Electrostatic chuck device and rotating body
The electrostatic chuck device facilitates sample rotation through a rotating mechanism with ionic fluid bearings and a magnet-coil configuration, addressing limitations in existing devices and expanding their use in semiconductor manufacturing.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2024-11-11
- Publication Date
- 2026-05-21
AI Technical Summary
Existing electrostatic chuck devices are limited in their ability to rotate plate-like samples during semiconductor manufacturing processes, necessitating improvements for broader applications.
An electrostatic chuck device with a rotating mechanism, comprising a dielectric substrate, internal electrodes, and rotationally symmetric terminals, allows for the rotation of a plate-like sample in the circumferential direction, using ionic liquids for fluid bearings and a magnet-coil configuration for stable rotation.
Enables the rotation of held samples, enhancing the device's applicability to various semiconductor processes while maintaining stability and durability in plasma environments.
Smart Images

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