628, and a frequency model module 1630. The impedance control module section 1614b includes a harmonized network controller 1632, a harmonized network adjustment module 1634, and a harmonized network module 1636. The rail control module section 1616 includes a rail controller 1638, a feedforward rail adjustment module 1640, and a rail model module 1642. In various embodiments, the control module 1610 includes one or more processors, controllers, modules, or submodules that execute code related to the module section or modules 1610, 1612, 1614a, 1614b, 1616, 1618, 1620, 1622, 1624, 1626, 1630, 1632, 1634, 1636, 1638, 1640, and 1642. The operation of the module section or modules 1610, 1612, 1614a, 1614b, 1616, 1618, 1620, 1622, 1624, 1626, 1630, 1632, 1634, 1636, 1638, 1640, and 1642 is described below with respect to the method shown in Figure 17.

[0088] For further definitions of the control modules 120a, 120b, 120' in Figure 1 and the controllers and modules described herein, see the flowcharts given below in Figure 17 and the definitions given below for the term “module”. The systems disclosed herein may be operated using numerous methods, examples, and various control systems, the methods of which are shown in the figures. The following operations are described primarily in relation to the implementations in the drawings, but the operations can be easily modified to apply to other implementations of the disclosure. The operations can be performed repeatedly. The following operations are shown and described primarily as being performed sequentially, but one or more of the following operations may be performed while one or more other operations are being performed.

[0089] Figure 17 shows a flowchart of a control system 1710 for performing pulse shaping control for, for example, the power transmission system in Figure 1. Control begins in block 1712 and continues in block 1714. Block 1714 determines a pulse setpoint profile based on the requested pulse profile or shape. Block 1714 outputs the setpoint profile to setpoint adjustment blocks 1720a, 1720b (1720b', 1720b''), and 1720c. Block 1714 also outputs the pulse setpoint profile to block 1716. Blocks 1716 and 1718 work together to determine the pulse shape at the load in block 1716 and compare the pulse shape at the load to the requested pulse shape in block 1718 to update the plant model.

[0090] The output from block 1714, which is the pulse setpoint profile, and the output from block 1718, which is the coefficient based on the plant model, are output to the respective setpoint adjustment blocks 1720a, 1720b (1720b', 1720b''), and 1720c. Setpoint adjustment block 1720a applies amplitude setpoint adjustment to achieve the desired pulse shape by modifying the amplitude of the signal output by the power amplifier to generate the desired pulse shape. Control then proceeds to block 1722a, which generates an amplitude control signal according to the adjustment applied to the pulse setpoint profile in block 1720a. The amplitude control signal output in block 1722a is input to block 1728 to control the power amplifier.

[0091] Similarly, block 1720b' applies impedance setpoint adjustments for impedance frequency control to achieve the desired pulse shape by modifying the frequency of the signal output by the power amplifier to generate the desired pulse shape. The control then proceeds to block 1722b', which generates a frequency control signal according to the adjustments applied to the pulse setpoint profile output from block 1720a. The frequency control signal output in block 1722b' is input to block 1728 to control the power amplifier.

[0092] Similarly, block 1720b'' applies a matched network component setpoint adjustment to coordinate the control of the matched network components and thereby control the power transmitted to the load. The control then proceeds to block 1722b'', which generates one or more matched network component control signals according to the setpoint adjustment applied to block 1720a. The one or more matched network component control signals output in block 1722b'' are input to block 1728 to control the matched network.

[0093] Block 1720c applies rail voltage setpoint adjustments to achieve the desired pulse shape by modifying the rail voltage applied to the power amplifier to generate the desired pulse shape. Control proceeds to block 1722c, which generates a rail voltage control signal according to the adjustments applied to the pulse setpoint profile output from block 1720c. The rail voltage control signal controls the DC power supply as shown in block 1726, and the DC power supply outputs rail voltages to control the power amplifier as shown in block 1728. The process ends in block 1730.

[0094] While Figure 17 focuses on setpoint adjustment, it should be understood that actuator adjustment can be implemented similarly, as shown in Figure 17. Furthermore, any combination of setpoint and actuator control can be implemented for each of the power, impedance, and rail voltage parameters to be controlled.

[0095] By controlling the pulse shape based on parameters measured by a post-matching sensor, the RF pulse shaping system described herein automatically adjusts the RF pulse characteristics at the load, which is the measurement location closest to the reaction in the plasma chamber. The method described herein facilitates load-to-load or chamber-to-chamber matching. The post-matching sensor is located downstream and is unaffected by the influence of the matching network as the matching network adapts to changing system impedances, such as impedance changes occurring in the load or plasma chamber. This disclosure facilitates narrower pulse shapes than conventional pulse shaping methods. Narrower pulse shapes create process space for device geometric shapes with higher aspect ratios or for processes requiring higher etching selectivity.

[0096] conclusion The above description is essentially illustrative and is not intended to limit the Disclosure, its application, or its use in any way. The broad teachings of the Disclosure can be implemented in various forms. Thus, although the Disclosure includes certain examples, the true scope of the Disclosure should not be limited in this way, as other modifications will become apparent upon study of the drawings, specification, and the following claims. In the written description and claims, one or more steps of the Method may be performed in a different order (or simultaneously) without altering the principles of the Disclosure. Similarly, one or more instructions stored on a non-temporary computer-readable medium may be performed in a different order (or simultaneously) without altering the principles of the Disclosure. Unless otherwise indicated, the numbering or other markings of instructions or method steps are for convenience of reference and not to indicate a fixed order.

[0097] Furthermore, while each embodiment is described above as having certain features, any one or more of those features described in relation to any embodiment of this disclosure may be implemented in any feature of any other embodiment, and / or in combination thereof, even if such combination is not explicitly described. In other words, the embodiments described are not mutually exclusive, and rearranging one or more embodiments with respect to one another remains within the scope of this disclosure.

[0098] Spatial and functional relationships between elements (e.g., between modules, between circuit elements, between semiconductor layers) are described using a variety of terms, including “connected,” “engaged,” “joined,” “adjacent,” “next to,” “above,” “below,” and “displaced.” Unless explicitly described as “direct,” when a relationship between a first element and a second element is described in the above disclosure, that relationship may be a direct relationship in which no other intervening elements exist between the first and second elements, or it may be an indirect relationship in which one or more intervening elements exist between the first and second elements (either spatially or functionally).

[0099] The phrase "A, B, and at least one of C" should be interpreted as meaning a logic (A or B or C) using non-exclusive OR, and not as meaning "at least one of A, at least one of B, and at least one of C". The term "set" does not necessarily exclude the empty set. In other words, in some situations a "set" can have zero elements. The term "non-empty set" may be used to indicate the exclusion of the empty set. In other words, a non-empty set always has one or more elements. The term "subset" does not necessarily require a proper subset. In other words, a "subset" of a first set may have the same extent (equal to) the first set. Furthermore, the term "subset" does not necessarily exclude the empty set. In some situations a "subset" can have zero elements.

[0100] In drawings, the direction of an arrow, such as an arrowhead, generally indicates the flow of information (such as data or commands) of interest in the drawing. For example, if elements A and B exchange various types of information, and the information transmitted from element A to element B is important to the drawing, the arrow may point from element A to element B. This unidirectional arrow does not imply that no other information is transmitted from element B to element A. Furthermore, with respect to the information transmitted from element A to element B, element B may transmit a request for that information, or an acknowledgment of its receipt, to element A.

[0101] In this application, the terms “module” or “controller” may be used interchangeably, including the following definitions, and may replace the term “circuit.” The term “module” may refer to, part of, or include any combination of some or all of the above, such as application-specific integrated circuits (ASICs), digital, analog, or mixed analog / digital discrete circuits, digital, analog, or mixed analog / digital integrated circuits, combinational logic circuits, field-programmable gate arrays (FPGAs), processor circuits (shared, dedicated, or grouped) that execute code, memory circuits (shared, dedicated, or grouped) that store code executed by the processor circuits, other suitable hardware components that provide the functions described, or system-on-a-chip.

[0102] A module may include one or more interface circuits. In some examples, the interface circuits may implement wired or wireless interfaces that connect to a local area network (LAN) or a wireless personal area network (WPAN). Examples of LANs are the Institute of Electrical and Electronics Engineers (IEEE) standard 802.11-2020 (also known as the WIFI wireless networking standard) and the IEEE standard 802.3-2015 (also known as the Ethernet wired networking standard). Examples of WPANs are the IEEE standard 802.15.4 (including the ZIGBEE® standard from the ZigBee® Alliance) and the BLUETOOTH® wireless networking standard from the Bluetooth® Special Interest Group (SIG) (including Core Specification versions 3.0, 4.0, 4.1, 4.2, 5.0, and 5.1 from the Bluetooth® SIG).

[0103] Modules can communicate with other modules using interface circuits. While modules may be illustrated in this disclosure as communicating directly and logically with other modules, in various implementations modules may actually communicate via a communication system. A communication system includes physical and / or virtual networking devices such as hubs, switches, routers, and gateways. In some implementations, a communication system connects to or traverses a wide area network (WAN), such as the Internet. For example, a communication system may include multiple LANs connected to each other via the Internet or point-to-point leased lines using technologies including Multiprotocol Label Switching (MPLS) and Virtual Private Networks (VPNs).

[0104] In various implementations, the functionality of a module can be distributed among multiple modules connected via a communication system. For example, multiple modules may implement the same functionality distributed by a load balancing system. In a further example, the functionality of a module can be divided into a server (also known as a remote or cloud) module and a client (or user) module. For example, a client module may include a native or web application running on a client device and communicating with the server module over a network.

[0105] Some or all hardware features of a module may be defined using a hardware description language, such as IEEE standard 1364-2005 (commonly known as "Verilog") and IEEE standard 1076-2008 (commonly known as "VHDL"). Hardware description languages ​​may be used to manufacture and / or program hardware circuits. In some implementations, some or all features of a module may be defined by a language such as IEEE 1666-2005 (commonly known as "SystemC"), which encompasses both code and hardware description as described below.

[0106] The term "code" as used above may include software, firmware, and / or microcode, and may refer to programs, routines, functions, classes, data structures, and / or objects. The term "shared processor circuit" encompasses a single processor circuit that executes some or all of the code from multiple modules. The term "group processor circuit" encompasses a processor circuit that, in combination with additional processor circuits, executes some or all of the code from one or more modules. References to multiple processor circuits include multiple processor circuits on separate dies, multiple processor circuits on a single die, multiple cores in a single processor circuit, multiple threads in a single processor circuit, or a combination of the above. The term "shared memory circuit" encompasses a single memory circuit that stores some or all of the code from multiple modules. The term "group memory circuit" encompasses a memory circuit that, in combination with additional memory, stores some or all of the code from one or more modules.

[0107] The term "memory circuit" is a subset of the term "computer-readable medium." As used herein, the term "computer-readable medium" does not include transient electrical or electromagnetic signals that propagate through a medium (such as on a carrier wave). Therefore, the term "computer-readable medium" can be considered tangible and non-transient. Examples of non-transient computer-readable mediums, not limited to these, include non-volatile memory circuits (such as flash memory circuits, erasable programmable read-only memory circuits, or mask read-only memory circuits), volatile memory circuits (such as static random-access memory circuits or dynamic random-access memory circuits), magnetic storage media (such as analog or digital magnetic tapes or hard disk drives), and optical storage media (such as CDs, DVDs, or Blu-ray® discs).

[0108] The apparatus and methods described in this application may be partially or fully implemented by a dedicated computer, which is made by configuring a general-purpose computer to perform one or more specific functions embodied in a computer program. Such apparatus and methods may be described as computerized apparatus and computerized methods. The functional blocks and flowchart elements described above serve as software specifications, which can be converted into a computer program by the routine work of an experienced technician or programmer.

[0109] A computer program includes processor-executable instructions stored in at least one non-temporary computer-readable medium. A computer program may also include, or depend on, stored data. A computer program may encompass a basic input / output system (BIOS) that interacts with the hardware of a dedicated computer, device drivers that interact with specific devices of the dedicated computer, one or more operating systems, user applications, background services, background applications, and the like.

[0110] A computer program may include (i) descriptive text to be parsed, such as HTML (Hypertext Markup Language), XML (Extensible Markup Language), or JSON (JavaScript Object Notation); (ii) assembly code; (iii) object code generated from the source code by a compiler; (iv) source code for execution by an interpreter; and (v) source code for compilation and execution by a just-in-time compiler. As a mere example, source code can be written using syntax from languages ​​including C, C++, C#, Objective-C, Swift, Haskell, Go, SQL, R, Lisp, Java®, Fortran, Perl, Pascal, Curl, OCaml, JavaScript®, HTML5 (Hypertext Markup Language 5th Revision), Ada, ASP (Active Server Pages), PHP (PHP: Hypertext Preprocessor), Scala, Eiffel, Smalltalk, Erlang, Ruby, Flash®, Visual Basic®, Lua, MATLAB®, SIMULINK®, and Python®. [Explanation of symbols]

[0111] 110 Power supply systems 112 RF Generator 114 RF Power Source 116 Sensors 118 Integrity Network 120 control modules 121 Control signals 122 RF power signal 124 signal 126 Signal 128 Control signals 130 Control signal 132 load 134 Synchronized Bias Detector 136 links 138 links 140 pulse-synchronous output ports 142 Digital communication ports 144 RF output ports 148 RF input ports 150 digital communication ports 152 pulse-synchronous input ports 156 Pulse synchronization signal 157 Digital Communication Links 158 RF control signal 166 Sensors 210 RF signal 212 pulses 214 areas 216 areas 312 pulses 314 pulses 412 pulses 414 pulses 510 RF Generation System 512 Setting value adjuster 514 System bus data link input 516 Pulse Synthesizer 518 RF Control Module 520 Amplitude Module 522 Power Amplifier 524 Sensors 610 RF Generation System 612 Setting value adjuster 614 System bus data link input 616 Pulse Synthesizer 618 Control Module 620 Amplitude Module 622 Power Amplifier 624 Sensors 626 Impedance Module 680 harmonized network 710 RF Generation System 712 Setting value adjuster 714 System bus data link input 716 Pulse Synthesizer 718 Control Module 720 Amplitude Module 722 Power Amplifier 724 Sensors 726 Impedance Module 730 Rail Voltage Module 780 harmonized network 810 RF Power Generation System 812 Setting value adjuster 814 System bus data link input 816 Pulse Synthesizer 818 RF Control Module 820 Amplitude Module 822 Power Amplifier 824 Sensors 826 Impedance Module 830 Rail Voltage Module 832 Feedforward Rail Setting Adjustment Module 880 Unified Network 910 RF Power Generation System 912 Setting value adjuster 914 System bus data link input 916 Pulse Synthesizer 918 RF Control Module 920 Amplitude Module 922 Power Amplifier 924 Sensors 926 Impedance Module 930 Rail Voltage Module 938 Feedforward Setting Adjustment Module 980 harmonized network 1018 RF Control Module 1020 Amplitude Feedback Module 1026 Impedance Feedback Module 1038 Feedforward Setting Adjustment Module 1040 Synthesizer 1042 Synthesizer 1044 Synthesizer 1046 Synthesizer 1082 Synthesizer 1084 Synthesizer 1118 RF Control Module 1120 Amplitude Feedback Module 1126 Impedance Feedback Module 1138 Feedforward Actuator Adjustment Module 1150 Synthesizer 1152 Synthesizer 1154 Synthesizer 1156 Synthesizer 1186 Synthesizer 1188 Synthesizer 1200 RF pulse molding system 1210 RF Power Generation System 1224 Sensor 1260 Configuration Profile Generation Module 1262 RF pulse generation module 1264 Output Network 1266 harmonized network 1268 load 1270 Adaptive Plant Model Module 1272 Synthesizer 1400 RF pulse molding system 1410 RF Generator 1424 Sensor 1460 Configuration Profile Generation Module 1462 RF pulse generation module 1466 Unified Network 1468 load 1472 Synthesizer 1474 Modeling delay 1476 Adaptive Inverse Model Module 1610 Control Module 1612 Amplitude Control Module 1614 Impedance Control Module 1616 Rail Control Module 1620 Amplitude Controller 1622 Feedforward Adjustment Module 1624 Amplitude Model Module 1626 Frequency Controller 1628 Feedforward Frequency Adjustment Module 1630 Frequency Model Module 1632 Matching Network Controller 1634 Harmonized Network Coordination Module 1636 Harmonized Network Model Module 1638 Rail Controller 1640 Feedforward Rail Adjustment Module 1642 Rail Model Module

Claims

1. RF power source and The RF power source is coupled to an RF control module configured to generate at least one control signal for changing at least one of the RF output signal from the RF power source or the impedance between the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust the at least one control signal for changing at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal. An RF generator in which at least one of the amplitude, frequency, or impedance is adjusted according to a respective feedforward adjustment that changes according to a respective detected pulse parameter detected between a matching network and the load.

2. The RF generator according to claim 1, wherein each of the feedforward adjustments changes at least one of the amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, or reflection coefficient.

3. The RF generator according to claim 2, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

4. The RF generator according to claim 3, wherein each of the feedforward adjustments changes at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

5. The RF generator according to claim 1, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

6. The RF generator according to claim 1, wherein the RF control module is further configured to further adjust at least one of the amplitude, frequency, or impedance according to an RF parameter detected between the RF power source and the matching network, and the at least one of the amplitude, frequency, or impedance is further adjusted according to the respective feedback signals that vary according to the RF parameter.

7. The RF generator according to claim 1, wherein the RF control module further comprises a setpoint modifier, the setpoint modifier is configured to receive a requested pulse shape including pulse setpoint parameters, receive each of the detected pulse parameters, and adjust the pulse setpoint parameters according to each of the detected pulse parameters to output an adjusted pulse shape.

8. The RF generator according to claim 7, wherein the RF control module further comprises a pulse combiner, the pulse combiner configured to receive the adjusted pulse shape and output a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile including RF parameter setpoints for controlling the RF power source.

9. The RF generator according to claim 8, wherein the at least one control signal changes according to the RF parameter setting value for controlling the RF power source.

10. The RF generator according to claim 9, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

11. The RF generator according to claim 10, wherein each of the feedforward adjustments changes the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

12. The RF generator according to claim 11, wherein the RF control module is further configured to further adjust at least one of the amplitude, frequency, or impedance according to an RF parameter detected between the RF power source and the matching network, the amplitude, frequency, or impedance being adjusted according to the respective feedback signals that vary according to the RF parameter.

13. The RF generator according to claim 1, wherein each of the detected pulse parameters is communicated between the matched sensor and the RF control module using either an analog or digital communication link.

14. The RF generator according to claim 13, wherein the digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), a fiber optic link, or a Gigabit transceiver data link.

15. The RF generator according to claim 1, wherein each of the feedforward adjustments is determined according to a parameter generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load.

16. A non-temporary computer-readable medium for storing instructions, wherein the instructions are To generate an RF output signal to the load, To generate at least one control signal for changing the impedance between the RF output signal or the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal. To control the shape of the pulse signal, the at least one control signal is adjusted to change the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load. A non-temporary computer-readable medium comprising adjusting the amplitude, frequency, or impedance of at least one of the pulse parameters detected between a matched network and a load, according to a feedforward adjustment that changes according to the respective pulse parameters detected between the matched network and the load.

17. The non-transient computer-readable medium according to claim 16, wherein each of the feedforward adjustments changes at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transmitted power, reflected power, or reflection coefficient.

18. The non-transient computer-readable medium according to claim 17, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

19. The non-transient computer-readable medium according to claim 18, wherein each of the feedforward adjustments changes the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

20. The non-transient computer-readable medium according to claim 19, wherein the instruction further comprises adjusting at least one of the amplitude, frequency, or impedance of the RF signal according to an RF parameter detected between the RF power source and the matching network, and the amplitude, frequency, or impedance of the RF signal is further adjusted according to the respective feedback signals which vary according to the RF parameter detected between the matching network and the load.

21. The RF generator according to claim 1, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

22. The non-temporary computer-readable medium according to claim 16, wherein the instruction further comprises receiving a requested pulse shape including at least one pulse setpoint parameter, receiving each of the pulse parameters, and adjusting the at least one pulse setpoint parameter according to each of the pulse parameters to output an adjusted pulse shape.

23. The non-temporary computer-readable medium according to claim 22, wherein the instruction further comprises receiving the adjusted pulse shape and outputting a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile comprising RF parameter setpoints for controlling an RF power source.

24. The non-transient computer-readable medium according to claim 23, wherein the at least one control signal changes according to the RF parameter setting value for controlling the RF power source.

25. The non-transient computer-readable medium according to claim 24, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source, and each of the feedforward adjustments changes at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

26. The non-transient computer-readable medium according to claim 25, further comprising adjusting at least one of the amplitude, frequency, or impedance according to RF signal parameters detected between the RF power source and the matching network, wherein the amplitude, frequency, or impedance is adjusted according to a feedback signal that changes according to RF parameters detected between the matching network and the load.

27. The non-transient computer-readable medium according to claim 16, further comprising the instruction communicating the respective pulse parameters detected between the matched network and the load between the post-matched sensor and the RF control module using either an analog or digital communication link.

28. The non-transient computer-readable medium according to claim 27, wherein the digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), an optical fiber, or a Gigabit transceiver data link.

29. The non-temporary computer-readable medium according to claim 16, wherein the instruction further comprises determining the respective feedforward adjustments according to parameters generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load.

30. A method for controlling RF signals, The steps include generating an RF output signal to the load, A step of generating a control signal for changing the RF output signal, the step of including an RF signal which is modulated by a pulse signal, The steps include adjusting the control signal to change at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal, A method comprising the steps of adjusting the amplitude, frequency, or impedance of the matching network and the load in accordance with a feedforward adjustment which changes according to a respective pulse parameter detected between the matching network and the load.

31. The method according to claim 30, further comprising the step of varying the amplitude, frequency, or impedance according to one of forward power, reverse power, transfer power, or reflection coefficient.

32. The method according to claim 31, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source.

33. The method according to claim 32, wherein each of the feedforward adjustments changes at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source.

34. The method according to claim 33, further comprising the step of adjusting the amplitude, frequency, or impedance of at least one of the RF signal parameters detected between the RF power source and the matching network, wherein the amplitude, frequency, or impedance of at least one of the RF parameters is further adjusted according to a feedback signal that changes according to the respective RF parameters detected between the matching network and the load.

35. The RF generator according to claim 1, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

36. The method according to claim 30, further comprising the steps of: receiving a requested pulse shape including at least one pulse setting parameter; receiving each of the pulse parameters; and adjusting the at least one pulse setting parameter according to each of the pulse parameters to output an adjusted pulse shape.

37. The method according to claim 36, further comprising the steps of receiving the adjusted pulse shape and outputting a pulse setpoint profile according to the adjusted pulse shape, wherein the pulse setpoint profile includes at least one RF parameter setpoint for controlling an RF power source.

38. The method according to claim 30, further comprising the step of communicating the respective pulse parameters detected between the matched network and the load between post-matched sensors using either an analog or digital communication link.

39. The method according to claim 30, further comprising the step of determining each feedforward adjustment according to parameters generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as it propagates to the load.

40. RF power source and An RF control module coupled to the RF power source and configured to generate at least one control signal for changing at least one of the RF output signal output by the RF power source or the impedance between the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust the at least one control signal for changing at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal, The RF control module and a digital communication link between a sensor disposed between a matched network and a load, wherein each detected pulse parameter detected by the sensor is communicated from the sensor to the RF power source via the digital communication link. An RF generator in which at least one of the amplitude, frequency, or impedance is adjusted according to a feedforward adjustment that changes according to the respective detected pulse parameter.

41. The RF generator according to claim 40, wherein each of the feedforward adjustments changes at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transfer power, or reflection coefficient.

42. The RF generator according to claim 41, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

43. The RF generator according to claim 42, wherein each of the feedforward adjustments changes at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

44. The RF generator according to claim 40, wherein the RF control module is further configured to further adjust at least one of the amplitude, frequency, or impedance according to RF signal parameters detected between the RF power source and the matching network, and the at least one of the amplitude, frequency, or impedance is adjusted according to at least one feedback signal which changes according to RF parameters detected between the matching network and the load.

45. The RF generator according to claim 40, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

46. The RF generator according to claim 40, wherein the RF control module further comprises a setpoint modifier, the setpoint modifier is configured to receive a requested pulse shape including at least one pulse setpoint parameter, receive each of the detected pulse parameters, and adjust the at least one pulse setpoint parameter according to each of the detected pulse parameters to output an adjusted pulse shape.

47. The RF generator according to claim 46, wherein the RF control module further comprises a pulse combiner, the pulse combiner configured to receive the adjusted pulse shape and output a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile including RF parameter setpoints for controlling the RF power source.

48. The RF generator according to claim 47, wherein the at least one control signal changes according to the RF parameter setting value for controlling the RF power source.

49. The RF generator according to claim 48, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

50. The RF generator according to claim 49, wherein each of the feedforward adjustments changes at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

51. The RF generator according to claim 50, wherein the RF control module is further configured to further adjust at least one of the amplitude, frequency, or impedance of the RF signal according to an RF signal parameter detected between the RF power source and the matching network, and the amplitude, frequency, or impedance of the RF signal is adjusted according to the respective feedback signals which vary according to the RF parameter detected between the matching network and the load.

52. The RF generator according to claim 40, wherein the digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), an optical fiber, or a Gigabit transceiver data link.

53. The RF generator according to claim 40, wherein each of the feedforward adjustments is determined according to a parameter generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as the pulse signal propagates from the RF generator to the load.

54. A non-temporary computer-readable medium for storing instructions, wherein the instructions are To generate an RF output signal to the load, To generate at least one control signal for changing the impedance between the RF output signal or the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal. A step of digitally communicating pulse parameters detected by a sensor disposed between a matched network and a load, wherein the pulse parameters are communicated from the sensor to an RF power source via a digital communication link. To control the shape of the pulse signal, adjust the at least one control signal for changing the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load, A non-temporary computer-readable medium comprising adjusting the amplitude, frequency, or impedance according to each feedforward adjustment that changes according to the pulse parameters.

55. The non-transient computer-readable medium according to claim 54, wherein each of the feedforward adjustments changes at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transmitted power, reflected power, or reflection coefficient.

56. The non-transient computer-readable medium according to claim 55, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

57. The non-transient computer-readable medium according to claim 56, wherein each of the feedforward adjustments changes the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

58. The non-transient computer-readable medium according to claim 57, wherein the instruction further comprises adjusting at least one of the amplitude, frequency, or impedance of the RF signal according to RF signal parameters detected between the RF power source and the matching network, and the amplitude, frequency, or impedance of the RF signal is further adjusted according to respective feedback signals that vary according to RF parameters detected between the matching network and the load.

59. The non-temporary computer-readable medium according to claim 54, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

60. The non-temporary computer-readable medium according to claim 54, wherein the instruction further comprises receiving a requested pulse shape including at least one pulse setpoint parameter, receiving the pulse parameter, and adjusting the at least one pulse setpoint parameter according to the pulse parameter to output an adjusted pulse shape.

61. The non-temporary computer-readable medium according to claim 60, wherein the instruction further comprises receiving the adjusted pulse shape and outputting a pulse setpoint profile according to the adjusted pulse shape, the pulse setpoint profile comprising at least one RF parameter setpoint for controlling an RF power source.

62. The non-transient computer-readable medium according to claim 61, wherein the at least one control signal changes according to the at least one RF parameter setting for controlling the RF power source.

63. The non-transient computer-readable medium according to claim 62, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source, and each of the feedforward adjustments changes at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

64. The non-transient computer-readable medium according to claim 63, further comprising adjusting at least one of the amplitude, frequency, or impedance according to RF signal parameters detected between the RF power source and the matching network, wherein the amplitude, frequency, or impedance is adjusted according to a feedback signal that changes according to RF parameters detected between the matching network and the load.

65. The non-temporary computer-readable medium according to claim 54, wherein the instruction further comprises communicating the pulse parameters detected between the matched network and the load between the post-matched sensor and the RF control module using a digital communication link.

66. The non-transient computer-readable medium according to claim 54, wherein the digital communication link includes at least one of a system bus data link, an Ethernet industrial bus, a Transmit Control Protocol (TCP), a User Data Link Protocol (UDP), an optical fiber, or a Gigabit transceiver data link.

67. The non-transient computer-readable medium according to claim 54, wherein the instruction further comprises determining the respective feedforward adjustments according to parameters generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as the pulse signal propagates to the load.

68. A method for controlling RF signals, The steps include generating an RF output signal to the load, A step of generating a control signal for changing the RF output signal, the step of including an RF signal which is modulated by a pulse signal, A step of digitally communicating each pulse parameter detected by a sensor disposed between a matched network and a load, wherein each pulse parameter is communicated from the sensor to an RF power source via a digital communication link. The steps include adjusting the control signal to change at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal, A method comprising the step of adjusting the amplitude, frequency, or impedance of the pulse signal according to each feedforward adjustment which varies according to each of the pulse parameters.

69. The method according to claim 68, further comprising the step of varying the amplitude, frequency, or impedance according to one of forward power, reverse power, transmitted power, reflected power, or reflection coefficient.

70. The method according to claim 69, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source.

71. The method according to claim 70, wherein each of the feedforward adjustments changes at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source.

72. The method according to claim 71, further comprising the step of adjusting the amplitude, frequency, or impedance of at least one of the RF signal parameters detected between the RF power source and the matching network, wherein the amplitude, frequency, or impedance of at least one of the RF signal parameters is adjusted according to the respective feedback signals which vary according to the respective RF parameters detected between the matching network and the load.

73. The method according to claim 68, further comprising the steps of: receiving a requested pulse shape including at least one pulse setting parameter; receiving each of the pulse parameters; and adjusting the at least one pulse setting parameter according to each of the pulse parameters to output an adjusted pulse shape.

74. The method according to claim 73, further comprising the steps of receiving the adjusted pulse shape and outputting a pulse setpoint profile according to the adjusted pulse shape, wherein the pulse setpoint profile includes at least one RF parameter setpoint for controlling an RF power source.

75. The method according to claim 68, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

76. The method according to claim 68, further comprising the step of using one of the digital communication links to communicate the respective pulse parameters detected between the matched network and the load between the post-matched sensor and the RF control module.

77. The method of claim 68, further comprising the step of determining each feedforward adjustment according to parameters generated by one of a plant model or inverse plant model that describes the variation of the pulse signal as it propagates to the load.

78. RF power source and An RF control module coupled to the RF power source and configured to generate at least one control signal for changing at least one of the RF output signal output by the RF power source or the impedance between the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal, and the RF control module is further configured to adjust the at least one control signal for changing at least one of the amplitude or frequency of the RF output signal or the impedance between the RF power source and the load in order to control the shape of the pulse signal, It comprises either a plant model module or an inverse plant model module, At least one of the amplitude, frequency, or impedance of the pulse signal is adjusted according to the respective feedforward signals which change according to the respective pulse parameters detected between the matched network and the load. An RF generator in which each of the aforementioned feedforward signals is determined according to parameters generated by one of the plant model modules or the inverse plant model modules.

79. The plant model module generates a plant model according to the fluctuations of the pulse signal introduced by the plant, The RF generator according to claim 78, wherein the inverse plant model module generates an inverse plant model according to the inverse of the variation of the pulse signal introduced by the plant.

80. The RF generator according to claim 79, wherein the plant model module receives a pulse profile from the RF control module and the difference between the modeled pulse profile output by the plant model module and the respective pulse parameters.

81. The RF generator according to claim 80, further comprising a delay module disposed between the RF control module and the plant model module, wherein the delay module introduces a predetermined delay in the pulse signal in order to synchronize the modeled pulse profile output by the plant model module with the pulse signal.

82. The RF generator according to claim 79, wherein the inverse plant model module receives the respective pulse parameters and the difference between the pulse profile from the RF control module and the modeled adaptive inverse pulse profile output by the inverse plant model module.

83. The RF generator according to claim 82, wherein the RF control module includes a copy of the inverse plant model generated by the inverse plant model module, and each of the feedforward signals applies the inverse of the plant model to the pulse signal.

84. The RF generator according to claim 79, wherein each of the feedforward signals varies at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transfer power, reflected power, or reflection coefficient.

85. The RF generator according to claim 84, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

86. The RF generator according to claim 85, wherein each of the feedforward signals changes at least one of the amplitude of the control signal or the amplitude of the rail voltage applied to the RF power source.

87. The RF generator according to claim 86, wherein the RF control module is further configured to further adjust at least one of the amplitude, frequency, or impedance of the RF signal according to RF signal parameters detected between the RF power source and the matching network, and at least one of the amplitude, frequency, or impedance of the RF signal is adjusted according to the respective feedback signals which change according to RF parameters detected between the matching network and the load.

88. The RF generator according to claim 78, wherein each of the feedforward signals adjusts at least one of a setpoint or actuator.

89. The RF generator according to claim 78, wherein the respective pulse parameters detected between the matched network and the load are communicated between the post-matched sensor and the RF control module using a digital communication link.

90. A non-temporary computer-readable medium for storing instructions, wherein the instructions are To generate an RF output signal to the load, To generate at least one control signal for changing the impedance between the RF output signal or the RF power source and the load, wherein the RF output signal includes an RF signal modulated by a pulse signal. A step of detecting the respective pulse parameters between the matched network and the load, A step of determining each feedforward adjustment to the at least one control signal according to one of the plant models or inverse plant models, wherein the one of the plant models or inverse plant models changes according to the respective pulse parameters. A non-temporary computer-readable medium comprising the steps of applying the respective feedforward adjustments to the at least one control signal to change the amplitude, frequency, or impedance of the RF output signal in order to control the shape of the pulse signal.

91. The non-temporary computer-readable medium according to claim 90, wherein the plant model receives a pulse profile and the difference between the modeled pulse profile output by the plant model and the respective pulse parameters.

92. The non-temporary computer-readable medium according to claim 91, wherein the instruction further delays the pulse profile to synchronize it with the modeled pulse profile.

93. The non-temporary computer-readable medium according to claim 90, wherein the inverse plant model receives the respective pulse parameters and the difference between the pulse profile and the modeled adaptive inverse pulse profile output by the inverse plant model.

94. The non-temporary computer-readable medium according to claim 93, wherein the instruction further comprises copying the inverse plant model and changing the respective feedforward adjustments to apply the inverse of the plant model to the pulse signal.

95. The non-transient computer-readable medium according to claim 90, wherein each of the feedforward adjustments changes at least one of the amplitude, frequency, or impedance according to one of the forward power, reverse power, transmitted power, reflected power, or reflection coefficient.

96. The non-transient computer-readable medium according to claim 95, wherein the amplitude of the RF signal changes according to at least one of the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

97. The non-transient computer-readable medium according to claim 96, wherein each of the feedforward adjustments changes the amplitude of the at least one control signal or the amplitude of the rail voltage applied to the RF power source.

98. The non-transient computer-readable medium according to claim 97, further comprising adjusting at least one of the amplitude, frequency, or impedance according to an RF signal parameter detected between the RF power source and the matching network, wherein the amplitude, frequency, or impedance is adjusted according to the respective feedback signals which vary according to the RF parameter detected between the matching network and the load.

99. The non-temporary computer-readable medium according to claim 98, wherein each of the feedforward adjustments adjusts at least one of a setpoint or actuator.

100. The non-transient computer-readable medium according to claim 90, wherein the respective pulse parameters detected between the matched network and the load are communicated between the post-matched sensor and the RF control module using a digital communication link.

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