Plasma water generator

Abstract

To improve the sterilization effect compared to conventional technology. [Solution] The plasma water generating device comprises a generating unit that generates microbubble-like plasma water, a storage unit that stores the generated plasma water, a regenerating unit that generates the stored plasma water again in the form of microbubbles, a circulation unit that circulates the plasma water that has been regenerated in the form of microbubbles back to the generating unit, and a plasma water supply unit that supplies the plasma water that has been circulated and stored in the storage unit to the cultivation target.

Description

Technical Field

[0001] The technology of the present disclosure relates to a plasma water generation device.

Background Art

[0002] Patent Document 1 discloses a system for generating a solution. In this system, a fluid such as water is passed through a plasma gas from a nozzle, sprayed so as to be activated, and stored in a first container. The activated fluid stored in the first container is sent to and stored in a second container. Nitrogen is further supplied to the second container. The solution in the second container is supplied to an object to sterilize the object.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] By the way, in the solution generated by supplying nitrogen to the fluid stored in the second container, the sterilization effect is small.

[0005] The technology of the present disclosure aims to provide a plasma water generation device capable of improving the sterilization effect more than the prior art.

Means for Solving the Problems

[0006] To achieve the above objective, a plasma water generating apparatus according to a first aspect of the technology disclosed herein comprises: a generating unit that generates microbubble plasma water; a storage unit that stores the generated plasma water; a regenerating unit that generates the stored plasma water again in the form of microbubbles; a circulation unit that circulates the plasma water that has been regenerated in the form of microbubbles back to the generating unit; and a plasma water supply unit that supplies the plasma water that has been circulated and stored in the storage unit to a cultivation target. [Effects of the Invention]

[0007] In a first aspect of the technology of this disclosure, plasma water that has been circulated through a generation unit, a storage unit, and a regeneration unit and stored in the storage unit, and then regenerated in a microbubble form, is supplied to the cultivation target, thereby improving the sterilization effect compared to the conventional technology. [Brief explanation of the drawing]

[0008] [Figure 1] Figure 1 is a schematic diagram showing an example of a plasma water generator 10 according to an embodiment. [Figure 2] Figure 2 is a block diagram of an example of the electrical system of the plasma water generator 10. [Figure 3] Figure 3 shows an example of the processing performed by the functional section of the CPU 52. [Figure 4] Figure 4 is a flowchart showing an example of a supply processing program executed by CPU 52. [Figure 5] Figure 5 is a schematic diagram showing an example of the first modified plasma water generator 10H1. [Figure 6] Figure 6 is a schematic diagram showing an example of a second modified plasma water generator 10H2. [Figure 7] Figure 7 is a schematic diagram showing an example of a third modified plasma water generator 10H3. [Modes for carrying out the invention]

[0009] Embodiments of the technology of this disclosure will be described below with reference to the drawings.

[0010] [Embodiment] (composition) Figure 1 is a schematic diagram showing an example of a plasma water generator 10 according to this embodiment. As shown in Figure 1, the plasma water generator 10 according to this embodiment comprises a microbubble mist generator 14 that generates microbubble-like plasma water, a storage tank 12 that stores the generated plasma water, and a cavitation generator 16 that regenerates the stored plasma water into microbubbles.

[0011] The plasma water generator 10 includes a circulation pipe 20 that circulates the plasma water, which has been regenerated in the form of microbubbles, to the microbubble mist generator 14, and a valve 22 that supplies the plasma water, which has been circulated and stored in the storage tank 12, to the cultivation target. The circulation pipe 20 is equipped with a pump 18 that sends out the plasma water, which has been regenerated in the form of microbubbles.

[0012] The objects of cultivation are, for example, plants.

[0013] The plasma water generator 10 includes a water supply device 26 that supplies water to the storage tank 12, and a liquid level sensor 24 that detects the height of the liquid level stored in the storage tank 12.

[0014] The microbubble mist generator 14 comprises a spraying device 14J that sprays water in microbubble form, an irradiation device 14P that irradiates with plasma, and a nitrogen supply device 14A that supplies nitrogen. The nitrogen supply device 14A supplies nitrogen by introducing air whose main component is nitrogen. The nitrogen supply device 14A supplies nitrogen to the water that has been sprayed in microbubble form by the spraying device 14J and irradiated with plasma, before the water is stored in the storage tank 12. Furthermore, the microbubble mist generator 14 is more preferably a structure that takes in outside air with an aspirator in order to suppress the reduction of oxygen concentration in the liquid.

[0015] The spraying device 14J includes a swirling flow method, a static mixer method, an ejector method, a Venturi method, a pressure dissolution method, a cavitation method, etc. The swirling flow method is a method of crushing bubbles by a high-speed swirling flow and generating fine bubbles in the liquid. The static mixer method is a method of pumping gas and liquid together into a flow path and generating fine bubbles by shearing the bubbles by obstacles or protrusions. The ejector method is a method of rapidly changing the pressure in the flow path and crushing the bubbles finely. The Venturi method is also a method of rapidly changing the pressure in the flow path and crushing the bubbles finely. The pressure dissolution method is a method of pressurizing the gas-liquid in the tank using a pump and dissolving the gas in the liquid in a supersaturated state. Then, the pressure is reduced to generate fine bubbles in the liquid. The cavitation method is a method that utilizes the cavitation phenomenon.

[0016] The irradiation device 14P is a method of applying power between a pair of opposing electrodes (anode and cathode) and generating plasma in the gap between the anode and the cathode. The nitrogen supply device 14A is a method of introducing air into micro-bubble water. It is also possible to directly introduce nitrogen gas. The introduction of air may be performed by a blower or by an aspirator. If it is an aspirator, since no power source is required, it is more energy-saving. The air introduced from the nitrogen supply device 14A into the micro-bubble water becomes bubbles and mixes into the water. Incidentally, it may further include a shock wave generation unit, and the micro-bubble water may be formed into ultra-fine bubbles by the shock wave. By introducing nitrogen in the air into the micro-bubble water, plasma water containing nitrate nitrogen can be produced.

[0017] When the cavitation generator 16 stirs the plasma water using an impeller (centrifugal pump), it creates a pressure difference in the plasma water by high-speed rotation or oscillation, thereby generating small bubbles (cavities) in the plasma water (cavitation phenomenon). Thereby, the plasma water is regenerated into micro-bubble form again.

[0018] The microbubble mist generator 14, the storage tank 12, and the cavitation generator 16 are each an example of the "generation unit", "storage unit", and "regeneration unit" of the technology of the present disclosure. The valve 22 and the pump 18 are an example of the "plasma water supply unit" of the technology of the present disclosure. The circulation pipe 20 and the pump 18 are an example of the "circulation unit" of the technology of the present disclosure. The spraying device 14J, the irradiation device 14P, and the nitrogen supply device 14A are each an example of the "spraying unit", "irradiation unit", and "nitrogen supply unit" of the technology of the present disclosure.

[0019] The "regeneration unit" is not limited to the cavitation generator 16 that uses an impeller (rotary vane). For example, first, a device that generates high-frequency sound waves in plasma water using an ultrasonic device to cause local pressure fluctuations in the plasma water and generate cavities in the plasma water, or second, a device that generates cavities in the plasma water by flowing water at high speed to reduce the local pressure in the plasma water may also be used. Devices for microbubbling water other than cavitation include, first, a device that injects compressed air into plasma water using a fine nozzle (the air disperses as microbubbles when it exits the nozzle), and second, a device that generates fine bubbles of oxygen and hydrogen in water by passing an electric current through the water for electrolysis (these bubbles become microbubbles).

[0020] FIG. 2 is a block diagram of an example of the electrical system of the plasma water generator 10. As shown in FIG. 2, the plasma water generator 10 includes a computer 50. The computer 50 includes a CPU 52, a RAM 54, a NVM 56, and an input / output (I / O port) 58. The CPU 52, the RAM 54, the NVM 56, and the input / output (I / O port) 58 are communicably connected to each other by a bus 60.

[0021] The RAM 54 is a memory in which information is temporarily stored and is used as a work memory by the CPU 52. Examples of the RAM 54 include DRAM (Dynamic Random Access Memory) or SRAM (Static Random Access Memory).

[0022] NVM56 is a non-volatile memory that stores various programs and parameters. An example of NVM56 is flash memory (e.g., EEPROM (Electrically Erasable and Programmable Read Only Memory)). The supply processing program 56P (see Figure 4) is stored in NVM56.

[0023] The functional units of the CPU 52 include a valve control processing unit 52A, a water supply processing unit 52B, an intake unit 52C, a determination unit 52D, and an operation processing unit 52E. The CPU 52 reads a supply processing program 56P from the NVM 56 and performs the supply processing by executing the read supply processing program 56P on the RAM 54. The CPU 52 operates as the valve control processing unit 52A, the water supply processing unit 52B, the intake unit 52C, the determination unit 52D, and the operation processing unit 52E according to the supply processing program 56P executed on the RAM 54.

[0024] The input / output (I / O port) 58 is connected to a valve 22, a water supply device 26, a liquid level sensor 24, a microbubble mist generator 14, a cavitation generator 16, a pump 18, and an input device 40. The input device 40 consists of an operation panel and the like, and is equipped with various instruction buttons to input instructions.

[0025] Figure 3 shows an example of the processing performed by the functional section of the CPU 52.

[0026] The valve control processing unit 52A closes the valve 22. The water supply processing unit 52B controls the water supply device 26 so that water is supplied to the storage tank 12. The intake unit 52C detects the liquid level of the water stored in the storage tank 12 from the liquid level sensor 24. The determination unit 52D determines whether a predetermined amount of water has been stored in the storage tank 12. If it is determined that a predetermined amount of water has been stored in the storage tank 12, the water supply processing unit 52B controls the water supply device 26 so that the supply of water to the storage tank 12 is stopped.

[0027] The operation processing unit 52E operates the microbubble mist generator 14, the cavitation generator 16, and the pump 18. Plasma water circulates through the cavitation generator 16 and the microbubble mist generator 14. The determination unit 52D determines whether the nitrite concentration of the plasma water stored in the storage tank 12 is at a predetermined concentration suitable for hydroponics. If this is confirmed, the valve control processing unit 52A opens the valve 22. As a result, plasma water with a nitrite concentration at a predetermined concentration suitable for hydroponics is supplied from the cavitation generator 16 and the pump 18 to the hydroponically grown plants via the valve 22.

[0028] (action) Figure 4 is a flowchart showing an example of a supply processing program 56P executed by the CPU 52. When the CPU 52 executes the supply processing program 56P, the supply processing and the soiled supply processing method are performed.

[0029] In step 102, the valve control processing unit 52A closes the valve 22.

[0030] In step 104, the water supply processing unit 52B controls the water supply device 26 so that water is supplied to the storage tank 12.

[0031] In step 106, the intake unit 52C detects the liquid level of the water stored in the storage tank 12 from the liquid level sensor 24.

[0032] In step 108, the determination unit 52D determines whether a predetermined amount of water has been stored in the storage tank 12. If it is determined that a predetermined amount of water has not been stored in the storage tank 12, the supply process returns to step 106 to detect the liquid level of the water stored in the storage tank 12. If it is determined that a predetermined amount of water has been stored in the storage tank 12, the supply process proceeds to step 110. Alternatively, the liquid level sensor 24 may be omitted, and the determination of whether a predetermined amount of water has been stored in the storage tank 12 may be made based on the amount of water supplied per unit time from the water supply device 26, the supply time, and the internal shape of the storage tank 12.

[0033] In step 110, the water supply processing unit 52B controls the water supply device 26 so that the supply of water to the storage tank 12 is stopped.

[0034] In step 112, the operation processing unit 52E operates the microbubble mist generator 14, the cavitation generator 16, and the pump 18.

[0035] The cavitation generator 16 regenerates the plasma water stored in the storage tank 12 into microbubbles and sends it to the pump 18. The pump 18 sends the plasma water from the cavitation generator 16 to the microbubble mist generator 14 via the circulation pipe 20. The nitrogen supply device 14A of the microbubble mist generator 14 supplies nitrogen to the spraying device 14J. The spraying device 14J sprays the plasma water sent from the pump 18 into microbubbles together with the nitrogen supplied from the spraying device 14J. The irradiation device 14P irradiates the plasma water sprayed into microbubbles by the spraying device 14J with plasma. Plasma is irradiated onto the plasma water, which is sprayed in microbubble form along with nitrogen, so that the nitrogen is fixed to the plasma water. The plasma water, which is sprayed in microbubble form and irradiated with plasma, is dispersed in a mist-like manner into the gas layer space of the storage tank 12. The plasma water is then accumulated in the water layer of the storage tank 12. The cavitation generator 16 generates the plasma water accumulated in the water layer of the storage tank 12 into microbubbles again and sends it to the pump 18. The pump 18 sends the plasma water sent from the cavitation generator 16 to the microbubble mist generator 14 via the circulation pipe 20.

[0036] In this way, in the plasma water generator 10, the operation of the pump 18 causes the plasma water to circulate through the cavitation generator 16 and the microbubble mist generator 14. Specifically, the plasma water stored in the storage tank 12 is regenerated in the form of microbubbles by the cavitation generator 16 (regeneration). Nitrogen is supplied to the plasma water regenerated in the form of microbubbles by the nitrogen supply device 14A (nitrogen supply). The plasma water supplied with nitrogen is sprayed in the form of microbubbles by the spraying device 14J (spraying). Plasma is irradiated onto the plasma water sprayed in the form of microbubbles by the irradiation device 14P (plasma irradiation). Then, regeneration, nitrogen supply, spraying, and plasma irradiation are repeated. Nitrogen can be supplied either into the storage tank 12, as detailed in Figure 5 described later, or it can be supplied to the circulation piping 20 using the aspirator effect. When supplied to the circulation piping 20 and then to the microbubble mist generator 14, and passed through the plasma gas, nitrite is more easily formed.

[0037] As the plasma water circulates through the cavitation generator 16 and the microbubble mist generator 14, after a predetermined time has elapsed since the start of the process in step 112, the nitrite concentration of the plasma water stored in the storage tank 12 reaches a predetermined concentration suitable for hydroponics.

[0038] Therefore, in step 114, the determination unit 52D determines whether or not the predetermined time has elapsed since the start of processing in step 112.

[0039] If it is determined that the predetermined time has not elapsed since the start of the process in step 112, the nitrite concentration of the plasma water stored in the storage tank 12 is not at a predetermined concentration suitable for hydroponics, and the supply process returns to step 114. This repeats the above cycle.

[0040] If it is determined that the predetermined time has elapsed since the start of the process in step 112, the nitrite concentration of the plasma water stored in the storage tank 12 has reached a predetermined concentration suitable for hydroponics, and the supply process proceeds to step 116.

[0041] In step 116, the valve control unit 52A opens the valve 22. As a result, plasma water with a nitrite concentration suitable for hydroponics is supplied from the cavitation generator 16 and pump 18 to the hydroponically grown plants via the valve 22.

[0042] In step 118, the determination unit 52D determines whether a predetermined supply time has elapsed since the valve 22 was opened in step 116, during which all (or almost all) of the plasma water stored in the storage tank 12 is supplied to the target for cultivation.

[0043] If it is determined that the above-mentioned supply time has not elapsed since valve 22 was opened in step 116, the supply process returns to step 118. As a result, valve 22 remains open, and plasma water continues to be supplied to the hydroponically grown plants.

[0044] If it is determined that the above-mentioned supply time has elapsed since the valve 22 was opened in step 116, then all (or almost all) of the plasma water stored in the storage tank 12 has been supplied to the cultivation target, and the supply process proceeds to step 120. In step 120, the operation processing unit 52E stops the operation of the microbubble mist generator 14, the cavitation generator 16, and the pump 18, and in step 122, the determination unit 52D determines whether or not to stop the supply process by determining whether or not a stop instruction for the supply process has been input from the input device.

[0045] If it is determined that this supply process should not be stopped, the supply process returns to step 122 and repeats the above process (steps 102 to 122).

[0046] If it is determined that this supply process should be stopped, this supply process will be terminated.

[0047] (effect) As described above, in this embodiment, the plasma water generator 10 circulates the plasma water, which has been regenerated in the form of microbubbles, to the microbubble mist generator 14. Furthermore, the plasma water generator 10 regenerates the plasma water, which has been circulated and stored in the storage tank 12, into microbubbles again and supplies it to the crop to be cultivated. Therefore, this embodiment can improve the sterilization effect compared to the conventional technology.

[0048] By the way, when plasma water generated in the form of microbubbles by the microbubble mist generator 14 is stored in the storage tank 12, the bubbles gradually dissipate over time, and the plasma water generated in the form of microbubbles becomes plasma water without bubbles. Even if such plasma water is supplied to the plants being cultivated, the plasma water is not easily absorbed by the roots of the plants being cultivated.

[0049] In contrast, the plasma water generator 10 of this embodiment circulates plasma water through a cavitation generator 16 and a microbubble mist generator 14, and supplies the plasma water, which is then regenerated into a more microbubble form, to the target of cultivation. Therefore, it is possible to generate plasma water that is more easily absorbed by the roots of the target of cultivation, such as plants.

[0050] Furthermore, the nitrogen supply device 14A supplies nitrogen to the plasma water by introducing air whose main component is nitrogen. Therefore, this embodiment can generate plasma water that serves as fertilizer for plants and other cultivated objects. Moreover, the plasma water, which has been regenerated in a microbubble form and whose nitrite concentration is suitable for hydroponic cultivation, is supplied to the cultivated objects. Therefore, this embodiment can promote the growth of cultivated objects.

[0051] In this embodiment, the plasma water, which is regenerated in the form of microbubbles by the cavitation generator 16, is circulated to the microbubble mist generator 14 via the circulation pipe 20. Therefore, compared to the conventional technology which has a first container and a second container, the plasma water generator 10 of this embodiment can be made smaller overall, resulting in space savings and cost reduction.

[0052] In the above embodiment, by determining whether a predetermined time has elapsed since the start of processing in step 112, it is determined whether the nitrite concentration of the plasma water stored in the storage tank 12 has reached a predetermined concentration suitable for hydroponics.

[0053] Incidentally, while it is possible to determine whether the nitrite concentration of the plasma water stored in the storage tank 12 has reached a suitable concentration for hydroponics based on the value detected by the concentration sensor, in this embodiment, the concentration sensor can be made unnecessary, and the plasma water generator 10 can be further simplified.

[0054] Furthermore, when determining whether the nitrite concentration of the plasma water stored in the storage tank 12 has reached a suitable concentration for hydroponics based on the value detected by the concentration sensor, it is possible to determine more accurately whether the nitrite concentration of the plasma water stored in the storage tank 12 has reached a suitable concentration for hydroponics than when determining whether a predetermined time has elapsed as described above.

[0055] In this embodiment, the water is sprayed in microbubble form along with nitrogen by the spraying device 14J, and before it is stored in the storage tank 12, it is irradiated with plasma, so that it can be easily converted into plasma water and nitrogen can be fixed into the plasma water.

[0056] In this embodiment, water with nitrogen fixed in it is sprayed in a microbubble form, allowing the storage tank 12 to store plasma water more uniformly.

[0057] [Differentiation] Next, various modifications will be described. Since each modification is substantially the same as the configuration of the above embodiment, the same reference numerals are used for the same parts, and their descriptions are omitted. The differences will be described primarily.

[0058] <First variation> The first modification has substantially the same configuration as the above embodiment and has substantially the same function as the above embodiment, so the differences will be explained.

[0059] (composition) Figure 5 is a schematic diagram showing an example of the first modified plasma water generator 10H1.

[0060] In the above embodiment, the microbubble mist generator 14 comprises a spraying device 14J, an irradiation device 14P, and a nitrogen supply device 14A.

[0061] In contrast, in the first modified version, the microbubble mist generator 14H1 does not include a nitrogen supply device 14A and an irradiation device 14P. The storage tank 12 has an air layer and a pair of electrodes 31P1 and 31P2 having a dielectric barrier. Plasma gas 31PG is generated in the pair of electrodes 31P1 and 31P2. The nitrogen supply device 14H1 is positioned on the side of the storage tank 12 and supplies nitrogen to the air layer of the storage tank 12 from the side of the storage tank 12.

[0062] (action) The microbubble mist generator 14H1 sprays water, which has been atomized into microbubbles by the spraying device 14J, onto the plasma gas 31PG generated between a pair of electrodes 31P1 and 31P2.

[0063] The nitrogen supply device 14H1 supplies nitrogen to the microbubble-like plasma water that has passed through the plasma gas 31PG. As nitrogen is supplied to the plasma water, it settles into the plasma water.

[0064] The microbubble-like plasma water, into which nitrogen has been immobilized, is stored in the storage tank 12.

[0065] (effect) The first modification has substantially the same configuration as the above embodiment and has the same function as the above embodiment, and therefore produces substantially the same effects as the above embodiment.

[0066] In the first modification, the microbubble mist generator 14 does not include the irradiation device 14P and the nitrogen supply device 14A. Therefore, in the first modification, the microbubble mist generator 14H1 can be made smaller than the microbubble mist generator 14 of the above embodiment.

[0067] In the first modified example, water is sprayed onto the plasma gas generated between the pair of electrodes, allowing water molecules to react with the plasma without leakage, thus promoting the generation of microbubble-like plasma water more effectively than in the above embodiment.

[0068] In the first modification, nitrogen is supplied after the water passes through the plasma gas, so the nitrogen concentration can be adjusted, and the nitrite concentration of the plasma water can be reached at a concentration suitable for hydroponics more quickly than in the above embodiment.

[0069] <Second variation> The second modification has substantially the same configuration and function as the first modification, so we will explain the differences.

[0070] (composition) Figure 6 is a schematic diagram showing an example of a second modified plasma water generator 10H2.

[0071] In the first modification, the nitrogen supply device 14A is positioned on the side of the storage tank 12 and supplies nitrogen to the air layer of the storage tank 12 from the side of the storage tank 12.

[0072] In contrast, in the second modification, the nitrogen supply device 14H2 is positioned at the bottom of the storage tank 12 and supplies nitrogen to the liquid layer of the storage tank 12 from the bottom of the storage tank 12. Specifically, the nitrogen supply device 14H2 supplies nitrogen to the region where cavitation is generated by the cavitation generator 16 (the region where the impeller rotates).

[0073] (action) The nitrogen supply device 14H2 supplies nitrogen to the liquid layer of the storage tank 12 from the bottom of the storage tank 12, into the area where cavitation is generated by the cavitation generator 16. The cavitation generator 16 generates cavitation to include the supplied nitrogen, and regenerates the stored plasma water in the form of microbubbles.

[0074] (effect) The second modification has substantially the same configuration as the above embodiment and has the same function as the above embodiment, and therefore produces substantially the same effects as the above embodiment.

[0075] In the second modification, nitrogen is supplied to the stored plasma water from the bottom of the storage tank that stores the microbubble-like plasma water, so that the nitrogen supplied to the storage tank continuously reacts with the already stored plasma water. Therefore, in the second modification, the fixation of nitrogen to the plasma water can be made stronger than in the above embodiment and the first modification.

[0076] In the second modification, the nitrogen supply device 14H2 supplies nitrogen to the region where cavitation is generated by the cavitation generator 16 (the region where the impeller rotates), so that plasma water with more nitrogen fixed can be supplied to the crop.

[0077] <Third variation> The third modification has substantially the same configuration and function as the second modification, so we will explain the differences.

[0078] (composition) Figure 7 is a schematic diagram showing an example of a plasma water generator 10H3 of the third modified example. In the second modified example, a pair of electrodes 31P1 and 31P2 having a dielectric barrier are provided in the air layer of the storage tank 12, and a plasma gas 31PG is generated in the air layer.

[0079] In contrast, in the third modified example, the liquid layer of the storage tank 12 is equipped with a pair of electrodes 31P1 and 31P2 having a dielectric barrier, and plasma gas 31PG is generated in the plasma water.

[0080] (action) Plasma gas is supplied to the region in the microbubble-like plasma water stored in the storage tank 12 where the cavitation generator 16 generates cavitation. Because plasma gas is directly supplied to the region where cavitation is occurring, the bubbles produced by cavitation and the plasma gas interact with each other.

[0081] (effect) The third modification has substantially the same configuration as the above embodiment and has the same function as the above embodiment, and therefore produces substantially the same effects as the above embodiment.

[0082] In the third modification, plasma gas is supplied to the region in the microbubble-like plasma water stored in the storage tank 12 where the cavitation generator 16 generates cavitation. Therefore, nitrogen and plasma gas are supplied to the region in the microbubble-like plasma water where cavitation occurs. Thus, in the third modification, microbubble-like plasma water with more nitrogen fixed can be supplied to the cultivation target.

[0083] <Other variations> The microbubble mist generator 14 in Figure 1 may be configured as a shower head equipped with a spraying device 14J and an irradiation device 14P. Since the microbubble mist generator 14 is configured as a shower head in this way, the microbubble mist generator 14 can be made into a simpler device.

[0084] [Note] Based on the above disclosures, the following addendum is proposed.

[0085] (Note 1) A generation unit that generates microbubble-like plasma water, A storage unit for storing the generated plasma water, A regeneration unit that generates the stored plasma water again in the form of microbubbles, A circulation unit that circulates the plasma water, which has been regenerated in the form of microbubbles, to the generation unit, A plasma water supply unit that supplies the plasma water, which has been circulated and stored in the storage unit, to the cultivation target, A plasma water generator equipped with the following features.

[0086] (Note 2) The generation unit supplies nitrogen to the plasma water. The plasma water generator described in Appendix 1.

[0087] (Note 3) The plasma water supply unit supplies the plasma water to the cultivation target when the concentration of nitrite in the plasma water stored in the storage unit reaches a predetermined value. The plasma water generator described in Appendix 2.

[0088] (Note 4) The plasma water supply unit supplies the plasma water to the cultivation target when it is determined that the nitrite concentration of the plasma water stored in the storage unit has reached a predetermined value, based on the value detected by the detection unit for detecting the nitrite concentration of the stored plasma water, or based on the time it takes for the generation unit to add nitrogen to the circulating plasma water. A plasma water generator as described in Appendix 2 or Appendix 3.

[0089] (Note 5) The generating unit is A spray unit that sprays water in a microbubble form, The irradiation unit that irradiates plasma, Equipped with, The irradiation unit irradiates the water sprayed in a microbubble shape by the spraying unit with plasma. A plasma water generator as described in any one of the appendices 1 to 4.

[0090] (Note 6) Equipped with a nitrogen supply unit that supplies nitrogen, The nitrogen supply unit supplies nitrogen to the water that has been sprayed in a microbubble form by the spraying unit and irradiated with plasma, either before it is stored in the storage unit or after it is stored in the storage unit. The plasma water generator described in Appendix 5.

[0091] (Note 7) Equipped with a nitrogen supply unit that supplies nitrogen, The nitrogen supply unit supplies nitrogen to the plasma water stored in the storage unit. The irradiation unit irradiates the plasma water stored in the storage unit with plasma. The plasma water generator described in Appendix 5. [Explanation of symbols]

[0092] 10 Plasma water generator 12 Storage tanks 14. Microbubble Mist Generator 14J spray device 14P irradiation device 14A Nitrogen supply unit K16 Cavitation Generator 20 Circulation piping 22 valves 24 Liquid level sensor 26 Water supply equipment

Claims

1. A generation unit that generates microbubble-like plasma water, A storage unit for storing the generated plasma water, A regeneration unit that generates the stored plasma water again in the form of microbubbles, A circulation unit that circulates the plasma water, which has been regenerated in the form of microbubbles, to the generation unit, A plasma water supply unit that supplies the plasma water, which has been circulated and stored in the storage unit, to the cultivation target, A plasma water generator equipped with the following features.

2. The generation unit supplies nitrogen to the plasma water. The plasma water generating apparatus according to claim 1.

3. The plasma water supply unit supplies the plasma water to the cultivation target when the concentration of nitrite in the plasma water stored in the storage unit reaches a predetermined value. The plasma water generating apparatus according to claim 2.

4. The plasma water supply unit supplies the plasma water to the cultivation target when it is determined that the nitrite concentration of the plasma water stored in the storage unit has reached a predetermined value, based on the value detected by the detection unit for detecting the nitrite concentration of the stored plasma water, or based on the time it takes for the generation unit to add nitrogen to the circulating plasma water. The plasma water generating apparatus according to claim 2.

5. The generating unit is A spray unit that sprays water in a microbubble form, The irradiation unit that irradiates plasma, Equipped with, The irradiation unit irradiates the water sprayed in a microbubble shape by the spraying unit with plasma. The plasma water generating apparatus according to claim 1.

6. Equipped with a nitrogen supply unit that supplies nitrogen, The nitrogen supply unit supplies nitrogen to the water that has been sprayed in a microbubble form by the spraying unit and irradiated with plasma, either before it is stored in the storage unit or after it is stored in the storage unit. The plasma water generating apparatus according to claim 5.

7. Equipped with a nitrogen supply unit that supplies nitrogen, The nitrogen supply unit supplies nitrogen to the plasma water stored in the storage unit. The irradiation unit irradiates the plasma water stored in the storage unit with plasma. The plasma water generating apparatus according to claim 5.

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